CN117144312B - A vacuum high-rate deposition rotating cylindrical arc coating source system - Google Patents
A vacuum high-rate deposition rotating cylindrical arc coating source system Download PDFInfo
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- CN117144312B CN117144312B CN202311009782.0A CN202311009782A CN117144312B CN 117144312 B CN117144312 B CN 117144312B CN 202311009782 A CN202311009782 A CN 202311009782A CN 117144312 B CN117144312 B CN 117144312B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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Abstract
本发明提供一种真空高速率沉积旋转圆柱电弧镀膜源系统，包括旋转圆柱靶装置，引弧装置，可活动遮罩装置，主体与电控装置和匀气装置；旋转圆柱靶装置包括处于中间的磁轴和靶材；磁轴包括固定轴、固定压紧块、调节螺母座、固定螺杆、导磁板、磁棒、连接轴套、支撑块、转动连接头一、转动连接头二和导磁遮罩；引弧装置包括钨极、连接块、加长杆、主轴、防镀遮罩、压板、筒座、绝缘垫、导向轴、弹簧压块、绝缘压块、气缸、气缸固定座和接线端头；可活动遮罩装置包括固定遮罩、右侧活动遮罩、左侧活动遮罩、无油衬套；该设计优化镀膜源系统结构，安装拆卸快捷，引弧更加高效，合理磁场及导磁设计，放电稳定，提高靶材利用率，从而提升成膜质量。
The invention provides a vacuum high-rate deposition rotating cylindrical arc coating source system, comprising a rotating cylindrical target device, an arc striking device, a movable shield device, a main body and an electric control device and a gas homogenizing device; the rotating cylindrical target device comprises a magnetic axis and a target material in the middle; the magnetic axis comprises a fixed axis, a fixed clamping block, an adjusting nut seat, a fixed screw, a magnetic plate, a magnetic rod, a connecting sleeve, a supporting block, a rotating connector head 1, a rotating connector head 2 and a magnetic shield; the arc striking device comprises a tungsten pole, a connecting block, an extension rod, a main axis, an anti-plating shield, a pressure plate, a cylinder seat, an insulating pad, a guide shaft, a spring pressure block, an insulating pressure block, a cylinder, a cylinder fixing seat and a wiring terminal; the movable shield device comprises a fixed shield, a right movable shield, a left movable shield and an oil-free bushing; the design optimizes the structure of the coating source system, is quick to install and disassemble, is more efficient in arc striking, has a reasonable magnetic field and magnetic conductivity design, is stable in discharge, improves the utilization rate of the target material, and thus improves the film forming quality.
Description
Technical Field
The utility model relates to the technical field of plasma surface vapor deposition, in particular to a vacuum high-speed deposition rotary cylindrical arc film plating source system.
Background
In the prior art, magnetron sputtering, evaporation coating, multi-arc ion plating and the like are all common physical coating source forms, however, the magnetron sputtering technology is mature, stable and easy to control, has a large number of application cases, has the defects of lower sputtering film forming rate and higher overall system cost, the evaporation coating technology is mature, the film forming is high in rate, the stability and large-area product quality are not easy to control, the multi-arc ion coating rate and the stability are between the two, the advantages of partial application cases are obvious, the market application scene is cylindrical plane arc, the target is fixed plane arc discharge, the heat is concentrated, the utilization rate is low, and the multi-unit combination is needed when the large-area product coating is applied.
In view of the above, the present inventors have conducted intensive studies on the above problems, which have resulted from the present invention.
Disclosure of utility model
Aiming at the problems, the utility model provides an arc coating source system which improves the coating film forming efficiency, the target utilization rate and the sputtering particle quality.
