CN115692146A - Edge intake components and semiconductor process equipment - Google Patents

Abstract

The present invention provides an edge air inlet assembly, which is used to be arranged on the top opening of a process chamber, and process gas is introduced into the process chamber from the edge of the process chamber. The edge air inlet assembly includes: an upper ring cover, a middle ring cover, The lower ring cover and the air inlet pipeline, the upper ring cover, the middle ring cover and the lower ring cover are stacked on the process chamber, and at least one air inlet is arranged on the upper ring cover, and the air inlet introduces process gas through the inlet pipeline; the lower The inner ring wall of the ring cover is surrounded by a plurality of gas injection holes, which are used to spray process gas into the process chamber; at least one group of uniform gas combination air channels is formed between the upper ring cover and the middle ring cover, and each group of uniform gas The combined gas channel is respectively connected with one gas inlet hole and a plurality of gas injection holes, and the process gas introduced by the gas inlet hole is discharged from the plurality of gas injection holes through the uniform gas combination gas channel. The edge air intake assembly provided by the invention can improve the overall stability and maintenance performance of the air intake structure while ensuring the uniformity of the intake air. The invention also provides a semiconductor process equipment.

Description

Edge intake components and semiconductor process equipment

technical field

The invention relates to the field of semiconductor process equipment, in particular to an edge air intake component of semiconductor process equipment and semiconductor process equipment.

Background technique

Inductive Coupled Plasma (ICP) etching machine is widely used in integrated circuit (integrated circuit, IC) and semiconductor manufacturing process. In the process chamber of plasma etching machine, the intake path of the chamber is divided into Central air intake and edge air intake, different process gases are injected into the process chamber in a high vacuum state through the center air intake and edge air intake paths and mixed, and then high-frequency power is applied to the electrodes on the upper part of the process chamber to control The process gas mixed in the chamber is ionized to form plasma, and then the surface of the wafer (Wafer) exposed to the plasma environment on the carrier plate is etched.

In the semiconductor process, the uniformity and stability of the gas flow field distribution in the process chamber has a very important influence on the etching uniformity of the wafer (Wafer) surface. Therefore, in order to improve the circumferential velocity uniformity of the process gas provided by the gas from the edge inlet path to the periphery of the wafer, a shunt channel for shunting the process gas is usually processed in the upper cover of the process chamber, and the process gas is distributed by the shunt. The inlet holes of the channel enter into the distribution channel, and a plurality of gas outlets uniformly distributed along the circumference formed by the distribution channel on the upper cover enter into the process chamber. However, the existing upper cover processed with the shunt channel is often prone to problems such as air leakage and poor air intake uniformity, and the structure is difficult to maintain and has a short service life. Therefore, how to provide an edge air intake structure that can improve the overall stability and maintenance performance of the structure while ensuring the uniformity of the intake air has become a technical problem to be solved urgently in this field.

Contents of the invention

The present invention aims to provide an edge air intake assembly of semiconductor process equipment and a semiconductor process equipment. The edge air intake assembly can improve the overall stability and maintenance performance of the intake structure while ensuring the uniformity of the intake air.

In order to achieve the above object, as one aspect of the present invention, an edge gas inlet assembly is provided, which is used to be arranged on the top opening of the process chamber, and process gas is introduced into the process chamber from the edge of the process chamber , the edge air intake assembly includes: an upper ring cover, a middle ring cover, a lower ring cover and an air intake pipeline, the upper ring cover, the middle ring cover and the lower ring cover are stacked on the process chamber, The upper ring cover is provided with at least one air intake hole, and the air intake hole introduces the process gas through the air intake pipeline; the inner ring wall of the lower ring cover is surrounded by a plurality of gas injection holes, so The gas injection hole is used to inject the process gas into the process chamber;

Between the upper ring cover and the middle ring cover is formed at least one set of gas-uniform combined air passages, each group of uniform gas combined air passages communicates with one air intake hole and a plurality of the air injection holes respectively, through the The uniform gas combination gas channel discharges the process gas introduced by the gas inlet holes from the plurality of gas injection holes.

Optionally, each group of the uniform gas combination airway includes:

A first guide groove and a plurality of second guide grooves located between the upper ring cover and the middle ring cover, the inlet end of the first guide groove communicates with the air inlet hole, and the first guide groove A diversion groove has at least two exhaust ends, and each exhaust end of the first diversion groove is correspondingly connected to an inlet end of the second diversion groove, and the second diversion groove is used for The gas flowing into the second diversion groove is divided again;

Each of the second guide grooves has at least two exhaust ends, and the exhaust ends of the second guide grooves communicate with the air injection holes.

Optionally, the first diversion groove is formed on the bottom surface of the upper ring cover, a plurality of second diversion grooves are formed on the top surface of the middle ring cover, and a plurality of second diversion grooves are formed in the middle ring cover. The second diversion groove corresponds to a plurality of middle cover through holes, and the middle cover through hole penetrates from the bottom of the corresponding second diversion groove to the bottom surface of the middle ring cover, and the second The guide groove communicates with the air injection hole through the through hole of the middle cover.

Optionally, the first diversion groove includes multiple stages of upper arc-shaped grooves extending in the circumferential direction, the upper arc-shaped grooves of the same stage are arranged at intervals in the circumferential direction and have the same length, and the upper arc-shaped grooves of different stages The upper arc-shaped grooves of the first stage communicate with the air inlet at the midpoint position, and in the upper arc-shaped grooves other than the last stage, each of the upper arc-shaped grooves The two ends communicate with the midpoints of the two upper arc-shaped grooves of the next stage respectively, and the two ends of the upper arc-shaped grooves of the last stage communicate with the second diversion groove.

Optionally, the second guide groove includes multiple stages of lower arc-shaped grooves extending in the circumferential direction, the lower arc-shaped grooves of the same stage are arranged at intervals in the circumferential direction and have the same length, and the lower arc-shaped grooves of different stages radially staggered between them, the lower arc-shaped grooves of the first stage communicate with the upper arc-shaped grooves of the last stage at the midpoint position, and in the lower arc-shaped grooves other than the last stage, each of the lower arc-shaped grooves The two ends of the arc-shaped groove communicate with the midpoint of the two lower arc-shaped grooves of the next stage, and the two ends of the lower arc-shaped groove of the last stage communicate with the two through holes of the middle cover respectively.

Optionally, both ends of each upper arc-shaped groove of the last stage communicate with midpoints of the two lower arc-shaped grooves of the first stage through two upper connecting grooves.

Optionally, a circumferentially extending annular separation groove is formed on the top surface of the middle ring cover, and a plurality of second guide grooves are formed at the bottom of the annular separation groove, and the edge air intake assembly further includes an annular A partition, the annular partition is matched in the annular partition groove, a plurality of connecting through holes are formed in the annular partition, and the second diversion groove is connected with the corresponding through connecting through holes. The first diversion groove is connected.

Optionally, an annular air channel is formed between the lower ring cover and the middle ring cover, and the combined gas uniform channel and the gas injection holes communicate with each other through the annular air channel.

