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CN116282953A - A kind of strong weather resistance NCVM thin film and coating process - Google Patents

A kind of strong weather resistance NCVM thin film and coating process Download PDF

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CN116282953A
CN116282953A CN202111561653.3A CN202111561653A CN116282953A CN 116282953 A CN116282953 A CN 116282953A CN 202111561653 A CN202111561653 A CN 202111561653A CN 116282953 A CN116282953 A CN 116282953A
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refractive index
film
index material
film layer
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李智超
毕文江
孙波
赵松
徐光科
方涛
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Henan Dubang Photoelectric Co ltd
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    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10Glass or silica
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
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    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/213SiO2
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    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
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    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
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    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/73Anti-reflective coatings with specific characteristics
    • C03C2217/734Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

The invention relates to the technical field of optical films, and provides a strong weather resistance NCVM film and a coating process. Comprises a substrate, a film layer is plated on the surface of the substrate, and the film layer adopts SiO 2 Low refractive index material, al 2 O 3 Medium refractive index material and Ti 3 O 5 The high refractive index material is laminated, and the film layer has the structure from inside to outside that: ti (Ti) 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /Al 2 O 3 /SiO 2 Layered junctionConstructing a structure. The glass surface film layer has uniform thickness, is convenient to monitor, has light blue color on the ink surface, can be stably qualified in a strict test standard at a terminal, and can be used for stabilizing the 72H appearance of a limited test product in a solution with pH of 4.7 and pH of 10 without abnormal phenomena such as change, corrosion, color change, foaming, cracking, film layer falling and the like.

Description

一种强耐候性NCVM薄膜及镀膜工艺A kind of strong weather resistance NCVM thin film and coating process

技术领域technical field

本发明涉及光学薄膜技术领域,尤其涉及一种强耐候性NCVM薄膜及镀膜工艺。The invention relates to the technical field of optical thin films, in particular to a highly weather-resistant NCVM thin film and a coating process.

背景技术Background technique

众所周知,目前镀膜行业中,手机,玩具,仪器仪表,车载后盖等产品中都需要镀制光学薄膜。As we all know, in the current coating industry, optical films need to be coated on mobile phones, toys, instruments, vehicle back covers and other products.

强耐候性NCVM薄膜是一种高端盖板产品要求。主要用于手机后盖摄像头 、中小尺寸车载显示屏等。智能产品中的重要部件屏幕需要适应更多的不同环境。要求产品在溶液pH=4.7和pH=10放置48H,其外观无变化、无腐蚀、变色、 起泡、开裂、涂层脱落。Strong weather resistance NCVM film is a requirement for high-end cover products. It is mainly used for mobile phone back cover cameras, small and medium-sized car display screens, etc. Screens, an important component in smart products, need to adapt to more different environments. The product is required to be placed in the solution pH=4.7 and pH=10 for 48H, and its appearance has no change, no corrosion, discoloration, foaming, cracking, and coating peeling off.

为了提高性能,同时丰富其实用范围,需要在玻璃材质的表面镀上特殊涂层。市场中现有的小尺寸盖板涂层在使用的过程中对于环境的要求却比较高,酸性和碱性条件下都会使玻璃屏幕上的膜层脱落,极大的限制了该产品的使用范围。目前,为满足及超越客户的要求与期许,增加摄像头镜片的市场竞争力,急需制定一种强耐候性NCVM薄膜及镀膜工艺满足对客户摄像头镜片的作业需求。In order to improve performance and at the same time enrich its range of applications, special coatings are required on the surface of the glass material. The existing small-size cover coatings in the market have relatively high environmental requirements during use. Under acidic and alkaline conditions, the film on the glass screen will fall off, which greatly limits the scope of use of the product. . At present, in order to meet and exceed the requirements and expectations of customers and increase the market competitiveness of camera lenses, it is urgent to develop a strong weather-resistant NCVM film and coating process to meet the operational needs of customers' camera lenses.

查阅各种资料,对于强耐候性NCVM薄膜,一般情况需要特殊的镀膜材料,镀膜后道工序复杂,不足于满足正常量产的要求,并且具有一定的局限性。According to various materials, for strong weather resistance NCVM films, special coating materials are generally required, and the post-coating process is complicated, which is not enough to meet the requirements of normal mass production, and has certain limitations.

