CN115876363A - Method and device for evaluating static stress state of shim strips in magnetic resonance system - Google Patents
Method and device for evaluating static stress state of shim strips in magnetic resonance system Download PDFInfo
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Abstract
本公开涉及一种用于评估匀场条在磁共振系统中静态受力状态的方法。匀场条具有沿其纵向方向设置的用于容纳匀场片的多个腔室,并且匀场条能够插入磁共振系统中以用于进行匀场操作。该方法包括:基于匀场条的每个腔室中针对匀场操作所需要容纳的匀场片的量,计算容纳有匀场片的各个腔室中的匀场片在磁场中的受力;基于各个腔室中的匀场片在磁场中的受力,计算各个腔室的横向侧壁的受力;以及基于各个腔室的横向侧壁的受力与相应阈值的比较,确定匀场条在磁共振系统中的静态受力状态。
The present disclosure relates to a method for evaluating the static stress state of a shim strip in a magnetic resonance system. The shim bar has a plurality of cavities arranged along its longitudinal direction for accommodating shim pieces, and the shim bar can be inserted into the magnetic resonance system for shimming operations. The method includes: calculating the force of the shims in each chamber containing the shims in the magnetic field based on the amount of shims that need to be accommodated in each chamber of the shims for the shimming operation; Based on the stress of the shims in each chamber in the magnetic field, calculate the force on the lateral sidewall of each chamber; and determine the shim bar based on the comparison of the force on the lateral sidewall of each chamber with the corresponding threshold Static force state in a magnetic resonance system.
Description
技术领域technical field
本公开涉及磁共振技术领域,特别是涉及一种用于评估磁共振系统中匀场条静态受力状态的方法、装置、磁共振系统、计算机可读存储介质以及计算机程序产品。The present disclosure relates to the field of magnetic resonance technology, in particular to a method, device, magnetic resonance system, computer-readable storage medium and computer program product for evaluating the static force state of a shim bar in a magnetic resonance system.
背景技术Background technique
磁共振成像(Magnetic Resonance Imaging,MRI)技术在医学诊断方面发挥着重要作用。磁共振成像技术不仅要求较高的恒定磁场,还要求恒定磁场有较高的均匀性。所谓的磁场均匀性是指在一定的容积范围内磁场强度的均一性,也就是单位面积内通过的磁力线数量的一致性。在磁共振成像的过程中,如果主磁场不均匀,可能导致产生的图像模糊或出现伪影。Magnetic Resonance Imaging (MRI) technology plays an important role in medical diagnosis. Magnetic resonance imaging technology not only requires a high constant magnetic field, but also requires a high uniformity of the constant magnetic field. The so-called uniformity of the magnetic field refers to the uniformity of the magnetic field intensity within a certain volume range, that is, the consistency of the number of magnetic force lines passing through a unit area. In the process of magnetic resonance imaging, if the main magnetic field is not uniform, it may cause blurred images or artifacts.
然而受磁体设计和制造工艺的限制以及周围环境的影响,磁共振的磁场可能无法达到符合要求的均匀性。为了提高磁场均匀性,需要对磁共振系统进行匀场操作,从而减少所生成的图像模糊或伪影。匀场操作是指调节磁场中某区间内磁场分布均匀性的操作过程。匀场方法可以包括被动匀场和主动匀场。被动匀场又被称为无源匀场,是在磁体的匀场孔内壁上添加专用的匀场片以使实际磁场变形,使得磁场更加接近所设计的磁场来达到所需的磁场均匀度。主动匀场又被称为有源匀场,是通过适当调整安装在磁共振系统中的匀场线圈阵列中各线圈的电流强度,使其周围的局部磁场发生变化来调节主磁场以提高磁场整体均匀性。However, due to the limitations of the magnet design and manufacturing process and the influence of the surrounding environment, the magnetic field of magnetic resonance may not be able to achieve the required uniformity. To improve magnetic field homogeneity, shimming of the magnetic resonance system is required to reduce the resulting image blur or artifacts. The shimming operation refers to the operation process of adjusting the uniformity of the magnetic field distribution in a certain interval of the magnetic field. Shimming methods may include passive shimming and active shimming. Passive shimming, also known as passive shimming, is to add special shims on the inner wall of the shimming hole of the magnet to deform the actual magnetic field, making the magnetic field closer to the designed magnetic field to achieve the required magnetic field uniformity. Active shimming, also known as active shimming, is to adjust the main magnetic field to improve the overall magnetic field by properly adjusting the current intensity of each coil in the shim coil array installed in the magnetic resonance system to change the local magnetic field around it. Uniformity.
在此部分中描述的方法不一定是之前已经设想到或采用的方法。除非另有指明,否则不应假定此部分中描述的任何方法仅因其包括在此部分中就被认为是现有技术。类似地,除非另有指明,否则此部分中提及的问题不应认为在任何现有技术中已被公认。The approaches described in this section are not necessarily approaches that have been previously conceived or employed. Unless otherwise indicated, it should not be assumed that any approaches described in this section are admitted to be prior art solely by virtue of their inclusion in this section. Similarly, issues mentioned in this section should not be considered to have been recognized in any prior art unless otherwise indicated.
发明内容Contents of the invention
根据本公开实施例的一方面,提出了一种用于评估匀场条在磁共振系统中静态受力状态的方法,其中,所述匀场条具有沿其纵向方向设置的用于容纳匀场片的多个腔室,并且所述匀场条能够插入所述磁共振系统中以用于进行匀场操作,所述方法包括:基于所述匀场条的每个腔室中针对所述匀场操作所需要容纳的匀场片的量,计算容纳有匀场片的各个腔室中的匀场片在磁场中的受力;基于所述各个腔室中的匀场片在磁场中的受力,计算所述各个腔室的横向侧壁的受力;以及基于所述各个腔室的横向侧壁的受力与相应阈值的比较,确定所述匀场条在所述磁共振系统中的静态受力状态。According to an aspect of an embodiment of the present disclosure, a method for evaluating the static stress state of a shim bar in a magnetic resonance system is proposed, wherein the shim bar has a structure along its longitudinal direction for accommodating a shim a plurality of chambers of the slice, and the shim bar can be inserted into the magnetic resonance system for shimming operation, the method includes: based on each chamber of the shim bar for the shim The amount of shims that need to be accommodated in the field operation, calculate the force of the shims in the magnetic field in each chamber containing the shims; Calculating the forces on the lateral side walls of the respective chambers; and determining the force of the shim strips in the magnetic resonance system based on the comparison of the forces on the lateral side walls of the respective chambers with corresponding thresholds Static stress state.
