CN118588522B - Carrier units and related products for charged particle beam devices - Google Patents
Carrier units and related products for charged particle beam devices Download PDFInfo
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- CN118588522B CN118588522B CN202411073109.8A CN202411073109A CN118588522B CN 118588522 B CN118588522 B CN 118588522B CN 202411073109 A CN202411073109 A CN 202411073109A CN 118588522 B CN118588522 B CN 118588522B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
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- Analysing Materials By The Use Of Radiation (AREA)
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Abstract
The application discloses a carrying unit for a charged particle beam device and a related product. The carrying unit comprises: the object carrying plate is arranged at the electron beam output end of the charged particle beam device through the fixed bracket, and is provided with a longitudinal opening coaxial with the electron beam, and the opening size of the longitudinal opening is larger than that of the electron beam output end; and a nailing station embedded in the longitudinal opening of the carrying plate for placing the detection object so that the electron beam acts on the detection object. According to the scheme provided by the embodiment of the application, the object carrying flat plate and the nail table can be fixed on the charged particle beam device together, so that the object carrying unit and the charged particle beam device form a whole, and even under the condition of vibration, the relative positions of the charged particle beam in the charged particle beam device and a sample cannot be changed, thereby eliminating negative influence of environment and device vibration on a detection result and improving the stability of performance detection of the charged particle beam device.
Description
Technical Field
The present application relates generally to the field of detection technology. More particularly, the present application relates to a carrier unit for a charged particle beam device and related products.
Background
With the continuous miniaturization of semiconductor devices, higher demands are being made on the detection accuracy, the processing accuracy, etc. of semiconductor devices, and the detection and processing techniques based on electron beams, ion beams, etc. are rapidly developed accordingly, and are widely used in the microelectronics field, such as scanning electron microscopes (SEM, scanning Electron Microscope) and Focused Ion Beam devices (FIB, focused Ion Beam), etc.
Taking a scanning electron microscope as an example, in a conventional scanning electron microscope, a sample is usually placed on a stage for detection, but since the actual process environment is difficult to control, the performance of the device is extremely susceptible to the environment in which the device is located when the scanning electron microscope is used for semiconductor detection. Particularly, the vibration of the surrounding environment can cause the relative position of the charged particle beam and the sample to change, so that the result of multiple measurements of the device is in and out, and the detection stability is affected.
In view of the foregoing, it is desirable to provide a design of a carrier unit for a charged particle beam device in order to eliminate the negative effects of environmental and device vibrations on the detection result when using the charged particle beam device for detection.
Disclosure of Invention
In order to solve at least one or more of the technical problems mentioned above, the present application proposes, in various aspects, a design of a carrier unit for a charged particle beam device.
In a first aspect, the application provides a carrier unit for a charged particle beam apparatus comprising: the object carrying plate is arranged at the electron beam output end of the charged particle beam device through a fixed bracket and is provided with a longitudinal opening coaxial with the electron beam; and a nailing station embedded in the longitudinal opening of the carrying plate for placing the detection object so that the electron beam acts on the detection object.
In some embodiments, the fixing support is made of conductive material, and the charged particle beam device where the carrying unit is located is provided with a lateral secondary electron detector, and the center point of the longitudinal opening is located on the axis of the electrode of the lateral secondary electron detector.
In some embodiments, the fixing support is made of an insulating material, and the charged particle beam device where the carrying unit is located is provided with an in-lens-barrel detector, and the in-lens-barrel detector is coaxially arranged with the longitudinal opening.
In some embodiments, the carrier unit comprises at least two fixing brackets uniformly arranged along a circumference centered on a center point of the longitudinal opening, wherein a radius of the circumference centered on the center point of the longitudinal opening is less than or equal to a radius of the carrier plate.
