[go: up one dir, main page]

CN103576243B - Array micro electro mechanical variable optical attenuator - Google Patents

Array micro electro mechanical variable optical attenuator Download PDF

Info

Publication number
CN103576243B
CN103576243B CN201310561866.5A CN201310561866A CN103576243B CN 103576243 B CN103576243 B CN 103576243B CN 201310561866 A CN201310561866 A CN 201310561866A CN 103576243 B CN103576243 B CN 103576243B
Authority
CN
China
Prior art keywords
array
shadow shield
variable optical
optical attenuator
shield
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201310561866.5A
Other languages
Chinese (zh)
Other versions
CN103576243A (en
Inventor
毛旭
吕兴东
魏伟伟
杨晋玲
杨富华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institute of Semiconductors of CAS
Original Assignee
Institute of Semiconductors of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institute of Semiconductors of CAS filed Critical Institute of Semiconductors of CAS
Priority to CN201310561866.5A priority Critical patent/CN103576243B/en
Publication of CN103576243A publication Critical patent/CN103576243A/en
Application granted granted Critical
Publication of CN103576243B publication Critical patent/CN103576243B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

本发明提供了一种阵列型微机电可变光衰减器。该阵列型微机电可变光衰减器通过使用固定遮光板与可动遮光块相结合的方法,有效低控制了光的散射和光束尺寸,实现了良好的光衰减性能。

The invention provides an array microelectromechanical variable optical attenuator. The array-type micro-electromechanical variable optical attenuator uses a combination of a fixed shading plate and a movable shading block to effectively control light scattering and beam size, and achieve good light attenuation performance.

Description

阵列型微机电可变光衰减器Array MEMS Variable Optical Attenuator

技术领域technical field

本发明涉及光电技术领域,尤其涉及一种阵列型微机电可变光衰减器。The invention relates to the field of optoelectronic technology, in particular to an array type micro-electromechanical variable optical attenuator.

背景技术Background technique

可变光衰减器(Variable Optical Attenuator,简称VOA)作为一种重要的无源光功率调整器件,可以在光网络中产生可控的衰减,与其它器件结合很好地实现光增益平坦、动态增益平衡以及传输功率均衡等,在波分复用(WDM)系统中具有广泛的应用1。Variable optical attenuator (Variable Optical Attenuator, referred to as VOA), as an important passive optical power adjustment device, can produce controllable attenuation in the optical network, and can be combined with other devices to achieve flat optical gain and dynamic gain. Balance and transmission power equalization, etc., have a wide range of applications in wavelength division multiplexing (WDM) systems1.

VOA有多种不同类型的制造技术,主要有可调机械式技术、磁光技术、液晶技术、声光技术、热光技术、平面波导技术、MEMS技术等形式。基于MEMS技术的器件体积小、性能好、易于实现阵列、功耗低,适应市场发展的需要。采用MEMS技术制作的VOA,除保持传统技术VOA的光学性能外,还具有衰减范围大、体积小、易于多通道集成、响应速度快、性价比高等优点,被认为是满足未来全光通信网络的理想器件之一。VOA has many different types of manufacturing technologies, mainly including adjustable mechanical technology, magneto-optical technology, liquid crystal technology, acousto-optic technology, thermo-optic technology, planar waveguide technology, MEMS technology and other forms. Devices based on MEMS technology are small in size, good in performance, easy to implement arrays, and low in power consumption, meeting the needs of market development. VOA made with MEMS technology, in addition to maintaining the optical performance of traditional technology VOA, also has the advantages of large attenuation range, small size, easy multi-channel integration, fast response speed, and high cost performance. It is considered to be ideal for future all-optical communication networks. One of the devices.

MEMS VOA的基本原理是一个MEMS可动结构带动微反光镜或遮光板运动。按驱动方法不同,MEMS VOA有静电、电磁、电热、压电和混合驱动等方式。自从上世纪九十年代以来,各种形式的MEMS VOA已被人们广泛研究,所利用的工艺也不断更新。The basic principle of MEMS VOA is that a MEMS movable structure drives the movement of the micro-mirror or visor. According to different driving methods, MEMS VOA has electrostatic, electromagnetic, electrothermal, piezoelectric and hybrid driving methods. Since the 1990s, various forms of MEMS VOAs have been extensively studied, and the techniques used have been continuously updated.

光网络实用化需要解决的关键问题之一是各波长通道间的功率不均衡,许多场合需要减少光信号的功率。随着波分复用(WDM)在光通信中的应用,在光放大器前的多个光信号传输通道上必须进行增益平坦化或信道功率均衡,以防止某个或某些信道的输入功率过大,引起光放大器增益饱和。在半实物仿真成像等领域需要大规模的光衰减器阵列以实现更精确的成像控制。One of the key problems to be solved in the practical application of optical networks is the unbalanced power among wavelength channels. In many cases, it is necessary to reduce the power of optical signals. With the application of wavelength division multiplexing (WDM) in optical communication, gain flattening or channel power equalization must be performed on multiple optical signal transmission channels before the optical amplifier to prevent the input power of one or some channels from being too high. Large, causing the gain saturation of the optical amplifier. Large-scale optical attenuator arrays are required in fields such as hardware-in-the-loop imaging to achieve more precise imaging control.

