CN115020171B - High stability, high detection efficiency microchannel plate for ultraviolet light and X-ray detection and preparation method thereof - Google Patents
High stability, high detection efficiency microchannel plate for ultraviolet light and X-ray detection and preparation method thereofInfo
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- CN115020171B CN115020171B CN202210532661.3A CN202210532661A CN115020171B CN 115020171 B CN115020171 B CN 115020171B CN 202210532661 A CN202210532661 A CN 202210532661A CN 115020171 B CN115020171 B CN 115020171B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
- H01J31/50—Image-conversion or image-amplification tubes, i.e. having optical, X-ray, or analogous input, and optical output
- H01J31/506—Image-conversion or image-amplification tubes, i.e. having optical, X-ray, or analogous input, and optical output tubes using secondary emission effect
- H01J31/507—Image-conversion or image-amplification tubes, i.e. having optical, X-ray, or analogous input, and optical output tubes using secondary emission effect using a large number of channels, e.g. microchannel plates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/023—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof secondary-electron emitting electrode arrangements
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Abstract
本发明提供一种高稳定性、高探测效率紫外光及X射线探测用微通道板及其制备方法，在微通道板的基础上，在微通道板输入面及通道一定深度处镀制具有高光电转化效率的膜层材料作为反射光电阴极；在镀制光电阴极材料之后，使用原子层沉积技术制备一层超薄厚度均匀的致密保护层，保护层材料包括氧化硅、氧化铪、氧化铝、氧化钛、氮化硅等，具有较强的阻隔水汽的能力，且具有一定的二次电子发射能力，降低对于MCP本身性能的影响。根据上述方法制备的MCP，可广泛应用于开放式结构探测器及相关设备中，能够承受多次真空与大气环境转换而不发生明显的变化，极大的拓展了卤化物等易受潮湿空气影响的材料作为MCP输入面反射式光电阴极的应用范围。
The present invention provides a microchannel plate for ultraviolet light and X-ray detection with high stability and high detection efficiency, and a preparation method thereof. On the basis of the microchannel plate, a film material with high photoelectric conversion efficiency is plated on the input surface of the microchannel plate and at a certain depth of the channel as a reflective photocathode; after plating the photocathode material, an ultra-thin, uniformly thick, dense protective layer is prepared using atomic layer deposition technology. The protective layer material includes silicon oxide, hafnium oxide, aluminum oxide, titanium oxide, silicon nitride, etc., which has a strong ability to block water vapor and a certain secondary electron emission capability, thereby reducing the impact on the performance of the MCP itself. The MCP prepared according to the above method can be widely used in open structure detectors and related equipment, and can withstand multiple vacuum and atmospheric environment conversions without significant changes, greatly expanding the application range of materials such as halides that are easily affected by humid air as reflective photocathodes on the input surface of the MCP.
Description
Technical Field
The invention relates to the technical field of micro-channel plates, in particular to a micro-channel plate for ultraviolet light and X-ray detection with high stability and high detection efficiency and a preparation method thereof.
Background
The microchannel plate (Microchannel Plate, MCP) is a simple and compact electron multiplier successfully developed in the last 60 th century, is in the shape of a thin wafer with millions of tiny parallel hollow glass tubes gathered, and each hollow tube channel acts like a continuous dynode multiplier, can detect particles, electrons, X-rays and UV photons, has the advantages of low power consumption, self-saturation, high-speed detection, low noise and the like, and is widely applied to various detectors.
In order to improve the detection efficiency of the conventional MCP for ultraviolet light and X-rays, a material with high conversion efficiency can be plated on the input surface of the MCP to serve as a reflective cathode, so that the incidence of signal photons to the MCP is greatly improved, the detection efficiency is improved, the material is mostly halide such as cesium iodide, and the like, and a method for plating the reflective cesium iodide cathode on the surface of the MCP is disclosed in patent CN 209312708U, namely an X-ray framing camera frame converter tube, by adopting a halide material as a cathode conversion function film layer of the MCP, but the problems that the halide with high conversion efficiency is easy to deliquest generally, needs to be in-situ packaged in a vacuum device after the film layer plating is finished, or needs to be transferred to vacuum equipment for packaging the vacuum device in a short time after the film layer is taken out, and the problems of efficiency reduction, noise increase and the like caused by deliquescence of the halide film layer are avoided. Therefore, the application range of the MCP containing the photoelectric conversion functional film layer is very limited, the application requirement of an open type MCP device cannot be met, the performance of the finished product MCP is greatly influenced by the turnover process and the environment, and the control difficulty is high.
