CN116088262A - Photomask mark and manufacturing method thereof - Google Patents

Abstract

A photomask mark and method of forming the same, wherein the photomask mark comprises: a transparent substrate including an exposure region and an edge region; the edge area of the transparent substrate is provided with a plurality of identification grooves, each identification groove comprises a plurality of main grooves which are arranged in rows and columns and auxiliary grooves which are connected with the adjacent main grooves, the width of each auxiliary groove is smaller than that of each main groove, some main grooves and auxiliary grooves in one identification groove are filled with opaque materials to form an identification code, and a plurality of corresponding identification codes in the identification grooves form an identification. The existing identification codes can be used for removing part of the light-tight materials to change into other identification codes, or the light-tight materials can be filled in the corresponding main grooves and auxiliary grooves again after being removed to change into other identification codes, so that the modification of the identification can be realized very simply and conveniently, and the management requirement in the mask plate manufacturing process is met.

Description

Photomask marking and manufacturing method thereof

technical field

The present application relates to the field of photomask plates, in particular to a modifiable photomask plate mark and a manufacturing method thereof.

Background technique

Photolithography is an indispensable and important technology in the integrated circuit manufacturing process. The photolithography process generally includes steps: firstly coat photosensitive materials such as photoresist on the surface of the wafer, and after the photoresist material is dried, expose the mask pattern on the photomask plate to the light with a specific light source through an exposure machine. On the photoresist photosensitive material, the photoresist photosensitive material is then developed with a developer to form a photoresist pattern on the wafer surface, and the photoresist pattern is used as a mask during the subsequent ion implantation process or etching process graphics.

Existing photomasks generally include: a transparent substrate; a number of discrete shielding patterns (or mask patterns) are formed on the surface of the transparent substrate; an annular frame is positioned on the surface of the transparent substrate, and the annular frame surrounds The shielding pattern; a protective film on the top surface of the annular frame, the protective film and the annular frame are used to seal the photomask.

Before the production of the photomask, it is necessary to mark the formation date and batch of the transparent substrate. The existing mark is directly etched on the transparent substrate, which cannot be changed in the subsequent process, and it is necessary for the production process of the mask. Management brings many inconveniences.

Contents of the invention

Some embodiments of the present application provide an identification of a photomask, including:

a transparent substrate comprising an exposed area and an edge area surrounding the exposed area;

There are a plurality of identification grooves in the edge region of the transparent substrate, and each of the identification grooves includes a plurality of main grooves arranged in rows and columns and auxiliary grooves connecting adjacent main grooves, the auxiliary grooves The width is smaller than the width of the main groove, and some of the main grooves and auxiliary grooves in one of the identification grooves are filled with opaque materials to form an identification code, and the corresponding multiple of the identification grooves The identification code constitutes an identification.

In some embodiments, the multiple main grooves in each of the marking grooves are arranged in rows and columns of 3x3, 4x4 or 5x5, and adjacent main grooves are connected by a secondary groove in the row direction and the column direction .

In some embodiments, the width of the secondary groove is 1/3-2/3 of the width of the main groove.

In some embodiments, the one identification code is any one of numbers 0-9, or any one of letters A-Z.

In some embodiments, an existing identification code is modified to another identification code after removing part of the opaque material in the main groove and/or the secondary groove, or an existing identification code is modified after removing all the main grooves. The opaque material in the groove and the sub-groove is then filled with the opaque material in the corresponding main groove and the sub-groove to modify it into other identification codes.

In some embodiments, the opaque material is opaque metal or ink.

In some embodiments, the identification includes one or more of product batch number, serial number, factory code, date, and customer code.

In some embodiments, the width of the identification groove is 6-12mm.

In some embodiments, the surface of the exposed area of the transparent substrate has several discrete masking patterns; the edge surface of the exposed area of the transparent substrate has a ring frame surrounding the masking graph; the top surface of the ring frame There is a protective film closing the space inside the annular frame.

