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CN115767948B - High-density and low-stress integration method for MEMS inertial systems - Google Patents

High-density and low-stress integration method for MEMS inertial systems Download PDF

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CN115767948B
CN115767948B CN202211423053.5A CN202211423053A CN115767948B CN 115767948 B CN115767948 B CN 115767948B CN 202211423053 A CN202211423053 A CN 202211423053A CN 115767948 B CN115767948 B CN 115767948B
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CN115767948A (en
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尚克军
陈安升
扈光锋
侯凤霞
莫平
刘垒
袁书博
王康
林梦娜
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Beijing Automation Control Equipment Institute BACEI
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Abstract

本发明公开了MEMS惯性系统高密度低应力集成方法,其特征在于,电路板通过MEMS惯性仪表陶瓷管壳粘接在金属结构件上;粘胶的金属结构件表面通过喷砂打磨;电路板之间通过柔性线互联,柔性线通过胶粘固定于金属结构上;采用高温老化、快变温和随机振动方法加速应力释放。本发明在保证集成度的条件下,降低了集成应力,并减少了变温、振动以及长时间使用过程中的应力变化带来的微机电惯性仪表参数变化。

The invention discloses a high-density and low-stress integration method for a MEMS inertial system. It is characterized in that the circuit board is bonded to the metal structural part through the MEMS inertial instrument ceramic tube shell; the surface of the glued metal structural part is polished by sandblasting; They are interconnected through flexible lines, which are fixed on the metal structure through adhesive; high-temperature aging, rapid temperature change, and random vibration methods are used to accelerate stress release. The present invention reduces integration stress while ensuring the degree of integration, and reduces changes in micro-electromechanical inertial instrument parameters caused by temperature changes, vibrations, and stress changes during long-term use.

Description

MEMS惯性系统高密度低应力集成方法High-density and low-stress integration method for MEMS inertial systems

技术领域Technical field

本成果属于惯性技术领域,涉及一种MEMS惯性系统高密度低应力集成方法。This achievement belongs to the field of inertial technology and involves a high-density and low-stress integration method for MEMS inertial systems.

背景技术Background technique

基于微机电惯性仪表的惯性测量单元、惯性导航系统均属于微机电惯性系统,微机电惯性系统具有体积小、重量轻、功耗低、价格低等优势,在无人车、无人机、机器人、制导弹药等领域应用越来越广泛,目前,随着微机电惯性仪表精度的不断提高,且仪表形态逐步向芯片化发展,微机电惯性系统越来越多的采用电路板焊接微机电惯性仪表芯片的形式进行集成,但是电路板的集成应力较大,且随着外部变温、振动,电路板的集成应力随着发生变化,最终传递到微机电惯性仪表芯片,导致微机电惯性仪表精度下降,综合性能退化。Inertial measurement units and inertial navigation systems based on microelectromechanical inertial instruments are all microelectromechanical inertial systems. Microelectromechanical inertial systems have the advantages of small size, light weight, low power consumption, and low price. They are widely used in unmanned vehicles, drones, and robots. , guided munitions and other fields are becoming more and more widely used. At present, with the continuous improvement of the accuracy of MEMS inertial instruments and the gradual development of instrument forms towards chip-based MEMS inertial systems, more and more MEMS inertial systems use circuit board welding MEMS inertial instruments. It is integrated in the form of a chip, but the integrated stress of the circuit board is relatively large. As the external temperature changes and vibrates, the integrated stress of the circuit board changes and is eventually transferred to the MEMS inertial instrument chip, resulting in a decrease in the accuracy of the MEMS inertial instrument. Overall performance degradation.

发明内容Contents of the invention

针对电路板集成应力较大,导致微机电惯性仪表精度下降问题,本发明目的在于提供一种MEMS惯性系统高密度低应力集成方法,在保证集成度的条件下,降低集成应力,并减少变温、振动以及长时间使用过程中的应力变化带来的微机电惯性仪表参数变化。In view of the problem that the integrated stress of the circuit board is large, resulting in a decrease in the accuracy of the micro-electromechanical inertial instrument, the purpose of the present invention is to provide a high-density and low-stress integration method for the MEMS inertial system, which can reduce the integration stress and reduce temperature changes and temperature changes while ensuring the degree of integration. Changes in MEMS inertial instrument parameters caused by vibration and stress changes during long-term use.

