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CN103361509B - Rolled copper foil, copper-clad laminated board, flexible printing wiring board and manufacture method thereof - Google Patents

Rolled copper foil, copper-clad laminated board, flexible printing wiring board and manufacture method thereof Download PDF

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CN103361509B
CN103361509B CN201310122528.1A CN201310122528A CN103361509B CN 103361509 B CN103361509 B CN 103361509B CN 201310122528 A CN201310122528 A CN 201310122528A CN 103361509 B CN103361509 B CN 103361509B
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copper foil
copper
rolled
intermittent
rolling
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CN103361509A (en
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中室嘉一郎
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JX Nippon Mining and Metals Corp
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C2202/00Physical properties

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention relates to rolled copper foil, copper-clad laminated board, flexible printing wiring board and manufacture method thereof.Its problem is to provide a kind of for bending rolled copper foil, copper-clad laminated board, the flexible printing wiring board (FPC) with the weather resistance more spent.Its solution is that a kind of interval decreasing the mitigation of the stress in bending bends tolerance Copper Foil.

Description

轧制铜箔、覆铜层叠板、柔性印刷布线板及其制造方法Rolled copper foil, copper clad laminate, flexible printed wiring board, and manufacturing method thereof

技术领域 technical field

本发明涉及轧制铜箔、覆铜层叠板、柔性印刷布线板及其制造方法。 The present invention relates to a rolled copper foil, a copper clad laminate, a flexible printed wiring board and a manufacturing method thereof.

背景技术 Background technique

电子设备通常以多个电子基板构成,对这些电子基板彼此进行电连接的柔性印刷布线板(以下有时记载为FPC)设置在电子基板之间。柔性印刷布线板通常具备绝缘基板和在该基板表面形成的铜制布线。对于连接电子基板彼此的柔性印刷布线板,要求良好的弯曲性等。 An electronic device is generally composed of a plurality of electronic substrates, and a flexible printed wiring board (hereinafter, sometimes referred to as FPC) that electrically connects these electronic substrates is provided between the electronic substrates. A flexible printed wiring board generally includes an insulating substrate and copper wiring formed on the surface of the substrate. Favorable bendability etc. are required for the flexible printed wiring board which connects electronic board|substrates.

特别是近年来,由于具备折叠部分、旋转部分、或者滑动拉出部分等的可动部的便携式电话、数字照相机、摄像机等的小型电子设备普及,不断小型化、薄型化、高密度化,所以对在可动部分中使用的柔性印刷布线板要求的弯曲性变得更高。 Especially in recent years, due to the popularization of small electronic devices such as cellular phones, digital cameras, and video cameras equipped with movable parts such as folding parts, rotating parts, or slide-out parts, miniaturization, thinning, and high density have continued. Flexibility required for flexible printed wiring boards used in movable parts becomes higher.

作为对这样的柔性印刷布线板要求的特性,有以MIT弯曲性为代表的良好的折曲性,以及以IPC弯曲性为代表的高循环弯曲性,以往,开发了具备这样的特性的铜箔、铜-树脂基板层叠体(专利文献1~2)。 As the characteristics required for such flexible printed wiring boards, there are good bendability represented by MIT bendability, and high cycle bendability represented by IPC bendability, and copper foils having such characteristics have been developed in the past. , Copper-resin substrate laminated body (Patent Documents 1~2).

例如,在滑动弯曲试验(IPC)中,使用试验装置可耐受10万次以上的弯曲次数这样的、可耐受一般在现实中不可能有的弯曲次数的柔性印刷布线板已经制品化。 For example, in the sliding bending test (IPC), flexible printed wiring boards that can withstand bending times of more than 100,000 times using a test device, which can withstand a number of bending times that are generally impossible in reality, have been commercialized.

现有技术文献 prior art literature

专利文献 patent documents

专利文献1:日本特开2010-100887号公报; Patent Document 1: Japanese Patent Laid-Open No. 2010-100887;

专利文献2:日本特开2009-111203号公报。 Patent Document 2: Japanese Unexamined Patent Publication No. 2009-111203.

发明要解决的问题 The problem to be solved by the invention

可是,即使是使用在滑动弯曲试验(IPC)中可耐受一般在现实中不可能有的弯曲次数(例如10万次)的柔性印刷布线板的小型电子设备、例如折叠型便携式电话、滑盖式便携式电话,在现实的制品中,柔性印刷布线板断裂的故障并没有消失。作为即使使用可耐受庞大的弯曲次数的FPC却在现实的制品中仍然产生这样的故障的原因,研讨了高密度化导致的部件的接触、其他部件对FPC的夹入、尖锐部件的顶端导致的龟裂、设计外的发热、化学反应导致的绝缘材料的劣化等无数的原因,并施加了对策。 However, even small electronic devices using flexible printed wiring boards, such as foldable mobile phones, slide covers, etc. In actual products, the failure of the flexible printed wiring board to break does not disappear. As reasons why such failures still occur in actual products even when FPCs that can withstand a large number of bending times are used, contact between parts caused by high density, sandwiching of FPCs by other parts, and problems caused by the tip of sharp parts have been studied. There are countless reasons, such as cracks in the body, heat generation outside the design, and deterioration of the insulating material due to chemical reactions, and countermeasures have been taken.

本发明者鉴于在现实的制品中柔性印刷布线板断裂的故障并没有消失的情况,考虑不另外寻求这些故障的原因,而能够通过改良FPC的铜箔本身来解决该问题,并进行了研究开发。 In view of the fact that failures of flexible printed wiring board breaks do not disappear in actual products, the present inventors considered that the problem can be solved by improving the copper foil of FPC itself without separately seeking the cause of these failures, and conducted research and development. .

发明内容 Contents of the invention

因此,本发明的目的在于提供一种在现实的制品中在FPC中使用的情况下,对于弯曲具有更高的耐久性的轧制铜箔、覆铜层叠板、柔性印刷布线板(FPC)。 Therefore, an object of the present invention is to provide a rolled copper foil, a copper-clad laminate, and a flexible printed wiring board (FPC) that have higher durability against bending when used in an actual product in an FPC.

用于解决课题的方案 Solution to the problem

在这样的状况下,本发明者考虑了在滑动弯曲试验(IPC)中可耐受一般在现实中不可能有的弯曲次数(例如10万次)的柔性印刷布线板在现实的制品(例如折叠型便携式电话、滑盖式便携式电话)中实际上仍然发生断裂的故障的情况,认为虽然如此,通过FPC的进一步的改良,还是能够避免这些断裂,并进行了锐意研究。 Under such circumstances, the present inventors considered that a flexible printed wiring board that can withstand a number of times of bending (for example, 100,000 times) that is generally impossible in reality in the sliding bending test (IPC) can be used in real products (such as folding In fact, fracture failures still occur in mobile phones and slide-type mobile phones), but it is thought that these fractures can be avoided by further improvement of FPC, and intensive research is carried out.

而且,本发明者构想现在已成为标准的试验方法的滑动弯曲试验(IPC)并没有反映现实的制品的使用环境,并相反地减少弯曲试验中的弯曲次数(每单位时间)而进行了各种实验性研讨,惊人地发现了通过间歇地赋予弯曲,从而容易产生断裂的现象。 Furthermore, the present inventors conceived that the sliding bending test (IPC), which is now a standard test method, does not reflect the actual product use environment, and instead reduced the number of times of bending (per unit time) in the bending test to conduct various tests. Surprisingly, experimental studies have found a phenomenon that cracks are easily generated by intermittently giving bending.

在此基础上,本发明者发现了该预料之外的现象是由于铜箔的应力缓和现象而产生的,发现了正是因为追求薄型化的FPC的铜箔,导致一般认为不过具有理论上的可能性的应力缓和现象对现实的制品的断裂造成大的影响,发现了在铜箔的制造中,通过尽量不使应力缓和产生,从而使现实的制品遇到的条件下的对弯曲的耐受性大幅提高,由此实现了本发明。 On this basis, the present inventors discovered that this unexpected phenomenon is caused by the stress relaxation phenomenon of the copper foil, and found that it is precisely because of the pursuit of thinner FPC copper foil that it is generally considered to have a theoretical The possible stress relaxation phenomenon has a great influence on the fracture of actual products, and it was discovered that in the manufacture of copper foil, by minimizing the occurrence of stress relaxation, the bending resistance under the conditions encountered by actual products can be improved. performance is greatly improved, thereby realizing the present invention.

即、根据本发明,通过以满足使FPC的铜箔的应力缓和减少的条件的方式来制造铜箔及FPC,从而能够提高对间歇的弯曲的耐久性,能够减少现实的制品遇到的条件下的FPC的断裂。因此,减少应力缓和,使间歇的弯曲耐受性提高的FPC及铜箔并不依赖于其具体的减少应力缓和的手段,包含在本发明的范围内。 That is, according to the present invention, by manufacturing the copper foil and the FPC in such a manner as to satisfy the conditions for relaxing and reducing the stress of the copper foil of the FPC, the durability against intermittent bending can be improved, and it is possible to reduce the stresses encountered by actual products. The breakage of the FPC. Therefore, FPC and copper foil that reduce stress relaxation and improve intermittent bending resistance are included in the scope of the present invention regardless of the specific means for reducing stress relaxation.

因此,本发明在于以下的(1)~。 Therefore, the present invention resides in the following (1)~.

(1) (1)

一种间歇弯曲耐受性铜箔,减少了弯曲中的应力缓和。 An intermittent bending resistant copper foil with reduced stress relaxation in bending.