本公开实施例的另一方面,提出了一种用于评估匀场条在磁共振系统中静态受力状态的装置,其中,所述匀场条具有沿其纵向方向设置的用于容纳匀场片的多个腔室,并且所述匀场条能够插入所述磁共振系统中以用于进行匀场操作,所述装置包括:第一计算单元,所述第一计算单元被配置为基于所述匀场条的每个腔室中针对所述匀场操作所需要容纳的匀场片的量,计算容纳有匀场片的各个腔室中的匀场片在磁场中的受力;第二计算单元,所述第二计算单元被配置为基于所述各个腔室中的匀场片在磁场中的受力,计算所述各个腔室的横向侧壁的受力;以及确定单元,所述确定单元被配置为基于所述各个腔室的横向侧壁的受力与相应阈值的比较,确定所述匀场条在所述磁共振系统中的静态受力状态。In another aspect of the embodiments of the present disclosure, a device for evaluating the static stress state of a shim bar in a magnetic resonance system is proposed, wherein the shim bar has a structure along its longitudinal direction for accommodating a shim a plurality of chambers of the sheet, and the shimming strip can be inserted into the magnetic resonance system for shimming operation, the apparatus includes: a first computing unit configured to be based on the In each chamber of the shim bar, the amount of shims required for the shimming operation is calculated, and the force of the shims in each chamber containing the shims in the magnetic field is calculated; the second A calculation unit, the second calculation unit is configured to calculate the force on the lateral side walls of each chamber based on the force on the shims in the respective chambers in the magnetic field; and the determination unit, the The determining unit is configured to determine a static stress state of the shim bars in the magnetic resonance system based on a comparison of the stress on the lateral side walls of the respective chambers with a corresponding threshold.
根据本公开实施例的另一方面,提出了一种磁共振系统,包括:磁共振系统本体;至少一个匀场条,至少一个匀场条能够插入磁共振系统本体中;以及电子设备,电子设备包括:至少一个处理器;以及与至少一个处理器通信连接的存储器;其中,存储器存储有计算机程序,计算机程序在被至少一个处理器执行时实现根据本公开实施例的方法。According to another aspect of the embodiments of the present disclosure, a magnetic resonance system is proposed, including: a magnetic resonance system body; at least one shim bar, at least one shim bar can be inserted into the magnetic resonance system body; and electronic equipment, electronic equipment It includes: at least one processor; and a memory communicatively connected with the at least one processor; wherein, the memory stores a computer program, and the computer program implements the method according to the embodiment of the present disclosure when executed by the at least one processor.
根据本公开实施例的另一方面,提出了一种存储有计算机程序的非瞬时计算机可读存储介质,其中,所述计算机程序在被处理器执行时实现根据本公开实施例的方法。According to another aspect of the embodiments of the present disclosure, a non-transitory computer-readable storage medium storing a computer program is provided, wherein the computer program implements the method according to the embodiments of the present disclosure when executed by a processor.
根据本公开实施例的另一方面,提出了一种计算机程序产品,包括计算机程序,其中,所述计算机程序在被处理器执行时实现根据本公开实施例的方法。According to another aspect of the embodiments of the present disclosure, a computer program product is provided, including a computer program, wherein the computer program implements the method according to the embodiments of the present disclosure when executed by a processor.
应当理解,本部分所描述的内容并非旨在标识本公开的实施例的关键或重要特征,也不用于限制本公开的范围。本公开的其它特征将通过以下的说明书而变得容易理解。It should be understood that what is described in this section is not intended to identify key or important features of the embodiments of the present disclosure, nor is it intended to limit the scope of the present disclosure. Other features of the present disclosure will be readily understood through the following description.
附图说明Description of drawings
附图示例性地示出了实施例并且构成说明书的一部分,与说明书的文字描述一起用于讲解实施例的示例性实施方式。所示出的实施例仅出于例示的目的,并不限制权利要求的范围。在所有附图中,相同的附图标记指代类似但不一定相同的要素。The drawings exemplarily illustrate the embodiment and constitute a part of the specification, and together with the text description of the specification, serve to explain the exemplary implementation of the embodiment. The illustrated embodiments are for illustrative purposes only and do not limit the scope of the claims. Throughout the drawings, like reference numbers designate similar, but not necessarily identical, elements.
下面将通过参照附图详细描述本公开的实施例,使本领域的普通技术人员更清楚本公开的上述及其他特征和优点,附图中:Embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings, so that those of ordinary skill in the art will be more aware of the above-mentioned and other features and advantages of the present disclosure. In the accompanying drawings:
图1示出了根据本公开的实施例的可以在其中实施本文描述的各种方法的示例性磁共振系统的示意图;FIG. 1 shows a schematic diagram of an exemplary magnetic resonance system in which various methods described herein may be implemented, according to an embodiment of the present disclosure;
图2示出了根据本公开的实施例的可以在其中实施本文描述的各种方法的示例性匀场条和匀场片的示意图;2 shows a schematic diagram of exemplary shim strips and shims in which various methods described herein may be implemented, according to an embodiment of the present disclosure;
图3示出了根据本公开的实施例的用于评估磁共振系统中匀场条静态受力状态的方法的流程图;Fig. 3 shows a flow chart of a method for evaluating the static force state of a shim bar in a magnetic resonance system according to an embodiment of the present disclosure;
图4示出了根据本公开的实施例的可以在其中实施本文描述的各种方法的示例性匀场条的示意图;以及4 shows a schematic diagram of an exemplary shim strip in which various methods described herein may be implemented, according to an embodiment of the present disclosure; and
图5示出了根据本公开实施例的用于评估磁共振系统中匀场条静态受力状态的装置的框图。Fig. 5 shows a block diagram of an apparatus for evaluating a static force state of a shim bar in a magnetic resonance system according to an embodiment of the present disclosure.
具体实施方式Detailed ways
为了对本公开的技术特征、目的和效果有更加清楚的理解,现对照附图说明本公开的具体实施方式,在各图中相同的标号表示相同的部分。In order to have a clearer understanding of the technical features, purposes and effects of the present disclosure, the specific implementation manners of the present disclosure will now be described with reference to the accompanying drawings, and the same reference numerals in each of the drawings represent the same parts.
在本文中,“示意性”表示“充当实例、例子或说明”,不应将在本文中被描述为“示意性”的任何图示、实施方式解释为一种更优选的或更具优点的技术方案。In this article, "schematic" means "serving as an example, example or illustration", and any illustration or implementation described as "schematic" should not be interpreted as a more preferred or more advantageous Technical solutions.
为使图面简洁,各图中只示意性地表示出了与本公开相关的部分,它们并不代表其作为产品的实际结构。另外,以使图面简洁便于理解,在有些图中具有相同结构或功能的部件,仅示意性地绘示了其中的一个,或仅标出了其中的一个。In order to keep the drawings concise, each drawing only schematically shows the parts related to the present disclosure, and they do not represent the actual structure of the product. In addition, to make the drawings concise and easy to understand, in some drawings, only one of the components having the same structure or function is schematically shown, or only one of them is marked.
在本文中,“一个”不仅表示“仅此一个”,也可以表示“多于一个”的情形。在本文中,“第一”、“第二”等仅用于彼此的区分,而非表示它们的重要程度及顺序、以及互为存在的前提等。Herein, "a" not only means "only one", but also means "more than one". In this article, "first", "second" and so on are only used to distinguish each other, not to indicate their importance and order, and the premise of mutual existence.
