CN115256062B - A photorheological-photochemical-cavitation synergistic polishing system - Google Patents

Abstract

The invention discloses a polishing system with optical flow change-photochemistry-cavitation synergistic effect, which comprises a mechanical arm, an integrated polishing tool, a mixed solution, a processing pool module, a viscosity reduction module, a solution circulation pipeline, a material supplementing device, a water pump and a control system. The integrated polishing tool controls the annular gel driving array according to the surface shape of the processed workpiece, and adjusts the surface shape change of the flexible curved surface; the surface of the flexible curved surface is provided with an annular boss structure, and the shearing force on the fluid is increased when the polishing head rotates; an annular ultraviolet lamp module is arranged in the integrated polishing tool, and the irradiation angle of the annular ultraviolet lamp module can be adjusted when facing a complex curved surface; in the polishing process, the fluid is irradiated by ultraviolet light to cause an optical rheological effect, so that the viscosity of the fluid is improved, and simultaneously, photochemical reaction is caused to weaken the surface layer of a processed workpiece; under the excitation of the ultrasonic vibrator, the polishing head generates cavitation effect; under the action of three fields of photo-rheological, photochemical and cavitation, the polishing effect on a processed workpiece is enhanced.

Description

A photorheological-photochemical-cavitation synergistic polishing system

Technical Field

The invention relates to the field of free-form surface parts polishing, and in particular to a photorheological-photochemical-cavitation synergistic polishing system.

Background Art

Precision molds are key process equipment for processing and manufacturing. With the further development of manufacturing technology, the structures of key components used in aerospace, medical equipment, information technology and other fields tend to be complex, and the complexity of precision molds is also increasing. During use, the mold may need to withstand high-intensity alternating stress, high impact force and rapid cooling and heating working environment, so the mold is usually cast with high hardness and high wear resistance materials. Precision molds require high surface roughness during use, and there must be no sub-surface damage and processing metamorphic layers. The fluid polishing method uses an extremely flexible fluid as the abrasive driving medium, which can better avoid damage to the workpiece due to the hard pressing of the abrasive. At the same time, due to the uncertainty of the fluid morphology, it can form contour polishing on complex curved surfaces.

By adding photosensitive groups and photochemical substances to the fluid, the fluid can cause photorheological effect under the irradiation of ultraviolet light, increase the viscosity of the fluid, and enhance the shearing effect on the surface of the fluid workpiece; at the same time, it also triggers a photochemical reaction to weaken the surface of the workpiece; by introducing the cavitation effect into the flow field, the impact effect of the fluid on the workpiece surface is enhanced, and with the assistance of the cavitation effect, the photochemical reaction speed is increased. Under the combined action of photorheology, photochemistry, and cavitation effects, the polishing effect on the workpiece surface is greatly improved.

Patent CN201810188063.2 discloses a polishing method and device based on photorheological materials. The method utilizes the reversible viscosity of photorheological materials, that is, the workpiece 8 rotates in the photorheological polishing body 4, so that the abrasive particles in the photorheological polishing body 4 continuously grind the workpiece 8, thereby achieving a polishing effect. The workpiece 8 is installed on the annular gland embedded light source 6. The photorheological polishing body 4 is irradiated by the annular gland embedded light source 6, and the viscosity of the photorheological polishing body 4 increases, thereby enhancing the shearing effect of the photorheological polishing body 4 on the workpiece 8. Although this method has a certain processing efficiency, the processing efficiency is limited, and the workpiece 8 cannot be polished in a local area during the polishing process, and is not suitable for polishing more complex structures.

Summary of the invention

The purpose of the present invention is to solve the problem that the existing polishing method has low polishing efficiency for free-form surfaces and is prone to sub-surface damage, and proposes a photorheological-photochemical-cavitation synergistic polishing system.

