CN117238747A - A peeling layer with reduced peeling strength and its manufacturing method, information display element and its manufacturing method - Google Patents
A peeling layer with reduced peeling strength and its manufacturing method, information display element and its manufacturing method Download PDFInfo
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Abstract
本发明公开了一种剥离层的制造方法,所述剥离层的制造方法包括以下步骤:准备支撑基板的步骤;以及在所述支撑基板上形成氧化石墨烯层的步骤。
The invention discloses a method for manufacturing a peeling layer. The manufacturing method of the peeling layer includes the following steps: preparing a supporting substrate; and forming a graphene oxide layer on the supporting substrate.
Description
技术领域Technical field
本发明涉及一种剥离强度降低的剥离层及其制造方法、信息显示元件及其制造方法,涉及一种通过调整形成剥离层的氧化石墨烯的大小,并调整不同大小的氧化石墨烯的组成比例,从而提高氧化石墨烯层的涂布率,使得剥离层的剥离强度降低的剥离层及其制造方法、信息显示元件及其制造方法。The invention relates to a peeling layer with reduced peeling strength and a manufacturing method thereof, an information display element and a manufacturing method thereof, and relates to a method of adjusting the size of graphene oxide forming a peeling layer and adjusting the composition ratio of graphene oxides of different sizes. , thereby increasing the coating rate of the graphene oxide layer and reducing the peeling strength of the peeling layer, the peeling layer and its manufacturing method, the information display element and its manufacturing method.
背景技术Background technique
随着智能眼镜等可穿戴装置的商业化进程的提速,如柔性显示屏(flexibledisplay)那样的柔性信息显示元件的必要性以及需求呈现增加的势头。As the commercialization of wearable devices such as smart glasses accelerates, the necessity and demand for flexible information display components such as flexible displays are increasing.
在柔性信息显示元件的制造工艺中,将柔性基板层叠在支撑基板上,然后进行制造工序,在最后的工序中执行将柔性基板从支撑基板上分离的工序。In the manufacturing process of the flexible information display element, the flexible substrate is laminated on the supporting substrate, and then the manufacturing process is performed. In the final process, a process of separating the flexible substrate from the supporting substrate is performed.
作为柔性基板,主要使用聚酰亚胺,作为支撑基板,则使用玻璃基板。在支撑基板上形成柔性基板的方法如下:将聚酰亚胺清漆(varnish)涂布于支撑基板上,并在高温下将其固化而在支承基板上形成柔性基板。在此过程中,聚酰亚胺与支撑基板之间产生化学键合,使得支撑基板与柔性基板之间的粘附力增加,因此,如果不额外设置工艺就很难将其分离。As the flexible substrate, polyimide is mainly used, and as the supporting substrate, a glass substrate is used. A method of forming a flexible substrate on a supporting substrate is as follows: coating polyimide varnish on the supporting substrate and curing it at a high temperature to form a flexible substrate on the supporting substrate. During this process, chemical bonding occurs between the polyimide and the support substrate, which increases the adhesion between the support substrate and the flexible substrate, making it difficult to separate them without additional processes.
为了解决这个问题,在现有技术中作为从支撑基板剥离柔性基板的工艺而主要采用了激光剥离(LLO,Laser-lift-off)的工艺。In order to solve this problem, in the prior art, the laser lift-off (LLO) process is mainly used as a process for peeling off the flexible substrate from the support substrate.
但是,如果使用激光,则存在需要使用昂贵的激光剥离装置,并且不适于大面积工艺的问题。However, if a laser is used, there is a problem that an expensive laser lift-off device is required and is not suitable for large-area processes.
发明内容Contents of the invention
发明所要解决的问题Problems to be solved by inventions
本发明是为了解决上述问题而提出的,本发明的目的在于提供一种剥离层及其制造方法、信息显示元件及其制造方法,其作为柔性信息显示元件的剥离层而形成氧化石墨烯层,并通过调整形成所述氧化石墨烯层的氧化石墨烯的大小以及调整不同大小的氧化石墨烯的组成比例来降低氧化石墨烯层的剥离强度。The present invention is proposed to solve the above problems. The purpose of the present invention is to provide a peeling layer and a manufacturing method thereof, an information display element and a manufacturing method thereof, which form a graphene oxide layer as a peeling layer of a flexible information display element, And by adjusting the size of graphene oxide forming the graphene oxide layer and adjusting the composition ratio of graphene oxide of different sizes, the peeling strength of the graphene oxide layer is reduced.
本发明的另一目的在于提供一种剥离层及其制造方法、信息显示元件及其制造方法,其由于不需要使用昂贵的激光剥离装置,因此制造成本低,并且可适用于大面积工艺。Another object of the present invention is to provide a peeling layer and a manufacturing method thereof, an information display element and a manufacturing method thereof, which do not require the use of an expensive laser peeling device, so the manufacturing cost is low and can be applied to large-area processes.
本发明的另一目的在于提供一种剥离层及其制造方法、信息显示元件及其制造方法,其由于在形成氧化石墨烯层时进行电喷雾涂布,从而可以省去阳离子聚合物电解质溶液的涂布工序,因此能够节省制造工艺的时间,并且制造成本低。Another object of the present invention is to provide a peeling layer and a manufacturing method thereof, an information display element and a manufacturing method thereof, which can eliminate the need for a cationic polymer electrolyte solution due to electrospray coating when forming the graphene oxide layer. coating process, thus saving time in the manufacturing process and reducing manufacturing costs.
用于解决问题的方法Methods used to solve problems
为了达成上述目的的根据本发明的剥离层的制造方法可以包括以下步骤:准备支撑基板的步骤;以及在所述支撑基板上形成氧化石墨烯层的步骤。In order to achieve the above object, the manufacturing method of the release layer according to the present invention may include the following steps: a step of preparing a supporting substrate; and a step of forming a graphene oxide layer on the supporting substrate.
根据本发明的剥离层可以通过所述剥离层的制造方法来制造。The release layer according to the present invention can be manufactured by the manufacturing method of the release layer.
为了达成上述另一目的的根据本发明的信息显示元件的制造方法可以包括以下步骤:准备支撑基板的步骤;在所述支撑基板上形成氧化石墨烯层的步骤;在所述氧化石墨烯层上形成柔性基板的步骤;以及将所述支撑基板和所述柔性基板进行分离的步骤。In order to achieve the other purpose mentioned above, the manufacturing method of an information display element according to the present invention may include the following steps: preparing a supporting substrate; forming a graphene oxide layer on the supporting substrate; and forming a graphene oxide layer on the graphene oxide layer. The step of forming a flexible substrate; and the step of separating the support substrate and the flexible substrate.
根据本发明的信息显示元件可以通过所述信息显示元件的制造方法来制造。The information display element according to the present invention can be manufactured by the manufacturing method of the information display element.
发明效果Invention effect
根据本发明,由于不需要使用昂贵的激光剥离装置,因此具有制造成本低,并且可适用于大面积工艺的优点。According to the present invention, since there is no need to use an expensive laser lift-off device, the manufacturing cost is low and the method is applicable to large-area processes.
另外,通过调整形成氧化石墨烯层的氧化石墨烯的大小,并调整不同大小的氧化石墨烯的组成比例来提高支撑基板上的剥离层的涂布率,从而能够在制造柔性基板时的高温暴露以及在显示屏的制造工艺时的高温以及等离子体等的条件下,防止支撑基板即玻璃基板与聚酰亚胺的化学键合,以达到降低剥离强度的效果。此外,由于既能够降低剥离强度,同时又能够形成为薄膜层,因此具有能够保持优异水平的透光度的优点。In addition, by adjusting the size of graphene oxide forming the graphene oxide layer and adjusting the composition ratio of graphene oxide of different sizes to increase the coating rate of the release layer on the support substrate, it is possible to achieve high temperature exposure when manufacturing flexible substrates. And under the conditions of high temperature and plasma during the manufacturing process of the display screen, it prevents the chemical bonding between the supporting substrate, that is, the glass substrate and the polyimide, so as to achieve the effect of reducing the peeling strength. In addition, since the peeling strength can be reduced while forming a thin film layer, there is an advantage that an excellent level of light transmittance can be maintained.
另外,在本发明中,利用电喷雾来微量喷射氧化石墨烯分散液,并且可施加电压,因此能够诱导支撑基板和氧化石墨烯分散液的静电引力,从而形成薄膜的氧化石墨烯层。因此,具有能够省去现有的在形成氧化石墨烯层之前进行的阳离子聚合物电解质溶液的涂布工序的优点。In addition, in the present invention, the graphene oxide dispersion is micro-sprayed using electrospray, and a voltage can be applied. Therefore, electrostatic attraction between the support substrate and the graphene oxide dispersion can be induced to form a thin graphene oxide layer. Therefore, there is an advantage that the conventional coating process of the cationic polymer electrolyte solution performed before forming the graphene oxide layer can be omitted.
附图说明Description of drawings
图1是根据本发明一实施例的剥离层的制造方法的流程图;Figure 1 is a flow chart of a method for manufacturing a release layer according to an embodiment of the present invention;
图2是根据本发明一实施例的信息显示元件的制造方法的流程图;Figure 2 is a flow chart of a manufacturing method of an information display element according to an embodiment of the present invention;
图3是根据本发明一实施例的柔性基板形成工艺的流程图;Figure 3 is a flow chart of a flexible substrate forming process according to an embodiment of the present invention;
图4是概要性地图示了根据本发明一实施例的信息显示元件的制造方法中形成的各层的剖视图;4 is a cross-sectional view schematically illustrating each layer formed in a manufacturing method of an information display element according to an embodiment of the present invention;
图5是概要性地图示了根据本发明一实施例的信息显示元件的制造工艺中支撑基板和柔性基板的分离过程的剖视图。5 is a cross-sectional view schematically illustrating the separation process of the support substrate and the flexible substrate in the manufacturing process of the information display element according to an embodiment of the present invention.
附图标记:Reference signs:
S10:准备支撑基板;S20:形成氧化石墨烯层;S30:形成柔性基板;S40:分离支撑基板和柔性基板;10:支撑基板;20:剥离层;30:柔性基板。S10: Prepare the supporting substrate; S20: Form the graphene oxide layer; S30: Form the flexible substrate; S40: Separate the supporting substrate and the flexible substrate; 10: Supporting substrate; 20: Peeling layer; 30: Flexible substrate.
具体实施方式Detailed ways
在本说明书中使用的技术术语仅仅是为了说明特定的实施例而使用的,需要注意的是这些技术术语不是用来限定本发明的。另外,在本说明书中使用的技术术语,理应解释为本发明所属技术领域普通技术人员通常所理解的含义,除非在本说明书中对其做出另外的特别的定义,不能对其以过度概括性的含义或过度缩小的含义来予以解释。此外,如果在本说明书中使用的技术术语是不能准确地描述本发明的思想的错误的技术术语,则理应以本领域普通技术人员能够准确理解的技术术语来代替错误的技术术语并予以理解。The technical terms used in this specification are only used to describe specific embodiments. It should be noted that these technical terms are not used to limit the present invention. In addition, the technical terms used in this specification should be interpreted as meanings commonly understood by those of ordinary skill in the technical field to which the present invention belongs. Unless otherwise specifically defined in this specification, they should not be overly generalized. meaning or an over-reduced meaning. In addition, if the technical terms used in this specification are incorrect technical terms that cannot accurately describe the idea of the present invention, the incorrect technical terms should be replaced with technical terms that can be accurately understood by those of ordinary skill in the art and understood.
另外,在本说明书中使用的一般术语,理应根据字典中的定义或根据上下文来加以解释,不能对其以过度缩小的含义来予以解释。In addition, general terms used in this specification should be interpreted based on the definitions in the dictionary or based on the context, and should not be interpreted with an excessively narrowed meaning.
此外,在本说明书中使用的关于单数的描述,如果在上下文中不产生其他含义,则包括复数的含义。另外,在本申请中,“构成”或“包括”等术语,不应解释为必须包括说明书中所记载的全部的各种构成要素或各种步骤,理应解释为可以不包括其中的部分构成要素或部分步骤,或者还可以进一步包括其他构成要素或步骤。In addition, descriptions of the singular used in this specification include the plural if the context does not produce other meanings. In addition, in this application, terms such as "constituting" or "comprising" should not be interpreted as necessarily including all the various constituent elements or various steps described in the specification, but should be interpreted as meaning that some of the constituent elements may not be included. or part of the steps, or may further include other constituent elements or steps.
下面,通过实施例更加具体地说明本发明,但是本发明的范围不受下述实施例的限制。Hereinafter, the present invention will be described in more detail using examples, but the scope of the present invention is not limited by the following examples.
图1是根据本发明一实施例的剥离层的制造方法的流程图。Figure 1 is a flow chart of a method for manufacturing a release layer according to an embodiment of the present invention.
参照图1,根据本发明一实施例的剥离层的制造方法可以包括以下步骤:准备支撑基板S10的步骤;以及形成氧化石墨烯层S20的步骤。Referring to FIG. 1 , a method for manufacturing a peeling layer according to an embodiment of the present invention may include the following steps: preparing a support substrate S10 ; and forming a graphene oxide layer S20 .
此时,所述支撑基板可以是玻璃基板、高分子膜或硅晶片。但是,根据本发明的支撑基板并非一定限定于此。At this time, the supporting substrate may be a glass substrate, a polymer film or a silicon wafer. However, the support substrate according to the present invention is not necessarily limited to this.
所述支撑基板可以包括清洗支撑基板的步骤和对支撑基板进行表面处理的步骤。The supporting substrate may include a step of cleaning the supporting substrate and a step of surface treating the supporting substrate.
此时,所述清洗支撑基板的步骤可以如下:将所述支撑基板浸入乙醇溶液中,然后利用超声波清洗所述支撑基板。此后,可以将所述支撑基板浸入异丙醇溶液中,然后利用超声波清洗所述支撑基板。At this time, the step of cleaning the support substrate may be as follows: immersing the support substrate in an ethanol solution, and then cleaning the support substrate using ultrasonic waves. Thereafter, the support substrate may be immersed in an isopropyl alcohol solution and then cleaned using ultrasonic waves.
可以对经过所述清洗工序的支撑基板进行干燥。The support substrate that has undergone the cleaning process may be dried.
所述形成氧化石墨烯层的步骤S20可以包括将氧化石墨烯分散液涂布于所述支撑基板上的步骤。The step S20 of forming the graphene oxide layer may include the step of coating the graphene oxide dispersion liquid on the support substrate.
此时,所述涂布可以是电喷雾方式。At this time, the coating may be electrosprayed.
所述电喷雾涂布可以在喷涂速度为70~90μL/min、气压为0.2~0.3MPa和电压为9kV以上的条件下进行。优选地,所述喷涂速度可以为80μL/min,所述气压可以为0.25MPa,所述电压可以为10kV。The electrospray coating can be performed under the conditions of a spray speed of 70 to 90 μL/min, an air pressure of 0.2 to 0.3 MPa, and a voltage of 9 kV or more. Preferably, the spraying speed may be 80 μL/min, the air pressure may be 0.25MPa, and the voltage may be 10kV.
喷涂速度越低于70μL/min,因容量不足而导致喷射的水滴数量越少,因此存在难以均匀涂布的问题,喷涂速度越高于90μL/min,则与容量相比喷射力越低,因此存在涂布较大的水滴的问题。The lower the spraying speed is than 70μL/min, the smaller the number of water droplets sprayed due to insufficient capacity, so there is a problem of difficulty in uniform coating. The higher the spraying speed is higher than 90μL/min, the lower the spraying force is compared with the capacity, so There is a problem of coating larger water droplets.
气压越低于0.2MPa,喷射力越小,因此存在涂布较大的水滴的问题,气压越高于0.3MPa,喷射的水滴越不能到达基板,因此存在涂布面积减少的问题。The lower the air pressure is than 0.2MPa, the smaller the spray force is, so there is a problem of coating larger water droplets. The higher the air pressure is higher than 0.3MPa, the less the sprayed water droplets can reach the substrate, so there is a problem of reduced coating area.
电压越低于9kV,存在喷射的水滴的大小越大的问题,而当电压为9kV以上时,能够充分地进行细微的喷射。As the voltage is lower than 9 kV, there is a problem that the size of the sprayed water droplets becomes larger. However, when the voltage is 9 kV or more, fine spraying can be sufficiently performed.
所述氧化石墨烯分散液的浓度可以为0.01~0.02重量%。优选地,所述浓度可以为0.01重量%。The concentration of the graphene oxide dispersion may be 0.01 to 0.02% by weight. Preferably, the concentration may be 0.01% by weight.
所述浓度越低于0.01重量%,涂布率越低,因此存在剥离强度增加的问题,所述浓度越高于0.02重量%,存在透光度越低的问题。When the concentration is lower than 0.01% by weight, the coating rate is lower, so there is a problem of increased peel strength. When the concentration is higher than 0.02% by weight, there is a problem of lower transmittance.
根据一实施例,所述氧化石墨烯分散液可以包括第一氧化石墨烯和第二氧化石墨烯,所述第一氧化石墨烯的大小可以为50um,所述第二氧化石墨烯的大小可以为1um。According to an embodiment, the graphene oxide dispersion may include a first graphene oxide and a second graphene oxide, the size of the first graphene oxide may be 50 μm, and the size of the second graphene oxide may be 1um.
所述氧化石墨烯分散液可以以5:5至8:2的比例包含所述第一氧化石墨烯和所述第二氧化石墨烯。The graphene oxide dispersion liquid may include the first graphene oxide and the second graphene oxide in a ratio of 5:5 to 8:2.
当所述第二氧化石墨烯的含量大于所述第一氧化石墨烯的含量时,存在涂布率降低而导致剥离强度增加的问题。When the content of the second graphene oxide is greater than the content of the first graphene oxide, there is a problem that the coating rate is reduced, resulting in an increase in peel strength.
根据另一实施例,所述氧化石墨烯分散液可以包含大小为50um的氧化石墨烯。此时,所述氧化石墨烯分散液可以只包含大小为50um的氧化石墨烯而不包含大小为1um的氧化石墨烯。According to another embodiment, the graphene oxide dispersion may include graphene oxide with a size of 50 μm. At this time, the graphene oxide dispersion may only contain graphene oxide with a size of 50 μm and not contain graphene oxide with a size of 1 μm.
也就是说,在本发明中,可以同时包含大小为50um的氧化石墨烯和大小为1um的氧化石墨烯,并且将大小为50um的氧化石墨烯和大小为1um的氧化石墨烯的组成范围设为5:5至8:2的范围内,或者可以通过使包含在氧化石墨烯分散液中的氧化石墨烯仅为大小为50um的氧化石墨烯,从而提高氧化石墨烯层的涂布率,其结果是,能够带来降低剥离层的剥离强度的效果。That is to say, in the present invention, graphene oxide with a size of 50um and graphene oxide with a size of 1um can be included simultaneously, and the composition range of the graphene oxide with a size of 50um and the graphene oxide with a size of 1um is set to In the range of 5:5 to 8:2, or by making the graphene oxide contained in the graphene oxide dispersion only graphene oxide with a size of 50um, the coating rate of the graphene oxide layer can be increased, and the result is Yes, it can bring about the effect of reducing the peel strength of the peel layer.
这种剥离强度的改善能够带来在制造信息显示元件装置工艺后剥离时,降低剥离强度的效果。This improvement in peel strength can bring about the effect of reducing the peel strength when peeling off after the process of manufacturing the information display element device.
图2是根据本发明一实施例的信息显示元件的制造方法的流程图。图3是根据本发明一实施例的柔性基板形成工艺的流程图。FIG. 2 is a flow chart of a manufacturing method of an information display element according to an embodiment of the present invention. FIG. 3 is a flow chart of a flexible substrate forming process according to an embodiment of the present invention.
参照图2,根据本发明一实施例的制造信息显示元件的制造方法可以包括以下步骤:准备支撑基板的步骤S10;形成氧化石墨烯层的步骤S20;形成柔性基板的步骤S30;以及分离支撑基板和柔性基板的步骤S40。Referring to Figure 2, a manufacturing method for manufacturing an information display element according to an embodiment of the present invention may include the following steps: step S10 of preparing a support substrate; step S20 of forming a graphene oxide layer; step S30 of forming a flexible substrate; and separating the support substrate and step S40 of the flexible substrate.
准备支撑基板的步骤S10和形成氧化石墨烯层的步骤S20的构成与前述参照图1说明的内容相同,因此省略赘述。The structures of the step S10 of preparing the supporting substrate and the step S20 of forming the graphene oxide layer are the same as those described above with reference to FIG. 1 , and therefore the redundant description is omitted.
参照图3,所述形成柔性基板的步骤S30可以包括以下步骤:涂布柔性基板物质的步骤S32和加热柔性基板物质的步骤S34。Referring to FIG. 3 , the step S30 of forming a flexible substrate may include the following steps: a step S32 of coating the flexible substrate substance and a step S34 of heating the flexible substrate substance.
在所述涂布柔性基板物质的步骤S32中,涂布于所述氧化石墨烯层上的物质可以选自由聚酰亚胺、聚酯、聚乙烯、聚碳酸酯、聚乙烯、聚乙烯酯、聚醚砜、聚丙烯酸酯、聚萘二甲酸乙二醇酯和聚对苯二甲酸乙二醇酯组成的群组中的任一种。在加热并固化涂布的所述物质的步骤中,固化条件可以根据涂布的所述物质而发生变化。In the step S32 of coating the flexible substrate substance, the substance coated on the graphene oxide layer may be selected from polyimide, polyester, polyethylene, polycarbonate, polyethylene, polyvinyl ester, Any one from the group consisting of polyethersulfone, polyacrylate, polyethylene naphthalate, and polyethylene terephthalate. In the step of heating and curing the applied substance, curing conditions may vary depending on the applied substance.
如果所述柔性基板物质为聚酰亚胺,则因其使用了聚酰亚胺清漆,所以需要加热固化的步骤,在加热步骤S34中,可以从常温加热至350℃,此时可以将温度每分钟升高5℃。If the flexible substrate material is polyimide, because it uses polyimide varnish, a heating and curing step is required. In the heating step S34, it can be heated from normal temperature to 350°C. At this time, the temperature can be adjusted every minutes to rise by 5°C.
例如,可以在100℃下加热10分钟,在200℃下加热30分钟,在350℃下加热30分钟。之后,自然冷却约3小时。For example, it can be heated at 100°C for 10 minutes, at 200°C for 30 minutes, and at 350°C for 30 minutes. After that, let it cool naturally for about 3 hours.
在所述分离支撑基板和柔性基板的步骤S40中,可以利用物理力来分离所述支撑基板和所述柔性基板。In the step S40 of separating the support substrate and the flexible substrate, physical force may be used to separate the support substrate and the flexible substrate.
图4是概要性地图示了根据本发明一实施例的信息显示元件的制造方法中形成的各层的剖视图。图5是概要性地图示了根据本发明一实施例的信息显示元件的制造工艺中支撑基板和柔性基板的分离过程的剖视图。对图4和图5的说明,将根据下面的实施例进行进一步详细地说明。4 is a cross-sectional view schematically illustrating each layer formed in a method of manufacturing an information display element according to an embodiment of the present invention. 5 is a cross-sectional view schematically illustrating the separation process of the support substrate and the flexible substrate in the manufacturing process of the information display element according to an embodiment of the present invention. The description of Figures 4 and 5 will be described in further detail based on the following embodiments.
下面,通过实施例更加详细地说明根据本发明的制造剥离层的工艺。下述的实施例是为了更加容易地理解本发明而提供的,因此,本发明的内容不受这些实施例的限制。Below, the process of manufacturing the peeling layer according to the present invention is explained in more detail through examples. The following examples are provided to make it easier to understand the present invention, and therefore the content of the present invention is not limited to these examples.
<实施例中使用的原料><Raw materials used in examples>
-bare Glass(Eagle XG,康宁(Corning)公司)-Bare Glass (Eagle XG, Corning Company)
-0.01重量%氧化石墨烯(Graphene Oxide)水溶液-0.01% by weight graphene oxide (Graphene Oxide) aqueous solution
实施例1Example 1
<准备支撑基板的步骤><Steps to prepare the support substrate>
首先,作为支撑基板10,准备宽度和长度分别为100mm、厚度为0.5mm的Eagle XG玻璃(Corning公司)。First, as the support substrate 10, Eagle XG glass (Corning Co., Ltd.) having a width and a length of 100 mm and a thickness of 0.5 mm was prepared.
将所述支撑基板10浸入乙醇溶液中,然后进行约15分钟的超声波清洗。之后,将所述支撑基板10浸入异丙醇溶液中,然后进行约15分钟的超声波清洗。将完成清洗的支撑基板10放入烤箱中,并在约80℃下干燥约5分钟。The support substrate 10 is immersed in an ethanol solution, and then ultrasonic cleaned for about 15 minutes. After that, the support substrate 10 is immersed in an isopropyl alcohol solution, and then ultrasonic cleaning is performed for about 15 minutes. The cleaned support substrate 10 is placed in an oven and dried at about 80° C. for about 5 minutes.
<形成剥离层的步骤><Steps for forming peeling layer>
然后,为了形成氧化石墨烯层,准备0.01重量%的氧化石墨烯(Graphene Oxide,GO)分散液。Then, in order to form a graphene oxide layer, a 0.01% by weight graphene oxide (GO) dispersion liquid was prepared.
更具体地说明,使用哈默斯法(Hummer's method)来制备氧化石墨烯。大小为1um的氧化石墨烯采用超声波粉碎法,大小为50um的氧化石墨烯则采用剪切应力法来控制氧化石墨烯的大小。More specifically, Hummer's method is used to prepare graphene oxide. Graphene oxide with a size of 1um uses ultrasonic pulverization method, and graphene oxide with a size of 50um uses a shear stress method to control the size of graphene oxide.
分别取初始浓度为0.5重量%的1um大小的氧化石墨烯溶液2g和初始浓度为0.5重量%的50um大小的氧化石墨烯溶液2g,然后分别加入三次蒸馏水98g,以制备0.01重量%的1um大小的氧化石墨烯分散液和0.01重量%的50um大小的氧化石墨烯分散液。Take 2g of the 1um-sized graphene oxide solution with an initial concentration of 0.5% by weight and 2g of the 50um-sized graphene oxide solution with an initial concentration of 0.5% by weight, and then add 98g of triple distilled water to prepare 0.01% by weight of the 1um-sized graphene oxide solution. Graphene oxide dispersion and 0.01% by weight of 50um size graphene oxide dispersion.
将0.01重量%的50um大小的氧化石墨烯分散液50g和0.01重量%的1um大小的氧化石墨烯分散液50g混合,以制备100g氧化石墨烯分散液(0.01重量%的50um大小的氧化石墨烯分散液和0.01重量%的1um大小的氧化石墨烯分散液的比例为5:5)。将100g氧化石墨烯分散液中的10ml注入到两个注射器中,将注射器和喷嘴进行组合,然后将其安装在电喷雾装置(NanoNC,型号名称:ESR200R2)上。Mix 0.01 wt % of 50 um size graphene oxide dispersion 50 g and 0.01 wt % of 1 um size graphene oxide dispersion 50 g to prepare 100 g of graphene oxide dispersion (0.01 wt % of 50 um size graphene oxide dispersion The ratio of liquid and 0.01% by weight of 1um size graphene oxide dispersion is 5:5). Inject 10 ml of 100 g of graphene oxide dispersion into two syringes, combine the syringes and nozzles, and then install them on the electrospray device (NanoNC, model name: ESR200R2).
在电喷雾装置中设置以下条件后,将氧化石墨烯涂布到支撑基板上。After setting the following conditions in the electrospray device, coat graphene oxide onto the supporting substrate.
表1Table 1
在本发明中,由于使用混合了1um大小的氧化石墨烯和50um大小的氧化石墨烯的氧化石墨烯分散液来进行涂布,以增加支撑基板上氧化石墨烯层的涂布率,因此能够带来降低剥离层的剥离强度的效果。In the present invention, since a graphene oxide dispersion mixed with 1 um-sized graphene oxide and 50-um sized graphene oxide is used for coating to increase the coating rate of the graphene oxide layer on the supporting substrate, it is possible to bring to reduce the peel strength of the peel layer.
另外,通过使用电喷雾装置来涂布氧化石墨烯,从而具有省去现有的在形成氧化石墨烯层之前进行的阳离子聚合物电解质溶液的涂布工艺的优点。此外,由于不形成阳离子聚合物层,因此具有能够防止由涂布的阳离子聚合物导致的透光度降低的优点。In addition, by using an electrospray device to coat graphene oxide, there is an advantage of eliminating the existing coating process of a cationic polymer electrolyte solution before forming the graphene oxide layer. In addition, since a cationic polymer layer is not formed, there is an advantage that reduction in transmittance caused by the coated cationic polymer can be prevented.
通过以上说明的工艺,完成根据本发明的剥离层20的形成。Through the process described above, the formation of the peeling layer 20 according to the present invention is completed.
<形成柔性基板的步骤><Steps to form flexible substrate>
其次,对制造根据本发明的信息显示元件的工艺进行详细地说明。Next, a process for manufacturing the information display element according to the present invention will be described in detail.
在前面提到的剥离层制造工艺完成后,使用涂布器将聚酰亚胺(PI)清漆涂布于所述氧化石墨烯层上,直至达到8um的厚度。After the aforementioned peeling layer manufacturing process is completed, a polyimide (PI) varnish is coated on the graphene oxide layer using an applicator until it reaches a thickness of 8um.
在100℃下执行10分钟、在200℃下执行30分钟、在350℃下执行30分钟的热处理,以提高酰亚胺化。此时,优选地,在各温度步骤中的升温速度为5℃/min。Heat treatment was performed at 100°C for 10 minutes, at 200°C for 30 minutes, and at 350°C for 30 minutes to improve imidization. At this time, preferably, the temperature rising rate in each temperature step is 5°C/min.
通过涂布聚酰亚胺清漆以及加热工序后,将其冷却3小时,以此完成柔性基板30的形成。After coating the polyimide varnish and heating process, it is cooled for 3 hours to complete the formation of the flexible substrate 30 .
<制造信息显示元件的步骤><Steps for manufacturing information display components>
之后,形成包括TFT层、有机发光层和封装层在内的层40,并进行分离支撑基板10和柔性基板30的步骤。After that, a layer 40 including a TFT layer, an organic light-emitting layer, and an encapsulation layer is formed, and a step of separating the support substrate 10 and the flexible substrate 30 is performed.
在本发明中,通过柔性基板30从剥离层20分离,从而进行分离支撑基板10和柔性基板30的步骤,由此也完成根据本发明的信息显示元件的制造工艺。In the present invention, the step of separating the support substrate 10 and the flexible substrate 30 is performed by detaching the flexible substrate 30 from the release layer 20, thereby also completing the manufacturing process of the information display element according to the present invention.
实施例2和3Examples 2 and 3
除了将所述实施例1的<形成剥离层的步骤>中制备氧化石墨烯分散液时的0.01重量%的50um大小的氧化石墨烯分散液和0.01重量%的1um大小的氧化石墨烯分散液以5:5的比例进行混合的步骤改为分别以7:3和8:2的比例混合以外,采用与实施例1相同的工艺,以此分别实施了实施例2和实施例3。In addition to adding 0.01% by weight of the graphene oxide dispersion of 50 μm in size and 0.01% by weight of the graphene oxide dispersion of 1 μm in size when preparing the graphene oxide dispersion in the <step of forming the peeling layer> in Example 1. Except that the step of mixing at a ratio of 5:5 was changed to mixing at a ratio of 7:3 and 8:2 respectively, the same process as in Example 1 was used, and thus Example 2 and Example 3 were implemented respectively.
实施例4Example 4
除了将所述实施例1的<形成剥离层的步骤>中制备氧化石墨烯分散液时的0.01重量%的50um大小的氧化石墨烯分散液和0.01重量%的1um大小的氧化石墨烯分散液以5:5的比例进行混合的步骤改为只使用0.01重量%的50um大小的氧化石墨烯分散液而不使用0.01重量%的1um大小的氧化石墨烯分散液以外,采用与实施例1相同的工艺,以此实施了实施例4。In addition to adding 0.01% by weight of the graphene oxide dispersion of 50 μm in size and 0.01% by weight of the graphene oxide dispersion of 1 μm in size when preparing the graphene oxide dispersion in the <step of forming the peeling layer> in Example 1. The same process as in Example 1 was used except that the step of mixing at a ratio of 5:5 was changed to use only 0.01% by weight of the 50um sized graphene oxide dispersion instead of 0.01% by weight of the 1um sized graphene oxide dispersion. , thus implementing Example 4.
比较例1和2Comparative Examples 1 and 2
除了将所述实施例1的<形成剥离层的步骤>中制备氧化石墨烯分散液时的0.01重量%的50um大小的氧化石墨烯分散液和0.01重量%的1um大小的氧化石墨烯分散液以5:5的比例进行混合的步骤改为分别以3:7和2:8的比例进行混合以外,采用与实施例1相同的工艺,以此分别实施了比较例1和比较例2。In addition to adding 0.01% by weight of the graphene oxide dispersion of 50 μm in size and 0.01% by weight of the graphene oxide dispersion of 1 μm in size when preparing the graphene oxide dispersion in the <step of forming the peeling layer> in Example 1. Comparative Example 1 and Comparative Example 2 were implemented respectively by using the same process as Example 1 except that the step of mixing at a ratio of 5:5 was changed to mixing at a ratio of 3:7 and 2:8 respectively.
比较例3Comparative example 3
除了将所述实施例1的<形成剥离层的步骤>中制备氧化石墨烯分散液时的0.01重量%的50um大小的氧化石墨烯分散液和0.01重量%的1um大小的氧化石墨烯分散液以5:5的比例进行混合的步骤改为只使用0.01重量%的1um大小的氧化石墨烯分散液而不包含0.01重量%的50um大小的氧化石墨烯分散液以外,采用与实施例1相同的工艺,以此实施了比较例3。In addition to adding 0.01% by weight of the graphene oxide dispersion of 50 μm in size and 0.01% by weight of the graphene oxide dispersion of 1 μm in size when preparing the graphene oxide dispersion in the <step of forming the peeling layer> in Example 1. The same process as in Example 1 was used except that the step of mixing at a ratio of 5:5 was changed to use only 0.01% by weight of the 1um-sized graphene oxide dispersion and not 0.01% by weight of the 50um-sized graphene oxide dispersion. , thus implementing Comparative Example 3.
实验例1Experimental example 1
为了测定在所述实施例中制备的形成于支撑基板10上的柔性基板30即聚酰亚胺基板的剥离强度,通过规格ASTMD3330的试验方法在膜粘接力试验装置中测定了垂直剥离强度。试验仪使用了AMETEK(LS-1)。其结果如表2所示。In order to measure the peel strength of the polyimide substrate, which is the flexible substrate 30 formed on the support substrate 10 prepared in the above example, the vertical peel strength was measured in a film adhesion testing device by the test method of standard ASTM D3330. The tester uses AMETEK (LS-1). The results are shown in Table 2.
实验例2Experimental example 2
为了测定根据所述实施例的透光度,使用宽度和长度分别为100mm、厚度为0.5mm的Eagle XG玻璃(Corning公司)进行校准后,测定了透光度。对每个样品进行三次测定而获得了平均值。此时,使用的透光度测定装置是DENSHOKU(NDH-7000)。其结果如表2所示。In order to measure the light transmittance according to the examples, the light transmittance was measured after calibration using Eagle XG glass (Corning Company) with a width and length of 100 mm and a thickness of 0.5 mm respectively. Three measurements were performed on each sample and the average value was obtained. At this time, the transmittance measuring device used was DENSHOKU (NDH-7000). The results are shown in Table 2.
表2Table 2
如上述表2所示,随着50um大小的氧化石墨烯分散液和1um大小的氧化石墨烯分散液的组成比例不同,剥离强度也不同,可以观察到具有如下效果:50um大小的氧化石墨烯分散液的含量越多,涂布率越增加,从而降低剥离强度。As shown in Table 2 above, as the composition ratio of the 50um size graphene oxide dispersion liquid and the 1um size graphene oxide dispersion liquid is different, the peeling strength is also different, and the following effects can be observed: 50um size graphene oxide dispersion liquid The higher the liquid content, the more the coating rate increases, thereby reducing the peel strength.
这是因为,对于尺寸较小的1um大小的氧化石墨烯分散液来说,由于其具有显著小于水滴大小的尺寸,因此在水蒸发的过程中,只有在水滴边缘的部分涂布有氧化石墨烯分散液,因此板材之间出现较多的重叠,从而导致涂布仅能够在局部进行。与此相对地,对于尺寸较大的50um大小的氧化石墨烯分散液来说,由于其具有相当于水滴大小的尺寸,从而在将分散有氧化石墨烯的水滴涂布于基板上时能够涂布在水滴的整个面积上,因此,相较于尺寸小的氧化石墨烯分散液,尺寸大的氧化石墨烯分散液能够均匀地涂布于整个面积上,由此增加涂布率。This is because, for the smaller 1um-sized graphene oxide dispersion, since it has a size significantly smaller than the size of a water droplet, during the evaporation of water, only the edge of the water droplet is coated with graphene oxide. dispersion, so there is more overlap between the sheets, resulting in coating being only possible locally. In contrast, the larger graphene oxide dispersion of 50 μm has a size equivalent to the size of water droplets, so it can be applied when water droplets in which graphene oxide is dispersed are applied to a substrate. On the entire area of the water droplets, therefore, compared to the small-sized graphene oxide dispersion, the large-sized graphene oxide dispersion can be evenly coated on the entire area, thereby increasing the coating rate.
