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CN115421356B - An improved exposure system for Micro-LED chip preparation - Google Patents

An improved exposure system for Micro-LED chip preparation Download PDF

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Publication number
CN115421356B
CN115421356B CN202211031716.9A CN202211031716A CN115421356B CN 115421356 B CN115421356 B CN 115421356B CN 202211031716 A CN202211031716 A CN 202211031716A CN 115421356 B CN115421356 B CN 115421356B
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fixedly connected
box
exposure
cavity
sliding
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CN115421356A (en
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唐素敏
王勇文
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Xingyuan Electronic Technology Shenzhen Co Ltd
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Xingyuan Electronic Technology Shenzhen Co Ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2041Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Studio Devices (AREA)

Abstract

本发明涉及芯片制造装置领域,公开了一种改进型Micro‑LED芯片制备用曝光系统,包括暗箱,其内部设置有处理腔、曝光腔、加固腔、收料腔和原料腔;预处理装置,其位于处理腔内,进行预处理;曝光装置,其位于曝光腔内,进行曝光;收料辊,其位于收料腔内;基板,其依次贯穿处理腔、曝光腔、加固腔和收料腔后与收料辊相连接;动力箱,其固定连接在暗箱的一侧,其内部连接有动能机构,所述曝光装置、收料辊均与动能机构相连接,本发明通过区域性的周期性用水,使得整体的水环境较为稳定,保证曝光的质量,减少整体的用水量,降低整体的生产成本减少搬运等过程中,降低破损率,进一步的降低整体的成本。

The present invention relates to the field of chip manufacturing devices, and discloses an improved exposure system for preparing Micro-LED chips, comprising a dark box, which is provided with a processing chamber, an exposure chamber, a reinforcement chamber, a material receiving chamber and a raw material chamber; a pretreatment device, which is located in the processing chamber and performs pretreatment; an exposure device, which is located in the exposure chamber and performs exposure; a material receiving roller, which is located in the material receiving chamber; a substrate, which passes through the processing chamber, the exposure chamber, the reinforcement chamber and the material receiving chamber in sequence and is connected to the material receiving roller; a power box, which is fixedly connected to one side of the dark box and is connected to a kinetic energy mechanism inside the power box, and the exposure device and the material receiving roller are both connected to the kinetic energy mechanism. The present invention uses water periodically in a regional manner to make the overall water environment more stable, ensure the quality of exposure, reduce the overall water consumption, reduce the overall production cost, reduce the breakage rate during transportation, and further reduce the overall cost.

Description

一种改进型Micro-LED芯片制备用曝光系统An improved exposure system for Micro-LED chip preparation

技术领域Technical Field

本发明涉及Micro-LED芯片制造装置领域,尤其涉及一种改进型Micro-LED芯片制备用曝光系统。The present invention relates to the field of Micro-LED chip manufacturing devices, and in particular to an improved exposure system for preparing Micro-LED chips.

背景技术Background technique

Micro -LED显示技术是指以自发光的微米量级的LED为发光像素单元,将其组装到驱动面板上形成高密度LED阵列的显示技术。由于micro- LED芯片尺寸小、集成度高和自发光等特点,其一般安装在较小的芯片上,以使得单位面积的LED足够,以达到必要工作需要,而芯片的生产一般采用光刻,但是较主流的电脑芯片,其工艺并不需要达到纳米级,故在光刻时,要求相对较低,在光刻时,需要利用到纯水,以使得部分成分得以溶解,以达到侵蚀的作用,但是现有的机器一般采用容积池中放入足量的水,然后进行多次的侵蚀作用,但是在此过程中,由于多次侵蚀使得纯水不纯,影响后续生产的进行,同时一次性量大,较为浪费纯水,增加其生产成本。Micro-LED display technology refers to a display technology that uses self-luminous micron-sized LEDs as light-emitting pixel units and assembles them on a driving panel to form a high-density LED array. Due to the small size, high integration, and self-luminescence of micro-LED chips, they are generally installed on smaller chips so that there are enough LEDs per unit area to meet the necessary work needs. The production of chips generally uses photolithography, but the process of more mainstream computer chips does not need to reach the nanometer level, so the requirements for photolithography are relatively low. During photolithography, pure water is needed to dissolve some components to achieve the effect of erosion. However, existing machines generally use a sufficient amount of water in a volume pool and then perform multiple erosions. However, in this process, the pure water is impure due to multiple erosions, which affects the subsequent production. At the same time, the one-time amount is large, which wastes pure water and increases its production cost.

发明内容Summary of the invention

为解决成本一定浪费的的技术问题,本发明提供一种改进型Micro-LED芯片制备用曝光系统。In order to solve the technical problem of certain cost waste, the present invention provides an improved exposure system for preparing Micro-LED chips.

本发明采用以下技术方案实现:一种改进型Micro-LED芯片制备用曝光系统,暗箱,其内部设置有处理腔、曝光腔、加固腔、收料腔和原料腔;预处理装置,其位于处理腔内,进行预处理;曝光装置,其位于曝光腔内,进行曝光;收料辊,其位于收料腔内;基板,其依次贯穿处理腔、曝光腔、加固腔和收料腔后与收料辊相连接,基板采用柔性电路板,配合后期的使用,动力箱,其固定连接在暗箱的一侧,其内部连接有动能机构,所述曝光装置、收料辊均与动能机构相连接。The present invention is implemented by the following technical scheme: an improved exposure system for preparing Micro-LED chips, a dark box, which is provided with a processing chamber, an exposure chamber, a reinforcement chamber, a material receiving chamber and a raw material chamber; a pretreatment device, which is located in the processing chamber for pretreatment; an exposure device, which is located in the exposure chamber for exposure; a material receiving roller, which is located in the material receiving chamber; a substrate, which passes through the processing chamber, the exposure chamber, the reinforcement chamber and the material receiving chamber in sequence and is connected to the material receiving roller, and the substrate adopts a flexible circuit board to cooperate with the later use; a power box, which is fixedly connected to one side of the dark box, and a kinetic energy mechanism is connected to the inside of the power box, and the exposure device and the material receiving roller are both connected to the kinetic energy mechanism.

作为上述方案的进一步改进,所述预处理装置包括:更换辊,其转动连接在暗箱的一侧,所述基板缠绕在更换辊的外侧;防护箱,其倾斜固定在暗箱的一侧,其内部设置有多个处理单元,防护箱内转动连接有多个辊轴,对基板进行限定,同时对光线进行遮挡,形成暗箱,上料辊,其与处理腔的腔壁转动连接,且其一侧设置有加热烘干辊;平整吹料机构,其固定连接在处理腔内,所述处理腔的底部固定连接有吸料机构。As a further improvement of the above scheme, the pretreatment device includes: a replacement roller, which is rotatably connected to one side of the dark box, and the substrate is wrapped around the outside of the replacement roller; a protective box, which is tilted and fixed on one side of the dark box, and multiple processing units are arranged inside it. Multiple rollers are rotatably connected in the protective box to limit the substrate and block the light to form a dark box, a loading roller, which is rotatably connected to the wall of the processing chamber, and a heating and drying roller is arranged on one side of it; a leveling blowing mechanism, which is fixedly connected in the processing chamber, and a suction mechanism is fixedly connected to the bottom of the processing chamber.