The present invention achieves the above-mentioned purpose through the following technical scheme: a photorheological-photochemical-cavitation synergistic polishing system, comprising a mechanical arm, an integrated polishing tool, a mixed solution, a processing tank module, a viscosity reduction module, a solution circulation pipeline, a feeding device, a water pump, and a control system; the mechanical arm is connected to the integrated polishing tool and controls the position of the integrated polishing tool so that a micro distance is formed between the integrated polishing tool and the workpiece processed by the processing tank module; the mixed solution is located in the processing tank module, the viscosity reduction module and the pipeline system; the viscosity reduction module is connected to the processing tank module, and the viscosity reduction module is connected to the processing tank module. The solution recovery pipeline of the processing pool module is connected; the feeding device is connected to the feeding pipeline of the viscosity reduction module; the water pump is provided with an inlet and an outlet, the inlet of the water pump is connected to the solution output pipeline of the viscosity reduction module, and the outlet of the water pump is connected to the solution circulation pipeline inlet of the processing pool module through the solution circulation pipeline; the control system is electrically connected to the robotic arm, the integrated polishing tool, the processing pool module, the viscosity reduction module, the feeding device, and the water pump to control the operation of the robotic arm, the integrated polishing tool, the processing pool module, the viscosity reduction module, the feeding device, and the water pump.

The integrated polishing tool includes a polishing head, an annular ultraviolet lamp module, a support plate platform No. 1, a polishing tool ring, a conductive slip ring, a support plate platform No. 2, a rotating shaft, a servo motor, a support plate base, a seismic isolation pad, and an ultrasonic vibrator; the annular gel array base of the polishing head is located on the boss of the polishing tool ring; the annular ultraviolet lamp module is connected to the support plate platform No. 1; the stator of the conductive slip ring is connected to the support plate platform No. 2; the rotating shaft is connected to the rotor of the conductive slip ring, and one end is connected to the servo motor, and the other end is connected to the annular gel array base of the polishing head, and the rotation of the rotating shaft drives the rotation of the polishing head; the servo motor is connected to the seismic isolation pad; the support plate base is connected to the seismic isolation pad; the seismic isolation pad is fixed to the base of the polishing tool ring; the ultrasonic vibrator is connected to the polishing tool ring.

The processing pool module includes a processing workpiece, a workpiece mounting platform, a processing pool, a solution circulation pipeline inlet, a fixed bracket, a solution recovery pipeline, a No. 1 filter disc, a solenoid valve, and a servo valve; the mixed solution contains photochemical reaction substances, photosensitive groups and abrasive particles, wherein the photochemical reaction substances can weaken the surface layer of the processing workpiece under the irradiation of ultraviolet light, and the viscosity of the photosensitive groups increases under the irradiation of ultraviolet light and decreases under the irradiation of visible light; the processing workpiece is mounted on the workpiece mounting platform; the workpiece mounting platform is mounted on the fixed bracket; the fixed bracket is mounted in the processing pool; the solenoid valve and the servo valve are both electrically connected to the control system.

The viscosity reduction module includes a solution recovery pipeline inlet, a viscosity reduction tank, a motor, an agitator, a feed pipeline, a concentration detection device, a solution output pipeline, and a second filter plate; the interior of the viscosity reduction tank is filled with visible light sources for reducing the viscosity of the mixed solution; the motor is installed on the top of the viscosity reduction tank; the agitator is connected to the motor; and the concentration detection device is installed on the right side of the viscosity reduction tank.

The polishing head includes a viscosity detection device, a flexible curved surface, a support ring array, an annular gel drive array, an annular reflector array, and an annular gel array base; the viscosity detection device is installed on the middle ring of the annular gel drive array and passes through the flexible curved surface, and is used to detect the viscosity of the fluid near the wall; the support ring array is connected to the annular gel drive array; the flexible curved surface is connected to the support ring array and is connected to the annular gel array base through a clamp; the annular reflector array is installed on the inner wall surface of the annular gel array base; the annular gel drive array is installed in the groove of the annular gel array base. After power is turned on, the expansion and contraction amount of the annular gel drive array is regulated by the voltage, driving the support ring array to move up and down, thereby causing the surface shape of the flexible curved surface to change.