In some embodiments, the longitudinal opening of the carrier plate is formed by axially combining a first circular opening and a second circular opening, and the first circular opening is coaxial with the second circular opening; the diameter of the first circular opening is larger than that of the second circular opening, the planeness of the interface between the first circular opening and the second circular opening is smaller than a preset planeness threshold, and the planeness of the interface between the carrying flat plate and the first circular opening is smaller than the preset planeness threshold.
In some embodiments, the difference between the diameter of the first circular opening and the diameter of the table top of the table is less than a preset diameter difference, and the difference between the diameter of the second circular opening and the diameter of the shank of the table is less than a preset diameter difference.
In some embodiments, the density of the fixed stent is less than a preset density threshold.
In some embodiments, the carrier plate is made of a conductive material, the carrier plate has a sidewall with a lateral opening facing the lateral secondary electron detector.
In some embodiments, the fixation bracket comprises: a vertical bracket, a bevel bracket and a telescopic piece; wherein, be equipped with first assembly end and second assembly end on the vertical support, first assembly end is used for fixed with charged particle beam device, is equipped with third assembly end and fourth assembly end on the dog-ear support, and the third assembly end is used for fixed with carrying the thing flat plate, and fourth assembly end is fixed through the extensible member with the second assembly end of vertical support, and the angle of buckling of dog-ear support is less than the angle difference of predetermineeing with the cone angle of the outer pole shoe of objective in the charged particle beam device.
In some embodiments, the top surface shape of the side wall of the carrier plate matches the electrode shape of the outer pole piece of the objective lens in the charged particle beam device.
In some embodiments, the longitudinal opening of the carrier plate is formed by axially combining a first circular opening and a second circular opening, and the first circular opening is coaxial with the second circular opening; the diameter of the first circular opening is larger than that of the second circular opening, and the height of the first circular opening is consistent with the thickness of the table top of the nail table.
In some embodiments, the conductivity of the carrier plate is greater than or equal to a preset conductivity threshold.
In some embodiments, the fixing support is a ceramic column, and metal connecting rods are arranged at two ends of the ceramic column, and the ceramic column is respectively connected and fixed with the charged particle beam device and the carrying flat plate through the metal connecting rods.
In a second aspect, the present application provides a charged particle beam apparatus comprising: a charged particle emitting unit, a particle beam focusing unit, an objective lens unit, a particle beam deflection unit and a carrier unit according to any one of the first aspects; the charged particle emission unit, the particle beam focusing unit, the objective lens unit and the particle beam deflection unit are coaxially arranged, and the object carrying unit is fixed on an outer pole shoe of the objective lens in the objective lens unit.
Through the object carrying unit for the charged particle beam device, the object carrying flat plate and the nail table embedded in the object carrying flat plate are fixed on the charged particle beam device through the fixing support, so that the object carrying unit and the charged particle beam device form a whole, the relative positions of the charged particle beam in the charged particle beam device and a sample cannot be changed even under the condition that vibration exists in the use environment, negative influences of the environment and device vibration on detection results are eliminated, and the stability of performance detection of the charged particle beam device is improved.
Drawings
The above, as well as additional purposes, features, and advantages of exemplary embodiments of the present application will become readily apparent from the following detailed description when read in conjunction with the accompanying drawings. In the drawings, embodiments of the application are illustrated by way of example and not by way of limitation, and like reference numerals refer to similar or corresponding parts and in which:
FIG. 1 illustrates an exemplary block diagram of a carrier unit according to an embodiment of the application;
FIG. 2 illustrates an exemplary block diagram of a staple station according to some embodiments of the present application;
FIG. 3 illustrates an exemplary block diagram of a carrier plate according to some embodiments of the application;
FIG. 4 illustrates an exemplary top view of a carrier plate according to some embodiments of the application;
FIG. 5 illustrates an exemplary cross-sectional view of a carrier plate according to some embodiments of the application;
FIG. 6 illustrates an exemplary block diagram of a vertical support of some embodiments of the application;
FIG. 7 illustrates an exemplary block diagram of a dog-leg bracket of some embodiments of the present application;
FIG. 8 illustrates an exemplary block diagram of a carrier unit according to further embodiments of the present application;
FIG. 9 illustrates an exemplary block diagram of a carrier plate according to further embodiments of the present application;
FIG. 10 illustrates an exemplary block diagram of a charged particle beam apparatus according to some embodiments of the application;
fig. 11 shows an exemplary structure of a charged particle beam apparatus according to other embodiments of the present application.
