CN115026060B - Mask cleaning apparatus and mask cleaning method - Google Patents

Abstract

The invention relates to a photomask cleaning device which is applied to a photomask box, wherein the photomask box comprises an upper cover and a chassis, a photomask is accommodated on the chassis, the photomask is provided with a photomask protecting film, the photomask cleaning device comprises a main shell, a primary shell, a photomask uncapping device, a conveying device and at least one air knife device, and the secondary shell is connected with the main shell. The photomask uncapping device comprises a lifting element and a uncapping element, wherein the uncapping element comprises a back connecting part and a cover part, and the lifting element is used for lifting the back connecting part. The cover part is embedded in the secondary shell, the cover part and the back connecting part form a photomask inlet, and the upper cover is propped against the cover part. The conveying device comprises a sliding rail and a photomask box carrying platform. The reticle pod carrier is moved to the reticle entrance via a slide rail. When the lifting element lifts the cover opening element, the upper cover, the cover cap part, the main shell and the secondary shell form a closed space.

Description

Photomask cleaning equipment and photomask cleaning method

Technical field

The present invention relates to a mask cleaning equipment and a mask cleaning method, in particular to a mask cleaning equipment and a mask cleaning method for removing contaminants on the mask protective film.

Background technique

In the semiconductor process, it includes an exposure process, which first places a mask with a pattern on top of the wafer, and then uses an exposure light source to shine on a wafer through the mask. After that, the wafer is immersed in a developer, and the mask pattern can be seen on the wafer.

There will be a layer of mask protective film on the photomask, which can prevent the photomask from being scratched. In addition, since the photomask protective film will adhere to pollutants (pollution particles), chemical substances, etc. due to static electricity, the photomask protective film needs to be cleaned so as not to affect the yield of the semiconductor process. However, there is still a need to improve the dust removal effect and dust removal efficiency of the existing photomask protective film. In addition, during the process of taking out the photomask, external contamination particles may easily adhere to the photomask protective film.

Therefore, how to improve the above-mentioned problems is worthy of consideration by those with ordinary knowledge in this field.

Contents of the invention

The object of the present invention is to provide a photomask cleaning device that has an excellent dust removal effect on the photomask protective film and can prevent external contamination particles from adhering to the photomask during the process of taking out the photomask. on the protective film.

The photomask cleaning equipment of the present invention is applied to a photomask box. The photomask box includes an upper cover and a chassis. The photomask is accommodated on the chassis. The photomask has a photomask protective film. The photomask cleaning equipment includes a main body. The housing, the primary housing, a mask opening device, a transport device and at least one air knife device, the secondary housing is connected to the main housing. The mask opening device includes a lifting element and a lid opening element. The lid opening element includes a back connection part and a cover part, and the lifting element is used to lift the back connection part and the cover part. In addition, the cover part is embedded in the sub-casing, the connection part of the cover part and the back forms a photomask inlet, and the upper cover abuts against the cover part. In addition, the transport device includes a slide rail and a mask box carrying platform. The mask box carrying platform is moved to the mask entrance via the slide rail, and the chassis is arranged on the mask box carrying platform. In addition, the air knife device is used to generate an air flow to the photomask film. When the lifting element lifts the cover element, the upper cover, the cover part, the main housing and the secondary housing form a closed space.

In the above photomask cleaning equipment, the air knife device includes an azimuth adjustment element and an air knife nozzle, and the air knife nozzle is connected to the azimuth adjustment element.

In the above photomask cleaning equipment, the orientation adjustment element includes a first axis, the air knife nozzle includes a second axis, and the first axis is perpendicular to the second axis.

In the above photomask cleaning equipment, the number of the air knife devices is multiple, and the air knife devices are arranged in a U-shape.

The above-mentioned photomask cleaning equipment also includes an electrostatic neutralization device, which produces a plurality of charged particles with a plurality of alpha particles, and these charged particles are transported to the photomask protective film through a clean gas. .

In the above-mentioned photomask cleaning equipment, the chassis includes a rotary switch, and the photomask box carrying platform includes a rotating unit, and the rotating unit corresponds to the rotary switch.

The above-mentioned photomask cleaning equipment further includes an ultrasonic resonance device, which is used to generate an ultrasonic wave to the photomask protective film.

The above-mentioned photomask cleaning equipment also includes at least one flow control device, which is used to control the air flow entering the air knife nozzle.