Optionally, the top surface of the lower ring cover has an annular protrusion surrounding the axis of the lower ring cover, and the inner cylindrical surface of the annular protrusion is flat with the inner wall of the lower ring cover, so An annular groove is formed on the bottom surface of the middle ring cover, the top surface of the lower ring cover is in contact with the bottom surface of the middle ring cover, the annular protrusion is correspondingly arranged in the annular groove, and the annular protrusion The top of the raised portion is in contact with the groove bottom of the annular groove, and the annular air channel is formed between the outer cylindrical surface of the annular protrusion and the side wall of the annular groove.

Optionally, the upper ring cover, the middle ring cover and the lower ring cover are all rectangular, and the four end corners of the upper ring cover are respectively provided with one of the air inlet holes, and the gas uniform combination There are four groups of air passages, and the air uniformity combined air passages and the air intake holes are provided in one-to-one correspondence.

Optionally, the air intake pipeline includes an air intake main pipe, a distribution box and a plurality of air intake branch pipes, the first end of the air intake main pipe is used to receive process gas from a gas source, and the second end of the air intake main pipe The distribution box communicates with the first end of at least one intake branch pipe, and the second end of the intake branch pipe communicates with the intake holes one by one.

As a second aspect of the present invention, a semiconductor process equipment is provided, the semiconductor process equipment includes a process chamber, an edge inlet assembly and a carrier plate, the carrier plate is arranged in the process chamber, and the edge inlet The gas assembly is arranged at the top opening of the process chamber, wherein the edge air intake assembly is the above-mentioned edge air intake assembly.

In the edge air intake assembly and the semiconductor process equipment provided by the present invention, at least one group of uniform gas combination air passages is formed between the upper ring cover and the middle ring cover, and each group of uniform gas combination air passages can introduce an air intake hole into the The process gas is divided into multiple gas injection holes and sprayed out, so as to be evenly sprayed to the edge area of the space above the carrier plate through the lower ring cover. The gas-uniform combination air channel is located between the upper ring cover and the middle ring cover, so that only the opposite surfaces of the upper ring cover and the middle ring cover need to be attached and fixed to assemble the gas-distribution combined air channel, and there is no chemical or Compared with the solution of welding multi-layer sub-channels in the prior art, the physical reaction improves the stability of the overall structure and the uniformity of the cross-section of the gas passage, and can further ensure the uniformity of the injection process gas of the lower ring cover.

And, when sealing the uniform gas combination air passage through the sealing member (such as a sealing ring), the sealing member only needs to seal the gap between the bottom surface of the upper ring cover and the top surface of the middle ring cover, and then disassemble and assemble the upper cover. During the process, the seal is only squeezed by the opposite side plane, and will not be subjected to shear force due to friction with other structures in the squeezed state, which improves the convenience of sealing and disassembling the upper cover, and extends the length of the upper cover. The service life of the seal in the cover.

In addition, when particles and other substances that need to be removed accumulate in the combined air passage of the uniform gas, it is only necessary to disassemble the upper ring cover, the middle ring cover and the lower ring cover, and the combined air passage of the uniform gas can be corresponding to the bottom surface of the upper ring cover or The groove structures on the top surface of the middle ring cover are directly exposed to the outside, so as to facilitate cleaning of these groove structures and improve the convenience of maintaining the overall structure.

Description of drawings

The accompanying drawings are used to provide a further understanding of the present invention, and constitute a part of the description, together with the following specific embodiments, are used to explain the present invention, but do not constitute a limitation to the present invention. In the attached picture:

Fig. 1 is an oblique top view of an edge intake assembly provided by an embodiment of the present invention;

Fig. 2 is an oblique bottom view of the edge air intake assembly provided by the embodiment of the present invention;

Fig. 3 is a cross-sectional view of the edge air intake assembly in Fig. 1 on the α plane;

Fig. 4 is a cross-sectional view of the edge air intake assembly in Fig. 1 on the β plane;

Fig. 5 is a top view of an edge intake assembly provided by an embodiment of the present invention;

Fig. 6 is a bottom view of the edge intake assembly provided by the embodiment of the present invention;

Fig. 7 is a schematic diagram of the connection relationship between the splitter box and the intake branch pipe in the edge intake assembly provided by the embodiment of the present invention;

Fig. 8 is a cross-sectional view of a splitter box in an edge air intake assembly provided by an embodiment of the present invention;

Fig. 9 is a schematic diagram of the bottom surface structure of the upper ring cover in the edge air intake assembly provided by the embodiment of the present invention;

Fig. 10 is a schematic diagram of the top surface structure of the middle ring cover in the edge air intake assembly provided by the embodiment of the present invention;

Fig. 11 is a partially enlarged schematic diagram of the gas path in the edge air intake assembly provided by the embodiment of the present invention;

Fig. 12 is a schematic diagram of the air path in the edge air intake assembly provided by the embodiment of the present invention;

Fig. 13 is a schematic diagram of the gas path structure of a uniform gas combination air channel in the prior art;

Fig. 14 is a schematic view of the gas path structure of another gas uniform combined air channel in the prior art.

Detailed ways

Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

In the existing upper cover structure, the shunt channel generally includes two forms: a multi-layer structure and a single-layer structure. Wherein, the distribution channels of the multi-layer structure include multi-layer gas channels stacked in the upper cover along the thickness direction and arranged around the axis of the process chamber. A plurality of air passages are connected to realize the bifurcation of the air flow when flowing from the upper layer to the lower layer, and the plurality of air passages in the lowermost layer form a plurality of air outlets evenly distributed in the circumferential direction on the upper cover to achieve uniform air intake.

Specifically, as shown in Figure 13, the upper cover includes a base 1 and a plurality of annular partitions arranged in the stepped annular flow guide groove in the base 1, the figure shows the situation of separating three layers of air passages (the upper cover is Ring structure, shown in the figure is a cross-section of a certain circumferential position of the upper cover). The lower annular baffle 4, the middle annular baffle 3 and the upper annular baffle 2 are sequentially fixed in the stepped annular diversion groove by welding, and the stepped annular diversion groove is divided into the upper air channel 5, the middle air channel, and the upper air channel. Road 6 and lower airway 7. Each annular baffle is formed with a plurality of through holes that penetrate the annular baffle along the thickness direction (that is, form a vertical connection channel). When one channel flows to the next channel, the flow diverges, and finally flows from the lower gas channel 7 to multiple gas outlets 8 and flows into the process chamber.

The distribution channels of the single-layer structure include multi-circle sub-channels formed in the upper cover around the axis of the process chamber and concentrically arranged on the same layer. Each sub-channel of the outer ring communicates with multiple sub-channels of the inner ring through a radially extending connecting channel. Furthermore, the air flow is bifurcated when flowing from the outer ring to the inner ring, and the plurality of sub-channels in the innermost ring form a plurality of air outlets evenly distributed in the circumferential direction on the upper cover to achieve uniform air intake.