为实现本发明目的,本发明提供的MEMS惯性系统高密度低应力集成方法采取技术方案如下:In order to achieve the purpose of the present invention, the high-density and low-stress integration method of the MEMS inertial system provided by the present invention adopts the following technical solutions:

电路板通过MEMS惯性仪表陶瓷管壳粘接在金属结构件上;粘胶的金属结构件表面通过喷砂打磨;电路板之间通过柔性线互联,柔性线通过胶粘固定于金属结构上;采用高温老化、快变温和随机振动方法加速应力释放。The circuit board is bonded to the metal structure through the ceramic shell of the MEMS inertial instrument; the surface of the bonded metal structure is polished by sandblasting; the circuit boards are interconnected by flexible wires, and the flexible wires are fixed to the metal structure by gluing; high temperature aging, fast temperature change and random vibration methods are used to accelerate stress release.

优选地,所述MEMS惯性仪表陶瓷管壳与金属结构之间采用硅橡胶固定,通过定量法控制胶厚度,胶厚度控制在100μm~300μm。Preferably, silicone rubber is used to fix the ceramic shell of the MEMS inertial instrument and the metal structure, and the glue thickness is controlled through a quantitative method, and the glue thickness is controlled between 100 μm and 300 μm.

优选地,喷砂为60目~150目。Preferably, the sandblasting range is 60 mesh to 150 mesh.

优选地,电路板厚度控制在1.0mm~1.6mm。Preferably, the thickness of the circuit board is controlled between 1.0mm and 1.6mm.

优选地,所述高温老化应力释放,高温老化时间24h~72h,老化温度80℃~90℃。Preferably, the high-temperature aging stress is released, the high-temperature aging time is 24h-72h, and the aging temperature is 80°C-90°C.

优选地,所述快变温应力释放,每个快变温循环为:高温70℃~90℃,保温1h~3h,以-5℃/min~-10℃/min降温,降至低温-40℃~-45℃,保温1h~3h,以5℃/min~10℃/min升温至高温70℃~90℃;以此循环8~12个完成快变温应力释放。Preferably, the rapid temperature change stress is released, and each rapid temperature change cycle is: high temperature 70°C to 90°C, heat preservation for 1h to 3h, cooling at -5°C/min to -10°C/min, and cooling to a low temperature of -40°C to -45℃, keep the temperature for 1h~3h, raise the temperature to the high temperature of 70℃~90℃ at 5℃/min~10℃/min; cycle this for 8~12 times to complete the rapid temperature stress release.

优选地,所述随机振动应力释放,振动谱型为:80Hz~350Hz范围内功率谱密度为0.01g2/Hz~0.08g2/Hz,20Hz~80Hz范围内功率谱密度为+3dB/Oct,350Hz~2000Hz范围内功率谱密度为-3dB/Oct,振动均方根量级为6.06g,振动时间为3min~10min。Preferably, the random vibration stress is released, and the vibration spectrum type is: the power spectral density in the range of 80Hz ~ 350Hz is 0.01g 2 /Hz ~ 0.08g 2 /Hz, and the power spectral density in the range of 20Hz ~ 80Hz is +3dB/Oct, The power spectral density in the range of 350Hz to 2000Hz is -3dB/Oct, the vibration root mean square magnitude is 6.06g, and the vibration time is 3min to 10min.

