CN116300293B - Double-moment X-ray backlight photographing system and method based on single-beam laser - Google Patents
Double-moment X-ray backlight photographing system and method based on single-beam laser Download PDFInfo
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- CN116300293B CN116300293B CN202310140160.5A CN202310140160A CN116300293B CN 116300293 B CN116300293 B CN 116300293B CN 202310140160 A CN202310140160 A CN 202310140160A CN 116300293 B CN116300293 B CN 116300293B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B42/00—Obtaining records using waves other than optical waves; Visualisation of such records by using optical means
- G03B42/02—Obtaining records using waves other than optical waves; Visualisation of such records by using optical means using X-rays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B42/00—Obtaining records using waves other than optical waves; Visualisation of such records by using optical means
- G03B42/02—Obtaining records using waves other than optical waves; Visualisation of such records by using optical means using X-rays
- G03B42/025—Positioning or masking the X-ray film cartridge in the radiographic apparatus
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Abstract
The invention relates to the field of laser fusion research and the technical field of X-ray detection, in particular to a double-moment X-ray back-light photographing system and a method based on single-beam laser, wherein the back-light photographing method comprises the steps of generating a primary X-ray source based on primary targets under the primary focusing action of the single-beam laser; the transmitted laser which does not act on the primary target is transmitted to a focusing optical device from the outer side of the primary target, the focused optical device is used for secondary focusing and the focal spot of the transmitted laser is reduced, a secondary X-ray source is generated based on the secondary target acted by the secondarily focused transmitted laser, and the image acquisition device is used for realizing backlight photography. The method aims to solve the technical problem that a single-beam laser acting target can only generate one X-ray source at a time in the existing laser X-ray radiography method, and achieve the technical effect of double-moment X-ray backlight radiography based on single-beam laser coaxial or double-axis.
Description
Technical Field
The invention relates to the field of laser fusion research and the technical field of X-ray detection, in particular to a double-moment X-ray backlight photographing system and method based on single-beam laser.
Background
At present, the internal structure information of an object is obtained based on the perspective photographing technology with high penetrating power of X-rays, the method is widely applied to the fields of industrial nondestructive testing, medical diagnosis, scientific research and the like, the traditional X-ray source comprises a radiation source, an X-ray machine, an accelerator X-ray source and the like, various novel ultra-fast ultra-strong X-ray sources are generated based on strong laser along with the progress of strong laser engineering technology, the power density after focusing of high-energy picosecond laser and femtosecond laser exceeds relativity intensity (about 10 18W/cm2), therefore, a large amount of MeV high-energy electrons can be generated by targeting so as to generate high-brightness high-energy X-ray sources, the pulse width of the novel X-ray sources is generally shorter than 0.1ns, when the novel X-ray sources are applied to transient photographing of the object with high-speed motion (speed of 1-1000 km/s), the image blurring brought by motion can be reduced to be below 0.1mm, and the advantage of small focal spot of the laser X-ray source can be combined, so that the ultra-fast high-energy X-ray phase based on the laser X-ray source can be widely applied to the fields of high-energy physics, inertial restraint fusion and the like.
When the laser X-ray source based ultra-fast high-energy X-ray photography is applied, the number of the laser X-ray sources, the high-speed motion characteristic of objects and the limited time resolution of an image recording system are limited, and multi-time multi-angle photographic images are difficult to obtain simultaneously;
In the prior art, the number of laser X-ray sources is increased by increasing the number of picosecond lasers, and the multi-angle and multi-moment ultra-fast high-energy radiography application, such as Compton radiography application for inertial confinement fusion, can be realized by changing the laser targeting moment, but in the technical scheme, a single laser acting target can only generate one X-ray source at a time, so that the scheme for increasing the number of the targeted lasers can increase the system scale and complexity and bring great economic cost, and therefore, the double-moment X-ray backlight radiography system and method based on the single laser are provided.