因此,提供一种结构简单,膜层材料常见,且生产工艺简单,能够同时满足量产条件和节约成本已经成为目前最大的技术问题。Therefore, it has become the biggest technical problem at present to provide a simple structure, common film layer material, and simple production process, which can meet the mass production conditions and save costs at the same time.

发明内容Contents of the invention

为了克服现有技术的上述缺点,本发明提出一种强耐候性NCVM薄膜及镀膜工艺,目的是提供一种结构简单,膜层材料常见,且生产工艺简单,能够同时满足量产条件和节约成本的技术问题,满足客户的高端需求,该工艺能够实现镀膜后玻璃表面在溶液pH=4.7和pH=10放置48H,产品外观无变化、无腐蚀、变色、 起泡、开裂、膜层脱落等异常现象。In order to overcome the above-mentioned shortcomings of the prior art, the present invention proposes a strong weather-resistant NCVM film and coating process, the purpose of which is to provide a simple structure, common film material, and simple production process, which can meet mass production conditions and save costs at the same time To meet the high-end needs of customers, this process can realize the glass surface after coating is placed in the solution pH=4.7 and pH=10 for 48H, the appearance of the product does not change, no corrosion, discoloration, blistering, cracking, film shedding and other abnormalities Phenomenon.

本发明所采取的技术方案是,提出一种强耐候性NCVM薄膜,包括基材,其中,在所述基材表面镀制膜层,所述膜层采用SiO2低折射率材料、Al2O3中折射率材料和Ti3O5高折射率材料层叠而成,所述膜层由内到外的结构是:Ti3O5/SiO2/Ti3O5/SiO2/Ti3O5/SiO2/Ti3O5/Al2O3/ SiO2层状结构。The technical solution adopted by the present invention is to propose a strong weather-resistant NCVM film, including a substrate, wherein a film layer is coated on the surface of the substrate, and the film layer is made of SiO 2 low refractive index materials, Al 2 O 3. Medium refractive index material and Ti 3 O 5 high refractive index material are laminated. The structure of the film layer from inside to outside is: Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /Al 2 O 3 /SiO 2 layered structure.

进一步地,所述每层SiO2低折射率材料厚度为80nm-100nm,每层Ti3O5高折射率材料为5nm-50nm,Al2O3中折射率材料厚度为10nm-50nm。Further, the thickness of each layer of SiO 2 low refractive index material is 80nm-100nm, the thickness of each layer of Ti 3 O 5 high refractive index material is 5nm-50nm, and the thickness of Al 2 O 3 medium refractive index material is 10nm-50nm.

进一步地,所述SiO2、Al2O3、Ti3O5膜层膜料纯度在99.999%。Further, the purity of the SiO 2 , Al 2 O 3 , and Ti 3 O 5 film materials is 99.999%.

本发明还提出一种强耐候性NCVM薄膜的镀制工艺,其包括以下步骤:The present invention also proposes a coating process of strong weather resistance NCVM film, which comprises the following steps:

步骤1:使用蒸发机270度EB加射频IB加晶控仪监控;Step 1: Use evaporator 270 degrees EB plus RF IB plus crystal controller to monitor;

步骤2:膜层设计采用SiO2低折射率材料、Al2O3中折射率材料和Ti3O5高折射率材料层叠而成,所述膜层由内到外的结构是:Ti3O5/SiO2/Ti3O5/SiO2/Ti3O5/SiO2/Ti3O5/Al2O3/SiO2层状结构,所述每层SiO2低折射率材料厚度为80nm-100nm,每层Ti3O5高折射率材料为5nm-50nm,Al2O3中折射率材料厚度为10nm-50nm;Step 2: The film layer is designed by laminating SiO 2 low refractive index material, Al 2 O 3 medium refractive index material and Ti 3 O 5 high refractive index material. The structure of the film layer from inside to outside is: Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /Al 2 O 3 /SiO 2 layered structure, the thickness of each layer of SiO 2 low refractive index material is 80nm -100nm, the thickness of each layer of Ti 3 O 5 high refractive index material is 5nm-50nm, and the thickness of Al 2 O 3 middle refractive index material is 10nm-50nm;