(2) (2)

一种(1)所述的间歇弯曲耐受性铜箔,相对于在25℃中0.2%的变形,满足下面的式I的条件: A copper foil with intermittent bending resistance according to (1), which satisfies the condition of the following formula I with respect to a deformation of 0.2% at 25° C.:

(T0-T5)/T0 ≤ 25(%) (式I) (T 0 -T 5 )/T 0 ≤ 25 (%) (Formula I)

(其中,T0表示初始应力,T5表示5小时后的应力)。 (where T0 represents the initial stress, and T5 represents the stress after 5 hours).

(3) (3)

一种间歇弯曲耐受性铜箔,从轧制平行剖面观察,每观察剖面积1000μm2的晶粒界面的长度是200μm以下。 An intermittent bending resistant copper foil having a grain boundary length of 200 μm or less per observed cross-sectional area of 1000 μm 2 when viewed in a rolled parallel section.

(4) (4)

根据(1)或(2)所述的间歇弯曲耐受性铜箔,从轧制平行剖面观察,每观察剖面积1000μm2的晶粒界面的长度是200μm以下。 In the intermittent bending resistant copper foil according to (1) or (2), the length of the crystal grain boundary per 1000 μm 2 of observed cross-sectional area is 200 μm or less when viewed from a rolling parallel section.

(5) (5)

根据(1)~(4)的任一项所述的间歇弯曲耐受性铜箔,具有60~105GPa的范围的杨氏模量。 The intermittent bending resistant copper foil according to any one of (1) to (4), which has a Young's modulus in the range of 60 to 105 GPa.

(6) (6)

根据(1)~(5)的任一项所述的间歇弯曲耐受性铜箔,铜箔是含有铜及不可避杂质而形成的铜箔。 The intermittent bending resistance copper foil according to any one of (1) to (5), wherein the copper foil contains copper and unavoidable impurities.

(7) (7)

根据(1)~(5)的任一项所述的间歇弯曲耐受性铜箔,铜箔是含有铜及不可避杂质的、还以合计20~500质量ppm含有从由Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V构成的组中选择的1种以上的元素而形成的铜箔。 The intermittent bending resistance copper foil according to any one of (1) to (5), wherein the copper foil contains copper and unavoidable impurities, and further contains Ag, Sn, In, Copper foil made of one or more elements selected from the group consisting of Ti, Zn, Zr, Fe, P, Ni, Si, Te, Cr, Nb, B, and V.

(8) (8)

根据(1)~(5)的任一项所述的间歇弯曲耐受性铜箔,铜箔是由无氧铜或韧铜构成的铜箔。 The intermittent bending resistance copper foil according to any one of (1) to (5), wherein the copper foil is made of oxygen-free copper or tough copper.

(9) (9)

根据(1)~(5)的任一项所述的间歇弯曲耐受性铜箔,铜箔是在无氧铜或韧铜之外还以合计20~500质量ppm添加有从由Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V构成的组中选择的1种以上的元素而形成的铜箔。 The intermittent bending-resistant copper foil according to any one of (1) to (5), wherein the copper foil contains Ag, Sn , In, Ti, Zn, Zr, Fe, P, Ni, Si, Te, Cr, Nb, B and V constitute the group of one or more elements selected from the copper foil formed.

(10) (10)

根据(1)~(9)的任一项所述的间歇弯曲耐受性铜箔,铜箔是轧制铜箔。 The intermittent bending resistant copper foil according to any one of (1) to (9), wherein the copper foil is a rolled copper foil.

(11) (11)

根据(1)~(10)的任一项所述的间歇弯曲耐受性铜箔,铜箔是以加工度96%以上被轧制而成的轧制铜箔。 The intermittent bending resistance copper foil according to any one of (1) to (10), wherein the copper foil is a rolled copper foil obtained by rolling with a processing degree of 96% or more.

(12) (12)

根据(1)~(11)的任一项所述的间歇弯曲耐受性铜箔,铜箔是柔性印刷布线板用的铜箔。 The intermittent bending resistance copper foil according to any one of (1) to (11), wherein the copper foil is copper foil for a flexible printed wiring board.

(13) (13)

根据(1)~(11)的任一项所述的间歇弯曲耐受性铜箔,铜箔层叠在柔性印刷布线板中。 The intermittent bending resistant copper foil according to any one of (1) to (11), wherein the copper foil is laminated on a flexible printed wiring board.

(14) (14)

根据(1)~(11)的任一项所述的间歇弯曲耐受性铜箔,铜箔是覆铜层叠板用的铜箔。 The intermittent bending resistant copper foil according to any one of (1) to (11), wherein the copper foil is a copper foil for a copper-clad laminate.

(15) (15)

根据(1)~(11)的任一项所述的间歇弯曲耐受性铜箔,铜箔层叠在覆铜层叠板中。 The intermittent bending resistant copper foil according to any one of (1) to (11), wherein the copper foil is laminated on a copper-clad laminate.

进而,本发明在于以下的(21)~。 Furthermore, the present invention resides in the following (21)~.

(21) (twenty one)

一种铜箔,在以160~400℃进行1秒钟~1小时的加热处理之后,变成(1)~(14)的任一项所述的间歇弯曲耐受性铜箔。 Copper foil which becomes the intermittent bending resistance copper foil as described in any one of (1)-(14) after heat-processing at 160-400 degreeC for 1 second - 1 hour.

(22) (twenty two)

一种铜箔,在以200℃进行30分钟的加热处理,或以350℃进行1秒钟的加热处理之后,变成(1)~(14)的任一项所述的间歇弯曲耐受性铜箔。 A copper foil having the intermittent bending resistance described in any one of (1) to (14) after heat treatment at 200°C for 30 minutes or heat treatment at 350°C for 1 second copper foil.

(23) (twenty three)

一种柔性印刷布线板,层叠有(1)~(10)、(11)、(12)的任一项所述的间歇弯曲耐受性铜箔而成。 A flexible printed wiring board in which the intermittent bending-resistant copper foil according to any one of (1) to (10), (11), and (12) is laminated.

(24) (twenty four)

一种覆铜层叠板,层叠有(1)~(10)、(13)、(14)的任一项所述的间歇弯曲耐受性铜箔而成。 A copper-clad laminate obtained by laminating the intermittent bending-resistant copper foil according to any one of (1) to (10), (13), and (14).

进而,本发明在于以下的(31)~。 Furthermore, the present invention resides in the following (31)~.

(31) (31)

一种轧制铜箔的制造方法,包含: A method of manufacturing rolled copper foil, comprising:

铸造铜的铸锭的工序; The process of casting copper ingots;

对铜的铸锭进行热轧的工序; The process of hot rolling copper ingots;

对热轧了的铜的铸锭进行1次以上的冷轧和退火的工序;以及 A process of cold-rolling and annealing hot-rolled copper ingots more than once; and

进行用于做成成品厚度的最后的冷轧的工序。 The final cold rolling process to make the thickness of the finished product is performed.

(32) (32)

根据(31)所述的制造方法,在进行用于做成成品厚度的最后的冷轧的工序中, According to the production method described in (31), in the process of performing the final cold rolling for making the thickness of the finished product,

使用于做成成品厚度的最后的冷轧的总加工度(最终轧制加工度)为96%以上。 The total processing degree (final rolling processing degree) of the final cold rolling used to make the finished product thickness is 96% or more.

(33) (33)

根据(31)~(32)的任一项所述的制造方法,在对热轧了的铜的铸锭进行1次以上的冷轧和退火的工序中, In the production method according to any one of (31) to (32), in the step of performing cold rolling and annealing one or more times on the hot-rolled copper ingot,

最后进行的退火以5℃/秒以上40℃/秒以下的升温速度进行。 The final annealing is performed at a temperature increase rate of 5°C/sec to 40°C/sec.

(34) (34)

根据(31)~(33)的任一项所述的制造方法,在对热轧了的铜的铸锭进行1次以上的冷轧和退火的工序中, In the manufacturing method according to any one of (31) to (33), in the step of performing one or more cold rolling and annealing on the hot-rolled copper ingot,

最后进行的退火的稍前进行的冷轧以60%~90%的加工度(总加工度)进行。 The cold rolling performed just before the final annealing is performed at a working degree (total working degree) of 60% to 90%.

(35) (35)

根据(31)~(34)的任一项所述的制造方法,铜的铸锭是含有铜及不可避杂质而形成的铜的铸锭。 In the production method according to any one of (31) to (34), the copper ingot is a copper ingot containing copper and unavoidable impurities.

(36) (36)

根据(31)~(35)的任一项所述的制造方法,铜的铸锭是含有铜及不可避杂质、还以合计20~500质量ppm含有从由Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V构成的组中选择的1种以上的元素而形成的铜的铸锭。 According to the production method described in any one of (31) to (35), the copper ingot contains copper and unavoidable impurities, and further contains Ag, Sn, In, Ti, Zn, A copper ingot made of one or more elements selected from the group consisting of Zr, Fe, P, Ni, Si, Te, Cr, Nb, B, and V.

(37) (37)

根据(31)~(34)的任一项所述的制造方法,铜的铸锭是由无氧铜或韧铜构成的铜的铸锭。 In the production method according to any one of (31) to (34), the copper ingot is a copper ingot made of oxygen-free copper or ductile copper.