作为上述方案的进一步改进,所述上料辊的一端贯穿暗箱到达动力箱内,所述动力箱内设置有与上料辊相连接的原料箱,所述平整吹料机构的底部固定连接有多个刮涂刀,所述平整吹料机构和吸料机构的一侧均连接有位于动力箱内的吸气泵,所述吸气泵的输出端连接有过滤机构,原料箱中设置有泵,给予上料辊以原料的支撑,同时原料箱内装有特定的保护剂,进行保护,刮涂刀的两侧均设置有位于平整吸料机构上的吸气孔,保证吸气的作用,吸气泵为现有结构,实现气体的流动。As a further improvement of the above scheme, one end of the feeding roller passes through the dark box to reach the power box, and a raw material box connected to the feeding roller is arranged in the power box. A plurality of scrapers are fixedly connected to the bottom of the leveling blowing mechanism, and one side of the leveling blowing mechanism and the suction mechanism are connected to an air suction pump located in the power box. The output end of the air suction pump is connected to a filtering mechanism. A pump is arranged in the raw material box to provide support for the raw material to the feeding roller. At the same time, a specific protective agent is loaded in the raw material box for protection. Suction holes located on the leveling suction mechanism are arranged on both sides of the scraper to ensure the suction effect. The air suction pump is an existing structure to realize the flow of gas.

作为上述方案的进一步改进,所述曝光装置包括:滑动架,其对称设置有两个,所述暗箱上设置有多个滑槽,所述滑动架的一侧与滑槽滑动套接,所述滑动架的一端与动能机构相连接;压力传感器,其设置有多个,且其固定连接在上方的所述滑动架的底部,所述压力传感器的下侧固定连接有第一缓冲圈,压力传感器为现有装置,同时动力箱内安装有PLC控制器,实现信号的处理和信号的输出,方便人员对内部的控制,移动箱,其与底部的滑动架固定连接,且其与暗箱滑动接触;执行器,其固定连接在移动箱上,其顶端连接有第二缓冲圈;As a further improvement of the above scheme, the exposure device includes: two sliding frames symmetrically arranged, a plurality of slide grooves are arranged on the dark box, one side of the sliding frame is slidably sleeved with the slide groove, and one end of the sliding frame is connected to the kinetic energy mechanism; a plurality of pressure sensors are arranged, and they are fixedly connected to the bottom of the upper sliding frame, and a first buffer ring is fixedly connected to the lower side of the pressure sensor, and the pressure sensor is an existing device. At the same time, a PLC controller is installed in the power box to realize signal processing and signal output, which is convenient for personnel to control the internal, and a mobile box is fixedly connected to the bottom sliding frame and is in sliding contact with the dark box; an actuator is fixedly connected to the mobile box, and a second buffer ring is connected to the top of the actuator;

作为上述方案的进一步改进,所述执行器包括:照射灯,其设置有多个,其固定连接在移动箱内,其上方设置有与移动箱固定连接的透光板;导光筒,其与移动箱固定连接,其顶部螺纹套接有安装筒,所述安装筒的顶端螺纹套接有执行筒,所述导光筒和执行筒内均固定连接有多个透镜,所述安装筒内固定连接有曝光板,导光筒、安装筒和执行筒之间通过销钉进行相对限定,保证各个位置的准确对准,同时保证整体的稳定,执行套,其套设在执行筒的外侧,其顶端与第二缓冲圈固定连接;滑动圈,其滑动套设在执行套内,其底端固定连接有与执行筒固定连接的调节圈,所述调节圈的一侧固定连接有与执行套固定连接的第一弹簧;泄流管,其一端与调节圈固定连接,其一侧设置有与调节圈固定连接的吸取管,所述吸取管的另一端固定连接有与原料腔相连接的连接管。As a further improvement of the above scheme, the actuator includes: an irradiation lamp, which is provided with multiple lamps and fixedly connected in the moving box, and a light-transmitting plate fixedly connected to the moving box is provided above the lamp; a light guide tube, which is fixedly connected to the moving box, and a mounting tube is threadedly sleeved on the top of the light guide tube, and an actuator tube is threadedly sleeved on the top of the mounting tube, and multiple lenses are fixedly connected in the light guide tube and the actuator tube, and an exposure plate is fixedly connected in the mounting tube, and the light guide tube, the mounting tube and the actuator tube are relatively limited by pins to ensure accurate alignment of each position and overall stability; an actuator sleeve, which is sleeved on the outside of the actuator tube, and the top of which is fixedly connected to the second buffer ring; a sliding ring, which is slidably sleeved in the actuator sleeve, and the bottom end of which is fixedly connected to an adjustment ring fixedly connected to the actuator tube, and one side of the adjustment ring is fixedly connected to a first spring fixedly connected to the actuator sleeve; a drain pipe, one end of which is fixedly connected to the adjustment ring, and one side of which is provided with an absorption pipe fixedly connected to the adjustment ring, and the other end of the absorption pipe is fixedly connected to a connecting pipe connected to the raw material chamber.

作为上述方案的进一步改进,所述暗箱的一侧设置有稳定箱,所述稳定箱的一侧连接有多个加热器,所述加热器的一侧设置有多个转向辊,所述转向辊并排成弧形结构。As a further improvement of the above solution, a stabilizing box is provided on one side of the dark box, a plurality of heaters are connected to one side of the stabilizing box, a plurality of steering rollers are provided on one side of the heater, and the steering rollers are arranged side by side in an arc structure.

作为上述方案的进一步改进,所述第一缓冲圈和第二缓冲圈均包括折叠圈,所述折叠圈内填充有惰性气体,所述折叠圈的一侧固定连接有接触圈,所述接触圈的一侧设置有多个密封槽。As a further improvement of the above solution, the first buffer ring and the second buffer ring both include a folding ring filled with an inert gas, one side of the folding ring is fixedly connected to a contact ring, and one side of the contact ring is provided with a plurality of sealing grooves.