步骤3:以上膜料纯度在99.999%,蒸发源到基板距离在0.9m-1.2m之间;Step 3: The purity of the above film materials is 99.999%, and the distance from the evaporation source to the substrate is between 0.9m-1.2m;

步骤4:低折射率材料在工作时,离子源充入氧气和氩气比4:1/5:1,氩气流量在5-50sccm,氧气流量在10-50sccm,气压在1.0E-3,其中射频Beam电流在500-1600mA,电压在800-1400V,为了充分考虑到膜层堆积密度,镀膜速率控制在8-10A/S;高折射率材料离子源充入氧气和氩气比6:1/7:1,氩气流量在10-15sccm,氧气流量在50-99sccm,镀膜气压在2.5E-2,其中射频Beam电流在800-1200 mA,电压在500-1400 V,镀膜速率3-4A/S,高折射率镀膜APC控制在3.0E-2,实际冲入氧气为70-90sccm;Step 4: When the low refractive index material is working, the ion source is filled with oxygen and argon at a ratio of 4:1/5:1, the flow rate of argon is 5-50sccm, the flow rate of oxygen is 10-50sccm, and the air pressure is 1.0E-3. Among them, the RF Beam current is 500-1600mA, and the voltage is 800-1400V. In order to fully consider the film stacking density, the coating rate is controlled at 8-10A/S; the high refractive index material ion source is filled with oxygen and argon at a ratio of 6:1 /7:1, argon flow at 10-15sccm, oxygen flow at 50-99sccm, coating pressure at 2.5E-2, RF Beam current at 800-1200 mA, voltage at 500-1400 V, coating rate at 3-4A /S, APC of high refractive index coating is controlled at 3.0E-2, and the actual intrusion oxygen is 70-90sccm;

步骤5:Al2O3中折射率材料的参数中需要做底料,表面不允许存在发红发黑现象,在镀膜过程中低温NO IAD,APC设定在2.0E-2,镀膜气压在1.0E-3,速率3A/S。Step 5: The parameters of the refractive index material in Al 2 O 3 need to be used as a primer, and redness and blackening are not allowed on the surface. During the coating process, low temperature NO IAD, APC is set at 2.0E-2, and the coating pressure is 1.0 E-3, rate 3A/S.

与现有技术相比,本发明的有益效果:本发明中玻璃表面膜层厚度均匀,监控方便,膜层在油墨面,颜色淡蓝色,在终端严格的测试标准中能稳定合格,极限测试产品在pH4.7、PH10溶液中可稳定72H外观无变化、无腐蚀、变色、起泡、开裂、膜层脱落等异常现象,另外本发明采用的膜层材料常见,且生产工艺简单,能够同时满足量产条件和节约成本已经成为目前最大的技术问题,满足客户的高端需求。Compared with the prior art, the present invention has the beneficial effects: in the present invention, the thickness of the film layer on the glass surface is uniform, and the monitoring is convenient. The film layer is on the ink surface, and the color is light blue. The product can be stabilized in pH4.7, PH10 solution for 72H without any change in appearance, no corrosion, discoloration, foaming, cracking, film shedding and other abnormal phenomena. In addition, the film material used in the present invention is common, and the production process is simple, which can simultaneously Satisfying mass production conditions and saving costs has become the biggest technical issue at present to meet the high-end needs of customers.

附图说明Description of drawings

图1为本发明一种强耐候性NCVM薄膜的结构示意图。Fig. 1 is a structural schematic diagram of a strong weather resistance NCVM film of the present invention.