(38) (38)

根据(31)~(34)、(37)的任一项所述的制造方法,铜的铸锭是在无氧铜或韧铜之外还以合计20~500质量ppm添加有从由Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V构成的组中选择的1种以上的元素而形成的铜的铸锭。 According to the production method described in any one of (31) to (34) and (37), the copper ingot is added with a total of 20 to 500 mass ppm of Ag, A copper ingot made of one or more elements selected from the group consisting of Sn, In, Ti, Zn, Zr, Fe, P, Ni, Si, Te, Cr, Nb, B, and V.

进而,本发明在于以下的(41)~。 Furthermore, the present invention resides in the following (41)~.

(41) (41)

一种间歇弯曲耐受性铜箔的制造方法,包含:对通过(31)~(36)的任一项的制造方法制造的轧制铜箔以160~400℃进行1秒钟~1小时的加热处理的工序。 A method for manufacturing intermittent bending resistant copper foil, comprising: performing rolling at 160 to 400°C for 1 second to 1 hour on the rolled copper foil manufactured by the manufacturing method of any one of (31) to (36). heat treatment process.

(42) (42)

一种间歇弯曲耐受性柔性印刷布线板的制造方法,包含: A method of manufacturing an intermittent bending resistant flexible printed wiring board, comprising:

将通过(31)~(36)的任一项的制造方法制造的轧制铜箔与基体树脂层叠的工序;以及 A step of laminating the rolled copper foil produced by the production method of any one of (31) to (36) with a matrix resin; and

对与基体树脂层叠的轧制铜箔以160~400℃进行1秒钟~1小时的加热处理的工序。 A process of heat-treating the rolled copper foil laminated with the matrix resin at 160-400° C. for 1 second to 1 hour.

(43) (43)

一种覆铜层叠板的制造方法,包含: A method for manufacturing a copper-clad laminate, comprising:

将通过(31)~(36)的任一项的制造方法制造的轧制铜箔与基体树脂层叠的工序;以及 A step of laminating the rolled copper foil produced by the production method of any one of (31) to (36) with a matrix resin; and

对与基体树脂层叠的轧制铜箔以160~400℃进行1秒钟~1小时的加热处理的工序。 A process of heat-treating the rolled copper foil laminated with the matrix resin at 160-400° C. for 1 second to 1 hour.

进而,本发明在于以下的(51)~。 Furthermore, the present invention resides in the following (51)~.

(51) (51)

一种轧制铜箔,通过(31)~(36)的任一项的制造方法制造。 A rolled copper foil produced by the production method of any one of (31) to (36).

(52) (52)

一种间歇弯曲耐受性铜箔,通过(41)的制造方法制造。 An intermittent bending resistant copper foil manufactured by the manufacturing method of (41).

(53) (53)

一种间歇弯曲耐受性柔性印刷布线板,通过(42)的制造方法制造。 An intermittent bending resistant flexible printed wiring board manufactured by the manufacturing method of (42).

(54) (54)

一种覆铜层叠板,通过(43)的制造方法制造。 A copper clad laminate manufactured by the manufacturing method of (43).

发明的效果 The effect of the invention

根据本发明,能够获得间歇弯曲耐受性铜箔,能获得在现实的制品中在FPC中使用的情况下,对于弯曲具有更高的耐久性的轧制铜箔、覆铜层叠板、柔性印刷布线板(FPC)。在使用具备本发明的间歇弯曲耐受性铜箔的柔性印刷布线板(FPC)的电子设备中,由于成为其可动部的FPC具备反映了现实的制品中的使用状况的弯曲耐受性,所以与仅考虑了对连续的弯曲的耐受性的现有的制品相比较,耐久性、可靠性优越。 According to the present invention, copper foil with intermittent bending resistance can be obtained, and rolled copper foil, copper-clad laminate, and flexographic printing with higher durability against bending can be obtained when used in FPC in actual products. Wiring board (FPC). In an electronic device using a flexible printed wiring board (FPC) provided with the intermittent bending-resistant copper foil of the present invention, since the FPC serving as the movable part has bending resistance reflecting the actual usage conditions in the product, Therefore, it is superior in durability and reliability compared with conventional products that only consider the resistance to continuous bending.

附图说明 Description of drawings

图1是表示铜箔的弯曲的内表面与外表面的状态的说明图。 FIG. 1 is an explanatory view showing the state of the curved inner surface and outer surface of copper foil.

图2是说明滞后回线的偏移的说明图。 FIG. 2 is an explanatory diagram illustrating a shift of a hysteresis loop.

图3是用于观察晶粒界面的轧制平行剖面的电子显微镜照片。 Fig. 3 is an electron micrograph of a rolling parallel section for observing grain boundaries.

具体实施方式 Detailed ways

以下,举出优选的实施方式,详细地说明本发明。 Hereinafter, the present invention will be described in detail with reference to preferred embodiments.

如上所述,以往,利用连续的弯曲运动来进行铜箔的弯曲性评价。可是,本发明者发现,与连续的弯曲相比,在间歇的弯曲中存在以较少的弯曲次数铜箔就断裂的情况。而且,发现该断裂寿命的变化起因于铜箔的应力缓和现象,从而到达了本发明。 As mentioned above, conventionally, the bendability evaluation of copper foil was performed using continuous bending motion. However, the inventors of the present invention have found that the copper foil may break with a smaller number of times of bending in intermittent bending than in continuous bending. Furthermore, it was found that the change in the fracture life is caused by the stress relaxation phenomenon of the copper foil, and arrived at the present invention.

根据本发明者的研讨,当使铜箔反复弯曲时,在铜箔表面,拉伸应力和压缩应力交替地起作用。如果是连续的弯曲的话,不管反复进行几次弯曲,起作用的拉伸/压缩应力也是相同程度。在该状态下进行的弯曲试验是以往进行的弯曲试验。可是,在间歇的弯曲的情况下,在弯曲和弯曲之间产生应力缓和,滞后回线(hysteresis loop)向低应力侧偏移,因此在再开始弯曲时滞后回线从原来偏移,结果应力振幅变大。本发明者得出了这是导致间歇的弯曲比连续的弯曲变得寿命短的原因的结论。 According to studies by the present inventors, when the copper foil is repeatedly bent, tensile stress and compressive stress act alternately on the surface of the copper foil. In the case of continuous bending, the same tensile/compressive stress acts regardless of how many times the bending is repeated. The bending test performed in this state is a conventional bending test. However, in the case of intermittent bending, stress relaxation occurs between bending and the hysteresis loop (hysteresis loop) shifts to the low-stress side. Therefore, when bending is resumed, the hysteresis loop shifts from the original, resulting in stress The amplitude becomes larger. The present inventors have come to the conclusion that this is the reason why intermittent bending has a shorter lifetime than continuous bending.

图1中示出说明该现象的说明图。图1是表示在设想铜箔的弯曲的内侧和外侧,分为外表面(外表面)和内表面(内侧表面)的情况下,外表面变成拉伸状态、内表面变成压缩状态的说明图。如图示那样,由于外表面处于拉伸状态,所以如果维持该状态,则不久会产生该拉伸状态下的应力缓和,结果,关于外表面变成滞后回线向压缩侧偏移的状态。另一方面,如图示那样,由于内表面处于压缩状态,所以如果维持该状态,则不久会产生该压缩状态下的应力缓和,结果,关于内表面变成滞后回线向拉伸侧偏移的状态。 An explanatory diagram illustrating this phenomenon is shown in FIG. 1 . Fig. 1 is an illustration showing that the outer surface is in a state of tension and the inner surface is in a state of compression when it is assumed that the inside and outside of the bend of the copper foil are divided into an outer surface (outer surface) and an inner surface (inner surface). picture. As shown in the figure, since the outer surface is in tension, if this state is maintained, stress relaxation in the tension state occurs soon, and as a result, the hysteresis loop shifts toward the compression side with respect to the outer surface. On the other hand, as shown in the figure, since the inner surface is in a compressed state, if this state is maintained, stress relaxation in the compressed state will occur soon, and as a result, the hysteresis loop with respect to the inner surface will shift toward the tension side. status.

图2示出说明这样的滞后回线的偏移的说明图。图2的横轴表示变形,纵轴表示应力。在图2中,示出上部、中央部、下部的3个滞后回线。中央部的滞后回线是在连续地进行弯曲的情况下的滞后回线。如果没有产生应力缓和导致的偏移,则滞后回线本来位于作为该中央部的滞后回线的位置。在以往进行的连续的弯曲试验中,可以说沿着该滞后回线例如进行10万次的弯曲试验。因此,FBC在现实的小型电子设备中的使用如果沿着这样的滞后回线进行的话,FBC应该均耐受例如超过10万次的弯曲,示出各制造厂商期待的那样的耐久性能。 FIG. 2 shows an explanatory diagram illustrating such a shift of the hysteresis loop. In FIG. 2 , the horizontal axis represents deformation, and the vertical axis represents stress. In FIG. 2, three hysteresis loops of an upper part, a central part, and a lower part are shown. The hysteresis loop at the center is a hysteresis loop when bending is performed continuously. If no shift due to stress relaxation occurs, the hysteresis loop is originally positioned as the hysteresis loop at the central portion. In the conventional continuous bending test, it can be said that, for example, 100,000 times of bending tests are performed along this hysteresis loop. Therefore, if FBCs are used in actual small electronic devices along such a hysteresis loop, FBCs should all withstand, for example, more than 100,000 bending times, showing the durability expected by various manufacturers.

