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CN114518070B - Quick positioning method and system for combined system of scanning probe microscope - Google Patents

Quick positioning method and system for combined system of scanning probe microscope Download PDF

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Publication number
CN114518070B
CN114518070B CN202210156964.XA CN202210156964A CN114518070B CN 114518070 B CN114518070 B CN 114518070B CN 202210156964 A CN202210156964 A CN 202210156964A CN 114518070 B CN114518070 B CN 114518070B
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sample image
sample
scanning probe
coordinates
probe microscope
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CN114518070A (en
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皮孝东
钱怡潇
王蓉
高万冬
杨德仁
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ZJU Hangzhou Global Scientific and Technological Innovation Center
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ZJU Hangzhou Global Scientific and Technological Innovation Center
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/002Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)

Abstract

The invention relates to the technical field of microscopes, and discloses a rapid positioning method and a rapid positioning system for a combined system of a scanning probe microscope, wherein the rapid positioning method and the rapid positioning system comprise the following steps: acquiring a first sample image obtained by shooting a sample under a high-power microscope; calibrating the first sample image and calculating four vertex coordinates of the first sample image; acquiring a second sample image obtained by shooting the sample under a scanning probe microscope; calibrating the second sample image and calculating four vertex coordinates of the second sample image, wherein the placement positions of the samples in the first sample image and the second sample image are the same, and the four vertex coordinates of the first sample image and the four vertex coordinates of the second sample image are the same; and carrying out code analysis on the first sample image, calculating the position coordinates of the target area, and finding out a corresponding scanning area in the second sample image according to the position coordinates. The invention can rapidly locate the target area to be scanned under the scanning probe microscope.