Disclosure of Invention
The invention aims to provide a double-moment X-ray backlight photographing system and method based on single-beam laser, which are used for solving the technical problem that a single-beam laser acting target can only generate one X-ray source at a time in the existing laser X-ray photographing method in the background technology and realizing the technical effect of double-moment X-ray backlight photographing based on single-beam laser coaxial or double-axis.
The technical scheme of the first aspect of the invention provides a double-moment X-ray backlight photographing system based on single-beam laser, which comprises a focusing optical device, an object to be tested and an image acquisition device, wherein the focusing optical device, the object to be tested and the image acquisition device are sequentially arranged at intervals, one side of the focusing optical device, which is close to the object to be tested, is provided with two focuses, and primary targets and secondary targets are respectively arranged on the two focuses.
Further, the primary target is configured to have a cross-sectional dimension that is smaller than a focal spot of the incident laser light.
Further, the primary target is a microwire target or a microsphere target.
Further, the secondary target is one of a microwire target, a microsphere target, and a planar target.
Further, the focusing optics employ an ellipsoidal focusing mirror.
The technical scheme of the second aspect of the invention provides a double-moment X-ray backlight photographing method based on single-beam laser, which comprises the following steps:
generating a primary X-ray source based on a primary target of a primary focusing action of a single laser;
the transmission laser light which does not act on the primary target is transmitted to the focusing optical device from the outer side of the primary target, and the focusing optical device is utilized for secondary focusing and the focal spot of the transmission laser light is reduced;
Generating a secondary X-ray source based on the secondarily focused transmitted laser acting on the secondary target;
and realizing backlight photographing by using the image acquisition device.
Further, the method further comprises:
The position between the object to be detected and the two focuses of the focusing optical device is changed, so that the photographing angle is adjusted, and coaxial photographing or biaxial photographing is realized;
and the photographing moment is further adjusted by adjusting parameters of the focusing optical device or the distance between an object to be measured and two focuses of the focusing optical device, so that coaxial double-moment photographing or double-shaft double-moment photographing is realized.
Further, the adjusting the photographing angle by changing the position between the object to be measured and the two focuses of the focusing optical device, the implementing coaxial photographing specifically includes:
the object to be measured is configured to be placed on an extension line of a connecting line of two focuses of the focusing optical device, so that the object to be measured and the two focuses are distributed in a collinear manner, and coaxial photographing is realized.
Further, the method for implementing biaxial photography by changing the position between the object to be tested and the two focuses of the focusing optical device to adjust the photographing angle specifically includes:
the object to be measured is configured to be placed on one side of the focusing optical device, which is far away from the two focal points, of the focusing optical device, so that the object to be measured and the two focal points are distributed in a triangular manner, and biaxial photographing is realized.
Further, the method further comprises:
The secondary target cross-section size is configured to be smaller than the spot diameter after secondary focusing so as to improve the spatial resolution of the X-ray source, or the secondary target cross-section size is configured to be larger than the spot diameter after secondary focusing so as to improve the laser energy utilization rate.
The beneficial effects of the invention include:
1. The invention realizes that a single-beam laser performs one-time shooting to generate a primary X-ray source and a secondary X-ray source by arranging the focusing optical device and combining the primary target and the secondary target, and on the other hand, realizes the technical effect of double-moment X-ray backlight shooting based on the coaxial or double-shaft of the single-beam laser by utilizing the image acquisition device by changing the position between the object to be detected and the two focuses of the focusing optical device, reduces the requirement of realizing the double-moment shooting on the number of lasers and reduces the economic cost compared with the prior art.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the embodiments of the present invention will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and should not be considered as limiting the scope, and other related drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a backlight camera system according to an embodiment of the present invention;
fig. 2 is a schematic diagram of a coaxial dual-moment backlight camera structure according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a dual-axis dual-instant backlight camera according to an embodiment of the present invention;
fig. 4 is a schematic flow chart of a backlight photographing method according to an embodiment of the invention.
