CN114700870B - Contact type ultra-precision chemical mechanical polishing device and method for bearing ring - Google Patents
Contact type ultra-precision chemical mechanical polishing device and method for bearing ring Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/02—Lapping machines or devices; Accessories designed for working surfaces of revolution
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/02—Frames; Beds; Carriages
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/04—Headstocks; Working-spindles; Features relating thereto
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/10—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces
- B24B47/12—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces by mechanical gearing or electric power
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
本发明公开了一种轴承套圈接触式超精密化学机械抛光装置及方法,抛光装置包括第一调心模块、第二调心模块、样品旋转模块、样品夹持模块、抛光模块和机座;第二调心模块调节样品夹持模块位置,带动样品夹持模块上的套圈,使套圈与样品旋转模块同轴,第一调心模块调节抛光模块位置,带动抛光模块上的抛光头,使抛光头与套圈同轴。抛光头高速旋转进行抛光,样品低速旋转均化误差,配合实现套圈超精密抛光。化学机械抛光液包括0.01~40wt%的胶体二氧化硅、0~10wt%的过氧化氢、剩余为水,pH值2‑11。本发明针对性设计内、外套圈抛光头和夹具;控制样品旋转模块和抛光模块转速,均化误差,实现套圈表面均匀抛光;针对不锈轴承钢设计抛光液,实现纳米级表面粗糙度。
The invention discloses a bearing ring contact type ultra-precision chemical mechanical polishing device and method. The polishing device includes a first centering module, a second centering module, a sample rotation module, a sample clamping module, a polishing module and a machine base; The second centering module adjusts the position of the sample holding module, drives the ferrule on the sample holding module, and makes the ferrule coaxial with the sample rotating module, the first centering module adjusts the position of the polishing module, drives the polishing head on the polishing module, Make the polishing head coaxial with the ferrule. The polishing head rotates at high speed for polishing, and the sample rotates at low speed to homogenize the error, and cooperate to realize ultra-precision polishing of the ferrule. The chemical mechanical polishing liquid includes 0.01-40wt% of colloidal silicon dioxide, 0-10wt% of hydrogen peroxide, the rest is water, and the pH value is 2-11. The invention specifically designs inner and outer ring polishing heads and fixtures; controls the rotational speed of the sample rotation module and the polishing module, averages errors, and realizes uniform polishing on the surface of the ring; designs a polishing liquid for stainless bearing steel to achieve nano-level surface roughness.
Description
技术领域technical field
本发明涉及超精密加工技术领域,具体而言,涉及轴承套圈接触式超精密化学机械抛光装置及方法。The invention relates to the technical field of ultra-precision machining, in particular to a bearing ring contact type ultra-precision chemical mechanical polishing device and method.
背景技术Background technique
轴承是机械设备中非常重要的零部件,其主要功能是支撑旋转机构,减小摩擦系数,保证回转精度。随着科学技术的高速发展,轴承逐渐应用于航天航空、机械制造、轨道交通等领域的高端装备,当轴承工作在高低温、超高真空、高比负荷、高低速、多次启停等极端工况下,极有可能会出现润滑膜厚急剧降低等苛刻润滑状态,如果此时轴承表面粗糙度较大,润滑膜厚小于粗糙峰高度,粗糙峰之间会直接接触,轴承表面则会产生磨损,影响轴承的使役性能和寿命。为此,需要从材料、设计、制造、测试等方面不断突破,保障轴承优异的使役性能,满足高端装备的技术需求。Bearings are very important parts in mechanical equipment, and their main function is to support the rotating mechanism, reduce the friction coefficient, and ensure the rotation accuracy. With the rapid development of science and technology, bearings are gradually used in high-end equipment in aerospace, machinery manufacturing, rail transit and other fields. Under working conditions, harsh lubricating conditions such as a sharp decrease in the lubricating film thickness are likely to occur. If the bearing surface roughness is large at this time, the lubricating film thickness is smaller than the height of the roughness peaks, and the roughness peaks will be in direct contact, and the bearing surface will be worn , affecting the service performance and life of the bearing. To this end, it is necessary to make continuous breakthroughs in materials, design, manufacturing, testing, etc. to ensure the excellent service performance of bearings and meet the technical needs of high-end equipment.
从轴承制造的角度,需要发展新的超精密加工技术,提高加工精度,降低表面粗糙度,提高膜厚比(润滑油膜厚度与表面粗糙度之比),避免摩擦副表面粗糙峰之间的直接接触,实现良好的润滑状态,从而提高轴承的使役性能和寿命,最终保证装备稳定可靠运行。根据参考文献(Hiroki Komata, Yasuhiro Iwanaga, Tohru Ueda, Koji Ueda, NobuakiMitamura, Enhanced Performance of Rolling Bearings by Improving theResistance of Rolling Elements to Surface Degradation, in: J.M. Beswick (Ed.)Bearing Steel Technologies: 10th Volume, Advances in Steel Technologies forRolling Bearings, ASTM International, West Conshohocken, PA, 2015, pp. 272-290),当轴承外套圈滚道表面粗糙度为30 nm,内套圈滚道表面粗糙度为50 nm时,滚珠的表面粗糙度从209 nm降低到6 nm,轴承的剥落寿命(flaking life)提高了约5倍。据此推断,轴承套圈和滚动体作为一对摩擦副,降低任一或者两者的表面粗糙度,均有利于提高轴承的使役性能和寿命。From the perspective of bearing manufacturing, it is necessary to develop new ultra-precision machining technology, improve machining accuracy, reduce surface roughness, increase film thickness ratio (ratio of lubricating oil film thickness to surface roughness), and avoid direct contact between rough peaks on the surface of friction pairs , to achieve a good lubrication state, thereby improving the service performance and life of the bearing, and ultimately ensuring the stable and reliable operation of the equipment. According to reference (Hiroki Komata, Yasuhiro Iwanaga, Tohru Ueda, Koji Ueda, Nobuaki Mitamura, Enhanced Performance of Rolling Bearings by Improving the Resistance of Rolling Elements to Surface Degradation, in: J.M. Beswick (Ed.) Bearing Steel Technologies: 10th Volume, Advances Steel Technologies for Rolling Bearings, ASTM International, West Conshohocken, PA, 2015, pp. 272-290), when the surface roughness of the raceway of the outer ring of the bearing is 30 nm, and the surface roughness of the raceway of the inner ring is 50 nm, the ball The surface roughness was reduced from 209 nm to 6 nm, and the flaking life of the bearing was increased by about 5 times. It can be inferred that bearing rings and rolling elements are a pair of friction pairs, and reducing the surface roughness of either or both is beneficial to improve the service performance and life of the bearing.
