CN110186925A - Detection device - Google Patents
Detection device Download PDFInfo
- Publication number
- CN110186925A CN110186925A CN201810153885.7A CN201810153885A CN110186925A CN 110186925 A CN110186925 A CN 110186925A CN 201810153885 A CN201810153885 A CN 201810153885A CN 110186925 A CN110186925 A CN 110186925A
- Authority
- CN
- China
- Prior art keywords
- pattern
- detection device
- lens
- beam generator
- spectroscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Signal Processing (AREA)
- Spectrometry And Color Measurement (AREA)
Abstract
Description
技术领域technical field
本发明关于一种检测装置,特别是一种共轭配置的检测装置。The present invention relates to a detection device, in particular to a conjugate configuration detection device.
背景技术Background technique
由于目前智能手机的应用日益增加,如浏览新闻、社交网站以及玩游戏,因此消费者在生活上已离不开智能手机。智能手机的电池大致上分成内建式与可换式两种。内建式电池设计是手机机壳无设置可拆的电池背盖,以利智能手机的薄化。可换式电池设计是手机机壳设置有可拆的电池背盖,以利于电池的更换。Due to the increasing use of smart phones, such as browsing news, social networking sites and playing games, consumers cannot live without smart phones. Smartphone batteries are roughly divided into two types: built-in and replaceable. The built-in battery design means that the mobile phone case does not have a removable battery back cover to facilitate the thinning of the smartphone. The replaceable battery design is that the mobile phone casing is provided with a detachable battery back cover to facilitate battery replacement.
不论是内建式或可换式,电池在出厂前皆需要经过检测,以淘汰掉有瑕疵的电池。详细来说,电池在制作时会通过真空技术将外皮包覆电池芯,但若电池膨胀或电池外皮破损,则外观上就不平整。反之,若电池外观不平整,则代表电池有瑕疵而会影响电池的品质。然而,目前通过同轴或环形照明的方式来检测电池的外观,将产生影像对比度不高,以及检测品质较为不稳定的问题。Regardless of whether it is a built-in type or a replaceable type, the battery needs to be tested before leaving the factory to eliminate defective batteries. In detail, during the production of the battery, the outer skin is used to cover the battery core by vacuum technology, but if the battery swells or the battery outer skin is damaged, the appearance will be uneven. Conversely, if the appearance of the battery is uneven, it means that the battery is defective and will affect the quality of the battery. However, at present, the appearance of the battery is inspected by means of coaxial or ring lighting, which will cause problems such as low image contrast and unstable inspection quality.
发明内容Contents of the invention
本发明在于提供一种检测装置,藉以改善以往电池的外观检测是通过同轴或环形照明的方式来检测电池的外观,而产生影像对比度不高以及检测品质不稳定的问题。The present invention is to provide a detection device to improve the conventional appearance detection of batteries by means of coaxial or ring lighting to detect the appearance of the battery, resulting in low image contrast and unstable detection quality.
本发明的一实施例所公开的检测装置,用以检测一待测物。检测装置包含一分光镜、一图案光束产生器、一影像撷取器及一处理器。图案光束产生器与影像撷取器分别位于分光镜的相异侧且图案光束产生器与影像撷取器呈共轭配置。图案光束产生器用以发出一预设图案,并通过分光镜照射于待测物。影像撷取器通过分光镜撷取预设图案呈现于待测物上的一实际图案。处理器用以比较预设图案与实际图案,以作为判断待测物的品质的依据。A detecting device disclosed in an embodiment of the present invention is used for detecting an object to be tested. The detection device includes a beam splitter, a pattern beam generator, an image picker and a processor. The pattern beam generator and the image picker are respectively located on different sides of the beam splitter, and the pattern beam generator and the image picker are in a conjugate configuration. The pattern beam generator is used to emit a preset pattern and irradiate the object under test through the beam splitter. The image capture device captures an actual pattern presented by the preset pattern on the object to be measured through the spectroscope. The processor is used for comparing the preset pattern and the actual pattern as a basis for judging the quality of the object to be tested.
根据上述实施例的检测装置,由于图案光束产生器与影像撷取器呈共轭配置,故与预设图案的比例与对比度相比,实际图案的比例与对比度较不会失真。如此一来,则能够提升实际影像的影像对比度,以及提升待测物检测的稳定性,进而提升检测装置的检测品质。According to the detection device of the above-mentioned embodiment, since the pattern beam generator and the image capture device are configured in a conjugate manner, the ratio and contrast of the actual pattern are less distorted compared with the ratio and contrast of the preset pattern. In this way, the image contrast of the actual image can be improved, and the stability of detecting the object under test can be improved, thereby improving the detection quality of the detection device.