然而,尽管MEMS VOA的相关报道众多,研究方向主要集中在单个器件,阵列型可变光衰减器的相关研究比较少,还未有可供实用的阵列型微机电可变光衰减器被提出。However, although there are many reports on MEMS VOA, the research direction is mainly focused on a single device, and there are relatively few related studies on array-type variable optical attenuators, and no practical array-type MEMS variable optical attenuators have been proposed.

发明内容Contents of the invention

(一)要解决的技术问题(1) Technical problems to be solved

鉴于上述技术问题,本发明提供了一种阵列型微机电可变光衰减器。In view of the above technical problems, the present invention provides an array micro-electromechanical variable optical attenuator.

(二)技术方案(2) Technical solutions

根据本发明的一个方面,提供了一种阵列型微机电可变光衰减器。该阵列型微机电可变光衰减器包括:固定遮光板、可控遮光板、磁场产生装置和驱动电路。其中,固定遮光板,其中心区域具有通光孔阵列,包含若干个固定通光孔。可控遮光板键合于固定遮光板的下方,其中心区域具有与通光孔阵列对应的可动遮光块阵列,该可动遮光块阵列中的每一可动遮光块单元包括:可动遮光块,悬空设置,正对其对应的固定通光孔,通过位于两侧的弹性梁连接至衬底。磁场产生装置,位于可控遮光板的下方或上方,或可控遮光板的外围,用于产生垂直于固定遮光板和可控遮光板所在平面的轴向磁场。驱动电路,通过金属引线分别电性连接可动遮光块阵列中的每一可动遮光块单元可动遮光块的弹性梁。其中,输入光纤阵列中的各光纤插入该固定通光孔阵列相应的固定通光孔中,输出光纤阵列位于可控遮光板的下方,其各光纤分别与输入光纤阵列的各个光纤相对准;对于可控遮光板中的每一可动遮光块单元而言,在驱动电路的驱动下,可控遮光板的弹性梁上通过电流,电流与轴向磁场作用产生洛伦兹力,在洛伦兹力作用下,弹性梁会发生形变,从而使相应的可动遮光块在平衡位置附近运动,从而改变由输入光纤经由固定遮光板上相应的通光孔、可动遮光块进入相应输出光纤的光通量。According to one aspect of the present invention, an array micro-electromechanical variable optical attenuator is provided. The array microelectromechanical variable optical attenuator includes: a fixed shading plate, a controllable shading plate, a magnetic field generating device and a driving circuit. Wherein, the fixed shading plate has a light hole array in its central area, including several fixed light holes. The controllable shading plate is bonded under the fixed shading plate, and its central area has a movable shading block array corresponding to the light hole array, and each movable shading block unit in the movable shading block array includes: a movable shading block The blocks are suspended in the air, facing the corresponding fixed light holes, and connected to the substrate through elastic beams on both sides. The magnetic field generating device is located below or above the controllable shading plate, or on the periphery of the controllable shading plate, and is used to generate an axial magnetic field perpendicular to the plane where the fixed shading plate and the controllable shading plate are located. The drive circuit is electrically connected to the elastic beams of each movable light-shielding block unit in the movable light-shielding block array through metal leads. Wherein, each optical fiber in the input optical fiber array is inserted into the fixed optical hole corresponding to the fixed optical hole array, the output optical fiber array is located below the controllable light-shielding plate, and each optical fiber is aligned with each optical fiber of the input optical fiber array; For each movable shading block unit in the controllable shading plate, driven by the drive circuit, the elastic beam of the controllable shading plate passes a current, and the action of the current and the axial magnetic field generates a Lorentz force. Under the force, the elastic beam will deform, so that the corresponding movable shading block moves near the equilibrium position, thereby changing the luminous flux from the input fiber entering the corresponding output fiber through the corresponding light hole on the fixed shading plate and the movable shading block .

(三)有益效果(3) Beneficial effects

从上述技术方案可以看出,本发明阵列型微机电可变光衰减器具有以下有益效果:It can be seen from the above technical solutions that the array type MEMS variable optical attenuator of the present invention has the following beneficial effects:

(1)通过使用固定遮光板与可动遮光块相结合的方法,有效低控制了光的散射和光束尺寸,实现了良好的光衰减性能;(1) By using the method of combining the fixed shading plate and the movable shading block, the light scattering and beam size are effectively and lowly controlled, and good light attenuation performance is achieved;

(2)各单元之间采用并联结构,通过电流控制,阵列的每个单元可独立或同步改变移动状态,为器件大规模应用提供基础;(2) Each unit adopts a parallel structure, and through current control, each unit of the array can change the moving state independently or synchronously, providing a basis for large-scale application of the device;

(3)提出了可动遮光块结构和引线排布方案,大幅提高了晶片空间利用率,整个阵列可以在集成电路控制下可靠工作。(3) A movable shading block structure and lead arrangement scheme are proposed, which greatly improves the space utilization of the chip, and the entire array can work reliably under the control of an integrated circuit.

