[go: up one dir, main page]

CN102888647B - Plating equipment and plating method - Google Patents

Plating equipment and plating method Download PDF

Info

Publication number
CN102888647B
CN102888647B CN201210069120.8A CN201210069120A CN102888647B CN 102888647 B CN102888647 B CN 102888647B CN 201210069120 A CN201210069120 A CN 201210069120A CN 102888647 B CN102888647 B CN 102888647B
Authority
CN
China
Prior art keywords
substrate holder
storage unit
substrate
plating
truck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201210069120.8A
Other languages
Chinese (zh)
Other versions
CN102888647A (en
Inventor
南吉夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to CN201610452990.1A priority Critical patent/CN106149031B/en
Priority to CN201610453013.3A priority patent/CN106119919B/en
Publication of CN102888647A publication Critical patent/CN102888647A/en
Application granted granted Critical
Publication of CN102888647B publication Critical patent/CN102888647B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/12Semiconductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775Docking arrangements

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A plating apparatus that ensures that a substrate holder can be easily touched and that the substrate holder can be easily maintained while a substrate is being processed in the plating apparatus. The plating apparatus includes a plating section for plating a substrate, a substrate holder for holding the substrate, a substrate holder transporter for holding and transporting the substrate holder, a storage section for storing the substrate holder, and a storage section mounting section for storing the storage section therein. The storage mounting portion includes a moving mechanism for moving the storage into and out of the storage mounting portion.

Description

镀敷设备和镀敷方法Plating equipment and plating method

技术领域technical field

本发明涉及一种用于诸如半导体晶片的工件(基板)的表面进行镀敷的设备及镀敷方法,特别涉及一种适于在基板的表面中限定的微细互通的沟槽、孔或阻抗开口中形成镀敷薄膜,或者适于在基板的表面上形成与封装体(package)等的电极电连接的凸块(凸出电极)。对于用于半导体芯片等的三维外壳,需要在基板中形成多个被称为插入器(interposer)或分隔件(spacer)的直通塞(throughviaplug)。为了形成这种直通插头,根据本发明的镀敷设备和镀敷方法还可以用于填充通过孔以形成这样的直通塞。更具体地说,本发明是涉及一种用于通过将基板浸在镀敷槽中的镀敷溶液中,对由基板保持器保持的基板进行镀敷的浸没型(dip-type)镀敷设备和浸没型镀敷方法。The present invention relates to a kind of equipment and method for plating on the surface of workpieces (substrates) such as semiconductor wafers, and in particular to a fine interconnected groove, hole or resistance opening suitable for defining in the surface of the substrate It is suitable for forming a plated film in the substrate, or forming a bump (protruding electrode) electrically connected to an electrode of a package or the like on the surface of the substrate. For a three-dimensional package for a semiconductor chip or the like, it is necessary to form a plurality of through via plugs called interposers or spacers in a substrate. In order to form such a through plug, the plating apparatus and plating method according to the present invention can also be used to fill the via hole to form such a through plug. More specifically, the present invention relates to a dip-type plating apparatus for plating a substrate held by a substrate holder by immersing the substrate in a plating solution in a plating bath and immersion-type plating methods.

背景技术Background technique

用于对基板镀敷的设备大致分为面向下型(face-downtype)镀敷设备和浸没型镀敷设备。Equipment for plating a substrate is roughly classified into face-down type plating equipment and immersion type plating equipment.

面向下型镀敷设备执行对例如半导体晶片的基板的镀敷时,基板被通过头部被水平地保持,并且其将要被镀敷的表面面向下。通常,基板被收容在例如前开式标准槽(FrontOpeningUnifiedPod)等的承载容器(carrierreceptacle)中,并且基板被水平地保持,其将要被镀敷的表面面向上。因此,在基板被面向下型镀敷设备镀敷前,基板需要在面向下镀敷设备中被转动成上下翻转。When the face-down type plating apparatus performs plating on a substrate such as a semiconductor wafer, the substrate is held horizontally by the head with its surface to be plated facing downward. Generally, the substrate is housed in a carrier container such as a Front Opening Unified Pod, and the substrate is held horizontally with its surface to be plated facing upward. Therefore, before the substrate is plated by the face-down type plating apparatus, the substrate needs to be turned upside down in the face-down plating apparatus.

另一方面,浸没型设备通过使得基板竖直地进入镀敷槽内的镀敷溶液中对由基板保持器保持的基板进行镀敷。因此,当基板保持在基板保持器中时,需要保持基板保持器水平,并且当要将基板浸没在镀敷溶液中时,必需要保持基板保持器竖直。因此,浸没型镀敷设备具有用于将基板从竖直状态转动成水平状态并且将基板从水平状态转动成垂直状态的机构。On the other hand, an immersion-type apparatus performs plating on a substrate held by a substrate holder by causing the substrate to vertically enter a plating solution in a plating bath. Therefore, it is necessary to keep the substrate holder horizontal when the substrate is held in the substrate holder, and it is necessary to keep the substrate holder vertical when the substrate is to be immersed in the plating solution. Therefore, the immersion type plating apparatus has a mechanism for turning the substrate from the vertical state to the horizontal state and turning the substrate from the horizontal state to the vertical state.

如图33所示,例如,常规的镀敷设备具有可转动地安装在运送器300上的臂304,臂304能够通过马达302而被转动。在臂304夹住基板保持器306的一端后,马达302被通电,以将臂304竖直转动90°,以将基板保持器306从竖直状态转动成水平状态。基板保持器306于是被水平地放置在台308上。如图34所示,另一个常规的镀敷设备具有固定区域316,固定区域316包括可竖直旋转的台310和可旋转的轴314,轴314夹住基板保持器312的一端并旋转基板保持器312。旋转的轴314围绕它自己的轴线旋转,以将基板保持器312从竖直状态转动成水平状态。As shown in FIG. 33 , for example, a conventional plating apparatus has an arm 304 rotatably mounted on a carrier 300 , and the arm 304 can be rotated by a motor 302 . After the arm 304 clamps one end of the substrate holder 306, the motor 302 is energized to turn the arm 304 vertically by 90° to turn the substrate holder 306 from a vertical state to a horizontal state. The substrate holder 306 is then placed horizontally on the stage 308 . As shown in FIG. 34, another conventional plating apparatus has a fixed area 316 including a vertically rotatable table 310 and a rotatable shaft 314 that clamps one end of a substrate holder 312 and rotates the substrate holder. device 312. The shaft of rotation 314 rotates about its own axis to turn the substrate holder 312 from a vertical state to a horizontal state.

近些年,由于基板的尺寸较大,用于旋转这种基板的臂或台的机构的尺寸也较大,并且将基板保持器从竖直状态转动到水平状态所需的时间并将基板保持器从水平状态转动到竖直状态所需的时间也较长。用于旋转臂或台的大型机构需要镀敷设备内有较大的空间以旋转臂或台。因此,镀敷设备自身的尺寸较大且制造成本较高。In recent years, due to the large size of the substrate, the size of the mechanism for rotating the arm or table for such a substrate is also large, and the time required to turn the substrate holder from the vertical state to the horizontal state and hold the substrate The time required for the device to rotate from a horizontal state to a vertical state is also longer. A large mechanism for rotating the arm or table requires a large space within the plating apparatus to rotate the arm or table. Therefore, the plating equipment itself is large in size and high in manufacturing cost.

传统的镀敷设备还包括基板保持器开启和闭合机构,例如,用来将基板设置在基板保持器上的自动固定装置(fixingrobot)。基板保持器开启和闭合机构具有以下问题:Conventional plating equipment also includes a substrate holder opening and closing mechanism, eg, a fixing robot for placing the substrate on the substrate holder. The substrate holder opening and closing mechanism has the following problems:

已知一种镀敷设备,包括用于竖直地保持基板并将基板浸没在镀敷溶液中的基板保持器。在这个镀敷设备中,基板保持器通过将基板夹持在固定支撑构件和可动支撑构件之间来保持基板,该可动支撑构件能够围绕铰合部打开和闭合。可动支撑构件具有不可拆卸的可旋转支撑构件。当支撑构件被旋转以其外圆周部分滑入固定支撑构件的夹紧装置中时,可动支撑构件的密封环密封基板的外圆周边缘和固定支撑构件的某些区域,使固定支撑构件的电力馈送接触件能够接触基板的外圆周边缘(参见日本专利No3979847、日本专利No3778282、日本专利No3940265和日本专利No4162440)。A plating apparatus is known comprising a substrate holder for holding a substrate vertically and immersing the substrate in a plating solution. In this plating apparatus, the substrate holder holds the substrate by sandwiching the substrate between a fixed support member and a movable support member that can be opened and closed about a hinge. The movable support member has a non-detachable rotatable support member. When the support member is rotated so that its outer peripheral portion slides into the clamping device of the fixed support member, the seal ring of the movable support member seals the outer peripheral edge of the substrate and certain areas of the fixed support member, allowing the power of the fixed support member to The feed contact can contact the outer circumferential edge of the substrate (see Japanese Patent No. 3979847, Japanese Patent No. 3778282, Japanese Patent No. 3940265, and Japanese Patent No. 4162440).

根据上述镀敷设备,当支撑构件旋转时,其本身被磨损,并导致可动支撑构件旋转,可能使基板偏移到无法与密封环对齐的位置并损坏密封环的密封能力。为了避免这种缺点,使用按压杆来按压可动支撑构件,并且按压杆被旋转且减少支撑构件与按压杆的磨损。然而,为了在旋转支撑构件时减少对支撑构件的磨损,镀敷设备需要沿着竖直轴竖直地往复运动且能够旋转的复杂机构。复杂机构使得基板保持器开启和闭合机构上比较复杂。复杂的基板保持器开启和闭合机构占据镀敷设备内的较大空间,使镀敷设备尺寸较大且制造昂贵。According to the above-described plating apparatus, when the support member rotates, it wears itself and causes the movable support member to rotate, possibly shifting the substrate out of alignment with the seal ring and damaging the sealing ability of the seal ring. In order to avoid this disadvantage, a pressing lever is used to press the movable support member, and the pressing lever is rotated and wear of the supporting member and the pressing lever is reduced. However, in order to reduce wear on the support member when the support member is rotated, the plating apparatus requires a complex mechanism that reciprocates vertically along a vertical axis and is capable of rotation. The complex mechanism makes the opening and closing mechanism of the substrate holder complicated. The complex substrate holder opening and closing mechanism takes up a lot of space within the plating apparatus, making the plating apparatus large in size and expensive to manufacture.

传统的基板保持器开启和闭合机构具有另一个问题:如果基板保持器具有不同的厚度,按压杆按压密封环并使密封环抵住基板保持器的按压距离会变化。具体来说,如果基板保持器的厚度比常规厚度薄,因为密封环因此没有被充分挤压,支撑构件在旋转的时候更容易被磨损。如果基板保持器的厚度大于常规厚度,密封环则会被过分地挤压和受损。因此,没有被适当地制作成满足厚度要求的基板保持器会降低密封环的密封能力。Conventional substrate holder opening and closing mechanisms have another problem: If the substrate holders have different thicknesses, the pressing distance at which the pressing rod presses the sealing ring and presses the sealing ring against the substrate holder varies. Specifically, if the thickness of the substrate holder is thinner than conventional, since the seal ring is thus not sufficiently compressed, the support member is more likely to be worn while rotating. If the thickness of the substrate holder is thicker than usual, the seal ring will be excessively compressed and damaged. Therefore, a substrate holder that is not properly fabricated to meet thickness requirements can reduce the sealing ability of the seal ring.

传统的基板保持器开口和闭合机构一般结合有位置偏移检测单元,当基板被安装到基板保持器中且当基板被偏移到未对齐的位置时,位置偏移检测单元用于检测该偏移。根据这个位置偏移检测单元,基板引导被设置在固定支撑构件上且靠近基板的外周边缘的位置上。例如光敏器件或激光传感器的水平光传感器,测量来自被水平地施加到基板保持器内的基板的上的光束的光线量。如果基板被放置在基板引导上,则基板被倾斜并阻挡光束。因此,与基板被适当地被设置在基板引导的基板保持器空隙中相比,则通过水平光传感器检测的光线量变得较小。用这样的方式,基于被检测到的光线量的减少,基板在基板保持器中的位置的偏移被检测。当基板在基板保持器中偏移出对齐位置时,基板引导将基板保持在基板引导上并保持基板的倾斜,防止基板在水平截面中偏移出对齐位置。Conventional substrate holder opening and closing mechanisms are generally combined with a position shift detection unit for detecting the shift when the substrate is mounted in the substrate holder and when the substrate is shifted to a misaligned position. shift. According to this positional deviation detection unit, the substrate guide is provided on the fixed support member at a position close to the outer peripheral edge of the substrate. A horizontal light sensor, such as a photosensor or a laser sensor, measures the amount of light from a beam of light applied horizontally onto the substrate within the substrate holder. If the substrate is placed on the substrate guide, the substrate is tilted and blocks the beam. Consequently, the amount of light detected by the level light sensor becomes smaller than if the substrate were properly arranged in the substrate-guided substrate holder gap. In this way, based on the detected reduction in the amount of light, a shift in the position of the substrate in the substrate holder is detected. When the substrate is shifted out of alignment in the substrate holder, the substrate guide holds the substrate on the substrate guide and maintains the tilt of the substrate, preventing the substrate from shifting out of alignment in a horizontal section.

然而,水平光传感器的问题在于,当基板上有水滴、基板本身形状变形、基板保持器本身形状变形、放置基板保持器的台的本身形状也变形、或基板保持器由于放置基板保持器的台上存在的纸粉或纸屑而倾斜时,基板可能被错误地检测为在基板保持器中偏移出了对齐位置。水平光传感器还具有关于检测精确性的问题,因为基板引导的高度受到基板保持器的尺寸的限制,随着传感器的表面因时间流逝而由污迹引起的雾化,能够被传感器检测到的光线量随着时间流逝而减少。However, the horizontal light sensor has a problem in that when there are water droplets on the substrate, the shape of the substrate itself is deformed, the shape of the substrate holder itself is deformed, the shape of the table on which the substrate holder is placed is also deformed, or the substrate holder is deformed due to the When tilted due to paper dust or dust present on the substrate, the substrate may be falsely detected as being out of alignment in the substrate holder. Horizontal light sensors also have problems with detection accuracy because the height of the substrate guide is limited by the size of the substrate holder, as the surface of the sensor fogs up due to the passage of time due to smudges, the amount of light that can be detected by the sensor amount decreases over time.

在浸没型镀敷设备中,因此在工作前,基板保持器被存储在贮藏部中。当浸没型镀敷设备开始工作,基板保持器被从贮藏部中取出,并且将要被处理的基板被从它的储藏部中取出并被保持在基板保持器中。保持基板的基板保持器通过基板保持器运送器被运送到基板被相应地进行处理的镀敷槽和其他与镀敷处理有关的处理槽中。In immersion-type plating installations, the substrate holders are therefore stored in storage before work. When the immersion type plating apparatus starts to operate, the substrate holder is taken out of the storage, and the substrate to be processed is taken out of its storage and held in the substrate holder. The substrate holder holding the substrate is transported by the substrate holder carrier into a plating tank where the substrate is processed accordingly and other processing tanks related to the plating process.

当基板保持器被发现存在例如电力馈送故障等问题并要被维修以解决该问题时,传统的浸没型镀敷设备必需被关闭并因此它的可操作性较低。被发现存在电力馈送故障的基板保持器被退回到贮藏部并直到起被维修都不能再使用。当浸没型镀敷设备在进行镀敷处理时,通向浸没型镀敷设备的内部的入口为了安全起见而受到限制。因此,当基板保持器被维修时,至少需要等到在发生问题前刚刚开始的镀敷处理结束。因为不能被使用的基板保持器不能用在镀敷处理中,浸没型镀敷设备每个单位时间内的处理量减少。When a substrate holder is found to have a problem such as a power feed failure and is repaired to solve the problem, the conventional immersion type plating apparatus has to be shut down and thus its operability is low. Substrate holders found to have power feed failures are returned to storage and cannot be used again until they are repaired. When the immersion-type plating equipment is performing a plating process, access to the interior of the immersion-type plating equipment is restricted for safety reasons. Therefore, when the substrate holder is repaired, it is necessary to wait at least until the plating process started just before the occurrence of the problem is completed. Since the substrate holder that cannot be used cannot be used in the plating process, the processing amount per unit time of the immersion type plating apparatus is reduced.

在传统的浸没型镀敷设备中,用于存储基板保持器的贮藏部是被不可分地结合在设备中。当被放置在贮藏部中的基板保持器需要被维修时,基板保持器被手动地或通过专用起重机从贮藏部移去。可选地,贮藏部被运送到可以从浸没型镀敷设备的外部碰触的位于浸没型镀敷设备内的输送槽或服务区,然后基板保持器被手动地或通过专用起重机从贮藏部移去。将基板保持器从浸没型镀敷设备移去或装回浸没型镀敷设备是非常繁重和耗时的。因为将要被操作的基板的尺寸较大,所需要的人工劳力增加并且所需要的起重机的尺寸也较大,繁重的和耗时的维修过程变得更糟。In a conventional immersion type plating apparatus, a storage portion for storing substrate holders is integrally incorporated in the apparatus. When a substrate holder placed in the storage needs to be serviced, the substrate holder is removed from the storage manually or by a dedicated crane. Alternatively, the storage is transported to a delivery tank or service area within the immersion-type plating plant that is accessible from outside the immersion-type plating plant, and the substrate holders are then removed from the storage either manually or by a dedicated crane. go. Removing and reinstalling the substrate holder from and back to the immersion-type plating apparatus is very tedious and time-consuming. The tedious and time-consuming repair process is made worse by the larger size of the substrate to be manipulated, the increased manual labor required and the larger size of the required crane.

发明内容Contents of the invention

鉴于以上情形,提供了本发明。本发明的第一目标是提供一种镀敷设备和镀敷方法,其允许基板保持器被简易地维修并且同时保证了基板在镀敷设备中进行处理时能够容易地触碰基板保持器。In view of the above circumstances, the present invention is provided. A first object of the present invention is to provide a plating apparatus and a plating method which allow a substrate holder to be easily serviced and at the same time ensure that substrates can easily touch the substrate holder while being processed in the plating apparatus.

本发明的第二目标都是提供一种镀敷设备、镀敷方法和转换使用在镀敷设备中的基板保持器的姿势的方法,其能够转换基板保持器的姿势,用于可拆卸地保持基板使其从水平状态变为竖直状态或从竖直状态变为水平状态,而不需要大尺寸的旋转机构。The second object of the present invention is to provide a plating apparatus, a plating method, and a method of changing the posture of a substrate holder used in a plating apparatus, which can change the posture of the substrate holder for detachably holding The base plate enables it to change from a horizontal state to a vertical state or from a vertical state to a horizontal state without the need for a large-sized rotating mechanism.

本发明的第三目标是提供一种镀敷设备,其能够将基板放置在具有基板保持器开启和闭合机构的基板保持器中,基板保持器开启和闭合机构无需较大的尺寸,复杂的结构,并且能够在基板被安装在基板保持器中时基板偏移出对齐位置时进行检测,同时允许基板保持器具有不同的厚度。A third object of the present invention is to provide a plating apparatus capable of placing a substrate in a substrate holder with a substrate holder opening and closing mechanism that does not require a large size, complicated structure , and enables detection when the substrate is shifted out of alignment when mounted in the substrate holder, while allowing the substrate holder to have different thicknesses.

本发明提供了一种镀敷设备,其包括:镀敷部,镀敷部用于镀敷基板;基板保持器,基板保持器用于保持基板;基板保持器运送器,基板保持器运送器用于保持和运送基板保持器;贮藏部,贮藏部用于存储基板保持器;和贮藏部安装部分,贮藏部安装部分用于将贮藏部存储在贮藏部安装部分中;其中,贮藏部包括移动机构,移动机构用于将贮藏部移入贮藏部安装部分和从贮藏部安装部分移出贮藏部。The invention provides a plating equipment, which includes: a plating part, the plating part is used for plating a substrate; a substrate holder, the substrate holder is used to hold the substrate; a substrate holder transporter, the substrate holder transporter is used to hold and a transport substrate holder; a storage part, the storage part is used to store the substrate holder; and a storage part installation part, the storage part installation part is used to store the storage part in the storage part installation part; wherein, the storage part includes a moving mechanism, which moves A mechanism is used to move the storage unit into and out of the storage unit mounting portion.

利用这种结构,基板保持器能够被从贮藏部中取出而不需要停止基板在镀敷设备中的处理。因此,镀敷设备的每单位时间内的处理量不会变低,并且基板保持器能够被容易和快速地维护。With this structure, the substrate holder can be taken out of the storage without stopping the processing of the substrate in the plating apparatus. Therefore, the throughput per unit time of the plating apparatus does not become low, and the substrate holder can be easily and quickly maintained.

根据本发明的一个优选方面,该移动机构包括脚轮,脚轮用于从镀敷设备移动和分离贮藏部。According to a preferred aspect of the invention, the moving mechanism comprises castors for moving and separating the storage from the plating apparatus.

该贮藏部安装部分可以包括:门,门能够选择性地打开和闭合;和闸板,闸板能够选择性地打开和闭合,用于在门打开时,使贮藏部安装部分中的空气和镀敷设备中的空气彼此隔离。The storage part installation part may include: a door which can be selectively opened and closed; The air in the coating equipment is isolated from each other.

该基板保持器运送器可以包括传感器,传感器用于检测基板保持器当前是否位于贮藏部中,或者检测基板保持器在贮藏部中的位置。The substrate holder transporter may include a sensor for detecting whether the substrate holder is currently located in the storage, or detecting the position of the substrate holder in the storage.

该镀敷设备可以进一步包括:控制器,控制器用于监测和控制基板保持器运送器和贮藏部安装部分的状态;和指示部分,指示部分用于向控制器指示贮藏部的移动。该贮藏部可以包括锁销把手,锁销把手用于将贮藏部锁在贮藏部安装部分中,并且贮藏部安装部分包括用于与锁销把手接合的锁销接收部。The plating apparatus may further include: a controller for monitoring and controlling states of the substrate holder carrier and the storage installation part; and an indication part for instructing the controller to move the storage. The storage portion may include a latch handle for locking the storage portion in the storage portion mounting portion, and the storage portion mounting portion includes a latch receiving portion for engaging the latch handle.

根据本发明的一个优选方面,该贮藏部安装部分包括用于限制门的开启的门开关和用于限制闸板的打开的闸板开关,其中,门开关和闸板开关彼此协同工作。According to a preferred aspect of the present invention, the storage part installation part includes a door switch for restricting opening of the door and a shutter switch for restricting opening of the shutter, wherein the door switch and the shutter switch cooperate with each other.

本发明提供了一种用于控制镀敷设备自动地执行步骤的镀敷方法,其包括以下步骤:将基板保持器从贮藏部移出;使用基板保持器保持基板;使用基板保持器运送器将保持基板的基板保持器运送到镀敷部;在镀敷部中对基板进行镀敷;和使用基板保持器运送器将基板保持器运送回贮藏部;其中,镀敷方法包括:当镀敷设备在自动地执行上述步骤时,使用贮藏部的移动机构将贮藏部从镀敷设备中移出。The present invention provides a plating method for controlling a plating apparatus to automatically perform steps, which includes the following steps: removing a substrate holder from a storage part; holding a substrate using the substrate holder; The substrate holder of the substrate is transported to the plating section; the substrate is plated in the plating section; and the substrate holder is transported back to the storage section using a substrate holder transporter; wherein the plating method includes: when the plating apparatus is in When performing the above-mentioned steps automatically, the storage part is moved out of the plating equipment using the moving mechanism of the storage part.

根据本发明的一个优选方面,移动机构包括脚轮,脚轮用于从镀敷设备移动和分离贮藏部。According to a preferred aspect of the invention, the moving mechanism comprises castors for moving and separating the storage from the plating apparatus.

根据本发明的一个优选方面,该镀敷方法进一步包括:在镀敷设备自动地执行上述步骤时,在贮藏部被移动出镀敷设备前,向镀敷设备的控制器指示贮藏部移出镀敷设备。According to a preferred aspect of the present invention, the plating method further includes: when the plating equipment automatically performs the above steps, before the storage portion is moved out of the plating equipment, instruct the controller of the plating equipment to remove the plating from the storage portion. equipment.

根据本发明的一个优选方面,该镀敷方法进一步包括:在贮藏部被移出镀敷设备前,闭合闸板以将镀敷设备内部与外界空气隔离;和在贮藏部已被移动进入镀敷设备后,打开闸板,以允许基板保持器运送器触碰贮藏部。According to a preferred aspect of the present invention, the plating method further includes: before the storage part is moved out of the plating device, closing the shutter to isolate the inside of the plating device from the outside air; and when the storage part has been moved into the plating device After that, the shutter is opened to allow the substrate holder transporter to touch the storage section.

本发明提供了一种用于存储在镀敷设备中使用的基板保持器的贮藏部,该贮藏部包括:基板保持器存储区,基板保持器存储区用于在该基板保持器存储区中存储基板保持器;和移动机构;其中,贮藏部通过移动机构被从镀敷设备移动和分离。The present invention provides a storage section for storing substrate holders used in plating equipment, the storage section includes: a substrate holder storage area for storing substrate holders in the substrate holder storage area A substrate holder; and a moving mechanism; wherein the storage is moved and separated from the plating apparatus by the moving mechanism.

贮藏部可以包括设置在贮藏部底部的排水盘。The storage portion may include a drain pan disposed at the bottom of the storage portion.

基板保持器存储区能够在该基板保持器存储区中存储阳极保持器。Substrate holder storage area Anode holders can be stored in the substrate holder storage area.