In order to solve the technical problems, the utility model adopts the following technical scheme:
a vacuum high-speed deposition rotary cylindrical arc coating source system comprises a rotary cylindrical target device, an arc striking device, a movable shade device, a main body, an electric control device and a gas homogenizing device;
The rotary cylindrical target device comprises a magnetic shaft and a target material in the middle, and a driven end head assembly, a driving end head assembly and a servo motor which are respectively positioned at two ends, wherein a driving belt pulley is arranged on an output shaft of the servo motor, and the driving belt pulley is connected with a driven belt pulley in the driving end head assembly through a belt;
The magnetic shaft comprises a fixed shaft, fixed compression blocks, an adjusting nut seat, fixed screws, a magnetic conduction plate, magnetic rods, a connecting shaft sleeve, supporting blocks, a first rotating connector, a second rotating connector, a magnetic conduction shade and the like, wherein two ends of the fixed shaft are respectively connected with the first rotating connector and the second rotating connector;
The arc striking device comprises a tungsten electrode, a connecting block, an extension rod, a main shaft, an anti-plating shade, a pressing plate, a cylinder seat, an insulating pad, a guide shaft, a spring pressing block, an insulating pressing block, an air cylinder fixing seat, a wiring end and the like, wherein the guide shaft is arranged in the cylinder seat, is put into a compression spring and pressed by the spring pressing block, the end of the guide shaft is fixed with the insulating pressing block, the guide shaft is arranged on the insulating pressing block, and the extension rod, the connecting block and the tungsten electrode are connected to the front end of the guide shaft.
The movable shade device comprises a fixed shade, a right movable shade, a left movable shade, oil-free bushings, fixed bolts, R-shaped pins and the like, wherein the oil-free bushings are respectively arranged on connecting lugs of the fixed shade, the right movable shade and the left movable shade, and the fixed shade, the right movable shade and the left movable shade are fixedly connected with the R-shaped pins through the fixed bolts.
Preferably, the two ends of the target material are provided with a holding block and a holding hoop.
Preferably, the rotary cylindrical target device is further provided with a motor installation adjusting plate and a motor fixing seat.
Preferably, the rotary cylindrical target device is further provided with an adjusting bolt.
Preferably, the movable shade device further comprises a connecting circular arc plate interposed between the right movable shade and the left movable shade.
Preferably, the movable shade device further comprises a fixed rod, a water inlet hose and a water outlet hose.
As can be seen from the above description of the technical solution, the present utility model has the following advantages:
The coating source system effectively improves the coating film forming efficiency, improves the target utilization rate, realizes large-area product mass production, has controllable coating parameters, is designed with a magnetic circuit and a magnetic conduction baffle plate, effectively controls the arc sputtering area, increases the discharge arc spot moving rate due to the rotary motion of the cylindrical structure target, improves the sputtering particle quality, ensures the film forming quality, and has the advantages of high film forming speed, high film forming quality, high material utilization rate and comprehensive cost.
Drawings
The accompanying drawings, which are included to provide a further understanding of the utility model and are incorporated in and constitute a part of this specification, illustrate embodiments of the utility model and together with the description serve to explain the utility model.
FIG. 1 is a front view of a vacuum high rate deposition rotary cylindrical arc coating source system;
FIG. 2 is a side view of a vacuum high rate deposition rotary cylindrical arc coating source system;
FIG. 3 is a front cross-sectional view of a rotary cylindrical target;
FIG. 4 is a cross-sectional view of a rotary cylindrical target;
fig. 5 is a front view of the arc striking device;
FIG. 6 is a front view of a movable shade device;
FIG. 7 is a side view of a movable shade device;
Reference numerals illustrate:
1-a rotary cylindrical target device 101-a target 102-a enclasping block 103-a hoop 104-a fixed shaft 105-a fixed compression block 106-an adjusting nut seat 107-a fixed screw 108-a magnetic guide plate 109-a magnetic rod 110-a connecting shaft sleeve 111-a supporting block 112-a rotary connector I113-a rotary connector II 114-a driven end head assembly 115-a driving end head assembly 116-a motor fixing seat 117-a motor installation adjusting plate 118-a belt 119-a driving pulley 120-a servo motor 121-an adjusting bolt;
2-arc striking device 201-tungsten electrode 202-connecting block 203-extension bar 204-main shaft 205-plating-preventing shade 206-pressing plate 207-cylinder seat 208-insulating pad 209-guiding shaft 210-spring press block 211-insulating press block 212-cylinder 213-cylinder fixing seat 214-wiring terminal;
3-shade device 301-fixed shade 302-right movable shade 303-left movable shade 304-connecting circular arc plate 305-fixed rod 306-oilless bushing 307-fixed plug 308-water inlet hose 309-water outlet hose 310-R-shaped pin;
4-a main body and an electric control device;
5-gas homogenizing device.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions in the embodiments of the present invention will be clearly and completely described in the following in conjunction with the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Referring to fig. 1-7, a vacuum high-speed deposition rotary cylindrical arc coating source system mainly comprises five parts, namely a rotary cylindrical target device 1, an arc striking device 2, a shade device 3, a main body, an electric control device 4, a gas homogenizing device 5 and the like.