The present application also provides a method for making a photomask mark, including:

providing a transparent substrate comprising an exposed area and an edge area surrounding the exposed area;

A plurality of identification grooves are formed in the edge region of the transparent substrate, each of the identification grooves includes a plurality of main grooves arranged in rows and columns and auxiliary grooves connecting adjacent main grooves, the auxiliary grooves the width of the groove is smaller than the width of the main groove;

Some of the main grooves and minor grooves in the identification grooves are filled with opaque materials, and identification codes are formed in the identification grooves, and a plurality of the identification codes correspondingly formed in a plurality of the identification grooves constitute a logo.

In some embodiments, the opaque material is opaque metal or ink.

In some embodiments, the method further includes: forming several discrete masking patterns on the surface of the exposure region of the transparent substrate.

In some embodiments, the forming process of the masking pattern and the identification code includes: forming an opaque metal layer on the edge area of the transparent substrate and the surface of the exposed area; forming an opaque metal layer on the opaque metal layer A patterned mask layer, the patterned mask layer exposes the region where the opaque metal layer needs to be removed; using the patterned mask layer as a mask, etching removes the exposed area An opaque metal layer, forming several discrete shielding patterns on the surface of the exposure area of the transparent substrate, and filling some of the main grooves and sub-grooves in the marking grooves in the edge area with opaque material An identification code is formed in the identification groove, and a plurality of identification codes correspondingly formed in the plurality of identification grooves constitute an identification.

In some embodiments, when the opaque material is ink, the opaque material is filled in some main grooves and sub-grooves in the marking groove through a dispensing process.

In some embodiments, the one identification code is any one of numbers 0-9, or any one of letters A-Z.

In some embodiments, the existing identification code is modified to other identification codes by removing the opaque material in some main grooves and/or minor grooves in an existing identification code, or by removing After the opaque material in all the main grooves and sub-grooves in a formed identification code, fill the opaque material in the corresponding main grooves and sub-grooves to modify the existing identification code to other the identification code for .

In some embodiments, the multiple main grooves in each of the marking grooves are arranged in rows and columns of 3x3, 4x4 or 5x5, and adjacent main grooves are connected by a secondary groove in the row direction and the column direction .

In some embodiments, the width of the secondary groove is 1/3-2/3 of the width of the main groove, and the width of the identification groove is 6-12mm.

In some embodiments, it also includes: a ring frame surrounding the masking pattern located on the edge surface of the exposure area of the transparent substrate; a protective film located on the top surface of the ring frame to close the space in the ring frame.

The marking of the photomask in some of the foregoing embodiments of the present application includes: a transparent substrate, the transparent substrate includes an exposure area and an edge area around the exposure area; there are a plurality of identification grooves in the edge area of the transparent substrate, each Each of the identification grooves includes a plurality of main grooves arranged in rows and columns and auxiliary grooves connecting adjacent main grooves, the width of the auxiliary grooves is smaller than the width of the main grooves, and one of the identification grooves Some of the main grooves and auxiliary grooves in the grooves are filled with opaque material to form an identification code, and the corresponding multiple identification codes in the plurality of identification grooves form an identification. The existing identification code of the present application can subsequently remove part of the opaque material to change into another identification code, or the opaque material can be refilled in the corresponding main groove and sub-groove after the opaque material is removed. It can be changed into other identification codes, and the modification of the identification can be easily implemented to meet the management requirements in the mask manufacturing process. Moreover, the identification groove of the above-mentioned specific structure can facilitate the identification of the identification code formed after filling the opaque material on the one hand; Different numbers (0-9) or different letters (A-Z) can be formed to meet different identification requirements.

Description of drawings

Fig. 1-Fig. 8, Fig. 11 are the schematic structural diagrams of the photomask mark making process in some embodiments of the present application;

Fig. 9 is an identification code diagram of numbers 0-9 in some embodiments of the present application;

Fig. 10 is a diagram of the identification codes of letters A-Z in some embodiments of the present application.

Detailed ways

The specific implementation manners of the present application will be described in detail below in conjunction with the accompanying drawings. When describing the embodiments of the present application in detail, for the convenience of explanation, the schematic diagrams will not be partially enlarged according to the general scale, and the schematic diagrams are only examples, which should not limit the protection scope of the present application. In addition, the three-dimensional space dimensions of length, width and depth should be included in actual production.

