CN118335582B - Ignition method, system and equipment applied to remote plasma source - Google Patents

Abstract

The present invention relates to the field of semiconductor manufacturing technology, and more specifically, to an ignition method, system and device for a remote plasma source. The scheme includes using a coupling capacitor to control the discharge energy and setting two ignition power supplies OUT1 and OUT2; setting a chamber structure for connecting with the two ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge zone; setting an ignition process using the chamber structure and the ion source ignition circuit; learning to obtain the optimal preset time length based on historical test data; forming the minimum MOS tube control timing; and recording all signal recordings after completing the ignition process based on the minimum MOS tube control timing. The scheme adds an ignition block to the plasma chamber, and obtains the most optimized control curve through experimental testing, so that each time an ignition circuit is obtained, it can be clearly determined that the MOS tube control timing that can achieve ignition and has the least damage to the device can be achieved.

Description

Ignition method, system and device for remote plasma source

Technical Field

The present invention relates to the field of semiconductor manufacturing technology, and more specifically, to an ignition method, system and device applied to a remote plasma source.

Background Art

At present, remote plasma sources for generating fluorine atoms are widely used for chamber cleaning in the semiconductor processing industry, especially for cleaning of deposition chambers. The use of remote plasma sources avoids the erosion of internal chamber materials in typical in-situ chamber cleaning. The operation of remote plasma sources generally starts with the introduction of argon or helium and the application of high pressure for pre-excitation (ignition), and then the introduction of cleaning gas into NF3 to ionize and generate atoms for chamber cleaning.

The conventional remote plasma source ignition method is to perform dielectric barrier discharge on sapphire glass through electrodes to ignite the inside of the cavity. This process is complex in structure and requires a high voltage. There is a risk of sapphire glass breakdown. Similarly, the sapphire needs to be vacuum-sealed, which creates a risk of chamber leakage.

Prior to the present invention, in the prior art, a series load resonant converter was conventionally used as an ignition circuit. Once the plasma was ignited, the inductance of the primary winding of the applicator transformer was effectively short-circuited. At this time, the inductance was reduced and the resonant frequency of the circuit became higher. The resonant converter entered a capacitive state, allowing an additional second higher resonant frequency current to flow to the switching power semiconductor device. The short-circuit current brings about a hard switch that is difficult to eliminate for the semiconductor device, but in order to work reliably, it must be reduced or clamped. At this time, the series capacitor must be short-circuited with a high-voltage relay and removed from the circuit, thereby reducing the resonant frequency point and entering a soft switch to avoid damage to the switch tube. The ignition device has a complex structure, has high requirements for the high-voltage relay, and is easily damaged.

Summary of the invention

In view of the above problems, the present invention proposes an ignition method, system and equipment for a remote plasma source, wherein an ignition block is added to the plasma chamber, and the ignition block and the chamber are insulated by a ceramic ring and a perfluoro O-ring. In addition, an optimized control curve is obtained through experimental testing, so that each time an ignition circuit is obtained, the control timing of the MOS tube that can achieve ignition and minimize device damage can be clearly determined.

According to a first aspect of an embodiment of the present invention, an ignition method applied to a remote plasma source is provided.

In one or more embodiments, preferably, the ignition method applied to a remote plasma source includes:

A coupling capacitor is used to control the discharge energy and two ignition power supplies OUT1 and OUT2 are set;

A chamber structure is provided for connecting with two ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge area;

Setting up the ignition process using the chamber structure and the ion source ignition circuit;

The optimal preset time is obtained by learning from historical test data;

The preset time is obtained to form a minimum control timing of the MOS tube;

After the ignition process is completed according to the control timing of the smallest MOS tube, all signal recordings are recorded.

In one or more embodiments, preferably, the method of using a coupling capacitor to control the discharge energy and setting two ignition power supplies OUT1 and OUT2 specifically includes:

Use coupling capacitor to control discharge energy;

The electrodes are set to use metal electrodes that are easy to process;

The ignition power supply uses a parallel load resonant converter;

Two current measurement points A1 and A2 are set, wherein A1 is located at the node between switches Q1 and Q2 of the bridge circuit toward the filter inductor, and A2 is located at the output of the secondary side of transformer T2.

In one or more embodiments, preferably, the chamber structure is configured to be connected to two ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge area, specifically including:

Two cavity ignition blocks are provided, including ignition block No. 1 and ignition block No. 2;

Connect the ignition power supply OUT1 to ignition block No. 1;

Connect the ignition power supply OUT2 to the ignition block No. 2;

The upper and lower chambers are isolated, and the isolation material is a ceramic ring, and is sealed with a perfluorinated O-ring;

The air gap formed by the cross section of the ignition block and the cross section of the chamber forms a capacitively coupled discharge zone.

In one or more embodiments, preferably, the ignition process is set by using the chamber structure and the ion source ignition circuit, specifically including:

Receiving an ignition signal in standby mode;

Close the relay to connect the line from the ignition power supply to the ignition transformer;

The ignition power supply outputs an excitation signal, and the ignition transformer steps up the voltage to the peak value;

Under the action of the voltage peak, the air gap breaks down and ionizes. The ionized argon ions collide with the surrounding gas molecules, continuously ionizing more ions and discharging in the capacitive coupling discharge area until the plasma ring is formed and ignited.

By measuring whether the current values of A1 and A2 reach the preset values, the timing will not start. If they do, the timing will start until the preset time is reached, and then the ignition power output will be turned off, and feedback will be given that the ignition is successful. If the preset time is not reached, the ignition power will continue to be output.

In one or more embodiments, preferably, the learning and obtaining the optimal preset time length according to the historical test data specifically includes:

Extract the preset time length of each ignition process and determine the current values at positions A1 and A2;

Calculate the average current using the first calculation formula according to the current values at positions A1 and A2;

Calculate the optimal coefficient matrix according to the second calculation formula;

Extracting a preset time length using the optimal coefficient matrix and a third calculation formula;

The first calculation formula is:

I _AVG =(I ₁ +I ₂ )÷2

Where IAVG is the average current, _I1 and _I2 are the current values at positions A1 and A2 respectively;

The second calculation formula is:

;

Among them, i is the power number, n is the total number of powers, _Zj is the optimal duration obtained by theoretical analysis in the jth acquisition, j is the acquisition number, s is the total number of acquisition numbers, argmin() is the extraction The function of the coefficient matrix {k ₁ , k ₂ , ..., k _n } when the minimum is reached, {k ₁ , k ₂ , ..., k _n } is the optimal coefficient matrix, k ₁ , k ₂ , ..., k _n are the 1st, 2nd, ..., nth coefficients of the optimal coefficient matrix respectively;

The third calculation formula is:

;

Among them, Y is the preset time length.

In one or more embodiments, preferably, obtaining the preset time length to form a minimum MOS tube control timing specifically includes:

Obtain the preset time length and use the fourth calculation formula to calculate the preset time length of the time delay;

According to the preset time length of the time delay, determine how long it takes to shut down, set the control timing of the MOS tube, and realize delayed shutdown;

The fourth calculation formula is:

C=1.2×Y

Wherein, C is the preset time length of the time delay.

In one or more embodiments, preferably, after the ignition process is completed according to the control timing of the smallest MOS tube, all signal recordings are recorded, which specifically includes:

After ignition is completed, the excitation signal output by the ignition power supply, the current of the parallel load resonant converter at A1 and A2, and the ignition voltage are automatically recorded;

Store the data in the memory card according to the preset format to realize offline reading of ignition recording data.

According to a second aspect of an embodiment of the present invention, an ignition system for a remote plasma source is provided.

In one or more embodiments, preferably, the ignition system applied to a remote plasma source comprises:

A structural module is provided for controlling discharge energy by using a coupling capacitor and providing two ignition power supplies OUT1 and OUT2;

A chamber module is provided to provide a chamber structure for connecting with two ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge area;

An ignition module is provided, which is used to set an ignition process using a chamber structure and an ion source ignition circuit;

The state acquisition module is used to learn and obtain the optimal preset time length based on historical test data;

An adaptive adjustment module, used to obtain the preset time length to form a minimum control timing of the MOS tube;

The ignition completion module is used to record all signal waveforms after the ignition process is completed according to the control timing of the smallest MOS tube.

According to a third aspect of an embodiment of the present invention, there is provided a computer-readable storage medium on which computer program instructions are stored. When the computer program instructions are executed by a processor, the method as described in any one of the first aspect of the embodiment of the present invention is implemented.

According to a fourth aspect of an embodiment of the present invention, there is provided an electronic device, comprising a memory and a processor, wherein the memory is used to store one or more computer program instructions, wherein the one or more computer program instructions are executed by the processor to implement any one of the methods described in the first aspect of the embodiment of the present invention.

The technical solution provided by the embodiments of the present invention may have the following beneficial effects:

In the scheme of the present invention, by changing the chamber structure, the cross section of the ignition block and the chamber cross section form a capacitive coupling discharge zone, and the coupling capacitor is used to control the discharge energy and improve the discharge power. The electrode uses an easy-to-process metal electrode to make the discharge easy to occur; the power supply frequency can be applied from high frequency to low frequency and even pulse power supply, and there is no need to add an additional igniter, reducing the complexity of the structure and the failure rate. In addition, the ignition power supply adopts a parallel load resonant converter, which has the advantage of not needing to consider the resonance point offset causing the hard switch to burn the machine at the moment of arcing.

In the solution of the present invention, the most optimized control curve is obtained through experimental testing, so that every time an ignition loop is obtained, the control timing of the MOS tube that can achieve ignition and cause the least damage to the device can be clearly determined.

Other features and advantages of the present invention will be described in the following description, and partly become apparent from the description, or understood by practicing the present invention. The purpose and other advantages of the present invention can be realized and obtained by the structures particularly pointed out in the written description, claims, and drawings.

The technical solution of the present invention is further described in detail below through the accompanying drawings and embodiments.

BRIEF DESCRIPTION OF THE DRAWINGS

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

FIG. 1 is a flow chart of an ignition method applied to a remote plasma source according to an embodiment of the present invention.

FIG. 2 is a flow chart of an ignition method for a remote plasma source according to an embodiment of the present invention, which uses a coupling capacitor to control discharge energy and sets two ignition power supplies OUT1 and OUT2.

3 is a flow chart of a chamber structure for setting up an ignition method for a remote plasma source according to an embodiment of the present invention, which is used to connect with two ignition power supplies OUT1 and OUT2 to form a capacitively coupled discharge region.

FIG. 4 is a flow chart of an ignition process using a chamber structure and an ion source ignition circuit in an ignition method applied to a remote plasma source according to an embodiment of the present invention.

FIG. 5 is a flow chart of an ignition method for a remote plasma source according to an embodiment of the present invention for learning and obtaining an optimal preset time length based on historical test data.

FIG6 is a flow chart of a control timing of obtaining the preset time length and forming the smallest MOS tube in an ignition method applied to a remote plasma source according to an embodiment of the present invention.

FIG. 7 is a flow chart of recording all signals after the ignition process is completed according to the control timing of the smallest MOS tube in an ignition method applied to a remote plasma source according to an embodiment of the present invention.

FIG. 8 is a structural diagram of an ignition system applied to a remote plasma source according to an embodiment of the present invention.

FIG. 9 is a structural diagram of an electronic device in an embodiment of the present invention.

FIG. 10 is a structural diagram of a conventional remote plasma source ignition method.

FIG. 11 is a structural diagram of the remote plasma source ignition method proposed in the present invention.

FIG. 12 is a diagram showing the ignition effect of the solution of the present invention.

DETAILED DESCRIPTION

In some of the processes described in the specification and claims of the present invention and the above-mentioned figures, multiple operations that appear in a specific order are included, but it should be clearly understood that these operations may not be executed in the order in which they appear in this article or executed in parallel. The serial numbers of the operations, such as 101, 102, etc., are only used to distinguish different operations, and the serial numbers themselves do not represent any execution order. In addition, these processes may include more or fewer operations, and these operations may be executed in sequence or in parallel. It should be noted that the descriptions of "first", "second", etc. in this article are used to distinguish different messages, devices, modules, etc., do not represent the order of precedence, and do not limit the "first" and "second" to be different types.

The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present invention.

The conventional remote plasma source ignition method is to perform dielectric barrier discharge on sapphire glass through electrodes to ignite the inside of the cavity. This process is complex in structure and requires a high voltage. There is a risk of sapphire glass breakdown. Similarly, the sapphire needs to be vacuum-sealed, which creates a risk of chamber leakage.

Prior to the present invention, in the prior art, a series load resonant converter was conventionally used as an ignition circuit. Once the plasma was ignited, the inductance of the primary winding of the applicator transformer was effectively short-circuited. At this time, the inductance was reduced and the resonant frequency of the circuit became higher. The resonant converter entered a capacitive state, allowing an additional second higher resonant frequency current to flow to the switching power semiconductor device. The short-circuit current brings about a hard switch that is difficult to eliminate for the semiconductor device, but in order to work reliably, it must be reduced or clamped. At this time, the series capacitor must be short-circuited with a high-voltage relay and removed from the circuit, thereby reducing the resonant frequency point and entering a soft switch to avoid damage to the switch tube. The ignition device has a complex structure, has high requirements for the high-voltage relay, and is easily damaged.

In the embodiment of the present invention, an ignition method, system and device for a remote plasma source are provided. The solution adds an ignition block to the plasma chamber, and insulates the ignition block and the chamber through a ceramic ring and a perfluoro O-ring. In addition, through experimental testing, the optimal control curve is obtained, so that each ignition loop can clearly achieve ignition and the control timing of the MOS tube with the least damage to the device.

According to a first aspect of an embodiment of the present invention, an ignition method applied to a remote plasma source is provided.

FIG. 1 is a flow chart of an ignition method applied to a remote plasma source according to an embodiment of the present invention.

In one or more embodiments, preferably, the ignition method applied to a remote plasma source includes:

S101, using coupling capacitors to control discharge energy and setting two ignition power supplies OUT1 and OUT2;

S102, setting a chamber structure for connecting with two ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge area;

S103, setting an ignition process using the chamber structure and the ion source ignition circuit;

S104, learning and obtaining the optimal preset time length according to historical test data;

S105, obtaining the preset time length to form a minimum control timing of the MOS tube;

S106 , after the ignition process is completed according to the control timing of the smallest MOS tube, all signal recordings are recorded.

In an embodiment of the present invention, the structure diagram of the conventional remote plasma source ignition method is shown in Figure 10. A series load resonant converter is conventionally used as an ignition circuit. However, once the plasma is ignited, the inductance of the primary winding of the applicator transformer T4 is effectively short-circuited. Since Lm is short-circuited, the transformer leakage inductance (Le) resonates with Cr. According to the resonant frequency calculation formula: f=1/[2π√(LC)], the circuit resonant frequency will increase when L is reduced, and the resonant converter enters a capacitive state, so that the additional second higher resonant frequency current can flow to the switching power semiconductor device. The short-circuit current brings a hard switch that is difficult to eliminate to the semiconductor device, but in order to work reliably, it must be reduced or clamped. At this time, the series capacitor must be short-circuited with a high-voltage relay and removed from the circuit, so that the resonant frequency point is reduced to enter a soft switch to avoid damage to the switch tube. The ignition device has a complex structure, high requirements for high-voltage relays and is easy to damage.

FIG. 2 is a flow chart of an ignition method for a remote plasma source according to an embodiment of the present invention, which uses a coupling capacitor to control discharge energy and sets two ignition power supplies OUT1 and OUT2.

As shown in FIG. 2 , in one or more embodiments, preferably, the use of coupling capacitors to control discharge energy and setting two ignition power supplies OUT1 and OUT2 specifically includes:

S201, using coupling capacitor to control discharge energy;

S202, setting electrodes to use metal electrodes that are easy to process;

S203, the ignition power supply adopts a parallel load resonant converter;

S204, setting two current measurement points A1 and A2, wherein A1 is located at the node between switches Q1 and Q2 of the bridge circuit toward the filter inductor, and A2 is located at the output of the secondary side of transformer T2.

In the embodiment of the present invention, when setting the remote plasma ignition mode, the ignition circuit is first changed, a coupling capacitor is used to control the discharge energy, and the electrode is set to use an easily processed metal electrode; the ignition power supply uses a parallel load resonant converter.

3 is a flow chart of a chamber structure for setting up an ignition method for a remote plasma source according to an embodiment of the present invention, which is used to connect with two ignition power supplies OUT1 and OUT2 to form a capacitively coupled discharge region.

As shown in FIG. 3 , in one or more embodiments, preferably, the chamber structure is configured to be connected to two ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge area, specifically including:

S301, setting two cavity ignition blocks, including ignition block No. 1 and ignition block No. 2;

S302, connect the ignition power supply OUT1 to the ignition block No. 1;

S303, connecting the ignition power supply OUT2 to the ignition block No. 2;

S304, upper and lower chambers are isolated, the isolation material is a ceramic ring, and is sealed with a perfluorinated O-ring;

S305. An air gap formed by the cross section of the ignition block and the cross section of the chamber forms a capacitive coupling discharge region.

In an embodiment of the present invention, two cavity ignition blocks are provided, including ignition block No. 1 and ignition block No. 2. The upper and lower chambers are isolated. The isolation material is a ceramic ring and is sealed with a perfluoro O-ring. The ignition power supply OUT1 is connected to ignition block No. 1, and the ignition power supply OUT2 is connected to ignition block No. 2. The air gap formed by the cross-section of the ignition block and the cross-section of the chamber can form a capacitively coupled discharge zone.

FIG. 4 is a flow chart of an ignition process using a chamber structure and an ion source ignition circuit in an ignition method applied to a remote plasma source according to an embodiment of the present invention.

As shown in FIG. 4 , in one or more embodiments, preferably, the ignition process is set using the chamber structure and the ion source ignition circuit, specifically including:

S401, receiving an ignition signal in a standby state;

S402, closing the relay so that the line from the ignition power supply to the ignition transformer is connected;

S403, the ignition power supply outputs an excitation signal, and the ignition transformer boosts the voltage to a peak value;

S404, under the action of the voltage peak, the air gap breaks down and ionizes, and the ionized argon ions collide with the surrounding gas molecules, continuously ionizing more ions, and discharging in the capacitive coupling discharge area until the plasma ring is formed and ignited;

S405, by measuring whether the current values of A1 and A2 reach the preset values, the timing will not be started. If they reach the preset time, the timing will be started, and then the ignition power output will be turned off, and feedback will be given that the ignition is successful. If the preset time is not reached, the ignition power will continue to be output.

In the embodiment of the present invention, when an ignition signal is received in the standby state, 1. the relay is closed first, so that the line from the ignition power supply to the ignition transformer is connected. 2. The ignition power supply outputs an excitation signal, and the ignition transformer performs voltage boosting. Under the action of Vspark and -Vspark, the air gap is broken down and ionized. The ionized argon ions will collide with the surrounding gas molecules and continue to ionize more ions until a preset time is reached, and a plasma ring is formed. At this time, by measuring the current values of A1 and A2, it can be judged whether the ignition is successful. If the preset value is reached, it is judged that the ignition is successful.

FIG. 5 is a flow chart of an ignition method for a remote plasma source according to an embodiment of the present invention for learning and obtaining an optimal preset time length based on historical test data.

As shown in FIG5 , in one or more embodiments, preferably, the learning and obtaining the optimal preset time length according to the historical test data specifically includes:

S501, extracting the preset time length of each ignition process, and determining the current values at positions A1 and A2;

S502, calculating the average current using a first calculation formula according to the current values at positions A1 and A2;

S503, calculating the optimal coefficient matrix according to the second calculation formula;

S504, extracting a preset time length using the optimal coefficient matrix and a third calculation formula;

The first calculation formula is:

I _AVG =(I ₁ +I ₂ )÷2

Where IAVG is the average current, _I1 and _I2 are the current values at positions A1 and A2 respectively;

The second calculation formula is:

;

Among them, i is the power number, n is the total number of powers, _Zj is the optimal duration obtained by theoretical analysis in the jth acquisition, j is the acquisition number, s is the total number of acquisition numbers, argmin() is the extraction The function of the coefficient matrix {k ₁ , k ₂ , ..., k _n } when the minimum is reached, {k ₁ , k ₂ , ..., k _n } is the optimal coefficient matrix, k ₁ , k ₂ , ..., k _n are the 1st, 2nd, ..., nth coefficients of the optimal coefficient matrix respectively;

The third calculation formula is:

;

Among them, Y is the preset time length.

In the embodiment of the present invention, the control curve with the most optimized preset time length is obtained through experiments and tests, so that the control time length of each ignition loop can be predicted according to the environmental conditions collected in advance.

FIG6 is a flow chart of a control timing of obtaining the preset time length and forming the smallest MOS tube in an ignition method applied to a remote plasma source according to an embodiment of the present invention.

As shown in FIG. 6 , in one or more embodiments, preferably, obtaining the preset time length to form a minimum MOS tube control timing specifically includes:

S601, obtaining the preset time length and using a fourth calculation formula to calculate the preset time length of the time delay;

S602, judging how long it takes to shut down according to the preset time of the time delay, setting the control timing of the MOS tube, and realizing delayed shutdown;

The fourth calculation formula is:

C=1.2×Y

Wherein, C is the preset time length of the time delay.

In the embodiment of the present invention, the control duration of the ignition circuit is then determined according to a preset margin to clearly determine the delay for ignition, and the control timing of the MOS tube that causes the least damage to the device is determined and saved as a control instruction.

FIG. 7 is a flow chart of recording all signals after the ignition process is completed according to the control timing of the smallest MOS tube in an ignition method applied to a remote plasma source according to an embodiment of the present invention.

As shown in FIG. 7 , in one or more embodiments, preferably, after the ignition process is completed according to the control timing of the smallest MOS tube, all signal recordings are recorded, which specifically includes:

S701, after ignition is completed, automatically record the excitation signal output by the ignition power supply, the current of the parallel load resonant converter at A1 and A2, and the ignition voltage;

S702. Store the ignition recording data in a memory card according to a preset format to realize offline reading of the ignition recording data.

In the embodiment of the present invention, the ignition process is completed, and during the ignition process, the transformation process of the waveform is recorded.

According to a second aspect of an embodiment of the present invention, an ignition system for a remote plasma source is provided.

FIG. 8 is a structural diagram of an ignition system applied to a remote plasma source according to an embodiment of the present invention.

In one or more embodiments, preferably, the ignition system applied to a remote plasma source comprises:

A structural module 801 is provided, which is used to control the discharge energy by using a coupling capacitor and to provide two ignition power supplies OUT1 and OUT2;

A chamber module 802 is provided to provide a chamber structure for connecting with two ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge area;

An ignition module 803 is provided to set an ignition process using the chamber structure and the ion source ignition circuit;

The state acquisition module 804 is used to learn and obtain the optimal preset time length according to historical test data;

The adaptive adjustment module 805 is used to obtain the preset time length to form a minimum control timing of the MOS tube;

The ignition completion module 806 is used to record all signal waveforms after the ignition process is completed according to the control timing of the smallest MOS tube.

In the embodiment of the present invention, a system suitable for different structures is realized through a series of modular designs. The system can achieve closed-loop, reliable and efficient execution through collection, analysis and control.

According to a third aspect of an embodiment of the present invention, there is provided a computer-readable storage medium on which computer program instructions are stored. When the computer program instructions are executed by a processor, the method as described in any one of the first aspect of the embodiment of the present invention is implemented.

According to a fourth aspect of an embodiment of the present invention, an electronic device is provided. FIG. 9 is a structural diagram of an electronic device in one embodiment of the present invention. The electronic device shown in FIG. 9 is an ignition device generally used for remote plasma sources. The electronic device may be a smart phone, a tablet computer, or other device. As shown, the electronic device 900 includes a processor 901 and a memory 902. The processor 901 is electrically connected to the memory 902. The processor 901 is the control center of the electronic device 900, and uses various interfaces and lines to connect various parts of the entire terminal, and executes various functions of the terminal and processes data by running or calling computer programs stored in the memory 902, and calling data stored in the memory 902, thereby monitoring the terminal as a whole.

In this embodiment, the processor 901 in the electronic device 900 will load the instructions corresponding to the processes of one or more computer programs into the memory 902 according to the following steps, and the processor 901 will run the computer program stored in the memory 902 to realize various functions: use coupling capacitors to control discharge energy and set two ignition power supplies OUT1 and OUT2; set a chamber structure for connecting with the two ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge area; use the chamber structure and the ion source ignition circuit to set the ignition process; learn from historical test data to obtain the optimal preset time length; obtain the preset time length to form the minimum MOS tube control timing; after completing the ignition process according to the minimum MOS tube control timing, record all signal recordings.

The memory 902 may be used to store computer programs and data. The computer programs stored in the memory 902 include instructions that can be executed in the processor. The computer programs may constitute various functional modules. The processor 901 executes various functional applications and data processing by calling the computer programs stored in the memory 902.

The structural diagram of the remote plasma source ignition method proposed in this scheme is shown in Figure 11, 1 and 2 represent cavity ignition blocks, 1 and 2 are isolated from the upper and lower chambers, the isolation material is a ceramic ring, and is sealed with a perfluorinated O-ring. The ignition power supply OUT1 is connected to the ignition block No. 1, and the voltage is Vspark at this time. The ignition power supply OUT2 is connected to the ignition block No. 2, and the voltage is -Vspark at this time. Due to the air gap formed by the cross-section of the ignition block and the cross-section of the chamber, a capacitively coupled discharge area CCP can be formed. Under the action of Vspark and -Vspark, the air gap is broken down and ionized. The ionized argon ions will collide with the surrounding gas molecules and continue to ionize more ions until a plasma ring is formed. At this time, by measuring the current values of A1 and A2, it can be determined whether the ignition is successful. When the preset value is reached, it is determined that the ignition is successful and the relay is disconnected.

As shown in Figure 12, it is an ignition effect diagram formed by the scheme of the present invention. Channel 1 is the excitation signal output by the ignition power supply, channel 3 is the current of the parallel load resonant converter at A1, channel 2 is the Vspark ignition voltage, and channel 4 is the ignition current. The above figure shows the entire waveform transformation process of successful breakdown discharge ignition. From the waveform, the entire discharge process is stable, the ignition time is short, and the ignition success rate is high. The improved ignition device meets the working requirements.

The technical solution provided by the embodiments of the present invention may have the following beneficial effects:

In the scheme of the present invention, by changing the chamber structure, the cross section of the ignition block and the chamber cross section form a capacitive coupling discharge zone, and the coupling capacitor is used to control the discharge energy and improve the discharge power. The electrode uses an easy-to-process metal electrode to make the discharge easy to occur; the power supply frequency can be applied from high frequency to low frequency and even pulse power supply, and there is no need to add an additional igniter, reducing the complexity of the structure and the failure rate. In addition, the ignition power supply adopts a parallel load resonant converter, which has the advantage of not needing to consider the resonance point offset causing the hard switch to burn the machine at the moment of arcing.

In the solution of the present invention, the most optimized control curve is obtained through experimental testing, so that every time an ignition loop is obtained, the control timing of the MOS tube that can achieve ignition and cause the least damage to the device can be clearly determined.

It should be understood by those skilled in the art that the embodiments of the present invention may be provided as methods, systems, or computer program products. Therefore, the present invention may take the form of a complete hardware embodiment, a complete software embodiment, or an embodiment combining software and hardware. Moreover, the present invention may take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to disk storage and optical storage, etc.) containing computer-usable program codes.

The present invention is described with reference to the flowcharts and/or block diagrams of the methods, devices (systems), and computer program products according to the embodiments of the present invention. It should be understood that each process and/or box in the flowchart and/or block diagram, as well as the combination of the processes and/or boxes in the flowchart and/or block diagram, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing device to generate a machine, so that the instructions executed by the processor of the computer or other programmable data processing device generate a device for implementing the functions specified in one or more processes in the flowchart and/or one or more boxes in the block diagram.

These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing device to work in a specific manner, so that the instructions stored in the computer-readable memory produce a manufactured product including an instruction device that implements the functions specified in one or more processes in the flowchart and/or one or more boxes in the block diagram.

These computer program instructions may also be loaded onto a computer or other programmable data processing device so that a series of operational steps are executed on the computer or other programmable device to produce a computer-implemented process, whereby the instructions executed on the computer or other programmable device provide steps for implementing the functions specified in one or more processes in the flowchart and/or one or more boxes in the block diagram.

Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.

Claims (5)

1. An ignition method for a remote plasma source, the method comprising:

The discharge energy is controlled by adopting a coupling capacitor, and 2 ignition power supplies OUT1 and OUT2 are arranged;

The chamber structure is arranged and is used for being connected with 2 ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge area;

setting an ignition flow by using the chamber structure and an ion source ignition circuit;

Learning according to historical test data to obtain optimal preset time length;

Obtaining the preset time length and forming a control time sequence of the minimum MOS tube;

after the ignition process is completed according to the control time sequence of the minimum MOS tube, recording all signal wave recordings;

wherein, adopt coupling capacitor control discharge energy and set up 2 ignition power OUT1 and OUT2, specifically include:

controlling discharge energy by adopting a coupling capacitor;

the set electrode adopts an easy-to-process metal electrode;

the ignition power supply adopts a parallel load resonant converter;

Setting two current measuring points A1 and A2, wherein A1 is positioned at a node between a Q1 switch and a Q2 switch of a bridge circuit and faces the direction of a filter inductance, and A2 is positioned at the output of the secondary side of a T2 transformer;

The cavity structure is used for being connected with 2 ignition power supplies OUT1 and OUT2 to form a capacitive coupling discharge area, and specifically comprises:

Setting 2 cavity ignition blocks, wherein the cavity ignition blocks comprise a No. 1 ignition block and a No. 2 ignition block;

Connecting an ignition power supply OUT1 to an ignition block No. 1;

connecting an ignition power supply OUT2 to an ignition block No. 2;

The upper cavity and the lower cavity are isolated, the isolated material is a ceramic ring, and the ceramic ring is sealed by a perfluorinated O-shaped ring;

the section of the ignition block and the air gap formed by the section of the cavity form a capacitive coupling discharge area;

the ignition process is set by using the chamber structure and the ion source ignition circuit, and specifically comprises the following steps:

receiving an ignition signal in a standby state;

closing the relay to enable a circuit from an ignition power supply to the ignition transformer to be connected;

the ignition power supply outputs an excitation signal, and the ignition transformer is boosted to a voltage peak value;

Under the action of a voltage peak value, the air gap is broken down and ionized, ionized argon ions collide with surrounding gas molecules, more ions are continuously ionized, and the discharge is carried out in a capacitive coupling discharge area until plasma rings form ignition;

By measuring whether the current values of A1 and A2 reach the preset value, not starting timing, if so, starting timing to reach the preset time length, then turning off the ignition power supply output, feeding back the ignition success, and if not, continuing to output the ignition power supply;

The learning according to the historical test data to obtain the optimal preset time length specifically comprises the following steps:

extracting the preset time length of each ignition process, and judging the current values at the A1 and A2 positions;

Calculating average current according to the current values of the A1 and the A2 positions by using a first calculation formula;

calculating an optimal coefficient matrix according to a second calculation formula;

Extracting a preset time length by using the optimal coefficient matrix and a third calculation formula;

the first calculation formula is as follows:

I_AVG=(I₁+I₂)÷2

Wherein, I _AVG is average current, I ₁ and I ₂ are current values of A1 and A2 respectively;

the second calculation formula is as follows:

；

wherein i is the number of powers, n is the total number of powers, Z _j is the optimal duration obtained by theoretical analysis in the jth acquisition, j is the number of acquisition times, s is the total number of acquisition times, argmin () is the extraction The function of the coefficient matrix { k ₁,k₂,……,k_n } at the minimum, { k ₁,k₂,……,k_n } is the optimal coefficient matrix, and k ₁,k₂,……,k_n is the 1 st, 2 nd, … … th and n th coefficients of the optimal coefficient matrix in sequence;

The third calculation formula is as follows:

；

Wherein Y is a preset time;

the obtaining the control time sequence of the MOS tube with the minimum preset time length comprises the following steps:

obtaining the preset time length and calculating the preset time length of the time delay by using a fourth calculation formula;

judging how long the MOS tube needs to be turned off according to the preset time length of the time delay, and setting a control time sequence of the MOS tube to realize the time delay turn-off;

the fourth calculation formula is as follows:

C=1.2×Y

wherein C is the preset time of the time delay.

2. The ignition method for a remote plasma source according to claim 1, wherein after the ignition process is completed according to the control timing sequence of the minimum MOS tube, recording all signal recordings, specifically comprising:

after the ignition is completed, the record of the excitation signal output by the ignition power supply, the current of the parallel load resonant converter at the A1 and the A2 and the ignition voltage is automatically carried out;

And storing the data into a memory card according to a preset format to realize off-line reading of the ignition recording data.

3. An ignition system for a remote plasma source, wherein the system is adapted to perform the method of any one of claims 1-2, the system comprising:

The setting structure module is used for controlling discharge energy by adopting a coupling capacitor and setting 2 ignition power supplies OUT1 and OUT2;

The device comprises a chamber module, a capacitor-coupled discharge area and a control module, wherein the chamber module is used for setting a chamber structure and is used for being connected with 2 ignition power supplies OUT1 and OUT2 to form a capacitor-coupled discharge area;

the ignition module is used for setting an ignition flow by utilizing the chamber structure and the ion source ignition circuit;

the state acquisition module is used for learning to obtain optimal preset time according to the historical test data;

The self-adaptive adjustment module is used for obtaining the preset time length and forming the control time sequence of the minimum MOS tube;

And the ignition completion module is used for recording all signal wave records after the ignition process is completed according to the control time sequence of the minimum MOS tube.

4. A computer readable storage medium, on which computer program instructions are stored, which computer program instructions, when executed by a processor, implement the method of any of claims 1-2.

5. An electronic device comprising a memory and a processor, wherein the memory is configured to store one or more computer program instructions, wherein the one or more computer program instructions are executed by the processor to implement the method of any of claims 1-2.