作为上述方案的进一步改进,所述动能机构包括:电机,其固定连接在动力箱内,其输出端连接有第一缺齿轮;第一传动轮,其与动力箱转动连接,其与第一缺齿轮传动连接,其下侧啮合连接有第一变速箱,所述第一变速箱的下方传动连接有第一主动轮;中间轴,其与第一主动轮固定套接,所述中间轴上固定套接有第二缺齿轮和摩擦轮;传递轮,其与第二缺齿轮传动连接,其中间固定套接有从动轴,所述从动轴的外壁固定套接有与摩擦轮相配合的挤压轮;转轮,其固定连接在从动轴的一端,所述从动轴与动力箱转动连接;曲柄,其一端与转轮转动连接,另一端转动连接有滑动机构;第二传动轮,其与动力箱转动连接,其与第一缺齿轮传动连接,其上侧啮合连接有第二变速箱,所述第二变速箱的上方传动连接有第二主动轮;槽轮机构,其与第二主动轮传动连接,所述槽轮机构的一侧连接有与收料辊相连接的收料轴,槽轮机构为现有的基本结构,可以实现整体的圆周运动带动另一物件的周期性转动。其中滑动机构包括对称设置的第一杆件,其中一个所述第一杆件与曲柄转动连接,另一个所述第一杆件的一端固定连接有与动力箱固定连接的第二弹簧,两个所述第一杆件的一端均转动连接有第二杆件,所述第二杆件的另一端与曝光装置转动连接;所述摩擦轮的外壁固定连接有多个弧形结构的挤压片,所述挤压片采用金属材质,所述挤压片的外壁固定套接有摩擦板。As a further improvement of the above scheme, the kinetic energy mechanism includes: a motor, which is fixedly connected in the power box, and its output end is connected to the first missing gear; a first transmission wheel, which is rotatably connected to the power box, which is transmission-connected to the first missing gear, and its lower side is meshedly connected to the first gearbox, and the lower side of the first gearbox is transmission-connected to the first driving wheel; an intermediate shaft, which is fixedly sleeved with the first driving wheel, and the second missing gear and the friction wheel are fixedly sleeved on the intermediate shaft; a transmission wheel, which is transmission-connected to the second missing gear, and the driven shaft is fixedly sleeved in the middle, and the outer wall of the driven shaft is fixedly sleeved with an extrusion wheel that matches the friction wheel. Wheel; a rotating wheel, which is fixedly connected to one end of a driven shaft, and the driven shaft is rotatably connected to a power box; a crank, one end of which is rotatably connected to a rotating wheel, and the other end of which is rotatably connected to a sliding mechanism; a second transmission wheel, which is rotatably connected to the power box, and is transmission-connected to the first missing gear, and its upper side is meshed and connected to a second gearbox, and the upper side of the second gearbox is transmission-connected to a second driving wheel; a groove wheel mechanism, which is transmission-connected to the second driving wheel, and one side of the groove wheel mechanism is connected to a receiving shaft connected to a receiving roller, and the groove wheel mechanism is an existing basic structure, which can realize the overall circular motion to drive the periodic rotation of another object. The sliding mechanism includes symmetrically arranged first rods, one of which is rotationally connected to the crank, and one end of the other first rod is fixedly connected to a second spring fixedly connected to the power box, and one end of the two first rods is rotationally connected to a second rod, and the other end of the second rod is rotationally connected to an exposure device; the outer wall of the friction wheel is fixedly connected to a plurality of extrusion sheets with arc structures, and the extrusion sheets are made of metal, and the outer wall of the extrusion sheet is fixedly sleeved with a friction plate.

作为上述方案的进一步改进,所述暗箱的底部连接有泄漏管,所述泄漏管的另一端连接有位于暗箱下方的收集箱,所述原料腔的一侧连接有进料管,所述收料腔内连接有检测器。As a further improvement of the above scheme, a leakage pipe is connected to the bottom of the dark box, the other end of the leakage pipe is connected to a collecting box located below the dark box, a feed pipe is connected to one side of the raw material chamber, and a detector is connected to the collecting chamber.

作为上述方案的进一步改进,所述加固腔内连接有喷射板,所述喷射板的一侧连接有位于外侧的供粉器,所述加固腔的两侧固定连接有第三弹簧,所述第三弹簧的另一端固定连接有滑块,两个所述滑块之间转动连接有与基板相接触的调节辊。As a further improvement of the above scheme, an injection plate is connected to the reinforcement cavity, one side of the injection plate is connected to a powder feeder located on the outside, a third spring is fixedly connected to both sides of the reinforcement cavity, the other end of the third spring is fixedly connected to a slider, and an adjustment roller in contact with the substrate is rotatably connected between the two sliders.

相比现有技术,本发明的有益效果在于:Compared with the prior art, the present invention has the following beneficial effects:

1、通过区域性的周期性用水,使得整体的水环境较为稳定,保证曝光的质量,同时极小的区域性供水,可以减少整体的用水量,进而降低整体的生产成本,同时整体性的生产,减少搬运等过程中,产生的灰尘或者其他损害,降低破损率,进一步的降低整体的成本。1. Through regional periodic water use, the overall water environment is relatively stable, ensuring the quality of exposure. At the same time, extremely small regional water supply can reduce the overall water consumption, thereby reducing the overall production cost. At the same time, overall production can reduce dust or other damage generated during transportation, reduce the breakage rate, and further reduce the overall cost.

2、通过整体工作,可以一次性的完成曝光干燥和收纳的工作,减少工序,方便工作的进行,增加工作效率,保证产出。2. Through the overall work, the exposure, drying and storage work can be completed at one time, reducing the process, facilitating the work, increasing work efficiency and ensuring output.

附图说明BRIEF DESCRIPTION OF THE DRAWINGS

图1为本发明的主视剖视示意图;FIG1 is a schematic front cross-sectional view of the present invention;

图2为本发明的左视剖视示意图;FIG2 is a schematic cross-sectional view of the present invention from the left;

图3为本发明的后视剖视示意图;FIG3 is a rear cross-sectional schematic diagram of the present invention;

图4为A处放大的结构示意图;FIG4 is a schematic diagram of the structure enlarged at point A;

图5为B处放大的结构示意图;FIG5 is a schematic diagram of the structure enlarged at B;

图6为执行器主视剖视示意图;FIG6 is a schematic cross-sectional front view of the actuator;

图7为缓冲圈结构示意图;Fig. 7 is a schematic diagram of the structure of the buffer ring;

图8为缓冲圈主视剖视示意图。FIG8 is a schematic diagram of a front cross-sectional view of a buffer ring.

主要符号说明:Description of main symbols:

1、暗箱;2、原料腔;3、进料管;4、收料辊;5、收料腔;6、处理腔;7、防护箱;8、更换辊;9、上料辊;10、加热烘干辊;11、吸料机构;12、平整吹料机构;13、执行器;14、滑动架;15、滑槽;16、转向辊;17、移动箱;18、收集箱;19、泄漏管;21、稳定箱;22、加热器;23、曝光腔;24、基板;25、第三弹簧;26、调节辊;27、加固腔;28、喷射板;30、电机;31、连接管;32、第二杆件;33、转轮;34、第一主动轮;35、传递轮;37、挤压轮;38、从动轴;39、中间轴;40、摩擦轮;41、第一变速箱;42、第二缺齿轮;43、第一传动轮;44、第一缺齿轮;45、第二传动轮;46、第二变速箱;47、第二主动轮;48、槽轮机构;49、收料轴;50、动力箱;52、第二弹簧;53、第一杆件;54、曲柄;55、压力传感器;56、滑动圈;57、第一弹簧;58、吸取管;59、执行筒;61、透镜;62、泄流管;63、调节圈;64、执行套;65、第二缓冲圈;66、第一缓冲圈;67、折叠圈;68、接触圈;69、安装筒;71、照射灯;72、透光板;73、导光筒;74、曝光板。1. Dark box; 2. Raw material chamber; 3. Feed pipe; 4. Receiving roller; 5. Receiving chamber; 6. Processing chamber; 7. Protective box; 8. Replacement roller; 9. Loading roller; 10. Heating and drying roller; 11. Suction mechanism; 12. Flat blowing mechanism; 13. Actuator; 14. Sliding rack; 15. Slide; 16. Steering roller; 17. Moving box; 18. Collecting box; 19. Leakage pipe; 21. Stabilizing box; 22. Heater; 23. Exposure chamber; 24. Substrate; 25. Third spring; 26. Adjusting roller; 27. Reinforcement chamber; 28. Injection plate; 30. Motor; 31. Connecting pipe; 32. Second rod; 33. Rotating wheel; 34. First driving wheel; 35. Transfer wheel; 37. Extrusion wheel; 38. Driven shaft; 39. Intermediate shaft ; 40, friction wheel; 41, first gearbox; 42, second missing gear; 43, first transmission wheel; 44, first missing gear; 45, second transmission wheel; 46, second gearbox; 47, second driving wheel; 48, groove wheel mechanism; 49, material collection shaft; 50, power box; 52, second spring; 53, first rod; 54, crank; 55, pressure sensor; 56, sliding ring; 57, first spring; 58, suction tube; 59, execution tube; 61, lens; 62, drain pipe; 63, adjustment ring; 64, execution sleeve; 65, second buffer ring; 66, first buffer ring; 67, folding ring; 68, contact ring; 69, installation tube; 71, irradiation lamp; 72, light-transmitting plate; 73, light-guiding tube; 74, exposure plate.

具体实施方式Detailed ways

下面,结合附图以及具体实施方式,对本发明做进一步描述,需要说明的是,在不相冲突的前提下,以下描述的各实施例之间或各技术特征之间可以任意组合形成新的实施例。The present invention is further described below in conjunction with the accompanying drawings and specific implementation methods. It should be noted that, under the premise of no conflict, the various embodiments or technical features described below can be arbitrarily combined to form a new embodiment.

实施例Example

请结合图1-8,暗箱1,其内部设置有处理腔6、曝光腔23、加固腔27、收料腔5和原料腔2,经过处理腔6进行出气的处理,然后经过曝光腔23内的曝光装置进行曝光,再经转运到达加固腔27中,进行一定的防护,通过收料腔5进行收纳,原料腔2中存放纯水。Please refer to Figures 1-8. The dark box 1 is provided with a processing chamber 6, an exposure chamber 23, a reinforcement chamber 27, a material receiving chamber 5 and a raw material chamber 2. The exhaust gas is processed in the processing chamber 6, and then is exposed by the exposure device in the exposure chamber 23. It is then transported to the reinforcement chamber 27 for certain protection and stored in the material receiving chamber 5. Pure water is stored in the raw material chamber 2.

预处理装置,其位于处理腔6内,进行预处理,预处理装置进行前期的处理,保证后期的使用。The pretreatment device is located in the treatment chamber 6 and performs pretreatment. The pretreatment device performs early treatment to ensure later use.

曝光装置,其位于曝光腔23内,进行曝光,曝光装置进行必要的曝光,实现光刻蚀。The exposure device is located in the exposure chamber 23 and performs exposure. The exposure device performs necessary exposure to achieve photolithography.

收料辊4,其位于收料腔5内,收料辊4对加工完成的零部件进行收取,实现工作的需要。The receiving roller 4 is located in the receiving cavity 5, and the receiving roller 4 collects the processed parts to meet the work needs.

基板24,其依次贯穿处理腔6、曝光腔23、加固腔27和收料腔5后与收料辊4相连接,基板24经过加工,在其上进行刻蚀,完成加工的需要。The substrate 24 passes through the processing chamber 6, the exposure chamber 23, the reinforcement chamber 27 and the receiving chamber 5 in sequence and is connected to the receiving roller 4. The substrate 24 is processed and etched to complete the processing needs.

动力箱50,其固定连接在暗箱1的一侧,其内部连接有动能机构,曝光装置、收料辊4均与动能机构相连接,通过动能机构对装置中的各个器件提供动能,保证其转动。The power box 50 is fixedly connected to one side of the dark box 1, and a kinetic energy mechanism is connected inside the power box. The exposure device and the receiving roller 4 are both connected to the kinetic energy mechanism. The kinetic energy mechanism provides kinetic energy to various devices in the device to ensure their rotation.

预处理装置包括:The pre-treatment device includes:

更换辊8,其转动连接在暗箱1的一侧,基板24缠绕在更换辊8的外侧,更换辊8上绕接初期的未加工的基板24,实现原料的供给。The replacement roller 8 is rotatably connected to one side of the dark box 1, and the substrate 24 is wound around the outer side of the replacement roller 8. The initial unprocessed substrate 24 is wound around the replacement roller 8 to realize the supply of raw materials.

防护箱7,其倾斜固定在暗箱1的一侧,其内部设置有多个处理单元,防护箱7进行导向和前期处理,同时减少光线的进入,保证后续的曝光需要。The protection box 7 is fixed obliquely on one side of the dark box 1, and a plurality of processing units are arranged inside the protection box 7. The protection box 7 performs guidance and preliminary processing, and reduces the entry of light to ensure the subsequent exposure needs.

上料辊9,其与处理腔6的腔壁转动连接,且其一侧设置有加热烘干辊10,上料辊9通过外界的供给,对基板24的表面进行上料,然后经过加热烘干辊10进行烘干,实现液体的固化,实现前期的准备。The feeding roller 9 is rotatably connected to the wall of the processing chamber 6, and a heating and drying roller 10 is provided on one side. The feeding roller 9 feeds the surface of the substrate 24 through external supply, and then dries it through the heating and drying roller 10 to achieve liquid solidification and complete the preliminary preparation.

平整吹料机构12,其固定连接在处理腔6内,处理腔6的底部固定连接有吸料机构11,平整吹料机构12的底部的刮涂刀进行必要的刮涂,对多余的原料进行去除,同时通过吸气泵的吸取,使得可能修整出来的原料进行吸附,实现平整的需要。The leveling blowing mechanism 12 is fixedly connected in the processing chamber 6, and the bottom of the processing chamber 6 is fixedly connected with the suction mechanism 11. The scraper at the bottom of the leveling blowing mechanism 12 performs necessary scraping to remove excess raw materials. At the same time, the suction of the suction pump can adsorb the raw materials that may be trimmed to achieve the leveling needs.