目前,轴承套圈通常采用油石珩磨作为最终精加工手段,此时表面粗糙度可以降至100 nm以下。为了进一步提高轴承加工精度,降低表面粗糙度,业界提出了一些新型的超精密加工方法,如电化学磨削、磁流变抛光、力流变抛光等,然而,在实际应用过程中,这些方法存在如下所述的不足之处:At present, oilstone honing is usually used as the final finishing method for bearing rings, and the surface roughness can be reduced to below 100 nm at this time. In order to further improve the machining accuracy of bearings and reduce surface roughness, some new ultra-precision machining methods have been proposed in the industry, such as electrochemical grinding, magnetorheological polishing, and force rheological polishing. There are deficiencies as follows:
1)磁流变抛光和力流变抛光均采用纯机械刻划方式去除轴承表面材料,去除时接触压力需要达到材料的塑性屈服极限,最小去除厚度受限,轴承的表面质量难以进一步提高;1) Both magnetorheological polishing and force rheological polishing use purely mechanical scribing to remove bearing surface materials. When removing, the contact pressure needs to reach the plastic yield limit of the material, the minimum removal thickness is limited, and the surface quality of the bearing is difficult to further improve;
2)力流变抛光主要通过提高剪切速率来实现抛光液的增稠效应,然而,对于曲面来说,各个位置的相对速度不尽相同,影响曲面各处加工均匀性的因素较多,且较难控制,改善面型精度难度较大。2) Mechano-rheological polishing mainly achieves the thickening effect of the polishing liquid by increasing the shear rate. However, for the curved surface, the relative speed of each position is not the same, and there are many factors that affect the processing uniformity of the curved surface. It is more difficult to control, and it is more difficult to improve the accuracy of surface shape.
化学机械抛光概念由美国孟山都公司于1965年首次提出,随后美国国际商业机器公司不断完善化学机械抛光工艺,经过几十年的发展,目前已经被广泛应用于超大规模集成电路的制造中。化学机械抛光通过化学反应和机械力的协同作用,在硅片等平面上可以实现亚纳米级的表面粗糙度和纳米级的面型精度,以及趋近于零的表面缺陷和接近于零的变质层厚度。鉴于化学机械抛光的技术优势,将其与传统的超精密加工方法有机结合,发展一些新型的超精密加工方法,应用于轴承超精密加工。The concept of chemical mechanical polishing was first proposed by Monsanto in 1965, and then the International Business Machines Corporation of the United States continued to improve the chemical mechanical polishing process. After decades of development, it has been widely used in the manufacture of VLSI. Chemical mechanical polishing can achieve sub-nanometer surface roughness and nanometer surface precision, as well as close to zero surface defects and close to zero deterioration on the plane of the silicon wafer through the synergistic effect of chemical reaction and mechanical force layer thickness. In view of the technical advantages of chemical mechanical polishing, it is organically combined with traditional ultra-precision machining methods to develop some new ultra-precision machining methods and apply them to bearing ultra-precision machining.
本研究小组已获授权的一项中国发明专利“微型轴承核心元件超精密柔性化学机械抛光装置及方法”(专利号:ZL202010118552.8,授权日期:2021年2月26日),公开了一种微型轴承核心元件超精密柔性化学机械抛光装置及方法,通过优化化学反应和力流变效应机械力的协同作用,能够实现核心元件表面超精密加工以及复杂曲面保形加工。然而,在实际应用过程中,该方法存在如下所述的不足之处:A Chinese invention patent "ultra-precision flexible chemical mechanical polishing device and method for core components of miniature bearings" (patent number: ZL202010118552.8, date of authorization: February 26, 2021) has been authorized by our research group, which discloses a The ultra-precision flexible chemical-mechanical polishing device and method for the core component of the miniature bearing can realize ultra-precision machining of the surface of the core component and conformal processing of complex curved surfaces by optimizing the synergistic effect of chemical reaction and mechano-rheological effect and mechanical force. However, in the actual application process, this method has the following shortcomings:
1)该方法的柔性化学机械抛光液使用多羟基聚合物作为非牛顿流体进行剪切增稠,多羟基聚合物可能会与抛光液中的其他化学试剂发生反应,影响抛光效果;1) The flexible chemical mechanical polishing fluid of this method uses polyhydroxyl polymers as non-Newtonian fluids for shear thickening. Polyhydroxyl polymers may react with other chemical reagents in the polishing fluid and affect the polishing effect;
2)如前所述,该方法主要通过抛光液高速冲击轴承核心元件表面来实现剪切增稠抛光,然而,对于轴承套圈和滚动体等核心元件来说,影响元件曲面各处加工均匀性的因素较多,且较难控制,改善面型精度难度较大。2) As mentioned above, this method mainly achieves shear thickening polishing by impacting the surface of the core component of the bearing with the polishing liquid at high speed. However, for core components such as bearing rings and rolling elements, the machining uniformity of the component surface is affected. There are many factors that are difficult to control, and it is difficult to improve the accuracy of surface shape.