附图说明Description of drawings

图1A为根据本发明实施例阵列型微机电可变光衰减器的剖面示意图;1A is a schematic cross-sectional view of an array micro-electromechanical variable optical attenuator according to an embodiment of the present invention;

图1B为图1所示阵列型微机电可变光衰减器中可控遮光板中可控通光孔的立体图;Fig. 1B is a perspective view of the controllable light-through hole in the controllable shading plate of the array microelectromechanical variable optical attenuator shown in Fig. 1;

图2A为图1所示阵列型微机电可变光衰减器中固定遮光板的上视图;FIG. 2A is a top view of a fixed light-shielding plate in the array microelectromechanical variable optical attenuator shown in FIG. 1;

图2B为图1所示阵列型微机电可变光衰减器中固定遮光板的剖面示意图;2B is a schematic cross-sectional view of a fixed light-shielding plate in the array-type MEMS variable optical attenuator shown in FIG. 1;

图3A为图1所示阵列型微机电可变光衰减器中可控遮光板的上视图;Fig. 3A is a top view of the controllable shading plate in the array microelectromechanical variable optical attenuator shown in Fig. 1;

图3B为图1所示阵列型微机电可变光衰减器中可控遮光板的剖面示意图;3B is a schematic cross-sectional view of the controllable light-shielding plate in the array microelectromechanical variable optical attenuator shown in FIG. 1;

图3C为图3A和图3B所示可控遮光板上可控通光孔阵列某一区域通光孔电路连接关系的放大图;Fig. 3C is an enlarged view of the circuit connection relationship of the controllable light hole array in a certain area of the controllable light shielding plate shown in Fig. 3A and Fig. 3B;

图4为图1所示阵列型微机电可变光衰减器工作原理的示意图。FIG. 4 is a schematic diagram of the working principle of the array type MEMS variable optical attenuator shown in FIG. 1 .

【本发明主要元件符号说明】[Description of the main component symbols of the present invention]

100-输入光纤阵列;100-input fiber array;

200-固定遮光板;200 - fixed visor;

210-通光孔阵列;    211-固定通光孔;210-light hole array; 211-fixed light hole;

230-键合区;230-bonding area;

300-可控遮光板;300-controllable visor;

310-可动遮光块阵列;    320-金属引线区;310-movable shading block array; 320-metal lead area;

330-键合区;         311b-可动遮光块;330-bonding area; 311b-movable shading block;

311c-弹性梁;           331-控制线;311c-elastic beam; 331-control line;

332-地线;        333-锚点;332-ground wire; 333-anchor point;

400-输出光纤阵列;400- output fiber array;

500-磁场产生装置;500-magnetic field generating device;

510-粘结剂。510 - Binder.

具体实施方式Detailed ways

为使本发明的目的、技术方案和优点更加清楚明白,以下结合具体实施例,并参照附图,对本发明进一步详细说明。需要说明的是,在附图或说明书描述中,相似或相同的部分都使用相同的图号。附图中未绘示或描述的实现方式,为所属技术领域中普通技术人员所知的形式。另外,虽然本文可提供包含特定值的参数的示范,但应了解,参数无需确切等于相应的值,而是可在可接受的误差容限或设计约束内近似于相应的值。实施例中提到的方向用语,例如“上”、“下”、“前”、“后”、“左”、“右”等,仅是参考附图的方向。因此,使用的方向用语是用来说明并非用来限制本发明的保护范围。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings. It should be noted that, in the drawings or descriptions of the specification, similar or identical parts all use the same figure numbers. Implementations not shown or described in the accompanying drawings are forms known to those of ordinary skill in the art. Additionally, while illustrations of parameters including particular values may be provided herein, it should be understood that the parameters need not be exactly equal to the corresponding values, but rather may approximate the corresponding values within acceptable error margins or design constraints. The directional terms mentioned in the embodiments, such as "upper", "lower", "front", "rear", "left", "right", etc., are only referring to the directions of the drawings. Therefore, the directional terms used are for illustration and not for limiting the protection scope of the present invention.

本发明提供了一种基于洛伦兹力驱动的阵列型微机电可变光衰减器。该阵列型微机电可变光衰减器采用MEMS工艺制备,其固定遮光板与可动遮光块的结合实现了良好的光衰减性能。The invention provides an array type micro-electromechanical variable optical attenuator driven by Lorentz force. The array-type micro-electromechanical variable optical attenuator is manufactured by MEMS technology, and the combination of the fixed shading plate and the movable shading block realizes good light attenuation performance.