Some embodiments of the present application firstly provide a method for manufacturing a photomask mark, and the photomask manufacturing process will be described in detail below with reference to the accompanying drawings.

Referring to FIGS. 1 and 2 , where FIG. 2 is a schematic cross-sectional view of FIG. 1 along the cutting line AB, a transparent substrate 201 is provided, and the transparent substrate 201 includes an exposure area 21 and an edge area 22 located around the exposure area 21 .

The transparent substrate 201 is used as a carrier of a photomask, and the material of the transparent substrate 201 is a light-transmitting material, and the light transmittance of the transparent substrate 201 is greater than 90%. In some embodiments, the material of the transparent substrate 201 may be quartz glass or soda glass. In some other embodiments, the material of the transparent substrate 201 may also be fused silica, calcium fluoride, silicon nitride, titanium oxide alloy, and sapphire.

In some embodiments, the transparent substrate 201 includes an exposure area 21 and an edge area 22 located around the exposure area 21, the exposure area 21 may be in the shape of a square or a circle or other suitable shapes, and the edge area 22 is in the form of a ring , surrounding the exposure area 21 . The surface of the exposure area 21 is used to form a shielding pattern (or light-shielding pattern) 202, and the surface of the exposure area 21 can also be used to form a phase shift layer, and the surface of the surrounding edge of the exposure area 21 is subsequently used to form a ring frame , the edge region 22 of the transparent substrate 201 is used to form a modifiable mark.

The identification is used to mark the produced photomask as identity information or distinguishing information of different produced photomasks. In some embodiments, the identification may include one or more of product batch number, serial number, factory code, date, and customer code. For example, some identifications may include serial number, factory code and date, and some identifications may include Including batch number, factory code and date, some marks can include batch number, factory code, date and customer code.

The identification is composed of multiple identification codes, and one identification code can be a number or a letter. The number is any one of 0-9 (0, 1, 2, 3, 4, 5, 6, 7, 8, 9), and the letter is A-Z (A, B, C, D, E, F , G, H, I, J, K, L, M, N, O, P, Q, R, S, T, U, V, W, X, Y, Z). In some embodiments, the identification may consist of multiple numbers, or multiple letters, or a combination of multiple numbers and letters.

Referring to FIGS. 3-5 , in which FIG. 4 is a schematic cross-sectional structure diagram of FIG. 3 along the cutting line AB, and FIG. 5 is a schematic cross-sectional structure diagram of FIG. 3 along the cutting line CD direction. A plurality of identification grooves 210, each of the identification grooves 210 includes a plurality of main grooves 211 arranged in rows and columns and auxiliary grooves 212 connecting adjacent main grooves 211, and the width W1 of the auxiliary grooves 212 smaller than the width W2 of the main groove 211 .

One identification groove 210 is subsequently filled with opaque material to form an identification code, and correspondingly filled with opaque material in a plurality of identification grooves 210 forms multiple identification codes.

Each of the identification grooves 210 includes a plurality of main grooves 211 arranged in rows and columns and auxiliary grooves 212 connecting adjacent main grooves 211, and the width W1 of the auxiliary grooves 212 is smaller than that of the main grooves. The width W2 of 211, on the one hand, the identification groove 210 of the aforementioned specific structure can facilitate the identification of the identification code formed after the opaque material is filled; Different filling methods of the groove 212 can form different numbers (0-9) or different letters (A-Z), so as to meet different identification requirements.

In some embodiments, the width W1 of the secondary groove 212 is 1/3-2/3 of the width W2 of the main groove 211 .

In some embodiments, the depth of the main groove 211 and the depth of the auxiliary groove 212 are the same. In some other embodiments, the depth of the main groove 211 and the depth of the auxiliary groove 212 may be different, specifically the depth of the main groove 211 may be greater than or smaller than the depth of the auxiliary groove 212, After the opaque metal material is subsequently filled, the surface height of the opaque metal material in the main groove 211 is different from the surface height of the opaque metal material in the secondary groove 212, so that the formed identification code has a more three-dimensional effect. Facilitate the identification of identification codes.

