CN116398489B - Diffusion pump control system and vacuum system for molecular beam epitaxy equipment - Google Patents
Diffusion pump control system and vacuum system for molecular beam epitaxy equipment Download PDFInfo
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- CN116398489B CN116398489B CN202310665966.6A CN202310665966A CN116398489B CN 116398489 B CN116398489 B CN 116398489B CN 202310665966 A CN202310665966 A CN 202310665966A CN 116398489 B CN116398489 B CN 116398489B
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- 238000009792 diffusion process Methods 0.000 title claims abstract description 220
- 238000001451 molecular beam epitaxy Methods 0.000 title claims abstract description 45
- 230000001960 triggered effect Effects 0.000 claims abstract description 14
- 239000000498 cooling water Substances 0.000 claims description 9
- 230000000007 visual effect Effects 0.000 claims description 4
- 238000000605 extraction Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 7
- 230000007547 defect Effects 0.000 abstract description 4
- 230000002159 abnormal effect Effects 0.000 description 8
- 238000005086 pumping Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 238000005485 electric heating Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
- F04F9/00—Diffusion pumps
- F04F9/08—Control
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
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- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
本发明涉及一种应用于分子束外延设备的扩散泵控制系统，包括扩散泵、插板阀、真空传感器和温度传感器，扩散泵抽气口与分子束外延设备的真空反应室连接，扩散泵具有前级真空管路，扩散泵通过前级真空管路连接机械泵；插板阀设置于真空反应室与扩散泵之间；真空传感器设置于扩散泵的前级真空管路上；温度传感器设置于扩散泵上；当真空传感器和/或温度传感器采集的信号超过或低于设定的扩散泵正常运行时各传感器的阈值时，触发插板阀关闭，以避免扩散泵的油被反抽进真空反应室中。本发明克服了现有技术中存在的介质油反抽到真空反应室而对分子束外延设备及外延材料造成致命性影响的缺陷。
The present invention relates to a diffusion pump control system applied to molecular beam epitaxy equipment, comprising a diffusion pump, a gate valve, a vacuum sensor and a temperature sensor. The air exhaust port of the diffusion pump is connected to the vacuum reaction chamber of the molecular beam epitaxy equipment. The diffusion pump has a front-stage vacuum pipeline, and the diffusion pump is connected to a mechanical pump through the front-stage vacuum pipeline; the gate valve is arranged between the vacuum reaction chamber and the diffusion pump; the vacuum sensor is arranged on the front-stage vacuum pipeline of the diffusion pump; the temperature sensor is arranged on the diffusion pump; when the signal collected by the vacuum sensor and/or the temperature sensor exceeds or is lower than the threshold value of each sensor when the diffusion pump is operating normally, the gate valve is triggered to close to prevent the oil of the diffusion pump from being back-drawn into the vacuum reaction chamber. The present invention overcomes the defect in the prior art that the medium oil is back-drawn into the vacuum reaction chamber, which has a fatal impact on the molecular beam epitaxy equipment and epitaxial materials.
Description
Technical Field
The invention relates to the technical field of vacuum equipment, in particular to a diffusion pump control system and a vacuum system applied to molecular beam epitaxy equipment.
Background
The diffusion pump has the advantages of large pumping speed, no vibration and the like in a high vacuum section compared with a cold pump, so that the diffusion pump has great advantages when being used for growing fine epitaxial materials of molecular beam epitaxy equipment (MBE). The conventional diffusion pump only needs to supply power to the diffusion pump electric heating wire, and the medium oil in the diffusion pump is electrically heated to reach a certain temperature to form an effective pumping speed.
The diffusion pump needs a silicone oil as a working medium, and once the diffusion pump has abnormal pumping speed or stops running, the silicone oil can be reversely pumped into a vacuum reaction chamber of a molecular beam epitaxy equipment (MBE), and the problem of oil reflection of the diffusion pump can cause fatal influence on the quality of epitaxial semiconductor materials and the MBE equipment, so that huge economic loss is caused. Therefore, in order to avoid the back-pumping of the medium oil into the MBE vacuum reaction chamber, it is highly desirable to propose a diffusion pump control system for use in a molecular beam epitaxy apparatus.