Specifically, as shown in FIG. 14, the upper cover includes an upper cover plate 10 and a base 20, wherein the upper cover plate 10 is an annular T-shaped cross-sectional structure, and a dovetail seal is formed on the inner and outer side walls of the upper cover plate 10. Outer O-Ring (O-Ring) 30 and inner O-Ring 40 can be installed in the two dovetail-shaped sealing grooves, so as to realize the sealing of the uniform flow area of the airway through radial sealing (the upper cover is a ring shape structure, the figure shows the cross-section of a certain circumferential position of the upper cover). The cover plate 10 is partially inserted into the radial sealing area and seals the tops of the multi-circle channels in the air channel uniform flow area, so that the multi-circle channels communicate only through the radially extending connecting channels.

However, in the multi-layer structure of the distribution channel, in order to ensure airtightness, the edge of the annular partition needs to be connected with the inner wall of the distribution channel by continuous full welding. The welding deformation is large, and it is difficult to ensure the dimensional accuracy of the channel. The deformation is seriously irregular, which seriously affects the uniformity of the edge air intake, and the airtightness of the air intake hole and the air outlet is affected by the deformation, and there is a greater risk of air leakage. At the same time, the welding process is complicated and cumbersome, and there are many welding tools, resulting The cycle is long, the processing cost is high, and particles are deposited after the channel is used for a long time. When cleaning and maintenance are required, the integrally welded channel structure cannot be opened, and it needs to be scrapped and replaced regularly. The maintenance cost is high and the service life is short.

In the single-layer structure of the distribution channel, in order to ensure airtightness, it is usually necessary to fix the upper cover plate 10 with bolts and other structures, and press the bottom of the upper cover plate 10 tightly into the channel structure, which is very easy to shear during installation. , squeeze the elastic parts such as the sealing ring, and the side of the sealing ring facing away from the sub-channel is exposed to the process gas in the cavity for a long time, which will easily cause the surface of the sealing ring to be corroded and bonded to the side wall of the channel. During the removal process, rely on The upper cover plate 10 is removed by the top wire, which makes it difficult to disassemble the upper cover plate 10, and, limited by the size of the upper cover, the number of turns of the sub-channel in the shunt channel of the single-layer structure is limited (in the prior art, only 8 can be evenly distributed at most). edge outlets), it is difficult to meet the increasing requirements of air intake uniformity.

In order to solve the above-mentioned technical problems, as one aspect of the present invention, an edge gas inlet assembly is provided, which is used to be arranged on the top opening of a semiconductor process equipment, and to feed process gas into the process chamber from the edge of the process chamber. As shown in Figures 1 to 6, the edge air intake assembly includes an upper ring cover 100, a middle ring cover 200, a lower ring cover 300 and an air intake pipeline, and the upper ring cover 100, the middle ring cover 200 and the lower ring cover 300 are stacked in the process chamber On the chamber, the upper ring cover 100 is provided with at least one air intake hole, which introduces the process gas through the intake pipeline; the inner ring wall of the lower ring cover is surrounded by a plurality of air injection holes, and the air injection holes are used to inject gas into the process chamber. The process gas is ejected from the chamber.

Between the upper ring cover 100 and the middle ring cover 200, at least one group of uniform gas combined air channels is formed (the air channel structure is located on the bottom surface of the upper ring cover 100 and/or the top surface of the middle ring cover 200), and each group of uniform gas combined air channels They are respectively communicated with one gas inlet hole and a plurality of gas injection holes, so as to discharge the process gas introduced by the gas inlet hole from the plurality of gas injection holes into the process chamber through the uniform gas combination gas channel.

It should be noted that the ring cover is designed to install the medium window. Specifically, as shown in FIG. 1 and FIG. After being installed on the upper ring cover 100, the upper ring cover 100, the middle ring cover 200, the medium window 700, and the lower ring cover 300 together form the upper cover of the process chamber, and the upper cover is sealed and installed on the top of the process chamber Afterwards, a radio frequency may be fed over the dielectric window 700 to ignite the process gas injected into the process chamber to form plasma.

In order to improve the accuracy of the flow direction of the process gas discharged from each gas injection hole into the process chamber, as a preferred embodiment of the present invention, as shown in Figures 1 to 6, the edge air intake assembly also includes a plurality of nozzles 400, A plurality of nozzles 400 are connected to the plurality of gas injection holes in one-to-one correspondence, and the process gas in the uniform gas channel is discharged into the process chamber through the plurality of nozzles 400 .

The embodiment of the present invention does not specifically limit the type and quantity of the nozzle 400. For example, optionally, the nozzle 400 can be an 8-inch nozzle. As shown in FIG. set up.

In the present invention, at least one group of uniform gas combination gas passages is formed between the upper ring cover 100 and the middle ring cover 200, and each group of uniform gas combination gas passages can divert the process gas introduced by one inlet hole to multiple gas injection holes and spray, so as to evenly spray to the edge area of the space above the carrier plate through the lower ring cover 300 (that is, to achieve uniform edge air intake). The air-distribution combined air channel is located between the upper ring cover 100 and the middle ring cover 200, so that only the opposite surfaces of the upper ring cover 100 and the middle ring cover 200 need to be attached and fixed to assemble the air-distribution combined air channel, during the assembly process There is no chemical or physical reaction. Compared with the solution of welding multi-layer sub-channels in the prior art, the stability of the overall structure and the uniformity of the cross-section of the gas passage are improved, which can further ensure the uniformity of the process gas sprayed by the lower ring cover 300 .

And, when sealing the uniform gas combined air passage by the sealing member (such as a sealing ring), the sealing member only needs to seal the gap between the bottom surface of the upper ring cover 100 and the top surface of the middle ring cover 200, and the upper cover During the disassembly process, the seal is only squeezed by the opposite side plane, and will not be subjected to shear force due to friction with other structures in the squeezed state, which improves the convenience of sealing and disassembly of the upper cover, and prolongs the life of the seal. The service life of the seal in the upper cover is reduced.

In addition, when particles and other substances that need to be removed accumulate in the combined air channel of the uniform gas, it is only necessary to disassemble the upper ring cover 100, the middle ring cover 200 and the lower ring cover 300, and the combined air channel of the uniform gas can be corresponding to the upper ring cover. The groove structure on the bottom surface of 100 or the top surface of the middle ring cover 200 is directly exposed, so as to facilitate cleaning of these groove structures and improve the convenience of maintaining the overall structure.

As an optional embodiment of the present invention, the gas-homogenizing combined air channel may include at least two pole-dividing groove structures. Specifically, as shown in Fig. 3 and Fig. 4, each group of gas-homogenizing combined air channel includes: The first diversion groove 110 and the plurality of second diversion grooves 210 between the 100 and the middle ring cover 200, the inlet end of the first diversion groove 110 communicates with the air inlet hole, and the first diversion groove 110 has at least two Exhaust end, each exhaust end of the first flow guide groove 110 is correspondingly connected to the intake end of a second flow guide groove 210, and the second flow guide groove 210 is used to carry out the gas flowing into the second flow guide groove 210 again. shunt. Each second guide groove 210 has at least two exhaust ends, and the exhaust ends of the second guide groove 210 communicate with the gas injection holes.