The two ends of the rotary cylindrical target device 1 are respectively provided with a driven end head assembly 114 and a driving end head assembly 115. The driving belt pulley 119 is arranged on the output shaft of the servo motor 120 and is fixed on the motor installation adjusting plate 117 and then integrally fixed on the motor fixing seat 116, one end of the belt 118 is connected with the driving belt pulley 119, the other end is connected with the driven belt pulley in the driving end head assembly 115, the tensioning degree of the synchronous belt can be adjusted through tightening the adjusting bolt 121, and effective and stable transmission is ensured.
The middle part of the rotary cylinder target device 1 is a magnetic axis and a target 101. The magnetic shaft mainly comprises a fixed shaft 104, a fixed compression block 105, an adjusting nut seat 106, a fixed screw 107, a magnetic conduction plate 108, a magnetic rod 109, a connecting shaft sleeve 110, a supporting block 111, a first rotating connector 112, a second rotating connector 113 and the like. The two ends of the fixed shaft 104 are respectively inserted with a first rotary connector 112 and a second rotary connector 113, and are provided with supporting blocks 111 which penetrate through screws and are fixed by nuts, the middle of the fixed shaft 104 is provided with supporting blocks 111 which penetrate through screws and are fixed by nuts, the middle of the two supporting blocks 111 is provided with a distance shaft sleeve 124 and a rotary shaft sleeve 110 which penetrate through screws and are fixed by nuts, and the rotary shaft sleeve 110 is designed to reduce the resistance of the target material during high-speed rotation and play a role in stabilizing and supporting. The fixing screws 107 are respectively fixed on the magnetic conduction plates 108, penetrate through the fixing shafts 104 and are fixed by the adjusting nut seats 106 and the fixing pressing blocks 105. Under the condition of loosening the fixed compression block 105, the adjusting nut seat 106 can be screwed to adjust the central heights of the magnetic shaft and the rotating shaft, and the magnetic flux parameters can be adjusted, so that better process effect can be achieved through measurement of a Gaussian meter. The magnetic rods 109 are adsorbed on the magnetic conduction plate 108, the magnetic conduction shield is used for shielding the magnetic rods 109, the magnetic conduction effect is enhanced, the magnetic shaft is provided with two magnetic rods 109, an unbalanced magnetic field can be formed, the magnetic field can ensure that arc spots rapidly move along the target surface, large particles are reduced, the target surface is ablated uniformly, and the target material utilization rate is effectively improved.
When the target 101 is replaced, the two end hoops 103 are required to be loosened firstly, the holding block 102 is required to be removed, then the clamping hoops in the driven end head assembly 114 and the driving end head assembly 115 are loosened, finally the supporting seat in the driven end head assembly 114 is removed, and the target is taken out for replacement. During installation, a magnetic shaft penetrates into the middle of the target 101 and fluororubber O-shaped rings are pressed into the two ends of the target 101, then the target 101 and one end of the magnetic shaft are firstly installed in the driving end head assembly 115, a supporting seat in the driven end head assembly 114 is installed at the other end of the target, then the target 101 is fixed by tightening clamping hoops in the driven end head assembly 114 and the driving end head assembly 115, and the clamping blocks 102 and the hoops 103 are installed at the two ends of the target 101 so as to shield the end parts of the target 101, so that the sputtering of the target is prevented from affecting the fixing strength of the two ends, and the target can stably rotate at a high speed.
When the rotary cylindrical target device 1 works, the magnetic shaft is fixed, two ends of the target 101 are held tightly by the clamping hoops in the driven end head assembly 114 and the driving end head assembly 115, the target 101 rotates at a high speed under the drive of the servo motor 120, and the target 101 can be ablated uniformly by continuous rotation of the target 101, so that the utilization rate of the target 101 is improved.