如上所述,设计一种应用于轴承套圈超精密抛光的装置和方法,并解决现有超精密加工中存在的各种问题,对指导轴承套圈超精密加工具有非常重大的意义。As mentioned above, designing a device and method for ultra-precision polishing of bearing rings and solving various problems existing in the existing ultra-precision machining is of great significance for guiding the ultra-precision machining of bearing rings.
发明内容Contents of the invention
为了克服上述现有技术的不足,本发明提供了一种轴承套圈接触式超精密化学机械抛光装置及方法,包括以下内容:In order to overcome the deficiencies of the above-mentioned prior art, the present invention provides a bearing ring contact type ultra-precision chemical mechanical polishing device and method, including the following content:
一种轴承套圈接触式超精密化学机械抛光装置,包括:第一调心模块、第二调心模块、样品旋转模块、样品夹持模块、抛光模块和机座;机座上分别设置有样品旋转模块和第一调心模块,第一调心模块上设置有抛光模块,样品旋转模块上设置有第二调心模块,第二调心模块上设置有样品夹持模块,第二调心模块用于带动样品夹持模块在水平方向上移动,从而使样品夹持模块上的轴承套圈与样品旋转模块同轴,第一调心模块用于带动抛光模块在水平方向和竖直方向上移动,从而使抛光模块上的抛光头与轴承套圈同轴,样品旋转模块用于驱动第二调心模块旋转,样品夹持模块跟随第二调心模块旋转,从而带动轴承套圈旋转,样品夹持模块针对性提供夹具用于夹持轴承套圈,抛光模块针对性提供抛光头用于对轴承套圈进行抛光。A contact type ultra-precision chemical mechanical polishing device for a bearing ring, comprising: a first aligning module, a second aligning module, a sample rotating module, a sample holding module, a polishing module and a base; the base is respectively provided with samples The rotating module and the first centering module, the first centering module is provided with a polishing module, the sample rotating module is provided with a second centering module, the second centering module is provided with a sample holding module, and the second centering module It is used to drive the sample holding module to move in the horizontal direction, so that the bearing ring on the sample holding module is coaxial with the sample rotating module, and the first self-aligning module is used to drive the polishing module to move in the horizontal and vertical directions , so that the polishing head on the polishing module is coaxial with the bearing ring, the sample rotation module is used to drive the second self-aligning module to rotate, the sample holding module rotates with the second self-aligning module, thereby driving the bearing ring to rotate, and the sample holder The holding module provides fixtures for clamping the bearing rings, and the polishing module provides polishing heads for polishing the bearing rings.
进一步的,第一调心模块包括电机架、第一支撑杆、第二支撑杆和开口固定环;第二支撑杆底部设有圆柱孔,圆柱孔内插入机座自带的圆柱杆,通过螺栓固定连接,第一支撑杆位于第二支撑杆上,第一支撑杆远离电机架的一端设置有第一连接板,第二支撑杆远离机座的一端设置有与第一连接板匹配连接的第二连接板,第一连接板和第二连接板上设有孔槽,第一连接板沿着孔槽相对第二连接板移动,使得第一支撑杆相对第二支撑杆在水平方向上移动,调整好位置后用螺栓连接固定,电机架位于第一支撑杆上,可沿着第一支撑杆在竖直方向移动,调整好位置后,设置在电机架上的开口固定环用于固定电机架的位置,确保电机架处于水平。Further, the first centering module includes a motor frame, a first support rod, a second support rod and an open fixed ring; a cylindrical hole is provided at the bottom of the second support rod, and a cylindrical rod that comes with the machine base is inserted into the cylindrical hole, and the bolt Fixed connection, the first support rod is located on the second support rod, the end of the first support rod away from the motor frame is provided with a first connecting plate, and the end of the second support rod away from the machine base is provided with a second connecting plate matched with the first connecting plate. Two connecting plates, the first connecting plate and the second connecting plate are provided with holes, the first connecting plate moves relative to the second connecting plate along the hole, so that the first support rod moves in the horizontal direction relative to the second support rod, After adjusting the position, connect and fix it with bolts. The motor frame is located on the first support rod and can move vertically along the first support rod. After adjusting the position, the open fixing ring set on the motor frame is used to fix the motor frame. position, make sure the motor frame is level.
进一步的,第二调心模块包括:二维工作台、上定位孔、下定位孔、带刻度第一方向旋钮和第二方向旋钮;二维工作台通过旋转两个带刻度的第一方向和第二方向旋钮控制台面向第一方向和第二方向移动,两个方向互相垂直,旋钮上的刻度可以确定样品夹持模块的位置,二维工作台台面上有多个上定位孔,用于固定样品夹持模块,二维工作台下方有四个下定位孔,用于将二维工作台用螺钉固定在样品旋转模块上,从而使二维工作台跟随样品旋转模块旋转,并带动样品夹持模块旋转,设置较低转速,减小抛光头加工误差带来的轴承套圈表面受力不均问题,均化误差,保证轴承套圈高的面型精度。Further, the second centering module includes: a two-dimensional workbench, an upper positioning hole, a lower positioning hole, a scaled first direction knob and a second direction knob; the two-dimensional workbench rotates two scaled first direction and The second direction knob console moves in the first direction and the second direction, and the two directions are perpendicular to each other. The scale on the knob can determine the position of the sample holding module. There are multiple upper positioning holes on the two-dimensional workbench for Fix the sample clamping module, there are four lower positioning holes under the two-dimensional worktable, which are used to fix the two-dimensional workbench on the sample rotation module with screws, so that the two-dimensional workbench rotates with the sample rotation module and drives the sample holder Hold the module to rotate, set a lower speed, reduce the problem of uneven force on the surface of the bearing ring caused by the processing error of the polishing head, homogenize the error, and ensure the high surface accuracy of the bearing ring.