In order to improve the utilization rate of the wall thickness of the upper ring cover 100 and the middle ring cover 200, as a preferred embodiment of the present invention, the first flow guide groove 110 and the second flow guide groove 210 can be respectively formed on the two opposite surfaces of the two ring covers above, specifically:

As shown in Fig. 3 and Fig. 4, a first diversion groove 110 is formed on the bottom surface of the upper ring cover 100; A plurality of second flow guide grooves 210 correspond to a plurality of middle cover through holes 220 one by one. The middle cover through holes 220 penetrate from the bottom of the corresponding second flow guide grooves 210 to the bottom surface of the middle ring cover 200, and the second flow guide grooves 210 communicates with the gas injection hole through the through hole 220 in the middle cover.

In the embodiment of the present invention, each first diversion groove 110 on the bottom surface of the upper ring cover 100 communicates with a plurality of second diversion grooves 210 on the top surface of the middle ring cover 200, and each first diversion groove 110 The process gas can be divided into a plurality of second diversion grooves 210 , and the process gas in each second diversion groove 210 can be divided into a plurality of through holes 220 in the middle cover. Therefore, after the process gas enters the first diversion groove 110 through the air inlet hole on the upper ring cover 100, it can go through at least two diversions and evenly flow through a plurality of middle cover through holes 220 to the lower ring cover 300, and then pass through The lower ring cover 300 sprays evenly to the edge area of the space above the carrier tray (ie achieves uniform edge air intake). And, the opening of the groove structure on the surface of each side can be closed by the surface of the opposite side, and cooperate with the seal to seal, that is, the first guide groove 110 is sealed by the top surface of the middle ring cover 200, the second The diversion groove 210 is sealed by the bottom surface of the upper ring cover 100, so in some embodiments of the present invention, the setting area of the first diversion groove 110 and the second diversion groove 210 can overlap, so that under the same wall thickness condition Accommodate more stages of diversion structures, improve the utilization rate of the wall thickness of the upper ring cover 100 and the middle ring cover 200 (in the case of the first diversion groove 110 or the second diversion groove 210 is a multi-stage diversion structure, the upper ring cover 100 and the The middle ring cover 200 can be provided with a multi-stage flow distribution structure, so that the number of flow distribution stages can exceed the maximum number of flow distribution stages accommodated on a single surface).

The embodiment of the present invention does not specifically limit how the first guide groove 110 is connected to the air intake hole on the upper ring cover 100. For example, the first guide groove 110 may extend to the edge of the bottom surface of the upper ring cover 100 and form an air intake hole. Alternatively, the air inlet extends inside the upper ring cover 100 to connect the first guide groove 110 with the opening on the side wall of the upper ring cover 100 .

In order to further improve the airtightness of the combined gas uniform air channel, preferably, as shown in Figures 1 to 4, the air inlet 120 directly penetrates the upper ring cover 100 along the thickness direction, and one end thereof corresponds to the first guide groove 110. At least one gas inlet 120 has an opening at the other end on the top surface of the upper ring cover 100 , and the gas inlet pipeline supplies process gas to the opening of the gas inlet hole on the top surface of the upper ring cover 100 .

In the embodiment of the present invention, each first diversion groove 110 communicates with the opening on the top surface of the upper ring cover 100 through the corresponding air inlet hole 120, so as to prevent the groove pattern on the bottom surface of the upper ring cover 100 from extending to the upper surface. The edge of the ring cover 100, and then when the uniform gas combined air passage is sealed, a seal (such as O type sealing ring), which improves the airtightness of the uniform air combination airway. Moreover, the diversion groove communicates with other spaces through the air intake hole 120 extending along the height direction and the through hole 220 of the middle cover, so that when maintaining the edge air intake components, it is convenient and quick to repair Grooves and hole structure for cleaning, improving the maintenance performance of edge intake components.

In order to further improve the uniformity of injecting process gas into the process chamber by multiple gas injection holes, preferably, as shown in Fig. The combined air channel and the jet holes communicate with each other through the annular air channel 320 .

In the embodiment of the present invention, an annular air passage 320 is formed between the lower ring cover 300 and the middle ring cover 200, so that when the gas source supplies process gas to the uniform gas combined The gas combination air channel is evenly injected into the annular air channel 320, and then enters the process chamber evenly through the multiple gas injection holes on the lower ring cover 300, so that the pressure of the process gas in different regions is balanced before the process gas enters the gas injection holes. The uniformity of injecting the process gas into the process chamber by the plurality of gas injection holes is further improved.

As an optional embodiment of the present invention, as shown in Fig. 3 and Fig. 4, the top surface of the lower ring cover 300 has an annular raised portion 310 surrounding the axis of the lower ring cover 300, and the inner side of the annular raised portion 310 The cylindrical surface is flat with the inner wall of the lower ring cover 300, and an annular groove is formed on the bottom surface of the middle ring cover 200, and the annular protrusion 310 is correspondingly arranged in the annular groove, and the top of the annular protrusion 310 is aligned with the ring groove. The bottom of the groove is in contact, and an annular air channel 320 is formed between the outer cylindrical surface of the annular protrusion 310 and the side wall of the annular groove. In the case where a plurality of middle cover through holes 220 are formed in the middle ring cover, the second guide groove 210 communicates with the annular air channel 320 through the plurality of middle cover through holes 220 .

In the embodiment of the present invention, the top surface of the lower ring cover 300 has an annular protrusion 310 that protrudes upward along the inner wall of the lower ring cover 300 , and the nozzles 400 are installed one by one on the holes that penetrate the annular protrusion 310 in the radial direction. In the multiple installation holes, when the gas source supplies the process gas to the uniform gas combination gas channel, the process gas flows into the through hole 220 of the middle cover from the second diversion groove 210 after being divided for many times, and is injected into the annular gas channel 320, and then The annular gas channel 320 flows into multiple gas injection holes and injects them into the process chamber, so that the pressure of the process gas in different areas is balanced before the process gas enters the gas injection holes, and the injection process of multiple gas injection holes into the process chamber is further improved. The homogeneity of the gas.

In order to further improve the uniformity of injecting process gas from multiple nozzles 400 into the process chamber, preferably, as shown in FIG. 9 and FIG. The positions (communication positions A to H) are arranged at equal intervals around the axis of the middle ring cover 200, and a plurality of middle cover through holes 220 are arranged at equal intervals around the axis of the middle ring cover 200; the communication positions correspond to the corresponding air inlet holes 120 The lengths of the shortest communication paths of the first flow guide grooves 110 are the same, and the lengths of the shortest communication paths of the plurality of middle cover through holes 220 and corresponding communication positions along the corresponding second flow guide grooves 210 are the same.