In the mask cleaning equipment described above, the frequency of the ultrasonic wave is not less than 20kHz.

In the mask cleaning equipment described above, the ultrasonic resonance device includes a height adjustment platform and an ultrasonic oscillation head, and the ultrasonic oscillation head is connected to the height adjustment platform.

The above-mentioned photomask cleaning equipment also includes a photomask protective film monitoring device, which is used to monitor the amplitude of the photomask protective film.

The above-mentioned photomask cleaning equipment further includes at least one air filtering device, which is used to filter contamination particles in the main housing.

Another object of the present invention is to provide a photomask cleaning method. The photomask cleaning method has an excellent dust removal effect on the photomask protective film, and can prevent external contamination particles from adhering to the photomask during the process of taking out the photomask. on the protective film.

The photomask cleaning method of the present invention is applied to the photomask cleaning equipment described above, and the photomask cleaning method includes the following steps. First, a photomask box is placed at the photomask entrance. The photomask box includes an upper cover and a chassis, and the chassis is used to accommodate a photomask. After that, separate the upper cover from the chassis so that the mask box carrying platform only carries the chassis and the mask. After that, move the chassis and photomask into the main housing. Then, an airflow is generated to a photomask protective film of the photomask. Afterwards, the chassis and photomask are returned to the photomask entrance. Afterwards, the upper cover is combined with the chassis so that the photomask is stored in the photomask box.

The above-mentioned photomask cleaning method further includes an electrostatic neutralization step to create a plurality of charged particles using a plurality of alpha particles, and these charged particles are transported to the photomask protective film through a clean gas.

The above-described photomask cleaning method further includes an ultrasonic resonance step for generating an ultrasonic wave to the photomask protective film.

The invention has the following advantages: it has excellent dust removal effect, and can prevent external contamination particles from adhering to the photomask protective film during the process of taking out the photomask.

The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments, but this is not intended to limit the invention.

Description of the drawings

Figure 1A shows a schematic diagram of the air knife device, transport device, ultrasonic resonance device, static neutralization device and flow control device located in the main housing;

Figure 1B shows a perspective view of the photomask cleaning equipment;

Figure 1C shows a perspective view of the upper cover and chassis of the photomask box;

Figure 1D shows a schematic diagram of the bottom surface of the mask box;

Figure 2A shows a schematic diagram of the photomask opening device;

Figure 2B shows a schematic diagram of the lid-opening component when it rises;

Figure 3A shows a schematic diagram of the transport device;

Figure 3B shows a schematic diagram of the mask box embedded in the mask entrance;

Figure 3C shows a schematic diagram of the cover opening component opening the upper cover;

Figure 3D shows a schematic diagram of the chassis installed on the photomask box carrying platform;

Figure 4 shows a schematic diagram of the chassis and photomask moving into the main housing;

Figure 5 shows a schematic diagram of three sets of air knife devices;

Figure 6 shows a schematic diagram of an electrostatic neutralization device;

Figure 7 shows a schematic diagram of an ultrasonic resonance device;

Figure 8 shows a flow chart of the photomask cleaning method in this embodiment;

FIG. 9 shows a flow chart of a photomask cleaning method according to another embodiment.

Among them, reference signs

10: Mask cleaning equipment

11: Main shell

12: Secondary shell

13: Photomask opening device

131: Lifting components

132: Open cover component

132B: Back connection part

132C: Cover part

132E: Mask entrance

14: Transport device

141: Slide rail

142: Mask box carrying platform

142S: Rotary unit

15: Air knife device

151: Orientation adjustment component

151A: First axis

152: Air knife nozzle

152A: Second axis 152A

16: Static neutralization device

161: Ion nozzle

162: Alpha ionizer

17: Ultrasonic resonance device

171: Height adjustment platform

172: Ultrasonic vibrating head

18: Flow control device

19: Photomask protective film monitoring device

21: Air filter device

8: Mask box

81: Upper cover

81T: Tenon seat

82: Chassis

82T: Tenon

82S: Rotary switch

83: Photomask

83F: Photomask protective film

S1～S8: Steps

Detailed ways

The structural principle and working principle of the present invention will be described in detail below in conjunction with the accompanying drawings:

Please refer to Figure 1A, Figure 1B, Figure 1C and Figure 1D. Figure 1A shows the air knife device 15, the transport device 14, the ultrasonic resonance device 17, the static electricity neutralization device 16 and the flow control device 18 located in the main housing 11 1B is a perspective view of the mask cleaning equipment 10, FIG. 1C is a perspective view of the upper cover 81 and the chassis 82 of the mask box 8, and FIG. 1D is a perspective view of the bottom surface of the mask box 8. Schematic diagram. The mask cleaning equipment 10 of this embodiment is applied to a mask box 8. The mask box 8 includes an upper cover 81 and a chassis 82. The upper cover 81 includes a plurality of tenon seats 81T. The sides of the chassis 82 are It includes a plurality of tenons 82T, and adjacent tenons 82T correspond to one tenon seat 81T. Furthermore, the bottom surface of the chassis 82 includes a rotary switch 82S. When the upper cover 81 is combined with the chassis 82, the chassis 82 is covered by the upper cover 8, and the latch 82T is embedded in the corresponding latch seat 81T. In addition, a photomask 83 is accommodated above the chassis 82, and the photomask 83 is provided with a photomask protective film 83F. .

The mask cleaning equipment 10 of this embodiment includes a main housing 11, a primary housing 12, a mask opening device 13, a transport device 14, three sets of air knife devices 15, a static neutralization device 16, a super The sonic resonance device 17, a plurality of flow control devices 18, a mask film monitoring device 19 and a plurality of air filter devices 21, the secondary housing 12 is connected to the main housing 11, and the secondary housing 12 and the main housing 11 are connected to each other. conduction. Among them, the air knife device 15, the static electricity neutralization device 16, the ultrasonic resonance device 17, the flow control device 18 and the mask protective film monitoring device 19 are installed in the main housing 11, and the transport device 14 is installed across the There is a main housing 11 and a secondary housing 12.

Please refer to FIG. 1B again and please refer to FIGS. 2A and 2B simultaneously. FIG. 2A shows a schematic diagram of the mask opening device 13 , and FIG. 2B shows a schematic diagram of the lid opening component 132 when it rises. The photomask opening device 13 includes a lifting element 131 and an opening element 132. The opening element 132 includes a back connection part 132B and a cover part 132C. The back connection part 132B is connected to the cover part 132C, and The cover portion 132C has an appearance like a U-shaped partition. It is worth noting that the lifting element 131 is used to raise or lower the back connection part 132B and the cover part 132C. In addition, the cover portion 132C of the mask opening device 13 is embedded in the sub-casing 12 , and the cover portion 132C and the back connection portion 132B will form a mask entrance 132E, and the mask entrance 132E is the mask box 8 The location area where it is placed.

Please refer to FIGS. 3A and 3B . FIG. 3A shows a schematic diagram of the transport device 14 , and FIG. 3B shows a schematic diagram of the mask box 8 embedded in the mask inlet 132E. The transport device 14 includes a slide rail 141 and a mask box carrying platform 142. One end of the slide rail 141 is in the main housing 11, the other end of the slide rail 141 is in the secondary housing 12, and the mask box is loaded The stage 142 includes a rotation unit 142S, which is a rotation switch 82S corresponding to the chassis 82 . Specifically, when the rotating unit 142S turns the rotary switch 82S, the latch 82T is retracted into the chassis 82 and is not embedded in the corresponding latch seat 81T. In this way, the upper cover 81 and the chassis 82 of the mask box 8 can be separated.

In addition, the mask box carrying platform 142 is movably connected to the sliding rail 141, so the mask box carrying platform 142 can move to the mask entrance 132E through the sliding rail 141. Specifically, when the mask box carrying platform 142 moves into the sub-casing 12 via the slide rail 141, the mask box carrying platform 142 will be exposed at the mask entrance 132E (please refer to FIG. 1B again). In this way, the mask box 8 can be placed on the mask box carrying platform 142 (the mask box 8 is placed on the mask box carrying platform 142 through the chassis 82).

Please refer to FIG. 3C. FIG. 3C shows a schematic diagram of the cover opening component 132 opening the upper cover 81. When the mask box 8 is placed on the mask box carrying platform 142, the upper cover 81 of the mask box 8 is against on the cover portion 132C. Therefore, when the mask cleaning equipment 10 wants to expose the mask 83 from the mask box 8, the rotating unit 142S will turn the rotary switch 82S and the lifting element 131 will immediately lift the back connection part 132B, and the upper cover 81 will follow the mask. The cover 132C rises upward. Afterwards, the upper cover 81 will be separated from the chassis 82. At this moment, the mask box carrying platform 142 only carries the chassis 82 and the mask 83 above the chassis 82 (please refer to FIG. 3D).

