CN110422345B - OSR thermal control coating based on photonic crystal - Google Patents
OSR thermal control coating based on photonic crystal Download PDFInfo
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Abstract
Description
技术领域technical field
本发明涉及热控涂层技术领域,更具体而言,涉及一种基于光子晶体的OSR 热控涂层。The present invention relates to the technical field of thermal control coatings, and more particularly, to an OSR thermal control coating based on photonic crystals.
背景技术Background technique
热控涂层是航天器重要的保障系统之一,太阳辐射是航天器受到最大的热辐射,其覆盖和紫外、可见和红外。当航天器在太空中运行时,向阳面的温度最高可达250℃,背阳的最低温度可达到-200℃。在这种情况下,航天器内部结构部件、仪器设备的温度不均匀性能达到±50-100℃。而航天器大多数设备对温度有着严格的要求,一般电子设备保持在-15℃-﹢50℃;而Ni-Cd电池耐受-10℃ -﹢40℃;对于某些特殊的设备,除了有温度范围要求外,还有温度变化率的要求,如空间望远镜和高精度对地观察相机等。高温及巨大的温度变化率对于航天器设备是无法接受的。而航天器主要采用铝合金,钛合金等轻合金材料。而金属的发射率εH很小,这样使得航天器在太阳辐照下运行时热平衡温度会很高。热控涂层是涂覆在航天器的表面,就先航天器的皮肤一样,对航天器的表面温度进行控制,以保证航天器及内部设备正常的工作。航天器的表面的热平衡温度表达式如下式:Thermal control coating is one of the important safeguard systems for spacecraft. Solar radiation is the largest thermal radiation received by spacecraft, which covers ultraviolet, visible and infrared. When the spacecraft is operating in space, the temperature on the sunny side can reach up to 250°C, and the lowest temperature on the back side can reach -200°C. In this case, the temperature non-uniformity of the internal structural components and instruments of the spacecraft can reach ±50-100 °C. Most of the spacecraft equipment has strict temperature requirements. Generally, electronic equipment is kept at -15℃-﹢50℃; while Ni-Cd batteries can withstand -10℃-﹢40℃; for some special equipment, in addition to the In addition to the temperature range requirements, there are also requirements for the rate of temperature change, such as space telescopes and high-precision ground observation cameras. High temperatures and huge temperature change rates are unacceptable for spacecraft equipment. The spacecraft mainly use light alloy materials such as aluminum alloy and titanium alloy. The emissivity ε H of metals is very small, so that the thermal equilibrium temperature of the spacecraft will be very high when operating under solar radiation. The thermal control coating is coated on the surface of the spacecraft, just like the skin of the spacecraft, to control the surface temperature of the spacecraft to ensure the normal operation of the spacecraft and its internal equipment. The thermal equilibrium temperature expression of the surface of the spacecraft is as follows:
其中S为太阳常数,σ是Stefan-Boltzmanncha常数,AP为航天器垂直于太阳辐射方向有效面积,A为航天器的有效面积,αS是航天器表面太阳能的吸收率,εH航天器表面的半球向外红外发射率。其中物体发射率定义为物体辐射能力E 与相同温度黑体辐射力Eb之比。对于特定的航天器,其S,σ,AP,A都是常数。由此可见,其航天器表面的平衡温度可以通过选择不同αS/εH,最终实现热控制。热控涂层的吸收发射比αS/εH的值越小则航天器的降温程度越大;热控涂层的吸收发射比αS/εH的值越大则航天器的升温程度越大。航天器主要采用轻合金材料,如铝合金,钛合金等。而金属的发射率εH很小,这样使得航天器在太阳辐照下运行时热平衡温度会很高。在航天器表面涂覆的热控涂层,减少航天器表面对太阳能吸收的吸收,增加其表面热辐射,降低航天器平衡温度,延长空间飞行器的使用寿命,保证航天器及其中的仪器设备维持在正常的工作温度范围内。由此,低吸收发射比的热控涂层是保证航天器及其设备正常工作的关键技术。where S is the solar constant, σ is the Stefan-Boltzmanncha constant, AP is the effective area of the spacecraft perpendicular to the direction of solar radiation, A is the effective area of the spacecraft, α S is the solar energy absorption rate on the spacecraft surface, ε H is the spacecraft surface The hemispherical outward infrared emissivity. The emissivity of an object is defined as the ratio of the radiation ability E of the object to the radiation force E b of the black body at the same temperature. For a particular spacecraft, its S, σ, AP , A are all constants. It can be seen that the equilibrium temperature of the spacecraft surface can be thermally controlled by selecting different α S /ε H . The smaller the value of the absorption-emission ratio α S /ε H of the thermal control coating, the greater the cooling degree of the spacecraft; the larger the value of the absorption-emission ratio α S /ε H of the thermal control coating, the higher the temperature of the spacecraft. big. Spacecraft mainly use light alloy materials, such as aluminum alloys, titanium alloys, etc. The emissivity ε H of metals is very small, so that the thermal equilibrium temperature of the spacecraft will be very high when operating under solar radiation. The thermal control coating applied on the surface of the spacecraft reduces the absorption of solar energy on the surface of the spacecraft, increases the thermal radiation on its surface, reduces the equilibrium temperature of the spacecraft, prolongs the service life of the spacecraft, and ensures the maintenance of the spacecraft and its instruments and equipment. within the normal operating temperature range. Therefore, the thermal control coating with low absorption-emission ratio is the key technology to ensure the normal operation of spacecraft and its equipment.
目前热控涂层按照涂层的组成可分为以下四种:未涂覆的金属表面,如抛光表面,喷砂表面;涂料型涂层,各种有机无机涂层;电化学涂层,如阳极氧化涂层和电镀涂层;二次表面镜型热控涂层,如光学太阳反射镜(OSA)、塑料薄膜型二次表面镜以及涂料二次表面镜;现有采用白漆和第二次表面镜是获得低吸收和高发射的主要技术途径。其中白漆主要有ZnO,ZrO2等白色颜料和有机树脂构成,如Z-93、YB71等,二次表面镜主要包括F-46和光学反射器(OSR)。针对目前航天器热控涂层的需求,目前OSR的金属反射层存在太阳能光谱吸收能力强、反射能力差,反射频段窄等技术难题。这使得OSRs存在太阳能吸收比αS较大(0.13)、太阳光谱反射比ρS低和反射光谱频段窄等难以克服的技术难题。At present, thermal control coatings can be divided into the following four types according to the composition of the coating: uncoated metal surfaces, such as polished surfaces, sandblasted surfaces; paint-type coatings, various organic and inorganic coatings; electrochemical coatings, such as Anodized coatings and electroplating coatings; secondary surface mirror type thermal control coatings such as optical sun reflectors (OSA), plastic film type secondary surface mirrors, and paint secondary surface mirrors; existing use of white paint and secondary surface mirrors Subsurface mirrors are the main technical route to obtain low absorption and high emission. Among them, the white paint is mainly composed of ZnO, ZrO 2 and other white pigments and organic resins, such as Z-93, YB71, etc. The secondary surface mirror mainly includes F-46 and optical reflector (OSR). In view of the current demand for thermal control coatings for spacecraft, the current OSR metal reflective layer has technical problems such as strong solar spectrum absorption ability, poor reflection ability, and narrow reflection frequency band. This makes OSRs have difficult technical problems such as a large solar absorption ratio α S (0.13), a low solar spectral reflectance ratio ρ S , and a narrow reflection spectral band.
目前主要材料由石英玻璃和金属膜层构成的热控涂层。采用这种涂层主要存在反射频段难以兼顾紫外、可见和红外多波段,也很难实现200nm-2000nm 的宽频段低吸收。而且由于金属在电场作用下,会产生电磁振荡,进而产生能量损耗。即便是较薄的趋肤深度,其电磁能量损耗也是不可忽视的。另一方面,金属膜层的附着力和耐环境适应性也较差。At present, the main material is a thermal control coating composed of quartz glass and metal film layers. The main problem of using this coating is that it is difficult to take into account the ultraviolet, visible and infrared multi-bands in the reflection frequency band, and it is also difficult to achieve low absorption in a wide frequency range of 200nm-2000nm. Moreover, due to the action of the electric field, the metal will generate electromagnetic oscillations, which will result in energy loss. Even with a thin skin depth, the electromagnetic energy loss is not negligible. On the other hand, the adhesion and environmental adaptability of the metal film layer are also poor.
发明内容SUMMARY OF THE INVENTION
为了克服现有技术中所存在的不足,本发明提供一种基于光子晶体的OSR 热控涂层,解决目前的OSR结构难以实现紫外-可见-红外太阳能全光谱的高反射和低吸收等问题,实现200nm-2000nm的宽频段全反射。In order to overcome the deficiencies in the prior art, the present invention provides an OSR thermal control coating based on photonic crystals, which solves the problems that the current OSR structure is difficult to achieve high reflection and low absorption of the full spectrum of ultraviolet-visible-infrared solar energy, and the like, Realize the wide-band total reflection of 200nm-2000nm.
为了解决上述技术问题,本发明所采用的技术方案为:In order to solve the above-mentioned technical problems, the technical scheme adopted in the present invention is:
一种基于光子晶体的OSR热控涂层,由发射层、紫外光反射层、可见红外光反射层组成;A photonic crystal-based OSR thermal control coating is composed of an emission layer, an ultraviolet light reflection layer, and a visible infrared light reflection layer;
所述发射层采用具备>0.8的红外发射率,可透过超过90%的紫外光、可见光和200nm-2000nm红外光,具备较高的传输率,并且耐高温,热膨胀系数极小的材料;The emission layer is made of materials with an infrared emissivity > 0.8, which can transmit more than 90% of ultraviolet light, visible light and 200nm-2000nm infrared light, with high transmission rate, high temperature resistance, and extremely small thermal expansion coefficient;
所述紫外光反射层采用由电介质薄膜A和电介质薄膜B交替构成的介质型光子晶体,交替周期为3-7,所述电介质薄膜A和电介质薄膜B为非金属材料,所述紫外光反射层在200nm-400nm为禁带,将200nm-400nm紫外光反射,对紫外线有较强的反射能力,对可见光与红外光有良好的传输能力;The ultraviolet light reflective layer adopts a dielectric photonic crystal composed of alternating dielectric films A and B, and the alternating period is 3-7. The dielectric film A and dielectric film B are non-metallic materials, and the ultraviolet light reflective layer 200nm-400nm is the forbidden band, reflecting 200nm-400nm ultraviolet light, has strong reflection ability to ultraviolet light, and has good transmission ability to visible light and infrared light;
所述可见红外光反射层由介质C和介质D交替构成,交替周期为4.5-7.5,所述介质C与介质D为金属光子晶体薄膜,所述可见红外光反射层在可见光和 400nm-2000nm红外光的等效介电常数小于0,阻碍该频域的电磁波进入可见- 红外反射型光子晶体。The visible-infrared light reflective layer is composed of medium C and medium D alternately, and the alternating period is 4.5-7.5. The medium C and medium D are metal photonic crystal films, and the visible-infrared light reflective layer is in visible light and 400nm-2000nm infrared light. The equivalent permittivity of light is less than 0, preventing electromagnetic waves in this frequency domain from entering the visible-infrared reflective photonic crystal.
进一步地,所述发射层采用石英玻璃和铈玻璃中任一种,厚度为0.1mm-0.2 mm。Further, the emission layer adopts any one of quartz glass and cerium glass, and the thickness is 0.1 mm-0.2 mm.
进一步地,所述电介质薄膜A采用吸收光子波长在太阳光谱频段外,即小于200nm和大于2000nm的非金属电介质材料,或在可见光和红外光低吸收高通过的非金属电介质材料;所述电介质薄膜B采用低损耗、介电常数大的材料。Further, the dielectric film A adopts a non-metallic dielectric material whose photon absorption wavelength is outside the frequency band of the solar spectrum, that is, less than 200 nm and greater than 2000 nm, or a non-metallic dielectric material with low absorption and high pass through visible light and infrared light; the dielectric film B uses materials with low loss and high dielectric constant.
进一步地,在于:所述电介质薄膜A采用Al2O3、BaF2、KBr、SiO2、SiC、MgF2和TiO2中任一种;所述电介质薄膜B采用Si、Ge中任一种。Further, the dielectric film A is any one of Al 2 O 3 , BaF 2 , KBr, SiO 2 , SiC, MgF 2 and TiO 2 ; the dielectric film B is any one of Si and Ge.
进一步地,在于:所述电介质薄膜B介电常数高于电介质薄膜A介电常数至少1.5。Further, the dielectric constant of the dielectric film B is higher than the dielectric constant of the dielectric film A by at least 1.5.
进一步地,所述紫外光反射层电介质薄膜A采用Al2O3薄膜,膜层厚度 dA=80nm-120nm;所述电介质薄膜B采用Si薄膜,膜层厚度dB=5nm-10nm;交替周期设置为4。Further, the ultraviolet light reflective layer dielectric film A is made of Al 2 O 3 film, and the film thickness is d A =80nm-120nm; the dielectric film B is Si film, and the film thickness is d B =5nm-10nm; alternating period Set to 4.
进一步地,所述介质C为一种高介电常数的电介质,其介电常数的实部大于1.5;介质D为反射率较大的金属材料,其在可见光和红外光的介电常数实部小于零。Further, the medium C is a high dielectric constant dielectric, and the real part of the dielectric constant is greater than 1.5; the medium D is a metal material with high reflectivity, and the real part of the dielectric constant of visible light and infrared light is less than zero.
进一步地,在于:所述介质C采用Al2O3、SiO2、TiO2和ITO中任一种;所述介质D采用Al和Ag中任一种。其中ITO为氧化铟锡。Further, the medium C is any one of Al 2 O 3 , SiO 2 , TiO 2 and ITO; the medium D is any one of Al and Ag. Wherein ITO is indium tin oxide.
进一步地,所述介质C采用ITO薄膜;所述介质D采用Ag薄膜,金属Ag 的膜厚大于100nm;所述Ag薄膜和ITO薄膜的厚度比大于1.5。Further, the medium C adopts an ITO film; the medium D adopts an Ag film, and the film thickness of the metal Ag is greater than 100 nm; the thickness ratio of the Ag film and the ITO film is greater than 1.5.
与现有技术相比,本发明所具有的有益效果为:Compared with the prior art, the present invention has the following beneficial effects:
本发明提供了一种基于光子晶体的OSR热控涂层,由发射层、紫外光反射层、可见红外光反射层组成,紫外光反射层作为连接层,可见红外光反射层中介质C作为隔离层,保障了光子晶体较强的附着力和环境适应性,实现太阳能紫外-可见-红外全光谱(200nm-2000nm)高反射(反射率大于80%)的同时,实现其太阳能宽光谱低吸收,同时,保持了其原有OSR热控涂层高发射的物理特性,采用光子晶体对于禁带频域的电磁波的态密度较低,降低其电磁波与有损耗介质和吸收介质相互作用,以降低航天器接收的太阳能辐射热,降低航天器表面的温度。应用到OSR的金属薄膜存在两个技术问题,一个是与石英玻璃的附着力较差,制备OSR的方法主要有磁控溅射法。主要采用高温沉积首层ITO 等介质膜层,再采用常温依次沉积OSR其它膜层。在沉积完所有膜层后,进行 300℃-450℃真空环境下高温退火,退火时间为30min-45min。采用这种方法,可很好解决OSR附着力差的技术难题;另一方面是环境适应性强,需要沉积保护层,由A和B组成的光子晶体薄膜一方面充当了紫外反射层;另一方面充当 D和空气的隔离层,避免了环境与D的相互作用,为此,紫外反射层充当了保护层的作用。本方案通过结构设计,实现了反射层、连接层和保护层一体化设计。光子晶体薄膜材料的介电常数、电导率、透光率等性能参数都会对光子晶体的紫外、红外、可见光的透过率造成一定的影响。本发明通过对其材料属性不断优化设计,最终实现了200nm-2000nm的禁带特性,拓宽了光子晶体的禁带宽度。原本技术在红外波段的禁带宽度为最宽为200nm左右。The invention provides an OSR thermal control coating based on photonic crystal, which is composed of an emission layer, an ultraviolet light reflection layer and a visible infrared light reflection layer, the ultraviolet light reflection layer is used as a connecting layer, and the medium C in the visible infrared light reflection layer is used as an isolation layer. layer, which ensures the strong adhesion and environmental adaptability of the photonic crystal, realizes the high reflection (reflectivity greater than 80%) of the solar ultraviolet-visible-infrared full spectrum (200nm-2000nm), and at the same time realizes its broad solar energy spectrum and low absorption, At the same time, the high emission physical properties of the original OSR thermal control coating are maintained, and the use of photonic crystals has a low density of states for electromagnetic waves in the bandgap frequency domain, reducing the interaction between electromagnetic waves and lossy media and absorbing media, so as to reduce aerospace The solar radiation heat received by the spacecraft reduces the temperature of the spacecraft surface. The metal thin film applied to OSR has two technical problems, one is the poor adhesion with quartz glass, and the method for preparing OSR mainly includes magnetron sputtering. The first layer of dielectric films such as ITO is mainly deposited at high temperature, and then other films of OSR are sequentially deposited at room temperature. After all the layers are deposited, high temperature annealing is carried out in a vacuum environment of 300℃-450℃, and the annealing time is 30min-45min. Using this method, the technical problem of poor adhesion of OSR can be well solved; on the other hand, the environmental adaptability is strong, and a protective layer needs to be deposited. On the one hand, the photonic crystal film composed of A and B acts as an ultraviolet reflection layer; The aspect acts as an isolation layer between D and air, avoiding the interaction between the environment and D, and for this reason, the UV reflective layer acts as a protective layer. This scheme realizes the integrated design of the reflection layer, the connection layer and the protective layer through the structural design. The performance parameters such as dielectric constant, electrical conductivity and light transmittance of photonic crystal film materials will have certain influence on the transmittance of photonic crystals in ultraviolet, infrared and visible light. The invention realizes the forbidden band characteristic of 200nm-2000nm by continuously optimizing the design of its material properties, and widens the forbidden band width of the photonic crystal. The forbidden band width of the original technology in the infrared band is about 200nm at the widest.
附图说明Description of drawings
图1为本发明提供的一种基于光子晶体的OSR热控涂层结构示意图;1 is a schematic structural diagram of a photonic crystal-based OSR thermal control coating provided by the present invention;
图2为本发明提供的一种基于光子晶体的OSR热控涂层工作原理图;2 is a working principle diagram of a photonic crystal-based OSR thermal control coating provided by the present invention;
图3为发射层及紫外反射层结构及紫外反射层的微观结构;Fig. 3 is the microstructure of the structure of the emission layer and the ultraviolet reflection layer and the ultraviolet reflection layer;
图4为发射层、紫外反射层和可见红外光反射层结构及可见-红外光反射层的微观结构;Fig. 4 is the microstructure of the emissive layer, the ultraviolet reflective layer, the visible-infrared light reflective layer structure and the visible-infrared light reflective layer;
图5为紫外反射层的反射率和透射率示意图;5 is a schematic diagram of the reflectivity and transmittance of the ultraviolet reflective layer;
图6为可见红外光反射层的反射率和吸收率;Fig. 6 is the reflectivity and absorptivity of the visible infrared light reflection layer;
图7不同金属在紫外、可见和红外的反射率和吸收率;Fig. 7 Reflectance and absorption of different metals in UV, visible and IR;
图中:1为发射层、2为紫外光反射层、3为可见红外光反射层。In the figure: 1 is the emission layer, 2 is the ultraviolet light reflection layer, and 3 is the visible infrared light reflection layer.
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
如图1-4所示,一种基于光子晶体的OSR热控涂层,由发射层1、紫外光反射层2、可见红外光反射层3组成;As shown in Figure 1-4, a photonic crystal-based OSR thermal control coating consists of an
所述发射层采用具备>0.8的红外发射率,可透过超过90%的紫外光、可见光和200nm-2000nm红外光,具备较高的传输率,并且耐高温,热膨胀系数极小的材料;The emission layer is made of materials with an infrared emissivity > 0.8, which can transmit more than 90% of ultraviolet light, visible light and 200nm-2000nm infrared light, with high transmission rate, high temperature resistance, and extremely small thermal expansion coefficient;
所述紫外光反射层采用由电介质薄膜A和电介质薄膜B交替构成的介质型光子晶体,交替周期为3-7,所述电介质薄膜A和电介质薄膜B为非金属材料,所述紫外光反射层在200nm-400nm为禁带,将200nm-400nm紫外光反射,对紫外线有较强的反射能力,对可见光与红外光有良好的传输能力;所述电介质薄膜A采用吸收光子波长在太阳光谱频段外,即小于200nm和大于2000nm的非金属电介质材料,或在可见光和红外光低吸收高通过的非金属电介质材料;根据材料电子带间跃迁的理论,电子吸收波长与其材料的能带带隙满足公式:吸收波长=hc/Eg=1240nm/Eg,其组成紫外型光子晶体的组份Eg>4.1eV或Eg <0.62eV。所述电介质薄膜B采用低损耗、介电常数大的材料。所述电介质薄膜A采用Al2O3、BaF2、KBr、SiO2、SiC、MgF2和TiO2中任一种;所述电介质薄膜B采用Si、Ge中任一种。所述电介质薄膜B介电常数高于电介质薄膜A 介电常数至少1.5。The ultraviolet light reflecting layer adopts a dielectric type photonic crystal which is alternately formed by a dielectric film A and a dielectric film B, and the alternating period is 3-7. The dielectric film A and the dielectric film B are non-metallic materials, and the ultraviolet light reflecting layer 200nm-400nm is the forbidden band, reflecting 200nm-400nm ultraviolet light, which has strong reflection ability to ultraviolet light, and has good transmission ability to visible light and infrared light; the dielectric film A adopts the absorption photon wavelength outside the solar spectrum frequency band. , that is, non-metallic dielectric materials less than 200nm and greater than 2000nm, or non-metallic dielectric materials with low absorption and high pass in visible light and infrared light; : Absorption wavelength=hc/Eg=1240nm/Eg, the component Eg>4.1eV or Eg<0.62eV of the ultraviolet photonic crystal. The dielectric film B is made of materials with low loss and high dielectric constant. The dielectric film A is any one of Al 2 O 3 , BaF 2 , KBr, SiO 2 , SiC, MgF 2 and TiO 2 ; the dielectric film B is any one of Si and Ge. The dielectric constant of the dielectric film B is higher than that of the dielectric film A by at least 1.5.
所述可见红外光反射层由介质C和介质D交替构成,交替周期为4.5-7.5,所述介质C与介质D为金属光子晶体薄膜,所述可见红外光反射层在可见光和 400nm-2000nm红外光的等效介电常数小于0,阻碍该频域的电磁波进入可见- 红外反射型光子晶体。所述介质C为一种高介电常数的电介质,其介电常数的实部大于1.5;介质D为反射率较大的金属材料,其在可见光和红外光的介电常数实部小于零。所述介质C采用Al2O3、SiO2、TiO2和ITO中任一种;所述介质D采用Al和Ag中任一种。The visible-infrared light reflective layer is alternately composed of medium C and medium D, and the alternating period is 4.5-7.5. The medium C and medium D are metal photonic crystal films, and the visible-infrared light reflective layer is in visible light and 400nm-2000nm infrared. The equivalent permittivity of light is less than 0, preventing electromagnetic waves in this frequency domain from entering the visible-infrared reflective photonic crystal. The medium C is a high dielectric constant dielectric, and the real part of the dielectric constant is greater than 1.5; the medium D is a metal material with high reflectivity, and the real part of the dielectric constant in visible light and infrared light is less than zero. The medium C adopts any one of Al 2 O 3 , SiO 2 , TiO 2 and ITO; the medium D adopts any one of Al and Ag.
在本实施例中,所述发射层采用石英玻璃和铈玻璃中任一种,厚度为0.1 mm-0.2mm,玻璃片规格可为40mm×40mm,40mm×20mm,20mm×20mm。根据热控涂层对发射率的要求对其发射层的厚度进行设计。In this embodiment, the emission layer is made of any one of quartz glass and cerium glass, with a thickness of 0.1 mm-0.2 mm, and the size of the glass sheet can be 40 mm×40 mm, 40 mm×20 mm, or 20 mm×20 mm. The thickness of the emissive layer is designed according to the emissivity requirements of the thermal control coating.
在本实施例中,所述紫外光反射层电介质薄膜A采用Al2O3薄膜,膜层厚度dA=80nm-120nm;所述电介质薄膜B采用Si薄膜,膜层厚度dB=5nm-10nm;交替周期设置为4。其中,第二光子晶体膜层的结构并不限于上述结构,只要确保满足紫外光子晶体在200nm-400nm为禁带即可。In this embodiment, the ultraviolet light reflective layer dielectric film A is an Al 2 O 3 film, and the film thickness is d A =80nm-120nm; the dielectric film B is a Si film, and the film thickness is d B =5nm-10nm ;Alternate period set to 4. Wherein, the structure of the second photonic crystal film layer is not limited to the above structure, as long as it is ensured that the ultraviolet photonic crystal is a forbidden band at 200nm-400nm.
在本实施例中,所述介质C采用ITO薄膜;所述介质D采用Ag薄膜,金属Ag的膜厚大于100nm;所述Ag薄膜和ITO薄膜的厚度比大于1.5。In this embodiment, the medium C adopts an ITO film; the medium D adopts an Ag film, and the film thickness of metal Ag is greater than 100 nm; the thickness ratio of the Ag film and the ITO film is greater than 1.5.
在太阳光谱通过该涂层时,由于发射层对太阳全光谱都具备较强的传输能力。这样,紫外-可见-红外将透过发射层入射到紫外反射型光子晶体表面,由于紫外反射型光子晶体禁带特性,紫外(200nm-400nm)的理论上近100%的反射回去,并通过发射层,反射到太空中;而可见-红外(400nm-2000nm)的电磁波继续入射到紫外和可见红外反射型光子晶体表面。由于设计的可见-红外光子晶体在400nm-2000nm等效介电常数为负,该频域电磁波被反射到太空中。因此会产生低吸收发射比和太阳能全光谱高反射的效果,所有频段的电磁波经过的路径都是低吸收(不发生能带跃迁)和低损耗(不发生自由电子震荡)的的介质,太阳能吸收比较低。When the solar spectrum passes through the coating, the emission layer has a strong transmission capability for the entire solar spectrum. In this way, the ultraviolet-visible-infrared will be incident on the surface of the ultraviolet reflective photonic crystal through the emission layer. Due to the band gap characteristic of the ultraviolet reflective photonic crystal, the theoretically 100% ultraviolet (200nm-400nm) will be reflected back, and through the emission layer, reflected into space; while visible-infrared (400nm-2000nm) electromagnetic waves continue to be incident on the surface of ultraviolet and visible-infrared reflective photonic crystals. Since the designed visible-infrared photonic crystal has a negative equivalent dielectric constant at 400nm-2000nm, this frequency domain electromagnetic wave is reflected into space. Therefore, it will produce the effect of low absorption-emission ratio and high reflection of the full spectrum of solar energy. The path of electromagnetic waves in all frequency bands is a medium with low absorption (no band transition) and low loss (no free electron oscillation), and solar energy absorbs relatively low.
本方案的实施效果。采用时域有限元差分法计算出本方案设计的结构的紫外和可见-红外的光谱太阳光谱反射及透射光谱图见图5和图6所示:图5中,(a)为紫外反射型光子晶体的反射率,(b)为紫外反射型光子晶体的透射率;反射率>75%(200nm-400nm),>90%(250nm-400nm)透射率在<3%(250 nm-375nm);在紫外区的反射率和透射率之和约为1,其对紫外的吸收可忽略。图6中,(a)为可见-红外(400nm-2000nm)反射率,(b)为可见-红外(400 nm-2000nm)吸收率,在可见-红外反射率>85%(400nm-2000nm),吸收率<10%;透射率几乎为零。The implementation effect of this program. Using the time domain finite element difference method to calculate the ultraviolet and visible-infrared spectral solar spectral reflection and transmission spectra of the structure designed in this scheme are shown in Figure 5 and Figure 6: In Figure 5, (a) is the ultraviolet reflection photon The reflectivity of the crystal, (b) is the transmittance of the ultraviolet reflective photonic crystal; the reflectivity is >75% (200nm-400nm), >90% (250nm-400nm) and the transmittance is <3% (250nm-375nm); The sum of reflectance and transmittance in the ultraviolet region is about 1, and its absorption to ultraviolet is negligible. In Figure 6, (a) is the visible-infrared (400nm-2000nm) reflectance, (b) is the visible-infrared (400nm-2000nm) absorptivity, and the visible-infrared reflectance > 85% (400nm-2000nm), Absorptivity < 10%; transmittance almost zero.
图7为不同金属在紫外、可见和红外的反射率和吸收率,图中实线为反射率,虚线为吸收率,可见-红外反射性能较强的金属Ag在波长小于400nm时,反射率骤降,且金属Ag在可见光存在较强的吸收,吸收率大于70%。而金属 Al在紫外-可见-红外具备宽光谱反射的特点,但其反射性能明显低于金属Ag,其反射能力较差,而金属Al在红外也有明显的吸收。而Cu和Pt等金属在太阳光谱反射能力较差,且吸收也很强,吸收在较宽的频谱范围内都>80%。为此金属薄膜这些物理固有的属性使得目前OSR存在太阳光谱反射能力差、反射频段窄和吸收比大的不足。为此,采用一种新方法和新原理设计一层新型的太阳能反射层替代OSR的金属反射层是解决该技术难题的关键。而目前新型的太阳能反射薄膜除了金属还有采用氧化铟锡层状反射薄膜。这种结构的反射频段可以通过结构设计,实现反射频段自由可控,其具有较高的反射性能,反射率可达到90%以上。但其不足主要是其反射频段较窄,很难实现太阳光谱全光谱高反射的目的。另外就是采用光子晶体频域叠加和无序光子晶体对其反射频段进行拓展。和单一反射材料相比,基于光子晶体反射镜具备其反射频段可设计,其反射频段和叠加等优势。本方案通过构建设计一种由表面层、紫外反射型和可见-红外反射型光子晶体构建的新型的OSR的结构。实现了OSR热控涂层太阳能全光谱高反射和低吸收。Figure 7 shows the reflectance and absorptivity of different metals in the ultraviolet, visible and infrared. The solid line in the figure is the reflectance, and the dotted line is the absorptivity. When the wavelength of Ag with strong visible-infrared reflectivity is less than 400nm, the reflectivity suddenly increases. drop, and metal Ag has strong absorption in visible light, and the absorption rate is greater than 70%. The metal Al has the characteristics of broad spectral reflection in the ultraviolet-visible-infrared, but its reflection performance is significantly lower than that of the metal Ag, and its reflection ability is poor, and the metal Al also has obvious absorption in the infrared. However, metals such as Cu and Pt have poor reflectivity and strong absorption in the solar spectrum, and the absorption is >80% in a wide spectrum range. For this reason, the inherent physical properties of metal thin films make the current OSR have the shortcomings of poor solar spectrum reflectivity, narrow reflection frequency band and large absorption ratio. To this end, using a new method and new principle to design a new type of solar reflective layer to replace the metal reflective layer of the OSR is the key to solving this technical problem. In addition to metal, the current new type of solar reflective film also uses indium tin oxide layered reflective film. The reflection frequency band of this structure can be freely controlled through structural design, and it has high reflection performance, and the reflection rate can reach more than 90%. However, its shortcomings are mainly due to its narrow reflection frequency band, which makes it difficult to achieve the purpose of high reflection of the full spectrum of the solar spectrum. In addition, the frequency domain superposition of photonic crystals and disordered photonic crystals are used to expand the reflection frequency band. Compared with a single reflective material, the photonic crystal-based mirror has the advantages of designing its reflection frequency band, its reflection frequency band and superposition. This scheme designs a new type of OSR structure constructed by surface layer, ultraviolet reflection type and visible-infrared reflection type photonic crystal. The OSR thermal control coating solar full-spectrum high reflectance and low absorption is achieved.
上面仅对本发明的较佳实施例作了详细说明,但是本发明并不限于上述实施例,在本领域普通技术人员所具备的知识范围内,还可以在不脱离本发明宗旨的前提下作出各种变化,各种变化均应包含在本发明的保护范围之内。Only the preferred embodiments of the present invention have been described in detail above, but the present invention is not limited to the above-mentioned embodiments, and within the scope of knowledge possessed by those of ordinary skill in the art, various aspects can also be made without departing from the purpose of the present invention. Various changes should be included within the protection scope of the present invention.
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