In the embodiment of the present invention, the plurality of communication positions and the plurality of middle cover through holes 220 are arranged at equal intervals in the circumferential direction, and the shortest paths between the plurality of communication positions and the corresponding air intake holes 120 are the same, and the plurality of middle cover through holes The shortest path between the hole 220 and the corresponding communication position is also the same, so the shortest air flow path length between the middle cover through holes 220 arranged at equal intervals in the circumferential direction and the corresponding air intake hole 120 is also the same, that is, the air flow is passed by the air intake hole. The lengths of paths flowing to the through holes 220 of the middle cover at various angles and flowing into the process chamber through the lower ring cover 300 are the same, thereby further ensuring the uniformity of process gas injected from the lower ring cover 300 into the process chamber.

The embodiment of the present invention does not specifically limit the outer contours of the cross-sections of the upper ring cover 100, the middle ring cover 200, and the lower ring cover 300. The cover 100, the middle ring cover 200 and the lower ring cover 300 (the outer contour) are all rectangular (or approximately rectangular, that is, the ridges of the ring cover corresponding to the four corners of the rectangle are rounded or chamfered), and the four corners of the upper ring cover 100 An air inlet 120 is respectively arranged on each end angle, and the gas-uniform combination air passage is divided into four groups, and the gas-distribution combination air passage and the air inlet 120 are provided in one-to-one correspondence.

In the embodiment of the present invention, the air intake holes 120 are arranged in the four corners, so that the area where the first flow guide groove 110 and the second flow guide groove 210 are arranged in the circumferential direction can be enlarged. And, when the upper ring cover 100, the middle ring cover 200 and the lower ring cover 300 are assembled with bolts, as shown in Figure 9 and Figure 10, the bolt holes can be arranged in the four corner areas (the four circles corresponding to the four corners of the approximate rectangular outline). holes), and the pin holes required for assembly can also be set in the four-corner area (before assembling the bolts, the cylindrical pins are sequentially passed through the pin holes in corresponding positions in multiple ring covers to ensure that the bolt holes of multiple ring covers aligned between).

The embodiment of the present invention does not specifically limit how to realize the same shortest path between multiple communication positions of the first guide groove 110 and the second guide groove 210 and the corresponding air inlet 120, for example, optionally, the first The diversion groove 110 includes multiple stages of upper arc-shaped grooves extending in the circumferential direction. The upper arc-shaped grooves of the same stage are arranged at intervals in the circumferential direction and have the same length. The arc-shaped grooves of different stages are radially staggered. Shaped groove communicates with air inlet 120 at the midpoint position, and in the upper arc-shaped groove beyond the last stage, the two ends of each upper arc-shaped groove respectively (through two upper connecting grooves 101) connect with the two ends of the next stage. The midpoint of the arc-shaped groove on the bar communicates with each other, and the two ends of the arc-shaped groove on the last stage communicate with the second diversion groove 210 .

That is, the arc-shaped slots on each level receive the process gas from the midpoint of the arc, and inject the gas into the two upper arc-shaped slots (or two second diversion slots 210 ) of the next level through the two ends of the slots. process gas, so that the number of branches of the process gas is doubled every time the process gas flows through the upper arc-shaped groove of the first stage. The number of 120 is multiplied by 2 to the power of the series of the upper arc grooves (that is, the number of the second diversion grooves 210 ).

Similarly, the second diversion groove 210 may also include multiple stages of lower arc-shaped grooves extending in the circumferential direction (as shown in FIG. The circumferential intervals between the lower arc grooves are arranged at the same length, and the radial staggers between the lower arc grooves of different stages. In the lower arc-shaped grooves other than the first level, the two ends of each lower arc-shaped groove communicate with the midpoint position of the two lower arc-shaped grooves of the next level (through two lower connecting grooves 201) respectively, and the last level of lower arc-shaped grooves Both ends of the arc-shaped groove communicate with the two through holes 220 of the middle cover respectively.

That is, the lower arc-shaped grooves of each stage receive the process gas from the midpoint of the arc, and inject the process gas into the two lower arc-shaped grooves (or two middle cover through holes 220) of the next stage through the two ends of the grooves. For gas, the number of branches of the process gas is doubled every time the process gas flows through the lower arc-shaped groove of the first stage. The number multiplied by 2 to the power of the lower arc groove series (that is, the number of through holes 220 in the middle cover).

The embodiment of the present invention does not specifically limit the extending direction of the upper connecting groove 101 and the lower connecting groove 201 , for example, as an optional embodiment of the present invention, the upper connecting groove 101 and the lower connecting groove 201 may extend radially.

In the case that the air intake hole 120 is arranged in the four-corner area, as a preferred embodiment of the present invention, the radius of the upper arc-shaped groove of the upper stage is greater than the radius of the upper arc-shaped groove of the lower stage, and the radius of the lower arc-shaped groove of the upper stage is larger than that of the lower stage. The radius of the arc groove, so that while keeping the air inlet 120 as a vertically extending hole (convenient for cleaning), the wall thickness of the upper ring cover 100 and the middle ring cover 200 is reasonably utilized, and more levels of upper ring cover can be set under the same wall thickness. The arc-shaped groove and the lower arc-shaped groove further improve the uniformity of air intake.

The embodiment of the present invention does not specifically limit the number of arc-shaped grooves in the first flow guide groove 110 and the second flow guide groove 210. For example, in some embodiments of the present invention, the first flow guide groove 110 and the second flow guide groove The slot 210 may only include one-stage arc-shaped slots.

For example, as an optional embodiment of the present invention, the first flow guide groove 110 includes only one level of upper arc-shaped grooves. Specifically, as shown in FIG. The lower arc-shaped grooves (the first-level lower arc-shaped grooves 211 and the second-level lower arc-shaped grooves 212), the lower arc-shaped grooves of the same level are arranged at circumferential intervals and have the same length, and the diameters between the lower arc-shaped grooves of different levels Staggered, the first level of the lower arc groove communicates with the first diversion groove 110 at the midpoint position, and in the lower arc grooves other than the last level, the two ends of each lower arc groove are respectively connected by two lower The groove 201 communicates with the midpoint of the two lower arc-shaped grooves of the next stage, and the two ends of the lower arc-shaped groove of the last stage communicate with the two through holes 220 of the middle cover respectively.

The first guide groove 110 includes an upper arc-shaped groove 111 extending in the circumferential direction. The upper arc-shaped groove 111 communicates with the air inlet 120 at the midpoint position. The arc-shaped groove 211 communicates.

As another optional embodiment of the present invention, the first diversion groove 110 includes only one level of upper arc-shaped grooves, and the second diversion groove 210 includes two stages of lower arc-shaped grooves. Specifically, as shown in FIG. 11 , The second guide groove 210 includes a plurality of first-level lower arc-shaped grooves 211 and a plurality of second-level lower arc-shaped grooves 212, and the plurality of first-level lower arc-shaped grooves 211 are arranged at circumferential intervals and have the same length. The two second-level lower arc-shaped grooves 212 are arranged at intervals in the circumferential direction and have the same length. The first-stage lower arc-shaped groove 211 and the second-stage lower arc-shaped groove 212 are radially staggered, and the first-stage lower arc-shaped groove 211 is at the midpoint position corresponding to the first guide groove 110 on the bottom surface of the upper ring cover communicated, and communicate with the midpoints of the two second-level lower arc-shaped grooves 212 through the two lower connecting grooves 201 at both ends. Both ends of the second-stage lower arc-shaped groove 212 communicate with the two through holes 220 of the middle cover respectively.