In terms of improving the stability of halide film materials such as cesium iodide and the like in a humid air environment, a lot of public reports are made that a PCTFE plastic film is covered on a scintillator of an X-ray detector in a patent CN 212872921U, a sealing glue is used for sealing the periphery of the PCTFE plastic film, the moisture resistance of the cesium iodide scintillator is greatly improved, the moisture resistance problem of the X-ray detector is well solved, a polymethyl methacrylate PMMA based on the cesium lead iodine photoelectric detector and a preparation method are provided on the surface of the cesium lead iodine photoelectric detector, the thickness of the protective layer is 20-50 nanometers, a waterproof film layer used in the waterproof cesium iodide scintillation screen is an organic film layer, and the waterproof cesium iodide scintillation screen is obtained, has excellent waterproof effect, improves the stability of the scintillator layer, and prolongs the service life of the scintillation screen. In addition, the prior art also tries to protect cesium iodide by using a metal aluminum film layer with the thickness of about 200nm, thicker PECVD silicon oxide and PECVD silicon nitride, and the protection effect obtained by thicker film layer thickness is still available.
In the multiple prior art designs, the provided protective film schemes can obtain good effects for cesium iodide materials serving as a transmission cathode or a scintillator, and the method cannot be applied to the reflection cathode because the too thick film layer can directly influence the escape of photoelectrons generated by the cathode materials so as to greatly influence the detection efficiency, and the poor secondary electron emission performance of the film layer materials can influence the electron multiplication function of the MCP.
Disclosure of Invention
The invention aims to provide a microchannel plate with high stability and high detection efficiency, which can be used for ultraviolet light and X-ray detection, wherein a functional film layer with high conversion efficiency is plated on the input surface and the inner wall of a channel of the microchannel plate to serve as a reflective cathode, so that high detection efficiency is obtained, and meanwhile, after the film layer is plated, an ultrathin compact waterproof protective film layer is prepared, so that the cathode film layer which is easily influenced by humid air is ensured to have good stability, and meanwhile, the detection efficiency and the electron multiplication function of MCP are not influenced.
According to a first aspect of the present invention, there is provided a high stability, high detection efficiency ultraviolet light and micro-channel plate for X-ray detection, comprising:
An array type electron multiplier formed by arranging millions of mutually parallel channel type electron multiplication units, wherein each electron multiplication unit forms a micro-channel structure;
Forming a reflective photocathode on the surface of the input surface and the inner wall of the channel of the electron multiplier unit, wherein the reflective photocathode is made of a material with high responsivity to ultraviolet light and X-rays, and
And a compact ultrathin waterproof protective layer with uniform thickness is prepared on the surface of the reflective photocathode.
Preferably, the reflective photocathode comprises a single film layer or a composite film layer which is prepared by at least one of cesium iodide, copper iodide, potassium bromide and potassium chloride.
Preferably, the ultrathin waterproof protective layer comprises a single film layer or a composite film layer which is prepared by at least one of silicon oxide, hafnium oxide, aluminum oxide, titanium oxide and silicon nitride.
Preferably, the coverage surface of the reflective photocathode is the whole input surface and the preset depth of the inner wall of the channel, the depth range is controlled to be 3D-20D, D is the aperture of each electron multiplication unit of the MCP, and the coating depth is more than or equal to 1/tan (theta), wherein theta is the chamfer angle of the electron multiplication unit.
Preferably, the covering surface of the ultrathin waterproof protective layer is the whole input surface and the whole inner wall of the channel.
Preferably, the thickness of the reflective photocathode is controlled to be 100-2000 nm, and the total thickness of the film layer of the ultrathin waterproof protective layer is controlled to be 0.5-20 nm.
