CN103311163A - Check valve applied to semiconductor storage device - Google Patents

Abstract

A check valve arranged in a semiconductor storage device comprises a circular column and a check member, wherein the check member is opened and closed through the elastic check member, so that excessive particles are prevented from being generated, and the pollution to articles in the semiconductor storage device is avoided.

Description

Check valve applied to semiconductor storage device

technical field

The present invention relates to a semiconductor storage device, in particular to a check valve configured in the semiconductor storage device; wherein, the semiconductor storage device may be a mask box or a wafer box.

Background technique

The rapid development of modern semiconductor technology, in which optical lithography (Optical Lithography) plays an important role, as long as it is about the definition of patterns, it needs to rely on optical lithography. In the application of optical lithography technology to semiconductors, the designed circuit is made into a light-transmitting mask (photo mask) with a specific shape. Using the exposure principle, the light source is projected onto the silicon wafer (silicon wafer) through a mask to expose and display a specific pattern. Since any dust particles (such as particles, dust or organic matter) attached to the mask will cause the quality of projection imaging to deteriorate, the mask used to generate graphics must be kept absolutely clean, and the projected silicon wafer or other semiconductor projection body It must also be kept absolutely quiet, so in general wafer processes, a cleanroom environment is provided to avoid particle contamination in the air. However, the current clean room cannot achieve absolute dust-free status.

Therefore, modern semiconductor processes use anti-pollution storage equipment for storage and transportation of masks and wafers to keep masks and wafers clean; anti-pollution semiconductor storage equipment is also used for storage and transportation of semiconductor components , to keep semiconductor components clean.

Semiconductor component storage equipment is used to store semiconductor components in the semiconductor process, to facilitate the handling and transmission of semiconductor components between machines, and to isolate the semiconductor components from contact with the atmosphere, and to prevent the semiconductor components from being polluted by impurities and changing. Therefore, in advanced semiconductor component factories, the cleanliness of mask storage equipment and semiconductor component storage equipment is usually required to comply with the Standard Mechanical Interface (SMIF), that is to say, to keep the cleanliness below Class 1. Therefore, filling gas into the mask storage device and the semiconductor device storage device is one of the current solutions.

Generally, the storage device is inflated and pumped through the check valve. As shown in Figure 1, the valve body usually has a valve body a disposed in the valve body storage tube b, a buckle c, and an elastic structure d It is sandwiched between the valve body a and the elastic structure d, and a filter e is arranged behind the buckle c; when the check valve is to be inflated, the valve body a will be pressed, so that the valve body a is separated from the valve body storage tube b to form Once there is a channel, the gas passes through the valve body storage tube b through the channel, and enters the storage device through the buckle c and the rear filter e; when the inflation is stopped, stop pressing the valve body a, and bounce the valve body a through the elastic structure d Return to the valve body storage tube b to form a closed state.

However, after many times of operation of the valve body a, it will rub against the components of the check valve for many times, so it is easy to generate a lot of particles, and the particles will contaminate the mask and crystal stored in the storage device. If the wafer is not round, the mask or wafer will be polluted, resulting in the dilemma that it cannot be used anymore and must be scrapped, which will increase the manufacturing cost. Therefore, it is an important issue to provide an inflatable device that does not generate pollutants.

In view of this, the non-return valves of the mask storage device and the wafer storage device provided by the present invention are improvements to the prior art.

Contents of the invention

In order to solve the above problems, a main purpose of the present invention is to provide a check valve arranged in the wafer box, through the opening and closing of the elastic single element itself, to prevent the generation of excessive particles, so as to avoid contamination of the wafer box. wafer.

According to the above purpose, the present invention provides a wafer box, which mainly includes a box body, an opening is formed on one side of the box body, and a door body, the door body is combined with the opening to form an accommodating space, Wafer placement is provided, wherein the wafer box is characterized in that: at least a pair of check valves are arranged in the box body, each check valve includes a circular column and a check piece, the circular column is a hollow cylinder, and The backstop is embedded in the circular column, wherein the backstop includes: a circular dome with a raised top and a circular bottom; a ring formed and surrounding the circular bottom; and at least A cut line extending from the center of the raised top to the rounded bottom.

Another main purpose of the present invention is to provide a non-return valve disposed in the mask box, through the opening and closing of a single element itself, to prevent excessive particles from being generated, so as to avoid contamination of the mask in the mask box.

According to the above purpose, the present invention provides a mask box, which mainly includes an upper cover and a lower cover. The upper cover is combined with the lower cover to form an accommodating space for placing the mask. The mask box is characterized in that : Dispose at least one pair of check valves in the mask box, each check valve includes a circular post and a check piece, the round post is a hollow cylinder, and the check piece is embedded in the round post Inside, wherein the backstop includes: a circular dome with a raised top and a rounded bottom; a ring formed and encircled around the rounded bottom; and at least one cutting line extending from the center of the raised top Extend towards the rounded bottom.

Through the design provided by the present invention, when the wafer box and the mask box are inflated and pumped, excessive particles can be prevented from polluting the semiconductor elements in the storage device.

Description of drawings

In order to illustrate the present invention more clearly, preferred embodiments are listed below and described in detail in conjunction with the accompanying drawings, wherein:

Fig. 1 is a schematic diagram of a known check valve;

Fig. 2 is a schematic diagram of a check valve of the present invention;

Fig. 3A is a schematic diagram of inflating the backstop of the present invention;

Fig. 3B is a schematic diagram of stopping inflation of the backstop of the present invention;

Fig. 4 is a schematic diagram of the check valve installed in the wafer box for the present invention;

FIG. 5 is a cross-sectional view of a check valve installed in a mask box according to the present invention.

Detailed ways

Since the present invention discloses a check valve, especially a check valve configured in a wafer box and a mask box; some of the elastic materials and filter membranes used in it are achieved by using the existing technology, so the following In the above description, it is not fully described. In addition, the drawings in the following texts are not completely drawn according to the actual relevant dimensions, and their function is only to express the schematic diagrams related to the features of the present invention.

First, please refer to FIG. 2 , which is a schematic diagram of the check valve of the present invention. As shown in Figure 2, the non-return valve 1 includes a circular post 10 and a non-return member 20, the circular post 10 is a hollow cylinder, and the non-return device 20 is embedded in the circular post 10, wherein the non-return The stopper 20 includes: a circular dome 201 with a raised top 2011 and a circular bottom 2013; a ring 203 formed and surrounding the circular bottom 2013; at least one cutting line 205 formed from the raised top 2011 The central part 2015 extends toward the circular bottom end 2013; the cutting lines 205 of the present invention are cut in a plurality of linear shapes, and are symmetrical to each other. and limit the quantity. The backstop member 20 is made of elastic material, such as fluorinated rubber, silica gel or rubber, but the invention does not limit the elastic material.

In addition, in the circular column 10, above the backstop 20, a filter membrane 30 is arranged. The filter membrane 30 has a microporous structure and mainly filters dust and impurities of the gas; the material used for the filter membrane 30 of the present invention is polystyrene. Vinyl fluoride (PTFE), but the present invention does not limit the material of the filter membrane 30 .

Next, please refer to FIG. 3A , which is a schematic diagram of inflating the backstop member of the present invention. As shown in Figure 3A, when the check valve 1 is inflated, the gas first enters from the A end, and the fluid pressure of the gas will stretch the valve 207 formed by at least one cutting line 205 of the backstop 20 (N can cut the line Form 2N valves, N=a natural number above 1), the channel 209 formed by the expanded valve 207 is inflated into; At the B end, complete the entire inflation step.

Next, please refer to FIG. 3B , which is a schematic diagram of stopping inflation of the non-return member of the present invention. As shown in Figure 3B, when the gas stops inflating, the valves 207 will return to the state where the valves 207 are closed to each other due to their elastic material; since the backstop 20 is in the shape of a dome and has a thickness, Therefore, the internal fluid pressure cannot push the valve 207, which prevents gas backflow.

In the embodiment of the present invention, when the diameter of the backstop 20 is 13 millimeters, the thickness of the valve 207 (i.e. the backstop) is 1.5 millimeters; The thickness of the conference increases relatively, but the present invention does not limit the relative ratio of diameter and thickness; in addition, the check valve 1 of the present invention can also be used for liquid or other fluids, and the present invention does not limit the type of fluid to be processed.

Please refer to FIG. 4 , which is a schematic diagram of the check valve installed in the wafer box according to the present invention. As shown in Figure 4, the wafer box 4 mainly includes a box body 40, an opening 401 is formed on one side of the box body 40, and a door body 42, the door body 42 is combined with the opening 401 to form a The accommodating space provides wafer placement; a pair of check valves 1 are arranged on the bottom 403 of the wafer box 4, and the pair of check valves 1 are an inflation valve 4031 and an exhaust valve 4033; since the check valve 1 is The air intake is in one direction, so the check pieces 20 inside the check valve 1 of the charging valve 4031 and the exhaust valve 4033 are arranged upside down.