The annular ultraviolet lamp module includes an ultraviolet lamp board and four small gel drivers; the ultraviolet lamp board is installed on the four small gel drivers, and the inclination of the ultraviolet lamp board is achieved by controlling the four small gel drivers, so as to achieve the purpose of adjustable irradiation angle of the ultraviolet lamp board; the ultraviolet lamp board divides the surface of the ultraviolet lamp board into four areas by radial vertical division, and the switch status of the ultraviolet lamps in the four areas can be controlled separately by the control system to avoid the influence of ultraviolet light on areas outside the polishing area during the polishing process.

Furthermore, the micro distance formed between the integrated polishing tool and the processed workpiece is 1 mm to 2.5 mm.

Furthermore, the flexible curved surface is made of a light-transmitting material, and has an annular boss structure on its surface, which can enhance the shearing effect on the fluid when the polishing head rotates at a high speed; the periphery of the annular gel array base of the polishing head is made of an opaque material, while the interior is made of a light-transmitting material; the support ring arrays are all made of light-transmitting materials;

Furthermore, the annular reflector array forms an angle of 10 degrees with the inner wall of the annular gel array base. Compared with a design without an angle, the reflection angle can be increased by 20 degrees when the incident angle is constant. At the same time, multiple reflectors are stacked in the axial direction to reduce the occupancy of the light channel.

Furthermore, the photosensitive group of the mixed solution is prepared by combining azobenzenecarboxylic acid and methylammonium chloride, and the viscosity of the group shows an increasing trend under 300nm-400nm ultraviolet light irradiation, and a decreasing trend under 400nm-450nm visible light irradiation.

Furthermore, the angle adjustment range of the ultraviolet lamp panel is 0 degrees to 5 degrees.

The beneficial effects of the present invention are:

1) The present invention uses a method combining photorheology, photochemistry and ultrasonic cavitation to polish the workpiece; the viscosity of the fluid near the wall is increased in the form of photorheology, thereby enhancing the shearing effect of the fluid on the wall; through the combination of photochemistry and ultrasonic cavitation, the surface layer of the workpiece is weakened, thereby further improving the polishing efficiency.

2) The polishing head of the present invention adopts an annular array, and realizes the contour change of the flexible curved surface through the gel driving module; the surface of the flexible curved surface is provided with an annular boss structure to increase the shear force on the fluid when the polishing head rotates;

3) The present invention is designed to install a ring-shaped ultraviolet lamp module inside the integrated polishing tool. During the polishing process, the mixed solution simultaneously triggers a photorheological effect and a photochemical reaction under the irradiation of ultraviolet light, realizing a scenario of one lamp for multiple uses.

4) The present invention installs a small gel driving device under the ultraviolet lamp board to achieve adjustable irradiation angle of the ultraviolet lamp. In combination with the annular reflector array provided on the inner wall of the annular gel array base, the ultraviolet irradiation angle can be adjusted to a greater extent, ensuring that the illumination angle is adjustable during the polishing process of complex curved surfaces.

5) The ultraviolet light panel of the present invention adopts a ring array, and each ring is separated by a certain distance, so that the light source passes through the base of the ring gel array base without affecting the ring gel drive array.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic diagram of the overall structure of a photorheological-photochemical-cavitation synergistic polishing system of the present invention.

FIG. 2 is a cross-sectional view of the integrated polishing tool of the present invention

FIG. 3 is a schematic diagram of the structure of the processing pool module of the present invention

FIG. 4 is a schematic diagram of the structure of the viscosity reduction module of the present invention.

FIG5 is a cross-sectional view of the polishing head of the present invention

FIG. 6 is an axial view of the flexible curved surface of the present invention.