The icons are 100-focusing optics, 110-secondarily focused transmitted laser, 200-object to be tested, 300-image acquisition device, 400-primary target, 410-transmitted laser, 420-primary X-ray source, 500-secondary target, 510-secondary X-ray source, 600-incident laser.
Detailed Description
The technical solutions in the embodiments of the present invention will be described below with reference to the accompanying drawings in the embodiments of the present invention.
It should be noted that like reference numerals and letters refer to like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures. Meanwhile, in the description of the present invention, the terms "first", "second", and the like are used only to distinguish the description, and are not to be construed as indicating or implying relative importance.
Referring to fig. 1, a technical solution of a first aspect of the present invention provides a dual-moment X-ray back-light photographing system based on a single laser, which includes a focusing optical device 100, an object 200 to be measured and an image acquisition device 300, which are sequentially arranged at intervals, wherein one side of the focusing optical device 100, which is close to the object 200 to be measured, is provided with two focuses, and a primary target 400 and a secondary target 500 are respectively arranged on the two focuses;
Preferably, the cross-section size of the primary target 400 is configured to be smaller than the focal spot of the incident laser light 600, the primary target 400 can be a microwire target or a microsphere target with a micrometer diameter, for example, a tungsten wire target with a diameter of 5-10um, or Jin Qiuba with a diameter of 5-10um, when in actual use, the high-power laser light acts on the primary target 400 to generate a large amount of high-energy electrons, and the high-energy electrons generate the primary X-ray source 420 in the primary target 400;
For example, selecting a primary target 400 of small size may produce a primary X-ray source 420 of small focal spot, and the primary X-ray source 420 of small focal spot may enable high resolution imaging, it being understood that in such a backlighting system, some of the laser light not acting on the primary target 400 may be transmitted through the outside of the primary target 400, producing transmitted laser light 410, and the smaller the size of the primary target 400, the greater the fraction of transmitted laser light 410, and more transmitted laser light 410 may be transmitted through the outside of the primary target 400.
Preferably, the focusing optical device 100 adopts an ellipsoidal focusing mirror, and based on the characteristics of the ellipsoidal focusing mirror, light emitted from one of the two focuses of the ellipsoidal focusing mirror is focused to the other focus, so that the reduction of an optical focal spot can be realized, the primary target 400 and the secondary target 500 are respectively placed on the two focuses of the ellipsoidal focusing mirror, and based on the parameter settings (long axis length and short axis length) of the ellipsoidal focusing mirror, the focal spot of the transmission laser 410 after secondary focusing on the ellipsoidal focusing mirror is smaller than the focal spot of the original transmission laser, so that the power of the transmission laser 410 after secondary focusing is high enough to generate the secondary X-ray source 510;
Preferably, the secondary target 500 may be one of a microwire target, a microsphere target and a planar target, and in practical use, the transmitted laser 410 acts on the secondary target 500 to generate a secondary X-ray source 510 after being secondarily focused by an ellipsoidal focusing mirror, and the size of the secondary target 500 is also determined according to the requirements in practical use;
For example, if the secondary target 500 is configured to have a size smaller than the diameter of the spot after secondary focusing in order to generate the secondary X-ray source 510 with micro-focus, the spatial resolution of the secondary X-ray source is improved;
the dual-moment X-ray back light photographing system based on single laser provided by the disclosure realizes that the single-beam laser is subjected to one-time shooting to generate two X-ray sources of the primary X-ray source 420 and the secondary X-ray source 510 by arranging the focusing optical device 100 and combining the primary target 400 and the secondary target 500, and compared with the prior art, the dual-moment photographing system reduces the requirement on the number of lasers for realizing dual-moment photographing and reduces the economic cost.