The embodiment of the present invention does not specifically limit how the first diversion groove 110 communicates with the corresponding second diversion groove 210. For example, in some embodiments of the present invention, the first diversion groove 110 is on the bottom surface of the upper ring cover 100 The projection of staggers with the projection of the second guide groove 210, and only overlaps at the communication position. For example, as shown in Figure 11 and Figure 12, the two ends of each upper arc-shaped groove 111 of the last stage communicate with the second diversion groove 210 through two upper connecting grooves 101 respectively, and connect with the last-stage upper arc-shaped groove 111. The two upper connecting grooves 101 connected to the two ends of the groove 111 overlap with the projection of the second guide groove 210 on the bottom surface of the upper ring cover 100 at the communication position (the upper ring cover 100 is not shown in the figure, only the upper ring cover 100 is shown The air intake hole 120 in the middle and the groove pattern at the bottom). That is, the upper arc-shaped grooves in the first flow guide groove 110 are all radially staggered from the lower arc-shaped grooves in the second flow guide groove 210, so that only the upper connecting groove 101 and the second flow guide groove 210 are projected to overlap. The locations are interconnected.

In order to improve the airtightness between the arc-shaped grooves and further ensure the uniformity of air intake, preferably, as shown in Figure 10 to Figure 12, the two ends of each upper arc-shaped groove in the last stage are respectively connected with the two first Corresponding to the midpoint position of the lower arc groove, a circumferentially extending annular separation groove 230 is also formed on the top surface of the middle ring cover 200, and a plurality of second guide grooves 210 are formed at the bottom of the annular separation groove 230, and the edge air intake The assembly also includes an annular partition 240, which is matched in the annular partition groove 230, and a plurality of connection through holes located in a plurality of communication positions are formed in the annular partition 240, and the second guide groove 210 passes through the connection through holes It communicates with the corresponding first diversion groove 110 .

It should be noted that the annular spacer 240 is preferably an elastic member, so that after the bottom surface of the upper ring cover 100 and the top surface of the middle ring cover 200 are pressed together, the annular spacer 240 can more closely align the arc groove under the action of elastic force. seal. In the embodiment of the present invention, the second flow guide groove 210 is covered by the annular partition 240, and the second flow guide groove 210 communicates with the corresponding first flow guide groove 110 through the connection through hole, thereby further improving the performance of the second flow guide groove. The airtightness between the lower arc-shaped grooves in the launder 210 .

And, in the case where the annular partition 240 is provided, preferably, as shown in FIG. 9 and FIG. The setting area of the arc-shaped groove coincides (that is, the projection area of the upper and lower arc-shaped grooves on the bottom surface of the upper ring cover can overlap), thereby further improving the utilization rate of the wall thickness of the upper ring cover 100 and the middle ring cover 200, and accommodating them under the same wall thickness. More levels of arc-shaped grooves (under the same wall thickness, the upper limit of the total number of arc-shaped grooves in the scheme where the setting area of the upper arc-shaped groove and the lower arc-shaped groove overlaps can be the radial staggering scheme of the upper arc-shaped groove and the lower arc-shaped groove Twice the upper limit of the total series of arc grooves).

In addition, the annular partition 240 can seal the upper arc-shaped groove and the lower arc-shaped groove at the same time, thereby further improving the airtightness of the uniform gas combination air channel and ensuring the uniformity of air intake.

In order to further improve the uniformity of intake air, preferably, as shown in FIGS. The process gas is received from the gas source, and the second end of the main intake pipe 510 communicates with the first end of at least one intake branch pipe 530 through the distribution box 520, and the second end of the intake branch pipe 530 communicates with the intake holes one by one.

In the embodiment of the present invention, the intake main pipe 510 in the intake pipeline is connected to a plurality of intake branch pipes 530 through a splitter box 520, that is, before the process gas enters the upper ring cover 100, it is divided into multiple streams, thereby further increasing the The number of diversions of the process gas further improves the uniformity of the intake air.

In order to further improve the uniformity of air intake, preferably, as shown in Figure 7 and Figure 8, the first end of the intake manifold 510 passes through the top wall of the distribution box 520 to communicate with the inside of the distribution box 520, and the side wall of the distribution box 520 The radial cross-sectional profile of the first end of the intake manifold 510 is a regular polygon (or an approximate regular polygon in the case of chamfers and rounded corners), and the axis of the first end of the intake manifold 510 passes through the geometric center of the regular polygon , the first ends of the plurality of intake branch pipes 530 pass through the side wall and communicate with the inside of the splitter box 520, and the connection positions of the first ends of the plurality of intake branch pipes 530 on the side wall are the same as those of the sides of the regular polygon. One to one correspondence.

In order to facilitate the assembly of the intake pipeline, preferably, the end of the intake manifold 510 and the intake branch pipe 530 used to connect with the splitter box 520 are of separate design, as shown in Figure 1, Figure 7, and Figure 8, the intake manifold 510 and the intake branch pipe 530 both include two separate pipelines, one end of which is connected to the distribution box 520 (that is, the pipeline shown in Figure 7 and Figure 8), and the other end is connected to the other pipeline through the air joint connection, the embodiment of the present invention does not specifically limit the type of the gas path connector, for example, the gas path connector may be a 1/4 inch gas path connector. One end of the other pipe is sealed and connected to the air inlet on the top surface of the upper ring cover 100 through an O-ring (O-Ring).

In the embodiment of the present invention, the intake main pipe 510 is connected to the cavity of the distribution box 520 by the top wall of the distribution box 520, and a plurality of intake branch pipes 530 are connected to the cavity by the side wall of the distribution box 520, and a plurality of side The distance between the wall and the first end of the intake manifold 510 is equal, so that after the process gas flows into the distribution box 520 along the intake manifold 510 from the second end of the intake manifold 510, it can flow into the distribution box 520 evenly along multiple different directions. The root air intake branch pipe 530 is evenly distributed to the plurality of air intake holes 120, which further improves the air intake uniformity.

The embodiment of the present invention does not specifically limit the structure of the distribution box 520. For example, optionally, the distribution box 520 includes a top cover 521 and a box body 522. The top cover 521 is used to seal the opening at the top of the box body 522. The top cover 521 is formed as The top wall of the distribution box 520 and the side wall of the box body 522 are formed as the side walls of the distribution box 520 . In order to ensure the airtightness of the distribution box 520, preferably, as shown in FIG. 8 , the top surface of the sealing box body 522 is formed with a top cover sealing groove surrounding the opening, and an annular seal is arranged in the top cover sealing groove (for example, can be is an O-ring).

In order to ensure the airtightness of the fluid passage in the upper cover, preferably, seals can also be used for sealing connection between the upper ring cover 100 and the middle ring cover 200 , and between the middle ring cover 200 and the lower ring cover 300 .