In some embodiments, the plurality of main grooves 211 in each of the marking grooves 210 are arranged in rows and columns of 3x3, 4x4 or 5x5, and adjacent main grooves 211 pass through a secondary groove in the row direction and in the column direction. The groove 212 connects. In this embodiment, the nine main grooves 211 in each of the marking grooves 210 are arranged in rows and columns of 3x3, and adjacent main grooves 211 pass through a secondary groove in the row direction and the column direction 212 connection, that is, a total of 10 secondary grooves 212 are needed to connect the nine main grooves 211 in the row direction and the column direction.

In some embodiments, the width of the identification groove 210 is 6-12mm. The width of the marking groove 210 is the distance between the outermost two main grooves 211 of the marking groove 210 along the transverse direction (row direction or direction parallel to the cutting line CD).

In some embodiments, the formation process of the identification groove 210 is: forming a patterned mask layer (not shown in the figure) on the surface of the transparent substrate 201, the patterned mask layer has A plurality of mask openings exposing the surface of the edge region of the transparent substrate 201, one of the mask openings includes a plurality of main first openings arranged in rows and columns and a second opening connecting adjacent first openings, the The width of the second opening is smaller than the width of the first opening, the position of the first opening corresponds to the position of the main groove, and the position of the second opening corresponds to the position of the auxiliary groove; The mask layer is a mask, and the transparent substrate 201 is etched along the mask opening to form a plurality of marking grooves 210 in the edge region of the transparent substrate 201, and each of the marking grooves 210 includes rows and columns. There are a plurality of main grooves 211 and auxiliary grooves 212 connecting adjacent main grooves 211 , the width W1 of the auxiliary grooves 212 is smaller than the width W2 of the main grooves 211 . In this implementation, four identification grooves 210 formed in the edge region 22 are taken as an example for illustration. In other embodiments, other numbers of identification grooves may be formed in the edge region 22 .

Referring to Fig. 6-Fig. 8, Fig. 7 is a schematic cross-sectional structural diagram of Fig. 6 along the cutting line AB, and Fig. 8 is a schematic cross-sectional structural diagram of Fig. 6 along the cutting line CD direction, some main recesses in the identification groove 210 The groove 211 and the auxiliary groove 212 are filled with an opaque material, and an identification code 213 is formed in the identification groove 210, and a plurality of the identification codes 213 correspondingly formed in a plurality of the identification grooves 210 form an identification.

An identification code 213 can be formed in the identification groove 210 by filling some (all or part) of the main groove 211 and the auxiliary groove 212 with an opaque material in one of the identification grooves 210 .

Different identifiers 213 can be formed by different filling combinations in the main groove 211 and the secondary groove 212 of an identification groove 210 . The identification code 213 can be a number or a letter. The number is any one of 0-9 (0, 1, 2, 3, 4, 5, 6, 7, 8, 9), specifically, please refer to Figure 9, from left to right in Figure 9 The following are structural schematic diagrams of the identification codes 0, 1, 2, 3, 4, 5, 6, 7, 8, and 9 after the identification grooves are filled with opaque materials. The letters are A-Z (A, B, C, D, E, F, G, H, I, J, K, L, M, N, O, P, Q, R, S, T, U, V, Any one of W, X, Y, Z), please refer to Figure 11 for details, and please refer to Figure 10 for details. Identification codes A, B, C, D, E, F, G, H, I, J, K, L, M, N, O, P, Q, R, S, T, U, V, W, X , Schematic diagram of the structure of Y, Z. That is to say, the marking groove 210 with a specific structure in this application can form both numbers and letters through different filling combinations of main grooves 211 and auxiliary grooves 212 , meeting the needs of marking diversity. In this embodiment, the identification code formed after filling the four identification grooves 210 with opaque material is: 7CI1.

Continuing to refer to FIGS. 6-8 , in some embodiments, all the identification slots 210 may be filled to form an identification code. In some other embodiments, only part of the identification groove 210 can be filled to form an identification code. If the identification needs to be modified in the subsequent process, such as adding some new information, it is only necessary to fill the remaining identification groove 210 with opaque material to form an identification code.