进一步的,样品夹持模块包括:轴承套圈夹具、抛光液液池和垫块;抛光液液池用于容纳抛光液和固定轴承套圈夹具,抛光液液池固定在垫块上的圆槽内,圆槽的内径与抛光液液池的外径相同,在此基础上,抛光液液池和垫块通过销钉固定连接,限制了液池相对于垫块旋转,垫块通过销钉固定连接在第二调心模块上,跟随第二调心模块移动和旋转,抛光结束后,取下定位销钉,取出垫块,向下移动样品夹持模块,将轴承套圈与抛光头分开,取出轴承套圈。Further, the sample holding module includes: a bearing ring fixture, a polishing liquid pool and a pad; the polishing liquid pool is used to accommodate the polishing liquid and fix the bearing ring fixture, and the polishing liquid pool is fixed on the circular groove on the pad Inside, the inner diameter of the circular groove is the same as the outer diameter of the polishing liquid pool. On this basis, the polishing liquid pool and the pad are fixedly connected by pins, which limits the rotation of the liquid pool relative to the pad, and the pad is fixedly connected by pins. On the second centering module, follow the second centering module to move and rotate. After polishing, remove the positioning pin, take out the spacer, move the sample holding module down, separate the bearing ring from the polishing head, and take out the bearing sleeve lock up.
进一步的,轴承套圈夹具包括:轴承外套圈夹具、轴承内套圈夹具;轴承外套圈夹具底部为一个外径与抛光液液池内径相同的圆盘底座,圆盘底座上方为一个与之同轴的圆柱,圆柱内部有一个与之同轴的阶梯孔,阶梯孔上部内径略大于轴承外套圈外径,方便轴承外套圈放入,阶梯孔上部有四个螺纹孔,通过螺钉拧紧固定轴承外套圈,防止其转动,阶梯孔下部内径小于轴承外套圈外径,大于轴承外套圈内径,使轴承外套圈保持在特定高度,同时方便轴承外套圈抛光头抛光轴承外套圈的整个内表面,圆柱周围均匀设置四个缺口,方便抛光液进入;轴承内套圈夹具底部为一个外径与抛光液液池内径相同的圆盘底座,圆盘底座上方为一个与之同轴的阶梯轴,阶梯轴上部直径与轴承内套圈内径相同,轴承内套圈通过过盈配合安装在阶梯轴上部,阶梯轴下部直径大于轴承内套圈内径,小于轴承内套圈外径,使轴承内套圈保持在特定的高度,同时方便抛光头抛光轴承内套圈的整个外表面。Further, the bearing ring clamp includes: a bearing outer ring clamp, a bearing inner ring clamp; the bottom of the bearing outer ring clamp is a disc base with the same outer diameter as the inner diameter of the polishing liquid pool, and the top of the disc base is a The shaft is a cylinder, and there is a coaxial stepped hole inside the cylinder. The inner diameter of the upper part of the stepped hole is slightly larger than the outer diameter of the bearing outer ring, which is convenient for the bearing outer ring to be inserted. There are four threaded holes in the upper part of the stepped hole, and the bearing outer is fixed by screwing. ring, to prevent it from rotating, the inner diameter of the lower part of the stepped hole is smaller than the outer diameter of the bearing outer ring, and larger than the inner diameter of the bearing outer ring, so that the bearing outer ring is kept at a specific height, and at the same time it is convenient for the bearing outer ring polishing head to polish the entire inner surface of the bearing outer ring, around the cylinder Four gaps are evenly set to facilitate the entry of polishing liquid; the bottom of the bearing inner ring fixture is a disc base with the same outer diameter as the inner diameter of the polishing liquid pool, and a stepped shaft coaxial with it is above the disc base, and the upper part of the stepped shaft is The diameter is the same as the inner diameter of the inner ring of the bearing. The inner ring of the bearing is installed on the upper part of the stepped shaft through interference fit. The diameter of the lower part of the stepped shaft is larger than the inner diameter of the inner ring of the bearing and smaller than the outer diameter of the inner ring of the bearing. At the same time, it is convenient for the polishing head to polish the entire outer surface of the inner ring of the bearing.
进一步的,抛光模块包括:抛光头、电机和电机控制器;抛光头由衬底和抛光垫两部分组成,抛光垫粘附衬底表面,衬底和抛光垫均采用柔性材料,衬底材料为硅胶、橡胶或硅橡胶,抛光垫材料为聚氨酯、羊毛、牛皮或尼龙。Further, the polishing module includes: a polishing head, a motor, and a motor controller; the polishing head is composed of a substrate and a polishing pad, and the polishing pad is adhered to the surface of the substrate. Both the substrate and the polishing pad are made of flexible materials, and the substrate material is Silicone, rubber or silicone rubber, polishing pad material is polyurethane, wool, cowhide or nylon.
