CN116375352B - Chemical polishing reagent and preparation method and application thereof - Google Patents
Chemical polishing reagent and preparation method and application thereofInfo
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- CN116375352B CN116375352B CN202211564427.5A CN202211564427A CN116375352B CN 116375352 B CN116375352 B CN 116375352B CN 202211564427 A CN202211564427 A CN 202211564427A CN 116375352 B CN116375352 B CN 116375352B
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- chemical polishing
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/06—Other polishing compositions
- C09G1/14—Other polishing compositions based on non-waxy substances
- C09G1/18—Other polishing compositions based on non-waxy substances on other substances
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
- C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Surface Treatment Of Glass (AREA)
- ing And Chemical Polishing (AREA)
Abstract
本申请涉及一种化学抛光试剂及其制备方法和应用。该化学抛光试剂包括如下质量份数的各组份：0.8份～15份的碱性试剂、0.05份～0.5份的表面活性剂以及83.5份～99.05份的多元醇溶剂。上述化学抛光试剂中使用多元醇类有机溶剂，使用该化学抛光试剂对玻璃进行消除微裂纹加工时，可使化学抛光的反应体系温度更高，增强化学抛光试剂对产品的抛光能力，在升温过程中，多元醇与碱性试剂发生反应，生成有机碱。有机碱能够提升化学抛光试剂对玻璃的腐蚀性，从而对玻璃实现较好的化学抛光效果，消除微裂纹以增强玻璃的强度。The present application relates to a chemical polishing agent, a preparation method and an application thereof. The chemical polishing agent includes the following components in parts by mass: 0.8 to 15 parts of an alkaline agent, 0.05 to 0.5 parts of a surfactant and 83.5 to 99.05 parts of a polyol solvent. A polyol organic solvent is used in the above-mentioned chemical polishing agent. When the chemical polishing agent is used to eliminate microcracks in glass, the temperature of the chemical polishing reaction system can be made higher, thereby enhancing the polishing ability of the chemical polishing agent on the product. During the heating process, the polyol reacts with the alkaline agent to generate an organic base. The organic base can enhance the corrosiveness of the chemical polishing agent to the glass, thereby achieving a better chemical polishing effect on the glass, eliminating microcracks and enhancing the strength of the glass.
Description
Technical Field
The application relates to the technical field of chemical polishing, in particular to a chemical polishing reagent and a preparation method and application thereof.
Background
At present, electronic products such as tablet computers and mobile phones are pursued to be light and thin, the thickness of a glass cover plate is also thinner and thinner, and in order to reduce drop damage of the glass cover plate, the glass cover plate is required to have higher strength. Glass is a brittle material, and the strength of the glass is affected by a plurality of factors, wherein the existence of surface microcracks greatly affects the strength of the glass. After the glass is subjected to working procedures such as cutting, CNC treatment, light sweeping and the like, a large number of microcracks are generated on the surface of the glass, and the strength of the glass is obviously reduced due to the microcracks. Thus, eliminating these microcracks is an effective method of improving the strength of the glass. At present, conventional glass has lower strength due to the presence of microcracks.
Disclosure of Invention
Based on this, it is necessary to provide a chemical polishing agent, a method for preparing the same and an application thereof. The chemical polishing agent can remove microcracks and improve the strength of glass.
In a first aspect, the application provides a chemical polishing reagent, which comprises the following components in parts by weight:
0.8-15 parts of alkaline reagent, 0.05-0.5 part of surfactant and
83.5 To 99.05 parts of polyol solvent.
In some embodiments, the polyol solvent comprises one or more of ethylene glycol, glycerol, polyethylene glycol, pentaerythritol, trimethylolethane, and xylitol;
and/or the alkaline reagent comprises one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide and magnesium hydroxide;
and/or the surfactant comprises at least one of isooctanol polyoxyethylene ether phosphate and a rapid permeation agent T.
In some embodiments, the cleaning agent further comprises 0.1-1 parts by mass of the cleaning agent.
In some embodiments, the impurity removing agent includes one or more of sodium citrate, sodium tetraborate, disodium edetate, and sodium gluconate.
In a second aspect, the present application provides a method of preparing a chemical polishing agent, comprising:
mixing an alkaline agent, a surfactant and a polyol solvent.
In a third aspect, the present application provides a glass processing method comprising:
The glass to be treated is chemically polished using any one of the chemical polishing agents described above or the chemical polishing agent prepared by the preparation method described above.
In some embodiments, the chemical polishing temperature is 60 ℃ to 150 ℃.