The arc striking device mainly comprises a tungsten electrode 201, a connecting block 202, an extension rod 203, a main shaft 204, an anti-plating mask 205, a pressing plate 206, a cylinder base 207, an insulating pad 208, a guide shaft 209, a spring pressing block 210, an insulating pressing block 211, a cylinder 212, a cylinder fixing seat 213, a wiring terminal 214 and the like. The guide shaft 209 is fitted into the cartridge 207, and a compression spring is placed therein and pressed by the spring pressing block 210. An insulating press block 211 is fixed to the end of the guide shaft 209, and the guide shaft 209 is mounted on the insulating press block 211, thereby ensuring that the guide shaft 209 can move only in the cartridge 207 without rotation. The front end of the guide shaft 209 is connected with an extension bar 203, a connecting block 202 and a tungsten electrode 201, the tungsten electrode 201 is consumable, and the connecting block 202 is designed to facilitate tungsten electrode replacement. When the arc striking device works, the wiring terminal 214 is grounded, the initial state of the air cylinder 212 is that the air cylinder 212 extends out, the end face of the air cylinder 212 props against the insulation press block 211 and carries the guide shaft 209 to extend out, the tungsten electrode 201 is far away from the target 101 and is not contacted with the target 101, and at the moment, the compression spring between the guide shaft 209 and the cylinder seat 207 is in a compression state. When the arc striking signal is received, the air cylinder 212 acts to retract, and the guide shaft 209 is also retracted under the drive of the compression force of the spring at the moment, so that the tungsten electrode 201 is driven to touch the target. The impact force to the target material when the tungsten electrode 201 and the target material 101 are driven by the compression force of the spring to touch can be ensured, meanwhile, the retraction of the cylinder 212 is faster than the contact of the tungsten electrode 201 and the target material 101, the retraction of the cylinder 212 is faster than the deformation recovery of the spring, the cylinder 212 can be ensured to be pushed out in advance to wait when the tungsten electrode 201 is not contacted with the target material 101, the response speed is improved, the arc striking contact time is prevented from being long enough, the service life of the tungsten electrode 201 is shortened due to excessive ablation, the tungsten electrode 201 can be pushed out faster to be separated from the target material 101 instantaneously, the tungsten electrode 201 is separated from the target material 201 instantaneously after the contact is electrified, the relative position of the target material 101 is unchanged, and the arc striking device 2 drives the tail end tungsten electrode 201 to move away from or contact the target material 101, so that a better arc striking effect is achieved. After the arc striking light discharge is ignited, the arc striking device 2 is automatically cut off (the arc striking device for the non-ignited arc striking light discharge repeatedly acts), and the stable discharge between the cathode arc source and the coating chamber is maintained by the arc power supply.
The movable shade device includes a fixed shade 301, a right movable shade 302, a left movable shade 303, a connecting circular arc plate 304, a fixed rod 305, an oilless bush 306, a fixed plug 307, a water inlet hose 308, a water outlet hose 309, an R-shaped pin 310, and the like. The fixed shade 301, the right movable shade 302 and the left movable shade 303 are respectively provided with oil-free bushings 306 through connecting lug holes, the shades are fixedly connected through fixing bolts 307 and R-shaped pins 310, the shades are mutually movable, and when the shades are integrally disassembled and assembled, the movable plates on two sides can be fixed through fixing rods 305, and the whole shade is relatively fixed and is relatively cheap to disassemble, assemble and replace. The connecting arc plate 304 is movably connected between the right movable shade 302 and the left movable shade 303, so that the right movable shade 302 and the left movable shade 303 can be replaced according to the size of the working coating surface in practical application, the non-shielding part can be 180 degrees or 120 degrees or 90 degrees, and the compatibility of equipment is improved. And water paths which are communicated with each other are arranged among the shades, and a cooling water inlet hose 308 flows in during film coating and flows out of a water outlet hose 309 to cool down the shades, so that the influence of temperature rise on the target 101 is reduced.
The foregoing embodiments are merely for illustrating the technical solution of the present invention, but not for limiting the same, and although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those skilled in the art that modifications may be made to the technical solution described in the foregoing embodiments or equivalents may be substituted for parts of the technical features thereof, and that such modifications or substitutions do not depart from the spirit and scope of the technical solution of the embodiments of the present invention in essence.