图1示出了根据本公开的实施例的可以在其中实施本文描述的各种方法的示例性磁共振系统100的示意图。FIG. 1 shows a schematic diagram of an exemplary
如图1所示,磁共振系统100包括磁共振系统本体110和匀场条(shim tray)120。磁共振系统本体110能够产生磁场,磁场可以用于例如疾病诊断等。匀场条120能够例如沿着图示的箭头方向插入磁共振系统本体110上的匀场孔111中,以对磁共振系统100进行被动匀场操作。从图1中可以看出,磁共振系统100设置有围绕其轴线分布的多个匀场孔111,尽管图1中仅示出了一个匀场条120,应当理解的是,磁共振系统100还可以包括多个匀场条120,该多个匀场条120可以分别插入磁共振系统本体110上的相对应的匀场孔111中,以对磁共振系统100进行被动匀场操作。As shown in FIG. 1 , the
图2示出了根据本公开的实施例的可以在其中实施本文描述的各种方法的示例性匀场条120和匀场片130的示意图。FIG. 2 shows a schematic diagram of an
进一步参考图2,匀场条120沿着其长度方向可以设置有多个腔室121,每个腔室121之间由横向侧壁122隔开。腔室121用于容纳匀场片130。对于被动匀场而言,首先获得主磁场(即,磁共振系统本体110产生的磁场)的参数,所获得的参数中包含能够指示磁场不均匀性的参数。根据所述参数,可以计算每个腔室121内所需要加入的匀场片的量,从而在相应腔室121中放入匀场片130后,可以将装有匀场片130的匀场条120插入相应的匀场孔111内,并进行安装固定,以完成被动匀场操作。匀场片130可以含铁或含硅,例如,匀场片130可以是硅钢片。当装有匀场片130的匀场条120插入匀场孔111内后,匀场片130可以吸引主磁场的磁感线向需要的方向移动,从而保持主磁场的均匀的磁场分布。尽管图2中仅示出了一个匀场片130,应当理解的是,根据需要,一个腔室121中可以放入多个匀场片130。Referring further to FIG. 2 , the
放入磁场中的匀场片130会受到磁场力的作用,从而具备运动的趋势,但由于匀场片130容纳在腔室121中,其运动趋势受到横向侧壁122或底壁的阻挡,而会在腔室121中保持静止状态。然而,在一些情况中,根据所述参数计算得到的某个或某几个腔室121内所需要加入的匀场片130的量可能较大,因此,较大量的匀场片130在磁场力的作用下,其作用于各个壁、尤其是横向侧壁122的力相应地较大。由于匀场条120通常是由无磁性且质轻的塑料制成,其材料的强度可能无法承受较大的压力,可能会引起例如侧壁122受力过大而产生断裂。如果发生断裂,则可能导致整个匀场条120的损坏。操作人员因此需要重新对系统进行匀场操作,不仅极大地浪费人力物力,而且还会延误磁共振系统的正常工作流程。The
本公开实施例提供一种用于评估磁共振系统中匀场条静态受力状态的方法、装置、系统、计算机可读存储介质以及计算机程序产品。Embodiments of the present disclosure provide a method, device, system, computer-readable storage medium, and computer program product for evaluating a static stress state of a shim bar in a magnetic resonance system.
图3示出了根据本公开的实施例的用于评估磁共振系统中匀场条静态受力状态的方法300的流程图。Fig. 3 shows a flowchart of a
如图3所示,方法300包括步骤S310至步骤S330。As shown in FIG. 3 , the
在步骤S310,基于匀场条的每个腔室中针对匀场操作所需要容纳的匀场片的量,计算容纳有匀场片的各个腔室中的匀场片在磁场中的受力;In step S310, based on the amount of shims that need to be accommodated in each chamber of the shim for the shimming operation, the force of the shims in each chamber containing the shims in the magnetic field is calculated;
在步骤S320,基于每个腔室中的匀场片在磁场中的受力,计算所述各个腔室的横向侧壁的受力;以及In step S320, based on the force of the shims in each chamber in the magnetic field, calculate the force of the lateral side walls of each chamber; and
在步骤S330,基于所述各个腔室的横向侧壁的受力与相应阈值的比较,确定匀场条在磁共振系统中的静态受力状态。In step S330, based on the comparison between the force on the lateral side walls of the respective chambers and the corresponding threshold, determine the static force state of the shim bars in the magnetic resonance system.
进一步地,在一些实施例中,方法300中不仅包括计算所述各个腔室的横向侧壁的受力,还包括计算匀场条的用于将其固定至磁共振系统的固定端部的受力,即,方法300包括:Further, in some embodiments, the
基于匀场条的每个腔室中针对匀场操作所需要容纳的匀场片的量,计算容纳有匀场片的各个腔室中的匀场片在磁场中的受力;Based on the amount of shims that need to be accommodated in each chamber of the shims for the shimming operation, the force of the shims in each chamber containing the shims in the magnetic field is calculated;
基于每个腔室中的匀场片在磁场中的受力,计算所述各个腔室的横向侧壁的受力以及匀场条的用于将其固定至磁共振系统的固定端部的受力;以及Based on the force of the shims in each chamber in the magnetic field, the force of the lateral side walls of each chamber and the force of the shim bars for fixing them to the fixed ends of the magnetic resonance system are calculated. force; and
基于所述各个腔室的横向侧壁的受力和固定端部的受力与相应阈值的比较,确定匀场条在磁共振系统中的静态受力状态。Based on the comparison of the forces on the lateral side walls of the respective chambers and the forces on the fixed ends with corresponding thresholds, the static force states of the shim strips in the magnetic resonance system are determined.
