CN118202139A - Controller for aftertreatment system and method for configuring pump and dispenser - Google Patents

Abstract

A controller for use in an aftertreatment system including a dispenser configured to dispense reductant into a decomposition chamber and a pump configured to supply reductant to the dispenser, the controller being configured to be operably coupled to the dispenser and the pump and programmed to cause the pump and the dispenser to operate in an idle mode in which the pump supplies reductant from a reductant tank to the dispenser in a steady state, the dispenser does not dispense reductant, and the reductant supplied to the dispenser by the pump is recirculated to the reductant tank. The controller is further programmed to determine a first speed of the pump required to achieve a predetermined target pressure when the pump and dispenser are operating in an idle mode. The controller is also programmed to operate the pump and the dispenser in a dispensing mode.

Description

Controller for aftertreatment system and method for configuring pump and dispenser

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to and the benefit of U.S. Provisional Application No. 63/286,231, filed on December 6, 2021, the entire disclosure of which is incorporated herein by reference.

Technical Field

The present application generally relates to systems and methods for improving aftertreatment systems based on different pump speeds achieved in different modes.

background

For internal combustion engines, such as diesel engines, nitrogen oxide ( _NOx ) compounds may be emitted in the exhaust. It may be desirable to reduce _NOx emissions, for example, to comply with environmental regulations. To reduce _NOx emissions, a reductant may be dosed into the exhaust through a doser. The reductant helps convert a portion of the exhaust into non- _NOx emissions, such as nitrogen ( _N2 ), carbon dioxide ( _CO2 ), and water ( _H2O ), thereby reducing _NOx emissions.

The post-treatment system may include a pump, a dispenser, and a controller to dispense or provide a reductant to the decomposition chamber. The dispenser may include a pressure sensor that generates a pressure value indicating the pressure of the dispenser. Based on the pressure measurement, the controller may control the dispensed amount by adjusting the pump, the dispenser, or both the pump and the dispenser. For example, based on the pressure measurement, the controller may determine whether the dispenser is over- or under-dispensing, and configure the pump, the dispenser, or both the pump and the dispenser to compensate for the over- or under-dispensing.

Overview

While existing methods of controlling or regulating a dispenser based on pressure sensor measurements may correct for errors due to pump variations, existing methods may not fully account for errors due to dispenser variations.

According to one embodiment of the present disclosure, a controller for an aftertreatment system is provided, the aftertreatment system including a dispenser configured to dispense a reductant into a decomposition chamber and a pump configured to supply the reductant to the dispenser. The controller is configured to be operably connected to the dispenser and the pump. The controller is programmed to: operate the pump and the dispenser in an idle mode, in which the pump supplies the reductant from the reductant tank to the dispenser in a stable state, the dispenser does not dispense the reductant, and the reductant supplied to the dispenser by the pump is recycled to the reductant tank; when the pump and the dispenser are operated in the idle mode, determine the first speed of the pump required to achieve a predetermined target pressure; operate the pump and the dispenser in a dosing mode, in which the pump supplies the reductant to the dispenser, and the dispenser dispenses the reductant into the decomposition chamber in a stable state; when the pump and the dispenser are operated in the dosing mode, determine the second speed of the pump required to achieve the predetermined target pressure; and generate commands based on the first speed and the second speed to configure the pump and the dispenser.

In one aspect, the dispenser includes a pressure sensor configured to provide a pressure measurement that has been adjusted by an offset pressure value. The controller is programmed to determine the offset pressure value based on the first speed and the second speed, and to generate a command based on the determined offset pressure value.

In one aspect, the controller is programmed to determine an effective orifice area of the dispenser based on the determined offset pressure value and to generate commands to configure the pump and the dispenser based on the determined effective orifice area.

In one aspect, the controller is programmed to determine a displacement of the pump based on the determined offset pressure value, and to generate commands to configure the pump and the dispenser based on the determined displacement.

In one aspect, the controller is programmed to update a pump flow model of the aftertreatment system based on the determined displacement and the determined effective orifice area, and to generate commands to configure the pump and the doser based on the updated pump flow model.

In one aspect, the controller is programmed to determine a duty cycle of the doser based on the effective orifice area and to generate commands to configure the pump and the doser based on the determined duty cycle of the doser.

In one aspect, the controller is programmed to determine an effective orifice area of the doser based on the first speed and the second speed, determine a duty cycle of the doser based on the effective orifice area, and generate commands to configure the pump and the doser based on the determined duty cycle of the doser.

According to another embodiment, a controller for an aftertreatment system is provided, the aftertreatment system including a first dispenser configured to dispense a reductant to a first decomposition chamber, a second dispenser configured to dispense the reductant to a second decomposition chamber, and a pump configured to supply the reductant to the first dispenser, the first dispenser being coupled between the pump and the second dispenser. The controller is configured to be operably coupled to the first dispenser, the second dispenser, and the pump. The controller is programmed to operate the pump, the first dispenser, and the second dispenser in an idle mode, in which the pump supplies the reductant from the reductant tank to the first dispenser in a steady state, the first dispenser and the second dispenser do not dispense the reductant, and the reductant supplied by the pump to the first dispenser and the second dispenser is recirculated to the reductant tank; determine a first speed of the pump required to achieve a predetermined target pressure when the pump, the first dispenser, and the second dispenser are operated in the idle mode; operate the pump, the first dispenser, and the second dispenser in a first dosing mode, in which the pump supplies the reductant to the first dispenser, the first dispenser dispenses the reductant into the first decomposition chamber in a steady state, and The second dispenser dispenses no reductant; when the pump, the first dispenser, and the second dispenser operate in the first dosing mode, determining a second speed of the pump required to achieve a predetermined target pressure; operating the pump, the first dispenser, and the second dispenser in a second dosing mode, in which the pump supplies the reductant to the first dispenser, the second dispenser dispenses the reductant into the second decomposition chamber in a steady state, and the first dispenser does not dispense the reductant; when the pump, the first dispenser, and the second dispenser operate in the second dosing mode, determining a third speed of the pump required to achieve a predetermined target pressure; and generating a command to configure the pump, the first dispenser, and the second dispenser based on the first speed, the second speed, and the third speed.

In one aspect, the pump is configured to supply reductant through the first doser to the second doser.

In one aspect, the second dispenser includes a pressure sensor configured to provide a pressure measurement that has been adjusted by an offset pressure value. The controller is programmed to determine the offset pressure value based on the first speed and the third speed, and to generate commands to configure the pump, the first dispenser, and the second dispenser based on the determined offset pressure value.

In one aspect, the controller is programmed to determine a first effective orifice area of the second doser based on the determined offset pressure value and to generate commands to configure the pump, the first doser, and the second doser based on the determined first effective orifice area.

In one aspect, the controller is programmed to determine a displacement of the pump based on the determined offset pressure value and to generate commands to configure the pump, the first doser, and the second doser based on the determined displacement.

In one aspect, the controller is programmed to determine a second effective orifice area of the first doser based on the determined displacement, first speed, and second speed of the pump, and to generate commands to configure the pump, the first doser, and the second doser based on the determined second effective orifice area.

In one aspect, the controller is configured to update a pump flow model of the aftertreatment system based on the determined displacement, the determined first effective orifice area, and the determined second effective orifice area, and generate commands to configure the pump, the first doser, and the second doser based on the updated pump flow model.

In one aspect, the controller is programmed to determine a dosing adjustment factor for the first doser based on the first effective orifice area and the second effective orifice area, and to generate a command to configure the first doser according to the dosing adjustment factor.

In one aspect, the controller is programmed to determine a displacement of the pump based on a first speed, determine a first effective orifice area based on the displacement of the pump, the first speed, and a second speed, determine a second effective orifice area based on the displacement of the pump, the first speed, and a third speed, determine a first dosing adjustment factor for a first doser based on the first effective orifice area, determine a second dosing adjustment factor for a second doser based on the second effective orifice area, and generate commands to configure the first doser and the second doser based on the first dosing adjustment factor and the second dosing adjustment factor.

According to another embodiment, a method for an aftertreatment system is provided, the aftertreatment system including a dispenser configured to dispense a reductant into a decomposition chamber and a pump configured to supply the reductant to the dispenser. The method includes: operating the pump and the dispenser in an idle mode by a processor, in which the pump supplies the reductant from the reductant tank to the dispenser in a steady state, the dispenser does not dispense the reductant, and the reductant supplied to the dispenser by the pump is recycled to the reductant tank; determining by the processor a first speed of the pump required to achieve a predetermined target pressure when the pump and the dispenser are operating in the idle mode; operating the pump and the dispenser in a dosing mode by the processor, in which the pump supplies the reductant to the dispenser, and the dispenser dispenses the reductant into the decomposition chamber in a steady state; determining by the processor a second speed of the pump required to achieve the predetermined target pressure while the pump and the dispenser are operating in the dosing mode; and generating by the processor a command to configure the pump and the dispenser based on the first speed and the second speed.

In one aspect, the dispenser includes a pressure sensor configured to provide a pressure measurement that has been adjusted by an offset pressure value. The method includes determining, by a processor, an offset pressure value based on a first speed and a second speed; and generating, by the processor, a command based on the determined offset pressure value.

In one aspect, the method includes determining, by a processor, an effective orifice area of a dispenser based on a determined offset pressure value; and determining, by the processor, a displacement of a pump based on the determined offset pressure value.

In one aspect, the method includes updating, by a processor, a pump flow model of the aftertreatment system based on the determined displacement and the determined effective orifice area; and generating, by the processor, commands to configure the pump and the dispenser based on the updated pump flow model.

In one aspect, the method includes determining, by a processor, a duty cycle of a doser based on an effective orifice area; and generating commands to configure a pump and a doser based on the determined duty cycle of the doser.

In one aspect, the method includes determining, by a processor, an effective orifice area of a doser based on a first speed and a second speed, determining, by the processor, a duty cycle of the doser based on the effective orifice area; and generating, by the processor, a command to configure a pump and the doser based on the determined duty cycle of the doser.