Please refer to FIG. 3C again and FIG. 4 at the same time. FIG. 4 shows a schematic diagram of the chassis 82 and the photomask 83 moving into the main housing 11 . It is worth noting that when the lifting element 131 lifts the back connection part 132B, the transport device 14 will also move the chassis 82 and the photomask 83 into the main housing 11 via the photomask box carrying platform 142, that is, the photomask will be 83 moves to below the air knife device 15 , the static electricity neutralization device 16 and the ultrasonic resonance device 17 . Moreover, when the upper cover 81 and the cover portion 132C of the mask box 8 rise upward, the upper cover 81 , the cover portion 132C, the main housing 11 and the sub-casing 12 will form a sealed space. In this way, the mask cleaning equipment 10 can prevent external contamination particles from adhering to the mask protective film 83F during the process of taking out the mask 83 . In addition, when cleaning the photomask protective film 83F, it can also be ensured that the photomask protective film 83F is within the sealed space.

Please refer to FIG. 4 again and FIG. 5 at the same time. FIG. 5 shows a schematic diagram of three sets of air knife devices 15 . The air knife device 15 includes an azimuth adjustment element 151 and an air knife nozzle 152. The air knife nozzle 152 is connected to the azimuth adjustment element 151. Among them, the orientation adjustment element 151 includes a first axis 151A, and the air knife nozzle 152 includes a second axis 152A. The first axis 151A is perpendicular to the second axis 152A. Therefore, the air knife nozzle 152 can be moved up and down, left and right, and rotated through the first axis 151A and the second axis 152A, so as to adjust the height or left and right position and rotation angle of the air knife device 15 .

In addition, the air knife device 152 is used to generate an airflow to the photomask protective film 83F, so as to blow the contamination particles away from the photomask protective film 83F through the airflow. Specifically, the airflow is ejected from the air knife nozzle 152 , and the air knife nozzle 152 can change the injection angle of the airflow through the azimuth adjustment element 151 . Therefore, the air knife device 152 can be adjusted according to the thickness of different photomasks 83 (ie, the position of the photomask protective film 83F) to achieve the best dust removal effect.

In addition, the mask cleaning equipment 10 of this embodiment has three sets of air knife devices 15, and the three sets of air knife devices 15 are arranged in a U-shape. In this way, the two sets of lateral air knife devices 15 will have an excellent dust removal effect on objects on the lateral facade.

In addition, each flow control device 18 corresponds to an air knife nozzle 152 , and the flow control device 18 is used to control the air flow entering the air knife nozzle 152 . In this way, it is beneficial for the air knife nozzle 152 to use the optimal air flow for dust removal and achieve the best dust removal effect.

Please refer to FIG. 4 again and FIG. 6 simultaneously. FIG. 6 shows a schematic diagram of the static electricity neutralizing device 16 . The static electricity neutralization device 16 includes an alpha ionizer 162 and a plurality of ion nozzles 161. The alpha ionizer 162 is used to generate a plurality of alpha particles. Afterwards, the static electricity neutralization device 16 produces a plurality of charged particles through these alpha particles, and these charged particles are then sent to the photomask pellicle 83F via the ion nozzle 161, so that the contamination particles are easily separated from the photomask pellicle 83F. Among them, the static electricity neutralization device 16 uses wind force (clean gas) to quickly reach the surface of the photomask protective film 83F with charged particles, so it can eliminate static electricity more effectively than the traditional static electricity neutralization device.

Please refer to FIG. 4 again and refer to FIG. 7 simultaneously. FIG. 7 shows a schematic diagram of the ultrasonic resonance device 17 . The ultrasonic resonance device 17 includes a height adjustment platform 171 and an ultrasonic oscillation head 172. The ultrasonic oscillation head 172 is connected to the height adjustment platform 171, and the height adjustment platform 171 is used to adjust the height position of the ultrasonic oscillation head 172. In this embodiment, the ultrasonic resonance device 17 generates an ultrasonic wave to the photomask protective film 83F through the ultrasonic oscillating head 172, so that the photomask protective film 83F and the pollution particles attached to the photomask protective film 83F resonate. . As a result, contamination particles can easily fall from the photomask protective film 83F to the outside. Among the above, the frequency of the ultrasonic wave is not less than 20 kHz, and the optimal frequency of the ultrasonic wave is about 35 kHz.