此外,由于图案光束产生器至分光镜的距离相等于影像撷取器的成像面至分光镜的距离,故可进一步减少影响检测稳定性的变数,进而进一步提升检测装置的检测品质。In addition, since the distance from the pattern beam generator to the beam splitter is equal to the distance from the imaging surface of the image capture device to the beam splitter, the variables affecting the detection stability can be further reduced, thereby further improving the detection quality of the detection device.
以上的关于本发明内容的说明及以下的实施方式的说明用以示范与解释本发明的精神与原理,并且提供本发明的专利申请权利要求保护范围更进一步的解释。The above description of the content of the present invention and the following description of the implementation are used to demonstrate and explain the spirit and principle of the present invention, and to provide further explanation of the protection scope of the patent application claims of the present invention.
附图说明Description of drawings
图1为根据本发明第一实施例所述的检测装置的平面图。Fig. 1 is a plan view of a detection device according to a first embodiment of the present invention.
图2为图1的光栅的平面图。FIG. 2 is a plan view of the grating of FIG. 1. FIG.
图3为图1的图案光束产生器所发出的预设图案的平面图。FIG. 3 is a plan view of a preset pattern emitted by the pattern beam generator of FIG. 1 .
图4为图1的影像撷取器所撷取的实际图案的平面图。FIG. 4 is a plan view of an actual pattern captured by the image capture device of FIG. 1 .
图5为图1的向量化的预设图案与向量化的实际图案的平面图。FIG. 5 is a plan view of the vectorized preset pattern and the vectorized actual pattern of FIG. 1 .
图6为根据本发明第二实施例所述的光栅的平面图。Fig. 6 is a plan view of a grating according to a second embodiment of the present invention.
其中,附图标记:Among them, reference signs:
10 检测装置10 detection device
20 待测物20 DUT
100 分光镜100 beam splitters
110 第一面110 First side
120 第二面120 Second side
200 图案光束产生器200 pattern beam generator
210 光源210 light source
220 光栅220 grating
221 遮光条221 Blackout strip
222 透光口222 Light-transmitting port
220’ 光栅220’ grating
221’ 第一遮光条221’ first blackout strip
222’ 第二遮光条222’ second blackout strip
223’ 透光口223’ light port
300 影像撷取器300 image grabber
310 成像面310 imaging surface
410 第一透镜410 first lens
420 第二透镜420 second lens
430 第三透镜430 third lens
500 处理器500 processors
a、b 方向a, b direction
P 预设图案P Preset pattern
A 实际图案A actual pattern
V1 向量化的预设图案Preset patterns for V1 vectorization
V2 向量化的实际图案Actual patterns for V2 vectorization
D1~D4 距离D1~D4 distance
F 照明范围F lighting range
C 撷取范围C capture range
具体实施方式Detailed ways
请参阅图1至图2。图1为根据本发明第一实施例所述的检测装置的平面图。图2为图1的光栅的平面图。Please refer to Figure 1 to Figure 2. Fig. 1 is a plan view of a detection device according to a first embodiment of the present invention. FIG. 2 is a plan view of the grating of FIG. 1. FIG.
本实施例的检测装置10用以检测一待测物20。待测物20例如为锂电池。锂电池在制作时会用真空技术让外皮包覆电池芯。正常来说,若电池芯无膨胀且电池外皮无破损,则锂电池的外皮为平整状。反之,若电池芯无膨胀且电池外皮无破损,则外皮就会破损或变形。The detection device 10 of this embodiment is used to detect a test object 20 . The test object 20 is, for example, a lithium battery. When lithium batteries are manufactured, vacuum technology is used to make the outer skin cover the battery core. Normally, if the battery core does not expand and the battery skin is not damaged, the skin of the lithium battery is flat. Conversely, if the battery core is not swollen and the battery skin is not damaged, the skin will be damaged or deformed.
检测装置10包含一分光镜100、一图案光束产生器200、一影像撷取器300及一处理器500。The detection device 10 includes a beam splitter 100 , a pattern beam generator 200 , an image capture device 300 and a processor 500 .