Generally, in the wafer box 4, an inert gas will be filled inside to protect the wafers inside, so after a period of time, the gas inside will need to be replaced; therefore, when the gas needs to be replaced, the inflation valve 4031 should be inflated first, Simultaneously, the gas pumping valve 4033 is pumped again to replace the internal gas with new gas. It should be emphasized here that the present invention does not limit the arrangement positions of the inflation valve 4031 and the exhaust valve 4033, nor does it limit the number of arrangements, as long as they conform to the implementation effect of the present invention, they are all within the implementation scope of the present invention.

Please refer to FIG. 5 , which is a cross-sectional view of the check valve installed in the mask box according to the present invention. As shown in Figure 5, the mask box 5 mainly includes an upper cover 50 and a lower cover 52, the upper cover 50 is combined with the lower cover 52 to form an accommodating space for placing the mask; in the mask box 5 A pair of check valves 1 are arranged on the lower cover 52 of the hood, and the pair of check valves 1 are an inflation valve 521 and an air extraction valve 523; since the check valve 1 is a single direction air intake, the inflation valve 521 and the extraction valve The check pieces 20 inside the check valve 1 of 523 are arranged upside down.

Generally, in the mask box 5, an inert gas will be filled inside to protect the mask inside, so after a period of time, the gas inside will need to be replaced; therefore, when the gas needs to be replaced, the inflation valve 521 should be inflated first, Simultaneously, the exhaust valve 523 is pumped again to replace the internal gas with new gas. It should be emphasized here that the present invention does not limit the arrangement positions of the inflation valve 521 and the air extraction valve 523, nor does it limit the number of arrangements, as long as it meets the implementation effect of the present invention, it is within the implementation scope of the present invention.

Although the present invention is disclosed above with the foregoing preferred embodiments, it is not intended to limit the present invention. Any person familiar with the similar technology can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The scope of patent protection of the present invention must be defined by the scope of the claims of the present invention.

Claims (18)

1. a wafer cassette comprises a box body, forms an opening in a side of this box body, and a body, and this opening of this Men Tiyu combines, and forms an accommodation space, provides wafer to place, and wherein this wafer cassette is characterised in that:

At least one pair of non-return valve of configuration in this box body, each this non-return valve comprises a circular columns and a check spare, and this circular columns is a hollow cylinder, and this check spare is embedded in this circular columns, and wherein this check spare comprises:

One circular domes has protuberance top and a rounded bottom; And

At least one line of cut is extended toward this rounded bottom by the centre on this protuberance top.

2. wafer cassette according to claim 1 wherein in this circular columns of this non-return valve, further configures a filter membrane.

3. wafer cassette according to claim 1, wherein this is to be disposed in the bottom of this box body to non-return valve.

4. wafer cassette according to claim 1, wherein this is to take out non-return valve and to fill non-return valve to non-return valve.

5. wafer cassette according to claim 1 wherein should the circle domes have a thickness.

6. wafer cassette according to claim 1, it further comprises an annulus, is surrounded on this rounded bottom.

7. wafer cassette according to claim 1, wherein this line of cut is many and symmetrical in twos.

8. wafer cassette according to claim 1, wherein the material of this non-return valve is an elastic material.

9. wafer cassette according to claim 8, wherein this elastic material is Viton, silica gel or rubber.

10. a mask box comprises a loam cake and a lower cover, and this loam cake combines with this lower cover, and forms an accommodation space, provides mask to place, and wherein this mask box is characterised in that:

At least one pair of non-return valve of configuration in this mask box, each this non-return valve comprises a circular columns and a check spare, and this circular columns is a hollow cylinder, and this check spare is embedded in this circular columns, and wherein this check spare comprises:

One circular domes has protuberance top and a rounded bottom; And

At least one line of cut is extended toward this rounded bottom by the centre on this protuberance top.

11. mask box according to claim 10 wherein in this circular columns of this non-return valve, further configures a filter membrane.

12. mask box according to claim 10, wherein this to non-return valve be disposed at this lower cover in.

13. mask box according to claim 10, wherein this is to take out non-return valve and to fill non-return valve to non-return valve.

14. mask box according to claim 10 wherein should the circle domes have a thickness.

15. mask box according to claim 10, it further comprises an annulus, is surrounded on this rounded bottom.

16. mask box according to claim 10, wherein this line of cut is many and symmetrical in twos.

17. mask box according to claim 10, wherein the material of this non-return valve is an elastic material.

18. mask box according to claim 17, wherein this elastic material is Viton, silica gel or rubber.

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