According to a second aspect of the present invention, there is also provided a method for manufacturing a microchannel plate for high stability, high detection efficiency ultraviolet light and X-ray detection, comprising the steps of:
Preparing a film layer as a reflective photocathode on the surface of an input surface and the inner wall of a channel of an electron multiplication unit of an array type electron multiplier formed by arranging millions of channel type electron multiplication units which are parallel to each other by utilizing a material with a photoelectric conversion function, wherein the reflective photocathode is made of a material with high responsivity to ultraviolet light and X rays;
and preparing a compact ultrathin waterproof protective layer with uniform thickness on the surface of the reflective photocathode.
It should be understood that all combinations of the foregoing concepts, as well as additional concepts described in more detail below, may be considered a part of the inventive subject matter of the present disclosure as long as such concepts are not mutually inconsistent. In addition, all combinations of claimed subject matter are considered part of the disclosed inventive subject matter.
The foregoing and other aspects, embodiments, and features of the present teachings will be more fully understood from the following description, taken together with the accompanying drawings. Other additional aspects of the invention, such as features and/or advantages of the exemplary embodiments, will be apparent from the description which follows, or may be learned by practice of the embodiments according to the teachings of the invention.
Drawings
The drawings are not intended to be drawn to scale. In the drawings, each identical or nearly identical component that is illustrated in various figures may be represented by a like numeral. For purposes of clarity, not every component may be labeled in every drawing. Embodiments of various aspects of the invention will now be described, by way of example, with reference to the accompanying drawings, in which:
Fig. 1 is a schematic diagram of a process for manufacturing a microchannel plate for ultraviolet light and X-ray detection according to an exemplary embodiment of the invention.
Fig. 2 is a schematic structural view of a micro-channel plate for ultraviolet light and X-ray detection according to an exemplary embodiment of the present invention.
FIG. 3 is a graph showing a comparison of surface topography/grain changes stored in air for a microchannel plate for UV and X-ray detection in accordance with an exemplary embodiment of the present invention.
Fig. 4 is a graph showing a change in air storage efficiency of a microchannel plate for ultraviolet light and X-ray detection according to an exemplary embodiment of the present invention.
Reference numerals illustrate:
10-inner wall of the channel;
20-input face;
31-a reflective photocathode;
32-ultrathin waterproof protective layer.
Detailed Description
For a better understanding of the technical content of the present invention, specific examples are set forth below, along with the accompanying drawings.
Aspects of the invention are described in this disclosure with reference to the drawings, in which are shown a number of illustrative embodiments. The embodiments of the present disclosure are not necessarily intended to include all aspects of the invention. It should be understood that the various concepts and embodiments described above, as well as those described in more detail below, may be implemented in any of a number of ways, as the disclosed concepts and embodiments are not limited to any implementation. Additionally, some aspects of the disclosure may be used alone or in any suitable combination with other aspects of the disclosure.
The microchannel plate for high stability and high detection efficiency ultraviolet light and X-ray detection in combination with the embodiment shown in figures 1 and 2 comprises an array type electron multiplier, a reflective photocathode prepared on the input surface and the channel of the array type electron multiplier and an ultrathin waterproof protective layer prepared on the surface of the reflective photocathode.
The array type electron multiplier is formed by arranging millions of channel type electron multiplying units which are parallel to each other, and has an input surface and an output surface.
As an alternative embodiment, the array electron multiplier refers to an array electron multiplier formed by arranging millions of mutually parallel channel electron multiplying units, and is usually made from a raw material of cladding glass and core glass through the processes of wire drawing, multifilament drawing, screen arrangement, screen pressing, screen cutting, polishing, corrosion and hydrogen reduction, and is in a state of not plating any functional film layer.
Each electron multiplying unit constitutes a microchannel structure.
An example of a microchannel structure of an array type electron multiplier, i.e. an MCP background, is shown in connection with fig. 1, wherein reference numeral 10 denotes the inner walls of the channels, the region between the two inner walls of the channels constituting the microchannel. Reference numeral 20 denotes an input face of the array type electron multiplier.
As shown in fig. 1 and 2, a reflective photocathode 31 is prepared on the surface of the input surface 20 and the surface of the inner wall 10 of the channel of the electron multiplier unit, wherein the reflective photocathode is a film layer prepared from a material having a photoelectric conversion function.
Preferably, the reflective photocathode is made of a material with high responsiveness to ultraviolet light and X-rays, for example, a single film layer prepared from one of cesium iodide, copper iodide, potassium bromide and potassium chloride.