在本发明的一个示例性实施例中,提供了一种阵列型微机电可变光衰减器。图1A为根据本发明实施例阵列型微机电可变光衰减器的剖面示意图;图1B为图1所示阵列型微机电可变光衰减器中可控遮光板中带有弹性梁的可动遮光块单元的立体图。请参照图1A和图1B,该阵列型微机电可变光衰减器包括:固定遮光板200、可控遮光板300、磁场产生装置500和驱动电路。其中,固定遮光板200,其中心区域具有通光孔阵列210,包括若干个通光孔,输入光纤阵列100中的各光纤插入该固定通光孔阵列210相应的固定通光孔中。可控遮光板300,键合于固定遮光板200的下方,其中心区域具有带弹性梁的可动遮光块阵列310,该可动遮光块阵列中的每一可动遮光块单元311包括:可动遮光块311b,悬空设置,正对其对应的固定通光孔,其通过位于两侧的弹性梁311c连接至衬底,且所述弹性梁311c通过器件上的金属引线电性连接至驱动电路;其中,输出光纤阵列400位于所述可控遮光板的下方,其各光纤分别与输入光纤阵列的各个光纤相对准。磁场产生装置500,位于可控遮光板的下方或上方,或可控遮光板的外围,用于产生垂于固定遮光板200和可控遮光板300所在平面的轴向磁场。驱动电路,用于提供大小可控电流,使可变光衰减器阵列在不同的衰减状态下转换。In an exemplary embodiment of the present invention, an array type MEMS variable optical attenuator is provided. Fig. 1A is a schematic cross-sectional view of an array-type micro-electro-mechanical variable optical attenuator according to an embodiment of the present invention; Perspective view of the shading block unit. Please refer to FIG. 1A and FIG. 1B , the array microelectromechanical variable optical attenuator includes: a fixed shading plate 200 , a controllable shading plate 300 , a magnetic field generating device 500 and a driving circuit. Wherein, the fixed light-shielding plate 200 has a light hole array 210 in its central area, including several light holes, and each optical fiber in the input fiber array 100 is inserted into the corresponding fixed light hole of the fixed light hole array 210 . The controllable shading plate 300 is bonded under the fixed shading plate 200, and its central area has a movable shading block array 310 with elastic beams. Each movable shading block unit 311 in the movable shading block array includes: The movable light-shielding block 311b is suspended in the air, facing the corresponding fixed light-through hole, which is connected to the substrate through the elastic beams 311c on both sides, and the elastic beams 311c are electrically connected to the drive circuit through the metal leads on the device ; Wherein, the output fiber array 400 is located below the controllable light-shielding plate, and each optical fiber thereof is respectively aligned with each optical fiber of the input optical fiber array. The magnetic field generating device 500 is located below or above the controllable shading plate, or on the periphery of the controllable shading plate, and is used to generate an axial magnetic field perpendicular to the plane where the fixed shading plate 200 and the controllable shading plate 300 are located. The drive circuit is used to provide a controllable current to make the variable optical attenuator array switch in different attenuation states.

其中,对于所述可控遮光板中的每一可动遮光块单元而言,在驱动电路的驱动下,可控遮光板的弹性梁上通过电流,电流与所述轴向磁场作用产生洛伦兹力,在洛伦兹力作用下,弹性梁会发生形变,从而使相应的可动遮光块在平衡位置附近运动,从而改变由输入光纤经由固定遮光板上相应的通光孔、可动遮光块进入相应输出光纤的光通量。Wherein, for each movable shading block unit in the controllable shading plate, driven by the driving circuit, the elastic beam of the controllable shading plate passes a current, and the current interacts with the axial magnetic field to generate Loren Under the action of Lorentz force, the elastic beam will deform, so that the corresponding movable shading block moves near the equilibrium position, thereby changing the input optical fiber through the corresponding light hole on the fixed shading plate, the movable shading block Block the luminous flux entering the corresponding output fiber.

以下针对本实施例阵列型微机电可变光衰减器的各个组成部分进行详细说明。Each component of the array micro-electromechanical variable optical attenuator of this embodiment will be described in detail below.

固定遮光板fixed visor

图2A为图1所示阵列型微机电可变光衰减器中固定遮光板的上视图。图2B为图1所示阵列型微机电可变光衰减器中固定遮光板的剖面示意图。FIG. 2A is a top view of a fixed light-shielding plate in the array microelectromechanical variable optical attenuator shown in FIG. 1 . FIG. 2B is a schematic cross-sectional view of a fixed light-shielding plate in the array-type MEMS variable optical attenuator shown in FIG. 1 .

请参照图2A和图2B,固定遮光板200由圆形基板制备而成,其中心是通光孔阵列210。在固定通光孔阵列210的两侧,具有驱动电路预留孔。外围是与可控遮光板300键合的键合区域230。Please refer to FIG. 2A and FIG. 2B , the fixed light-shielding plate 200 is made of a circular substrate with a light hole array 210 at its center. On both sides of the fixed light hole array 210, there are holes reserved for the driving circuit. The periphery is the bonding area 230 bonded with the controllable light-shielding plate 300 .