通过计算每个腔室横向侧壁122的受力,必要时还计算匀场条120沿其纵向方向的用于将其固定至磁共振系统的固定端部123(图1中,端部123-1)的受力,并将它们与相应阈值进行比较,能够确定匀场条120的静态受力状态。由此,在确定针对匀场操作所需要在每个腔室121中配置的匀场片130的量后,可以先通过方法300对该配置下的匀场条120的静态受力状态进行评估,从而及时识别可能存在的匀场条120受力过大的情形,以便在将匀场条120插入匀场孔111之前,确定匀场条120的部分或整体是否可能发生断裂。因此,可以避免匀场条120损坏,不仅节省了人力物力,而且还保障了磁共振系统的正常工作流程。By calculating the force on the
其中,在步骤S310,所需要容纳的匀场片的量可以是所需要容纳的匀场片的体积。对于同一种材料的匀场片,其磁导率相同,匀场片的总体积越大,匀场片对主磁场的影响也相应地越大,并且匀场片所受到的磁场力也相应地越大。在一些实施例中,匀场片130是具有不同尺寸规格的匀场片。例如,一组匀场片130可以是具有同一长度和宽度尺寸、不同厚度尺寸的一组匀场片,匀场片130的长度和宽度尺寸可以对应于腔室121的长度和宽度尺寸,以方便地将匀场片130容纳在腔室121中。因此,所需要容纳的匀场片130的量可以是匀场条的每个腔室中针对匀场操作所需要容纳的匀场片130的总厚度。Wherein, in step S310, the amount of the shims to be accommodated may be the volume of the shims to be accommodated. For shims of the same material, their magnetic permeability is the same, the larger the total volume of the shim, the greater the influence of the shim on the main magnetic field, and the greater the magnetic field force on the shim. big. In some embodiments, the
此外,在步骤S310,计算容纳有匀场片的各个腔室121中的匀场片130在磁场中的受力包括计算匀场片130所受到的各个方向的磁场力。例如,可以基于已知的主磁场的磁场强度(或磁感应强度)、匀场片130的磁导率、以及每个腔室121中的匀场片130的体积,来计算匀场片130在各个方向受到的磁场力。进一步地,可以将各个方向受到的磁场力转换为径向方向和轴向方向的合力,并分别基于轴向方向的合力或径向方向的合力进行下一步计算。其中,轴向方向是指平行于磁共振系统100中心轴线的方向;径向方向是指垂直于磁共振系统100中心轴线的方向。In addition, in step S310 , calculating the force of the
下面将结合图4,进一步说明方法300。由于每个腔室121之间的横向侧壁122的强度通常弱于腔室121其他部位(例如底壁或沿匀场条长度方向延伸的侧壁)的强度,因此,在以下的示例计算过程中,仅考虑匀场片在轴向方向的合力,而不考虑匀场片在径向方向的合力。The
图4示出了根据本公开的实施例的可以在其中实施本文描述的各种方法的示例性匀场条420的示意图。其中,P01至P10表示沿着匀场条420的长度方向分布的10个腔室(pocket),每个腔室之间由W01至W09这九个横向侧壁(wall)分隔开。此外,W00表示匀场条420头部端部(靠近固定端部一侧)的横向侧壁;W10表示匀场条420尾部端部(远离固定端部一侧)的横向侧壁。在腔室P01至P10的一个或多个中,可以容纳一至多个匀场片(为了视图的简洁,图4中未示出匀场片)。FIG. 4 shows a schematic diagram of an
在一些实施例中,在步骤S310,计算容纳有匀场片的各个腔室中的匀场片在磁场中的受力包括:计算匀场片在磁共振系统100所产生的磁场中的受力。In some embodiments, in step S310, calculating the force of the shims in the magnetic field in each chamber containing the shims includes: calculating the force of the shims in the magnetic field generated by the
在已知磁共振系统100所产生的磁场的磁场强度(或磁感应强度)、匀场片的磁导率、以及每个腔室中的匀场片的量(例如匀场片厚度)的情况下,基于等式(1)至等式(3),可以计算匀场片在磁共振系统100所产生的磁场中的受力。When the magnetic field intensity (or magnetic induction intensity) of the magnetic field generated by the
对于等式(1):For equation (1):
其中,表示匀场条的每个腔室中单位厚度的匀场片在磁共振系统100自身磁体所产生的磁场中的受力,其单位是牛顿/毫米(N/mm);in, Represents the force of the shims per unit thickness in each chamber of the shims in the magnetic field generated by the
n表示匀场条中的腔室的数量,在图4所示的实施例中,n=10;n represents the number of chambers in the shim strip, in the embodiment shown in Figure 4, n=10;
a11至ann表示每个腔室中的单位厚度的匀场片在磁共振系统100自身产生的磁场中的受力,其中,a11至ann的取值与相应的腔室在磁场中的位置处的磁场强度以及容纳在其中的匀场片的磁导率有关;a 11 to a nn represent the force of the shims per unit thickness in each chamber in the magnetic field generated by the
因此,对于包含n个腔室的匀场条而言,可以表示成如等式(1)的矩阵形式。Therefore, for a shim strip containing n chambers, can be expressed in matrix form as in equation (1).
对于等式(2):For equation (2):
其中,HP表示匀场条的每个腔室中的匀场片的厚度,其单位是毫米(mm);Wherein, HP represents the thickness of the shim sheet in each chamber of the shim bar, and its unit is millimeter (mm);
n表示匀场条中的腔室的数量,在图4所示的实施例中,n=10;n represents the number of chambers in the shim strip, in the embodiment shown in Figure 4, n=10;
对于包含n个腔室的匀场条,HP可以表示成等式(2)的矩阵形式,其中,h1至hn分别表示第1个至第n个腔室中容纳的匀场片的总厚度。For a shim strip containing n chambers, H P can be expressed in the matrix form of equation (2), where h 1 to h n represent the shims contained in the 1st to nth chambers respectively Total thickness.
进一步地,可以通过等式(3)计算每个腔室中的匀场片在磁共振系统100所产生的磁场中的受力,其单位是牛顿(N):Further, the force of the shims in each chamber in the magnetic field generated by the
例如,当矩阵HP中的某个元素(例如h1)为0时,表示在该腔室(例如腔室P01)中,没有容纳匀场片。则针对腔室P01计算得到的匀场片在磁共振系统100所产生的磁场中所受的磁力为0。For example, when a certain element (eg h 1 ) in the matrix H P is 0, it means that no shim is accommodated in the chamber (eg chamber P01 ). Then the calculated magnetic force of the shim in the magnetic field generated by the
通过上述等式,可以计算得到容纳有匀场片的各个腔室中的匀场片在磁共振系统100所产生的磁场中的受力。Through the above equation, the force of the shims in each chamber containing the shims in the magnetic field generated by the
在一些实施例中,在步骤S310,计算容纳有匀场片的各个腔室中的匀场片在磁场中的受力还包括:计算匀场片130在相邻的至少一个腔室121中的匀场片所产生的磁场中的受力。In some embodiments, in step S310, calculating the force of the shims in the magnetic field in each chamber containing the shims further includes: calculating the force of the
由于匀场片130包含例如铁、硅等能够被磁化的物质,因此,当在匀场条实际被插入到磁共振系统100中时,磁共振系统100的磁场会将放入其中的匀场片磁化,从而使得匀场片130自身也产生了磁场。匀场片130所产生的磁场同样会对其附近腔室中的其他匀场片产生磁力作用。因此,将相邻的至少一个腔室121中的匀场片所产生的磁场也考虑在内,可以进一步对匀场片130受到的磁场力进行更加精确地评估。Since the
在一些实施例中,可以根据例如等式(4)计算单位厚度的匀场片在相邻的至少一个腔室中的单位厚度的匀场片所产生的磁场中的受力:In some embodiments, the force of the shims of unit thickness in the magnetic field generated by the shims of unit thickness in at least one adjacent chamber can be calculated according to, for example, equation (4):
其中,GP to P表示第i个腔室中单位厚度的匀场片产生的磁场对于第j个腔室中单位厚度的匀场片的力,其单位是牛顿/毫米(N/mm2);n表示匀场条中的腔室的数量,在图4所示的实施例中,n=10。Among them, G P to P represents the force of the magnetic field generated by the shim of unit thickness in the i-th chamber on the shim of unit thickness in the j-th chamber, and its unit is Newton/mm (N/mm 2 ) ; n represents the number of chambers in the shim strip, in the embodiment shown in FIG. 4 , n=10.
对于一个特定腔室,沿匀场条纵向方向与其前后相邻的两个腔室中的匀场片产生的磁场对该特定腔室中的匀场片的力较大,间隔较远的腔室中的匀场片产生的磁场对该特定腔室中的匀场片的力较小。For a specific chamber, the magnetic field generated by the shims in the two adjacent chambers along the longitudinal direction of the shim bar has a greater force on the shims in the specific chamber, and the farther apart the chamber The magnetic field generated by the shims in , exerts less force on the shims in that particular chamber.