FIG. 7 is a cross-sectional view of the annular reflector array of the present invention

FIG8 is a schematic diagram of the structure of the annular ultraviolet lamp module of the present invention

FIG. 9 is a schematic diagram of the structure of the ultraviolet light irradiation angle adjustment of the present invention.

FIG. 10 is a schematic structural diagram of the polishing head surface shape adjustment of the present invention.

In the figure, 01-robot arm, 02-integrated polishing tool, 03-mixed solution, 04-processing pool module, 05-viscosity reduction module, 06-solution circulation pipeline, 07-feeding device, 08-water pump, 09-control system, 0201-polishing head, 0202-annular ultraviolet lamp module, 0203-support plate No. 1 platform, 0204-polishing tool collar, 0205-conductive slip ring, 0206-support plate No. 2 platform, 0207-rotating shaft, 0208-servo motor, 0209-support plate base, 0210-seismic isolation pad, 0211-ultrasonic vibrator, 0401-processing workpiece, 0402-workpiece mounting platform, 0403-processing pool, 0404-solution circulation pipeline inlet, 0405 -Fixed bracket, 0406-solution recovery pipeline, 0407-filter disc No. 1, 0408-solenoid valve, 0409-servo valve, 0501-solution recovery pipeline inlet, 0502-viscosity reduction tank, 0503-motor, 0504-agitator, 0505-feeding pipeline, 0506-concentration detection device, 0507-solution output pipeline, 0508-filter disc No. 2, 020101-viscosity detection device, 020102-flexible surface, 020103-support ring array, 020104-annular gel drive array, 020105-annular reflector array, 020106-annular gel array base, 020201-UV lamp board, 020202-small gel driver.

DETAILED DESCRIPTION

The present invention is further described below in conjunction with the accompanying drawings:

As shown in FIGS. 1 to 10 , a photorheological-photochemical-cavitation synergistic polishing system includes a robot arm 01, an integrated polishing tool 02, a mixed solution 03, a processing tank module 04, a viscosity reduction module 05, a solution circulation pipeline 06, a feeding device 07, a water pump 08, and a control system 09; the robot arm 01 is connected to the integrated polishing tool 02, and controls the position of the integrated polishing tool 02 so that a micro distance is formed between the integrated polishing tool 02 and a processing workpiece 0401 of the processing tank module 04; the mixed solution 03 is located in the processing tank module 04, the viscosity reduction module 05, and the pipeline system; the viscosity reduction module 05 and the solution recovery pipeline 0406 of the processing tank module 04 are connected. connected; the feeding device 07 is connected to the feeding pipeline 0505 of the viscosity reduction module 05; the water pump 08 is provided with an inlet and an outlet, the inlet of the water pump 08 is connected to the solution output pipeline 0507 of the viscosity reduction module 05, and the outlet of the water pump 08 is connected to the solution circulation pipeline inlet 0404 of the processing tank module 04 through the solution circulation pipeline 06; the control system 09 is electrically connected to the robot arm 01, the integrated polishing tool 02, the processing tank module 04, the viscosity reduction module 05, the feeding device 07, and the water pump 08 and controls the operation of the robot arm 01, the integrated polishing tool 02, the processing tank module 04, the viscosity reduction module 05, the feeding device 07, and the water pump 08.

As shown in FIG2 , the integrated polishing tool 02 includes a polishing head 0201, an annular ultraviolet lamp module 0202, a support plate platform No. 1 0203, a polishing tool collar 0204, a conductive slip ring 0205, a support plate platform No. 2 0206, a rotating shaft 0207, a servo motor 0208, a support plate base 0209, an isolation pad 0210, and an ultrasonic vibrator 0211; the annular gel array base 020106 of the polishing head 0201 is located on the boss of the polishing tool collar 0204; the annular ultraviolet lamp module 0202 is connected to the support plate platform No. 1 0203; the stator of the conductive slip ring 0205 is connected to the The support plate is connected to the second platform 0206; the rotating shaft 0207 is connected to the rotor of the conductive slip ring 0205, and one end is connected to the servo motor 0208, and the other end is connected to the annular gel array base 020106 of the polishing head 0201, and the rotation of the rotating shaft 0207 drives the rotation of the polishing head 0201; the servo motor 0208 is connected to the seismic isolation pad 0210; the support plate base 0209 is connected to the seismic isolation pad 0210; the seismic isolation pad 0210 is fixed on the base of the polishing tool ring 0204; the ultrasonic vibrator 0211 is connected to the polishing tool ring 0204.