在固定遮光板的通光孔阵列中,固定通光孔211为上宽下窄的结构,较宽的开口方便光纤安装;通光孔较窄的一端与光束大小有关,既保证光束正常通过,又可以限制光的发散,使光束照射在可控遮光板300上的面积最小,从而有利于可控遮光板中的遮光单元进行工作。In the light hole array of the fixed light-shielding plate, the fixed light hole 211 is a structure with a wide top and a narrow bottom. The wider opening is convenient for optical fiber installation; the narrower end of the light hole is related to the size of the beam, which ensures the normal passage of the light beam. In addition, the divergence of light can be limited, so that the area where the light beam irradiates on the controllable shading plate 300 is minimized, thereby facilitating the work of the shading unit in the controllable shading plate.

可控遮光板Controllable visor

图3A为图1所示阵列型微机电可变光衰减器中可控遮光板的上视图。图3B为图1所示阵列型微机电可变光衰减器中可控遮光板的剖面示意图。图3C为图3A和图3B所示可控遮光板上可控通光孔阵列某一区域通光孔电路连接关系的放大图。FIG. 3A is a top view of the controllable light-shielding plate in the array MEMS variable optical attenuator shown in FIG. 1 . 3B is a schematic cross-sectional view of the controllable light-shielding plate in the array MEMS variable optical attenuator shown in FIG. 1 . FIG. 3C is an enlarged view of the circuit connection relationship of the light-through holes in a certain area of the controllable light-through-hole array on the controllable shading plate shown in FIG. 3A and FIG. 3B .

请参照图3A,可控遮光板300利用MEMS工艺技术在SOI晶圆基片上制作,其形状与尺寸与固定遮光板对应。该可控遮光板300的中心区域为可动遮光块阵列310。在可动遮光块阵列310的四周为金属引线区320。在整个可控遮光板300的外围是与固定遮光板200键合的键合区330,即固定遮光板200和可控遮光板300通过键合方式集成,两者之间形成键合层230。Referring to FIG. 3A , the controllable shading plate 300 is fabricated on the SOI wafer substrate using MEMS technology, and its shape and size correspond to the fixed shading plate. The central area of the controllable shading plate 300 is a movable shading block array 310 . Around the movable light-shielding block array 310 is a metal lead area 320 . On the periphery of the entire controllable light-shielding plate 300 is a bonding area 330 bonded to the fixed light-shielding plate 200 , that is, the fixed light-shielding plate 200 and the controllable light-shielding plate 300 are integrated by bonding, and a bonding layer 230 is formed between them.

请参照图3A和图3B,可控遮光板300的中心区域具有可动遮光块阵列,每一可动遮光块单元包括:可动遮光块,悬空设置,与固定通光孔阵列中相应的固定通光孔相对准,其直径大于所述固定通光孔的直径;其通过位于两侧的弹性梁311c连接至衬底,且所述弹性梁311c通过金属互连线电性连接至驱动电路。其中,输出光纤阵列400位于所述可控遮光板的下方,其各光纤分别通过通光孔本体对准固定遮光板上相应的固定通光孔Please refer to Fig. 3A and Fig. 3B, the central area of the controllable shading plate 300 has an array of movable shading blocks, each movable shading block unit includes: The apertures are aligned and have a diameter larger than that of the fixed apertures; they are connected to the substrate through elastic beams 311c on both sides, and the elastic beams 311c are electrically connected to the driving circuit through metal interconnection wires. Wherein, the output optical fiber array 400 is located below the controllable light-shielding plate, and each optical fiber is aligned with the corresponding fixed light-through hole on the fixed light-shielding plate through the light-through hole body.

本发明中,固定通光孔为方形,圆形或者三角形等形状,其尺寸与光束的尺寸相关,通常在1微米到500微米的范围内,可动遮光块为对应的方形,圆形或者三角形等形状,其尺寸略大于固定通光孔几个微米到几十个微米。此外,为使整个可控通光孔阵列可以在集成电路提供的电压、电流下正常工作,降低器件的功耗,需合理设计器件连线,使工作电流尽量减小,电阻不能过大。In the present invention, the fixed light hole is square, circular or triangular in shape, and its size is related to the size of the light beam, usually in the range of 1 micron to 500 microns, and the movable light-shielding block is a corresponding square, circular or triangular shape. and other shapes, and its size is slightly larger than the fixed light hole by a few microns to tens of microns. In addition, in order to make the entire controllable aperture array work normally under the voltage and current provided by the integrated circuit and reduce the power consumption of the device, it is necessary to reasonably design the device connection to minimize the working current and prevent the resistance from being too large.

如图3A和图3C所示,金属引线区330位于可控遮光板阵列外围,包含控制线331、地线332,以及锚点333;锚点333用于与控制电路压焊实现电学互联。As shown in Figure 3A and Figure 3C, the metal lead area 330 is located on the periphery of the controllable light-shielding plate array, including control lines 331, ground lines 332, and anchor points 333; the anchor points 333 are used for electrical interconnection with the control circuit by pressure welding.