Description

Quick positioning method and system for combined system of scanning probe microscope
Technical Field
The invention relates to the technical field of microscopes, in particular to a rapid positioning method and a rapid positioning system for a system combined with a scanning probe microscope.
Background
Scanning probe microscopy is a precision imaging instrument spanning two instruments, namely an optical microscope and an electron microscope, and can be used for measurement in the micro-nano scale field, such as surface topography characterization of materials and surface property analysis of materials. However, the scanning probe microscope has a small scanning range, and for samples with target area sizes in the micrometer scale or even the nanometer scale, it is difficult to rapidly and accurately position the samples.
For small-size samples of micrometer scale, a method is currently used in which a target area is first found under a high-magnification microscope and then transferred to a scanning probe microscope for scanning. For example, a rough target region can be found under a differential interference microscope, the region is marked by a marking tool such as a marker pen, then the sample is transferred to a scanning probe microscope, and the sample is scanned according to the marking mark. Or finding out a target area under a scanning electron microscope to obtain a finished scanning electron microscope image, transferring the sample under a scanning probe microscope, and scanning the sample by comparing the obtained scanning electron microscope image.
However, the existing scanning probe microscope has 200-500 times of the self-carried optical microscope, has a small imaging range, and is difficult to directly and rapidly locate a micrometer-scale target area for a microstructure such as a microtube and the like which are difficult to observe by a conventional optical microscope. If the target area is found under the differential interference microscope or the scanning electron microscope, then the sample is transferred from the differential interference microscope or the scanning electron microscope to the scanning probe microscope to find the target area, and the same position point is difficult to find again due to the fact that the position of the sample is transferred in the whole process.
Disclosure of Invention
The invention aims to solve the problem that the existing scanning probe microscope is difficult to position, and provides a rapid positioning method and system for a system combined with the scanning probe microscope.
In order to achieve the above object, the present invention provides a rapid positioning method for a system for use with a scanning probe microscope, comprising the steps of:
Acquiring a first sample image of a sample, which is obtained by shooting the sample under a high-power micro-mirror, calibrating the first sample image and calculating four vertex coordinates of the first sample image;
Acquiring a second sample image of the sample, which is obtained by shooting the sample under a scanning probe microscope, calibrating the second sample image, and calculating four vertex coordinates of the second sample image, wherein the placing positions of the sample in the first sample image and the second sample image are the same, and the four vertex coordinates of the first sample image and the four vertex coordinates of the second sample image are the same;
And carrying out code analysis on the first sample image, calculating the position coordinates of the target area, and finding out a corresponding scanning area in the second sample image according to the position coordinates.
As an embodiment, the high power microscope is a scanning electron microscope or a differential interference microscope.
As one embodiment, the step of performing code analysis on the first sample image and calculating the position coordinates of the target area includes: and carrying out code analysis on the first sample image to obtain different pixel points in the first sample image, and calculating the coordinates of the pixel points of the target area to obtain the position coordinates of the target area.
As an embodiment, each pixel is represented by a different code comprising numbers and letters.
As an embodiment, the step of calibrating the first sample image and calculating four vertex coordinates of the first sample image includes: and calibrating the first sample image to obtain four vertexes of the first sample image, setting coordinates of one vertex as (0, 0) by taking the vertex as an origin, and sequentially determining the coordinates of the other three vertexes.
As an embodiment, the macro microscope and the scanning probe microscope share a sample stage and an electric stage, the sample is placed on the sample stage, and the electric stage moves the sample and the sample stage under the lenses of the macro microscope and the scanning probe microscope, respectively, to take a photograph.
Correspondingly, the invention also provides a rapid positioning system of the system combined with the scanning probe microscope, which comprises the following modules:
A first acquisition module: the method comprises the steps of acquiring a first sample image of a sample, which is shot by a high-power microscope, calibrating the first sample image and calculating four vertex coordinates of the first sample image;
And a second acquisition module: the method comprises the steps of acquiring a second sample image of the sample, which is obtained by shooting the sample under a scanning probe microscope, calibrating the second sample image, and calculating four vertex coordinates of the second sample image, wherein the placing positions of the sample in the first sample image and the second sample image are the same, and the four vertex coordinates of the first sample image and the four vertex coordinates of the second sample image are the same;
A scanning area calculation module: and the method is used for carrying out code analysis on the first sample image, calculating the position coordinates of the target area, and finding out the corresponding scanning area in the second sample image according to the position coordinates.
As one embodiment, the step of performing code analysis on the first sample image and calculating the position coordinates of the target area includes: and carrying out code analysis on the first sample image to obtain different pixel points in the first sample image, and calculating coordinates corresponding to each pixel point to obtain the coordinates of the pixel point of the target area, namely the position coordinates of the target area.