与现有技术对比,本发明有益效果如下:Compared with the existing technology, the beneficial effects of the present invention are as follows:

本发明通过惯性仪表陶瓷管壳胶粘固定在金属结构上隔离安装应力;通过粘接结构喷砂、电路板轻量化、柔性电气互联及固定等方法,降低变温、振动等条件下的集成应力变化,提高微机电惯性仪表参数稳定性;通过高温老化、快变温以及随机振动进行集成应力释放,减少长期使用过程中胶粘等集成应力释放带来的微机电惯性仪表参数变化,提高微机电惯性系统的力热环境适应性以及长期稳定性。The present invention isolates installation stress by gluing and fixing the ceramic tube shell of the inertial instrument on the metal structure; reduces integrated stress changes under conditions such as temperature change and vibration, and improves parameter stability of the micro-electromechanical inertial instrument through methods such as sandblasting of the bonding structure, lightweight circuit boards, and flexible electrical interconnection and fixation; releases integrated stress through high-temperature aging, rapid temperature changes, and random vibrations, reduces parameter changes of the micro-electromechanical inertial instrument caused by integrated stress release such as gluing during long-term use, and improves the mechanical and thermal environment adaptability and long-term stability of the micro-electromechanical inertial system.

附图说明Description of drawings

所包括的附图用来提供对本发明实施例的进一步的理解,其构成了说明书的一部分,用于例示本发明的实施例,并与文字描述一起来阐释本发明的原理。显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。The accompanying drawings are included to provide a further understanding of the embodiments of the invention, and constitute a part of this specification, illustrate embodiments of the invention and together with the description, serve to explain the principles of the invention. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without exerting creative efforts.

图1示出了根据本发明的具体实施例提供的MEMS陀螺仪、MEMS加速度计的布局示意图。Figure 1 shows a schematic layout diagram of a MEMS gyroscope and a MEMS accelerometer provided according to a specific embodiment of the present invention.

图2示出了根据本发明的具体实施例提供的MEMS陀螺仪的陶瓷管壳和MEMS加速度计的陶瓷管壳通过胶粘接在结构件上的示意图。FIG. 2 is a schematic diagram showing a ceramic tube shell of a MEMS gyroscope and a ceramic tube shell of a MEMS accelerometer bonded to a structural member by adhesive according to a specific embodiment of the present invention.

图3示出了根据本发明的具体实施例提供的结构件粘接面喷砂位置示意图。FIG. 3 is a schematic diagram showing the sandblasting positions of the bonding surface of a structural component according to a specific embodiment of the present invention.

图4示出了根据本发明的具体实施例提供的应力释放前后MEMS陀螺仪变温输出对比曲线。Figure 4 shows the MEMS gyroscope temperature change output comparison curve before and after stress release according to a specific embodiment of the present invention.

1、X轴MEMS陀螺,2、Z轴MEMS陀螺,3X轴MEMS加速度计,4Y轴MEMS陀螺,5Y轴MEMS加速度计,6、Z轴加速度计,7~10陀螺仪和加速度计与结构粘胶的位置,11、结构喷砂位置。1, position, 11. Structural sandblasting position.

具体实施方式Detailed ways

需要说明的是,在不冲突的情况下,本申请中的实施例及实施例中的特征可以相互组合。下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。以下对至少一个示例性实施例的描述实际上仅仅是说明性的,决不作为对本发明及其应用或使用的任何限制。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。It should be noted that, as long as there is no conflict, the embodiments and features in the embodiments of this application can be combined with each other. The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, rather than all the embodiments. The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the invention, its application or uses. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without making creative efforts fall within the scope of protection of the present invention.

作为本发明实施例提出的一种MEMS惯性系统高密度低应力集成方法,具体如下:As an embodiment of the present invention, a high-density and low-stress integration method for MEMS inertial systems is proposed, specifically as follows:

MEMS惯性系统集成了3个MEMS陀螺仪和3个MEMS加速度计,6只MEMS惯性仪表焊接在3个至6个电路板上,电路板的固定方式是通过MEMS惯性仪表陶瓷管壳粘接在结构件上,防止胶粘应力传递至MEMS惯性仪表的敏感结构,相对于传统的印制板粘胶或者螺钉固定,集成应力传递大幅降低。MEMS惯性仪表陶瓷管壳与金属结构之间采用硅橡胶固定,为了避免胶太薄在振动过程中出现惯性仪表与结构件碰撞,胶过厚在变温条件下惯性仪表的安装误差大,正交性下降,导致系统精度下降,通过定量法控制胶厚度,胶厚度控制在100μm~300μm。The MEMS inertial system integrates 3 MEMS gyroscopes and 3 MEMS accelerometers. 6 MEMS inertial instruments are welded on 3 to 6 circuit boards. The circuit boards are fixed by bonding the MEMS inertial instrument ceramic tube shell to the structure. On the components, the adhesive stress is prevented from being transmitted to the sensitive structure of the MEMS inertial instrument. Compared with the traditional printed board adhesive or screw fixation, the integrated stress transmission is greatly reduced. Silicone rubber is used to fix the ceramic shell of the MEMS inertial instrument and the metal structure. In order to avoid the collision between the inertial instrument and the structural parts during vibration if the glue is too thin, and the glue is too thick, the installation error of the inertial instrument will be large under variable temperature conditions and the orthogonality will be affected. Decrease, resulting in a decrease in system accuracy. The glue thickness is controlled through a quantitative method, and the glue thickness is controlled between 100 μm and 300 μm.

结构无喷砂粘胶条件下按照应力释放后进行变温试验,粘胶位置有脱胶现象,MEMS陀螺输出跳变;为了提高胶与金属结构局部粘接可靠性,降低胶粘局部脱落带来的应力变化,粘胶的金属结构表面通过喷砂打磨,喷砂为60目~150目,粘接后再按照应力释放后进行变温试验,MEMS陀螺输出跳变消失。Under the condition of no sandblasting adhesive on the structure, a temperature change test was conducted after stress release. There was degumming at the adhesive position, and the MEMS gyro output jumped; in order to improve the reliability of the local bonding between the adhesive and the metal structure and reduce the stress caused by the local detachment of the adhesive. Change, the surface of the adhesive metal structure is sandblasted with 60 mesh to 150 mesh. After bonding, a temperature change test is performed after the stress is released. The MEMS gyro output jump disappears.

电路板及电路板之间的电气互联会将应力传递至MEMS惯性仪表,为了降低变温、振动等条件下的应力传递,电路板厚度控制在1.0mm~1.6mm,电路板之间通过柔性线互联,柔性线通过胶粘固定于金属结构上。The circuit board and the electrical interconnection between the circuit boards will transmit stress to the MEMS inertial instrument. In order to reduce the stress transmission under conditions such as temperature changes and vibration, the thickness of the circuit board is controlled between 1.0mm and 1.6mm, and the circuit boards are interconnected through flexible wires. , the flexible wire is fixed to the metal structure through adhesive.

胶粘等集成带来的集成应力会在使用过程中逐步释放,为了加速应力释放,采用一套应力释放工艺。具体为:The integrated stress caused by integration such as gluing will be gradually released during use. In order to accelerate the stress release, a set of stress release processes are adopted. Specifically:

①高温老化应力释放,高温老化时间24h~72h,老化温度80℃~90℃;①High temperature aging stress release, high temperature aging time 24h~72h, aging temperature 80℃~90℃;

②快变温应力释放,每个快变温循环为:高温70℃~90℃,保温1h~3h,以-5℃/min~-10℃/min降温,降至低温-40℃~-45℃,保温1h~3h,以5℃/min~10℃/min升温至高温70℃~90℃;以此循环8~12个完成快变温应力释放;② Rapid temperature change stress release, each rapid temperature change cycle is: high temperature 70℃ ~ 90℃, heat preservation for 1h ~ 3h, cooling at -5℃/min ~ -10℃/min, to low temperature -40℃ ~ -45℃, Keep the temperature for 1h to 3h, then raise the temperature to a high temperature of 70℃ to 90℃ at a rate of 5℃/min to 10℃/min; cycle this for 8 to 12 times to complete the rapid temperature stress release;

③随机振动应力释放,振动谱型为:80Hz~350Hz范围内功率谱密度0.01g2/Hz~0.08g2/Hz,20Hz~80Hz范围内功率谱密度为+3dB/Oct,350Hz~2000Hz范围内功率谱密度-3dB/Oct,振动均方根量级为6.06g,振动时间为3min~10min。③ Random vibration stress release, the vibration spectrum type is: power spectral density 0.01g 2 /Hz ~ 0.08g 2 /Hz in the range of 80Hz ~ 350Hz, power spectral density + 3dB/Oct in the range of 20Hz ~ 80Hz, and power spectrum density in the range of 350Hz ~ 2000Hz The power spectral density is -3dB/Oct, the vibration root mean square magnitude is 6.06g, and the vibration time is 3min~10min.