Disclosure of Invention
Therefore, the technical problem to be solved by the invention is to overcome the technical defect that the molecular beam epitaxy equipment and the epitaxy material are subjected to fatal influence caused by the fact that medium oil is pumped back into the MBE vacuum reaction chamber in the prior art.
In order to solve the above technical problems, the present invention provides a diffusion pump control system applied to a molecular beam epitaxy apparatus, comprising:
The extraction opening of the diffusion pump is connected with the vacuum reaction chamber of the molecular beam epitaxy equipment, the diffusion pump is provided with a foreline vacuum pipeline, and the diffusion pump is connected with the mechanical pump through the foreline vacuum pipeline;
The gate valve is arranged between the vacuum reaction chamber and the diffusion pump;
The vacuum sensor is arranged on a foreline vacuum pipeline of the diffusion pump and is used for measuring the vacuum value of the foreline vacuum pipeline in real time;
A temperature sensor disposed on the diffusion pump, the temperature sensor being for measuring an actual temperature of the diffusion pump in real time;
And triggering the gate valve to close when the signals acquired by the vacuum sensor and/or the temperature sensor exceed or are lower than the threshold value of each sensor when the set diffusion pump normally operates, so as to prevent the oil of the diffusion pump from being reversely pumped into the vacuum reaction chamber.
In one embodiment of the invention, the intelligent control system further comprises an interlocking module, wherein the interlocking module comprises a diffusion pump interlocking unit, the diffusion pump interlocking unit comprises an overheat protection switch, a low Wen Jiting switch and a vacuum protection switch, the overheat protection switch is triggered to switch when a signal acquired by the temperature sensor exceeds a set threshold value, the low-temperature emergency stop switch is triggered to switch when the signal acquired by the temperature sensor is lower than the set threshold value, and the vacuum protection switch is triggered to switch when the signal acquired by the vacuum sensor exceeds the set threshold value.
In one embodiment of the invention, the interlock module further comprises a mechanical pump operation switch and a diffusion pump operation auxiliary relay contact, the mechanical pump operation switch, diffusion pump operation auxiliary relay contact and the diffusion pump interlock unit being connected in series.
In one embodiment of the invention, the valve further comprises a gate valve interlocking bypass, and two ends of the gate valve interlocking bypass are connected with the interlocking module.
In one embodiment of the invention, the valve further comprises a gate valve opening relay and a gate valve opening relay contact, wherein the gate valve opening relay contact is commonly connected with the interlocking module and the gate valve interlocking bypass, and the gate valve opening relay contact is connected with the gate valve opening relay.
In one embodiment of the invention, the valve further comprises a gate valve opening switch, wherein the gate valve opening switch is commonly connected with the interlocking module and the gate valve interlocking bypass.
In one embodiment of the present invention, a diffusion pump interlock bypass is further included, and both ends of the diffusion pump interlock bypass are connected to the diffusion pump interlock unit.
In one embodiment of the present invention, the diffusion pump further comprises a flow sensor, the diffusion pump is provided with a cooling water pipeline, the flow sensor is arranged on the cooling water pipeline, the flow sensor and the mechanical pump form a front module, the front module is arranged at the front ends of the diffusion pump interlocking unit and the diffusion pump interlocking bypass, after the front module operates, the diffusion pump can be started, and the front module cannot be bypassed.
In one embodiment of the present invention, the diffusion pump further comprises a diffusion pump start auxiliary relay, a diffusion pump start auxiliary relay contact and a diffusion pump operation auxiliary relay, wherein the diffusion pump start auxiliary relay contact is commonly connected with the diffusion pump interlocking unit and the diffusion pump interlocking bypass, the diffusion pump start auxiliary relay contact is connected with the diffusion pump start auxiliary relay, the diffusion pump start auxiliary relay is connected with the diffusion pump operation auxiliary relay, and the diffusion pump operation auxiliary relay is connected with the diffusion pump operation auxiliary relay contact.
In addition, the invention also provides a vacuum system which comprises the diffusion pump control system applied to the molecular beam epitaxy equipment.
Compared with the prior art, the technical scheme of the invention has the following advantages:
The diffusion pump control system and the vacuum system for the molecular beam epitaxy equipment integrate the vacuum sensor and the temperature sensor to monitor the running state of the diffusion pump in real time, and when the operation of the diffusion pump is abnormal, the gate valve between the diffusion pump and the vacuum reaction chamber of the molecular beam epitaxy equipment is automatically closed, so that medium oil is prevented from being reversely pumped into the vacuum reaction chamber, the protection of the vacuum reaction chamber is realized, and the defect that the fatal influence is caused to the molecular beam epitaxy equipment and epitaxial materials because the medium oil is reversely pumped into the vacuum reaction chamber in the prior art is overcome.
Drawings
In order that the invention may be more readily understood, a more particular description of the invention will be rendered by reference to specific embodiments thereof that are illustrated in the appended drawings.
Fig. 1 is a control block diagram of a diffusion pump control system for a molecular beam epitaxy apparatus according to the present invention.
Fig. 2 is another control block diagram of a diffusion pump control system for a molecular beam epitaxy apparatus according to the present invention.
The reference numerals are described as 101, low Wen Jiting switch, 102, overheat protection switch, 103, vacuum protection switch, 2, mechanical pump operation switch, 3, diffusion pump operation auxiliary relay contact, 4, gate valve interlocking bypass, 401, gate valve interlocking bypass switch, 5, gate valve opening relay, 6, gate valve opening relay contact, 7, gate valve opening switch, 8, gate valve stopping switch, 9, diffusion pump interlocking bypass, 901, diffusion pump interlocking bypass switch, 10, flow triggering switch, 11, mechanical pump starting switch, 12, diffusion pump starting auxiliary relay, 13, diffusion pump starting auxiliary relay contact, 14, diffusion pump operation auxiliary relay, 15, diffusion pump starting switch, 16, diffusion pump stopping switch, 17, vacuum solenoid operation relay, 18, vacuum solenoid opening switch, 19, vacuum solenoid operation relay contact a, 20, vacuum solenoid operation relay contact b.
Detailed Description
The present invention will be further described with reference to the accompanying drawings and specific examples, which are not intended to be limiting, so that those skilled in the art will better understand the invention and practice it.
Referring to fig. 1 and 2, an embodiment of the present invention provides a diffusion pump control system applied to a molecular beam epitaxy apparatus, including a diffusion pump, a gate valve, a vacuum sensor and a temperature sensor, where a gas outlet of the diffusion pump is connected to a vacuum reaction chamber of the molecular beam epitaxy apparatus, the diffusion pump has a forevacuum pipeline, the diffusion pump is connected to a mechanical pump through the forevacuum pipeline, the gate valve is disposed between the vacuum reaction chamber and the diffusion pump, the vacuum sensor is disposed on a forevacuum pipeline of the diffusion pump, the vacuum sensor is used for measuring a vacuum value of the forevacuum pipeline in real time, the temperature sensor is disposed on the diffusion pump, and is used for measuring an actual temperature of the diffusion pump in real time, where when a signal collected by the vacuum sensor and/or the temperature sensor exceeds or is lower than a threshold value of each sensor when the diffusion pump is set to operate normally, the gate valve is triggered to close so as to avoid oil of the diffusion pump from being back pumped into the vacuum reaction chamber.
The diffusion pump control system for the molecular beam epitaxy equipment disclosed by the invention integrates the vacuum sensor and the temperature sensor to monitor the running state of the diffusion pump in real time, and when the operation of the diffusion pump is abnormal, the gate valve between the diffusion pump and the vacuum reaction chamber of the molecular beam epitaxy equipment is automatically closed, so that the medium oil is prevented from being reversely pumped into the vacuum reaction chamber, the protection of the vacuum reaction chamber is realized, and the defect that the fatal influence is caused to the molecular beam epitaxy equipment and epitaxial materials because the medium oil is reversely pumped into the vacuum reaction chamber in the prior art is overcome.
The diffusion pump control system applied to the molecular beam epitaxy equipment further comprises an interlocking module, the interlocking module comprises a diffusion pump interlocking unit, the diffusion pump interlocking unit comprises an overheat protection switch 102, a low Wen Jiting switch 101 and a vacuum protection switch 103, the overheat protection switch 102, the low Wen Jiting switch 101 and the vacuum protection switch 103 are connected in series, the overheat protection switch 102, the low Wen Jiting switch 101 and the vacuum protection switch 103 are all in a closed state when the diffusion pump normally operates, but when a signal acquired by the temperature sensor exceeds a set threshold value, the overheat protection switch 102 is triggered to be opened, the diffusion pump stops working when the signal acquired by the temperature sensor is lower than the set threshold value, similarly, the low Wen Jiting switch 101 is triggered to be opened, the diffusion pump stops working when the signal acquired by the vacuum sensor exceeds the set threshold value, and the vacuum protection switch 103 is triggered to be opened when the signal acquired by the vacuum sensor exceeds the set threshold value.
In order to avoid the environment temperature fluctuation and cause the false triggering protection of the diffusion pump, the working temperature of the diffusion pump is set to be two low-temperature thresholds, including a first threshold and a second threshold. As an example, the first threshold may be 20 ℃, and the second threshold may be 10 ℃, that is, when the actual temperature of the diffusion pump detected by the temperature sensor is lower than the set 20 ℃, an audible and visual alarm is sent out to remind a field worker to timely intervene in checking the working state of the diffusion pump, and when the actual temperature of the diffusion pump detected by the temperature sensor is lower than the set 10 ℃, the low Wen Jiting switch 101 is triggered to be turned off, and a gate valve between the vacuum reaction chamber and the diffusion pump is automatically closed immediately to protect the vacuum reaction chamber from reverse pumping pollution of diffusion pump oil.
When the molecular beam epitaxy equipment grows epitaxial materials, the vacuum value of the vacuum reaction chamber is continuously changed, so that the dynamic change of the vacuum value of a vacuum pipeline between the diffusion pump and the front-stage mechanical pump is possibly caused, and in order to avoid misjudgment protection of a system caused by the normal dynamic change of the vacuum value, two vacuum value thresholds including a first vacuum value threshold and a second vacuum value threshold are set for the vacuum value of the vacuum pipeline between the diffusion pump and the front-stage mechanical pump. The first vacuum value threshold may be 50mbar, the second vacuum value threshold may be 100mbar, and when the actual vacuum value detected by the vacuum sensor exceeds 50mbar, an audible and visual alarm is sent to remind on-site staff to check the working state of the diffusion pump, and when the actual vacuum value detected by the vacuum sensor exceeds 100mbar, the vacuum protection switch 103 is triggered to be turned off, and a gate valve between the vacuum reaction chamber and the diffusion pump is automatically closed immediately to protect the vacuum reaction chamber from reverse pumping pollution of diffusion pump oil.
Further, the diffusion pump control system applied to the molecular beam epitaxy device further comprises a diffusion pump interlocking bypass 9, and two ends of the diffusion pump interlocking bypass 9 are connected with the diffusion pump interlocking units. As an example, the diffusion pump interlock bypass 9 of the present embodiment includes a diffusion pump interlock bypass switch 901, that is, the present embodiment designs two working states, and bypasses the interlocking relationship of the collected signals of each sensor through the diffusion pump interlock bypass switch 901, so that the diffusion pump can be freely started or stopped without being affected by the sensor signals, and the maintenance and the repair of the diffusion pump control system are facilitated.
In addition, the diffusion pump control system applied to the molecular beam epitaxy device further comprises a flow sensor, the diffusion pump is provided with a cooling water pipeline, the flow sensor is arranged on the cooling water pipeline, the flow sensor and the mechanical pump form a front module, and the front module is arranged at the front ends of the diffusion pump interlocking unit and the diffusion pump interlocking bypass 9. As an example, the flow sensor corresponds to a flow trigger switch 10 and the mechanical pump corresponds to a mechanical pump start switch 11. The mechanical pump start switch 11 in this embodiment refers to a button switch of the mechanical pump itself, when the mechanical pump start switch 11 is pressed, the mechanical pump is started, and when the mechanical pump start switch is turned off, the mechanical pump stops working. According to the embodiment, the front-end module is added in the starting logic of the diffusion pump, the front-end module comprises two front-end conditions, firstly, the process cooling water flow is normal, secondly, the front-end mechanical pump of the diffusion pump runs normally, the diffusion pump can be started only when the two front-end conditions are met at the same time, and the two front-end conditions cannot be bypassed, so that the situation that an operator starts the diffusion pump by mistake under the condition that the front-end mechanical pump is not started or cooling water is not introduced can be avoided, and the diffusion pump is damaged.
In addition, the diffusion pump control system applied to the molecular beam epitaxy equipment further comprises a diffusion pump starting switch 15, a diffusion pump starting auxiliary relay 12, a diffusion pump starting auxiliary relay contact 13 and a diffusion pump operation auxiliary relay 14, wherein the diffusion pump starting switch 15 is commonly connected with the diffusion pump interlocking unit and the diffusion pump interlocking bypass 9, the diffusion pump starting auxiliary relay contact 13 is connected with the diffusion pump starting auxiliary relay 12, the diffusion pump starting auxiliary relay 12 is connected with the diffusion pump operation auxiliary relay 14, and the diffusion pump operation auxiliary relay 14 is connected with the diffusion pump operation auxiliary relay contact 3.
In actual operation, when the process cooling water flow is normal, the diffusion pump front-stage mechanical pump operates normally, and the signals collected by the temperature sensor and the vacuum sensor are all normal, the flow trigger switch 10, the mechanical pump starting switch 11, the low Wen Jiting switch 101, the overheat protection switch 102 and the vacuum protection switch 103 are all closed at this time, after the diffusion pump starting switch 15 is pressed, the diffusion pump starting auxiliary relay contact 13 is electrically closed, the diffusion pump starting auxiliary relay 12 is conducted, meanwhile, the diffusion pump operation auxiliary relay 14 is conducted, and in the diffusion pump operation process, the diffusion pump operation auxiliary relay 14 is always in a conducting state so as to display the working state of the diffusion pump.
In the operation process of the diffusion pump, if the flow of the process cooling water is abnormal, or the operation of a front-stage mechanical pump of the diffusion pump is abnormal, or a signal acquired by a vacuum sensor is abnormal, or a signal acquired by a temperature sensor is abnormal, the diffusion pump stops working, and the gate valve is immediately triggered to be closed, so that the oil of the diffusion pump is prevented from being reversely pumped into the vacuum reaction chamber. It should be emphasized that the conditions for determining that the signals collected by the vacuum sensor and the temperature sensor are abnormal are described in detail in the above description, and the diffusion pump is triggered to stop working only if the specific threshold range is not satisfied, which is not described in detail in this embodiment.
Of course, the diffusion pump control system applied to the molecular beam epitaxy device provided by the embodiment of the invention further comprises the diffusion pump stop switch 16, and the diffusion pump can be stopped by the diffusion pump stop switch 16, so that the operation, the overhaul and the maintenance of the diffusion pump control system are facilitated.
In succession, the above-mentioned interlocking module still includes mechanical pump operation switch 2 and diffusion pump operation auxiliary relay contact 3, mechanical pump operation switch 2, diffusion pump operation auxiliary relay contact 3 and diffusion pump interlocking unit establish ties. The mechanical pump operation switch corresponds to the operation state of the mechanical pump, when the mechanical pump is in the operation state, the mechanical pump operation switch 2 is in the closed state, when the mechanical pump stops working, the mechanical pump operation switch 2 is opened, similarly, the diffusion pump operation auxiliary relay contact 3 corresponds to the diffusion pump operation auxiliary relay 14, and when the diffusion pump operation auxiliary relay 14 is in the on state, the diffusion pump operation auxiliary relay contact 3 is closed.