进一步的,抛光头包括:轴承外套圈抛光头、轴承内套圈抛光头;轴承外套圈抛光头的衬底为圆柱,上部有一个内径与电机轴外径相同的圆柱孔,且附带键槽,圆柱外表面粘附抛光垫后,外径与轴承外套圈内径相同;轴承内套圈抛光头的衬底为圆柱,上部有一个内径与电机轴外径相同的圆柱孔,且附带键槽,下部有一个圆柱孔,圆柱孔内表面粘附抛光垫后,内径与轴承内套圈外径相同。Further, the polishing head includes: a polishing head for the outer bearing ring, a polishing head for the inner ring of the bearing; the substrate of the polishing head for the outer bearing ring is a cylinder, and the upper part has a cylindrical hole with the same inner diameter as the outer diameter of the motor shaft, and a keyway, cylindrical After the polishing pad is adhered to the outer surface, the outer diameter is the same as the inner diameter of the bearing outer ring; the substrate of the bearing inner ring polishing head is a cylinder, the upper part has a cylindrical hole with the same inner diameter as the motor shaft outer diameter, and a keyway, and the lower part has a Cylindrical hole, after the inner surface of the cylindrical hole adheres the polishing pad, the inner diameter is the same as the outer diameter of the inner ring of the bearing.
进一步的,电机固定在电机架的中心,抛光头通过键连接在电机轴上,通过调整电机控制器使电机达到不同的转速,带动抛光头旋转,设置较高转速,在抛光垫与化学机械抛光液的共同作用下,对轴承套圈进行抛光。Further, the motor is fixed at the center of the motor frame, and the polishing head is connected to the motor shaft through a key. By adjusting the motor controller, the motor can reach different speeds to drive the polishing head to rotate, and a higher speed is set. Under the combined action of the fluid, the bearing ring is polished.
进一步的,采用本发明提供的一种轴承套圈接触式超精密化学机械抛光装置进行抛光,抛光方法包括以下步骤:Further, a bearing ring contact type ultra-precision chemical mechanical polishing device provided by the present invention is used for polishing, and the polishing method includes the following steps:
S1、将第二调心模块固定安装在样品旋转模块上,将轴承套圈安装在样品夹持模块上,将样品夹持模块固定安装在第二调心模块上,依次安装第一调心模块、抛光模块,通过第一调心模块和第二调心模块分别调整抛光头和轴承套圈的位置,使抛光头、轴承套圈和样品旋转模块三者同轴;S1. Fix the second alignment module on the sample rotation module, install the bearing ring on the sample holding module, fix the sample holding module on the second alignment module, and install the first alignment module in
S2、配置化学机械抛光液,搅拌均匀,倒入抛光液液池中;S2, configure the chemical mechanical polishing liquid, stir evenly, and pour it into the polishing liquid liquid pool;
S3、设置抛光工艺参数,包括环境温度、抛光模块转速、样品旋转模块转速、抛光时间,进行抛光;S3. Set the polishing process parameters, including the ambient temperature, the rotational speed of the polishing module, the rotational speed of the sample rotation module, and the polishing time, and perform polishing;
S4、抛光结束后,取下轴承套圈,检测抛光后的表面质量,若未达到要求,进行S3,直至达到要求。S4. After polishing, remove the bearing ring and check the surface quality after polishing. If the requirements are not met, proceed to S3 until the requirements are met.
进一步的,化学机械抛光液包括0.01~40 wt%的胶体二氧化硅、0~10 wt%的过氧化氢、剩余为水,pH值2-11,其中,过氧化氢作为氧化剂,可以在样品表面产生一层均匀一致的反应膜,在胶体二氧化硅磨粒的作用下实现去除。Further, the chemical mechanical polishing solution includes 0.01-40 wt% colloidal silicon dioxide, 0-10 wt% hydrogen peroxide, and the rest is water, with a pH value of 2-11, wherein hydrogen peroxide is used as an oxidizing agent and can be used in samples A uniform and consistent reaction film is formed on the surface, and the removal is achieved under the action of colloidal silica abrasive particles.
本发明提供的一种轴承套圈接触式超精密化学机械抛光装置及方法,具有如下有益效果:A bearing ring contact type ultra-precision chemical mechanical polishing device and method provided by the present invention have the following beneficial effects:
1、针对性设计内、外套圈抛光头和夹具,可以实现轴承内、外套圈超精密抛光。1. Targeted design of inner and outer ring polishing heads and fixtures can realize ultra-precision polishing of bearing inner and outer rings.
2、通过第一和第二调心模块实现抛光头、轴承套圈和样品旋转模块三者高度同轴,在此基础上,控制样品旋转模块和抛光模块转速,均化误差,实现轴承套圈表面均匀抛光。2. Through the first and second centering modules, the polishing head, the bearing ring and the sample rotation module are highly coaxial. On this basis, the speed of the sample rotation module and the polishing module is controlled, and the error is averaged to realize the bearing ring. The surface is evenly polished.
3、针对不锈轴承钢设计化学机械抛光液,添加一定浓度的过氧化氢作为氧化剂,在轴承钢表面生成一层均匀一致的铁铬氧化膜,在胶体二氧化硅磨粒的作用下实现去除,实现纳米级表面粗糙度。3. Design a chemical mechanical polishing solution for stainless bearing steel, add a certain concentration of hydrogen peroxide as an oxidant, and form a uniform iron-chromium oxide film on the surface of the bearing steel, and remove it under the action of colloidal silica abrasive particles , to achieve nanoscale surface roughness.
附图说明Description of drawings
为了更清楚地说明本发明实施例的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,应当理解,以下附图仅示出了本发明的某些实施例,因此不应被看作是对范围的限定。In order to illustrate the technical solutions of the embodiments of the present invention more clearly, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention, and thus should be seen as limiting the scope.