Detailed Description
The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are some, but not all embodiments of the application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
It should be understood that the terms "comprises" and "comprising," when used in this specification and in the claims, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
It is also to be understood that the terminology used in the description of the application herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used in the specification and claims, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should be further understood that the term "and/or" as used in the present specification and claims refers to any and all possible combinations of one or more of the associated listed items, and includes such combinations.
As used in this specification and the claims, the term "if" may be interpreted as "when..once" or "in response to a determination" or "in response to detection" depending on the context. Similarly, the phrase "if a determination" or "if a [ described condition or event ] is detected" may be interpreted in the context of meaning "upon determination" or "in response to determination" or "upon detection of a [ described condition or event ]" or "in response to detection of a [ described condition or event ]".
Specific embodiments of the present application are described in detail below with reference to the accompanying drawings.
Exemplary application scenarios
In existing scanning electron microscopes, the sample is typically placed on a stage, which is typically a carrier device independent of the scanning electron microscope. Since the actual process environment is difficult to control, the device performance is extremely susceptible to the environment in which the device is located, especially the vibration of the surrounding environment, when using a scanning electron microscope for semiconductor inspection.
When a sample is placed on a stage independent of a scanning electron microscope, vibration of the surrounding environment may cause displacement of the scanning electron microscope and/or the stage, and the displacement direction and degree of the sample cannot be guaranteed to be consistent under the condition that the sample and the stage are simultaneously displaced, so that the relative positions of the charged particle beam and the sample are changed, and the result of multiple measurement of the device is in and out, and the detection stability is affected.
Exemplary application scenario
In view of the above, the embodiment of the application provides a design scheme of a carrying unit for a charged particle beam device, which fixes a carrying flat plate, a nail table and the charged particle beam device into a whole through a fixing bracket, thereby ensuring that the relative positions of a charged particle beam and a sample under the influence of environmental vibration are not changed, eliminating the negative influence of the environmental and device vibration on a detection result, and improving the performance detection stability of the charged particle beam device.
Fig. 1 shows an exemplary structure of a carrier unit according to an embodiment of the present application, and as shown in fig. 1, the carrier unit includes: a fixed bracket 11, a carrying flat plate 12 and a nail table 13. The nail table is also called a nail-shaped sample table, has various tool specifications and is used for placing a detection object, and the electron beam emitted by the charged particle beam device acts on the detection object. In this embodiment, the carrier plate 12 has a longitudinal opening for receiving the staple table 13.
In this embodiment, the longitudinal direction refers to the axial direction perpendicular to the object carrying surface of the object carrying plate 12, and the axis of the longitudinal opening coincides with the axial direction of the charged particle beam device, that is, the longitudinal opening is coaxial with the electron beam emitted by the charged particle beam device. In addition, in the carrier unit shown in this embodiment, the opening size of the longitudinal opening is larger than the opening size of the electron beam output end.
Fig. 2 shows an exemplary block diagram of the nailing station according to some embodiments of the present application, and fig. 3 shows an exemplary block diagram of the carrier plate according to some embodiments of the present application, in which the longitudinal opening of the carrier plate 12 is formed by axially combining a first circular opening and a second circular opening, and the first circular opening is coaxial with the second circular opening, wherein the diameter of the first circular opening is larger than the diameter of the second circular opening. The nailing station 13 is embedded in the longitudinal opening, specifically, the table top of the nailing station 13 is embedded in the first circular opening, and the nailing body of the nailing station is embedded in the second circular opening.