Correspondingly, the invention also provides electronic equipment, which comprises: at least one processor, a memory communicatively coupled to at least one of the processors; at least one of the processors is configured to read a program in the memory for performing the method.
Accordingly, the present invention also provides a computer-readable storage medium having instructions stored thereon that, when executed on a computer, cause the computer to perform the method.
The invention has the beneficial effects that: the invention discloses a quick positioning method and a quick positioning system for a system combined with a scanning probe microscope, which are characterized in that a first sample image obtained by shooting a sample under a high-power microscope and a second sample image obtained by shooting the sample under the scanning probe microscope are obtained, by calculating the position coordinates of the target area in the first sample image and finding the corresponding scanning area in the second sample image according to the position coordinates, the target area to be scanned can be rapidly positioned under the scanning probe microscope.
Drawings
FIG. 1 is a schematic diagram showing steps of a rapid positioning method of a combined system of a scanning probe microscope according to an embodiment of the present invention.
FIG. 2 is a schematic diagram showing the coordinate calculation of the first sample image in the rapid positioning method of the combined system of the embodiment of the present invention and the scanning probe microscope.
FIG. 3 is a schematic diagram showing the coordinate calculation of the second sample image in the rapid positioning method of the combined system of the embodiment of the present invention and the scanning probe microscope.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Referring to fig. 1, the present embodiment provides a technical solution: a method of rapid localization of a system for use with a scanning probe microscope, comprising the steps of:
Step S100, a first sample image obtained by shooting a sample under a high-power microscope is obtained, the first sample image is calibrated, and four vertex coordinates of the first sample image are calculated;
Step S200, a second sample image obtained by shooting the sample under a scanning probe microscope is obtained, the second sample image is calibrated, and four vertex coordinates of the second sample image are calculated, wherein the placement positions of the sample in the first sample image and the second sample image are the same, and the four vertex coordinates of the first sample image and the four vertex coordinates of the second sample image are the same;
And step S300, carrying out code analysis on the first sample image, calculating the position coordinates of a target area, and finding a corresponding scanning area in the second sample image according to the position coordinates.
In the present embodiment, the high power microscope is a scanning electron microscope or a differential interference microscope, but in other embodiments, the high power microscope may be another type of high power microscope.
The step of analyzing the code of the first sample image and calculating the position coordinates of the target area comprises the following steps: and carrying out code analysis on the first sample image to obtain different pixel points in the first sample image, and calculating the coordinates of the pixel points of the target area to obtain the position coordinates of the target area.
Wherein the first sample image and the second sample image are each composed of a plurality of pixels, each pixel being represented by a different code including a number and a letter; therefore, the first sample image and the second sample image may be represented by codes, and each pixel point has corresponding coordinates, and it should be noted that the coordinate values in this embodiment are parameters whose parameters are mapped to centimeter units according to the relationship between the pixels and the centimeters.
The step of calibrating the first sample image and calculating four vertex coordinates of the first sample image comprises: calibrating the first sample image to obtain four vertexes of the first sample image, setting one vertex as an origin, setting coordinates as (0, 0), and sequentially determining coordinates of the other three vertexes, wherein as shown in fig. 2, four vertex coordinates are sequentially calculated for the first sample image obtained by shooting: a (0, 0), B (X1, 0), C (0, Y1), D (X1, Y1), as shown in fig. 3, are four vertex coordinates sequentially calculated for the second sample image obtained by photographing: e (0, 0), F (X1, 0), G (0, Y1), H (X1, Y1).
Wherein calibrating the first and second sample images is to find four vertices of the first and second sample images.
The high power microscope and the scanning probe microscope share a sample stage and an electric object stage, the sample is placed on the sample stage, and the electric object stage moves the sample and the sample stage to the lenses of the high power microscope and the scanning probe microscope for shooting.
Specifically, in this embodiment, an electric stage and a sample stage are added between the existing high-power microscope and the scanning probe microscope, the sample stage is placed on the electric stage, when the high-power microscope is to photograph the sample, the sample stage is placed on the electric stage, the electric stage moves the sample stage and the sample under the lens of the high-power microscope, after the high-power microscope is used for photographing, the electric stage moves the sample stage and the sample under the lens of the scanning probe microscope, so that the high-power microscope and the scanning probe microscope share the sample stage, whether the sample is under the lens of the high-power microscope or under the lens of the scanning probe microscope, the positions of the sample relative to the two lenses are identical, the sizes of the photographed images and the positions of the photographed images are identical, after the photographing of the high-power microscope is completed, the sample stage and the sample are moved under the lens of the scanning probe microscope by the electric stage, and the coordinates