In addition, the diffusion pump control system applied to the molecular beam epitaxy equipment provided by the embodiment of the invention further comprises a gate valve interlocking bypass 4, and two ends of the gate valve interlocking bypass 4 are connected with the interlocking module. As an example, the gate valve interlocking bypass 4 in this embodiment includes a gate valve interlocking bypass switch 401, that is, this embodiment designs two working states, and bypasses the interlocking relationship of the mechanical pump operation switch 2, the diffusion pump operation auxiliary relay contact 3 and the diffusion pump interlocking unit through the gate valve interlocking bypass 4, so that the gate valve can be freely started or stopped without being affected by the mechanical pump operation switch, and the maintenance and the repair of the diffusion pump control system are facilitated.
In addition, the diffusion pump control system applied to the molecular beam epitaxy equipment further comprises a gate valve opening relay 5 and a gate valve opening relay contact 6, wherein the gate valve opening relay contact 6 is jointly connected with the interlocking module and the gate valve interlocking bypass 4, and the gate valve opening relay contact 6 is connected with the gate valve opening relay 5.
In actual operation, when the diffusion pump normally operates, a gate valve between the diffusion pump and the vacuum reaction chamber is in an open state, and when the diffusion pump is in the open state, the gate valve opening relay contact 6 is electrically closed, and the gate valve opening relay 5 is conducted.
In the operation process of the diffusion pump, if any one of the diffusion pump operation auxiliary relay contact 3 or the mechanical pump operation switch 2 or the low-temperature emergency stop switch 101 or the overheat protection switch 102 or the vacuum protection switch 103 is disconnected, the gate valve is immediately triggered to be closed, so that the oil of the diffusion pump is prevented from being reversely pumped into the vacuum reaction chamber.
Of course, the diffusion pump control system applied to the molecular beam epitaxy equipment provided by the embodiment of the invention further comprises a gate valve opening switch 7, wherein the gate valve opening switch 7 is commonly connected with the interlocking module and the gate valve interlocking bypass 4, and the gate valve can be opened through the gate valve opening switch 7, so that the operation, the overhaul and the maintenance of the gate valve are convenient.
The diffusion pump control system applied to the molecular beam epitaxy equipment further comprises a gate valve stop switch 8, wherein the gate valve stop switch 8 is in a normally closed state, when the diffusion pump is in an operating state, the gate valve stop switch 8 is in a closed state, the gate valve can be stopped through the gate valve stop switch, and the operation, the overhaul and the maintenance of the gate valve are facilitated.
In addition, the diffusion pump control system applied to the molecular beam epitaxy equipment further comprises a vacuum electromagnetic valve, wherein the vacuum electromagnetic valve is arranged at an exhaust port of the diffusion pump, and can be started and stopped synchronously with the diffusion pump, so that the diffusion pump can be prevented from reversely pumping the front-stage mechanical pump after the diffusion pump stops running, and primary vacuum can be ensured to be obtained before the diffusion pump is started.
As an example, the vacuum solenoid valve corresponds to the vacuum solenoid valve operation relay 17, the vacuum solenoid valve operation relay 17 has a vacuum solenoid valve operation relay contact a19 and a vacuum solenoid valve operation relay contact b20, the vacuum solenoid valve operation relay contact a19 is a pair of normally open contacts of the vacuum solenoid valve operation relay 17, the vacuum solenoid valve operation relay contact b20 is a pair of normally closed contacts of the vacuum solenoid valve operation relay 17, and when the diffusion pump is operated, that is, the diffusion pump operation auxiliary relay 14 is energized, the vacuum solenoid valve operation relay contact a19 is electrically closed, that is, the vacuum solenoid valve is started to operate, and the vacuum solenoid valve operation relay contact b20 is electrically opened. Of course, the vacuum solenoid valve may be independently opened manually, for example, by opening the vacuum solenoid valve via the vacuum solenoid valve opening switch 18.
Corresponding to the above embodiment of a diffusion pump control system for a molecular beam epitaxy apparatus, the present invention further provides a vacuum system, which includes a diffusion pump control system for a molecular beam epitaxy apparatus as described above, and has all the advantages of the diffusion pump control system for a molecular beam epitaxy apparatus as described above, and the present invention is not repeated herein.
It is apparent that the above examples are given by way of illustration only and are not limiting of the embodiments. Other variations and modifications of the present invention will be apparent to those of ordinary skill in the art in light of the foregoing description. It is not necessary here nor is it exhaustive of all embodiments. And obvious variations or modifications thereof are contemplated as falling within the scope of the present invention.