In further embodiments, the reflective photocathode 31 comprises a first composite film layer prepared from at least two of cesium iodide, copper iodide, potassium bromide, and potassium chloride.
In the foregoing embodiment, the total layer thickness of the reflective photocathode 31 is controlled to be 100-2000nm, whether it is a single film layer or a composite film layer.
The preparation process of the reflective photocathode can adopt physical vapor deposition methods for plating, such as thermal evaporation, electron beam evaporation, magnetron sputtering, ion plating process and the like.
In the embodiment of the invention, the reflective photocathode 31 covers the whole input surface and the predetermined depth of the inner wall of the channel, the covered depth is controlled to be 3D-20D, wherein D is the aperture of each electron multiplier unit of the MCP, and the coating depth is more than or equal to 1/tan (theta), wherein theta is the chamfer angle of the electron multiplier unit.
As shown in fig. 1 and 2, the surface of the reflective photocathode 31 is also provided with a dense ultra-thin waterproof protective layer 32 with uniform thickness. The ultra-thin waterproof layer 32 covers the entire surface of the input surface 20 and the entire inner wall 10 of the passage.
In further alternative embodiments, the ultra-thin waterproof layer 32 covers the entire input face 20 surface, the output face surface, and the entire channel inner wall 10.
In the examples shown in fig. 1 and 2, the preparation of the ultrathin waterproof protective layer can be performed by an atomic layer deposition technology, and the prepared film layer has high water vapor barrier capability and a certain secondary electron emission capability, and the types of materials include silicon oxide, hafnium oxide, aluminum oxide, titanium oxide, silicon nitride and the like.
In alternative embodiments, the ultra-thin waterproof protective layer 32 comprises a film layer made of one of silicon oxide, hafnium oxide, aluminum oxide, titanium oxide, silicon nitride, or a composite film layer made of at least two of silicon oxide, hafnium oxide, aluminum oxide, titanium oxide, silicon nitride.
The total thickness of the film layer of the ultra-thin waterproof protective layer 32 is controlled to be 0.5 nm-20 nm, whether it is a single film layer or a composite film layer.
The preparation method of the microchannel plate for ultraviolet light and X-ray detection with high stability and high detection efficiency disclosed by the invention comprises the following steps:
Preparing a film layer as a reflective photocathode on the surface of an input surface and the inner wall of a channel of an electron multiplication unit of an array type electron multiplier formed by arranging millions of channel type electron multiplication units which are parallel to each other by utilizing a material with a photoelectric conversion function, wherein the reflective photocathode is made of a material with high responsivity to ultraviolet light and X rays;
and preparing a compact ultrathin waterproof protective layer with uniform thickness on the surface of the reflective photocathode.
As an alternative embodiment, the reflective photocathode 31 may be plated by physical vapor deposition methods such as thermal evaporation, electron beam evaporation, magnetron sputtering, ion plating, etc., and may be a single film layer or a composite film layer prepared by using at least one of cesium iodide, copper iodide, potassium bromide, and potassium chloride. The parameters such as the aperture, the chamfer angle, the size and the like of the MCP substrate are not limited, the covered depth range is controlled to be 3D-20D, wherein D is the aperture of each electron multiplication unit of the MCP, the coating depth is more than or equal to 1/tan (theta), and theta is the chamfer angle of the electron multiplication unit.
The film material plating process parameters of the reflective photocathode 31 can be selected from the range of 100-2000 nm film thickness, 1-100 r/min tool rotation speed, 0.5-5 nm/s film plating speed, and pre-film plating baking at 50-200 ℃ for 10-60 min.
As an alternative embodiment, the ultra-thin waterproof protective layer 32 includes a single film layer or a composite film layer prepared by at least one of silicon oxide, hafnium oxide, aluminum oxide, titanium oxide, and silicon nitride.
As an alternative embodiment, the ultrathin waterproof protective layer 32 is prepared by adopting an atomic layer deposition technology, and the prepared film layer has high water vapor blocking capability and certain secondary electron emission capability. The prepared ultrathin waterproof protective layer uniformly covers the input surface of the MCP and the whole surface of the inner wall of the penetrating channel, the thickness range of the film layer is 0.5-20 nm, and the deposition temperature range of the film layer is 150-300 ℃.