In some embodiments, when the identification is modified according to the needs of the process, the present application can easily modify the existing identification code to meet the needs of the process. Specifically, modify the existing identification code to other identification codes by removing the opaque material in some main grooves and/or sub-grooves in an existing identification code, compared to Figure 6, the The two sides of the third letter identification code "I" can be removed to form a digital identification code "1", or after removing the opaque material in all the main grooves and auxiliary grooves in a formed identification code, Corresponding main grooves and auxiliary grooves are filled with opaque materials to modify the existing identification codes to other identification codes, such as one or more identification codes as shown in Figure 6 with all the opaque materials All are removed, and then the corresponding main grooves and auxiliary grooves are filled with opaque material to modify the existing identification codes to other identification codes.

The opaque material is opaque metal or ink. In some embodiments, the opaque material is the same material as the shielding pattern 202 to be formed in the exposure area 21 , and both are opaque metals. The opaque metal is one or more of chromium, nickel, aluminum, ruthenium, molybdenum, titanium, tantalum, copper, tungsten, silver, platinum, or chromium, nickel, aluminum, ruthenium, molybdenum, titanium , tantalum, copper, tungsten, silver, platinum, chromium oxide, iron oxide, niobium oxide, chromium nitride, molybdenum trioxide, molybdenum nitride, chromium oxide, titanium nitride, zirconium nitride, titanium oxide, tantalum nitride, One or more of tantalum oxide, silicon dioxide, niobium nitride, silicon nitride, silicon oxynitride, amorphous carbon, silicon oxycarbide, neutral alumina, and aluminum oxide. The masking pattern 202 and the identification code 213 can be a single-layer or multi-layer stacked structure (such as a stacked structure of two or more layers)

In some embodiments, the identification code 213 of the edge area 22 is formed synchronously with the masking pattern 202 of the exposure area 21, so as to realize the integration of the identification code process and the masking pattern process and save costs. In a specific embodiment, the forming process of the identification code 213 in the edge area 22 and the shielding pattern 202 in the exposure area 21 includes: forming an opaque pattern on the surface of the edge area 22 of the transparent substrate 201 and the surface of the exposure area 21 . metal layer (not shown in the figure); a patterned mask layer (not shown in the figure) is formed on the opaque metal layer, and the patterned mask layer exposes the opaque The area where the optical metal layer needs to be removed; using the patterned mask layer as a mask, the exposed opaque metal layer is etched and removed, and formed on the surface of the exposed area 21 of the transparent substrate 201 A number of discrete shielding patterns 202 are filled with opaque material in some main grooves and minor grooves in the identification groove 210 of the edge region 22, and an identification code 213 is formed in the identification groove 210. A plurality of the A plurality of identification codes 213 correspondingly formed in the identification groove 210 constitute an identification.

In other embodiments, when the opaque material is ink, the opaque material is filled in some of the main grooves and sub-grooves in the marking groove through a dispensing process.

In some embodiments, referring to FIG. 11 , further comprising: forming an annular frame 204 surrounding the shielding pattern 202 on the edge surface of the exposure area 21 of the transparent substrate 201; forming a closed frame on the top surface of the annular frame 204 A protective film 206 for the inner space of the ring frame 204 .

The ring frame 204 is used to support the protective film formed subsequently, and the masking pattern 202 on the photomask plate 201 and the middle area surface of the photomask plate 201 can be separated from the outside by the ring frame 204 and the protective film formed subsequently. Environmental isolation to prevent contamination of the external environment.

The ring frame 204 has a hollow ring shape, and the material of the ring frame 204 is a material with certain mechanical strength. In some embodiments, the material of the ring frame 204 is aluminum. In some other embodiments, the material of the ring frame 204 may be aluminum alloy, ceramics, carbon steel or other suitable metal or non-metal materials.

In some embodiments, the ring frame 204 is adhered to the edge area of the transparent substrate through the adhesive layer 203 .

The material of the adhesive layer 203 is an organic adhesive. In some embodiments, the organic adhesive is rubber adhesive, polyurethane adhesive, acrylic adhesive, SEBS (styrene ethylene butylene benzene Vinyl) adhesive, SEPS (styrene ethylene propylene styrene) adhesive, or silicone adhesive.