在等式(4)中,b1,2至bn-1,n表示每个腔室中的单位厚度的匀场片在其前方相邻的第一个腔室中单位厚度的匀场片所产生的磁场中所受的磁力;In equation (4), b 1,2 to b n-1,n represent the shims of unit thickness in each chamber and the shims of unit thickness in the first adjacent chamber in front of it the magnetic force experienced in the resulting magnetic field;
b2,1至bn,n-1表示每个腔室中的单位厚度的匀场片在其后方相邻的第一个腔室中单位厚度的匀场片所产生的磁场中所受的磁力;b 2,1 to b n,n-1 represent the shims of unit thickness in each chamber that are subjected to the magnetic field generated by the shims of unit thickness in the first adjacent chamber behind it magnetic force;
c1,3至cn-2,n表示每个腔室中的单位厚度的匀场片在其前方相邻的第二个腔室中单位厚度的匀场片所产生的磁场中所受的磁力;以及c 1, 3 to c n-2, n represent that the shims of unit thickness in each chamber are subjected to the magnetic field generated by the shims of unit thickness in the second adjacent chamber in front of it magnetism; and
c3,1至cn,n-2表示每个腔室中的单位厚度的匀场片在其后方相邻的第二个腔室中单位厚度的匀场片所产生的磁场中所受的磁力。c 3,1 to c n,n-2 represent the shims of unit thickness in each chamber are subjected to the magnetic field generated by the shims of unit thickness in the second adjacent chamber magnetic force.
类似地,Z1,n表示每个腔室中的单位厚度的匀场片在其前方相邻的第n个腔室中单位厚度的匀场片所产生的磁场中所受的磁力;以及Similarly, Z 1, n represents the magnetic force experienced by the shims of unit thickness in each chamber in the magnetic field generated by the shims of unit thickness in the adjacent nth chamber in front of it; and
类似地,zn,1表示每个腔室中的单位厚度的匀场片在其后方相邻的第n个腔室中单位厚度的匀场片所产生的磁场中所受的磁力。Similarly, z n,1 represents the magnetic force experienced by the shims of unit thickness in each chamber in the magnetic field generated by the shims of unit thickness in the adjacent nth chamber behind it.
其中,b1,2至bn-1,n、b2,1至bn,n-1、c1,3至cn-2,n、c3,1至cn,n-2、zn,1、z1,n的取值与相应的腔室在磁场中的位置处的磁场强度以及容纳在其中的匀场片的磁导率有关。Among them, b 1,2 to b n-1,n , b 2,1 to b n,n-1 , c 1,3 to c n-2,n , c 3,1 to c n,n-2 , The values of z n,1 and z 1,n are related to the magnetic field intensity at the position of the corresponding chamber in the magnetic field and the magnetic permeability of the shims accommodated therein.
因此,对于包含n个腔室的匀场条而言,GP to P可以表示成如等式(4)的矩阵形式。Therefore, for a shim bar containing n chambers, G P to P can be expressed in a matrix form as in equation (4).
在一些实施例中,计算单位厚度的匀场片在相邻的至少一个腔室中的单位厚度的匀场片所产生的磁场中所受的力可以包括:计算单位厚度的匀场片在沿着匀场条长度方向前后相邻的各两个腔室中的单位厚度的匀场片所产生的磁场中的受力。即,可以将等式(4)中参数b至参数z中除了参数b和参数c之外的其他参数设置为0。In some embodiments, calculating the force experienced by the shims of unit thickness in the magnetic field generated by the shims of unit thickness in at least one adjacent chamber may include: calculating the force of the shims of unit thickness along the The force in the magnetic field generated by the shims of unit thickness in each of the two chambers adjacent to each other in the longitudinal direction of the shims. That is, parameters other than parameter b and parameter c among parameters b to z in equation (4) may be set to 0.
应当理解的是,虽然在上述计算过程,计算了单位厚度的匀场片在沿着匀场条纵向方向前后相邻的各两个腔室中的单位厚度的匀场片所产生的磁场中所受的磁力,但是,在一些实施例中,还可以计算单位厚度的匀场片在沿着匀场条纵向方向前后相邻的各一个腔室中的单位厚度的匀场片所产生的磁场中所受的磁力。在另外一些实施例中,还可以计算单位厚度的匀场片在沿着匀场条纵向方向前后相邻的各三个(或更多个)腔室中的单位厚度的匀场片所产生的磁场中所受的磁力,用于进一步精确计算匀场片所受的磁力,在此不再赘述。It should be understood that although in the above calculation process, the calculation of the shims of unit thickness in the magnetic field generated by the shims of unit thickness in the two chambers adjacent to each other along the longitudinal direction of the shim bar However, in some embodiments, the shims of unit thickness can also be calculated in the magnetic field generated by the shims of unit thickness in each chamber adjacent to each other along the longitudinal direction of the shim bar subjected to magnetic force. In some other embodiments, the shims of unit thickness produced by the shims of unit thickness in three (or more) chambers adjacent to each other along the longitudinal direction of the shim bar can also be calculated. The magnetic force in the magnetic field is used to further accurately calculate the magnetic force of the shims, which will not be repeated here.
进一步地,可以根据例如表达式(5)计算单位厚度的匀场片在与其相邻的至少一个腔室中的匀场片所产生的磁场中的受力,其单位是牛顿/毫米(N/mm):Further, the force of the shims per unit thickness in the magnetic field generated by the shims in at least one chamber adjacent to it can be calculated according to, for example, expression (5), and its unit is Newton/mm (N/ mm):
HP·IP T·GP to P (5)H P · I P T · G P to P (5)
其中,HP表示匀场条的每个腔室中的匀场片的厚度,其单位是毫米(mm),其含义与等式(2)中的相同;IP的表达式(6)如下所示,其是单位矩阵,便于矩阵的运算。Wherein, HP represents the thickness of the shim sheet in each chamber of the shim bar, and its unit is millimeter (mm), and its meaning is the same as in equation (2); the expression (6) of IP is as follows As shown, it is an identity matrix, which is convenient for matrix operations.
进一步地,将表达式(5)与HP相乘,得到等式(7),用于计算每个腔室中的匀场片在与其相邻的至少一个腔室中的匀场片所产生的磁场中的受力,其单位是牛顿(N):Further, the expression (5) is multiplied by HP to obtain the equation (7), which is used to calculate the shims in each chamber in at least one adjacent chamber. The force in a magnetic field in Newtons (N):
FP″=[HP·IP T·GP to P]·HP (7)F P″ =[H P ·I P T ·G P to P ]·H P (7)
在一些实施例中,可以用如下等式(8)计算匀场片的静态受力:In some embodiments, the static force of the shim can be calculated by the following equation (8):
由此,在评估匀场片的静态受力情况时,不仅考虑了匀场片在磁共振系统所产生的磁场中的受力,还考虑了匀场片在相邻的至少一个腔室中的匀场片所产生的磁场中的受力。使用线性矩阵算子来简化匀场片在磁场中的受力计算,该线性矩阵算子与磁场参数相关,这在可接受的误差范围内缩短了计算耗时。Therefore, when evaluating the static stress of the shims, not only the stress of the shims in the magnetic field generated by the magnetic resonance system, but also the force of the shims in at least one adjacent chamber The force in the magnetic field generated by the shim. A linear matrix operator is used to simplify the force calculation of the shims in the magnetic field, and the linear matrix operator is related to the magnetic field parameters, which shortens the calculation time within an acceptable error range.