另外,在透光度上,在所有实施例中均得到了优异的透光度结果。In addition, in terms of light transmittance, excellent light transmittance results were obtained in all examples.
实验例3Experimental example 3
为了测定在所述比较例中制备的形成于支撑基板10上的柔性基板30即聚酰亚胺基板的剥离强度,通过规格ASTMD3330的试验方法在膜粘接力试验装置中测定了垂直剥离强度。试验仪使用了AMETEK(LS1)。其结果如表3所示。In order to measure the peel strength of the polyimide substrate, which is the flexible substrate 30 formed on the support substrate 10 prepared in the comparative example, the vertical peel strength was measured in a film adhesion testing device according to the test method of ASTM D3330. The tester uses AMETEK (LS1). The results are shown in Table 3.
实验例4Experimental example 4
为了测定根据所述比较例的透光度,使用宽度和长度分别为100mm、厚度为0.5mm的Eagle XG玻璃(Corning公司)进行校准后,测定了透光度。对每个样品进行三次测定而获得了平均值。此时,使用的透光度测定装置是DENSHOKU(NDH-7000)。其结果如表3所示。In order to measure the light transmittance according to the comparative example, Eagle XG glass (Corning Co., Ltd.) with a width and a length of 100 mm and a thickness of 0.5 mm was used for calibration and then the light transmittance was measured. Three measurements were performed on each sample and the average value was obtained. At this time, the transmittance measuring device used was DENSHOKU (NDH-7000). The results are shown in Table 3.
表3table 3
如上述表3所示,随着50um大小的氧化石墨烯分散液和1um大小的氧化石墨烯分散液的组成比例不同,剥离强度也不同,可以观察到存在如下问题:1um大小的氧化石墨烯分散液的含量越多,剥离强度越高。As shown in Table 3 above, with the different composition ratios of the 50um-sized graphene oxide dispersion and the 1um-sized graphene oxide dispersion, the peeling strength is also different. It can be observed that the following problems exist: 1um-sized graphene oxide dispersion The higher the liquid content, the higher the peel strength.
以上,就本发明的特定的优选的实施例进行了说明,但本发明不受上述的特定的实施例的限制,在不脱离权利要求书中请求保护的本发明的主旨的情况下,本发明所属技术领域普通技术人员可以进行各种变形的实施方式,并且这种变形的实施方式理应列入权利要求书中所记载的范围内。The specific preferred embodiments of the present invention have been described above. However, the present invention is not limited to the above-mentioned specific embodiments. The present invention can be modified without departing from the gist of the present invention as claimed in the claims. Those skilled in the art can implement various modified embodiments, and such modified embodiments should be included in the scope described in the claims.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150060869A1 (en) * | 2013-08-30 | 2015-03-05 | Jae-Sang Ro | Supporting substrate for manufacturing flexible informaiton display device using temporary bonding/debonding layer, manufacturing method thereof, and flexible information display device |
| WO2016039541A1 (en) * | 2014-09-12 | 2016-03-17 | 한양대학교 산학협력단 | Electronic device and method of manufacturing same |
| WO2017083566A1 (en) * | 2015-11-12 | 2017-05-18 | Cornell University | High performance electrodes |
| US20180369839A1 (en) * | 2015-11-12 | 2018-12-27 | Cornell University | Air controlled electrospray manufacturing and products thereof |
| KR20210065061A (en) * | 2019-11-26 | 2021-06-03 | (주)에버켐텍 | Debonding Layer and Method for Manufacturing the Same, Information Display Element and Method for Manufacturing the Same |
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|---|---|---|---|---|
| KR101714836B1 (en) * | 2014-09-12 | 2017-03-10 | 한양대학교 산학협력단 | electronic device, and method of fabricating the same |
-
2022
- 2022-06-15 KR KR1020220072861A patent/KR102452861B1/en active Active
-
2023
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150060869A1 (en) * | 2013-08-30 | 2015-03-05 | Jae-Sang Ro | Supporting substrate for manufacturing flexible informaiton display device using temporary bonding/debonding layer, manufacturing method thereof, and flexible information display device |
| WO2016039541A1 (en) * | 2014-09-12 | 2016-03-17 | 한양대학교 산학협력단 | Electronic device and method of manufacturing same |
| WO2017083566A1 (en) * | 2015-11-12 | 2017-05-18 | Cornell University | High performance electrodes |
| US20180369839A1 (en) * | 2015-11-12 | 2018-12-27 | Cornell University | Air controlled electrospray manufacturing and products thereof |
| KR20210065061A (en) * | 2019-11-26 | 2021-06-03 | (주)에버켐텍 | Debonding Layer and Method for Manufacturing the Same, Information Display Element and Method for Manufacturing the Same |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025195896A1 (en) | 2024-03-22 | 2025-09-25 | Soitec | Substrate having a graphene oxide layer, intended for transferring a layer by laser separation, and manufacturing method |
| FR3160514A1 (en) * | 2024-03-22 | 2025-09-26 | Soitec | SUPPORT PROVIDED WITH A LAYER OF GRAPHENE OXIDE, INTENDED FOR THE TRANSFER OF A LAYER BY LASER SEPARATION, AND MANUFACTURING METHOD |
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