如图3A所示,为了有效利用可控遮光板阵列基片的空白空间,将金属互联线布置在器件单元的支撑区域。在保证引线之间不相互影响的电学可靠性前提下,尽量增加引线宽度,减小长度。通过将地线332做成网络状的结构,实现所有地线332并联,有效地降低了电阻。这些设计既节省空间,并减小了总电阻,满足了驱动电路的工作要求,使整个可变光衰减器阵列的性能得到提升。As shown in FIG. 3A , in order to effectively utilize the blank space of the array substrate of the controllable light-shielding plate, the metal interconnection lines are arranged in the supporting area of the device unit. Under the premise of ensuring the electrical reliability of the lead wires without mutual influence, the width of the lead wires should be increased as much as possible and the length should be reduced. By making the ground wires 332 into a network structure, all the ground wires 332 are connected in parallel, which effectively reduces the resistance. These designs not only save space, but also reduce the total resistance, meet the working requirements of the driving circuit, and improve the performance of the entire variable optical attenuator array.

请参照图2A和图3A,固定遮光板外围的键合区域230与可控遮光板外围的键合区域330通过键合方式集成起来,进行封装。本领域技术人员应当清楚,除了键合之外,该固定遮光板和可控遮光板还可以采用其他方式组合起来,只要保证固定遮光板的固定通光孔和可控遮光板可控通光孔中遮光单元相对准即可。Referring to FIG. 2A and FIG. 3A , the bonding area 230 on the periphery of the fixed shading plate and the bonding area 330 on the periphery of the controllable shading plate are integrated by bonding for packaging. Those skilled in the art should be clear that, in addition to bonding, the fixed shading plate and the controllable shading plate can also be combined in other ways, as long as the fixed light hole of the fixed shading plate and the controllable light hole of the controllable shading plate are guaranteed Align the middle shading unit.

磁场产生装置magnetic field generator

本实施例中,磁场产生装置500位于可控遮光板300的下方,但本发明并不以此为限,该磁场产生装置500还可以设置于固定遮光板200的上方、可控遮光板300的外围等,只要其能够产生垂于固定遮光板200和可控遮光板300所在平面的轴向磁场,并且不阻挡光路即可。In this embodiment, the magnetic field generating device 500 is located below the controllable shading plate 300, but the present invention is not limited thereto. Periphery, etc., as long as it can generate an axial magnetic field perpendicular to the plane where the fixed shading plate 200 and the controllable shading plate 300 are located, and does not block the light path.

本实施例中,该磁场产生装置500为环形的永磁体,其通过粘合剂与可控遮光板的下表面粘合在一起,用于产生垂于固定遮光板200和可控遮光板300所在平面的轴向磁场,但本领域并不以此为限,该磁场产生装置500还可以采用电磁线圈或其他可以产生轴向磁场的结构。In this embodiment, the magnetic field generating device 500 is an annular permanent magnet, which is glued together with the lower surface of the controllable shading plate by an adhesive, so as to generate A planar axial magnetic field, but the field is not limited thereto, and the magnetic field generating device 500 may also use electromagnetic coils or other structures capable of generating an axial magnetic field.

驱动电路Drive circuit

本实施例中,驱动电路,位于可控遮光板上方,固定遮光板的预留孔内,用于提供大小可控电流,使可变光衰减器阵列在不同的衰减状态下转换。驱动电路是CMOS集成电路,并利用键合、压焊或其它技术与可控遮光板300集成。In this embodiment, the driving circuit is located above the controllable shading plate and in the reserved hole of the fixed shading plate, and is used to provide a controllable current to switch the variable optical attenuator array under different attenuation states. The driving circuit is a CMOS integrated circuit, and is integrated with the controllable shading plate 300 by bonding, pressure welding or other techniques.

请参照图1B和图4,本实施例阵列型微机电可变光衰减器的工作原理如下:对于可控遮光板300中的每一可动遮光块单元311而言,在可控遮光板的弹性梁311c上通过电流时,电流与磁场作用产生洛伦兹力,洛伦兹力与电流的大小成正比。在洛伦兹力作用下,弹性梁311c会发生形变,从而使相应的可动遮光块311b在平衡位置附近运动,从而改变由输入光纤经由固定遮光板上相应的通光孔、可动遮光块进入相应输出光纤的光通量,实现对光衰减量的控制。Please refer to Fig. 1B and Fig. 4, the working principle of the array microelectromechanical variable optical attenuator of the present embodiment is as follows: for each movable shading block unit 311 in the controllable shading plate 300, When a current passes through the elastic beam 311c, the action of the current and the magnetic field generates a Lorentz force, and the Lorentz force is proportional to the magnitude of the current. Under the action of Lorentz force, the elastic beam 311c will be deformed, so that the corresponding movable shading block 311b will move near the equilibrium position, thus changing the input optical fiber through the corresponding light hole on the fixed shading plate, the movable shading block The light flux entering the corresponding output fiber realizes the control of light attenuation.