Claims (6)
1. The vacuum high-speed deposition rotary cylindrical arc coating source system is characterized by comprising a rotary cylindrical target device, an arc striking device, a movable shade device, a main body, an electric control device and a gas homogenizing device;
The rotary cylindrical target device comprises a magnetic shaft and a target material in the middle, and a driven end head assembly, a driving end head assembly and a servo motor which are respectively positioned at two ends, wherein a driving belt pulley is arranged on an output shaft of the servo motor, and the driving belt pulley is connected with a driven belt pulley in the driving end head assembly through a belt;
The magnetic shaft comprises a fixed shaft, fixed compression blocks, an adjusting nut seat, fixed screws, a magnetic conduction plate, magnetic rods, a connecting shaft sleeve, supporting blocks, a first rotating connector, a second rotating connector and a magnetic conduction shade, wherein two ends of the fixed shaft are respectively connected with the first rotating connector and the second rotating connector;
The arc striking device comprises a tungsten electrode, a connecting block, an extension rod, a main shaft, an anti-plating shade, a pressing plate, a cylinder seat, an insulating pad, a guide shaft, a spring pressing block, an insulating pressing block, a cylinder fixing seat and a wiring terminal, wherein the guide shaft is arranged in the cylinder seat and is put into a compression spring and pressed by the spring pressing block;
The movable shade device comprises a fixed shade, a right movable shade, a left movable shade, oil-free bushings, fixed bolts and R-shaped pins, wherein the oil-free bushings are respectively arranged on connecting lugs of the fixed shade, the right movable shade and the left movable shade, and then the fixed shade, the right movable shade and the left movable shade are fixedly connected with the R-shaped pins through the fixed bolts.
2. The vacuum high-speed deposition rotary cylindrical arc coating source system of claim 1, wherein the two ends of the target are provided with a holding block and a holding hoop.
3. The vacuum high-speed deposition rotary cylindrical arc coating source system of claim 1, wherein the rotary cylindrical target device is further provided with a motor mounting adjusting plate and a motor fixing seat.
4. The vacuum high-speed deposition rotary cylindrical arc coating source system of claim 1, wherein the rotary cylindrical target device is further provided with an adjusting bolt.
5. The vacuum high-rate deposition rotating cylindrical arc coating source system of claim 1, wherein the movable mask assembly further comprises a connecting circular arc plate interposed between the right movable mask and the left movable mask.
6. The vacuum high-speed deposition rotating cylindrical arc coating source system of claim 1, wherein the movable shade device further comprises a fixed rod, a water inlet hose and a water outlet hose.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202311009782.0A CN117144312B (en) | 2023-08-11 | 2023-08-11 | A vacuum high-rate deposition rotating cylindrical arc coating source system |
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| CN202311009782.0A CN117144312B (en) | 2023-08-11 | 2023-08-11 | A vacuum high-rate deposition rotating cylindrical arc coating source system |
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| CN117144312B true CN117144312B (en) | 2025-06-17 |
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN220703783U (en) * | 2023-08-11 | 2024-04-02 | 福建金石能源有限公司 | A vacuum high-rate deposition rotating cylindrical arc coating source system |
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| GB9615548D0 (en) * | 1996-07-24 | 1996-09-04 | Univ Nanyang | Cathode arc source and graphite target |
| AU9410498A (en) * | 1997-11-26 | 1999-06-17 | Vapor Technologies, Inc. | Apparatus for sputtering or arc evaporation |
| US7014741B2 (en) * | 2003-02-21 | 2006-03-21 | Von Ardenne Anlagentechnik Gmbh | Cylindrical magnetron with self cleaning target |
| US9349576B2 (en) * | 2006-03-17 | 2016-05-24 | Angstrom Sciences, Inc. | Magnetron for cylindrical targets |
| KR20110046074A (en) * | 2009-10-28 | 2011-05-04 | 김만수 | Magnetic field control cathode gun in sputter deposition equipment |
| CN202595251U (en) * | 2012-03-30 | 2012-12-12 | 广东友通工业有限公司 | Arc target structure of multi-arc ion coating machine |
| CN204644453U (en) * | 2015-04-22 | 2015-09-16 | 成都金倍科技有限公司 | A kind of magnetic field rotating magnetic control post arc target |
| CN204644452U (en) * | 2015-04-22 | 2015-09-16 | 成都金倍科技有限公司 | A kind of target pipe rotary magnetron post arc target |
| CN107723669A (en) * | 2017-08-22 | 2018-02-23 | 深圳市生波尔光电技术有限公司 | Columnar arc source and arc ion coating device |
| CN209352972U (en) * | 2018-12-28 | 2019-09-06 | 上海福宜真空设备有限公司 | A kind of small arc source for multi-arc ion plating film |
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| CN220703783U (en) * | 2023-08-11 | 2024-04-02 | 福建金石能源有限公司 | A vacuum high-rate deposition rotating cylindrical arc coating source system |
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