图2的上部的滞后回线是使铜箔弯曲并伴随时间的经过产生应力缓和之后观察到的、铜箔的内表面侧由于应力缓和而偏移后的滞后回线。图2的下部的滞后回线是使铜箔弯曲并伴随时间的经过产生应力缓和之后观察到的、铜箔的外表面侧由于应力缓和而偏移后的滞后回线。像这样,在使铜箔弯曲并保持,随着时间的经过而产生应力缓和的情况下,在同一铜箔的、外表面侧和内表面侧,像这样具有不同的滞后回线。 The upper hysteresis loop in FIG. 2 is a hysteresis loop in which the inner surface side of the copper foil deviates due to stress relaxation and is observed after the copper foil is bent and stress relaxation occurs with the passage of time. The hysteresis loop in the lower part of FIG. 2 is a hysteresis loop in which the outer surface side of the copper foil deviates due to stress relaxation and is observed after the copper foil is bent to cause stress relaxation with the passage of time. In this way, when the copper foil is bent and held to cause stress relaxation over time, the same copper foil has different hysteresis loops on the outer surface side and the inner surface side.

进而在此之后,在使铜箔向相反侧弯曲,即,使之前的外侧这次变成内侧、使之前的内侧这次变成外侧的方式进行弯曲的情况下,从图2的上部的滞后回线向下部的滞后回线,同时从下部的滞后回线向上部的滞后回线,对铜箔的两面施加超过各个滞后回线的大的振幅。进而在之后,如果再次使铜箔向相反侧弯曲并保持,则再次对铜箔的两面施加超过各个滞后回线的大的振幅,结果,如果像这样持续进行间歇的弯曲,则在两面交替地产生应力缓和,应力、变形振幅增大。图2的箭头表示产生这样的滞后回线的偏移(振幅)的情况。当像这样持续进行间歇的弯曲时,与仅使中央部的滞后回线循环那样进行连续的弯曲的情况相比,对铜箔施加严酷的变形,结果,在没有达到如果是连续的弯曲就能够耐受的弯曲次数的情况下铜箔就破损了。 Furthermore, after that, when the copper foil is bent to the opposite side, that is, the previous outer side becomes the inner side this time, and the former inner side becomes the outer side this time, the hysteresis from the upper part of FIG. The loop goes to the lower hysteresis loop, and at the same time, from the lower hysteresis loop to the upper hysteresis loop, a large amplitude exceeding each hysteresis loop is applied to both surfaces of the copper foil. Then, if the copper foil is bent to the opposite side again and held, a large amplitude exceeding each hysteresis loop is applied to both sides of the copper foil again. Stress relaxation occurs, and the amplitude of stress and deformation increases. Arrows in FIG. 2 indicate the occurrence of such a shift (amplitude) of the hysteresis loop. When intermittent bending is continued in this way, compared with the case of continuous bending that only circulates the hysteresis loop in the center, severe deformation is applied to the copper foil. The copper foil is broken when the number of times of bending is endured.

因此,为了避免这样的破损,本发明者想到了改善铜箔的应力缓和特性的主意。因此,本发明在于,通过减少应力缓和,或者防止应力缓和产生,从而使铜箔的间歇的弯曲性提高,进而在于由此间歇的弯曲性提高的铜箔(包含FPC中的铜箔)。在本说明书中,举出用于使铜箔的间歇的弯曲性提高的具体的实施方式来对本发明进行说明,但本发明并不被这样举出的具体的实施方式所限定。 Then, in order to avoid such damage, this inventor thought the idea of improving the stress relaxation characteristic of copper foil. Therefore, the present invention resides in improving intermittent bendability of copper foil by reducing stress relaxation or preventing occurrence of stress relaxation, and further resides in copper foil (including copper foil in FPC) with improved intermittent bendability. In this specification, although the concrete embodiment for improving the intermittent bendability of copper foil was given and this invention was demonstrated, this invention is not limited to the concrete embodiment mentioned above.

进而,为了避免这样的破损,本发明者想到了通过降低铜箔的杨氏模量从而能够减小相对于变形量的应力变化的主意。由此,假使即使在发生了应力缓和的情况下,也能够抑制应力、变形振幅的增大。因此,本发明也在于,通过降低铜箔的杨氏模量从而提高铜箔的间歇的弯曲性,进而在于通过其提高了间歇的弯曲性的铜箔(包含FPC中的铜箔)。关于这一点,在本说明书中,举出用于使铜箔的间歇的弯曲性提高的具体的实施方式来对本发明进行说明,但本发明并不被这样举出的具体的实施方式所限定。 Furthermore, in order to avoid such breakage, the present inventors thought that by reducing the Young's modulus of copper foil, the stress change with respect to deformation|transformation amount can be made small. This makes it possible to suppress increases in stress and deformation amplitude even when stress relaxation occurs. Therefore, the present invention also resides in improving the intermittent bendability of the copper foil by reducing the Young's modulus of the copper foil, and further resides in the copper foil (including the copper foil in FPC) in which the intermittent bendability is improved. In this regard, in this specification, specific embodiments for improving the intermittent bendability of copper foil are given and the present invention is described, but the present invention is not limited to the specific embodiments mentioned in this way.

[应力缓和] [stress relief]

应力缓和是在固定的温度、固定的变形的条件下,在金属负载的应力随着时间而减少的现象。 Stress relaxation is a phenomenon in which the stress applied to a metal decreases over time under the conditions of a fixed temperature and a fixed deformation.

应力缓和在微观上是通过材料中的位错的移动而产生的现象。这样的位错的移动容易在晶粒界面中产生。因此,本发明使铜箔的晶粒界面的长度减少来作为实现应力缓和减少的手段,由此实现了相对于间歇的弯曲的耐受性的提高。 Stress relaxation is a phenomenon produced by movement of dislocations in a material microscopically. Such movement of dislocations tends to occur at grain boundaries. Therefore, in the present invention, the length of the crystal grain boundary of copper foil is reduced as a means for stress relaxation and reduction, thereby improving tolerance to intermittent bending.

[晶界长度] [Grain boundary length]

晶粒界面的长度(晶界长度)例如能够以如下方式求取,即,对以200℃进行30分钟退火后的铜箔使用CP(Cross section polisher,剖面抛光)而形成轧制平行剖面,使用EBSD(Electron Back Scattering Diffraction,背散射电子衍射,日本电子株式会社制JXA8500F),以步长0.5μm、加速电压15kV、WD23mm、电流5×10-8A对观察范围1000μm2的结晶取向进行测定,将与邻接的测定点的结晶取向差为15度以上的情况看作晶粒界面,测定在观察范围中包含的晶粒界面长度。 The length of the grain boundary (grain boundary length) can be obtained, for example, by forming a rolled parallel cross-section on a copper foil annealed at 200° C. for 30 minutes using CP (Cross section polisher). EBSD (Electron Back Scattering Diffraction, backscattered electron diffraction, JXA8500F manufactured by JEOL Ltd.), with a step size of 0.5 μm, an acceleration voltage of 15 kV, a WD of 23 mm, and a current of 5×10 -8 A to measure the crystal orientation in the observation range of 1000 μm 2 , The case where the crystal orientation difference from the adjacent measurement point was 15 degrees or more was regarded as a grain boundary, and the length of the grain boundary included in the observation range was measured.

在优选的实施方式中,从轧制平行剖面看到的每观察剖面积1000μm2的晶粒界面的长度例如能够设为200μm以下,优选设为100μm以下,进一步优选设为90μm以下,更优选设为70μm以下,更进一步优选设为50μm以下。从减少应力缓和的观点出发,晶粒界面的长度越小越好。另一方面,在优选的实施方式中,能够将晶粒界面的长度设为例如0.1μm以上、例如1.0μm以上、例如5.0μm以上。从铜箔的强度的观点出发,优选晶粒界面的长度是该值以上的值。 In a preferred embodiment, the length of the grain boundary per observed cross - sectional area of 1000 μm seen from the rolling parallel section can be set to, for example, 200 μm or less, preferably 100 μm or less, more preferably 90 μm or less, more preferably set to It is 70 μm or less, more preferably 50 μm or less. From the viewpoint of reducing stress relaxation, the smaller the length of the grain boundary, the better. On the other hand, in a preferred embodiment, the length of the crystal grain boundary can be set to, for example, 0.1 μm or more, for example, 1.0 μm or more, for example, 5.0 μm or more. From the viewpoint of the strength of the copper foil, it is preferable that the length of the grain boundary is a value equal to or greater than this value.

为了表示晶粒界面的长度,图3示出观察到的轧制平行剖面的电子显微镜照片的一例。在图3中,作为横长的照片示出上、中、下的3个剖面照片。在图3的上部的剖面照片中,几乎看不到晶粒界面。几乎看不到晶粒界面的该样品片示出了良好的间歇弯曲耐受性(良)。再有,由于铜箔极其薄,所以为了获得电子显微镜照片而将支承体抵接于铜箔进行观察,上部的剖面照片的最上部的黑的部分是该支承体与铜箔的间隙,其正下的白的部分是支承体。在图3的下方的剖面照片中,观察到许多晶粒界面。被观察到许多晶粒界面的该样品片是间歇弯曲耐受性差的样本(不良)。在图3的中部的剖面照片中,观察到中等程度的晶粒界面。该样品片在间歇弯曲耐受性方面比上述的下部的剖面照片的样本优秀,但比上述上部的剖面照片的样本差。 In order to show the length of the grain boundary, FIG. 3 shows an example of an electron micrograph of the observed rolling parallel section. In FIG. 3 , three cross-sectional photographs of upper, middle and lower are shown as horizontally long photographs. In the cross-sectional photograph in the upper part of FIG. 3 , crystal grain boundaries are hardly visible. This sample sheet in which crystal grain boundaries were hardly seen showed good intermittent bending resistance (good). In addition, since the copper foil is extremely thin, in order to obtain an electron micrograph, the support body was brought into contact with the copper foil for observation. The uppermost black part of the upper cross-sectional photo is the gap between the support body and the copper foil. The lower white part is a support. In the lower cross-sectional photograph of FIG. 3 , many grain boundaries are observed. This sample piece in which many grain boundaries were observed was a sample poor in intermittent bending resistance (poor). In the cross-sectional photograph in the middle of FIG. 3 , moderate grain boundaries are observed. The sample sheet was superior in intermittent bending resistance to the sample of the above-mentioned lower cross-sectional photograph, but inferior to the sample of the above-mentioned upper cross-sectional photograph.