如图4所示,在驱动电流的控制下,可控通光孔阵列的每个遮光单元不但可以相互独立工作,实现不同的光衰减量,而且所有遮光单元可以同时改变工作状态。图4中所示的第一个通路工作在光完全被衰减的状态,第二个通路工作在光完全通过的状态,第三个和第四个通路工作在光部分被衰减的状态通过电流控制器件上通过的电流实现不同工作状态之间的转换。As shown in Figure 4, under the control of the driving current, each shading unit of the controllable aperture array can not only work independently of each other to achieve different light attenuation, but also all the shading units can change their working states at the same time. The first path shown in Figure 4 works in the state where the light is completely attenuated, the second path works in the state where the light is completely passed, and the third and fourth paths work in the state where the light is partially attenuated by current control The current passing through the device realizes the transition between different working states.

至此,已经结合附图对本实施例进行了详细描述。依据以上描述,本领域技术人员应当对本发明阵列型微机电可变光衰减器有了清楚的认识。So far, the present embodiment has been described in detail with reference to the drawings. Based on the above description, those skilled in the art should have a clear understanding of the array type MEMS variable optical attenuator of the present invention.

此外,上述对各元件和方法的定义并不仅限于实施方式中提到的各种具体结构、形状或方式,本领域的普通技术人员可对其进行简单地熟知地替换,例如:In addition, the above-mentioned definitions of each element and method are not limited to the various specific structures, shapes or methods mentioned in the embodiments, and those skilled in the art can easily and well-known replace them, for example:

(1)可控遮光板除了可以采用SOI衬底来制作,还可以使用硅片或其他衬底制作;(1) The controllable light-shielding plate can be made not only by SOI substrate, but also by silicon wafer or other substrates;

(2)固定遮光板上的固定通光孔和可控遮光板上的可动遮光块除了可以采用方形外,也可以采用圆形,三角形等其他形状代替。(2) The fixed light-through hole on the fixed shading plate and the movable shading block on the controllable shading plate can be replaced by other shapes such as circles and triangles in addition to square shapes.

综上所述,本发明提供一种利用MEMS工艺制备的阵列型微机电可变光衰减器。该阵列型微机电可变光衰减器利用洛伦兹力控制遮光单元的运动,从而由固定遮光板与可动遮光块的结合实现了良好的光衰减性能,具有规模大,均匀性好,成本低廉等优点,可以很好地与IC兼容,具有巨大的市场潜力。To sum up, the present invention provides an array-type micro-electromechanical variable optical attenuator prepared by MEMS technology. The array micro-electromechanical variable optical attenuator uses the Lorentz force to control the movement of the shading unit, so that the combination of the fixed shading plate and the movable shading block achieves good light attenuation performance, and has the advantages of large scale, good uniformity, and low cost. Low cost and other advantages, can be well compatible with IC, has huge market potential.

以上所述的具体实施例,对本发明的目的、技术方案和有益效果进行了进一步详细说明,所应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The specific embodiments described above have further described the purpose, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above descriptions are only specific embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.

Claims (9)

1. an array micro electro mechanical variable optical attenuator, is characterized in that, comprising:
Fixing shadow shield, its central area has light hole array, comprises several fixing light holes;
Controlled shadow shield, be bonded to the below of described fixing shadow shield, its central area has the movable light shield block array corresponding with described light hole array, each movable light shield module unit in this movable light shield block array comprises: movable light shield block, unsettled setting, just to the fixing light hole of its correspondence, be connected to substrate by the elastic beam being positioned at both sides;
Magnetic field generation device, is positioned at below or the top of described controlled shadow shield, or the periphery of controlled shadow shield, for generation of the axial magnetic field perpendicular to described fixing shadow shield and controlled shadow shield place plane;
Driving circuit, is electrically connected the elastic beam of each the movable light shield module unit movable light shield block in described movable light shield block array respectively by metal lead wire;
Wherein, each optical fiber in input optical fibre array inserts this fixing light hole array and fixes accordingly in light hole, and output optical fibre array is positioned at the below of described controlled shadow shield, and its each optical fiber aligns with each optical fiber of input optical fibre array respectively; For each the movable light shield module unit in described controlled shadow shield, under the driving of driving circuit, the elastic beam of controlled shadow shield passes through electric current, electric current and described axial magnetic field effect produce Lorentz force, under Lorentz force effect, can there is deformation in elastic beam, thus corresponding movable light shield block is moved near equilibrium position, thus change the luminous flux being entered corresponding output optical fibre by input optical fibre via light hole corresponding on fixing shadow shield, movable light shield block.
2. array micro electro mechanical variable optical attenuator according to claim 1, is characterized in that, described controlled shadow shield is made on SOI wafer substrate for utilizing MEMS technology technology.
3. array micro electro mechanical variable optical attenuator according to claim 2, it is characterized in that, described movable light shield block is corresponding with the shape of described fixing light hole, and the size of described movable light shield block than the large several micron of the size of described fixing light hole to tens microns.
4. array micro electro mechanical variable optical attenuator according to claim 3, is characterized in that, described fixing light hole is square, circular or triangle.
5. array micro electro mechanical variable optical attenuator according to claim 2, is characterized in that, in described controlled shadow shield, is metal lead wire district in the surrounding of described movable light shield block array; It is the bonding region with fixing shadow shield bonding in the periphery of controlled shadow shield;
Described metal lead wire district comprises: control line, ground wire and anchor point, and wherein all ground wires realize in parallel with reticulate texture.
6. array micro electro mechanical variable optical attenuator according to claim 1, is characterized in that, described fixing shadow shield being fixed light hole is structure wide at the top and narrow at the bottom, and described input optical fibre is inserted by the wide mouth of this structure.
7. array micro electro mechanical variable optical attenuator according to claim 6, is characterized in that, it is integrated that described fixing shadow shield and controlled shadow shield pass through bonding pattern.
8. array micro electro mechanical variable optical attenuator according to claim 1, is characterized in that, described magnetic field generation device is annular permanent magnet, is positioned at the below of described controlled shadow shield.
9. array micro electro mechanical variable optical attenuator according to any one of claim 1 to 7, is characterized in that, described driving circuit is CMOS integrated circuit, and it utilizes bonding or pressure welding and described controlled shadow shield integrated.
CN201310561866.5A 2013-11-12 2013-11-12 Array micro electro mechanical variable optical attenuator Active CN103576243B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201310561866.5A CN103576243B (en) 2013-11-12 2013-11-12 Array micro electro mechanical variable optical attenuator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310561866.5A CN103576243B (en) 2013-11-12 2013-11-12 Array micro electro mechanical variable optical attenuator