分光镜100具有相对的一第一面110及一第二面120。第一面110与第二面120倾斜设置,且第一面110例如朝向右方,以及第二面120例如朝向上方。若光线沿方向a经过第一面110或第二面120,则光线会穿过第一面110或第二面120。若光线沿方向b经过第一面110或第二面120,则光线会受第一面110或第二面120反射。The beam splitter 100 has a first surface 110 and a second surface 120 opposite to each other. The first surface 110 and the second surface 120 are arranged obliquely, and the first surface 110 faces to the right, for example, and the second surface 120 faces upward, for example. If the light passes through the first surface 110 or the second surface 120 along the direction a, the light will pass through the first surface 110 or the second surface 120 . If the light passes through the first surface 110 or the second surface 120 along the direction b, the light will be reflected by the first surface 110 or the second surface 120 .
图案光束产生器200与影像撷取器300分别位于分光镜100的相异侧且图案光束产生器200与影像撷取器300呈共轭配置。详细来说,图案光束产生器200例如位于分光镜100的右侧,且分光镜100的第一面110面向图案光束产生器200。影像撷取器300例如位于分光镜100的上侧,且分光镜100的第二面120面向影像撷取器300。所谓的图案光束产生器200与影像撷取器300呈共轭配置是指,通过分光镜100之后的图案光束产生器200的照明范围F与影像撷取器300的影像撷取范围C完全重叠,其效果容后一并说明。The pattern beam generator 200 and the image capture device 300 are respectively located on different sides of the beam splitter 100 and the pattern beam generator 200 and the image capture device 300 are configured in a conjugate configuration. In detail, the pattern beam generator 200 is located on the right side of the beam splitter 100 , for example, and the first surface 110 of the beam splitter 100 faces the pattern beam generator 200 . For example, the image capture device 300 is located on the upper side of the beam splitter 100 , and the second surface 120 of the beam splitter mirror 100 faces the image capture device 300 . The so-called conjugate configuration of the pattern beam generator 200 and the image capture device 300 means that the illumination range F of the pattern beam generator 200 and the image capture range C of the image capture device 300 after passing through the beam splitter 100 completely overlap, Its effect will be explained later.
图案光束产生器200包含一光源210及一光栅220。光源210例如为面光源。光栅220介于光源210与分光镜100之间。光栅220具有直条状的多个遮光条221。这些遮光条221分隔出多条透光口222,使得光源210通过光栅220发出具有多条白色长方形图案的一预设图案P(请暂参阅图3),且图案光束产生器200所发出的预设图案P通过分光镜100照射于待测物20。在本实施例中,预设图案P为多条白色长方形图案的周期性图案,但不以此为限,在其他实施例中,预设图案也可以为非周期性图案。The pattern beam generator 200 includes a light source 210 and a grating 220 . The light source 210 is, for example, a surface light source. The grating 220 is interposed between the light source 210 and the beam splitter 100 . The grating 220 has a plurality of light-shielding strips 221 in the shape of straight strips. These light-shielding strips 221 separate a plurality of light-transmitting openings 222, so that the light source 210 emits a preset pattern P (please refer to FIG. It is assumed that the pattern P is irradiated on the object under test 20 through the beam splitter 100 . In this embodiment, the preset pattern P is a periodic pattern of multiple white rectangular patterns, but it is not limited thereto. In other embodiments, the preset pattern can also be an aperiodic pattern.
此外,在本实施例中,图案光束产生器200是由光源210与光栅220构成,但并不以此为限。在其他实施例中,也可以单靠光源排列出预设图案的形状,以直接发出预设图案。In addition, in this embodiment, the pattern beam generator 200 is composed of a light source 210 and a grating 220 , but it is not limited thereto. In other embodiments, the shape of the preset pattern can also be arranged solely by the light source, so as to directly emit the preset pattern.
影像撷取器300用以通过分光镜100撷取预设图案P呈现于待测物20上的一实际图案A(请暂参阅图4)。影像撷取器300具有一成像面310。影像撷取器300所撷取的影像成像于成像面310。在本实施例中,成像面310至分光镜100的距离D1等于光栅220至分光镜100的距离D2,以减少影响检测稳定性的变数,进而增加检测装置10的检测精准度。The image capture unit 300 is used for capturing an actual pattern A (please refer to FIG. 4 ) of the preset pattern P presented on the object 20 through the spectroscope 100 . The image capture device 300 has an imaging surface 310 . The image captured by the image capture device 300 is imaged on the imaging surface 310 . In this embodiment, the distance D1 from the imaging surface 310 to the beamsplitter 100 is equal to the distance D2 from the grating 220 to the beamsplitter 100 , so as to reduce the variables affecting the detection stability, thereby increasing the detection accuracy of the detection device 10 .