下面结合一型微机电惯性测量单元对本发明方法进一步进行说明。The method of the present invention will be further described below in conjunction with a microelectromechanical inertial measurement unit.

所述微机电惯性测量单元采用一体化集成电路、内凹结构、胶粘工艺以及应力释放工艺,具体为:The microelectromechanical inertial measurement unit adopts an integrated integrated circuit, a concave structure, an adhesive process and a stress relief process, specifically:

MEMS惯性测量单元集成了3个MEMS陀螺仪(包括X轴MEMS陀螺1、Y轴MEMS陀螺4、Z轴MEMS陀螺2)和3个MEMS加速度计(X轴MEMS加速度计3、Y轴MEMS加速度计5、Z轴MEMS加速度计6),6只MEMS惯性仪表焊接在3个至6个电路板上,MEMS陀螺仪和MEMS加速度计布局如附图1。电路板通过MEMS惯性仪表陶瓷管壳粘接在结构件上,陀螺仪和加速度计与结构粘胶的位置7~10如附图2所示。MEMS惯性仪表陶瓷管壳与金属结构之间采用硅橡胶固定,胶厚度控制在200μm。The MEMS inertial measurement unit integrates 3 MEMS gyroscopes (including 5. Z-axis MEMS accelerometer 6), 6 MEMS inertial instruments are welded on 3 to 6 circuit boards. The layout of the MEMS gyroscope and MEMS accelerometer is as shown in Figure 1. The circuit board is bonded to the structural part through the MEMS inertial instrument ceramic shell. The positions 7 to 10 of the gyroscope and accelerometer bonded to the structure are shown in Figure 2. The ceramic shell of the MEMS inertial instrument and the metal structure are fixed with silicone rubber, and the thickness of the glue is controlled at 200 μm.

粘胶的金属结构表面通过喷砂打磨,如附图3,喷砂为80目。The surface of the adhesive metal structure is polished by sandblasting, as shown in Figure 3, and the sandblasting is 80 mesh.

电路板厚度为1.0mm,电路板之间通过柔性线互联,柔性线通过胶粘固定于金属结构上。通过上述低应力集成方式,微机电惯测体积减少至40cm3以下The thickness of the circuit board is 1.0mm. The circuit boards are interconnected through flexible lines, and the flexible lines are fixed on the metal structure through adhesive. Through the above-mentioned low-stress integration method, the MEMS inertial measurement volume is reduced to less than 40cm3

为了加速应力释放,采用应力释放工艺。具体为:In order to accelerate stress relief, a stress relief process is used. Specifically:

①高温老化应力释放,高温老化时间48h,老化温度80℃;①High temperature aging stress release, high temperature aging time 48h, aging temperature 80℃;

②快变温应力释放,每个快变温循环为:高温80℃,保温2h,以-5℃/min降温,降至低温-45℃,保温2h,以10℃/min升温至高温80℃;以此循环10个完成快变温应力释放;② Rapid temperature change stress release, each rapid temperature change cycle is: high temperature 80℃, holding for 2 hours, cooling at -5℃/min, lowering to low temperature -45℃, holding for 2h, heating at 10℃/min to high temperature of 80℃; 10 cycles of this cycle complete rapid temperature stress release;

③随机振动应力释放,振动谱型为:80Hz~350Hz范围内功率谱密度0.04g2/Hz,20Hz~80Hz范围内功率谱密度为+3dB/Oct,350Hz~2000Hz范围内功率谱密度-3dB/Oct,振动均方根量级为6.06g,振动时间为5min。③ Random vibration stress release, vibration spectrum type: power spectral density in the range of 80Hz ~ 350Hz is 0.04g 2 /Hz, power spectrum density in the range of 20Hz ~ 80Hz is +3dB/Oct, power spectrum density in the range of 350Hz ~ 2000Hz -3dB/ Oct, the vibration root mean square magnitude is 6.06g, and the vibration time is 5min.