In the following we take examples 1,2 and microchannel plates plated with reflective photocathodes only as examples, the same MCP assemblies were assembled for detection testing of 2KeV X-rays.
Example 1:
Step 1, plating a photoelectric conversion reflective cathode film layer by adopting a physical vapor deposition method:
1) Preparing MCP with aperture of 12 μm, diameter of 50mm and chamfer angle of 12 degree after plating NiCr electrode;
2) Preparing cesium iodide coating material;
3) Placing the MCP into a special clamp capable of correcting the bevel angle, and placing the clamp on a coater fixture with the coating angle adjusted so that the coating depth is 10D;
4) Proper coating parameters are set, namely the thickness of the coating layer is 1000nm, the rotating speed of the tool is 5r/min, the coating speed is 1nm/s, the baking before coating is carried out, namely the temperature is 150 ℃ and the time is 30min, and the coating process is automatically operated, so that the coating process is completed.
Step 2, preparing a protective film layer by adopting an atomic layer deposition technology
1) Preparing a precursor SiH 2(NEt2)2+O3 for depositing silicon oxide;
2) The MCP plated with the reflective photocathode film layer is directly transferred to the ALD equipment through a sample transfer channel connected with the vacuum equipment, and the MCP is suspended in the ALD equipment;
3) And (3) carrying out deposition of a film layer, wherein the deposition temperature is 280 ℃, and the deposition thickness of the film layer is 1nm.
4) After the deposition of the protective film layer was completed, air was discharged to obtain MCP sample 1.
And 3, packaging the MCP sample 1 into an MCP assembly, and performing detection efficiency and moisture resistance tests.
Example 2:
Step 1, plating a photoelectric conversion reflective cathode film layer by adopting a physical vapor deposition method, wherein the method is the same as that in the embodiment 1.
Step 2, preparing a protective film layer by adopting an atomic layer deposition technology
1) Preparing a precursor SiH 2(NEt2)2+O3 for depositing silicon oxide;
2) The MCP plated with the reflective photocathode film layer is directly transferred to the ALD equipment through a sample transfer channel connected with the vacuum equipment, and the MCP is suspended in the ALD equipment;
3) Depositing a film layer, wherein the deposition temperature is 280 ℃, and the deposition thickness of the film layer is 20nm;
4) After the deposition of the protective film layer was completed, air was released to obtain MCP sample 2.
And 3, packaging the MCP sample 2 into an MCP assembly, and performing detection efficiency and moisture resistance tests.
By comparing the test results of example 1, example 2 and the unplated ultra-thin waterproof protective film layer as follows
* The moist air condition is that the temperature is 22-25 ℃ and the relative humidity is 60 percent.
* SEM pictures of the morphology change of the crystal grains are shown in figure 3.
According to the detection result of the embodiment, the thickness of the ultrathin waterproof protective film layer is thicker, so that the detection efficiency of X-rays is more and more obviously influenced, the thicker the ultrathin waterproof protective film layer is, the more stable the storage in the air is, and the more stable the detection efficiency is along with the extension of the storage time, therefore, in the embodiment of the invention, the thickness of the ultrathin waterproof protective film layer is selected to be 0.5-20nm, the detection efficiency of X-rays and ultraviolet is basically not influenced, the cathode film layer which is easily influenced by humid air is ensured to have good stability, the ultrathin waterproof protective film layer can be widely applied to an open structure detector and related equipment, the change of multiple times of vacuum and atmospheric environment is not obvious, and the application range of materials such as halides which are easily influenced by humid air as MCP input surface reflective photocathodes is greatly expanded.
While the invention has been described with reference to preferred embodiments, it is not intended to be limiting. Those skilled in the art will appreciate that various modifications and adaptations can be made without departing from the spirit and scope of the present invention. Accordingly, the scope of the invention is defined by the appended claims.