图1为本发明一种轴承套圈接触式超精密化学机械抛光装置的整体示意图;Fig. 1 is an overall schematic diagram of a bearing ring contact type ultra-precision chemical mechanical polishing device of the present invention;
图2为本发明样品旋转模块和机座的示意图;Fig. 2 is the schematic diagram of sample rotation module and machine base of the present invention;
图3为本发明第一调心模块的细节图;Fig. 3 is a detailed view of the first aligning module of the present invention;
图4为本发明第二调心模块的细节图;Fig. 4 is the detailed diagram of the second centering module of the present invention;
图5为本发明抛光轴承外套圈所用样品夹持模块的细节图;Fig. 5 is a detailed view of the sample holding module used for polishing the bearing outer ring of the present invention;
图6为本发明抛光轴承内套圈所用样品夹持模块的细节图;Fig. 6 is a detailed view of the sample holding module used for polishing the bearing inner ring of the present invention;
图7为本发明抛光轴承外套圈所用抛光模块的细节图;Fig. 7 is a detailed view of the polishing module used for polishing the bearing outer ring of the present invention;
图8为本发明抛光轴承内套圈所用抛光模块的细节图;Fig. 8 is a detailed view of the polishing module used for polishing the bearing inner ring of the present invention;
图9为本发明抛光轴承外套圈的示意图;Fig. 9 is a schematic diagram of the polished bearing outer ring of the present invention;
图10为本发明抛光轴承内套圈的结构示意和细节对比图;Fig. 10 is a structural schematic diagram and detailed comparison diagram of the polished bearing inner ring of the present invention;
图11为本发明轴承内套圈抛光前后的试验结果对比图,其中左图为抛光前,右图为抛光后;Fig. 11 is a comparison diagram of test results before and after polishing of the bearing inner ring of the present invention, wherein the left picture is before polishing, and the right picture is after polishing;
图12为本发明轴承内套圈抛光后的三维形貌测量试验结果图,其中左图为轴承内套圈大径处,右图为轴承内套圈小径处;Fig. 12 is a three-dimensional shape measurement test result diagram of the inner ring of the bearing after polishing in the present invention, wherein the left picture is the large diameter of the inner ring of the bearing, and the right picture is the small diameter of the inner ring of the bearing;
图13为本发明轴承外套圈抛光前后的试验结果对比图,其中左图为抛光前,右图为抛光后;Fig. 13 is a comparison diagram of test results before and after polishing of the bearing outer ring of the present invention, wherein the left picture is before polishing, and the right picture is after polishing;
附图说明:1-第一调心模块;2-第二调心模块;3-样品旋转模块;4-样品夹持模块;5-抛光模块;6-机座;101-电机架;102-第一支撑杆;103-第二支撑杆;104-开口固定环;105-第一连接板;106-第二连接板;201-二维工作台;202-上定位孔;203-下定位孔;204-第一方向旋钮;205-第二方向旋钮;301-旋转圆盘;302-旋转圆盘开关;303-旋转圆盘调速旋钮;401-轴承外套圈夹具;402-抛光液液池;403-垫块;404-轴承外套圈;405-短销;406-长销;407-轴承内套圈夹具;408-轴承内套圈;501-电机;502-电机控制器;503-轴承外套圈抛光头;504-抛光垫;505-轴承内套圈抛光头。Description of drawings: 1-the first alignment module; 2-the second alignment module; 3-sample rotation module; 4-sample clamping module; 5-polishing module; 103-second support rod; 104-opening fixing ring; 105-first connecting plate; 106-second connecting plate; 201-two-dimensional workbench; 202-upper positioning hole; 203-lower positioning hole ;204-first direction knob; 205-second direction knob; 301-rotary disc; 302-rotary disc switch; 303-rotary disc speed control knob; 401-bearing outer ring fixture; ;403-pad; 404-bearing outer ring; 405-short pin; 406-long pin; 407-bearing inner ring fixture; 408-bearing inner ring; 501-motor; 502-motor controller; 503-bearing Outer ring polishing head; 504-polishing pad; 505-bearing inner ring polishing head.
具体实施方式Detailed ways
为使本发明实施例的目的、技术方案和优点更加清楚,下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。通常在此处附图中描述和表示出的本发明实施例的组件可以以各种不同的配置来布置和设计。In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. The components of the embodiments of the invention generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations.
因此,以下对在附图中提供的本发明的实施例的详细描述并非旨在限制要求保护的本发明的范围,而是仅仅表示本发明的选定实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。Accordingly, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
请参照图1至图10,本实施例提供一种轴承套圈接触式超精密化学机械抛光装置,该装置包括第一调心模块1、第二调心模块2、样品旋转模块3、样品夹持模块4、抛光模块5和机座6;抛光对象轴承套圈包括轴承外套圈404、轴承内套圈408;机座6上分别设置有样品旋转模块3和第一调心模块1,第一调心模块1上设置有抛光模块5,样品旋转模块3上设置有第二调心模块2,第二调心模块2上设置有样品夹持模块4,第一调心模块1包括电机架101、第一支撑杆102、第二支撑杆103、开口固定环104,第二调心模块2包括二维工作台201、上定位孔202、下定位孔203、第一方向旋钮204和第二方向旋钮205,样品旋转模块3包括旋转圆盘301、旋转圆盘开关302和旋转圆盘调速旋钮303,样品夹持模块4包括轴承外套圈夹具401、轴承内套圈夹具407、抛光液液池402和垫块403,抛光模块5包括轴承外套圈抛光头503、轴承内套圈抛光头505、电机501和电机控制器502。Please refer to Fig. 1 to Fig. 10, this embodiment provides a bearing ring contact type ultra-precision chemical mechanical polishing device, the device includes a first alignment module 1, a second alignment module 2, a sample rotation module 3, a sample holder holding module 4, polishing module 5 and machine base 6; the bearing ring to be polished includes bearing outer ring 404 and bearing inner ring 408; The centering module 1 is provided with a polishing module 5, the sample rotating module 3 is provided with a second centering module 2, the second centering module 2 is provided with a sample holding module 4, and the first centering module 1 includes a motor frame 101 , the first support rod 102, the second support rod 103, the open fixed ring 104, the second alignment module 2 includes a two-dimensional workbench 201, an upper positioning hole 202, a lower positioning hole 203, a first direction knob 204 and a second direction Knob 205, the sample rotation module 3 includes a rotary disc 301, a rotary disc switch 302 and a rotary disc speed control knob 303, and the sample clamping module 4 includes a bearing outer ring clamp 401, a bearing inner ring clamp 407, and a polishing liquid pool 402 and pad 403, the polishing module 5 includes a bearing outer ring polishing head 503, a bearing inner ring polishing head 505, a motor 501 and a motor controller 502.