In this embodiment, the diameters of the first circular opening and the second circular opening are not strictly limited, and in practical application, the diameters of the first circular opening and the second circular opening can be adjusted according to the tooling specification of the nail table 13, so that the nail table 13 can be better embedded into the longitudinal opening.
In some embodiments, in order to ensure that the sample is placed perpendicular to the axial direction of the particle beam device, the particle beam can strike the sample at a predetermined angle, preventing sample tilting from affecting the detection result of the device, the following requirements are set on the flatness of the loading plate 12: the flatness of the interface of the first circular opening and the second circular opening is less than a preset flatness threshold, and the flatness of the interface of the carrier plate 12 and the first circular opening is less than a preset flatness threshold.
And taking the direction of the second circular opening pointing to the first circular opening as the upper direction, wherein the planeness of the plane Pa where the upper surface of the first circular opening is positioned is smaller than a preset planeness threshold value, and the planeness of the plane where the lower surface of the first circular opening or the upper surface Pb of the second circular opening is positioned is smaller than the preset planeness threshold value.
Further, in the present embodiment, the preset flatness threshold value may be 15 μm to 20 μm, alternatively, the preset flatness threshold value may be 20 μm.
In some embodiments, it may be desirable to apply a voltage across the carrier plate 12 and the sample when the sample is placed for detection, where the carrier plate 12 is made of a conductive material. In order to prevent the excessive gap between the loading plate 12 and the nailing table 13 from affecting the uniformity of the formed electrostatic field, in this embodiment, the difference between the diameter Da of the first circular opening and the diameter Dc of the table top of the nailing table 13 is smaller than the preset diameter difference, and the difference between the diameter Db of the second circular opening and the diameter Dd of the shank of the nailing table 13 is smaller than the preset diameter difference, so that the nailing table 13 is more attached to the loading plate 12.
As an example, the difference Da-Dc between the diameter Da of the first circular opening and the diameter Dc of the table top of the table 13 is less than 25 μm, and the difference Db-Dd between the diameter Db of the second circular opening and the diameter Dd of the shank of the table 13 is less than 25 μm, it should be noted that, in order to ensure that the table 13 can be inserted into the longitudinal opening on the loading plate 12, the following dimensional parameters of the table 13 are required: dc is less than or equal to Da and Dd is less than or equal to Db.
In the embodiment of the application, the nail table 13 is embedded and fixed in the center of the carrying flat plate 12, the carrying flat plate 12 is fixed with the charged particle beam device through the fixing bracket, specifically, the carrying flat plate 12 is installed at the electron beam output end of the charged particle beam device through the fixing bracket 11, so that the nail table 13 and the carrying flat plate 12 form a whole with the charged particle beam device, and the relative positions of the charged particle beam and the sample in the charged particle beam device are not changed even under the condition of vibration in the use environment. Further, the number of the fixing brackets 11 is greater than or equal to 2, and the plurality of fixing brackets 11 are uniformly arranged along a circumference to secure stability. The circumference is centered on the center point of the longitudinal opening and has a radius less than or equal to the radius of the load plate 12. As an example, the loading plate 12 may be fixed to the charged particle beam device by 4,5,6 or other number of fixing brackets 11, for example, in the case of 4 fixing brackets 11, an angle between each two adjacent fixing brackets 11 of the 4 fixing brackets 11 and a central line of the loading plate 12 may be 90 degrees, and one end of each fixing bracket 11 is fixed to the charged particle beam device, and the other end is fixed to the loading plate 12.
In the performance acceptance phase of a charged particle beam apparatus, the charged particle beam apparatus may use different types of detectors, such as: lateral secondary electron detector and in-lens-barrel detector. Corresponding to the different performance acceptance conditions, fixing brackets with different materials can be selected.
