Disclosure of Invention
In order to overcome the deficiencies of the prior art, at least one technical problem presented in the background art is solved.
The technical scheme adopted for solving the technical problems is as follows:
In a first aspect, the present invention provides a system building method based on OpenHarmony development, including:
Extracting talent technical fields and talent cultivation targets through a talent cultivation construction system, carrying out correlation analysis on application technical fields corresponding to OpenHarmony system foundation kit in the talent technical fields by combining a correlation algorithm, and developing a target kit installation library in a OpenHarmony system foundation kit library according to a correlation analysis result;
Step two, proportional analysis is carried out on talent culture targets, and the construction priority of OpenHarmony system foundation kits contained in a target kit installation library is determined by combining correlation analysis results;
Thirdly, processing and analyzing application teaching targets and actual application data of the foundation suite in a monitoring period according to the OpenHarmony system foundation suite, obtaining a foundation suite application value, comparing and analyzing the OpenHarmony system foundation suite with the matched OpenHarmony system standard suite, and determining the matching priority of the OpenHarmony system standard suite according to an analysis result and combining the foundation suite application value;
And fourthly, processing according to actual application data and application teaching targets of the OpenHarmony system standard suite in a monitoring period to obtain a standard suite application value, calculating to obtain a project matching value by combining the number proportion of the OpenHarmony system standard suite matched with the project to be developed, and sequencing the project to be developed according to the project matching value to obtain a project development task table.
In a second aspect, the present invention provides a system set-up system developed based on OpenHarmony, comprising:
the installation library construction module extracts talent technical fields and talent cultivation targets through a talent cultivation construction system, performs correlation analysis on application technical fields corresponding to OpenHarmony system foundation kit in the talent technical fields by combining a correlation algorithm, and develops a target kit installation library in the OpenHarmony system foundation kit library according to a correlation analysis result;
The foundation set building module is used for carrying out proportional analysis on talent culture targets and determining the building priority of OpenHarmony system foundation sets contained in the target set installation library by combining correlation analysis results;
The standard suite building module is used for processing and analyzing application teaching targets and actual application data of the foundation suite in a monitoring period according to the OpenHarmony system foundation suite, obtaining a foundation suite application value, comparing and analyzing the OpenHarmony system foundation suite and the matched OpenHarmony system standard suite, and determining the matching priority of the OpenHarmony system standard suite according to an analysis result and combining the foundation suite application value;
and the project development matching module is used for processing the actual application data and the application teaching target in the monitoring period according to the OpenHarmony system standard suite to obtain a standard suite application value, calculating to obtain a project matching value by combining the number proportion of the OpenHarmony system standard suites matched with the project to be developed, and sequencing the project to be developed according to the project matching value to obtain a project development task list.
The beneficial effects of the invention are as follows:
1. By carrying out linear analysis on the talent technical field and the application technical field of OpenHarmony system foundation kits, a proper correlation analysis method is selected to carry out correlation analysis, openHarmony system foundation kits with strong correlation with the talent technical field are selected from OpenHarmony system foundation kits and are installed, the accuracy of system construction is improved, redundancy is avoided, and the determination of OpenHarmony system foundation kit construction priority is carried out by combining talent culture targets, so that the kit which is most closely related to the talent technical field requirements is ensured to be installed first, and the collaborative development of talent culture and system construction is promoted.
2. According to the application times and actual use times of the OpenHarmony system foundation kit in the monitoring period, processing and analyzing to obtain a foundation kit application value, carrying out function matching and performance load performance comparison analysis on the OpenHarmony system foundation kit and the matched OpenHarmony system standard kit, and determining the matching priority of the OpenHarmony system standard kit by combining the foundation kit application value, thereby being beneficial to realizing accurate matching of the OpenHarmony system standard kit and improving the system construction efficiency.
3. Analyzing the quantity ratio of OpenHarmony system standard kits matched with the to-be-developed project, combining the standard kit application values of the OpenHarmony system standard kits, processing and analyzing to obtain project matching values, and sequencing the to-be-developed projects according to the project matching values to obtain a project development task list, so that the project development efficiency is improved, the project resource configuration management is optimized, and the system construction is efficiently completed.
Detailed Description
The invention is further described in connection with the following detailed description in order to make the technical means, the creation characteristics, the achievement of the purpose and the effect of the invention easy to understand.