Publications (2)

Publication Number Publication Date
CN103576243A CN103576243A (en) 2014-02-12
CN103576243B true CN103576243B (en) 2015-08-26

Family

ID=50048397

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310561866.5A Active CN103576243B (en) 2013-11-12 2013-11-12 Array micro electro mechanical variable optical attenuator

Country Status (1)

Country Link
CN (1) CN103576243B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103197452B (en) * 2013-04-16 2015-08-05 浙江大学 A kind of adjustable optical attenuator based on liquid crystal clad polymer optical waveguide
DE102014115068A1 (en) * 2014-10-16 2016-04-21 Osram Opto Semiconductors Gmbh lighting arrangement
CN116224571A (en) * 2023-02-17 2023-06-06 中国科学院半导体研究所 Variable optical attenuator array structure and electronic equipment

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1131454C (en) * 2000-12-19 2003-12-17 上海交通大学 Electromagnetically driven micromechanical variable light attenuator
US6711317B2 (en) * 2001-01-25 2004-03-23 Lucent Technologies Inc. Resiliently packaged MEMs device and method for making same
KR100473491B1 (en) * 2002-03-05 2005-03-08 삼성전기주식회사 Variable optical attenuator and Method thereof
CN103149683B (en) * 2013-02-07 2015-07-01 东南大学 One-direction torsion and high-balance variable optical attenuator and preparation method thereof

Also Published As

Publication number Publication date
CN103576243A (en) 2014-02-12

Similar Documents

Publication Publication Date Title
CN103576243B (en) Array micro electro mechanical variable optical attenuator
JP2005326620A (en) Micro mirror element
US10730740B2 (en) Microelectromechanical displacement structure and method for controlling displacement
Hwang et al. Flip chip packaging of digital silicon photonics MEMS switch for cloud computing and data centre
CN106019490A (en) MEMS optical switch module with 1*N channels
US20140341504A1 (en) Optical cross-connect switch with configurable optical input/output ports
US8666218B2 (en) Compact thermal actuated variable optical attenuator
CN116224571A (en) Variable optical attenuator array structure and electronic equipment
CN205941979U (en) 1 MEMS photoswitch module of N passageway
CN103576241B (en) Light-blocking type micro-electro-mechanical variable optical attenuator
US6873756B2 (en) Tiling of optical MEMS devices
US20050013580A1 (en) Variable optical attenuator
JP5612555B2 (en) Micromirror element and micromirror array
JP5309297B2 (en) Optical waveguide device and manufacturing method thereof
CN101246259A (en) A kind of micro optical device and its preparation method
CN101587240A (en) Large-angle Twisted Micromirror Actuator and Its Application in Optical Switches
CN103698854A (en) Encapsulation structure and encapsulation method for MEMS (micro-electromechanical system) variable optical attenuator
CN204719329U (en) A kind of tunable optical driver of combination drive
JP2005099678A (en) Light intercepting device and optical switch apparatus
JP2005122112A (en) Variable optical attenuator
CN104298030B (en) Infrared beam control chip based on electric control liquid crystal infrared convergence planar micro-cylindrical-lens
CN113552672A (en) Variable optical attenuator and manufacturing method
CN104614854A (en) Variable optical attenuator
CN204454561U (en) A kind of MEMS adjustable optical attenuator chip of integrated micro-pad
KR20090063012A (en) Optical switch module

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant