CN110383176A - processing equipment - Google Patents

Abstract

The invention relates to a processing apparatus for substrate bodies, in particular an optical processing apparatus, comprising an exposure system with an exposure unit or a plurality of exposure units, an alignment system with at least one alignment camera for adjusting the exposure system, a substrate carrier unit with a holding device for the substrate body, and a registration system with one registration camera or a plurality of registration cameras, wherein the position and/or orientation of the substrate body held by the holding device can be detected by the one or the at least one registration camera in at least one alignment position of the substrate carrier unit, the processing apparatus being configured such that the exposure system and the registration system can be easily coordinated with one another, the alignment system having a reference marking or a plurality of reference markings, which are respectively arranged in a defined relative position with respect to the at least one alignment camera, and one reference mark or at least one reference mark may be detected by one registration camera or at least one registration camera.

Description

processing equipment

technical field

The invention relates to a processing device for substrate bodies, in particular an optical processing device, comprising an exposure system with one or more exposure units, a calibration system with at least one calibration camera for adjusting the exposure system, A substrate carrier unit with a holding device for a substrate body, and a registration system with one or more registration cameras, wherein the position of the substrate body held by the holding device in at least one registration position of the substrate carrier unit and Or orientation can be detected by one or at least one registration camera.

Background technique

The processing device is, for example, an exposure device.

Such processing equipment is known in the prior art.

In these processing devices there is the problem of coordinating the exposure system and the registration system.

In particular, the exposure system is oriented relative to a coordinate system of the exposure system, and the registration system detects the position and/or orientation of the substrate body in the coordinate system of the registration system.

There is thus the problem of obtaining transformation rules between the coordinate system of the exposure system (on the one hand) and the coordinate system of the registration system (on the other hand).

For example, in known processing devices, a test exposure of a test substrate body with marks is performed, wherein the marks are detected by a registration system and the exposure system exposes the test structures to the test substrate body. From the spatial offset between the marks of the test substrate body and the exposed test structure, the transformation rules between the coordinate system of the exposure system (on the one hand) and the coordinate system of the registration system (on the other hand) can be determined.

However, this method is complex and requires special expertise, so it should only be performed by trained service personnel.

Contents of the invention

It is therefore the object of the present invention to provide an improved processing device of the type in question, in particular a processing device in which the exposure system and the registration system can be coordinated with one another in a simple manner.

According to the invention, this object is achieved in a processing device of the above-mentioned type in that the calibration system has a reference mark or a plurality of reference marks, each of which is arranged in a defined relative position with respect to at least one calibration camera , and the one or at least one reference mark can be detected by a registration camera or at least one registration camera, in particular in at least one registration position.

Preferably, a plurality, in particular all reference marks, can be detected by one registration camera or at least one registration camera, in particular in the registration position.

It can be seen that the advantage of the solution according to the invention is that the one or at least one reference mark can be detected by the one or at least one registration camera and thus the position of the one or at least one reference mark is determined by the registration system detection. Thus, by means of the defined relative position between the one or at least one reference mark and the calibration camera, the position of the calibration camera can be determined by the registration system.

Since the exposure system is adjusted by means of a calibration system with at least one calibration camera, the position of which calibration camera can be determined by a registration system, the exposure system and the registration system can thus be coordinated with each other by means of a calibration system with one or at least one reference mark .

In particular, the transformation rule between the coordinate system of the exposure system which can be adjusted by means of the calibration system and the coordinate system of the registration system which detects the one or at least one reference mark can be determined by means of the reference mark.

In particular, the position of the reference mark or the positions of the reference marks is known in the coordinate system of the calibration system.

Therefore, preferably, the transformation rules between the coordinate system of the exposure system and the coordinate system of the calibration system and between the coordinate system of the registration system and the coordinate system of the calibration system can also be determined.

Another advantage of the solution according to the invention can be seen in that an automatic adjustment of the exposure system and an automatic coordination of the exposure system to the registration system can be achieved.

In particular, transformation rules between the coordinate system of the exposure system and the coordinate system of the registration system and the coordinate system of the calibration system can be detected automatically, for example by the control system.

Regarding the structure of the substrate carrier unit, no more detailed description will be made at present.

In particular, it is provided that the substrate carrier unit and the exposure system are movable relative to one another.

For example, the substrate carrier unit and the one or more exposure units may be movable relative to each other.

As a result, the substrate body arranged on the substrate carrier unit can be advantageously exposed by the exposure system.

It is preferably provided that the substrate carrier unit and the registration system, in particular the one or more registration cameras, are movable relative to each other.

Thus, in a certain position the position and/or orientation of the substrate body can be detected by the registration system and in another position the substrate body can be exposed by the exposure system.

In a particularly advantageous embodiment it is provided that the substrate carrier unit can be moved substantially linearly in the advancing direction relative to the exposure system and/or the registration system.

For example, the substrate carrier unit is arranged to be movably, in particular movably guided, on a frame of a processing apparatus.

In particular, the rack comprises one or more guides.

Preferably, the substrate carrier unit is arranged movably guided, in particular substantially linearly in the feed direction, on the one or more guides of the machine frame.

In particular, the substrate body is arranged on the substrate carrier unit in the support region.

Preferably, the substrate body rests in a suitable arrangement on a support element or support elements.

For example, the substrate body rests flat on the one or at least one support element.

In a preferred embodiment it is provided that the base plate body rests partially on a support element or at least one support element, preferably partially on a plurality of support elements.

In particular, the support region extends substantially in the geometric support plane.

In principle, the holding device can be constructed in various forms and ways.

In particular, the holding device substantially holds the substrate body in a geometric holding plane.

An arrangement substantially in one plane is understood to mean that the exact plane deviates by less than 5 mm, better by less than 2 mm and preferably by less than 1 mm.

Advantageously, the geometric holding plane and the geometric support plane extend substantially parallel to one another.

A substantially parallel extension is to be understood as an extension of at most ±10° (angle), better at most ±5° (angle), and preferably at most ±2° (angle) from an exactly parallel extension.

For example, the holding device includes a mechanical holding mechanism for holding the substrate body.

For example, the mechanical holding mechanism includes a clamping body that fixedly holds the substrate body.

In a preferred embodiment it is provided that the holding device holds the substrate body hydrostatically.

Preferably, the holding device comprises a suction nozzle or nozzles with which a negative pressure is generated, in particular with respect to ambient pressure, and by which the substrate body is held, for example pressed connected to the one or at least one support element.

In a particularly advantageous embodiment, the holding device is movable, in particular relative to the substructure of the substrate carrier unit.

Preferably, the holding device is movable in a direction extending at least approximately perpendicularly to the holding plane.

In particular, the holding device is movable in a direction at least approximately perpendicular to the exposure plane of the exposure system.

Therefore, preferably, the holding device with the arranged substrate body is movable, in particular height-adjustable relative to the holding plane and/or the exposure plane.

Substrate bodies of different thicknesses can thus also be respectively well positioned for exposure, in particular with their processing sides to be processed, respectively, substantially positioned in the exposure plane.

The expression "at least approximately" is understood in context to include those configurations in which the stated value is achieved exactly and also includes configurations in which the stated value is achieved with a deviation of at most ± 20%, preferably at most ± 10%, in particular at most ± 5%. %, for example at most ±1%.

For example, the substrate main body is a plate-shaped substrate main body.

In particular, the substrate body extends substantially in the geometrical body plane, wherein, for example, the extension of the substrate body in the geometrical body plane is much greater, for example at least 5 times greater, than the extension of the substrate body perpendicular to the geometrical body plane.

In particular, it is provided that, when the substrate body is correctly arranged on the substrate carrier unit, the geometric support plane and the geometric body plane extend essentially parallel to one another.

It is preferably provided that, when the substrate body is correctly arranged on the substrate carrier unit, the geometric body plane and the geometric holding plane run essentially parallel to one another.

In an advantageous embodiment it is provided that when the substrate body is correctly arranged on the substrate carrier unit, the geometric body plane and the geometric holding plane substantially coincide.

In particular, the substrate body comprises at least one processing side. It is provided here that the processing side is processed by a processing device.

It is preferably provided that the substrate body rests in the support region with the side situated opposite the processing side.

In a further advantageous embodiment it is provided that, when the substrate body is correctly arranged in the substrate carrier unit, the geometric holding plane extends substantially through the processing side of the substrate body.

In particular, the substrate body comprises at least one photosensitive layer, which is advantageously arranged on the process side.

Upon irradiation with suitable light, a photochemical process is triggered in the photosensitive layer and chemically converts at least a portion of the photosensitive layer.

Furthermore, it is provided in an advantageous embodiment that the processing device comprises a substrate carrier unit detection system for detecting the position of the substrate carrier unit with high precision.

The position is therefore always known precisely, even in a movable substrate carrier unit.

In particular, the substrate carrier unit detection system detects the position of the substrate carrier unit in the feed direction with high precision.

For example, the substrate carrier unit detection system detects the substrate carrier unit with an accuracy of at least ±0.3 mm, preferably at least ±0.1 mm, especially at least ±0.05 mm, particularly advantageously at least ±0.001 mm, and more advantageously at least ±0.0005 mm s position.

Regarding the structure of the exposure system and the one or more exposure units, there is no detailed description at present.

In particular, it is provided that each of the exposure units comprises a light source.

In particular, the light source radiates light which triggers photochemical processes in the photosensitive layer of the substrate body.

For example, the light source is a laser diode.

Advantageously, each exposure unit includes one, in particular its own or its associated optical deflection device.

In this case, for example, each exposure unit can comprise its own deflection device.

Preferably, the deflection device is assigned to a plurality of exposure units.

In particular, the optical deflecting device deflects, in particular precisely deflects, the light beam emanating from the light source.

Thus, with each exposure unit it is possible to precisely expose the predefined structure or at least a part thereof onto the substrate body.

Preferably, each exposure unit is provided for exposure in an exposure section. Thereby, in particular, each region of the substrate body is exposed separately by means of the exposure unit.

In particular, the exposure system (and advantageously each exposure unit) can be adjusted by means of a calibration system, for example in a spatial relationship to a reference mark or at least one reference mark.

In an advantageous embodiment, it is provided that adjacent exposure sections are arranged next to each other in the adjusted state.

In particular, the individual exposure segments do not overlap in the state of the adjustment number.

In a particularly advantageous embodiment it is provided that the exposure segments in the adjusted state are arranged transversely to the advance direction next to each other, in particular adjacent to each other.

Advantageously, therefore, substantially the entire exposure region to be exposed of the substrate body which is moved in the feed direction by means of the substrate carrier unit can be exposed substantially over the entire area by the exposure system.

In particular, the exposure regions are partly respectively exposed by the exposure unit.

Advantageously, one exposure strip each is exposed on the substrate body by each exposure unit.

In particular, the exposure strip extends substantially elongated in the feed direction.

Advantageously, the individual exposure strips are arranged adjacently transverse to the feed direction.

In particular, in each case two mutually adjacent exposure strips are arranged adjacent to each other.

In an advantageous embodiment it is provided that the exposure system is oriented so as to expose the processing side of the substrate body which is arranged substantially in the geometric exposure plane.

In particular, the geometric exposure plane extends substantially parallel to the geometric holding plane.

It is preferably provided that the geometric exposure plane and the geometric support plane extend substantially parallel to one another.

In particular, with regard to the exposure system, full reference is made to DE 10242142 A1 and DE 102006059818 A1.

In a particularly advantageous embodiment it is provided that the exposure unit comprises one or more features of the exposure mechanisms known from these publications.

The design of the calibration system and the at least one calibration camera is currently not described in detail.

The calibration system preferably comprises exactly one calibration camera.

Provision is made in a further advantageous embodiment for the calibration system to comprise a plurality of calibration cameras.

It is particularly advantageous if the one calibration camera or at least one calibration camera or several calibration cameras of the plurality of calibration cameras, in particular all calibration cameras, comprise one or more of the following features.

In particular, the calibration camera is movable, in particular relative to the gantry.

The calibration camera and the registration camera are preferably arranged movable relative to each other.

It is particularly advantageous if the calibration camera is arranged movable relative to the exposure system, in particular relative to the exposure unit.

In particular, the calibration camera can be moved, eg displaced, substantially parallel to the exposure plane.

Preferably, the calibration camera is movable in each exposure segment.

Advantageously, the calibration camera is movable in all exposure segments.

Thus, in particular, each light beam of each exposure unit can be detected by the calibration camera, and the individual exposure units can be easily adjusted to each other.

In principle, the calibration camera can be arranged movably on the gantry by a separate kinematic system with position detection.

In a particularly advantageous embodiment it is provided that the calibration camera is arranged on the substrate carrier unit.

As a result, the calibration camera can advantageously be moved together with the substrate carrier unit.

In particular, it is provided that the calibration camera is arranged movably on the substrate carrier unit, preferably so that it can move at least approximately perpendicularly to the advancing direction.

Thus, a simple embodiment is achieved in which the calibration camera can be moved by means of the substrate carrier unit substantially in the direction of feed and also transversely, in particular at least approximately perpendicularly, to the direction of feed.

For example, the calibration camera is arranged movably on the substrate carrier unit on a linear axis which in particular extends at least approximately perpendicularly to the feed direction.

Furthermore, provision is made in a particularly advantageous embodiment for the calibration system to include a calibration camera detection system which detects, in particular, the position of the calibration camera with the highest accuracy.

In particular, the calibration camera detection system detects the position of the calibration camera relative to the exposure plane, preferably within the exposure plane.

Advantageously, the calibration camera detection system detects the position of the calibration camera along the linear axis.

Therefore, the position of the calibration camera is always known particularly with the highest accuracy, and the calibration can be carried out in a simple manner.

In particular, “highest precision” is understood to mean a measurement error of at most ±0.01 mm, preferably at most ±0.001 mm and particularly preferably at most ±0.0005 mm.

In a particularly advantageous embodiment it is provided that the calibration system includes an imaging system for calibrating the camera.

For example, an imaging system includes multiple optical elements.

Preferably, the imaging system, in particular its optical elements, is fixedly connected to the calibration camera, eg directly or indirectly arranged invariably to the calibration camera.

In a particularly advantageous embodiment it is provided that the imaging system comprises microscope optics and thus the calibration camera advantageously captures images with the highest precision.

In particular, it is provided that the calibration camera captures images in the imaging region, in particular with the highest precision.

Preferably, the imaging region extends substantially in the exposure plane.

In a further advantageous embodiment it is provided that the imaging region extends substantially in the holding plane.

In some embodiments it is provided that the imaging region extends substantially in the support plane.

Advantageously, the imaging region extends substantially in the object plane of the imaging system, in particular of the calibration camera.

In this case, an imaging region extending substantially in a plane is understood to mean in particular an imaging region which is at most 5 mm, preferably at most 1 mm, in particular at most 0.3 mm, and particularly preferably at most 0.3 mm, from said plane At most 0.1 mm.

Regarding the reference marks, there is no detailed description at present.

For example, the calibration system has exactly one reference mark.

In an advantageous embodiment it is provided that the calibration system has a plurality of reference marks, for example two or three or four or five reference marks.

The conversion between the coordinate system of the exposure system and the coordinate system of the registration system and in particular the coordinate system of the calibration system can thus be determined more precisely. Therefore, preferably, an angle of rotation and/or a translation and/or a linear scaling between the coordinate systems can also be determined.

It is advantageously provided that one or more, in particular all reference marks are arranged substantially in the exposure plane.

The reference marks are thus arranged in particular in the exposure-related exposure plane and advantageously the conversion between the coordinate system of the exposure system and the coordinate system of the calibration system and the coordinate system of the registration system is more accurate.

For example, it can be provided that the relative position between one or more reference marks and the calibration camera is time-variable, since they are arranged movable relative to each other, and the relative position is detected and thus defined, for example by means of the calibration camera detection system. Location.

However, it is preferably provided that one or more, in particular all reference marks are each arranged in an essentially constant relative position to the calibration camera.

In particular, one or more, in particular all, reference marks are arranged stationary relative to the calibration camera, and therefore advantageously these reference marks are aligned with the calibration camera when the calibration camera is moved, for example in the feed direction and/or in particular along a linear axis. Calibrate the camera movement together.

The position of one or more reference marks in the coordinate system of the calibration system is thus advantageously determined particularly precisely.

For example, one or more, in particular all reference marks are arranged invariantly with respect to the calibration camera.

In a particularly advantageous embodiment it is provided that one or more, in particular all reference marks are arranged in the imaging region of the calibration camera.

In particular, one or more, in particular all, reference marks can be detected by the calibration camera, for example for adjusting the exposure system.

Preferably, one or more, in particular all reference marks are arranged in the object plane of the calibration camera.

In an advantageous embodiment it is provided that one or more, in particular all reference marks are arranged on the optical elements of the imaging system.

For example, an optical element may be a focusing element, in particular a lens.

In particular, the optical element is a plane-parallel transparent plate.

Preferably, the optical element is a beam visualization element which visualizes the beam of the exposure unit for detection by the calibration camera.

It is preferably provided that one or more, in particular all reference marks are arranged on the surface of the optical element.

In particular, this surface extends in the object plane of the calibration camera.

Furthermore, it is particularly advantageous if the surface of the optical element on which one or more, in particular all reference marks are arranged, extends substantially in the geometric exposure plane.

In a further embodiment it is provided that the surface extends substantially in a geometrically retaining plane.

Thus, one or more, in particular all reference marks are always detectable by the calibration camera and thus their position in the coordinate system of the calibration system is always detectable, in particular detectable with high precision.

Thus, in this embodiment, since the calibration camera always detects the exact position of the reference marks, this gives little error sensitivity, for example with respect to mechanical deformation and/or thermally induced extension and compression, They are able to change the relative position of the reference markers with respect to the calibration camera.

In addition, after dismantling the processing device, in particular the calibration system, the position of the reference marks can be quickly and easily detected again by calibrating the camera.

In a further advantageous embodiment it is provided that one or more, in particular all reference marks are arranged preferably unchanged on the calibration camera.

Thus, in particular, the relative position of the reference mark with respect to the calibration camera is invariant and the system is less prone to errors, eg with respect to mechanical deformations.

In a further advantageous embodiment it is provided that one or more, in particular all reference marks are arranged unchanged relative to the mount of the calibration camera, for example on the mount itself.

Furthermore, in particular in an embodiment in which the calibration camera cannot detect one or more reference marks, it is advantageously provided that the relative position of the reference marks with respect to the calibration camera is stored after being measured in the control system.

Thus, the relative position is always retrievable and readjustment is preferably also automated.

Furthermore, it is advantageously provided that one or more, in particular all reference marks, can be detected by one or more registration cameras at least in the reference position of the substrate carrier unit, for example in the registration position.

Reference marks can thus always be detected by one or more registration cameras, even in movable substrate carrier units.

In particular, one, preferably several, in particular all reference marks are arranged in the object plane of one, for example several, in particular all registration cameras, in particular in their imaging regions.

In particular, it is provided that one or more, in particular all reference marks comprise structures with a high optical contrast with respect to the background region.

The reference marks can thus be detected particularly well and precisely by means of the calibration camera and/or the registration camera.

For example, one or more, especially all reference signs are separate elements.

Preferably, one or more, in particular all reference marks, are embodied as a coating, in particular on the optical element and/or on the calibration camera and/or on the mount of the calibration camera.

Provision is made in an advantageous embodiment for the coating to contain chromium or chromium oxide.

Reference marks can have various shapes.

In particular, it is provided that at least one reference mark is configured as a circle or a rectangle.

It is particularly advantageous if at least one reference mark is configured in the shape of a cross.

Another preferred solution provides that the reference marks are formed as line outlines.

In particular, the line profile can be designed as a line profile surrounding the inner region, which line profile can have a variety of courses, for example a rectangular or circular course.

The invention also relates to a method for operating a processing plant of a substrate body, in particular a method for adjusting and aligning components of the processing plant, wherein the processing plant comprises: an exposure system with one or more exposure units, A calibration system with at least one calibration camera for adjusting the exposure system, a substrate carrier unit with a holding device for the substrate body, and a registration system with a registration camera or a plurality of registration cameras for detecting The position and/or orientation of the substrate body held by the device.

Here, it is an object of the invention to provide a simplified method for coordinating an exposure system and a registration system with one another.

According to the invention, this object is achieved by a method of the above-mentioned type in that the calibration system has a reference mark or a plurality of reference marks, each of which is arranged in a defined relative position with respect to at least one calibration camera, and A reference mark or at least one reference mark is detected by a registration camera or at least one registration camera.

It can be seen that one of the advantages of the solution according to the invention is that at least one registration camera detects at least one of the reference marks, and thus the registration can be aligned in a simple manner by means of the reference mark or reference marks. Barebones harmonizes to the exposure system.

In particular, the registration system detects the position and/or orientation of the substrate body to be processed in a coordinate system of the registration system.

The exposure system, in particular the exposure unit or exposure units, is oriented relative to the coordinate system of the exposure system.

In particular, the exposure system is adjusted by means of a calibration system.

Advantageously, the exposure system is adjusted in the coordinate system of the calibration system by means of the calibration system, and a transformation rule between the coordinate system of the exposure system and the coordinate system of the calibration system is preferably determined here.

In particular, the exposure units respectively emit light beams.

Preferably, by means of a calibration system, in particular by means of a calibration camera, the position, in particular It is a plurality of optimal beam paths for all beams.

For example, the intersection of the beam path and the exposure plane of the exposure system is detected.

In the method according to the invention, in particular the transformation rules between the coordinate system of the registration system and the coordinate system of the exposure system and in particular the coordinate system of the calibration system can be determined, since the exposure system is connected to a reference mark or reference marks The spatial relationship of is adjusted and one or at least one reference marker is detected by at least one registration camera.

In a particularly advantageous embodiment it is provided that one reference mark or the position of at least one reference mark is detected by at least one calibration camera.

In particular, it is provided that the position of several, in particular all, reference marks is detected by at least one calibration camera.

Preferably, a reference mark or reference marks are detected to adjust the exposure system.

Thus, the exact position of the one or more reference marks can always be detected by at least one calibration camera and the exposure system is advantageously oriented relative to the one or more reference marks.

In a further advantageous embodiment it is provided that the position of the one or at least one reference marker relative to the at least one calibration camera is known by measurement.

Preferably, a relative position of the reference mark and the at least one calibration camera or a plurality of relative positions of the reference marks and the at least one calibration camera are stored in the control system.

Advantageously, during adjustment of the exposure system or during coordination of the exposure system with the registration system, the relative position or relative positions can be called up from the control system in a simple manner and the relative positions are known without having to reset Measurement.

In particular, it is provided that the movement and/or position of the at least one calibration camera is preferably detected with the highest accuracy by the calibration camera detection system.

Preferably, the movement and/or position of the calibration camera is detected relative to, preferably parallel to, the exposure plane of the exposure system.

For example, the movement and/or position of the calibration camera relative to the exposure system and/or the registration system is detected.

In particular, the movement and/or position of the calibration camera is detected along a linear axis, wherein the calibration camera is arranged movably on the substrate carrier unit along the linear axis.

It is preferably provided that the substrate carrier unit detection system detects, in particular, the movement and/or the position of the substrate carrier unit with the highest precision.

In particular, the movement and/or position of the substrate carrier unit is detected relative to, eg parallel to, the exposure plane of the exposure system.

Preferably, the movement and/or position of the substrate carrier unit relative to the exposure system is detected.

It is particularly advantageous to detect the movement and/or the position of the substrate carrier unit relative to the registration system.

Advantageously, the movement and/or the position of the substrate carrier unit is detected in the direction of advancement, in particular the substrate carrier unit is guided to be movable.

Thus, even during movement of the calibration camera and/or the substrate carrier unit its position is known and thus at least a relative displacement of the coordinate system of the calibration system with respect to the coordinate systems of the exposure system and the registration system can be determined.

For example, each exposure unit comprises a light source and optical deflecting means for controllably deflecting the light beam of the light source.

In particular, provision is made for the optical deflection device to be oriented by means of the alignment system such that the light beams of the respective exposure unit are used for exposure in the exposure section in each case.

In a particularly advantageous embodiment it is provided that the method, in particular the adjustment and alignment of the components of the treatment device, is automated.

In particular, automated methods are performed, for example, by a computer-aided control system.

Readjustment and/or readjustment of components of the processing device can thus advantageously be carried out without trained service personnel, for example after at least partial disassembly of the processing device or after a predetermined time interval.

Furthermore, it is preferably provided that one or more features mentioned in connection with the processing device are used in the method.

Furthermore, a particularly preferred embodiment of the aforementioned processing device is configured to carry out the method according to the invention.

Description of drawings

Other features and advantages of the invention are the subject of the following description and the accompanying drawings of some embodiments:

Shown in the accompanying drawings:

Figure 1 is a perspective view of a processing device according to a first embodiment,

Figure 2 is an illustration of a substrate body to be processed,

Figure 3 is a partial perspective view of a substrate carrier unit with a calibration camera arranged,

Figure 4 is a partial side view of a substrate carrier unit with a calibration camera arranged,

Figure 5 is a partially enlarged view of the processing equipment in the area of the exposure system and the substrate body to be exposed,

Figure 6 is a schematic diagram of two exposure strips of the exposure system,

Figure 7 is a schematic diagram of the calibration system in a) orientation of the exposure system and b) reference marks obtained by registration cameras,

Figure 8 is a schematic illustration of a calibration camera arranged on a substrate carrier unit by means of a bracket according to a second embodiment, and

Fig. 9 is a schematic diagram similar to Fig. 7 of the third embodiment.

Detailed ways

As an example of a processing device generally indicated at 10 , a processing device 10 for the optical processing of a substrate body 12 is described and exemplarily shown in FIG. 1 as a first embodiment.

FIG. 2 shows by way of example a substrate body 12 to be processed.

In particular, the substrate main body 12 is basically configured in a plate shape.

Preferably, the substrate body 12 extends substantially in the geometrical body plane 22 , wherein, in particular, the extension of the substrate body 12 perpendicular to the geometrical body plane 22 is significantly smaller than the extension of the substrate body 12 in the geometrical body plane 22 .

In particular, the substrate body 12 comprises at least one photosensitive layer 24 and an underlying structural layer 26 .

The at least one photosensitive layer 24 and the at least one structural layer 26 are arranged on the processing side 28 of the substrate body 12 .

In this case, the photosensitive layer 24 is applied onto the structural layer 26 .

For example, the photosensitive layer 24 is also provided on the side facing away from the structural layer 26 with a protective layer which protects the photosensitive layer 24 from external influences, in particular harmful influences.

For example, the structural layer 26 and the photosensitive layer 24 are applied to the carrier plate 32 .

In particular, the carrier plate 32 extends substantially in the geometric body plane 22 .

It is provided that a predefined structure 42 is formed on the processing side 28 by means of the processing device 10 .

In particular, it is provided that the predefined structures 42 are applied by exposure.

In this case, photochemical processes are triggered in the photosensitive layer 24 under suitable exposure, whereby the material of the photosensitive layer 24 is converted.

Preferably, the chemically converted material of the exposed photosensitive layer 24 protects the regions of the structural layer 26 lying below this material, so that only the photosensitive layer is removed, in particular etched, during removal, in particular during etching. The unconverted regions of 24 and the corresponding regions of structural layer 26 lying beneath said regions.

The structural layer 26 includes in particular a metal, for example the structural layer 26 is a copper layer.

The predefined structure 42 is formed in particular from a plurality of images of the structural elements 44 .

In particular, the plurality of structural elements 44 are designed substantially identically.

Each of said structural elements 44 is formed from a plurality of components 46 .

For example, the structural element 44 is designed as a conductor track system for an electronic or electrical functional element, and the component 46 is in particular an electrical conductor track.

The processing device 10 comprises a substrate carrier unit 52 and an exposure system 54 , wherein the predefined structure 42 is exposed onto the substrate body 12 arranged on the substrate carrier unit 52 by means of the exposure system 54 .

Furthermore, the processing apparatus 10 comprises a calibration system 56 for adjusting the exposure system 54 and a registration system 58 for detecting the position and/or orientation of the substrate body 12 on the substrate carrier unit 52 .

The substrate carrier unit 52 is movably arranged on a frame 62 of the processing apparatus 10 , preferably arranged linearly movable in a feed direction 66 .

For example, frame 62 includes two guides 68a and 68b. The two guides are preferably designed substantially similarly and are collectively referred to below as guide 68 .

The guides 68 extend substantially in the feed direction 66 and are spaced from one another, for example transversely to the feed direction 66 .

The substrate carrier unit 52 is arranged movably on guides 68 , preferably in a guided manner between two guides 68 .

The substrate carrier unit 52 includes, for example, a substructure 112 .

The substrate carrier unit 52 expediently comprises at least two guide bodies 114 a , 114 b , which preferably engage in guides 68 a , 68 b . In particular, the guide body 114 is arranged beside the substructure 112 .

Furthermore, a substrate carrier unit detection system 118 is provided, which detects the position of the substrate carrier unit 52 , in particular its position in the advance direction 66 , with the highest precision.

The substrate carrier unit 52 comprises holding means 122 with which the substrate body 12 is held during the processing process.

In this case, the holding device 122 includes, in particular, a support element 124 . The support element 124 comprises at least one support side 126 on which a support region 128 is arranged ( FIGS. 3 and 4 ).

In this case, the substrate body 12 is in the support region 128 on the support element 124 during processing. In particular, the substrate body 12 rests in a support region 128 on a support side 126 with the side opposite to the process side 28 to be processed.

For example, in a variant of the embodiment, the support area 128 is configured flat so that the substrate body 12 lies flat.

In a further variant it is provided that in the support region 128 individual parts of the support element 124 extend and that the substrate body 12 only partially rests on these parts of the support element 124 in the support region 128 .

For example, said parts of the support element 124 are configured as a grid-like structure.

For example, the holding device 122 includes a suction nozzle 129 . With the suction nozzle 129 a negative pressure is generated relative to the ambient pressure, preferably on the support side 126 of the support element 124 , and the substrate body 12 is attracted to the support element 124 and fixed.

For example, the suction nozzle 129 is arranged on the support element 124 .

In a variant of embodiment, the substrate body 12 is optionally or additionally held by means of mechanical holding means, such as clamps.

Thus, the substrate body 12 is substantially held in the geometrical holding plane 132 by the holding means 122 .

In particular, with the substrate body 12 resting in the support region 128 on the support element 124 , the geometric body plane 22 and the geometric holding plane 132 of the substrate body substantially coincide.

In one variant, it is provided that the geometric holding plane 132 extends substantially through the support side 126 , in particular through the surface of the support side.

In a further variant, it is provided that the geometric holding plane 132 extends substantially through the processing side 28 to be processed of the substrate body 12 , in particular through this processing side, when the substrate body 12 is properly arranged in the holding device 122 s surface.

Preferably, the holding device 122 is arranged to be movable relative to the machine frame 62 , for example relative to the substructure 112 .

In particular, the holding device 122 is movable in a direction extending perpendicularly at least approximately perpendicularly to the holding plane 132 .

The exposure system 54 includes a plurality of exposure units 152, in particular a large number of exposure units 152 (FIG. 5).

For example, exposure system 54 includes several hundred exposure units 152 .

The exposure units 152 each comprise at least one light source 156 and in particular an optical deflection device 158 associated therewith.

The light source 156 emits light which triggers a chemical conversion process in the photosensitive layer 24 of the substrate body 12 .

The light beam 159 emitted by the light source 156 is aligned and for example focused on a desired position on the substrate body 12 by means of an optical deflection device 158 .

The exposure unit 152 is oriented such that the substrate body 12 , in particular its processing side 28 , is exposed substantially in the exposure plane 160 .

The optical deflection means 158 deflects the light beam 159 of the light source 156 so that it hits and exposes a predetermined area in the exposure plane 160 .

In particular, the predetermined area corresponds to a partial area of the predefined structure 42 .

In particular, the exposure plane 160 passes through its processing side 28 to be processed, preferably through its surface, while the substrate body 12 is held in a defined manner by the holding device 122 .

In particular, the exposure plane 160 and the holding plane 132 extend substantially parallel to each other.

The deflection device 158 deflects the light beam 159 of the light source 156 within the exposure section 162 , more precisely, deflects the light beam according to the data present in the coordinate system (X1, Y1).

Therefore, the path of the beam 159 in the coordinate system (X1, Y1) is known.

It is provided here that the light beams 159 of the exposure units 152 are each moved in the exposure sections 162 in order to expose the substrate body 12 .

In this case, the exposure segments 162 are in particular arranged adjacent to one another without overlapping or next to each other overlapping one another.

Preferably, the exposure segments 162 are arranged side by side transversely to the feed direction 66 , in particular at least approximately perpendicularly to the feed direction 66 .

In particular, it is provided that during the exposure of the substrate body 12 the substrate body is moved linearly by the substrate carrier unit 52 in the feed direction 66 and that the light beam 159 of the light source 156 in the corresponding exposure section 162 is transverse, in particular oblique, to the feed The direction 66 is deflected by a deflection device 158 .

Accordingly, the exposure units 152 preferably each irradiate within the respective exposure section 162 by means of the movement of the light beam 159 within the region delimited by the exposure strips 164 on the substrate body 12 .

The exposure strip 164 produced on the substrate body 12 extends in particular longitudinally in the feed direction 66 and has a width transverse to the feed direction 66 which is equal to the width of the exposure section 162 .

The exposure strips 164 are also arranged side by side transversely to the feed direction 66 , wherein the exposure strips 164 preferably overlap at the edges.

In particular, two adjacent exposure strips 164 each adjoin each other.

Thus, the area 166 to be exposed on the substrate body 12 is determined by the entirety of the exposure strip 164 .

Preferably, the exposure unit 152 exposes a single pixel in the exposure section 162 .

In particular, the pixels are arranged in a grid of individual grid points RP ( FIG. 6 ).

In particular, the grid points RP are arranged in rows 168 which extend substantially laterally in the exposure section 162 .

For example, the row 168 extends transversely to the feed direction 66 , wherein, in particular, the inclination angle between the course of the row 168 and the feed direction 66 may be determined by the movement speed of the substrate body 12 in the feed direction 66 and the transverse direction of the light beam. The speed of movement in the feed direction 66 is given.

Exposure unit 152 exposes individual pixels whose center is each substantially in one of the grid points RP.

In this case, the size of the pixel spot is much larger than the distance between two adjacent grid points RP in the row 168, for example at least 5 times larger, and is much larger than the distance between two adjacent rows 168, for example at least 5 times.

Furthermore, the mutual distance of the grid points RP is significantly smaller than the typical dimensions of the individual components 46 .

Thus, the area to be exposed of the predefined structure 42 is covered by a plurality of pixel spots, so that sharp edges of the predefined structure 42 can be imaged with sufficient precision.

With regard to further advantageous features of the exposure system 54 , reference is made in full to DE 10 242 142 A1, in particular to the construction of the exposure device described there.

The individual exposure units 152 are adjusted relative to each other by means of the calibration system 56 .

In particular, the exposure segments 162 of the individual exposure units 152 are oriented relative to each other and the corresponding coordinate systems (Xla, _Yla ), ( _Xlb , _{Ylb )} , . . . of the individual exposure units 152 are detected.

The calibration system 56 includes at least one calibration camera 212 ( FIGS. 3 , 4 and 7 ) having an optical imaging system 214 .

The calibration camera 212 is arranged in particular on the substrate carrier unit 52 , for example on the side of the substrate carrier unit 52 which is the end side of the substrate carrier unit 52 with respect to the feed direction 66 .

The calibration camera 212 is arranged movably on the substrate carrier unit 52 , eg on its substructure 112 , substantially transversely to the feed direction 66 , preferably at least approximately perpendicularly to the feed direction 66 .

For example, the calibration camera 212 is arranged to be movably guided by means of a support 218 on a linear axis 216 which extends transversely to the feed direction 66 .

In particular, calibration camera 212 is arranged to be movable in such a way that it can be moved through each exposure section 162 of each exposure unit 152 .

With the aid of imaging system 214 , calibration camera 212 detects imaging region 222 in its coordinate system (X2, Y2).

Preferably, the optical element 224 is arranged in the imaging region 222 .

In particular, the optical element 224 is designed as a light beam visualization element, so that the point of impact 226 of the light beam 159 on the optical element 224 for calibrating the camera 212 can be detected. For example, optical element 224 scatters light beam 159 .

For example, the optical imaging element 224 consists of glass, in particular a glass plate.

Imaging region 222 , for example the side of optical element 224 facing calibration camera 212 , lies in particular in the object plane of calibration camera 212 , so that calibration camera 212 detects images of imaging region 222 clearly.

In particular, the imaging system 214 and in particular the optical element 224 is constantly connected to the calibration camera 212 , for example by means of a bracket 218 , so that the optical element 224 and thus also the imaging region 222 can also be transverse, preferably at least approximately perpendicular, to the feed direction 66 . moves and moves with the movement of the calibration camera 212 .

Preferably, imaging region 222 extends substantially in exposure plane 160 .

In a variant, the imaging region 222 extends substantially in the geometrically maintained plane 132 .

Furthermore, the calibration system 56 has at least one reference mark 232 , for example two reference marks 232a, 232b.

The positions of the reference marks 232 are known in the coordinate system (X2, Y2) of the calibration camera 212 , in particular these positions are detected by the calibration camera 212 .

In particular, a reference mark 232 is arranged in the imaging region 222 , preferably on the optical element 224 .

For example, reference marks 232 are arranged in an edge region of imaging region 222 , so that the reference marks are detected by calibration camera 212 and a central region of imaging region 222 is left free.

In particular, the reference mark 232 comprises a high-contrast structure 234 which is set out in optically high contrast by the background on which the reference mark 232 is arranged.

The reference mark 232 is formed of, for example, chromium or chromium oxide.

In addition, calibration system 56 also includes calibration camera detection system 242 that detects the position of calibration camera 212 and, for example, detects movement of the calibration camera along linear axis 216 .

In particular, calibration camera detection system 242 detects the position of calibration camera 212 on linear axis 216 .

Registration system 58 includes at least one registration camera 252 .

In an advantageous variant, two registration cameras 252 are provided.

For example, the at least one registration camera 252 is arranged on a bridge 254 of the frame 62 .

Preferably, the bridge 254 extends transversely to the feed direction 66 .

In particular, the bridge 254 spans the guide 68 and the substrate carrier unit 52 can be moved under the bridge 254 therethrough.

In particular, the substrate carrier unit 52 is arranged to be movable relative to the registration camera 252 .

In at least one registration position 258 of the substrate carrier unit 52 , the registration camera 252 is aimed at the substrate carrier unit 52 and in particular detects the support area 128 .

A correctly arranged substrate body 12 on the substrate carrier unit 52 can thus be detected by the registration camera 252 in the registration position 258 .

Registration camera 252 detects, in particular in registration position 258 , the position and orientation of substrate body 12 arranged on substrate carrier unit 52 in its coordinate system (X3, Y3).

For example, registration camera 252 detects its position and orientation by means of reference marks on substrate body 12 and/or on corners and edges of substrate body 12 .

Furthermore, in at least one reference position 264 of the substrate carrier unit 52 the reference mark 232 may be detected by the registration camera 252 .

Thus, the processing device 10 functions and its calibration preferably proceeds as follows:

To align and set exposure units 152 , calibration camera 212 is moved within exposure section 162 of the respective exposure unit 152 and between the exposure sections.

In particular, here substrate carrier unit 52 is moved in feed direction 66 , for example in guide 68 , and calibration camera 212 is moved along linear axis 216 transversely to feed direction 66 .

In this case, the precise position of the substrate carrier unit 52 along the feed direction 66 is always detected by the substrate carrier unit detection system 118 and the position of the calibration camera 212 along the linear axis 216 is determined by the calibration camera detection system 242, Its position is thus known with the highest precision. For example, its position is known to have an error of at most ±0.1 mm, better ±0.05 mm, still better ±0.001 mm, and particularly advantageously ±0.0005 mm.

In this case, the calibration camera 212 detects the impingement point 226 of the light beam 159 in the imaging region 222 as well as the reference mark 232 ( FIG. 7 a ).

Thus, the position of the impact point 226 relative to the reference mark 232 is detected by the calibration camera 212 in its coordinate system (X2, Y2), the position of the impact point in the coordinate system (X1, Y1) of the exposure unit 152 being known.

Thus, transformation between the coordinate system (X1, Y1) of the exposure unit and the coordinate system (X2, Y2) of the calibration camera 212 can be realized.

Furthermore, the calibration camera 212 is moved into the individual exposure sections 162 of the exposure unit 152 and the exposure sections 162 are aligned relative to each other by adjusting the deflection device 158 .

For this purpose, in particular the end points of the row 168 are detected by the calibration camera 212 and the deflection device 158 is coordinated such that the respective end points of two adjacent exposure sections 162 have the desired relative position with respect to each other, in particular substantially They are arranged offset relative to each other in feed direction 66 and have a distance from one another, for example transversely to feed direction 66 , which is substantially equal to the distance between adjacent grid points RP in row 168 .

In order to match the coordinate system (X2, Y2) of the calibration camera 212 and the coordinate system (X3, Y3) of the registration camera 252, the substrate carrier unit 52 is moved to the reference position 264, for example by moving the substrate carrier unit 52 along the feed direction 66. Movement and calibration of the camera 212 is effected along a linear axis 216 .

In this case, the registration camera 252 detects the position of the reference mark 232 in its coordinate system (X3, Y3), the position of the reference mark 232 in the coordinate system (X2, Y2) of the calibration camera 212 is known. This enables an adjustment and transformation between the coordinate system (X2, Y2) of the calibration camera 212 and the coordinate system (X3, Y3) of the registration camera 252 (FIG. 7b).

In this case, the spatial relationship between the coordinate system (X2, Y2) of the calibration system (56) and the coordinate system (X1, Y1) of the exposure system 54 and the coordinate system (X3, Y3) of the registration system 58 The displacement in the movement of the substrate carrier unit 52 and the calibration camera 212 is known by detecting the movement, in particular with the highest precision, by the substrate carrier unit detection system 118 and the calibration camera detection system 242 .

With the thus determined transformation between the coordinate system (X2, Y2) of the calibration system 56 on the one hand and the coordinate system (X1, Y1) of the exposure system 54 and on the other hand the coordinate system (X3, Y3) of the registration system 58 , the transformation between the coordinate system (X1, Y1) of the exposure system 54 and the coordinate system (X3, Y3) of the registration system 58 can be determined.

Preferably, the above-mentioned adjustment and calibration of the components of the processing apparatus 10 , in particular the substrate carrier unit 52 , the exposure system 54 , the calibration system 56 and the registration system 58 , are automated by eg a computer-aided control system 312 .

For handling the substrate body 12 , in particular for exposing it, said substrate body 12 is arranged on the substrate carrier unit 52 , in particular in the support region 128 and held by the holding device 122 .

Preferably, the processing side 28 is positioned substantially in the exposure plane 160 by the height-adjustable holding device 122 .

With the substrate body 12 arranged, the substrate carrier unit 52 is moved into the registration position 258 and the position and orientation of the substrate body 12 is detected by the registration camera 252 in its coordinate system (X3, Y3).

Thus, the position and orientation of the substrate body 12 is also known in the coordinate system (X1, Y1) of the exposure system 54 by adjustment and calibration of the processing apparatus 10 .

To expose the substrate body 12 , the substrate body is moved from the substrate carrier unit 52 through the exposure section 162 and the exposure unit 152 exposes the substrate body 12 with the predetermined structure 42 , in particular in its respective exposure strip 164 .

In a second embodiment of the processing device 10 according to the invention (partially shown for example in FIG. 8 ), those components which are the same as those of the first embodiment have the same reference numerals and are fully described with respect to them. Reference is made to the implementation of the first example.

In a second embodiment, at least one reference mark 232 , for example two reference marks 232 a , 232 b , is arranged at element 322 of calibration system 56 , for example on support 218 .

In this case, element 322 is permanently connected to calibration camera 212 .

In particular, element 322 moves in the same manner as calibration camera 212 , for example along linear axis 216 .

Thus, preferably, the relative position between the reference mark 232 and the calibration camera 212 is substantially constant, at least under normal operating conditions of the processing device 10 .

The position of the reference marker 232 in the coordinate system (X2, Y2) of the calibration system 56 is measured once, for example, and stored in the control system 312 for subsequent use, eg for calibrating and orienting components of the processing device 10 .

In the second embodiment, the orientation of the exposure unit 152 is performed in a similar manner to the first embodiment. The impingement point 226 of the light beam 159 is detected by the calibration camera 212 in its coordinate system (X2, Y2). Thus, a transformation from the coordinate system (X1, Y1) of the exposure unit 152 to the coordinate system (X2, Y2) of the calibration camera 212 can be determined and the individual exposure segments 162 oriented relative to each other.

In addition, registration camera 252 detects reference marker 232 in reference position 264 so that the coordinate system of registration system 58 can be determined ( X3, Y3) and the coordinate system (X2, Y2) of the calibration system 56 .

In order to precisely determine the position of the reference mark 232 in the coordinate system (X2, Y2) of the calibration system 56, for example a test substrate body 12' provided with a reference structure is exposed by a processing device 10 with a test structure designed, for example, with The reference structure is basically the same.

Here, in particular, a first approximation of the transformation between the coordinate system (X3, Y3) of the registration system 58 and the coordinate system (X2, Y2) of the calibration system 56 is used.

From the spatial offset between the reference structure and the exposed test structure, an approximate correction to the transformation between the coordinate systems (X3, Y3) and (X2, Y2) can be determined and stored, for example, in the control system 312 in.

A high-precision transformation is thus determined between the coordinate system (X3, Y3) of the registration system 58 and the coordinate system (X2, Y2) of the calibration system 56 by a first approximation with the offset-corrected transformation.

Furthermore preferably, the thus determined positions of reference marker 232 in coordinate system (X2, Y2) of calibration system 56 are preferably stored in control system 312 so that they can be recalled for subsequent adjustment and orientation of processing device 10 .

Therefore, preferably, automatic adjustment and orientation of the components of the processing device 10 can also be realized in the second embodiment.

In the third exemplary embodiment of the processing device according to the invention as shown in FIG. 9 , the reference mark 232 ′ a is configured as a line profile which surrounds the inner region 233 ′ and can thus be detected very precisely.

Furthermore, all elements that are identical to those of the first exemplary embodiment are provided with the same reference numerals, so that full reference can be made to the implementation of the first exemplary embodiment.

Claims (32)

1. one kind is used for the processing equipment (10) of base main body (12), especially optical treatment equipment (10), comprising: have one The exposure system (54) of exposing unit (152) or multiple exposing units (152) has for adjusting exposure system (54) at least The calibration system (56) of one calibration camera (212) has the substrate of the holding meanss (122) for the base main body (12) Carrier element (52), and the registration arrangement (58) with a registration camera (252) or multiple registrations camera (252), wherein By the holding meanss (122) keep the base main body (12) position and/or be oriented in the substrate carrier unit It (52) can be by one registration camera or at least one registration camera (252) inspection at least one registration position (258) It surveys,

It is characterized in that, the calibration system (56) has a reference marker (232) or multiple reference markers (232), it is described One or at least one reference marker is arranged in the opposite position of the restriction relative at least one calibration camera (212) In setting, and one or at least one reference marker (232) can be by one or at least one registration camera (252) Detection.

2. processing equipment (10) according to claim 1, which is characterized in that the substrate carrier unit (52) and the exposure Photosystem (54) can be movable with respect to each other.

3. according to the described in any item processing equipments of preceding claims (10), which is characterized in that the substrate carrier unit (52) it can be movable with respect to each other with the registration arrangement (58).

4. according to the described in any item processing equipments of preceding claims (10), which is characterized in that the substrate carrier unit It (52) can be substantial linear on direction of feed (66) relative to the exposure system (54) and/or the registration arrangement (58) Movement.

5. according to the described in any item processing equipments of preceding claims (10), which is characterized in that processing equipment (10) packet Substrate carrier control chip unit detecting system (118) are included, with the position for accurately detecting substrate carrier unit (52).

6. according to the described in any item processing equipments of preceding claims (10), which is characterized in that in the exposing unit (152) Each exposing unit include light source (156) and optical deflecting device (158).

7. according to the described in any item processing equipments of preceding claims (10), which is characterized in that in the exposing unit (152) Each exposing unit setting for accordingly exposure section (162) in exposure.

8. processing equipment (10) according to claim 7, which is characterized in that in the state of regulating, each exposure is single The exposure section (162) of first (152) is disposed adjacent to each other respectively.

9. according to the described in any item processing equipments of preceding claims (10), which is characterized in that exposure system (54) quilt Orient the processing side (28) in the exposure plane (160) for being arranged substantially at geometry to expose the base main body (12).

10. according to the described in any item processing equipments of preceding claims (10), which is characterized in that at least one described calibration phase Machine (212) can move in each exposure section (162) and can move to exposure section (162) inside.

11. according to the described in any item processing equipments of preceding claims (10), which is characterized in that at least one described calibration phase Machine (212) is arranged on the substrate carrier unit (52).

12. according to the described in any item processing equipments of preceding claims (10), which is characterized in that at least one described calibration phase Machine (212) is at least approximately perpendicular to the direction of feed (66) and is movably arranged on the substrate carrier unit (52).

13. according to the described in any item processing equipments of preceding claims (10), which is characterized in that calibration system (56) packet It includes calibration camera detection system (242), the calibration camera detection system detects the position of at least one calibration camera (212) It sets, especially up to detects to precision.

14. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are arranged substantially in the exposure plane (160).

15. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) be arranged in at least one described calibration camera (212) substantially invariable relative position.

16. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) be arranged in the optical imaging system (214) at least one calibration camera (252) with institute It states on the optical element (224) that calibration camera is fixedly connected, is disposed particularly on light beam visualization element.

17. according to the described in any item processing equipments of preceding claims (10), which is characterized in that the optical element (224) Surface extend substantially in the exposure plane (160), arrangement is one or more on said surface, particularly all ginsengs Examine label.

18. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are arranged in the imaging region (222) of at least one calibration camera (212).

19. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are arranged at least one described calibration camera (212),.

20. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are arranged on the bracket (218) of at least one calibration camera (212), especially unchangeably cloth It sets.

21. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) at least can be by one at least one reference position (264) of the substrate carrier unit (52) A or multiple registration camera (252) detections.

22. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) include the structure relative to the high optical contrast in background area.

23. according to the described in any item processing equipments of preceding claims (10), which is characterized in that it is one or more, particularly All reference markers (232) are configured at least one on the optical element (224) and/or described calibration camera (212) And/or at least one calibration camera (212) bracket (218) on coating.

24. according to the described in any item processing equipments of preceding claims (10), which is characterized in that the reference marker (232) It is configured to region-wide label, there is the outer profile limited.

25. according to claim 1 to processing equipment described in any one of 23, which is characterized in that reference marker (232) structure Make the line profile for being especially constructed to surround interior zone for line profile.

26. method of the one kind for the processing equipment (10) of running substrate main body (12), especially described for adjusting and orienting The method of the component of processing equipment (10), wherein the processing equipment (10) includes: with an exposing unit (152) or multiple The exposure system (54) of exposing unit (152) has at least one calibration camera for adjusting the exposure system (54) (212) calibration system (56) has the substrate carrier unit of the holding meanss (122) for the base main body (12) (52), and with a registration camera (252) or multiple registration arrangements (58) for being registrated camera (252), for detecting by institute State position and/or the orientation of the base main body (12) of holding meanss (122) holding, which is characterized in that the calibration system (56) there is a reference marker (232) or multiple reference markers (232), the reference marker to be respectively disposed at relative to institute In the relative position for stating the restriction of at least one calibration camera (212), and one or at least one reference marker (232) By one or at least one registration camera (252) detection.

27. according to the method for claim 26, which is characterized in that adjust the exposure by means of the calibration system (56) System (54).

28. the method according to claim 26 or 27, which is characterized in that detected by means of the calibration system by described one One or more that a or multiple exposing units (152) emit relative to one or at least one reference marker (232), spy It is not the rays of all light beams (159).

29. the method according to any one of claim 26 to 28, which is characterized in that one or at least one reference It is detected by least one described calibration camera (212) position of label (232).

30. the method according to any one of claim 26 to 29, which is characterized in that one or at least one reference Label (232) is stored in control system (312) relative to the position of at least one calibration camera (212).

31. the method according to any one of claim 26 to 30, which is characterized in that at least one described calibration camera (212) movement of the exposure plane (160) for being parallel to the exposure system (54) and/or position are by calibration camera detection system (242) it detects, especially up to detects to precision.

32. the method according to any one of claim 26 to 31, which is characterized in that by substrate carrier control chip unit detecting system (118) the substrate carrier unit (52) is detected relative to the exposure system (54) and/or relative to the registration arrangement (58) movement and/or position, are especially accurately detected.