According to another embodiment, a method for an aftertreatment system is provided, the aftertreatment system including a first dispenser configured to dispense a reductant to a first decomposition chamber, a second dispenser configured to dispense a reductant to a second decomposition chamber, and a pump configured to supply the reductant to the first dispenser, the first dispenser being connected between the pump and the second dispenser. The method includes: operating the first dispenser and the second dispenser in an idle mode by a processor, in which the pump supplies the reductant from the reductant tank to the first dispenser in a steady state, the first dispenser and the second dispenser do not dispense the reductant, and the reductant supplied to the first dispenser and the second dispenser by the pump is recycled to the reductant tank; determining a first speed of the pump required to achieve a predetermined target pressure by a processor when the pump, the first dispenser and the second dispenser operate in the idle mode; operating the pump, the first dispenser and the second dispenser in a first dispensing mode by a processor, in which the pump supplies the reductant to the first dispenser, the first dispenser dispenses the reductant into the first decomposition chamber in a steady state, and the second dispenser does not dispense the reductant; dispensing the reductant; determining, by the processor, a second speed of the pump required to achieve a predetermined target pressure when the pump, the first dispenser, and the second dispenser are operated in a first dispensing mode; operating, by the processor, the pump, the first dispenser, and the second dispenser in a second dispensing mode, in which the pump supplies the reductant to the first dispenser, the second dispenser dispenses the reductant into the second decomposition chamber in a steady state, and the first dispenser does not dispense the reductant; determining, by the processor, a third speed of the pump required to achieve a predetermined target pressure when the pump, the first dispenser, and the second dispenser are operated in the second dispensing mode; and generating, by the processor, a command to configure the pump, the first dispenser, and the second dispenser based on the first speed, the second speed, and the third speed.

In one aspect, the second dispenser includes a pressure sensor configured to provide a pressure measurement value that has been adjusted by an offset pressure value. The method includes determining, by a processor, an offset pressure value based on a first speed and a third speed; and generating, by the processor, a command to configure the pump, the first dispenser, and the second dispenser according to the determined offset pressure value.

In one aspect, the method includes determining, by a processor, a first effective orifice area of a second dispenser based on a determined offset pressure value, determining, by the processor, a displacement of a pump based on the determined offset pressure value; and determining, by the processor, a second effective orifice area of the first dispenser based on the determined displacement, a first speed, and a second speed of the pump.

In one aspect, the method includes updating, by a processor, a pump flow model of the aftertreatment system based on the determined displacement, the determined first effective orifice area, and the determined second effective orifice area; and generating, by the processor, commands to configure the pump, the first doser, and the second doser based on the updated pump flow model.

In one aspect, the method includes determining, by a processor, a dosing adjustment factor for a first doser based on a first effective orifice area and a second effective orifice area; and generating, by the processor, a command to configure the first doser according to the dosing adjustment factor.

In one aspect, the method includes determining, by a processor, a displacement of a pump based on a first speed; determining, by a processor, a first effective orifice area based on the displacement of the pump, the first speed, and a second speed; determining, by a processor, a second effective orifice area based on the displacement of the pump, the first speed, and a third speed; determining, by a processor, a first dosing adjustment factor for a first dispenser based on the first effective orifice area; determining, by a processor, a second dosing adjustment factor for a second dispenser based on the second effective orifice area; and generating, by the processor, a command to configure the first dispenser and the second dispenser based on the first dosing adjustment factor and the second dosing adjustment factor.

BRIEF DESCRIPTION OF THE DRAWINGS

Details of various embodiments are set forth in the accompanying drawings and the following description. Other features, aspects, and advantages of the present disclosure will become apparent from the description, drawings, and claims, in which:

FIG1 is a schematic block diagram of an example aftertreatment system having a dispenser;

FIG2 is an example block diagram of an example post-processing system;

3 is a flow chart illustrating an example process for operating an aftertreatment system based on different pump speeds achieved in different modes;

4 is a flow chart illustrating an example process for operating an aftertreatment system based on different pump speeds achieved in different modes;

5 is a schematic block diagram of an example aftertreatment system having two dispensers;

FIG6 is an example block diagram of an example post-processing system;

7 is a flow chart illustrating an example process for operating an aftertreatment system based on different pump speeds achieved in different modes; and

8 is a flow chart illustrating an example process for operating an aftertreatment system based on different pump speeds achieved in different modes.

It will be appreciated that some or all of the drawings are schematic illustrations for illustrative purposes. The drawings are provided for the purpose of illustrating one or more embodiments, with the explicit understanding that they will not be used to limit the scope or meaning of the claims.

A detailed description

I. Overview

The following is a more detailed description of various concepts and embodiments related to methods, apparatus, and methods for implementing corrections to a reductant delivery system in an aftertreatment system of an internal combustion engine. The various concepts introduced above and discussed in more detail below can be implemented in any of a number of ways, as the concepts described are not limited to any particular implementation. Examples of specific embodiments and applications are provided primarily for illustrative purposes.

Disclosed herein are systems and methods for improving an aftertreatment system, the aftertreatment system including a pump, a dispenser, and a controller to dispense or provide a reductant to a decomposition chamber. In one aspect, different pump speeds are obtained in the following different modes: an idle mode and a dispensing mode. In the idle mode, the pump supplies the reductant from the reductant tank to the dispenser in a stable state, the dispenser does not dispense the reductant, and the reductant supplied to the dispenser by the pump is recycled to the reductant tank. In the dispensing mode, the pump supplies the reductant to the dispenser, and the dispenser dispenses the reductant into the decomposition chamber in a stable state. In one aspect, when the pump and the dispenser are operated in the idle mode, a first speed of the pump required to achieve a target pressure can be determined. In addition, when the pump and the dispenser are operated in the dispensing mode, a second speed of the pump required to achieve the target pressure can be determined. Based on the first speed and the second speed obtained in different modes, a command can be generated to configure the pump and the dispenser.

In one aspect, controlling the aftertreatment system based on pressure sensor measurements of the dispenser can correct errors due to pump variations. For example, the pump and dispenser can be configured to achieve a target pressure value. Then, a pressure measurement of the dispenser operating according to this configuration can be obtained. Based on the difference between the target pressure value and the pressure measurement, it can be determined whether the dispenser is overdosing or underdosing. In addition, the pump and dispenser can be configured to compensate for overdosing or underdosing. Although controlling the aftertreatment system based solely on pressure sensor measurements can correct errors due to pump-to-pump variations, it may not be sufficient to correct errors due to dispenser variations or variations due to installation.

When a pressure sensor of a dispenser is adjusted or regulated, it may become more difficult to control the aftertreatment system based solely on the pressure sensor measurement. In some cases, the pressure sensor is adjusted or regulated to correct for errors or changes in the pressure sensor. Typically, the pressure measurement output by the pressure sensor is adjusted or regulated internally by the manufacturer of the dispenser, and the amount of the pressure sensor adjustment may be unknown. Without knowing the amount of the adjustment, estimating other parameters of the dispenser (e.g., effective injector orifice area or displacement) may be difficult and result in inaccuracies in controlling the aftertreatment system.

In one aspect, the disclosed systems and methods can obtain pump speeds in different modes and determine offset pressure values, effective injector orifice area, displacement, or any combination thereof based on the pump speeds obtained in the different modes. Based on the determined values, the controller can control the aftertreatment system with improved accuracy.

II. Overview of the Aftertreatment System Including a Single Dispenser

1 depicts an aftertreatment system 100 having an exemplary reductant delivery system 110 for an exhaust system 190. The aftertreatment system 100 includes a particulate filter, such as a diesel particulate filter (DPF) 102, a reductant delivery system 110, a decomposition chamber 104 (e.g., a reactor, a reactor tube, etc.), an SCR catalyst 106, and a sensor 150.

The DPF 102 is configured to remove particulate matter, such as soot, from the exhaust gas flowing in the exhaust system 190. The DPF 102 includes an inlet in which the exhaust gas is received and an outlet at which the exhaust gas exits after having the particulate matter substantially filtered from the exhaust gas and/or converting the particulate matter into carbon dioxide. In some embodiments, the DPF 102 may be omitted.

The decomposition chamber 104 is configured to convert a reductant such as urea or diesel exhaust fluid (DEF) into ammonia. The decomposition chamber 104 includes a reductant delivery system 110 having a dispenser 112 configured to dispense the reductant into the decomposition chamber 104 (e.g., via an injector, such as the injector described below). In some embodiments, the reductant is injected upstream of the SCR catalyst 106. The reductant droplets then undergo a process of evaporation, pyrolysis, and hydrolysis to form gaseous ammonia within the exhaust system 190. The decomposition chamber 104 includes an inlet and an outlet, the inlet being fluidly connected to the DPF 102 to receive exhaust gas containing NO _x emissions, and the outlet being used to flow the exhaust gas, NO _x emissions, ammonia, and/or reductant to the SCR catalyst 106.

The decomposition chamber 104 includes or is coupled to a dispenser 112 such that the dispenser 112 can dispense reductant into the exhaust gas flowing in the exhaust system 190. The dispenser 112 may include a spacer 114 disposed between a portion of the dispenser 112 and a portion of the decomposition chamber 104 on which the dispenser 112 is mounted. The dispenser 112 is fluidly coupled to a reductant tank 116. The reductant tank 116 may include a plurality of reductant tanks 116. In some embodiments, a pump 118 may be used to pressurize the reductant from the reductant tank 116 for delivery to the dispenser 112. In some embodiments, the pump 118 is pressure controlled (e.g., controlled to obtain a target pressure, etc.). The reductant tank 116 may be, for example, a reductant tank 116 comprising a plurality of reductant tanks 116. of diesel exhaust fluid tank.

The dispenser 112 and the pump 118 are also electrically or communicatively connected to the controller 120. The controller 120 is configured to control the dispenser 112 to dispense the reducing agent into the decomposition chamber 104. The controller 120 may also be configured to control the pump 118. The controller 120 may include a microprocessor, an application specific integrated circuit (ASIC), a field programmable gate array (FPGA), etc. or a combination thereof. The controller 120 may include a memory, which may include but is not limited to an electronic, optical, magnetic or any other storage device or transmission device capable of providing program instructions to the processor, ASIC, FPGA, etc. The memory may include a memory chip, an electrically erasable programmable read-only memory (EEPROM), an erasable programmable read-only memory (EPROM), a flash memory or any other suitable memory from which the controller 120 can read instructions. The instructions may include code from any suitable programming language.

The SCR catalyst 106 is configured to help reduce _NOx emissions to diatomic nitrogen, water, and/or carbon dioxide by accelerating the _NOx reduction process between ammonia and exhaust _NOx . The selective catalytic reduction (SCR) catalyst 106 includes an inlet and an outlet, the inlet being in fluid communication with the decomposition chamber 104, the exhaust gas and the reductant being received from the inlet, and the outlet being in fluid communication with an end of the exhaust system 190.

The exhaust system 190 may further include an oxidation catalyst, such as a diesel oxidation catalyst (DOC), in fluid communication with the exhaust system 190 (eg, downstream of the SCR catalyst 106 or upstream of the DPF 102 ) to oxidize hydrocarbons and carbon monoxide in the exhaust.

In some embodiments, the DPF 102 may be located downstream of the decomposition chamber 104. For example, the DPF 102 and the SCR catalyst 106 may be combined into a single unit. In some embodiments, the doser 112 may alternatively be located downstream of the turbocharger or upstream of the turbocharger.