[应力缓和率] [Stress relaxation rate]

应力缓和率以如下方式求取,即,例如将以200℃进行30分钟退火后的铜箔,使用精密刀具切割出宽度12.7mm的长条状,使用拉伸试验机(株式会社岛津制作所制AGS-X),以卡盘间距离50mm进行固定,将卡盘间距离拉伸到50.1mm在25℃对应力的变化进行测定,将在t小时后获得的应力Tt和初始(0小时后)的应力T0的差分除以初始的应力T0后的值{(T0-Tt)/T0}作为t小时后的应力缓和率(%)。 The stress relaxation ratio is obtained by cutting, for example, copper foil annealed at 200°C for 30 minutes into strips with a width of 12.7 mm using a precision cutter, and using a tensile testing machine (Shimadzu Corporation AGS-X), fixed at a distance of 50mm between the chucks, stretched to 50.1mm between the chucks and measured the change of stress at 25°C, the stress T t obtained after t hours and the initial (0 hours After dividing the difference of stress T 0 by the initial stress T 0 {(T 0 -T t )/T 0 } as the stress relaxation rate (%) after t hours.

在优选的实施方式中,本发明的间歇弯曲耐受性铜箔的应力缓和率(%)在设t=5小时的情况下,相对于在25℃为0.2%的变形,能够满足下式I的条件: In a preferred embodiment, the stress relaxation ratio (%) of the intermittent bending resistant copper foil of the present invention can satisfy the following formula I with respect to a deformation of 0.2% at 25°C when t=5 hours conditions of:

(T0-T5)/T0 ≤ 25(%) (式I) (T 0 -T 5 )/T 0 ≤ 25 (%) (Formula I)

(其中,T0表示初始应力,T5表示5小时后的应力), (where T0 represents the initial stress and T5 represents the stress after 5 h),

进而优选能够满足下式II的条件: And then preferably can satisfy the condition of following formula II:

(T0-T5)/T0 ≤ 20(%) (式II) (T 0 -T 5 )/T 0 ≤ 20 (%) (Formula II)

的条件。更优选能够将(T0-T5)/T0的值设为19%以下。 conditions of. More preferably, the value of (T 0 −T 5 )/T 0 can be set to 19% or less.

[杨氏模量] [Young's modulus]

杨氏模量例如能够使用谐振式测定器(日本technoplas株式会社制TE-RT)来进行测定。在本发明的优选的实施方式中,间歇弯曲耐受性铜箔的杨氏模量例如能够设为60~105GPa,优选设为70~105GPa,进一步优选设为70~100GPa,更优选设为70~90GPa,更进一步优选设为75~85GPa的范围。 The Young's modulus can be measured, for example, using a resonant measuring device (TE-RT manufactured by Nippon Technoplas Co., Ltd.). In a preferred embodiment of the present invention, the Young's modulus of the intermittent bending resistance copper foil can be set to, for example, 60 to 105 GPa, preferably 70 to 105 GPa, more preferably 70 to 100 GPa, more preferably 70 ~90GPa, more preferably in the range of 75~85GPa.

[组分] [components]

本发明的铜箔的组分只要是能减少应力缓和的组分就能够使用。例如,能够使用包含铜及不可避杂质的纯铜。在优选的实施方式中,作为铜箔的组分,能够将符合JIS-H3100的合金号码C1100的规格的韧铜或符合JIS-H3100的合金号码C1020的规格的无氧铜作为组分。当采用这样的接近于纯铜的组分时,铜箔的导电率不会降低,适于FPC、COF。通常,轧制铜箔中包含的氧浓度在韧铜的情况下是0.01~0.05质量%,在无氧铜的情况下是0.001质量%以下。此外,作为无氧铜能够使用符合JIS-H3510的合金号码C1011的规格的无氧铜。 The components of the copper foil of the present invention can be used as long as they reduce stress relaxation. For example, pure copper containing copper and unavoidable impurities can be used. In a preferred embodiment, as a component of the copper foil, tough copper conforming to the standard of alloy number C1100 of JIS-H3100 or oxygen-free copper conforming to the standard of alloy number C1020 of JIS-H3100 can be used as a component. When such a component close to pure copper is used, the conductivity of the copper foil will not decrease, which is suitable for FPC and COF. Usually, the oxygen concentration contained in the rolled copper foil is 0.01 to 0.05% by mass in the case of tough copper, and 0.001% by mass or less in the case of oxygen-free copper. In addition, as the oxygen-free copper, oxygen-free copper conforming to the standard of alloy number C1011 of JIS-H3510 can be used.

在优选的实施方式中,作为铜箔的组分,也可以对上述接近于纯铜的组分进一步以合计500质量ppm以下含有从Ag及Sn的组中选出的1种以上。其中,优选Sn的含有量是300ppm以下。当Ag或Sn向轧制铜箔的合计添加量超过500质量ppm时,导电率降低并且再结晶温度上升,有在最终退火中再结晶晶粒的生长被抑制,晶界长度变长的情况。虽然Ag和Sn的合计添加量的下限没有特别规定,但通常是合计20质量ppm以上。 In a preferable embodiment, as a component of the copper foil, one or more selected from the group of Ag and Sn may be contained in a total of 500 mass ppm or less of the above-mentioned component close to pure copper. Among them, the content of Sn is preferably 300 ppm or less. When the total amount of Ag or Sn added to the rolled copper foil exceeds 500 mass ppm, the electrical conductivity decreases and the recrystallization temperature rises, and the growth of recrystallized grains is suppressed during final annealing, and the grain boundary length may become longer. Although the lower limit of the total addition amount of Ag and Sn is not particularly specified, it is usually 20 mass ppm or more in total.

在优选的实施方式中,在上述接近于纯铜的组分的铜中,例如在上述韧铜或上述无氧铜中,以合计20~500质量ppm含有从Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V的组中选择的1种以上的元素也可。 In a preferred embodiment, in the above-mentioned copper having a composition close to pure copper, for example, in the above-mentioned tough copper or the above-mentioned oxygen-free copper, Ag, Sn, In, Ti, Zn are contained in a total of 20 to 500 mass ppm One or more elements selected from the group of , Zr, Fe, P, Ni, Si, Te, Cr, Nb, B, and V may be used.

再有,也可以对上述接近于纯铜的组分的铜以合计500质量ppm以上添加有从Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V的组中选择的1种以上的元素,例如通过在600℃以上的高温施加30分钟以上的热处理从而使再结晶晶粒生长,也能够改善应力缓和特性。可是,在该工序中,在为了制造覆铜层叠板而必须将再结晶后的软质铜箔与树脂层叠的方面并不有利。 In addition, it is also possible to add Ag, Sn, In, Ti, Zn, Zr, Fe, P, Ni, Si, Te, Cr, Nb to the above-mentioned copper having a composition close to pure copper at a total of 500 mass ppm or more. One or more elements selected from the group of , B, and V can also improve stress relaxation characteristics by, for example, applying heat treatment at a high temperature of 600° C. or higher for 30 minutes or more to grow recrystallized grains. However, this step is disadvantageous in that the recrystallized soft copper foil and resin must be laminated in order to manufacture a copper-clad laminate.

[铜箔的制造] [production of copper foil]

本发明的铜箔(间歇弯曲耐受性铜箔)的制造如上述那样,只要是能够制造减少了应力缓和的铜箔的方法,则能够没有特别限制而进行。在优选的实施方式中,通过包含使用上述组分的铜(铜合金)对铜的铸锭进行铸造的工序、对铜的铸锭进行热轧的工序、对热轧后的铜的铸锭进行1次以上的冷轧和退火的工序、进行用于做成成品厚度的最后的冷轧的工序的制造方法来制造轧制铜箔,通过对该轧制铜箔进行以160~400℃进行1秒钟~1小时加热处理的工序,从而能够制造间歇弯曲耐受性铜箔。此外,上述以160~400℃进行1秒钟~1小时的加热处理,也可以兼作为使铜箔与树脂层接合的覆铜层叠板的制造工序中的热处理。 The production of the copper foil (intermittent bending resistance copper foil) of the present invention is not particularly limited as long as it is a method capable of producing a copper foil with reduced stress relaxation as described above. In a preferred embodiment, the process of casting a copper ingot using copper (copper alloy) having the above-mentioned composition, the process of hot rolling the copper ingot, and performing the hot-rolled copper ingot The production method of cold rolling and annealing one or more times, and the final cold rolling process for making the thickness of the finished product is to produce rolled copper foil, and the rolled copper foil is 1 Second to 1 hour heat treatment process, so that intermittent bending resistance copper foil can be produced. In addition, the above-mentioned heat treatment at 160 to 400° C. for 1 second to 1 hour may also be used as heat treatment in the manufacturing process of a copper-clad laminate for bonding copper foil and a resin layer.