Example 1
As shown in fig. 1, a system building method based on OpenHarmony development according to an embodiment of the present invention includes:
Extracting talent technical fields and talent cultivation targets through a talent cultivation construction system, carrying out correlation analysis on application technical fields corresponding to OpenHarmony system foundation kit in the talent technical fields by combining a correlation algorithm, and developing a target kit installation library in a OpenHarmony system foundation kit library according to a correlation analysis result;
The talent technical field includes, but is not limited to:
Computer science and technology (e.g., software development, hardware design, artificial intelligence, etc.);
information technology (e.g., network communications, database management, etc.);
electronic engineering (e.g., embedded system development, integrated circuit design, etc.);
internet of things (e.g., sensor technology, platform development of internet of things, etc.);
The application technical fields corresponding to OpenHarmony system foundation sets include, but are not limited to:
Kernel layer techniques (e.g., use and optimization of kernels such as LiteOS-M, liteOS-a);
system service layer technologies (e.g., distributed data management, distributed task scheduling, etc.);
Frame layer techniques (e.g., UI frames, distributed soft bus frames, etc.);
application layer technologies (e.g., smart home application development, smart wearable device application development, etc.);
The method comprises the steps of acquiring talent technical field data at different acquisition time points in an acquisition period and OpenHarmony system basic suite application technical field data through the Internet of things, and performing relevant analysis on the characteristics, wherein the specific steps are as follows:
Constructing a scatter diagram according to talent technical field data at different acquisition time points in an acquisition period and application technical field data of OpenHarmony system foundation suite;
The X-axis represents the data of talent technical field, including but not limited to heat, market demand, technical difficulty and application case quantity, the Y-axis represents the data of application technical field of OpenHarmony system foundation kit, including but not limited to heat, market demand, technical difficulty and application case quantity, wherein if the X-axis represents the number of application cases included in the data of talent technical field, the corresponding Y-axis represents the number of application cases included in the data of application technical field of OpenHarmony system foundation kit;
the scatter plot is linearly regressed using statistical software (e.g., excel, library scikit-learn of Python, etc.), where the "regression" tool in the "data analysis" toolkit can be used;
Obtaining a regression coefficient and an intercept, wherein the linear regression model outputs the regression coefficient (slope) and the intercept, and describes an equation of an optimal straight line, namely Y=aX+b, wherein a is the regression coefficient and b is the intercept;
and calculating an R square value, wherein the calculation formula of the R square value is as follows:
R2 = 1 - (SSE / SST);
Wherein SSE is the sum of squares of the residuals (Sum of Squared Errors), representing the sum of squares of the differences between the model predicted and actual values, SST is the sum of squares (Sum of Squares Total), representing the total variance of the dependent variable Y;
performing difference processing on the obtained R square value and 1, and taking the absolute value of the difference value to obtain an R square difference value;
comparing the R square difference value with an R square difference threshold;
If the R square difference value is larger than the R square difference threshold value, the linear relation between the data in the talent technical field and the data in the application technical field of OpenHarmony system foundation sets is weak;
If the R square difference value is smaller than or equal to the R square difference threshold value, the linear relation between the data in the talent technical field and the data in the application technical field of OpenHarmony system foundation sets is strong, and the data in the talent technical field are marked as linear related data;
counting the number of linear related data in the talent technical field, and carrying out ratio processing on the number of the data in the talent technical field and the number of the data in the talent technical field to obtain a linear related value;
Comparing the linear correlation value with a linear correlation threshold;
If the linear correlation value is larger than the linear correlation threshold, the linear relation exists between the talent technical field and the application technical field of OpenHarmony system foundation sets;
If the linear correlation value is smaller than or equal to the linear correlation threshold, the nonlinear relation exists between the talent technical field and the application technical field of OpenHarmony system foundation sets;
if a linear relation exists between the talent technical field and the application technical field of the OpenHarmony system foundation kit, selecting the pearson correlation coefficient to calculate the correlation coefficient between the talent technical field and the application technical field of the OpenHarmony system foundation kit;
If a nonlinear relation exists between the talent technical field and the application technical field of the OpenHarmony system foundation kit, selecting a spearman rank correlation coefficient to calculate a correlation coefficient between the talent technical field and the application technical field of the OpenHarmony system foundation kit;
According to the correlation coefficient between the talent technical field and the application technical field of OpenHarmony system foundation suites, openHarmony system foundation suites with the correlation coefficient closest to 1 are selected as corresponding building suites of the corresponding talent technical field, and the corresponding building suites of each talent technical field are integrated to obtain a target suite installation library;
Step two, proportional analysis is carried out on talent culture targets, and the construction priority of OpenHarmony system foundation kits contained in a target kit installation library is determined by combining correlation analysis results;
the talent culturing targets are expressed as talent culturing numbers corresponding to each talent technical field;
Summing the talent culturing population corresponding to each talent technical field to obtain a talent culturing total population;
Based on any personal area;
The ratio processing is carried out on the talent culture population corresponding to the talent technical field and the talent culture total population, so as to obtain the culture weight of the talent technical field;
Obtaining a correlation coefficient between the talent technical field and the corresponding construction kit, and performing product processing on the correlation coefficient and the culture weight of the talent technical field to obtain a construction priority coefficient of OpenHarmony system foundation kits contained in a target kit installation library;
sequencing OpenHarmony system foundation suites from large to small according to the construction priority coefficient of OpenHarmony system foundation suites contained in the target suite installation library, and determining the construction priority of OpenHarmony system foundation suites contained in the target suite installation library;
In the embodiment, linear analysis is performed on the talent technical field and the application technical field of OpenHarmony system foundation kits, so that a proper correlation analysis method is selected to perform correlation analysis, openHarmony system foundation kits with strong correlation with the talent technical field are selected from OpenHarmony system foundation kits and are installed, accuracy of system construction is improved, redundancy is avoided, and determination of OpenHarmony system foundation kit construction priority is performed by combining talent cultivation targets, and it is beneficial to ensure that kits which are most closely related to talent technical field requirements are installed first, and collaborative development of talent cultivation and system construction is promoted.