在另一些实施例中,在评估匀场片的静态受力情况时,可以仅计算匀场片在磁共振系统所产生的磁场中的受力,而不考虑匀场片在相邻的至少一个腔室中的匀场片所产生的磁场中的受力。In some other embodiments, when evaluating the static force of the shims, only the force of the shims in the magnetic field generated by the magnetic resonance system can be calculated, without considering the shims in at least one adjacent The force in the magnetic field generated by the shims in the chamber.
在步骤S320,可以基于容纳有匀场片的各个腔室中的匀场片在磁场中的受力,计算这些腔室的横向侧壁的受力。In step S320, based on the force of the shims in the magnetic field in the chambers containing the shims, the forces on the lateral side walls of these chambers can be calculated.
通过上述等式已经计算得到了各个腔室中所容纳的匀场片的静态受力。可基于此,通过如下等式(9),计算各个腔室的侧壁的受力:The static force of the shims accommodated in each chamber has been calculated through the above equation. Based on this, the force on the side walls of each chamber can be calculated by the following equation (9):
其中,FWt表示第t个横向侧壁的受力;t表示沿着所述匀场条从头部端部至尾部端部的横向侧壁的顺序编号;并且其中,FPt表示第t个腔室中的匀场片在磁场中的受力,FPt+1表示第t+1个腔室中的匀场片在磁场中的受力。Wherein, F Wt represents the force of the tth lateral sidewall; t represents the sequential numbering of the lateral sidewalls along the shim bar from the head end to the tail end; and wherein, F Pt represents the tth The force of the shims in the chamber in the magnetic field, F Pt+1 represents the force of the shims in the t+1th chamber in the magnetic field.
例如,如图4所示,可计算得到P01至P10中所容纳的匀场片的静态受力,所受的磁场力分别为FP01至FP10。For example, as shown in FIG. 4 , the static forces of the shims accommodated in P01 to P10 can be calculated, and the magnetic field forces received are F P01 to F P10 respectively.
如图4所示,对于腔室P05和腔室P06之间的横向侧壁W05而言,横向侧壁W05受到的力可以是腔室P05中的匀场片和腔室P06中的匀场片作用在横向侧壁W05上的合力。例如,可以基于等式(9)计算横向侧壁W05的受力。As shown in Figure 4, for the lateral side wall W05 between the chamber P05 and the chamber P06, the force on the lateral side wall W05 can be the shims in the chamber P05 and the shims in the chamber P06 The resultant force acting on the lateral sidewall W05. For example, the force on the lateral sidewall W05 can be calculated based on equation (9).
参考图4所示的方向,根据等式(9),当腔室P05中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP05方向朝向尾部端部、且腔室P06中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP06方向朝向头部端部时,FW05为FP05和FP06的矢量和;当腔室P05中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP05方向朝向尾部端部、且腔室P06中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP06方向也朝向尾部端部时,FW05为FP05;当腔室P05中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP05方向朝向头部端部、且腔室P06中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP06方向也朝向头部端部时,FW05为FP06;当腔室P05中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP05方向朝向头部端部、且腔室P06中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP06方向朝向尾部端部时,FW05为0。With reference to the direction shown in Figure 4, according to equation (9), when the shims in the chamber P05 are subjected to the magnetic force F P05 in the magnetic field generated by the magnetic resonance system 100, the direction of the magnetic force F P05 is towards the end of the tail, and the chamber P06 When the direction of the magnetic force F P06 suffered by the shims in the magnetic field generated by the magnetic resonance system 100 is toward the end of the head, F W05 is the vector sum of F P05 and F P06 ; when the shims in the chamber P05 The direction of the magnetic force F P05 in the magnetic field generated by the magnetic resonance system 100 is towards the end of the tail, and the direction of the magnetic force F P06 that the shims in the chamber P06 are subjected to in the magnetic field generated by the magnetic resonance system 100 is also towards At the tail end, F W05 is F P05 ; when the magnetic force F P05 of the shim in the chamber P05 in the magnetic field generated by the magnetic resonance system 100 is directed toward the head end, and the shim in the chamber P06 When the direction of the magnetic force F P06 that the field sheet receives in the magnetic field generated by the magnetic resonance system 100 is also toward the end of the head, F W05 is F P06 ; When the direction of the magnetic force F P05 in the magnetic field is towards the end of the head, and the direction of the magnetic force F P06 of the shim in the chamber P06 is towards the end of the tail in the magnetic field generated by the magnetic resonance system 100, F W05 is 0.
对于横向侧壁W00而言,当腔室P01中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP01方向朝向头部端部时,FW00为FP01;当腔室P01中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP01方向朝向尾部端部时,FW00为0。For the lateral side wall W00, when the direction of the magnetic force F P01 of the shim in the cavity P01 in the magnetic field generated by the
对于横向侧壁W10(即,尾部端部)而言,当腔室P10中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP10方向朝向头部端部时,FW10为0;当腔室P10中的匀场片在磁共振系统100所产生的磁场中所受的磁力FP10方向朝向尾部端部时,FW10为FP10。For the lateral sidewall W10 (i.e., the tail end), when the magnetic force F P10 of the shim in the chamber P10 in the magnetic field generated by the
类似地,可以计算得到每个腔室的横向侧壁的受力。Similarly, the forces on the lateral side walls of each chamber can be calculated.
此外,在一些实施例中,匀场条的端部包括用于将匀场条420固定到磁共振系统100中的固定端部423-1(或图2中的123-1),匀场条沿其纵向方向的固定端部的受力等于各个腔室中匀场片在磁场中的受力的叠加。In addition, in some embodiments, the end of the shim bar includes a fixed end 423-1 (or 123-1 in FIG. 2 ) for fixing the
例如,可以基于等式(10)计算匀场条的固定端部423-1的受力FH,其单位为牛顿(N):For example, the force F H on the fixed end 423-1 of the shim bar can be calculated based on equation (10), in Newton (N):
对于图4中的示例,n=10。因此,固定端部受到的合力可以是第1个至第10个这十个腔室中的匀场片在磁场中的受力的叠加。由于固定端部用于将匀场条固定到磁共振系统,固定端部通常包括用于固定的结构(例如螺纹结构),因此,评估固定端部处的受力情况也十分重要,以及时评估固定端部可能发生损坏的情形。For the example in Figure 4, n=10. Therefore, the resultant force on the fixed end may be the superposition of the force on the shims in the ten chambers in the first to tenth chambers in the magnetic field. Since the fixed end is used to fix the shim bar to the MRI system, the fixed end usually includes a structure for fixing (such as a threaded structure), so it is also very important to evaluate the force situation at the fixed end to evaluate in time Damage to the fixed end may occur.
在一些实施例中,所述方法300还包括:In some embodiments, the
响应于确定容纳有匀场片的各个腔室中的任一个腔室的横向侧壁的受力或匀场条的固定端部的受力超过相应阈值,指示在将匀场条插入磁共振系统之前,对腔室中所需要容纳的匀场片的量进行重新配置。In response to determining that the force on the lateral sidewall of any of the chambers housing the shims or the force on the fixed end of the shim bar exceeds a corresponding threshold, indicating that the shim bar is inserted into the magnetic resonance system Previously, the amount of shims needed to be accommodated in the chamber was reconfigured.