In addition, the air knife device 15, the static electricity neutralizing device 16 and the ultrasonic resonance device 17 are all located above the mask box carrying platform 142, so the air knife device 15, the static electricity neutralizing device 16 and the ultrasonic resonance device 17 can simultaneously Mask protective film 83F is used for dust removal. Moreover, by moving the mask box carrying platform 142 back and forth on the slide rail 141, the cleaning effect of the mask protective film 83F can be further increased.

In addition, the mask pellicle monitoring device 19 is disposed beside the ultrasonic resonance device 17 . It is worth noting that the mask pellicle monitoring device 19 is used to monitor the amplitude of the mask pellicle 83F. In this way, excessive vibration of the photomask protective film 83F due to ultrasonic vibration is prevented, resulting in damage to the photomask protective film 83F.

In addition, the air filter device 21 is provided next to the flow control device 18 . The air filter device 21 is used to filter the contamination particles to reduce contaminants in the mask cleaning equipment 10 .

In this embodiment, when the mask protective film 83F completes the cleaning process, the transport device 14 will also return the chassis 82 together with the mask 83 to the mask entrance 132E, which is the opening of the mask box 8 . Then, the mask opening device 13 combines the upper cover 81 with the chassis 82 , and the rotation unit 142S locks the rotary switch 82S so that the mask 83 is stored in the mask box 8 again.

To sum up, the mask cleaning equipment 10 has an excellent dust removal effect on the mask protective film 83F through the air knife device 15, the static electricity neutralization device 16 and the ultrasonic resonance device 17, and when taking out the mask 83 and storing the mask During the 83 process, external contamination particles can also be prevented from adhering to the photomask protective film 83F.

Please refer to FIG. 8 , which is a flow chart of the photomask cleaning method in this embodiment. The photomask cleaning method of this embodiment is applied to the photomask cleaning device 10. The photomask cleaning method includes the following steps. First, please refer to FIG. 1C, FIG. 3B and step S1. Place a mask box 8 to the mask entrance 132E. The mask box 8 includes an upper cover 81 and a chassis 82, and the chassis 82 accommodates a mask 83. .

Afterwards, please refer to FIG. 3C, FIG. 3D and step S2 to separate the upper cover 81 and the chassis 82 so that the mask box carrying platform 142 only carries the chassis 82 and the mask 83. Specifically, the upper cover 81 and the chassis 82 are opened and separated through the cover opening component 132 .

Afterwards, referring to FIG. 4 and step S3 , the chassis 82 and the photomask 83 are moved into the main housing 11 via the transport device 14 .

After that, please refer to FIG. 6 and step S4. Step S4 is equivalent to an electrostatic neutralization step. A plurality of charged particles are produced from a plurality of alpha particles through the electrostatic neutralization device 16, and these charged particles are transmitted to the light through a clean gas. A reticle pellicle 83F is provided on the cover 83 so that contaminant particles are easily separated from the reticle pellicle 83F.

After that, please refer to Figure 7 and step S5. Step 5 is equivalent to an ultrasonic resonance step. An ultrasonic wave is generated through the ultrasonic resonance device 17 to the photomask protective film 83F, so that the photomask protective film 83F adheres to the photomask. The contamination particles on the protective film 83F resonate. Therefore, contamination particles easily fall from the photomask pellicle 83F to the outside. .

After that, please refer to FIG. 5 and step S6 , an air flow is generated to the photomask protective film 83F through the plurality of air knife devices 15, so that the contaminant particles are blown away from the photomask protective film 83F.

Afterwards, please refer to step S7, the chassis 82 and the photomask 83 are returned to the photomask entrance 132E via the transport device 14.

After that, please refer to step S8 , the upper cover 81 and the chassis 82 are combined via the cover opening component 132 so that the photomask 83 is stored in the photomask box 8 .

In the above photomask cleaning method, step S4, step S5 and step S6 are performed in sequence. However, in other embodiments, step S4, step S5 and step S6 can also be performed simultaneously (see Figure 9). Specifically, the air knife device 15, the static electricity neutralization device 16, and the ultrasonic resonance device 17 can simultaneously remove dust from the photomask protective film 83F, and do not need to be performed separately in sequence. Furthermore, in other embodiments, the mask box carrying platform 142 can be moved back and forth several times in the main housing 11 . In this way, the above-mentioned steps S4, S5 and S6 are repeated multiple times, which is more conducive to cleaning the photomask protective film 83F.