Example 2
As shown in fig. 1, based on embodiment 1, the system building method based on OpenHarmony development according to the embodiment of the present invention includes:
Thirdly, processing and analyzing application teaching targets and actual application data of the foundation suite in a monitoring period according to the OpenHarmony system foundation suite, obtaining a foundation suite application value, comparing and analyzing the OpenHarmony system foundation suite with the matched OpenHarmony system standard suite, and determining the matching priority of the OpenHarmony system standard suite according to an analysis result and combining the foundation suite application value;
Specifically, the application teaching target comprises target use times, and the actual application data comprises actual application times;
Carrying out ratio processing on actual application times and target use times of OpenHarmony system foundation sets in a monitoring period to obtain a foundation set application value;
the comparison and analysis of OpenHarmony system foundation kit and matched OpenHarmony system standard kit specifically comprises:
Acquiring target application scenes in a talent culture construction system in the talent technical field of OpenHarmony system foundation kits and OpenHarmony system standard kits, and combing functional requirements of the target application scenes through a requirement analysis technology to obtain a functional requirement library;
The method comprises the steps of respectively obtaining functional requirements contained in OpenHarmony system basic kits and OpenHarmony system standard kits;
Marking the functional requirements contained in OpenHarmony system basic kits and OpenHarmony system standard kits as coincident functional requirements, counting the number of the coincident functional requirements, carrying out ratio processing on the number of the coincident functional requirements and the total number of the functional requirements contained in OpenHarmony system basic kits to obtain a functional requirement coincidence ratio, and marking the functional requirement coincidence ratio as CH;
In the function requirements contained in the OpenHarmony system standard suite, marking the function requirements which are not contained in the OpenHarmony system basic suite as priority function requirements, counting the number of the priority function requirements, carrying out ratio processing on the number of the priority function requirements and the total number of the function requirements contained in the OpenHarmony system basic suite to obtain a function requirement priority ratio, and marking the function requirement priority ratio as YX;
based on any one of the priority function requirements;
if the priority function requirement can be found in the function requirement library, marking the priority function requirement as conforming to the function requirement;
if the priority function requirement cannot be found in the function requirement library, no operation is performed;
Counting the number meeting the functional requirements, carrying out ratio processing on the total number of the functional requirements contained in the OpenHarmony system foundation suite to obtain a functional requirement meeting ratio, and marking the functional requirement meeting ratio as FH;
the obtained function demand coincidence ratio CH, function demand priority ratio YX and function demand coincidence ratio FH are subjected to data processing, and the following formula is adopted: obtaining a function demand priority value GNY, wherein s1, s2 and s3 are preset proportionality coefficients, wherein the value of s1 is 1.012, the value of s2 is 1.314 and the value of s3 is 1.062;
Comparing the functional requirements contained in the OpenHarmony system basic kit and the OpenHarmony system standard kit, and extracting coincident functional requirements, wherein the coincident functional requirements are functional requirements shared by the OpenHarmony system basic kit and the OpenHarmony system standard kit;
Simulating load data of OpenHarmony system foundation suites and OpenHarmony system standard suites under the overlapping functional requirements using benchmark test techniques, including but not limited to response time, throughput, resource occupancy;
Acquiring the quantity of load data of the OpenHarmony system standard suite which is superior to that of the OpenHarmony system basic suite;
for example, if the OpenHarmony system standard suite has faster response time and higher throughput under the requirement of the superposition function, the number of load data representing that the OpenHarmony system standard suite is better than the OpenHarmony system basic suite is 2;
comparing the amount of load data of the OpenHarmony system standard suite that is better than the OpenHarmony system base suite to a load data target amount threshold;
If the number of load data of the OpenHarmony system standard suite which is superior to that of the OpenHarmony system basic suite is greater than the load data target amount threshold, marking the coincidence function requirement as a priority function requirement;
otherwise, marking the coincident function requirement as a non-preferential function requirement;
Counting the number proportion of the priority function demands in the superposition function demands to obtain a function load priority value;
summing the function demand priority value and the function load priority value to obtain a function priority value;
Summing the function priority value and the basic suite application value to obtain a matching priority value;
Sequencing OpenHarmony system standard kits matched with OpenHarmony system basic kits according to the matching priority value, and determining the matching priority of OpenHarmony system standard kits;
In this embodiment, according to the number of applications and actual number of uses of the OpenHarmony system basic kit in the monitoring period, the basic kit application value is obtained through processing and analysis, functional matching and performance load performance comparison analysis are performed on the OpenHarmony system basic kit and the matched OpenHarmony system standard kit, and the matching priority of the OpenHarmony system standard kit is determined by combining the basic kit application value, so that accurate matching of the OpenHarmony system standard kit is facilitated, and the system construction efficiency is improved.