In some embodiments, the chemical polishing is performed for 10min to 120min.
In some embodiments, the method further comprises subjecting the chemically polished glass to a condensation dehydration treatment.
In some of these embodiments, the condensation dehydration treatment includes at least one of sulfuric acid condensation dehydration, bake condensation dehydration, and silane coupling agent condensation dehydration.
In a fourth aspect, the present application provides a glass processed by the chemical polishing agent of any one of the above or the chemical polishing agent prepared by the above preparation method, or by any one of the above glass processing methods.
In the chemical polishing agent, a polyhydric alcohol-based organic solvent is used as the solvent. When the chemical polishing agent is used for eliminating microcracks of glass, the temperature of a chemical polishing reaction system can be higher, and the polishing capability of the chemical polishing agent on products is enhanced. Meanwhile, the polyalcohol organic solvent is used, and in the chemical polishing process, the polyalcohol reacts with the alkaline reagent to generate organic alkali, so that the organic alkali can promote the corrosiveness of the chemical polishing reagent on the glass, thereby realizing better chemical polishing effect on the glass, and eliminating microcracks to enhance the strength of the glass. The surfactant can reduce the surface tension of the solution when the chemical polishing agent is used for chemically polishing the glass sample, and increase the permeability and the dispersibility of the solution, thereby reducing the possibility of depositing chemical polishing products on the surface of the glass.
According to the glass processing method, the chemical polishing reagent is used for processing the glass, the effect of eliminating glass microcracks is good, and the strength of the processed glass is high.
Detailed Description
The following detailed description of the present application will provide further details in order to make the above-mentioned objects, features and advantages of the present application more comprehensible. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. The present application may be embodied in many other forms than described herein and similarly modified by those skilled in the art without departing from the spirit of the application, whereby the application is not limited to the specific embodiments disclosed below.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The term "and/or" as used herein includes any and all combinations of one or more of the associated listed items.
The embodiment of the application provides a chemical polishing reagent, which comprises the following components in parts by weight:
0.8-15 parts of alkaline reagent, 0.05-0.5 part of surfactant and
83.5 To 99.05 parts of polyol solvent. In the chemical polishing agent, a polyhydric alcohol-based organic solvent is used as the solvent. When the chemical polishing agent is used for eliminating microcracks of glass, the temperature of a chemical polishing reaction system can be higher, and the polishing capability of the chemical polishing agent on products is enhanced. Meanwhile, using a polyalcohol organic solvent, and reacting the polyalcohol with an alkaline reagent in the polishing process to generate organic alkali. The organic alkali can promote the corrosiveness of the chemical polishing agent to the glass, so that a good chemical polishing effect is realized on the glass, and microcracks are eliminated to enhance the strength of the glass. The surfactant can reduce the surface tension of the solution when the chemical polishing agent is used for chemically polishing the glass sample, and increase the permeability and the dispersibility of the solution, thereby reducing the possibility of depositing chemical polishing products on the surface of the glass.
In some embodiments, the polyol solvent comprises one or more of ethylene glycol, glycerol, polyethylene glycol, pentaerythritol, trimethylolethane, and xylitol;
and/or the alkaline reagent comprises one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide and magnesium hydroxide;
and/or the surfactant comprises at least one of isooctanol polyoxyethylene ether phosphate and a rapid permeation agent T.
In some embodiments, the polyol solvent includes one or more of ethylene glycol, glycerol, polyethylene glycol, pentaerythritol, trimethylolethane, and xylitol.
In some embodiments, the alkaline agent comprises one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide, magnesium hydroxide.
In some embodiments, the surfactant comprises at least one of isooctanol polyoxyethylene ether phosphate and a fast permeabilizing agent T.
In some embodiments, the polyol solvent comprises one or more of ethylene glycol, glycerol, polyethylene glycol, pentaerythritol, trimethylolethane, and xylitol, the alkaline agent comprises one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide, magnesium hydroxide, and the surfactant comprises at least one of isooctanol polyoxyethylene ether phosphate and a fast permeabilizer T.
In some embodiments, the cleaning agent further comprises 0.1-1 parts by mass of the cleaning agent. The impurity removing agent can reduce the influence of impurities in a reaction system on the chemical polishing effect when the chemical polishing agent is used for chemically polishing a glass sample.
In some embodiments, the impurity removing agent includes one or more of sodium citrate, sodium tetraborate, disodium edetate, and sodium gluconate.
In some embodiments, the chemical polishing agent comprises the following components in parts by weight:
0.8-15 parts of alkaline reagent, 0.05-0.5 part of surfactant, 0.1-1 part of impurity removing agent and 83.5-99.05 parts of polyol solvent. In the chemical polishing agent, a polyhydric alcohol type organic solvent is used as the solvent, and the solvent is free of water, and the chemical polishing agent is an anhydrous polishing agent. When the chemical polishing agent is used for eliminating microcracks of glass, the temperature of a chemical polishing reaction system can be higher, and the polishing capability of the chemical polishing agent on products is enhanced. Meanwhile, the polyalcohol organic solvent is used, and in the chemical polishing process, the polyalcohol reacts with the alkaline reagent to generate organic alkali, so that the organic alkali can promote the corrosiveness of the chemical polishing reagent on the glass, thereby realizing better chemical polishing effect on the glass, and eliminating microcracks to enhance the strength of the glass. Meanwhile, hydrofluoric acid or concentrated sulfuric acid is not used for polishing in the chemical polishing reagent, so that the risk of harm to human bodies when the hydrofluoric acid or the concentrated sulfuric acid is used for polishing is avoided.
In some embodiments, the chemical polishing agent comprises the following components in percentage by mass:
0.8% -15% of alkaline reagent, 0.05% -0.5% of surfactant, 0.1% -1% of impurity removing agent and 83.5% -99.05% of polyol solvent.
In another embodiment of the present application, a method for preparing a chemical polishing agent is provided, comprising:
mixing an alkaline agent, a surfactant and a polyol solvent.
In some of these embodiments, the method of preparing the chemical polishing agent includes mixing an alkaline agent, a surfactant, a contaminant removal agent, and a polyol solvent.
Yet another embodiment of the present application provides a glass processing method comprising:
The glass to be treated is chemically polished using any one of the chemical polishing agents described above or the chemical polishing agent prepared by the preparation method described above.
In some embodiments, chemically polishing the glass using the chemical polishing agent of any one of the above or the chemical polishing agent prepared by the method of preparation described above comprises etching the surface of the glass after heating the chemical polishing agent to a use temperature.
In some embodiments, the chemical polishing temperature is 60 ℃ to 150 ℃. When the temperature of chemical polishing is too low, the generation of organic alkali is poor, the corrosion effect of chemical polishing reagent on glass is poor, and when the temperature of chemical polishing is too high, the volatilization of solvent is too fast, and the effect of chemical polishing is poor. In the chemical polishing temperature, the chemical polishing reagent has better corrosion effect on the glass, and the obtained glass has higher strength. Alternatively, the temperature of the chemical polishing is 60 ℃, 65 ℃, 70 ℃, 75 ℃, 80 ℃, 85 ℃, 90 ℃, 95 ℃,100 ℃, 105 ℃,110 ℃, 115 ℃, 120 ℃, 125 ℃, 130 ℃, 135 ℃, 140 ℃, 145 ℃, or 150 ℃.
In some embodiments, the chemical polishing is performed for 10min to 120min. When the chemical polishing time is too short, the corrosion effect of the chemical polishing reagent on the glass is not obvious, the glass strengthening effect is poor, and when the chemical polishing time is too long, the corrosion of the chemical polishing reagent on the glass is excessive, so that the strength of the glass is reduced. In the time range of the chemical polishing, the chemical polishing reagent has better corrosion effect on glass and better glass strength enhancement effect. Alternatively, the time of chemical polishing is 10min、15min、20min、25min、30min、35min、40min、45min、50min、55min、60min、65min、70min、75min、80min、85min、90min、95min、100min、105min、110min、115min or 120min.
In some embodiments, the method further comprises sequentially performing material cutting, CNC treatment, polishing treatment and tempering treatment on the sample before chemical polishing to obtain glass to be treated.
In some embodiments, the method further comprises subjecting the chemically polished glass to a condensation dehydration treatment.
In some of these embodiments, the condensation dehydration treatment includes at least one of sulfuric acid condensation dehydration, bake condensation dehydration, and silane coupling agent condensation dehydration.
In some embodiments, the concentration of sulfuric acid in the sulfuric acid condensation dehydration is 50% -98%. Alternatively, the concentration of sulfuric acid in the sulfuric acid condensation dehydration is 50%, 52%, 54%, 56%, 58%, 60%, 65%, 70%, 75%, 80%, 85%, 90%, 92%, 94%, 96% or 98%.
In some embodiments, the temperature of the sulfuric acid condensation dehydration is 70 ℃ to 90 ℃. Alternatively, the treatment temperature for sulfuric acid condensation dehydration is 70 ℃, 72 ℃, 74 ℃,76 ℃, 78 ℃, 80 ℃, 82 ℃, 84 ℃, 86 ℃, 88 ℃, or 90 ℃.
In some embodiments, the temperature of the bake-condensation dehydration is 250 ℃ to 300 ℃. Optionally, the temperature of the bake condensation dehydration is 250 ℃, 260 ℃, 270 ℃, 280 ℃, 290 ℃ or 300 ℃.
In some of these embodiments, the glass to be treated comprises at least one of soda lime glass, high alumina glass, and glass ceramic.
In a further embodiment, the application provides a glass processed by the chemical polishing agent or the chemical polishing agent prepared by the preparation method, or by the glass processing method.
The following are specific examples
Example 1
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60 minutes, and the chemical polishing temperature is 60 ℃. In this example, the glass sample was a corning glass ceramic 165.74X 74.35mm sheet, and the glass samples used in the following examples and comparative examples were the same as those in example 1.
Example 2
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 90 ℃.
Example 3
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 120 ℃.
Example 4
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 150 ℃.
Example 5
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 30min, and the chemical polishing temperature is 120 ℃.
Example 6
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 120min, and the chemical polishing temperature is 120 ℃.
Example 7
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 3% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 96.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 120 ℃.
Example 8
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 15% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 84.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 120 ℃.
Example 9
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of glycerin.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 120 ℃.
Example 10
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 120 ℃. The chemically polished glass is subjected to dehydration condensation post-treatment by immersing the chemically polished glass in 70 ℃ sulfuric acid for 30min.
Example 11
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 120 ℃. And (3) carrying out dehydration condensation post-treatment on the chemically polished glass, wherein the dehydration condensation post-treatment method is to bake the chemically polished glass for 30min at 280 ℃.
Example 12
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 120 ℃. The chemically polished glass was subjected to dehydration condensation by immersing the chemically polished glass in 10% ethyl orthosilicate at 70℃for 30 minutes.
Example 13
The chemical polishing agent in the embodiment comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate and 91.8% of ethylene glycol.
The glass sample is subjected to cutting, CNC treatment, polishing treatment and tempering treatment in sequence, and the tempered glass sample is subjected to chemical polishing by using the chemical polishing reagent, wherein the chemical polishing time is 60min, and the chemical polishing temperature is 120 ℃.
Comparative example 1
The chemical polishing agent in the comparative example comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample in the comparative example was subjected to cutting, CNC treatment, polishing treatment and tempering treatment in this order, and the tempered glass sample was subjected to chemical polishing using the chemical polishing agent for 60 minutes at a chemical polishing temperature of 30 ℃.
Comparative example 2
The chemical polishing agent in the comparative example comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample in the comparative example was subjected to cutting, CNC treatment, polishing treatment and tempering treatment in this order, and the tempered glass sample was subjected to chemical polishing using the chemical polishing agent for 60 minutes at a chemical polishing temperature of 180 ℃.
Comparative example 3
The chemical polishing agent in the comparative example comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample in the comparative example was subjected to cutting, CNC treatment, polishing treatment and tempering treatment in this order, and the tempered glass sample was subjected to chemical polishing using the chemical polishing agent for 5 minutes at a chemical polishing temperature of 60 ℃.
Comparative example 4
The chemical polishing agent in the comparative example comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample in the comparative example was subjected to cutting, CNC treatment, polishing treatment and tempering treatment in this order, and the tempered glass sample was subjected to chemical polishing using the chemical polishing agent for 150 minutes at a chemical polishing temperature of 60 ℃.
Comparative example 5
The chemical polishing agent in the comparative example comprises, by mass, 0.5% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 98.8% of ethylene glycol.
The glass sample in the comparative example was subjected to cutting, CNC treatment, polishing treatment and tempering treatment in this order, and the tempered glass sample was subjected to chemical polishing using the chemical polishing agent for 60 minutes at a chemical polishing temperature of 60 ℃.
Comparative example 6
The chemical polishing agent in the comparative example comprises the following components in percentage by mass of 20% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 79.3% of ethylene glycol.
The glass sample in the comparative example was subjected to cutting, CNC treatment, polishing treatment and tempering treatment in this order, and the tempered glass sample was subjected to chemical polishing using the chemical polishing agent for 60 minutes at a chemical polishing temperature of 60 ℃.
Comparative example 7
The chemical polishing agent in the comparative example comprises the following components in percentage by mass of 8% of sodium hydroxide, 0.2% of isooctyl alcohol polyoxyethylene ether phosphate, 0.5% of sodium gluconate and 91.3% of ethylene glycol.
The glass sample in the comparative example was subjected to cutting, CNC treatment, polishing treatment and tempering treatment in this order, and the tempered glass sample was subjected to chemical polishing using the chemical polishing agent for 60 minutes at a chemical polishing temperature of 98 ℃.
Comparative example 8
The chemical polishing agent in this comparative example comprises, by mass, 8% sodium hydroxide, 0.2% isooctyl alcohol polyoxyethylene ether phosphate, 0.5% sodium gluconate, and 91.3% a mixed solvent of glycerin and water (wherein the mass ratio of glycerin to water is glycerin: water=95:5).
The glass sample in the comparative example was subjected to cutting, CNC treatment, polishing treatment and tempering treatment in this order, and the tempered glass sample was subjected to chemical polishing using the chemical polishing agent for 60 minutes at a chemical polishing temperature of 120 ℃.
Comparative example 9
In this comparative example, the glass sample was not chemically polished using a chemical polishing agent, and the glass processing step in this comparative example was as follows, the glass sample was sequentially subjected to a blanking process, a CNC process, a polishing process, and a tempering process.
Examples 1 to 13 and comparative examples 1 to 9 were shown in Table 1 below, in which the amounts and percentages by weight of the alkaline agent, the surfactant, the impurity removing agent, the polyol organic solvent, the chemical polishing time and temperature, and the method of condensation dehydration were as follows:
TABLE 1
The glass samples processed in examples 1 to 13 and comparative examples 1 to 9 were tested for surface strength using a static pressure test machine, and the surface strength of the processed glass samples was characterized by the force to which the samples were subjected to fracture, and the test results are shown in table 2 below:
TABLE 2
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples illustrate only a few embodiments of the application, which are described in detail and are not to be construed as limiting the scope of the application. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the application, which are all within the scope of the application. The scope of the application is, therefore, indicated by the appended claims, and the description may be intended to interpret the contents of the claims.
Claims (7)
1. A glass processing method is characterized by comprising the steps of chemically polishing glass to be processed by using a chemical polishing reagent to eliminate cracks so as to enhance the strength of the glass, wherein the chemical polishing reagent is an anhydrous polishing reagent and comprises, by mass, 0.8-15 parts of an alkaline reagent, 0.05-0.5 part of a surfactant and 83.5-99.05 parts of a polyol solvent, the chemical polishing temperature is 120-150 ℃, and the chemical polishing time is 60-120 min;
And (3) performing condensation dehydration treatment on the chemically polished glass.
2. The glass processing method of claim 1, wherein the polyol solvent comprises one or more of ethylene glycol, glycerol, and polyethylene glycol;
and/or the alkaline reagent comprises one or more of sodium hydroxide, potassium hydroxide, lithium hydroxide and magnesium hydroxide;
and/or the surfactant comprises at least one of isooctyl alcohol polyoxyethylene ether phosphate and a rapid permeation agent T.
3. The glass processing method according to any one of claims 1 to 2, further comprising 0.1 to 1 part by mass of a impurity removing agent.
4. The glass processing method of claim 3, wherein the impurity removing agent comprises one or more of sodium citrate, sodium tetraborate, disodium edetate, and sodium gluconate.
5. The glass processing method according to claim 1, wherein the preparation method of the chemical polishing agent comprises:
Mixing the alkaline agent, the surfactant, and the polyol solvent.
6. The glass processing method according to claim 1, wherein the condensation dehydration treatment includes at least one of sulfuric acid condensation dehydration, baking condensation dehydration, and silane coupling agent condensation dehydration.
7. A glass which is obtained by the glass processing method according to any one of claims 1 to 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211564427.5A CN116375352B (en) | 2022-12-07 | 2022-12-07 | Chemical polishing reagent and preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211564427.5A CN116375352B (en) | 2022-12-07 | 2022-12-07 | Chemical polishing reagent and preparation method and application thereof |
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| CN114349356A (en) * | 2020-10-14 | 2022-04-15 | 肖特股份有限公司 | Method for processing glass by alkaline etching |
| CN114656159A (en) * | 2022-02-15 | 2022-06-24 | 万津实业(赤壁)有限公司 | Glass strengthening liquid and preparation method and application thereof |
| CN119735375A (en) * | 2024-12-28 | 2025-04-01 | 维达力科技股份有限公司 | Glass strengthening method and strengthened glass |
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