CN103510073A - Gas mixer - Google Patents
Gas mixer Download PDFInfo
- Publication number
- CN103510073A CN103510073A CN201310448853.7A CN201310448853A CN103510073A CN 103510073 A CN103510073 A CN 103510073A CN 201310448853 A CN201310448853 A CN 201310448853A CN 103510073 A CN103510073 A CN 103510073A
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- CN
- China
- Prior art keywords
- gas
- hollow ball
- inlet pipe
- gas mixer
- hollow sphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 33
- 239000012159 carrier gas Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
Abstract
The invention discloses a gas mixer. The gas mixer comprises a first hollow sphere and a second hollow sphere. A first gas inlet pipe and at least one second gas inlet pipe are arranged on one side of the first hollow sphere. The tail end of the first gas inlet pipe is positioned at a gas outlet of the first hollow sphere; the gas outlet of the first hollow sphere is connected with a gas inlet of the second hollow sphere through a pipe; a certain included angle is formed between the gas outlet direction of the second hollow sphere and the gas inlet direction of the second hollow sphere. The gas mixer disclosed by the invention can achieve the effect of rapidly and completely mixing gas, ensures that the concentration of the gas mixture is not liable to fluctuate and the quality of the gas mixture is stable and reliable, and effectively improves and controls the growth quality of semiconductors.
Description
Technical field
The invention belongs to gas reaction device field, be specifically related to a kind of gas mixer.
Background technology
In semicon industry, vapour deposition process is to prepare the method that semiconductor film material is conventional, gas used while growing is comprised of carrier gas and multiple reaction gas conventionally, the mode of existing importing gas normally directly passes into respectively reaction chamber by the inlet pipe of each gas, because the flow velocity of each gas is not identical, intake pressure is also different, less air inlet produces certain squeezing action to flow to make air inlet meeting that flow is large, and gas is very short in the reaction chamber residence time, multiple gases cannot fully be mixed at reaction chamber, cause gas to occur fluctuation in the concentration of reaction chamber, affect Semiconductor Film Growth quality.
Summary of the invention
The object of the invention is to enter gas for existing vapour deposition process and mix inhomogeneous problem, a kind of gas mixer is provided.
It is as follows that the present invention realizes the technical scheme that above-mentioned purpose adopts:
, comprise the first hollow ball and the second hollow ball,
A side at described the first hollow ball is provided with the first inlet pipe and at least one second inlet pipe, the air outlet place of the end of described the first inlet pipe in the first hollow ball;
The air outlet of described the first hollow ball is connected by pipeline with the inlet mouth of described the second hollow ball;
The air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball keep certain angle.
Further, described the first hollow ball is (1～1.5) with the diameter ratio of the second hollow ball: 1.
Further, the angle between described the first inlet pipe and the second inlet pipe is 20～80 degree.
Further, the angle between described the first inlet pipe and the second inlet pipe is 50～60 degree.
Further, described the first inlet pipe latter end is contraction-like.
Further, described the first inlet pipe latter end is conial tube.
Further, the angle of the air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball is 90～150 degree.
Further, the angle of the air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball is 120 degree.
Further, described the first hollow ball is provided with 2～3 the second inlet pipe.
Adopt gas mixer of the present invention can realize mixing fast fully of gas, mixed gas concentration is difficult for producing fluctuation, and the steady quality of mixed gas is reliable, effectively improves and controls semiconductor growing quality.
Accompanying drawing explanation
Fig. 1 is the structural representation of gas mixer of the present invention.