处理器500例如为个人电脑,并用以比较预设图案P与实际图案A以作为判断待测物20的品质的依据。The processor 500 is, for example, a personal computer, and is used to compare the preset pattern P with the actual pattern A as a basis for judging the quality of the object under test 20 .
在本实施例中,检测装置10更包含一第一透镜410、一第二透镜420及一第三透镜430。第一透镜410、第二透镜420及第三透镜430皆例如为凸透镜。第一透镜410位于图案光束产生器200与分光镜100之间,以令图案光束产生器200所发出的预设图案P投射至分光镜100。第二透镜420位于影像撷取器300与分光镜100之间,以令预设图案P呈现于待测物20上的实际图案A投射于影像撷取器300的成像面310。此外,第一透镜410相同于第二透镜420,且第一透镜410至分光镜100的距离D3等于第二透镜420至分光镜100的距离D4,以进一步减少检测的变数,进而进一步增加检测装置10检测精准度。第三透镜430与第二透镜420分别位于分光镜100的相对两侧,即分光镜100位于影像撷取器300与第三透镜430之间,以将预设图案P汇聚于待测物20。In this embodiment, the detection device 10 further includes a first lens 410 , a second lens 420 and a third lens 430 . The first lens 410 , the second lens 420 and the third lens 430 are, for example, convex lenses. The first lens 410 is located between the pattern beam generator 200 and the beam splitter 100 to project the preset pattern P emitted by the pattern beam generator 200 to the beam splitter 100 . The second lens 420 is located between the image capture device 300 and the beam splitter 100 , so that the actual pattern A of the preset pattern P displayed on the object 20 is projected onto the imaging surface 310 of the image capture device 300 . In addition, the first lens 410 is the same as the second lens 420, and the distance D3 from the first lens 410 to the beam splitter 100 is equal to the distance D4 from the second lens 420 to the beam splitter 100, so as to further reduce the detection variables and further increase the number of detection devices. 10 detection accuracy. The third lens 430 and the second lens 420 are respectively located on opposite sides of the beam splitter 100 , that is, the beam splitter 100 is located between the image capture device 300 and the third lens 430 to focus the predetermined pattern P on the object 20 to be tested.
请参阅图3至5,图3为图1的图案光束产生器所发出的预设图案的平面图。图4为图1的影像撷取器所撷取的实际图案的平面图。图5为图1的向量化的预设图案与向量化的实际图案的平面图。Please refer to FIGS. 3 to 5 . FIG. 3 is a plan view of a preset pattern emitted by the pattern beam generator in FIG. 1 . FIG. 4 is a plan view of an actual pattern captured by the image capture device of FIG. 1 . FIG. 5 is a plan view of the vectorized preset pattern and the vectorized actual pattern of FIG. 1 .
以具有瑕疵的待测物20来进行检测,即待测物20的外表面呈凹凸状。当图案光束产生器200所发出的具多条白色长方形图案的预设图案P(如图3所示)沿方向b投射于分光镜100的第一面110时,分光镜100的第一面110会将预设图案P反射至待测物20的凹凸表面。由于预设图案P会受到待测物20的凹凸表面的影响而从原本的白色长方形图案变成不规则的扭曲图案。也就是说,呈现于待测物20的实际图案A(如图4所示)变成多条不规则的扭曲图案。接着,实际图案A再沿方向a经分光镜100的第一面110投射于影像撷取器300的成像面310。接着,如图5所示,处理器500会将实际图案A向量化与预设图案P向量化,再将向量化的实际图案V2与向量化的预设图案V1重叠比较。具体来说,向量化的实际图案V2中的各曲线会和向量化的预设图案V1中距离最近的各直线相比,并例如以最小平方法的方式,计算出向量化的实际图案V2与向量化的预设图案V1的差异量。由于差异量超过一预设值,故判定不合格。反之,若曲线与直线的误差量小于预设值,则判定合格。The detection is performed with the object under test 20 having defects, that is, the outer surface of the object under test 20 is concave-convex. When the preset pattern P (as shown in FIG. 3 ) with a plurality of white rectangular patterns emitted by the pattern beam generator 200 is projected on the first surface 110 of the beam splitter 100 along the direction b, the first surface 110 of the beam splitter 100 The preset pattern P is reflected to the concave-convex surface of the object under test 20 . Since the predetermined pattern P is affected by the uneven surface of the object under test 20 , the original white rectangular pattern becomes an irregular distorted pattern. That is to say, the actual pattern A (as shown in FIG. 4 ) presented on the object under test 20 becomes a plurality of irregular distorted patterns. Then, the actual pattern A is projected on the imaging surface 310 of the image capture device 300 along the direction a through the first surface 110 of the beam splitter 100 . Next, as shown in FIG. 5 , the processor 500 vectorizes the actual pattern A and the preset pattern P, and then overlaps and compares the vectorized actual pattern V2 with the vectorized preset pattern V1 . Specifically, each curve in the vectorized actual pattern V2 will be compared with the nearest straight lines in the vectorized preset pattern V1, and, for example, by means of the least square method, the vectorized actual pattern V2 and the vector The difference amount of the pre-set pattern V1. Since the difference exceeds a preset value, it is determined to be unqualified. On the contrary, if the error amount between the curve and the straight line is less than the preset value, it is determined to be qualified.