请参照图3,第一调心模块1的主要功能为调整电机架101在水平方向和竖直方向上的位置,带动抛光模块5,从而使抛光头与轴承套圈同轴;三根第二支撑杆103底部设有圆柱孔,圆柱孔内插入机座6自带的圆柱杆,通过侧面的螺栓固定连接,三根第一支撑杆102位于所匹配的三根第二支撑杆103上,三根第一支撑杆102远离电机架101的一端设置有三块第一连接板105,三根第二支撑杆103远离机座6的一端设置有与三块第一连接板105匹配连接的三块第二连接板106,第一连接板105和第二连接板106上设有孔槽,第一连接板105沿着孔槽相对第二连接板106移动,使得第一支撑杆102相对第二支撑杆103在水平方向上移动,调整好位置后用螺栓连接固定,电机架101位于第一支撑杆102上,可沿着第一支撑杆102在竖直方向上移动,调整好位置后,在电机架101上的三个开口固定环104用于固定电机架101竖直方向的位置,确保电机架101处于水平。Please refer to Fig. 3, the main function of the first centering
请参照图2和图4,第二调心模块2的主要功能为通过二维工作台201调整台面上的样品夹持模块4的水平位置,从而使轴承套圈与样品旋转模块3同轴。二维工作台201通过旋转第一方向旋钮204和第二方向旋钮205控制台面向第一方向和第二方向移动,两个方向互相垂直,两个旋钮上标有刻度,可确定样品夹持模块4的位置,二维工作台201台面上有多个上定位孔202,用于固定样品夹持模块4,二维工作台201下方有四个下定位孔203,用于将二维工作台201用螺钉固定在样品旋转模块3的旋转圆盘301上,使二维工作台201跟随样品旋转模块3旋转,从而带动样品夹持模块4上的轴承套圈转动,通过旋转圆盘开关302实现旋转圆盘301停止或旋转,通过旋转圆盘调速旋钮303实现旋转圆盘301不同转速,设置较低转速,减小抛光头加工误差带来的轴承套圈表面受力不均问题,均化误差,保证轴承套圈高的面型精度。Please refer to FIG. 2 and FIG. 4 , the main function of the second aligning
请参照图5和图6,样品夹持模块4的主要功能为针对性提供轴承内、外套圈夹具,并容纳抛光液;轴承套圈夹具包括轴承外套圈夹具401、轴承内套圈夹具407,分别用于固定轴承外套圈404、轴承内套圈408,抛光液液池402用于容纳抛光液,并固定轴承套圈夹具,抛光液液池402固定在垫块403上,垫块403通过两根短销405和两根长销406固定在第二调心模块2上,跟随第二调心模块2移动和旋转,抛光结束后,取下定位销钉后,取出垫块403,向下移动样品夹持模块4,将轴承套圈与抛光头分开,取出轴承套圈。Please refer to Fig. 5 and Fig. 6, the main function of the
轴承外套圈夹具401底部为一个外径与抛光液液池402内径相同的圆盘底座,圆盘底座上方为一个与之同轴的圆柱,圆柱内部有一个与之同轴阶梯孔,阶梯孔上部直径略大于轴承外套圈404外径,方便轴承外套圈404放入,阶梯孔上部有四个螺纹孔,通过螺钉拧紧固定轴承外套圈404,防止其转动,阶梯孔下部内径小于轴承外套圈404外径,大于轴承外套圈404内径,使轴承外套圈404保持在特定高度,同时方便抛光轴承外套圈404的整个内表面,圆柱周围均匀设置四个缺口,方便抛光液进入;轴承内套圈夹具407底部为一个外径与抛光液液池402内径相同的圆盘底座,圆盘底座上方为一个与之同轴的阶梯轴,阶梯轴上部直径与轴承内套圈408内径相同,轴承内套圈408通过过盈配合安装在阶梯轴上部,阶梯轴下部直径大于轴承内套圈408内径,小于轴承内套圈408外径,使轴承内套圈408保持在特定的高度,同时方便抛光头抛光轴承内套圈408的整个外表面。The bottom of the bearing
请参照图7和图8,抛光模块5的主要功能为针对性提供轴承内、外套圈抛光头,并控制抛光头旋转,对轴承套圈进行抛光;抛光头由衬底和抛光垫504两部分组成,抛光垫504粘附衬底表面,衬底和抛光垫504均采用柔性材料,综合考虑弹性和匹配性,衬底材料选择70度的硅胶,抛光垫504材料选择多孔聚氨酯。Please refer to Fig. 7 and Fig. 8, the main function of polishing module 5 is to provide bearing inner and outer ring polishing heads in a targeted manner, and to control the rotation of the polishing heads to polish the bearing rings; the polishing head is composed of a substrate and a
轴承外套圈抛光头503的衬底为圆柱,上部有一个内径与电机轴外径相同的圆柱孔,且附带键槽,圆柱外表面粘附抛光垫504后,外径与轴承外套圈404内径相同;轴承内套圈抛光头505的衬底为圆柱,上部有一个内径与电机轴外径相同的圆柱孔,且附带键槽,下部有一个圆柱孔,圆柱孔内表面粘附抛光垫504后,内径与轴承内套圈408外径相同。The substrate of the bearing outer
电机501固定在电机架101的中心,抛光头通过键连接在电机501的轴上,通过控制电机控制器502,电机501可以实现不同转速,并带动抛光头旋转,设置较高转速,在抛光垫504与化学机械抛光液的共同作用下,对轴承套圈进行抛光。The
请参照图9和图10,采用实施例一中的一种轴承套圈接触式超精密化学机械抛光装置进行抛光,抛光方法包括以下步骤:Please refer to Figure 9 and Figure 10, a bearing ring contact type ultra-precision chemical mechanical polishing device in
S1、将第二调心模块2固定安装在样品旋转模块3上,将轴承套圈安装在样品夹持模块4上,将样品夹持模块4固定安装在第二调心模块2上,依次安装第一调心模块1、抛光模块5,通过第一调心模块1和第二调心模块2调整位置,使抛光头、轴承套圈和样品旋转模块3三者同轴,同时保证抛光头与轴承套圈充分接触;S1. Fix the
S2、配置化学机械抛光液,鉴于轴承套圈材料为9Cr18Mo不锈轴承钢,抛光液包括2wt%的胶体二氧化硅、1 wt%的过氧化氢、剩余为水,pH值4,搅拌均匀,将抛光液倒入抛光液液池402中,其中,2 wt%的胶体二氧化硅能够提供充足的机械作用,1 wt%的过氧化氢能够在轴承钢表面生成一层均匀一致的铁铬氧化膜,且具有钝化作用,有助于实现纳米级表面粗糙度,pH值4能够兼顾材料去除速率和表面粗糙度;S2, configure the chemical mechanical polishing liquid, in view of the bearing ring material is 9Cr18Mo stainless bearing steel, the polishing liquid includes 2wt% colloidal silicon dioxide, 1 wt% hydrogen peroxide, the remainder is water, the pH value is 4, stir evenly, Pour the polishing liquid into the polishing