例如,当计算得到的横向侧壁W05的受力(例如,大小为500牛顿,方向朝向尾部端部)超过相应阈值(例如,大小为400牛顿)时,可以确定匀场条120的横向侧壁W05可能发生断裂。因此,在将匀场条插入磁共振系统之前,可以指示对腔室中所需要容纳的匀场片的量进行重新配置。例如,可以指示对某个或某几个腔室中所需要容纳的匀场片的厚度进行重新配置,从而避免当插入匀场条时,横向侧壁损坏的情况的发生,从而可以保障磁共振系统的正常工作流程并节省人力物力。For example, when the calculated force of the lateral side wall W05 (for example, the magnitude is 500 Newton, and the direction is toward the tail end) exceeds a corresponding threshold (for example, the magnitude is 400 Newton), the lateral sidewall of the
类似地,当计算得到的固定端部的受力FH(例如,大小为600牛顿,方向朝向尾部端部)超过相应阈值(例如,大小为500牛顿)时,可以确定匀场条在磁共振系统中的静态受力状态为第一状态。对于该第一状态,其可以表示匀场条120的固定端部可能发生断裂。因此,在将匀场条插入磁共振系统之前,可以指示对腔室中所需要容纳的匀场片的量进行重新配置。例如,可以指示对某个或某几个腔室中所需要容纳的匀场片的厚度进行重新配置,从而避免当插入匀场条时,固定端部损坏的情况的发生,从而可以保障磁共振系统的正常工作流程并节省人力物力。Similarly, when the calculated force F H of the fixed end (for example, the magnitude is 600 Newtons, and the direction is towards the tail end) exceeds the corresponding threshold (for example, the magnitude is 500 Newtons), it can be determined that the shim bar is in the magnetic resonance The static stress state in the system is the first state. For this first state, it may indicate that the fixed end of the
在一些实施例中,所述方法300还包括:In some embodiments, the
响应于确定容纳有匀场片的各个腔室横向侧壁的受力以及匀场条的固定端部的受力均不超过相应阈值,指示允许将匀场条插入磁共振系统中。In response to determining that neither the force on the respective chamber lateral sidewall housing the shims nor the force on the fixed end of the shim bar exceeds a respective threshold, permission to insert the shim bar into the magnetic resonance system is indicated.
例如,当计算得到的横向侧壁W00至W10的受力、以及计算得到的固定端部的受力FH均不超过相应阈值,可以确定匀场条120的部分或整体在插入磁共振系统100中时,没有发生损坏的风险,因此,可以指示允许将匀场条120插入磁共振系统100中。For example, when the calculated forces on the lateral sidewalls W00 to W10 and the calculated force F H on the fixed end do not exceed the corresponding threshold, it can be determined that a part or the whole of the
由此,在完成匀场片的配置之后、且在将配置了匀场片的匀场条插入磁共振系统中之前,对匀场条在磁共振系统中的静态受力状态进行评估,能够预先确定插入匀场条是否会使得匀场条的部分或整体受力过大而发生损坏。并针对潜在的风险作出重新配置匀场片的指示,从而保障了磁共振系统的正常工作流程,提高效率与安全性。Thus, after the configuration of the shims is completed and before the shims configured with the shims are inserted into the magnetic resonance system, the static stress state of the shims in the magnetic resonance system can be evaluated, which can be preliminarily Determine if inserting shim strips will overstress parts or the whole of the shim strips and cause damage. Instructions for reconfiguring the shims are given in response to potential risks, thereby ensuring the normal workflow of the magnetic resonance system and improving efficiency and safety.
根据本公开实施例的另一方面,提出了一种用于评估磁共振系统中匀场条静态受力状态的装置。According to another aspect of the embodiments of the present disclosure, a device for evaluating a static force state of a shim bar in a magnetic resonance system is provided.
图5示出了根据本公开实施例的用于匀场条在评估磁共振系统中静态受力状态的装置500的框图,其中,匀场条具有沿其纵向方向设置的用于容纳匀场片的多个腔室,并且匀场条能够插入磁共振系统中以用于进行匀场操作。装置500包括:Fig. 5 shows a block diagram of an
第一计算单元510,所述第一计算单元被配置为基于匀场条的每个腔室中针对匀场操作所需要容纳的匀场片的量,计算容纳有匀场片的各个腔室中的匀场片在磁场中的受力;The
第二计算单元520,所述第二计算单元被配置为基于所述各个腔室中的匀场片在磁场中的受力,计算所述各个腔室的横向侧壁的受力;以及The
确定单元530,所述确定单元被配置为基于所述各个腔室的横向侧壁的受力与相应阈值的比较,确定匀场条在磁共振系统中的静态受力状态。A
在一些实施例中,第二计算单元520还被配置为基于所述各个腔室中的匀场片在磁场中的受力,计算匀场条的固定端部的受力,并且相应地,确定单元530还被配置为基于匀场条的固定端部的受力与相应阈值的比较,确定匀场条在磁共振系统中的静态受力状态。In some embodiments, the
根据本公开实施例的另一方面,提出了一种磁共振系统100,包括:磁共振系统本体110;至少一个匀场条120,至少一个匀场条120能够插入磁共振系统本体110中;以及电子设备,电子设备包括:至少一个处理器;以及与至少一个处理器通信连接的存储器;其中,存储器存储有计算机程序,计算机程序在被至少一个处理器执行时实现根据本公开实施例的用于评估磁共振系统中匀场条静态受力状态的方法300。According to another aspect of the embodiments of the present disclosure, a
根据本公开实施例的另一方面,提供一种存储有计算机程序的非瞬时计算机可读存储介质,其中,所述计算机程序在被处理器执行时实现根据本公开实施例的用于评估磁共振系统中匀场条静态受力状态的方法300。According to another aspect of the embodiments of the present disclosure, there is provided a non-transitory computer-readable storage medium storing a computer program, wherein when the computer program is executed by a processor, the method for evaluating magnetic resonance according to an embodiment of the present disclosure is implemented. A
根据本公开实施例的另一方面,提出了一种计算机程序产品,包括计算机程序,其中,所述计算机程序在被处理器执行时实现根据本公开实施例的用于评估磁共振系统中匀场条静态受力状态的方法300。According to another aspect of the embodiments of the present disclosure, a computer program product is provided, including a computer program, wherein, when the computer program is executed by a processor, the method for evaluating shimming in a magnetic resonance system according to an embodiment of the present disclosure is provided.