To sum up, the photomask cleaning method of this embodiment has an excellent dust removal effect on the photomask protective film 83F through the air knife device 15, the static electricity neutralization device 16 and the ultrasonic resonance device 17 of the photomask cleaning equipment 10. Moreover, this method also stores the cleaned photomask 83 back into the original photomask box 8 .

Of course, the present invention can also have various other embodiments. Without departing from the spirit and essence of the present invention, those skilled in the art can make various corresponding changes and deformations according to the present invention. However, these corresponding Changes and deformations should fall within the protection scope of the appended claims of the present invention.

Claims (15)

1. A photomask cleaning equipment, applied to a photomask box. The photomask box includes an upper cover and a chassis. The chassis is used to accommodate a photomask. The photomask has a photomask protective film. Its characteristics The mask cleaning equipment includes: a main housing; The primary shell is connected to the main shell; A mask opening device, equipped with: a lifting element; and An open cover component is provided with: A back connection part, the lifting component is used to lift the back connection part; and A cover part is embedded in the sub-casing, the cover part and the back connection part form a mask entrance, and the upper cover is against the cover part; A transport device, equipped with: a slide rail; and A mask box carrying platform moves to the mask entrance via the slide rail, and the chassis is disposed on the mask box carrying platform; and At least one air knife device for generating an air flow to the photomask film; When the lifting element lifts the back connection part and the cover part, the upper cover, the cover part, the main housing and the secondary housing form a closed space. 2. The photomask cleaning equipment according to claim 1, characterized in that the air knife device includes: an azimuth adjustment component; and An air knife nozzle is connected to the azimuth adjustment element, and the azimuth adjustment element is used to adjust the angle of the air knife nozzle. 3. The mask cleaning equipment according to claim 2, wherein the orientation adjustment element includes a first axis, the air knife nozzle includes a second axis, and the first axis is perpendicular to the third axis. Two axis. 4. The photomask cleaning equipment according to claim 1 or 2, characterized in that the number of the air knife devices is multiple, and the air knife devices are arranged in a U-shape. 5. The photomask cleaning equipment according to claim 1, further comprising an electrostatic neutralization device, the electrostatic neutralization device uses a plurality of alpha particles to produce a plurality of charged particles, and these charged particles pass through a clean The gas is delivered to the reticle pellicle. 6. The mask cleaning equipment according to claim 1, wherein the chassis includes a rotary switch, the mask box carrying platform includes a rotation unit, and the rotation unit corresponds to the rotation switch. 7. The photomask cleaning equipment according to claim 5, further comprising an ultrasonic resonance device for generating an ultrasonic wave to the photomask protective film. 8. The photomask cleaning equipment according to claim 2, further comprising at least one flow control device used to control the air flow entering the air knife nozzle. 9. The mask cleaning equipment according to claim 7, wherein the frequency of the ultrasonic wave is not less than 20 kHz. 10. The mask cleaning equipment according to claim 7, wherein the ultrasonic resonance device includes: a height adjustment platform; and An ultrasonic vibrating head is connected to the height adjustment platform. 11. The photomask cleaning equipment according to claim 7, further comprising a photomask pellicle monitoring device, the photomask pellicle monitoring device being used to monitor the amplitude of the photomask pellicle. 12. The photomask cleaning equipment according to claim 1, further comprising at least one air filtering device for filtering contamination particles in the main housing. 13. A photomask cleaning method, applied to the photomask cleaning equipment according to claim 7, characterized in that the photomask cleaning method includes: Place a mask box to the mask entrance. The mask box includes an upper cover and a chassis, and the chassis is used to accommodate a mask; Separate the upper cover from the chassis so that the photomask box carrying platform only carries the chassis and the photomask; Move the chassis and the photomask into the main housing; Generate an airflow to a reticle film of the reticle; Return the chassis and the reticle to the reticle entrance; and The upper cover is combined with the chassis so that the photomask is stored in the photomask box. 14. The photomask cleaning method according to claim 13, further comprising an electrostatic neutralization step, through which a plurality of charged particles are produced using a plurality of alpha particles, and the charged particles are passed through an Clean gas is delivered to the reticle pellicle. 15. The photomask cleaning method according to claim 13, further comprising an ultrasonic resonance step to generate an ultrasonic wave to the photomask protective film.