S3、设置抛光工艺参数,其中,环境温度设置为22℃~23℃,抛光模块5转速设置为280 r/min,该转速既能实现高速抛光,又能保证抛光液不会飞溅出抛光液液池402,样品旋转模块3转速设置为10 r/min,该转速可以减小抛光头加工误差带来的轴承套圈表面受力不均问题,均化误差,设置好参数后,进行抛光;S3. Set the polishing process parameters, wherein the ambient temperature is set to 22°C~23°C, and the speed of the polishing module 5 is set to 280 r/min. This speed can not only achieve high-speed polishing, but also ensure that the polishing liquid will not splash out of the polishing liquid In the
S4、抛光结束后,取下轴承套圈,利用三维形貌仪检测抛光后的表面质量。S4. After the polishing is completed, the bearing ring is removed, and the surface quality after polishing is detected by a three-dimensional topography instrument.
抛光前后的轴承套圈照片如图11和图13所示,对比发现,抛光前轴承内、外套圈的表面仅能反射出模糊倒影,抛光后能够反射出清晰倒影,表面质量明显变好。抛光后的三维形貌仪检测结果如图12所示,其中左图为轴承内套圈408大径处,表面粗糙度S a为1.02 nm,右图为轴承内套圈408小径处,表面粗糙度S a为1.32 nm。The photos of bearing rings before and after polishing are shown in Figure 11 and Figure 13. By comparison, it is found that the surfaces of the inner and outer rings of the bearing can only reflect blurred reflections before polishing, but can reflect clear reflections after polishing, and the surface quality is obviously improved. The test results of the three-dimensional profiler after polishing are shown in Figure 12, in which the left picture shows the large diameter of the bearing
综上所述,本发明公开了一种轴承套圈接触式超精密化学机械抛光装置及方法,本发明针对性设计轴承内、外套圈抛光头和夹具;控制样品旋转模块和抛光模块转速,均化误差,实现轴承套圈表面均匀抛光;针对不锈轴承钢设计抛光液,使轴承套圈表面粗糙度接近1 nm,相比于发明专利“微型轴承核心元件超精密柔性化学机械抛光装置及方法”的试验结果,表面粗糙度降低了一个量级,实现轴承套圈超精密加工。In summary, the present invention discloses a contact type ultra-precision chemical mechanical polishing device and method for bearing rings. The present invention specifically designs the polishing heads and fixtures for the inner and outer rings of bearings; Minimize the error, realize the uniform polishing of the surface of the bearing ring; design the polishing liquid for the stainless bearing steel, so that the surface roughness of the bearing ring is close to 1 nm, compared with the invention patent "ultra-precision flexible chemical mechanical polishing device and method for the core component of the miniature bearing" "The test results show that the surface roughness is reduced by an order of magnitude, and the ultra-precision machining of the bearing ring is realized.
本说明书描述了本发明的实施例的示例,并不意味着这些实施例说明并描述了本发明的所有可能形式。本领域的普通技术人员将会意识到,这里所述的实施例是为了帮助读者理解本发明的原理,应被理解为本发明的保护范围并不局限于这样的特别陈述和实施例。本领域的普通技术人员可以根据本发明公开的这些技术启示做出各种不脱离本发明实质的其它各种具体变形和组合,这些变形和组合仍然在本发明的保护范围内。While this specification describes examples of embodiments of the invention, it is not intended that these embodiments illustrate and describe all possible forms of the invention. Those skilled in the art will appreciate that the embodiments described here are to help readers understand the principles of the present invention, and it should be understood that the protection scope of the present invention is not limited to such specific statements and embodiments. Those skilled in the art can make various other specific modifications and combinations based on the technical revelations disclosed in the present invention without departing from the essence of the present invention, and these modifications and combinations are still within the protection scope of the present invention.
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