在本实施例中,由于图案光束产生器200与影像撷取器300呈共轭配置,故与预设图案P的比例与对比度相比,实际图案A的比例与对比度较不会失真。如此一来,则能够提升实际影像A的影像对比度,以及提升待测物20检测的稳定性,进而提升检测装置10的检测品质。In this embodiment, since the pattern beam generator 200 and the image capture device 300 are configured in a conjugate manner, compared with the ratio and contrast of the preset pattern P, the ratio and contrast of the actual pattern A are less distorted. In this way, the image contrast of the actual image A can be improved, and the detection stability of the object under test 20 can be improved, thereby improving the detection quality of the detection device 10 .
在图1实施例中,光栅220是以具有直条状的多个遮光条221为例,但并不以此为限。请参阅图6。图6为根据本发明第二实施例所述的光栅的平面图。In the embodiment of FIG. 1 , the grating 220 is exemplified by a plurality of light shielding strips 221 having a straight strip shape, but it is not limited thereto. See Figure 6. Fig. 6 is a plan view of a grating according to a second embodiment of the present invention.
本实施例的光栅220’具有构成方格状的多个第一遮光条221’及多个第二遮光条222’,这些第一遮光条221’与这些第二遮光条222’共同分隔出多个透光口223’。由于本实施例的光栅220’具有双维度的图案,所以可进一步提升检测装置的检测精准度。The grating 220' of this embodiment has a plurality of first light-shielding strips 221' and a plurality of second light-shielding strips 222' which form a grid. A light-transmitting port 223'. Since the grating 220' of this embodiment has a two-dimensional pattern, the detection accuracy of the detection device can be further improved.
根据上述实施例的检测装置,由于图案光束产生器与影像撷取器呈共轭配置,故与预设图案的比例与对比度相比,实际图案的比例与对比度较不会失真。如此一来,则能够提升实际影像的影像对比度,以及提升待测物检测的稳定性,进而提升检测装置的检测品质。According to the detection device of the above-mentioned embodiment, since the pattern beam generator and the image capture device are configured in a conjugate manner, the ratio and contrast of the actual pattern are less distorted compared with the ratio and contrast of the preset pattern. In this way, the image contrast of the actual image can be improved, and the stability of detecting the object under test can be improved, thereby improving the detection quality of the detection device.
此外,由于图案光束产生器至分光镜的距离相等于影像撷取器的成像面至分光镜的距离,故可进一步减少影响检测稳定性的变数,进而进一步提升检测装置的检测品质。In addition, since the distance from the pattern beam generator to the beam splitter is equal to the distance from the imaging surface of the image capture device to the beam splitter, the variables affecting the detection stability can be further reduced, thereby further improving the detection quality of the detection device.