上料辊9的一端贯穿暗箱1到达动力箱50内,动力箱50内的设置有与上料辊9相连接的原料箱,平整吹料机构12的底部固定连接有多个刮涂刀,平整吹料机构12和吸料机构11的一侧均连接有位于动力箱50内的吸气泵,所述吸气泵的输出端连接有过滤机构,过滤机构对刮涂出来的材料进行过滤,减少污染。One end of the feeding roller 9 passes through the dark box 1 and reaches the power box 50. A raw material box connected to the feeding roller 9 is arranged in the power box 50. A plurality of scraping knives are fixedly connected to the bottom of the leveling blowing mechanism 12. One side of the leveling blowing mechanism 12 and the suction mechanism 11 are both connected to an air suction pump located in the power box 50. The output end of the air suction pump is connected to a filtering mechanism. The filtering mechanism filters the scraped material to reduce pollution.

曝光装置包括:The exposure device includes:

滑动架14,其对称设置有两个,暗箱1上设置有多个滑槽15,滑动架14的一侧与滑槽15滑动套接,滑动架14的一端与动能机构相连接,滑动架的14在滑槽15和暗箱1的限定下,可以进行上下的移动,实现后续工作的需要。There are two sliding frames 14 symmetrically arranged, and a plurality of slide grooves 15 are arranged on the dark box 1. One side of the sliding frame 14 is slidably connected with the slide groove 15, and one end of the sliding frame 14 is connected to the kinetic energy mechanism. The sliding frame 14 can move up and down under the limitation of the slide groove 15 and the dark box 1 to meet the needs of subsequent work.

压力传感器55,其设置有多个,且其固定连接在上方的滑动架14的底部,压力传感器55的下侧固定连接有第一缓冲圈66,压力传感器55感受压力,然后传递给外界,进行检测,同时第一缓冲圈66配合第二缓冲圈65对基板24进行挤压密封。There are multiple pressure sensors 55, which are fixedly connected to the bottom of the upper sliding frame 14. A first buffer ring 66 is fixedly connected to the lower side of the pressure sensor 55. The pressure sensor 55 senses the pressure and then transmits it to the outside for detection. At the same time, the first buffer ring 66 cooperates with the second buffer ring 65 to squeeze and seal the substrate 24.

移动箱17,其与底部的滑动架14固定连接,且其与暗箱1滑动接触,移动箱17伴随着滑动架14的移动而移动,带动执行器13进行移动。The moving box 17 is fixedly connected to the sliding frame 14 at the bottom and is in sliding contact with the dark box 1. The moving box 17 moves along with the movement of the sliding frame 14, driving the actuator 13 to move.

执行器13,其固定连接在移动箱17上,其顶端连接有第二缓冲圈65;The actuator 13 is fixedly connected to the moving box 17, and a second buffer ring 65 is connected to the top of the actuator;

执行器13包括:The actuator 13 includes:

照射灯71,其设置有多个,其固定连接在移动箱17内,其上方设置有与移动箱17固定连接的透光板72,照射灯71产生光源,实现强烈的光照,保证后续的曝光需要,光透过透光板72进入到导光筒73中。There are multiple irradiation lamps 71, which are fixedly connected in the moving box 17. A light-transmitting plate 72 fixedly connected to the moving box 17 is arranged above the irradiation lamps 71. The irradiation lamps 71 generate light sources to achieve strong illumination to ensure subsequent exposure needs. The light passes through the light-transmitting plate 72 and enters the light guide tube 73.

导光筒73,其与移动箱17固定连接,其顶部螺纹套接有安装筒69,安装筒69的顶端螺纹套接有执行筒59,导光筒73和执行筒59内均固定连接有多个透镜61,安装筒69内固定连接有曝光板74,进入到导光筒73中的光经过透镜61后经过曝光板 74的部分遮挡,然后经过执行筒59后,照射在基板24上,进行光刻蚀。The light guide tube 73 is fixedly connected to the movable box 17, and a mounting tube 69 is threadedly sleeved on the top thereof, and an execution tube 59 is threadedly sleeved on the top of the mounting tube 69. Multiple lenses 61 are fixedly connected in the light guide tube 73 and the execution tube 59, and an exposure plate 74 is fixedly connected in the mounting tube 69. The light entering the light guide tube 73 passes through the lens 61 and is partially blocked by the exposure plate 74, and then passes through the execution tube 59 to irradiate the substrate 24 for photolithography.

执行套64,其套设在执行筒59的外侧,其顶端与第二缓冲圈65固定连接;The execution sleeve 64 is sleeved on the outside of the execution cylinder 59, and the top end of the execution sleeve 64 is fixedly connected to the second buffer ring 65;

滑动圈56,其滑动套设在执行套64内,其底端固定连接有与执行筒59固定连接的调节圈63,调节圈63的一侧固定连接有与执行套64固定连接的第一弹簧57,伴随着滑动架14的移动,带动压力传感器55和执行套64移动,使得第一缓冲套66和第二缓冲圈65之间相互靠近,挤压基板24,实现密封,同时第二缓冲圈65内体积缩小,压力增加。The sliding ring 56, whose sliding sleeve is arranged in the executing sleeve 64, has its bottom end fixedly connected to the adjusting ring 63 fixedly connected to the executing cylinder 59, and one side of the adjusting ring 63 is fixedly connected to the first spring 57 fixedly connected to the executing sleeve 64. With the movement of the sliding frame 14, the pressure sensor 55 and the executing sleeve 64 are driven to move, so that the first buffer sleeve 66 and the second buffer ring 65 are close to each other, squeezing the substrate 24 to achieve sealing, and at the same time, the volume inside the second buffer ring 65 is reduced and the pressure is increased.

泄流管62,其一端与调节圈63固定连接,其一侧设置有与调节圈63固定连接的吸取管58,吸取管58的另一端固定连接有与原料腔2相连接的连接管31,在第二缓冲圈65体积缩小后,内部液体经过泄流管62流出,在后续恢复时,通过吸取管58和连接管31在原料腔2中吸取纯水原料。The leakage pipe 62 has one end fixedly connected to the adjustment ring 63, and one side thereof is provided with a suction pipe 58 fixedly connected to the adjustment ring 63, and the other end of the suction pipe 58 is fixedly connected to the connecting pipe 31 connected to the raw material chamber 2. After the volume of the second buffer ring 65 is reduced, the internal liquid flows out through the leakage pipe 62. During subsequent recovery, the pure water raw material is absorbed in the raw material chamber 2 through the suction pipe 58 and the connecting pipe 31.

暗箱1的一侧设置有稳定箱21,稳定箱21的一侧连接有多个加热器22,加热器22的一侧设置有多个转向辊16,转向辊16并排成弧形结构,稳定箱21对加热器22进行固定,然后经过加热器进行初步的烘干和固化,保证后续的运输以及后续的收纳。A stabilizing box 21 is provided on one side of the dark box 1, and a plurality of heaters 22 are connected to one side of the stabilizing box 21. A plurality of steering rollers 16 are provided on one side of the heater 22. The steering rollers 16 are arranged side by side in an arc structure. The stabilizing box 21 fixes the heater 22, and then the heater performs preliminary drying and curing to ensure subsequent transportation and subsequent storage.