在对该热轧后的铜的铸锭进行1次以上的冷轧和退火的工序中,能够适宜地反复进行冷轧和退火,做成所希望的厚度。在优选实施方式中,优选在该退火中最后进行的退火、即在进行用于做成成品厚度的最后的冷轧的工序稍前进行的退火中,将升温速度设为5℃/秒以上40℃/秒以下。在升温速度是5℃/秒以下的情况下,发生晶粒的粗大化,再结晶组织变得不均匀。另一方面在40℃/秒以上的情况下,由于微细的再结晶晶粒分别生长,所以再结晶组织变得不均匀。 In the step of cold-rolling and annealing the hot-rolled copper ingot one or more times, the cold-rolling and annealing can be repeated as appropriate to obtain a desired thickness. In a preferred embodiment, it is preferable that in the last annealing of the annealing, that is, in the annealing performed just before the final cold rolling process for making the finished product thickness, the temperature increase rate is set to be 5° C./second or more and 40° C. °C/sec or less. When the temperature increase rate is 5°C/sec or less, the crystal grains are coarsened, and the recrystallized structure becomes non-uniform. On the other hand, in the case of 40° C./sec or more, since fine recrystallized grains grow separately, the recrystallized structure becomes inhomogeneous.

在优选的实施方式中,在上述最后进行的退火稍前进行的轧制中,能够将加工度(总加工度)例如设为90%以下,优选设为89%以下,更优选设为88%以下,例如能够设为60%以上,优选设为65%以上,更优选设为67%以上。通过采用这样的范围,能够在该退火工序后实现均匀的再结晶组织,在最终轧制工序中能够制作适当的轧制组织。当在最后进行的退火的稍前进行的轧制工序的总加工度超过90%时,集合组织过度发达,退火工序后的晶粒容易粗大化。 In a preferred embodiment, in the rolling performed just before the last annealing, the workability (total workability) can be set to, for example, 90% or less, preferably 89% or less, more preferably 88% Below, for example, it can be set to 60% or more, preferably 65% or more, and more preferably 67% or more. By adopting such a range, a uniform recrystallized structure can be realized after the annealing step, and an appropriate rolled structure can be produced in the final rolling step. When the total working ratio of the rolling step performed just before the final annealing exceeds 90%, the texture is excessively developed, and the crystal grains after the annealing step tend to be coarsened.

在优选实施方式中,在进行用于做成成品厚度的最后的冷轧的工序中,能够将该最后的冷轧的总加工度(最终轧制加工度)设为96%以上 ,优选设为97%以上,更优选设为97.5%以上。 In a preferred embodiment, in the process of performing the final cold rolling for making the thickness of the finished product, the total processing degree of the final cold rolling (final rolling processing degree) can be set to 96% or more, preferably set to 97% or more, more preferably 97.5% or more.

再有,本领域人员理解,在本发明的各个轧制工序中,一个轧制工序也可以使材料多次通过(多次经过)轧制辊来实施。因此,在本申请说明书中,某个轧制工序的加工度,意味着在通过这样的多次经过来进行轧制工序的情况下,通过多次经过而实现的综合的加工度,并不是在该轧制工序中包含的任一次的经过的加工度(1次经过加工度),为了使其更加明确,有时将某个轧制工序的加工度记载为总加工度。 Furthermore, those skilled in the art understand that in each rolling process of the present invention, one rolling process can also be implemented by passing the material through the rolling rolls multiple times (multiple passes). Therefore, in the specification of this application, the working degree of a certain rolling process means that in the case where the rolling process is carried out through such multiple passes, the comprehensive working degree achieved by multiple passes does not mean In order to clarify the processing degree of any one pass (processing degree of one pass) included in this rolling process, the processing degree of a certain rolling process may be described as the total processing degree.

在优选实施方式中,在对轧制铜箔以160~400℃进行1秒钟~1小时加热处理的工序中,例如能够以200~400℃进行1秒钟~30分钟的加热处理,例如能够以200℃进行30分钟的加热处理,例如能够以350℃进行1秒钟的加热处理。再有,加热时间也可以比1秒钟短、例如是0.1秒钟~1秒钟。通过该加热处理,上述受到最后的冷轧的轧制铜箔成为应力缓和减少了的本发明的间歇弯曲耐受性铜箔。该加热处理作为对轧制铜箔的独立的工序来进行也可,但例如在为了制造覆铜层叠板而层叠树脂,对膜状的树脂进行热压接时,以成为该加热处理条件的方式进行加热处理也可,或者例如在为了制造覆铜层叠板而层叠树脂,涂覆树脂材料使其热固化而形成膜层时,以成为该加热处理条件的方式进行加热处理也可。 In a preferred embodiment, in the process of heat-treating the rolled copper foil at 160-400° C. for 1 second to 1 hour, for example, heat treatment can be performed at 200-400° C. for 1 second to 30 minutes. The heat treatment can be performed at 200° C. for 30 minutes, for example, at 350° C. for 1 second. In addition, the heating time may be shorter than 1 second, for example, 0.1 second to 1 second. By this heat treatment, the rolled copper foil subjected to the above-mentioned final cold rolling becomes the intermittent bending resistance copper foil of the present invention in which stress relaxation is reduced. This heat treatment may be performed as an independent process for rolling copper foil, but for example, when laminating resins for manufacturing copper-clad laminates and thermocompression-bonding film-like resins, the heat treatment conditions should be set Heat treatment may be performed, or, for example, when laminating a resin for manufacturing a copper-clad laminate, coating a resin material, and thermally curing it to form a film layer, heat treatment may be performed so as to meet the conditions of the heat treatment.

[柔性印刷布线板] [Flexible printed wiring board]

本发明的铜箔(间歇弯曲耐受性铜箔)如上述那样具有优越的间歇弯曲耐受性,能够作为柔性印刷布线板的导电性的布线部分适宜地使用。因此,本发明也在于层叠而具备上述铜箔的柔性印刷布线板。 The copper foil (intermittent bending resistance copper foil) of the present invention has excellent intermittent bending resistance as described above, and can be suitably used as a conductive wiring portion of a flexible printed wiring board. Therefore, this invention also resides in the flexible printed wiring board provided with the said copper foil laminated|stacked.

柔性印刷布线板通常由导电性的布线层叠于绝缘性的树脂而形成,是柔性的且具有弯曲性。布线根据需要经由粘接层层叠于绝缘性的基材的树脂层。本发明的铜箔在任何层叠的方式中均示出优秀的间歇弯曲耐受性 ,因此本发明的柔性印刷布线板只要是层叠而具备本发明的铜箔的柔性印刷布线板,就能够采用各种各样的具体的方式。在优选实施方式中,例如是在膜状的树脂层粘接有本发明的铜箔的柔性印刷布线板也可,是在本发明的铜箔涂覆树脂材料而成膜为膜状的柔性印刷布线板也可。对于树脂层,没有特别限制而能够使用可在柔性印刷布线板中使用的树脂。在优选实施方式中,例如能够使用聚酰亚胺树脂。 A flexible printed wiring board is usually formed by laminating conductive wiring on insulating resin, and is flexible and bendable. The wiring is laminated on the resin layer of the insulating base material via an adhesive layer as needed. The copper foil of the present invention shows excellent intermittent bending resistance in any laminated form. Therefore, as long as the flexible printed wiring board of the present invention is a flexible printed wiring board that is laminated with the copper foil of the present invention, various types can be used. various specific methods. In a preferred embodiment, for example, a flexible printed wiring board in which the copper foil of the present invention is bonded to a film-shaped resin layer may be a flexible printed circuit board in which the copper foil of the present invention is coated with a resin material to form a film. Wiring boards are also available. For the resin layer, resins that can be used for flexible printed wiring boards can be used without particular limitation. In a preferred embodiment, for example, polyimide resin can be used.

本发明的柔性印刷布线板例如能够以如下方式制造。在轧制铜箔的单面涂覆将聚酰胺酸作为主体的聚酰亚胺前体,进行干燥及固化,加工成聚酰亚胺树脂层和铜箔层的覆铜层叠板,通过光刻形成规定的电路,进而在铜箔层的布线侧的面粘接聚酰亚胺膜,能够做成柔性印刷布线板。在上述覆铜层叠板中,只要铜箔的层是间歇弯曲耐受性铜箔即可,因此,作为上述轧制铜箔,使用通过用于聚酰亚胺树脂层的形成的加热处理,例如受到200℃的30分钟的加热处理而成为本发明的间歇弯曲耐受性铜箔的铜箔即可。此外,例如在轧制铜箔的单面粘接聚酰亚胺膜,加工成聚酰亚胺树脂层和铜箔层的覆铜层叠板,进行之后的光刻以后的工序,做成柔性印刷布线板也可。在该情况下,在上述覆铜层叠板中,只要铜箔的层是间歇弯曲耐受性铜箔即可,因此,作为上述轧制铜箔使用,通过用于聚酰亚胺膜的粘接的加热处理,例如受到200℃的30分钟的加热处理而成为本发明的间歇弯曲耐受性铜箔的铜箔即可。 The flexible printed wiring board of this invention can be manufactured as follows, for example. A polyimide precursor mainly made of polyamic acid is coated on one side of a rolled copper foil, dried and cured, and processed into a copper-clad laminate with a polyimide resin layer and a copper foil layer, which is processed by photolithography A predetermined circuit is formed, and a polyimide film is bonded to the surface of the copper foil layer on the wiring side to obtain a flexible printed wiring board. In the above-mentioned copper-clad laminate, it is only necessary that the layer of copper foil is an intermittent bending-resistant copper foil. Therefore, as the above-mentioned rolled copper foil, heat treatment for forming a polyimide resin layer is used, such as What is necessary is just to receive heat processing at 200 degreeC for 30 minutes, and to become the intermittent bending resistance copper foil of this invention. In addition, for example, a polyimide film is bonded to one side of a rolled copper foil, and a polyimide resin layer and a copper foil layer are processed into a copper-clad laminate, and the subsequent photolithography and subsequent processes are performed to make flexographic printing. Wiring boards are also available. In this case, in the above-mentioned copper-clad laminate, as long as the layer of copper foil is an intermittent bending-resistant copper foil, it is used as the above-mentioned rolled copper foil, and it is used for bonding polyimide films. What is necessary is just to heat-process at 200 degreeC for 30 minutes, for example, and to become the copper foil of intermittent bending resistance copper foil of this invention.