Example 3
As shown in fig. 1, based on embodiment 1 and embodiment 2, the system building method based on OpenHarmony development according to the embodiment of the present invention includes:
Step four, according to actual application data and application teaching targets of OpenHarmony system standard kits in a monitoring period, processing to obtain standard kit application values, combining the number proportion of OpenHarmony system standard kits matched with the to-be-developed projects, processing and analyzing to obtain project matching values, and sorting the to-be-developed projects according to the project matching values to obtain a project development task list;
according to OpenHarmony system standard suite, processing to obtain standard suite application values according to actual application data and application teaching targets in a monitoring period;
counting standard suite application values of each OpenHarmony system standard suite matched with the project to be developed, summing and taking an average value to obtain standard suite application average values, and marking the standard suite application average values as JZ;
the standard suite application value and the basic suite application value are acquired in the same mode;
specifically, any item to be developed is based;
Counting the number of OpenHarmony system standard kits matched with a to-be-developed project, carrying out ratio processing on the number of OpenHarmony system standard kits matched with the to-be-developed project and the total number of OpenHarmony system standard kits to obtain the number proportion of the system standard kits, and marking the system standard kits as ZB;
Wherein, the total number of OpenHarmony system standard kits represents the sum of the number of OpenHarmony system standard kits matched with all to-be-developed projects;
and carrying out data processing on the obtained standard suite application mean JZ and the system standard suite quantity ratio ZB, and adopting the formula: Obtaining an item matching value XB, wherein a1 and a2 are preset proportionality coefficients, wherein the value of a1 is 1.24, and the value of a2 is 1.16;
sequencing the to-be-developed projects from large to small according to the corresponding project matching values XB to obtain a project development task table;
In the embodiment, the number proportion of OpenHarmony system standard kits matched with the project to be developed is analyzed, the project matching value is obtained through processing and analysis by combining the standard kit application value of OpenHarmony system standard kits, the project to be developed is ordered according to the project matching value, a project development task table is obtained, the project development efficiency is improved, the project resource allocation management is optimized, and the system construction is completed efficiently.
Example 4
As shown in fig. 2, a system building system based on OpenHarmony development according to an embodiment of the present invention includes:
the installation library construction module extracts talent technical fields and talent cultivation targets through a talent cultivation construction system, performs correlation analysis on application technical fields corresponding to OpenHarmony system foundation kit in the talent technical fields by combining a correlation algorithm, and develops a target kit installation library in the OpenHarmony system foundation kit library according to a correlation analysis result;
The foundation set building module is used for carrying out proportional analysis on talent culture targets and determining the building priority of OpenHarmony system foundation sets contained in the target set installation library by combining correlation analysis results;
The standard suite building module is used for processing and analyzing application teaching targets and actual application data of the foundation suite in a monitoring period according to the OpenHarmony system foundation suite, obtaining a foundation suite application value, comparing and analyzing the OpenHarmony system foundation suite and the matched OpenHarmony system standard suite, and determining the matching priority of the OpenHarmony system standard suite according to an analysis result and combining the foundation suite application value;
and the project development matching module is used for processing the actual application data and the application teaching target in the monitoring period according to the OpenHarmony system standard suite to obtain a standard suite application value, calculating to obtain a project matching value by combining the number proportion of the OpenHarmony system standard suites matched with the project to be developed, and sequencing the project to be developed according to the project matching value to obtain a project development task list.
The foregoing has shown and described the basic principles, principal features and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, and that the above embodiments and descriptions are merely illustrative of the principles of the present invention, and various changes and modifications may be made without departing from the spirit and scope of the invention, which is defined in the appended claims. The scope of the invention is defined by the appended claims and equivalents thereof.