[go: up one dir, main page]

CN118155682A - Memory, data reading method, chip system and electronic equipment - Google Patents

Memory, data reading method, chip system and electronic equipment Download PDF

Info

Publication number
CN118155682A
CN118155682A CN202211552336.XA CN202211552336A CN118155682A CN 118155682 A CN118155682 A CN 118155682A CN 202211552336 A CN202211552336 A CN 202211552336A CN 118155682 A CN118155682 A CN 118155682A
Authority
CN
China
Prior art keywords
transistor
bit line
voltage
read
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202211552336.XA
Other languages
Chinese (zh)
Inventor
甘萍
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huawei Technologies Co Ltd
Original Assignee
Huawei Technologies Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huawei Technologies Co Ltd filed Critical Huawei Technologies Co Ltd
Priority to CN202211552336.XA priority Critical patent/CN118155682A/en
Priority to PCT/CN2023/121750 priority patent/WO2024119984A1/en
Publication of CN118155682A publication Critical patent/CN118155682A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0483Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells having several storage transistors connected in series
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/08Address circuits; Decoders; Word-line control circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/24Bit-line control circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/30Power supply circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Static Random-Access Memory (AREA)

Abstract

The embodiment of the application provides a memory, a data reading method, a chip system and electronic equipment. The memory cell array includes memory cells. The memory cells are coupled through a read bitline pre-read circuit. The data voltage of the read bit line is charged to a first voltage value by the bit line charging circuit. When the voltage value of the data voltage is at the first voltage value, the bit line discharging circuit discharges the voltage value of the data voltage to a second voltage value, and the second voltage value is larger than the reading value comparison voltage of the reading circuit. Then in the stage of reading the stored data, when the value of the data in the memory cell corresponds to a low level, the data voltage is reduced from the second voltage value to below the read value comparison voltage, and the reading speed of the memory cell is faster due to the smaller difference value between the second voltage value and the read value comparison voltage, so that the reading speed of the memory is improved.

Description

一种存储器、数据读取方法、芯片系统及电子设备A memory, data reading method, chip system and electronic device

技术领域Technical Field

本申请涉及计算机数据存储技术领域,尤其涉及一种存储器、数据读取方法、芯片系统及电子设备。The present application relates to the technical field of computer data storage, and in particular to a memory, a data reading method, a chip system and an electronic device.

背景技术Background technique

存储器中包括存储单元和读取电路,读取电路可用于执行读取数据操作,以获取存储单元中存储的数据的取值。根据存储单元的类型不同,读取数据操作可分为单端读取和双端读取。双端读取为:每个读取电路设置两条读取位线。其中一条读取位线用于获取数据电压,该数据电压的大小用于指示该存储单元中存储数据的取值。另一条位线用于获取参考电压。读取电路通过比较数据电压和参考电压的大小,即可获取存储单元中存储的数据的取值。单端读取为:每个读取电路设置一个读取位线。该读取位线用于输出数据电压。读取电路根据数据电压的电压值的大小,确定存储单元中存储的数据的取值。The memory includes a storage unit and a read circuit. The read circuit can be used to perform a data read operation to obtain the value of the data stored in the storage unit. Depending on the type of storage unit, the data read operation can be divided into single-end read and double-end read. Double-end read is: each read circuit is set with two read bit lines. One of the read bit lines is used to obtain a data voltage, and the magnitude of the data voltage is used to indicate the value of the data stored in the storage unit. The other bit line is used to obtain a reference voltage. The read circuit can obtain the value of the data stored in the storage unit by comparing the magnitude of the data voltage and the reference voltage. Single-end read is: each read circuit is set with a read bit line. The read bit line is used to output the data voltage. The read circuit determines the value of the data stored in the storage unit according to the magnitude of the voltage value of the data voltage.

在实际的应用中,通过数据电压的不同电压值来代表存储单元中存储的数据的取值。在双端读取的实现方式中,对数据电压的不同电压值的识别精度在几十毫伏(mV)。即在双端读取的方式下,数据电压的不同电压值的设置跨度在几十毫伏(mV)到上百毫伏之间,即可实现对数据的不同取值的读取。而在单端读取的实现方式中,对数据电压的不同电压值的识别精度在几伏(V)。即在单端读取的实现方式中,需要在读取位线上施加更大的数据电压。而更大的数据电压会降低存储器的读取速率。In actual applications, different voltage values of the data voltage are used to represent the values of the data stored in the storage unit. In the implementation of dual-end reading, the recognition accuracy of different voltage values of the data voltage is tens of millivolts (mV). That is, in the dual-end reading mode, the setting span of different voltage values of the data voltage is between tens of millivolts (mV) and hundreds of millivolts, which can realize the reading of different values of the data. In the implementation of single-end reading, the recognition accuracy of different voltage values of the data voltage is several volts (V). That is, in the implementation of single-end reading, a larger data voltage needs to be applied to the read bit line. And a larger data voltage will reduce the read rate of the memory.

发明内容Summary of the invention

本申请实施例提供一种存储器、数据读取方法、芯片系统及电子设备,提高了基于单端读取的存储器的读取数据时的读取速率。The embodiments of the present application provide a memory, a data reading method, a chip system and an electronic device, which improve the reading rate of the memory based on single-end reading when reading data.

为达到上述目的,本申请的实施例采用如下技术方案:To achieve the above objectives, the embodiments of the present application adopt the following technical solutions:

第一方面,提供了一种存储器,该存储器包括:存储单元阵列、读取位线、读取电路和位线放电电路;存储单元阵列包括存储单元和;存储单元通过读取位线与读取电路的输入端耦合;位线放电电路包括第一晶体管;第一晶体管的第一极与读取位线耦合;第一晶体管的栅极用于输入第一控制信号;第一控制信号用于控制第一晶体管导通或关断。In a first aspect, a memory is provided, which includes: a memory cell array, a read bit line, a read circuit and a bit line discharge circuit; the memory cell array includes memory cells and; the memory cells are coupled to the input end of the read circuit through the read bit line; the bit line discharge circuit includes a first transistor; the first electrode of the first transistor is coupled to the read bit line; the gate of the first transistor is used to input a first control signal; and the first control signal is used to control the first transistor to be turned on or off.

在本申请实施例中,在对该存储单元进行数据读取时,分为两个阶段:位线预充电阶段和读取存储数据阶段。在位线预充电阶段中,将读取位线的数据电压充电至第一电压值。在读取存储数据阶段,导通存储单元,存储单元中的存储电压的电压值不同,读取位线上的数据电压的电压值也不同。读取电路根据当前读取位线上的数据电压的电压值判断存储单元中的存储电压所指示的数据的取值。而到存储单元中的数据的取值为0时,数据电压需要从第一电压值下降到高低电平的翻转电压以下,读取电路才能判断出存储单元中的数据的取值为0。因第一电压值与高低电平的翻转电压之间的差值较大,需要较长的放电时间,才能使得数据电压下降到高低电平的翻转电压以下。这将导致存储器的读取速率的下降。而在本申请实施例中,将第一晶体管的第二极接地或连接负电压在位线预充电阶段,当数据电压的电压值在第一电压值后,通过控制第一晶体管导通,使得第一晶体管的第一极与第一晶体管的第二极之间导通,进而使得读取位线上的正电荷从第一晶体管的第一极流向第一晶体管的第二极,以实现对读取位线的放电。而通过第一控制信号来控制第一晶体管的导通时长,即可控制放电的时间。通过控制放电的时间长短来使得读取位线上的数据电压的电压值从第一电压值放电到第二电压值。In an embodiment of the present application, when data is read from the storage cell, it is divided into two stages: a bit line precharge stage and a storage data reading stage. In the bit line precharge stage, the data voltage of the read bit line is charged to a first voltage value. In the storage data reading stage, the storage cell is turned on, and the voltage value of the storage voltage in the storage cell is different, and the voltage value of the data voltage on the read bit line is also different. The reading circuit determines the value of the data indicated by the storage voltage in the storage cell according to the voltage value of the data voltage on the current read bit line. When the value of the data in the storage cell is 0, the data voltage needs to drop from the first voltage value to below the high and low level flip voltage, and the reading circuit can determine that the value of the data in the storage cell is 0. Because the difference between the first voltage value and the high and low level flip voltage is large, a longer discharge time is required to make the data voltage drop below the high and low level flip voltage. This will lead to a decrease in the reading rate of the memory. In the embodiment of the present application, the second electrode of the first transistor is grounded or connected to a negative voltage in the bit line precharge stage. When the voltage value of the data voltage is after the first voltage value, the first transistor is controlled to be turned on so that the first electrode of the first transistor and the second electrode of the first transistor are turned on, thereby causing the positive charge on the read bit line to flow from the first electrode of the first transistor to the second electrode of the first transistor to discharge the read bit line. The discharge time can be controlled by controlling the conduction time of the first transistor through the first control signal. The voltage value of the data voltage on the read bit line is discharged from the first voltage value to the second voltage value by controlling the discharge time.

通过位线放电电路将数据电压的电压值放电到第二电压值,该第二电压值大于高低电平的翻转电压。然后在读取存储数据阶段,当存储单元中的数据的取值为0时,数据电压从第二电压值下降到高低电平的翻转电压以下,因第二电压值与高低电平的翻转电压之间的差值较小,使得对该存储单元的读取速度更快,从而提高了该存储器的读取速率。The voltage value of the data voltage is discharged to a second voltage value through the bit line discharge circuit, and the second voltage value is greater than the high-low level flip voltage. Then, in the stage of reading the stored data, when the value of the data in the storage cell is 0, the data voltage drops from the second voltage value to below the high-low level flip voltage. Since the difference between the second voltage value and the high-low level flip voltage is small, the reading speed of the storage cell is faster, thereby improving the reading rate of the memory.

在一种可能的实施方式中,位线放电电路包括第一晶体管、第二晶体管和储能单元;第一晶体管的第一极与读取位线耦合;第一晶体管的第二极与储能单元的第一端耦合;储能单元的第二端与第二晶体管的第一极耦合;第二晶体管的第二极接地或者连接负电压;第一晶体管的栅极用于输入第一控制信号;第二晶体管的栅极用于输入第二控制信号;第一控制信号用于控制第一晶体管导通或关断,第二控制信号用于控制第二晶体管导通或关断。In one possible implementation, the bit line discharge circuit includes a first transistor, a second transistor and an energy storage unit; the first electrode of the first transistor is coupled to the read bit line; the second electrode of the first transistor is coupled to the first end of the energy storage unit; the second end of the energy storage unit is coupled to the first electrode of the second transistor; the second electrode of the second transistor is grounded or connected to a negative voltage; the gate of the first transistor is used to input a first control signal; the gate of the second transistor is used to input a second control signal; the first control signal is used to control the first transistor to be turned on or off, and the second control signal is used to control the second transistor to be turned on or off.

在本申请实施例中,通过储能单元存储读取位线上的正电荷,以将读取位线上的数据电压的电压值从第一电压值放电到第二电压值。此时,通过第一控制信号来导通第一晶体管,使得读取位线和储能单元之间导通,储能单元对读取位线上的正电荷进行存储。当储能单元存储到最大存储量时,不再对读取位线上的正电荷进行存储。通过控制储能单元的最大存储量,即可控制对读取位线的放电量。而在不需要对读取位线进行放电时,将第一晶体管关断。当存储单元内存储的正电荷达到最大存储量时,可以通过第二控制信号来导通第二晶体管,通过导通的第二晶体管对储能单元内存储的正电荷进行释放,从而清空储能单元的电荷存储空间,以便于下一周期内,储能单元可以正常对读取位线上的正电荷进行存储。In an embodiment of the present application, the positive charge on the read bit line is stored by the energy storage unit to discharge the voltage value of the data voltage on the read bit line from the first voltage value to the second voltage value. At this time, the first transistor is turned on by the first control signal, so that the read bit line and the energy storage unit are connected, and the energy storage unit stores the positive charge on the read bit line. When the energy storage unit stores the maximum storage amount, the positive charge on the read bit line is no longer stored. By controlling the maximum storage amount of the energy storage unit, the discharge amount of the read bit line can be controlled. When the read bit line does not need to be discharged, the first transistor is turned off. When the positive charge stored in the storage unit reaches the maximum storage amount, the second control signal can be used to turn on the second transistor, and the positive charge stored in the energy storage unit is released by the turned-on second transistor, thereby clearing the charge storage space of the energy storage unit, so that in the next cycle, the energy storage unit can normally store the positive charge on the read bit line.

在一种可能的实施方式中,储能单元包括金属线耦合电容;第一晶体管的第二极与金属线耦合电容的第一极耦合;金属线耦合电容的第二极与第二晶体管的第一极耦合。In a possible implementation, the energy storage unit includes a metal line coupling capacitor; the second electrode of the first transistor is coupled to the first electrode of the metal line coupling capacitor; the second electrode of the metal line coupling capacitor is coupled to the first electrode of the second transistor.

在本申请实施例中,通过第一晶体管的第二极和第二晶体管之间的金属线构成金属线耦合电容,以金属线的耦合电容的电容值作为单次放电的最大电荷存储量。In the embodiment of the present application, a metal line coupling capacitor is formed by the second electrode of the first transistor and the metal line between the second transistor, and the capacitance value of the metal line coupling capacitor is used as the maximum charge storage capacity of a single discharge.

在一种可能的实施方式中,金属线耦合电容包括第一缠绕金属线和第二缠绕金属线;第一缠绕金属线为金属线耦合电容的第一极,第二缠绕金属线为金属线耦合电容的第二极;第一缠绕金属线的总长度和第二缠绕金属线的总长度分别与读取位线上耦合的存储单元的数量对应。In one possible embodiment, the metal wire coupling capacitor includes a first winding metal wire and a second winding metal wire; the first winding metal wire is the first pole of the metal wire coupling capacitor, and the second winding metal wire is the second pole of the metal wire coupling capacitor; the total length of the first winding metal wire and the total length of the second winding metal wire respectively correspond to the number of storage cells coupled to the read bit line.

在本申请实施例中,两个互相绝缘的金属板或者金属线即可构成电容。在本申请实施例中,通过第一缠绕金属线和第二缠绕金属线分别构成金属线耦合电容的两极,即可构成金属线耦合电容。在具体的应用中,单条读取位线上耦合的存储单元的数量不同,则读取位线上的负载大小也不同。在电路设计阶段,根据读取位线的负载大小,设计相应电容值的金属线耦合电容。而当金属线耦合电容包括第一缠绕金属线和第二缠绕金属线时,可以通过控制每段缠绕金属线的电容值,以及控制第一缠绕金属线的总长度和第二缠绕金属线的总长度,来实现对金属线耦合电容的电容值的调整。例如,将每段金属线耦合电容中的缠绕金属线的数量设置为与单条读取位线的存储单元的数量相对应。In an embodiment of the present application, two mutually insulated metal plates or metal wires can constitute a capacitor. In an embodiment of the present application, a metal wire coupling capacitor can be constituted by forming two poles of a metal wire coupling capacitor through a first winding metal wire and a second winding metal wire respectively. In a specific application, the number of storage units coupled to a single read bit line is different, and the load size on the read bit line is also different. In the circuit design stage, a metal wire coupling capacitor with a corresponding capacitance value is designed according to the load size of the read bit line. When the metal wire coupling capacitor includes a first winding metal wire and a second winding metal wire, the capacitance value of the metal wire coupling capacitor can be adjusted by controlling the capacitance value of each section of the winding metal wire, and controlling the total length of the first winding metal wire and the total length of the second winding metal wire. For example, the number of winding metal wires in each section of the metal wire coupling capacitor is set to correspond to the number of storage units of a single read bit line.

在一种可能的实施方式中,存储器还包括金属层;第一缠绕金属线和第二缠绕金属线设置在金属层中。In a possible implementation, the memory further includes a metal layer; the first winding metal wire and the second winding metal wire are arranged in the metal layer.

在本申请实施例中,在芯片制造工艺中,一般可分为前道工艺(front end ofline,FEOL)和后道工艺(back end of line,BEOL)。在前道工艺中,通过前道掩膜(mask)在晶圆(wafer)上进行刻蚀等加工操作,生成晶体管等构成的基础电路,如上述实施例中的位线充电电路、读取电路、位线放电电路、存储单元阵列等。然后再在后道工艺中,通过后道掩膜(mask)在生成的基础电路上刻蚀出多个金属层,通过不同的金属层上牵引出金属走线,以完成集成电路的内部与内部,和/或,内部与外部之间的电气连接。在设计的后道掩膜(mask)中,可能包括多个金属层,但是只有多个金属层中的部分金属层用于进行上述电气连接,我们可以将用于连接的金属层定义为连接金属层。而一些金属层可能处于空余状态。我们将这些处于空余状态的金属层定义为空余金属层。以一个存储器的设计版图中包括四层金属层为例,其中第一层和第二层的金属层用于实现电气连接,而第三层的空余金属层和第四层的空余金属层则未用于进行电气连接。此时,可以在第三层和/或第四层的空余金属层上,位于各个存储单元的上方的位置对应设置各段缠绕金属线,并将这些缠绕金属线连接后耦合至第一晶体管和第二晶体管作为金属线耦合电容。在本申请实施例中,若在前道工艺BEOL中设置金属线耦合电容,因金属线耦合电容需要具有一定的电容值,则需要大量的金属线进行缠绕,才能得到具备该电容值的耦合电容,这将占用芯片大量的布局面积,导致存储器的实际的芯片面积增加。故通过在位于存储单元上方的空余金属层上设置缠绕金属线,无需额外设计缠绕金属线的布局面积,可以节约存储器的芯片面积,使得存储器的芯片布局更紧凑。第一缠绕金属线和第二缠绕金属线可根据在金属层中的不同设置方式,构成金属-绝缘体-金属(metal-insulator-metal,MIM)电容,或者,构成金属-氧化物-金属(metal-oxide-metal,MOM)电容。In the embodiments of the present application, in the chip manufacturing process, it can generally be divided into the front end of line (FEOL) and the back end of line (BEOL). In the front end process, etching and other processing operations are performed on the wafer through the front end mask to generate basic circuits composed of transistors, such as the bit line charging circuit, reading circuit, bit line discharge circuit, memory cell array, etc. in the above embodiments. Then in the back end process, multiple metal layers are etched on the generated basic circuit through the back end mask, and metal traces are pulled out through different metal layers to complete the electrical connection between the inside and the inside of the integrated circuit, and/or between the inside and the outside. In the designed back end mask, multiple metal layers may be included, but only some of the metal layers in the multiple metal layers are used for the above electrical connection. We can define the metal layers used for connection as connecting metal layers. Some metal layers may be in a vacant state. We define these vacant metal layers as vacant metal layers. Take a memory design layout including four metal layers as an example, wherein the metal layers of the first and second layers are used to realize electrical connection, while the spare metal layers of the third layer and the spare metal layers of the fourth layer are not used for electrical connection. At this time, each section of winding metal wire can be set corresponding to the position above each storage unit on the spare metal layer of the third layer and/or the fourth layer, and these winding metal wires are connected and coupled to the first transistor and the second transistor as metal wire coupling capacitors. In an embodiment of the present application, if a metal wire coupling capacitor is set in the front-end process BEOL, because the metal wire coupling capacitor needs to have a certain capacitance value, a large number of metal wires need to be wound to obtain a coupling capacitor with the capacitance value, which will occupy a large amount of layout area of the chip, resulting in an increase in the actual chip area of the memory. Therefore, by setting a winding metal wire on the spare metal layer above the storage unit, there is no need to additionally design the layout area of the winding metal wire, which can save the chip area of the memory and make the chip layout of the memory more compact. The first winding metal wire and the second winding metal wire may form a metal-insulator-metal (MIM) capacitor or a metal-oxide-metal (MOM) capacitor according to different arrangements in the metal layer.

在一种可能的实施方式中,储能单元还包括至少一个可调电容组;一个可调电容组包括第三晶体管和第一电容;第三晶体管的第一极与金属线耦合电容耦合;第三晶体管的第二极与第一电容耦合。In a possible implementation, the energy storage unit further includes at least one adjustable capacitor group; an adjustable capacitor group includes a third transistor and a first capacitor; the first electrode of the third transistor is coupled to the metal wire coupling capacitor; and the second electrode of the third transistor is coupled to the first capacitor.

在本申请实施例中,在实际的应用中,因生产工艺等的差异,不同读取位线的负载大小等可能存在差异。故通过生产制造的金属线耦合电容进行放电时,金属线耦合电容的电容值大小不一定可以适应将所有的读取位线的数据电压都降到第二电压值,通过上文实施例可知,第二电压值需要满足大于高低电平的翻转电压,才能保证不会对读取存储数据阶段造成干扰。故若金属线耦合电容的电容值设置的较大,根据该较大的电容值设计缠绕金属线等,然后进行生产制造。那么对于存储单元阵列中的多个读取位线而言,通过金属线耦合电容放电后,数据电压的电压值可能较高低电平的翻转电压而言较低,也可能接近于高低电平的翻转电压但仍然大于高低电平的翻转电压,也可能低于高低电平的翻转电压。而放电后的数据电压的电压值大于高低电平的翻转电压的情况下,不同的电压差带来的影响是对接下来的读取存储数据阶段中放电速度的不一致。但在放电后的数据电压的电压值等于或小于高低电平的翻转电压的情况下,在后续读取存储数据阶段所读取到的数据存在不可靠性。基于这种情况,可以将金属线耦合电容的电容值设置得比理想值稍小一些(理想值为满足所有读取位线刚好使得放电后的第二电压值刚好略大于高低电平的翻转电压的理论值),以确保经过金属线耦合电容放电后,所有读取位线的电压值都大于高低电平的翻转电压。而后,根据每条读取位线实际的负载大小,可以控制每条读取位线上的至少一个可调电容组中的第三晶体管导通或关断,以实现对每条读取位线所对应的位线放电电路的放电量的适应性调整。In the embodiment of the present application, in actual application, due to differences in production processes, etc., there may be differences in the load size of different read bit lines. Therefore, when the metal wire coupling capacitor is discharged through the manufactured metal wire coupling capacitor, the capacitance value of the metal wire coupling capacitor may not be able to adapt to the data voltage of all read bit lines to the second voltage value. It can be seen from the above embodiment that the second voltage value needs to meet the flip voltage greater than the high and low levels to ensure that there will be no interference in the reading and storage data stage. Therefore, if the capacitance value of the metal wire coupling capacitor is set larger, the winding metal wire is designed according to the larger capacitance value, and then the production is carried out. Then for multiple read bit lines in the memory cell array, after the metal wire coupling capacitor is discharged, the voltage value of the data voltage may be lower than the flip voltage of the high and low levels, or it may be close to the flip voltage of the high and low levels but still greater than the flip voltage of the high and low levels, or it may be lower than the flip voltage of the high and low levels. When the voltage value of the data voltage after discharge is greater than the flip voltage of the high and low levels, the impact of different voltage differences is the inconsistency of the discharge speed in the next reading and storage data stage. However, when the voltage value of the data voltage after discharge is equal to or less than the high-low level flip voltage, the data read in the subsequent stage of reading the stored data is unreliable. Based on this situation, the capacitance value of the metal line coupling capacitor can be set to be slightly smaller than the ideal value (the ideal value is to satisfy all read bit lines so that the second voltage value after discharge is just slightly greater than the theoretical value of the high-low level flip voltage) to ensure that after the metal line coupling capacitor is discharged, the voltage value of all read bit lines is greater than the high-low level flip voltage. Then, according to the actual load size of each read bit line, the third transistor in at least one adjustable capacitor group on each read bit line can be controlled to be turned on or off to achieve adaptive adjustment of the discharge amount of the bit line discharge circuit corresponding to each read bit line.

可选地,第三晶体管的第一极可以耦合在金属线耦合电容的输入端,也可以耦合在金属线耦合电容的输出端,也可以耦合在金属线耦合电容的中间金属线上。Optionally, the first electrode of the third transistor may be coupled to the input end of the metal line coupling capacitor, may be coupled to the output end of the metal line coupling capacitor, or may be coupled to the middle metal line of the metal line coupling capacitor.

在本申请实施例中,在位线预充电阶段,当需要通过位线放电电路对读取位线进行放电时,导通第一晶体管并关断第二晶体管。对于某一可调电容组,当导通对应的第三晶体管时:如果第三晶体管的第一极耦合在金属线耦合电容的输入端,第三晶体管的第一极耦合在金属线耦合电容的输入端时,金属线耦合电容与第一电容之间并联,可以通过导通后的第一晶体管,同时将读取位线上的正电荷存储到金属线耦合电容和第一电容中。如果第三晶体管的第一极耦合在金属线耦合电容的输出端,第三晶体管的第一极耦合在金属线耦合电容的输出端时,金属线耦合电容和第一电容之间为串联,可以通过导通后的第一晶体管,将读取位线上的正电荷经过金属线耦合电容后传输到第一电容中。如果第三晶体管的第一极耦合在金属线耦合电容的中间金属线上,金属线耦合电容中包括缠绕金属线,第三晶体管的第一极耦合在缠绕金属线之间,在第一晶体管导通且第二晶体管关断时,第一电容与部分缠绕金属线串联并与部分缠绕金属线并联。上述三种方式,均为本申请实施例可能存在的实施方式,对读取位线进行放电使得读取位线上的数据电压的电压值下降到第二电压值。第二电压值的大小由位线放电电路可以存储的电荷量决定。而位线放电电路可以存储的电荷量主要由金属线耦合电容的电容值决定,除此以外,通过导通第三晶体管,可以使得对应的第一可调电容组中第一电容与金属线耦合电容导通,进而实现对位线放电电路可以存储的电荷量的调整。当第三晶体管导通状态或者关断状态固定时,位线放电电路可以存储的电容量是一致的,其大小等于金属线耦合电容的电容值与导通的第三晶体管对应的第一电容的电容值之和。上述三种不同的连接结构下,影响的是位线放电电路存储电荷和释放电荷的速度。在本申请实施例中,根据位线预充电阶段和读取存储数据阶段的周期时长等,可以适应性选择对应的连接结构。In an embodiment of the present application, in the bit line pre-charging stage, when it is necessary to discharge the read bit line through the bit line discharge circuit, the first transistor is turned on and the second transistor is turned off. For a certain adjustable capacitor group, when the corresponding third transistor is turned on: if the first electrode of the third transistor is coupled to the input end of the metal wire coupling capacitor, when the first electrode of the third transistor is coupled to the input end of the metal wire coupling capacitor, the metal wire coupling capacitor is connected in parallel with the first capacitor, and the positive charge on the read bit line can be stored in the metal wire coupling capacitor and the first capacitor at the same time through the turned-on first transistor. If the first electrode of the third transistor is coupled to the output end of the metal wire coupling capacitor, when the first electrode of the third transistor is coupled to the output end of the metal wire coupling capacitor, the metal wire coupling capacitor and the first capacitor are in series, and the positive charge on the read bit line can be transmitted to the first capacitor through the metal wire coupling capacitor through the turned-on first transistor. If the first electrode of the third transistor is coupled to the middle metal wire of the metal wire coupling capacitor, the metal wire coupling capacitor includes a winding metal wire, and the first electrode of the third transistor is coupled between the winding metal wires, when the first transistor is turned on and the second transistor is turned off, the first capacitor is connected in series with part of the winding metal wire and in parallel with part of the winding metal wire. The above three methods are all possible implementation methods of the embodiments of the present application. The read bit line is discharged so that the voltage value of the data voltage on the read bit line drops to a second voltage value. The magnitude of the second voltage value is determined by the amount of charge that can be stored in the bit line discharge circuit. The amount of charge that can be stored in the bit line discharge circuit is mainly determined by the capacitance value of the metal line coupling capacitor. In addition, by turning on the third transistor, the first capacitor in the corresponding first adjustable capacitor group can be turned on with the metal line coupling capacitor, thereby adjusting the amount of charge that can be stored in the bit line discharge circuit. When the on state or off state of the third transistor is fixed, the capacitance that can be stored in the bit line discharge circuit is consistent, and its size is equal to the sum of the capacitance value of the metal line coupling capacitor and the capacitance value of the first capacitor corresponding to the turned-on third transistor. Under the above three different connection structures, what is affected is the speed at which the bit line discharge circuit stores and releases charges. In the embodiment of the present application, the corresponding connection structure can be adaptively selected according to the cycle length of the bit line pre-charging stage and the stage of reading and storing data.

在一种可能的实施方式中,位线放电电路还包括开关控制电路;开关控制电路分别与第一晶体管的栅极、第二晶体管的栅极耦合;开关控制电路用于向第一晶体管的栅极输出第一控制信号,向第二晶体管的栅极输出第二控制信号;第一控制信号用于控制第一晶体管导通或关断,第二控制信号用于控制第二晶体管导通或关断。In one possible implementation, the bit line discharge circuit further includes a switch control circuit; the switch control circuit is coupled to the gate of the first transistor and the gate of the second transistor respectively; the switch control circuit is used to output a first control signal to the gate of the first transistor and to output a second control signal to the gate of the second transistor; the first control signal is used to control the first transistor to be turned on or off, and the second control signal is used to control the second transistor to be turned on or off.

在本申请实施例中,通过开关控制电路分别输出第一控制信号和第二控制信号至第一晶体管的栅极和第二晶体管的栅极,使得第一晶体管和第二晶体管之间交叉导通。在这种交叉导通的情况下,通过第一控制信号导通第一晶体管,并通过第二控制信号关断第二晶体管,读取位线上的正电荷流入位线放电电路中。此时第二晶体管为关断状态,不会将位线放电电路所存储的正电荷进行释放,以保证位线放电电路的存储量可以刚好将数据电压的电压值下降到第二电压值的。而在放电结束后,通过第一控制信号控制第一晶体管关断,并通过第二控制信号控制第二晶体管导通。此时,通过第二晶体管对位线放电电路进行持续放电,以确保位线放电电路中存储的正电荷释放完全,进而确保在后续的放电过程中,位线放电电路有足够的存储量继续存储读取位线上的正电荷。In an embodiment of the present application, a first control signal and a second control signal are respectively output to the gate of the first transistor and the gate of the second transistor by a switch control circuit, so that the first transistor and the second transistor are cross-conducted. In the case of such cross-conduction, the first transistor is turned on by the first control signal, and the second transistor is turned off by the second control signal, and the positive charge on the read bit line flows into the bit line discharge circuit. At this time, the second transistor is in the off state, and the positive charge stored in the bit line discharge circuit will not be released, so as to ensure that the storage capacity of the bit line discharge circuit can just reduce the voltage value of the data voltage to the second voltage value. After the discharge is completed, the first transistor is turned off by the first control signal, and the second transistor is turned on by the second control signal. At this time, the bit line discharge circuit is continuously discharged by the second transistor to ensure that the positive charge stored in the bit line discharge circuit is completely released, thereby ensuring that in the subsequent discharge process, the bit line discharge circuit has enough storage capacity to continue to store the positive charge on the read bit line.

在一种可能的实施方式中,开关控制电路包括与非门和第一反相器;第一反相器的输出端分别与与非门的第一输入端、第二晶体管的栅极耦合,第一反相器的输出端用于输出第二控制信号;与非门的第二输入端用于输入使能信号;与非门的输出端与第一晶体管的栅极耦合;与非门的输出端用于输出第一控制信号。In one possible implementation, the switch control circuit includes a NAND gate and a first inverter; the output end of the first inverter is respectively coupled to the first input end of the NAND gate and the gate of the second transistor, and the output end of the first inverter is used to output the second control signal; the second input end of the NAND gate is used to input an enable signal; the output end of the NAND gate is coupled to the gate of the first transistor; and the output end of the NAND gate is used to output the first control signal.

在本申请实施例中,若第一晶体管和第二晶体管采用同种类型的晶体管(例如同样为P型金属-氧化物-半导体晶体管,或者,同样为N型金属-氧化物-半导体晶体管等),则可以将第一控制信号和第二控制信号设置为相反电平,以实现第一晶体管和第二晶体管之间为交叉耦合。通过包括与非门和第一反相器的开关控制电路,可以实现输出的第一控制信号和第二控制信号恒定为相反电平的控制信号。In the embodiment of the present application, if the first transistor and the second transistor are transistors of the same type (for example, both are P-type metal-oxide-semiconductor transistors, or both are N-type metal-oxide-semiconductor transistors, etc.), the first control signal and the second control signal can be set to opposite levels to achieve cross coupling between the first transistor and the second transistor. By using a switch control circuit including a NAND gate and a first inverter, the output first control signal and the second control signal can be constantly output as control signals of opposite levels.

在一种可能的实施方式中,存储器还包括输出缓冲电路;输出缓冲电路的输入端与读取电路的输出端耦合;输出缓冲电路用于周期性锁存读取电路输出的数据。In a possible implementation, the memory further includes an output buffer circuit; an input end of the output buffer circuit is coupled to an output end of the read circuit; and the output buffer circuit is used to periodically latch data output by the read circuit.

在本申请实施例中,通过输出缓冲电路对读取电路输出的数据进行锁存缓冲。这样可以实现周期性从输出缓冲电路获取读取电路所输出的数据,避免读取电路输出的数据没有时间性和区分性等,造成读取错乱等。In the embodiment of the present application, the data output by the reading circuit is latched and buffered by the output buffer circuit, so that the data output by the reading circuit can be periodically obtained from the output buffer circuit, thereby avoiding the data output by the reading circuit having no timeliness and distinction, causing reading confusion, etc.

在一种可能的实施方式中,输出缓冲电路包括第一充电电路、高电平保持电路和锁存器;锁存器的输入端为输出缓冲电路的输入端,锁存器的输入端与读取电路的输出端耦合;第一充电电路的输出端、高电平保持电路的保持端分别与锁存器的输入端耦合;第一充电电路用于向读取电路的输出端输出为高电平的电压。In one possible implementation, the output buffer circuit includes a first charging circuit, a high-level holding circuit and a latch; the input end of the latch is the input end of the output buffer circuit, and the input end of the latch is coupled to the output end of the reading circuit; the output end of the first charging circuit and the holding end of the high-level holding circuit are respectively coupled to the input end of the latch; the first charging circuit is used to output a high-level voltage to the output end of the reading circuit.

在本申请实施例中,在位线预充电阶段,通过第一充电电路输出充电电压,使得第六晶体管的第一极和锁存器的第一极为高电平。当第六晶体管导通时,将第一充电电路输出的充电电压流入第六晶体管的第二极,以拉低第六晶体管的第一极的电压。当第六晶体管关断时,通过高电平保持电路使得第六晶体管的第一极始终保持高电平,锁存器的输入端输入高电平,对该高电平进行锁存缓冲后,再输出进行输出。In an embodiment of the present application, in the bit line pre-charging stage, a charging voltage is outputted through the first charging circuit, so that the first electrode of the sixth transistor and the first electrode of the latch are at a high level. When the sixth transistor is turned on, the charging voltage outputted by the first charging circuit flows into the second electrode of the sixth transistor to pull down the voltage of the first electrode of the sixth transistor. When the sixth transistor is turned off, the first electrode of the sixth transistor is always kept at a high level through a high level holding circuit, a high level is inputted to the input end of the latch, the high level is latched and buffered, and then outputted.

在一种可能的实施方式中,锁存器包括时钟控制电路和锁存电路;时钟控制电路包括级联的两个第四反相器;锁存电路包括级联的三个第五反相器;第一级的第五反相器的输入端作为锁存器的输入端;第三级的第五反相器的输出端作为锁存器的输出端;第一级的第四反相器的输出端与第一级的第五反相器的第一电压端和第三级的第五反相器的第一电压端耦合;第二级的第四反相器的输出端还与第一级的第五反相器的第二电压端和第三级的第五反相器的第二电压端耦合。In one possible implementation, the latch includes a clock control circuit and a latch circuit; the clock control circuit includes two cascaded fourth inverters; the latch circuit includes three cascaded fifth inverters; the input end of the fifth inverter of the first stage serves as the input end of the latch; the output end of the fifth inverter of the third stage serves as the output end of the latch; the output end of the fourth inverter of the first stage is coupled with the first voltage end of the fifth inverter of the first stage and the first voltage end of the fifth inverter of the third stage; the output end of the fourth inverter of the second stage is also coupled with the second voltage end of the fifth inverter of the first stage and the second voltage end of the fifth inverter of the third stage.

在本申请实施例中,通过时钟控制电路控制第一级的第五反相器和第三级的器不工作,以实现将输入的电平信号锁存在第二级的第五反相器中。并通过时钟控制电路控制第一级的第五反相器和第三级的第五反相器工作,以实现将锁存在第二级的第五反相器中的电平信号输出。时钟控制电路通过两个级联的第四反相器,实现第一级的第四反相器的输出信号与第二级的第四反相器的输出信号之间的电平始终相反。通过输入第一级的第四反相器输入的电平不同,可以控制第一级的第五反相器和第三级的第五反相器工作或者不工作。In an embodiment of the present application, the fifth inverter of the first stage and the third stage are controlled not to work by the clock control circuit to realize the input level signal is locked in the fifth inverter of the second stage. And the fifth inverter of the first stage and the fifth inverter of the third stage are controlled to work by the clock control circuit to realize the output of the level signal locked in the fifth inverter of the second stage. The clock control circuit realizes that the level between the output signal of the fourth inverter of the first stage and the output signal of the fourth inverter of the second stage is always opposite through two cascaded fourth inverters. By inputting different levels of the fourth inverter of the first stage, the fifth inverter of the first stage and the fifth inverter of the third stage can be controlled to work or not work.

在一种可能的实施方式中,输出缓冲电路还包括第二反相器;第二反相器的输入端与锁存器的输出端耦合。In a possible implementation manner, the output buffer circuit further includes a second inverter; an input terminal of the second inverter is coupled to an output terminal of the latch.

在本申请实施例中,通过第二反相器对输出缓冲电路输出的数据进行反相。In the embodiment of the present application, the data output by the output buffer circuit is inverted by the second inverter.

在一种可能的实施方式中,读取电路包括第三反相器和第六晶体管;第三反相器的输入端为读取电路的输入端,且第三反相器的输入端与读取位线耦合;第三反相器的输出端与第六晶体管的栅极耦合;第六晶体管的第二极接地或者连接负电压;第六晶体管的第一极为读取电路的输出端。In one possible implementation, the reading circuit includes a third inverter and a sixth transistor; the input end of the third inverter is the input end of the reading circuit, and the input end of the third inverter is coupled to the reading bit line; the output end of the third inverter is coupled to the gate of the sixth transistor; the second pole of the sixth transistor is grounded or connected to a negative voltage; the first pole of the sixth transistor is the output end of the reading circuit.

在本申请实施例中,以第六晶体管为NMOS晶体管为例。在读取存储阶段,通过第三反相器获取读取位线上的数据电压的电压值,当该电压值高于高低电平的翻转电压时,第三反相器输出低电平至第六晶体管(NMOS晶体管)的栅极,以控制第六晶体管关断。当该电压值低于高低电平的翻转电压时,第三反相器输出高电平至第六晶体管(NMOS晶体管)的栅极,以控制第六晶体管导通。通过第六晶体管的第二极连接接地电压或负电压,使得在第六晶体管导通和关断的情况下,第六晶体管的第一极的电压值不同,以第六晶体管的第一极的电压值来指示存储单元中的数据的取值。例如,第六晶体管的第一极为高电平时,指示存储单元中的数据的取值为1;第六晶体管的第一极为低电平时,指示存储单元中的数据的取值为0。In the embodiment of the present application, the sixth transistor is an NMOS transistor as an example. In the reading and storage stage, the voltage value of the data voltage on the read bit line is obtained by the third inverter. When the voltage value is higher than the high-low level flip voltage, the third inverter outputs a low level to the gate of the sixth transistor (NMOS transistor) to control the sixth transistor to turn off. When the voltage value is lower than the high-low level flip voltage, the third inverter outputs a high level to the gate of the sixth transistor (NMOS transistor) to control the sixth transistor to turn on. The second pole of the sixth transistor is connected to the ground voltage or negative voltage, so that when the sixth transistor is turned on and off, the voltage value of the first pole of the sixth transistor is different, and the voltage value of the first pole of the sixth transistor is used to indicate the value of the data in the storage unit. For example, when the first pole of the sixth transistor is a high level, the value of the data in the storage unit is indicated to be 1; when the first pole of the sixth transistor is a low level, the value of the data in the storage unit is indicated to be 0.

在一种可能的实施方式中,存储器还包括状态保持器,状态保持器还包括至少一个第五晶体管;至少一个第五晶体管与第四晶体管的第一极耦合,且至少一个第五晶体管与第四晶体管串联。In a possible implementation, the memory further includes a state holder, and the state holder further includes at least one fifth transistor; the at least one fifth transistor is coupled to the first electrode of the fourth transistor, and the at least one fifth transistor is connected in series with the fourth transistor.

在本申请实施例中,在读取存储数据阶段,读取位线可能会存在浮空(floating)信号,造成对读取数据的干扰。通过第三反相器的输出端与第四晶体管的栅极耦合,第三反相器的输出端输出低电平时,第四晶体管导通,通过第四晶体管向数据位线输入一定值的保持电流,以防止浮空信号的产生。第四晶体管输入的电流的电流值需要设置的比较小,一般要小于第三反相器可以进行识别读取的程度,以避免对第三反相器造成读取数据的干扰。In an embodiment of the present application, during the stage of reading stored data, a floating signal may exist on the read bit line, causing interference to the read data. The output end of the third inverter is coupled to the gate of the fourth transistor. When the output end of the third inverter outputs a low level, the fourth transistor is turned on, and a certain value of holding current is input to the data bit line through the fourth transistor to prevent the generation of a floating signal. The current value of the current input by the fourth transistor needs to be set relatively small, generally less than the degree that the third inverter can recognize and read, so as to avoid interference with the read data of the third inverter.

在一种可能的实施方式中,状态保持器还包括至少一个第五晶体管;至少一个第五晶体管与第四晶体管的第一极耦合,且至少一个第五晶体管与第四晶体管串联。In a possible implementation, the state holder further includes at least one fifth transistor; the at least one fifth transistor is coupled to the first electrode of the fourth transistor, and the at least one fifth transistor is connected in series with the fourth transistor.

在本申请实施例中,第五晶体管的数量可以为一个或多个,第五晶体管与第四晶体管串联。控制第五晶体管始终导通。通过设置第五晶体管可以增加状态保持器的稳定性等。In the embodiment of the present application, the number of the fifth transistor can be one or more, and the fifth transistor is connected in series with the fourth transistor. The fifth transistor is controlled to be always turned on. The stability of the state holder can be increased by setting the fifth transistor.

在一种可能的实施方式中,存储器还包括位线充电电路;位线充电电路与读取位线耦合。In a possible implementation, the memory further includes a bit line charging circuit; the bit line charging circuit is coupled to the read bit line.

在本申请实施例中,在位线预充电阶段,通过位线充电电路对读取位线进行充电,以使得读取位线上的数据电压的电压值为第一电压值。In the embodiment of the present application, in the bit line precharging stage, the read bit line is charged by the bit line charging circuit so that the voltage value of the data voltage on the read bit line is the first voltage value.

在一些可能的实施方式中,位线充电电路包括第七晶体管。第七晶体管的第一极用于输入充电电压,第七晶体管的第二极与读取位线耦合。第七晶体管的栅极用于输入第一充电控制信号,第一充电控制信号用于控制第七晶体管导通,以向读取位线充电。In some possible implementations, the bit line charging circuit includes a seventh transistor. A first electrode of the seventh transistor is used to input a charging voltage, and a second electrode of the seventh transistor is coupled to the read bit line. A gate of the seventh transistor is used to input a first charging control signal, and the first charging control signal is used to control the seventh transistor to turn on, so as to charge the read bit line.

在本申请实施例中,通过第七晶体管的第一极输入充电电压。当第一控制信号控制第七晶体管导通后,充电电压从第七晶体管的第一极导通至第七晶体管的第二极,并从第七晶体管的第二极输出至读取位线,从而实现对读取位线的充电。In the embodiment of the present application, the charging voltage is input through the first electrode of the seventh transistor. When the first control signal controls the seventh transistor to be turned on, the charging voltage is conducted from the first electrode of the seventh transistor to the second electrode of the seventh transistor, and is output from the second electrode of the seventh transistor to the read bit line, thereby realizing charging of the read bit line.

示例性地,将充电电压的电压值设置为第一电压值,则可实现通过充电电压将读取位线上的数据电压的电压值充电至第一电压值。Exemplarily, by setting the voltage value of the charging voltage to a first voltage value, it is possible to charge the voltage value of the data voltage on the read bit line to the first voltage value through the charging voltage.

在一些可能的实施方式中,存储单元阵列中的所有存储单元均为单端读取型存储单元。In some possible implementations, all memory cells in the memory cell array are single-end read memory cells.

在本申请实施例中,当存储单元阵列中的所有存储单元都为单端读取型存储单元时,为每一个存储单元所耦合的读取字线都对应设置上述实施例所记载的读取电路、位线充电电路和位线放电电路。In an embodiment of the present application, when all memory cells in the memory cell array are single-ended read memory cells, the read word line coupled to each memory cell is correspondingly provided with the read circuit, bit line charging circuit and bit line discharging circuit described in the above embodiment.

在一些可能的实施方式中,存储单元阵列中的一部分存储单元为单端读取型存储单元,另一部分存储单元为双端读取型存储单元。In some possible implementations, a portion of the memory cells in the memory cell array are single-end read memory cells, and another portion of the memory cells are double-end read memory cells.

在本申请实施例中,在与单端读取型存储单元耦合的读取位线上设置上述实施例中所记载的读取电路、位线放电电路和位线充电电路。通过该位线放电电路,对对应的读取位线进行放电,从而提高单端读取型存储单元的读取速率,以提高存储器的读取速率。In the embodiment of the present application, the read circuit, the bit line discharge circuit and the bit line charging circuit described in the above embodiment are arranged on the read bit line coupled to the single-end read type memory cell. The corresponding read bit line is discharged by the bit line discharge circuit, thereby improving the read rate of the single-end read type memory cell, so as to improve the read rate of the memory.

在一些可能的实施方式中,当存储单元为双端读取型存储单元时,该存储单元可以为包括六个晶体管的存储单元。In some possible implementations, when the memory cell is a dual-terminal read memory cell, the memory cell may be a memory cell including six transistors.

示例性地,当存储单元为双端读取型存储单元时,存储单元阵列包括存储单元、字线、位线。每条位线包括第一位线和第二位线。六个晶体管分别为第一导通晶体管、第二导通晶体管、第一存储晶体管、第二存储晶体管、第三存储晶体管、第四存储晶体管。第一存储晶体管和第三存储晶体管为PMOS晶体管。第一导通晶体管、第二导通晶体管、第二存储晶体管、第四存储晶体管为NMOS晶体管。读取电路包括读出放大器。其中:第一导通晶体管的第一极与第一位线耦合。第一导通晶体管的第二极分别与第一存储晶体管的第二极、第二存储晶体管的第一极、第三存储晶体管的栅极和第四存储晶体管的栅极耦合至第一存储点。第一导通晶体管的栅极与字线耦合。第二导通晶体管的第一极与第二位线耦合。第二导通晶体管的第二极分别与第三存储晶体管的第二极、第四存储晶体管的第一极、第一存储晶体管的栅极和第二存储晶体管的栅极耦合至第二存储点。第二导通晶体管的栅极与字线耦合。第一位线和第二位线都与位线充电电路和读出放大器耦合。Exemplarily, when the memory cell is a dual-end read memory cell, the memory cell array includes a memory cell, a word line, and a bit line. Each bit line includes a first bit line and a second bit line. The six transistors are respectively a first conduction transistor, a second conduction transistor, a first storage transistor, a second storage transistor, a third storage transistor, and a fourth storage transistor. The first storage transistor and the third storage transistor are PMOS transistors. The first conduction transistor, the second conduction transistor, the second storage transistor, and the fourth storage transistor are NMOS transistors. The reading circuit includes a readout amplifier. Wherein: the first electrode of the first conduction transistor is coupled to the first bit line. The second electrode of the first conduction transistor is respectively coupled to the second electrode of the first storage transistor, the first electrode of the second storage transistor, the gate of the third storage transistor, and the gate of the fourth storage transistor to the first storage point. The gate of the first conduction transistor is coupled to the word line. The first electrode of the second conduction transistor is coupled to the second bit line. The second electrode of the second conduction transistor is respectively coupled to the second electrode of the third storage transistor, the first electrode of the fourth storage transistor, the gate of the first storage transistor, and the gate of the second storage transistor to the second storage point. The gate of the second conduction transistor is coupled to the word line. The first bit line and the second bit line are both coupled to the bit line charging circuit and the readout amplifier.

在本申请实施例中,第一存储点的存储电压所指示的取值,与第二存储点的存储电压所指示的取值为相反的两个取值。且以第一存储点的存储电压所指示的取值作为该存储单元21中所存储的数据的取值。该包括六个晶体管的双端读取型存储单元,读取数据的具体操作为:In the embodiment of the present application, the value indicated by the storage voltage of the first storage point is opposite to the value indicated by the storage voltage of the second storage point. The value indicated by the storage voltage of the first storage point is used as the value of the data stored in the storage unit 21. The specific operation of reading data in the two-terminal read storage unit including six transistors is as follows:

一、位线预充电阶段:不对字线进行充电,以使得第一导通晶体管(NMOS晶体管)和第二导通晶体管(NMOS晶体管)受低电平而关断。然后通过位线充电电路对第一位线和第二位线进行预充电,使得在第一导通晶体管(NMOS晶体管)和第二导通晶体管(NMOS晶体管)关断的情况下,第一位线上的数据电压和第二位线上的数据电压的电压值为第一电压值。1. Bit line precharge stage: The word line is not charged, so that the first conduction transistor (NMOS transistor) and the second conduction transistor (NMOS transistor) are turned off by the low level. Then the first bit line and the second bit line are precharged by the bit line charging circuit, so that when the first conduction transistor (NMOS transistor) and the second conduction transistor (NMOS transistor) are turned off, the voltage value of the data voltage on the first bit line and the data voltage on the second bit line is the first voltage value.

二、读取存储数据阶段:对字线进行充电,以使得第一导通晶体管(NMOS晶体管)和第二导通晶体管(NMOS晶体管)受高电平而导通。读出放大器通过比较此时第一位线上的数据电压和第二位线上的数据电压的大小,来确定第一存储点的存储电压所指示的取值,进而以确定该存储单元所存储的数据的取值,具体确定方式为:若第一存储点处的存储电压对应的数据的取值为1,第二存储点处的存储电压对应的取值为0,则第一存储点处的存储电压高于第二存储点处的存储电压。因为第二存储点处的存储电压低于第一电压值,所以会拉低第二位线处的数据电压,进而导致第二位线上的数据电压低于第一位线上的数据电压。此时读出放大器比较第一位线上的数据电压和第二位线上的数据电压的电压值大小。第一位线上的数据电压的电压值大于第二位线上的数据电压的电压值。则可以确定第一位线对应的第一存储点处的存储电压对应的数据的取值为1(即存储单元中的数据的取值为1)。若第一存储点处的存储电压对应的数据的取值为0,第二存储点处的存储电压对应的取值为1,则第一存储点处的存储电压低于第二存储点处的存储电压。因为第一存储点处的存储电压低于第一电压值,所以会拉低第一位线处的数据电压,进而导致第一位线上的数据电压低于第二位线上的数据电压。此时读出放大器比较第一位线上的数据电压和第二位线上的数据电压的电压值大小。第一位线上的数据电压的电压值小于第二位线上的数据电压的电压值。则可以确定第一位线对应的第一存储点处的存储电压对应的数据的取值为0(即存储单元中的数据的取值为0)。2. Reading the stored data phase: charging the word line so that the first conduction transistor (NMOS transistor) and the second conduction transistor (NMOS transistor) are turned on by the high level. The readout amplifier determines the value indicated by the storage voltage of the first storage point by comparing the data voltage on the first bit line and the data voltage on the second bit line at this time, and then determines the value of the data stored in the storage unit. The specific determination method is: if the value of the data corresponding to the storage voltage at the first storage point is 1, and the value corresponding to the storage voltage at the second storage point is 0, then the storage voltage at the first storage point is higher than the storage voltage at the second storage point. Because the storage voltage at the second storage point is lower than the first voltage value, it will pull down the data voltage at the second bit line, thereby causing the data voltage on the second bit line to be lower than the data voltage on the first bit line. At this time, the readout amplifier compares the voltage value of the data voltage on the first bit line and the data voltage on the second bit line. The voltage value of the data voltage on the first bit line is greater than the voltage value of the data voltage on the second bit line. Then it can be determined that the value of the data corresponding to the storage voltage at the first storage point corresponding to the first bit line is 1 (that is, the value of the data in the storage unit is 1). If the value of the data corresponding to the storage voltage at the first storage point is 0, and the value of the storage voltage at the second storage point is 1, then the storage voltage at the first storage point is lower than the storage voltage at the second storage point. Because the storage voltage at the first storage point is lower than the first voltage value, the data voltage at the first bit line will be pulled down, which will cause the data voltage on the first bit line to be lower than the data voltage on the second bit line. At this time, the read amplifier compares the voltage values of the data voltage on the first bit line and the data voltage on the second bit line. The voltage value of the data voltage on the first bit line is less than the voltage value of the data voltage on the second bit line. It can be determined that the value of the data corresponding to the storage voltage at the first storage point corresponding to the first bit line is 0 (that is, the value of the data in the storage cell is 0).

在一些可能的实施方式中,当存储单元为单端读取型存储单元时,该存储单元可以为包括八个晶体管的存储单元,或者,为包括一个晶体管的存储单元。In some possible implementations, when the memory cell is a single-end read memory cell, the memory cell may be a memory cell including eight transistors, or a memory cell including one transistor.

示例性地,当存储单元为包括八个晶体管的存储单元时。每条字线包括写入字线(write wordline,WWL)、读取字线(read wordline,RWL)。每条位线包括第一写入位线、第二写入位线、读取位线。八个晶体管分别为第一导通晶体管、第二导通晶体管、第三导通晶体管、第四导通晶体管、第一存储晶体管、第二存储晶体管、第三存储晶体管、第四存储晶体管。第一存储晶体管和第三存储晶体管为PMOS晶体管。第一导通晶体管、第二导通晶体管、第三导通晶体管、第四导通晶体管、第二存储晶体管、第四存储晶体管为NMOS晶体管。读取电路包括第三反相器和第六晶体管。其中:Exemplarily, when the memory cell is a memory cell including eight transistors. Each word line includes a write word line (write wordline, WWL) and a read word line (read wordline, RWL). Each bit line includes a first write bit line, a second write bit line, and a read bit line. The eight transistors are respectively a first conduction transistor, a second conduction transistor, a third conduction transistor, a fourth conduction transistor, a first storage transistor, a second storage transistor, a third storage transistor, and a fourth storage transistor. The first storage transistor and the third storage transistor are PMOS transistors. The first conduction transistor, the second conduction transistor, the third conduction transistor, the fourth conduction transistor, the second storage transistor, and the fourth storage transistor are NMOS transistors. The reading circuit includes a third inverter and a sixth transistor. Wherein:

第一导通晶体管的第一极与第一写入位线耦合。第一导通晶体管的第二极分别与第一存储晶体管的第二极、第二存储晶体管的第一极、第三存储晶体管的栅极和第四存储晶体管的栅极耦合至第一存储点。第一导通晶体管的栅极与写入字线耦合。第二导通晶体管的第一极与第二写入位线耦合。第二导通晶体管的第二极分别与第三存储晶体管的第二极、第四存储晶体管的第一极、第一存储晶体管的栅极和第二存储晶体管的栅极耦合至第二存储点。第二导通晶体管的栅极与写入字线耦合。第三导通晶体管的栅极与第二存储点耦合。第三导通晶体管的第二极接地或者连接负电压。第三导通晶体管的第一极与第四导通晶体管的第二极耦合。第四导通晶体管的栅极与读取字线耦合。第四导通晶体管的第一极与读取位线耦合。位线充电电路、位线放电电路和第三反相器的输入端都与读取位线耦合。第三反相器的输出端与第六晶体管的栅极耦合。The first electrode of the first pass transistor is coupled to the first write bit line. The second electrode of the first pass transistor is respectively coupled to the second electrode of the first storage transistor, the first electrode of the second storage transistor, the gate of the third storage transistor and the gate of the fourth storage transistor to the first storage point. The gate of the first pass transistor is coupled to the write word line. The first electrode of the second pass transistor is coupled to the second write bit line. The second electrode of the second pass transistor is respectively coupled to the second electrode of the third storage transistor, the first electrode of the fourth storage transistor, the gate of the first storage transistor and the gate of the second storage transistor to the second storage point. The gate of the second pass transistor is coupled to the write word line. The gate of the third pass transistor is coupled to the second storage point. The second electrode of the third pass transistor is grounded or connected to a negative voltage. The first electrode of the third pass transistor is coupled to the second electrode of the fourth pass transistor. The gate of the fourth pass transistor is coupled to the read word line. The first electrode of the fourth pass transistor is coupled to the read bit line. The input end of the bit line charging circuit, the bit line discharging circuit and the third inverter are all coupled to the read bit line. The output end of the third inverter is coupled to the gate of the sixth transistor.

在本申请实施例中,采用了单端读取型存储单元,其读取数据的操作为:In the embodiment of the present application, a single-ended read storage unit is used, and the operation of reading data is as follows:

一、位线预充电阶段:不对读取字线进行充电,以使得第四导通晶体管(NMOS晶体管)受低电平而关断。然后通过位线充电电路对读取位线进行预充电,使得在第四导通晶体管关断的情况下,读取位线上的数据电压的电压值为第一电压值。1. Bit line precharge stage: The read word line is not charged, so that the fourth conduction transistor (NMOS transistor) is turned off by the low level. Then the read bit line is precharged by the bit line charging circuit, so that when the fourth conduction transistor is turned off, the voltage value of the data voltage on the read bit line is the first voltage value.

二、位线放电阶段:通过位线放电电路对读取位线进行放电,使得读取位线的数据电压的电压值等于第二电压值。2. Bit line discharge stage: the read bit line is discharged through the bit line discharge circuit, so that the voltage value of the data voltage of the read bit line is equal to the second voltage value.

三、存储单元导通阶段:对读取字线进行充电,以导通第四导通晶体管(NMOS晶体管)。使得存储单元与读取位线之间导通。3. Memory cell conduction stage: charging the read word line to conduct the fourth conduction transistor (NMOS transistor), so that the memory cell is connected to the read bit line.

四、读取存储数据阶段:根据第二存储点处的存储电压的电压值确定是否导通第三导通晶体管。根据第三晶体管导通与否,读取位线上的数据电压呈现出不同的电压值。然后第三反相器根据读取位线上的数据电压的电压值确定存储单元中的数据的取值。具体确定方式为:4. Reading the stored data phase: Determine whether to turn on the third conduction transistor according to the voltage value of the storage voltage at the second storage point. Depending on whether the third transistor is turned on or not, the data voltage on the read bit line presents different voltage values. Then the third inverter determines the value of the data in the storage cell according to the voltage value of the data voltage on the read bit line. The specific determination method is:

当第一存储点处的存储电压对应的数据的取值为0,第二存储点处的存储电压对应的取值为1时。第二存储点处的存储电压为高电平,使得第三导通晶体管(NMOS晶体管)导通。则导通的第三导通晶体管和导通的第四导通晶体管使得第三导通晶体管的第二极与读取位线之间导通,第三导通晶体管的第二极处的接地电压或负电压会拉低读取位线上的数据电压,使得数据电压的电压值低于高低电平的翻转电压。高低电平的翻转电压为第三反相器的工作点,对于电压值高于高低电平的翻转电压的电压,第三反相器判断其为高电平的电压;反之,对于电压值低于高低电平的翻转电压的电压,第三反相器判断其为低电平的电压。读取电路采用第三反相器对读取位线上的数据电压进行读取,此时的数据电压低于高低电平的翻转电压,第三反相器输入的是低电平,则第三反相器向第六晶体管(NMOS晶体管)的栅极输出高电平,第六晶体管导通,第六晶体管的第二极的接地电压或负电压将第六晶体管的第一极的电压拉低为低电平,此时第六晶体管的第一极处的电压值的取值为0,用于指示第一存储点的存储电压对应的数据的取值为0(即存储单元中的数据的取值为0)。When the value of the data corresponding to the storage voltage at the first storage point is 0, and the value corresponding to the storage voltage at the second storage point is 1. The storage voltage at the second storage point is at a high level, so that the third conduction transistor (NMOS transistor) is turned on. Then the turned-on third conduction transistor and the turned-on fourth conduction transistor make the second electrode of the third conduction transistor conductive with the read bit line, and the ground voltage or negative voltage at the second electrode of the third conduction transistor will pull down the data voltage on the read bit line, so that the voltage value of the data voltage is lower than the high-low level flip voltage. The high-low level flip voltage is the working point of the third inverter. For a voltage whose voltage value is higher than the high-low level flip voltage, the third inverter determines it as a high-level voltage; conversely, for a voltage whose voltage value is lower than the high-low level flip voltage, the third inverter determines it as a low-level voltage. The reading circuit uses the third inverter to read the data voltage on the read bit line. At this time, the data voltage is lower than the high-low level flip voltage. The third inverter inputs a low level, and the third inverter outputs a high level to the gate of the sixth transistor (NMOS transistor). The sixth transistor is turned on, and the ground voltage or negative voltage at the second pole of the sixth transistor pulls the voltage at the first pole of the sixth transistor down to a low level. At this time, the voltage value at the first pole of the sixth transistor is 0, which is used to indicate that the data value corresponding to the storage voltage of the first storage point is 0 (that is, the data value in the storage unit is 0).

当第一存储点处的存储电压对应的数据的取值为1,第二存储点处的存储电压对应的取值为0时。第二存储点处的存储电压为低电平,使得第三导通晶体管(NMOS晶体管)关断。因第三导通晶体管关断,使得第三导通晶体管的第二极与读取位线之间也关断,读取位线上的数据电压为第二电压值到第一电压值之间。第三反相器对读取位线上的数据电压进行读取,此时的数据电压的电压值高于高低电平的翻转电压,第三反相器输入的是高电平,则第三反相器向第六晶体管(NMOS晶体管)的栅极输出低电平,第六晶体管关断。第六晶体管的第一极的电压保持为高电平状态,此时第六晶体管的第一极处的电压值的取值为1,用于指示第一存储点的存储电压对应的数据的取值为1(即存储单元中的数据的取值为1)。When the value of the data corresponding to the storage voltage at the first storage point is 1, and the value of the storage voltage at the second storage point is 0. The storage voltage at the second storage point is at a low level, so that the third conduction transistor (NMOS transistor) is turned off. Because the third conduction transistor is turned off, the second electrode of the third conduction transistor is also turned off from the read bit line, and the data voltage on the read bit line is between the second voltage value and the first voltage value. The third inverter reads the data voltage on the read bit line. At this time, the voltage value of the data voltage is higher than the high-low level flip voltage. The third inverter inputs a high level, then the third inverter outputs a low level to the gate of the sixth transistor (NMOS transistor), and the sixth transistor is turned off. The voltage of the first electrode of the sixth transistor remains at a high level state. At this time, the value of the voltage value at the first electrode of the sixth transistor is 1, which is used to indicate that the value of the data corresponding to the storage voltage of the first storage point is 1 (that is, the value of the data in the storage unit is 1).

在本申请实施例中,当存储单元为单端读取型存储单元时,读取电路采用第三反相器对读取位线上的数据电压进行读取。第二存储点处的存储电压的电压值不同,存在导通第三导通晶体管,或者,关断第三导通晶体管,两种情况。两种情况下读取位线上的数据电压的电压值不同,根据数据电压的电压值得到第二存储点处的存储电压所指示的数据的取值。因第一存储点处的存储电压所指示的数据的取值和第二存储点处的存储电压所指示的取值为相反取值。在本申请实施例中,可以将第二存储点处的数据的取值作为存储单元中存储的数据的取值。也可以将第一存储点处的数据的取值作为存储单元中存储的数据的取值,并根据第二存储点处的数据的取值得到第一存储点处的数据的取值。In an embodiment of the present application, when the storage cell is a single-ended read type storage cell, the read circuit uses a third inverter to read the data voltage on the read bit line. The voltage value of the storage voltage at the second storage point is different, and there are two situations: turning on the third conduction transistor, or turning off the third conduction transistor. The voltage value of the data voltage on the read bit line is different in the two situations, and the value of the data indicated by the storage voltage at the second storage point is obtained according to the voltage value of the data voltage. Because the value of the data indicated by the storage voltage at the first storage point and the value indicated by the storage voltage at the second storage point are opposite values. In an embodiment of the present application, the value of the data at the second storage point can be used as the value of the data stored in the storage cell. The value of the data at the first storage point can also be used as the value of the data stored in the storage cell, and the value of the data at the first storage point can be obtained according to the value of the data at the second storage point.

第二方面,本申请实施例还提出了一种数据读取方法,应用于存储器;该存储器包括存储单元阵列、读取位线和位线放电电路;存储单元阵列包括存储单元;存储单元和位线放电电路分别与读取位线耦合;该方法包括:控制位线放电电路将读取位线上的数据电压的电压值从第一电压值放电到第二电压值;第二电压值大于读值比较电压;导通存储单元和读取位线;根据数据电压的电压值得到存储单元中的数据;当数据电压的电压值大于读值比较电压时,判断存储单元中的数据的取值为第一取值;当数据电压的电压值小于读值比较电压时,判断存储单元中的数据的取值为第二取值。In the second aspect, an embodiment of the present application also proposes a data reading method, which is applied to a memory; the memory includes a memory cell array, a read bit line and a bit line discharge circuit; the memory cell array includes a memory cell; the memory cell and the bit line discharge circuit are respectively coupled to the read bit line; the method includes: controlling the bit line discharge circuit to discharge the voltage value of the data voltage on the read bit line from a first voltage value to a second voltage value; the second voltage value is greater than the read value comparison voltage; turning on the memory cell and the read bit line; obtaining the data in the memory cell according to the voltage value of the data voltage; when the voltage value of the data voltage is greater than the read value comparison voltage, judging that the value of the data in the memory cell is the first value; when the voltage value of the data voltage is less than the read value comparison voltage, judging that the value of the data in the memory cell is the second value.

示例性地,第一取值可以为1,第二取值可以为0。Exemplarily, the first value may be 1, and the second value may be 0.

在一种可能的实施方式中,上述控制位线放电电路将读取位线上的数据电压的电压值从第一电压值放电到第二电压值,包括:控制位线放电电路的放电时间,将读取位线上的数据电压的电压值从第一电压值放电到第二电压值。In a possible implementation, the above-mentioned control bit line discharge circuit discharges the voltage value of the data voltage on the read bit line from a first voltage value to a second voltage value, including: controlling the discharge time of the bit line discharge circuit to discharge the voltage value of the data voltage on the read bit line from the first voltage value to the second voltage value.

在一种可能的实施方式中,上述控制位线放电电路将读取位线上的数据电压的电压值从第一电压值放电到第二电压值,包括:控制位线放电电路的放电量,将读取位线上的数据电压的电压值从第一电压值放电到第二电压值。In a possible implementation, the above-mentioned control bit line discharge circuit discharges the voltage value of the data voltage on the read bit line from a first voltage value to a second voltage value, including: controlling the discharge amount of the bit line discharge circuit to discharge the voltage value of the data voltage on the read bit line from the first voltage value to the second voltage value.

在一种可能的实施方式中,上述位线放电电路包括金属线耦合电容;控制位线放电电路的放电量,将读取位线上的数据电压的电压值从第一电压值放电到第二电压值,包括:控制位线放电电路与读取位线导通,将读取位线上的数据电压的电压值从第一电压值放电到第二电压值。In one possible implementation, the bit line discharge circuit includes a metal line coupling capacitor; controlling the discharge amount of the bit line discharge circuit to discharge the voltage value of the data voltage on the read bit line from a first voltage value to a second voltage value, including: controlling the bit line discharge circuit to be turned on with the read bit line to discharge the voltage value of the data voltage on the read bit line from the first voltage value to the second voltage value.

在一种可能的实施方式中,上述位线放电电路还包括至少一个第一电容;该方法还包括:根据第一电压差和/或第一数量控制每个第一电容是否与金属线耦合电容导通,以调整位线放电电路的放电量;第一电压差为第一电压值与读值比较电压之差;第一数量为单条读取位线上所耦合的存储单元的数量。In a possible implementation, the bit line discharge circuit further includes at least one first capacitor; the method further includes: controlling whether each first capacitor is turned on with the metal line coupling capacitor according to a first voltage difference and/or a first quantity to adjust the discharge amount of the bit line discharge circuit; the first voltage difference is the difference between the first voltage value and the read value comparison voltage; the first quantity is the number of storage cells coupled to a single read bit line.

在一种可能的实施方式中,该方法还包括:通过第一控制信号控制位线放电电路是否存储读取位线上的电荷;通过第二控制信号控制位线放电电路是否释放位线放电电路中存储的电荷。In a possible implementation, the method further includes: controlling the bit line discharge circuit to store the charge on the read bit line by a first control signal; and controlling the bit line discharge circuit to release the charge stored in the bit line discharge circuit by a second control signal.

在一种可能的实施方式中,该方法还包括:在根据数据电压的电压值得到存储单元中的数据的取值后,对得到的存储单元中的数据进行锁存后输出。In a possible implementation, the method further includes: after obtaining the value of the data in the storage unit according to the voltage value of the data voltage, latching and outputting the obtained data in the storage unit.

第三方面,本申请实施例还提出了一种芯片系统,该芯片系统包括处理器和如上述第一方面所记载的存储器;处理器用于向存储器中写入数据、读取存储器中存储的数据,或者,刷新存储器中存储的数据。In a third aspect, an embodiment of the present application further proposes a chip system, which includes a processor and a memory as described in the first aspect above; the processor is used to write data to the memory, read data stored in the memory, or refresh data stored in the memory.

第四方面,本申请实施例还提出了一种电子设备,该电子设备包括如上述第三方面所记载的芯片系统和电路板,该芯片系统设置在电路板上。In a fourth aspect, an embodiment of the present application further proposes an electronic device, which includes a chip system and a circuit board as described in the third aspect above, and the chip system is arranged on the circuit board.

关于上述第二方面、第三方面和第四方面的技术效果的描述,可参考上述第一方面的相关描述,在此不再赘述。For the description of the technical effects of the second, third and fourth aspects mentioned above, reference may be made to the relevant description of the first aspect mentioned above, and no further details will be given here.

附图说明BRIEF DESCRIPTION OF THE DRAWINGS

图1为本申请实施例提供的一种电子设备的结构示意图;FIG1 is a schematic diagram of the structure of an electronic device provided in an embodiment of the present application;

图2为本申请实施例提供的一种芯片系统的结构示意图;FIG2 is a schematic diagram of the structure of a chip system provided in an embodiment of the present application;

图3为本申请实施例提供的一种存储器的结构示意图;FIG3 is a schematic diagram of the structure of a memory provided in an embodiment of the present application;

图4为本申请实施例提供的一种双端读取型存储单元的结构示意图;FIG4 is a schematic diagram of the structure of a dual-end read storage unit provided in an embodiment of the present application;

图5为本申请实施例提供的一种单端读取型存储单元的结构示意图;FIG5 is a schematic diagram of the structure of a single-ended read storage unit provided in an embodiment of the present application;

图6为本申请实施例提供的又一种存储器的结构示意图;FIG6 is a schematic diagram of the structure of another memory provided in an embodiment of the present application;

图7为本申请实施例提供的又一种存储器的结构示意图;FIG7 is a schematic diagram of the structure of another memory provided in an embodiment of the present application;

图8为本申请实施例提供的一种位线放电电路的结构示意图;FIG8 is a schematic structural diagram of a bit line discharge circuit provided in an embodiment of the present application;

图9为本申请实施例提供的又一种位线放电电路的结构示意图;FIG9 is a schematic structural diagram of another bit line discharge circuit provided in an embodiment of the present application;

图10为本申请实施例提供的又一种位线放电电路的结构示意图;FIG10 is a schematic diagram of the structure of another bit line discharge circuit provided in an embodiment of the present application;

图11为本申请实施例提供的一种存储器的芯片布局示意图;FIG11 is a schematic diagram of a chip layout of a memory provided in an embodiment of the present application;

图12为本申请实施例提供的又一种位线放电电路的结构示意图;FIG12 is a schematic diagram of the structure of another bit line discharge circuit provided in an embodiment of the present application;

图13为本申请实施例提供的又一种位线放电电路的结构示意图;FIG13 is a schematic diagram of the structure of another bit line discharge circuit provided in an embodiment of the present application;

图14为本申请实施例提供的又一种位线放电电路的结构示意图;FIG14 is a schematic structural diagram of another bit line discharge circuit provided in an embodiment of the present application;

图15为本申请实施例提供的一种位线充电电路的结构示意图;FIG15 is a schematic diagram of the structure of a bit line charging circuit provided in an embodiment of the present application;

图16为本申请实施例提供的一种读取电路及输出缓冲电路的结构示意图;FIG16 is a schematic diagram of the structure of a reading circuit and an output buffer circuit provided in an embodiment of the present application;

图17为本申请实施例提供的又一种输出缓冲电路的结构示意图;FIG17 is a schematic diagram of the structure of another output buffer circuit provided in an embodiment of the present application;

图18为本申请实施例提供的一种锁存器的结构示意图;FIG18 is a schematic diagram of the structure of a latch provided in an embodiment of the present application;

图19为本申请实施例提供的一种状态保持器的结构示意图;FIG19 is a schematic diagram of the structure of a state holder provided in an embodiment of the present application;

图20为本申请实施例提供的一种存储单元阵列的结构示意图;FIG20 is a schematic diagram of the structure of a memory cell array provided in an embodiment of the present application;

图21为本申请实施例提供的又一种存储器的结构示意图;FIG21 is a schematic diagram of the structure of another memory provided in an embodiment of the present application;

图22为本申请实施例提供的又一种存储器的结构示意图;FIG22 is a schematic diagram of the structure of another memory provided in an embodiment of the present application;

图23为本申请实施例提供的一种数据读取方法的流程示意图;FIG23 is a schematic diagram of a flow chart of a data reading method provided in an embodiment of the present application;

图24为本申请实施例提供的一种当存储的数据的取值为0时各个信号的电压或电平状态的时序示意图;FIG24 is a timing diagram of the voltage or level states of various signals when the value of the stored data is 0, provided by an embodiment of the present application;

图25为本申请实施例提供的一种当存储的数据的取值为1时各个信号的电压或电平状态的时序示意图。FIG. 25 is a timing diagram of the voltage or level state of each signal when the value of the stored data is 1, provided in an embodiment of the present application.

具体实施方式Detailed ways

需要说明的是,本申请实施例涉及的术语“第一”、“第二”等仅用于区分同一类型特征的目的,不能理解为用于指示相对重要性、数量、顺序等。It should be noted that the terms "first", "second", etc. involved in the embodiments of the present application are only used to distinguish features of the same type and cannot be understood as indicating relative importance, quantity, order, etc.

本申请实施例涉及的术语“示例性的”或者“例如”等词用于表示作例子、例证或说明。本申请中被描述为“示例性的”或者“例如”的任何实施例或设计方案不应被解释为比其他实施例或设计方案更优选或更具优势。确切而言,使用“示例性的”或者“例如”等词旨在以具体方式呈现相关概念。The terms "exemplary" or "for example" and the like in the embodiments of the present application are used to indicate examples, illustrations or descriptions. Any embodiment or design described as "exemplary" or "for example" in the present application should not be interpreted as being more preferred or more advantageous than other embodiments or designs. Specifically, the use of the terms "exemplary" or "for example" is intended to present the related concepts in a specific way.

本申请实施例涉及的术语“耦合”、“连接”应做广义理解,例如,可以指物理上的直接连接,也可以指通过电子器件实现的间接连接,例如通过电阻、电感、电容或其他电子器件实现的连接。The terms "coupling" and "connection" involved in the embodiments of the present application should be understood in a broad sense. For example, they may refer to a direct physical connection, or an indirect connection achieved through electronic devices, such as a connection achieved through resistors, inductors, capacitors or other electronic devices.

首先,对一些基础概念进行解释说明:First, some basic concepts are explained:

晶体管包括P型金属-氧化物-半导体(P-metal-oxide-semiconductor,PMOS)晶体管、N型金属-氧化物-半导体(N-metal-oxide-semiconductor,NMOS)晶体管等。其中NMOS晶体管的栅极受高电平,使得NMOS晶体管的第一极和第二极之间导通;NMOS晶体管的栅极受低电平,使得NMOS晶体管的第一极和第二极之间关断。反之,PMOS晶体管的栅极受低电平,使得PMOS晶体管的第一极和第二极之间导通;PMOS晶体管的栅极受高电平,使得PMOS晶体管的第一极和第二极之间关断。The transistor includes a P-type metal-oxide-semiconductor (PMOS) transistor, an N-type metal-oxide-semiconductor (NMOS) transistor, etc. The gate of the NMOS transistor is subjected to a high level, so that the first and second electrodes of the NMOS transistor are turned on; the gate of the NMOS transistor is subjected to a low level, so that the first and second electrodes of the NMOS transistor are turned off. Conversely, the gate of the PMOS transistor is subjected to a low level, so that the first and second electrodes of the PMOS transistor are turned on; the gate of the PMOS transistor is subjected to a high level, so that the first and second electrodes of the PMOS transistor are turned off.

本申请实施例提出了一种电子设备,如图1所示,该电子设备1000包括芯片系统100。如图2所示,该芯片系统100包括存储器10和处理器20。其中,处理器20用于向存储器10中写入数据、读取存储器10中存储的数据,或者,刷新存储器10中存储的数据。The embodiment of the present application proposes an electronic device, as shown in FIG1 , the electronic device 1000 includes a chip system 100. As shown in FIG2 , the chip system 100 includes a memory 10 and a processor 20. The processor 20 is used to write data to the memory 10, read data stored in the memory 10, or refresh data stored in the memory 10.

示例性地,该电子设备1000可以为台式电脑、笔记本电脑、平板电脑、手机、智能手表等等需要进行数据存储、数据读出或数据刷新等处理操作的设备。Exemplarily, the electronic device 1000 may be a desktop computer, a laptop computer, a tablet computer, a mobile phone, a smart watch, or the like, which is a device that needs to perform processing operations such as data storage, data reading, or data refreshing.

示例性地,电子设备1000还包括电路板,该芯片系统100设置在电路板上。Exemplarily, the electronic device 1000 further includes a circuit board, and the chip system 100 is arranged on the circuit board.

如图3所示,该存储器10包括外围电路1和存储单元阵列2、多条字线(wordline)WL和多条位线(bitline)BL。该存储单元阵列2包括多个存储单元21。每个存储单元21都分别与对应的字线WL和对应的位线BL耦合。外围电路1包括多个位线充电电路11和多个读取电路12。每个读取电路12通过位线BL与该位线BL上的多个存储单元21耦合。每个位线充电电路11分别耦合一条位线BL。As shown in FIG3 , the memory 10 includes a peripheral circuit 1 and a memory cell array 2, a plurality of word lines WL and a plurality of bit lines BL. The memory cell array 2 includes a plurality of memory cells 21. Each memory cell 21 is coupled to a corresponding word line WL and a corresponding bit line BL. The peripheral circuit 1 includes a plurality of bit line charging circuits 11 and a plurality of reading circuits 12. Each reading circuit 12 is coupled to a plurality of memory cells 21 on the bit line BL through the bit line BL. Each bit line charging circuit 11 is coupled to a bit line BL.

在本申请实施例中,可以将字线WL对应存储单元阵列2的行,将位线BL对应存储单元阵列2的列。则可为每条字线WL设置对应的行地址,为每条位线BL设置对应的列地址。通过行地址和列地址的结合,即可确定对应的存储单元21的地址。对某一存储单元21中的数据进行读取的操作为:In the embodiment of the present application, the word line WL can correspond to the row of the memory cell array 2, and the bit line BL can correspond to the column of the memory cell array 2. Then, a corresponding row address can be set for each word line WL, and a corresponding column address can be set for each bit line BL. By combining the row address and the column address, the address of the corresponding memory cell 21 can be determined. The operation of reading the data in a certain memory cell 21 is:

首先,通过位线充电电路11将对应行地址的位线BL的数据电压预充电到第一电压值。First, the data voltage of the bit line BL corresponding to the row address is precharged to a first voltage value through the bit line charging circuit 11 .

接着,为对应列地址的字线WL进行预充电,以导通需要读取数据的存储单元21。存储单元21内存储有存储电压,存储电压的不同电压值用于指示所存储的数据的不同取值。导通后的存储单元21中的存储电压的电压值会影响所耦合的位线BL上的数据电压的电压值,根据存储电压的电压值的不同,数据电压的电压值也不同。Next, the word line WL corresponding to the column address is precharged to turn on the storage cell 21 from which data needs to be read. A storage voltage is stored in the storage cell 21, and different voltage values of the storage voltage are used to indicate different values of the stored data. The voltage value of the storage voltage in the turned-on storage cell 21 affects the voltage value of the data voltage on the coupled bit line BL, and the voltage value of the data voltage is also different according to the different voltage values of the storage voltage.

最后,读取电路12获取位线BL上的数据电压。根据位线BL上的数据电压确认存储单元中所存储的数据的取值。Finally, the reading circuit 12 obtains the data voltage on the bit line BL and confirms the value of the data stored in the memory cell according to the data voltage on the bit line BL.

当数据电压大于读值比较电压时,确定存储单元21中存储的数据的取值为第一取值;当数据电压小于读值比较电压时,确定存储单元21中存储的数据的取值为第二取值。When the data voltage is greater than the read value comparison voltage, the value of the data stored in the storage unit 21 is determined to be the first value; when the data voltage is less than the read value comparison voltage, the value of the data stored in the storage unit 21 is determined to be the second value.

需要说明的是,在本申请实施例中,以字线WL对应列地址,位线BL对应行地址为例。但在实际应用中,也可以以字线WL对应行地址,位线BL对应列地址。行与列的定义仅仅作为自定义的区分命名,不应看做对存储单元阵列2结构的限定。It should be noted that in the embodiment of the present application, the word line WL corresponds to the column address and the bit line BL corresponds to the row address. However, in actual applications, the word line WL may correspond to the row address and the bit line BL may correspond to the column address. The definition of row and column is only used as a self-defined distinguishing name and should not be regarded as a limitation on the structure of the memory cell array 2.

在一些可能的实施方式中,存储单元21为双端读取型存储单元。In some possible implementations, the storage unit 21 is a dual-terminal read storage unit.

示例性地,如图4所示,当存储单元21为双端读取型存储单元时,存储器10包括字线WL和位线BL。存储单元21可以包括六个晶体管。每条位线BL包括第一位线BL1和第二位线BL2。六个晶体管分别为第一导通晶体管PG、第二导通晶体管PGB、第一存储晶体管PU、第二存储晶体管PD、第三存储晶体管PUB、第四存储晶体管PDB。第一存储晶体管PU和第三存储晶体管PUB为PMOS晶体管。第一导通晶体管PG、第二导通晶体管PGB、第二存储晶体管PD、第四存储晶体管PDB为NMOS晶体管。读取电路12包括读出放大器(sense amplifier,SA)121。其中:Exemplarily, as shown in FIG4 , when the memory cell 21 is a dual-end read memory cell, the memory 10 includes a word line WL and a bit line BL. The memory cell 21 may include six transistors. Each bit line BL includes a first bit line BL1 and a second bit line BL2. The six transistors are a first conduction transistor PG, a second conduction transistor PGB, a first storage transistor PU, a second storage transistor PD, a third storage transistor PUB, and a fourth storage transistor PDB. The first storage transistor PU and the third storage transistor PUB are PMOS transistors. The first conduction transistor PG, the second conduction transistor PGB, the second storage transistor PD, and the fourth storage transistor PDB are NMOS transistors. The read circuit 12 includes a sense amplifier (SA) 121. Wherein:

第一导通晶体管PG的第一极与第一位线BL1耦合。第一导通晶体管PG的第二极分别与第一存储晶体管PU的第二极、第二存储晶体管PD的第一极、第三存储晶体管PUB的栅极和第四存储晶体管PDB的栅极耦合至第一存储点BIT。第一导通晶体管PG的栅极与字线WL耦合。The first electrode of the first pass transistor PG is coupled to the first bit line BL1. The second electrode of the first pass transistor PG is respectively coupled to the second electrode of the first storage transistor PU, the first electrode of the second storage transistor PD, the gate of the third storage transistor PUB and the gate of the fourth storage transistor PDB to the first storage point BIT. The gate of the first pass transistor PG is coupled to the word line WL.

第二导通晶体管PGB的第一极与第二位线BL2耦合。第二导通晶体管PGB的第二极分别与第三存储晶体管PUB的第二极、第四存储晶体管PDB的第一极、第一存储晶体管PU的栅极和第二存储晶体管PD的栅极耦合至第二存储点NBIT。第二导通晶体管PGB的栅极与字线WL耦合。The first electrode of the second pass transistor PGB is coupled to the second bit line BL2. The second electrode of the second pass transistor PGB is respectively coupled to the second electrode of the third storage transistor PUB, the first electrode of the fourth storage transistor PDB, the gate of the first storage transistor PU and the gate of the second storage transistor PD to the second storage point NBIT. The gate of the second pass transistor PGB is coupled to the word line WL.

第一位线BL1和第二位线BL2都与位线充电电路11和读出放大器121耦合。Both the first bit line BL1 and the second bit line BL2 are coupled to the bit line charging circuit 11 and the sense amplifier 121 .

在本申请实施例中,在如图4所示的结构下,第一存储点BIT的存储电压所指示的取值,与第二存储点NBIT的存储电压所指示的取值为相反的两个取值。且以第一存储点BIT的存储电压所指示的取值作为该存储单元21中所存储的数据的取值。对于如图4所示的存储单元21,读取数据的具体操作为:In the embodiment of the present application, under the structure shown in FIG4, the value indicated by the storage voltage of the first storage point BIT and the value indicated by the storage voltage of the second storage point NBIT are two opposite values. And the value indicated by the storage voltage of the first storage point BIT is used as the value of the data stored in the storage unit 21. For the storage unit 21 shown in FIG4, the specific operation of reading data is:

一、位线预充电阶段:不对字线WL进行充电,以使得第一导通晶体管PG(NMOS晶体管)和第二导通晶体管PGB(NMOS晶体管)受低电平而关断。然后通过位线充电电路11对第一位线BL1和第二位线BL2进行预充电,使得在第一导通晶体管PG(NMOS晶体管)和第二导通晶体管PGB(NMOS晶体管)关断的情况下,第一位线BL1上的数据电压和第二位线BL2上的数据电压的电压值为第一电压值。1. Bit line precharge stage: The word line WL is not charged, so that the first conduction transistor PG (NMOS transistor) and the second conduction transistor PGB (NMOS transistor) are turned off by the low level. Then the first bit line BL1 and the second bit line BL2 are precharged by the bit line charging circuit 11, so that when the first conduction transistor PG (NMOS transistor) and the second conduction transistor PGB (NMOS transistor) are turned off, the voltage value of the data voltage on the first bit line BL1 and the data voltage on the second bit line BL2 is the first voltage value.

二、读取存储数据阶段:对字线WL进行充电,以使得第一导通晶体管PG(NMOS晶体管)和第二导通晶体管PGB(NMOS晶体管)受高电平而导通。读出放大器121通过比较此时第一位线BL1上的数据电压和第二位线BL2上的数据电压的大小,来确定第一存储点BIT的存储电压所指示的取值,进而以确定该存储单元21所存储的数据的取值,具体确定方式如下:2. Reading the stored data phase: charging the word line WL so that the first conduction transistor PG (NMOS transistor) and the second conduction transistor PGB (NMOS transistor) are turned on by the high level. The sense amplifier 121 determines the value indicated by the storage voltage of the first storage point BIT by comparing the data voltage on the first bit line BL1 with the data voltage on the second bit line BL2 at this time, and then determines the value of the data stored in the storage unit 21. The specific determination method is as follows:

若第一存储点BIT处的存储电压对应的数据的取值为1,第二存储点NBIT处的存储电压对应的取值为0,则第一存储点BIT处的存储电压高于第二存储点NBIT处的存储电压。因为第二存储点NBIT处的存储电压低于第一电压值,所以会拉低第二位线BL2处的数据电压,进而导致第二位线BL2上的数据电压低于第一位线BL1上的数据电压。此时读出放大器121比较第一位线BL1上的数据电压和第二位线BL2上的数据电压的电压值大小。第一位线BL1上的数据电压的电压值大于第二位线BL2上的数据电压的电压值。则可以确定第一位线BL1对应的第一存储点BIT处的存储电压对应的数据的取值为1(即存储单元21中的数据的取值为1)。If the value of the data corresponding to the storage voltage at the first storage point BIT is 1, and the value of the storage voltage at the second storage point NBIT is 0, then the storage voltage at the first storage point BIT is higher than the storage voltage at the second storage point NBIT. Because the storage voltage at the second storage point NBIT is lower than the first voltage value, the data voltage at the second bit line BL2 will be pulled down, which will cause the data voltage on the second bit line BL2 to be lower than the data voltage on the first bit line BL1. At this time, the read amplifier 121 compares the voltage value of the data voltage on the first bit line BL1 and the data voltage on the second bit line BL2. The voltage value of the data voltage on the first bit line BL1 is greater than the voltage value of the data voltage on the second bit line BL2. It can be determined that the value of the data corresponding to the storage voltage at the first storage point BIT corresponding to the first bit line BL1 is 1 (that is, the value of the data in the storage unit 21 is 1).

若第一存储点BIT处的存储电压对应的数据的取值为0,第二存储点NBIT处的存储电压对应的取值为1,则第一存储点BIT处的存储电压低于第二存储点NBIT处的存储电压。因为第一存储点BIT处的存储电压低于第一电压值,所以会拉低第一位线BL1处的数据电压,进而导致第一位线BL1上的数据电压低于第二位线BL2上的数据电压。此时读出放大器121比较第一位线BL1上的数据电压和第二位线BL2上的数据电压的电压值大小。第一位线BL1上的数据电压的电压值小于第二位线BL2上的数据电压的电压值。则可以确定第一位线BL1对应的第一存储点BIT处的存储电压对应的数据的取值为0(即存储单元21中的数据的取值为0)。If the value of the data corresponding to the storage voltage at the first storage point BIT is 0, and the value of the storage voltage at the second storage point NBIT is 1, then the storage voltage at the first storage point BIT is lower than the storage voltage at the second storage point NBIT. Because the storage voltage at the first storage point BIT is lower than the first voltage value, the data voltage at the first bit line BL1 will be pulled down, which will cause the data voltage on the first bit line BL1 to be lower than the data voltage on the second bit line BL2. At this time, the read amplifier 121 compares the voltage values of the data voltage on the first bit line BL1 and the data voltage on the second bit line BL2. The voltage value of the data voltage on the first bit line BL1 is less than the voltage value of the data voltage on the second bit line BL2. It can be determined that the value of the data corresponding to the storage voltage at the first storage point BIT corresponding to the first bit line BL1 is 0 (that is, the value of the data in the storage unit 21 is 0).

在本申请实施例中,如图4所示的为双端读取型存储单元的存储单元21,通过第一位线BL1和第二位线BL2进行读取数据、写入数据和刷新数据等操作。其中,在读取数据时,具体的读取方式为通过读出放大器121比较第一位线BL1和第二位线BL2上的数据电压的电压值的大小。这种比较的方式中,读出放大器121对于数据电压的电压值的精度要求在几十毫伏(mV)级别。即第一位线BL1上的数据电压的电压值和第二位线BL2上的数据电压的电压值之差达到几十毫伏的大小,读出放大器121即可对两者进行比较。而在实际的应用中,考虑到不同的存储单元21之间可能存在偏差,故也可将读取数据时的电压差设置得更大一些,如在150毫伏(mV)左右。In the embodiment of the present application, as shown in FIG. 4 , a memory cell 21 of a dual-end read memory cell is used to read data, write data, and refresh data through the first bit line BL1 and the second bit line BL2. When reading data, the specific reading method is to compare the voltage value of the data voltage on the first bit line BL1 and the second bit line BL2 through the read amplifier 121. In this comparison method, the accuracy of the voltage value of the data voltage by the read amplifier 121 is required to be at the level of tens of millivolts (mV). That is, the difference between the voltage value of the data voltage on the first bit line BL1 and the voltage value of the data voltage on the second bit line BL2 reaches tens of millivolts, and the read amplifier 121 can compare the two. In actual applications, considering that there may be deviations between different memory cells 21, the voltage difference when reading data can also be set to be larger, such as about 150 millivolts (mV).

在一些可能的实施方式中,存储单元21为单端读取型存储单元。In some possible implementations, the storage unit 21 is a single-end read type storage unit.

示例性地,如图5所示,当存储单元21为单端读取型存储单元时,存储单元21可以包括八个晶体管。每条字线WL包括写入字线(write wordline,WWL)WWL、读取字线(readwordline,RWL)RWL。每条位线BL包括第一写入位线WBL、第二写入位线WNBL、读取位线RBL。八个晶体管分别为第一导通晶体管PG、第二导通晶体管PGB、第三导通晶体管RPD、第四导通晶体管RPG、第一存储晶体管PU、第二存储晶体管PD、第三存储晶体管PUB、第四存储晶体管PDB。第一存储晶体管PU和第三存储晶体管PUB为PMOS晶体管。第一导通晶体管PG、第二导通晶体管PGB、第三导通晶体管RPD、第四导通晶体管RPG、第二存储晶体管PD、第四存储晶体管PDB为NMOS晶体管。读取电路12包括第三反相器INV3和第六晶体管M6。其中:Exemplarily, as shown in FIG5 , when the memory cell 21 is a single-ended read memory cell, the memory cell 21 may include eight transistors. Each word line WL includes a write word line (write wordline, WWL) WWL and a read word line (read wordline, RWL) RWL. Each bit line BL includes a first write bit line WBL, a second write bit line WNBL, and a read bit line RBL. The eight transistors are respectively a first conduction transistor PG, a second conduction transistor PGB, a third conduction transistor RPD, a fourth conduction transistor RPG, a first storage transistor PU, a second storage transistor PD, a third storage transistor PUB, and a fourth storage transistor PDB. The first storage transistor PU and the third storage transistor PUB are PMOS transistors. The first conduction transistor PG, the second conduction transistor PGB, the third conduction transistor RPD, the fourth conduction transistor RPG, the second storage transistor PD, and the fourth storage transistor PDB are NMOS transistors. The read circuit 12 includes a third inverter INV3 and a sixth transistor M6. Wherein:

第一导通晶体管PG的第一极与第一写入位线WBL耦合。第一导通晶体管PG的第二极分别与第一存储晶体管PU的第二极、第二存储晶体管PD的第一极、第三存储晶体管PUB的栅极和第四存储晶体管PDB的栅极耦合至第一存储点BIT。第一导通晶体管PG的栅极与写入字线WWL耦合。The first electrode of the first pass transistor PG is coupled to the first write bit line WBL. The second electrode of the first pass transistor PG is respectively coupled to the second electrode of the first storage transistor PU, the first electrode of the second storage transistor PD, the gate of the third storage transistor PUB and the gate of the fourth storage transistor PDB to the first storage point BIT. The gate of the first pass transistor PG is coupled to the write word line WWL.

第二导通晶体管PGB的第一极与第二写入位线WNBL耦合。第二导通晶体管PGB的第二极分别与第三存储晶体管PUB的第二极、第四存储晶体管PDB的第一极、第一存储晶体管PU的栅极和第二存储晶体管PD的栅极耦合至第二存储点NBIT。第二导通晶体管PGB的栅极与写入字线WWL耦合。The first electrode of the second pass transistor PGB is coupled to the second write bit line WNBL. The second electrode of the second pass transistor PGB is respectively coupled to the second electrode of the third storage transistor PUB, the first electrode of the fourth storage transistor PDB, the gate of the first storage transistor PU and the gate of the second storage transistor PD to the second storage point NBIT. The gate of the second pass transistor PGB is coupled to the write word line WWL.

第三导通晶体管RPD的栅极与第二存储点NBIT耦合。第三导通晶体管RPD的第二极接地或者连接负电压。第三导通晶体管的第一极与第四导通晶体管RPG的第二极耦合。第四导通晶体管RPG的栅极与读取字线RWL耦合。第四导通晶体管RPG的第一极与读取位线RBL耦合。The gate of the third pass transistor RPD is coupled to the second storage point NBIT. The second electrode of the third pass transistor RPD is grounded or connected to a negative voltage. The first electrode of the third pass transistor is coupled to the second electrode of the fourth pass transistor RPG. The gate of the fourth pass transistor RPG is coupled to the read word line RWL. The first electrode of the fourth pass transistor RPG is coupled to the read bit line RBL.

位线充电电路11和第三反相器INV3的输入端都与读取位线RBL耦合。第三反相器INV3的输出端与第六晶体管M6的栅极耦合。The input terminals of the bit line charging circuit 11 and the third inverter INV3 are coupled to the read bit line RBL. The output terminal of the third inverter INV3 is coupled to the gate of the sixth transistor M6.

在本申请实施例中,采用了如图5所示的单端读取型存储单元。相比于如图4所示的双端读取型存储单元,两者在写入数据时原理一致。但在读取数据方面,图5所示的单端读取型存储单元增加了读取字线RWL、读取位线RBL、第三导通晶体管RPD、第四导通晶体管RPG。通过第四导通晶体管RPG对第二存储点NBIT处的存储电压的电压值进行读取,通过读取字线RWL控制第四导通晶体管RPG是否导通,以确定读取位线RBL上的数据电压的电压值。然后通过第三反相器INV3对读取位线RBL上的数据电压的电压值所对应的电平进行反相,得到第一存储点BIT处的存储电压所对应的电平。该第一存储点BIT处的存储电压所对应的电平用于指示存储单元21中的数据的取值。对于如图5所示的存储单元21,读取数据的操作为:In the embodiment of the present application, a single-ended read type memory cell as shown in FIG5 is used. Compared with the dual-ended read type memory cell as shown in FIG4, the two have the same principle when writing data. However, in terms of reading data, the single-ended read type memory cell shown in FIG5 adds a read word line RWL, a read bit line RBL, a third conduction transistor RPD, and a fourth conduction transistor RPG. The voltage value of the storage voltage at the second storage point NBIT is read by the fourth conduction transistor RPG, and whether the fourth conduction transistor RPG is turned on is controlled by the read word line RWL to determine the voltage value of the data voltage on the read bit line RBL. Then, the level corresponding to the voltage value of the data voltage on the read bit line RBL is inverted by the third inverter INV3 to obtain the level corresponding to the storage voltage at the first storage point BIT. The level corresponding to the storage voltage at the first storage point BIT is used to indicate the value of the data in the storage cell 21. For the storage cell 21 shown in FIG5, the operation of reading data is:

一、位线预充电阶段:不对读取字线RWL进行充电,以关断第四导通晶体管RPG(NMOS晶体管)。然后通过位线充电电路11对读取位线RBL进行预充电,使得在第四导通晶体管RPG关断的情况下,读取位线RBL上的数据电压的电压值为第一电压值。1. Bit line precharge stage: The read word line RWL is not charged to turn off the fourth conduction transistor RPG (NMOS transistor). Then the read bit line RBL is precharged by the bit line charging circuit 11, so that when the fourth conduction transistor RPG is turned off, the voltage value of the data voltage on the read bit line RBL is the first voltage value.

二、读取存储数据阶段:对读取字线RWL进行充电,以导通第四导通晶体管RPG(NMOS晶体管)。然后第三反相器INV3根据读取位线RBL上的数据电压的电压值确定存储单元21中的数据的取值。具体确定方式为:2. Reading and storing data stage: charging the read word line RWL to turn on the fourth conduction transistor RPG (NMOS transistor). Then the third inverter INV3 determines the value of the data in the storage unit 21 according to the voltage value of the data voltage on the read bit line RBL. The specific determination method is:

当第一存储点BIT处的存储电压对应的数据的取值为0,第二存储点NBIT处的存储电压对应的取值为1时。第二存储点NBIT处的存储电压为高电平,使得第三导通晶体管RPD(NMOS晶体管)导通。则导通的第三导通晶体管RPD和导通的第四导通晶体管RPG使得第三导通晶体管RPD的第二极与读取位线RBL之间导通,第三导通晶体管RPD的第二极处的接地电压或负电压会拉低读取位线RBL上的数据电压,使得数据电压的电压值低于读值比较电压。读值比较电压为第三反相器INV3的翻转电压值,具体原理为:对于电压值高于读值比较电压的电压,第三反相器INV3判断其为高电平的电压;反之,对于电压值低于读值比较电压的电压,第三反相器INV3判断其为低电平的电压。读取电路12采用第三反相器INV3对读取位线RBL上的数据电压进行读取,此时的数据电压低于读值比较电压,第三反相器INV3输入的是低电平,则第三反相器INV3向第六晶体管M6(NMOS晶体管)的栅极输出高电平,第六晶体管M6导通,第六晶体管M6的第二极的接地电压或负电压将第六晶体管M6的第一极的电压拉低为低电平,此时第六晶体管M6的第一极处的电压值的取值为0,用于指示第一存储点BIT的存储电压对应的数据的取值为0(即存储单元21中的数据的取值为0)。When the value of the data corresponding to the storage voltage at the first storage point BIT is 0, and the value corresponding to the storage voltage at the second storage point NBIT is 1. The storage voltage at the second storage point NBIT is at a high level, so that the third conduction transistor RPD (NMOS transistor) is turned on. Then the turned-on third conduction transistor RPD and the turned-on fourth conduction transistor RPG make the second pole of the third conduction transistor RPD conductive with the read bit line RBL, and the ground voltage or negative voltage at the second pole of the third conduction transistor RPD will pull down the data voltage on the read bit line RBL, so that the voltage value of the data voltage is lower than the read value comparison voltage. The read value comparison voltage is the flip voltage value of the third inverter INV3. The specific principle is: for a voltage whose voltage value is higher than the read value comparison voltage, the third inverter INV3 judges it as a high-level voltage; conversely, for a voltage whose voltage value is lower than the read value comparison voltage, the third inverter INV3 judges it as a low-level voltage. The reading circuit 12 uses the third inverter INV3 to read the data voltage on the read bit line RBL. At this time, the data voltage is lower than the reading value comparison voltage. The third inverter INV3 inputs a low level, and the third inverter INV3 outputs a high level to the gate of the sixth transistor M6 (NMOS transistor). The sixth transistor M6 is turned on, and the ground voltage or negative voltage of the second electrode of the sixth transistor M6 pulls the voltage of the first electrode of the sixth transistor M6 down to a low level. At this time, the voltage value at the first electrode of the sixth transistor M6 is 0, which is used to indicate that the value of the data corresponding to the storage voltage of the first storage point BIT is 0 (that is, the value of the data in the storage unit 21 is 0).

当第一存储点BIT处的存储电压对应的数据的取值为1,第二存储点NBIT处的存储电压对应的取值为0时。第二存储点NBIT处的存储电压为低电平,使得第三导通晶体管RPD(NMOS晶体管)关断。因第三导通晶体管RPD关断,使得第三导通晶体管RPD的第二极与读取位线RBL之间也关断,读取位线RBL上的数据电压保持为第一电压值。第三反相器INV3对读取位线RBL上的数据电压进行读取,此时的数据电压的电压值为第一电压值,高于读值比较电压,第三反相器INV3输入的是高电平,则第三反相器INV3向第六晶体管M6(NMOS晶体管)的栅极输出低电平,第六晶体管M6关断。第六晶体管M6的第一极的电压保持为高电平状态,此时第六晶体管M6的第一极处的电压值的取值为1,用于指示第一存储点BIT的存储电压对应的数据的取值为1(即存储单元21中的数据的取值为1)。When the value of the data corresponding to the storage voltage at the first storage point BIT is 1, and the value of the storage voltage at the second storage point NBIT is 0. The storage voltage at the second storage point NBIT is low, so that the third conduction transistor RPD (NMOS transistor) is turned off. Because the third conduction transistor RPD is turned off, the second electrode of the third conduction transistor RPD is also turned off from the read bit line RBL, and the data voltage on the read bit line RBL remains at the first voltage value. The third inverter INV3 reads the data voltage on the read bit line RBL. At this time, the voltage value of the data voltage is the first voltage value, which is higher than the read value comparison voltage. The third inverter INV3 inputs a high level, and the third inverter INV3 outputs a low level to the gate of the sixth transistor M6 (NMOS transistor), and the sixth transistor M6 is turned off. The voltage of the first electrode of the sixth transistor M6 remains at a high level state. At this time, the value of the voltage value at the first electrode of the sixth transistor M6 is 1, which is used to indicate that the value of the data corresponding to the storage voltage of the first storage point BIT is 1 (that is, the value of the data in the storage unit 21 is 1).

在本申请实施例中,当存储单元21为如图5所示的单端读取型存储单元时,读取电路12采用第三反相器INV3对读取位线RBL上的数据电压进行读取。而第三反相器INV3会有翻转电压值(即读值比较电压),当输入的电压的电压值超过该翻转电压值,第三反相器INV3判断输入的为高电平,并输出低电平。当输入的电压的电压值低于该翻转电压值,第三反相器INV3判断输入的为低电平,并输出高电平。读值比较电压一般为供电电压VDD的一半。而供电电压VDD的取值一般在几伏(V)级别,则读值比较电压的取值也在1伏(V)以上(1V=1000mV)。则可以看出,当采用单端读取型存储单元时,在预充电接地将读取位线RBL的数据电压预充电到了第一电压值(一般电压值大小为供电电压VDD),而在读取存储数据阶段,若第二存储点NBIT处的存储电压为高电平时,第三导通晶体管RPD导通并通过第三导通晶体管RPD的第二极对读取位线RBL进行放电,当读取位线RBL的数据电压放电到低于VDD/2后,第三反相器INV3才能输出所需的高电平。因单端读取型存储单元需要放电的电压跨度(一般1V以上)相对于双端读取型存储单元需要放电的电压跨度(一般在几十mV到一百多mV之间)更大,则需要更多的放电时间,才能完成该放电操作。因该放电时间的过长,导致存储单元21在读取操作时的速率降低,这种问题在所有单端读取型存储单元中都存在。故对于单端读取型存储单元,如何减少读取操作时的放电时间以提高读取速率为一个很大的问题。In the embodiment of the present application, when the storage unit 21 is a single-ended read type storage unit as shown in FIG5 , the read circuit 12 uses the third inverter INV3 to read the data voltage on the read bit line RBL. The third inverter INV3 has a flip voltage value (i.e., a read value comparison voltage). When the voltage value of the input voltage exceeds the flip voltage value, the third inverter INV3 determines that the input is a high level and outputs a low level. When the voltage value of the input voltage is lower than the flip voltage value, the third inverter INV3 determines that the input is a low level and outputs a high level. The read value comparison voltage is generally half of the power supply voltage VDD. The value of the power supply voltage VDD is generally at a level of several volts (V), so the value of the read value comparison voltage is also above 1 volt (V) (1V=1000mV). It can be seen that when a single-end read type memory cell is used, the data voltage of the read bit line RBL is precharged to a first voltage value (generally the voltage value is the power supply voltage VDD) in the precharge grounding, and in the stage of reading the stored data, if the storage voltage at the second storage point NBIT is high, the third conduction transistor RPD is turned on and the read bit line RBL is discharged through the second electrode of the third conduction transistor RPD. When the data voltage of the read bit line RBL is discharged to less than VDD/2, the third inverter INV3 can output the required high level. Since the voltage span required to be discharged by the single-end read type memory cell (generally more than 1V) is larger than the voltage span required to be discharged by the dual-end read type memory cell (generally between tens of mV and more than one hundred mV), more discharge time is required to complete the discharge operation. Due to the excessively long discharge time, the rate of the memory cell 21 during the read operation is reduced. This problem exists in all single-end read type memory cells. Therefore, for the single-end read type memory cell, how to reduce the discharge time during the read operation to improve the read rate is a big problem.

为了提高应用单端读取型存储单元的存储器的读取速率,本申请实施例还提出了一种存储器,如图6所示,该存储器10包括外围电路1、存储单元阵列2、多条读取字线RWL和多条读取位线RBL。该存储单元阵列2包括多个存储单元21。每个存储单元21都分别与对应的读取字线RWL和对应的读取位线RBL耦合。外围电路1包括多个位线充电电路11、多个读取电路12和多个位线放电电路13。每个读取电路12通过读取位线RBL与该读取位线RBL上的多个存储单元21耦合。每个位线充电电路11和位线放电电路13分别耦合一条读取位线RBL。该存储单元21为单端读取型存储单元。In order to improve the read rate of a memory using a single-ended read type memory cell, an embodiment of the present application further proposes a memory, as shown in FIG6 , the memory 10 includes a peripheral circuit 1, a memory cell array 2, a plurality of read word lines RWL, and a plurality of read bit lines RBL. The memory cell array 2 includes a plurality of memory cells 21. Each memory cell 21 is coupled to a corresponding read word line RWL and a corresponding read bit line RBL, respectively. The peripheral circuit 1 includes a plurality of bit line charging circuits 11, a plurality of reading circuits 12, and a plurality of bit line discharging circuits 13. Each reading circuit 12 is coupled to a plurality of memory cells 21 on the read bit line RBL through the read bit line RBL. Each bit line charging circuit 11 and the bit line discharging circuit 13 are coupled to a read bit line RBL, respectively. The memory cell 21 is a single-ended read type memory cell.

示例性地,在位线预充电阶段,通过位线充电电路11对读取位线RBL进行充电,使得读取位线RBL上的数据电压的电压值为第一电压值。而后,通过位线放电电路13对读取位线RBL进行放电,使得读取位线RBL上的数据电压的电压值为第二电压值。其中第二电压值大于读值比较电压。读值比较电压为读取电路12的翻转电压值,当输入读取电路12的电压大于读值比较电压时,读取电路12判断输入的电压为高电平;反之,当输入读取电路12的电压小于读值比较电压时,读取电路12判断输入的电压为低电平。而后,在读取存储数据阶段,对读取字线RWL进行充电,使得存储单元21与读取位线RBL之间导通,若存储单元21中存储的数据为1,则读取位线RBL上的数据电压的电压值不会被拉低到读值比较电压以下,读取电路12判断存储单元21中的数据的取值为1。反之,若存储单元21中存储的数据为1,则读取位线RBL上的数据电压的电压值会被拉低到读值比较电压以下,读取电路12判断存储单元21中的数据的取值为0。Exemplarily, in the bit line pre-charging stage, the read bit line RBL is charged by the bit line charging circuit 11, so that the voltage value of the data voltage on the read bit line RBL is a first voltage value. Then, the read bit line RBL is discharged by the bit line discharge circuit 13, so that the voltage value of the data voltage on the read bit line RBL is a second voltage value. The second voltage value is greater than the read value comparison voltage. The read value comparison voltage is the flip voltage value of the read circuit 12. When the voltage input to the read circuit 12 is greater than the read value comparison voltage, the read circuit 12 determines that the input voltage is a high level; conversely, when the voltage input to the read circuit 12 is less than the read value comparison voltage, the read circuit 12 determines that the input voltage is a low level. Then, in the stage of reading the stored data, the read word line RWL is charged so that the storage cell 21 is connected to the read bit line RBL. If the data stored in the storage cell 21 is 1, the voltage value of the data voltage on the read bit line RBL will not be pulled down below the read value comparison voltage, and the read circuit 12 determines that the value of the data in the storage cell 21 is 1. On the contrary, if the data stored in the memory cell 21 is 1, the voltage value of the data voltage on the read bit line RBL will be pulled down to below the read value comparison voltage, and the read circuit 12 determines that the value of the data in the memory cell 21 is 0.

在本申请实施例中,通过位线放电电路13提前将读取位线RBL上的数据电压的电压值放电到第二电压值,因第二电压值大于读值比较电压,则该放电操作不会对读取存储数据阶段造成影响。而在读取存储数据阶段,若存储单元21中的数据的取值为0时,在将读取位线RBL的数据电压拉低的过程中,只需要将数据电压的电压值从第二电压值拉低到读值比较电压以下,相比于将数据电压的电压值从第一电压值拉低到读值比较电压以下,放电时间更短,进而使得读取数据的读取速率更快。In the embodiment of the present application, the voltage value of the data voltage on the read bit line RBL is discharged to the second voltage value in advance through the bit line discharge circuit 13. Since the second voltage value is greater than the read value comparison voltage, the discharge operation will not affect the stage of reading and storing data. In the stage of reading and storing data, if the value of the data in the storage unit 21 is 0, in the process of lowering the data voltage of the read bit line RBL, it is only necessary to lower the voltage value of the data voltage from the second voltage value to below the read value comparison voltage. Compared with lowering the voltage value of the data voltage from the first voltage value to below the read value comparison voltage, the discharge time is shorter, thereby making the reading rate of the read data faster.

在一些可能的实施方式中,如图6所示的存储器10中,可以通过控制位线放电电路13的放电时间,来实现通过位线放电电路13将数据电压从第一电压值放电到第二电压值。In some possible implementations, in the memory 10 shown in FIG. 6 , the data voltage may be discharged from the first voltage value to the second voltage value through the bit line discharge circuit 13 by controlling the discharge time of the bit line discharge circuit 13 .

示例性地,可以通过调整放电时间的长短,来调整第一电压值与第二电压值之间的电压差,或者,调整第二电压值与读值比较电压之间的电压差。For example, the voltage difference between the first voltage value and the second voltage value, or the voltage difference between the second voltage value and the reading comparison voltage, can be adjusted by adjusting the length of the discharge time.

在一些可能的实施方式中,如图7所示,位线放电电路13包括第一晶体管M1;第一晶体管M1的第一极与读取位线RBL耦合;第一晶体管M1的第二极接地或者连接负电压。In some possible implementations, as shown in FIG. 7 , the bit line discharge circuit 13 includes a first transistor M1 ; a first electrode of the first transistor M1 is coupled to the read bit line RBL; and a second electrode of the first transistor M1 is grounded or connected to a negative voltage.

示例性地,在位线预充电阶段,首先控制第一晶体管M1关断,然后由位线充电电路11对读取位线RBL进行充电,使得读取位线RBL的数据电压的电压值达到第一电压值。然后向第一晶体管M1的栅极输入第一控制信号,通过第一控制信号控制第一晶体管M1导通。因第一晶体管M1的第二极连接接地电压或负电压,所有读取位线RBL上的正电荷会从第一晶体管M1的第一极流向第一晶体管M1的第二极,使得读取位线RBL上的数据电压的电压值降低。通过调整第一控制信号控制第一晶体管M1导通的导通时长,可以调整第二电压值。Exemplarily, in the bit line pre-charging stage, the first transistor M1 is first controlled to be turned off, and then the bit line charging circuit 11 charges the read bit line RBL so that the voltage value of the data voltage of the read bit line RBL reaches the first voltage value. Then, the first control signal is input to the gate of the first transistor M1, and the first transistor M1 is controlled to be turned on by the first control signal. Because the second electrode of the first transistor M1 is connected to the ground voltage or the negative voltage, all positive charges on the read bit line RBL will flow from the first electrode of the first transistor M1 to the second electrode of the first transistor M1, so that the voltage value of the data voltage on the read bit line RBL is reduced. By adjusting the on-time of controlling the first transistor M1 to be turned on by the first control signal, the second voltage value can be adjusted.

在本申请实施例中,采用调整放电时间长短的方式来调整第一电压值与第二电压值时间的电压差,或者,调整第二电压值与读值比较电压之间的电压差。In the embodiment of the present application, the voltage difference between the first voltage value and the second voltage value is adjusted by adjusting the discharge time, or the voltage difference between the second voltage value and the reading comparison voltage is adjusted.

在一些可能的实施方式中,如图6所示的存储器10中,可以通过控制位线放电电路13的放电量,来实现通过位线放电电路13将数据电压从第一电压值放电到第二电压值。In some possible implementations, in the memory 10 shown in FIG. 6 , the data voltage may be discharged from a first voltage value to a second voltage value through the bit line discharge circuit 13 by controlling the discharge amount of the bit line discharge circuit 13 .

在一些可能的实施方式中,如图8所示,位线放电电路13包括第一晶体管M1、第二晶体管M2和储能单元131;第一晶体管M1的第一极与读取位线RBL耦合;第一晶体管M1的第二极与储能单元131的第一端耦合;储能单元131的第二端与第二晶体管M2的第一极耦合;第二晶体管M2的第二极接地或者连接负电压。In some possible implementations, as shown in FIG8 , the bit line discharge circuit 13 includes a first transistor M1, a second transistor M2, and an energy storage unit 131; the first electrode of the first transistor M1 is coupled to the read bit line RBL; the second electrode of the first transistor M1 is coupled to the first end of the energy storage unit 131; the second end of the energy storage unit 131 is coupled to the first electrode of the second transistor M2; and the second electrode of the second transistor M2 is grounded or connected to a negative voltage.

示例性地,在位线预充电阶段,首先控制第一晶体管M1关断,然后由位线充电电路11对读取位线RBL进行充电,使得读取位线RBL的数据电压的电压值达到第一电压值。然后向第一晶体管M1的栅极输入第一控制信号,通过第一控制信号控制第一晶体管M1导通。在第一晶体管M1导通后,储能单元131通过导通的第一晶体管M1,将读取位线RBL上的正电荷存储到储能单元131中。然后在读取存储数据阶段,控制第一晶体管M1关断。通过调整储能单元131的最大电荷存储量,即可控制储能单元131可从读取位线RBL上吸收的电荷量,进而可以实现对第二电压值的调整。Exemplarily, in the bit line pre-charging stage, the first transistor M1 is first controlled to be turned off, and then the bit line charging circuit 11 charges the read bit line RBL so that the voltage value of the data voltage of the read bit line RBL reaches the first voltage value. Then, a first control signal is input to the gate of the first transistor M1, and the first transistor M1 is controlled to be turned on by the first control signal. After the first transistor M1 is turned on, the energy storage unit 131 stores the positive charge on the read bit line RBL in the energy storage unit 131 through the turned-on first transistor M1. Then, in the stage of reading and storing data, the first transistor M1 is controlled to be turned off. By adjusting the maximum charge storage amount of the energy storage unit 131, the amount of charge that the energy storage unit 131 can absorb from the read bit line RBL can be controlled, and then the adjustment of the second voltage value can be achieved.

示例性地,当在读取存储数据阶段时,控制第一晶体管M1关断,此时可以通过第二控制信号控制第二晶体管M2导通,导通后的第二晶体管M2,可以将储能单元131中存储的电荷释放掉,以使得下一次位线预充电阶段,储能单元131仍然可以正常工作,以将数据电压从第一电压值放电到第二电压值。Exemplarily, when in the stage of reading stored data, the first transistor M1 is controlled to be turned off, and the second transistor M2 can be controlled to be turned on by the second control signal. After being turned on, the second transistor M2 can release the charge stored in the energy storage unit 131, so that in the next bit line pre-charging stage, the energy storage unit 131 can still work normally to discharge the data voltage from the first voltage value to the second voltage value.

在本申请实施例中,采用调整放电量的方式来调整第一电压值与第二电压值时间的电压差,或者,调整第二电压值与读值比较电压之间的电压差。In the embodiment of the present application, the voltage difference between the first voltage value and the second voltage value is adjusted by adjusting the discharge amount, or the voltage difference between the second voltage value and the reading comparison voltage is adjusted.

在一些可能的实施方式中,如图9所示,储能单元131包括金属线耦合电容C1;第一晶体管M1的第二极与金属线耦合电容C1的第一极耦合;金属线耦合电容C1的第二极与第二晶体管M1的第一极耦合。In some possible implementations, as shown in FIG. 9 , the energy storage unit 131 includes a metal wire coupling capacitor C1 ; the second electrode of the first transistor M1 is coupled to the first electrode of the metal wire coupling capacitor C1 ; the second electrode of the metal wire coupling capacitor C1 is coupled to the first electrode of the second transistor M1 .

在本申请实施例中,在通过第一晶体管M1的第二极和第二晶体管M2之间的金属线构成金属线耦合电容C1,以金属线耦合电容C1的电容值作为单次放电的最大电荷存储量。在具体的应用中,单条读取位线RBL上耦合的存储单元21的数量不同,则读取位线RBL上的负载大小也不同。在电路设计阶段,根据读取位线RBL的负载大小,设计相应电容值的金属线耦合电容C1。In the embodiment of the present application, a metal line coupling capacitor C1 is formed by a metal line between the second electrode of the first transistor M1 and the second transistor M2, and the capacitance value of the metal line coupling capacitor C1 is used as the maximum charge storage capacity of a single discharge. In a specific application, the number of memory cells 21 coupled to a single read bit line RBL is different, and the load size on the read bit line RBL is also different. In the circuit design stage, the metal line coupling capacitor C1 with a corresponding capacitance value is designed according to the load size of the read bit line RBL.

示例性地,如图10所示,金属线耦合电容C1包括第一缠绕金属线L1和第二缠绕金属线L2;第一缠绕金属线L1的总长度和第二缠绕金属线L2与读取位线RBL上耦合的存储单元21的数量对应。Exemplarily, as shown in FIG. 10 , the metal wire coupling capacitor C1 includes a first winding metal wire L1 and a second winding metal wire L2 ; the total length of the first winding metal wire L1 and the second winding metal wire L2 corresponds to the number of memory cells 21 coupled to the read bit line RBL.

在本申请实施例中,绝缘的两个金属板或者两根金属线可构成电容。在本申请实施例中,在对存储器10进行芯片加工阶段,通过第一缠绕金属线和第二缠绕金属线分别构成金属线耦合电容的两极,即可构成金属线耦合电容。在具体的应用中,单条读取位线上耦合的存储单元21的数量不同,则读取位线RBL上的负载大小也不同。在电路设计阶段,根据读取位线RBL的负载大小,设计相应电容值的金属线耦合电容C1。而当金属线耦合电容C1包括第一缠绕金属线L1和第二缠绕金属线L2时,可以通过控制每段缠绕金属线的电容值,以及控制第一缠绕金属线L1的总长度和第二缠绕金属线L2的总长度,来实现对金属线耦合电容C1的电容值的调整。例如,将金属线耦合电容C1中的缠绕金属线的数量设置为与单条读取位线RBL的存储单元21的数量相对应,则可实现金属线耦合电容C1的电容值与存储单元21的数量以及从读取位线RBL上存储的电荷量的自动匹配。In the embodiment of the present application, two insulated metal plates or two metal wires can constitute a capacitor. In the embodiment of the present application, in the chip processing stage of the memory 10, the first winding metal wire and the second winding metal wire respectively constitute the two poles of the metal wire coupling capacitor, so as to constitute the metal wire coupling capacitor. In a specific application, the number of storage cells 21 coupled to a single read bit line is different, and the load size on the read bit line RBL is also different. In the circuit design stage, according to the load size of the read bit line RBL, the metal wire coupling capacitor C1 of the corresponding capacitance value is designed. When the metal wire coupling capacitor C1 includes the first winding metal wire L1 and the second winding metal wire L2, the capacitance value of the metal wire coupling capacitor C1 can be adjusted by controlling the capacitance value of each winding metal wire, and controlling the total length of the first winding metal wire L1 and the total length of the second winding metal wire L2. For example, the number of winding metal wires in the metal wire coupling capacitor C1 is set to correspond to the number of storage cells 21 of the single read bit line RBL, so that the capacitance value of the metal wire coupling capacitor C1 can be automatically matched with the number of storage cells 21 and the amount of charge stored on the read bit line RBL.

在一些可能的实施方式中,第一缠绕金属线L1和第二缠绕金属线L2设置在存储单元21上的金属层(matel layer)上。In some possible implementations, the first winding metal wire L1 and the second winding metal wire L2 are disposed on a metal layer on the storage unit 21 .

示例性地,存储单元21的上方设置有多层金属层,通过金属层进行存储器10的电气连接。在实际的应用中,可将金属层上的部分布局面积用于进行存储器10的电气连接,将金属层上的另外部分布局面积用于设置第一缠绕金属线L1和第二缠绕金属线L2。Exemplarily, a plurality of metal layers are disposed above the memory cell 21, and the metal layers are used to electrically connect the memory 10. In practical applications, part of the layout area on the metal layer can be used to electrically connect the memory 10, and another part of the layout area on the metal layer can be used to set the first winding metal wire L1 and the second winding metal wire L2.

示例性地,存储单元21的上方设置有用于存储器10进行电气连接的金属层。可在这些进行电气连接的金属层外,再增设金属层。在增设的金属层上设置第一缠绕金属线L1和第二缠绕金属线L2。Exemplarily, a metal layer for electrical connection of the memory 10 is disposed above the memory cell 21. In addition to the metal layer for electrical connection, another metal layer may be provided. A first winding metal wire L1 and a second winding metal wire L2 are provided on the additional metal layer.

示例性地,如图11所示,存储单元21的上方设置有多层金属层ML,第一缠绕金属线L1和第二缠绕金属线L2设置在存储单元21上方金属层ML中的金属层ML_D上。Exemplarily, as shown in FIG. 11 , a plurality of metal layers ML are disposed above the memory cell 21 , and the first winding metal wire L1 and the second winding metal wire L2 are disposed on a metal layer ML_D in the metal layers ML above the memory cell 21 .

在本申请实施例中,如图11所示,在芯片制造工艺中,一般可分为前道工艺(frontend of line,FEOL)和后道工艺(back end of line,BEOL)。在前道工艺中,通过前道掩膜(mask)在晶圆(wafer)上进行刻蚀等加工操作,生成晶体管等构成的基础电路,如上述实施例中的位线充电电路11、读取电路12、位线放电电路13、存储单元阵列2等。然后再在后道工艺中,通过后道掩膜(mask)在生成的基础电路上刻蚀出多个金属层ML,通过不同的金属层ML上牵引出金属走线,以完成集成电路的内部与内部,和/或,内部与外部之间的电气连接。在设计的后道掩膜(mask)中,可能包括多个金属层ML,但是只有多个金属层ML中的部分金属层ML用于进行上述电气连接,我们可以将用于连接的金属层ML定义为连接金属层ML_L。而一些金属层ML可能未用于进行上述电气连接。我们将这些未用于进行上述电气连接的金属层ML定义为空余金属层ML_D。如图11所示,以一个存储器10的设计版图中包括四层金属层ML为例,其中第一层和第二层的金属层ML用于实现电气连接,而第三层的空余金属层ML_D和第四层的空余金属层ML_D则未用于进行电气连接。此时,可以在第三层和/或第四层的空余金属层ML_D上,位于各个存储单元21的上方的位置对应设置第一缠绕金属线L1和第二缠绕金属线L2,并将第一缠绕金属线L1和第二缠绕金属线L2分别耦合至第一晶体管M1和第二晶体管M2作为金属线耦合电容C1。在如图11所示的布局中,若在前道工艺BEOL中设置金属线耦合电容C1,因金属线耦合电容C1需要具有一定的电容值,则需要大量的金属线进行缠绕,才能得到具备该电容值的耦合电容,这将占用芯片大量的布局面积,导致存储器10的实际的芯片面积增加。故如图11所示,通过在位于存储单元21上方的空余金属层ML_D上设置第一缠绕金属线L1和第二缠绕金属线L2,无需额外设计第一缠绕金属线L1和第二缠绕金属线L2的布局面积,可以节约存储器10的芯片面积,使得存储器10的芯片布局更紧凑。图11中的金属层ML的数量仅为一种示例,且每个金属层ML的形状并不一定为板层状。金属层ML的数量也可根据实际的应用和版图设计进行调整。每个金属层ML的形状也可根据实际的电气连接需求进行调整。In the embodiment of the present application, as shown in FIG11 , in the chip manufacturing process, it can generally be divided into the front-end of line (FEOL) and the back-end of line (BEOL). In the front-end process, etching and other processing operations are performed on the wafer through the front-end mask to generate a basic circuit composed of transistors, such as the bit line charging circuit 11, the reading circuit 12, the bit line discharge circuit 13, the memory cell array 2, etc. in the above embodiment. Then in the back-end process, multiple metal layers ML are etched on the generated basic circuit through the back-end mask, and metal traces are pulled out through different metal layers ML to complete the electrical connection between the inside and the inside of the integrated circuit, and/or between the inside and the outside. In the designed back-end mask, multiple metal layers ML may be included, but only some of the metal layers ML in the multiple metal layers ML are used for the above electrical connection. We can define the metal layer ML used for connection as the connection metal layer ML_L. Some metal layers ML may not be used for the above electrical connection. We define these metal layers ML that are not used for the above electrical connection as spare metal layers ML_D. As shown in FIG11, take a memory 10 design layout including four metal layers ML as an example, wherein the first and second metal layers ML are used to realize electrical connection, while the spare metal layer ML_D of the third layer and the spare metal layer ML_D of the fourth layer are not used for electrical connection. At this time, the first winding metal wire L1 and the second winding metal wire L2 can be set correspondingly at the position above each storage unit 21 on the spare metal layer ML_D of the third layer and/or the fourth layer, and the first winding metal wire L1 and the second winding metal wire L2 are respectively coupled to the first transistor M1 and the second transistor M2 as metal wire coupling capacitor C1. In the layout shown in FIG11, if the metal wire coupling capacitor C1 is set in the front-end process BEOL, because the metal wire coupling capacitor C1 needs to have a certain capacitance value, a large number of metal wires need to be wound to obtain a coupling capacitor with the capacitance value, which will occupy a large amount of layout area of the chip, resulting in an increase in the actual chip area of the memory 10. Therefore, as shown in FIG11 , by setting the first winding metal wire L1 and the second winding metal wire L2 on the vacant metal layer ML_D located above the memory cell 21, there is no need to additionally design the layout area of the first winding metal wire L1 and the second winding metal wire L2, which can save the chip area of the memory 10 and make the chip layout of the memory 10 more compact. The number of metal layers ML in FIG11 is only an example, and the shape of each metal layer ML is not necessarily a plate layer. The number of metal layers ML can also be adjusted according to the actual application and layout design. The shape of each metal layer ML can also be adjusted according to the actual electrical connection requirements.

在一些可能的实施方式中,如图12和图13所示,储能单元131还包括至少一个可调电容组1311;一个可调电容组1311包括第三晶体管M3和第一电容C2。第三晶体管M3的第二极与第一电容C2耦合。如图12所示,第三晶体管M3的第一极与金属线耦合电容C1的第一极耦合。或者,如图13所示,第三晶体管M3的第一极与金属线耦合电容C1的第二极耦合。In some possible implementations, as shown in FIG. 12 and FIG. 13 , the energy storage unit 131 further includes at least one adjustable capacitor group 1311; an adjustable capacitor group 1311 includes a third transistor M3 and a first capacitor C2. The second electrode of the third transistor M3 is coupled to the first capacitor C2. As shown in FIG. 12 , the first electrode of the third transistor M3 is coupled to the first electrode of the metal wire coupling capacitor C1. Alternatively, as shown in FIG. 13 , the first electrode of the third transistor M3 is coupled to the second electrode of the metal wire coupling capacitor C1.

在本申请实施例中,在位线预充电阶段,当需要通过位线放电电路13对读取位线RBL进行放电时,导通第一晶体管M1并关断第二晶体管M2。对于某一可调电容组1311,当导通对应的第三晶体管M3时:如图12所示,第三晶体管M3的第一极耦合在金属线耦合电容C1的第一极时,金属线耦合电容C1与第一电容C2之间并联,可以通过导通后的第一晶体管M1,同时将读取位线RBL上的正电荷存储到金属线耦合电容C1和第一电容C2中。如图13所示,第三晶体管M3的第一极耦合在金属线耦合电容C1的第二极时,金属线耦合电容C1和第一电容C2之间为串联,可以通过导通后的第一晶体管M1,将读取位线RBL上的正电荷经过金属线耦合电容C1后传输到第一电容C2中。上述两种方式,均为本申请实施例可能存在的实施方式,对读取位线RBL进行放电使得读取位线RBL上的数据电压的电压值下降到第二电压值。第二电压值的大小由位线放电电路13可以存储的电荷量决定。而位线放电电路13可以存储的电荷量主要由金属线耦合电容C1的电容值决定,除此以外,通过导通第三晶体管M3,可以使得对应的第一可调电容组1311中第一电容C2与金属线耦合电容C1导通,进而实现对位线放电电路13可以存储的电荷量的调整。在实际的应用中,因生产工艺等的差异,不同读取位线RBL的负载大小等可能存在差异。故通过生产制造的金属线耦合电容C1进行放电时,金属线耦合电容C1的电容值大小不一定可以适应将所有的读取位线RBL的数据电压都降到第二电压值,通过上文实施例可知,第二电压值需要满足大于读值比较电压,才能保证不会对读取存储数据阶段造成干扰。故若金属线耦合电容C1的电容值设置的较大,根据该较大的电容值设计第一缠绕金属线L1和第二缠绕金属线L2等,然后进行生产制造。那么对于存储器10中的多个读取位线RBL而言,通过金属线耦合电容C1放电后,数据电压的电压值可能较读值比较电压而言较低,也可能接近于读值比较电压但仍然大于读值比较电压,也可能低于读值比较电压。而放电后的数据电压的电压值大于读值比较电压的情况下,不同的电压差带来的影响是对接下来的读取存储数据阶段中放电速度的不一致。但在放电后的数据电压的电压值等于或小于读值比较电压的情况下,在后续读取存储数据阶段所读取到的数据存在不可靠性。基于这种情况,可以将金属线耦合电容C1的电容值设置得比理想值稍小一些(理想值为满足所有读取位线RBL刚好使得放电后的第二电压值刚好略大于读值比较电压的理论值),以确保经过金属线耦合电容C1放电后,所有读取位线RBL的电压值都大于读值比较电压。而后,根据每条读取位线RBL实际的负载大小,可以控制每条读取位线RBL上的至少一个可调电容组1311中的第三晶体管M3导通或关断,以实现对每条读取位线RBL所对应的位线放电电路13的放电量的适应性调整。如图12、图13所示的连接情况下,当第三晶体管M3导通状态或者关断状态固定时,位线放电电路13可以存储的电容量是一致的,其大小等于金属线耦合电容C1的电容值与导通的第三晶体管M3对应的第一电容C2的电容值之和。而图12、图13的连接结构下,影响的是位线放电电路13存储电荷和释放电荷的速度。在本申请实施例中,根据位线预充电阶段和读取存储数据阶段的周期时长等,可以适应性选择对应的连接结构。In the embodiment of the present application, in the bit line pre-charging stage, when it is necessary to discharge the read bit line RBL through the bit line discharge circuit 13, the first transistor M1 is turned on and the second transistor M2 is turned off. For a certain adjustable capacitor group 1311, when the corresponding third transistor M3 is turned on: as shown in FIG12, when the first electrode of the third transistor M3 is coupled to the first electrode of the metal line coupling capacitor C1, the metal line coupling capacitor C1 and the first capacitor C2 are connected in parallel, and the positive charge on the read bit line RBL can be stored in the metal line coupling capacitor C1 and the first capacitor C2 at the same time through the turned-on first transistor M1. As shown in FIG13, when the first electrode of the third transistor M3 is coupled to the second electrode of the metal line coupling capacitor C1, the metal line coupling capacitor C1 and the first capacitor C2 are connected in series, and the positive charge on the read bit line RBL can be transmitted to the first capacitor C2 after passing through the metal line coupling capacitor C1 through the turned-on first transistor M1. The above two methods are both possible implementation methods of the present application embodiment, and the read bit line RBL is discharged so that the voltage value of the data voltage on the read bit line RBL drops to the second voltage value. The magnitude of the second voltage value is determined by the amount of charge that the bit line discharge circuit 13 can store. The amount of charge that the bit line discharge circuit 13 can store is mainly determined by the capacitance value of the metal line coupling capacitor C1. In addition, by turning on the third transistor M3, the first capacitor C2 in the corresponding first adjustable capacitor group 1311 can be turned on with the metal line coupling capacitor C1, thereby adjusting the amount of charge that the bit line discharge circuit 13 can store. In actual applications, due to differences in production processes, etc., there may be differences in the load size of different read bit lines RBL. Therefore, when discharging through the manufactured metal line coupling capacitor C1, the capacitance value of the metal line coupling capacitor C1 may not be able to adapt to reducing the data voltage of all read bit lines RBL to the second voltage value. It can be seen from the above embodiment that the second voltage value needs to be greater than the read value comparison voltage to ensure that there will be no interference in the reading and storage data stage. Therefore, if the capacitance value of the metal line coupling capacitor C1 is set to be larger, the first winding metal wire L1 and the second winding metal wire L2 are designed according to the larger capacitance value, and then production is carried out. Then for the multiple read bit lines RBL in the memory 10, after being discharged through the metal line coupling capacitor C1, the voltage value of the data voltage may be lower than the read value comparison voltage, may be close to the read value comparison voltage but still greater than the read value comparison voltage, or may be lower than the read value comparison voltage. When the voltage value of the data voltage after discharge is greater than the read value comparison voltage, the impact of different voltage differences is the inconsistency of the discharge speed in the subsequent reading and storing data stage. However, when the voltage value of the data voltage after discharge is equal to or less than the read value comparison voltage, the data read in the subsequent reading and storing data stage is unreliable. Based on this situation, the capacitance value of the metal line coupling capacitor C1 can be set to be slightly smaller than the ideal value (the ideal value is to satisfy all the read bit lines RBL so that the second voltage value after discharge is just slightly greater than the theoretical value of the read value comparison voltage) to ensure that after the metal line coupling capacitor C1 is discharged, the voltage value of all the read bit lines RBL is greater than the read value comparison voltage. Then, according to the actual load size of each read bit line RBL, the third transistor M3 in at least one adjustable capacitor group 1311 on each read bit line RBL can be controlled to be turned on or off, so as to achieve adaptive adjustment of the discharge amount of the bit line discharge circuit 13 corresponding to each read bit line RBL. In the connection conditions shown in Figures 12 and 13, when the on state or off state of the third transistor M3 is fixed, the capacitance that can be stored in the bit line discharge circuit 13 is consistent, and its size is equal to the sum of the capacitance value of the metal line coupling capacitor C1 and the capacitance value of the first capacitor C2 corresponding to the turned-on third transistor M3. Under the connection structure of Figures 12 and 13, what is affected is the speed of storing and releasing charges in the bit line discharge circuit 13. In the embodiment of the present application, the corresponding connection structure can be adaptively selected according to the cycle length of the bit line pre-charging stage and the stage of reading and storing data.

在一些可能的实施方式中,如图14所示,位线放电电路13还包括开关控制电路132;开关控制电路132分别与第一晶体管M1的栅极、第二晶体管M2的栅极耦合;开关控制电路132用于向第一晶体管M1的栅极输出第一控制信号,向第二晶体管M2的栅极输出第二控制信号;第一控制信号与第二控制信号为相反电平的信号。In some possible implementations, as shown in FIG. 14 , the bit line discharge circuit 13 further includes a switch control circuit 132; the switch control circuit 132 is coupled to the gate of the first transistor M1 and the gate of the second transistor M2, respectively; the switch control circuit 132 is used to output a first control signal to the gate of the first transistor M1, and to output a second control signal to the gate of the second transistor M2; the first control signal and the second control signal are signals of opposite levels.

在本申请实施例中,通过开关控制电路132分别输出相反电平的第一控制信号和第二控制信号至第一晶体管M1的栅极和第二晶体管M2的栅极,使得第一晶体管M1和第二晶体管M2之间交叉导通。在这种交叉导通的情况下,通过第一控制信号导通第一晶体管M1,并通过第二控制信号关断第二晶体管M2,读取位线RBL上的正电荷流入位线放电电路13中。此时第二晶体管M2为关断状态,不会将位线放电电路13所存储的正电荷进行释放,以保证位线放电电路13的存储量可以刚好将数据电压的电压值下降到第二电压值的。而在放电结束后,通过第一控制信号控制第一晶体管M1关断,并通过第二控制信号控制第二晶体管M2导通。此时,通过第二晶体管M2对位线放电电路13进行持续放电,以确保位线放电电路13中存储的正电荷释放完全,进而确保在后续的放电过程中,位线放电电路13有足够的存储量继续存储读取位线RBL上的正电荷。In the embodiment of the present application, the switch control circuit 132 outputs the first control signal and the second control signal of opposite levels to the gate of the first transistor M1 and the gate of the second transistor M2, respectively, so that the first transistor M1 and the second transistor M2 are cross-conducted. In this cross-conducted state, the first transistor M1 is turned on by the first control signal, and the second transistor M2 is turned off by the second control signal, and the positive charge on the read bit line RBL flows into the bit line discharge circuit 13. At this time, the second transistor M2 is in the off state, and the positive charge stored in the bit line discharge circuit 13 will not be released, so as to ensure that the storage capacity of the bit line discharge circuit 13 can just reduce the voltage value of the data voltage to the second voltage value. After the discharge is completed, the first transistor M1 is turned off by the first control signal, and the second transistor M2 is turned on by the second control signal. At this time, the bit line discharge circuit 13 is continuously discharged by the second transistor M2 to ensure that the positive charge stored in the bit line discharge circuit 13 is completely released, thereby ensuring that in the subsequent discharge process, the bit line discharge circuit 13 has enough storage capacity to continue to store the positive charge on the read bit line RBL.

示例性地,如图14所示,开关控制电路132包括与非门1321和第一反相器INV1;第一反相器INV1的输出端分别与与非门1321的第一输入端、第二晶体管M2的栅极耦合,第一反相器INV1的输出端用于输出第二控制信号;与非门1321的第二输入端用于输入使能信号;与非门1321的输出端与第一晶体管M1的栅极耦合;与非门1321的输出端用于输出第一控制信号。Exemplarily, as shown in FIG14 , the switch control circuit 132 includes a NAND gate 1321 and a first inverter INV1; the output end of the first inverter INV1 is coupled to the first input end of the NAND gate 1321 and the gate of the second transistor M2, respectively, and the output end of the first inverter INV1 is used to output the second control signal; the second input end of the NAND gate 1321 is used to input an enable signal; the output end of the NAND gate 1321 is coupled to the gate of the first transistor M1; and the output end of the NAND gate 1321 is used to output the first control signal.

在本申请实施例中,通过包括与非门1321和第一反相器INV1的开关控制电路132,可以实现输出的第一控制信号和第二控制信号恒定为相反电平的控制信号。通过使能信号可以实现对储能单元131是否进行放电工作的控制。In the embodiment of the present application, the switch control circuit 132 including the NAND gate 1321 and the first inverter INV1 can realize that the output first control signal and the second control signal are constant control signals of opposite levels. The enable signal can be used to control whether the energy storage unit 131 performs a discharge operation.

在一些可能的实施方式中,示例性地,如图15所示,位线充电电路11包括第七晶体管M7。第七晶体管M7的第一极用于输入充电电压,第七晶体管M7的第二极与读取位线RBL耦合。第七晶体管M7的栅极用于输入第一充电控制信号,第一充电控制信号用于控制第七晶体管M7导通,以向读取位线RBL充电。In some possible implementations, exemplarily, as shown in FIG15 , the bit line charging circuit 11 includes a seventh transistor M7. A first electrode of the seventh transistor M7 is used to input a charging voltage, and a second electrode of the seventh transistor M7 is coupled to the read bit line RBL. A gate of the seventh transistor M7 is used to input a first charging control signal, and the first charging control signal is used to control the seventh transistor M7 to turn on, so as to charge the read bit line RBL.

示例性地,第七晶体管M7为PMOS晶体管。第一反相器INV1的输入端用于输入第一充电控制信号。Exemplarily, the seventh transistor M7 is a PMOS transistor. The input terminal of the first inverter INV1 is used to input the first charging control signal.

在本申请实施例中,可以通过开关控制电路132控制位线放电电路13是否进行放电。与非门1321的运算逻辑为:当输入全部为高电平时,与非门1321输出低电平;否则,当输入的信号中有一个低电平时,与非门1321输出高电平。如图15所示,当第七晶体管M7为PMOS晶体管时,第一充电控制信号(低电平)控制第七晶体管M7导通。此时,第一充电控制信号(低电平)输入第一反相器INV1。由第一反相器INV1输出第二控制信号(高电平)到与非门1321的第一输入端。反之,第一充电控制信号(高电平)控制第七晶体管M7关断。此时,第一充电控制信号(高电平)输入第一反相器INV1。由第一反相器INV1输出第二控制信号(低电平)到与非门1321的第一输入端。综上可知,通过第一反相器INV1对第一充电控制信号进行反相,生成第二控制信号来控制第二晶体管M2的导通和关断,可以确保第二晶体管M2导通以对储能单元131进行放电的情况只会出现在位线充电电路11的第七晶体管M7未对读取位线RBL进行充电的时候。这样可以避免在对读取位线RBL进行充电的同时,第一晶体管M1和第二晶体管M2同时导通,以至于对存储读取位线RBL上的正电荷并对存储的正电荷进行释放,造成功耗浪费的情况。通过控制输入与非门1321的第二输入端的信号为高电平或低电平的使能信号,即可实现对储能单元131是否进行放电工作的控制。In the embodiment of the present application, the switch control circuit 132 can be used to control whether the bit line discharge circuit 13 is discharged. The operation logic of the NAND gate 1321 is: when all inputs are high level, the NAND gate 1321 outputs a low level; otherwise, when there is a low level in the input signal, the NAND gate 1321 outputs a high level. As shown in Figure 15, when the seventh transistor M7 is a PMOS transistor, the first charging control signal (low level) controls the seventh transistor M7 to be turned on. At this time, the first charging control signal (low level) is input to the first inverter INV1. The first inverter INV1 outputs the second control signal (high level) to the first input terminal of the NAND gate 1321. Conversely, the first charging control signal (high level) controls the seventh transistor M7 to be turned off. At this time, the first charging control signal (high level) is input to the first inverter INV1. The first inverter INV1 outputs the second control signal (low level) to the first input terminal of the NAND gate 1321. In summary, by inverting the first charging control signal through the first inverter INV1 and generating the second control signal to control the on and off of the second transistor M2, it can be ensured that the second transistor M2 is turned on to discharge the energy storage unit 131 only when the seventh transistor M7 of the bit line charging circuit 11 does not charge the read bit line RBL. In this way, it can be avoided that the first transistor M1 and the second transistor M2 are turned on at the same time when the read bit line RBL is charged, so that the positive charge on the read bit line RBL is stored and the stored positive charge is released, resulting in a waste of power consumption. By controlling the signal at the second input terminal of the input NAND gate 1321 to be a high level or low level enable signal, it is possible to control whether the energy storage unit 131 performs a discharge operation.

在一些可能的实施方式中,如图16所示,读取电路12包括第三反相器INV3和第六晶体管M6。第三反相器INV3的输入端作为读取电路12的输入端,第三反相器INV3的输出端与第六晶体管M6的栅极耦合。In some possible implementations, as shown in Fig. 16, the read circuit 12 includes a third inverter INV3 and a sixth transistor M6. The input end of the third inverter INV3 serves as the input end of the read circuit 12, and the output end of the third inverter INV3 is coupled to the gate of the sixth transistor M6.

在本申请实施例中,以第六晶体管M6为NMOS晶体管为例。在读取存储阶段,通过第三反相器INV3获取读取位线RBL上的数据电压的电压值,当该电压值高于读值比较电压时,第三反相器INV3输出低电平至第六晶体管M6(NMOS晶体管)的栅极,以控制第六晶体管M6关断。当该电压值低于读值比较电压时,第三反相器INV3输出高电平至第六晶体管M6(NMOS晶体管)的栅极,以控制第六晶体管M6导通。通过第六晶体管M6的第二极连接接地电压或负电压,使得在第六晶体管M6导通和关断的情况下,第六晶体管M6的第一极的电压值不同,以第六晶体管M6的第一极的电压值来指示存储单元21中的数据的取值。例如,第六晶体管M6的第一极为高电平时,指示存储单元21中的数据的取值为1;第六晶体管M6的第一极为低电平时,指示存储单元21中的数据的取值为0。In the embodiment of the present application, the sixth transistor M6 is an NMOS transistor as an example. In the reading and storage stage, the voltage value of the data voltage on the read bit line RBL is obtained by the third inverter INV3. When the voltage value is higher than the read value comparison voltage, the third inverter INV3 outputs a low level to the gate of the sixth transistor M6 (NMOS transistor) to control the sixth transistor M6 to turn off. When the voltage value is lower than the read value comparison voltage, the third inverter INV3 outputs a high level to the gate of the sixth transistor M6 (NMOS transistor) to control the sixth transistor M6 to turn on. The second pole of the sixth transistor M6 is connected to the ground voltage or the negative voltage, so that when the sixth transistor M6 is turned on and off, the voltage value of the first pole of the sixth transistor M6 is different, and the voltage value of the first pole of the sixth transistor M6 is used to indicate the value of the data in the storage unit 21. For example, when the first pole of the sixth transistor M6 is at a high level, it indicates that the value of the data in the storage unit 21 is 1; when the first pole of the sixth transistor M6 is at a low level, it indicates that the value of the data in the storage unit 21 is 0.

在一些可能的实施方式中,如图16所示,外围电路1还包括输出缓冲电路14;输出缓冲电路14的输入端与读取电路12的输出端耦合。输出缓冲电路14用于周期性锁存读取电路12输出的数据。In some possible implementations, as shown in FIG16 , the peripheral circuit 1 further includes an output buffer circuit 14; an input end of the output buffer circuit 14 is coupled to an output end of the read circuit 12. The output buffer circuit 14 is used to periodically latch data output by the read circuit 12.

在本申请实施例中,通过输出缓冲电路14对读取电路12输出的信号进行锁存等操作。In the embodiment of the present application, the signal output by the reading circuit 12 is latched by the output buffer circuit 14 .

示例性地,如图16所示,输出缓冲电路14包括第一充电电路141、高电平保持电路142、锁存器143和第二反相器INV2;锁存器143的输入端为输出缓冲电路14的输入端,锁存器143的输入端与读取电路12中的第六晶体管M6的第一极耦合;第一充电电路141的输出端、高电平保持电路142的保持端分别与锁存器143的输入端耦合;锁存器143的输出端与第二反相器INV2的输入端耦合。Exemplarily, as shown in FIG16 , the output buffer circuit 14 includes a first charging circuit 141, a high-level holding circuit 142, a latch 143 and a second inverter INV2; the input end of the latch 143 is the input end of the output buffer circuit 14, and the input end of the latch 143 is coupled to the first electrode of the sixth transistor M6 in the reading circuit 12; the output end of the first charging circuit 141 and the holding end of the high-level holding circuit 142 are respectively coupled to the input end of the latch 143; the output end of the latch 143 is coupled to the input end of the second inverter INV2.

在本申请实施例中,在位线预充电阶段,通过第一充电电路141输出充电电压,使得第六晶体管M6的第一极和锁存器143的第一极为高电平。当第六晶体管M6导通时,将第一充电电路141输出的充电电压流入第六晶体管M6的第二极,以拉低第六晶体管M6的第一极的电压。当第六晶体管M6关断时,通过高电平保持电路142使得第六晶体管M6的第一极始终保持高电平,锁存器143的输入端输入高电平,对该高电平进行锁存后,再输出为低电平信号至第二反相器INV2,第二反相器INV2将输入的低电平信号再转换为高电平进行输出。In the embodiment of the present application, in the bit line pre-charging stage, the charging voltage is outputted by the first charging circuit 141, so that the first electrode of the sixth transistor M6 and the first electrode of the latch 143 are at a high level. When the sixth transistor M6 is turned on, the charging voltage outputted by the first charging circuit 141 flows into the second electrode of the sixth transistor M6 to pull down the voltage of the first electrode of the sixth transistor M6. When the sixth transistor M6 is turned off, the first electrode of the sixth transistor M6 is always kept at a high level through the high level holding circuit 142, and a high level is inputted to the input end of the latch 143. After latching the high level, it is outputted as a low level signal to the second inverter INV2, and the second inverter INV2 converts the input low level signal into a high level for output.

示例性地,如图17所示,第一充电电路141包括第八晶体管M8,第八晶体管M8的第一极用于输入充电电压,第八晶体管M8的第二极与读取电路12的输出端以及锁存器143的输入端耦合。第八晶体管M8的栅极用于输入第二充电控制信号;该第二充电控制信号用于控制第八晶体管M8导通,以向锁存器143的输入端输出充电电压。Exemplarily, as shown in FIG17 , the first charging circuit 141 includes an eighth transistor M8, a first electrode of the eighth transistor M8 is used to input a charging voltage, and a second electrode of the eighth transistor M8 is coupled to the output terminal of the reading circuit 12 and the input terminal of the latch 143. The gate of the eighth transistor M8 is used to input a second charging control signal; the second charging control signal is used to control the conduction of the eighth transistor M8 to output the charging voltage to the input terminal of the latch 143.

可选地,第八晶体管M8为PMOS晶体管。当第二充电控制信号为低电平时,第八晶体管M8导通,当第二充电控制信号为高电平时,第八晶体管M8关断。Optionally, the eighth transistor M8 is a PMOS transistor. When the second charging control signal is at a low level, the eighth transistor M8 is turned on, and when the second charging control signal is at a high level, the eighth transistor M8 is turned off.

示例性地,如图17所示,锁存器143包括时钟控制电路1431和锁存电路1432;时钟控制电路1431包括级联的两个第四反相器INV4;锁存电路1432包括级联的三个第五反相器INV5;第一级的第四反相器INV4_1的输出端还与第一级的第五反相器INV5_1的第一电压端和第三级的第五反相器INV5_3的第一电压端耦合;第二级的第四反相器INV4_2的输出端还与第一级的第五反相器INV5_1的第二电压端和第三级的第五反相器INV5_3的第二电压端耦合。Exemplarily, as shown in Figure 17, the latch 143 includes a clock control circuit 1431 and a latch circuit 1432; the clock control circuit 1431 includes two cascaded fourth inverters INV4; the latch circuit 1432 includes three cascaded fifth inverters INV5; the output end of the fourth inverter INV4_1 of the first stage is also coupled with the first voltage end of the fifth inverter INV5_1 of the first stage and the first voltage end of the fifth inverter INV5_3 of the third stage; the output end of the fourth inverter INV4_2 of the second stage is also coupled with the second voltage end of the fifth inverter INV5_1 of the first stage and the second voltage end of the fifth inverter INV5_3 of the third stage.

在本申请实施例中,通过时钟控制电路1431控制第五反相器INV_1和第五反相器INV_3不工作,以实现将输入的电平信号锁存在第五反相器INV_2中。并通过时钟控制电路1431控制第五反相器INV_1和第五反相器INV_3工作,以实现将锁存在第五反相器INV_2中的电平信号输出。时钟控制电路1431通过两个级联的第四反相器INV4,实现第四反相器INV4_1的输出信号与第四反相器INV4_2的输出信号之间的电平始终相反。通过输入第四反相器INV4_1输入的电平不同,可以控制第五反相器INV_1和第五反相器INV_3工作或者不工作。In the embodiment of the present application, the fifth inverter INV_1 and the fifth inverter INV_3 are controlled not to work by the clock control circuit 1431 to realize that the input level signal is locked in the fifth inverter INV_2. And the fifth inverter INV_1 and the fifth inverter INV_3 are controlled to work by the clock control circuit 1431 to realize the output of the level signal locked in the fifth inverter INV_2. The clock control circuit 1431 realizes that the level between the output signal of the fourth inverter INV4_1 and the output signal of the fourth inverter INV4_2 is always opposite through two cascaded fourth inverters INV4. By inputting different levels of the fourth inverter INV4_1, the fifth inverter INV_1 and the fifth inverter INV_3 can be controlled to work or not work.

示例性地,如图18所示,第五反相器INV_1和第五反相器INV_3可以为包括一个NMOS晶体管和PMOS晶体管的反相器结构。当该反相器需要正常工作时,需要向PMOS晶体管的第一极(第一电压端)输入高电平,向NMOS晶体管的第二极(第二电压端)输入低电平。而当向PMOS晶体管的第一极(第一电压端)输入低电平,向NMOS晶体管的第二极(第二电压端)输入高电平时,该反相器无法正常进行反相处理操作。故通过向第四反相器INV_1的输入端输入高电平或低电平,使得第一电压端和第二电压端输入不同的电平信号,以实现控制第五反相器INV_1和第五反相器INV_3工作或者不工作。Exemplarily, as shown in Figure 18, the fifth inverter INV_1 and the fifth inverter INV_3 can be an inverter structure including an NMOS transistor and a PMOS transistor. When the inverter needs to work normally, it is necessary to input a high level to the first pole (first voltage terminal) of the PMOS transistor and a low level to the second pole (second voltage terminal) of the NMOS transistor. When a low level is input to the first pole (first voltage terminal) of the PMOS transistor and a high level is input to the second pole (second voltage terminal) of the NMOS transistor, the inverter cannot perform the inversion processing operation normally. Therefore, by inputting a high level or a low level to the input terminal of the fourth inverter INV_1, different level signals are input to the first voltage terminal and the second voltage terminal to realize the control of the fifth inverter INV_1 and the fifth inverter INV_3 to work or not work.

在一些可能的实施方式中,向第四反相器INV_1的输入端输入的是固定周期的时钟控制信号。In some possible implementations, a clock control signal with a fixed period is input to the input terminal of the fourth inverter INV_1.

在一些可能的实施方式中,如图19、图22所示,外围电路1还包括状态保持器15,状态保持器15包括第四晶体管M4;第四晶体管M4的第二极与读取位线RBL耦合;第四晶体管M4的栅极与第三反相器INV3的输出端耦合。In some possible implementations, as shown in FIG. 19 and FIG. 22 , the peripheral circuit 1 further includes a state holder 15 , which includes a fourth transistor M4 ; a second electrode of the fourth transistor M4 is coupled to the read bit line RBL; and a gate of the fourth transistor M4 is coupled to the output end of the third inverter INV3 .

在本申请实施例中,第四晶体管M4可以为PMOS晶体管。如图19所示,在读取存储数据阶段,读取位线RBL可能会存在浮空(floating)信号,造成对读取数据的干扰。通过第三反相器INV3的输出端与第四晶体管M4的栅极耦合,第三反相器INV3的输出端输出低电平时,第四晶体管M4(PMOS晶体管)导通,通过第四晶体管M4向数据位线BL3输入一定值的保持电流,以防止浮空信号的产生。第四晶体管M4输入的电流的电流值需要设置的比较小,一般要小于第三反相器INV3可以进行识别读取的程度,以避免对第三反相器INV3造成读取数据的干扰。In an embodiment of the present application, the fourth transistor M4 can be a PMOS transistor. As shown in Figure 19, in the stage of reading stored data, a floating signal may exist in the read bit line RBL, causing interference with the read data. The output end of the third inverter INV3 is coupled with the gate of the fourth transistor M4. When the output end of the third inverter INV3 outputs a low level, the fourth transistor M4 (PMOS transistor) is turned on, and a certain value of holding current is input to the data bit line BL3 through the fourth transistor M4 to prevent the generation of a floating signal. The current value of the current input by the fourth transistor M4 needs to be set relatively small, generally less than the degree to which the third inverter INV3 can identify and read, so as to avoid interference with the read data caused by the third inverter INV3.

示例性地,如图19、图22所示,状态保持器15还包括至少一个第五晶体管M5;至少一个第五晶体管M5与第四晶体管M4的第一极耦合,且至少一个第五晶体管M5与第四晶体管M4串联。Exemplarily, as shown in FIG. 19 and FIG. 22 , the state holder 15 further includes at least one fifth transistor M5 ; the at least one fifth transistor M5 is coupled to the first electrode of the fourth transistor M4 , and the at least one fifth transistor M5 is connected in series with the fourth transistor M4 .

在本申请实施例中,如图19、图22所示,第五晶体管M5的数量可以为一个或多个,第五晶体管M5与第四晶体管M4串联。控制第五晶体管M5始终导通。通过设置第五晶体管M5可以增加状态保持器15的稳定性等。In the embodiment of the present application, as shown in FIG. 19 and FIG. 22 , the number of the fifth transistor M5 can be one or more, and the fifth transistor M5 is connected in series with the fourth transistor M4. The fifth transistor M5 is controlled to be always turned on. By setting the fifth transistor M5, the stability of the state holder 15 can be increased.

在一些可能的实施方式中,存储器10包括多条字线WL和多条位线BL存储单元阵列2包括多个存储单元21。每个存储单元21分别对应耦合一条字线WL和一条位线BL。如图20所示,当存储单元21为单端读取型存储单元时,对于与存储单元阵列2中的每个为单端读取型存储单元的存储单元21所对应的字线WL和位线BL,每条字线WL包括写入字线WWL、读取字线RWL。每条位线BL包括第一写入位线WBL、第二写入位线WNBL、读取位线RBL。如图21所示,外围电路1还包括逻辑控制电路16、行译码电路17、写入电路18、输入缓冲电路19等。逻辑控制电路16分别与位线充电电路11、读取电路12、位线放电电路13、输出缓冲电路14、行译码电路17、写入电路18、输入缓冲电路19等耦合。位线充电电路11、读取电路12的输入端、位线放电电路13分别与读取位线RBL耦合,读取电路12的输出端与输出缓冲电路14的输入端耦合。输入缓冲电路19的输出端与写入电路18的输入端耦合,写入电路18的输出端分别与第一写入位线WBL和第二写入位线WNBL耦合。行译码电路17的输出端分别与写入字线WWL和读取字线RWL耦合。In some possible implementations, the memory 10 includes a plurality of word lines WL and a plurality of bit lines BL. The memory cell array 2 includes a plurality of memory cells 21. Each memory cell 21 is respectively coupled to a word line WL and a bit line BL. As shown in FIG20 , when the memory cell 21 is a single-ended read memory cell, for the word line WL and the bit line BL corresponding to each memory cell 21 in the memory cell array 2 that is a single-ended read memory cell, each word line WL includes a write word line WWL and a read word line RWL. Each bit line BL includes a first write bit line WBL, a second write bit line WNBL, and a read bit line RBL. As shown in FIG21 , the peripheral circuit 1 also includes a logic control circuit 16, a row decoding circuit 17, a write circuit 18, an input buffer circuit 19, etc. The logic control circuit 16 is respectively coupled to the bit line charging circuit 11, the read circuit 12, the bit line discharging circuit 13, the output buffer circuit 14, the row decoding circuit 17, the write circuit 18, the input buffer circuit 19, etc. The bit line charging circuit 11, the input end of the reading circuit 12, and the bit line discharging circuit 13 are coupled to the reading bit line RBL respectively, and the output end of the reading circuit 12 is coupled to the input end of the output buffer circuit 14. The output end of the input buffer circuit 19 is coupled to the input end of the writing circuit 18, and the output end of the writing circuit 18 is coupled to the first writing bit line WBL and the second writing bit line WNBL respectively. The output end of the row decoding circuit 17 is coupled to the writing word line WWL and the reading word line RWL respectively.

在本申请实施例中,通过逻辑控制电路16控制行译码电路17分别对写入字线WWL和读取字线RWL进行充电和放电,以分别控制存储单元21中的第一导通晶体管PG和第二导通晶体管PGB是否导通。逻辑控制电路16通过控制写入电路18分别对第一写入位线WBL和第二写入位线WNBL进行充电和放电,并通过控制行译码电路17对写入字线WWL进行充电和放电,以实现在存储单元21中写入数据。逻辑控制电路16通过控制位线充电电路11、位线放电电路13对读取位线RBL进行充电和放电,并通过控制行译码电路17对读取字线RWL进行充电和放电,以实现读取存储单元21中存储的数据。In the embodiment of the present application, the row decoding circuit 17 is controlled by the logic control circuit 16 to charge and discharge the write word line WWL and the read word line RWL respectively, so as to control whether the first conduction transistor PG and the second conduction transistor PGB in the storage unit 21 are turned on respectively. The logic control circuit 16 charges and discharges the first write bit line WBL and the second write bit line WNBL respectively by controlling the write circuit 18, and charges and discharges the write word line WWL by controlling the row decoding circuit 17, so as to write data in the storage unit 21. The logic control circuit 16 charges and discharges the read bit line RBL by controlling the bit line charging circuit 11 and the bit line discharging circuit 13, and charges and discharges the read word line RWL by controlling the row decoding circuit 17, so as to read the data stored in the storage unit 21.

示例性地,逻辑控制电路16可以为包括控制器的控制电路。可选地,该控制器可以为专用集成芯片(application specific integrated circuit,ASIC),还可以是系统芯片(system on chip,SoC),还可以是中央处理器(central processor unit,CPU),还可以是网络处理器(network processor,NP),还可以是数字信号处理电路(digital signalprocessor,DSP),还可以是微控制器(micro controller unit,MCU),还可以是可编程控制器(programmable logic device,PLD)或其他集成芯片等。Exemplarily, the logic control circuit 16 may be a control circuit including a controller. Optionally, the controller may be an application specific integrated circuit (ASIC), a system on chip (SoC), a central processor unit (CPU), a network processor (NP), a digital signal processor (DSP), a microcontroller unit (MCU), a programmable logic device (PLD), or other integrated chips.

示例性地,逻辑控制电路16可以为由数字逻辑电路组成的数字硬件控制电路。Exemplarily, the logic control circuit 16 may be a digital hardware control circuit composed of a digital logic circuit.

在一些可能的实施方式中,存储器10中存储单元21全部为单端读取型存储单元。或者,存储器10中部分存储单元21为双端读取型存储单元,另一部分存储单元21为单端读取型存储单元。In some possible implementations, all storage cells 21 in the memory 10 are single-end read storage cells. Alternatively, some storage cells 21 in the memory 10 are dual-end read storage cells, and another part of the storage cells 21 are single-end read storage cells.

示例性地,该存储器10可以为静态随机存取存储器(static random-accessmemory,SRAM)、只读存储器(read-only memory,ROM)等。Exemplarily, the memory 10 may be a static random-access memory (SRAM), a read-only memory (ROM), or the like.

可选地,当存储器10为静态随机存取存储器时,其中的存储单元21可以全部为上述实施例中所记载的包括八个晶体管的单端读取型存储单元。可选的,其中的存储单元21也可以一部分为上述实施例中所记载的包括八个晶体管的单端读取型存储单元,另一部分存储单元21可以为上述实施例中所记载的包括六个晶体管的双端读取型存储单元。Optionally, when the memory 10 is a static random access memory, all of the memory cells 21 therein may be single-ended read memory cells including eight transistors as described in the above embodiment. Optionally, part of the memory cells 21 therein may be single-ended read memory cells including eight transistors as described in the above embodiment, and the other part of the memory cells 21 may be double-ended read memory cells including six transistors as described in the above embodiment.

可选地,当存储器10为只读存储器时,其中的存储单元21可以为包括一个晶体管的单端读取型存储单元。Optionally, when the memory 10 is a read-only memory, the memory cell 21 therein may be a single-ended read-type memory cell including one transistor.

在一些可能的实施方式中,关于写入字线WWL、读取字线RWL、第一写入位线WBL、第二写入位线WNBL、读取位线RBL中的至少一种数据线,分别设置有对应的放电电路和充电电路,以分别对该至少一种数据线进行充电和放电操作。In some possible embodiments, corresponding discharge circuits and charging circuits are respectively provided for at least one data line among the write word line WWL, the read word line RWL, the first write bit line WBL, the second write bit line WNBL, and the read bit line RBL to respectively perform charging and discharging operations on the at least one data line.

在本申请实施例中,当存储器10中包括如图4所示的双端读取型存储单元和如图5所示的单端读取型存储单元时,两种类型的存储单元21在写入数据方面的原理和操作一致,故存储器10对所有存储单元进行写入数据操作时的写入速率一致。但在对所有的存储单元21进行读取数据时,如图5所示的单端读取型存储单元的读取速率会慢于如图4所示的双端读取型存储单元。此时,对于该单端读取型存储单元,采用包括上述图6、图7、图8、图9、图10、图11、图12、图13、图14、图15、图16、图17、图18、图19、图20和图21所记载的相关结构的外围电路,可以提高单端读取型存储单元的读取速率,进而提高该存储器10的读取速率。In the embodiment of the present application, when the memory 10 includes a dual-end read type memory cell as shown in FIG. 4 and a single-end read type memory cell as shown in FIG. 5 , the two types of memory cells 21 have the same principle and operation in writing data, so the memory 10 has the same write rate when writing data to all memory cells. However, when reading data from all memory cells 21, the read rate of the single-end read type memory cell as shown in FIG. 5 is slower than that of the dual-end read type memory cell as shown in FIG. 4 . At this time, for the single-end read type memory cell, the peripheral circuit including the related structures described in FIG. 6 , FIG. 7 , FIG. 8 , FIG. 9 , FIG. 10 , FIG. 11 , FIG. 12 , FIG. 13 , FIG. 14 , FIG. 15 , FIG. 16 , FIG. 17 , FIG. 18 , FIG. 19 , FIG. 20 and FIG. 21 can improve the read rate of the single-end read type memory cell, thereby improving the read rate of the memory 10.

基于包括上述图5、图6、图7、图8、图9、图10、图11、图12、图13、图14、图15、图16、图17、图18、图19、图20、图21和图22所记载的结构的存储器10,可执行如图23所示的包括步骤S110-步骤S130的数据读取方法:Based on the memory 10 including the structure described in FIGS. 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21 and 22, a data reading method including steps S110 to S130 as shown in FIG. 23 may be executed:

步骤S110、对读取位线RBL进行预充电,以使得读取位线RBL上的数据电压的电压值为第一电压值。Step S110 , pre-charging the read bit line RBL so that the voltage value of the data voltage on the read bit line RBL is a first voltage value.

在一些可能的实施方式中,图6所示,在读取数据操作的位线预充电阶段,通过位线充电电路11对读取位线RBL进行充电,使得读取位线RBL上的数据电压的电压值为第一电压值。In some possible implementations, as shown in FIG. 6 , in the bit line precharging stage of the data reading operation, the read bit line RBL is charged by the bit line charging circuit 11 so that the voltage value of the data voltage on the read bit line RBL is a first voltage value.

示例性地,以进行数据读取的存储单元21为如图5所示的单端读取型存储单元为例。如图18、图19所示,通过逻辑控制电路16控制行译码电路17分别对写入字线WWL和读取字线RWL进行放电,以控制存储单元21中的第一导通晶体管PG不导通,以及控制第二导通晶体管PGB不导通。通过逻辑控制电路16控制位线放电电路13不进行放电,并控制位线充电电路11对读取位线RBL进行充电,以使得数据电压的电压值达到第一电压值。For example, the memory cell 21 for data reading is a single-ended read memory cell as shown in FIG5. As shown in FIG18 and FIG19, the row decoding circuit 17 is controlled by the logic control circuit 16 to discharge the write word line WWL and the read word line RWL respectively, so as to control the first conduction transistor PG in the memory cell 21 to be non-conductive, and control the second conduction transistor PGB to be non-conductive. The bit line discharge circuit 13 is controlled by the logic control circuit 16 not to discharge, and the bit line charging circuit 11 is controlled to charge the read bit line RBL, so that the voltage value of the data voltage reaches the first voltage value.

示例性地,如图8、图9、图10、图12、图13和图14所示,在逻辑控制电路16控制位线充电电路11对读取位线RBL进行充电时,逻辑控制电路16控制第一晶体管M1不导通,并控制第二晶体管M2导通,以对位线放电电路13中存储的正电荷进行释放。Exemplarily, as shown in Figures 8, 9, 10, 12, 13 and 14, when the logic control circuit 16 controls the bit line charging circuit 11 to charge the read bit line RBL, the logic control circuit 16 controls the first transistor M1 to be non-conductive, and controls the second transistor M2 to be conductive, so as to release the positive charge stored in the bit line discharge circuit 13.

示例性地,如图14所示,逻辑控制电路16向位线充电电路11中的第七晶体管M7的栅极输出第一充电控制信号,并将该第一充电控制信号输出至第一反相器INV1的输入端。使得通过第一充电控制信号控制位线充电电路11对读取位线RBL进行充电的时候,通过第一充电控制信号同步控制第二晶体管M2对位线放电电路13中存储的正电荷进行释放。Exemplarily, as shown in FIG14 , the logic control circuit 16 outputs a first charging control signal to the gate of the seventh transistor M7 in the bit line charging circuit 11, and outputs the first charging control signal to the input end of the first inverter INV1, so that when the bit line charging circuit 11 is controlled by the first charging control signal to charge the read bit line RBL, the second transistor M2 is synchronously controlled by the first charging control signal to release the positive charge stored in the bit line discharge circuit 13.

步骤S120、对读取位线RBL进行放电,以使得读取位线RBL上的数据电压的电压值为第二电压值。Step S120 , discharging the read bit line RBL so that the voltage value of the data voltage on the read bit line RBL is a second voltage value.

示例性地,第二电压值大于读值比较电压。其中读值比较电压为读取电路12的翻转电压值,当读取位线RBL上的数据电压的电压值大于读值比较电压时,读取电路12确定其为高电平;反之,当读取位线RBL上的数据电压的电压值小于读值比较电压时,读取电路12确定其为低电平。Exemplarily, the second voltage value is greater than the read value comparison voltage. The read value comparison voltage is a flip voltage value of the read circuit 12. When the voltage value of the data voltage on the read bit line RBL is greater than the read value comparison voltage, the read circuit 12 determines it as a high level; conversely, when the voltage value of the data voltage on the read bit line RBL is less than the read value comparison voltage, the read circuit 12 determines it as a low level.

在本申请实施例中,在对读取位线RBL进行预充电以使得读取位线RBL上的数据电压的电压值为第一电压值后,并在对读取位线RBL上的数据电压的电压值进行读取之前,将读取位线RBL上的数据电压的电压值下降到第二电压值。而后在后续对读取位线RBL上的数据电压的电压值进行读取的读取存储数据阶段,若存储单元21中的存储电压的电压值所指示的取值为1,则数据电压的电压值不会下降,读取电路12判断输入的为高电平;若存储单元21中的存储电压的电压值所指示的取值为0,则数据电压的电压值会下降到读值比较电压以下,读取电路12判断输入的为低电平。因数据电压的电压值为第二电压值,第二电压值与读值比较电压之间的差值,相对于,第一电压值与读值比较电压之间的差值更小,所以可以使得该存储单元21的放电速度更快,进而提高数据读取速率。In the embodiment of the present application, after the read bit line RBL is precharged so that the voltage value of the data voltage on the read bit line RBL is the first voltage value, and before the voltage value of the data voltage on the read bit line RBL is read, the voltage value of the data voltage on the read bit line RBL is reduced to the second voltage value. Then, in the subsequent reading and storing data phase of reading the voltage value of the data voltage on the read bit line RBL, if the value indicated by the voltage value of the storage voltage in the storage cell 21 is 1, the voltage value of the data voltage will not decrease, and the reading circuit 12 determines that the input is a high level; if the value indicated by the voltage value of the storage voltage in the storage cell 21 is 0, the voltage value of the data voltage will decrease below the read value comparison voltage, and the reading circuit 12 determines that the input is a low level. Because the voltage value of the data voltage is the second voltage value, the difference between the second voltage value and the read value comparison voltage is smaller than the difference between the first voltage value and the read value comparison voltage, so the discharge speed of the storage cell 21 can be made faster, thereby improving the data reading rate.

在一些可能的实施方式中,通过控制位线放电电路13的放电时间,来实现通过位线放电电路13将数据电压从第一电压值放电到第二电压值。In some possible implementations, the data voltage is discharged from the first voltage value to the second voltage value through the bit line discharge circuit 13 by controlling the discharge time of the bit line discharge circuit 13 .

示例性地,如图7、图20和图21所示,位线放电电路13包括第一晶体管M1。逻辑控制电路16通过控制位线放电电路13中的第一晶体管M1的导通时长,来实现对放电的控制。7 , 20 and 21 , the bit line discharge circuit 13 includes a first transistor M1 . The logic control circuit 16 controls the discharge by controlling the conduction time of the first transistor M1 in the bit line discharge circuit 13 .

在一些可能的实施方式中,通过控制位线放电电路13的放电量,来实现通过位线放电电路13将数据电压从第一电压值放电到第二电压值。In some possible implementations, the data voltage is discharged from the first voltage value to the second voltage value through the bit line discharge circuit 13 by controlling the discharge amount of the bit line discharge circuit 13 .

示例性地,如图8、图20和图21所示,位线放电电路13包括第一晶体管M1、第二晶体管M2和储能单元131。逻辑控制电路16通过向第一晶体管M1输出第一控制信号,并向第二晶体管M2输出第二控制信号。通过第一控制信号控制第一晶体管M1导通,并通过第二控制信号控制第二晶体管M2关断。然后由储能单元131存储读取位线RBL上的正电荷,以实现对读取位线RBL的放电。Exemplarily, as shown in FIG8, FIG20 and FIG21, the bit line discharge circuit 13 includes a first transistor M1, a second transistor M2 and an energy storage unit 131. The logic control circuit 16 outputs a first control signal to the first transistor M1 and a second control signal to the second transistor M2. The first control signal controls the first transistor M1 to be turned on, and the second control signal controls the second transistor M2 to be turned off. Then, the energy storage unit 131 stores the positive charge on the read bit line RBL to discharge the read bit line RBL.

示例性地,如图9、图10和图11所示,储能单元131包括金属线耦合电容C1。通过金属线耦合电容C1对读取位线RBL上的正电荷进行存储,以实现对读取位线RBL的放电。9, 10 and 11, the energy storage unit 131 includes a metal line coupling capacitor C1. The positive charge on the read bit line RBL is stored by the metal line coupling capacitor C1 to discharge the read bit line RBL.

在一些可能的实施方式中,如图12和图13所示,储能单元131还包括至少一个可调电容组1311;一个可调电容组1311包括第三晶体管M3和第一电容C2。通过调整第三晶体管M3是否导通来调整储能单元131对正电荷的存储量。In some possible implementations, as shown in Figures 12 and 13, the energy storage unit 131 further includes at least one adjustable capacitor group 1311; an adjustable capacitor group 1311 includes a third transistor M3 and a first capacitor C2. The storage capacity of the energy storage unit 131 for positive charges is adjusted by adjusting whether the third transistor M3 is turned on.

在本申请实施例中,在位线预充电阶段,当需要通过位线放电电路13对读取位线RBL进行放电时,导通第一晶体管M1并关断第二晶体管M2。对于某一可调电容组1311,当导通对应的第三晶体管M3时:如图12所示,第三晶体管M3的第一极耦合在金属线耦合电容C1的第一极时,金属线耦合电容C1与第一电容C2之间并联,可以通过导通后的第一晶体管M1,同时将读取位线RBL上的正电荷存储到金属线耦合电容C1和第一电容C2中。如图13所示,第三晶体管M3的第一极耦合在金属线耦合电容C1的第二极时,金属线耦合电容C1和第一电容C2之间为串联,可以通过导通后的第一晶体管M1,将读取位线RBL上的正电荷经过金属线耦合电容C1后传输到第一电容C2中。上述两种方式,均为本申请实施例可能存在的实施方式,对读取位线RBL进行放电使得读取位线RBL上的数据电压的电压值下降到第二电压值。第二电压值的大小由位线放电电路13可以存储的电荷量决定。而位线放电电路13可以存储的电荷量主要由金属线耦合电容C1的电容值决定,除此以外,通过导通第三晶体管M3,可以使得对应的第一可调电容组1311中第一电容C2与金属线耦合电容C1导通,进而实现对位线放电电路13可以存储的电荷量的调整。在实际的应用中,因生产工艺等的差异,不同读取位线RBL的负载大小等可能存在差异。故通过生产制造的金属线耦合电容C1进行放电时,金属线耦合电容C1的电容值大小不一定可以适应将所有的读取位线RBL的数据电压都降到第二电压值,通过上文实施例可知,第二电压值需要满足大于读值比较电压,才能保证不会对读取存储数据阶段造成干扰。故若金属线耦合电容C1的电容值设置的较大,根据该较大的电容值设计第一缠绕金属线L1和第二缠绕金属线L2等,然后进行生产制造。那么对于存储器10中的多个读取位线RBL而言,通过金属线耦合电容C1放电后,数据电压的电压值可能较读值比较电压而言较低,也可能接近于读值比较电压但仍然大于读值比较电压,也可能低于读值比较电压。而放电后的数据电压的电压值大于读值比较电压的情况下,不同的电压差带来的影响是后续读取存储数据阶段中放电速度的不一致。但在放电后的数据电压的电压值等于或小于读值比较电压的情况下,在后续读取存储数据阶段所读取到的数据存在不可靠性。基于这种情况,可以将金属线耦合电容C1的电容值设置得比理想值稍小一些(理想值为满足所有读取位线RBL刚好使得放电后的第二电压值刚好略大于读值比较电压的理论值),以确保经过金属线耦合电容C1放电后,所有读取位线RBL的电压值都大于读值比较电压。而后,根据每条读取位线RBL实际的负载大小,可以控制每条读取位线RBL上的至少一个可调电容组1311中的第三晶体管M3导通或关断,以实现对每条读取位线RBL所对应的位线放电电路13的放电量的适应性调整。如图12和图13所示的连接情况下,当第三晶体管M3导通状态或者关断状态固定时,位线放电电路13可以存储的电容量是一致的,其大小等于金属线耦合电容C1的电容值与导通的第三晶体管M3对应的第一电容C2的电容值之和。而图12和图13的连接结构下,影响的是位线放电电路13存储电荷和释放电荷的速度。在本申请实施例中,根据位线预充电阶段和读取存储数据阶段的周期时长等,可以适应性选择对应的连接结构。In the embodiment of the present application, in the bit line pre-charging stage, when it is necessary to discharge the read bit line RBL through the bit line discharge circuit 13, the first transistor M1 is turned on and the second transistor M2 is turned off. For a certain adjustable capacitor group 1311, when the corresponding third transistor M3 is turned on: as shown in FIG12, when the first electrode of the third transistor M3 is coupled to the first electrode of the metal line coupling capacitor C1, the metal line coupling capacitor C1 and the first capacitor C2 are connected in parallel, and the positive charge on the read bit line RBL can be stored in the metal line coupling capacitor C1 and the first capacitor C2 at the same time through the turned-on first transistor M1. As shown in FIG13, when the first electrode of the third transistor M3 is coupled to the second electrode of the metal line coupling capacitor C1, the metal line coupling capacitor C1 and the first capacitor C2 are connected in series, and the positive charge on the read bit line RBL can be transmitted to the first capacitor C2 after passing through the metal line coupling capacitor C1 through the turned-on first transistor M1. The above two methods are both possible implementation methods of the present application embodiment, and the read bit line RBL is discharged so that the voltage value of the data voltage on the read bit line RBL drops to the second voltage value. The magnitude of the second voltage value is determined by the amount of charge that the bit line discharge circuit 13 can store. The amount of charge that the bit line discharge circuit 13 can store is mainly determined by the capacitance value of the metal line coupling capacitor C1. In addition, by turning on the third transistor M3, the first capacitor C2 in the corresponding first adjustable capacitor group 1311 can be turned on with the metal line coupling capacitor C1, thereby adjusting the amount of charge that the bit line discharge circuit 13 can store. In actual applications, due to differences in production processes, etc., there may be differences in the load size of different read bit lines RBL. Therefore, when discharging through the manufactured metal line coupling capacitor C1, the capacitance value of the metal line coupling capacitor C1 may not be able to adapt to reducing the data voltage of all read bit lines RBL to the second voltage value. It can be seen from the above embodiment that the second voltage value needs to be greater than the read value comparison voltage to ensure that there will be no interference in the reading and storage data stage. Therefore, if the capacitance value of the metal line coupling capacitor C1 is set to be larger, the first winding metal wire L1 and the second winding metal wire L2 are designed according to the larger capacitance value, and then production is carried out. Then for the multiple read bit lines RBL in the memory 10, after being discharged through the metal line coupling capacitor C1, the voltage value of the data voltage may be lower than the read value comparison voltage, may be close to the read value comparison voltage but still greater than the read value comparison voltage, or may be lower than the read value comparison voltage. When the voltage value of the data voltage after discharge is greater than the read value comparison voltage, the impact of different voltage differences is the inconsistency of the discharge speed in the subsequent reading and storage data stage. However, when the voltage value of the data voltage after discharge is equal to or less than the read value comparison voltage, the data read in the subsequent reading and storage data stage is unreliable. Based on this situation, the capacitance value of the metal line coupling capacitor C1 can be set to be slightly smaller than the ideal value (the ideal value is to satisfy all the read bit lines RBL so that the second voltage value after discharge is just slightly greater than the theoretical value of the read value comparison voltage) to ensure that after the metal line coupling capacitor C1 is discharged, the voltage value of all the read bit lines RBL is greater than the read value comparison voltage. Then, according to the actual load size of each read bit line RBL, the third transistor M3 in at least one adjustable capacitor group 1311 on each read bit line RBL can be controlled to be turned on or off, so as to achieve adaptive adjustment of the discharge amount of the bit line discharge circuit 13 corresponding to each read bit line RBL. In the connection conditions shown in Figures 12 and 13, when the on state or off state of the third transistor M3 is fixed, the capacitance that can be stored in the bit line discharge circuit 13 is consistent, and its size is equal to the sum of the capacitance value of the metal line coupling capacitor C1 and the capacitance value of the first capacitor C2 corresponding to the turned-on third transistor M3. Under the connection structure of Figures 12 and 13, what is affected is the speed of storing and releasing charges in the bit line discharge circuit 13. In the embodiment of the present application, the corresponding connection structure can be adaptively selected according to the cycle length of the bit line pre-charging stage and the stage of reading and storing data.

示例性地,根据第一电压差来控制第三晶体管M3是否导通。其中,第一电压差为第一电压值和读值比较电压之差。Exemplarily, whether the third transistor M3 is turned on is controlled according to the first voltage difference, wherein the first voltage difference is the difference between the first voltage value and the reading value comparison voltage.

在本申请实施例中,需要将数据电压从第一电压值下降到第二电压值,而第二电压值需要满足是大于读值比较电压的,故需要根据第一电压值与读值比较电压之间的差值来确定第二电压值的大小。根据确定的第二电压值,确定需要从读取位线23上存储的正电荷的量,存储的正电荷的量与储能单元131的电容值相关,故根据实际所需的储能单元131的电容值与储能单元131中的金属线耦合电容C1的电容值进行比较,当金属线耦合电容C1的电容值小于实际所需的储能单元131的电容值时,则可导通相应数量的第三晶体管M3,以第一电容C2的电容值来增加储能单元131的电容值,使得储能单元131的电容值等于所需的电容值。In the embodiment of the present application, the data voltage needs to be reduced from the first voltage value to the second voltage value, and the second voltage value needs to satisfy that it is greater than the reading value comparison voltage, so the size of the second voltage value needs to be determined according to the difference between the first voltage value and the reading value comparison voltage. According to the determined second voltage value, the amount of positive charge that needs to be stored on the read bit line 23 is determined, and the amount of stored positive charge is related to the capacitance value of the energy storage unit 131, so the capacitance value of the energy storage unit 131 actually required is compared with the capacitance value of the metal line coupling capacitor C1 in the energy storage unit 131. When the capacitance value of the metal line coupling capacitor C1 is less than the capacitance value of the energy storage unit 131 actually required, the corresponding number of third transistors M3 can be turned on, and the capacitance value of the energy storage unit 131 is increased by the capacitance value of the first capacitor C2, so that the capacitance value of the energy storage unit 131 is equal to the required capacitance value.

示例性地,根据第一数量来控制第三晶体管M3是否导通。其中,第一数量为单条读取位线RBL上所耦合的存储单元21的数量。Exemplarily, whether the third transistor M3 is turned on is controlled according to a first number, wherein the first number is the number of storage cells 21 coupled to a single read bit line RBL.

在本申请实施例中,对于单条读取位线RBL,其上耦合有多个存储单元21。单条读取位线RBL上耦合的存储单元21的数量不同,该读取位线RBL上的负载大小也不相同,在不同的负载大小下,位线充电电路11对每个读取位线RBL输出的充电电压的大小一样,但不同负载大小读取位线RBL输入该充电电压后,因负载大小不同,对充电电压的消耗也不一样,故充电后得到的数据电压的第一电压值也不一样。故需要适应性调整储能单元131的电容值。In the embodiment of the present application, a single read bit line RBL is coupled with a plurality of storage cells 21. The number of storage cells 21 coupled to a single read bit line RBL is different, and the load size on the read bit line RBL is also different. Under different load sizes, the charging voltage output by the bit line charging circuit 11 to each read bit line RBL is the same, but after the read bit lines RBL with different load sizes input the charging voltage, the consumption of the charging voltage is different due to different load sizes, so the first voltage value of the data voltage obtained after charging is also different. Therefore, it is necessary to adaptively adjust the capacitance value of the energy storage unit 131.

在一些可能的实施方式中,逻辑控制电路16向储能单元131输出调整控制信号,该调整控制信号的比特位与可调电容组1311的数量对应,且调整控制信号的每一个比特位的取值用于控制对应的可调电容组1311中的第三晶体管M3是否导通。In some possible embodiments, the logic control circuit 16 outputs an adjustment control signal to the energy storage unit 131, the bit of the adjustment control signal corresponds to the number of adjustable capacitor groups 1311, and the value of each bit of the adjustment control signal is used to control whether the third transistor M3 in the corresponding adjustable capacitor group 1311 is turned on.

示例性地,以包括两个第一可调电容组1311为例,则调整控制信号可以为两比特位的控制信号。两个第一可调电容组1311分别为0比特位第一可调电容组和1比特位第一可调电容组。当调整控制信号的取值为00时,控制两个第三晶体管M3都关断,此时储能单元131的电容值等于金属线耦合电容C1的电容值。当调整控制信号的取值为01时,控制1比特位对应的第三晶体管M3关断,并控制0比特位对应的第三晶体管M3导通。此时储能单元131的电容值等于金属线耦合电容C1的电容值与0比特位对应的第一电容C2的电容值之和。同理,当调整控制信号的取值为10时,储能单元131的电容值等于金属线耦合电容C1的电容值与1比特位对应的第一电容C2的电容值之和。当调整控制信号的取值为11时,储能单元131的电容值等于:金属线耦合电容C1的电容值、0比特位对应的第一电容C2的电容值、0比特位对应的第一电容C2的电容值之和。Exemplarily, taking the two first adjustable capacitor groups 1311 as an example, the adjustment control signal can be a two-bit control signal. The two first adjustable capacitor groups 1311 are respectively the 0-bit first adjustable capacitor group and the 1-bit first adjustable capacitor group. When the value of the adjustment control signal is 00, the two third transistors M3 are controlled to be turned off, and at this time, the capacitance value of the energy storage unit 131 is equal to the capacitance value of the metal wire coupling capacitor C1. When the value of the adjustment control signal is 01, the third transistor M3 corresponding to the 1-bit is controlled to be turned off, and the third transistor M3 corresponding to the 0-bit is controlled to be turned on. At this time, the capacitance value of the energy storage unit 131 is equal to the capacitance value of the metal wire coupling capacitor C1 and the capacitance value of the first capacitor C2 corresponding to the 0-bit. Similarly, when the value of the adjustment control signal is 10, the capacitance value of the energy storage unit 131 is equal to the capacitance value of the metal wire coupling capacitor C1 and the capacitance value of the first capacitor C2 corresponding to the 1-bit. When the value of the adjustment control signal is 11, the capacitance value of the energy storage unit 131 is equal to the sum of the capacitance value of the metal line coupling capacitor C1, the capacitance value of the first capacitor C2 corresponding to the 0 bit, and the capacitance value of the first capacitor C2 corresponding to the 0 bit.

在一些可能的实施方式中,如图14所示,位线放电电路13还包括开关控制电路132;开关控制电路132分别与第一晶体管M1的栅极、第二晶体管M2的栅极耦合;开关控制电路132用于向第一晶体管M1的栅极输出第一控制信号,向第二晶体管M2的栅极输出第二控制信号;第一控制信号与第二控制信号为相反电平的信号。In some possible implementations, as shown in FIG. 14 , the bit line discharge circuit 13 further includes a switch control circuit 132; the switch control circuit 132 is coupled to the gate of the first transistor M1 and the gate of the second transistor M2, respectively; the switch control circuit 132 is used to output a first control signal to the gate of the first transistor M1, and to output a second control signal to the gate of the second transistor M2; the first control signal and the second control signal are signals of opposite levels.

在本申请实施例中,通过开关控制电路132分别输出相反电平的第一控制信号和第二控制信号至第一晶体管M1的栅极和第二晶体管M2的栅极,使得第一晶体管M1和第二晶体管M2之间交叉导通。在这种交叉导通的情况下,通过第一控制信号导通第一晶体管M1,并通过第二控制信号关断第二晶体管M2,读取位线RBL上的正电荷流入位线放电电路13中。此时第二晶体管M2为关断状态,不会将位线放电电路13所存储的正电荷进行释放,以保证位线放电电路13的存储量可以刚好将数据电压的电压值下降到第二电压值的。而在放电结束后,通过第一控制信号控制第一晶体管M1关断,并通过第二控制信号控制第二晶体管M2导通。此时,通过第二晶体管M2对位线放电电路13进行持续放电,以确保位线放电电路13中存储的正电荷释放完全,进而确保在后续的放电过程中,位线放电电路13有足够的存储量继续存储读取位线RBL上的正电荷。In the embodiment of the present application, the switch control circuit 132 outputs the first control signal and the second control signal of opposite levels to the gate of the first transistor M1 and the gate of the second transistor M2, respectively, so that the first transistor M1 and the second transistor M2 are cross-conducted. In this cross-conducted state, the first transistor M1 is turned on by the first control signal, and the second transistor M2 is turned off by the second control signal, and the positive charge on the read bit line RBL flows into the bit line discharge circuit 13. At this time, the second transistor M2 is in the off state, and the positive charge stored in the bit line discharge circuit 13 will not be released, so as to ensure that the storage capacity of the bit line discharge circuit 13 can just reduce the voltage value of the data voltage to the second voltage value. After the discharge is completed, the first transistor M1 is turned off by the first control signal, and the second transistor M2 is turned on by the second control signal. At this time, the bit line discharge circuit 13 is continuously discharged by the second transistor M2 to ensure that the positive charge stored in the bit line discharge circuit 13 is completely released, thereby ensuring that in the subsequent discharge process, the bit line discharge circuit 13 has enough storage capacity to continue to store the positive charge on the read bit line RBL.

示例性地,如图14所示,开关控制电路132包括与非门1321和第一反相器INV1;第一反相器INV1的输出端分别与与非门1321的第一输入端、第二晶体管M2的栅极耦合,第一反相器INV1的输出端用于输出第二控制信号;与非门1321的输出端与第一晶体管M1的栅极耦合;与非门1321的输出端用于输出第一控制信号。Exemplarily, as shown in FIG14 , the switch control circuit 132 includes a NAND gate 1321 and a first inverter INV1; the output end of the first inverter INV1 is respectively coupled to the first input end of the NAND gate 1321 and the gate of the second transistor M2, and the output end of the first inverter INV1 is used to output the second control signal; the output end of the NAND gate 1321 is coupled to the gate of the first transistor M1; the output end of the NAND gate 1321 is used to output the first control signal.

在本申请实施例中,通过包括与非门1321和第一反相器INV1的开关控制电路132,可以实现输出的第一控制信号和第二控制信号恒定为相反电平的控制信号。In the embodiment of the present application, the switch control circuit 132 including the NAND gate 1321 and the first inverter INV1 can achieve that the output first control signal and the second control signal are control signals of constant opposite levels.

步骤S130、导通存储单元21与读取位线RBL。Step S130 , turning on the memory cell 21 and the read bit line RBL.

在一些可能的实施方式中,当存储单元21为如图5记载的单端读取型存储单元时,如图5、图6、图20、图21、图22所示,通过向该存储单元21对应耦合的读取字线RWL充电,使得第四导通晶体管RPG导通,从而使得存储单元21与读取位线RBL之间导通。若存储单元21中的存储电压的电压值不同,会使得读取位线RBL上的数据电压的电压值也不同。关于存储电压与数据电压的关系可参加上述实施例中关于图5的描述,在此不再赘述。In some possible implementations, when the memory cell 21 is a single-ended read memory cell as shown in FIG5 , as shown in FIG5 , FIG6 , FIG20 , FIG21 , and FIG22 , the fourth conduction transistor RPG is turned on by charging the read word line RWL corresponding to the memory cell 21 , thereby conducting between the memory cell 21 and the read bit line RBL. If the voltage value of the storage voltage in the memory cell 21 is different, the voltage value of the data voltage on the read bit line RBL will also be different. The relationship between the storage voltage and the data voltage can be referred to the description of FIG5 in the above embodiment, which will not be repeated here.

步骤S140、获取读取位线上的数据电压的电压值,得到存储单元21中的数据的取值。Step S140 , obtaining the voltage value of the data voltage on the read bit line to obtain the value of the data in the storage unit 21 .

在一些可能的实施方式中,如图6、图7、图8、图9、图10、图12、图13、图14、图15、图16、图17、图18、图19、图20、图21和图22所示,逻辑控制电路16控制位线充电电路11不对读取位线RBL进行充电,并控制位线放电电路13不对读取位线RBL进行放电。而后,逻辑控制电路16控制读取电路12获取读取位线RBL上的数据电压的电压值,当数据电压的电压值小于读值比较电压时,读取电路12判定输入为低电平;当数据电压的电压值大于读值比较电压时,读取电路12判定输入为高电平。In some possible implementations, as shown in FIG6, FIG7, FIG8, FIG9, FIG10, FIG12, FIG13, FIG14, FIG15, FIG16, FIG17, FIG18, FIG19, FIG20, FIG21 and FIG22, the logic control circuit 16 controls the bit line charging circuit 11 not to charge the read bit line RBL, and controls the bit line discharging circuit 13 not to discharge the read bit line RBL. Then, the logic control circuit 16 controls the read circuit 12 to obtain the voltage value of the data voltage on the read bit line RBL. When the voltage value of the data voltage is less than the read value comparison voltage, the read circuit 12 determines that the input is a low level; when the voltage value of the data voltage is greater than the read value comparison voltage, the read circuit 12 determines that the input is a high level.

示例性地,以存储单元21为图5所示的结构为例,如图5、图20和图21所示,在读取存储数据阶段,逻辑控制电路16通过行译码电路17对写入字线WWL进行放电,以控制第一导通晶体管PG和第二导通晶体管PGB关断,并通过行译码电路17对读取字线RWL进行充电,以控制第四导通晶体管RPG导通。Exemplarily, taking the storage unit 21 as the structure shown in Figure 5 as an example, as shown in Figures 5, 20 and 21, in the stage of reading stored data, the logic control circuit 16 discharges the write word line WWL through the row decoding circuit 17 to control the first pass transistor PG and the second pass transistor PGB to be turned off, and charges the read word line RWL through the row decoding circuit 17 to control the fourth pass transistor RPG to be turned on.

当第二存储点NBIT中存储的数据的取值为1时(即第一存储点BIT中存储的数据的取值为0),第三导通晶体管RPD导通,使得读取位线RBL的数据电压的电压值从第二电压值下降到低于读值比较电压。读取电路12判断输入的为低电平,该输入的低电平即对应第一存储点BIT中存储的数据的取值0,也对应着该存储单元21中的数据的取值0。When the value of the data stored in the second storage point NBIT is 1 (i.e., the value of the data stored in the first storage point BIT is 0), the third conduction transistor RPD is turned on, so that the voltage value of the data voltage of the read bit line RBL drops from the second voltage value to below the read value comparison voltage. The read circuit 12 determines that the input is a low level, which corresponds to the value 0 of the data stored in the first storage point BIT, and also corresponds to the value 0 of the data in the storage unit 21.

当第二存储点NBIT中存储的数据的取值为0时(即第一存储点BIT中存储的数据的取值为1),第三导通晶体管RPD关断,不会降低读取位线RBL的数据电压的电压值。此时读取位线RBL的数据电压的电压值保持在第二电压值,第二电压值高于读值比较电压,读取电路12判断输入的为高电平,该输入的高电平即对应第一存储点BIT中存储的数据的取值1,也对应着该存储单元21中的数据的取值1。When the value of the data stored in the second storage point NBIT is 0 (that is, the value of the data stored in the first storage point BIT is 1), the third conduction transistor RPD is turned off, and the voltage value of the data voltage of the read bit line RBL is not reduced. At this time, the voltage value of the data voltage of the read bit line RBL is maintained at the second voltage value, which is higher than the read value comparison voltage. The read circuit 12 determines that the input is a high level, and the high level of the input corresponds to the value 1 of the data stored in the first storage point BIT, and also corresponds to the value 1 of the data in the storage unit 21.

示例性地,如图16所示,读取电路12包括第三反相器INV3和第六晶体管M6。第三反相器INV3对输入的电平进行反相,而后通过反相后电平控制第六晶体管M6是否导通,根据导通和关断两种情况下,第六晶体管M6的第一极的电压的不同取值来指示存储单元21中的数据的取值。Exemplarily, as shown in FIG16 , the reading circuit 12 includes a third inverter INV3 and a sixth transistor M6. The third inverter INV3 inverts the input level, and then controls whether the sixth transistor M6 is turned on or not by the inverted level, and indicates the value of the data in the storage unit 21 according to different values of the voltage of the first electrode of the sixth transistor M6 in the two cases of on and off.

在一些可能的实施方式中,如图16所示,在读取电路12的输出端设置输出缓冲电路14。通过输出缓冲电路14对读取的数据进行缓存锁存,而后再进行输出。In some possible implementations, as shown in Fig. 16, an output buffer circuit 14 is provided at the output end of the reading circuit 12. The output buffer circuit 14 caches and latches the read data and then outputs the data.

示例性地,如图16所示,输出缓冲电路14中包括第一充电电路141、锁存器143。逻辑控制电路16向第一充电电路141输出第二充电控制信号,通过第二充电控制信号控制第一充电电路141向锁存器143和第六晶体管M6的第一极输出充电电压,以使得锁存器143的输入端和第六晶体管M6的第一极之间保持在高电平。当第六晶体管M6导通后,将第一充电电路141输出的充电电压拉低,使得第六晶体管M6的第一极与锁存器143的输入端之间为低电平。锁存器143将对该低电平进行锁存后再输出。Exemplarily, as shown in FIG16 , the output buffer circuit 14 includes a first charging circuit 141 and a latch 143. The logic control circuit 16 outputs a second charging control signal to the first charging circuit 141, and controls the first charging circuit 141 to output a charging voltage to the latch 143 and the first electrode of the sixth transistor M6 through the second charging control signal, so that the input terminal of the latch 143 and the first electrode of the sixth transistor M6 are kept at a high level. When the sixth transistor M6 is turned on, the charging voltage output by the first charging circuit 141 is pulled down, so that the first electrode of the sixth transistor M6 and the input terminal of the latch 143 are at a low level. The latch 143 latches the low level and then outputs it.

在本申请实施例中,以存储单元21为如图5所示的包括八个晶体管的单端读取型存储单元为例,该存储单元21中包括第一存储点BIT和第二存储点NBIT,第一存储点BIT和第二存储点NBIT中存储的为相反的数据。上述实施例中均以将第一存储点BIT中存储的数据作为存储单元21中存储的数据为例。而在实际的应用中,也可以将第二存储点NBIT中存储的数据作为存储单元21中存储的数据。在如图16所示的结构中,锁存器143输出的电平与第二存储点NBIT中存储的数据相对应。In the embodiment of the present application, the storage unit 21 is a single-ended read type storage unit including eight transistors as shown in FIG5 , and the storage unit 21 includes a first storage point BIT and a second storage point NBIT, and the first storage point BIT and the second storage point NBIT store opposite data. In the above embodiments, the data stored in the first storage point BIT is used as the data stored in the storage unit 21. In actual applications, the data stored in the second storage point NBIT can also be used as the data stored in the storage unit 21. In the structure shown in FIG16 , the level output by the latch 143 corresponds to the data stored in the second storage point NBIT.

示例性地,如图17所示,当第一充电电路141包括第八晶体管M8时,若第八晶体管M8为PMOS晶体管,则向第八晶体管M8的栅极输出为低电平的第二充电控制信号,以控制第八晶体管M8向锁存器143的输入端以及读取电路12中的第六晶体管M6的第一极输出充电电压。Exemplarily, as shown in Figure 17, when the first charging circuit 141 includes an eighth transistor M8, if the eighth transistor M8 is a PMOS transistor, a second charging control signal of a low level is output to the gate of the eighth transistor M8 to control the eighth transistor M8 to output a charging voltage to the input end of the latch 143 and the first electrode of the sixth transistor M6 in the reading circuit 12.

示例性地,如图16所示,输出缓冲电路14还包括第二反相器INV2。锁存器143的输出端与第二反相器INV2的输入端耦合。如图17所示,锁存器143包括时钟控制电路1431和锁存电路1432;时钟控制电路1431包括级联的两个第四反相器INV4;锁存电路1432包括级联的三个第五反相器INV5;第一级的第四反相器INV4_1的输出端还与第一级的第五反相器INV5_1的第一电压端和第三级的第五反相器INV5_3的第一电压端耦合;第二级的第四反相器INV4_2的输出端还与第一级的第五反相器INV5_1的第二电压端和第三级的第五反相器INV5_3的第二电压端耦合。Exemplarily, as shown in FIG16 , the output buffer circuit 14 further includes a second inverter INV2. The output end of the latch 143 is coupled to the input end of the second inverter INV2. As shown in FIG17 , the latch 143 includes a clock control circuit 1431 and a latch circuit 1432; the clock control circuit 1431 includes two fourth inverters INV4 in cascade connection; the latch circuit 1432 includes three fifth inverters INV5 in cascade connection; the output end of the fourth inverter INV4_1 of the first stage is also coupled to the first voltage end of the fifth inverter INV5_1 of the first stage and the first voltage end of the fifth inverter INV5_3 of the third stage; the output end of the fourth inverter INV4_2 of the second stage is also coupled to the second voltage end of the fifth inverter INV5_1 of the first stage and the second voltage end of the fifth inverter INV5_3 of the third stage.

在本申请实施例中,如图17所示,锁存电路1432包括级联的三个第五反相器INV5。如图18所示,每个第五反相器INV5可以为包括一个PMOS晶体管和一个NMOS晶体管的反相器。该PMOS晶体管栅极和NMOS晶体管的栅极耦合后共同作为第五反相器INV5的输入端,PMOS晶体管的第二极和NMOS晶体管的第一极共同耦合后作为第五反相器INV5的输出端。当第五反相器INV5的输入端输入低电平时,使得PMOS晶体管导通且NMOS晶体管关断,此时,若PMOS晶体管的第一极(即第五反相器INV5的第一电压端)输入的是高电平,则可从PMOS晶体管的第二极(即第五反相器INV5的输出端)输出高电平,从而实现反相的作用,反之,若从PMOS晶体管的第一极(即第五反相器INV5的第一电压端)输入的是低电平,则该第五反相器INV5并未进行反相。同理,若向第五反相器INV5的输入端输入高电平,使得PMOS晶体管关断且NMOS晶体管导通,此时,若NMOS晶体管的第二极(即第五反相器INV5的第二电压端)输入的是低电平,则可从NMOS晶体管的第一极(即第五反相器INV5的输出端)输出低电平,从而实现反相的作用,反之,若从NNMOS晶体管的第二极(即第五反相器INV5的第二电压端)输入的是高电平,则该第五反相器INV5并未进行反相。如图17所示,时钟控制电路1431包括级联的两个第四反相器INV4,则第四反相器INV4_1输出的控制信号与第四反相器INV4_2输出的控制信号始终为相反电平。将第四反相器INV4_1的输出端耦合至第五反相器INV5_1的第一电压端和第五反相器INV5_3的第一电压端,并将第四反相器INV4_2的输出端耦合至第五反相器INV5_1的第二电压端和第五反相器INV5_3的第二电压端;或者,将第四反相器INV4_1的输出端耦合至第五反相器INV5_1的第二电压端和第五反相器INV5_3的第二电压端,并将第四反相器INV4_2的输出端耦合至第五反相器INV5_1的第一电压端和第五反相器INV5_3的第一电压端。通过向第四反相器INV4_1的输入端输入不同电平,即可实现控制锁存电路1432是否进行锁存。因为输出缓冲电路14的输入端的电平等于第六晶体管M6的第一极处的电平,该电平用于指示存储单元21中的数据的取值。而该电平被输入锁存电路1432中的第五反相器INV5_1后,输出与存储单元21中的数据相反的电平,而经过第五反相器INV5_2后,输出为与存储单元21中的数据对应的电平,而经过第五反相器INV5_3后,从锁存电路1432输出的电平的取值与第二存储点NBIT中存储的数据的取值相同,并与第一存储点BIT中存储的数据的取值相反。所以,当第一存储点BIT中存储的数据作为存储单元21中存储的数据时,还需要经过第二反相器INV2对锁存电路1432输出的电平进行反相,得到用于指示第一存储点BIT中存储的数据的取值所对应的电平。In an embodiment of the present application, as shown in Figure 17, the latch circuit 1432 includes three fifth inverters INV5 in cascade. As shown in Figure 18, each fifth inverter INV5 can be an inverter including a PMOS transistor and an NMOS transistor. The gate of the PMOS transistor and the gate of the NMOS transistor are coupled together as the input end of the fifth inverter INV5, and the second pole of the PMOS transistor and the first pole of the NMOS transistor are coupled together as the output end of the fifth inverter INV5. When a low level is input to the input end of the fifth inverter INV5, the PMOS transistor is turned on and the NMOS transistor is turned off. At this time, if the first pole of the PMOS transistor (i.e., the first voltage end of the fifth inverter INV5) is input with a high level, a high level can be output from the second pole of the PMOS transistor (i.e., the output end of the fifth inverter INV5), thereby realizing the inversion effect. On the contrary, if a low level is input from the first pole of the PMOS transistor (i.e., the first voltage end of the fifth inverter INV5), the fifth inverter INV5 is not inverted. Similarly, if a high level is input to the input end of the fifth inverter INV5, so that the PMOS transistor is turned off and the NMOS transistor is turned on, at this time, if the second pole of the NMOS transistor (i.e., the second voltage end of the fifth inverter INV5) is input with a low level, a low level can be output from the first pole of the NMOS transistor (i.e., the output end of the fifth inverter INV5), thereby achieving the inversion effect, on the contrary, if a high level is input from the second pole of the NNMOS transistor (i.e., the second voltage end of the fifth inverter INV5), the fifth inverter INV5 does not perform inversion. As shown in FIG17 , the clock control circuit 1431 includes two cascaded fourth inverters INV4, and the control signal output by the fourth inverter INV4_1 and the control signal output by the fourth inverter INV4_2 are always at opposite levels. The output end of the fourth inverter INV4_1 is coupled to the first voltage end of the fifth inverter INV5_1 and the first voltage end of the fifth inverter INV5_3, and the output end of the fourth inverter INV4_2 is coupled to the second voltage end of the fifth inverter INV5_1 and the second voltage end of the fifth inverter INV5_3; or, the output end of the fourth inverter INV4_1 is coupled to the second voltage end of the fifth inverter INV5_1 and the second voltage end of the fifth inverter INV5_3, and the output end of the fourth inverter INV4_2 is coupled to the first voltage end of the fifth inverter INV5_1 and the first voltage end of the fifth inverter INV5_3. By inputting different levels to the input end of the fourth inverter INV4_1, it is possible to control whether the latch circuit 1432 is latched. Because the level of the input end of the output buffer circuit 14 is equal to the level at the first pole of the sixth transistor M6, the level is used to indicate the value of the data in the storage unit 21. After the level is input into the fifth inverter INV5_1 in the latch circuit 1432, the level opposite to the data in the storage unit 21 is output, and after passing through the fifth inverter INV5_2, the level corresponding to the data in the storage unit 21 is output, and after passing through the fifth inverter INV5_3, the value of the level output from the latch circuit 1432 is the same as the value of the data stored in the second storage point NBIT, and opposite to the value of the data stored in the first storage point BIT. Therefore, when the data stored in the first storage point BIT is used as the data stored in the storage unit 21, the level output by the latch circuit 1432 needs to be inverted through the second inverter INV2 to obtain the level corresponding to the value of the data stored in the first storage point BIT.

示例性地,可以设置时钟控制信号,该时钟控制信号可以由计数器、时钟单元等生成。该时钟控制信号为固定周期的信号,包括具有固定的有效脉宽(即持续的高电平)的控制信号。将该时钟控制信号输入时钟控制电路1431的输入端(即第四反相器INV4_1的输入端),从而实现周期性地对读取的数据进行锁存。同时,根据该时钟控制信号的周期,与输出缓冲电路14的输出端耦合的后级器件也可以周期性地获取读取的数据。Exemplarily, a clock control signal can be set, and the clock control signal can be generated by a counter, a clock unit, etc. The clock control signal is a fixed-cycle signal, including a control signal with a fixed effective pulse width (i.e., a continuous high level). The clock control signal is input to the input end of the clock control circuit 1431 (i.e., the input end of the fourth inverter INV4_1), so as to periodically latch the read data. At the same time, according to the cycle of the clock control signal, the subsequent device coupled to the output end of the output buffer circuit 14 can also periodically obtain the read data.

示例性地,上述步骤S120和步骤S130,在具体实施时,可以先实施步骤S120,再实施步骤S130。也可以将步骤S120和步骤S130同步进行实施。当同步实施步骤S120和步骤S130时,可以减少读取数据的时长,避免通过位线放电电路13对读取位线RBL进行放电的操作增长读取数据的时长。For example, in the specific implementation of the above step S120 and step S130, step S120 may be implemented first, and then step S130. Step S120 and step S130 may also be implemented synchronously. When step S120 and step S130 are implemented synchronously, the time for reading data can be reduced, and the operation of discharging the read bit line RBL through the bit line discharge circuit 13 is avoided to increase the time for reading data.

以步骤S120和步骤S130同步进行实施为例,在采用包括如图17、图19和图22所示的结构的存储器10时,当读取数据的取值为0时,各信号电压或电平状态的时序变化如图24所示;当读取数据的取值为1时,各信号电压或电平状态的时序变化如图25所示。Taking the simultaneous implementation of step S120 and step S130 as an example, when using a memory 10 including a structure as shown in Figures 17, 19 and 22, when the value of the read data is 0, the timing changes of each signal voltage or level state are as shown in Figure 24; when the value of the read data is 1, the timing changes of each signal voltage or level state are as shown in Figure 25.

本申请实施例提供了一种存储器、数据读取方法、芯片系统及电子设备,该存储器中包括存储单元阵列和外围电路。存储单元阵列包括存储单元和读取位线。当存储单元阵列中的部分存储单元或者全部存储单元为单端读取型存储单元时,外围电路包括位线充电电路、位线放电电路和读取电路。存储单元通过读取位线预读取电路耦合。位线充电电路和位线放电电路分别耦合至读取位线上。在对该存储单元进行数据读取时,分为两个阶段:位线预充电阶段和读取存储数据阶段。在位线预充电阶段中,通过位线充电电路将读取位线的数据电压充电至第一电压值。在读取存储数据阶段,导通存储单元,存储单元中的存储电压的电压值不同,读取位线上的数据电压的电压值也不同。读取电路根据当前读取位线上的数据电压的电压值判断存储单元中的存储电压所指示的数据的取值。而到存储单元中的数据的取值为0时,数据电压需要从第一电压值下降到读值比较电压以下,读取电路才能判断出存储单元中的数据的取值为0。因第一电压值与读值比较电压之间的差值较大,需要较长的放电时间,才能使得数据电压下降到读值比较电压以下。这将导致存储器的读取速率的下降。而在本申请实施例中,在位线预充电阶段,当数据电压的电压值在第一电压值后,通过位线放电电路将数据电压的电压值放电到第二电压值,该第二电压值大于读值比较电压。然后在读取存储数据阶段,当存储单元中的数据的取值为0时,数据电压从第二电压值下降到读值比较电压以下,因第二电压值与读值比较电压之间的差值较小,使得对该存储单元的读取速度更快,从而提高了该存储器的读取速率。The embodiment of the present application provides a memory, a data reading method, a chip system and an electronic device, wherein the memory includes a memory cell array and a peripheral circuit. The memory cell array includes memory cells and a read bit line. When some or all of the memory cells in the memory cell array are single-ended read memory cells, the peripheral circuit includes a bit line charging circuit, a bit line discharging circuit and a reading circuit. The memory cell is coupled through a read bit line pre-reading circuit. The bit line charging circuit and the bit line discharging circuit are respectively coupled to the read bit line. When data is read from the memory cell, it is divided into two stages: a bit line pre-charging stage and a read storage data stage. In the bit line pre-charging stage, the data voltage of the read bit line is charged to a first voltage value by the bit line charging circuit. In the read storage data stage, the memory cell is turned on, and the voltage value of the storage voltage in the memory cell is different, and the voltage value of the data voltage on the read bit line is also different. The reading circuit determines the value of the data indicated by the storage voltage in the memory cell according to the voltage value of the data voltage on the current read bit line. When the value of the data in the memory cell is 0, the data voltage needs to drop from the first voltage value to below the read value comparison voltage, and the reading circuit can determine that the value of the data in the memory cell is 0. Because the difference between the first voltage value and the read value comparison voltage is large, a longer discharge time is required to make the data voltage drop below the read value comparison voltage. This will lead to a decrease in the read rate of the memory. In the embodiment of the present application, in the bit line precharge stage, when the voltage value of the data voltage is after the first voltage value, the voltage value of the data voltage is discharged to a second voltage value through the bit line discharge circuit, and the second voltage value is greater than the read value comparison voltage. Then in the stage of reading the stored data, when the value of the data in the storage cell is 0, the data voltage drops from the second voltage value to below the read value comparison voltage. Because the difference between the second voltage value and the read value comparison voltage is small, the reading speed of the storage cell is faster, thereby improving the read rate of the memory.

本申请实施例涉及的处理器可以是一个芯片。例如,可以是现场可编程门阵列(field programmable gate array,FPGA),可以是专用集成芯片(application specificintegrated circuit,ASIC),还可以是系统芯片(system on chip,SoC),还可以是中央处理器(central processor unit,CPU),还可以是网络处理器(network processor,NP),还可以是数字信号处理电路(digital signal processor,DSP),还可以是微控制器(microcontroller unit,MCU),还可以是可编程控制器(programmable logic device,PLD)或其他集成芯片。The processor involved in the embodiments of the present application may be a chip. For example, it may be a field programmable gate array (FPGA), an application specific integrated circuit (ASIC), a system on chip (SoC), a central processor unit (CPU), a network processor (NP), a digital signal processor (DSP), a microcontroller unit (MCU), a programmable logic device (PLD), or other integrated chips.

本申请实施例涉及的存储器可以是易失性存储器或非易失性存储器,或可包括易失性和非易失性存储器两者。其中,非易失性存储器可以是只读存储器(read-onlymemory,ROM)、可编程只读存储器(programmable ROM,PROM)、可擦除可编程只读存储器(erasable PROM,EPROM)、电可擦除可编程只读存储器(electrically EPROM,EEPROM)或闪存。易失性存储器可以是随机存取存储器(random access memory,RAM),其用作外部高速缓存。通过示例性但不是限制性说明,许多形式的RAM可用,例如静态随机存取存储器(static RAM,SRAM)、动态随机存取存储器(dynamic RAM,DRAM)、同步动态随机存取存储器(synchronous DRAM,SDRAM)、双倍数据速率同步动态随机存取存储器(double data rateSDRAM,DDR SDRAM)、增强型同步动态随机存取存储器(enhanced SDRAM,ESDRAM)、同步连接动态随机存取存储器(synchlink DRAM,SLDRAM)和直接内存总线随机存取存储器(directrambus RAM,DR RAM)。应注意,本文描述的系统和方法的存储器旨在包括但不限于这些和任意其它适合类型的存储器。The memory involved in the embodiments of the present application may be a volatile memory or a non-volatile memory, or may include both volatile and non-volatile memories. Among them, the non-volatile memory may be a read-only memory (ROM), a programmable read-only memory (PROM), an erasable programmable read-only memory (EPROM), an electrically erasable programmable read-only memory (EEPROM), or a flash memory. The volatile memory may be a random access memory (RAM), which is used as an external cache. By way of example and not limitation, many forms of RAM are available, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double data rate SDRAM (DDR SDRAM), enhanced SDRAM (ESDRAM), synchronous link DRAM (SLDRAM), and direct RAM (DR RAM). It should be noted that the memory of the systems and methods described herein is intended to include, but is not limited to, these and any other suitable types of memory.

应理解,在本申请的各种实施例中,上述各过程的序号的大小并不意味着执行顺序的先后,各过程的执行顺序应以其功能和内在逻辑确定,而不应对本申请实施例的实施过程构成任何限定。It should be understood that in the various embodiments of the present application, the size of the serial numbers of the above-mentioned processes does not mean the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present application.

本领域普通技术人员可以意识到,结合本文中所公开的实施例描述的各示例的模块及算法步骤,能够以电子硬件、或者计算机软件和电子硬件的结合来实现。这些功能究竟以硬件还是软件方式来执行,取决于技术方案的特定应用和设计约束条件。专业技术人员可以对每个特定的应用来使用不同方法来实现所描述的功能,但是这种实现不应认为超出本申请的范围。Those of ordinary skill in the art will appreciate that the modules and algorithm steps of each example described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, or a combination of computer software and electronic hardware. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. Professional and technical personnel can use different methods to implement the described functions for each specific application, but such implementation should not be considered to be beyond the scope of this application.

所属领域的技术人员可以清楚地了解到,为描述的方便和简洁,上述描述的系统、装置和模块的具体工作过程,可以参考前述方法实施例中的对应过程,在此不再赘述。Those skilled in the art can clearly understand that, for the convenience and brevity of description, the specific working processes of the systems, devices and modules described above can refer to the corresponding processes in the aforementioned method embodiments and will not be repeated here.

在本申请所提供的几个实施例中,应该理解到,所揭露的系统、设备和方法,可以通过其它的方式实现。例如,以上所描述的设备实施例仅仅是示意性的,例如,所述模块的划分,仅仅为一种逻辑功能划分,实际实现时可以有另外的划分方式,例如多个模块或组件可以结合或者可以集成到另一个设备,或一些特征可以忽略,或不执行。另一点,所显示或讨论的相互之间的耦合或直接耦合或通信连接可以是通过一些接口,设备或模块的间接耦合或通信连接,可以是电性,机械或其它的形式。In the several embodiments provided in the present application, it should be understood that the disclosed systems, devices and methods can be implemented in other ways. For example, the device embodiments described above are only schematic. For example, the division of the modules is only a logical function division. There may be other division methods in actual implementation, such as multiple modules or components can be combined or integrated into another device, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, indirect coupling or communication connection of devices or modules, which can be electrical, mechanical or other forms.

所述作为分离部件说明的模块可以是或者也可以不是物理上分开的,作为模块显示的部件可以是或者也可以不是物理模块,即可以位于一个设备,或者也可以分布到多个设备上。可以根据实际的需要选择其中的部分或者全部模块来实现本实施例方案的目的。The modules described as separate components may or may not be physically separated, and the components shown as modules may or may not be physical modules, that is, they may be located in one device or distributed on multiple devices. Some or all of the modules may be selected according to actual needs to achieve the purpose of the present embodiment.

另外,在本申请各个实施例中的各功能模块可以集成在一个设备中,也可以是各个模块单独物理存在,也可以两个或两个以上模块集成在一个设备中。In addition, each functional module in each embodiment of the present application may be integrated into one device, or each module may exist physically separately, or two or more modules may be integrated into one device.

在上述实施例中,可以全部或部分地通过软件、硬件、固件或者其任意组合来实现。当使用软件程序实现时,可以全部或部分地以计算机程序产品的形式来实现。该计算机程序产品包括一个或多个计算机指令。在计算机上加载和执行计算机程序指令时,全部或部分地产生按照本申请实施例所述的流程或功能。所述计算机可以是通用计算机、专用计算机、计算机网络、或者其他可编程装置。所述计算机指令可以存储在计算机可读存储介质中,或者从一个计算机可读存储介质向另一个计算机可读存储介质传输,例如,所述计算机指令可以从一个网站站点、计算机、服务器或者数据中心通过有线(例如同轴电缆、光纤、数字用户线(Digital Subscriber Line,DSL))或无线(例如红外、无线、微波等)方式向另一个网站站点、计算机、服务器或数据中心进行传输。所述计算机可读存储介质可以是计算机能够存取的任何可用介质或者是包含一个或多个可以用介质集成的服务器、数据中心等数据存储设备。所述可用介质可以是磁性介质(例如,软盘、硬盘、磁带),光介质(例如,DVD)、或者半导体介质(例如固态硬盘(Solid State Disk,SSD))等。In the above embodiments, it can be implemented in whole or in part by software, hardware, firmware or any combination thereof. When implemented using a software program, it can be implemented in whole or in part in the form of a computer program product. The computer program product includes one or more computer instructions. When loading and executing computer program instructions on a computer, the process or function described in the embodiment of the present application is generated in whole or in part. The computer may be a general-purpose computer, a special-purpose computer, a computer network, or other programmable devices. The computer instructions may be stored in a computer-readable storage medium, or transmitted from one computer-readable storage medium to another computer-readable storage medium, for example, the computer instructions may be transmitted from a website site, computer, server or data center by wired (e.g., coaxial cable, optical fiber, digital subscriber line (Digital Subscriber Line, DSL)) or wireless (e.g., infrared, wireless, microwave, etc.) mode to another website site, computer, server or data center. The computer-readable storage medium may be any available medium that a computer can access or may contain one or more servers, data centers and other data storage devices that can be integrated with a medium. The available medium may be a magnetic medium (eg, a floppy disk, a hard disk, a magnetic tape), an optical medium (eg, a DVD), or a semiconductor medium (eg, a solid state disk (SSD)).

以上所述,仅为本申请的具体实施方式,但本申请的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本申请揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本申请的保护范围之内。因此,本申请的保护范围应以所述权利要求的保护范围为准。The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art who is familiar with the present technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

Claims (25)

1.一种存储器,其特征在于,包括存储单元阵列、读取位线、读取电路和位线放电电路;所述存储单元阵列包括存储单元;所述存储单元通过所述读取位线与所述读取电路的输入端耦合;所述位线放电电路包括第一晶体管;所述第一晶体管的第一极与所述读取位线耦合;所述第一晶体管的第二极接地或连接负电压;所述第一晶体管的栅极用于输入第一控制信号;所述第一控制信号用于控制所述第一晶体管导通或关断。1. A memory, characterized in that it comprises a memory cell array, a read bit line, a read circuit and a bit line discharge circuit; the memory cell array comprises a memory cell; the memory cell is coupled to an input end of the read circuit through the read bit line; the bit line discharge circuit comprises a first transistor; a first electrode of the first transistor is coupled to the read bit line; a second electrode of the first transistor is grounded or connected to a negative voltage; a gate of the first transistor is used to input a first control signal; and the first control signal is used to control the first transistor to be turned on or off. 2.根据权利要求1所述的存储器,其特征在于,所述位线放电电路包括第一晶体管、第二晶体管和储能单元;所述第一晶体管的第一极与所述读取位线耦合;所述第一晶体管的第二极与所述储能单元的第一端耦合;所述储能单元的第二端与所述第二晶体管的第一极耦合;所述第二晶体管的第二极接地或者连接负电压;所述第一晶体管的栅极用于输入第一控制信号;所述第二晶体管的栅极用于输入第二控制信号;所述第一控制信号用于控制所述第一晶体管导通或关断,所述第二控制信号用于控制所述第二晶体管导通或关断。2. The memory according to claim 1 is characterized in that the bit line discharge circuit includes a first transistor, a second transistor and an energy storage unit; the first electrode of the first transistor is coupled to the read bit line; the second electrode of the first transistor is coupled to the first end of the energy storage unit; the second end of the energy storage unit is coupled to the first electrode of the second transistor; the second electrode of the second transistor is grounded or connected to a negative voltage; the gate of the first transistor is used to input a first control signal; the gate of the second transistor is used to input a second control signal; the first control signal is used to control the first transistor to be turned on or off, and the second control signal is used to control the second transistor to be turned on or off. 3.根据权利要求2所述的存储器,其特征在于,所述储能单元包括金属线耦合电容;所述第一晶体管的第二极与所述金属线耦合电容的第一极耦合;所述金属线耦合电容的第二极与所述第二晶体管的第一极耦合。3. The memory according to claim 2 is characterized in that the energy storage unit includes a metal line coupling capacitor; the second electrode of the first transistor is coupled to the first electrode of the metal line coupling capacitor; the second electrode of the metal line coupling capacitor is coupled to the first electrode of the second transistor. 4.根据权利要求3所述的存储器,其特征在于,所述金属线耦合电容包括第一缠绕金属线和第二缠绕金属线;所述第一缠绕金属线为所述金属线耦合电容的第一极,所述第二缠绕金属线为所述金属线耦合电容的第二极;所述第一缠绕金属线的总长度和第二缠绕金属线的总长度分别与所述读取位线上耦合的所述存储单元的数量对应。4. The memory according to claim 3 is characterized in that the metal wire coupling capacitor includes a first winding metal wire and a second winding metal wire; the first winding metal wire is the first pole of the metal wire coupling capacitor, and the second winding metal wire is the second pole of the metal wire coupling capacitor; the total length of the first winding metal wire and the total length of the second winding metal wire respectively correspond to the number of the storage units coupled to the read bit line. 5.根据权利要求4所述的存储器,其特征在于,所述存储器还包括金属层;所述第一缠绕金属线和所述第二缠绕金属线设置在所述金属层中。5 . The memory according to claim 4 , wherein the memory further comprises a metal layer; and the first winding metal wire and the second winding metal wire are arranged in the metal layer. 6.根据权利要求3-5任一项所述的存储器,其特征在于,所述储能单元还包括至少一个可调电容组;一个所述可调电容组包括第三晶体管和第一电容;6. The memory according to any one of claims 3 to 5, characterized in that the energy storage unit further comprises at least one adjustable capacitor group; one of the adjustable capacitor groups comprises a third transistor and a first capacitor; 所述第三晶体管的第一极与所述金属线耦合电容耦合;所述第三晶体管的第二极与所述第一电容耦合。The first electrode of the third transistor is coupled to the metal line coupling capacitor; the second electrode of the third transistor is coupled to the first capacitor. 7.根据权利要求3-6任一项所述的存储器,其特征在于,所述位线放电电路还包括开关控制电路;所述开关控制电路分别与所述第一晶体管的栅极、所述第二晶体管的栅极耦合;所述开关控制电路用于向所述第一晶体管的栅极输出所述第一控制信号,向所述第二晶体管的栅极输出所述第二控制信号。7. The memory according to any one of claims 3-6 is characterized in that the bit line discharge circuit also includes a switch control circuit; the switch control circuit is coupled to the gate of the first transistor and the gate of the second transistor respectively; the switch control circuit is used to output the first control signal to the gate of the first transistor and output the second control signal to the gate of the second transistor. 8.根据权利要求7所述的存储器,其特征在于,所述开关控制电路包括与非门和第一反相器;所述第一反相器的输出端分别与所述与非门的第一输入端、所述第二晶体管的栅极耦合,所述第一反相器的输出端用于输出所述第二控制信号;所述与非门的第二输入端用于输入使能信号;所述与非门的输出端与所述第一晶体管的栅极耦合;所述与非门的输出端用于输出所述第一控制信号。8. The memory according to claim 7 is characterized in that the switch control circuit includes a NAND gate and a first inverter; the output end of the first inverter is coupled with the first input end of the NAND gate and the gate of the second transistor respectively, and the output end of the first inverter is used to output the second control signal; the second input end of the NAND gate is used to input an enable signal; the output end of the NAND gate is coupled with the gate of the first transistor; the output end of the NAND gate is used to output the first control signal. 9.根据权利要求1-8任一项所述的存储器,其特征在于,所述存储器还包括输出缓冲电路;所述输出缓冲电路的输入端与所述读取电路的输出端耦合;所述输出缓冲电路用于周期性锁存所述读取电路输出的数据。9. The memory according to any one of claims 1-8 is characterized in that the memory further comprises an output buffer circuit; the input end of the output buffer circuit is coupled to the output end of the read circuit; the output buffer circuit is used to periodically latch the data output by the read circuit. 10.根据权利要求9所述的存储器,其特征在于,所述输出缓冲电路包括第一充电电路、高电平保持电路和锁存器;所述锁存器的输入端为所述输出缓冲电路的输入端,所述锁存器的输入端与所述读取电路的输出端耦合;所述第一充电电路的输出端、所述高电平保持电路的保持端分别与所述锁存器的输入端耦合;所述第一充电电路用于向所述读取电路的输出端输出为高电平的电压。10. The memory according to claim 9 is characterized in that the output buffer circuit comprises a first charging circuit, a high-level holding circuit and a latch; the input end of the latch is the input end of the output buffer circuit, and the input end of the latch is coupled to the output end of the reading circuit; the output end of the first charging circuit and the holding end of the high-level holding circuit are respectively coupled to the input end of the latch; the first charging circuit is used to output a high-level voltage to the output end of the reading circuit. 11.根据权利要求10所述的存储器,其特征在于,所述锁存器包括时钟控制电路和锁存电路;所述时钟控制电路包括级联的两个第四反相器;所述锁存电路包括级联的三个第五反相器;第一级的所述第五反相器的输入端作为所述锁存器的输入端;第三级的所述第五反相器的输出端作为所述锁存器的输出端;11. The memory according to claim 10, characterized in that the latch comprises a clock control circuit and a latch circuit; the clock control circuit comprises two cascaded fourth inverters; the latch circuit comprises three cascaded fifth inverters; the input end of the first stage of the fifth inverter serves as the input end of the latch; the output end of the third stage of the fifth inverter serves as the output end of the latch; 第一级的所述第四反相器的输出端与第一级的所述第五反相器的第一电压端和第三级的所述第五反相器的第一电压端耦合;第二级的所述第四反相器的输出端还与第一级的所述第五反相器的第二电压端和第三级的所述第五反相器的第二电压端耦合。The output end of the fourth inverter of the first stage is coupled with the first voltage end of the fifth inverter of the first stage and the first voltage end of the fifth inverter of the third stage; the output end of the fourth inverter of the second stage is also coupled with the second voltage end of the fifth inverter of the first stage and the second voltage end of the fifth inverter of the third stage. 12.根据权利要求10或11所述的存储器,其特征在于,所述输出缓冲电路还包括第二反相器;所述第二反相器的输入端与所述锁存器的输出端耦合。12 . The memory according to claim 10 , wherein the output buffer circuit further comprises a second inverter; an input terminal of the second inverter is coupled to an output terminal of the latch. 13.根据权利要求1-12任一项所述的存储器,其特征在于,所述读取电路包括第三反相器和第六晶体管;所述第三反相器的输入端为所述读取电路的输入端,且所述第三反相器的输入端与所述读取位线耦合;所述第三反相器的输出端与所述第六晶体管的栅极耦合;所述第六晶体管的第二极接地或者连接负电压;所述第六晶体管的第一极为所述读取电路的输出端。13. The memory according to any one of claims 1-12 is characterized in that the read circuit includes a third inverter and a sixth transistor; the input end of the third inverter is the input end of the read circuit, and the input end of the third inverter is coupled to the read bit line; the output end of the third inverter is coupled to the gate of the sixth transistor; the second pole of the sixth transistor is grounded or connected to a negative voltage; the first pole of the sixth transistor is the output end of the read circuit. 14.根据权利要求13所述的存储器,其特征在于,所述存储器还包括状态保持器,所述状态保持器包括第四晶体管;所述第四晶体管的第二极与所述读取位线耦合;所述第四晶体管的栅极与所述第三反相器的输出端耦合。14. The memory according to claim 13, characterized in that the memory further comprises a state holder, the state holder comprising a fourth transistor; a second electrode of the fourth transistor is coupled to the read bit line; and a gate of the fourth transistor is coupled to the output end of the third inverter. 15.根据权利要求14所述的存储器,其特征在于,所述状态保持器还包括至少一个第五晶体管;所述至少一个第五晶体管与所述第四晶体管的第一极耦合,且所述至少一个第五晶体管与所述第四晶体管串联。15. The memory according to claim 14, wherein the state holder further comprises at least one fifth transistor; the at least one fifth transistor is coupled to the first electrode of the fourth transistor, and the at least one fifth transistor is connected in series with the fourth transistor. 16.根据权利要求1-15任一项所述的存储器,其特征在于,所述存储器还包括位线充电电路;所述位线充电电路与所述读取位线耦合。16 . The memory according to claim 1 , further comprising a bit line charging circuit; wherein the bit line charging circuit is coupled to the read bit line. 17.一种数据读取方法,其特征在于,应用于存储器;所述存储器包括存储单元阵列、读取位线和位线放电电路;所述存储单元阵列包括存储单元;所述存储单元和所述位线放电电路分别与所述读取位线耦合;所述方法包括:17. A data reading method, characterized in that it is applied to a memory; the memory comprises a memory cell array, a read bit line and a bit line discharge circuit; the memory cell array comprises a memory cell; the memory cell and the bit line discharge circuit are respectively coupled to the read bit line; the method comprises: 控制所述位线放电电路将所述读取位线上的数据电压的电压值从第一电压值放电到第二电压值;所述第二电压值大于读值比较电压;Controlling the bit line discharge circuit to discharge the voltage value of the data voltage on the read bit line from a first voltage value to a second voltage value; the second voltage value is greater than the read value comparison voltage; 导通所述存储单元和所述读取位线;Turning on the memory cell and the read bit line; 根据所述数据电压的电压值得到所述存储单元中的数据的取值;当所述数据电压的电压值大于所述读值比较电压时,判断所述存储单元中的数据的取值为第一取值;当所述数据电压的电压值小于所述读值比较电压时,判断所述存储单元中的数据的取值为第二取值。The value of the data in the storage cell is obtained according to the voltage value of the data voltage; when the voltage value of the data voltage is greater than the read value comparison voltage, the value of the data in the storage cell is determined to be a first value; when the voltage value of the data voltage is less than the read value comparison voltage, the value of the data in the storage cell is determined to be a second value. 18.根据权利要求17所述的方法,其特征在于,所述控制所述位线放电电路将所述读取位线上的数据电压的电压值从第一电压值放电到第二电压值,包括:18. The method according to claim 17, wherein controlling the bit line discharge circuit to discharge the voltage value of the data voltage on the read bit line from a first voltage value to a second voltage value comprises: 控制所述位线放电电路的放电时间,将所述读取位线上的数据电压的电压值从所述第一电压值放电到所述第二电压值。The discharge time of the bit line discharge circuit is controlled to discharge the voltage value of the data voltage on the read bit line from the first voltage value to the second voltage value. 19.根据权利要求17所述的方法,其特征在于,所述控制所述位线放电电路将所述读取位线上的数据电压的电压值从第一电压值放电到第二电压值,包括:19. The method according to claim 17, wherein controlling the bit line discharge circuit to discharge the voltage value of the data voltage on the read bit line from a first voltage value to a second voltage value comprises: 控制所述位线放电电路与所述读取位线导通,将所述读取位线上的数据电压的电压值从所述第一电压值放电到所述第二电压值。The bit line discharge circuit is controlled to be conductive with the read bit line, so that the voltage value of the data voltage on the read bit line is discharged from the first voltage value to the second voltage value. 20.根据权利要求19所述的方法,其特征在于,所述位线放电电路包括金属线耦合电容;所述控制所述位线放电电路与所述读取位线导通,将所述读取位线上的数据电压的电压值从所述第一电压值放电到所述第二电压值,包括:20. The method according to claim 19, wherein the bit line discharge circuit comprises a metal line coupling capacitor; and the step of controlling the bit line discharge circuit to be conductive with the read bit line to discharge the voltage value of the data voltage on the read bit line from the first voltage value to the second voltage value comprises: 控制所述金属线耦合电容与所述读取位线导通,将所述读取位线上的数据电压的电压值从所述第一电压值放电到所述第二电压值。The metal line coupling capacitor is controlled to be conductive with the read bit line, so that the voltage value of the data voltage on the read bit line is discharged from the first voltage value to the second voltage value. 21.根据权利要求20所述的方法,其特征在于,所述位线放电电路还包括至少一个第一电容;所述方法还包括:21. The method according to claim 20, wherein the bit line discharge circuit further comprises at least one first capacitor; the method further comprises: 根据第一电压差和/或第一数量控制每个所述第一电容是否与所述金属线耦合电容导通,以调整所述位线放电电路的放电量;所述第一电压差为所述第一电压值与所述读值比较电压之差;所述第一数量为单条所述读取位线上所耦合的所述存储单元的数量。Whether each of the first capacitors is turned on with the metal line coupling capacitor is controlled according to a first voltage difference and/or a first quantity to adjust the discharge amount of the bit line discharge circuit; the first voltage difference is the difference between the first voltage value and the read value comparison voltage; the first quantity is the number of the storage cells coupled to the single read bit line. 22.根据权利要求19-21任一项所述的方法,其特征在于,所述方法还包括:22. The method according to any one of claims 19 to 21, characterized in that the method further comprises: 通过第一控制信号控制所述位线放电电路是否存储所述读取位线上的电荷;Controlling whether the bit line discharge circuit stores the charge on the read bit line by a first control signal; 通过第二控制信号控制所述位线放电电路是否释放所述位线放电电路中存储的电荷。Whether the bit line discharge circuit releases the charges stored in the bit line discharge circuit is controlled by a second control signal. 23.根据权利要求17-22任一项所述的方法,其特征在于,所述方法还包括:23. The method according to any one of claims 17 to 22, characterized in that the method further comprises: 在根据所述数据电压的电压值得到所述存储单元中的数据的取值后,对得到的所述存储单元中的数据进行锁存后输出。After the value of the data in the storage unit is obtained according to the voltage value of the data voltage, the obtained data in the storage unit is latched and then output. 24.一种芯片系统,其特征在于,包括处理器和如权利要求1-16任一项所述的存储器;所述处理器用于向所述存储器中写入数据、读取所述存储器中存储的数据,或者,刷新所述存储器中存储的数据。24. A chip system, characterized in that it comprises a processor and a memory as described in any one of claims 1 to 16; the processor is used to write data into the memory, read data stored in the memory, or refresh data stored in the memory. 25.一种电子设备,其特征在于,包括如权利要求24所述的芯片系统和电路板,所述芯片系统设置在所述电路板上。25. An electronic device, characterized in that it comprises the chip system and a circuit board as claimed in claim 24, wherein the chip system is arranged on the circuit board.
CN202211552336.XA 2022-12-05 2022-12-05 Memory, data reading method, chip system and electronic equipment Pending CN118155682A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202211552336.XA CN118155682A (en) 2022-12-05 2022-12-05 Memory, data reading method, chip system and electronic equipment
PCT/CN2023/121750 WO2024119984A1 (en) 2022-12-05 2023-09-26 Memory, data reading method, chip system, and electronic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202211552336.XA CN118155682A (en) 2022-12-05 2022-12-05 Memory, data reading method, chip system and electronic equipment

Publications (1)

Publication Number Publication Date
CN118155682A true CN118155682A (en) 2024-06-07

Family

ID=91300459

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202211552336.XA Pending CN118155682A (en) 2022-12-05 2022-12-05 Memory, data reading method, chip system and electronic equipment

Country Status (2)

Country Link
CN (1) CN118155682A (en)
WO (1) WO2024119984A1 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3529965B2 (en) * 1996-12-18 2004-05-24 株式会社東芝 Nonvolatile semiconductor memory device
US6831871B2 (en) * 2002-12-30 2004-12-14 Intel Corporation Stable memory cell read
TWI295806B (en) * 2005-11-24 2008-04-11 Via Tech Inc Output circuit of sram
US20150085592A1 (en) * 2013-09-20 2015-03-26 Lsi Corporation Bit-Line Discharge Assistance in Memory Devices
US10431269B2 (en) * 2015-02-04 2019-10-01 Altera Corporation Methods and apparatus for reducing power consumption in memory circuitry by controlling precharge duration
CN117616501A (en) * 2021-10-26 2024-02-27 华为技术有限公司 single-ended memory

Also Published As

Publication number Publication date
WO2024119984A1 (en) 2024-06-13

Similar Documents

Publication Publication Date Title
CN112997251B (en) Device with row hammer address latch mechanism
US8009459B2 (en) Circuit for high speed dynamic memory
US20140321188A1 (en) Memory devices having data lines included in top and bottom conductive lines
US10163490B2 (en) P-type field-effect transistor (PFET)-based sense amplifiers for reading PFET pass-gate memory bit cells, and related memory systems and methods
JP6308218B2 (en) Semiconductor memory device
CN107945830A (en) A kind of non-volatile three-state content addressing memory and its addressing method
CN118116429A (en) Word line control circuit and magnetic random access memory
CN116403626A (en) SRAM memory cell, SRAM memory and circuit chip
WO2023278189A1 (en) Memory write methods and circuits
CN107919155A (en) A kind of non-volatile three-state content addressing memory and its addressing method
JP6287043B2 (en) Semiconductor memory device
CN118939232A (en) Storage and computing integrated module, chip and electronic device based on input data sparsity
CN118155682A (en) Memory, data reading method, chip system and electronic equipment
US20220148642A1 (en) Word lines coupled to pull-down transistors, and related devices, systems, and methods
CN118280410A (en) 10T1C-SRAM memory cell, memory array, and memory circuit
WO2024250813A1 (en) Refresh circuit and memory
CN117350344A (en) A neural network circuit structure, storage and calculation module, component, system and operation method
CN104867522A (en) High-speed low-power consumption charge pump SRAM and implementation method therefor
CN119179447B (en) High-bandwidth flash memory, data reading method and memory chip
US12237009B2 (en) Sense amplifier circuit, memory circuit, and sensing method thereof
CN116453559B (en) ROM bit line precharge voltage control circuit
CN118248187A (en) Memory, driving method, memory system and electronic equipment
US20250264992A1 (en) Sensing within an embedded dynamic random access memories (drams) having reference cells
Raghavendra et al. Comparative analysis of MOSFET and FINFET DRAM N* N Array
CN118866029A (en) Memory, storage devices and electronic devices

Legal Events

Date Code Title Description
PB01 Publication