本文中以上描述的系统和技术的各种实施方式可以在数字电子电路系统、集成电路系统、场可编程门阵列(FPGA)、专用集成电路(ASIC)、专用标准产品(ASSP)、芯片上系统的系统(SOC)、负载可编程逻辑设备(CPLD)、计算机硬件、固件、软件、和/或它们的组合中实现。这些各种实施方式可以包括:实施在一个或者多个计算机程序中,该一个或者多个计算机程序可在包括至少一个可编程处理器的可编程系统上执行和/或解释,该可编程处理器可以是专用或者通用可编程处理器,可以从存储系统、至少一个输入装置、和至少一个输出装置接收数据和指令,并且将数据和指令传输至该存储系统、该至少一个输入装置、和该至少一个输出装置。Various implementations of the systems and techniques described above herein can be implemented in digital electronic circuit systems, integrated circuit systems, field programmable gate arrays (FPGAs), application specific integrated circuits (ASICs), application specific standard products (ASSPs), systems on chips Implemented in a system of systems (SOC), load programmable logic device (CPLD), computer hardware, firmware, software, and/or combinations thereof. These various embodiments may include being implemented in one or more computer programs executable and/or interpreted on a programmable system including at least one programmable processor, the programmable processor Can be special-purpose or general-purpose programmable processor, can receive data and instruction from storage system, at least one input device, and at least one output device, and transmit data and instruction to this storage system, this at least one input device, and this at least one output device an output device.
用于实施本公开的方法的程序代码可以采用一个或多个编程语言的任何组合来编写。这些程序代码可以提供给通用计算机、专用计算机或其他可编程数据处理装置的处理器或控制器,使得程序代码当由处理器或控制器执行时使流程图和/或框图中所规定的功能/操作被实施。程序代码可以完全在机器上执行、部分地在机器上执行,作为独立软件包部分地在机器上执行且部分地在远程机器上执行或完全在远程机器或服务器上执行。Program codes for implementing the methods of the present disclosure may be written in any combination of one or more programming languages. These program codes may be provided to a processor or controller of a general-purpose computer, a special purpose computer, or other programmable data processing devices, so that the program codes, when executed by the processor or controller, make the functions/functions specified in the flow diagrams and/or block diagrams Action is implemented. The program code may execute entirely on the machine, partly on the machine, as a stand-alone software package partly on the machine and partly on a remote machine or entirely on the remote machine or server.
在本公开的上下文中,计算机可读存储介质可以是有形的介质,其可以包含或存储以供指令执行系统、装置或设备使用或与指令执行系统、装置或设备结合地使用的程序。计算机可读存储介质可以是计算可读信号介质或计算机可读储存介质。计算机可读介质可以包括但不限于电子的、磁性的、光学的、电磁的、红外的、或半导体系统、装置或设备,或者上述内容的任何合适组合。极端就可读存储介质的更具体示例会包括基于一个或多个线的电气连接、便携式计算机盘、硬盘、随机存取存储器(RAM)、只读存储器(ROM)、可擦除可编程只读存储器(EPROM或快闪存储器)、光纤、便捷式紧凑盘只读存储器(CD-ROM)、光学储存设备、磁储存设备、或上述内容的任何合适组合。In the context of the present disclosure, a computer-readable storage medium may be a tangible medium that may contain or store a program for use by or in conjunction with an instruction execution system, apparatus, or device. The computer readable storage medium may be a computer readable signal medium or a computer readable storage medium. A computer readable medium may include, but is not limited to, electronic, magnetic, optical, electromagnetic, infrared, or semiconductor systems, apparatus, or devices, or any suitable combination of the foregoing. More specific examples of extreme readable storage media would include one or more wire-based electrical connections, portable computer disks, hard disks, random access memory (RAM), read only memory (ROM), erasable programmable read-only memory (EPROM or flash memory), optical fiber, compact disc read only memory (CD-ROM), optical storage, magnetic storage, or any suitable combination of the foregoing.
为了提供与用户的交互,可以在计算机上实施此处描述的系统和技术,该计算机具有:用于向用户显示信息的显示装置(例如,CRT(阴极射线管)或者LCD(液晶显示器)监视器);以及键盘和指向装置(例如,鼠标或者轨迹球),用户可以通过该键盘和该指向装置来将输入提供给计算机。其他种类的装置还可以用于提供与用户的交互;例如,提供给用户的反馈可以是任何形式的传感反馈(例如,视觉反馈、听觉反馈、或者触觉反馈);并且可以用任何形式(包括声输入、语音输入或者、触觉输入)来接收来自用户的输入。To provide for interaction with the user, the systems and techniques described herein can be implemented on a computer having a display device (e.g., a CRT (cathode ray tube) or LCD (liquid crystal display) monitor) for displaying information to the user. ); and a keyboard and pointing device (eg, a mouse or a trackball) through which a user can provide input to the computer. Other kinds of devices can also be used to provide interaction with the user; for example, the feedback provided to the user can be any form of sensory feedback (e.g., visual feedback, auditory feedback, or tactile feedback); and can be in any form (including Acoustic input, speech input or, tactile input) to receive input from the user.
可以将此处描述的系统和技术实施在包括后台部件的计算系统(例如,作为数据服务器)、或者包括中间件部件的计算系统(例如,应用服务器)、或者包括前端部件的计算系统(例如,具有图形用户界面或者网络浏览器的用户计算机,用户可以通过该图形用户界面或者该网络浏览器来与此处描述的系统和技术的实施方式交互)、或者包括这种后台部件、中间件部件、或者前端部件的任何组合的计算系统中。可以通过任何形式或者介质的数字数据通信(例如,通信网络)来将系统的部件相互连接。通信网络的示例包括:局域网(LAN)、广域网(WAN)和互联网。The systems and techniques described herein can be implemented in a computing system that includes back-end components (e.g., as a data server), or a computing system that includes middleware components (e.g., an application server), or a computing system that includes front-end components (e.g., as a a user computer having a graphical user interface or web browser through which a user can interact with embodiments of the systems and techniques described herein), or including such backend components, middleware components, Or any combination of front-end components in a computing system. The components of the system can be interconnected by any form or medium of digital data communication, eg, a communication network. Examples of communication networks include: Local Area Network (LAN), Wide Area Network (WAN) and the Internet.
应该理解,可以使用上面所示的各种形式的流程,重新排序、增加或删除步骤。例如,本公开中记载的各步骤可以并行地执行、也可以顺序地或以不同的次序执行,只要能够实现本公开公开的技术方案所期望的结果,本文在此不进行限制。It should be understood that steps may be reordered, added or deleted using the various forms of flow shown above. For example, each step described in the present disclosure may be executed in parallel, sequentially or in a different order, as long as the desired result of the technical solution disclosed in the present disclosure can be achieved, no limitation is imposed herein.
虽然已经参照附图描述了本公开的实施例或示例,但应理解,上述的方法、系统和设备仅仅是示例性的实施例或示例,本发明的范围并不由这些实施例或示例限制,而是仅由授权后的权利要求书及其等同范围来限定。实施例或示例中的各种要素可以被省略或者可由其等同要素替代。此外,可以通过不同于本公开中描述的次序来执行各步骤。进一步地,可以以各种方式组合实施例或示例中的各种要素。重要的是随着技术的演进,在此描述的很多要素可以由本公开之后出现的等同要素进行替换。Although the embodiments or examples of the present disclosure have been described with reference to the accompanying drawings, it should be understood that the above-mentioned methods, systems and devices are merely exemplary embodiments or examples, and the scope of the present invention is not limited by these embodiments or examples, but It is limited only by the appended claims and their equivalents. Various elements in the embodiments or examples may be omitted or replaced by equivalent elements thereof. Also, steps may be performed in an order different from that described in the present disclosure. Further, various elements in the embodiments or examples can be combined in various ways. Importantly, as technology advances, many of the elements described herein may be replaced by equivalent elements appearing after this disclosure.
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