本发明提供了另一种用于存储镀敷设备中使用的阳极保持器的贮藏部,该贮藏部包括:阳极保持器存储区,阳极保持器存储区用于在该阳极保持器存储区中存储阳极保持器;排水盘,排水盘设置在贮藏部的底部;和移动机构;其中,贮藏部通过移动机构被从镀敷设备移动和分离。The present invention provides another storage section for storing anode holders used in plating equipment, the storage section comprising: an anode holder storage area for storing in the anode holder storage area an anode holder; a drain pan provided at the bottom of the storage; and a moving mechanism; wherein the storage is moved and separated from the plating apparatus by the moving mechanism.

本发明提供了另一种镀敷设备,该镀敷设备包括:基板保持器,基板保持器用于可拆卸地保持基板;台,基板保持器被水平地放置在台上;镀敷部,镀敷部具有镀敷槽,镀敷槽用于通过将基板在竖直面中浸没在镀敷溶液中而对被基板保持器保持的基板进行镀敷;和基板保持器运送器,基板保持器运送器用于在台和镀敷部之间运送基板保持器,基板保持器运送器包括用于保持基板保持器的保持部分;其中,台具有水平移动机构,当水平移动机构支撑基板保持器的下端时,水平移动机构能够水平地移动;和其中,基板保持器运送器包括能够竖直移动的臂,当基板保持器的下端被水平移动机构支撑并且通过竖直移动保持部分水平移动机构水平移动时,臂用于将基板保持器的姿势从竖直状态变成水平状态,或者从水平状态变成竖直状态。The present invention provides another plating device, which includes: a substrate holder, the substrate holder is used to detachably hold the substrate; a table, the substrate holder is horizontally placed on the table; a plating part, a plating The part has a plating tank for plating a substrate held by a substrate holder by immersing the substrate in a plating solution in a vertical plane; and a substrate holder carrier for the substrate holder carrier For conveying the substrate holder between the table and the plating section, the substrate holder transporter includes a holding portion for holding the substrate holder; wherein the table has a horizontal movement mechanism, and when the horizontal movement mechanism supports the lower end of the substrate holder, the horizontal movement mechanism can move horizontally; and wherein the substrate holder transporter includes an arm capable of vertical movement, the arm moves horizontally when the lower end of the substrate holder is supported by the horizontal movement mechanism and moves horizontally by the vertical movement holding portion Used to change the posture of the substrate holder from a vertical state to a horizontal state, or from a horizontal state to a vertical state.

利用这种结构,基板保持器能够稳定地旋转而无需大尺寸的旋转机构,并且该镀敷设备能够节省空间并能够以低成本制造。尤其是,因为用于将基板保持器传送到镀敷区的基板保持器运送器被用于旋转基板保持器,不需要附加的动力机构来旋转基板保持器。因此,镀敷设备以很低的成本制造。With this structure, the substrate holder can be stably rotated without a large-sized rotating mechanism, and the plating apparatus can save space and can be manufactured at low cost. In particular, since the substrate holder transporter used to transfer the substrate holder to the plating zone is used to rotate the substrate holder, no additional power mechanism is required for rotating the substrate holder. Therefore, the plating device can be manufactured at very low cost.

镀敷设备可以进一步包括:传感器,传感器用于检测基板保持器运送器是否保持基板保持器,或者检测到被基板保持器运送器保持的基板保持器的距离The plating apparatus may further include: a sensor for detecting whether the substrate holder carrier holds the substrate holder, or detecting a distance of the substrate holder held by the substrate holder carrier

本发明的一个优选方面,如果传感器检测到当基板保持器运送器没有保持基板保持器或者到被基板保持器运送器保持的基板保持器的距离偏离参考值,能够竖直移动的臂被停止运作。In a preferred aspect of the present invention, if the sensor detects that the substrate holder is not held by the substrate holder transporter or the distance to the substrate holder held by the substrate holder transporter deviates from a reference value, the vertically movable arm is deactivated. .

基板保持器可以包括圆形手柄,并且保持部分保持圆形手柄。The substrate holder may include a round handle, and the holding portion holds the round handle.

保持部分可以具有可旋转地支撑圆形手柄的形状。The holding portion may have a shape to rotatably support the circular handle.

水平移动机构支撑的基板保持器的下端可以具有与水平移动机构接触的半圆部分。A lower end of the substrate holder supported by the horizontal movement mechanism may have a semicircular portion in contact with the horizontal movement mechanism.

通过从水平移动机构悬挂的重物,水平移动机构在沿着降低保持部分的方向上正常地偏置。The horizontal movement mechanism is normally biased in a direction in which the holding portion is lowered by a weight suspended from the horizontal movement mechanism.

基板保持器运送器可以包括用于在基板保持器被运送时防止基板保持器摇晃的夹持器。The substrate holder transporter may include a gripper for preventing the substrate holder from shaking while the substrate holder is being transported.

本发明提供了一种转换用于可拆卸地保持基板的基板保持器的姿势的方法,该方法包括:使用基板保持器运送器的保持部分保持基板保持器的一个端部;在台上方移动由保持部分保持的基板保持器;降低保持部分以使得基板保持器的另一个端部与台上的水平移动机构接触;和为了将基板保持器的姿势从竖直状态转换为水平状态,进一步降低保持部分以水平地移动水平移动机构。The present invention provides a method of switching the posture of a substrate holder for detachably holding a substrate, the method comprising: holding one end of the substrate holder using a holding portion of a substrate holder carrier; The substrate holder held by the holding portion; the holding portion is lowered so that the other end of the substrate holder comes into contact with the horizontal movement mechanism on the stage; part to move the horizontal movement mechanism horizontally.

该方法进一步包括:使用传感器检测基板保持器运送器是否保持基板保持器,或者检测到被基板保持器运送器保持的基板保持器的距离;和如果传感器检测到当基板保持器运送器没有保持基板保持器或者到被基板保持器运送器保持的基板保持器的距离偏离参考值,停止保持部分的运作。The method further includes: using a sensor to detect whether the substrate holder transporter is holding the substrate holder, or detecting the distance of the substrate holder being held by the substrate holder transporter; and if the sensor detects that the substrate holder transporter is not holding the substrate The holder or the distance to the substrate holder held by the substrate holder transporter deviates from the reference value, stopping the operation of the holding section.

该方法进一步包括:在基板的另一端与水平移动机构接触后,水平地移动基板保持器运送器,以使得基板保持器倾斜预定角度。The method further includes horizontally moving the substrate holder transporter such that the substrate holder is inclined at a predetermined angle after the other end of the substrate is in contact with the horizontal moving mechanism.

本发明提供了另一种镀敷方法,该镀敷方法包括:将基板保持器放置在台上;使用放置在台上的基板保持器安装和保持基板;使用基板保持器运送器的保持部分保持基板保持器的端部;抬升基板保持器运送器并且水平地移动位于台上的水平移动机构,以将基板保持器的姿势从水平状态变成竖直状态;使用基板保持器运送器将基板保持器移动到位于具有镀敷溶液的镀敷槽的上方的位置;和使用基板保持器运送器降低基板保持器,以将基板浸没在镀敷槽中的镀敷溶液中。The present invention provides another plating method comprising: placing a substrate holder on a stage; mounting and holding a substrate using the substrate holder placed on the stage; holding the substrate using a holding portion of a substrate holder transporter The end of the substrate holder; lift the substrate holder carrier and horizontally move the horizontal movement mechanism located on the table to change the posture of the substrate holder from a horizontal state to a vertical state; hold the substrate using the substrate holder carrier moving the device to a position above the plating tank with the plating solution; and lowering the substrate holder using the substrate holder transporter to immerse the substrate in the plating solution in the plating tank.

本发明提供了另一种镀敷设备,该镀敷设备包括:基板保持器,基板保持器用于可拆卸地保持基板;台,基板保持器被水平地放置在台上;镀敷部,镀敷部具有镀敷槽,镀敷槽用于通过将由基板保持器保持的基板在竖直面中浸没在镀敷溶液中而对基板进行镀敷;和基板保持器运送器,基板保持器运送器用于在台和镀敷部之间运送基板保持器,基板保持器运送器包括用于保持基板保持器的保持部分;基板保持器打开和闭合机构,基板保持器打开和闭合机构用于打开和闭合位于台上的基板保持器;其中,基板保持器包括:可移动支撑构件,可移动支撑构件具有可旋转支撑构件;和固定支撑构件,固定支撑构件用于与可移动支撑构件协同工作以夹持基板,可移动支撑构件被可移除地紧固到固定支撑构件;和其中,基板保持器打开和闭合机构包括:头部分,头部分用于按压可移动支撑构件,头部分至少具有将可移动支撑构件紧固到固定支撑构件和将可移动支撑构件从固定支撑构件释放的可旋转的部分,可移动支撑构件被头部分可移除地保持;第一致动器,第一致动器用于竖直地移动头部分;和第二致动器,第二致动器用于旋转头部分的至少一部分。The present invention provides another plating device, which includes: a substrate holder, the substrate holder is used to detachably hold the substrate; a table, the substrate holder is horizontally placed on the table; a plating part, a plating The part has a plating tank for plating the substrate by immersing the substrate held by the substrate holder in a plating solution in a vertical plane; and a substrate holder carrier for The substrate holder is transported between the table and the plating section, the substrate holder transporter includes a holding portion for holding the substrate holder; a substrate holder opening and closing mechanism, the substrate holder opening and closing mechanism is used to open and close the A substrate holder on a stage; wherein the substrate holder includes: a movable support member having a rotatable support member; and a fixed support member for cooperating with the movable support member to hold a substrate , the movable support member is removably fastened to the fixed support member; and wherein the substrate holder opening and closing mechanism comprises: a head portion for pressing the movable support member, the head portion having at least a The member is fastened to the fixed support member and the rotatable part that releases the movable support member from the fixed support member, the movable support member is removably held by the head part; the first actuator, the first actuator is used to vertically moving the head portion linearly; and a second actuator for rotating at least a portion of the head portion.

这能够简化用于开启和关闭基板保持器的机构,以减少镀敷设备的尺寸,以使得镀敷设备的成本能够被降低。This can simplify the mechanism for opening and closing the substrate holder to reduce the size of the plating apparatus, so that the cost of the plating apparatus can be reduced.

根据本发明的一个优选的方面,该头部分包括旋转板和按压片,按压片具有用于保持可移动支撑构件的吊钩,按压片用于按压可移动支撑构件;支撑构件包括突出部;固定支撑构件包括夹持器;旋转板被连接到轴,并且当轴由第二致动器推压时,旋转板被旋转以旋转支撑构件;和随着支撑构件旋转,突出部与夹持器适配接合,以将移动支撑构件紧固到固定支撑构件,或将移动支撑构件移动到被吊钩悬吊的位置。According to a preferred aspect of the present invention, the head portion includes a rotating plate and a pressing piece, the pressing piece has a hook for holding the movable supporting member, and the pressing piece is used for pressing the movable supporting member; the supporting member includes a protrusion; The support member includes a holder; the rotating plate is connected to the shaft, and when the shaft is pushed by the second actuator, the rotating plate is rotated to rotate the support member; and as the support member rotates, the protrusion fits into the holder. to fasten the mobile support member to the fixed support member, or to move the mobile support member to a position suspended by the hook.

头部分可以包括基板位置检测部分,基板位置检测部分用于确定基板在基板保持器中的位置。The head portion may include a substrate position detection portion for determining a position of the substrate in the substrate holder.

因此,在基板被放置在基板保持器中时基板的偏移位置能够被精确地检测,而无论例如基板和基板保持器的变形和施加到基板和基板保持器上的水滴。Therefore, the shifted position of the substrate when the substrate is placed in the substrate holder can be accurately detected regardless of, for example, deformation of the substrate and the substrate holder and water droplets applied to the substrate and the substrate holder.

按压片可以具有按压块,按压块用于按压可移动支撑构件,按压块包括设置在按压块中的预压缩弹簧。The pressing piece may have a pressing block for pressing the movable supporting member, and the pressing block includes a pre-compressed spring arranged in the pressing block.

这能减少当基板保持器被打开和关闭时施加到组件上的摩擦阻力,并且即使基板保持器具有不同的厚度也能达到用于密封基板保持器的稳定的密封能力This can reduce the frictional resistance applied to the assembly when the substrate holder is opened and closed, and achieve stable sealing ability for sealing the substrate holder even if the substrate holder has different thicknesses

附图说明Description of drawings

图1是根据本发明的一个实施例的镀敷设备的示意性侧视图;Figure 1 is a schematic side view of a plating apparatus according to one embodiment of the present invention;

图2是图1所示的镀敷设备的平面图;Fig. 2 is the plan view of plating equipment shown in Fig. 1;

图3是显示基板保持器的结构的示意图;3 is a schematic diagram showing the structure of a substrate holder;

图4A是显示基板保持器运送器的结构的示意性视图;图4B是显示图4A中显示的基板保持器运送器保持基板保持器的方式的示意性视图;并且图4C是沿着图4B的线Y-Y′的截面图;4A is a schematic view showing the structure of the substrate holder transporter; FIG. 4B is a schematic view showing the manner in which the substrate holder transporter shown in FIG. 4A holds the substrate holder; Sectional view of line Y-Y';

图5A到5F是示意性地显示用于水平移动台的水平移动机构和基板保持器运送器的臂的操作顺序的示意图,用于将基板保持器水平地放置在台上;5A to 5F are diagrams schematically showing the operation sequence of the horizontal movement mechanism for the horizontal movement stage and the arm of the substrate holder transporter for placing the substrate holder horizontally on the stage;

图6A到6F是以图5A到图5F中的操作顺序详细地显示基板保持器和水平移动机构的视图;6A to 6F are views showing the substrate holder and the horizontal movement mechanism in detail in the operation sequence in FIGS. 5A to 5F;

图7A到图7D是显示用于将基板保持器放置在水平移动机构上的基板保持器运送器的操作顺序的视图;7A to 7D are views showing the operation sequence of the substrate holder carrier for placing the substrate holder on the horizontal movement mechanism;

图8A到8C是示意性地显示,用于水平移动台的水平移动机构和基板保持器传送器的臂的另一个操作顺序的示意图,用于将基板保持器水平地放置在台上;8A to 8C are diagrams schematically showing another sequence of operations of the horizontal movement mechanism for the horizontal movement stage and the arm of the substrate holder conveyor for placing the substrate holder horizontally on the stage;

图9A到9C是示意性地显示用于水平地移动台的水平移动机构和基板保持器传送器的臂的另一个操作顺序的示意图,用于将基板保持器水平地放置在台上,9A to 9C are diagrams schematically showing another operation sequence for horizontally moving the horizontal movement mechanism of the stage and the arm of the substrate holder conveyor for horizontally placing the substrate holder on the stage,

图10是显示另一个基板保持器的结构的示意性视图;FIG. 10 is a schematic view showing the structure of another substrate holder;

图11A是显示图10显示的基板保持器的固定支撑构件的示意性视图;并且图11B是显示图10显示的基板保持器的可动支撑构件的示意性视图;11A is a schematic view showing a fixed support member of the substrate holder shown in FIG. 10; and FIG. 11B is a schematic view showing a movable support member of the substrate holder shown in FIG. 10;

图12是图10中显示的基板保持器的可动支撑构件和固定支撑构件的部分放大截面图;12 is a partially enlarged cross-sectional view of the movable support member and the fixed support member of the substrate holder shown in FIG. 10;

图13是显示基板保持器开启和闭合机构的结构的示意性示图;13 is a schematic view showing the structure of the opening and closing mechanism of the substrate holder;

图14A是显示基板保持器开口和闭合机构的头部分的结构的平面图;并且图14B是显示图14A中的头部分的正视图;14A is a plan view showing the structure of the head portion of the substrate holder opening and closing mechanism; and FIG. 14B is a front view showing the head portion in FIG. 14A ;

图15是头部分上的按压块的截面图;Fig. 15 is a cross-sectional view of a pressing block on the head portion;

图16A和16B说明是使用传感器检测基板的位置偏移的过程的示意性视图;16A and 16B illustrate schematic views of a process of detecting a positional deviation of a substrate using a sensor;

图17是基板保持器的平面图,该基板保持器具有在基板放置位置被限定在基板保持器内的凹进部分;17 is a plan view of a substrate holder having a recessed portion defined within the substrate holder at a substrate placement position;

图18A和18B说明是使用传感器检测基板的位置偏移的过程的示意性视图;18A and 18B illustrate schematic views of a process of detecting a positional deviation of a substrate using a sensor;

图19是显示基板保持器开启和闭合机构的工作的方式的立体图;Figure 19 is a perspective view showing the manner in which the substrate holder opening and closing mechanism works;

图20是显示基板保持器开启和闭合机构的工作的方式的立体图;Figure 20 is a perspective view showing the manner in which the substrate holder opening and closing mechanism works;

图21是显示基板保持器开启和闭合机构工作的方式的立体图;Figure 21 is a perspective view showing the manner in which the substrate holder opening and closing mechanism works;

图22是显示基板保持器开启和闭合机构工作的方式的立体图;Figure 22 is a perspective view showing the manner in which the substrate holder opening and closing mechanism works;

图23是显示货车式贮藏部的结构的示意图;Fig. 23 is a schematic diagram showing the structure of a truck type storage part;

图24是显示另一个货车式贮藏部的结构的立体图;Fig. 24 is a perspective view showing the structure of another truck-type storage part;

图25是示意地显示镀敷设备内的贮藏部安装部和货车式贮藏部的侧视图;Fig. 25 is a side view schematically showing a storage installation part and a truck type storage in the plating equipment;

图26是示意地显示镀敷设备内的贮藏部安装部和货车型贮藏部的后视图;Fig. 26 is a rear view schematically showing the storage installation part and the truck-type storage part in the plating equipment;

图27是贮藏部安装部中的导板和货车式贮藏部中的竖直辊和水平辊的平面图;Fig. 27 is a plan view of the guide plate in the storage part installation part and the vertical rollers and horizontal rollers in the truck type storage part;

图28是贮藏部安装部中的导板和货车式贮藏部中的竖直辊和水平辊的正视图;Fig. 28 is a front view of the guide plate in the storage part installation part and the vertical roller and the horizontal roller in the truck type storage part;

图29A是显示货车式贮藏部上的锁柄和贮藏部安装部的门上的锁引导之间关系的示意图;图29B是显示锁引导被安装在其上的门的表面和锁柄的关系的示意图;和图29C是安装有锁引导的门的侧视图;29A is a schematic diagram showing the relationship between the lock handle on the truck-type storage part and the lock guide on the door of the storage part installation part; FIG. 29B is a diagram showing the relationship between the surface of the door on which the lock guide is installed and the lock handle Schematic; and Figure 29C is a side view of a door with a lock guide installed;

图30是显示镀敷设备的控制器、基板保持器运送器、贮藏部安装部,贮藏部触碰指示部和可触碰/不可触碰显示部之间联系的方块图;30 is a block diagram showing the connection between the controller of the plating equipment, the substrate holder transporter, the storage unit installation unit, the storage unit touch indication unit and the touchable/untouchable display unit;

图31A到31E是示意地显示用于将货车式贮藏部放置到货车式贮藏部的贮藏部安装部和从货车式贮藏部移除贮藏部安装部的步骤的立体图;31A to 31E are perspective views schematically showing steps for placing the truck storage unit to the storage unit mounting portion of the truck storage unit and removing the storage unit mounting portion from the truck storage unit;

图32是当镀敷设备在工作时,用于将货车式贮藏部放置到货车式贮藏部的贮藏部安装部和从货车式贮藏部移除贮藏部安装部的步骤的流程图;32 is a flowchart of the steps for placing a truck storage unit into a storage unit mount of a truck storage unit and removing the storage unit installation portion from the truck storage unit while the plating apparatus is in operation;

图33是显示用于将设置在传统的镀敷设备中的基板保持器进行旋转的机构的示意图;和33 is a schematic diagram showing a mechanism for rotating a substrate holder provided in a conventional plating apparatus; and

图34是显示用于将设置在另一个传统的镀敷设备中的基板保持器进行旋转的另一个机构的示意图。Fig. 34 is a schematic view showing another mechanism for rotating a substrate holder provided in another conventional plating apparatus.

具体实施方式detailed description

在下文中,将参考附图来详细描述本发明的较佳实施例。图1是显示根据本发明的实施例的镀敷设备的侧视图,图2是图1显示的镀敷设备的平面图。Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a side view showing a plating apparatus according to an embodiment of the present invention, and FIG. 2 is a plan view of the plating apparatus shown in FIG. 1 .

如图1和2所示,镀敷设备包括设备框架100、用于支撑基板500的基板保持器110(参见图3)、用于将存储基板500的例如FOUP的承载容器放置在其上的一对装载口170、基板自动运送器180、旋转式冲洗干燥器(SRD)190、台120、镀敷部130、基板保持器运送器140、货车式贮藏部150和校准器195。货车式贮藏部150被放置在设备框架100中的贮藏部安装部分160。上述实施例中,货车式贮藏部150被用作贮藏部。As shown in FIGS. 1 and 2, the plating apparatus includes an apparatus frame 100, a substrate holder 110 (see FIG. 3) for supporting a substrate 500, a carrier container such as a FOUP for storing the substrate 500 placed thereon. Pair load port 170 , substrate automated transporter 180 , spin rinse dryer (SRD) 190 , table 120 , plating section 130 , substrate holder transporter 140 , truck storage section 150 and aligner 195 . The cart type storage unit 150 is placed at the storage unit installation portion 160 in the equipment frame 100 . In the above-described embodiments, the cart-type storage unit 150 is used as the storage unit.

基板自动运送器180将基板500从放置在一个装载口170上的承载容器中取出,并将基板500传送到台120。基板自动运送器180还运送来自台120的处理过的基板,并将处理过的基板存储在被放置在一个装载口170上的承载容器中。基板自动运送器180可旋转并在装载口170、台120、旋转式冲洗干燥器190和校准器195之间运送基板500。旋转式冲洗干燥器190旋转镀敷完的基板500,同时冲洗镀敷完的基板500,并最后通过以高速旋转镀敷完的基板500来使得基板500干燥。The substrate automatic transporter 180 takes the substrate 500 out of the carrier container placed on one load port 170 and transfers the substrate 500 to the stage 120 . The substrate automatic transporter 180 also transports the processed substrates from the station 120 and stores the processed substrates in carrier containers placed on one of the load ports 170 . Substrate automated transporter 180 is rotatable and transports substrate 500 between load port 170 , stage 120 , spin rinse dryer 190 , and aligner 195 . The spin rinse dryer 190 spins the plated substrate 500 while rinsing the plated substrate 500 , and finally dries the substrate 500 by rotating the plated substrate 500 at high speed.

校准器195与基板500在基板500的圆周方向上的特定位置角度对齐。具体来说,校准器195检测基板500内限定的凹口或凹陷的位置,并将凹口导向为与标出的角位置对齐,从而将基板500转动到标出的角位置。当基板500转动时,校准器195还在预定位置与基板500的中心位置对齐。The aligner 195 is angularly aligned with a certain position of the substrate 500 in the circumferential direction of the substrate 500 . Specifically, aligner 195 detects the position of a notch or depression defined in substrate 500 and guides the notch into alignment with the marked angular position, thereby rotating substrate 500 to the marked angular position. When the substrate 500 is rotated, the aligner 195 is also aligned with the center position of the substrate 500 at a predetermined position.

镀敷设备还包括运送轴101,该运送轴101用于将基板座运送器140沿着该运送轴101移动、基板保持器开启和闭合机构102和控制器200,该控制器200包括基板保持器运送器控制器。The plating apparatus also includes a transport shaft 101 for moving a substrate holder transporter 140 along the transport shaft 101, a substrate holder opening and closing mechanism 102, and a controller 200 comprising a substrate holder Transporter controller.

当基板500被镀敷时,基板保持器110保持基板500,并将基板500的端部和反面密封并将待镀敷的表面露出。基板保持器110还具有电气触点,该电气触点用于电接触基板500的待镀敷的表面的外边缘,并且该电气触点由外接电源供电。在镀敷处理前,基板保持器110被存储在货车式贮藏部150中。在镀敷处理中,基板保持器110通过基板保持器运送器140被在台120和镀敷部130之间移动。在镀敷处理后,基板保持器110被存储在货车式贮藏部150的后部。The substrate holder 110 holds the substrate 500 when the substrate 500 is plated, and seals the end and the reverse side of the substrate 500 and exposes the surface to be plated. The substrate holder 110 also has electrical contacts for electrically contacting the outer edges of the surface to be plated of the substrate 500 and which are powered by an external power source. The substrate holders 110 are stored in the cart storage 150 prior to the plating process. In the plating process, the substrate holder 110 is moved between the stage 120 and the plating section 130 by the substrate holder carrier 140 . After the plating process, the substrate holder 110 is stored in the rear of the cart storage unit 150 .

基板保持器110能够被水平地放置在台120上。基板自动运送器180将基板500放置到被水平地放置在台120上的基板保持器110中,或将基板500从被水平地放置在台120上的基板保持器110中取出。The substrate holder 110 can be horizontally placed on the stage 120 . The automatic substrate carrier 180 places the substrate 500 into the substrate holder 110 placed horizontally on the stage 120 or takes out the substrate 500 from the substrate holder 110 placed horizontally on the stage 120 .

镀敷设备在其镀敷处理中使用两种镀敷溶液。镀敷部130包括按照镀敷处理的顺序被依次排列的预洗涤槽130a、预处理槽130b、冲洗槽130c、第一镀敷槽130d、冲洗槽130e、第二镀敷槽130f、冲洗槽130g和熔解槽130h。优选地,处理槽130a到130h被以镀敷处理的顺序沿着从x朝向x′的方向依次地排列,排除其他额外的运送路径。镀敷设备中槽的类型、数目和布置能够基于基板处理的目的而被自由选择。Plating equipment uses two plating solutions in its plating process. The plating section 130 includes a pre-wash tank 130a, a pre-treatment tank 130b, a rinse tank 130c, a first plating tank 130d, a rinse tank 130e, a second plating tank 130f, and a rinse tank 130g, which are sequentially arranged in the order of plating treatment. and melting tank 130h. Preferably, the treatment tanks 130a to 130h are sequentially arranged in the order of the plating treatment along the direction from x toward x', excluding other additional delivery paths. The type, number and arrangement of tanks in the plating apparatus can be freely selected based on the purpose of substrate processing.

在图1和2所述的镀敷设备中,通过基板保持器110被保持的基板500通过镀敷部130的处理槽130a到130h中的处理流体被处理。特别的,通过基板保持器110被保持的基板500被竖直地浸没在镀敷槽130f中的镀敷溶液中,并被在镀敷溶液中被镀敷,同时镀敷溶液被从下引入镀敷槽130f并溢出镀敷槽130f。在本实施例中,镀敷槽130f被分成多个区域,通过基板保持器110被保持的一个基板500在每个区域被竖直地浸没在镀敷溶液中并被镀敷。镀敷槽130f的每个区域具有用于将基板保持器110从其中穿过的插入槽、用于供应电能到基板保持器110的电源单元、正极、搅拌装置和屏蔽板。正极被安装在正极保持器上,与基板500同轴并且具有面对基板500的露出表面。In the plating apparatus described in FIGS. 1 and 2 , the substrate 500 held by the substrate holder 110 is processed by the processing fluid in the processing tanks 130 a to 130 h of the plating part 130 . Specifically, the substrate 500 held by the substrate holder 110 is vertically immersed in the plating solution in the plating tank 130f, and is plated in the plating solution while the plating solution is introduced from below for plating. Plating tank 130f and overflows plating tank 130f. In the present embodiment, the plating tank 130f is divided into a plurality of regions, and one substrate 500 held by the substrate holder 110 is vertically immersed in the plating solution and plated in each region. Each area of the plating bath 130f has an insertion slot for passing the substrate holder 110 therethrough, a power supply unit for supplying electric power to the substrate holder 110, a positive electrode, a stirring device, and a shielding plate. The positive electrode is mounted on the positive electrode holder coaxially with the substrate 500 and has an exposed surface facing the substrate 500 .

基板保持器运送器140能够通过传送机构沿着运送轴101在台120、镀敷部130和货车式贮藏部150之间移动,传送机构例如是线性电机等等,但未在图中显示。基板保持器运送器140运送基板保持器110并同时保持基板保持器110处于竖直姿势。The substrate holder transporter 140 is movable along the transport shaft 101 between the stage 120, the plating section 130, and the truck storage section 150 by a transport mechanism such as a linear motor or the like, but not shown in the figure. The substrate holder transporter 140 transports the substrate holder 110 while maintaining the substrate holder 110 in a vertical posture.

货车式贮藏部150能够存储多个基板保持器110,每个基板保持器110在竖直平面内延伸。在图1中,货车式贮藏部150被设置为靠近镀敷设备的后表面。然而,货车式贮藏部150可以被设置在其它位置,例如在台120和镀敷部130之间。The cart storage 150 is capable of storing a plurality of substrate holders 110 each extending in a vertical plane. In FIG. 1, a cart type storage part 150 is disposed near the rear surface of the plating apparatus. However, the truck storage section 150 may be provided at other locations, such as between the stage 120 and the plating section 130 .

以下将通过举例简要说明镀敷设备的操作顺序。操作顺序包括以下步骤(a)到步骤(h)。The operation sequence of the plating apparatus will be briefly described below by way of example. The sequence of operations includes the following steps (a) to (h).

(a)基板保持器运送器140移动到货车式贮藏部150上方的位置,保持和取出存储在货车式贮藏部中的基板保持器110。(a) The substrate holder transporter 140 moves to a position above the cart storage 150, and holds and takes out the substrate holders 110 stored in the cart storage.

(b)然后,基板保持器运送器140移动到台120上方的位置,同时保持基板保持器110,并将基板保持器110水平的放置在台120上。(b) Then, the substrate holder transporter 140 moves to a position above the stage 120 while holding the substrate holder 110 , and places the substrate holder 110 horizontally on the stage 120 .

(c)基板500被安置到基板保持器110。(c) The substrate 500 is set to the substrate holder 110 .

(d)基板保持器运送器140竖直地保持基板保持器110,并移动到镀敷部130的预洗涤槽130a。此后,基板保持器运送器140在从x到x′的方向上依次通过镀敷部130的处理槽130a到镀敷部130的处理槽130h,同时通过基板保持器110被保持的基板500在处理槽130a到处理槽130h中被处理。(d) The substrate holder transporter 140 vertically holds the substrate holder 110 and moves to the pre-wash tank 130 a of the plating section 130 . Thereafter, the substrate holder transporter 140 sequentially passes through the processing tank 130a of the plating section 130 to the processing tank 130h of the plating section 130 in the direction from x to x' while the substrate 500 held by the substrate holder 110 is being processed. Tank 130a is processed in processing tank 130h.

(e)基板500在镀敷部130中的处理完成后,基板保持器运送器140移动到台120,同时竖直地保持基板保持器110,然后将基板保持器110水平的放置在台120上。(e) After the processing of the substrate 500 in the plating section 130 is completed, the substrate holder transporter 140 moves to the stage 120 while vertically holding the substrate holder 110, and then places the substrate holder 110 horizontally on the stage 120 .

(f)基板500被从基板保持器110移去。(f) The substrate 500 is removed from the substrate holder 110 .

(g)如果多个待处理的基板500要被连续地处理,则下一个未被处理的基板500被安置在基板保持器110中,并重复以上从步骤(d)到步骤(f)的顺序。(g) If a plurality of substrates 500 to be processed are to be processed continuously, the next unprocessed substrate 500 is placed in the substrate holder 110, and the above sequence from step (d) to step (f) is repeated .

(h)当全部的镀敷处理完成后,基板保持器运送器140竖直地保持已将基板500从其移除的基板保持器110,基板保持器运送器140移动到货车式贮藏部150,并将基板保持器110竖直地存储到货车式贮藏部150中。(h) When the entire plating process is completed, the substrate holder transporter 140 vertically holds the substrate holder 110 from which the substrate 500 has been removed, the substrate holder transporter 140 moves to the truck storage section 150, And the substrate holder 110 is stored vertically in the cart type storage 150 .

在上述操作顺序中,在将基板500安置在基板保持器110中后,基板保持器运送器140将保持基板500的基板保持器110移动到镀敷部130的预洗涤槽130a。然而,在将基板500安置在基板保持器110后,基板保持器运送器140可以将基板保持器110运送到货车式贮藏部150,并可以暂时将基板保持器110放置在货车式贮藏部150上。In the above operation sequence, after the substrate 500 is set in the substrate holder 110 , the substrate holder transporter 140 moves the substrate holder 110 holding the substrate 500 to the pre-wash tank 130 a of the plating part 130 . However, after the substrate 500 is set on the substrate holder 110, the substrate holder transporter 140 may transport the substrate holder 110 to the truck storage part 150, and may temporarily place the substrate holder 110 on the truck storage part 150. .

以下将描述基板保持器110结构上的细节。图3是显示基板保持器110的结构的示意性视图;Structural details of the substrate holder 110 will be described below. FIG. 3 is a schematic view showing the structure of the substrate holder 110;

如图3所示,基板保持器110在它的一端具有操纵柄111。操纵柄111通过基板保持器运送器140被保持。操纵柄111的形式为可以绕自身轴线旋转的圆杆,该圆杆用于将基板保持器110的姿势从竖直状态转换为水平状态和从水平状态转换为竖直状态。As shown in FIG. 3 , the substrate holder 110 has a handle 111 at one end thereof. The handle 111 is held by the substrate holder transporter 140 . The handle 111 is in the form of a round rod rotatable around its own axis for switching the posture of the substrate holder 110 from a vertical state to a horizontal state and from a horizontal state to a vertical state.

操纵柄111希望是由耐腐蚀性的不锈钢制成,以使其自身能够抵抗可能施加到其上的镀敷溶液。在操纵柄111由不锈钢制成,但仍然因为与镀敷溶液接触而易受到腐蚀的情况下,操纵柄111的表面希望应当涂覆有铬镀敷层或碳化钛(TiC)层,用于增加耐腐蚀性。操纵柄111可以由具有高度抗腐蚀性的钛制成。在这种情况下,因为基板保持器运送器140的表面摩擦阻力的等级通常较高,需要将基板保持器运送器最后加工成能平稳地旋转滑动接触基板保持器运送器140的升降器142,该升降器142将稍后描述。The handle 111 is desirably made of corrosion resistant stainless steel so that it is itself resistant to plating solutions that may be applied thereto. In the case where the handle 111 is made of stainless steel but is still susceptible to corrosion due to contact with the plating solution, the surface of the handle 111 should desirably be coated with a chromium plating layer or a titanium carbide (TiC) layer for increasing corrosion resistance. The handle 111 may be made of titanium which is highly corrosion resistant. In this case, since the level of surface frictional resistance of the substrate holder carrier 140 is generally high, it is necessary to finish the substrate holder carrier so as to be able to smoothly rotate and slidingly contact the lifter 142 of the substrate holder carrier 140, The elevator 142 will be described later.

基板保持器110具有一对吊架112,每个吊架112分别位于基板保持器110的相对的上端上。每一个吊架112是长方体或立方体形式。吊架112被分别地放置在吊架接收器中,吊架120的作用是在基板保持器110被放置在镀敷部130的处理槽130a到130h中时吊起基板保持器110。吊架112中的一个具有电能馈送触点114。如果镀敷槽130d和130f是电镀敷槽,则在吊架112上的电能馈送触点114被保持与位于相应的吊架接收器上的电气触点接触,该电气触点用于将电流从外部电源供应到基板500的待镀敷表面。当基板保持器110被放置在吊架接收器上的吊架112吊起时,电能馈送触点114位于不与镀敷槽中的镀敷溶液接触的位置。当基板保持器110被存储在货车式贮藏部150中时,吊架112被支撑在货车式贮藏部150的吊架接收器152上,该吊架接收器152将稍后描述。The substrate holder 110 has a pair of hangers 112 each located on opposite upper ends of the substrate holder 110 . Each hanger 112 is in the form of a cuboid or a cube. Hangers 112 are respectively placed in the hanger receivers, and the hanger 120 functions to lift the substrate holder 110 when the substrate holder 110 is placed in the treatment tanks 130 a to 130 h of the plating part 130 . One of the hangers 112 has a power feed contact 114 . If the plating cells 130d and 130f are electroplating cells, the power feed contacts 114 on the hanger 112 are held in contact with electrical contacts located on the corresponding hanger receivers for transferring current from External power is supplied to the surface to be plated of the substrate 500 . When the substrate holder 110 is lifted by the hanger 112 placed on the hanger receiver, the power feeding contact 114 is located at a position not in contact with the plating solution in the plating bath. When the substrate holder 110 is stored in the truck storage 150 , the hanger 112 is supported on a hanger receiver 152 of the truck storage 150 , which will be described later.

每个吊架112的形式为长方体或立方体,每个吊架112被设计成当基板保持器110移动时防止基板保持器110摇晃,抵抗沿着图3中的箭头A表示的方向被施加到基板保持器运送器140上的力。当基板保持器110处于竖直状态并且它的下端113面向下时,吊架112使它们的上表面水平布置。Each hanger 112 is in the form of a cuboid or a cube, and each hanger 112 is designed to prevent the substrate holder 110 from shaking when the substrate holder 110 moves, resisting being applied to the substrate along the direction indicated by the arrow A in FIG. The force on the holder transporter 140. When the substrate holder 110 is in a vertical state and its lower end 113 faces downward, the hangers 112 have their upper surfaces arranged horizontally.

基板保持器110的下端113具有半圆形的横截面(参见图6A到6F),用于与台120的水平移动机构121平滑地旋转滑动接触,该水平移动机构121将稍后描述。The lower end 113 of the substrate holder 110 has a semicircular cross section (see FIGS. 6A to 6F ) for smooth rotational sliding contact with a horizontal movement mechanism 121 of the stage 120 which will be described later.

图4A是显示基板保持器110的结构的示意性视图。图4B是显示通过图4A显示的基板保持器运送器140保持基板保持器110的方式的示意性视图。图4C是沿着图4B的线Y-Y′的截面图。基板保持器运送器140包括结合在竖直支撑柱145中的上升下降机构,该上升下降机构没有显示。上升下降机构竖直地运行以抬升和降低基板保持器110。上升下降机构包括用于吊起基板保持器110的水平臂141。臂141具有作为保持部分的升降器142,用于通过从下方支撑操纵柄111来吊起和保持基板保持器110。为了从下方支撑操纵柄111,升降器或保持部分142具有用于与操纵柄111接合的一对半圆形指状元件142a。半圆形指状元件142具有略微大于操纵柄111的外侧直径的内侧直径。升降器142在半圆形指状元件142a之间具有空隙,并还包括传感器144,该传感器144作为基板保持器检测器,用于检测操纵柄111目前是否出现在空间中,并且用于检测到空间中的操纵柄111的距离。如果传感器或基板保持器检测器144检测到反常状态或没有检测到操纵柄111,即,基板保持器110,或检测到当到操纵柄111的距离偏离参考值,即,当基板保持器110偏移出相对于臂141的位置时,传感器144将反常状态显示给上升下降机构控制器,该上升下降机构控制器停止抬升和降低臂141,该上升下降机构控制器在图中未显示。传感器144还能够检测另一个反常状态,在该另一个反常状态中,当指状元件142a想要从下方支撑操纵柄111时,因为基板保持器110的位置偏移,升降器142的指状元件142a没有适当地支撑操纵柄111。FIG. 4A is a schematic view showing the structure of the substrate holder 110 . FIG. 4B is a schematic view showing the manner in which the substrate holder 110 is held by the substrate holder transporter 140 shown in FIG. 4A. FIG. 4C is a cross-sectional view along line Y-Y' of FIG. 4B. The substrate holder transporter 140 includes an ascending and descending mechanism, not shown, incorporated in the vertical support column 145 . The ascending and descending mechanism operates vertically to raise and lower the substrate holder 110 . The raising and lowering mechanism includes a horizontal arm 141 for lifting the substrate holder 110 . The arm 141 has a lifter 142 as a holding portion for lifting and holding the substrate holder 110 by supporting the handle 111 from below. In order to support the handle 111 from below, the lifter or holding portion 142 has a pair of semicircular finger members 142a for engaging with the handle 111 . Semicircular finger elements 142 have an inner diameter slightly larger than the outer diameter of handlebar 111 . The lifter 142 has a space between the semicircular finger elements 142a, and also includes a sensor 144, which acts as a substrate holder detector, for detecting whether the handle 111 is presently present in the space, and for detecting The distance of the handlebar 111 in space. If the sensor or substrate holder detector 144 detects an abnormal state or does not detect the handling handle 111, that is, the substrate holder 110, or detects when the distance to the handling handle 111 deviates from a reference value, that is, when the substrate holder 110 is deflected When moving out of position relative to the arm 141, the sensor 144 indicates an abnormal state to the raising and lowering mechanism controller, not shown, which stops raising and lowering the arm 141. The sensor 144 is also capable of detecting another abnormal state in which the fingers of the lifter 142 are displaced because the position of the substrate holder 110 is shifted when the fingers 142a want to support the handle 111 from below. 142a does not support handlebar 111 properly.

优选地,指状元件142a在它们保持为与操纵柄111接触的表面应当结合有例如PTFE等等的合成树脂层,或被TUFRAM处理过或被覆盖有PEEK的铝层,以减少表面的摩擦系数,使操纵柄111相对于指状元件142a平滑地转动。Preferably, the surfaces of the finger elements 142a which remain in contact with the handle 111 should be combined with a layer of synthetic resin such as PTFE or the like, or an aluminum layer treated with TUFRAM or covered with PEEK to reduce the coefficient of friction of the surface , so that the handle 111 is smoothly rotated relative to the finger member 142a.

基板保持器运送器140包括一对夹持器143,用于防止基板保持器110摇晃。当基板保持器运送器140水平地移动,夹持器143对基板保持器110的吊架112的上水平面施加向下的力,以防止基板保持器110在沿着基板保持器运送器140移动的方向上摇晃。为了更有效地防止基板保持器110摇晃,吊架112可以被设计成具有与夹持器143适配接合的形状。The substrate holder transporter 140 includes a pair of grippers 143 for preventing the substrate holder 110 from shaking. When the substrate holder transporter 140 moves horizontally, the gripper 143 exerts a downward force on the upper horizontal surface of the hanger 112 of the substrate holder 110 to prevent the substrate holder 110 from moving along the substrate holder transporter 140. Shake in direction. In order to prevent the substrate holder 110 from shaking more effectively, the hanger 112 may be designed to have a shape that fits and engages with the holder 143 .

在这个实施例中,夹持器143具有向下开放的C形,用于对基板保持器110的吊架112的上水平面施加向下的力,并支撑吊架112的相反的竖直表面,以防止基板保持器110摇晃。如果从夹持器143竖直地施加到吊架112的上水平面的力的程度能够被设置成大于使基板保持器110趋向于摇晃的力,则夹持器143不需要支撑吊架的相反的竖直表面。基本上,因为吊架112的上水平面不具有较大的面积,优选地,夹持器143应当支撑吊架112的相反的垂直表面。In this embodiment, the clamper 143 has a downwardly open C-shape for exerting a downward force on the upper horizontal surface of the hanger 112 of the substrate holder 110 and supporting the opposite vertical surface of the hanger 112, To prevent the substrate holder 110 from shaking. If the degree of force applied vertically from the gripper 143 to the upper horizontal plane of the hanger 112 can be set to be greater than the force that tends to shake the substrate holder 110, the gripper 143 need not support the opposite side of the hanger. vertical surface. Basically, since the upper horizontal surface of the hanger 112 does not have a large area, preferably the holder 143 should support the opposite vertical surface of the hanger 112 .

当基板保持器110被从竖直状态改变为水平状态,夹持器143被向上移动以释放基板保持器110。夹持器143通过被安装在臂141上的独立的致动器146,例如气缸、电动执行器等等被竖直地移动。在本实施例中,两个致动器146被用于移动夹持器143,夹持器143在基板保持器110的相反端上支撑吊架112支撑。然而,单个致动器146可以被安装在臂141上,并与基板保持器110的中心对准,附接件可以安装在致动器146的可动部件上,并被连接到两个夹持器146,该附接件没有显示。When the substrate holder 110 is changed from the vertical state to the horizontal state, the gripper 143 is moved upward to release the substrate holder 110 . The gripper 143 is moved vertically by an independent actuator 146 mounted on the arm 141, such as an air cylinder, an electric actuator, or the like. In this embodiment, two actuators 146 are used to move the gripper 143 that supports the hanger 112 on opposite ends of the substrate holder 110 . However, a single actuator 146 could be mounted on the arm 141 and aligned with the center of the substrate holder 110, and the attachment could be mounted on the movable part of the actuator 146 and connected to both clamps. 146, this attachment is not shown.

通过从水平状态转变为垂直状态,台120被用于在其上水平地放置基板保持器110。台120包括用于支撑基板保持器110的下端113的水平移动机构121(参见图5A到5F)。水平移动机构121能够随着引导物在沿着基板保持器运送器140的运送轴101的方向上滑动,例如线性运动(LM)引导来引导基板保持器110的下端113进行线性运动,引导物没有在图中显示。The stage 120 is used to horizontally place the substrate holder 110 thereon by transitioning from a horizontal state to a vertical state. The stage 120 includes a horizontal movement mechanism 121 for supporting the lower end 113 of the substrate holder 110 (see FIGS. 5A to 5F ). The horizontal movement mechanism 121 is capable of guiding the lower end 113 of the substrate holder 110 to perform linear motion along with the guide sliding in the direction along the transport axis 101 of the substrate holder transporter 140, such as a linear motion (LM) guide, without the guide shown in the figure.

在本实施例中,水平移动机构121受到由重物123经由线122施加的外力,水平移动机构121趋向于将水平移动机构121返回到初始位置,即,当基板保持器运送器140被朝着台120降低时,水平移动机构121总是与基板保持器110的下端113接触的位置。重物123可以用螺旋弹簧代替。优选地,水平移动机构121应当具有适合于与基板保持器110的下端113滑动接触的形状和材料。In this embodiment, the horizontal movement mechanism 121 is subjected to an external force applied by the weight 123 via the wire 122, and the horizontal movement mechanism 121 tends to return the horizontal movement mechanism 121 to the original position, that is, when the substrate holder transporter 140 is moved toward When the stage 120 is lowered, the horizontal movement mechanism 121 is always in a position of contacting the lower end 113 of the substrate holder 110 . The weight 123 can be replaced by a coil spring. Preferably, the horizontal moving mechanism 121 should have a shape and material suitable for sliding contact with the lower end 113 of the substrate holder 110 .

以下将参考图5A到5F,6A到6F,7A到7D描述用于将基板保持器110从竖直状态改变成水平状态和将基板保持器110水平地放置在台120上的操作顺序。An operation sequence for changing the substrate holder 110 from the vertical state to the horizontal state and placing the substrate holder 110 horizontally on the stage 120 will be described below with reference to FIGS. 5A to 5F , 6A to 6F, and 7A to 7D.

图5A到5F是示意性地显示为了将基板保持器110水平地放置在台120上,用于水平移动台120的水平移动机构121和基板保持器运送器140的上升下降机构的臂141的操作顺序的视图。图6A到6F是详细地显示图5A到5F的操作顺序中的基板保持器110和水平移动机构121的视图。图7A到7D是显示用于将基板保持器110放置在水平移动机构121上的基板保持器运送器140的操作顺序的视图。5A to 5F are schematic diagrams for placing the substrate holder 110 horizontally on the stage 120, the operation of the horizontal movement mechanism 121 for the horizontal movement stage 120 and the arm 141 of the ascending and descending mechanism of the substrate holder transporter 140. sequential view. 6A to 6F are views showing in detail the substrate holder 110 and the horizontal movement mechanism 121 in the operation sequence of FIGS. 5A to 5F . 7A to 7D are views showing the operation sequence of the substrate holder carrier 140 for placing the substrate holder 110 on the horizontal movement mechanism 121 .

随着臂141的升降器142将基板保持器110吊起并且夹持器143夹紧基板保持器110以抵抗摇晃,基板保持器运送器140移动到台120上方的位置。此时基板保持器110和水平移动机构121之间的空间关系显示在图7A和7B中。台120包括在支撑基板保持器110的下端113的同时能够水平移动的水平移动机构121。当基板保持器运送器140移动到台120上方的位置时,竖直地保持基板保持器110的臂141开始下降。图5A显示了基板保持器110的下端113被降低到略微高于水平移动机构121的位置的状态。此时基板保持器110和水平移动机构121之间的位置关系显示在图6A和7B中。The substrate holder transporter 140 moves to a position above the table 120 as the lifter 142 of the arm 141 lifts the substrate holder 110 and the clamper 143 clamps the substrate holder 110 against shaking. The spatial relationship between the substrate holder 110 and the horizontal movement mechanism 121 at this time is shown in FIGS. 7A and 7B . The stage 120 includes a horizontal movement mechanism 121 capable of horizontal movement while supporting the lower end 113 of the substrate holder 110 . When the substrate holder transporter 140 moves to a position above the stage 120, the arm 141 vertically holding the substrate holder 110 starts to descend. FIG. 5A shows a state where the lower end 113 of the substrate holder 110 is lowered to a position slightly higher than the horizontal moving mechanism 121 . The positional relationship between the substrate holder 110 and the horizontal movement mechanism 121 at this time is shown in FIGS. 6A and 7B .

然后,如图7C所示,夹持器143释放基板保持器110。如5B、6B和7D所示,臂141被降低,直到基板保持器110的下端113接触水平移动机构121。Then, as shown in FIG. 7C , the gripper 143 releases the substrate holder 110 . As shown in 5B, 6B and 7D, the arm 141 is lowered until the lower end 113 of the substrate holder 110 contacts the horizontal movement mechanism 121 .

在如图5A和5B所示的基板保持器110的向下运动期间,优选地,臂141应当被以高速降低,并且夹持器143支撑基板保持器110以抵抗摇晃运动,直到基板保持器110的下端113到达略微高于水平移动机构121的位置。然后,优选地,夹持器143释放基板保持器110并以低速度降低臂141,直到基板保持器110的下端113接触水平移动机构121。用这样的方式,基板保持器110在短时间段内被稳定地降低。During the downward movement of the substrate holder 110 as shown in FIGS. 5A and 5B , preferably the arm 141 should be lowered at high speed and the gripper 143 supports the substrate holder 110 against the rocking motion until the substrate holder 110 The lower end 113 of the lower end 113 reaches a position slightly higher than the horizontal movement mechanism 121. Then, preferably, the gripper 143 releases the substrate holder 110 and lowers the arm 141 at a low speed until the lower end 113 of the substrate holder 110 contacts the horizontal movement mechanism 121 . In this way, the substrate holder 110 is stably lowered in a short period of time.

当基板保持器110的下端113刚刚接触到水平移动机构121时,基板保持器110位于它的旋转圆周的底部死点并且不能平滑地旋转。因此,在基板保持器110的下端113接触到水平移动机构121后,如图5C所示,臂141被稍微降低并被稍微地朝向镀敷部130水平移动。因此,如图6C所示,基板保持器110现在倾斜并开始平滑旋转。When the lower end 113 of the substrate holder 110 just contacts the horizontal moving mechanism 121, the substrate holder 110 is at the bottom dead center of its rotation circle and cannot rotate smoothly. Therefore, after the lower end 113 of the substrate holder 110 contacts the horizontal movement mechanism 121 , the arm 141 is slightly lowered and moved horizontally toward the plating part 130 slightly as shown in FIG. 5C . Accordingly, the substrate holder 110 is now tilted and begins to rotate smoothly, as shown in FIG. 6C .

在基板保持器110被倾斜一定预定角度后,优选地大约为15°,臂141被降低以使得基板保持器110的下端113在基板保持器110的重量下推动水平移动机构121,如图6D所示。当基板保持器110的下端113被降低,臂141可以被略微地朝向基板自动运送器180移动。如图5D和5E所示,基板保持器110的下端113通过水平移动机构121被支撑,臂141的下降使基板保持器110被旋转并从竖直状态倾斜成水平状态。具体来说,如图6E所示,当臂141从图6D所示的位置降低,基板保持器110被倾斜成水平状态,同时在点A被支撑。After the substrate holder 110 is tilted by a predetermined angle, preferably approximately 15°, the arm 141 is lowered so that the lower end 113 of the substrate holder 110 pushes the horizontal movement mechanism 121 under the weight of the substrate holder 110, as shown in FIG. 6D Show. When the lower end 113 of the substrate holder 110 is lowered, the arm 141 may be moved slightly toward the substrate automated transporter 180 . As shown in FIGS. 5D and 5E , the lower end 113 of the substrate holder 110 is supported by the horizontal movement mechanism 121 , and the lowering of the arm 141 causes the substrate holder 110 to be rotated and tilted from a vertical state to a horizontal state. Specifically, as shown in FIG. 6E , when the arm 141 is lowered from the position shown in FIG. 6D , the substrate holder 110 is tilted into a horizontal state while being supported at point A.

当臂141被进一步降低时,基板保持器110水平布置,如图5F和6F所示,基板保持器运送器140的向下运动和水平移动机构121的水平运动完成。水平基板保持器110的全部重量由台120负担。臂141进一步被降低,然后朝镀敷部130退回,并此后被抬起。When the arm 141 is further lowered, the substrate holder 110 is arranged horizontally, as shown in FIGS. 5F and 6F , and the downward movement of the substrate holder transporter 140 and the horizontal movement of the horizontal moving mechanism 121 are completed. The entire weight of the horizontal substrate holder 110 is borne by the table 120 . The arm 141 is further lowered, then retracted toward the plating part 130, and thereafter raised.

如上所述,基板保持器110从竖直姿势转换为水平姿势,而不需要具有用于旋转基板保持器110的大扭矩的大尺寸旋转机构。根据本发明,重要的是优化以下设计:基板保持器运送器140初始移动以使基板保持器110倾斜的距离、臂141降低的速度、被施加以使得水平移动机构121回到初始位置的力、操纵柄111和升降器142的指状元件142a之间的滑动阻力、基板保持器110的下端113和水平移动机构121之间的滑动阻力、基板保持器110的下端113和水平移动机构121的形状。As described above, the substrate holder 110 is converted from the vertical posture to the horizontal posture without requiring a large-sized rotating mechanism having a large torque for rotating the substrate holder 110 . According to the present invention, it is important to optimize the design of: the distance the substrate holder transporter 140 initially moves to tilt the substrate holder 110, the speed at which the arm 141 is reduced, the force applied to bring the horizontal movement mechanism 121 back to the initial position, Sliding resistance between handle 111 and finger member 142a of lifter 142, sliding resistance between lower end 113 of substrate holder 110 and horizontal movement mechanism 121, shape of lower end 113 of substrate holder 110 and horizontal movement mechanism 121 .

根据本发明,基板保持器110的姿势随着水平移动机构121的水平运动被转换。根据另一个姿势转换方案,如图8A到8C所述,基板保持器110的下端113可以被保持为与台120的左端接触,臂141可以被弧形地移动,以使基板保持器110变为水平姿势。然而,如图1所示,当基板自动运送器180将基板500运送到基板保持器110或从基板保持器110接收基板500时基板保持器开启和闭合机构102能够使基板保持器110释放基板500,基板保持器开启和闭合机构102被设置在台120的上方,基板保持器运送器140和基板保持器开启和闭合机构102易于相互干扰。According to the present invention, the posture of the substrate holder 110 is converted along with the horizontal movement of the horizontal movement mechanism 121 . According to another posture conversion scheme, as described in FIGS. 8A to 8C , the lower end 113 of the substrate holder 110 can be held in contact with the left end of the stage 120, and the arm 141 can be moved in an arc so that the substrate holder 110 becomes horizontal posture. However, as shown in FIG. 1 , the substrate holder opening and closing mechanism 102 enables the substrate holder 110 to release the substrate 500 when the substrate automatic handler 180 transports the substrate 500 to or receives the substrate 500 from the substrate holder 110 . , the substrate holder opening and closing mechanism 102 is disposed above the stage 120, and the substrate holder transporter 140 and the substrate holder opening and closing mechanism 102 tend to interfere with each other.

根据另一个姿势转换方案,如图9A到9C所述,基板保持器110的下端113可以被保持为与台120的右端接触,臂141可以使基板保持器110朝向镀敷部130倾斜,直至基板保持器110水平,并最终臂141将基板保持器110移动到台120上。然而,如图9B所示,因为基板保持器运送器140从台120朝向镀敷部130突出较大的距离,有可能干扰镀敷部130的处理操作。According to another posture conversion scheme, as described in FIGS. 9A to 9C , the lower end 113 of the substrate holder 110 can be kept in contact with the right end of the stage 120, and the arm 141 can tilt the substrate holder 110 toward the plating part 130 until the substrate The holder 110 is horizontal, and finally the arm 141 moves the substrate holder 110 onto the stage 120 . However, as shown in FIG. 9B , since the substrate holder carrier 140 protrudes from the stage 120 toward the plating section 130 by a large distance, there is a possibility of interfering with the processing operation of the plating section 130 .

根据本发明改变基板保持器110的姿势的过程,不同于以上其它的姿势变换方案,基板保持器运送器140转换基板保持器110的姿势时,基板保持器运送器140没有干扰基板保持器开启和闭合机构102和镀敷部130中的处理操作。因此,不用考虑基板保持器运送器140与基板保持器开启和闭合机构102和镀敷部130之间的距离。根据本发明的基板保持器110的姿势改变的过程对于节省镀敷设备的空间非常有效。According to the process of changing the posture of the substrate holder 110 according to the present invention, unlike the above other posture changing schemes, when the substrate holder transporter 140 changes the posture of the substrate holder 110, the substrate holder transporter 140 does not interfere with the opening and closing of the substrate holder. Processing operations in the closing mechanism 102 and the plating section 130 . Therefore, the distance between the substrate holder carrier 140 and the substrate holder opening and closing mechanism 102 and the plating section 130 is not considered. The process of changing the posture of the substrate holder 110 according to the present invention is very effective for saving the space of the plating equipment.

水平移动机构121可以包括用于通过其自身而不需要基板保持器110的重量就可水平移动的机构。然而,为了转换基板保持器110的姿势,这种机构需要它自己的电源并且必须与臂141配合工作,结果导致了复杂的控制过程。相应地,希望使得水平移动机构121能够滑动,并且也希望控制一个机构以使水平移动机构121在重物123或螺旋弹簧施加的外力下水平移动,使得水平移动机构121返回到其初始位置。The horizontal movement mechanism 121 may include a mechanism for horizontal movement by itself without the weight of the substrate holder 110 . However, such a mechanism requires its own power source and must cooperate with the arm 141 in order to switch the posture of the substrate holder 110, resulting in a complicated control process. Accordingly, it is desirable to enable the horizontal movement mechanism 121 to slide, and it is also desirable to control a mechanism to move the horizontal movement mechanism 121 horizontally under the external force exerted by the weight 123 or the coil spring so that the horizontal movement mechanism 121 returns to its original position.

随着基板保持器110从竖直状态改变成水平状态,在本实施例中,操纵柄111和升降器142的指状元件142、基板保持器110的下端113和水平移动机构121彼此滑动抵靠。如果不需要它们彼此相互滑动抵靠,则操纵柄111的相反端可以通过轴承支撑,辊可以被安装在基板保持器110的下端113。然而,因为基板保持器110被浸没在镀敷溶液中,轴承和辊被设置在镀敷溶液中或靠近镀敷溶液的表面。可能不想要轴承和辊被镀敷溶液影响。因此,为了避免部件的滑动移动,辊可以被安装在升降器142的指状元件142a或水平移动机构121上,以使操纵柄111或基板保持器110的下端113可旋转。As the substrate holder 110 changes from a vertical state to a horizontal state, in this embodiment, the handle 111 and the fingers 142 of the lifter 142, the lower end 113 of the substrate holder 110 and the horizontal movement mechanism 121 slide against each other . The opposite ends of the handle 111 may be supported by bearings and the rollers may be mounted at the lower end 113 of the substrate holder 110 if they are not required to slide against each other. However, because the substrate holder 110 is immersed in the plating solution, the bearings and rollers are disposed in the plating solution or near the surface of the plating solution. It may not be desirable for the bearings and rollers to be affected by the plating solution. Therefore, in order to avoid sliding movement of the components, rollers may be mounted on the fingers 142a of the lifter 142 or the horizontal movement mechanism 121 so that the handle 111 or the lower end 113 of the substrate holder 110 is rotatable.

处理过的基板500被从放置在台120上的基板保持器110移去或下一个待处理的基板500被基板保持器110保持后,基板保持器110将它的姿势从水平状态改变为竖直状态。为了这种姿势转换,升降器142的指状元件142a进入操纵柄111的下方,并与操纵柄111接合,随着臂141上升,升降器142将基板保持器110吊起。水平移动机构121没有与基板保持器110的下端113脱离接合,并回到它的初始位置,使得基板保持器110变成竖直姿势。臂141被进一步升起,当臂141被升起时,夹持器143如上所述地工作,防止基板保持器110摇晃。After the processed substrate 500 is removed from the substrate holder 110 placed on the stage 120 or the next substrate 500 to be processed is held by the substrate holder 110, the substrate holder 110 changes its posture from a horizontal state to a vertical state. state. For this posture transition, the finger member 142a of the lifter 142 enters under the handle 111 and engages with the handle 111, and the lifter 142 lifts the substrate holder 110 as the arm 141 rises. The horizontal movement mechanism 121 is not disengaged from the lower end 113 of the substrate holder 110, and returns to its original position, so that the substrate holder 110 becomes a vertical posture. The arm 141 is further raised, and when the arm 141 is raised, the clamper 143 operates as described above, preventing the substrate holder 110 from shaking.

在本实施例中,为了将基板保持器110的姿势在竖直姿势和水平姿势之间转换,只要求动力水平地移动水平移动机构121并且抬升和降低臂141。用于产生水平和竖直移动的基板保持器运送器140的机构被要求将基板保持器110移动到处理槽并将基板500浸没在处理槽中的处理溶液中。因此,不需要专用的动力来改变基板保持器110的姿势。In the present embodiment, in order to switch the posture of the substrate holder 110 between the vertical posture and the horizontal posture, power is only required to move the horizontal movement mechanism 121 horizontally and raise and lower the arm 141 . The mechanism of the substrate holder transporter 140 for generating horizontal and vertical movement is required to move the substrate holder 110 to the processing tank and immerse the substrate 500 in the processing solution in the processing tank. Therefore, no dedicated power is required to change the posture of the substrate holder 110 .

本发明适用于很多使用基板保持器来保持基板、运输基板保持器和镀敷基板的设备。在本实施例中,通过实例来说明本发明的原则如何被用于镀敷设备。然而,发明的原则也合适酸洗设备和无镀敷敷设备等等。本发明的原则不但适用于将基板保持器完全浸没在处理槽中的处理设备,也适用于包括这样的处理槽的处理设备:开口被限定在该处理槽的竖直侧壁上并水平地靠近被基板保持器保持的基板。在本实施例中,镀敷设备包括单个基板保持器运送器,该基板保持器运送器通常被用来改变基板保持器的姿势并且将基板保持器运送到包括镀敷槽的处理槽。然而,本发明的原则适用于包括多个基板保持器运送器的镀敷设备,例如,多个基板保持器运送器中的一个用于改变基板保持器的姿势,另一个例如用于将基板保持器运送到镀敷部130。The present invention is applicable to many devices that use substrate holders to hold substrates, transport substrate holders, and plate substrates. In this example, an example is given to illustrate how the principles of the invention can be applied to plating equipment. However, the principles of the invention are also applicable to pickling plants and non-plating plants and the like. The principles of the present invention are applicable not only to processing equipment in which the substrate holder is fully submerged in a processing tank, but also to processing equipment comprising a processing tank in which openings are defined in the vertical side walls of the tank and are horizontally adjacent to the A substrate held by a substrate holder. In the present embodiment, the plating apparatus includes a single substrate holder transporter, which is generally used to change the posture of the substrate holder and transport the substrate holder to a processing bath including a plating bath. However, the principles of the present invention are applicable to a plating apparatus comprising a plurality of substrate holder transporters, for example, one of the plurality of substrate holder transporters is used to change the posture of the substrate The device is transported to the plating section 130.

根据本发明,如上所述,因为基板保持器能够稳定地旋转而不再需要大尺寸的旋转机构,该镀敷设备节省了空间并降低制造成本。特别地,因为被用来将基板保持器运送到镀敷槽的基板保持器运送器又被用来旋转基板保持器,不需要单独的用于旋转基板保持器的动力机构,该镀敷设备的制造成本能够被极大地降低。According to the present invention, as described above, since the substrate holder can be rotated stably without requiring a large-sized rotating mechanism, the plating apparatus saves space and reduces manufacturing costs. In particular, since the substrate holder transporter used to transport the substrate holder to the plating bath is used to rotate the substrate holder, a separate power mechanism for rotating the substrate holder is not required, and the plating apparatus Manufacturing costs can be greatly reduced.

以下将描述基板保持器打开和闭合机构102的操作顺序。基板保持器打开和闭合机构102的作用是安装和移动基板保持器110的罩,即,以下将描述的可动支撑构件11,为了将基板500安装到水平地放置在台120上的基板保持器110,并从该基板保持器110移除。The operation sequence of the substrate holder opening and closing mechanism 102 will be described below. The role of the substrate holder opening and closing mechanism 102 is to mount and move the cover of the substrate holder 110, that is, the movable support member 11 to be described below, in order to mount the substrate 500 to the substrate holder placed horizontally on the stage 120 110, and removed from the substrate holder 110.

图10是显示基板保持器110的结构的平面图,在该基板保持器110中,可动支撑构件11被安装在固定支撑构件15上,同时突出部(lobe)13被分别保持为与夹持器16适配接合。图11A是显示基板保持器110的固定支撑构件15的平面图。图11B说显示基板保持器110的可动支撑构件11固定平面图。图12是基板保持器110的固定支撑构件15和可动支撑构件11的一部分的放大截面图。10 is a plan view showing the structure of a substrate holder 110 in which a movable support member 11 is mounted on a fixed support member 15 while protrusions (lobes) 13 are respectively held in contact with the holder. 16 fitting engagement. FIG. 11A is a plan view showing the fixed support member 15 of the substrate holder 110 . FIG. 11B illustrates a fixed plan view showing the movable support member 11 of the substrate holder 110 . 12 is an enlarged cross-sectional view of a part of the fixed support member 15 and the movable support member 11 of the substrate holder 110 .

如图10到12所示,基板保持器110具有作为罩的可动支撑构件11和被放置在台120上的固定支撑构件15。基板500被夹紧在可动支撑构件11和固定支撑构件15之间。可动支撑构件11形成为大致圆环状并具有支撑构件12和多个突出部13,多个突出部13与支撑构件12一体形成且从支撑构件12向外突出。可动支撑构件11能够被固定到固定支撑构件15并且能够从可动支撑构件11移除。如图10所示,可动支撑构件11被固定到固定支撑构件15的上表面上。固定支撑构件15具有多个夹持器16,该多个夹持器16的位置分别与突出部13对应。夹持器16具有倒转的L形状,并具有向内弯曲的顶端。当突出部13被适配进夹持器16的向内弯曲的顶端时,夹持器16将可动支撑构件11紧固到固定支撑构件15。优选地,突出部13和夹持器16应当具有用于使突出部13和夹持器16能够方便地相互适配的锥形表面。As shown in FIGS. 10 to 12 , the substrate holder 110 has a movable support member 11 as a cover and a fixed support member 15 placed on a table 120 . The substrate 500 is clamped between the movable support member 11 and the fixed support member 15 . The movable supporting member 11 is formed in a substantially annular shape and has a supporting member 12 and a plurality of protrusions 13 integrally formed with the supporting member 12 and protruding outward from the supporting member 12 . The movable support member 11 can be fixed to the fixed support member 15 and can be removed from the movable support member 11 . As shown in FIG. 10 , the movable support member 11 is fixed to the upper surface of the fixed support member 15 . The fixed support member 15 has a plurality of clampers 16 whose positions correspond to the protrusions 13, respectively. The holder 16 has an inverted L shape with an inwardly bent top end. The clamp 16 secures the movable support member 11 to the fixed support member 15 when the protrusion 13 is fitted into the inwardly bent top end of the clamp 16 . Preferably, the protrusion 13 and the holder 16 should have tapered surfaces for enabling the protrusion 13 and the holder 16 to fit each other easily.

支撑构件12能够相对于可动支撑构件11旋转,并被分离防止构件(dislodgmentpreventionmember)12b不可分地保持,支撑构件12和突出部13可一起围绕可动支撑构件11的中心R在大致水平的平面上可旋转。支撑构件12形成为例如大致圆环状。支撑构件12具有设置在支撑构件12的圆周表面上并朝向基板保持器打开和闭合机构的头部分1100突出的突起12a,该突起12a将稍后描述。支撑构件12通过分离防止构件12b被防止从可动支撑构件11中分离。The supporting member 12 is rotatable relative to the movable supporting member 11 and is inseparably held by a dislodgment prevention member 12b, and the supporting member 12 and the protrusion 13 can be together around the center R of the movable supporting member 11 on a substantially horizontal plane. Can be rotated. The supporting member 12 is formed, for example, in a substantially annular shape. The supporting member 12 has a protrusion 12a provided on the circumferential surface of the supporting member 12 and protruding toward the head portion 1100 of the substrate holder opening and closing mechanism, which will be described later. The supporting member 12 is prevented from being separated from the movable supporting member 11 by the separation preventing member 12b.

基板500被夹持在可动支撑构件11和固定支撑构件15之间,当支撑构件12被旋转以使突出部13与夹持器16适配接合时,可动支撑构件11和固定支撑构件15被紧固在一起。为了安装和移除基板500,支撑构件12被旋转以使突出部13从与夹持器16的适配接合中脱离。基板500被放置在固定支撑构件15的基板放置区域14中。The substrate 500 is clamped between the movable support member 11 and the fixed support member 15, which when the support member 12 is rotated so that the protrusion 13 fits into engagement with the holder 16, the movable support member 11 and the fixed support member 15 are fastened together. To install and remove substrate 500 , support member 12 is rotated to disengage protrusion 13 from mating engagement with holder 16 . The substrate 500 is placed in the substrate placement area 14 of the fixed support member 15 .

可动支撑构件11具有第一密封环18a和第二密封环18b,用于密封基板500的不需要被镀敷的部分,例如基板500边缘和反面,从而不与镀敷溶液接触。第一密封环18a被保持与基板500的外周边缘接触,第二密封环18b被保持与固定支撑构件15的表面接触。基板保持器110被用在镀敷设备中。因此,基板保持器110具有电触点20,该电触点20用于接触通过被第一密封环18a密封的基板500的边缘区域并将电力提供到基板500。电触点20被电气连接到外部电源,且基板500被夹持在可动支撑构件11和固定支撑构件15之间。第一密封环18a和第二密封环18b由密封环保持19保持。为了简明而要,第一密封环18a和第二密封环18b可以被笼统地认为是密封环18。The movable supporting member 11 has a first sealing ring 18a and a second sealing ring 18b for sealing portions of the substrate 500 not to be plated, such as the edge and the reverse side of the substrate 500, from being in contact with the plating solution. The first seal ring 18 a is held in contact with the outer peripheral edge of the substrate 500 , and the second seal ring 18 b is held in contact with the surface of the fixed support member 15 . The substrate holder 110 is used in a plating apparatus. Accordingly, the substrate holder 110 has electrical contacts 20 for contacting and supplying electrical power to the substrate 500 through the edge region of the substrate 500 sealed by the first sealing ring 18 a. The electrical contacts 20 are electrically connected to an external power source, and the substrate 500 is sandwiched between the movable support member 11 and the fixed support member 15 . The first seal ring 18 a and the second seal ring 18 b are held by a seal ring holder 19 . For simplicity, the first seal ring 18 a and the second seal ring 18 b may be collectively referred to as the seal ring 18 .

为了将基板500从基板保持器110移去,可动支撑构件11被移动远离固定支撑构件13。此时,第一密封环18a可以和基板500紧固在一起,基板500可能被附着到可动支撑构件11并同可动支撑构件11一起升起。为了防止基板500被附着到可动支撑构件11,优选地,可动支撑构件11具有剥落弹簧,用于当基板500被移动远离第一密封环18a时将基板500朝向固定支撑构件15偏置,并将基板500从第一密封环18a剥落。剥落弹簧被专利号为No4162440的日本专利公开。In order to remove the substrate 500 from the substrate holder 110 , the movable support member 11 is moved away from the fixed support member 13 . At this time, the first sealing ring 18 a may be fastened together with the base plate 500 , and the base plate 500 may be attached to the movable support member 11 and lifted together with the movable support member 11 . In order to prevent the substrate 500 from being attached to the movable support member 11, preferably the movable support member 11 has a peeling spring for biasing the substrate 500 towards the fixed support member 15 when the substrate 500 is moved away from the first sealing ring 18a, And the substrate 500 is peeled off from the first seal ring 18a. The peeling spring is disclosed by Japanese Patent No. 4162440.

然而,即使可动支撑构件11具有弹簧构件,根据被施加到基板500的保护层的性质和特性,例如材料和厚度,因为在可动支撑构件11被移除时密封环18a和基板500被紧固在一起,基板500可以从基板放置区域14被位置偏移。特别地,基板500的边缘的一部分可以被紧固到第一密封环18a,基板500可以被倾斜地升起并落入固定支撑构件15的未对齐位置。However, even if the movable support member 11 has a spring member, depending on the properties and characteristics of the protective layer applied to the substrate 500, such as material and thickness, since the seal ring 18a and the substrate 500 are tightly pressed when the movable support member 11 is removed, Together, the substrate 500 may be positionally offset from the substrate placement area 14 . In particular, a portion of the edge of the substrate 500 may be fastened to the first sealing ring 18 a, and the substrate 500 may be lifted obliquely and dropped into a misaligned position of the fixed support member 15 .

如后所描述,当基板保持器打开和闭合机构102的传感器1140检测到基板500的位置未对齐时,通过阻止镀敷设备继续对偏移的基板500的操作来解决了这个问题。As described later, this problem is solved by preventing the plating apparatus from continuing to operate on the shifted substrate 500 when the sensor 1140 of the substrate holder opening and closing mechanism 102 detects that the position of the substrate 500 is out of alignment.

图13是显示基板保持器打开和闭合机构102的结构的示意性视图。如图13所示,基板保持器打开和闭合机构102包括头部分1100、第一致动器1200和第二致动器1300。FIG. 13 is a schematic view showing the structure of the substrate holder opening and closing mechanism 102 . As shown in FIG. 13 , the substrate holder opening and closing mechanism 102 includes a head portion 1100 , a first actuator 1200 and a second actuator 1300 .

被放置在台120上方的头部分1100能够保持被放置在台120上的基板保持器110的可动支撑构件11。头部分1100能够旋转可动支撑构件11的支撑构件12以旋转突出部13,用于将可动支撑构件11紧固到固定支撑构件15或从固定支撑构件15释放可动支撑构件11,并保持可动支撑构件11,。The head portion 1100 placed above the stage 120 can hold the movable support member 11 of the substrate holder 110 placed on the stage 120 . The head portion 1100 is capable of rotating the support member 12 of the movable support member 11 to rotate the protrusion 13 for fastening the movable support member 11 to the fixed support member 15 or releasing the movable support member 11 from the fixed support member 15, and holding Movable support member 11'.

第一致动器1200通过头部分1100的连接凸起1170被连接到头部分1100。当操作时,第一致动器1200竖直地移动头部分1100。在本实施例中,第一致动器1200具有致动器单元1210和轴1220,该轴1220具有连接到头部分1100的端部。随着轴1220被延伸和缩短,第一致动器1200竖直地移动头部分1100。The first actuator 1200 is connected to the head part 1100 through the connection protrusion 1170 of the head part 1100 . When in operation, the first actuator 1200 moves the head portion 1100 vertically. In the present embodiment, the first actuator 1200 has an actuator unit 1210 and a shaft 1220 having an end connected to the head portion 1100 . The first actuator 1200 moves the head portion 1100 vertically as the shaft 1220 is extended and shortened.

第二致动器1300具有单轴移动的致动器单元1310和固定到致动器单元1310的移动板1320的轴钩1330。通过用于使轴1130在被推动时能够滑动的辊轴1350,两个辊1340在该两个辊1340之间相互间隔的位置上被旋转地安装到轴钩1330。当第二致动器1300被运作时,轴钩1330被水平地往复移动,以推动从头部分1100延伸的轴1130,以旋转头部分1100的旋转板1150。第二致动器1300可以包含球形螺钉。The second actuator 1300 has an actuator unit 1310 that uniaxially moves and a shaft hook 1330 fixed to a moving plate 1320 of the actuator unit 1310 . The two rollers 1340 are rotatably mounted to the shaft hook 1330 at positions spaced from each other between the two rollers 1340 through a roller shaft 1350 for enabling the shaft 1130 to slide while being pushed. When the second actuator 1300 is operated, the shaft hook 1330 is horizontally reciprocated to push the shaft 1130 extending from the head part 1100 to rotate the rotation plate 1150 of the head part 1100 . The second actuator 1300 may comprise a ball screw.

图14A和14B显示头部分1100的结构上的详情。如图14A和14B,头部分1100包括按压片1110和被安装在按压片1100的旋转板1150。按压片1110包括吊钩1111、旋转板引导1112、引导辊1113和按压块1114。传感器1140被沿着它的外周以一定间隔被稳固地支撑在按压片1110上。14A and 14B show structural details of the header portion 1100 . 14A and 14B , the head part 1100 includes a pressing piece 1110 and a rotating plate 1150 installed on the pressing piece 1100 . The pressing piece 1110 includes a hook 1111 , a rotating plate guide 1112 , a guide roller 1113 and a pressing block 1114 . The sensor 1140 is firmly supported on the pressing piece 1110 at intervals along its periphery.

旋转板1150具有紧固钩1151并被连接到轴1130的端部。旋转板1150为大致的圆环状并被按压片圆盘1110上的旋转板引导1112夹持。旋转板1150能够围绕其中心轴线在大致水平平面中旋转并与引导辊1113接合。The rotating plate 1150 has a fastening hook 1151 and is connected to an end of the shaft 1130 . The rotating plate 1150 has a substantially circular shape and is sandwiched by the rotating plate guide 1112 on the pressing disc 1110 . The rotating plate 1150 is rotatable about its central axis in a substantially horizontal plane and engages with the guide roller 1113 .

轴1130例如包括杆。当第二致动器1300运转以水平地移动轴钩1330时,轴1130也被水平地移动,旋转板1150被旋转。具体地,旋转板1150的旋转能够通过控制第二致动器1300的运转来控制。用于检测轴1130的位置的传感器1131被安装到按压片1110上。The shaft 1130 includes, for example, a rod. When the second actuator 1300 operates to horizontally move the shaft hook 1330, the shaft 1130 is also horizontally moved, and the rotation plate 1150 is rotated. Specifically, the rotation of the rotating plate 1150 can be controlled by controlling the operation of the second actuator 1300 . A sensor 1131 for detecting the position of the shaft 1130 is attached to the pressing piece 1110 .

当旋转板1150围绕其中心轴线旋转时,旋转板1150旋转支撑构件12和突出部13。在本实施例中,两个紧固钩1151在各自的两个周向位置从旋转板1150向下延伸。当旋转板1150通过第二致动器1300被旋转时,紧固钩1151中一个推动支撑构件12的突起12a,旋转支撑构件12。When the rotating plate 1150 is rotated about its central axis, the rotating plate 1150 rotates the supporting member 12 and the protrusion 13 . In this embodiment, two fastening hooks 1151 extend downward from the rotating plate 1150 at respective two circumferential positions. When the rotating plate 1150 is rotated by the second actuator 1300 , one of the fastening hooks 1151 pushes the protrusion 12 a of the supporting member 12 , rotating the supporting member 12 .

按压块1114被安装在按压片1110的底面上。当第一致动器1120降低头部分1100时,例如,按压块1114在图12中的点P与可动支撑构件11接触,向下按压可动支撑构件11。当可动支撑构件11被这样按压时,密封环18变形,且变形距离为可动支撑构件11被向下按压的距离。随着可动支撑构件11被下降,在突出部13和夹持器16之间产生了空隙。因此,施加以旋转支撑构件12的力,即,通过第二致动器1300产生的驱动力可以较小,以使得夹持器16和突出部13上的磨损最小化。The pressing block 1114 is installed on the bottom surface of the pressing piece 1110 . When the first actuator 1120 lowers the head portion 1100 , for example, the pressing block 1114 comes into contact with the movable support member 11 at point P in FIG. 12 , pressing the movable support member 11 downward. When the movable support member 11 is pressed in this way, the seal ring 18 is deformed by a distance by which the movable support member 11 is pressed down. As the movable support member 11 is lowered, a gap is created between the protrusion 13 and the gripper 16 . Accordingly, the force applied to rotate the support member 12 , ie, the driving force generated by the second actuator 1300 may be small to minimize wear on the holder 16 and the protrusion 13 .

按压块1114向下按压可动支撑构件11的距离通过头部分1100被下降到的位置确定。如果基板保持器110具有不同的厚度,则密封环18被变形或被压缩的距离会不同。具体地,如果基板保持器110比正常厚度薄,则因为密封环18没有被充分地压缩,支撑构件12在旋转时易于被更多地磨损。如果基板保持器110比正常厚度厚,则密封环18被过度地压缩和破坏,相反地,密封环18的密封能力就会被影响。The distance by which the pressing block 1114 presses the movable supporting member 11 downward is determined by the position to which the head portion 1100 is lowered. If the substrate holders 110 have different thicknesses, the distance by which the seal ring 18 is deformed or compressed will be different. Specifically, if the substrate holder 110 is thinner than a normal thickness, the support member 12 tends to be worn more while rotating because the seal ring 18 is not sufficiently compressed. If the substrate holder 110 is thicker than normal, the seal ring 18 is excessively compressed and broken, and conversely, the sealing ability of the seal ring 18 is affected.

如图15所示,上述问题能够通过使用具有弹性构件30的活塞解决,该弹性构件30例如为如每个按压块1114一样被设置在活塞内部的弹簧。活塞还容纳保持抵靠弹性构件30并且突出活塞之外的销31。具有弹力的弹性构件30被预先压缩一定程度并被容纳在活塞中,以便弹性构件30常态地偏置销31,以使销31从活塞中伸出并与基板保持器110接触。按压块1114因此被构造成能够减小密封环18因为各个基板保持器110的几何特性导致的距离上的差别。因此,可以容许基板保持器110具有厚度差别,稳定地减小产生在基板保持器110被打开和关闭时在元件之间的摩擦力,并且稳定了密封环18的密封能力。As shown in FIG. 15 , the above-mentioned problem can be solved by using a piston having an elastic member 30 such as a spring provided inside the piston like each pressing piece 1114 . The piston also houses a pin 31 held against the elastic member 30 and protruding out of the piston. The elastic member 30 having elastic force is pre-compressed to some extent and accommodated in the piston so that the elastic member 30 normally biases the pin 31 so that the pin 31 protrudes from the piston and comes into contact with the substrate holder 110 . The pressing blocks 1114 are thus configured to reduce differences in the distance of the sealing ring 18 due to the geometrical properties of the individual substrate holders 110 . Therefore, it is possible to allow the substrate holder 110 to have a difference in thickness, stably reduce the frictional force generated between elements when the substrate holder 110 is opened and closed, and stabilize the sealing ability of the seal ring 18 .

按压片1110在其外边缘具有多个吊钩1111。当可动支撑构件11的突出部13被旋转到多个吊钩1111的各个吊挂件的正上方的位置时,头部分1100被升起。可动支撑构件11的突出部13现在通过吊钩1111被吊挂,以使可动支撑构件11随着头部分1100同步上升。此时,在可动支撑构件11和固定支撑构件15之间产生空隙,允许基板500被放置在固定支撑构件15上或被从固定支撑构件15上移除。The pressing piece 1110 has a plurality of hooks 1111 on its outer edge. When the protrusion 13 of the movable supporting member 11 is rotated to a position directly above each hanger of the plurality of hooks 1111, the head portion 1100 is lifted. The protrusion 13 of the movable support member 11 is now suspended by the hook 1111 so that the movable support member 11 rises synchronously with the head part 1100 . At this time, a gap is generated between the movable support member 11 and the fixed support member 15 , allowing the substrate 500 to be placed on or removed from the fixed support member 15 .

如上所述,可动支撑构件11的支撑构件12被旋转以将可动支撑构件11紧固到固定支撑构件15,可动支撑构件11通过分离致动器被抬升和下降,每个步骤通过头部分1100在单个动作中运行。因此,在此不需要传统镀敷设备所需要的复杂的往复和旋转机构,镀敷设备的尺寸较小并且结构简单,制造成本低。包括通过铰链被彼此连接的移动支撑构件11和固定支撑构件15的传统的基板保持器,其需要用于抬升可动支撑构件11到低于台的位置的机构。根据本发明的基板保持器110不需要专门的致动器用于打开和关闭基板保持器110。As mentioned above, the support member 12 of the movable support member 11 is rotated to fasten the movable support member 11 to the fixed support member 15, and the movable support member 11 is raised and lowered by the separation actuator, each step by the head Portion 1100 operates in a single action. Therefore, there is no need for complex reciprocating and rotating mechanisms required by conventional plating equipment, and the plating equipment is small in size, simple in structure, and low in manufacturing cost. A conventional substrate holder comprising a movable support member 11 and a fixed support member 15 connected to each other by a hinge requires a mechanism for lifting the movable support member 11 to a position below the table. The substrate holder 110 according to the present invention does not require a dedicated actuator for opening and closing the substrate holder 110 .

传感器1140被安装在按压片110的外周边缘,传感器1140作为用于检测被放置在台120上的基板保持器110中的基板500的位置的位置检测器。以下将参考图16A和16B描述检测基板500的位置的过程。A sensor 1140 serving as a position detector for detecting the position of the substrate 500 placed in the substrate holder 110 on the stage 120 is mounted on the outer peripheral edge of the pressing sheet 110 . The process of detecting the position of the substrate 500 will be described below with reference to FIGS. 16A and 16B .

如图16A和16B,基板保持器打开和关闭机构102的每个传感器1140被放置在基板保持器110的上方。传感器1140可以是例如激光传感器,但并不局限于此。基板保持器打开和关闭机构102的至少一个传感器1140能够精确地检测基板500的位置不对齐。基板保持器110的固定支撑构件15具有被限定在固定支撑构件15的外周边缘的凹部17,凹部17与传感器1140施加激光束的位置对齐。例如,如图17所示,基板保持器打开和关闭机构102具有三个传感器1140,固定支撑构件15在基板安置区域14的外周边缘具有三个凹部17。优选地,每个凹部17具有倾斜的底面,该底面与来自传感器1140的激光束的轴线基本垂直,并允许镀敷溶液流出凹部17,以便在传感器1140和凹部17的倾斜底面之间保持有恒定距离。Each sensor 1140 of the substrate holder opening and closing mechanism 102 is placed above the substrate holder 110 as shown in FIGS. 16A and 16B . The sensor 1140 may be, for example, a laser sensor, but is not limited thereto. At least one sensor 1140 of the substrate holder opening and closing mechanism 102 is capable of accurately detecting positional misalignment of the substrate 500 . The fixed support member 15 of the substrate holder 110 has a concave portion 17 defined in an outer peripheral edge of the fixed support member 15 , and the concave portion 17 is aligned with a position where the sensor 1140 applies the laser beam. For example, as shown in FIG. 17 , the substrate holder opening and closing mechanism 102 has three sensors 1140 , and the fixed support member 15 has three recesses 17 at the outer peripheral edge of the substrate seating area 14 . Preferably, each recess 17 has an inclined bottom surface substantially perpendicular to the axis of the laser beam from the sensor 1140 and allows the plating solution to flow out of the recess 17 so that a constant gap is maintained between the sensor 1140 and the inclined bottom surface of the recess 17. distance.

传感器1140测量到对象的距离,并确定测得的距离是否在预先确定的范围中。例如,如果被设置在与凹部17的倾斜底面相隔距离A的特定高度处的传感器1140,如图16A所示,传感器1140检测距离A作为到倾斜底面的距离,然后,判断出传感器1140检测到了到倾斜底面的正确距离,而不是到固定支撑构件15上的基板500的距离。因此,发现基板500不是位于传感器1140和倾斜底面,即凹部17,之间。The sensor 1140 measures a distance to an object and determines whether the measured distance is within a predetermined range. For example, if the sensor 1140 is provided at a specific height at a distance A from the inclined bottom surface of the concave portion 17, as shown in FIG. The correct distance to the sloped bottom surface, not to the base plate 500 on the fixed support member 15. Therefore, it is found that the substrate 500 is not located between the sensor 1140 and the inclined bottom surface, ie, the recess 17 .

另一方面,如果所述传感器1140检测到小于距离A的距离W1,如图16B所示,则判断出传感器1140测量到了到基板500的距离,并且基板500处于的位置不对齐。On the other hand, if the sensor 1140 detects a distance W 1 smaller than the distance A, as shown in FIG. 16B , it is determined that the sensor 1140 has measured the distance to the substrate 500 and the substrate 500 is not aligned.

如果距离多个凹部17的倾斜底面的正确距离是由对应的传感器1140检测出的,则发现基板500在任何凹处17的方向上的位置没有出现不对齐。因此基板500的位置不对齐能够被更精确地检测。If the correct distance from the inclined bottom surfaces of the plurality of recesses 17 is detected by the corresponding sensor 1140, no misalignment of the position of the substrate 500 in the direction of any recess 17 is found. Therefore the positional misalignment of the substrate 500 can be more accurately detected.

可以通过调节传感器1140与基板500法线的倾斜度R和距离A和来设定用于确定基板500的位置不对齐的阈值D为适当的值。优选地,阈值D应当处于05毫米到15毫米的范围内。The threshold D for determining the misalignment of the substrate 500 can be set to an appropriate value by adjusting the inclination R and the distance A of the sensor 1140 from the normal of the substrate 500 . Preferably, the threshold D should be in the range of 0.5 mm to 15 mm.

当基板500没有位于传感器1140和凹部17之间的位置时,基板500可能不位于固定支撑构件15上。例如,基板500可能附着在可动支撑构件11,并可能同可动支撑构件11一起被抬升。为了防止这个情况发生,如图18A和18B所示,传感器1140可以随着头部分1100上升,并可以再次测量从传感器1140之前测量到凹部17的倾斜底面的距离时所处的高度到凹部17的倾斜底面的距离。When the substrate 500 is not positioned between the sensor 1140 and the recess 17 , the substrate 500 may not be positioned on the fixed support member 15 . For example, the substrate 500 may be attached to the movable support member 11 and may be lifted together with the movable support member 11 . To prevent this from happening, as shown in FIGS. 18A and 18B , the sensor 1140 can be raised with the head portion 1100 and can again measure the height to the recess 17 from the height at which the sensor 1140 previously measured the distance to the sloped bottom surface of the recess 17. The distance of the sloped bottom.

具体地,如图18A所示,当传感器1140从传感器1140之前测量到凹部17的倾斜底面的距离时所处的高度上升高度H,传感器1140与基板500间隔距离W2Specifically, as shown in FIG. 18A , when the sensor 1140 rises by a height H from the height at which the sensor 1140 measured the distance to the sloped bottom surface of the recess 17 before the sensor 1140 , the sensor 1140 is separated from the substrate 500 by a distance W 2 .

如果传感器1140测量距离基板500的距离W2,则判断出传感器1140已测量了到基板500的正确距离,并发现基板500被放置在固定支撑构件15上。If the sensor 1140 measures the distance W 2 from the substrate 500 , it is determined that the sensor 1140 has measured the correct distance to the substrate 500 and the substrate 500 is found to be placed on the fixed support member 15 .

如图18B所示,另一方面,如果传感器1140测量小于距离W2的距离B,则判断出传感器1140已测量到凹部17的倾斜底面的距离,并发现基板500不位于固定支撑构件15上。As shown in FIG. 18B , on the other hand, if the sensor 1140 measures a distance B smaller than the distance W 2 , it is judged that the sensor 1140 has measured the distance to the sloped bottom surface of the recess 17 and finds that the substrate 500 is not located on the fixed support member 15.

以下将参照图19到22描述用于将基板500放置在基板保持器110内和将基板500从基板保持器110移除的基板保持器打开和关闭机构102的运转顺序。The operation sequence of the substrate holder opening and closing mechanism 102 for placing and removing the substrate 500 in the substrate holder 110 will be described below with reference to FIGS. 19 to 22 .

图19是显示通过基板保持器运送器140被水平地放置在台120上的基板保持器110的立体图。在该状态下,通过连接凸起1170被连接到第一致动器1200的头部分1100被与基板保持器110向上地间隔。轴1130从头部分1100延伸到第二致动器1300上方的位置。基板保持器110没有保持基板500,可动支撑构件11通过突出部13被暂时地紧固到固定支撑构件15,该突出部13与夹持器16轻微地接合保持。FIG. 19 is a perspective view showing the substrate holder 110 placed horizontally on the stage 120 by the substrate holder transporter 140 . In this state, the head portion 1100 connected to the first actuator 1200 through the connection protrusion 1170 is spaced upward from the substrate holder 110 . A shaft 1130 extends from the head portion 1100 to a position above the second actuator 1300 . The substrate holder 110 does not hold the substrate 500 , and the movable support member 11 is temporarily fastened to the fixed support member 15 by the protrusion 13 which is held in light engagement with the clamper 16 .

然后,头部分1100通过第一致动器1200被降低,从而使轴1130位于两个辊1340之间的位置。Then, the head part 1100 is lowered by the first actuator 1200 so that the shaft 1130 is positioned between the two rollers 1340 .

其后,如图20所示,第二致动器1300被运转以将可动支撑构件11从固定支撑构件15释放,即,从夹持器16释放突出部13。如图20所示,轴钩1330在由箭头X′指示出的方向上通过第二致动器1300被移动,将旋转板1150反时针方向转动。因此,如上所述,紧固钩1151中的一个推动支撑构件12的突起12a,将突出部13移动到吊钩1111。Thereafter, as shown in FIG. 20 , the second actuator 1300 is operated to release the movable support member 11 from the fixed support member 15 , ie release the protrusion 13 from the gripper 16 . As shown in FIG. 20, the shaft hook 1330 is moved by the second actuator 1300 in the direction indicated by the arrow X', rotating the rotating plate 1150 counterclockwise. Therefore, as described above, one of the fastening hooks 1151 pushes the protrusion 12 a of the support member 12 , moving the protrusion 13 to the hook 1111 .

在箭头X,X′所示的方向上,第二致动器1300移动到其初始位置,以将轴钩1330从图20所示的位置返回到其中间位置。然后,第一致动器1200被运转以提升头部分1100,提升可动支撑构件11。如图21所示,基板自动运送器180将基板500放置在固定支撑构件15的基板放置区域14。In the direction indicated by the arrows X, X', the second actuator 1300 is moved to its initial position to return the axle hook 1330 from the position shown in FIG. 20 to its intermediate position. The first actuator 1200 is then operated to lift the head portion 1100 , lifting the movable support member 11 . As shown in FIG. 21 , the substrate automatic transporter 180 places the substrate 500 on the substrate placement area 14 of the fixed support member 15 .

然后,第一致动器1200被运转以将头部分1100从图21所示的位置降低。如上所述,当位于按压片1110的下表面上的按压块1114按压可动支撑构件11时,因为按压块1114各自在其中包括弹性构件30,弹性构件30能够减小密封环18因为基板保持器110的不同厚度而被压缩的距离上的差别。The first actuator 1200 is then operated to lower the head portion 1100 from the position shown in FIG. 21 . As described above, when the pressing blocks 1114 on the lower surface of the pressing piece 1110 press the movable support member 11, since the pressing blocks 1114 each include the elastic member 30 therein, the elastic members 30 can reduce the size of the seal ring 18 because the substrate holder The difference in the compressed distance due to the different thickness of 110.

当第一致动器1200降低头部分1100并且第二致动器1300在箭头X指示的方向上从图21所示的位置移动轴钩1330时,轴钩1330在箭头X指示的方向上推动轴1130,顺时针方向转动旋转板1150,如图22所示。紧固钩1151推动支撑构件12的突起12a,该突起12a也顺时针转动。突出部13现在与夹持器16适配接合。移动支撑构件11现在被固定到固定支撑构件15,以将基板500夹持在移动支撑构件11和固定支撑构件15之间。When the first actuator 1200 lowers the head portion 1100 and the second actuator 1300 moves the shaft hook 1330 from the position shown in FIG. 21 in the direction indicated by the arrow X, the shaft hook 1330 pushes the shaft in the direction indicated by the arrow X. 1130, rotate the rotary plate 1150 clockwise, as shown in FIG. 22 . The fastening hook 1151 pushes the protrusion 12a of the support member 12, which also rotates clockwise. The protrusion 13 is now in fitting engagement with the holder 16 . The mobile support member 11 is now secured to the fixed support member 15 to clamp the substrate 500 between the mobile support member 11 and the fixed support member 15 .

图22显示被保持为彼此适配接合的突出部13和夹持器16,基板500被夹持在移动支撑构件11和固定支撑构件15之间。如果移动支撑构件11将被暂时地紧固到固定支撑构件15,而基板500没有被夹紧在移动支撑构件11和固定支撑构件15之间,轴钩1330可能被停止在比图22所示的位置稍微靠前的位置上。FIG. 22 shows the protrusion 13 and the holder 16 held in fitted engagement with each other, the substrate 500 being clamped between the mobile support member 11 and the fixed support member 15 . If the mobile support member 11 is to be temporarily fastened to the fixed support member 15 without the base plate 500 being clamped between the mobile support member 11 and the fixed support member 15, the shaft hook 1330 may be stopped at a position other than that shown in FIG. position slightly forward.

如图22所示,在突出部13和夹持器16被保持为相互适配接合时,第二致动器1300移动到其初始位置,以将轴钩1330在箭头X,X′指示的方向上返回到其中间位置。保持基板500的基板保持器110然后由基板保持器运送器140运送到基板500将被处理的镀敷部130。As shown in Figure 22, when the protrusion 13 and the holder 16 are kept in fit engagement with each other, the second actuator 1300 moves to its initial position to move the shaft hook 1330 in the direction indicated by the arrow X, X' to return to its middle position. The substrate holder 110 holding the substrate 500 is then carried by the substrate holder carrier 140 to the plating section 130 where the substrate 500 is to be processed.

在基板500被处理后,保持已被处理的基板500的基板保持器110被放置在台120上,并且基板500通过基板保持器打开和关闭机构102和基板自动运送器180被从基板保持器110移除。为了将基板500从基板保持器110移除,将固定支撑构件15从移动支撑构件11分离的过程通过第一致动器1200第二致动器1300以与上述方法相同的方式进行。图21也显示了在保持已被处理基板500的基板保持器110被放置在台120上后,头部分1100抬升的可动支撑构件11。如果基板500被紧固到第一密封环18a并被第一密封环18a抬起,然后落入固定支撑构件15上的不对齐位置,或如果基板500继续附着在可动支撑构件11,则当传感器1140如上所述测量到固定支撑构件15和到基板500的距离时,这样的问题被位于头部分1100上的传感器1140检测。After the substrate 500 is processed, the substrate holder 110 holding the processed substrate 500 is placed on the stage 120, and the substrate 500 is removed from the substrate holder 110 by the substrate holder opening and closing mechanism 102 and the substrate automatic transporter 180. remove. In order to remove the substrate 500 from the substrate holder 110, the process of separating the fixed support member 15 from the movable support member 11 is performed by the first actuator 1200 and the second actuator 1300 in the same manner as the method described above. FIG. 21 also shows the movable support member 11 with the head portion 1100 lifted after the substrate holder 110 holding the processed substrate 500 is placed on the stage 120 . If the substrate 500 is fastened to and lifted by the first sealing ring 18a and then falls into a misaligned position on the fixed support member 15, or if the substrate 500 continues to be attached to the movable support member 11, then when Such problems are detected by the sensor 1140 located on the head portion 1100 as the sensor 1140 measures the distance to the fixed support member 15 and to the substrate 500 as described above.

如上所述,因为基板保持器打开和关闭机构102以简单的组件组合而成,其尺寸相对较小,并且成本较低。因为本实施例中的基板保持器打开和关闭机构102包括位于可竖直移动的头部分1100上的传感器1140,该传感器1140用于检测基板500的位置不对齐,基板保持器打开和关闭机构102能够比现有的设备更精确地检测基板500的位置不对齐,而无论基板500和基板保持器110是否变形以及基板500上是否有水滴。另外,因为用于按压基板保持器1100的按压块1114分别在其中包括各自的弹性构件30,弹性构件30能够减小密封环18因为基板保持器110的不同厚度而被压缩的距离上的差别,并稳定密封环18相对于基板500的密封能力。As described above, since the substrate holder opening and closing mechanism 102 is assembled with simple components, it is relatively small in size and low in cost. Since the substrate holder opening and closing mechanism 102 in the present embodiment includes the sensor 1140 on the vertically movable head portion 1100 for detecting the misalignment of the substrate 500, the substrate holder opening and closing mechanism 102 The positional misalignment of the substrate 500 can be detected more accurately than existing devices regardless of whether the substrate 500 and the substrate holder 110 are deformed and whether there is water drop on the substrate 500 . In addition, since the pressing blocks 1114 for pressing the substrate holder 1100 respectively include respective elastic members 30 therein, the elastic members 30 can reduce the difference in the distance that the seal ring 18 is compressed due to different thicknesses of the substrate holder 110, And stabilize the sealing ability of the sealing ring 18 relative to the substrate 500 .

在这本实施例中,第二致动器1300被沿着台120设置。然而,因为第二致动器1300起到相对于按压片1110旋转旋转板1150的作用,第二致动器1300可以被安装在按压片1110上,用于旋转旋转板1150的。在本实施例中,分别包括弹性构件30的按压块114减小密封环18因为基板保持器110的不同厚度而被压缩的距离上的差别。然而,用于竖直地移动头部分1100的第一致动器1200可以包含具有扭矩监测能力的伺服电机,可以控制伺服电机以控制头部分1100的下降,以使得压缩密封环18的力为恒定。以此方法,密封环18被压缩的距离可以为恒定,而不论基板保持器110的不同厚度。本实施例中的货车型贮藏部150(参见图1和2)适用于存储每个在竖直平面内延伸的基板保持器110。货车型贮藏部150能够存储至少与镀敷部130中的镀敷槽130f中的隔室的数目相同的基板保持器110。优选地,货车型贮藏部150应该存储额外的一组基板保持器110,作为被发现因为电力馈送故障等而出现问题的基板保持器110的备用。In this embodiment, the second actuator 1300 is positioned along the table 120 . However, since the second actuator 1300 functions to rotate the rotating plate 1150 relative to the pressing piece 1110 , the second actuator 1300 may be installed on the pressing piece 1110 for rotating the rotating plate 1150 . In the present embodiment, the pressing blocks 114 respectively including the elastic members 30 reduce the difference in the distance at which the seal ring 18 is compressed due to the different thicknesses of the substrate holder 110 . However, the first actuator 1200 for vertically moving the head portion 1100 may comprise a servo motor with torque monitoring capability that may be controlled to control the lowering of the head portion 1100 such that the force compressing the sealing ring 18 is constant . In this way, the distance by which the sealing ring 18 is compressed can be constant despite the different thicknesses of the substrate holder 110 . The truck-type storage portion 150 (see FIGS. 1 and 2 ) in this embodiment is adapted to store substrate holders 110 each extending in a vertical plane. The van-type storage section 150 is capable of storing at least the same number of substrate holders 110 as the compartments in the plating tank 130 f in the plating section 130 . Preferably, the van-type storage section 150 should store an extra set of substrate holders 110 as a spare for substrate holders 110 that are found to be malfunctioning due to power feed failure or the like.

货车型贮藏部150位于贮藏部安装部分160。如图1所示,贮藏部安装部分160设置为靠近镀敷设备的后表面,在镀敷设备的前表面上具有装载口170。贮藏部安装部分160和货车型贮藏部150可以被放置在其他位置,例如,在台120和镀敷部130之间。然而,台120、镀敷部130和贮藏部安装部分160应当被以如图1的顺序依次排列,以提高效率,因为这样的布局可以在每单位时间里产生较高的吞吐量。具体地,当镀敷设备在连续运转中,在基板保持器110运送已经在镀敷部130处理过的基板500后,基板保持器110接收下一个待处理基板500。因此,除非基板保持器110遇到例如电力馈送故障等问题时,货车型贮藏部150中的相应隔室变空,并会导致用于基板保持器110从空的货车型贮藏部150上方经过的运送时间损耗。换句话说,当镀敷设备处于连续运转时,基板保持器110不会被向右运送超出图1中的X表示的点。The truck-type storage unit 150 is located at the storage unit installation portion 160 . As shown in FIG. 1 , the storage installation part 160 is disposed close to the rear surface of the plating apparatus, and has the loading port 170 on the front surface of the plating apparatus. The storage installation part 160 and the truck-type storage 150 may be placed at other locations, for example, between the stage 120 and the plating part 130 . However, the stage 120, the plating part 130, and the storage part installation part 160 should be sequentially arranged in the order shown in FIG. 1 to improve efficiency because such a layout can generate a higher throughput per unit time. Specifically, when the plating apparatus is in continuous operation, after the substrate holder 110 transports the substrate 500 that has been processed in the plating section 130 , the substrate holder 110 receives the next substrate 500 to be processed. Therefore, unless the substrate holder 110 encounters a problem such as a power feed failure, the corresponding compartment in the truck-type storage part 150 becomes empty, and will cause the substrate holder 110 to pass over the empty truck-type storage part 150. Shipping time loss. In other words, when the plating apparatus is in continuous operation, the substrate holder 110 is not transported to the right beyond the point indicated by X in FIG. 1 .

如果货车型贮藏部150和贮藏部安装部分160设置在台120和镀敷部130之间,面对图1的观察者的镀敷设备的侧壁需要具有开口,并且货车型贮藏部150必须通过该开口被放入贮藏部安装部分160和从贮藏部安装部分160中取出。然而,镀敷设备通常与邻近的设备间隔开大约1米,提供了有限空间,其中操作者将货车型贮藏部150放进贮藏部安装部分160和从贮藏部安装部分160中取出,并继续在货车型贮藏部150上工作。很难制造在这样的有限空间里可移动且能存储多个基板保持器的货车型贮藏部。根据本实施例,贮藏部安装部分160被设置在靠近镀敷设备的后表面,因为在镀敷设备的后表面后面具有较大的空间,可以自由地接近贮藏部安装部分160。If the truck type storage part 150 and the storage part installation part 160 are arranged between the table 120 and the plating part 130, the side wall of the plating equipment facing the observer of Fig. 1 needs to have an opening, and the truck type storage part 150 must pass through The opening is put into and taken out of the storage installation part 160 . However, the plating equipment is usually spaced about 1 meter apart from adjacent equipment, providing a limited space in which the operator puts the truck-type storage unit 150 into and takes it out of the storage unit installation portion 160, and continues to operate in the storage unit. Work on the truck-type storage unit 150 . It is difficult to manufacture a truck-type storage unit that is movable in such a limited space and can store a plurality of substrate holders. According to the present embodiment, the storage installation part 160 is provided close to the rear surface of the plating apparatus, since there is a large space behind the rear surface of the plating apparatus, the storage installation part 160 can be freely accessed.

接着,以下将描述货车型贮藏部150的结构上的细节。当镀敷设备断电时,即,当没有基板500被处理时,货车型贮藏部150在其中存储所有的基板保持器110。当镀敷设备处于工作中时,即,当基板500被处理时,必需的基板保持器110被从货车型贮藏部150中取出,并且没有被使用的基板保持器110或者遇到例如电力馈送故障等问题的基板保持器110被储存在货车型贮藏部150中。Next, structural details of the truck-type storage unit 150 will be described below. When the plating apparatus is powered off, that is, when no substrate 500 is processed, the truck-type storage part 150 stores therein all the substrate holders 110 . When the plating apparatus is in operation, that is, when the substrate 500 is processed, the necessary substrate holder 110 is taken out of the truck-type storage part 150, and the substrate holder 110 that is not used or encounters, for example, a power feed failure The substrate holders 110 for problems such as the above are stored in the truck-type storage unit 150 .

图23是显示货车型贮藏部150的结构的示意性视图。如图23所示,货车型贮藏部150包括作为用于移动货车型贮藏部150的多个脚轮151、用于支撑基板保持器110的吊架112以吊起基板保持器110的多个吊架接收器152、和用于防止通过吊架接收器152吊起的基板保持器110摇晃的基板保持器摇晃防止构件153。货车型贮藏部150包括例如锁销等的用于将货车型贮藏部150锁在贮藏部安装部分160中的一对贮藏部锁159、框架155、竖直辊156、水平辊157、排水盘158和手柄154。这些部件的细节将在下文中描述。货车型贮藏部150具有限定在框架155内的基板保持器存储区,作为用于在其中储存多个基板保持器110的空间。FIG. 23 is a schematic view showing the structure of the truck-type storage unit 150 . As shown in FIG. 23 , the truck-type storage unit 150 includes a plurality of hangers as a plurality of casters 151 for moving the truck-type storage unit 150 , a hanger 112 for supporting the substrate holder 110 to lift the substrate holder 110 The receiver 152 and the substrate holder shaking prevention member 153 for preventing the substrate holder 110 suspended by the hanger receiver 152 from shaking. The truck-type storage unit 150 includes a pair of storage unit locks 159, such as locking pins, for locking the truck-type storage unit 150 in the storage unit mounting portion 160, a frame 155, vertical rollers 156, horizontal rollers 157, a drain pan 158 and handle 154 . Details of these components will be described below. The truck-type storage section 150 has a substrate holder storage area defined within the frame 155 as a space for storing a plurality of substrate holders 110 therein.

因为货车型贮藏部150具有作为移动机构的脚轮151,货车型贮藏部150能够被移进贮藏部安装部分160和从贮藏部安装部分160移出,即,移进镀敷设备和从镀敷设备移出。在这本实施例中,脚轮151被用作移动机构。然而,货车型贮藏部150可以具有另一个移动机构以代替脚轮151。例如,可以设置轨道以滑动地将货车型贮藏部150引导进贮藏部安装部分160或者从贮藏部安装部分160移出。因为货车型贮藏部150能够从镀敷设备内的贮藏部安装部分160拉出,基板保持器110能够被放入位于镀敷设备外的货车型贮藏部150并从该货车型贮藏部150取出,操作者的负担相比于基板保持器110被手动地或通过位于镀敷设备内的升降机被放入货车型贮藏部150和从货车型贮藏部150中取出。Because the truck type storage part 150 has the casters 151 as a moving mechanism, the truck type storage part 150 can be moved into and out of the storage part installation part 160, that is, into and out of the plating equipment. . In this embodiment, casters 151 are used as the moving mechanism. However, the truck-type storage unit 150 may have another moving mechanism instead of the casters 151 . For example, rails may be provided to slidably guide the truck-type storage unit 150 into or out of the storage unit installation portion 160 . Because the truck type storage part 150 can be pulled out from the storage part installation part 160 in the plating equipment, the substrate holder 110 can be put into and taken out from the truck type storage part 150 outside the plating equipment, The burden on the operator is compared to that the substrate holder 110 is put into and taken out of the truck-type storage 150 manually or by a lifter located in the plating apparatus.

因为货车型贮藏部150由于脚轮151而可以移动,货车型贮藏部150能够被完全地从镀敷设备分离。从吊钩接收器152悬挂的基板保持器110能够经由凹陷155a从货车型贮藏部150容易地被取出,基板保持器110能够被容易地引导进货车型贮藏部150并经由凹陷155a从吊钩接收器152悬挂。凹陷155a使基板保持器110能够被容易地经由凹陷凹处放进和取出货车型贮藏部150,不需要将货车型贮藏部150台升出基板保持器110。图24是显示另一个货车型贮藏部150的结构的立体图。如图24所示,货车型贮藏部150的框架155具有被限定在框架155的侧壁的凹陷155a。从吊钩接收器152悬挂的基板保持器110能够经由凹陷155a从货车型贮藏部150容易地被取出,基板保持器110能够被容易地引导进货车型贮藏部150并经由凹陷155a从吊钩接收器152悬挂。凹陷155a使基板保持器110能够被容易地经由凹陷155a放进和取出货车型贮藏部150,不需要将货车型贮藏部150台升出基板保持器110。Since the truck type storage part 150 is movable due to the casters 151, the truck type storage part 150 can be completely separated from the plating apparatus. The substrate holder 110 suspended from the hook receiver 152 can be easily taken out from the truck-type storage part 150 via the recess 155a, and the substrate holder 110 can be easily guided into the truck-type storage part 150 and removed from the hook receiver via the recess 155a. 152 hanging. The recess 155a enables the substrate holder 110 to be easily put in and out of the truck-type storage unit 150 via the recessed recess without lifting the truck-type storage unit 150 out of the substrate holder 110 . FIG. 24 is a perspective view showing the structure of another truck-type storage unit 150 . As shown in FIG. 24 , the frame 155 of the truck-type storage unit 150 has a recess 155 a defined in a side wall of the frame 155 . The substrate holder 110 suspended from the hook receiver 152 can be easily taken out from the truck-type storage part 150 via the recess 155a, and the substrate holder 110 can be easily guided into the truck-type storage part 150 and removed from the hook receiver via the recess 155a. 152 hanging. The recess 155 a enables the substrate holder 110 to be easily put in and out of the truck-type storage 150 via the recess 155 a without the need to lift the truck-type storage 150 out of the substrate holder 110 .

图25是位于镀敷设备中的贮藏部安装部分160和货车型贮藏部150的示意性侧视图。图26是位于镀敷设备中的贮藏部安装部分160和货车型贮藏部150的示意性后视图。FIG. 25 is a schematic side view of the storage installation part 160 and the truck-type storage 150 located in the plating apparatus. FIG. 26 is a schematic rear view of the storage installation part 160 and the truck type storage 150 located in the plating apparatus.

优选地,贮藏部安装部分160被放置在基板保持器运送器140的运送轴101的延伸方向上接近镀敷设备的后表面的位置上,因为基板保持器110不经过空的货车型贮藏部150的上方并且应答时间被减小,不会有运送时间的损耗。例如,如图1和2所示,贮藏部安装部分160可以被设置在台120和溶解槽130h之间,而不是接近镀敷设备的后表面。然而,当货车型贮藏部150被从位于台120和溶解槽130h之间的贮藏部安装部分160拉出时,货车型贮藏部150被放置在镀敷设备的侧部。因为在镀敷设备的侧部的空间被邻近的设备限制,从而不能使货车型贮藏部150可以被自由触碰,贮藏部安装部分160希望被设置在接近镀敷设备的后表面的位置。Preferably, the storage section installation portion 160 is placed at a position close to the rear surface of the plating apparatus in the direction of extension of the transport shaft 101 of the substrate holder transporter 140 because the substrate holder 110 does not pass through the empty truck-type storage section 150 and the response time is reduced without loss of transit time. For example, as shown in FIGS. 1 and 2 , the storage installation part 160 may be provided between the stage 120 and the dissolution tank 130h instead of being close to the rear surface of the plating apparatus. However, when the truck type storage part 150 is pulled out from the storage part installation part 160 located between the stage 120 and the dissolution tank 130h, the truck type storage part 150 is placed at the side of the plating apparatus. Since the space at the side of the plating equipment is limited by adjacent equipment so that the truck type storage 150 cannot be freely touched, the storage installation part 160 is desirably provided near the rear surface of the plating equipment.

如图25和26所示,贮藏部安装部分160包括门161,经由该门161货车型贮藏部150被放入贮藏部安装部分160和贮藏部安装部分160取出,该门161被设置在被限定在镀敷设备的后表面的开口中,闸板162作为打开和关闭装置,用于在门161打开时将可使周围空气流入镀敷设备的空隙最小化。在本实施例中,门161包括和闸板162一起工作的锁定机构。当闸板162打开时,锁定机构将门161锁在关闭位置。As shown in FIGS. 25 and 26 , the storage portion installation portion 160 includes a door 161 through which the truck-type storage portion 150 is put into the storage portion installation portion 160 and taken out from the storage portion installation portion 160 , and the door 161 is arranged in a defined position. In the opening of the rear surface of the plating apparatus, the shutter 162 serves as an opening and closing means for minimizing a gap through which ambient air may flow into the plating apparatus when the door 161 is opened. In this embodiment, door 161 includes a locking mechanism that works with shutter 162 . When the shutter 162 is open, the locking mechanism locks the door 161 in the closed position.

本实施例中的锁定机构包括用于锁住闸板162的闸板开关165a和用于锁住门161的门开关165b。闸板开关165a和门开关165b被设置在贮藏部安装部分160。每个闸板开关165a和门开关165b优选地为致动器组合开关。当被安装在闸板162或门161上的致动器被插入闸板开关165a或门开关165b中时,闸板开关165a或门开关165b检测闸板162或门161被关闭,闸板开关165a或门开关165b锁住致动器防止其被移除。当解锁信号被传送给闸板开关165a或门开关165b时,闸板开关165a或者门开关165b将致动器解锁。当闸板开关165a锁住了致动器时,闸板162不能被打开,当门开关165b锁住致动器时,门162不能被打开。闸板开关165a和门开关165b彼此协同工作,从而门开关165b不能被解锁,除非闸板开关165a被锁住,并且闸板开关165a不能解锁,除非门开关165b被锁住。因此,只要闸板开关165a和门开关165b中的一个打开,另一个必须被关闭,以使流入诸如镀敷部130和基板保持器运送器140的区域的环境空气最小化。The locking mechanism in this embodiment includes a shutter switch 165 a for locking the shutter 162 and a door switch 165 b for locking the door 161 . A shutter switch 165 a and a door switch 165 b are provided at the storage installation part 160 . Each of the paddle switch 165a and door switch 165b is preferably an actuator combination switch. When the actuator installed on the shutter 162 or the door 161 is inserted into the shutter switch 165a or the door switch 165b, the shutter switch 165a or the door switch 165b detects that the shutter 162 or the door 161 is closed, and the shutter switch 165a OR door switch 165b locks the actuator against removal. When the unlock signal is transmitted to the shutter switch 165a or the door switch 165b, the shutter switch 165a or the door switch 165b unlocks the actuator. When the shutter switch 165a locks the actuator, the shutter 162 cannot be opened, and when the door switch 165b locks the actuator, the door 162 cannot be opened. The paddle switch 165a and the door switch 165b cooperate with each other such that the door switch 165b cannot be unlocked unless the paddle switch 165a is locked, and the paddle switch 165a cannot be unlocked unless the door switch 165b is locked. Therefore, whenever one of the shutter switch 165 a and the door switch 165 b is open, the other must be closed to minimize ambient air flow into areas such as the plating section 130 and the substrate holder transporter 140 .

闸板开关165a中和门开关165b中的每一个可以包含电磁控制的安全开关。镀敷设备的后面板可以被用作货车型贮藏部150的并与货车型贮藏部150一体的门,而不用贮藏部安装部分160的门。闸板162包括枢轴旋转的闸板,为了节省空间,该闸板通过闸板旋转机构162a在打开位置和关闭位置之间能够角度移动。贮藏部安装部分160通过闸板开关165a检测闸板162何时被打开或关闭。Each of the shutter switch 165a and the door switch 165b may include a solenoid-operated safety switch. The rear panel of the plating apparatus may be used as a door of the truck type storage part 150 and integrated with the truck type storage part 150 instead of the door of the storage part installation part 160 . The shutter 162 comprises a pivoting shutter that is angularly movable between an open position and a closed position by a shutter rotation mechanism 162a to save space. The storage installation part 160 detects when the shutter 162 is opened or closed through the shutter switch 165a.

在本实施例中,贮藏部锁或贮藏部锁销159中的每个包括用于牢固地将货车型贮藏部150固定到贮藏部安装部分160的锁销手柄159a。当货车型贮藏部150处于贮藏部安装部分160中时,贮藏部锁或贮藏部锁销159将货车型贮藏部150不可移动地保持在贮藏部安装部分160中。由橡胶等制成的弹性块167被安装在货车型贮藏部150的一端,当货车型贮藏部150移动进入贮藏部安装部分160时,该端作为前端,或在货车型贮藏部150进入贮藏部安装部分160时贮藏部安装部分160抵靠货车型贮藏部150的后表面上。弹性块167起到当货车型贮藏部150和贮藏部安装部分160的后表面彼此接触时减小冲击的作用。当货车型贮藏部150被引导进贮藏部安装部分160时,操作者推动货车型贮藏部150进入贮藏部安装部分160,直到货车型贮藏部150挤压弹性块167,然后使用贮藏部锁或贮藏部锁销159将货车型贮藏部150紧固在贮藏部安装部分160中的位置上。In this embodiment, each of the storage unit lock or storage unit latch 159 includes a latch handle 159a for securely securing the truck-type storage unit 150 to the storage unit mounting portion 160 . When the truck type storage unit 150 is in the storage unit mounting portion 160 , the storage unit lock or storage unit detent 159 immovably holds the truck type storage unit 150 in the storage unit mounting portion 160 . An elastic block 167 made of rubber or the like is mounted on one end of the truck type storage part 150, and when the truck type storage part 150 moves into the storage part installation part 160, this end acts as a front end, or when the truck type storage part 150 enters the storage part. The storage unit installation portion 160 abuts against the rear surface of the truck type storage unit 150 when the storage unit 160 is installed. The elastic block 167 functions to reduce shock when the rear surfaces of the truck type storage part 150 and the storage part mounting part 160 contact each other. When the truck-type storage unit 150 is guided into the storage unit installation portion 160, the operator pushes the truck-type storage unit 150 into the storage unit installation portion 160 until the truck-type storage unit 150 squeezes the elastic block 167, and then uses the storage unit lock or storage The truck-type storage unit 150 is secured in place in the storage unit mounting portion 160 by the storage unit latch pin 159 .

在本实施例中,贮藏部安装部分160具有设置在贮藏部安装部分160中的水平导向板163,用于在货车型贮藏部150被放入贮藏部安装部分160和从贮藏部安装部分160中取出时调节货车型贮藏部150的位置和高度。图27是设置在贮藏部安装部分160中的导向板163和位于货车型贮藏部150上的竖直辊156和水平辊157的平面图。图28是被设置在贮藏部安装部分160中的导向板163和位于货车型贮藏部150上的竖直辊156和水平辊157的侧视图。In the present embodiment, the storage unit installation portion 160 has a horizontal guide plate 163 provided in the storage unit installation portion 160 for being put into the storage unit installation portion 160 and from the storage unit installation portion 160 when the truck type storage unit 150 Adjust the position and height of the truck-type storage unit 150 when taking it out. 27 is a plan view of the guide plate 163 provided in the storage part installation part 160 and the vertical roller 156 and the horizontal roller 157 on the truck type storage part 150. Referring to FIG. 28 is a side view of the guide plate 163 provided in the storage part installation part 160 and the vertical roller 156 and the horizontal roller 157 on the truck type storage part 150 .

如图27和28,货车型贮藏部150包括位于脚轮150旁的竖直辊156,贮藏部安装部分160包括导向板163。当货车型贮藏部150被推进贮藏部安装部分160中时,竖直辊156位于导向板163上。在这时候,脚轮151被抬离地板。As shown in FIGS. 27 and 28 , the truck type storage unit 150 includes vertical rollers 156 located beside the casters 150 , and the storage unit mounting portion 160 includes guide plates 163 . When the truck type storage unit 150 is pushed into the storage unit installation portion 160 , the vertical roller 156 is positioned on the guide plate 163 . At this point, the casters 151 are lifted off the floor.

各个镀敷设备通常具有不同的距离地板的高度。如果贮藏部安装部分160没有导向板,当货车型贮藏部150被推入贮藏部安装部分160时,脚轮151保持与地板的接触,然后货车型贮藏部150可以相对不同的镀敷设备不能被适当地竖直定位。已经相对一个镀敷设备被竖直调整的货车型贮藏部150,可能不能相对于另一个镀敷设备适当地竖直定位。这样的缺点能够通过导向板163而被避免,该导向板163被竖直定位且被作为在不同镀敷设备中的部件的公共高度的参照。因为货车型贮藏部150被支撑在导向板163上,当货车型贮藏部150处于贮藏部安装部分160中时,货车型贮藏部150可以被不同的镀敷设备公用。除非另有说明,多个货车型贮藏部150可以被用在一个镀敷设备中。Individual plating installations generally have different heights from the floor. If the storage part installation part 160 does not have the guide plate, when the truck type storage part 150 is pushed into the storage part installation part 160, the casters 151 remain in contact with the floor, and then the truck type storage part 150 may not be properly installed with respect to different plating equipment. positioned vertically. A truck-type storage unit 150 that has been vertically adjusted relative to one plating apparatus may not be properly vertically positioned relative to another plating apparatus. Such disadvantages can be avoided by means of a guide plate 163 which is positioned vertically and serves as a reference for the common height of the components in the different plating installations. Since the truck type storage part 150 is supported on the guide plate 163, when the truck type storage part 150 is in the storage part installation part 160, the truck type storage part 150 may be commonly used by different plating apparatuses. Unless otherwise stated, multiple truck-type storage units 150 may be used in one plating facility.

为了顺畅地将货车型贮藏部150放进贮藏部安装部分160,在本实施例中,导向板163具有中心垂直导轨163a,在货车型贮藏部150移动进入贮藏部安装部分160时,位于货车型贮藏部150上的水平辊157被保持为与导轨163a的侧面滚动接触。当水平辊157被保持为与导轨163a的侧面滚动接触时,水平辊限制脚轮151的侧向移动,从而调节脚轮151的位置。In order to smoothly put the truck-type storage unit 150 into the storage unit installation portion 160, in this embodiment, the guide plate 163 has a central vertical guide rail 163a, which is positioned at the truck-type storage unit 150 when the truck-type storage unit 150 moves into the storage unit installation portion 160. The horizontal rollers 157 on the storage portion 150 are held in rolling contact with the sides of the rails 163a. When the horizontal roller 157 is held in rolling contact with the side of the guide rail 163a, the horizontal roller restricts the lateral movement of the caster 151, thereby adjusting the position of the caster 151.

在这本实施例中,导向板163的上表面具有斜坡163b,该斜坡163b靠近上表面的前端,用于允许竖直辊156顺畅地滚动到导向板163上。导轨163a具有一对斜坡163c,该对斜坡163c位于其相反侧面上且靠近其前端,用于允许水平辊157顺畅地滚动到导轨163a上。导轨163a可以具有宽度,该宽度在远离斜坡163c的方向上逐渐地变大,以逐渐地减小水平辊157和导轨163a之间的空隙。水平辊157被顺畅地移动并与导轨163a滚动接触,将货车型贮藏部150调节到贮藏部安装部分160中更精确的位置。In this embodiment, the upper surface of the guide plate 163 has a slope 163b near the front end of the upper surface for allowing the vertical roller 156 to roll onto the guide plate 163 smoothly. The guide rail 163a has a pair of slopes 163c on opposite sides thereof near the front end thereof for allowing the horizontal roller 157 to smoothly roll onto the guide rail 163a. The guide rail 163a may have a width that gradually becomes larger in a direction away from the slope 163c to gradually reduce a gap between the horizontal roller 157 and the guide rail 163a. The horizontal roller 157 is smoothly moved and rolls in contact with the guide rail 163 a, adjusting the truck type storage part 150 to a more accurate position in the storage part installation part 160 .

除了货车式贮藏部150上的竖直辊156,球形脚轮可以被安装在导向板163上,并且当货车式贮藏部150被推进贮藏部安装部分160时,货车式贮藏部150可以在导向板163上的球形脚轮上移动。货车式贮藏部150可以具有辊,并且贮藏部安装部分160可以具有用于调节货车式贮藏部150在贮藏部安装部分160中的位置的引导。In addition to the vertical rollers 156 on the truck storage unit 150, ball casters can be installed on the guide plate 163, and when the truck storage unit 150 is pushed into the storage unit installation portion 160, the truck storage unit 150 can be mounted on the guide plate 163. Move on spherical casters. The truck storage 150 may have rollers, and the storage installation part 160 may have a guide for adjusting a position of the truck storage 150 in the storage installation part 160 .

在本实施例中,支撑柱164被安装在导向板163的下表面,用于承担货车式贮藏部150的重量。支撑柱164具有调节高度的功能。整个镀敷设备的距离地板的高度通过位于镀敷设备的下表面上的调节器168(参见图25)调节。在图25中,导向板163具有固定到镀敷设备的左端,并且通过支撑柱164的高度调节功能被调节为与地板平行。In this embodiment, the support column 164 is installed on the lower surface of the guide plate 163 to bear the weight of the truck-type storage unit 150 . The support column 164 has the function of height adjustment. The height of the entire plating apparatus from the floor is adjusted by an adjuster 168 (see FIG. 25 ) located on the lower surface of the plating apparatus. In FIG. 25 , the guide plate 163 has a left end fixed to the plating apparatus, and is adjusted to be parallel to the floor by the height adjustment function of the support column 164 .

贮藏部安装部分160可以具有贮藏部检测器,该贮藏部检测器没有显示,诸如红外线传感器或照相机,用于确定货车式贮藏部150是否位于贮藏部安装部分160中和货车式贮藏部150是否被紧固在贮藏部安装部分160中的适当位置。贮藏部安装部分160还可以具有指示部,诸如灯泡等,用于向操作者指示货车式贮藏部150是否位于贮藏部安装部分160中。The storage unit mounting portion 160 may have a storage unit detector, not shown, such as an infrared sensor or camera, for determining whether the truck storage unit 150 is located in the storage unit mounting portion 160 and whether the truck storage unit 150 is Fastened in place in the storage portion mounting portion 160 . The storage installation part 160 may also have an indication part, such as a light bulb, for indicating to the operator whether the truck type storage 150 is located in the storage installation part 160 .

除非贮藏部检测器检测到货车式贮藏部150被紧固在贮藏部安装部分160中的适当位置,并且除非门开关165b将门161锁住,解锁信号不会被发送到正锁住闸板162的闸板开关165a,即闸板162保持关闭。这样能够防止基板保持器110在货车式贮藏部150被安装在贮藏部安装部分160中的错误位置时导致的运送问题,或防止外界空气被引入镀敷部130和基板保持器运送器140的乱流。Unless the storage unit detector detects that the truck storage unit 150 is fastened in place in the storage unit mounting portion 160, and unless the door switch 165b locks the door 161, an unlock signal will not be sent to the locking paddle 162. The shutter switch 165a, that is, the shutter 162 remains closed. This can prevent transportation problems caused by the substrate holder 110 when the cart storage unit 150 is installed in the wrong position in the storage unit installation portion 160, or prevent outside air from being introduced into the plating unit 130 and the substrate holder transporter 140 from being confused. flow.

如图29A到29C所示,锁销手柄159a被安装在货车式贮藏部150面对门161的侧壁上。贮藏部安装部分160具有用于分别接收锁销手柄159a的锁销接收器159b。锁销手柄159a和锁销接收器159b联结组成锁销或贮藏部锁159,用于将货车式贮藏部150锁在贮藏部安装部分160中。门161在该门161面对货车式贮藏部150的表面上具有锁销引导169,锁销引导169用于引导各自的锁销手柄159a。As shown in FIGS. 29A to 29C , a latch handle 159 a is mounted on the side wall of the cart storage portion 150 facing the door 161 . The storage portion mounting portion 160 has latch receivers 159b for respectively receiving the latch handles 159a. The latch handle 159a and the latch receiver 159b combine to form a latch or storage unit lock 159 for locking the truck storage unit 150 in the storage unit mounting portion 160 . The door 161 has a latch guide 169 on the surface of the door 161 facing the truck storage portion 150 for guiding the respective latch handle 159a.

图29A是显示货车式贮藏部150上的锁销手柄和贮藏部安装部分160的门161的锁销引导169之间关系的示意图;图29B是显示锁销引导169被安装在其上的门161的表面和锁销手柄159a的关系的侧视图;和图29C是安装有锁销引导169的门161的侧视图。29A is a schematic diagram showing the relationship between the latch handle on the truck type storage part 150 and the latch guide 169 of the door 161 of the storage part installation part 160; 29C is a side view of the door 161 with the deadbolt guide 169 installed.

当锁销手柄159a与锁销接收器159b接合时,货车式贮藏部150被锁在贮藏部安装部分160中的适当位置。当锁销手柄159a通过锁销接收器159b在来自被挤压的弹性块的反作用力下,锁销手柄159a与锁销接收器159接合。The truck storage unit 150 is locked in place in the storage unit mounting portion 160 when the latch handle 159a is engaged with the latch receiver 159b. The deadbolt handle 159a engages the deadbolt receiver 159 when the deadbolt handle 159a passes through the deadbolt receiver 159b under the reaction force from the compressed resilient mass.

锁销引导169被设置在门161的内表面上,当货车式贮藏部150被放置在贮藏部安装部分160中时,该内表面面对货车式贮藏部150。如图29C所示,锁销引导169的形式是从门161突出的支架形式并基本水平地延伸,其形状能够将锁销手柄159a保持在其当中。为了将货车式贮藏部150安装在贮藏部安装部分160中并且关闭门161,锁销手柄159a必需被定位为大致水平,以便锁销手柄159a被保持在锁销引导169之间。The latch guide 169 is provided on an inner surface of the door 161 that faces the truck storage 150 when the truck storage 150 is placed in the storage installation part 160 . As shown in Figure 29C, the latch guide 169 is in the form of a bracket protruding from the door 161 and extending substantially horizontally, shaped to retain the latch handle 159a therein. In order to install the truck storage unit 150 in the storage unit mounting portion 160 and close the door 161 , the deadbolt handle 159a must be positioned generally horizontal so that the deadbolt handle 159a is held between the deadbolt guides 169 .

为了将锁销手柄159a定位为大致水平,货车式贮藏部150需要被推进贮藏部安装部160中的的预定位置。当货车式贮藏部150位于贮藏部安装部分160中的预定位置时,货车式贮藏部150通过由锁销手柄159a和锁销接收器159b组成的锁销159被锁在贮藏部安装部分160中。除非锁销手柄159a被定位成大致水平,锁销手柄159a和锁销接收器159b相互干涉,并防止门161被关闭。因此,门161不能被关闭,除非货车式贮藏部150被推进贮藏部安装部分160中的预定位置。In order to position the latch handle 159a substantially horizontally, the cart type storage part 150 needs to be pushed into a predetermined position in the storage part mounting part 160 . When the truck storage unit 150 is located at a predetermined position in the storage unit installation part 160, the truck storage unit 150 is locked in the storage unit installation part 160 by a lock pin 159 consisting of a lock pin handle 159a and a lock pin receiver 159b. Unless the deadbolt handle 159a is positioned approximately horizontal, the deadbolt handle 159a and the deadbolt receiver 159b interfere with each other and prevent the door 161 from being closed. Therefore, the door 161 cannot be closed unless the cart type storage part 150 is pushed into a predetermined position in the storage part installation part 160 .

用这样的方式,货车式贮藏部150必需被安装和锁在贮藏部安装部分160中的预定位置中。货车式贮藏部150可以具有开关和致动器,该开关和致动器没有显示,该开关用于检测锁销手柄159a与锁销接收器159在适当位置接合的时候,该致动器用于紧固锁销手柄159a防止不适当的移动。In this way, the cart type storage unit 150 must be installed and locked in a predetermined position in the storage unit installation portion 160 . The truck storage unit 150 may have a switch, not shown, for detecting when the latch handle 159a is engaged with the latch receiver 159 in place, and an actuator for tightening the lock. The latch handle 159a is secured against inappropriate movement.

如图23、25和26所示,排水盘158被设置在货车式贮藏部150的较低部分上或货车式贮藏部150的底部。如图25所示,开口166被限定在贮藏部安装部分160的上方,通过基板保持器运送器140保持的基板保持器110经过开口166进入和离开贮藏部安装部分160。开口166被设置成小于货车式贮藏部150中的排水盘158。相应地,闸板162打开时,液滴通过开口166坠落,液滴通过排水盘158被接收在货车式贮藏部150中而不是坠落在地板上并弄脏地板。As shown in FIGS. 23 , 25 and 26 , a drain pan 158 is provided on a lower portion of the truck storage unit 150 or at the bottom of the truck storage unit 150 . As shown in FIG. 25 , an opening 166 through which the substrate holder 110 held by the substrate holder transporter 140 enters and exits the storage installation part 160 is defined above the storage installation part 160 . The opening 166 is configured smaller than the drain pan 158 in the truck storage 150 . Accordingly, when the shutter 162 is open, droplets fall through the opening 166 and are received in the truck storage 150 through the drain pan 158 rather than falling on the floor and soiling it.

贮藏部安装部分160可以具有足够大的尺寸,以将货车式贮藏部150放置在其中。然而,优选地,当货车式贮藏部150被放入贮藏部安装部分160中时,货车式贮藏部150和贮藏部安装部分160之间不应具有较大的空间,以防止当闸板162打开时,过多的外界空气进入镀敷部130。无论货车式贮藏部150是否被放置在贮藏部安装部分中,为了将让外界空气进入镀敷设备的开口的面积的变化最小化并防止内部气体和液滴从镀敷设备排出,隔离物可以设置在货车式贮藏部150的周围,隔离物没有在图中显示。The storage mounting portion 160 may have a size large enough to place the truck storage 150 therein. However, preferably, when the truck type storage unit 150 is put into the storage unit installation portion 160, there should not be a large space between the truck type storage unit 150 and the storage unit installation portion 160, so as to prevent the opening of the storage unit when the shutter 162 is opened. When , too much outside air enters the plating part 130 . Regardless of whether the truck storage unit 150 is placed in the storage unit installation section, in order to minimize the change in the area of the opening that allows outside air to enter the plating equipment and to prevent internal gas and liquid droplets from being discharged from the plating equipment, a spacer can be provided. Around the truck storage portion 150, partitions are not shown in the figure.

根据本实施例的镀敷设备,即使当镀敷设备正在操作中,货车式贮藏部150能够被从镀敷设备中拉出,即,镀敷设备的外面板的外侧,而不需要中断镀敷设备的操作。因此,货车式贮藏部150能够被从镀敷设备中取出,并且基板保持器110能够被维护而不会降低镀敷设备的可操作性。当镀敷设备正在运转中,为了将货车式贮藏部150放入或离开镀敷设备,需要考虑镀敷设备的操作安全性,并尽量使因为触碰货车式贮藏部150而导致的干扰镀敷设备的气流最小化。若要在镀敷设备未运转时触碰货车式贮藏部150,以上用于镀敷设备的操作安全和最小化干扰气流的要求应当被符合,若要在镀敷设备运转时触碰货车式贮藏部150,以上要求要被更精确地满足。According to the plating apparatus of the present embodiment, even when the plating apparatus is in operation, the cart type storage part 150 can be pulled out from the plating apparatus, that is, the outside of the outer panel of the plating apparatus, without interrupting the plating. operation of the device. Accordingly, the cart storage 150 can be taken out of the plating apparatus, and the substrate holder 110 can be maintained without reducing the operability of the plating apparatus. When the plating equipment is in operation, in order to put the truck-type storage part 150 into or leave the plating equipment, it is necessary to consider the operational safety of the plating equipment, and try to minimize the interference caused by touching the truck-type storage part 150. Airflow to the device is minimized. The above requirements for operational safety of the plating plant and minimizing disturbing airflow should be met if the truck storage section 150 is to be accessed when the plating plant is not in operation. Section 150, the above requirements are to be more precisely met.

当基板保持器运送器140将基板保持器110放入到货车式贮藏部150中或将基板保持器110从货车式贮藏部150移除时,优选地,应当控制镀敷设备以锁住货车式贮藏部150,使其不能从镀敷设备中移去。因此,镀敷设备包括用于掌握和控制基板保持器运送器140的运转状态的基板保持器运送器控制器210(参见图30)。When the substrate holder transporter 140 puts the substrate holder 110 into or removes the substrate holder 110 from the truck storage 150, preferably, the plating apparatus should be controlled to lock the truck. Storage section 150, so that it cannot be removed from the plating equipment. Therefore, the plating apparatus includes a substrate holder carrier controller 210 (see FIG. 30 ) for grasping and controlling the operating state of the substrate holder carrier 140 .

图30是显示镀敷设备的控制器200、基板保持器运送器140、贮藏部安装部分160、贮藏部触碰指示部250和可触碰/不触碰显示部260之间联系的方框图。如图30所示,镀敷设备包括控制器200,该控制器200包括基板保持器运送器控制器210、贮藏部安装部分控制器220、指示部控制器230和显示部控制器240。30 is a block diagram showing the connection between the controller 200 of the plating apparatus, the substrate holder carrier 140, the storage installation part 160, the storage touch indication part 250 and the touchable/untouchable display part 260. As shown in FIG. 30 , the plating apparatus includes a controller 200 including a substrate holder carrier controller 210 , a storage section installation section controller 220 , an indication section controller 230 , and a display section controller 240 .

基板保持器运送器控制器210监测和控制基板保持器运送器140,并接收来自被安装在基板保持器运送器140上的传感器144的检测信号(参见图4A到4C)。贮藏部安装部分控制器220监测和控制贮藏部安装部分160的各个组件,包括门161、用于锁住门161的门开关165b、闸板162、和用于锁住闸板162的闸板开关165a。The substrate holder transporter controller 210 monitors and controls the substrate holder transporter 140 and receives a detection signal from a sensor 144 mounted on the substrate holder transporter 140 (see FIGS. 4A to 4C ). The storage section installation section controller 220 monitors and controls various components of the storage section installation section 160, including the door 161, the door switch 165b for locking the door 161, the shutter 162, and the shutter switch for locking the shutter 162 165a.

指示部控制器230接收来自贮藏部触碰指示部250的触碰指示。显示部控制器240控制可触碰/不可触碰显示部260,基于关于贮藏部安装部分160是否能够被触碰的信息显示贮藏部安装部分160可触碰或贮藏部安装部分160不可触碰。The indication part controller 230 receives a touch indication from the storage part touch indication part 250 . The display controller 240 controls the touchable/untouchable display 260 to display that the storage installation part 160 is touchable or the storage installation part 160 is not touchable based on the information on whether the storage installation part 160 can be touched.

贮藏部触碰指示部250(以下简称“指示部”)向指示部控制器230指示将货车式贮藏部150从贮藏部安装部分160取出过程的操作开始和货车式贮藏部150返回贮藏部安装部分160的操作的过程的结束,并控制基板保持器运送器控制器210以限制基板保持器运送器140对贮藏部安装部分160的触碰。指示部250的形式可以是用于输入处理指令的可触面板或设置在靠近镀敷设备的后表面的专用按钮。指示部250向指示部控制器230指示货车式贮藏部150可触碰,指示部控制器230将指示传送到基板保持器运送器控制器210。基板保持器运送器控制器210限制通过基板保持器运送器140对贮藏部安装部分160的触碰。The storage part touches the instruction part 250 (hereinafter referred to as "instruction part") to instruct the instruction part controller 230 to start the operation of taking out the truck type storage part 150 from the storage part installation part 160 and to return the truck type storage part 150 to the storage part installation part 160 , and the substrate holder transporter controller 210 is controlled to restrict the substrate holder transporter 140 from touching the storage unit installation part 160 . The indicating part 250 may be in the form of a touch panel for inputting processing instructions or a dedicated button provided near the rear surface of the plating apparatus. The instructing part 250 instructs the instructing part controller 230 that the cart storage part 150 is accessible, and the instructing part controller 230 transmits the instruction to the substrate holder transporter controller 210 . The substrate holder carrier controller 210 restricts access to the storage installation part 160 by the substrate holder carrier 140 .

当指示部250向指示部控制器230指示即将发生的对货车式贮藏部150的触碰,指示部控制器230发送该指示到贮藏部安装部分控制器220。贮藏部安装部分控制器220基于贮藏部安装部分160的状态和基板保持器运送器140的运转状态,确定对贮藏部安装部分160的可触碰性或不可触碰性,其中基板保持器运送器140的运转状态由基板保持器运送器控制器210掌控。可触碰/不可触碰显示部260向操作者显示经确定的可触碰性或不可触碰性。When the indication part 250 indicates to the indication part controller 230 that a touch on the truck-type storage part 150 is about to occur, the indication part controller 230 sends the indication to the storage part installation part controller 220 . The storage installation section controller 220 determines the accessibility or inaccessibility to the storage installation section 160 based on the state of the storage installation section 160 and the operating state of the substrate holder transporter 140, wherein the substrate holder transporter 140 The operating state of 140 is controlled by the substrate holder transporter controller 210 . The touchable/untouchable display part 260 displays the determined touchability or untouchability to the operator.

可触碰/不可触碰显示部260可以包括灯泡、GUI屏幕图像或警报器,以向操作者或设备使用者指示可触碰或不可触碰。可触碰/不可触碰显示部260可以显示关于货车式贮藏部150是否被安装在贮藏部安装部分160中的信息,以允许操作者容易地确认贮藏部安装部分160是否可触碰以及贮藏部安装部分160的状态。The touchable/untouchable display 260 may include a light bulb, a GUI screen image, or an alarm to indicate to an operator or device user whether it is touchable or not. The touchable/non-touchable display part 260 may display information on whether the cart type storage part 150 is installed in the storage part installation part 160, to allow the operator to easily confirm whether the storage part installation part 160 is accessible and whether the storage part installation part 160 is accessible or not. The state of the installed part 160.

当基板保持器运送器140被操作以将基板保持器110存储在货车式贮藏部150中时,对货车式贮藏部150的触碰被禁止,贮藏部安装部分控制器220判断出货车式贮藏部150为不可触碰。当贮藏部安装部分控制器220判断货车式贮藏部150为不可触碰时,门161被牢固地锁住,以防止门161被意外地打开。When the substrate holder transporter 140 is operated to store the substrate holder 110 in the cart storage 150, touching to the cart storage 150 is prohibited, and the storage installation part controller 220 judges that the cart storage 150 is untouchable. When the storage unit installation part controller 220 judges that the truck type storage unit 150 is untouchable, the door 161 is firmly locked to prevent the door 161 from being accidentally opened.

门161通过由开关165锁住,开关165由用于锁住闸板162的闸板开关165a和用于锁住门161的门开关165b组成。The door 161 is locked by a switch 165 consisting of a shutter switch 165 a for locking the shutter 162 and a door switch 165 b for locking the door 161 .

门161可以包括打开和关闭传感器,以防止以下这种情况:即尽管闸板162被打开,但由于用于锁住门161的门开关165发生故障的某些原因,门161也被打开。该打开和关闭传感器没有显示。还可以包括联锁机构,当门161被打开时,联锁机构可以被用于检测并基于来自开口和关闭传感器的信号产生出错信号。The door 161 may include an opening and closing sensor to prevent a situation in which the door 161 is opened due to some reason that a door switch 165 for locking the door 161 malfunctions although the shutter 162 is opened. The opening and closing sensors are not shown. An interlock mechanism may also be included which may be used to detect when the door 161 is opened and generate an error signal based on the signals from the opening and closing sensors.

在本实施例中,被安装在基板保持器运送器140上的传感器144(参见图4A到4C)还被用于检测存储在货车式贮藏部15中的基板保持器110的数量和位置。当镀敷设备被启动和初始化时,传感器144检测存储在货车式贮藏部150中的基板保持器110的数量和位置。随后,根据用于开始镀敷处理的指令,基板保持器运送器140将基板保持器110从货车式贮藏部150中移去。镀敷设备的控制器200总是掌握哪个基板保持器110已经被从货车式贮藏部150中取出。因此,在货车式贮藏部150被从贮藏部安装部分160移去之前,镀敷设备的控制器200能够知道多少基板保持器110被存储在货车式贮藏部150中。另外,在货车式贮藏部150被从贮藏部安装部分160移去之前,基板保持器110可以被再次检测和检查。In this embodiment, the sensor 144 (see FIGS. 4A to 4C ) mounted on the substrate holder transporter 140 is also used to detect the number and position of the substrate holders 110 stored in the cart storage 15 . The sensor 144 detects the number and position of the substrate holders 110 stored in the truck storage 150 when the plating apparatus is activated and initialized. Subsequently, the substrate holder transporter 140 removes the substrate holder 110 from the cart storage 150 according to an instruction for starting the plating process. The controller 200 of the plating system always knows which substrate holder 110 has been removed from the truck storage 150 . Therefore, the controller 200 of the plating apparatus can know how many substrate holders 110 are stored in the cart storage 150 before the cart storage 150 is removed from the storage installation part 160 . In addition, the substrate holder 110 may be inspected and inspected again before the cart storage unit 150 is removed from the storage unit installation portion 160 .

然后,货车式贮藏部150被从镀敷设备中移去,存储在货车式贮藏部150中的基板保持器110被维护,货车式贮藏部150被放回镀敷设备中。当货车式贮藏部150被放回贮藏部安装部分160时,传感器144检测货车式贮藏部150中的基板保持器110。此时,如果在货车式贮藏部150被放回到贮藏部安装部分160之后检测到的基板保持器110的数量大于在货车式贮藏部150被从贮藏部安装部分160移去之前检测到的基板保持器110的数量,传感器144可以发送报警信号。因为基板保持器110的数量增加意味着货车式贮藏部150将没有可供镀敷设备中的基板保持器110被放回的空间,所以传感器144要发生报警信号。Then, the cart storage 150 is removed from the plating apparatus, the substrate holders 110 stored in the cart storage 150 are maintained, and the cart storage 150 is put back into the plating apparatus. When the cart storage unit 150 is put back into the storage unit installation portion 160 , the sensor 144 detects the substrate holder 110 in the cart storage unit 150 . At this time, if the number of substrate holders 110 detected after the cart storage unit 150 is put back into the storage unit installation portion 160 is greater than the number of substrates detected before the truck storage unit 150 is removed from the storage unit installation portion 160 Depending on the number of holders 110, the sensor 144 can send an alarm signal. The sensor 144 is to generate an alarm signal because the increased number of substrate holders 110 means that the cart storage 150 will have no room for the substrate holders 110 in the plating plant to be put back.

当货车式贮藏部150被从镀敷设备移去,贮藏在其中的基板保持器110被维护,然后已被维护的基板保持器110被放回到货车式贮藏部150中,已被维护的基板保持器110可以贮藏在货车式贮藏部150中与其被移去的原位置不同的位置上。此时,当已被维护的基板保持器110被放回到货车式贮藏部150时,基板保持器110被如上所述地检测,基板保持器110在货车式贮藏部150中的的位置信息被更新。因此,当基板保持器运送器140将基板保持器110放回到货车式贮藏部150时,如果基板保持器110要被贮藏的位置已经被另一个基板保持器110占据,传感器144将检测到另一个基板保持器110已经占据了该位置,并产生用于停止基板保持器运送器140将基板保持器110放回的信号。传感器144不是一定要被安装在基板保持器运送器140内,而是可以被安装在能够检测被贮藏在货车式贮藏部150中的基板保持器110的数量和位置的任何位置上。When the truck-type storage part 150 is removed from the plating apparatus, the substrate holders 110 stored therein are maintained, and then the maintained substrate holders 110 are put back into the truck-type storage part 150, the maintained substrates The holder 110 may be stored in a location in the cart storage portion 150 that is different from the original location from which it was removed. At this time, when the maintained substrate holder 110 is put back into the truck storage unit 150, the substrate holder 110 is detected as described above, and the position information of the substrate holder 110 in the truck storage unit 150 is obtained. renew. Therefore, when the substrate holder transporter 140 returns the substrate holder 110 to the truck storage section 150, if the location where the substrate holder 110 is to be stored is already occupied by another substrate holder 110, the sensor 144 will detect that another A substrate holder 110 has already occupied this position and a signal is generated for stopping the substrate holder transporter 140 to put the substrate holder 110 back. The sensor 144 is not necessarily installed in the substrate holder transporter 140 , but may be installed in any position capable of detecting the number and position of the substrate holders 110 stored in the truck storage unit 150 .

为了将货车式贮藏部150可靠地放入贮藏部安装部分160和从贮藏部安装部分160取出,当货车式贮藏部150被放入贮藏部安装部分160和从贮藏部安装部分160中取出时,基板保持器运送器140被防止移动到贮藏部安装部分160上方的位置。基板保持器运送器140被防止通过例如移动基板保持器运送器140的伺服电机的驱动部而被移动到贮藏部安装部分160上方的位置。In order to reliably put the truck type storage unit 150 into the storage unit installation portion 160 and take it out from the storage unit installation portion 160, when the truck type storage unit 150 is put into the storage unit installation portion 160 and taken out from the storage unit installation portion 160, The substrate holder transporter 140 is prevented from moving to a position above the storage installation part 160 . The substrate holder carrier 140 is prevented from being moved to a position above the storage installation part 160 by, for example, a driving part of a servo motor that moves the substrate holder carrier 140 .

以下将参考图31A到31E描述用于将货车式贮藏部150放入贮藏部安装部分160和将货车式贮藏部150从贮藏部安装部分160移去的操作。图31A到31E是示意地显示用于的将货车式贮藏部150放入贮藏部安装部分160和将货车式贮藏部150从贮藏部安装部分160移去的操作过程的立体图。Operations for putting the cart type storage unit 150 into and removing the cart type storage unit 150 from the storage portion installation portion 160 will be described below with reference to FIGS. 31A to 31E . 31A to 31E are perspective views schematically showing the operation process for putting the cart type storage unit 150 into the storage portion mounting portion 160 and removing the cart type storage portion 150 from the storage portion mounting portion 160. FIG.

首先,如图31A所示,货车型贮藏部150被移动到靠近贮藏部安装部分160的门161的位置。然后,如图31B所示,门161打开。当传感器检测到正在接近的货车型贮藏部150时,门161可以被手动地打开或可以被自动地打开。然后,如图31C所示,货车型贮藏部150被移入贮藏部安装部分160的预定位置。如图31D所示,在门161被关闭后,确认货车型贮藏部150被放到贮藏部安装部分160的预定位置。然后,如图31E所示,在确认货车型贮藏部150被放入到贮藏部安装部分160中的预定位置后,门161被关闭,贮藏部安装部分160中的闸板162被打开。贮藏部安装部分160可能具有用于指示闸板162被打开并且货车型贮藏部150可以被进行镀敷处理的显示部。First, as shown in FIG. 31A , the truck-type storage unit 150 is moved to a position close to the door 161 of the storage unit installation portion 160 . Then, as shown in Fig. 31B, the door 161 is opened. When the sensor detects the approaching truck type storage 150, the door 161 may be opened manually or may be opened automatically. Then, as shown in FIG. 31C , the truck type storage unit 150 is moved into a predetermined position of the storage unit installation portion 160 . As shown in FIG. 31D , after the door 161 is closed, it is confirmed that the truck type storage unit 150 is put in a predetermined position of the storage unit installation portion 160 . Then, as shown in FIG. 31E , after confirming that the truck type storage unit 150 is put into a predetermined position in the storage unit installation portion 160 , the door 161 is closed, and the shutter 162 in the storage unit installation portion 160 is opened. The storage unit installation portion 160 may have a display portion for indicating that the shutter 162 is opened and that the truck type storage unit 150 may be subjected to a plating process.