of the first vertex of the second sample are calculated, and the coordinates of the second vertex of the image are found in the same area, and the coordinates of the second vertex of the image are found in the first vertex of the image and the second image; for example, as shown in fig. 2, the first sample image has a total of A, B, C, D four vertices, as shown in fig. 3, the second sample image has a total of E, F, G, H four vertices, where the placement positions of the samples in the first sample image and the second sample image are unchanged, the vertex a in the first sample image corresponds to the vertex E in the second sample image, the coordinates are (0, 0), the vertex B in the first sample image corresponds to the vertex F in the second sample image, the coordinates are (X1, 0), the vertex C in the first sample image corresponds to the vertex G in the second sample image, the coordinates are (0, Y1), the vertex D in the first sample image corresponds to the vertex H in the second sample image, and the coordinates are (X1, Y1).
In this embodiment, the image captured by the high power microscope is correlated with the image captured by the scanning probe microscope lens, that is, the target region of the micrometer level is directly and rapidly found out by the scanning probe microscope lens according to the position coordinates of the target region on the image captured by the high power microscope lens, and the target region is scanned by the scanning probe microscope, so that the required specific physical information is obtained.
Specifically, when the sample is silicon carbide, the sizes of microtubes, protrusions and pits on the surface of the silicon carbide are about several micrometers to tens of micrometers, and the peripheries of the defects have abundant physical information and electrical information, so that the information can be obtained by using a scanning probe microscope, however, the scanning probe microscope is limited by the magnification of the self-contained optical microscope, and the defects are difficult to directly observe under the scanning probe microscope; whereas the solutions in the prior art are: when the high-power microscope is a scanning electron microscope, the position of the microtube is found by scanning under the scanning electron microscope, then the silicon carbide sample and the sample table are taken off from the electric stage of the scanning electron microscope, and the silicon carbide sample and the sample table are installed on the electric stage of the scanning probe microscope for scanning and observing again, but the position of the sample is changed due to the reinstallation, so that the same point on the sample obtained by scanning under the scanning electron microscope is difficult to find under the scanning probe microscope.
According to the calibration function of the software designed in the embodiment, the electric object stage of the embodiment can respectively transmit the sample to the same position under the lens of the high power microscope and the lens of the scanning probe microscope for scanning, so as to obtain two scanning images; and then, carrying out spatial correlation on a scanning image obtained by the scanning probe microscope and a scanning image obtained by the high power microscope, and directly finding the position and the surface morphology of the target area of the microtube in the image obtained by scanning by the scanning probe microscope according to the position coordinates of the target area, namely the microtube and the like, obtained by shooting under the scanning electron microscope.
Based on the same inventive concept, the embodiment of the invention also provides a rapid positioning system of a combined system with a scanning probe microscope, which comprises the following modules:
A first acquisition module: the method comprises the steps of acquiring a first sample image of a sample, which is shot by a high-power microscope, calibrating the first sample image and calculating four vertex coordinates of the first sample image;
And a second acquisition module: the method comprises the steps of acquiring a second sample image of the sample, which is obtained by shooting the sample under a scanning probe microscope, calibrating the second sample image, and calculating four vertex coordinates of the second sample image, wherein the placing positions of the sample in the first sample image and the second sample image are the same, and the four vertex coordinates of the first sample image and the four vertex coordinates of the second sample image are the same;
A scanning area calculation module: and the method is used for carrying out code analysis on the first sample image, calculating the position coordinates of the target area, and finding out the corresponding scanning area in the second sample image according to the position coordinates.
The step of analyzing the code of the first sample image and calculating the position coordinates of the target area comprises the following steps: and carrying out code analysis on the first sample image to obtain different pixel points in the first sample image, and calculating the coordinates of the pixel points of the target area to obtain the position coordinates of the target area.
Based on the same inventive concept, the embodiments of the present invention further provide an electronic device, with respect to the constituent parts, reference may be made to the foregoing related description, and the repetition is not repeated, including: at least one processor, a memory communicatively coupled to the at least one processor; the at least one processor is configured to read the program in the memory for performing the method described above.
Based on the same inventive concept, the embodiments of the present invention further provide a computer readable storage medium, with reference to the foregoing related description, for components, and details will not be repeated, where the medium stores instructions that, when executed on a computer, cause the computer to perform the method described above.
Although the present invention has been described with respect to the preferred embodiments, it is not intended to be limited thereto, and any person skilled in the art can make any possible variations and modifications to the technical solution of the present invention by using the methods and techniques disclosed herein without departing from the spirit and scope of the present invention.