具体实施方式Detailed ways

参看图1,一种强耐候性NCVM薄膜,包括基材1,其中,在所述基材1表面镀制膜层,所述膜层采用SiO2低折射率材料3、Al2O3中折射率材料4和Ti3O5高折射率材料2层叠而成,所述膜层由内到外的结构是:Ti3O5/SiO2/Ti3O5/SiO2/Ti3O5/SiO2/Ti3O5/Al2O3/SiO2层状结构;所述基材1采用玻璃基材;Referring to Fig. 1, a kind of strong weather resistance NCVM thin film, comprises substrate 1, wherein, on described substrate 1 surface coating film layer, described film layer adopts SiO 2 low refractive index material 3, Al 2 O 3 middle refraction High-refractive-index material 4 and Ti 3 O 5 high-refractive-index material 2 are laminated. The structure of the film layer from inside to outside is: Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 / SiO 2 /Ti 3 O 5 /Al 2 O 3 /SiO 2 layered structure; the substrate 1 is a glass substrate;

进一步地,所述每层SiO2低折射率材料3厚度为80nm-100nm,每层Ti3O5高折射率材料2为5nm-50nm,Al2O3中折射率材料厚度4为10nm-50nm。Further, the thickness of each layer of SiO 2 low refractive index material 3 is 80nm-100nm, the thickness of each layer of Ti 3 O 5 high refractive index material 2 is 5nm-50nm, and the thickness 4 of Al 2 O 3 medium refractive index material is 10nm-50nm .

进一步地,所述SiO2、Al2O3、Ti3O5膜层膜料纯度在99.999%。Further, the purity of the SiO 2 , Al 2 O 3 , and Ti 3 O 5 film materials is 99.999%.

本发明还提出一种强耐候性NCVM薄膜的镀制工艺,其包括以下步骤:The present invention also proposes a coating process for a strong weather-resistant NCVM film, which comprises the following steps:

步骤1:使用蒸发机270度EB加射频IB加晶控仪监控;Step 1: Use evaporator 270 degrees EB plus RF IB plus crystal controller to monitor;

步骤2:膜层设计采用SiO2低折射率材料3、Al2O3中折射率材料4和Ti3O5高折射率材料2层叠而成,所述膜层由内到外的结构是:Ti3O5/SiO2/Ti3O5/SiO2/Ti3O5/SiO2/Ti3O5/Al2O3/SiO2层状结构,所述每层SiO2低折射率材料3厚度为80nm-100nm,每层Ti3O5高折射率材料2为5nm-50nm,Al2O3中折射率材料4厚度为10nm-50nm;Step 2: The film layer is designed by laminating SiO 2 low refractive index material 3, Al 2 O 3 medium refractive index material 4 and Ti 3 O 5 high refractive index material 2. The structure of the film layer from inside to outside is: Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /Al 2 O 3 /SiO 2 layered structure, each layer of SiO 2 low refractive index material 3 The thickness is 80nm-100nm, each layer of Ti3O5 high refractive index material 2 is 5nm-50nm, and the thickness of Al2O3 medium refractive index material 4 is 10nm-50nm;

步骤3:以上膜料纯度在99.999%,蒸发源到基板距离在0.9m-1.2m之间;Step 3: The purity of the above film materials is 99.999%, and the distance from the evaporation source to the substrate is between 0.9m-1.2m;

步骤4:低折射率材料3在工作时,离子源充入氧气和氩气比4:1/5:1,氩气流量在5-50sccm,氧气流量在10-50sccm,气压在1.0E-3,其中射频Beam电流在500-1600mA,电压在800-1400V,为了充分考虑到膜层堆积密度,镀膜速率控制在8-10A/S;高折射率材料3离子源充入氧气和氩气比6:1/7:1,氩气流量在10-15sccm,氧气流量在50-99sccm,镀膜气压在2.5E-2,其中射频Beam电流在800-1200 mA,电压在500-1400 V,镀膜速率3-4A/S,高折射率镀膜APC控制在3.0E-2,实际冲入氧气为70-90sccm;Step 4: When the low refractive index material 3 is working, the ion source is filled with oxygen and argon at a ratio of 4:1/5:1, the argon flow rate is 5-50 sccm, the oxygen flow rate is 10-50 sccm, and the air pressure is 1.0E-3 , where the RF Beam current is 500-1600mA, and the voltage is 800-1400V. In order to fully consider the film stacking density, the coating rate is controlled at 8-10A/S; the high refractive index material 3 ion source is filled with oxygen and argon at a ratio of 6 : 1/7: 1, argon flow at 10-15sccm, oxygen flow at 50-99sccm, coating pressure at 2.5E-2, RF Beam current at 800-1200 mA, voltage at 500-1400 V, coating rate 3 -4A/S, the APC of high refractive index coating is controlled at 3.0E-2, and the actual rushing oxygen is 70-90sccm;

步骤5: Al2O3中折射率材料4的参数中需要做底料,表面不允许存在发红发黑现象,在镀膜过程中低温NO IAD,APC设定在2.0E-2,镀膜气压在1.0E-3,速率3A/S。Step 5: The parameters of the refractive index material 4 in Al 2 O 3 need to be used as a primer, and redness and blackening are not allowed on the surface. During the coating process, low temperature NO IAD, APC is set at 2.0E-2, and the coating pressure is at 1.0E-3, rate 3A/S.