通过上述应力释放,微机电惯测陀螺变温零偏稳定性提高80%以上,如附图4所示为应力释放前后MEMS陀螺仪变温输出对比,其中图4(a)为应力释放前陀螺变温输出曲线,图4(b)为应力释放后陀螺变温输出曲线。Through the above stress release, the temperature-variable zero-bias stability of the MEMS gyroscope is improved by more than 80%. As shown in FIG4 , a comparison of the temperature-variable output of the MEMS gyroscope before and after the stress release is shown, wherein FIG4(a) is the temperature-variable output curve of the gyroscope before the stress release, and FIG4(b) is the temperature-variable output curve of the gyroscope after the stress release.

因此,本发明提出一种MEMS惯性系统高密度低应力集成,在保证集成度的条件下,降低了集成应力,并减少变温、振动以及长时间使用过程中的应力变化带来的微机电惯性仪表参数变化,提高了微机电惯性系统的力热环境适应性以及长期稳定性。Therefore, the present invention proposes a high-density and low-stress integration of a MEMS inertial system, which reduces the integration stress while ensuring the integration level, and reduces the micro-electromechanical inertial instrumentation caused by temperature changes, vibrations, and stress changes during long-term use. Parameter changes improve the mechanical and thermal environment adaptability and long-term stability of the MEMS inertial system.

最后应说明的是:以上实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的精神和范围。Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that it can still be used Modifications are made to the technical solutions described in the foregoing embodiments, or equivalent substitutions are made to some of the technical features; however, these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims (4)

  1. The high-density low-stress integration method of the MEMS inertial system is characterized in that 6 MEMS inertial instruments are welded on 3 to 6 circuit boards, the circuit boards are bonded on a metal structural member through an MEMS inertial instrument ceramic shell through adhesive, and the surface of the glued metal structural member is polished through sand blasting;
    the circuit boards are interconnected through flexible wires, and the flexible wires are fixed on the metal structural member through gluing;
    the circuit boards are electrically interconnected to transfer stress to the MEMS inertial instrument, and the method adopts high-temperature aging stress release, rapid temperature change stress release and random vibration stress release and comprises the following steps:
    the high-temperature aging stress is released, the high-temperature aging time is 24-72 hours, and the aging temperature is 80-90 ℃;
    the rapid temperature change stress release is carried out, and each rapid temperature change cycle is as follows: maintaining the temperature at 70-90 ℃ for 1-3 h, cooling at-5 ℃/min to-10 ℃/min, cooling to low temperature of-40-45 ℃, maintaining the temperature for 1-3 h, and heating to 70-90 ℃ at 5 ℃/min to 10 ℃/min; the rapid temperature-changing stress release is completed by 8 to 12 cycles;
    the random vibration stress is released, and the vibration spectrum type is as follows: the power spectral density is 0.01g within the range of 80 Hz-350 Hz 2 /Hz~0.08g 2 The power spectral density in the range of 20 Hz-80 Hz is +3dB/Oct, the power spectral density in the range of 350 Hz-2000 Hz is-3 dB/Oct, the vibration root mean square magnitude is 6.06g, and the vibration time is 3-10 min.
  2. 2. The method for integrating the high-density and low-stress of the MEMS inertial system according to claim 1, wherein the ceramic tube shell of the MEMS inertial instrument is fixed with the metal structural part by adopting silicon rubber, and the rubber thickness is controlled to be 100-300 μm by a quantitative method.
  3. 3. The method of claim 1, wherein the blasting is 60-150 mesh.
  4. 4. The method of claim 1, wherein the circuit board thickness is controlled between 1.0mm and 1.6mm.
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