Claims (12)
1. The utility model provides a high stability, high detection efficiency ultraviolet light and microchannel board for X ray detection which characterized in that includes:
An array type electron multiplier formed by arranging millions of mutually parallel channel type electron multiplication units, wherein each electron multiplication unit forms a micro-channel structure;
Forming a reflective photocathode on the surface of the input surface and the inner wall of the channel of the electron multiplier unit, wherein the reflective photocathode is made of a material with high responsivity to ultraviolet light and X-rays, and
The thickness of the ultra-thin waterproof protective layer is controlled to be 0.5-20 nm;
The reflective photocathode covers the whole input surface and the preset depth of the inner wall of the channel, the covered depth range is controlled to be 3-20D, D is the aperture of each electron multiplication unit of the MCP, the coating depth is more than or equal to 1/tan (theta), and theta is the chamfer angle of the electron multiplication unit.
2. The high-stability high-detection-efficiency ultraviolet light and X-ray detection microchannel plate as claimed in claim 1, wherein the reflective photocathode comprises a single film layer prepared from one of cesium iodide, copper iodide, potassium bromide and potassium chloride.
3. The high-stability high-detection-efficiency ultraviolet light and X-ray detection microchannel plate as claimed in claim 1, wherein the reflective photocathode comprises a first composite film layer prepared from at least two of cesium iodide, copper iodide, potassium bromide and potassium chloride.
4. The high-stability high-detection-efficiency ultraviolet light and X-ray detection microchannel plate as defined in claim 2 or 3, wherein the ultra-thin waterproof protective layer comprises a film layer prepared from one of silicon oxide, hafnium oxide, aluminum oxide, titanium oxide and silicon nitride.
5. The high-stability high-detection-efficiency ultraviolet light and X-ray detection microchannel plate as defined in claim 2 or 3, wherein the ultra-thin waterproof protective layer comprises a second composite film layer prepared from at least two of silicon oxide, hafnium oxide, aluminum oxide, titanium oxide, and silicon nitride.
6. The high-stability high-detection-efficiency ultraviolet light and X-ray detection microchannel plate according to claim 1, wherein the ultra-thin waterproof protective layer covers the entire input surface and the entire inner wall of the channel.
7. The microchannel plate for high stability and high detection efficiency ultraviolet light and X-ray detection according to claim 1, wherein the thickness of the reflective photocathode is controlled to be 100 nm-2000 nm.
8. The preparation method of the microchannel plate for ultraviolet light and X-ray detection with high stability and high detection efficiency is characterized by comprising the following steps:
Preparing a film layer as a reflective photocathode on the surface of an input surface and the inner wall of a channel of an electron multiplication unit of an array type electron multiplier formed by arranging millions of channel type electron multiplication units which are parallel to each other by utilizing a material with a photoelectric conversion function, wherein the reflective photocathode is made of a material with high responsivity to ultraviolet light and X rays;
Preparing a compact ultrathin waterproof protective layer with uniform thickness on the surface of the reflective photocathode, wherein the total thickness of a film layer of the ultrathin waterproof protective layer is controlled to be 0.5-20 nm;
The reflective photocathode coverage surface is the whole input surface and the preset depth of the inner wall of the channel, the coverage depth range is controlled to be 3-20D, D is the aperture of each electron multiplication unit of the MCP, the coating depth is more than or equal to 1/tan (theta), and theta is the chamfer angle of the electron multiplication unit.
9. The method for preparing the microchannel plate for high-stability and high-detection-efficiency ultraviolet light and X-ray detection according to claim 8, wherein the reflective photocathode comprises a single film layer or a composite film layer prepared from at least one of cesium iodide, copper iodide, potassium bromide and potassium chloride.
10. The method for preparing the microchannel plate for high-stability and high-detection efficiency ultraviolet light and X-ray detection according to claim 8, wherein the ultra-thin waterproof protective layer comprises a single film layer or a composite film layer prepared from at least one of silicon oxide, hafnium oxide, aluminum oxide, titanium oxide and silicon nitride.
11. The method for manufacturing a microchannel plate for high stability and high detection efficiency ultraviolet light and X-ray detection according to claim 8, wherein the ultra-thin waterproof layer covers the entire input surface and the entire inner wall of the channel.
12. The method for preparing the microchannel plate for high-stability and high-detection-efficiency ultraviolet light and X-ray detection according to claim 9, wherein the thickness of the reflective photocathode is controlled to be 100-2000 nm.
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| WO2010017136A1 (en) * | 2008-08-04 | 2010-02-11 | Amir Dassoud Dabiran | Microchannel plate photocathode |
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