Claims (9)

1. A method for rapid localization of a system for use with a scanning probe microscope, comprising the steps of:
Acquiring a first sample image of a sample, which is obtained by shooting the sample under a high-power micro-mirror, calibrating the first sample image and calculating four vertex coordinates of the first sample image;
Obtaining a second sample image obtained by shooting the sample under a scanning probe microscope, calibrating the second sample image and calculating four vertex coordinates of the second sample image, wherein the positions of the sample under the lenses of the first sample image and the second sample image are identical, the sizes of the shot first sample image and second sample image and the positions of the sample under the lenses of the scanning probe microscope are identical, the sample is placed on the sample table, the sample table is moved to the lenses of the high power microscope and the scanning probe microscope by the electric stage, so that the positions of the sample under the lenses of the high power microscope and the lenses of the scanning probe microscope are identical, and the positions of the shot first sample image and second sample image and the positions of the sample under the lenses of the scanning probe microscope are identical, and the coordinates of the sample under the lenses of the scanning probe microscope are calculated when the positions of the sample under the lenses of the scanning probe microscope are identical, the coordinates of the sample under the lenses of the scanning probe microscope are identical, and the coordinates of the corresponding vertex images are obtained;
And carrying out code analysis on the first sample image, calculating the position coordinates of the target area, and finding out a corresponding scanning area in the second sample image according to the position coordinates.
2. The method of claim 1, wherein the high power microscope is a scanning electron microscope or a differential interference microscope.
3. The method of claim 1, wherein the step of code resolving the first sample image and calculating the position coordinates of the target area comprises: and carrying out code analysis on the first sample image to obtain different pixel points in the first sample image, and calculating the coordinates of the pixel points of the target area to obtain the position coordinates of the target area.
4. A method of rapid localization in conjunction with a scanning probe microscope as claimed in claim 3 wherein each pixel is represented by a different code comprising numbers and letters.
5. The method for rapid localization of a system for use with a scanning probe microscope as claimed in claim 1, the step of calibrating the first sample image and calculating four vertex coordinates of the first sample image comprises: and calibrating the first sample image to obtain four vertexes of the first sample image, setting coordinates of one vertex as (0, 0) by taking the vertex as an origin, and sequentially determining the coordinates of the other three vertexes.
6. A rapid positioning system for use with a scanning probe microscope, comprising the following modules:
A first acquisition module: acquiring a first sample image of a sample, which is obtained by shooting the sample under a high-power micro-mirror, calibrating the first sample image and calculating four vertex coordinates of the first sample image;
And a second acquisition module: obtaining a second sample image obtained by shooting the sample under a scanning probe microscope, calibrating the second sample image and calculating four vertex coordinates of the second sample image, wherein the positions of the sample under the lenses of the first sample image and the second sample image are identical, the sizes of the shot first sample image and second sample image and the positions of the sample under the lenses of the scanning probe microscope are identical, the sample is placed on the sample table, the sample table is moved to the lenses of the high power microscope and the scanning probe microscope by the electric stage, so that the positions of the sample under the lenses of the high power microscope and the lenses of the scanning probe microscope are identical, and the positions of the shot first sample image and second sample image and the positions of the sample under the lenses of the scanning probe microscope are identical, and the coordinates of the sample under the lenses of the scanning probe microscope are calculated when the positions of the sample under the lenses of the scanning probe microscope are identical, the coordinates of the sample under the lenses of the scanning probe microscope are identical, and the coordinates of the corresponding vertex images are obtained;
A scanning area calculation module: and the method is used for carrying out code analysis on the first sample image, calculating the position coordinates of the target area, and finding out the corresponding scanning area in the second sample image according to the position coordinates.
7. The rapid positioning system for a scanning probe microscope of claim 6, wherein the step of code resolving the first sample image and calculating the position coordinates of the target area comprises: and carrying out code analysis on the first sample image to obtain different pixel points in the first sample image, and calculating coordinates corresponding to each pixel point to obtain the coordinates of the pixel point of the target area, namely the position coordinates of the target area.
8. An electronic device, comprising: at least one processor, a memory communicatively coupled to at least one of the processors; at least one of the processors is configured to read a program in the memory for performing the method according to any of claims 1-5.
9. A computer readable storage medium having instructions stored thereon which, when run on a computer, cause the computer to perform the method of any of claims 1-5.
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CN110927549A (en) * 2019-11-21 2020-03-27 广西天微电子有限公司 Wafer repositioning method and system

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CN107516624A (en) * 2017-07-14 2017-12-26 聚束科技(北京)有限公司 A sample position calibration method and device
CN110927549A (en) * 2019-11-21 2020-03-27 广西天微电子有限公司 Wafer repositioning method and system

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