The material of the protective film 206 is a transparent material.

Some embodiments of the present application also provide a photomask mark, referring to FIGS. 6-8 , wherein FIG. 7 is a schematic cross-sectional structural diagram of FIG. 6 along the cutting line AB, and FIG. 8 is a cross-sectional view of FIG. 6 along the cutting line CD. Structure diagram, including:

A transparent substrate 201, the transparent substrate 201 comprising an exposure area 21 and an edge area 22 located around the exposure area 21;

There are a plurality of marking grooves 210 in the edge region 22 of the transparent substrate 201, and each of the marking grooves 210 includes a plurality of main grooves 211 arranged in rows and columns and auxiliary grooves connecting adjacent main grooves 211 212, the width of the secondary groove 212 is smaller than the width of the main groove 211, and some of the primary grooves 211 and secondary grooves 212 in one of the identification grooves 210 are filled with opaque materials to form an identification code 213. The plurality of identification codes 213 corresponding to the plurality of identification slots 210 form an identification.

In some embodiments, the plurality of main grooves 211 in each of the marking grooves 210 are arranged in rows and columns of 3x3, 4x4 or 5x5, and adjacent main grooves 211 pass through a secondary groove in the row direction and in the column direction. The groove 212 connects.

In some embodiments, the width W1 of the secondary groove 212 is 1/3-2/3 of the width W2 of the main groove 211 .

In some embodiments, referring to FIG. 9 , the one identification code is any one of numbers 0-9. In some embodiments, referring to FIG. 10 , the one identification code is any one of letters A-Z.

In some embodiments, an existing identification code is modified to another identification code after removing part of the opaque material in the main groove and/or the secondary groove, or an existing identification code is modified after removing all the main grooves. The opaque material in the groove and the sub-groove is then filled with the opaque material in the corresponding main groove and the sub-groove to modify it into other identification codes.

In some embodiments, the opaque material is opaque metal or ink.

In some embodiments, the identification includes one or more of product batch number, serial number, factory code, date, and customer code.

In some embodiments, the width of the identification groove 210 is 6-12 mm.

In some embodiments, referring to FIG. 11 , it further includes: several discrete shielding patterns 202 located on the surface of the exposure area 21 of the transparent substrate 201; The ring frame 204 of the shielding pattern 202; the protective film 206 located on the top surface of the ring frame 204 to close the inner space of the ring frame 204.

It should be noted that the definitions or descriptions of the same or similar parts in some embodiments of the photomask of the present application as in some embodiments of the aforementioned photomask forming method will not be repeated here. For details, please refer to the aforementioned photomask Definitions or descriptions of corresponding parts in some embodiments of the plate forming method.

Although the present application has been disclosed as above with preferred embodiments, it is not intended to limit the present application. Any person skilled in the art can use the methods and technical contents disclosed above to analyze the present application without departing from the spirit and scope of the present application. Possible changes and modifications are made in the technical solution. Therefore, any simple modifications, equivalent changes and modifications made to the above embodiments according to the technical essence of the application without departing from the content of the technical solution of the application belong to the technical solution of the application. protected range.

Claims (19)