Claims (10)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810153885.7A CN110186925A (en) | 2018-02-22 | 2018-02-22 | Detection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810153885.7A CN110186925A (en) | 2018-02-22 | 2018-02-22 | Detection device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110186925A true CN110186925A (en) | 2019-08-30 |
Family
ID=67713846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810153885.7A Withdrawn CN110186925A (en) | 2018-02-22 | 2018-02-22 | Detection device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110186925A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112098424A (en) * | 2020-11-17 | 2020-12-18 | 北京领邦智能装备股份公司 | High-precision imaging system, method and detection equipment |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4742237A (en) * | 1986-04-11 | 1988-05-03 | Fuji Photo Film Co., Ltd. | Surface configuration inspection apparatus with moving grating |
| US6376818B1 (en) * | 1997-04-04 | 2002-04-23 | Isis Innovation Limited | Microscopy imaging apparatus and method |
| CN103177983A (en) * | 2013-03-01 | 2013-06-26 | 日月光半导体制造股份有限公司 | Detection device and method |
| CN104115004A (en) * | 2012-02-10 | 2014-10-22 | 株式会社岛津制作所 | Solar cell inspection device and solar cell processing device |
| CN104897680A (en) * | 2014-03-04 | 2015-09-09 | 万润科技股份有限公司 | Object detection method and device |
| CN105758329A (en) * | 2014-12-18 | 2016-07-13 | 财团法人金属工业研究发展中心 | Optical surface profile scanning system |
| CN106645161A (en) * | 2016-09-27 | 2017-05-10 | 凌云光技术集团有限责任公司 | Surface defect detecting system and method |
| CN106931892A (en) * | 2015-12-29 | 2017-07-07 | 德律科技股份有限公司 | Optical detection device |
-
2018
- 2018-02-22 CN CN201810153885.7A patent/CN110186925A/en not_active Withdrawn
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4742237A (en) * | 1986-04-11 | 1988-05-03 | Fuji Photo Film Co., Ltd. | Surface configuration inspection apparatus with moving grating |
| US6376818B1 (en) * | 1997-04-04 | 2002-04-23 | Isis Innovation Limited | Microscopy imaging apparatus and method |
| CN104115004A (en) * | 2012-02-10 | 2014-10-22 | 株式会社岛津制作所 | Solar cell inspection device and solar cell processing device |
| CN103177983A (en) * | 2013-03-01 | 2013-06-26 | 日月光半导体制造股份有限公司 | Detection device and method |
| CN104897680A (en) * | 2014-03-04 | 2015-09-09 | 万润科技股份有限公司 | Object detection method and device |
| CN105758329A (en) * | 2014-12-18 | 2016-07-13 | 财团法人金属工业研究发展中心 | Optical surface profile scanning system |
| CN106931892A (en) * | 2015-12-29 | 2017-07-07 | 德律科技股份有限公司 | Optical detection device |
| CN106645161A (en) * | 2016-09-27 | 2017-05-10 | 凌云光技术集团有限责任公司 | Surface defect detecting system and method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112098424A (en) * | 2020-11-17 | 2020-12-18 | 北京领邦智能装备股份公司 | High-precision imaging system, method and detection equipment |
| CN112098424B (en) * | 2020-11-17 | 2023-09-15 | 北京领邦智能装备股份公司 | High-precision imaging system, method and detection equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8976250B2 (en) | Lens inspection system | |
| JP6629455B2 (en) | Appearance inspection equipment, lighting equipment, photography lighting equipment | |
| CN106645161B (en) | Surface defect detection system and method | |
| TWI596333B (en) | Means for measuring a film with a transparent substrate and a measuring method thereof | |
| KR20220103962A (en) | Depth measurement via display | |
| JP2017062120A (en) | Inspection lighting device and inspection system | |
| JP2019100930A (en) | Inspection system and inspection method | |
| CN105486700B (en) | System for detecting transparent object defects and using method thereof | |
| KR101030450B1 (en) | Cylindrical secondary battery Upper and lower metal inspection device | |
| CN106841237A (en) | A kind of electronic display glass cover plate surfaces defect detecting system and method | |
| TW201337211A (en) | Shape reflector and surface contour mapping | |
| CN104568963A (en) | Online three-dimensional detection device based on RGB structured light | |
| KR101211438B1 (en) | Apparatus for inspecting defects | |
| CN113984790B (en) | Lens quality detection method and device | |
| CN111999313A (en) | Light source device, defect detection method and defect detection system | |
| US12051606B2 (en) | Apparatus, method and recording medium storing command for inspection | |
| JP2015055561A (en) | Defect inspection method and defect inspection apparatus for microlens array | |
| KR20150071228A (en) | Apparatus of inspecting glass of three dimensional shape | |
| TWI696820B (en) | Detection device | |
| JP2017011277A (en) | Automatic chip orientation system and method for CAD layout with sub-optical resolution | |
| CN110186925A (en) | Detection device | |
| CN204287060U (en) | A kind of online three-dimensional detection device based on RGB structured light | |
| JP5821092B2 (en) | Illuminance distribution measuring apparatus and illuminance distribution measuring method | |
| KR101030451B1 (en) | Cylindrical secondary battery tube and washer inspection device | |
| CN114867985B (en) | Three-dimensional shape measuring device, three-dimensional shape measuring method, and storage medium |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20190830 |