Referring to fig. 4, the technical solution of the second aspect of the present invention provides a dual-moment X-ray back-light photographing method based on a single laser, comprising the following steps:
Step S1, generating a primary X-ray source 420 based on the primary target 400 acted on by the primary focusing of the single laser;
The single laser can be focused for the first time by using the existing off-axis parabolic mirror, and the angle between the incidence angle of the single laser and the primary target 400 (the angle can change the optical path) can be determined according to actual requirements;
Step S1 further comprises configuring the focusing optic 100 to transmit the laser light 410 to a power density of 10 14W/cm2～1015W/cm2 on the surface of the focusing optic 100, wherein the power density in the above range is used to generate a plasma mirror on the surface of the focusing optic 100 to achieve a higher laser reflectivity of the focusing optic 100;
Step S2, the transmission laser light 410 which does not act on the primary target 400 is transmitted to the focusing optical device 100 from the outer side of the primary target 400, and the focusing optical device 100 is utilized for secondary focusing and the focal spot of the transmission laser light 410 is reduced;
Step S3, generating a secondary X-ray source 510 based on the secondarily focused transmitted laser light 410 acting on the secondary target 500;
step S4, utilizing the image acquisition device 300 to realize backlight photographing;
preferably, the above-mentioned backlight photographing method further comprises:
The position between the object 200 to be measured and the two focuses of the focusing optical device 100 is changed, so that the photographing angle is adjusted, and coaxial photographing or biaxial photographing is realized;
Preferably, the photographing angle is adjusted by changing the position between the object 200 to be measured and the two focuses of the focusing optical device 100, as shown in fig. 3, the implementation of the coaxial photographing specifically includes that the object 200 to be measured is configured to be placed on an extension line of the line between the two focuses of the focusing optical device 100, it can be understood that at this time, the object 200 to be measured and the two focuses of the focusing optical device 100 are distributed in a three-point collinear manner, and at this time, the implementation of the coaxial photographing is realized;
Preferably, the method for adjusting the photographing angle by changing the position between the object 200 to be measured and the two focuses of the focusing optical device 100, as shown in fig. 2, specifically includes configuring the object 200 to be measured to be placed on the side far away from the focusing optical device 100 and connected to the two focuses of the focusing optical device 100, where it can be understood that the object 200 to be measured and the two focuses of the focusing optical device 100 are in triangular distribution, and the biaxial photographing is implemented at this time;
Preferably, the photographing time is adjusted by adjusting parameters of the focusing optical device 100 or a distance between the object 200 to be measured and two focuses of the focusing optical device 100, so as to realize coaxial double-time photographing or biaxial double-time photographing;
for example, as shown in fig. 2, when applied to dual-axis dual-time backlight photography, the image acquisition device 300 may be configured as an X-ray image recording device such as a time-integrating imaging plate, a film, an X-ray CCD, a scintillator-coupled CMOS, or a photon-counting semiconductor detector or an X-ray framing camera with time resolution capability;
For example, as shown in fig. 3, when applied to coaxial dual-moment back light photography, the image acquisition device 300 may be configured as an existing device such as an X-ray framing camera with time resolution capability;
For example, when the object 200 to be measured is placed on the extension line of the line connecting the two focuses of the focusing optics 100 or on the midplane of the two focuses of the focusing optics 100, the adjustment of the photographing moment is determined by the specific parameters of the focusing optics 100;
For example, when the position of the object 200 to be measured is located on the intersection line of the axes of the primary target 400 and the secondary target 500, the photographing time is determined by the specific parameters of the focusing optical device 100, and is also related to the specific position of the object 200 to be measured on the intersection line, specifically, by changing the specific position between the object 200 to be measured and the primary target 400 and the secondary target 500, the optical path of the secondary focusing of the focusing optical device 100 is changed, so as to adjust the photographing time of the X-ray source, thereby realizing double-time photographing;