第一缓冲圈66和第二缓冲圈65均包括折叠圈67,折叠圈67内填充有惰性气体,折叠圈67的一侧固定连接有接触圈68,接触圈68的一侧设置有多个密封槽,接触圈68采用橡胶材质,实现密封的可能。The first buffer ring 66 and the second buffer ring 65 both include a folding ring 67, which is filled with inert gas. A contact ring 68 is fixedly connected to one side of the folding ring 67, and a plurality of sealing grooves are provided on one side of the contact ring 68. The contact ring 68 is made of rubber material to achieve sealing.

动能机构包括:Kinetic energy institutions include:

电机30,其固定连接在动力箱50内,其输出端连接有第一缺齿轮44,电机30提供力矩,带动第一缺齿轮44进行周期性的转动,进而间断的接触第一传动轮43和第二传动轮45,实现力矩的传递。The motor 30 is fixedly connected in the power box 50, and its output end is connected to the first missing gear 44. The motor 30 provides torque to drive the first missing gear 44 to rotate periodically, and then intermittently contact the first transmission wheel 43 and the second transmission wheel 45 to achieve torque transmission.

第一传动轮43,其与动力箱50转动连接,其与第一缺齿轮44传动连接,其下侧啮合连接有第一变速箱41,第一变速箱41的下方传动连接有第一主动轮34,通过第一传动轮43和第一变速箱41的变速传动,使得第一主动轮34转动,的进一步带动中间轴39和第一缺齿轮42和摩擦轮40转动。The first transmission wheel 43 is rotationally connected to the power box 50, and is transmission-connected to the first missing gear 44. The lower side of the first transmission wheel 43 is meshedly connected to the first gearbox 41, and the lower side of the first gearbox 41 is transmission-connected to the first driving wheel 34. Through the speed change transmission of the first transmission wheel 43 and the first gearbox 41, the first driving wheel 34 rotates, which further drives the intermediate shaft 39, the first missing gear 42 and the friction wheel 40 to rotate.

中间轴39,其与第一主动轮34固定套接,中间轴39上固定套接有第二缺齿轮42和摩擦轮40;The intermediate shaft 39 is fixedly sleeved with the first driving wheel 34, and the second missing gear 42 and the friction wheel 40 are fixedly sleeved on the intermediate shaft 39;

传递轮35,其与第二缺齿轮42传动连接,其中间固定套接有从动轴38,从动轴38的外壁固定套接有与摩擦轮40相配合的挤压轮37,传递轮35接收第二缺齿轮42传递的力矩,同时通过摩擦轮40和挤压轮37之间的配合,维持一定的摩擦力,保持一定时间的稳定状态。The transmission wheel 35 is transmission-connected with the second missing gear 42, and a driven shaft 38 is fixedly sleeved in the middle thereof. An extrusion wheel 37 cooperating with the friction wheel 40 is fixedly sleeved on the outer wall of the driven shaft 38. The transmission wheel 35 receives the torque transmitted by the second missing gear 42, and at the same time maintains a certain friction force through the cooperation between the friction wheel 40 and the extrusion wheel 37, thereby keeping a stable state for a certain period of time.

转轮33,其固定连接在从动轴38的一端,从动轴38与动力箱50转动连接,转轮33带动曲柄54转动,进一步的带动曲柄54进行移动。The rotating wheel 33 is fixedly connected to one end of the driven shaft 38. The driven shaft 38 is rotatably connected to the power box 50. The rotating wheel 33 drives the crank 54 to rotate, and further drives the crank 54 to move.

曲柄54,其一端与转轮33转动连接,另一端转动连接有滑动机构;A crank 54, one end of which is rotatably connected to the rotating wheel 33, and the other end of which is rotatably connected to a sliding mechanism;

第二传动轮45,其与动力箱50转动连接,其与第一缺齿轮44传动连接,其上侧啮合连接有第二变速箱46,第二变速箱6的上方传动连接有第二主动轮47,通过第二传动轮45以及第二变速箱46的传递,使得第二主动轮47转动。The second transmission wheel 45 is rotationally connected to the power box 50, which is transmission-connected to the first missing gear 44, and its upper side is meshingly connected to the second gearbox 46, and the upper side of the second gearbox 6 is transmission-connected to the second driving wheel 47. The second driving wheel 47 rotates through the transmission of the second transmission wheel 45 and the second gearbox 46.

槽轮机构48,其与第二主动轮47传动连接,槽轮机构48的一侧连接有与收料辊4相连接的收料轴49,经过传动,槽轮机构48伴随着第二主动轮47的带动,实现间接性的转动,进一步的带动收料轴49和收料辊4的转动,带动基板24进行一端距离的移动。The groove wheel mechanism 48 is connected to the second driving wheel 47 in transmission. One side of the groove wheel mechanism 48 is connected to the receiving shaft 49 connected to the receiving roller 4. After transmission, the groove wheel mechanism 48 is driven by the second driving wheel 47 to achieve indirect rotation, further driving the rotation of the receiving shaft 49 and the receiving roller 4, and driving the substrate 24 to move a distance at one end.

其中滑动机构包括对称设置的第一杆件53,其中一个第一杆件53与曲柄54转动连接,另一个第一杆件53的一端固定连接有与动力箱50固定连接的第二弹簧52,两个第一杆件53的一端均转动连接有第二杆件32,第二杆件32的另一端与曝光装置转动连接,在曲柄带动带动第一杆件53移动时,在暗箱1和滑动架14的限定下,第二杆件32移动,进一步的带动滑动架14移动,实现两个滑动架40相互靠近,形成挤压,在后续没有外在力支撑后,第二弹簧52使得各个杆件归位,等待后续的工作。The sliding mechanism includes symmetrically arranged first rods 53, one of which is rotatably connected to the crank 54, and one end of the other first rod 53 is fixedly connected to a second spring 52 fixedly connected to the power box 50, one end of the two first rods 53 are both rotatably connected to the second rod 32, and the other end of the second rod 32 is rotatably connected to the exposure device. When the crank drives the first rod 53 to move, the second rod 32 moves under the limitation of the darkbox 1 and the sliding frame 14, and further drives the sliding frame 14 to move, so that the two sliding frames 40 are close to each other to form extrusion. After there is no external force support, the second spring 52 makes each rod return to its position and wait for subsequent work.

摩擦轮40的外壁固定连接有多个弧形结构的挤压片,挤压片采用金属材质,挤压片的外壁固定套接有摩擦板,其中摩擦轮40和第二缺齿轮42之间有一定的夹角,在第二缺齿轮42转动后,摩擦板与挤压轮37接触,由摩擦力保持从动轴的状态,在摩擦板移动出挤压轮37后,第二弹簧52作用,然后再第二缺齿轮作用,形成整个周期的循环。The outer wall of the friction wheel 40 is fixedly connected with a plurality of extrusion sheets with an arc-shaped structure. The extrusion sheets are made of metal. The outer wall of the extrusion sheet is fixedly sleeved with a friction plate. There is a certain angle between the friction wheel 40 and the second missing gear 42. After the second missing gear 42 rotates, the friction plate contacts the extrusion wheel 37, and the state of the driven shaft is maintained by the friction force. After the friction plate moves out of the extrusion wheel 37, the second spring 52 acts, and then the second missing gear acts, forming a cycle of the entire cycle.