与现有技术相比,本发明的有益效果:本发明中玻璃基材表面膜层厚度均匀,监控方便,膜层在油墨面,颜色淡蓝色,在终端严格的测试标准中能稳定合格,极限测试产品在pH4.7、PH10溶液中可稳定48H外观无变化、无腐蚀、变色、起泡、开裂、膜层脱落等异常现象,另外本发明采用的膜层材料常见,且生产工艺简单,能够同时满足量产条件和节约成本已经成为目前最大的技术问题,满足客户的高端需求。Compared with the prior art, the beneficial effect of the present invention is that the thickness of the film layer on the surface of the glass substrate in the present invention is uniform, and the monitoring is convenient. The film layer is on the ink surface, and the color is light blue. The limit test product can be stable in pH4.7, PH10 solution for 48H without any change in appearance, no corrosion, discoloration, foaming, cracking, film shedding and other abnormal phenomena. In addition, the film material used in the present invention is common, and the production process is simple. Being able to meet mass production conditions and save costs at the same time has become the biggest technical problem at present to meet the high-end needs of customers.

试验检测数据:本发明一种强耐候性NCVM薄膜经过一系列严格苛刻的性能测试结果如下:水煮100摄氏度,2小时1*1不出现脱膜,玻璃表面在溶液pH=4.7和pH=10放置48H,产品外观无变化、无腐蚀、变色、起泡、开裂 、膜层脱落等异常现象。Experimental detection data: A series of strict and harsh performance test results of a strong weather-resistant NCVM film of the present invention are as follows: boiled at 100 degrees Celsius, 2 hours 1*1 does not appear to be defilmed, and the glass surface is in the solution pH=4.7 and pH=10 Placed for 48 hours, there is no change in the appearance of the product, no corrosion, discoloration, blistering, cracking, film shedding and other abnormal phenomena.

Claims (4)

1. A strong weatherability NCVM film comprising a substrate characterized by: coating a film layer on the surface of the base material, wherein the film layer adopts SiO 2 Low refractive index material, al 2 O 3 Medium refractive index material and Ti 3 O 5 High-foldingThe film layer is formed by laminating the emissivity materials, and the structure from inside to outside is as follows: ti (Ti) 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /Al 2 O 3 /SiO 2 A layered structure.
2. A strong weatherability NCVM film as recited in claim 1, wherein: each layer of SiO 2 The thickness of the low refractive index material is 80nm-100nm, each layer of Ti 3 O 5 The high refractive index material is 5nm-50nm, al 2 O 3 The thickness of the medium refractive index material is 10nm-50nm.
3. A strong weatherability NCVM film as recited in claim 1, wherein: the SiO is 2 、Al 2 O 3 、Ti 3 O 5 The purity of the film material of the film layer is 99.999 percent.
4. A process for plating a strong weatherability NCVM film as claimed in claim 1, comprising the steps of:
step 1: monitoring by using an evaporator 270-DEG EB and radio frequency IB crystal adding control instrument;
step 2: the film layer is designed by SiO 2 Low refractive index material, al 2 O 3 Medium refractive index material and Ti 3 O 5 The high refractive index material is laminated, and the film layer has the structure from inside to outside that: ti (Ti) 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /SiO 2 /Ti 3 O 5 /Al 2 O 3 /SiO 2 A layered structure of each layer of SiO 2 The thickness of the low refractive index material is 80nm-100nm, each layer of Ti 3 O 5 The high refractive index material is 5nm-50nm, al 2 O 3 The thickness of the medium refractive index material is 10nm-50nm;
step 3: the purity of the film material is 99.999 percent, and the distance from the evaporation source to the substrate is 0.9m-1.2 m;
step 4: in operation, the ion source is charged with oxygen and argon in a ratio of 4:1/5:1, argon flow is 5-50sccm, oxygen flow is 10-50sccm, air pressure is 1.0E-3, radio frequency Beam current is 500-1600mA, voltage is 800-1400V, and in order to fully consider film layer stacking density, film coating speed is controlled at 8-10A/S; high refractive index material ion source is filled with oxygen and argon in the ratio of 6:1/7:1, argon flow is 10-15sccm, oxygen flow is 50-99sccm, film plating air pressure is 2.5E-2, radio frequency Beam current is 800-1200 mA, voltage is 500-1400V, film plating speed is 3-4A/S, high refractive index film plating APC is controlled at 3.0E-2, and actually oxygen is flushed in the film at 70-90sccm;
step 5: al (Al) 2 O 3 The parameters of the medium refractive index material need to be used as a primer, the surface is not allowed to have the phenomenon of reddening and blackening, the low-temperature NO IAD is adopted in the film plating process, the APC is set at 2.0E-2, the film plating air pressure is 1.0E-3, and the speed is 3A/S.
CN202111561653.3A 2021-12-20 2021-12-20 A kind of strong weather resistance NCVM thin film and coating process Pending CN116282953A (en)