Preferably, the method further comprises configuring the cross-sectional dimension of the secondary target 500 to be smaller than the spot diameter after secondary focusing to improve the spatial resolution of the X-ray source, or configuring the cross-sectional dimension of the secondary target 500 to be larger than the spot diameter after secondary focusing to improve the laser energy utilization rate;
an embodiment is provided below to describe the above-mentioned backlight photographing method in detail:
In this embodiment, first, a primary target 400 is placed at the first focal point of an ellipsoidal focusing mirror, the energy of an incident single laser beam is selected to be 100J, the pulse width is 1ps, the incident single laser beam is focused for the first time by an off-axis parabolic mirror with an F number of 2.5, the focused light spot size is 30 μm, and the power density after focusing is 9×10 18W/cm2;
Since the laser focal spot is larger than the primary target 400, only about 36J of energy laser can act on the primary target 400, and the primary X-ray source 420 with energy larger than 10keV can generate, the photon number of the primary X-ray source 420 is 9 multiplied by 10 11;
The parameters of the ellipsoidal focusing mirror are configured to be 16.8mm in long axis and 12mm in short axis, the included angle between the connecting lines of the two focuses of the incident single-beam laser and the ellipsoidal focusing mirror is configured to be 20 degrees, at the moment, the light spot of the transmitted laser 410 reaching the ellipsoidal focusing mirror is dispersed to be about 10mm in diameter, the corresponding laser power density is about 10 15W/cm2, at the moment, the reflectivity of the ellipsoidal focusing mirror to the transmitted laser 410 is about 50% under the power density, and at the moment, 32J of laser is secondarily focused;
further, after calculation according to the imaging formula of the ellipsoidal focusing mirror, the focal spot of the laser reaching the secondary target 500 is reduced by 0.38 times to 11.4 μm, and the power density of the laser reaching the secondary target 500 after secondary focusing is 2×10 19W/cm2;
wherein the secondary target 500 at the second focus of the ellipsoidal focusing mirror is configured as Jin Siba with a diameter of 10um, the angle of incidence of the transmitted laser 410 on the secondary target 500 is configured as 50 DEG, and the number of photons larger than 10keV in the generated energy can reach 1×10 12;
Then, the object to be measured 200 is placed at the intersection of the axes of the primary target 400 and the secondary target 500, and then 2 point-like X-ray sources of 10 μm are photographed as seen from the direction of the object to be measured 200, whereby a spatial resolution of 10 μm in 2 directions can be obtained, in this arrangement, the distance from the primary target 400 to the object to be measured 200 is configured to be 18.5mm, the distance from the secondary target 500 to the object to be measured 200 is configured to be 14.5mm, and the total optical path difference including the optical path difference brought about by the focusing optics 100 is 29.6mm, corresponding to a time delay of 98.6 ps;
Finally, a multi-layer imaging plate is placed in the photographing direction of the double light sources to realize double-shaft double-moment photographing, the embodiment utilizes single picosecond laser to enter a double-gold wire target system comprising an ellipsoidal focusing mirror, double-shaft double-moment X-ray back light photographing is realized, photographing resolution of each shaft reaches 10 mu m, time delay of double moments is about 100ps, and the method can be used for researching a high-speed object evolution process with speed of more than 100km/s, such as kinetic research of an implosion target pill of inertial confinement fusion.
In summary, according to the dual-moment X-ray backlight photographing method based on single-beam laser provided by the present disclosure, by changing the position between the object 200 to be measured and the two focuses of the focusing optical device 100, the technical effect of dual-moment X-ray backlight photographing based on single-beam laser coaxial or dual-axis is achieved by using the image acquisition device 300, information of two viewing angles of the housing to be measured can be obtained, and the photographing visibility can be flexibly adjusted according to requirements.
The foregoing is merely illustrative of the present invention, and the present invention is not limited thereto, and any person skilled in the art will readily recognize that variations or substitutions are within the scope of the present invention. Therefore, the protection scope of the invention is subject to the protection scope of the claims.
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