As shown in Figure 3, the processing pool module 04 includes a processing workpiece 0401, a workpiece mounting platform 0402, a processing pool 0403, a solution circulation pipeline inlet 0404, a fixed bracket 0405, a solution recovery pipeline 0406, a No. 1 filter disc 0407, a solenoid valve 0408, and a servo valve 0409; the mixed solution 03 contains photochemical reaction substances, photosensitive groups and abrasive particles, wherein the photochemical reaction substances can weaken the surface layer of the processing workpiece 0401 under the irradiation of ultraviolet light, and the viscosity of the photosensitive groups increases under the irradiation of ultraviolet light and decreases under the irradiation of visible light; the processing workpiece 0401 is installed on the workpiece mounting platform 0402; the workpiece mounting platform 0402 is installed on the fixed bracket 0405; the fixed bracket 0405 is installed in the processing pool 0403; the solenoid valve 0408 and the servo valve 0409 are both electrically connected to the control system 09.

As shown in Figure 4, the viscosity reduction module 05 includes a solution recovery pipeline inlet 0501, a viscosity reduction tank 0502, a motor 0503, an agitator 0504, a feed pipeline 0505, a concentration detection device 0506, a solution output pipeline 0507, and a second filter disc 0508; the interior of the viscosity reduction tank 0502 is filled with visible light sources for reducing the viscosity of the mixed solution 03; the motor 0503 is installed on the top of the viscosity reduction tank 0502; the agitator 0504 is connected to the motor 0503; the concentration detection device 0506 is installed on the right side of the viscosity reduction tank 0502.

As shown in FIGS. 5 to 7, the polishing head 0201 includes a viscosity detection device 020101, a flexible curved surface 020102, a support ring array 020103, an annular gel drive array 020104, an annular reflector array 020105, and an annular gel array base 020106; the viscosity detection device 020101 is installed on the middle ring of the annular gel drive array 020104 and passes through the flexible curved surface 020102, and is used to detect the viscosity of the fluid near the wall; the support ring array 020103 is connected to the annular gel drive array 020104; the flexible curved surface 020102 Surface 020102 is connected to the support ring array 020103, and is connected to the annular gel array base 020106 through a clamp; the annular reflector array 020105 is installed on the inner wall surface of the annular gel array base 020106; the annular gel drive array 020104 is installed in the groove of the annular gel array base 020106. After power is turned on, the expansion and contraction amount of the annular gel drive array 020104 is regulated by the voltage, driving the support ring array 020103 to move up and down, thereby causing the surface shape of the flexible curved surface 020102 to change.

As shown in Figure 8, the annular ultraviolet lamp module 0202 includes an ultraviolet lamp board 020201 and four small gel drivers 020202; the ultraviolet lamp board 020201 is installed on the four small gel drivers 020202, and the inclination of the ultraviolet lamp board 020201 is achieved by controlling the four small gel drivers 020202, so as to achieve the purpose of adjusting the irradiation angle of the ultraviolet lamp board 020201; the ultraviolet lamp board 020201 divides the surface of the ultraviolet lamp board 020201 into four areas by radial vertical division, and the switch status of the ultraviolet lamps in the four areas can be independently controlled by the control system 09 to avoid the influence of ultraviolet light on areas outside the polishing area during the polishing process.