Taking fig. 1 as an example, a carrier unit is shown, which is suitable for a charged particle beam device with a lateral secondary electron detector, in which a conductive material is used as a fixing bracket 11 in the carrier unit, for example: and (3) metal. And, the center point of the longitudinal opening of the loading plate 12 is located on the axis of the electrode of the side secondary electron detector, so that secondary electrons generated by the electron beam acting on the detection object can be collected by the electrode of the side secondary electron detector. When the lateral secondary electron detector is used for detection, voltage does not need to be applied to the sample, and the secondary electrons excited from the sample can be effectively prevented from being continuously accumulated on the fixed support by adopting the conductive material, so that the device performance is influenced.
Further, in the carrier unit shown in fig. 1, the carrier plate 12 has side walls. Fig. 4 shows an exemplary top view of a carrier plate according to some embodiments of the application, fig. 5 shows an exemplary cross-sectional view of a carrier plate according to some embodiments of the application, as shown in fig. 4 and 5, with lateral openings 121 on the side walls of carrier plate 12, and with lateral openings 121 facing a lateral secondary electron detector in a charged particle beam device, so that the electrodes of the lateral secondary electron detector collect secondary electrons. As one example, the opening angle of the lateral opening 121 may be 100 ° to 150 °.
Since no voltage needs to be applied to the sample when using the lateral secondary electron detector for detection, the carrier unit can be in contact fit with the objective pole shoe in the charged particle beam device. In order to achieve a better limiting effect, in some embodiments, the shape of the top surface of the side wall of the carrying plate 12 is matched with the shape of the electrode of the outer pole shoe of the objective lens in the charged particle beam device, so that the top surface of the side wall of the carrying plate 12 can be perfectly attached to the outer pole shoe of the objective lens, and the carrying plate 12 is effectively limited in the radial direction.
As an example, the shape of the electrode of the outer pole piece of the objective lens in the charged particle beam device may include a horizontal plane and a taper angle slope, and the shape of the top surface of the sidewall of the carrier plate 12 in this embodiment may also include a horizontal plane and a taper angle slope, so that after the carrier plate 12 is mounted to the electron beam output end of the charged particle beam device, the horizontal plane on the top surface of the sidewall of the carrier plate 12 is fitted to the horizontal plane of the electrode of the outer pole piece of the objective lens, and the taper angle slope on the top surface of the sidewall of the carrier plate 12 is fitted to the taper angle slope of the electrode of the outer pole piece of the objective lens. When the charged particle beam device is in a vibration environment, the inclined surface can limit the movement of the charged particle beam device in the horizontal direction, and similarly, the cone angle inclined surface can limit the movement of the carrying unit in the horizontal direction.
In this embodiment, the fixing bracket 11 is used for axially limiting the carrying plate 12. As an example, the fixing bracket 11 may include: a vertical bracket 111, a corner bracket 112 and a telescopic member 113. Fig. 6 illustrates an exemplary structural view of a vertical bracket according to some embodiments of the present application, fig. 7 illustrates an exemplary structural view of a corner bracket according to some embodiments of the present application, and as shown in fig. 6 and 7, the vertical bracket 111 and the corner bracket 112 are provided with fitting holes, the fitting holes on the vertical bracket 111 may be provided at first and second fitting ends of the vertical bracket 111, and the fitting holes on the corner bracket 112 may be provided at third and fourth fitting ends of the corner bracket 112. The first assembling end of the vertical support 111 is used for being fixed with the charged particle beam device through the assembling hole, the third assembling end of the angle bracket 112 is used for being fixed with the carrying flat plate 12 through the assembling hole, the second assembling end of the vertical support 111 and the fourth assembling end of the angle bracket 112 are fixed through the assembling holes and the telescopic pieces 113, so that the vertical support 111 and the angle bracket 112 are connected, and the carrying flat plate 12 is fixed at the electron beam output end of the charged particle beam device.
In this embodiment, the telescopic member 113 may use a buffer member such as a spring, and the telescopic member can ensure that the outer pole shoe of the objective lens is minimally pressed while fixing the loading plate, thereby preventing damage to the pole shoe of the objective lens due to the fixing of the loading unit.
Still further, in some embodiments, the difference between the bending angle of the angled support 112 and the cone angle of the outer pole piece of the objective lens in the charged particle beam apparatus is less than a predetermined angle difference, thereby preventing mechanical interference between the fixed support and the outer pole piece of the objective lens. As an example, the angle of bending of the angle bracket 112 may be equal to the cone angle of the outer pole piece of the objective lens in the charged particle beam device.
In response to another performance acceptance condition, the present application provides another carrier unit, fig. 8 shows an exemplary structure of a carrier unit according to another embodiment of the present application, and the carrier unit shown in fig. 8 is suitable for a charged particle beam device with an in-lens-barrel detector, in which a fixing bracket 11 of the carrier unit is made of an insulating material, for example: and (3) ceramics. And the charged particle beam device of the detector in the lens barrel is coaxially arranged with the longitudinal opening, so that secondary electrons generated by the action of the electron beam on the detected object can be collected by the electrode of the detector in the lens barrel. When the detector in the lens cone is used for detection, the object carrying unit can be connected with a voltage of 0 to-11 kV through an external lead, so that an electrostatic field is formed between the sample and the outer pole shoe of the objective lens, secondary electrons emitted by the sample are accelerated and are beaten to the detector in the lens cone for imaging, and in order to ensure the withstand voltage between the charged particle beam device and the object carrying unit, the fixed support 11 needs to use an insulating material to ensure the withstand voltage.
Since the loading plate in this embodiment needs to be connected to a voltage, the electrical conductivity of the loading plate 12 in this embodiment is greater than or equal to a preset electrical conductivity threshold, where the preset electrical conductivity threshold is equal to the electrical conductivity of the metallic copper. In addition, the plane to which the voltage is applied is required to have a certain flatness, so that the carrying flat plate needs to have a certain flatness and smoothness.
In this embodiment, the carrying plate 12 may be mounted on the charged particle beam device by using a plurality of ceramic posts, and metal connecting rods are disposed at two ends of the ceramic posts, and the metal connecting rods may be threaded and fixed with the ceramic posts by welding, and the two ends of the ceramic posts are respectively fixed on the carrying plate and the outer pole shoe of the objective lens of the charged particle beam device by the metal connecting rods. Fig. 9 shows an exemplary structural view of a carrier plate according to other embodiments of the present application, and as shown in fig. 9, the carrier plate 12 has a longitudinal opening formed by axially combining a first circular opening and a second circular opening, and the first circular opening is coaxial with the second circular opening. The diameter of the first circular opening is larger than that of the second circular opening, and the height Ha of the first circular opening is consistent with the thickness Hc of the table top of the nail table 13, so that after the nail table 13 is embedded into the carrying flat plate 12, the table top of the nail table 13 can be in the same horizontal plane with the carrying surface of the carrying flat plate 12.
Similar to the carrier plate in fig. 3, in the carrier plate of the present embodiment, the flatness of the interface of the first circular opening and the second circular opening is smaller than a preset flatness threshold value, where the flatness of the interface of the carrier plate 12 and the first circular opening is smaller than the preset flatness threshold value, and the preset flatness threshold value may be 20 μm.
In order to prevent the excessive gap between the loading plate 12 and the nailing table 13 from affecting the uniformity of the formed electrostatic field, in this embodiment, the difference between the diameter Da of the first circular opening and the diameter Dc of the table top of the nailing table 13 is smaller than the preset diameter difference, and the difference between the diameter Db of the second circular opening and the diameter Dc of the shank of the nailing table 13 is smaller than the preset diameter difference, so that the nailing table 13 is more attached to the loading plate 12.