暗箱1的底部连接有泄漏管19,泄漏管19的另一端连接有位于暗箱1下方的收集箱18,原料腔2的一侧连接有进料管3,泄流管19将多余的纯水进行收集,然后重新利用,减少纯水的过渡使用,收料腔5内连接有检测器29。A leakage pipe 19 is connected to the bottom of the dark box 1, and the other end of the leakage pipe 19 is connected to a collecting box 18 located below the dark box 1. A feed pipe 3 is connected to one side of the raw material chamber 2. The discharge pipe 19 collects excess pure water and then reuses it to reduce the excessive use of pure water. A detector 29 is connected to the collecting chamber 5.

加固腔27内连接有喷射板28,喷射板28的一侧连接有位于外侧的供粉器,加固腔27的两侧固定连接有第三弹簧25,第三弹簧25的另一端固定连接有滑块,两个滑块之间转动连接有与基板24相接触的调节辊26,通过第三弹簧25的作用,使得调节辊26可以进行一定的移动,保证基板24始终处于一定的拉伸状态。An injection plate 28 is connected to the reinforcement cavity 27, and one side of the injection plate 28 is connected to a powder feeder located on the outside. Third springs 25 are fixedly connected to both sides of the reinforcement cavity 27, and a slider is fixedly connected to the other end of the third spring 25. An adjusting roller 26 in contact with the substrate 24 is rotatably connected between the two sliders. Through the action of the third spring 25, the adjusting roller 26 can move to a certain extent to ensure that the substrate 24 is always in a certain stretched state.

在进行工作时,基板24通过机械贯穿各个腔室,进行初期的准备,在进行工作中,首先经过防护箱7进行初期的准备和隔绝,然后经过上料辊9进行表面胶体等必要的涂覆,然后经过加热烘干辊10的工作,进行烘干和稳固,然后经过吹料机构12的刮涂和吸取,进行整体的平整和固定,然后经过执行器13的工作进行曝光,然后经过转向辊16的转向和加热器22的加热,进行必要的烘干,最后经过喷射板28的辅助和检测器29的检测,绕接到收料辊4上,完成工作,在进行整体工作时,电机30通过第一缺齿轮44、第一传动轮43、第一变速箱41、第一主动轮34、中间轴39、第二缺齿轮42、传递轮35带动转轮33转动,进一步的带动曲柄54和第一杆件53移动,从而经过第二杆件32带动两个滑动架14相向运动,进而带动第一缓冲圈66和第二缓冲圈65相向运动,实现挤压,在压力传感器55感受到压力到达一定程度时,通过控制,照射灯71工作,然后经过透光板72、透镜61、曝光板74、执行筒59进行照射,实现曝光,在两个滑动架14相近的过程中,将混合稀释的纯水经过泄流管62排出,当后续第二缓冲圈65、第一缓冲圈66相对运动时,体积变大,下方的空间吸取干净的纯水,进行添加,完成局部的精准的添加,同时此过程配合着第二传动轮45、第二变速箱46、第二主动轮47、槽轮机构48和收料轴49的工作,实现基板24的拽取收纳,实现稳定的持续性的工作,增加工作效率。During operation, the substrate 24 passes through each chamber through the machine to carry out initial preparation. During operation, it first passes through the protective box 7 for initial preparation and isolation, then passes through the loading roller 9 for necessary coating of surface colloid, then passes through the heating and drying roller 10 for drying and stabilization, then passes through the scraping and absorption of the blowing mechanism 12 for overall flatness and fixation, then passes through the actuator 13 for exposure, then passes through the steering of the steering roller 16 and the heating of the heater 22 for necessary drying, and finally passes through the assistance of the injection plate 28 and the detection of the detector 29, and is wound around the receiving roller 4 to complete the work. During the overall operation, the motor 30 drives the rotating wheel 33 to rotate through the first missing gear 44, the first transmission wheel 43, the first gearbox 41, the first driving wheel 34, the intermediate shaft 39, the second missing gear 42, and the transmission wheel 35, and further drives the crank 54 and the first The rod 53 moves, thereby driving the two sliding frames 14 to move toward each other through the second rod 32, and then driving the first buffer ring 66 and the second buffer ring 65 to move toward each other to achieve extrusion. When the pressure sensor 55 senses that the pressure has reached a certain level, the irradiation lamp 71 is controlled to work, and then irradiation is performed through the light-transmitting plate 72, the lens 61, the exposure plate 74, and the execution tube 59 to achieve exposure. In the process of the two sliding frames 14 approaching each other, the mixed and diluted pure water is discharged through the drain pipe 62. When the subsequent second buffer ring 65 and the first buffer ring 66 move relative to each other, the volume becomes larger, and the space below absorbs clean pure water for addition, completing local and precise addition. At the same time, this process cooperates with the work of the second transmission wheel 45, the second gearbox 46, the second driving wheel 47, the groove wheel mechanism 48 and the receiving shaft 49 to realize the pulling and storage of the substrate 24, achieve stable and continuous work, and increase work efficiency.

上述实施方式仅为本发明的优选实施方式,不能以此来限定本发明保护的范围,本领域的技术人员在本发明的基础上所做的任何非实质性的变化及替换均属于本发明所要求保护的范围。The above-mentioned embodiments are only preferred embodiments of the present invention and cannot be used to limit the scope of protection of the present invention. Any non-substantial changes and substitutions made by technicians in this field on the basis of the present invention shall fall within the scope of protection required by the present invention.

Claims (8)