As the optimal choice of the present invention, the micro distance formed between the integrated polishing tool 02 and the processed workpiece 0401 is 1 mm to 2.5 mm.

In the present invention, the flexible curved surface 020102 is made of a light-transmitting material, and has an annular boss structure on its surface, which can enhance the shearing effect on the fluid when the polishing head 0201 rotates at a high speed; the outer periphery of the annular gel array base 020106 of the polishing head 0201 is made of an opaque material, while the inner part is made of a light-transmitting material; the support ring array 020103 is made of a light-transmitting material;

In the present invention, the annular reflector array 020105 and the inner wall of the annular gel array base 020106 form an angle of 10 degrees. Compared with a design without an angle, the reflection angle can be increased by 20 degrees when the incident angle is constant. At the same time, multiple reflectors are stacked in the axial direction to reduce the occupancy of the light channel.

In the present invention, the photosensitive group of the mixed solution 03 is prepared by combining azobenzenecarboxylic acid and methylammonium chloride. The viscosity of the group increases under 300nm-400nm ultraviolet light irradiation, and decreases under 400nm-450nm visible light irradiation.

In the present invention, the angle adjustment range of the ultraviolet lamp board 020201 is 0 degrees to 5 degrees.

9 and 10, the polishing process of the present invention is as follows: the polishing process is divided into three stages. In the first stage of polishing, the prepared mixed solution is first introduced into the processing pool so that it covers the workpiece; the robot arm is controlled to move the integrated polishing tool to the macro position above the workpiece, and the expansion and contraction amount of the annular gel drive array is adjusted according to the surface shape of the workpiece, so that the surface shape of the flexible curved surface is similar to the surface shape of the workpiece, and the rotation of the polishing head drives the rotation of the fluid between the polishing head and the workpiece, and the abrasive particles in the rotating fluid continuously grind the surface of the workpiece, thereby achieving a polishing effect; the annular ultraviolet lamp module on the integrated polishing tool is turned on, and the irradiation angle of the ultraviolet lamp is adjusted to focus on the polishing area. At this time, the fluid in the macro distance causes a photorheological effect after being irradiated with ultraviolet light, which increases the viscosity of the fluid and also causes a photochemical reaction to weaken the surface of the workpiece; at the same time, the ultrasonic vibrator is turned on, and the integrated ultraviolet lamp module is turned on. The Chenghua polishing tool produces cavitation effect under the action of ultrasonic vibrator, and under the auxiliary action of cavitation effect, it can increase the photochemical reaction speed and enhance the impact effect of fluid on the surface of the workpiece; the polishing efficiency is greatly improved by the polishing method of photorheology, photochemistry and cavitation effect; after waiting for the first stage of polishing to be completed, turn on the water pump, and under the suction of the water pump, the mixed solution in the viscosity reduction pool is ejected from the inlet of the solution circulation pipeline on the processing pool through the solution circulation pipeline; at the same time, the mixed solution in the processing pool is recovered by controlling the solenoid valve and servo valve on the solution recovery pipeline, the purpose is to reduce the viscosity and filter the high viscosity liquid and debris generated during the polishing process, and the recovered mixed solution will enter the viscosity reduction pool for degradation; the concentration detection device in the viscosity reduction pool will detect the concentration of the solution in the pool in real time, and control the feeding device to feed the viscosity reduction pool according to the concentration detection result. After waiting for the solution circulation to be completed, turn off the water pump, solenoid valve and servo valve to make the mixed solution in the processing pool static, and then control the robot arm to move the integrated polishing tool back to the surface of the workpiece for the next stage of polishing. And so on, until the three-stage polishing process is completed.

The above embodiments are only preferred embodiments of the present invention and are not limitations of the technical solutions of the present invention. Any technical solution that can be implemented on the basis of the above embodiments without creative work should be deemed to fall within the scope of protection of the patent of the present invention.