As an example, the difference Da-Dc between the diameter Da of the first circular opening and the diameter Dc of the table top of the table 13 is less than 25 μm, and the difference Db-Dd between the diameter Db of the second circular opening and the diameter Dd of the shank of the table 13 is less than 25 μm, it should be noted that, in order to ensure that the table 13 can be inserted into the longitudinal opening on the loading plate 12, the following dimensional parameters of the table 13 are required: dc is less than or equal to Da and Dd is less than or equal to Db.
In the present application, the carrier unit shown in fig. 1 or fig. 8 is fixed to the outer pole piece of the objective lens of the charged particle beam apparatus, and in order to reduce the load of the weight of the carrier unit on the outer pole piece of the objective lens, the fixing bracket in the carrier unit described in any of the foregoing embodiments may be designed to be lightweight. Whether the fixing support is made of a metal conductive material or an insulating ceramic material, a lightweight material with the density smaller than a preset density threshold value is preferably selected.
Based on the object carrying unit described in any of the previous embodiments, the present application further provides a charged particle beam apparatus. Fig. 10 shows an exemplary structure of a charged particle beam apparatus according to some embodiments of the present application, as shown in fig. 10, the charged particle beam apparatus includes: the charged particle emission unit 50, the particle beam focusing unit 40, the objective lens unit 30, the particle beam deflection unit 20 and the object carrying unit 10 are arranged along the same axial direction, the object carrying unit is fixed on an outer pole shoe of an objective lens of the objective lens unit through a fixing bracket, and the axial direction of the object carrying unit coincides with the axial direction of the charged particle beam device.
In the charged particle beam apparatus, the charged particle emitting unit 50 may be a component that generates an electron beam, such as an electron gun, or a component that generates an ion beam, such as a liquid ion source, or a component that generates other particle beams. The charged particle emitting unit may provide a stable, focusable particle beam for a charged particle beam device. As one example, as shown in fig. 10, the charged particle emitting unit 50 may include: a thermal field emission electron tip 51, an extraction electrode 52 and an acceleration anode 53. The extraction electrode can provide a high-voltage electric field for an electron beam generated by the thermal field emission electron tip, and the accelerating anode can provide an accelerating voltage for the electron beam.
The particle beam focusing unit 40 is used for focusing the particle beam, for example, a scanning electron microscope may be used as the particle beam focusing unit, and a common electromagnetic lens mainly includes two types of electrostatic lenses and magnetic lenses, wherein the electrostatic lenses may form equipotential curved surface clusters with specific shapes and being rotationally symmetrical, the equipotential curved surface clusters may enable the electron beam to focus under the action of coulomb force, the magnetic lens may generate a rotationally symmetrical non-uniform magnetic field, the electron beam may be subjected to the action of lorentz force in the rotationally symmetrical magnetic field to generate a focusing effect, for example, a condensing lens is disposed at a position close to the charged particle emitting unit to realize the focusing effect on the particle beam emitted by the charged particle emitting unit.
The main function of the objective lens unit 30 is to finally focus the particle beam such that the particle beam is again reduced and focused onto the sample surface. The particle beam deflection unit may deflect and perform a regular scanning movement of the particle beam before final focusing of the particle beam, and may consist of an electric deflector or a magnetic deflector, wherein the number of electric deflectors or magnetic deflectors may be one or more. Further, the electric deflector may be composed of mutually unconnected small electrodes circumferentially arranged at the same axial position of 8 or 12 pieces, and the magnetic deflector may be composed of four saddle-shaped or ring-shaped coils circumferentially arranged at the same axial position.
Further, the charged particle beam apparatus may further include: the diaphragm 60 is moved. In some embodiments, an in-column detector 70 is also provided within the charged particle beam apparatus. The moving diaphragm plays a role in controlling the flow rate, shape and forming a scanning pattern of the electron beam.