In order to improve the stability of the intake pipeline, preferably, as shown in FIG. Air port 501, the other end forms the edge air intake interface on the top surface of the upper ring cover 100, the air intake end of the air intake main pipe 510 is connected with the edge air intake interface, thereby fixing the air intake end of the air intake main pipe 510 by the upper ring cover 100 During the use of semiconductor process equipment, the gas source is connected to the edge air inlet 501 on the upper ring cover 100 through the corresponding pipeline. The stability of the road, thereby improving the uniformity and stability of the edge intake airflow.

Specifically, as shown in Fig. 4 and Fig. 5, a first annular sealing groove 231 and a second annular sealing groove 232 (Fig. Shown in Fig. 5 is that the first annular seal groove 231 is formed on the top surface of the middle ring cover 200, and the second annular seal groove 232 is formed on the situation on the bottom surface of the upper ring cover 100), the radius of the first annular seal groove 231 The radius of the second annular sealing groove 232 is smaller than the radius of the arc groove in the first flow guiding groove 110 and the second flow guiding groove 210 , and the radius of the second annular sealing groove 232 is larger than the radius of the arc groove in the first flow guiding groove 110 and the second flow guiding groove 210 . A third annular sealing groove 331 surrounding the axis of the middle ring cover 200 is formed on the top surface of the annular protrusion 310, and a third annular sealing groove 331 surrounding the axis of the lower ring cover 300 and having a radius greater than the maximum radius of the annular air channel 320 is formed on the top surface of the lower ring cover 300. The fourth annular sealing groove 332 . The first annular sealing groove 231 , the second annular sealing groove 232 , the third annular sealing groove 331 and the fourth annular sealing groove 332 are all provided with annular sealing elements (for example, O-rings).

As shown in Figure 4, the bottom surface of the upper ring cover 100 or the top surface of the middle ring cover 200 is formed with an inductive coil slot 233 surrounding the axis of the middle ring cover 200, and an inductive coil slot 233 is provided with an inductive coil for quick release The charge accumulated in the upper cover enhances the electrical connectivity between the various components of the edge intake assembly to maintain electrical connection to ground.

The embodiment of the present invention does not specifically limit the number of the intake branch pipe 530, the intake hole 120 and the first diversion groove 110, for example, when the outer contours of the upper ring cover 100, the middle ring cover 200 and the lower ring cover 300 are approximately square , optionally, as shown in Figures 1 to 12, the air intake pipeline includes four air intake branch pipes 530, and the upper ring cover 100 is respectively formed with four air intake holes 120 (inlet air holes 120-1, inlet air holes 120-1, air hole 120 - 2 , air inlet hole 120 - 3 and air inlet hole 120 - 4 ), and four first guide grooves 110 are formed on the bottom surface of the upper ring cover 100 correspondingly.

As shown in Figures 9 to 12, when the first guide groove 110 only includes one level of upper arc-shaped groove 111, the second guide groove 210 includes two levels of lower arc-shaped grooves (first-level lower arc-shaped groove 211 and During the second stage lower arc groove 212), 4 air inlets 120 (air inlet 120-1, air inlet 120-2, air inlet 120-3 and air inlet 120-4) pass through 4 respectively The second flow guide groove 210 communicates with the eight second flow guide grooves 210 at eight communication positions (communication positions A to H). The eight second diversion grooves 210 communicate with the lower annular gap through 32 middle cover through holes 220 respectively.

For example, FIG. 11 shows a schematic diagram of the flow direction of the airflow from the air intake hole 120-1 to the corresponding eight middle cover through holes 220. The arrows in FIGS. 1 After flowing into the upper arc-shaped groove 111, the flow is divided into two streams along the upper arc-shaped groove 111 and flows to two connected positions at both ends, that is, the connected position A and the connected position B, and then a flow of air flows from the connected position A into the second guide flow channel 210, and finally diverted to the four through-holes 220 (B-1, B-2, B-3, B-4) of the middle cover, and another air flow flows from the communication position B into another second diversion flow In the groove 210, the flow is finally divided into the four through holes 220 (A-1, A-2, A-3, A-4) of the middle cover, and the communication position A and the communication position B corresponding to the air inlet 120-1 The included angle between the lines of the projection of the axis of the upper cover on the horizontal plane is 45°, and the corresponding included angle is 90° in the area where the through-hole 220 of the middle cover that is connected finally is, that is, the four air inlets 120 respectively distribute the process gas evenly. The flow is divided into a quarter of the annular gap, and finally 360° uniform air intake is achieved.

As a second aspect of the present invention, a semiconductor process equipment is provided, including a process chamber, an edge inlet assembly and a carrier plate, the carrier tray is arranged in the process chamber, and the edge inlet assembly is arranged at the top opening of the process chamber , wherein the edge air intake assembly is the edge air intake assembly provided by the embodiment of the present invention.

In the semiconductor process equipment provided by the present invention, at least one group of uniform gas combined gas channels is formed between the upper ring cover 100 and the middle ring cover 200, and each group of uniform gas combined gas channels can divide the process gas introduced by an air inlet hole. to a plurality of spray holes and spray out, so as to spray evenly to the edge area of the space above the carrier tray through the lower ring cover 300 . The air-distribution combined air channel is located between the upper ring cover 100 and the middle ring cover 200, so that only the opposite surfaces of the upper ring cover 100 and the middle ring cover 200 need to be attached and fixed to assemble the air-distribution combined air channel, during the assembly process There is no chemical or physical reaction. Compared with the solution of welding multi-layer sub-channels in the prior art, the stability of the overall structure and the uniformity of the cross-section of the gas passage are improved, which can further ensure the uniformity of the process gas sprayed by the lower ring cover 300 .

And, when sealing the uniform gas combined air passage by the sealing member (such as a sealing ring), the sealing member only needs to seal the gap between the bottom surface of the upper ring cover 100 and the top surface of the middle ring cover 200, and the upper cover During the disassembly process, the seal is only squeezed by the opposite side plane, and will not be subjected to shear force due to friction with other structures in the squeezed state, which improves the convenience of disassembly and assembly of the upper cover seal and prolongs the service life of the seal. The service life of the seals in the upper cover.

In addition, when particles and other substances that need to be removed accumulate in the combined air channel of the uniform gas, it is only necessary to disassemble the upper ring cover 100, the middle ring cover 200 and the lower ring cover 300, and the combined air channel of the uniform gas can be corresponding to the upper ring cover. The groove structure on the bottom surface of 100 or the top surface of the middle ring cover 200 is directly exposed, so as to facilitate cleaning of these groove structures and improve the convenience of maintaining the overall structure.

As an optional embodiment of the present invention, as shown in Figure 1, Figure 2, Figure 5, and Figure 6, a central air inlet 603 is formed at the central position of the dielectric window 700, and the semiconductor process equipment also includes an intermediate air inlet pipeline 602 , for supplying process gas into the process chamber through the central inlet hole 603 .