Claims (6)

1. An optical rheological-photochemical-cavitation synergistic polishing system, characterized by: the polishing device comprises a mechanical arm (01), an integrated polishing tool (02), a mixed solution (03), a processing pool module (04), a viscosity reduction module (05), a solution circulation pipeline (06), a material supplementing device (07), a water pump (08) and a control system (09); the mechanical arm (01) is connected with the integrated polishing tool (02) and controls the position of the integrated polishing tool (02) to form a micro-distance with a processing workpiece (0401) of the processing pool module (04); the mixed solution (03) is positioned in the processing pool module (04), the viscosity reduction module (05) and the pipeline system; the viscosity reduction module (05) is connected with a solution recovery pipeline (0406) of the processing pool module (04); the material supplementing device (07) is connected with a material supplementing pipeline (0505) of the viscosity reducing module (05); the water pump (08) is provided with an inlet and an outlet, the inlet of the water pump (08) is connected with the solution output pipeline (0507) of the viscosity reduction module (05), and the outlet of the water pump (08) is connected with the solution circulation pipeline inlet (0404) of the processing pool module (04) through the solution circulation pipeline (06); the control system (09) is electrically connected with the mechanical arm (01), the integrated polishing tool (02), the processing pool module (04), the viscosity reduction module (05), the feeding device (07) and the water pump (08) and controls the mechanical arm (01), the integrated polishing tool (02), the processing pool module (04), the viscosity reduction module (05), the feeding device (07) and the water pump (08) to work;

The integrated polishing tool (02) comprises a polishing head (0201), an annular ultraviolet light lamp module (0202), a first supporting plate platform (0203), a polishing tool lantern ring (0204), a conductive slip ring (0205), a second supporting plate platform (0206), a rotating shaft (0207), a servo motor (0208), a supporting plate base (0209), a shock insulation pad (0210) and an ultrasonic vibrator (0211); an annular gel array base (020106) of the polishing head (0201) is located on a boss of the polishing tool collar (0204); the annular ultraviolet lamp module (0202) is connected with the first supporting plate platform (0203); the stator of the conductive slip ring (0205) is connected with the second supporting plate platform (0206); the rotating shaft (0207) is connected with the rotor of the conductive slip ring (0205), one end of the rotating shaft is connected with the servo motor (0208), the other end of the rotating shaft is connected with the annular gel array base (020106) of the polishing head (0201), and the rotation of the rotating shaft (0207) drives the polishing head (0201) to rotate; the servo motor (0208) is connected with the shock insulation pad (0210); the support plate base (0209) is connected with the shock insulation pad (0210); the shock insulation pad (0210) is fixed on the base of the polishing tool collar (0204); the ultrasonic vibrator (0211) is connected with the polishing tool collar (0204);

The processing pool module (04) comprises a processing workpiece (0401), a workpiece mounting platform (0402), a processing pool (0403), a solution circulation pipeline inlet (0404), a fixed bracket (0405), a solution recovery pipeline (0406), a first filter disc (0407), an electromagnetic valve (0408) and a servo valve (0409); the mixed solution (03) contains photochemical reaction substances, photosensitive groups and abrasive particles, wherein the photochemical reaction substances can weaken the surface layer of the processing workpiece (0401) under the irradiation of ultraviolet light, the photosensitive groups have high viscosity under the irradiation of the ultraviolet light, and the photosensitive groups have low viscosity under the irradiation of visible light; the processing workpiece (0401) is arranged on the workpiece mounting platform (0402); the workpiece mounting platform (0402) is mounted on the fixed bracket (0405); the fixed support (0405) is arranged in the processing pool (0403); the electromagnetic valve (0408) and the servo valve (0409) are electrically connected with the control system (09);

the viscosity reduction module (05) comprises a solution recovery pipeline inlet (0501), a viscosity reduction tank (0502), a motor (0503), a stirrer (0504), a material supplementing pipeline (0505), a concentration detection device (0506), a solution output pipeline (0507) and a second filter disc (0508); a visible light source is distributed in the viscosity reduction tank (0502) and used for reducing viscosity of the mixed solution (03); the motor (0503) is arranged at the top of the viscosity reduction tank (0502); the stirrer (0504) is connected with the motor (0503); the concentration detection device (0506) is arranged on the right side of the viscosity reduction tank (0502);