Embodiment
Below in conjunction with accompanying drawing, the preferred embodiments of the present invention are described, should be appreciated that preferred embodiment described herein, only for description and interpretation the present invention, is not intended to limit the present invention.
embodiment 1
As shown in Figure 1, the diameter that described gas mixer comprises the first hollow ball 3 and the second hollow ball 4, the first hollow balls 3 and the second hollow ball 4 is than being 1.2:1.A side at the first hollow ball 3 is provided with the first inlet pipe 1 and two the second inlet pipe 2, and wherein, the latter end of the first inlet pipe 1 stretches to the inside of the first hollow ball 3, and makes the end of the first inlet pipe 1 at the place, air outlet of the first hollow ball 3.The first inlet pipe 1 latter end is preferably contraction-like, as is conial tube, is conducive to so further to improve in this inlet pipe flow velocity when gas is given vent to anger, and two the second inlet pipe 2 respectively and between the first inlet pipe 1, keep the angle of 60 degree.The air outlet of the first hollow ball 3 is connected with the inlet mouth of the second hollow ball 4 by pipeline 6, at the opposite side of the second hollow ball 4, sets out gas port, and makes the air outlet direction of the second hollow ball 4 and the inlet mouth direction of the second hollow ball 4 keep the angles of 120 degree.The quantity of the second inlet pipe 2 can be determined according to the number of real reaction use gas kind.
During use, gas mixer is connected with reaction unit with source of the gas respectively, wherein, the gas of flow maximum (this gas is carrier gas under normal conditions) enters from the first inlet pipe 1, the gas that other flow is relatively little enters from the second inlet pipe 2 respectively, the gas of flow maximum is accelerated to enter the second hollow ball 4 after ejection by the first inlet pipe 1, at first hollow ball 3 centre ofs sphere, produce a negative pressure simultaneously, thereby can not push the γ-ray emission of the second inlet pipe 2, make second to enter the gas of being managed in 2 and enter smoothly the first hollow ball 3, each gas enters after the second hollow ball 4, utilize the unexpected change of volume large, gas is mixed at the second hollow ball 4, the air outlet of the second hollow ball 4 and air intake are certain angle, avoid the air-flow that enters the second hollow ball 4 directly facing to air outlet, like this, gas forms certain eddy flow at the interior energy of the second hollow ball 4, gas mixes fully, evenly.Mixed gas escapes and enter reaction unit by the escape pipe 5 being connected on the second hollow ball 4 air outlets again.
Finally it should be noted that: the foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, although the present invention is had been described in detail with reference to previous embodiment, for a person skilled in the art, its technical scheme that still can record aforementioned each embodiment is modified, or part technical characterictic is wherein equal to replacement.Within the spirit and principles in the present invention all, any modification of doing, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.
Claims (9)
1. a gas mixer, comprises the first hollow ball and the second hollow ball,
A side at described the first hollow ball is provided with the first inlet pipe and at least one second inlet pipe, the air outlet place of the end of described the first inlet pipe in the first hollow ball;
The air outlet of described the first hollow ball is connected by pipeline with the inlet mouth of described the second hollow ball;
The air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball keep certain angle.
2. gas mixer according to claim 1, is characterized in that: described the first hollow ball is (1～1.5) with the diameter ratio of the second hollow ball: 1.
3. gas mixer according to claim 1, is characterized in that: the angle between described the first inlet pipe and the second inlet pipe is 20～80 degree.
4. gas mixer according to claim 3, is characterized in that: the angle between described the first inlet pipe and the second inlet pipe is 50～60 degree.
5. gas mixer according to claim 1, is characterized in that: described the first inlet pipe latter end is contraction-like.
6. gas mixer according to claim 5, is characterized in that: described the first inlet pipe latter end is conial tube.
7. gas mixer according to claim 1, is characterized in that: the angle of the air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball is 90～150 degree.
8. gas mixer according to claim 7, is characterized in that: the angle of the air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball is 120 degree.