本发明的间歇弯曲耐受性铜箔及使用其的柔性印刷布线板能够在便携式电话、笔记本电脑、照相机的镜筒部的布线构件、HDD等的电子设备的可动部、自动加工机、机器人臂等的产业用机械中适宜地使用。 The intermittent bending resistance copper foil of the present invention and the flexible printed wiring board using the same can be used in mobile phones, notebook computers, wiring members of lens barrels of cameras, movable parts of electronic equipment such as HDDs, automatic processing machines, and robots. It is suitably used for industrial machinery such as arms.

[实施例] [Example]

以下,一起示出本发明的实施例和比较例,这些实施例是为了更好地理解本发明及其优点而提供的,并不限定本发明。 Hereinafter, examples and comparative examples of the present invention will be shown together, but these examples are provided for better understanding of the present invention and its advantages, and do not limit the present invention.

[铜箔的制造] [production of copper foil]

溶解无氧铜(JIS合金号码C1020)(OFC:Oxygen-Free Copper)或韧铜(JIS合金号码C1100)(TPC:Tough-Pitch Copper),根据需要添加表1所示的元素进行铸造,制作厚度200mm、宽度600mm的铸锭。在将铸锭热轧到厚度10mm之后,反复进行冷轧和退火,使用于做成成品厚度的最后的冷轧的加工度(最终轧制加工度)分别为表1记载的那样,制造了轧制铜箔。这时的最终轧制加工度及箔厚分别是表1中记载的那样。 Dissolve oxygen-free copper (JIS alloy number C1020) (OFC: Oxygen-Free Copper) or tough copper (JIS alloy number C1100) (TPC: Tough-Pitch Copper), add the elements shown in Table 1 as needed, and cast to make the thickness 200mm ingot with a width of 600mm. After the ingot was hot rolled to a thickness of 10mm, cold rolling and annealing were repeated, and the final cold rolling processing degree (final rolling processing degree) used to make the finished product thickness was as described in Table 1, respectively. Making copper foil. The final rolling degree and the foil thickness at this time are as described in Table 1, respectively.

此外,在最终的冷轧稍前的退火工序的稍前进行的轧制工序的总加工度及最终的冷轧稍前的退火工序中的升温速度如表1所示那样。再有,升温速度的“○”意味着升温速度为5℃/秒以上40℃/秒以下。此外,比较例7的“×”意味着以超过40℃/秒的升温速度进行退火。 In addition, the total working ratio in the rolling step performed just before the final cold rolling and the temperature increase rate in the annealing step just before the final cold rolling are as shown in Table 1. In addition, "circle" of a temperature increase rate means that a temperature increase rate is 5 degrees C/sec or more and 40 degrees C/sec or less. In addition, "x" in Comparative Example 7 means that the annealing was performed at a temperature increase rate exceeding 40°C/sec.

[评价] [evaluate]

对获得的轧制铜箔以200℃进行30分钟的退火之后,或者制作评价用FPC,供于后述的杨氏模量、晶界长度、应力缓和率、弯曲性(连续弯曲、间歇弯曲)的评价。在表1和表2中汇总了所获得的结果。但是关于实施例2及比较例2,不层叠聚酰亚胺及覆盖层(cover lay)而使其通过将辊温度调整为350℃的层压加工机,由此进行退火,进行与制作后述的评价用FPC的情况的热处理同样的热处理。这时的热处理时间设为1秒钟。 After the obtained rolled copper foil is annealed at 200°C for 30 minutes, or an FPC for evaluation is produced, and used for Young's modulus, grain boundary length, stress relaxation rate, and bendability (continuous bending, intermittent bending) described later evaluation of. The results obtained are summarized in Tables 1 and 2. However, in Example 2 and Comparative Example 2, the polyimide and the cover layer (cover layer) were not laminated, but they were annealed by passing through a lamination processing machine with the roller temperature adjusted to 350°C, and the production and fabrication will be described later. The same heat treatment as the heat treatment of the case of FPC was used for the evaluation. The heat treatment time at this time was set to 1 second.

[杨氏模量] [Young's modulus]

杨氏模量使用谐振式测定器(日本technoplas株式会社制TE-RT)来进行测定。 The Young's modulus was measured using a resonant measuring device (TE-RT manufactured by Nippon Technoplas Co., Ltd.).

[晶界长度] [Grain boundary length]

对以上述条件(200℃或350℃)退火后的铜箔使用CP(Cross section polisher,剖面抛光)而形成轧制平行剖面,使用EBSD(Electron Back Scattering Diffraction,背散射电子衍射,日本电子株式会社制JXA8500F),以步长0.5μm、加速电压15kV、WD23mm、电流5×10-8A对观察范围1000μm2的结晶取向进行测定。将与邻接的测定点的结晶取向差为15度以上的情况看作晶粒界面,测定在观察范围中包含的晶粒界面长度。 The copper foil annealed under the above conditions (200°C or 350°C) is formed by using CP (Cross section polisher, section polishing) to form a rolled parallel section, using EBSD (Electron Back Scattering Diffraction, backscattered electron diffraction, JEOL Ltd. JXA8500F), the crystal orientation in the observation range of 1000 μm 2 was measured with a step size of 0.5 μm, an accelerating voltage of 15 kV, a WD of 23 mm, and a current of 5×10 -8 A. The case where the crystal orientation difference from the adjacent measurement point was 15 degrees or more was regarded as a grain boundary, and the length of the grain boundary included in the observation range was measured.

[应力缓和率] [Stress relaxation rate]

使用精密刀具将获得的轧制铜箔切割成宽度12.7mm的长条状,以上述条件(200℃或350℃)进行退火,使用拉伸试验机(株式会社岛津制作所制AGS-X)以卡盘间距离50mm进行固定。之后,将卡盘间距离拉伸到50.1mm(相当于0.2%变形),在25℃测定了载荷的变化。作为应力缓和率(%),获得将在t小时后获得的应力Tt和初始(0小时后)的应力T0的差分除以初始的应力T0后的值{(T0-Tt)/T0}。在表2中示出t=5小时的情况下的应力缓和率(%)。 The obtained rolled copper foil was cut into strips with a width of 12.7 mm using a precision cutter, annealed under the above conditions (200°C or 350°C), and a tensile tester (AGS-X manufactured by Shimadzu Corporation) was used. Fix with a distance of 50mm between the chucks. After that, the distance between the chucks was stretched to 50.1 mm (corresponding to 0.2% deformation), and the change in load was measured at 25°C. As the stress relaxation rate (%), a value obtained by dividing the difference between the stress T t obtained after t hours and the initial (after 0 hours) stress T 0 by the initial stress T 0 {(T 0 -T t ) /T 0 }. Table 2 shows the stress relaxation rate (%) in the case of t=5 hours.

[弯曲性评价] [flexibility evaluation]

对以轧制加工获得的铜箔与聚酰亚胺膜(nikkan工业株式会社制NIKAFLEX:聚酰亚胺厚度12.5μm,粘接剂厚度15μm)进行热压接(200℃、30分),获得覆铜层叠板。对获得的覆铜层叠板进行蚀刻,做成电路宽度100μm的FPC,之后将覆盖层(nikkan工业株式会社制NIKAFLEX:聚酰亚胺厚度12.5μm,粘接剂厚度15μm)热压接(200℃,30分)到电路面,制作了评价用FPC。但是关于实施例2及比较例2,使用调整为辊温度350℃的层压加工机,将以轧制加工获得的铜箔与上述聚酰亚胺膜做成覆铜层叠板,使用与上述同样的手法做成FPC之后,使用调整为辊温度350℃的层压加工机将上述覆盖层压接到电路面,制作了评价用FPC。再有,这时的加热时间合计是1秒钟。 Copper foil obtained by rolling and a polyimide film (NIKAFLEX manufactured by Nikkan Industry Co., Ltd.: polyimide thickness 12.5 μm, adhesive thickness 15 μm) were thermocompressed (200°C, 30 minutes) to obtain Copper Clad Laminates. The obtained copper-clad laminate was etched to form an FPC with a circuit width of 100 μm, and then the cover layer (NIKAFLEX manufactured by Nikkan Industry Co., Ltd.: polyimide thickness 12.5 μm, adhesive thickness 15 μm) was thermocompressed (200°C , 30 points) to the circuit side, and made an FPC for evaluation. However, for Example 2 and Comparative Example 2, the copper foil obtained by rolling and the above-mentioned polyimide film were made into a copper-clad laminate using a laminating machine adjusted to a roll temperature of 350° C. After the FPC was produced by the method described above, the above-mentioned cover layer was bonded to the circuit surface using a lamination machine adjusted to a roll temperature of 350° C., and an FPC for evaluation was produced. Note that the total heating time at this time is 1 second.