In other embodiments, the in-barrel detector may be replaced with a lateral secondary electron detector. Fig. 11 shows an exemplary structure of a charged particle beam apparatus according to other embodiments of the present application, as shown in fig. 11, including: a charged particle emitting unit 50, a particle beam focusing unit 40, an objective lens unit 30, a particle beam deflection unit 20 and a carrier unit 10.
In this charged particle beam device, the lateral secondary electron detector is located at a side of the charged particle beam device, and its axis forms a certain angle with the axis of the charged particle beam device, and the electrodes of the lateral secondary electron detector face the carrier unit 10, specifically, the axis of the electrodes of the lateral secondary electron detector coincides with the center point of the longitudinal opening of the carrier plate 12 in the carrier unit 10.
In this charged particle beam apparatus, the charged particle emitting unit 50, the particle beam focusing unit 40, the objective lens unit 30, the particle beam deflecting unit 20 and the carrier unit 10 are coaxially arranged, wherein the structure and function of the charged particle emitting unit 50, the particle beam focusing unit 40, the objective lens unit 30, the particle beam deflecting unit 20 and the carrier unit 10 can be referred to the previous description in connection with the embodiment of fig. 10, and the description thereof will be omitted.
In summary, the embodiment of the application provides a carrying unit for a charged particle beam device, which fixes a carrying flat plate, a nail table and the charged particle beam device into a whole through a fixing bracket, thereby ensuring that the relative position of a charged particle beam and a sample under the influence of environmental vibration is not changed, eliminating the negative influence of the environmental and device vibration on a detection result, and improving the performance detection stability of the charged particle beam device.
Some embodiments of the present application further provide an object carrying unit, which is suitable for a charged particle beam device on which a lateral secondary electron detector is mounted, where a fixing support of the object carrying unit is made of a conductive material, so that secondary electrons excited from a sample can be effectively prevented from continuously accumulating on the fixing support, and thus the influence of the accumulated secondary electrons on the performance of the charged particle beam device is avoided.
Some embodiments of the present application further provide a carrier unit adapted to a charged particle beam device on which a detector in a lens barrel is mounted, wherein a fixing bracket in the carrier unit is made of an insulating material, and when the carrier unit is connected to a voltage of 0 to-11 kV, thereby forming an electrostatic field between a sample and an outer pole piece of an objective lens, the insulating material ensures a withstand voltage between the charged particle beam device and the carrier unit.
While various embodiments of the present application have been shown and described herein, it will be obvious to those skilled in the art that such embodiments are provided by way of example only. Numerous modifications, changes, and substitutions will occur to those skilled in the art without departing from the spirit and scope of the application. It should be understood that various alternatives to the embodiments of the application described herein may be employed in practicing the application. The appended claims are intended to define the scope of the application and are therefore to cover all equivalents or alternatives falling within the scope of these claims.
Claims (13)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411073109.8A CN118588522B (en) | 2024-08-06 | 2024-08-06 | Carrier units and related products for charged particle beam devices |
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| CN108666195A (en) * | 2017-03-28 | 2018-10-16 | 日本株式会社日立高新技术科学 | charged particle beam device |
| CN110176379A (en) * | 2018-02-20 | 2019-08-27 | 日本株式会社日立高新技术科学 | Charged particle beam apparatus and sample process observation method |
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| US10453645B2 (en) * | 2016-12-01 | 2019-10-22 | Applied Materials Israel Ltd. | Method for inspecting a specimen and charged particle multi-beam device |
| JP7152757B2 (en) * | 2018-10-18 | 2022-10-13 | 株式会社日立ハイテクサイエンス | Sample processing observation method |
| US11183361B1 (en) * | 2020-05-19 | 2021-11-23 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device and method for inspecting and/or imaging a sample |
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| CN108666195A (en) * | 2017-03-28 | 2018-10-16 | 日本株式会社日立高新技术科学 | charged particle beam device |
| CN110176379A (en) * | 2018-02-20 | 2019-08-27 | 日本株式会社日立高新技术科学 | Charged particle beam apparatus and sample process observation method |
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