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CN116490697B - Carrier transport system, magnetic stabilization unit, carrier and method for contactless transport of a carrier - Google Patents

Carrier transport system, magnetic stabilization unit, carrier and method for contactless transport of a carrier Download PDF

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Publication number
CN116490697B
CN116490697B CN202080107159.7A CN202080107159A CN116490697B CN 116490697 B CN116490697 B CN 116490697B CN 202080107159 A CN202080107159 A CN 202080107159A CN 116490697 B CN116490697 B CN 116490697B
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CN
China
Prior art keywords
carrier
magnetic
unit
electromagnet
force
Prior art date
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Active
Application number
CN202080107159.7A
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Chinese (zh)
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CN116490697A (en
Inventor
克里斯蒂安·沃尔夫冈·埃曼
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Applied Materials Inc
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Applied Materials Inc
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Publication of CN116490697B publication Critical patent/CN116490697B/en
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G54/00—Non-mechanical conveyors not otherwise provided for
    • B65G54/02—Non-mechanical conveyors not otherwise provided for electrostatic, electric, or magnetic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/0408—Passive magnetic bearings
    • F16C32/041—Passive magnetic bearings with permanent magnets on one part attracting the other part
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/0408—Passive magnetic bearings
    • F16C32/0436—Passive magnetic bearings with a conductor on one part movable with respect to a magnetic field, e.g. a body of copper on one part and a permanent magnet on the other part
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F16C32/0442—Active magnetic bearings with devices affected by abnormal, undesired or non-standard conditions such as shock-load, power outage, start-up or touchdown
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F16C32/0444—Details of devices to control the actuation of the electromagnets
    • F16C32/0446—Determination of the actual position of the moving member, e.g. details of sensors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F16C32/0459—Details of the magnetic circuit
    • F16C32/0461—Details of the magnetic circuit of stationary parts of the magnetic circuit
    • F16C32/0463—Details of the magnetic circuit of stationary parts of the magnetic circuit with electromagnetic bias, e.g. by extra bias windings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F16C32/047—Details of housings; Mounting of active magnetic bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/04—Bearings not otherwise provided for using magnetic or electric supporting means
    • F16C32/0406—Magnetic bearings
    • F16C32/044—Active magnetic bearings
    • F16C32/0472—Active magnetic bearings for linear movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67709—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using magnetic elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/6773—Conveying cassettes, containers or carriers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02—Articles
    • B65G2201/0214—Articles of special size, shape or weigh
    • B65G2201/022—Flat
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/02—Controlled or contamination-free environments or clean space conditions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2326/00—Articles relating to transporting

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • General Chemical & Material Sciences (AREA)
  • Non-Mechanical Conveyors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

A carrier transport system (100) for non-contact transport of a carrier (10) along a track assembly is described. The carrier transport system comprises a passive magnet arrangement (120) for generating a carrier levitation force (F L) counteracting the weight force of the carrier, and an actively controlled bi-directional magnetic stabilization unit (140) configured to selectively apply a magnetic stabilization force (F S) to the carrier (10) in an upward and downward direction to hold the carrier (10) at a predetermined vertical position in a carrier transport space (102). A bi-directional magnetic stabilization unit (140) for a carrier transport system and a carrier (10) configured for contactless transport with the carrier transport system are further described.

Description

Carrier transport system, magnetic stabilization unit, carrier and method for contactless transport of a carrier
Technical Field
Embodiments of the present disclosure relate to apparatus and methods for transporting a carrier, particularly a carrier for carrying a large area substrate, with a magnetic levitation system. More particularly, embodiments of the present disclosure relate to apparatus and methods for non-contact transport of vertically oriented carriers in a substrate processing apparatus (e.g., in a vacuum deposition system). In particular, embodiments of the present disclosure relate to carrier transport systems, magnetic stabilization units, carriers, and methods for non-contact transport of carriers.
Background
Techniques for depositing layers on a substrate include, for example, sputter deposition, physical Vapor Deposition (PVD), chemical Vapor Deposition (CVD), and thermal evaporation. Coated substrates can be used in several applications and in several technical fields. For example, the coated substrate may be used in the field of display devices. Display devices may be used in the manufacture of television screens, computer displays, mobile phones, other handheld devices, etc. to display information. Typically, displays are produced by coating a substrate with a stack of layers of different materials.
Substrates are typically coated in vacuum deposition systems and other substrate processing equipment having multiple deposition sources. The substrates are typically transported along the track assembly through a vacuum deposition system, for example, from a first deposition module to a second deposition module and/or to other substrate processing equipment. The substrate may be transported through the vacuum system in a substantially vertical orientation.
The substrate is typically carried by a carrier (i.e. a carrier means for carrying the substrate). The carrier is typically transported through the vacuum deposition system using a carrier transport system (e.g., a magnetic levitation system in which the weight of the carrier is held at least in part by magnetic forces). The magnetic levitation system may be configured for transporting a carrier carrying the substrate along a track assembly extending in a transport direction and defining a transport path for the carrier.
Transporting the carrier accurately and smoothly through a vacuum system is challenging, especially when the carrier is oriented vertically during transport. The carrier may be supported and/or moved by rollers. However, particle generation due to friction of the moving part may cause degradation of the manufacturing process. Transporting the carrier with a magnetic levitation system may reduce particle generation because the mechanical contact between the moving parts is reduced. For example, a magnetic levitation system may comprise a magnetic levitation unit that generates a levitation force of a carrier, i.e. a magnetic force acting on the carrier in a vertical direction for maintaining the weight of the carrier.
The magnetic levitation units of the magnetic levitation system can be actively controlled. In other words, the upward levitation force generated by the magnetic levitation unit may be actively controlled based on the measured gap width to continuously ensure a predetermined distance between the carrier and the actively controlled magnetic levitation unit. Actively controlled magnetic levitation units, however, are often expensive and complex and may require considerable effort to provide adequate cooling for large electromagnets used to generate large magnetic levitation forces. Furthermore, thermally induced expansion or contraction of the carrier during processing can make reliable position control of the carrier challenging.
In view of the foregoing, it would be beneficial to provide an improved carrier transport system for suspending and transporting carriers and an improved method of non-contact transporting carriers in a vacuum system that overcomes at least some of the problems of the prior art. In particular, it would be beneficial to provide a carrier transport system that allows for non-contact carrier transport with reduced effort and improved reliability.
Disclosure of Invention
In view of the above, a carrier transport system for contactless transport of a carrier along a rail assembly in a vacuum chamber, a magnetic stabilizing unit for a carrier transport system, a carrier for transport by a carrier transport system and a method for contactless transport of a carrier according to the independent claims are provided. Further aspects, advantages and features are apparent from the dependent claims, the description and the drawings.
According to an aspect, a carrier transport system for contactless transport of carriers along a track assembly in a transport direction is provided. The carrier transport system comprises a passive magnet arrangement for generating a carrier levitation force counteracting the weight force of the carrier, an actively controlled bi-directional magnetic stabilization unit configured to selectively apply a magnetic stabilization force to the carrier in an upward direction and a downward direction to hold the carrier at a predetermined vertical position in the carrier transport space.
In some embodiments, the magnetic stabilizing unit is arranged at a first ordinate and the first permanent magnet levitation unit of the passive magnet arrangement is arranged at a second ordinate different from the first ordinate, e.g. at a distance of 1m or more from the first ordinate.
According to an aspect, a magnetic stabilization unit for a carrier transport system, in particular for a carrier transport system as described herein, is provided. The magnetic stabilization unit includes at least one electromagnet for acting on a first magnetic unit of a carrier disposed in a guide space between two poles of the at least one electromagnet, a set of permanent magnets generating magnetic fields having opposite directions in an upper region and a lower region of the guide space, a gap sensor, and a controller configured to control the at least one electromagnet based on a signal of the gap sensor. The magnetic stabilizing unit is actively controlled and configured to selectively apply a magnetic stabilizing force to the carrier in an upward direction and a downward direction to maintain the carrier at a predetermined vertical position in the carrier transport space.
According to an aspect, a carrier for transport by a carrier transport system, in particular by any of the carrier transport systems described herein, is described. The carrier comprises a holding section for carrying an object to be transported at the carrier in a substantially vertical orientation, a first magnetic unit protruding laterally from the carrier at a first ordinate and configured to magnetically interact with an actively controlled bi-directional magnetic stabilizing unit, and a second magnetic unit arranged at the carrier at a second ordinate and configured to magnetically interact with a first permanent magnet levitation unit generating a levitation force of the carrier. The object to be transported may be, for example, a substrate or a mask.
The carrier may optionally further comprise any one of a third magnetic unit arranged at the carrier at a third ordinate and configured to interact with a drive unit configured to move the carrier along the track assembly in the transport direction, and a fourth magnetic unit arranged at the carrier at a fourth ordinate and configured to magnetically interact with a second permanent magnet levitation unit generating a levitation force of the carrier.
According to one aspect, a vacuum deposition system for depositing material on a substrate in a vacuum chamber is provided. The vacuum deposition system includes a vacuum chamber, a carrier transport system according to any of the embodiments described herein, and a deposition source disposed in the vacuum chamber. Optionally, a carrier according to any of the embodiments described herein may also be part of a vacuum deposition system.
According to one aspect, a method for contactless transport of a carrier is provided. The method includes generating a carrier levitation force counteracting the weight force of the carrier with a passive magnet arrangement, which may include a first permanent magnet levitation unit arranged at a second ordinate, stabilizing the carrier at a predetermined vertical position in a carrier transport space by selectively applying a magnetic stabilizing force to the carrier in an upward direction and a downward direction with an actively controlled bi-directional magnetic stabilizing unit arranged at the first ordinate, and moving the carrier in the transport direction with a drive unit arranged at a third ordinate.
Embodiments are also directed to an apparatus for performing the disclosed methods and comprising an apparatus portion for performing each of the described method aspects. These method aspects may be performed by means of hardware components, a computer programmed by suitable software, any combination of the two or in any other way. Further, embodiments according to the present disclosure also relate to methods for operating the described apparatus and methods of manufacturing the apparatus and devices described herein. The method for operating the described device includes method aspects for performing each function of the device.
Drawings
So that the manner in which the above recited features of the present disclosure can be understood in detail, a more particular description of the disclosure, briefly summarized above, may be had by reference to embodiments. The drawings relate to embodiments of the present disclosure and are described below:
FIG. 1 shows a schematic cross-sectional view of a carrier transport system and carrier according to embodiments described herein;
FIG. 2 shows a schematic side view of a carrier transport system and carrier according to embodiments described herein;
FIG. 3 shows a schematic perspective view of a magnetic stabilization unit according to embodiments described herein;
FIG. 4 shows a top view of the magnetic stabilization unit of FIG. 3;
FIG. 5A shows a side view of the magnetic stabilization unit of FIG. 3 in a first control state (I);
FIG. 5B shows a side view of the magnetic stabilization unit of FIG. 3 in a second control state (II), and
Fig. 6 shows a flow chart of a method for contactless transport of a carrier in a transport direction according to embodiments described herein.
Detailed Description
Reference will now be made in detail to the various embodiments of the disclosure, one or more examples of which are illustrated in each figure. In the following description of the figures, like reference numerals refer to like parts. Only the differences with respect to the respective embodiments are described. Each example is provided by way of explanation of the disclosure and is not intended as a limitation of the disclosure. Additionally, features illustrated or described as part of one embodiment can be used on or in conjunction with other embodiments to yield yet a further embodiment. The description is intended to include such modifications and variations.
The carrier transport system is configured for transporting the carrier in a vacuum environment, in particular in a vacuum chamber or in a vacuum system comprising a plurality of vacuum chambers arranged adjacent to each other. The carrier transport system may provide one, two or more transport paths and may move or transport the carrier along one or more transport paths in a transport direction (T) along the track assembly.
The carrier transport system described herein may be part of a vacuum processing system, in particular a vacuum deposition system configured for depositing material on a substrate carried by a carrier. The carrier transport system may be configured to move the carrier along the track array a distance of 5m or more or 10m or more.
As used herein, a "transport direction T" is a direction along which a carrier can be transported by a carrier transport system. A track assembly 105 extending along a transport direction T may be provided and the carrier transport system 100 may transport carriers along the track assembly 105. The transport direction T is typically a horizontal direction or a substantially horizontal direction (horizontal direction +/-10 °). As used herein, the "vertical direction V" corresponds to the direction of gravity, i.e. the gravity of the carrier is downward in the vertical direction. In order to counteract the weight force of the carrier so that the carrier can be held in a floating state without contact, the levitation unit is configured to apply a carrier levitation force F L to the carrier upward in the vertical direction V. As used herein, "lateral direction L" is a direction that is lateral to the transport direction T and lateral to the vertical direction V. The lateral direction L is typically a substantially horizontal direction perpendicular to the transport direction T.
In some embodiments, the carrier may have a substantially vertical orientation during transport. In other words, the orientation of the carrier and the orientation of the substrate carried by the carrier may be substantially vertical (vertical +/-10 °) during transport. The substrate may be a large area substrate, in particular a large area glass substrate, for example for display manufacturing. In some embodiments, the substrate may be a semiconductor substrate, such as a wafer, and the vacuum system may be a semiconductor processing system.
The "carrier transport space 102" may be understood as a space in which the carrier is held by the carrier transport system 100 and the carrier is transported therethrough by the carrier transport system in a non-contact manner. The magnets of the carrier transport system may exert a magnetic force on the carrier that holds the carrier in the carrier transport space 102 in a contactless manner, i.e. the carrier does not escape from the carrier transport space 102.
Fig. 1 is a schematic cross-sectional view of a carrier transport system 100 for non-contact transport of a carrier 10 in a transport direction T along a track assembly as described herein. The carrier 10 may carry a substrate 11, such as a large area substrate having a surface area of 1m 2 or more, at a holding section of the carrier 10. Or the carrier may carry another object to be transported, such as a mask, at the holding section. The holding section may comprise a holding mechanism, for example a mechanical, electrostatic or magnetic chuck device for holding the object in the holding section. In particular, the angle between the vertical direction V and the main surface of the substrate or other object may be 10 ° or less during carrier transport.
The carrier transport system 100 comprises a passive magnet arrangement 120 for generating a carrier levitation force F L counteracting the weight force of the carrier 10 such that the carrier can be kept floating in the carrier transport space 102 relative to the track assembly 105. A "passive" magnet arrangement may be understood to include passive magnets for generating carrier levitation forces that are not actively controlled. For example, the passive magnet arrangement 120 may comprise a permanent magnet levitation unit for generating the carrier levitation force F L and/or an electromagnet or electro-permanent magnet generating a magnetic field whose strength is not controlled by the current carrier position. Thus, a "passive magnet arrangement" differs from an "actively controlled magnet arrangement" in that the magnetic field generated by the latter varies according to an input parameter, such as the gap width between the carrier and the track assembly.
In some embodiments, the carrier levitation force F L is an attractive magnetic force exerted on the carrier 10 that pulls the carrier upward toward the passive magnet arrangement 120. In particular, the passive magnet arrangement 120 comprises a levitation magnet, e.g. a permanent magnet, configured to apply an attractive force to the carrier to pull the carrier upwards. For example, a levitation magnet of a passive magnet arrangement may be arranged above the carrier transport space 102, such as pulling the carrier up towards the levitation magnet, as schematically depicted in fig. 1.
In some embodiments, the passive magnet arrangement 120 may also stabilize the carrier in the lateral direction L. In other words, the magnetic force exerted by the passive magnet arrangement on the carrier may prevent the carrier from unintentionally leaving the carrier transport space 102 in the lateral direction L. In the embodiment shown in fig. 1, the carrier is magnetically attracted by the passive magnet arrangement 120 and therefore does not attempt to escape sideways. Other types of passive magnet arrangements 120 are possible. Optionally, a magnetic stabilizing unit for stabilizing the carrier in the lateral direction L may additionally be provided, which may be active or passive.
The carrier transport system 100 further comprises an actively controlled magnetic stabilization unit 140 configured to apply a magnetic stabilization force F s to the carrier 10 in an upward and downward direction to hold the carrier 10 in a predetermined vertical position in the carrier transport space 102. The magnetic stabilizing unit is also referred to herein as "bi-directional" in that it can exert both an upwardly directed stabilizing force and a downwardly directed stabilizing force on the carrier. Specifically, if the current carrier position is determined to be too low, the magnetic stabilizing unit 140 may generate a magnetic stabilizing force acting in an upward direction and pull the carrier upward, and if the current carrier position is determined to be too high, the magnetic stabilizing unit 140 may generate a magnetic stabilizing force acting in a downward direction and pull the carrier downward so as to maintain a predetermined vertical positioning of the carrier.
According to the enzodiac theorem, the carrier cannot be held in a floating state in a non-contact manner only by the passive magnetic unit that generates a constant magnetic field. For example, without active control exerted by a magnetic stabilizing unit or other stabilizing force, the carrier would move towards and hit the passive levitation unit exerting an attractive force on the carrier from above, or the carrier would escape sideways from the passive levitation unit exerting a repulsive force on the carrier from below. According to embodiments described herein, the carrier may be continuously held in the carrier transport space without contact, as the actively controlled magnetic stabilization unit ensures a predetermined distance between the carrier and the passive magnet arrangement. In other words, the carrier may be stabilized at a predetermined vertical distance from the passive magnet arrangement due to the magnetic stabilizing force applied to the carrier by the magnetic stabilizing unit 140.
The carrier transport system described herein is beneficial compared to other magnetic levitation systems for the following reasons:
other magnetic levitation systems that rely on passive magnet arrangements to generate carrier levitation force F L use mechanical elements, such as rollers or spacer elements, that at least temporarily contact the carrier to ensure that the carrier can remain in a predetermined position and do not strike or escape the passive magnet arrangement. However, the rollers or spacing elements in contact with the moving carrier generate small particles due to friction forces, which may negatively affect the quality of the deposition on the substrate carried by the carrier. The carrier transport system described herein can transport carriers entirely contactless, i.e. without contacting the stabilizing elements, due to the magnetic stabilizing force exerted by the actively controlled magnetic stabilizing unit.
Still other magnetic levitation systems rely on actively controlled levitation magnets to apply magnetic levitation forces to the carrier. Such a levitation magnet needs to generate a strong magnetic force in order to counteract the weight of the carrier. This means that large coils and complex cooling systems are typically provided for actively controlling the levitation magnet. Furthermore, actively controlled levitation magnets typically control the strength of the levitation force of the carrier based on a distance signal measured by a gap sensor that measures the vertical gap between the carrier and the levitation magnet with the purpose of keeping the gap width constant. However, maintaining the gap width (which is typically as small as a few millimeters or less) constant can be challenging, for example, when the carrier thermally expands or contracts. For example, the height of the vertically oriented carrier may increase significantly during the heat treatment, which may lead to a reduction of the gap width and thus to problems in the active control of the levitation unit and/or problems related to maintaining a constant gap width of the linear motor.
In contrast, in the carrier transport system described herein, the magnetic levitation units are passive units that are separately provided and maintained at a vertical distance from the actively controlled magnetic stabilization units. Thus, a relatively small magnetic stabilizing force generated by the magnetic stabilizing unit is sufficient, which may fluctuate around a zero force value, as the (considerable) carrier levitation forces are passively generated by passive magnet arrangements arranged at different positions. Therefore, a small and compact actively controlled magnetic stabilization unit can be provided, and the cooling effort can be reduced. Furthermore, the magnetic stabilizing unit may be placed at a location spaced apart from the magnetic levitation unit, e.g., at a location where thermally induced carrier deformation does not function or negatively affect the control of the magnetic stabilizing force and/or driving force.
Still other magnetic levitation systems rely on a plurality of active stabilization units disposed at different locations about the carrier transport space and configured to generate stabilization forces in different directions. Such magnetic levitation systems are complex and expensive and coordinating multiple active stabilization units is challenging. In contrast, the magnetic stabilization unit 140 of the carrier transport system 100 described herein is bi-directional, i.e., capable of generating both upward and downward directed stabilization forces and is disposed at a first ordinate. Thus, two or more stabilizing units arranged at different ordinate positions (such as above and below the carrier) may not be needed. Thus, control of carrier positioning is simplified and a more reliable and smoother transport of the non-contact carrier can be obtained.
In some embodiments, the passive magnet arrangement 120 comprises a first permanent magnet levitation unit 121 arranged at a second ordinate V2 different from the first ordinate V1 at which the magnetic stabilizing unit 140 is arranged. The first permanent magnet levitation unit 121 may include a permanent magnet configured to apply a carrier levitation force directed upward to the carrier 10, and the carrier 10 may include a magnetic counterpart unit (referred to herein as a second magnetic unit 15) attracted by the first permanent magnet levitation unit 121, such as a ferromagnetic track or a permanent magnet fixed at the carrier. Alternatively or additionally, the passive magnet arrangement may comprise one or more coils or ferromagnets attracted by a permanent magnet provided at the carrier.
The first permanent magnet levitation unit 121 may be disposed above the carrier transport space 102 and may be configured to magnetically interact with the second magnetic unit 15 that may be disposed at a head portion of the carrier. In particular, the second ordinate V2 on which the first permanent magnet levitation unit 121 is disposed may be disposed above the first ordinate V1 on which the magnetic stabilization unit 140 is disposed. In particular, the first permanent magnet levitation unit 121 may be configured to magnetically interact with the second magnetic unit 15 disposed at the head portion of the carrier, and the magnetic stabilization unit 140 may be configured to magnetically interact with the first magnetic unit 14 disposed at the bottom portion of the carrier. In some embodiments, the first magnetic unit 14 of the carrier may be a ferromagnetic element, such as a ferromagnetic track, which may be disposed on one side of the carrier and may protrude from the carrier toward the magnetic stabilizing unit.
In some embodiments, the distance D1 between the first and second ordinate V1, V2 may be 1m or more, in particular 2m or more, more in particular 3m or more or even 4m or more. For example, in a carrier transport system configured to transport vertically oriented carriers, the passive magnet arrangement 120 may be disposed at the top rail 106 of the track assembly 105 and the magnetic stabilization unit 140 may be disposed at the bottom rail of the track assembly 105. It may be sufficient to accurately control vertical carrier positioning relative to the bottom rail in which the magnetic stabilizing units 140 are disposed, while less accurate carrier positioning relative to the top rail (where only passive magnetic units may be provided) may be acceptable. Thus, thermally induced carrier deformation, which may cause vertical movement of the head portion of the carrier, does not negatively affect the control of the magnetic stabilizing force and does not impair carrier transport by the linear motor.
The head portion of the vertically oriented carrier may be understood as the carrier portion that interacts with the head rail 106 above the substrate holding section, and the bottom portion may be understood as the carrier portion that interacts with the bottom rail below the substrate holding section. The distance between the head portion and the bottom portion of the carrier may be 1m or more, in particular 2m or more, more in particular 3m or more or even 4m or more. In some embodiments, the first permanent magnet levitation unit 121 can be configured to magnetically interact with a head portion of the carrier and the magnetic stabilization unit 140 can be configured to magnetically interact with a bottom portion of the carrier. In particular, the first permanent magnet levitation unit 121 can be arranged at the top rail 106 of the track assembly, in particular above the carrier transport space 102, and the magnetic stabilization unit 140 can be arranged at the bottom rail of the track assembly. It may be sufficient to accurately monitor and maintain the positioning of the carrier with respect to the bottom rail, where the magnetic stabilization unit 140 and the drive unit 150 may be located.
In some embodiments, which may be combined with other embodiments described herein, the passive magnet arrangement 120 further comprises a second permanent magnet levitation unit 122 arranged at a fourth ordinate V4. The first permanent magnet levitation unit 121 can be configured to counteract a first portion of the weight of the carrier and the second permanent magnet levitation unit 122 can be configured to counteract a second portion of the weight of the carrier.
Similar to the first permanent magnet levitation unit 121, the second permanent magnet levitation unit 122 can also include a permanent magnet or electromagnet for applying a passive upward-pointing magnetic levitation force F L to the carrier. In fig. 1, the north pole of the permanent magnet suspension unit is shown in phantom, while the south pole is shown in self-color. Since the south pole of the second permanent magnet levitation unit 122 points toward and faces the north pole of a magnetically corresponding unit (referred to herein as fourth magnetic unit 17) of the carrier disposed below the second permanent magnet levitation unit 122, a levitation force directed upward is applied to the carrier. The fourth magnetic element 17 of the carrier may be a ferromagnetic element or a permanent magnet. In other embodiments, the orientation, arrangement or shape of the permanent magnet suspension units may be different, as long as an upwardly directed suspension force is applied to the carrier.
In some embodiments, the first portion of the weight of the carrier that is counteracted by the first permanent magnet suspension unit 121 may be 20% or more, particularly about 30% or more, more particularly 40% or more of the total weight. The second portion of the weight of the carrier being counteracted by the second permanent magnet suspension unit 122 may be 50% or more, in particular about 80% or more, more in particular 90% or more of the total weight.
By providing two or more magnetic levitation units at two or more different ordinate (optionally with an offset in lateral direction L) to generate respective portions of carrier levitation force F L, a smoother and more stable carrier transport can be obtained. For example, a first permanent magnet levitation unit 121 can be disposed at the top rail 106 of the track assembly and can be configured to magnetically interact with a head portion of the carrier, and a second permanent magnet levitation unit 122 can be disposed at the bottom rail of the track assembly and configured to magnetically interact with a bottom portion of the carrier. The distance between the second ordinate V2 and the fourth ordinate V4 may be 1m or more, particularly 2m or more, more particularly 3m or more or 4m or more. The distance between the first ordinate V1 and the fourth ordinate V4 may be 30cm or less.
Both the second permanent magnet levitation unit 122 and the magnetic stabilization unit 140 can be disposed at the bottom rail of the track assembly 105. For example, the second permanent magnet levitation unit 122 can be disposed below the magnetic stabilization unit 140 at the bottom rail and configured to magnetically interact with the fourth magnetic unit 17 disposed at the carrier.
The sum of the first and second portions may be 100% or more, particularly 120% or more, more particularly about 130% or more of the weight of the carrier. In other words, the combination of the first and second permanent magnet suspension units may carry the full weight of the carrier (or may generate more force).
The reason why the carrier levitation force corresponds to more than 100% of the carrier gravity force may be that there is at least one further downward directed force component acting on the carrier during transport of the carrier. For example, a linear motor arranged below the carrier may typically apply not only a transport force F T to the carrier in the transport direction T, but may additionally also apply a downward directed force component F C, which may correspond to 20% or more of the weight of the carrier. The passive magnet arrangement 120 may also counteract the latter force component pulling the carrier downwards.
In some embodiments, (i) the carrier levitation force F L of the passive magnet arrangement 120, (ii) the weight force of the carrier and (iii) the downward-directed force component F C exerted on the carrier by the drive unit 150 add up to substantially zero during carrier transport if the carrier is exactly arranged at a predetermined position in the carrier transport space 102. Thus, the average magnetic stabilizing force F s exerted by the magnetic stabilizing unit 140 on the carrier may also be substantially zero. For example, the magnetic stabilizing force F S applied by the magnetic stabilizing unit 140 to the carrier may continuously fluctuate around zero force (e.g., the applied stabilizing force integrated over time may be substantially zero). The magnetic stabilizing force may only be provided to stabilize and hold the carrier in a predetermined vertical position in which the above forces (i), (ii), (iii) (and/or other optional forces acting on the carrier) add up to substantially zero. Since the magnetic stabilizing unit 140 does not apply a large magnetic force to the carrier, the magnetic stabilizing unit can be kept small and compact, and the cooling work of the corresponding coil can be reduced.
The carrier levitation force F L generated by the passive magnet arrangement 120 may correspond to 100% or more, particularly 120% or more, more particularly 130% or more of the weight of the carrier. Accordingly, the entire carrier levitation force may be passively generated (e.g., by the first permanent magnet levitation unit and/or the second permanent magnet levitation unit), while the actively controlled magnetic stabilization unit may be provided only for preventing the carrier from escaping from a predetermined position in the carrier transport space 102 relative to the track assembly.
In some embodiments, which may be combined with other embodiments described herein, the carrier transport system 100 further comprises a drive unit 150, in particular a linear motor, for moving the carrier along the track assembly 105 in the transport direction T. The drive unit 150 may be arranged at a third ordinate V3, in particular below the magnetic counterpart of the carrier (herein referred to as third magnetic unit 16). In particular, the drive unit 150 may be arranged below the carrier transport space 102 and may be configured to magnetically interact with a bottom portion of the carrier, in particular with the third magnetic unit 16 arranged at the bottom portion of the carrier.
In some embodiments, the distance D2 between the first ordinate V1 in which the magnetic stabilizing unit 140 is arranged and the third ordinate V3 in which the driving unit 150 is arranged may be 30cm or less, in particular 20cm or less or even 10 cm or less. In particular, the magnetic stabilizing unit 140 and the drive unit 150 may be arranged at a very close vertical distance from each other, e.g. both at the bottom rail of the track assembly. The drive unit 150 (which may be a linear motor) may depend on an accurate and small gap width of the third magnetic unit 16 relative to the carrier. Therefore, if the magnetic stabilization unit 140, which ensures the predetermined vertical carrier positioning, is disposed next to the driving unit 150, the gap width can be accurately maintained even if the carrier is subjected to thermal deformation.
In particular, if the carrier is to be inflated, the head portion of the carrier may be moved upward toward the head rail of the track assembly, but the bottom portion of the carrier where the first and third magnetic units 14, 16 are disposed may maintain a predetermined vertical position. Therefore, it is advantageous to arrange the magnetic stabilizing unit in the vicinity of the drive unit. By arranging the actively controlled magnetic stabilization unit 140 near the drive unit 150, problems associated with large distances between the linear motor and the actively controlled levitation unit can be avoided, whereas the passive magnet arrangement can be arranged at different locations, e.g. at the head rail 106. No actively controlled suspension units are required at the head rail.
According to some embodiments, the magnetic stabilization unit 140 is laterally arranged at one side of the carrier transport space 102. In particular, the magnetic stabilization unit 140 may be arranged laterally only on one side of the carrier, instead of on two opposite sides. By arranging the magnetic stabilizing unit 140 on one side of the carrier and being able to bi-directionally control and stabilize the carrier position, the control can be simplified and several controllers of the active unit responsible for the carrier stability in different directions may not be needed to be coordinated.
The magnetic stabilization unit 140 may define a guiding space 148 of the first magnetic unit 14, which protrudes laterally from the carrier into the guiding space 148. The first magnetic unit 14 may be a ferromagnetic element, such as a ferromagnetic track, protruding laterally from a side surface of the carrier towards the magnetic stabilizing unit, in particular protruding into a guiding space 148 defined by the magnetic stabilizing unit 140. For example, the magnetic stabilizing unit 140 may be a coil with a magnetic core shaped such that the magnetic core partially encloses the guiding space 148, in particular at three sides of the guiding space. The two poles of the coil may be directed towards the guiding space 148 from opposite sides, respectively, such that when the first magnetic unit 14 is arranged in the guiding space 148, both poles are directed towards the first magnetic unit 14.
When the magnetic field of the magnetic stabilizing unit extends through the guiding space 148, the guiding space 148 may allow a reliable guiding of the first magnetic unit 14 of the carrier moving in the transport direction T in the guiding space. Furthermore, the guiding space enables the magnetic stabilizing unit to apply a stabilizing force to the first magnetic element 14 in two opposite vertical directions.
In some embodiments, which may be combined with other embodiments described herein, the magnetic stabilization unit 140 includes at least one electromagnet 141 disposed in the guide space 148 for acting on the first magnetic unit 14, a gap sensor 146, and a controller 145 configured to control the at least one electromagnet 141 based on a signal of the gap sensor 146. The gap sensor 146 may be configured to measure the vertical positioning of the carrier and send the measured position value to the controller, for example, by measuring the gap width between the carrier and the magnetic stabilization unit (or another fixed component of the track assembly). The controller may be configured to control the magnetic stabilizing unit to apply a stabilizing force directed upwards to the carrier (e.g. if the carrier position is too low) or to apply a stabilizing force directed downwards to the carrier (e.g. if the carrier position is too high). Thus, a bi-directional magnetic stabilization unit is provided.
In some embodiments, the magnetic stabilization unit 140 may have a permanent magnet bias. Details of specific examples of bi-directional magnetic stabilization units will be described below with reference to fig. 3, 4, 5A, and 5B.
Fig. 2 shows a schematic side view of a carrier transport system 100 for non-contact retention of a carrier 10 according to embodiments described herein. The carrier transport system 100 and the carrier 10 may have some or all of the features of the embodiment shown in fig. 1 such that reference is made to the above description and no further description is provided herein.
The carrier 10 is configured to be transported by the carrier transport system 100 described herein. The carrier 10 comprises a holding section for carrying an object, such as a substrate 11 to be processed, in particular in a substantially vertical orientation. The carrier portion above the holding section is also referred to herein as the head portion, and the carrier portion below the holding section is also referred to herein as the bottom portion. The carrier 10 further comprises a first magnetic unit 14 protruding laterally from the carrier at a first ordinate and configured to magnetically interact with an actively controlled bi-directional magnetic stabilization unit 140 as described herein. The first magnetic unit 14 may be a ferromagnetic element, such as a metal track, which extends in the transport direction T on one side of the carrier and protrudes from the carrier in the lateral direction L. The first magnetic unit 14 may be disposed at a bottom portion of the carrier, i.e., below the substrate holding section.
The magnetic stabilization unit 140 is schematically indicated in fig. 2 in a rotated position for illustration purposes. The magnetic stabilizing unit 140 is in fact arranged such that the guiding space 148 defined between its poles is open towards the carrier, so that the first magnetic unit 14 can protrude sideways into the guiding space 148, as shown in fig. 1. The number of magnetic stabilizing units 140 may be arranged at the first ordinate V1, for example, at predetermined intervals in the transport direction T, such that the first magnetic unit 14 of the carrier, which is likewise arranged at the first ordinate V1, always protrudes into at least one magnetic stabilizing unit during movement along the track assembly, in particular into at least two magnetic stabilizing units during movement along the track assembly. Advantageously, the first magnetic unit 14 of the carrier protrudes into both magnetic stabilizing units at the same time, so that the vertical position of the carrier and the pitch of the carrier (i.e. the rotational position of the carrier with respect to the lateral direction L) can be stabilized. Thus, the carrier may be stabilized vertically at a plurality of positions along the track assembly during transport in the transport direction.
The carrier 10 further comprises a second magnetic unit 15 arranged at the carrier at a second ordinate and configured to magnetically interact with a passive magnet arrangement 120, in particular with the first permanent magnet levitation unit 121 described herein, which exerts a carrier levitation force F L on the second magnetic unit 15. The second magnetic unit 15 may comprise a permanent magnet track or a ferromagnetic track, for example a metal track. The second magnetic unit 15 may be arranged at the head portion of the carrier, for example 1m or more above the first magnetic unit 14. In particular, the second magnetic unit 15 may be arranged at the top surface of the carrier.
In some embodiments, the carrier 10 further comprises a third magnetic unit 16 arranged at the carrier at a third ordinate and configured to interact with a drive unit 150 configured to move the carrier along the track assembly in the transport direction T. The third magnetic unit 16 may include a plurality of permanent magnets disposed at a bottom surface of the carrier. In particular, the third magnetic unit 16 may be a moving part of a linear motor, which may be driven by the linear motor to move. The third magnetic unit 16 may be arranged at a bottom portion of the carrier, in particular at a bottom surface of the carrier. The vertical distance between the first magnetic unit 14 and the third magnetic unit 16 may be 30cm or less. The gap width between the drive unit 150 and the third magnetic part 16 of the carrier may be 5mm or less, in particular 3mm or less, during transport of the carrier.
According to some embodiments, the driving unit 150 may include a linear motor configured to apply a magnetic force to the carrier to move the carrier along the rail assembly in the transport direction T without contact. The driving unit 150 may include, for example, a plurality of linear motors disposed at the rail assembly at predetermined intervals in the transport direction T.
The linear motor of the drive unit 150 may be configured to be coupled with the third magnetic unit 16 of the carrier to provide a driving force in the transport direction T. The drive unit generating the driving force in the transport direction T is contactless and therefore no particles are generated during transport. In some embodiments, the drive unit 150 may include a synchronous linear motor. In other embodiments, the driving unit 150 may include an asynchronous linear motor.
In some embodiments, the carrier 10 further comprises a fourth magnetic unit 17 arranged at the carrier at a fourth ordinate and configured to magnetically interact with a second permanent magnet levitation unit generating a carrier levitation force F L. The fourth magnetic unit 17 may comprise a permanent magnet track or a ferromagnetic track, for example a metal track. The fourth magnetic unit 17 may be provided at the bottom portion of the carrier, for example, 1m or more below the second magnetic unit 15. In some embodiments, the fourth magnetic unit 17 is arranged at the bottom part of the carrier between the first magnetic unit 14 and the third magnetic unit 16.
In some embodiments, the second magnetic unit 15 is arranged at the head portion of the carrier above the holding section, and the first, third and/or fourth magnetic units 14, 16, 17 are arranged at the bottom portion of the carrier below the holding section during carrier transport. In particular, the first magnetic unit, the third magnetic unit and the fourth magnetic unit may be arranged at the bottom portion.
The carrier depicted in fig. 2 is particularly suitable for transport with the carrier transport system 100 described herein. Thanks to the above arrangement of the magnet units, even if the carrier expands or contracts in the vertical direction during the heat treatment, a smooth and reliable non-contact carrier transport is possible.
Hereinafter, the magnetic stabilizing unit 140 of the carrier transport system according to the embodiment of the present disclosure will be described in further detail with reference to fig. 3, 4, 5A and 5B. Fig. 3 shows a schematic perspective view of the magnetic stabilization unit 140. Fig. 4 shows a top view of the magnetic stabilization unit 140. Fig. 5A shows a side view of the magnetic stabilization unit 140 in the first control state (I), and fig. 5B shows a side view of the magnetic stabilization unit 140 in the second control state (II).
The magnetic stabilization unit 140 is actively controlled and may apply a magnetic stabilization force F s in an upward direction and a downward direction to the first magnetic unit 14. The first magnetic unit 14 may be a ferromagnetic carrier track of a carrier, which is arranged in a guiding space 148 provided by the magnetic stabilizing unit 140. The magnetic stabilization unit 140 comprises at least one electromagnet 141 (in particular a coil) for applying a magnetic stabilization force F s to the first magnetic unit 14, a gap sensor, and a controller (shown in fig. 1) configured for controlling the at least one electromagnet 141 based on a signal of the gap sensor. The gap sensor may measure the vertical gap width between the carrier and the stationary part of the track assembly, e.g. between the at least one electromagnet 141 and the first magnetic unit 14.
The at least one electromagnet 141 may include a first magnetic pole 181 and a second magnetic pole 182 stacked on each other and arranged to face each other, and a guide space 148 for the first magnetic unit 14 of the carrier is provided between the first magnetic pole 181 and the second magnetic pole 182. For example, the at least one electromagnet 141 may include a coil having a core bent such that the first and second magnetic poles 181 and 182 disposed at the ends of the core face each other, thereby defining the guide space 148 therebetween.
The magnetic stabilization unit 140 may further include a permanent magnet bias provided by at least one set of permanent magnets 175, as explained in further detail below.
In some embodiments, the magnetic stabilization unit 140 is switchable between a first control state (I) (shown in fig. 5A) in which the magnetic stabilization force F S is applied to the carrier in an upward direction, and a second control state (II) (shown in fig. 5B) in which the magnetic stabilization force F S is applied to the carrier in a downward direction. Switching may be performed by reversing the magnetic polarities of the first and second poles of the at least one electromagnet 141 (e.g., by reversing the direction of current flow through the coils). Further, by controlling the current flowing through the coil via the controller, the absolute value of the force can be changed. Therefore, the direction and absolute value of the magnetically stabilized force can be appropriately set to hold the carrier in a predetermined vertical position.
In some embodiments, which may be combined with other embodiments described herein, at least one electromagnet 141 comprises a first electromagnet 171, a second electromagnet 172, and optionally a third electromagnet 173 (and optionally yet further electromagnets) arranged side by side in the transport direction and respectively partially surrounding the guiding space 148. The second electromagnet 172 is arranged in the vicinity of the first electromagnet 171 in the transport direction T, and optionally between the first electromagnet 171 and the third electromagnet 173. To apply a magnetic stabilizing force F s to the carrier, the controller controls these electromagnets such that the first electromagnet 171 (and optionally the third electromagnet 173, i.e., the outer electromagnet) is oppositely polarized relative to the second electromagnet (i.e., the center electromagnet). Thus, the magnetic field lines generated by the first electromagnet 171 (and optionally the third electromagnet 173) extending through the guiding space 148 have an opposite direction than the magnetic field lines 192 generated by the second electromagnet 172 extending through the guiding space 148, as schematically depicted in fig. 5A and 5B. If at least one electromagnet 141 comprises more than three electromagnets arranged side by side in the transport direction, two adjacent electromagnets are respectively oppositely polarized, forming a linear array of alternately polarized electromagnets.
In particular, in a first control state (I) schematically depicted in fig. 5A, magnetic field lines 192 generated by the second electromagnet 172 extend in a downward direction through the guide space 148, and magnetic field lines generated by the first electromagnet 171 (and optionally the third electromagnet 173) extend in an upward direction through the guide space 148. In a second control state (II), schematically depicted in fig. 5B, the magnetic field lines 192 generated by the second electromagnet 172 extend in an upward direction through the guiding space 148, and the magnetic field lines generated by the first electromagnet 171 (and optionally the third electromagnet 173) extend in a downward direction through the guiding space 148. The "symmetrical" arrangement of three or more electromagnets in alternating arrangement of opposite polarizations as shown in fig. 5A can reduce the undesirable force component exerted by the magnetic stabilizing unit on the carrier. In particular, a stabilizing force may be provided that is directed exactly in an upward direction or downward direction (e.g., in a vertical direction V or a direction enclosing an angle of 10 ° or less with respect to the vertical direction V).
In some embodiments, which may be combined with other embodiments described herein, the magnetic stabilization unit 140 includes a permanent magnet bias. In particular, the magnetic stabilizing unit 140 comprises a set of permanent magnets 175 that generate a magnetic field in the guiding space 148 that is superimposed with the magnetic field generated by the at least one electromagnet 141.
The magnetic field lines 191 of the magnetic field generated by the set of permanent magnets 175 may have opposite directions in at least one upper region 178 and at least one lower region 179 of the guiding space 148. For example, a first two permanent magnets with the same poles pointing toward each other may be arranged above the guide space 148, and a second two permanent magnets with the same poles pointing toward each other may be arranged at the other side of the guide space below the first two permanent magnets. This arrangement of permanent magnets creates oppositely directed magnetic field lines 191 in the upper and lower regions of the guide space, as schematically depicted in fig. 5A and 5B. Alternatively, the set of permanent magnets 175 may comprise a pair of permanent magnets arranged above and below the guiding space, such as to generate oppositely directed magnetic field lines 191 in the upper and lower regions of the guiding space. For example, a first permanent magnet may be disposed between the first electromagnet and the second electromagnet above the guide space, and a second permanent magnet may be disposed between the first electromagnet and the second electromagnet below the guide space.
In some embodiments, the set of permanent magnets 175 may be disposed between the first electromagnet and the second electromagnet, and optionally between the second electromagnet and the third electromagnet. In particular, a first pair of permanent magnets may be disposed between the first electromagnet and the second electromagnet above and below the guide space 148, and an optional second pair of permanent magnets may be disposed between the second electromagnet and the third electromagnet above and below the guide space 148. This arrangement of permanent magnets creates oppositely directed magnetic field lines 191 in the upper and corresponding lower regions between the poles of the first, second and third electromagnets, as schematically depicted in fig. 5A and 5B.
In a first control state (I), schematically depicted in fig. 5A, the set of permanent magnets 175 produces magnetic field lines 191, the magnetic field lines 191 having substantially the same direction as the magnetic field lines 192 produced by the first and second electromagnets (and optionally the third electromagnet) in the upper region 178 of the guide space. Accordingly, magnetic forces directed upwards in the upper region 178 of the guide space (see three upper regions 178 circled for illustration purposes in fig. 5A) act on the first magnetic unit 14. Furthermore, the magnetic field lines 191 generated by the set of permanent magnets 175 have a substantially opposite direction to the magnetic field lines 192 generated by the first and second electromagnets (and optionally the third electromagnet) in the lower region of the guiding space. Thus, in the lower region of the guiding space, no or only a small net magnetic force acts on the first magnetic unit 14 (see the corresponding oppositely directed arrows in the lower region in fig. 5A). Thus, the carrier is pulled upward in fig. 5A.
In a second control state (II), schematically depicted in fig. 5B, the magnetic field lines 191 generated by the set of permanent magnets 175 have substantially the same direction as the magnetic field lines 192 generated by the first and second electromagnets (and optionally the third electromagnet) in the lower region 179 of the guiding space. Accordingly, a downward magnetic force acts on the first magnetic unit 14 in a lower region 179 of the guide space (see three lower regions 179 circled for illustration purposes in fig. 5B). Furthermore, the magnetic field lines 191 generated by the set of permanent magnets 175 have a substantially opposite direction to the magnetic field lines 192 generated by the first and second electromagnets (and optionally the third electromagnet) in the upper region of the guiding space. Thus, in the upper region of the guiding space, no or only a small net magnetic force acts on the first magnet unit 14 (see the corresponding oppositely directed arrows in the upper region in fig. 5B). Thus pulling the carrier downwards.
Thus, a bi-directional magnetic stabilization unit is provided which is switchable between an upwardly directed force and a downwardly directed force exerted on the carrier by reversing the magnetic poles of at least one electromagnet 141, in particular by reversing the magnetic poles of each of the first, second and optionally third (or more) electromagnets. Furthermore, the stabilizing force may be controlled by controlling the current through the at least one electromagnet 141, in particular through the first, second and optionally third electromagnets. One or more stabilizing units arranged at one ordinate with a predetermined interval therebetween in the transport direction T and having one common controller or a corresponding number of controllers are sufficient to stabilize the carrier bi-directionally in the vertical direction. Thus, a simple and reliable arrangement is provided according to the embodiments described herein.
The first electromagnet, the second electromagnet and the optional third electromagnet may be controlled via the same control circuit and connected to the same controller. In particular, the same current (or a current that varies in a corresponding manner) may flow through the first, second, and third coils in alternating directions during carrier transport, as schematically depicted in fig. 4, such that the magnetic field of the second electromagnet is opposite to the magnetic fields of the first and third electromagnets.
The magnetic stabilization unit may be configured to produce a maximum magnetic stabilization force of +/-400N or less, particularly +/-300N or less, more particularly about +/-200N.
Fig. 6 is a block diagram illustrating a method for non-contact transport of a carrier along a track assembly in a transport direction T, for example by a vacuum chamber of a vacuum deposition system. The transport method may be implemented using a carrier transport system as described herein that carries the carriers as described herein in a non-contact manner such that reference may be made to the above description and will not be repeated here.
In block 610, a carrier levitation force is generated that counteracts a weight force of the carrier with a passive magnet arrangement. The passive magnet arrangement may comprise a first permanent magnet levitation unit 121 arranged at a second ordinate V2 and an optional second permanent magnet levitation unit 122 arranged at a fourth ordinate V4.
In block 620, a predetermined vertical positioning of the carrier in the carrier transport space is stabilized by applying a magnetic stabilizing force to the carrier. The carrier is magnetically stabilized with an actively controlled bi-directional magnetic stabilization unit 140 that is capable of applying a magnetic stabilization force to the carrier in an upward direction and a downward direction, as described herein. In the first control state (I), a magnetically stabilizing force directed upwards is applied to the carrier, for example if the carrier position is detected to be too low and/or the carrier is sinking down. In the second control state (II), a magnetic stabilizing force directed downwards is applied to the carrier, for example if the carrier position is detected to be too high and/or the carrier is rising upwards. The position of the carrier can be controlled in a closed loop control.
In block 630, the carrier is moved along the track assembly in the transport direction T with a drive unit arranged at the third ordinate V3, in particular with a linear motor applying a magnetic transport force F T to the carrier.
The levitation of block 610, stabilization of block 620, and movement of block 630 may occur simultaneously to enable smooth and stable transport of the non-contact carrier in a vacuum system with a compact magnetic levitation system that includes active control that is not adversely affected by thermally induced carrier deformation.
In some embodiments, which may be combined with other embodiments, the carrier is oriented substantially vertically during transport. The distance between the first and second ordinate V1, V2 may be greater than the distance between the first and third ordinate V1, V3. Therefore, by the control of the magnetic stabilizing unit, the gap width between the linear motor 150 and the third magnetic unit 16 can be accurately maintained (e.g., maintain a gap width of 3mm or less), even though the head portion of the carrier may "stretch away" from the bottom portion due to thermal deformation.
During carrier levitation and transport, (i) carrier levitation force F L exerted by the passive magnet arrangement, (ii) the weight force of the carrier and (iii) the vertical force component F C exerted by the drive unit on the carrier add up to substantially zero during carrier transport, such that the average magnetic stabilizing force F s exerted by the magnetic stabilizing unit 140 on the carrier is also substantially zero, as the stabilizing force fluctuates around zero net force. This allows the magnetic stabilizing unit to be compact and relatively small.
In some implementations, the carrier and the substrate carried by the carrier are oriented substantially vertically. The substrate may be a large area substrate having a surface area of 1m 2, particularly 3m 2 or more. The carrier may have a vertical dimension of 1m or more, in particular 2m or more.
The first permanent magnet levitation unit 121 may magnetically interact with a head portion of the carrier, the magnetic stabilization unit 140 may magnetically interact with a bottom portion of the carrier, and the driving unit 150 may interact with the bottom portion of the carrier.
While the foregoing is directed to embodiments, other and further embodiments may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.

Claims (20)

1.一种用于沿轨道组件（105）非接触式运输载体（10）的载体运输系统（100），包括：1. A carrier transport system (100) for non-contact transport of a carrier (10) along a track assembly (105), comprising: 被动磁体布置（120），所述被动磁体布置用于产生抵消所述载体的重力的载体悬浮力（FL）；以及a passive magnet arrangement (120) for generating a carrier levitation force ( FL ) that counteracts the weight of the carrier; and 主动控制的双向磁稳定单元（140），所述主动控制的双向磁稳定单元布置在第一纵坐标（V1）处并被配置为有选择地在向上方向和向下方向上对所述载体（10）的第一磁单元（14）施加磁稳定力（FS）以将所述载体（10）保持在载体运输空间（102）中的预定竖直位置，an actively controlled bidirectional magnetic stabilization unit (140) arranged at a first longitudinal coordinate (V1) and configured to selectively apply a magnetic stabilization force (F S ) to a first magnetic unit (14) of the carrier (10) in an upward direction and a downward direction to maintain the carrier (10) in a predetermined vertical position in the carrier transport space (102), 其中所述磁稳定单元（140）包括至少一个电磁体（141），所述至少一个电磁体用于作用在所述第一磁单元（14）上，并且所述第一磁单元（14）从所述载体（10）侧向突出并布置在所述至少一个电磁体（141）的两个磁极之间的导引空间（148）中。The magnetic stabilization unit (140) comprises at least one electromagnet (141), the at least one electromagnet being used to act on the first magnetic unit (14), and the first magnetic unit (14) protruding laterally from the carrier (10) and arranged in a guide space (148) between two magnetic poles of the at least one electromagnet (141). 2.如权利要求1所述的载体运输系统，其中所述被动磁体布置（120）包括第一永磁悬浮单元（121），所述第一永磁悬浮单元布置在第二纵坐标（V2）处，并且在所述第一纵坐标（V1）与所述第二纵坐标（V2）之间的距离（Dl）为1m或更大。2. The carrier transport system of claim 1 , wherein the passive magnet arrangement ( 120 ) comprises a first permanent magnetic suspension unit ( 121 ), the first permanent magnetic suspension unit being arranged at a second longitudinal coordinate ( V2 ), and a distance ( D1 ) between the first longitudinal coordinate ( V1 ) and the second longitudinal coordinate ( V2 ) being 1 m or greater. 3.如权利要求2所述的载体运输系统，其中所述被动磁体布置（120）进一步包括第二永磁悬浮单元（122），所述第二永磁悬浮单元设置在第四纵坐标（V4）处，所述第一永磁悬浮单元（121）被配置为抵消所述载体的所述重力的第一部分，且所述第二永磁悬浮单元（122）被配置为抵消所述载体的所述重力的第二部分。3. The carrier transport system of claim 2, wherein the passive magnet arrangement (120) further comprises a second permanent magnetic suspension unit (122), the second permanent magnetic suspension unit being arranged at a fourth longitudinal coordinate (V4), the first permanent magnetic suspension unit (121) being configured to offset a first portion of the weight of the carrier, and the second permanent magnetic suspension unit (122) being configured to offset a second portion of the weight of the carrier. 4.如权利要求1所述的载体运输系统，其中由所述被动磁体布置（120）产生的所述载体悬浮力（FL）对应于所述载体（10）的所述重力的100%或更多。4. The carrier transport system of claim 1, wherein the carrier levitation force ( FL ) generated by the passive magnet arrangement (120) corresponds to 100% or more of the weight of the carrier (10). 5.如权利要求1所述的载体运输系统，进一步包括驱动单元（150），所述驱动单元用于在运输方向（T）上沿所述轨道组件（105）移动所述载体，其中所述驱动单元（150）布置在第三纵坐标（V3）处。5. The carrier transport system of claim 1, further comprising a drive unit (150) for moving the carrier along the track assembly (105) in a transport direction (T), wherein the drive unit (150) is arranged at a third longitudinal coordinate (V3). 6.如权利要求5所述的载体运输系统，其中在所述第一纵坐标（V1）与所述第三纵坐标（V3）之间的距离（D2）为30cm或更小。6. The carrier transport system of claim 5, wherein a distance (D2) between the first longitudinal coordinate (V1) and the third longitudinal coordinate (V3) is 30 cm or less. 7.如权利要求1至6中任一项所述的载体运输系统，其中所述磁稳定单元（140）侧向布置在所述载体运输空间（102）的一侧上。7. The carrier transport system according to any one of claims 1 to 6, wherein the magnetic stabilization unit (140) is arranged laterally on one side of the carrier transport space (102). 8.如权利要求1至6中任一项所述的载体运输系统，其中所述磁稳定单元（140）进一步包括：8. The carrier transport system according to any one of claims 1 to 6, wherein the magnetic stabilization unit (140) further comprises: 间隙传感器（146）；以及a gap sensor (146); and 控制器（145），所述控制器被配置为基于所述间隙传感器（146）的信号来控制所述至少一个电磁体（141）。A controller (145) is configured to control the at least one electromagnet (141) based on a signal of the gap sensor (146). 9.如权利要求8所述的载体运输系统，其中所述磁稳定单元（140）进一步包括一组永磁体（175），所述一组永磁体在所述导引空间（148）的上区域和下区域中产生具有相反方向的磁场线。9. The carrier transport system according to claim 8, wherein the magnetic stabilization unit (140) further comprises a set of permanent magnets (175) which generate magnetic field lines having opposite directions in the upper and lower regions of the guide space (148). 10.如权利要求8所述的载体运输系统，其中所述至少一个电磁体（141）包括彼此堆叠且彼此面对布置的第一磁极（181）和第二磁极（182），并且所述导引空间（148）设置在所述第一磁极与所述第二磁极之间。10. The carrier transport system of claim 8, wherein the at least one electromagnet (141) includes a first magnetic pole (181) and a second magnetic pole (182) stacked on each other and arranged facing each other, and the guide space (148) is provided between the first magnetic pole and the second magnetic pole. 11.如权利要求8所述的载体运输系统，其中所述磁稳定单元（140）可通过反转所述至少一个电磁体（141）的极性来在沿所述向上方向对所述载体（10）施加所述磁稳定力（FS）的第一控制状态（I）与在所述向下方向上对所述载体（10）施加所述磁稳定力（FS）的第二控制状态（II）之间切换。11. The carrier transport system of claim 8, wherein the magnetic stabilization unit (140) is switchable between a first control state (I) for applying the magnetic stabilization force (F S ) to the carrier (10) in the upward direction and a second control state (II) for applying the magnetic stabilization force (F S ) to the carrier (10) in the downward direction by reversing the polarity of the at least one electromagnet (141). 12.如权利要求8所述的载体运输系统，其中所述至少一个电磁体（141）包括在运输方向（T）上并排布置的第一电磁体（171）和第二电磁体（172），其中所述第二电磁体（172）相对于所述第一电磁体（171）相反极化，使得12. The carrier transport system of claim 8, wherein the at least one electromagnet (141) comprises a first electromagnet (171) and a second electromagnet (172) arranged side by side in the transport direction (T), wherein the second electromagnet (172) is polarized oppositely to the first electromagnet (171), such that -在第一控制状态（I）下，由所述第二电磁体（172）产生的磁场线在向下方向上延伸穿过所述导引空间（148）并且由所述第一电磁体（171）产生的磁场线在向上方向上延伸穿过所述导引空间（148），并且- in a first control state (I), the magnetic field lines generated by the second electromagnet (172) extend through the guide space (148) in a downward direction and the magnetic field lines generated by the first electromagnet (171) extend through the guide space (148) in an upward direction, and -在第二控制状态（II）下，由所述第二电磁体（172）产生的磁场线在向上方向上延伸穿过所述导引空间（148）并且由所述第一电磁体（171）产生的磁场线在向下方向上延伸穿过所述导引空间（148）。In a second control state (II), the magnetic field lines generated by the second electromagnet (172) extend through the guide space (148) in an upward direction and the magnetic field lines generated by the first electromagnet (171) extend through the guide space (148) in a downward direction. 13.如权利要求12所述的载体运输系统，进一步包括一组永磁体（175），所述一组永磁体布置在所述第一电磁体与第二电磁体之间，使得13. The carrier transport system of claim 12, further comprising a set of permanent magnets (175) arranged between the first electromagnet and the second electromagnet such that -在所述第一控制状态和所述第二控制状态中的一者中，所述一组永磁体产生磁场线（191），所述磁场线（191）在所述导引空间的上区域（178）中具有与由所述第一电磁体和所述第二电磁体产生的所述磁场线（192）基本上相同的方向并在所述导引空间的下区域（179）中具有基本上相反的方向，从而产生在所述向上方向上的磁稳定力（FS），并且- in one of the first control state and the second control state, the set of permanent magnets generates magnetic field lines (191) having in an upper region (178) of the guide space substantially the same direction as the magnetic field lines (192) generated by the first and second electromagnets and having in a lower region (179) of the guide space substantially the opposite direction, thereby generating a magnetic stabilizing force (F S ) in the upward direction, and -在所述第一控制状态和所述第二控制状态中的另一者中，所述一组永磁体产生磁场线（191），所述磁场线（191）在所述导引空间的所述下区域（179）中具有与由所述第一电磁体和所述第二电磁体产生的所述磁场线（192）基本上相同的方向并在所述导引空间的所述上区域（178）中具有基本上相反的方向，从而产生在所述向下方向上的磁稳定力（FS）。- in the other of the first control state and the second control state, the set of permanent magnets generates magnetic field lines (191) which, in the lower region (179) of the guide space, have substantially the same direction as the magnetic field lines (192) generated by the first electromagnet and the second electromagnet and have substantially the opposite direction in the upper region (178) of the guide space, thereby generating a magnetic stabilizing force (F S ) in the downward direction. 14.一种用于载体运输系统的磁稳定单元（140），包括：14. A magnetic stabilization unit (140) for a carrier transport system, comprising: 至少一个电磁体（141），所述至少一个电磁体用于作用在所述载体的第一磁单元（14）上，所述第一磁单元从所述载体侧向突出并布置在所述至少一个电磁体的两个磁极之间的导引空间（148）中；at least one electromagnet (141), the at least one electromagnet being used to act on a first magnetic unit (14) of the carrier, the first magnetic unit protruding laterally from the carrier and arranged in a guide space (148) between two magnetic poles of the at least one electromagnet; 一组永磁体（175），所述一组永磁体在所述导引空间的上区域（178）和下区域（179）中产生具有相反方向的磁场；a group of permanent magnets (175), the group of permanent magnets generating magnetic fields having opposite directions in an upper region (178) and a lower region (179) of the guide space; 间隙传感器（146）；以及a gap sensor (146); and 控制器（145），所述控制器被配置为基于所述间隙传感器的信号来控制所述至少一个电磁体，a controller (145) configured to control the at least one electromagnet based on a signal from the gap sensor, 其中所述磁稳定单元是主动控制的并被配置为有选择地在向上方向和向下方向上对所述载体（10）施加磁稳定力（FS）来使所述载体（10）保持在预定竖直位置处。The magnetic stabilization unit is actively controlled and configured to selectively apply a magnetic stabilization force (F S ) to the carrier (10) in an upward direction and a downward direction to keep the carrier (10) at a predetermined vertical position. 15.一种用于由载体运输系统（100）运输的载体（10），包括：15. A carrier (10) for transport by a carrier transport system (100), comprising: 保持区段，所述保持区段用于以基本上竖直的取向在所述载体处承载要运输的对象；a holding section for holding an object to be transported at the carrier in a substantially vertical orientation; 第一磁单元（14），所述第一磁单元在第一纵坐标处从所述载体侧向突出并被配置为通过与主动控制的双向磁稳定单元（140）磁相互作用而有选择地在向上方向和向下方向上被施加磁稳定力（FS）以将所述载体（10）保持在载体运输空间（102）中的预定竖直位置，其中所述第一磁单元（14）被配置为布置在所述磁稳定单元（140）的至少一个电磁体的两个磁极之间的导引空间（148）中；以及a first magnetic unit (14) protruding laterally from the carrier at a first longitudinal coordinate and configured to selectively exert a magnetic stabilizing force (F S ) in an upward direction and a downward direction to hold the carrier (10) in a predetermined vertical position in the carrier transport space (102) by magnetically interacting with an actively controlled bidirectional magnetic stabilizing unit (140), wherein the first magnetic unit (14) is configured to be arranged in a guide space (148) between two magnetic poles of at least one electromagnet of the magnetic stabilizing unit (140); and 第二磁单元（15），所述第二磁单元在第二纵坐标处布置在所述载体处并被配置为与第一永磁悬浮单元（121）磁相互作用，从而产生载体悬浮力（FL）。A second magnetic unit (15) is arranged on the carrier at a second longitudinal coordinate and is configured to magnetically interact with the first permanent magnetic suspension unit (121) to generate a carrier suspension force ( FL ). 16.如权利要求15所述的载体，进一步包括以下项中的至少一者：16. The vector of claim 15, further comprising at least one of the following: 第三磁单元（16），所述第三磁单元在第三纵坐标处布置在所述载体处并被配置为与驱动单元（150）相互作用，所述驱动单元被配置为在运输方向（T）上沿轨道组件移动所述载体；以及a third magnetic unit (16) arranged at the carrier at a third longitudinal coordinate and configured to interact with a drive unit (150) configured to move the carrier along the track assembly in a transport direction (T); and 第四磁单元（17），所述第四磁单元在第四纵坐标处布置在所述载体处并被配置为与第二永磁悬浮单元（122）磁相互作用，从而产生载体悬浮力（FL）。A fourth magnetic unit (17) is arranged on the carrier at a fourth longitudinal coordinate and is configured to magnetically interact with the second permanent magnetic suspension unit (122) to generate a carrier suspension force ( FL ). 17.如权利要求16所述的载体，其中所述第二磁单元（15）布置在所述载体的在所述保持区段上方的头部部分处，并且所述第一磁单元（14）、所述第三磁单元（16）和所述第四磁单元（17）中的至少一者或多者在载体运输期间布置在所述载体的在所述保持区段下方的底部部分处。17. The carrier according to claim 16, wherein the second magnetic unit (15) is arranged at a head portion of the carrier above the holding section, and at least one or more of the first magnetic unit (14), the third magnetic unit (16) and the fourth magnetic unit (17) are arranged at a bottom portion of the carrier below the holding section during transport of the carrier. 18.一种非接触式运输载体的方法，包括：18. A method for non-contact transport of a carrier, comprising: 用被动磁体布置产生抵消所述载体的重力的载体悬浮力（FL）；generating a carrier levitation force ( FL ) with a passive magnet arrangement to counteract the weight of the carrier; 通过用布置在第一纵坐标（V1）处的主动控制的双向磁稳定单元（140）有选择地在向上方向和向下方向上对所述载体的第一磁单元（14）施加磁稳定力（FS）来稳定所述载体在载体运输空间中的预定竖直定位，其中所述第一磁单元（14）从所述载体侧向突出并布置在所述磁稳定单元（140）的至少一个电磁体的两个磁极之间的导引空间（148）中；以及Stabilizing a predetermined vertical positioning of the carrier in a carrier transport space by selectively exerting a magnetic stabilizing force (F S ) in an upward direction and a downward direction on a first magnetic unit (14) of the carrier by an actively controlled bidirectional magnetic stabilizing unit (140) arranged at a first longitudinal coordinate (V1), wherein the first magnetic unit (14) protrudes laterally from the carrier and is arranged in a guide space (148) between two magnetic poles of at least one electromagnet of the magnetic stabilizing unit (140); and 用布置在第三纵坐标（V3）处的驱动单元在运输方向上移动所述载体。The carrier is moved in a transport direction by a drive unit arranged at a third longitudinal coordinate ( V3 ). 19.如权利要求18所述的方法，其中(i)所述被动磁体布置的所述载体悬浮力（FL）、(ii)所述载体的重力和(iii)由所述驱动单元施加在所述载体上的竖直力分量（FC）在载体运输期间加起来基本上为零，并且由所述磁稳定单元（140）对所述载体施加的平均磁稳定力基本上为零。19. The method of claim 18, wherein (i) the carrier levitation force ( FL ) of the passive magnet arrangement, (ii) the weight of the carrier, and (iii) a vertical force component ( FC ) applied by the drive unit on the carrier add up to substantially zero during carrier transport, and an average magnetic stabilization force applied by the magnetic stabilization unit (140) on the carrier is substantially zero. 20.如权利要求18或19所述的方法，其中所述载体基本上竖直地取向并具有1m或更大的竖直尺寸，所述被动磁体布置的第一永磁悬浮单元（121）与所述载体的头部部分磁相互作用，所述磁稳定单元（140）与所述载体的底部部分磁相互作用，并且所述驱动单元（150）与所述载体的所述底部部分相互作用。20. The method of claim 18 or 19, wherein the carrier is oriented substantially vertically and has a vertical dimension of 1 m or more, the first permanent magnetic levitation unit (121) of the passive magnet arrangement magnetically interacts with a head portion of the carrier, the magnetic stabilization unit (140) magnetically interacts with a bottom portion of the carrier, and the drive unit (150) interacts with the bottom portion of the carrier.
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