弯曲试验将滑动速度设为每分钟120次,在室温环境中进行。为了使弯曲时对铜箔施加的变形一致,弯曲半径在铜箔厚度为18μm的情况下设为1.5mm,在12μm的情况下设为1.0mm,在9μm的情况下设为0.75mm,分别以到断裂为止的次数进行了评价。对试料通电,通过导通切断来检测出断裂。在连续弯曲中,设如果断裂次数不足10万次则为×,如果是10万次以上不足30万次则为○,如果是30万次以上则为◎。此外在间歇弯曲中,以5小时间隔连续进行1000次弯曲,设如果断裂次数不足5万次则为×,如果是5万次以上不足10万次则为○,如果是10万次以上则为◎。 The bending test was carried out at room temperature with the sliding speed set at 120 times per minute. In order to make the deformation applied to the copper foil uniform during bending, the bending radius is set to 1.5 mm when the copper foil thickness is 18 μm, 1.0 mm when the copper foil is 12 μm, and 0.75 mm when the copper foil is 9 μm. The number of times until breaking was evaluated. The sample is energized, and the fracture is detected by breaking the conduction. In continuous bending, if the number of breaking times is less than 100,000, then it is x, if it is 100,000 to less than 300,000, it is ○, and if it is 300,000 or more, it is ◎. In addition, in intermittent bending, 1,000 bendings were performed continuously at intervals of 5 hours. If the number of breaks is less than 50,000 times, then it is ×, if it is more than 50,000 times and less than 100,000 times, it is ○, and if it is more than 100,000 times, it is ○. ◎.

 [表1] [Table 1]

 [表2] [Table 2]

产业上的利用可能性 Industrial Utilization Possibility

根据本发明,能够获得间歇弯曲耐受性铜箔,能获得在现实的制品中在FPC中使用的情况下对于弯曲具有更高的耐久性的轧制铜箔、覆铜层叠板、柔性印刷布线板(FPC)。在使用具备本发明的间歇弯曲耐受性铜箔的柔性印刷布线板(FPC)的电子设备中,由于成为其可动部的FPC具备反映了现实的制品中的使用状况的弯曲耐受性,所以与仅考虑了对连续的弯曲的耐受性的现有的制品相比较,耐久性、可靠性优越。本发明是产业上有用的发明。 According to the present invention, intermittent bending resistance copper foil can be obtained, and rolled copper foil, copper clad laminate, and flexible printed wiring having higher durability against bending when used in FPC in actual products can be obtained board (FPC). In an electronic device using a flexible printed wiring board (FPC) provided with the intermittent bending-resistant copper foil of the present invention, since the FPC serving as the movable part has bending resistance reflecting the actual usage conditions in the product, Therefore, it is superior in durability and reliability compared with conventional products that only consider the resistance to continuous bending. The present invention is an industrially useful invention.

Claims (12)

1.一种间歇弯曲耐受性铜箔, 1. An intermittent bending resistant copper foil, 弯曲中的应力缓和为,相对于在25℃中0.2%的变形,满足下面的式I的条件: Stress relaxation in bending is such that the condition of the following formula I is satisfied with respect to a deformation of 0.2% at 25°C: (T0-T5)/T0 ≤ 25(%) (式I) (T 0 -T 5 )/T 0 ≤ 25 (%) (Formula I) 其中,T0表示初始应力,T5表示5小时后的应力, where T0 represents the initial stress, T5 represents the stress after 5 hours, 其中,铜箔是: Among them, copper foil is: 由铜及不可避杂质、还以合计20~500质量ppm含有从由Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V构成的组中选择的1种以上的元素而形成的铜箔;或者 Contains copper and unavoidable impurities from the group consisting of Ag, Sn, In, Ti, Zn, Zr, Fe, P, Ni, Si, Te, Cr, Nb, B, and V at a total of 20 to 500 mass ppm Copper foil formed from one or more selected elements; or 由在无氧铜或韧铜之外还以合计20~500质量ppm添加有从由Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V构成的组中选择的1种以上的元素而形成的铜箔。 In addition to oxygen-free copper or ductile copper, Ag, Sn, In, Ti, Zn, Zr, Fe, P, Ni, Si, Te, Cr, Nb, B, and Copper foil made of one or more elements selected from the group consisting of V. 2.根据权利要求1所述的间歇弯曲耐受性铜箔,从轧制平行剖面观察,每观察剖面积1000μm2的晶粒界面的长度是200μm以下。 2. The intermittent bending resistant copper foil according to claim 1, wherein the length of the crystal grain boundary per 1000 μm 2 of observed cross-sectional area is 200 μm or less when viewed in a rolled parallel section. 3.根据权利要求1所述的间歇弯曲耐受性铜箔,具有60~105GPa的范围的杨氏模量。 3 . The intermittent bending resistant copper foil according to claim 1 , which has a Young's modulus in the range of 60 to 105 GPa. 4.根据权利要求1所述的间歇弯曲耐受性铜箔,铜箔是轧制铜箔。 4. The intermittent bending resistant copper foil according to claim 1, wherein the copper foil is a rolled copper foil. 5.根据权利要求1所述的间歇弯曲耐受性铜箔,铜箔是以加工度96%以上被轧制而成的轧制铜箔。 5 . The intermittent bending resistant copper foil according to claim 1 , wherein the copper foil is a rolled copper foil with a processing degree of 96% or more. 5 . 6.根据权利要求1所述的间歇弯曲耐受性铜箔,层叠在柔性印刷布线板中。 6. The intermittent bending resistant copper foil according to claim 1, which is laminated in a flexible printed wiring board. 7.一种铜箔,在以160~400℃进行1秒钟~1小时的加热处理之后,变成权利要求1~7的任一项所述的间歇弯曲耐受性铜箔。 7 . A copper foil which becomes the intermittent bending resistant copper foil according to claim 1 , after heat-processing at 160 to 400° C. for 1 second to 1 hour. 8 . 8.一种铜箔,在以200℃进行30分钟的加热处理,或以350℃进行1秒钟的加热处理之后,变成权利要求1~6的任一项所述的间歇弯曲耐受性铜箔。 8. A copper foil having the intermittent bending resistance according to any one of claims 1 to 6 after heat treatment at 200°C for 30 minutes, or heat treatment at 350°C for 1 second copper foil. 9.一种柔性印刷布线板,层叠有权利要求1~6的任一项所述的间歇弯曲耐受性铜箔而成。 9. A flexible printed wiring board in which the intermittent bending-resistant copper foil according to any one of claims 1 to 6 is laminated. 10.一种制造权利要求1所述的间歇弯曲耐受性铜箔的制造方法,包含: 10. A method of manufacturing the intermittent bending resistant copper foil according to claim 1, comprising: 铸造铜的铸锭的工序; The process of casting copper ingots; 对铜的铸锭进行热轧的工序; The process of hot rolling copper ingots; 对热轧了的铜的铸锭进行1次以上的冷轧和退火的工序;以及 A process of cold-rolling and annealing hot-rolled copper ingots more than once; and 以总加工度即最终轧制加工度为96%以上的方式进行用于做成成品厚度的最后的冷轧的工序,其中,在对热轧了的铜的铸锭进行1次以上的冷轧和退火的工序中, The final cold-rolling process for making the finished product thickness is performed so that the total working ratio, that is, the final rolling working ratio, is 96% or more, wherein the hot-rolled copper ingot is cold-rolled once or more and annealing process, 最后进行的退火以5℃/秒以上40℃/秒以下的升温速度进行, The final annealing is carried out at a temperature increase rate of 5°C/sec to 40°C/sec, 其中,铜的铸锭是: Among them, copper ingots are: 由含有铜及不可避杂质、还以合计20~500质量ppm含有从由Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V构成的组中选择的1种以上的元素而形成的铜的铸锭;或者 Contains copper and unavoidable impurities, and also contains Ag, Sn, In, Ti, Zn, Zr, Fe, P, Ni, Si, Te, Cr, Nb, B, and V in a total of 20 to 500 mass ppm Ingots of copper formed from one or more elements selected from ; or 由在无氧铜或韧铜之外还以合计20~500质量ppm添加有从由Ag、Sn、In、Ti、Zn、Zr、Fe、P、Ni、Si、Te、Cr、Nb、B及V构成的组中选择的1种以上的元素而形成的铜的铸锭。 In addition to oxygen-free copper or ductile copper, Ag, Sn, In, Ti, Zn, Zr, Fe, P, Ni, Si, Te, Cr, Nb, B, and A copper ingot made of one or more elements selected from the group consisting of V. 11.根据权利要求10所述的制造方法,在对热轧了的铜的铸锭进行1次以上的冷轧和退火的工序中, 11. The manufacturing method according to claim 10, in the step of cold-rolling and annealing the hot-rolled copper ingot more than once, 最后进行的退火的稍前进行的冷轧以60%~90%的加工度即总加工度进行。 The cold rolling performed just before the final annealing is performed at a working degree of 60% to 90%, that is, a total working degree. 12.一种间歇弯曲耐受性铜箔的制造方法,包含:对通过权利要求10或11所述的制造方法制造的轧制铜箔以160~400℃进行1秒钟~1小时的加热处理的工序。 12. A method of manufacturing intermittent bending resistant copper foil, comprising: heat-treating the rolled copper foil manufactured by the manufacturing method according to claim 10 or 11 at 160 to 400° C. for 1 second to 1 hour process.
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