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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102747328A (en) * 2012-06-27 2012-10-24 同济大学 Coating method capable of improving laser induced damage threshold of high-reflectivity film
CN103173720A (en) * 2013-03-22 2013-06-26 同济大学 Preparation method for waterproof laser film
US20140376094A1 (en) * 2013-05-07 2014-12-25 Corning Incorporated Low-Color Scratch-Resistant Articles with a Multilayer Optical Film
CN106495746A (en) * 2016-12-01 2017-03-15 潮州三环(集团)股份有限公司 A kind of black ceramic and the method for increase black ceramic blackness
CN110205594A (en) * 2019-05-24 2019-09-06 河南镀邦光电股份有限公司 A kind of cover board IM coating structure and preparation method
CN110208885A (en) * 2019-06-28 2019-09-06 浙江舜宇光学有限公司 Plated film lens, optical lens and the method for forming plated film lens
CN110216934A (en) * 2019-07-15 2019-09-10 浙江星星科技股份有限公司 A kind of superhard anti-blue light display panel
CN111683910A (en) * 2018-01-31 2020-09-18 Agc株式会社 Glass substrates and optical components with anti-reflection coatings
CN112458409A (en) * 2020-11-25 2021-03-09 湖北久之洋红外系统股份有限公司 Preparation method of underwater pressure-resistant optical window antireflection film

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102747328A (en) * 2012-06-27 2012-10-24 同济大学 Coating method capable of improving laser induced damage threshold of high-reflectivity film
CN103173720A (en) * 2013-03-22 2013-06-26 同济大学 Preparation method for waterproof laser film
US20140376094A1 (en) * 2013-05-07 2014-12-25 Corning Incorporated Low-Color Scratch-Resistant Articles with a Multilayer Optical Film
CN106495746A (en) * 2016-12-01 2017-03-15 潮州三环(集团)股份有限公司 A kind of black ceramic and the method for increase black ceramic blackness
CN111683910A (en) * 2018-01-31 2020-09-18 Agc株式会社 Glass substrates and optical components with anti-reflection coatings
CN110205594A (en) * 2019-05-24 2019-09-06 河南镀邦光电股份有限公司 A kind of cover board IM coating structure and preparation method
CN110208885A (en) * 2019-06-28 2019-09-06 浙江舜宇光学有限公司 Plated film lens, optical lens and the method for forming plated film lens
CN110216934A (en) * 2019-07-15 2019-09-10 浙江星星科技股份有限公司 A kind of superhard anti-blue light display panel
CN112458409A (en) * 2020-11-25 2021-03-09 湖北久之洋红外系统股份有限公司 Preparation method of underwater pressure-resistant optical window antireflection film

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
朴政国等编著: "光伏发电原理、技术及其应用", 31 January 2020, 机械工业出版社, pages: 184 *

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