The sensor 150 may be coupled to the exhaust system 190 to detect a condition of the exhaust gas flowing through the exhaust system 190. In some embodiments, the sensor 150 may have a portion disposed within the exhaust system 190; for example, the tip of the sensor 150 may extend into a portion of the exhaust system 190. In other embodiments, the sensor 150 may receive exhaust gas passing through another conduit (e.g., one or more sample tubes extending from the exhaust system 190). Although the sensor 150 is depicted as being positioned downstream of the SCR catalyst 106, it should be understood that the sensor 150 may be positioned at any other location of the exhaust system 190, including upstream of the DPF 102, within the DPF 102, between the DPF 102 and the decomposition chamber 104, within the decomposition chamber 104, between the decomposition chamber 104 and the SCR catalyst 106, within the SCR catalyst 106, or downstream of the SCR catalyst 106. Additionally, two or more sensors 150 may be used to detect conditions of the exhaust, such as two, three, four, five, or six sensors 150 , where each sensor 150 is located at one of the aforementioned locations in the exhaust system 190 .

FIG. 2 shows a post-treatment system 200 for reducing NO _x emissions. The post-treatment system 200 includes a reductant tank 218, a pump 220, a dispenser 260, and a controller 233. In this embodiment, the reductant tank 218 corresponds to the reductant tank 116, the pump 220 corresponds to the pump 118, the dispenser 260 corresponds to the dispenser 112, and the controller 233 corresponds to the controller 120. These components can work together to dispense or provide a reductant and generate a substance (e.g., ammonia) to reduce NO _x emissions. In some embodiments, the post-treatment system 200 includes more, fewer, or different components than those shown in FIG. 2. For example, the post-treatment system 200 can include a decomposition chamber 104 coupled to the dispenser 260.

In one configuration, the reductant tank 218 is fluidly coupled to the pump 220 via a conduit 222, and the pump 220 is fluidly coupled to the dispenser 260 via a conduit 224. In one configuration, the dispenser 260 is fluidly coupled to the reductant tank 218 via a conduit 228, and is fluidly coupled to the decomposition chamber 104. In one configuration, the controller 233 is communicatively coupled to the pump 220 and the dispenser 260 via a wired medium (e.g., conductive traces or wires) or a wireless medium (e.g., a wireless link, such as Wi-Fi, cellular, Bluetooth, etc.). In this configuration, the controller 233 can generate electrical signals or commands to operate the pump 220, the dispenser 260, or both the pump 220 and the dispenser 260 to dispense the reductant into the decomposition chamber 104.

In some embodiments, the reductant tank 218 is a component for storing a reductant. The reductant may be, for example, urea, diesel exhaust fluid (DEF), Urea aqueous solution (UWS), aqueous urea solution (e.g., AUS32, etc.), and other similar fluids. The reductant tank 218 may include a plurality of reductant tanks 218. In one configuration, the reductant tank 218 includes an inlet fluidly coupled to a first outlet of a dispenser 260 via a conduit 228, and an outlet fluidly coupled to an inlet of a pump 220 via a conduit 222. In this configuration, the reductant tank 218 may provide the pump 220 with reductant and receive recirculated reductant from the dispenser 260.

The pump 220 is a component that pressurizes the reductant from the reductant tank 218 to be delivered to the dispenser 260. In some embodiments, the pump 220 is pressure controlled (e.g., controlled to obtain a target pressure, etc.). In one configuration, the pump 220 includes an inlet fluidly coupled to the outlet of the reductant tank 218 and an outlet fluidly coupled to the inlet of the dispenser 260. In addition, the pump 220 is communicatively coupled to the controller 233 to receive an electrical signal or command indicating a pump speed or a displacement of the reductant. In this configuration, the pump 220 can provide the reductant from the reductant tank 218 to the dispenser 260 according to the pump speed or displacement indicated by the electrical signal or command.

The dispenser 260 is a component that provides or dispenses the reductant from the pump 220 to the decomposition chamber 104. The dispenser 260 can be mounted directly on the decomposition chamber 104. In one configuration, the dispenser 260 includes an inlet fluidly coupled to the outlet of the pump 220, a first outlet fluidly coupled to the inlet of the reductant tank 218, a second outlet directly coupled to the inlet of the decomposition chamber 104, and an internal conduit connected between the inlet and the outlet. The dispenser 260 includes an injector 214 disposed at the second outlet of the dispenser 260, through which some of the reductant from the inlet can be dispensed or provided to the decomposition chamber 104. The dispenser 260 also includes a return hole 212 at the first outlet of the dispenser 260, through which the remaining reductant not provided to the decomposition chamber 208 can be recirculated back to the reductant tank 218. The dispenser 260 may include a pressure sensor 268 that detects the pressure within the dispenser 260 (e.g., the pressure within the internal conduit) and generates an electrical signal corresponding to the pressure measurement value. The dispenser 260 may also include an interface circuit 262 that is communicatively coupled to the controller 233 and internal devices, such as the pressure sensor 268 and the injector 214. In this configuration, the interface circuit 262 may receive an electrical signal or command from the controller 233 and configure the opening or closing of the injector 214 according to the electrical signal or command. By adjusting the opening amount or the duty cycle of the injector 214, the desired amount of reducing agent may be provided to the decomposition chamber 104. In addition, the interface circuit 262 may receive an electrical signal corresponding to the pressure measurement value from the pressure sensor 268 and generate sensor measurement data indicating the pressure measurement value according to the electrical signal. The interface circuit 262 may transmit the sensor measurement data to the controller 233.

Controller 233 is a component that generates electrical signals or commands to operate pump 220 and dispenser 260 to dispense reductant into decomposition chamber 104. In some embodiments, controller 233 includes a processor and a memory. The processor can be implemented as a microprocessor, an application-specific integrated circuit (ASIC), a field programmable gate array (FPGA), or any combination thereof. The memory can be implemented as a memory chip, an electrically erasable programmable read-only memory (EEPROM), an erasable programmable read-only memory (EPROM), a flash memory, or any other suitable memory that stores and provides instructions for performing various functions described herein. The instructions may include code from any suitable programming language. Controller 233 can communicate with an engine control unit (ECU) of an internal combustion engine, or can be implemented as a part of an engine control unit (ECU) of an internal combustion engine. In one configuration, controller 233 is communicatively coupled to pump 220 and dispenser 260. In this configuration, controller 233 can receive sensor measurement data indicating a detected pressure measurement value from dispenser 260, and generate signals or commands to configure pump 220 and dispenser 260 according to the sensor measurement data.

In one aspect, controller 233 generates commands for controlling pump 220 and dispenser 260 based on a pump flow model. The pump flow model may be represented as follows:

Wherein, A _ret is the effective orifice area of the return orifice 212, A _inj is the effective orifice area of the injector 214, δ is the injector duty cycle, ρ _fluid is the fluid density, γ is the specific gravity, P is the pressure measurement, Ω is the pump speed, and D is the displacement of the reductant through the pump 220. The controller 233 can generate an electrical signal or command to configure the opening of the injector 214 or the duty cycle of the opening and closing of the injector 214, so that the injector 214 can have an effective orifice area A _inj or operate with an effective orifice area A _inj . In addition, the controller 233 can generate an electrical signal or command to configure the pump 220 to dispense the reductant into the dispenser 260 at a pump speed Ω. In one aspect, the controller 233 can receive a target pressure P _target and automatically set, adjust or determine the effective orifice area A _ret of the return orifice 212, the effective orifice area A _inj of the injector 214 and the pump speed Ω based on the pump flow model or equation (1) to achieve the target pressure P _target . Then, the controller 233 may generate an electrical signal or command corresponding to the effective orifice area A _ret of the return orifice 212, the effective orifice area A _inj of the injector 214, and the pump speed Ω. The controller 233 may send the electrical signal or command to the pump 220 and the dispenser 260 so that the pump 220 and the dispenser 260 may operate as instructed by the electrical signal or command.

In one aspect, controlling the aftertreatment system 200 to operate at a target pressure P _target can correct errors caused by variations in the pump 220. For example, the controller 233 can determine the effective orifice area A _ret of the return orifice 212, the effective orifice area A _inj of the injector, and the pump speed Ω to achieve the target pressure P _target according to the pump flow model or equation (1). The controller 233 can configure the pump 220 and the dispenser 260 to operate according to the determined effective orifice area A _ret of the return orifice 212, the effective orifice area A _inj of the injector 214, and the pump speed Ω. The controller 233 can obtain a pressure measurement value from the pressure sensor 268 while the pump 220 and the dispenser 260 operate according to the determined value. The controller 233 can then compare the difference between the target pressure P _target and the pressure measurement value, and determine whether the dispenser 260 is overdosing or underdosing according to the difference. Based on the difference, the controller 233 can configure the pump 220, the dispenser 260, or both to compensate for the overdosing or underdosing. While controlling the aftertreatment system 200 based solely on pressure sensor measurements may correct for errors due to pump-to-pump variations, it may not be sufficient to correct for errors due to variations in the doser 260 or due to installation-induced variations.

When the pressure sensor 268 is adjusted or regulated, it may become more difficult to control the aftertreatment system 200 based solely on the pressure sensor measurements. In some cases, the pressure sensor 268 is adjusted or regulated to correct for errors or variations in the pressure sensor 268. For example, the pressure measurement output by the pressure sensor 268 may be adjusted by an offset pressure value ΔP corresponding to the error or variation in the pressure sensor 268. Operating the doser 260 with the regulated pressure sensor may help improve dosing accuracy, but the offset pressure value ΔP may result in an inaccurate estimate of the effective orifice area A _inj of the injector 214. Typically, the pressure measurement is adjusted or regulated internally by the manufacturer of the doser 260, and the offset pressure value ΔP may be unknown. Without knowing the offset pressure value ΔP, it may be difficult to determine the effective orifice area A _inj of the injector 214, and an inaccurate estimate of the effective orifice area A _inj may result in inaccurate control of the aftertreatment system 200.

In some embodiments, the controller 233 obtains two pump speeds of the pump 220 operating in different modes, and controls the pump 220 and the dispenser 260 based on the two pump speeds. In one aspect, the controller 133 obtains different pump speeds in the following different modes: an idle mode and a dosing mode. In the idle mode, the pump 220 supplies the reductant from the reductant tank 218 to the dispenser 260 in a steady state, the dispenser 260 does not dispense the reductant, and the reductant supplied to the dispenser 260 by the pump 220 is recycled to the reductant tank 218. In the dosing mode, the pump 220 supplies the reductant to the dispenser 260, and the dispenser 160 dispenses the reductant into the decomposition chamber 104 in a steady state. In one aspect, when the pump 220 and the dispenser 260 operate in the idle mode, a first speed Ω ₁ of the pump 220 required to achieve the target pressure P _target can be determined. In addition, when the pump 220 and the dispenser 260 operate in the dosing mode, a second speed P _target of the pump 220 required to achieve the target pressure P _target can be determined. Based on the first speed _Ω1 and the second speed _Ω2 obtained in different modes, the offset pressure value ΔP for configuring the pump 220 and the doser 260, the effective orifice area A _inj of the injector 214, the displacement D, or any combination thereof can be obtained. Based on the determined values, the controller 233 can control the aftertreatment system 200 with increased accuracy.

III. Aftertreatment Systems Including Non-Regulating Dispensers

In some embodiments, the controller 233 may obtain the pump speeds Ω ₁ , Ω ₂ and determine the effective orifice area A _inj and the displacement D of the injector 214 according to the pump speeds Ω ₁ , Ω _2. In addition, the controller 233 may determine the adjusted injector duty cycle δ _adj according to the effective orifice area A _inj of the injector 214 to adjust the on/off duty cycle of the injector 214.

In one aspect, the controller 233 can configure the aftertreatment system 200 to operate in an idle mode. In the idle mode, the pump 220 supplies the reductant from the reductant tank 218 to the dispenser 260 in a steady state, the dispenser 260 does not dispense the reductant, and the reductant supplied to the dispenser 260 by the pump 220 is recirculated to the reductant tank 218. In the idle mode, the effective orifice area A _inj of the injector 214 can be zero, and the pump flow model or equation (1) can be expressed as follows:

Wherein, Ω ₁ is the pump speed required to achieve the target pressure P _target in the idle mode, and A _{ret_nom} is the nominal return orifice area of the return orifice 212. Therefore, the controller 233 may determine the displacement D as follows.

In one aspect, the controller 233 can configure the aftertreatment system 200 to operate in a dosing mode. In the dosing mode, the pump 220 supplies the reductant to the doser 260, and the doser 260 doses the reductant into the decomposition chamber 104 at a steady state. In the dosing mode, the pump flow model or equation (1) can be expressed as follows:

Wherein, Ω ₂ is the pump speed required to achieve the target pressure P _target in the dosing mode. In addition, the controller 233 can determine the effective orifice area A _inj of the injector 214 based on the displacement D as shown below.

Additionally, the controller 233 may determine an adjusted injector duty cycle δadj to adjust the on-off duty cycle of the injector 214 based on the effective orifice area _Ainj of the injector 214 as follows:

Where A _{inj_nom} is the nominal orifice area of the injector 214. The controller 233 may adjust the on/off duration of the injector 214 according to the adjusted injector duty cycle δ _adj so that the accuracy of the doser 260 may be improved despite variations in the doser 260 or due to variations in the installation process.

IV. Post-processing system including adjustment of dispenser

In some embodiments, the controller 233 may obtain the pump speeds Ω ₁ , Ω ₂ , and determine the offset pressure value ΔP, the effective orifice area A _inj of the injector 214 , and the displacement D according to the pump speeds Ω ₁ , Ω ₂ . In addition, the controller 233 may determine the adjusted injector duty cycle δadj according to the effective orifice area A _inj of the injector 214 to adjust the switching duty cycle of the injector 214 .

In one aspect, the controller 233 can configure the aftertreatment system 200 to operate in an idle mode. In the idle mode, the pump 220 supplies the reductant from the reductant tank 218 to the dispenser 260 in a steady state, the dispenser 260 does not dispense the reductant, and the reductant supplied to the dispenser 260 by the pump 220 is recirculated to the reductant tank 218. In the idle mode, the effective orifice area A _inj of the injector 214 can be zero, and the pump flow model or equation (1) can be expressed as follows.

In one aspect, the controller 233 can configure the aftertreatment system 200 to operate in a dosing mode. In the dosing mode, the pump 220 supplies the reductant to the doser 260, which doses the reductant into the decomposition chamber 104 at a steady state.

In the dosing mode, the pump flow model or equation (1) can be expressed as follows.

Based on the difference between equation (7) and equation (8), the controller 233 may determine the offset pressure value ΔP as follows.

Furthermore, the controller 233 may determine the effective orifice area A _inj of the injector 214 as follows based on the offset pressure value ΔP.

Furthermore, the controller 233 may determine the displacement amount D as follows based on the offset pressure value ΔP.

In one aspect, the offset pressure value ΔP, the effective orifice area A _inj of the injector 214 , and the displacement D allow the controller 233 to control the aftertreatment system 200 with increased accuracy regardless of the offset pressure value ΔP.

V. Example Operation of Reductant Delivery System

FIG3 is a flow chart showing an example process 300 for operating the aftertreatment system 100 or 200 based on different pump speeds Ω ₁ , Ω ₂ obtained in different modes. In some embodiments, the process 300 is performed by the controller 233. In some embodiments, the process 300 is performed by other entities (e.g., another control device). In some embodiments, the process 300 includes more, fewer, or different steps than those shown in FIG3 . For example, the pump speeds Ω ₁ , Ω ₂ may be obtained in an order different from that shown in FIG3 .

In step 310, the controller 233 operates the pump 220 and the dispenser 260 in an idle mode. In the idle mode, the pump 220 supplies the reductant from the reductant tank 218 to the dispenser 260 in a steady state, the dispenser 260 does not dispense the reductant, and the reductant supplied by the pump 220 to the dispenser 260 is recirculated to the reductant tank 218.

In step 320 , when the pump 220 and the dispenser 260 are operating in the idle mode, the controller 233 determines a first speed Ω ₁ of the pump 220 to achieve a predetermined target pressure P _target .

In step 330, the controller 233 operates the pump 220 and the dispenser 260 in the dispensing mode. In the dispensing mode, the pump 220 supplies the reductant to the dispenser 260, and the dispenser 260 dispenses the reductant into the decomposition chamber 104 in a steady state.

In step 340 , when the pump 220 and the dispenser 260 are operating in the dosing mode, the controller 233 determines a second speed Ω ₂ of the pump 220 to achieve a predetermined target pressure P _target .

In step 350, the controller 233 generates commands to configure the pump 220 and the dispenser ₂₆₀ based on the first speed _Ω1 and the second speed Ω2. In one approach, the controller 233 may determine the offset pressure value ΔP based on the first speed _Ω1 and the second speed _Ω2 according to equation (9). Based on the offset pressure value ΔP, the controller 233 may determine the effective orifice area A _inj of the injector 214 according to equation (10). In addition, based on the offset pressure value ΔP, the controller 233 may determine the displacement D according to equation (11). The controller 233 may update the pump flow model ΔP based on the determined values (e.g., the offset pressure value, the effective orifice area A _inj of the injector 214, and the displacement D), and generate commands based on the updated pump flow model to control the aftertreatment system 100 or 200 with improved accuracy.

FIG4 is a flow chart showing an example process 400 for operating the aftertreatment system 100 or 200 based on different pump speeds Ω ₁ , Ω ₂ obtained in different modes. In some embodiments, the process 400 is performed by the controller 233. In some embodiments, the process 400 is performed by other entities. In some embodiments, the process 400 includes more, fewer, or different steps than those shown in FIG4 .

In step 410, the controller 233 starts the process 400. The controller 233 may start the process 400 once when the post-treatment system 100 or 200 is first deployed, before the post-treatment system 100 or 200 is deployed, or when the pump 220 or the dispenser 260 is installed. When the controller 233 starts the process 400, variables such as Dosing Cmd, Idle Learn, Dosing Learn, etc. may be set to initial values (e.g., "0"). The controller 233 may store variables or indicators of Dosing Cmd, Idle Learn, Dosing Learn in a memory of the controller 233. Dosing Cmd may be an indicator indicating whether the dispenser 260 is dispensing the reductant into the decomposition chamber 104. Idle Learn may be an indicator indicating whether the first speed Ω ₁ of the pump 220 in the idle mode is determined. Dosing Learn may be an indicator indicating whether the second speed Ω ₂ of the pump 220 in the dosing mode is determined.

In step 415, the controller 233 determines whether Dosing Cmd has a value of "0". Dosing Cmd having a value of "0" may indicate that the aftertreatment system 100 or 200 is operating in the idle mode, while Dosing Cmd having a value different from "0" may indicate that the aftertreatment system 100 or 200 is operating in the dosing mode. In response to Dosing Cmd having a value different from "0", the controller 233 may proceed to step 435. In response to Dosing Cmd having a value of "0", the controller 233 may wait for the pump speed to stabilize. In step 420, when the pump speed stabilizes in the idle mode to achieve the target pressure P _target , the controller 233 may determine the pump speed Ω ₁ of the pump 220. In step 425, in response to determining the pump speed Ω ₁ of the pump 220, the controller 230 may set Idle Learn to have a value of "1". Idle Learn having a value of “0” may indicate that the pump speed _Ω1 of the pump 220 operating in the idle mode has not been determined, whereas Idle Learn having a value of “1” may indicate that the pump speed _Ω1 of the pump 220 operating in the idle mode has been determined.

In step 430, after setting Idle Learn to have a value of "1" in step 425, the controller 233 may determine whether Dosing Learn has a value of "0". Dosing Learn having a value of "0" may indicate that the pump speed Ω ₂ of the pump 220 in the dosing mode has not been determined, while Dosing Learn having a value of "1" may indicate that the pump speed Ω ₂ of the pump 220 in the dosing mode has been determined. In step 455, in response to determining that Dosing Learn does not have a value of "0" (or has a value of "1"), the controller 233 may determine the offset pressure value ΔP, the effective orifice area A _{inj of the injector 214, and the displacement D according to equations (9) to (11). According to the offset pressure value ΔP, the effective orifice area A inj of} the injector 214, and the displacement D, the controller 233 may update the pump flow model or equation (1) to improve the accuracy of the aftertreatment system 100 or 200. Additionally, controller 233 may generate electrical signals or commands to operate pump 220 and dispenser 260 based on the updated pump flow model.

In step 435, in response to determining that Dosing Learn has a value of "0" in step 430, the controller 233 may determine whether Dosing Cmd is greater than a threshold value. The threshold value may be predetermined or adjusted. In one aspect, Dosing Cmd having a value greater than the threshold value may indicate that sufficient reductant is provided to the decomposition chamber 104 to measure the pump speed Ω ₂ in the dosing mode, while Dosing Cmd having a value less than or equal to the threshold value may indicate that the reductant provided to the decomposition chamber 104 is insufficient to measure the pump speed Ω ₂ in the dosing mode. Therefore, in response to determining that Dosing Cmd has a value less than or equal to the threshold value, the controller 233 may proceed to step 415. In response to determining that Dosing Cmd has a value greater than the threshold value, the controller 233 may wait for the pump speed to stabilize in the dosing mode. In step 440, when the pump speed stabilizes in the dosing mode to achieve the target pressure P _target , the controller 233 may determine the pump speed Ω ₂ of the pump 220. In step 445 , in response to determining the pump speed Ω ₂ of the pump 220 , the controller 230 may set Dosing Learn to have a value of “1”.

In step 450, after setting Dosing Learn to have a value of "1" in step 445, the controller 233 may determine whether Idle Learn has a value of "1". In response to determining that Idle Learn does not have a value of "1", the controller 233 may proceed to step 415. In step 455, in response to determining that Idle Learn has a value of "1", the controller 233 may determine the offset pressure value ΔP, the effective orifice area A _inj of the injector 214, and the displacement D according to equations (9) to (11). According to the offset pressure value ΔP, the effective orifice area A _inj of the injector 214, and the displacement D, the controller 233 may update the pump flow model or equation (1) to improve the accuracy of the aftertreatment system 100 or 200. In addition, the controller 233 may generate an electrical signal or command to operate the pump 220 and the doser 260 according to the updated pump flow model.

VI. Overview of the aftertreatment system including two dispensers

FIG. 5 depicts an aftertreatment system 500 including a dispenser 502 and a dispenser 504. As described above, the dispenser 502 can be used as the dispenser 112 of FIG. 1 described above. Before entering the dispenser 504, the flow of the fluid can be regulated by a valve (e.g., a restrictor valve, etc.), an orifice, or other similar structure. Alternatively, the flow of the fluid is controlled by a component of the aftertreatment system 500 downstream of the dispenser 504.

The aftertreatment system 500 includes an inlet exhaust section 506, an aftertreatment component 508 in fluid communication with the inlet exhaust section 506, and an outlet exhaust section 510 in fluid communication with the aftertreatment component 508. The inlet exhaust section 506 receives exhaust gas from the internal combustion engine (e.g., via an exhaust manifold, etc.). The outlet exhaust section 510 provides exhaust gas from the internal combustion engine downstream (such as to an exhaust pipe, a muffler, or other similar structure).

Aftertreatment component 508 is configured to cooperatively treat exhaust gas received from an internal combustion engine so that the emissions produced by aftertreatment component 508 are more desirable. For example, aftertreatment component 508 can reduce the level of NO _x in the exhaust gas. In this way, a system (e.g., a vehicle, a generator, a marine vessel, etc.) utilizing an internal combustion engine with aftertreatment system 500 may be more desirable than a similar system without aftertreatment system 500.

In one configuration, the dispenser 502, the dispenser 504, the reductant tank 516, and the pump 532 are in fluid communication. For example, the reductant tank 516 is fluidly coupled to the inlet 536 of the pump 532. For example, the outlet 530 of the pump 532 is fluidly coupled to the inlet 528 of the dispenser 504. For example, the outlet 524 of the dispenser 504 is fluidly coupled to the inlet 522 of the dispenser 502. For example, the outlet 519 of the dispenser 502 is fluidly connected to the reductant tank 516.

The pump 532 is used to draw the reductant from the reductant tank 516 and provide the reductant to the dispenser 502 and the dispenser 504. In one embodiment, the pump 532 is configured so that the reductant from the reductant tank 516 is provided to the inlet 528 of the dispenser 504, and the remaining reductant is provided from the outlet 524 of the dispenser 504 to the inlet 522 of the dispenser 502. Then, the remaining reductant is returned to the reductant tank 516 from the outlet 519 of the dispenser 502.

Aftertreatment component 508 may be divided into a plurality of sections 572, 570A, 575A, 580, 575B, 570B, and 582. In some embodiments, aftertreatment assembly 508 may include more or fewer sections. Section 572 is the inlet of aftertreatment component 508, and section 582 is the outlet of aftertreatment component 508. In some embodiments, section 572 includes a DOC; section 570A includes a mixer; section 575A includes an SCR; section 580 includes a DPF (or cDPF); section 575B includes an SCR; section 570B includes a mixer 570B; and section 582 includes a slip catalyst (e.g., an ammonia slip catalyst (ASC)).

As shown in FIG5 , aftertreatment system 500 also includes an engine control unit 542. Engine control unit 542 is in electronic communication with dispenser 502, dispenser 504, and pump 532 via communication network 544. Communication network 544 facilitates transmission of signals between any of engine control unit 542, dispenser 502, dispenser 504, and pump 532. For example, engine control unit 542 may send a signal to dispenser 502 and dispenser 504 that causes dispenser 502 and/or dispenser 504 to dispense exhaust gas. Signals sent from engine control unit 542 may include, for example, a dispense amount, a dispense duration, a pumping command (e.g., to pump 532, etc.), and other similar commands.

In some embodiments, the aftertreatment system 500 further includes a parameter unit 546 that can be in electronic communication with the communication network 544. The parameter unit 546 can provide information (e.g., stored parameters, sensed parameters, etc.) to the engine control unit 542. For example, the parameter unit 546 can be in electronic communication with various sensors so that the parameter unit 546 receives information from various components within the aftertreatment system 500. In some applications, the parameter unit 546 receives the level of the reductant in the reductant tank 516 (e.g., amount, percentage of maximum capacity, etc.), the temperature (e.g., the temperature of the inlet exhaust section 506, the temperature of the dispenser 504, the temperature within the aftertreatment component 508, the temperature of the dispenser 502, the temperature of the outlet exhaust section 510, etc.), the quality of the reductant (e.g., the concentration of the reductant, etc.), the level of the component (e.g., _NOx , _NH3 , etc.), and other similar information. The parameter unit 546 can include a memory and a processing circuit. Parameter unit 546 may include configuration data stored on memory, configuration data related to the configuration of aftertreatment system 500 (eg, sections 572 , 570A, 575A, 580 , 575B, 570B, 582 , etc.).

Aftertreatment system 500 may also include a dosing control unit 548 that may be in electronic communication with communication network 544. Dosing control unit 548 may provide local control of dosing device 502, dosing device 504, and/or pump 532.

In one aspect, aftertreatment component 508 operates as two SCR systems including sections 575A, 575B. When the engine is cold started, the two SCR systems can be operated as early as possible to reduce emissions. The first SCR in section 575A can operate at a lower temperature than the second SCR in section 575B.

FIG. 6 shows a post-treatment system 600 for reducing NO _x emissions. In some embodiments, the post-treatment system 600 is implemented as or corresponds to the post-treatment system 500 of FIG. 5 . In this embodiment, the reductant tank 618 corresponds to the reductant tank 516, the pump 620 corresponds to the pump 532, the dispenser 660A corresponds to the dispenser 504, the dispenser 660B corresponds to the dispenser 502, and the controller 633 corresponds to the dosing control unit 548. The post-treatment system 600 is similar to the post-treatment system 200 of FIG. 2, except that the post-treatment system 600 includes two dispensers 660A, 660B, instead of a single dispenser 260. Therefore, for the sake of brevity, a detailed description of the duplicated portions thereof is omitted here. In some embodiments, the post-treatment system 600 includes more, less, or different components than those shown in FIG. 6 . For example, the aftertreatment system 600 includes one or more decomposition chambers (or mixers 570A, 570B), and each of the dispensers 660A, 660B may be coupled to or mounted on a corresponding decomposition chamber (or a corresponding mixer 570).

In one configuration, dispensers 660A, 660B are serially fluidly coupled between pump 620 and reductant tank 618. Pump 620 and reductant tank 618 may correspond to pump 220 and reductant tank 218, respectively. Dispenser 660A may be directly coupled to a first inlet of mixer 570A, and dispenser 660B may be directly coupled to a second inlet of mixer 570B. In one configuration, controller 633 is coupled to pump 620 and dispensers 600A, 660B via a wired medium (e.g., conductive traces or wires) or a wireless medium (e.g., a wireless link, such as Wi-Fi, cellular, Bluetooth, etc.) communication. In this configuration, controller 633 may generate electrical signals or commands to operate pump 620, dispensers 660A, 660B, or any combination thereof, to dispense reductant into one or more decomposition chambers (or mixers 570A, 570B).

Dispenser 660A is a component that provides or dispenses reducing agent to decomposition chamber (or mixer 570A) from pump 620. Dispenser 660A can be directly mounted on the first inlet of decomposition chamber (mixer 570A). In one configuration, dispenser 660A includes an inlet of the outlet of pump 620 that is fluidly coupled, a first outlet of the inlet of dispenser 660B that is fluidly coupled, a second outlet of the first inlet that is directly coupled to decomposition chamber (or mixer 570A), and an internal pipeline connected between the inlet and the outlet. Dispenser 660A includes an ejector 614A disposed at the second outlet of dispenser 660A, and some reducing agents from the inlet can be dispensed or provided to decomposition chamber (or mixer 570A) by the ejector 614A. Dispenser 660A also includes a return hole 612A of the first outlet of dispenser 660A, and the remaining reducing agent that is not provided to decomposition chamber (or mixer 570A) can be provided to dispenser 660B by the return hole 612A. In some embodiments, the dispenser 660A does not include a pressure sensor. The dispenser 660A may also include an interface circuit 662A that is communicatively coupled to the controller 633 and internal devices such as the injector 614A. In this configuration, the interface circuit 662A may receive an electrical signal or command from the controller 633 and configure the opening or closing of the injector 614A according to the electrical signal or command. By adjusting the opening amount of the injector 614A or the duty cycle of opening and closing, the desired amount of reducing agent may be provided to the decomposition chamber (or mixer 570A).

Dispenser 660B is a component that provides or dispenses reductant from dispenser 660A to decomposition chamber (or mixer 570B). Dispenser 660B can be directly mounted on decomposition chamber (or mixer 570B). In one configuration, dispenser 660B includes an inlet of a first outlet of dispenser 660A, a first outlet of an inlet of a fluid coupled to reductant tank 618, a second outlet directly coupled to a second inlet of decomposition chamber (or mixer 570B), and an internal conduit connected between the inlet and the outlet. Dispenser 660B includes an injector 614B disposed at the second outlet of dispenser 660B, and some reductants from dispenser 660A can be dispensed or provided to decomposition chamber (or mixer 570B) by the injector 614B. The dispenser 660B also includes a return hole 612B of the first outlet of the dispenser 660B, and the remaining reductant not provided to the decomposition chamber (or the mixer 570B) can be recycled back to the reductant tank 618 through the return hole 612B. In some embodiments, the dispenser 660B includes a pressure sensor 668, which detects the pressure in the dispenser 660B (for example, the pressure in the internal pipeline) and generates an electrical signal corresponding to the pressure measurement value. The dispenser 660B can also include an interface circuit 662B, which is communicatively connected to the controller 633 and internal devices, such as pressure sensors 668 and injectors 614B. In this configuration, the interface circuit 662B can receive an electrical signal or command from the controller 633, and configure the opening or closing of the injector 614B according to the electrical signal or command. By adjusting the opening amount of the injector 614B or the duty cycle of opening and closing, the required amount of reductant can be provided to the decomposition chamber (or the mixer 570B). In addition, the interface circuit 662B can receive an electrical signal corresponding to the pressure measurement value from the pressure sensor 668 and generate sensor measurement data indicating the pressure measurement value based on the electrical signal. The interface circuit 662B can transmit the sensor measurement data to the controller 633.

In one aspect, the controller 633 generates commands for controlling the pump 620 and the dispensers 660A, 660B according to the pump flow model. The pump flow model can be expressed as follows:

Wherein, A _ret is the effective orifice area of the return orifice 612, A _inj1 is the effective orifice area of the injector 614A, A _inj2 is the effective orifice area of the injector 614B, δ1 is the injector duty cycle of the injector 614A, δ2 is the injector duty cycle of the injector 614B, ρ _fluid is the fluid density, γ is the specific gravity, P is the pressure measurement, Ω is the pump speed, and D is the displacement of the reductant through the pump 620. The controller 633 can generate an electrical signal or command to configure the opening of the injectors 614A, 614B or the duty cycle of the opening and closing of the injectors 614A, 614B, so that the injectors 614A, 614B can have an effective orifice area A _inj1 or operate with an effective orifice area A _inj2 . In addition, the controller 633 can generate an electrical signal or command to configure the pump 620 to provide the reductant to the dispensers 660A, 660B at the pump speed Ω. In one aspect, the controller 633 can receive the target pressure P _target and automatically set, adjust or determine the effective orifice area A _inj1 of the injector 614A, the effective orifice area A _inj2 of the injector 614B and the pump speed Ω to achieve the target pressure P _target based on the pump flow model or equation (12). The controller 133 can then generate an electrical signal or command corresponding to the effective orifice area A _inj1 of the injector 614A, the effective orifice area A _inj2 of the injector 614B and the pump speed Ω. The controller 133 can send the electrical signal or command to the pump 620 and the dispensers 660A, 660B so that the pump 620 and the dispensers 660A, 660B can operate as indicated by the electrical signal or command.

In some embodiments, the controller 633 obtains three pump speeds of the pump 620 operating in different modes, and controls the pump 620 and the dispensers 660A, 660B based on the three pump speeds. In one aspect, the controller 633 obtains different pump speeds in the following different modes: idle mode, first dispensing mode, and second dispensing mode. In idle mode, the pump 620 supplies the reductant from the reductant tank 618 to the first dispenser 660A in a stable state, the first dispenser 660A and the second dispenser 660B do not dispense the reductant, and the reductant supplied by the pump 620 to the first dispenser 660A and the second dispenser 660B is recycled to the reductant tank 618. In the first dispensing mode, the pump 620 supplies the reductant to the first dispenser 660A, the first dispenser 660A dispenses the reductant into the decomposition chamber (or mixer 570A) in a stable state, and the second dispenser 660B does not dispense the reductant. In the second dosing mode, the pump 620 supplies the reductant to the first doser 660A, the first doser 660A does not dosing the reductant, and the second doser 660B dosing the reductant into the decomposition chamber (or the mixer 570B) in a steady state. In one aspect, when the pump 620 and the doser 660A, 660B are operated in the idle mode, a first speed Ω ₁ of the pump 620 required to achieve the target pressure P _target may be determined. In addition, when the pump 620 and the doser 660A, 660B are operated in the first dosing mode, a second speed Ω ₂ of the pump 620 required to achieve the target pressure P _target may be determined. In addition, when the pump 620 and the doser 660A, 660B are operated in the second dosing mode, a second speed Ω ₃ of the pump 620 required to achieve the target pressure P _target may be determined. Based on the first speed Ω ₁ , the second speed Ω ₂ and the third speed Ω ₃ obtained in different modes, the offset pressure value ΔP, the effective orifice area A _inj1 , A _inj1 , the displacement D or any combination thereof of the jets 614A, 614B may be determined to configure the pump 620 and the dosing devices 660A, 660B. Based on the determined values, the controller 633 may control the aftertreatment system 600 with increased accuracy.

VII. Post-processing system including adjustment of dispenser

In some embodiments, the controller 633 may obtain the pump speeds Ω ₁ , Ω ₂ , and Ω ₃ and determine the offset pressure value ΔP according to the pump speeds Ω ₁ , Ω ₂ , and Ω ₃ , the effective orifice areas A _inj1 , A _inj2 of the injectors 614A and 614B, and the displacement D. In addition, the controller 633 may determine the adjusted injector duty ratio δ _adj1 according to the effective orifice area A _inj1 of the injector 614A to adjust the on/off duty ratio of the injector 614A. Similarly, the controller 633 may determine the adjusted injector duty ratio δ _adj2 according to the effective orifice area A _inj2 of the injector 614B to adjust the on/off duty ratio of the injector 614B.

In one aspect, the controller 633 can configure the aftertreatment system 600 to operate in an idle mode. In the idle mode, the pump 620 supplies the reductant from the reductant tank 618 to the first doser 660A in a steady state, the first doser 660A and the second doser 660B do not dose the reductant, and the reductant supplied by the pump 620 to the first doser 660A and the second doser 660B is recirculated to the reductant tank 618. In the idle mode, the effective orifice areas A _inj1 , A _inj2 of the injectors 614A, 614B can be zero, and the pump flow model or equation (12) can be expressed as follows.

Wherein, Ω ₁ is the pump speed required to achieve the target pressure P _target in idle mode, and A _{ret_nom} is the nominal return orifice area of the return orifice 612B.

In one aspect, the controller 633 can configure the aftertreatment system 600 to operate in a first dosing mode. In the first dosing mode, the pump 620 supplies the reductant to the first doser 660A, the first doser 660A dispenses the reductant into the decomposition chamber (or mixer 570A) at a steady state, and the second doser 660B does not dispense the reductant. In the first dosing mode, the pump flow model or equation (12) can be expressed as follows:

Wherein, Ω ₂ is the pump speed required to achieve the target pressure P _target in the first dosing mode.

In one aspect, the controller 633 can configure the aftertreatment system 600 to operate in a second dosing mode. In the second dosing mode, the pump 620 supplies the reductant to the first doser 660A, the first doser 660A does not dosing the reductant, and the second doser 660B dosing the reductant into the decomposition chamber (or mixer 570B) at a steady state. In the second dosing mode, the pump flow model or equation (12) can be expressed as follows:

Wherein, Ω ₃ is the pump speed required to achieve the target pressure P _target in the second dosing mode. In addition, the effective orifice area A _inj2 of the injector 614B can be obtained as follows:

Where A _{inj_nom} is the nominal injector orifice area of injector 614B.

Based on equation (15) and equation (16), the controller 633 may determine the offset pressure value ΔP as follows.

Furthermore, the controller 633 may determine the displacement amount D as follows based on the offset pressure value ΔP.

Furthermore, based on the difference between equation (13) and equation (14), the controller 633 may determine the effective orifice area A _inj1 of the injector 214 based on the displacement D as follows.

Based on the effective orifice area A _inj1 of the injector 614A, the controller 633 may determine the following dosing adjustment factor Inj1 _adj that is applied to the injector duty cycle δ1 of the injector 614A.

For example, the controller 633 may multiply the injector duty cycle δ1 of the injector 614A by the dosing adjustment factor Inj1 _adj to obtain the adjusted injector duty cycle δ _adj1 .

In one aspect, the offset pressure value ΔP, the effective orifice area A _inj1 of injector 614A, the effective orifice area A _inj2 of injector 614B, and the displacement D allow the controller 633 to control the aftertreatment system 600 with increased accuracy regardless of the offset pressure value ΔP.

VIII. Aftertreatment Systems Including Non-Regulating Dispensers

In some embodiments, the controller 633 may obtain the pump speeds Ω ₁ , Ω ₂ , and Ω ₃ , and determine the effective orifice area A _inj1 of the injector 614A, the effective orifice area A _inj2 of the injector 614B, and the displacement D according to the pump speeds Ω ₁ , Ω ₂ , and Ω ₃ . In addition, the controller 633 may determine the adjusted injector duty cycle δ _adj1 according to the effective orifice area A _inj1 of the injector 614A to adjust the duty cycle δ ₁ of the injector 614A. In addition, the controller 633 may determine the adjusted injector duty cycle δ _adj2 according to the effective orifice area A _inj2 of the injector 614B to adjust the duty cycle δ ₂ of the injector 614B.

In one aspect, the controller 633 may determine an adjusted injector duty cycle δ _adj1 as follows based on the effective orifice area A _inj1 of the injector 614A to adjust the duty cycle δ ₁ of the injector 614A.

Similarly, the controller 633 may determine an adjusted injector duty cycle δ _adj2 as follows based on the effective orifice area A _inj2 of the injector 614B to adjust the duty cycle δ ₂ of the injector 614A.

Controller 633 may adjust the on/off duration of injectors 614A, 614B according to the adjusted injector duty cycles δ _adj1 , δ _adj2 so that the accuracy of dosers 660A, 660B may be improved despite variations in dosers 660A, 660B or variations due to the installation process.

IX. Example Operation of Reductant Delivery System

FIG. 7 is a flow chart illustrating an example process 700 for operating the aftertreatment system 500 or 600 based on different pump speeds Ω ₁ , Ω ₂ , Ω ₃ obtained in different modes. In some embodiments, the process 700 is performed by the controller 633. In some embodiments, the process 700 is performed by other entities. In some embodiments, the process 700 includes more, fewer, or different steps than those shown in FIG. 7 . For example, the pump speeds Ω ₁ , Ω ₂ , Ω ₃ may be obtained in an order different from that shown in FIG. 7 .

In step 710, the controller 633 operates the pump 620 and the dispensers 660A, 660B in an idle mode. In the idle mode, the pump 620 supplies the reductant from the reductant tank 618 to the first dispenser 660A in a steady state, the first dispenser 660A and the second dispenser 660B do not dispense the reductant, and the reductant supplied by the pump 620 to the first dispenser 660A and the second dispenser 660B is recirculated to the reductant tank 618.

In step 720 , when the pump 620 and the dispensers 660A, 660B are operating in the idle mode, the controller 633 determines a first speed Ω ₁ of the pump 620 to achieve a predetermined target pressure P _target .

In step 730, the controller 633 operates the pump 620 and the dispensers 660A, 660B in a first dispensing mode. In the first dispensing mode, the pump 620 supplies the reductant to the first dispenser 660A, the first dispenser 660A dispenses the reductant to one or more decomposition chambers (or mixers 570A, 570B) in a steady state, and the second dispenser 660B does not dispense the reductant.

In step 740, the controller 633 determines a second speed Ω ₂ of the pump 620 to achieve a predetermined target pressure P _target when the pump 620 and the dispensers 660A, 660B are operated in the second dosing mode.

In step 750, the controller 633 operates the pump 620 and the dispensers 660A, 660B in the second dispensing mode. In the second dispensing mode, the pump 620 supplies the reductant to the first dispenser 660A, the second dispenser 660B dispenses the reductant into the decomposition chamber 608 at a steady state, and the first dispenser 660A does not dispense the reductant.

In step 760, the controller 633 determines a third speed Ω ₃ of the pump 620 to achieve a predetermined target pressure P _target when the pump 620 and the dosing devices 660A, 660B are operated in the third dosing mode.

In step 770, the controller 633 generates commands based on the first speed Ω ₁ , the second speed Ω ₂ , and the third speed Ω ₃ to configure the pump 620 and the dispensers 660A, 660B. In one approach, the controller 633 may determine the offset pressure value ΔP based on the first speed Ω ₁ and the third speed Ω ₃ according to equation (17). In one approach, the controller 633 may determine the offset pressure value ΔP based on the first speed Ω ₁ and the third speed Ω ₃ according to equation (16). Based on the offset pressure value ΔP, the controller 633 may determine the effective orifice area A _inj2 of the injector 614B according to equation (16). In addition, based on the displacement D, the first speed Ω ₁ , and the second speed Ω ₂ , the controller 633 may determine the effective orifice area A _inj1 of the injector 614A according to equation (19). Controller 633 may update the pump flow model according to the determined values (eg, offset pressure value ΔP, effective orifice area A _inj1 of injector 614A, effective orifice area A _inj2 of injector 614B, and displacement D) and generate commands based on the updated pump flow model to control aftertreatment system 500 or 600 with improved accuracy.

FIG8 is a flow chart showing an example process 800 for operating the aftertreatment system 500 or 600 based on different pump speeds Ω ₁ , Ω ₂ , Ω ₃ obtained in different modes. In some embodiments, the process 800 is performed by the controller 633. In some embodiments, the process 800 is performed by other entities. In some embodiments, the process 800 includes more, fewer, or different steps than those shown in FIG8 .

In step 810, the controller 633 starts the process 800. The controller 633 may start the process 800 once when the aftertreatment system 500 or 600 is first deployed, before the aftertreatment system 500 or 600 is deployed, or when the pump 620 or the dispenser 660A or the dispenser 660B is installed. When the controller 633 starts the process 800, variables such as Dosing Cmd, Idle Learn, DosingLearn, etc. may be set to initial values (e.g., "0"). The controller 633 may store variables or indicators of Dosing Cmd, Idle learn, Dosing Learn in the memory of the controller 633. Dosing Cmd may be an indicator indicating whether the dispenser 660A or the dispenser 660B is dispensing the reductant into one or more decomposition chambers (or mixers 570A, 570B). Idle Learn may be an indicator indicating whether the first speed Ω ₁ of the pump 620 in the idle mode has been determined. Dosing Learn may be an indicator indicating whether the second speed _Ω2 of the pump 620 in the first dosing mode and the third speed _Ω3 of the pump 620 in the second dosing mode are determined.

In step 815, the controller 633 determines whether Dosing Cmd has a value of "0". Dosing Cmd having a value of "0" may indicate that the aftertreatment system 500 or 600 is operating in the idle mode, while Dosing Cmd having a value different from "0" may indicate that the aftertreatment system 500 or 600 is operating in the first dosing mode or the second dosing mode. In response to Dosing Cmd having a value different from "0", the controller 633 may proceed to step 835. In response to Dosing Cmd having a value of "0", the controller 633 may wait for the pump speed to stabilize. In step 820, when the pump speed stabilizes in the idle mode to achieve the target pressure P _target , the controller 633 may determine the pump speed Ω ₁ of the pump 620. In step 825, in response to determining the pump speed Ω ₁ of the pump 620, the controller 630 may set Idle Learn to have a value of "1". Idle Learn having a value of “0” may indicate that the pump speed _Ω1 of the pump 620 operating in the idle mode has not been determined, whereas Idle Learn having a value of “1” may indicate that the pump speed _Ω1 of the pump 620 operating in the idle mode has been determined.

In step 830, after setting Idle Learn to have a value of "1" in step 825, the controller 633 may determine whether Dosing Learn has a value of "0". Dosing Learn having a value of "0" may indicate that the pump speed _Ω2 at which the pump 620 operates in the first dosing mode and the pump speed _Ω3 at which the pump 620 operates in the second dosing mode have not yet been determined, while Dosing Learn having a value of "1" may indicate that the pump speed _Ω2 at which the pump 620 operates in the first dosing mode and the pump speed _Ω3 at which the pump 620 operates in the second dosing mode have already been determined. In step 855, in response to determining that Dosing Learn does not have a value of "0" (or has a value of "1"), the controller 633 may determine the offset pressure value ΔP, the effective orifice area A _inj1 of the injector 614A, the effective orifice area A _inj2 of the injector 614B, and the displacement D according to equations (16) to (19). Based on the offset pressure value ΔP, the effective orifice area A _inj1 of injector 614A, the effective orifice area A _inj2 of injector 614B, and the displacement D, the controller 633 may update the pump flow model or equation (12) to improve the accuracy of the aftertreatment system 500 or 600. In addition, the controller 633 may generate electrical signals or commands to operate the pump 620 and the dosing devices 660A, 660B based on the updated pump flow model.

In step 835, in response to determining that Dosing Learn has a value of "0", the controller 633 may determine whether DosingCmd is greater than a threshold value. The threshold value may be predetermined or adjusted. In one aspect, DosingCmd having a value greater than the threshold value may indicate that sufficient reductant is provided to one or more decomposition chambers (e.g., or mixers 570A, 570B) to measure the pump speed _Ω2 in the first dosing mode and the pump speed _Ω3 in the second dosing mode, while Dosing Cmd having a value less than or equal to the threshold value may indicate that the reductant provided to one or more decomposition chambers (e.g., or mixers 570A, 570B) is insufficient to measure the pump speed _Ω2 in the first dosing mode and the pump speed _Ω3 in the second dosing mode. Therefore, in response to determining that DosingCmd has a value less than or equal to the threshold value, the controller 633 may proceed to step 815. In response to determining that Dosing Cmd has a value greater than the threshold value, the controller 633 may configure the dispensers 660A, 660B to operate in the first dosing mode and wait for the pump speed to stabilize. In step 840, when the pump speed is stable in the first dosing mode to achieve the target pressure P _target , the controller 633 may determine the pump speed Ω ₂ of the pump 620. In response to determining the pump speed Ω ₂ , the controller 633 may configure the dosing devices 660A, 660B to operate in the second dosing mode. In step 842, when the pump speed is stable in the second dosing mode to achieve the target pressure P _target in the second dosing mode, the controller 633 may determine the pump speed Ω ₃ of the pump 620. In step 845, in response to determining the pump speeds Ω ₂ , Ω ₃ , the controller 630 may set Dosing Learn to have a value of “1”.

In step 850, after setting Dosing Learn to have a value of "1" in step 845, the controller 633 may determine whether Idle Learn has a value of "1". In response to determining that Idle Learn does not have a value of "1", the controller 633 may proceed to step 815. In step 855, in response to determining that Idle Learn has a value of "1", the controller 633 may determine the offset pressure value ΔP, the effective orifice area A _inj1 of the injector 614A, the effective orifice area A _inj2 of the injector 614B, and the displacement D according to equations (16) to (19). According to the offset pressure value ΔP, the effective orifice area A _inj1 of the injector 614A, the effective orifice area A _inj2 of the injector 614B, and the displacement D, the controller 633 may update the pump flow model or equation (12) to improve the accuracy of the aftertreatment system 500 or 600. In addition, the controller 633 may generate an electrical signal or command to operate the pump 620 and the dosing devices 660A, 660B according to the updated pump flow model.

X. Configuration of Example Embodiments

Although this specification contains many specific implementation details, these should not be interpreted as limitations on the scope of the content that can be claimed, but should be interpreted as descriptions of features that are unique to specific implementations. Certain features described in the context of separate implementations in this specification may also be implemented in combination in a single implementation. On the contrary, the various features described in the context of a single implementation may also be implemented individually or in any suitable sub-combination in multiple implementations. Moreover, although features may be described as working in certain combinations and even initially claimed as such, one or more features from the claimed combination may be deleted from the combination in some cases, and the claimed combination may involve a sub-combination or a deformation of a sub-combination.

As utilized herein, the terms "substantially," "approximately," and similar terms are intended to have a broad meaning consistent with common and accepted usage by those of ordinary skill in the art to which the subject matter of the present disclosure belongs. Those skilled in the art who review the present disclosure should understand that these terms are intended to allow description of certain features described and claimed without limiting the scope of these features to the precise numerical ranges provided. Therefore, these terms should be interpreted as indicating that insubstantial or inconsequential modifications or alterations of the subject matter described and claimed are considered to be within the scope of the present invention as described in the appended claims.

As used herein, the term "coupled" and similar terms mean the joining of two components directly or indirectly to one another. Such joining may be fixed (e.g., permanent) or movable (e.g., removable or releasable). Such joining may be achieved by the two components, or the two components and any additional intermediate components, being integrally formed as a single unitary body with one another, or by the two components, or the two components and any additional intermediate components, being attached to one another.

As used herein, the terms "fluidically coupled to," "fluidically configured to communicate with," and the like mean that two components or objects have a path formed between the two components or objects in which a fluid (such as air, liquid reductant, gaseous reductant, aqueous reductant, gaseous ammonia, etc.) can flow with or without an intervening component or object. Examples of fluid couplings or configurations for achieving fluid communication may include pipes, channels, or any other suitable components for achieving the flow of a fluid from one component or object to another component or object.

It is important to note that the structure and arrangement of the systems shown in the various exemplary embodiments are illustrative and non-restrictive in nature. All changes and modifications within the spirit and/or scope of the described embodiments need to be protected. It should be understood that some features may not be necessary, and embodiments without various features may be considered to be within the scope of this application, which is defined by the subsequent claims. When the language "a portion" is used, the item may include a portion and/or the entire item unless explicitly stated to the contrary.

Claims (28)

1. A controller for use in an aftertreatment system including a dispenser configured to dispense a reductant into a decomposition chamber and a pump configured to supply the reductant to the dispenser, the controller configured to be operably coupled to the dispenser and the pump, and programmed to:

Operating the pump and the dispenser in an idle mode in which the pump supplies the reductant from a reductant tank to the dispenser in a steady state, the dispenser does not dispense the reductant, and the reductant supplied to the dispenser by the pump is recirculated to the reductant tank;

determining a first speed of the pump required to achieve a predetermined target pressure when the pump and the dispenser are operating in the idle mode;

Operating the pump and the dispenser in a dosing mode in which the pump supplies the reducing agent to the dispenser and the dispenser doses the reducing agent into the decomposition chamber in a steady state;

Determining a second speed of the pump required to achieve the predetermined target pressure when the pump and the dispenser are operating in the dispensing mode; and

Based on the first speed and the second speed, commands are generated to configure the pump and the dispenser.

2. The controller according to claim 1,

Wherein the dispenser includes a pressure sensor configured to provide a pressure measurement that has been adjusted by an offset pressure value, and

Wherein the controller is programmed to:

determining the offset pressure value based on the first speed and the second speed, and

A command is generated based on the determined offset pressure value.