Claims (2)
1. A diffusion pump control system applied to a molecular beam epitaxy device is characterized by comprising:
The extraction opening of the diffusion pump is connected with the vacuum reaction chamber of the molecular beam epitaxy equipment, the diffusion pump is provided with a foreline vacuum pipeline, and the diffusion pump is connected with the mechanical pump through the foreline vacuum pipeline;
The gate valve is arranged between the vacuum reaction chamber and the diffusion pump;
The vacuum sensor is arranged on a foreline vacuum pipeline of the diffusion pump and is used for measuring the vacuum value of the foreline vacuum pipeline in real time;
A temperature sensor disposed on the diffusion pump, the temperature sensor being for measuring an actual temperature of the diffusion pump in real time;
The interlocking module comprises a diffusion pump interlocking unit, a mechanical pump operation switch and a diffusion pump operation auxiliary relay contact, wherein the diffusion pump interlocking unit comprises an overheat protection switch, a low Wen Jiting switch and a vacuum protection switch; when the signal collected by the temperature sensor exceeds the set threshold value, triggering the overheat protection switch to switch, when the signal collected by the diffusion pump comprises a first threshold value and a second threshold value, the second threshold value is smaller than the first threshold value, when the signal collected by the temperature sensor is lower than the first threshold value, an audible and visual alarm is sent out, when the signal collected by the temperature sensor is lower than the second threshold value, triggering the low-temperature emergency switch to switch, wherein the vacuum value of the foreline comprises a first vacuum value threshold value and a second vacuum value threshold value, and when the signal collected by the vacuum sensor exceeds the first vacuum value threshold value, the audible and visual alarm is sent out, and when the signal collected by the temperature sensor is lower than the second threshold value, the signal collected by the vacuum sensor exceeds the second vacuum value threshold value, the vacuum switch of the foreline is triggered to switch;
The diffusion pump is characterized by further comprising a gate valve interlocking bypass, a gate valve opening relay contact, a gate valve opening switch, a diffusion pump interlocking bypass, a diffusion pump starting auxiliary relay, a flow sensor, a diffusion pump starting auxiliary relay contact and a diffusion pump operation auxiliary relay, wherein two ends of the gate valve interlocking bypass are connected with the interlocking module, the gate valve opening relay contact is jointly connected with the interlocking module and the gate valve interlocking bypass, the gate valve opening relay contact is connected with the gate valve opening relay, the gate valve opening switch is jointly connected with the interlocking module and the gate valve interlocking bypass, two ends of the diffusion pump interlocking bypass are connected with the diffusion pump interlocking unit, the diffusion pump is provided with a cooling water pipeline, the flow sensor and the mechanical pump form a front-end module, the front-end module is arranged at the front-end of the diffusion pump interlocking unit and the front-end of the diffusion pump bypass, after the front-end module operates, the diffusion pump can be started, the front-end module cannot be connected with the diffusion pump interlocking unit, the auxiliary diffusion pump interlocking unit is connected with the diffusion pump starting auxiliary relay, and the diffusion pump auxiliary pump is connected with the diffusion pump starting auxiliary relay, and the diffusion pump is in a common mode, and the diffusion pump is in a diffusion pump is started.
2. A vacuum system comprising a diffusion pump control system for a molecular beam epitaxy apparatus according to claim 1.
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| CN202310665966.6A CN116398489B (en) | 2023-06-07 | 2023-06-07 | Diffusion pump control system and vacuum system for molecular beam epitaxy equipment |
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| 10MeV紧凑回旋加速器真空控制系统研究;查剑;李冬;王晓敏;秦斌;;工业控制计算机;20170731(第07期);第4-6页，图1-5 * |
| 查剑 ; 李冬 ; 王晓敏 ; 秦斌 ; .10MeV紧凑回旋加速器真空控制系统研究.工业控制计算机.2017,(第07期),第4-6页，图1-5. * |
| 真空技术及应用系列讲座 第十六讲 真空系统的操作与维护;张以忱;;真空;20091130(第06期);第87-88页 * |
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