1. An improved exposure system for Micro-LED chip preparation, comprising:
the dark box is internally provided with a processing cavity, an exposure cavity, a reinforcing cavity, a material receiving cavity and a raw material cavity;
The pretreatment device is positioned in the treatment cavity and is used for pretreatment;
an exposure device, which is positioned in the exposure cavity and is used for exposure;
The material receiving roller is positioned in the material receiving cavity;
the substrate sequentially penetrates through the processing cavity, the exposure cavity, the reinforcing cavity and the material receiving cavity and then is connected with the material receiving roller;
The power box is fixedly connected to one side of the camera bellows, the inside of the power box is connected with a kinetic energy mechanism, and the exposure device and the material receiving roller are connected with the kinetic energy mechanism;
the exposure apparatus includes:
The two sliding frames are symmetrically arranged, a plurality of sliding grooves are formed in the camera bellows, one side of each sliding frame is in sliding sleeve joint with each sliding groove, and one end of each sliding frame is connected with the kinetic energy mechanism;
the pressure sensors are arranged in a plurality, are fixedly connected to the bottom of the sliding frame above, and are fixedly connected with a first buffer ring at the lower side;
the movable box is fixedly connected with the sliding frame at the bottom and is in sliding contact with the camera bellows;
The actuator is fixedly connected to the movable box, and the top end of the actuator is connected with a second buffer ring;
The actuator includes:
the plurality of the irradiation lamps are fixedly connected in the movable box, and a light-transmitting plate fixedly connected with the movable box is arranged above the irradiation lamps;
the light guide cylinder is fixedly connected with the movable box, the top thread of the light guide cylinder is sleeved with the mounting cylinder, the top thread of the mounting cylinder is sleeved with the execution cylinder, the light guide cylinder and the execution cylinder are fixedly connected with a plurality of lenses, and the mounting cylinder is fixedly connected with the exposure plate;
The execution sleeve is sleeved on the outer side of the execution cylinder, and the top end of the execution sleeve is fixedly connected with the second buffer ring;
The sliding ring is sleeved in the execution sleeve in a sliding manner, the bottom end of the sliding ring is fixedly connected with an adjusting ring fixedly connected with the execution cylinder, and one side of the adjusting ring is fixedly connected with a first spring fixedly connected with the execution sleeve;
One end of the bleeder tube is fixedly connected with the adjusting ring, one side of the adjusting ring is connected with a suction tube fixedly connected with the adjusting ring, and the other end of the suction tube is fixedly connected with a connecting tube connected with the raw material cavity;
Wherein, along with the movement of carriage, drive pressure sensor and execution cover removal for be close to each other between first buffer ring and the second buffer ring, squeeze the base plate, realize sealedly, the internal volume of second buffer ring reduces simultaneously, and pressure increase, after the second buffer ring reduces in volume, inside liquid flows through the bleeder tube, and at the time of follow-up resumes, draws pure water raw materials in the raw materials chamber through suction pipe and connecting pipe.
2. The improved Micro-LED chip manufacturing exposure system according to claim 1, wherein the preprocessing device comprises:
a replacement roller rotatably connected to one side of the camera bellows, the substrate being wound around the outside of the replacement roller;
The protective box is obliquely fixed on one side of the camera bellows, and a plurality of processing units are arranged in the protective box;
The feeding roller is rotationally connected with the cavity wall of the processing cavity, and one side of the feeding roller is provided with a heating and drying roller;
The flattening blowing mechanism is fixedly connected in the processing cavity, and the bottom of the processing cavity is fixedly connected with the material sucking mechanism.
3. The improved Micro-LED chip preparation exposure system according to claim 2, wherein one end of the feeding roller penetrates through the camera bellows to reach the power box, a raw material box connected with the feeding roller is arranged in the power box, a plurality of knife-coating knives are fixedly connected to the bottom of the leveling blowing mechanism, suction pumps positioned in the power box are connected to one sides of the leveling blowing mechanism and the suction mechanism, and a filtering mechanism is connected to the output end of the suction pump.
4. The improved Micro-LED chip manufacturing exposure system according to claim 1, wherein a stabilizing box is arranged on one side of the dark box, a plurality of heaters are connected to one side of the stabilizing box, a plurality of turning rollers are arranged on one side of the heaters, and the turning rollers are arranged side by side to form an arc-shaped structure.
5. The improved Micro-LED chip manufacturing exposure system of claim 1, wherein the first buffer ring and the second buffer ring each comprise a folding ring, inert gas is filled in the folding rings, a contact ring is fixedly connected to one side of each folding ring, and a plurality of sealing grooves are formed in one side of each contact ring.
6. The improved Micro-LED chip manufacturing exposure system of claim 1, wherein the kinetic energy mechanism comprises:
The motor is fixedly connected in the power box, and the output end of the motor is connected with a first gear lack;
The first driving wheel is in rotary connection with the power box, is in transmission connection with the first gear lack, is connected with a first gearbox in a meshed manner at the lower side of the first driving wheel, and is in transmission connection with a first driving wheel at the lower side of the first gearbox;
the intermediate shaft is fixedly sleeved with the first driving wheel, and the intermediate shaft is fixedly sleeved with a second gear-lack and a friction wheel;
The transmission wheel is in transmission connection with the second gear lack, a driven shaft is fixedly sleeved in the middle of the transmission wheel, and an extrusion wheel matched with the friction wheel is fixedly sleeved on the outer wall of the driven shaft;
the rotating wheel is fixedly connected with one end of a driven shaft, and the driven shaft is rotationally connected with the power box;
One end of the crank is rotationally connected with the rotating wheel, and the other end of the crank is rotationally connected with the sliding mechanism;
The second driving wheel is in rotary connection with the power box, is in transmission connection with the first gear lack, is in meshed connection with a second gearbox at the upper side, and is in transmission connection with a second driving wheel at the upper side of the second gearbox;
The grooved pulley mechanism is in transmission connection with the second driving wheel, and one side of the grooved pulley mechanism is connected with a receiving shaft connected with the receiving roller;
The sliding mechanism comprises first rod pieces which are symmetrically arranged, one of the first rod pieces is rotationally connected with the crank, one end of the other first rod piece is fixedly connected with a second spring which is fixedly connected with the power box, one end of each of the two first rod pieces is rotationally connected with a second rod piece, and the other end of each of the second rod pieces is rotationally connected with the exposure device;
The outer wall fixedly connected with a plurality of arc-shaped structure's of friction pulley extrusion piece, the extrusion piece adopts the metal material, the fixed friction plate that has cup jointed of outer wall of extrusion piece.
7. The improved Micro-LED chip manufacturing exposure system according to claim 6, wherein a leakage pipe is connected to the bottom of the camera bellows, a collecting box located below the camera bellows is connected to the other end of the leakage pipe, and a feeding pipe is connected to one side of the raw material cavity.
8. The improved Micro-LED chip manufacturing exposure system according to claim 7, wherein a jet plate is connected in the reinforcing cavity, a powder feeder positioned on the outer side is connected to one side of the jet plate, a third spring is fixedly connected to two sides of the reinforcing cavity, a sliding block is fixedly connected to the other end of the third spring, and an adjusting roller contacting with the substrate is rotatably connected between the two sliding blocks.
CN202211031716.9A 2022-08-26 2022-08-26 An improved exposure system for Micro-LED chip preparation Active CN115421356B (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101477312A (en) * 2003-09-03 2009-07-08 株式会社尼康 Exposure apparatus and device producing method
CN114007330A (en) * 2021-10-11 2022-02-01 星源电子科技(深圳)有限公司 Flexible printing device for flexible miniLED backlight module

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5001343B2 (en) * 2008-12-11 2012-08-15 エーエスエムエル ネザーランズ ビー.ブイ. Fluid extraction system, immersion lithographic apparatus, and method for reducing pressure fluctuations of an immersion liquid used in an immersion lithographic apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101477312A (en) * 2003-09-03 2009-07-08 株式会社尼康 Exposure apparatus and device producing method
CN114007330A (en) * 2021-10-11 2022-02-01 星源电子科技(深圳)有限公司 Flexible printing device for flexible miniLED backlight module

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