3. The controller of claim 2, wherein the controller is programmed to:

determining an effective aperture area of the dispenser based on the determined offset pressure value, an

Based on the determined effective aperture area, a command is generated to configure the pump and the dispenser.

4. A controller according to claim 3, wherein the controller is programmed to:

Determining a displacement of the pump based on the determined offset pressure value, an

Based on the determined displacement, a command is generated to configure the pump and the dispenser.

5. The controller of claim 4, wherein the controller is programmed to:

Updating a pump flow model of the aftertreatment system based on the determined displacement and the determined effective orifice area, and

Based on the updated pump flow model, commands are generated to configure the pump and the dispenser.

6. A controller according to claim 3, wherein the controller is programmed to:

determining a duty cycle of the dispenser based on the effective aperture area, an

Based on the determined duty cycle of the dispenser, a command is generated to configure the pump and the dispenser.

7. The controller of claim 1, wherein the controller is programmed to:

Determining an effective aperture area of the dispenser based on the first speed and the second speed,

Determining a duty cycle of the dispenser based on the effective aperture area, an

Based on the determined duty cycle of the dispenser, a command is generated to configure the pump and the dispenser.

8. A controller for use in an aftertreatment system including a first dispenser configured to dispense a reductant into a first decomposition chamber, a second dispenser configured to dispense the reductant into a second decomposition chamber, and a pump configured to supply the reductant to the first dispenser, the first dispenser coupled between the pump and the second dispenser, the controller configured to be operably coupled to the first dispenser, the second dispenser, and the pump, and the controller programmed to:

Operating the pump, the first and second dispensers in an idle mode in which the pump supplies the reductant from a reductant tank to the first dispenser, the first and second dispensers do not dispense the reductant, and the reductant supplied to the first and second dispensers by the pump is recirculated to the reductant tank;

Determining a first speed of the pump required to achieve a predetermined target pressure when the pump, the first dispenser, and the second dispenser are operating in the idle mode;

Operating the pump, the first dispenser, and the second dispenser in a first dispensing mode in which the pump supplies the reducing agent to the first dispenser, the first dispenser dispenses the reducing agent into the first decomposition chamber in a steady state, and the second dispenser does not dispense the reducing agent;

Determining a second speed of the pump required to achieve the predetermined target pressure when the pump, the first dispenser, and the second dispenser are operating in the first dispensing mode;

Operating the pump, the first dispenser, and the second dispenser in a second dispensing mode in which the pump supplies the reductant to the first dispenser, the second dispenser dispenses the reductant into the second decomposition chamber in a steady state, and the first dispenser does not dispense the reductant;

Determining a third speed of the pump required to achieve the predetermined target pressure when the pump, the first dispenser, and the second dispenser are operating in the second dispensing mode; and

Based on the first speed, the second speed, and the third speed, commands are generated to configure the pump, the first dispenser, and the second dispenser.

9. The controller of claim 8, wherein the pump is configured to supply the reductant to the second dispenser through the first dispenser.

10. The controller according to claim 8,

Wherein the second dispenser includes a pressure sensor configured to provide a pressure measurement that has been adjusted by an offset pressure value, and

Wherein the controller is programmed to:

Determining the offset pressure value based on the first speed and the third speed, and

Based on the determined offset pressure value, a command is generated to configure the pump, the first dispenser, and the second dispenser.

11. The controller of claim 10, wherein the controller is programmed to:

Determining a first effective aperture area of the second dispenser based on the determined offset pressure value, an

Based on the determined first effective aperture area, a command is generated to configure the pump, the first dispenser, and the second dispenser.

12. The controller of claim 11, wherein the controller is programmed to:

Determining a displacement of the pump based on the determined offset pressure value, an

Based on the determined displacement, a command is generated to configure the pump, the first dispenser, and the second dispenser.

13. The controller of claim 12, wherein the controller is programmed to:

determining a second effective orifice area of the first dispenser based on the determined displacement of the pump, the first speed, and the second speed, and

Based on the determined second effective aperture area, a command is generated to configure the pump, the first dispenser, and the second dispenser.

14. The controller of claim 13, wherein the controller is configured to:

updating a pump flow model of the aftertreatment system based on the determined displacement, the determined first effective orifice area, and the determined second effective orifice area, and

Based on the updated pump flow model, commands are generated to configure the pump, the first dispenser, and the second dispenser.

15. The controller of claim 13, wherein the controller is programmed to:

Determining a dispensing adjustment factor for the first dispenser based on the first effective aperture area and the second effective aperture area, and

A command is generated to configure the first dispenser based on the dispensing adjustment factor.

16. The controller of claim 8, wherein the controller is programmed to:

Determining a displacement of the pump based on the first speed,

A first effective orifice area is determined based on the displacement of the pump, the first speed and the second speed,

A second effective orifice area is determined based on the displacement of the pump, the first speed and the third speed,

A first dispensing adjustment factor for the first dispenser is determined based on the first effective aperture area,

Determining a second dispensing adjustment factor for the second dispenser based on the second effective aperture area, and

A command is generated to configure the first and second dispensers based on the first and second dispensing adjustment factors.

17. A method for an aftertreatment system including a dispenser configured to dispense a reductant into a decomposition chamber and a pump configured to supply the reductant to the dispenser, the method comprising:

Operating the pump and the dispenser by a processor in an idle mode in which the pump supplies the reductant from a reductant tank to the dispenser in a steady state, the dispenser does not dispense reductant, and the reductant supplied to the dispenser by the pump is recycled to the reductant tank;

Determining, by the processor, a first speed of the pump required to achieve a predetermined target pressure when the pump and the dispenser are operating in the idle mode;

operating, by the processor, the pump and the dispenser in a dosing mode in which the pump supplies the reducing agent to the dispenser and the dispenser doses the reducing agent into the decomposition chamber in a steady state;

determining, by the processor, a second speed of the pump required to achieve the predetermined target pressure when the pump and the dispenser are operating in the dispensing mode; and

Generating, by the processor, a command to configure the pump and the dispenser based on the first speed and the second speed.

18. The method of claim 17, wherein the dispenser includes a pressure sensor configured to provide a pressure measurement that has been adjusted by an offset pressure value, the method further comprising:

determining, by the processor, the offset pressure value based on the first speed and the second speed; and

A command is generated by the processor based on the determined offset pressure value.

19. The method of claim 18, further comprising:

Determining, by the processor, an effective aperture area of the dispenser based on the determined offset pressure value; and

A displacement of the pump is determined by the processor based on the determined offset pressure value.

20. The method of claim 19, further comprising:

Updating, by the processor, a pump flow model of the aftertreatment system based on the determined displacement and the determined effective orifice area; and

Generating, by the processor, commands to configure the pump and the dispenser based on the updated pump flow model.

21. The method of claim 19, further comprising:

Determining, by the processor, a duty cycle of the dispenser based on the effective aperture area; and

Based on the determined duty cycle of the dispenser, a command is generated to configure the pump and the dispenser.

22. The method of claim 17, further comprising:

Determining, by the processor, an effective aperture area of the dispenser based on the first speed and the second speed;

Determining, by the processor, a duty cycle of the dispenser based on the effective aperture area; and

A command is generated by the processor to configure the pump and the dispenser based on the determined duty cycle of the dispenser.

23. A method for an aftertreatment system including a first dispenser configured to dispense a reductant into a first decomposition chamber, a second dispenser configured to dispense the reductant into a second decomposition chamber, and a pump configured to supply the reductant to the first dispenser, the first dispenser coupled between the pump and the second dispenser, the method comprising:

Operating, by a processor, the first and second dispensers in an idle mode in which the pump supplies the reductant from a reductant tank to the first dispenser, the first and second dispensers do not dispense the reductant, and the reductant supplied to the first and second dispensers by the pump is recirculated to the reductant tank;

Determining, by the processor, a first speed of the pump required to achieve a predetermined target pressure when the pump, the first dispenser, and the second dispenser are operating in the idle mode;

Operating, by the processor, the pump, the first dispenser, and the second dispenser in a first dispensing mode in which the pump supplies the reducing agent to the first dispenser, the first dispenser dispenses the reducing agent into the first decomposition chamber in a steady state, and the second dispenser does not dispense the reducing agent;

Determining, by the processor, a second speed of the pump required to achieve the predetermined target pressure when the pump, the first dispenser, and the second dispenser are operating in the first dispensing mode;

Operating, by the processor, the pump, the first dispenser, and the second dispenser in a second dispensing mode in which the pump supplies the reducing agent to the first dispenser, the second dispenser dispenses the reducing agent into the second decomposition chamber in a steady state, and the first dispenser does not dispense the reducing agent;

determining, by the processor, a third speed of the pump required to achieve the predetermined target pressure while the pump, the first dispenser, and the second dispenser are operating in the second dispensing mode; and

Generating, by the processor, commands to configure the pump, the first dispenser, and the second dispenser based on the first speed, the second speed, and the third speed.

24. The method of claim 23, wherein the second dispenser includes a pressure sensor configured to provide a pressure measurement that has been adjusted by an offset pressure value, the method further comprising:

determining, by the processor, the offset pressure value based on the first speed and the third speed; and

A command is generated by the processor to configure the pump, the first dispenser, and the second dispenser based on the determined offset pressure value.

25. The method of claim 24, further comprising:

Determining, by the processor, a first effective aperture area of the second dispenser based on the determined offset pressure value;

determining, by the processor, a displacement of the pump based on the determined offset pressure value; and

A second effective aperture area of the first dispenser is determined by the processor based on the determined displacement of the pump, the first speed, and the second speed.

26. The method of claim 25, further comprising:

Updating, by the processor, a pump flow model of the aftertreatment system based on the determined displacement, the determined first effective orifice area, and the determined second effective orifice area; and

Commands are generated by the processor to configure the pump, the first dispenser, and the second dispenser based on the updated pump flow model.

27. The method of claim 25, further comprising:

Determining, by the processor, a dosing adjustment factor for the first dispenser based on the first effective aperture area and the second effective aperture area; and

Generating, by the processor, a command to configure the first dispenser in accordance with the dispensing adjustment factor.

28. The method of claim 23, further comprising:

determining, by the processor, a displacement of the pump based on the first speed;

determining, by the processor, a first effective aperture area based on the displacement of the pump, the first speed, and the second speed;

Determining, by the processor, a second effective orifice area based on the displacement of the pump, the first speed, and the third speed;

determining, by the processor, a first dosing adjustment factor for the first dispenser based on the first effective aperture area;

Determining, by the processor, a second dosing adjustment factor for the second dispenser based on the second effective aperture area; and

Generating, by the processor, a command to configure the first and second dispensers based on the first and second dispensing adjustment factors.