9. gas mixer according to claim 7, is characterized in that: described the first hollow ball is provided with 2～3 the second inlet pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310448853.7A CN103510073A (en) | 2013-09-28 | 2013-09-28 | Gas mixer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310448853.7A CN103510073A (en) | 2013-09-28 | 2013-09-28 | Gas mixer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103510073A true CN103510073A (en) | 2014-01-15 |
Family
ID=49893486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310448853.7A Pending CN103510073A (en) | 2013-09-28 | 2013-09-28 | Gas mixer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103510073A (en) |
Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS5024263A (en) * | 1973-06-16 | 1975-03-15 | ||
| JPS5024263B2 (en) * | 1971-08-16 | 1975-08-14 | ||
| CN85200098U (en) * | 1985-04-01 | 1985-10-10 | 武汉大学 | Two-step mixing pump |
| CN2065096U (en) * | 1990-03-23 | 1990-11-07 | 中国科学院兰州化学物理研究所 | Gas mixer |
| CN1476350A (en) * | 2001-08-02 | 2004-02-18 | ����-��ϣ�ɷݹ�˾ | Device for mixing fluid |
| CN1724131A (en) * | 2005-06-16 | 2006-01-25 | 上海交通大学 | Injection/injection hot and cold water mixing device |
| JP2009136716A (en) * | 2007-12-04 | 2009-06-25 | Hitachi Zosen Corp | Gas mixing equipment |
| CN101601965A (en) * | 2009-07-24 | 2009-12-16 | 华电环保系统工程有限公司 | The ammonia-spraying grid device of SCR method denitrating flue gas, and SCR method flue-gas denitration process |
| CN201394414Y (en) * | 2009-05-09 | 2010-02-03 | 江苏中科节能环保技术有限公司 | Injection Ammonia Mixing Mechanism of SCR Reactor |
| CN101815571A (en) * | 2007-10-02 | 2010-08-25 | 英尼奥斯欧洲有限公司 | Mixing apparatus for gases |
| CN202161929U (en) * | 2011-07-18 | 2012-03-14 | 湖北三宁化工股份有限公司 | Combined ejector |
| CN102500256A (en) * | 2011-11-11 | 2012-06-20 | 南通申东冶金机械有限公司 | Rotary jet mixer |
| CN102974257A (en) * | 2012-12-03 | 2013-03-20 | 山西新华化工有限责任公司 | Dynamic activity detection mixer |
| CN203474892U (en) * | 2013-09-28 | 2014-03-12 | 无锡荣能半导体材料有限公司 | Gas mixer |
-
2013
- 2013-09-28 CN CN201310448853.7A patent/CN103510073A/en active Pending
Patent Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5024263B2 (en) * | 1971-08-16 | 1975-08-14 | ||
| JPS5024263A (en) * | 1973-06-16 | 1975-03-15 | ||
| CN85200098U (en) * | 1985-04-01 | 1985-10-10 | 武汉大学 | Two-step mixing pump |
| CN2065096U (en) * | 1990-03-23 | 1990-11-07 | 中国科学院兰州化学物理研究所 | Gas mixer |
| CN1476350A (en) * | 2001-08-02 | 2004-02-18 | ����-��ϣ�ɷݹ�˾ | Device for mixing fluid |
| CN1724131A (en) * | 2005-06-16 | 2006-01-25 | 上海交通大学 | Injection/injection hot and cold water mixing device |
| CN101815571A (en) * | 2007-10-02 | 2010-08-25 | 英尼奥斯欧洲有限公司 | Mixing apparatus for gases |
| JP2009136716A (en) * | 2007-12-04 | 2009-06-25 | Hitachi Zosen Corp | Gas mixing equipment |
| CN201394414Y (en) * | 2009-05-09 | 2010-02-03 | 江苏中科节能环保技术有限公司 | Injection Ammonia Mixing Mechanism of SCR Reactor |
| CN101601965A (en) * | 2009-07-24 | 2009-12-16 | 华电环保系统工程有限公司 | The ammonia-spraying grid device of SCR method denitrating flue gas, and SCR method flue-gas denitration process |
| CN202161929U (en) * | 2011-07-18 | 2012-03-14 | 湖北三宁化工股份有限公司 | Combined ejector |
| CN102500256A (en) * | 2011-11-11 | 2012-06-20 | 南通申东冶金机械有限公司 | Rotary jet mixer |
| CN102974257A (en) * | 2012-12-03 | 2013-03-20 | 山西新华化工有限责任公司 | Dynamic activity detection mixer |
| CN203474892U (en) * | 2013-09-28 | 2014-03-12 | 无锡荣能半导体材料有限公司 | Gas mixer |
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| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20140115 |
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| RJ01 | Rejection of invention patent application after publication |