The polishing head (0201) comprises a viscosity detection device (020101), a flexible curved surface (020102), a support ring array (020103), an annular gel driving array (020104), an annular reflector array (020105) and an annular gel array base (020106); the viscosity detection device (020101) is arranged on the middle ring of the annular gel driving array (020104) and penetrates out of the flexible curved surface (020102) to detect the viscosity of fluid near the wall surface; the support ring array (020103) is connected with the annular gel driving array (020104); the flexible curved surface (020102) is connected with the support ring array (020103) and is connected with the annular gel array base (020106) through a clamp; the annular reflector array (020105) is arranged on the inner wall surface of the annular gel array base (020106); the annular gel driving array (020104) is arranged in a groove of the annular gel array base (020106), and after the annular gel driving array (020104) is electrified, the stretching amount of the annular gel driving array (020104) is regulated and controlled through the voltage, and the supporting ring array (020103) is driven to move up and down, so that the surface shape of the flexible curved surface (020102) is caused to change;

The annular ultraviolet lamp module (0202) comprises an ultraviolet lamp plate (020201) and four small gel drivers (020202); the ultraviolet light lamp panel (020201) is arranged on the four small gel drivers (020202), and the inclination of the ultraviolet light lamp panel (020201) is realized by controlling the four small gel drivers (020202), so that the aim of adjusting the irradiation angle of the ultraviolet light lamp panel (020201) is fulfilled; the ultraviolet light lamp panel (020201) is equally divided into four areas on the surface of the ultraviolet light lamp panel (020201) through radial vertical segmentation, and the ultraviolet light lamp on-off state of the four areas can be independently controlled through the control system (09), so that the ultraviolet light is prevented from affecting areas outside a polishing area in the polishing process.

2. An optical flow-photochemical-cavitation synergistic polishing system in accordance with claim 1, wherein: the micro-distance formed between the integrated polishing tool (02) and the processing workpiece (0401) is 1 mm-2.5 mm.

3. An optical flow-photochemical-cavitation synergistic polishing system in accordance with claim 1, wherein: the photosensitive group of the mixed solution (03) is prepared by combining azobenzene carboxylic acid and methyl ammonium chloride, and the viscosity of the group is in an ascending trend under the irradiation of ultraviolet light of 300-400 nm, and the viscosity of the group is in a descending trend under the irradiation of visible light of 400-450 nm.

4. An optical flow-photochemical-cavitation synergistic polishing system in accordance with claim 1, wherein: the flexible curved surface (020102) is made of a light-transmitting material, the surface of the flexible curved surface is provided with an annular boss structure, and when the polishing head (0201) rotates at a high speed, the shearing effect on fluid can be enhanced; the periphery of the annular gel array base (020106) of the polishing head (0201) is made of a light-tight material, and the inside of the annular gel array base is made of a light-tight material; the support ring arrays (020103) are made of light-transmitting materials.

5. An optical flow-photochemical-cavitation synergistic polishing system in accordance with claim 1, wherein: the annular reflector array (020105) and the inner wall of the annular gel array base (020106) form an included angle of 10 degrees, and compared with the design without the included angle, the reflection angle of 20 degrees can be increased under the condition of a certain incidence angle; meanwhile, a plurality of reflectors are stacked in the axial direction, so that occupation of a light channel can be reduced.

6. An optical flow-photochemical-cavitation synergistic polishing system in accordance with claim 1, wherein: the angle adjusting range of the ultraviolet light lamp panel (020201) is 0-5 degrees.