1. A photomask marking, characterized in that it comprises: A transparent substrate, the transparent substrate includes an exposure area and an edge area located around the exposure area; there are a plurality of marking grooves in the edge area of the transparent substrate, and each of the marking grooves includes a plurality of main grooves arranged in rows and columns And the auxiliary grooves connecting the adjacent main grooves, the width of the auxiliary grooves is smaller than the width of the main grooves, some of the main grooves and auxiliary grooves in one of the identification grooves are filled with different The light-transmitting material forms an identification code, and a plurality of identification codes corresponding to the plurality of identification grooves form an identification. 2. The photomask marking according to claim 1, wherein a plurality of main grooves in each of the marking grooves are arranged in rows and columns of 3x3, 4x4 or 5x5, and adjacent main grooves are Both the row direction and the column direction are connected by a sub-groove. 3. The photomask mark according to claim 1, wherein the width of the secondary groove is 1/3-2/3 of the width of the main groove. 4. The photomask label according to claim 1, wherein the one identification code is any one of numbers 0-9, or any one of letters A-Z. 5. The photomask marking according to claim 4, wherein an existing identification code is modified to another identification code after removing part of the opaque material in the main groove and/or the sub-groove , or an existing identification code after removing all the opaque material in the main groove and the sub-groove and then filling the opaque material in the corresponding main groove and the sub-groove to modify it into another identification code. 6. The photomask marking according to claim 1 or 5, wherein the opaque material is opaque metal or ink. 7. The photomask mark according to claim 1, wherein the mark includes one or more of product batch number, serial number, factory code, date, and customer code. 8. The photomask marking according to claim 1, wherein the width of the marking groove is 6-12 mm. 9. The photomask plate mark as claimed in claim 1, characterized in that, there are several discrete shielding patterns on the surface of the exposure area of the transparent substrate; An annular frame for shielding graphics; the top surface of the annular frame has a protective film that closes the inner space of the annular frame. 10. A method for making a photomask mark, comprising: providing a transparent substrate comprising an exposed area and an edge area surrounding the exposed area; A plurality of identification grooves are formed in the edge region of the transparent substrate, each of the identification grooves includes a plurality of main grooves arranged in rows and columns and auxiliary grooves connecting adjacent main grooves, the auxiliary grooves the width of the groove is smaller than the width of the main groove; Some of the main grooves and minor grooves in the identification grooves are filled with opaque materials, and identification codes are formed in the identification grooves, and a plurality of the identification codes correspondingly formed in a plurality of the identification grooves constitute a logo. 11. The method for making a photomask mark according to claim 10, wherein the opaque material is opaque metal or ink. 12 . The method for making a photomask mark according to claim 11 , further comprising: forming several discrete masking patterns on the surface of the exposure region of the transparent substrate. 13 . 13. The method for making a photomask mark according to claim 12, wherein the forming process of the masking pattern and the identification code comprises: forming an opaque layer on the surface of the edge area and the exposure area of the transparent substrate. A light metal layer; a patterned mask layer is formed on the opaque metal layer, and the patterned mask layer exposes the region where the light-opaque metal layer needs to be removed; with the The patterned mask layer is a mask, and the exposed opaque metal layer is etched away to form several discrete shielding patterns on the surface of the exposed area of the transparent substrate, and in the identification groove of the edge area Some of the main grooves and auxiliary grooves are filled with opaque material, and an identification code is formed in the identification groove, and a plurality of the identification codes correspondingly formed in a plurality of the identification grooves constitute one identification. 14. The manufacturing method of photomask mark as claimed in claim 11, it is characterized in that, when the said opaque material is ink, some main grooves and auxiliary grooves in the mark groove are formed by dispensing process. The groove is filled with opaque material. 15. The method for making a photomask mark according to claim 10, wherein the one identification code is any one of numbers 0-9, or any one of letters A-Z. 16. The method for making a photomask mark as claimed in claim 15, characterized in that, after removing the opaque material in part of the main grooves and/or minor grooves in an existing identification code, the Modify the above existing identification codes to other identification codes, or after removing the opaque material in all the main grooves and auxiliary grooves in a formed identification code, and then insert the corresponding main grooves and auxiliary grooves Filling the opaque material modifies the existing identification codes into other identification codes. 17. The method for making a photomask mark as claimed in claim 10, wherein a plurality of main grooves in each of the mark grooves are arranged in rows and columns of 3x3, 4x4 or 5x5, and adjacent main grooves The grooves are connected by a sub-groove both in the row direction and in the column direction. 18. The manufacturing method of photomask mark as claimed in claim 10, is characterized in that, the width of described sub-groove is 1/3-2/3 of the width of main groove, and the width of described marking groove is 6-12mm. 19. The method for making a photomask mark according to claim 10, further comprising: an annular frame surrounding the masking pattern located on the edge surface of the exposure area of the transparent substrate; A protective film on the top surface of the annular frame enclosing the inner space of the annular frame.

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