货车型贮藏部150以如下步骤从贮藏部安装部分160中移去:The truck type storage unit 150 is removed from the storage unit installation portion 160 in the following steps:

首先,如图31D所示,确认门161被关闭,然后闸板162被关闭。然后,如图31C所示,门161被打开。货车型贮藏部150现在开始从贮藏部安装部分160中移去。如图31B所示,货车型贮藏部150从贮藏部安装部分160移出,直到货车型贮藏部150完全地与贮藏部安装部分160分离。在确认货车型贮藏部150完全地与贮藏部安装部分160分离后,门161被关闭,如图31A所示。First, as shown in FIG. 31D, it is confirmed that the door 161 is closed, and then the shutter 162 is closed. Then, as shown in Fig. 31C, the door 161 is opened. The truck type storage unit 150 is now removed from the storage unit mounting portion 160 . As shown in FIG. 31B , the truck type storage unit 150 is removed from the storage unit installation portion 160 until the truck type storage unit 150 is completely separated from the storage unit installation portion 160 . After confirming that the truck-type storage unit 150 is completely separated from the storage unit installation portion 160, the door 161 is closed, as shown in FIG. 31A.

以下将参考附图32描述当镀敷设备在运转时,用于将货车型贮藏部150放入贮藏部安装部分160和将货车型贮藏部150从贮藏部安装部分160移去的操作。图32是该操作过程的流程图,其中连续的步骤通过标识的参考标号标识,并且之前加有前缀“S”。Operations for putting the truck type storage unit 150 into and removing the truck type storage unit 150 from the storage unit installation portion 160 when the plating apparatus is in operation will be described below with reference to FIG. 32 . Fig. 32 is a flowchart of the process of operation, in which successive steps are identified by identified reference numerals and preceded by the prefix "S".

当镀敷设备在正常运转时,货车型贮藏部150被放入贮藏部安装部分160,门161被关闭和锁住,闸板162被打开(步骤S101)。When the plating apparatus is in normal operation, the truck type storage part 150 is put into the storage part installation part 160, the door 161 is closed and locked, and the shutter 162 is opened (step S101).

当为了对货车型贮藏部150中的基板保持器110进行维护而必需将货车型贮藏部150从贮藏部安装部分160移去时,例如,指示部250发送将货车型贮藏部150从贮藏部安装部分160移出操作开始的指示,指示部控制器230接收来自指示部250的指示(步骤S102)。当指示部控制器230接收来自指示部250的指示时,基板保持器运送器控制器210确认基板保持器运送器140的状态。基于被基板保持器运送器210确认的基板保持器140的状态,贮藏部安装部分控制器220确定货车型贮藏部150是否可触碰或不可触碰,例如,基板保持器运送器140是否将基板保持器110从货车型贮藏部150移去或基板保持器运送器140是否将基板保持器110放进货车型贮藏部150(步骤S103)。When it is necessary to remove the truck-type storage unit 150 from the storage unit installation part 160 in order to maintain the substrate holder 110 in the truck-type storage unit 150, for example, the instructing part 250 sends a message to install the truck-type storage unit 150 from the storage unit. The part 160 moves out the instruction of operation start, and the instruction part controller 230 receives the instruction from the instruction part 250 (step S102). When the instructing section controller 230 receives an instruction from the instructing section 250 , the substrate holder transporter controller 210 confirms the state of the substrate holder transporter 140 . Based on the state of the substrate holder 140 confirmed by the substrate holder transporter 210, the storage unit installation section controller 220 determines whether the truck-type storage unit 150 is accessible or not, for example, whether the substrate holder transporter 140 places the substrate Whether the holder 110 is removed from the truck-type storage unit 150 or the substrate holder transporter 140 puts the substrate holder 110 into the truck-type storage unit 150 (step S103 ).

如果贮藏部安装部分控制器220判断货车型贮藏部150为不可触碰,显示部控制器240控制可触碰/不可触碰显示部260以指示货车型贮藏部150是不可触碰的(步骤S104)。此时,门161保持锁定且不能打开。随后,如果基板保持器运送器140的状态不久后被改变,贮藏部安装部分控制器220判断货车型贮藏部150为可触碰,控制进行到步骤S105If the storage part installation part controller 220 judges that the truck type storage part 150 is untouchable, the display part controller 240 controls the touchable/untouchable display part 260 to indicate that the truck type storage part 150 is untouchable (step S104 ). At this time, the door 161 remains locked and cannot be opened. Subsequently, if the state of the substrate holder carrier 140 is changed shortly thereafter, the storage unit installation section controller 220 judges that the truck type storage unit 150 is accessible, and the control proceeds to step S105.

如果贮藏部安装部分控制器220判断货车型贮藏部150为可触碰,显示部控制器240控制可触碰/不可触碰显示部260,以显示货车型贮藏部150是可触碰的(步骤S105)。闸板162通过开关165a被关闭和锁住,门161通过开关165b被释放,并释放联锁机构。贮藏部安装部分控制器220现在允许门161被打开(步骤S106)。If the storage part installation part controller 220 judges that the truck type storage part 150 is touchable, the display part controller 240 controls the touchable/untouchable display part 260 to display that the truck type storage part 150 is touchable (step S105). The shutter 162 is closed and locked by the switch 165a, the door 161 is released by the switch 165b, and the interlock mechanism is released. The storage installation part controller 220 now allows the door 161 to be opened (step S106).

当门161被打开以允许触碰货车型贮藏部150时,贮藏部锁或锁销159可以被手动地释放。贮藏部安装部分控制器220使用安装在贮藏部安装部分160上的传感器等检测到货车型贮藏部150从贮藏部安装部分160被移去(步骤S107)。Storage lock or latch 159 may be manually released when door 161 is opened to allow access to van-type storage 150 . The storage unit installation part controller 220 detects that the truck type storage unit 150 is removed from the storage unit installation part 160 using a sensor or the like installed on the storage unit installation part 160 (step S107).

在货车型贮藏部150被从贮藏部安装部分160移去后,门161被关闭,贮藏部安装部分控制器220检测到门161被关闭(步骤S108)。从贮藏部安装部分160中被移去的货车型贮藏部150中的基板保持器110被从货车型贮藏部150中取出并被维护(步骤S109)。当基板保持器110的维护完成后,门161被打开并将货车型贮藏部150放回贮藏部安装部分160。门161的打开通过贮藏部安装部分控制器220被检测(步骤S110)。After the truck type storage part 150 is removed from the storage part installation part 160, the door 161 is closed, and the storage part installation part controller 220 detects that the door 161 is closed (step S108). The substrate holder 110 in the truck-type storage unit 150 removed from the storage unit installation portion 160 is taken out from the truck-type storage unit 150 and maintained (step S109 ). When the maintenance of the substrate holder 110 is completed, the door 161 is opened and the truck type storage part 150 is put back into the storage part installation part 160 . The opening of the door 161 is detected by the storage installation part controller 220 (step S110).

货车型贮藏部150被放置在贮藏部安装部分160中,然后通过贮藏部锁或锁销159被锁住。通过贮藏部安装部分控制器220检测到货车型贮藏部150在贮藏部安装部分160中通过贮藏部锁或锁销159被锁住(步骤S111)。在货车型贮藏部150被放置在贮藏部安装部分160中并通过贮藏部锁或锁销159被锁住后,门161被关闭。门161的关闭通过贮藏部安装部分控制器220被检测(步骤S112)。The truck type storage unit 150 is placed in the storage unit mounting portion 160 and then locked by the storage unit lock or pin 159 . It is detected by the storage installation part controller 220 that the truck type storage 150 is locked in the storage installation part 160 by the storage lock or the lock pin 159 (step S111). After the truck type storage unit 150 is placed in the storage unit mounting portion 160 and locked by the storage unit lock or latch 159, the door 161 is closed. The closing of the door 161 is detected by the storage installation part controller 220 (step S112).

当指示部250发送货车型贮藏部150的安装完成的指示后,指示部控制器230接收来自指示部250的指示(步骤S113)。贮藏部安装部分控制器220控制开关165b,以锁住门161,并且贮藏部安装部分控制器220控制开关165a以释放和打开闸板162(步骤S114)。在闸板162在步骤S105中被关闭后,直至步骤S114,闸板162被保持关闭以阻挡外界空气进入。When the instruction unit 250 sends an instruction that the installation of the truck-type storage unit 150 is completed, the instruction unit controller 230 receives the instruction from the instruction unit 250 (step S113 ). The storage installation part controller 220 controls the switch 165b to lock the door 161, and the storage installation part controller 220 controls the switch 165a to release and open the shutter 162 (step S114). After the shutter 162 is closed in step S105, until step S114, the shutter 162 is kept closed to block outside air from entering.

在本实施例中,货车型贮藏部150将基板保持器110贮藏在其中。如果镀敷设备为执行电子镀敷的镀敷设备,货车型贮藏部150可以存储阳极保持器以在镀敷槽中使用,或者可以存储基板保持器110和阳极保持器两者。在基板保持器110和阳极保持器被存储在货车型贮藏部150中的情况下,用于将基板保持器110存储在货车型贮藏部150中的基板保持器储存区还起到阳极保持器储存区的作用。In the present embodiment, the truck-type storage unit 150 stores the substrate holder 110 therein. If the plating apparatus is a plating apparatus performing electroplating, the van-type storage part 150 may store the anode holder for use in the plating tank, or may store both the substrate holder 110 and the anode holder. In the case where the substrate holder 110 and the anode holder are stored in the truck-type storage section 150, the substrate holder storage area for storing the substrate holder 110 in the truck-type storage section 150 also functions as anode holder storage. role of the district.

保持阳极的阳极保持器被放置在镀敷槽中的镀敷溶液中。在镀敷槽中,阳极通过阳极保持器被保持,基板500通过基板保持器110被设置成与阳极相对,阳极和基板500的表面相互平行。当镀敷电源在阳极和基板500之间提供电流时,从基板保持器110露出的基板500的将要被镀敷的表面被电子镀敷。阳极保持器的外形与显示在图3中的基板保持器110的外轮廓相似,例如,阳极保持器包括主体、吊架和手柄,阳极保持器把阳极保持在主体上。通过阳极保持器保持的阳极被电连接到位于吊架上的电源馈送触点,该连接方法与图3所示的大致相同。The anode holder holding the anode is placed in the plating solution in the plating tank. In the plating bath, the anode is held by the anode holder, the substrate 500 is disposed opposite to the anode by the substrate holder 110 , and the surfaces of the anode and the substrate 500 are parallel to each other. When the plating power supply supplies current between the anode and the substrate 500, the surface to be plated of the substrate 500 exposed from the substrate holder 110 is electronically plated. The shape of the anode holder is similar to that of the substrate holder 110 shown in FIG. 3 , for example, the anode holder includes a main body, a hanger and a handle, and the anode holder holds the anode on the main body. The anodes held by the anode holders were electrically connected to the power feed contacts located on the hanger in much the same way as shown in FIG. 3 .

阳极保持器以如下方法被放置在货车型贮藏部中:首先,阳极保持器被从镀敷槽中向上拉出。阳极保持器通常的具有阳极后部,用于防止阳极残渣扩散。因此,当阳极保持器被从镀敷槽向上拉出后,在短时间内,镀敷溶液仍继续从阳极后部滴下。在镀敷溶液液滴开始以足够长的间隔滴落,阳极保持器在冲洗槽中被冲洗。当大部分冲洗水被从阳极保持器去除时,阳极保持器被放回到货车型贮藏部150中。因为即使在阳极保持器被贮藏在货车型贮藏部150中后镀敷溶液仍然继续从阳极保持器滴落,位于货车型贮藏部150的下部分或底部的排水盘158接收和保持滴落的镀敷溶液。The anode holder is placed in the truck-type storage in the following manner: First, the anode holder is pulled upwards from the plating tank. Anode holders typically have an anode rear to prevent diffusion of anode residue. Thus, the plating solution continues to drip from the rear of the anode for a short time after the anode holder is pulled upwards from the plating tank. After the plating solution droplets start to drip at sufficiently long intervals, the anode holder is rinsed in the rinse tank. When most of the rinse water has been removed from the anode holder, the anode holder is placed back into the truck type storage 150 . Because the plating solution continues to drip from the anode holder even after the anode holder is stored in the truck-type storage portion 150, the drain pan 158 located at the lower portion or bottom of the truck-type storage portion 150 receives and holds the dripping plating solution. Apply the solution.

存储有阳极保持器的货车型贮藏部150具有与存储有基板保持器110的货车型贮藏部150相同的优点。具体来说,因为货车型贮藏部150能够被从镀敷设备中拉出,以及阳极保持器能够被放入在镀敷设备外的货车型贮藏部和从在镀敷设备外的货车型贮藏部取出,与如果阳极保持器是通过在镀敷设备中的升降机人工地放入货车型贮藏部和从货车型贮藏部拿出相比,操作者的负担较小。The truck-type storage unit 150 storing the anode holders has the same advantages as the truck-type storage unit 150 storing the substrate holders 110 . Specifically, because the truck type storage part 150 can be pulled out from the plating equipment, and the anode holder can be put into the truck type storage part outside the plating equipment and from the truck type storage part outside the plating equipment Taking out is less burdensome on the operator than if the anode holder is manually put in and out of the truck-type storage by means of a lift in the plating plant.

在本实施例中,货车型贮藏部150被用作贮藏部。也可以使用被构造成沿着轨道移进贮藏部安装部分和从贮藏部安装部分移出的贮藏部,而不使用货车型贮藏部150。In the present embodiment, the truck-type storage unit 150 is used as the storage unit. Instead of using the truck-type storage 150 , a storage configured to move into and out of the storage installation portion along rails may also be used.

虽然已经详细描述了本发明的某些优选实施例,本发明不局限于上述实施例,并且应该理解的是可以在不脱离附加的权利要求的范围里在其中做出各种变化和修改。Although certain preferred embodiments of the present invention have been described in detail, the present invention is not limited to the above-described embodiments, and it should be understood that various changes and modifications may be made therein without departing from the scope of the appended claims.

Claims (8)

1. a plating apparatus, it is characterised in that described plating apparatus includes:
Plating portion, described plating portion is used for plating substrate;
Substrate holder, described substrate holder is used for keeping described substrate;
Substrate holder conveyer, described substrate holder conveyer is used for keeping and transport described substrate holder;
Storage unit, described storage unit is used for storing described substrate holder;With
Mounting portion, storage unit, mounting portion, described storage unit is for being stored in described storage unit in mounting portion, described storage unit;
Wherein, described storage unit includes travel mechanism, and described travel mechanism for moving into described plating apparatus and removing described storage unit from described plating apparatus by described storage unit;And
Wherein, mounting portion, described storage unit includes:
Door, described door can selectively open and close, and described door is arranged in the opening, and wherein by described opening, described storage unit can move into described plating apparatus or remove from described plating apparatus;With
Flashboard, described flashboard can selectively open and close, and for when described door is opened, makes the air in mounting portion, described storage unit and the air in described plating apparatus be isolated from each other.
2. plating apparatus as claimed in claim 1, it is characterised in that described travel mechanism includes castor, and described castor is for moving and separate described storage unit from described plating apparatus.
3. plating apparatus as claimed in claim 1, it is characterized in that, described substrate holder conveyer includes that sensor, described sensor are used for detecting the most described substrate holder is positioned in described storage unit, or detects described substrate holder position in described storage unit.
4. plating apparatus as claimed in claim 1, it is characterised in that farther include:
Controller, described controller is for being monitored and controlled described substrate holder conveyer and the state of mounting portion, described storage unit;With
Indicating section, described indicating section for indicating the movement of described storage unit to described controller.
5. plating apparatus as claimed in claim 1, it is characterized in that, described storage unit includes lock pin handle, and described lock pin handle is for being locked in described storage unit in mounting portion, described storage unit, and mounting portion, described storage unit includes the lock pin acceptance division for engaging with described lock pin handle.
6. plating apparatus as claimed in claim 1, it is characterized in that, mounting portion, described storage unit includes the door trip of the unlatching for limiting described door and switchs for limiting the flashboard opened of described flashboard, and wherein, described door trip and described flashboard switch co-operate.
7. plating apparatus as claimed in claim 1, it is characterised in that described storage unit includes being arranged on the drain pan bottom described storage unit.
8. plating apparatus as claimed in claim 1, it is characterised in that described storage unit includes substrate holder memory block, and described substrate holder memory block can store anode holder in this substrate holder memory block.
CN201210069120.8A 2010-10-21 2012-03-15 Plating equipment and plating method Expired - Fee Related CN102888647B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201610452990.1A CN106149031B (en) 2011-07-19 2012-03-15 Plating apparatus
CN201610453013.3A CN106119919B (en) 2010-10-21 2012-03-15 Plating apparatus, method for plating and change substrate holder for removably keeping substrate posture method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010236524 2010-10-21
JP2011158484A JP5750327B2 (en) 2010-10-21 2011-07-19 Plating apparatus, plating processing method, and attitude changing method of substrate holder for plating apparatus
JP2011-158484 2011-07-19

Related Child Applications (2)

Application Number Title Priority Date Filing Date
CN201610453013.3A Division CN106119919B (en) 2010-10-21 2012-03-15 Plating apparatus, method for plating and change substrate holder for removably keeping substrate posture method
CN201610452990.1A Division CN106149031B (en) 2011-07-19 2012-03-15 Plating apparatus

Publications (2)

Publication Number Publication Date
CN102888647A CN102888647A (en) 2013-01-23
CN102888647B true CN102888647B (en) 2016-08-03

Family

ID=57528775

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201210069120.8A Expired - Fee Related CN102888647B (en) 2010-10-21 2012-03-15 Plating equipment and plating method
CN201610453013.3A Expired - Fee Related CN106119919B (en) 2010-10-21 2012-03-15 Plating apparatus, method for plating and change substrate holder for removably keeping substrate posture method

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201610453013.3A Expired - Fee Related CN106119919B (en) 2010-10-21 2012-03-15 Plating apparatus, method for plating and change substrate holder for removably keeping substrate posture method

Country Status (2)

Country Link
JP (2) JP5750327B2 (en)
CN (2) CN102888647B (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9859141B2 (en) * 2010-04-15 2018-01-02 Suss Microtec Lithography Gmbh Apparatus and method for aligning and centering wafers
JP6077886B2 (en) 2013-03-04 2017-02-08 株式会社荏原製作所 Plating equipment
JP6247557B2 (en) * 2014-02-14 2017-12-13 株式会社Jcu Substrate plating jig
JP6251124B2 (en) * 2014-06-09 2017-12-20 株式会社荏原製作所 Substrate attaching / detaching portion for substrate holder and wet substrate processing apparatus provided with the same
WO2015199047A1 (en) * 2014-06-26 2015-12-30 株式会社村田製作所 Plating jig
JP6607517B2 (en) * 2015-07-15 2019-11-20 日新イオン機器株式会社 Ion beam irradiation equipment
JP6675257B2 (en) * 2016-04-14 2020-04-01 株式会社荏原製作所 Plating apparatus and plating method
JP6659467B2 (en) * 2016-06-03 2020-03-04 株式会社荏原製作所 Plating apparatus, substrate holder, method of controlling plating apparatus, and storage medium storing program for causing computer to execute method of controlling plating apparatus
JP6695750B2 (en) * 2016-07-04 2020-05-20 株式会社荏原製作所 Substrate holder inspection device, plating device including the same, and visual inspection device
JP6723889B2 (en) * 2016-09-28 2020-07-15 株式会社荏原製作所 Plating equipment
JP6727117B2 (en) * 2016-12-22 2020-07-22 株式会社荏原製作所 Substrate attachment/detachment device, plating device, substrate attachment/detachment device control device, storage medium storing a program for causing a computer to execute the method
JP6276449B1 (en) * 2017-03-30 2018-02-07 株式会社荏原製作所 Substrate processing apparatus, control method for substrate processing apparatus, and storage medium storing program
CN108657818B (en) * 2017-03-31 2024-04-26 可能可特科技(深圳)有限公司 A handling device based on FPC electroplating
JP7030497B2 (en) 2017-12-13 2022-03-07 株式会社荏原製作所 A storage medium that stores a board processing device, a control method for the board processing device, and a program.
JP6971922B2 (en) * 2018-06-27 2021-11-24 株式会社荏原製作所 Board holder
CN112585539A (en) * 2018-08-23 2021-03-30 Asml荷兰有限公司 Platform device and method for calibrating an object loading process
JP7100556B2 (en) * 2018-10-05 2022-07-13 株式会社荏原製作所 A device for causing the board holder to hold the board and / or releasing the holding of the board by the board holder, and a plating device having the same device.
CN111074230A (en) * 2018-10-19 2020-04-28 东泰高科装备科技有限公司 On-line detection device and method for coating uniformity and coating equipment
JP7058209B2 (en) 2018-11-21 2022-04-21 株式会社荏原製作所 How to hold the board in the board holder
JP7421340B2 (en) * 2020-01-06 2024-01-24 株式会社荏原製作所 Substrate processing equipment and substrate processing method
CN111074211A (en) * 2020-01-15 2020-04-28 苏州东福来机电科技有限公司 Electrosilvering equipment
TWI870551B (en) * 2020-02-20 2025-01-21 美商布魯克斯自動機械美國公司 Linear electrical machine, electromagnetic conveyor substrate transport apparatus, and method for linear electrical machine
CN112259493A (en) * 2020-10-19 2021-01-22 绍兴同芯成集成电路有限公司 Electroplating and chemical plating integrated process for ultrathin wafer
CN115365083B (en) * 2021-05-17 2024-06-11 亨泰光学股份有限公司 Bidirectional anode plasma chemical vapor deposition coating equipment
CN115094503B (en) * 2022-07-21 2023-10-03 北京浦丹光电股份有限公司 Automatic moving device for driving chip electroplating
CN115612975B (en) * 2022-10-13 2024-09-27 四川美呀意斐医疗科技有限公司 Super-hydrophilic treatment method for titanium alloy
CN120244826B (en) * 2025-06-04 2025-08-19 华海清科股份有限公司 Wafer carrying unit, post-processing device, overturning method and processing equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5628828A (en) * 1994-03-04 1997-05-13 Hitachi , Ltd. Processing method and equipment for processing a semiconductor device having holder/carrier with flattened surface
JP2003243473A (en) * 2002-02-15 2003-08-29 Nec Electronics Corp Conveying cart of semiconductor substrate carrier

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2636413A1 (en) * 1976-08-12 1978-02-16 Schering Ag DEVICE FOR COMPLETE AND PARTIAL TREATMENT OF THE SURFACES OF PARTS
JPH0723556B2 (en) * 1988-04-23 1995-03-15 富士通株式会社 Loading device for plating jig with frame on board
JPH0723557B2 (en) * 1988-04-25 1995-03-15 富士通株式会社 Substrate automatic loading device
JPH11255321A (en) * 1998-03-11 1999-09-21 Shinko Electric Co Ltd Flatbed push dolly
JP2002363794A (en) * 2001-06-01 2002-12-18 Ebara Corp Substrate holder and plating device
US6558750B2 (en) * 2001-07-16 2003-05-06 Technic Inc. Method of processing and plating planar articles
JP4162440B2 (en) * 2002-07-22 2008-10-08 株式会社荏原製作所 Substrate holder and plating apparatus
JP4124327B2 (en) * 2002-06-21 2008-07-23 株式会社荏原製作所 Substrate holder and plating apparatus
JP3778282B2 (en) * 2002-07-15 2006-05-24 株式会社荏原製作所 Substrate holder and plating apparatus
JP2004353004A (en) * 2003-05-27 2004-12-16 Ebara Corp Plating device
JP2006117966A (en) * 2004-10-19 2006-05-11 Ebara Corp Plating apparatus and plating method
CN102257186B (en) * 2008-11-14 2014-10-15 加布里埃尔·李普曼-公共研究中心 A system for plating a conductive substrate, and a substrate holder for holding a conductive substrate during plating thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5628828A (en) * 1994-03-04 1997-05-13 Hitachi , Ltd. Processing method and equipment for processing a semiconductor device having holder/carrier with flattened surface
JP2003243473A (en) * 2002-02-15 2003-08-29 Nec Electronics Corp Conveying cart of semiconductor substrate carrier

Also Published As

Publication number Publication date
CN106119919B (en) 2017-06-27
JP2012107311A (en) 2012-06-07
JP2015187306A (en) 2015-10-29
CN102888647A (en) 2013-01-23
CN106119919A (en) 2016-11-16
JP5750327B2 (en) 2015-07-22
JP6001134B2 (en) 2016-10-05

Similar Documents

Publication Publication Date Title
CN102888647B (en) Plating equipment and plating method
US9991145B2 (en) Plating apparatus and plating method
KR101853801B1 (en) Plating apparatus, plating method, stocker and method of converting attitude of substrate holder
US10077504B2 (en) Plating apparatus
US8864965B2 (en) Substrate holder and plating apparatus
US7762754B2 (en) Storage apparatus for transported object
US20070158291A1 (en) Reticle storage pod (rsp) transport system utilizing foup adapter plate
US10577714B2 (en) Plating apparatus and plating method
JP2008060513A (en) Treating device and treating method
JP3248129B2 (en) Substrate transfer processing equipment
CN107868975B (en) Plating apparatus
US7811422B2 (en) Electro-chemical processor with wafer retainer
JP5865979B2 (en) Plating apparatus and plating method
TWI830802B (en) Substrate holder, plating device, and plating method of substrate
CN112242320B (en) Substrate processing apparatus and substrate conveying method
JP2000156397A (en) Substrate treatment equipment

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160803

Termination date: 20210315