In the embodiment of the present invention, the intermediate air intake pipeline supplies the process gas to the central area of the space above the carrier plate through the central air intake hole 603, and the edge air intake assembly provided in the embodiment of the present invention passes through the surrounding ring wall of the lower ring cover A plurality of gas injection holes provide process gas to the edge area of the space above the carrier plate, so as to realize the combination of intermediate air intake and edge air intake, and further improve the uniformity of the process gas intake in the process chamber.

In order to improve the stability of the middle air intake pipeline, preferably, as shown in Figure 1 and Figure 2, a corner of the upper ring cover 100 is also formed with an intermediate air intake channel, and one end of the middle air intake channel is on the side wall of the upper ring cover 100 The middle air inlet 601 is formed on the top, and the other end forms the middle air inlet interface on the top surface of the upper ring cover 100. The position of the air inlet end of the gas pipeline 602. During the use of semiconductor process equipment, the gas source is connected to the middle air inlet 601 on the upper ring cover 100 through the corresponding pipeline, and the disassembly process of the pipeline will not affect the middle air inlet pipeline. 602, thereby improving the stability of the middle intake pipeline, thereby improving the uniformity and stability of the middle intake airflow. For the convenience of pipeline arrangement, preferably, as shown in FIG. 1 and FIG. 2 , the middle air inlet 601 is adjacent to the edge air inlet 501 .

It can be understood that, the above embodiments are only exemplary embodiments adopted for illustrating the principle of the present invention, but the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also regarded as the protection scope of the present invention.

Claims (12)

1. An edge gas inlet assembly for disposing at a top opening of a process chamber and introducing process gas into the process chamber from an edge of the process chamber, the edge gas inlet assembly comprising: the upper ring cover, the middle ring cover and the lower ring cover are overlapped on the process chamber, at least one air inlet hole is formed in the upper ring cover, and the process gas is introduced into the air inlet hole through the air inlet pipeline; a plurality of gas injection holes are formed in the inner annular wall of the lower annular cover in an encircling manner and used for injecting the process gas into the process chamber;

at least one group of gas homogenizing combined air passages are formed between the upper ring cover and the middle ring cover, each group of gas homogenizing combined air passages are respectively communicated with one gas inlet hole and a plurality of gas ejecting holes, and the process gas introduced by the gas inlet holes is discharged from the plurality of gas ejecting holes through the gas homogenizing combined air passages.

2. The edge intake assembly of claim 1, wherein each set of the unified airway comprises:

the gas inlet end of the first diversion trench is communicated with the gas inlet hole, the first diversion trench is provided with at least two gas outlet ends, each gas outlet end of the first diversion trench is correspondingly connected with the gas inlet end of one second diversion trench, and the second diversion trenches are used for splitting the gas flowing into the second diversion trenches again;

each second diversion trench is provided with at least two exhaust ends, and the exhaust ends of the second diversion trenches are communicated with the gas injection holes.

3. The edge air inlet assembly according to claim 2, wherein the first guiding groove is formed on a bottom surface of the upper ring cover, the second guiding grooves are formed on a top surface of the middle ring cover, a plurality of middle cover through holes corresponding to the second guiding grooves are formed in the middle ring cover, the middle cover through holes penetrate through the bottom surface of the middle ring cover from the bottom of the corresponding second guiding groove, and the second guiding grooves are communicated with the air injection holes through the middle cover through holes.

4. The edge air intake assembly of claim 3, wherein the first guide groove comprises a plurality of stages of upper arc-shaped grooves extending in the circumferential direction, the upper arc-shaped grooves of the same stage are circumferentially spaced and have the same length, the upper arc-shaped grooves of different stages are radially staggered, the upper arc-shaped groove of the first stage is communicated with the air inlet hole at a midpoint position, in the upper arc-shaped grooves except for the last stage, two ends of each upper arc-shaped groove are respectively communicated with the midpoint positions of the two upper arc-shaped grooves of the next stage, and two ends of the upper arc-shaped groove of the last stage are communicated with the second guide groove.

5. The edge air inlet assembly according to claim 4, wherein the second diversion trench includes a plurality of stages of lower arc-shaped trenches extending along the circumferential direction, the lower arc-shaped trenches of the same stage are circumferentially spaced and have the same length, the lower arc-shaped trenches of different stages are radially staggered, the lower arc-shaped trench of the first stage is communicated with the upper arc-shaped trench of the last stage at a midpoint position, in the lower arc-shaped trenches except for the last stage, two ends of each lower arc-shaped trench are communicated with midpoint positions of two lower arc-shaped trenches of the next stage, and two ends of the lower arc-shaped trench of the last stage are respectively communicated with the two middle cover through holes.

6. The edge intake assembly of claim 5, wherein both ends of each of the upper arc-shaped slots of the last stage are respectively communicated with the middle points of the lower arc-shaped slots of the first stage through two upper connecting slots.

7. The edge intake assembly of claim 5, wherein a circumferentially extending annular partition groove is formed on a top surface of the middle ring cover, a plurality of the second guide grooves are formed at a bottom of the annular partition groove, and the edge intake assembly further comprises an annular partition member fittingly disposed in the annular partition groove, a plurality of connecting through holes are formed in the annular partition member, and the second guide grooves communicate with the corresponding first guide grooves through the connecting through holes.

8. The edge intake assembly of any one of claims 1 to 7, wherein an annular air passage is formed between the lower ring cover and the middle ring cover, and the uniform gas combination air passage and the gas injection holes are communicated with each other through the annular air passage.

9. The edge intake assembly of claim 8, wherein the top surface of the lower ring cover has an annular protrusion surrounding the axis of the lower ring cover, and the inner cylindrical surface of the annular protrusion is flush with the inner wall of the lower ring cover, the bottom surface of the middle ring cover has an annular groove, the top surface of the lower ring cover is in contact with the bottom surface of the middle ring cover, the annular protrusion is correspondingly disposed in the annular groove, the top of the annular protrusion is in contact with the bottom of the annular groove, and the annular air passage is formed between the outer cylindrical surface of the annular protrusion and the side wall of the annular groove.

10. The edge intake assembly of claim 1, wherein the upper ring cover, the middle ring cover and the lower ring cover are rectangular, four corners of the upper ring cover are respectively provided with one air inlet, the air-homogenizing combined air passages are four groups, and the air-homogenizing combined air passages and the air inlets are arranged in a one-to-one correspondence manner.

11. The edge intake assembly of claim 1, wherein the intake conduit comprises an intake manifold, a splitter box, and a plurality of intake legs, wherein a first end of the intake manifold is configured to receive the process gas from the gas source, a second end of the intake manifold is in communication with a first end of at least one of the intake legs through the splitter box, and second ends of the intake legs are in one-to-one communication with the intake apertures.

12. Semiconductor processing equipment comprising a process chamber, an edge admission assembly and a carrier plate, the carrier plate being arranged in the process chamber, the edge admission assembly being arranged at a top opening of the process chamber, characterized in that the edge admission assembly is according to any one of claims 1 to 11.

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