CN111122518B - Photoelectric detection equipment and photoelectric detection method - Google Patents
Photoelectric detection equipment and photoelectric detection method Download PDFInfo
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 23
- 229910021389 graphene Inorganic materials 0.000 claims description 23
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- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/041—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
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Abstract
本公开涉及自动检测技术领域，提出了一种光电检测设备及光电检测方法。光电检测设备包括上料部、传输组件以及检测组件，上料部用于承载待检测膜料；传输组件用于驱动上料部移动；检测组件设置在上料部的移动路径上，检测组件包括透光率检测部和面电阻检测部，以用于测量待检测膜料的光学透光率和面电阻。本公开的光电检测设备通过上料部、传输组件以及检测组件的透光率检测部和面电阻检测部能够实现对待检测膜料的光学透光率和面电阻的自动测量，以此判断待检测膜料是否合格。由于整个过程属于自动化测量，提高了检测效率，且适合生产线的批量快速检测。
The present disclosure relates to the field of automatic detection technology, and proposes a photoelectric detection device and a photoelectric detection method. The photoelectric detection device includes a feeding part, a transmission component and a detection component. The feeding part is used to carry the film material to be detected; the transmission component is used to drive the feeding part to move; the detection component is arranged on the moving path of the feeding part, and the detection component includes a transmittance detection part and a surface resistance detection part, which are used to measure the optical transmittance and surface resistance of the film material to be detected. The photoelectric detection device disclosed in the present disclosure can realize automatic measurement of the optical transmittance and surface resistance of the film material to be detected through the feeding part, the transmission component and the transmittance detection part and the surface resistance detection part of the detection component, so as to judge whether the film material to be detected is qualified. Since the whole process belongs to automatic measurement, the detection efficiency is improved, and it is suitable for batch rapid detection of production lines.
Description
Technical Field
The disclosure relates to the technical field of automatic detection, and in particular relates to photoelectric detection equipment and a photoelectric detection method.
Background
The graphene material has excellent electrical, mechanical, optical, thermodynamic and other properties, and is a novel material with excellent comprehensive performance and great application prospect. At present, pilot scale large-scale production of graphene film materials has been realized by a plurality of scientific research institutions and enterprises at home and abroad, but the uniformity of the properties of the obtained materials is poor due to unstable equipment or immature process. The batch stable preparation of the high-quality graphene materials is beneficial to downstream large-scale application, so that the process detection of a batch preparation production line of the graphene film materials is particularly important.
The detection of the graphene film material in the current industry mainly adopts a manual single-point detection mode, usually requires special sample preparation, belongs to an off-line detection means, has low efficiency, and is not suitable for batch rapid detection of a production line.
Disclosure of Invention
It is a primary object of the present disclosure to overcome at least one of the above-mentioned drawbacks of the prior art, and to provide a photodetection device and a photodetection method.
According to a first aspect of the present invention, there is provided a photodetection device comprising:
the feeding part is used for bearing the film material to be detected;
The transmission assembly is used for driving the feeding part to move;
The detection assembly is arranged on the moving path of the feeding portion and comprises a light transmittance detection portion and a surface resistance detection portion, and is used for measuring the optical light transmittance and the surface resistance of the film material to be detected.
In one embodiment of the invention, a transmission assembly comprises:
A first transmission section;
The first transmission part and the second transmission part are arranged at intervals and have the same extending direction, and a detection gap is formed between the first transmission part and the second transmission part;
At least part of the light transmittance detection part and at least part of the surface resistance detection part are arranged opposite to the detection gap so as to be used for measuring the optical light transmittance and the surface resistance of the film material to be detected after the feeding part drives the film material to be detected to move to a position opposite to the detection gap.
In one embodiment of the present invention, the light transmittance detecting section includes a first probe and a second probe, both the first probe and the area resistance detecting section are located above the detection gap, and at least part of the second probe is located within or below the detection gap;
wherein the first probe and the second probe are arranged oppositely.
In one embodiment of the invention, the feeding part is in a hollow structure so as to avoid shielding the first probe and the second probe from measuring the optical transmittance of the film material to be detected.
In one embodiment of the invention, the light transmittance detecting part and the surface resistance detecting part are both movably arranged to adjust the relative positions between the light transmittance detecting part and the surface resistance detecting part and the film material to be detected on the feeding part.
In one embodiment of the present invention, the photodetection device further comprises:
And the transverse moving mechanism is arranged on the moving path of the feeding part, the detection assembly is arranged on the transverse moving mechanism, and the transverse moving mechanism drives the detection assembly to move along the direction perpendicular to the moving direction of the feeding part.
In one embodiment of the present invention, the light transmittance detecting section includes a first probe and a second probe disposed opposite to each other, and the traversing mechanism includes:
The first transverse moving part is positioned above the transmission assembly, and the first probe and the surface resistance detection part are arranged on the first transverse moving part;
the first transverse moving part and the second transverse moving part are arranged oppositely, the second transverse moving part is positioned below the transmission assembly, and the second probe is arranged on the second transverse moving part;
and the driving part is in driving connection with the first traversing part and the second traversing part so as to drive the first probe, the surface resistance detection part and the second probe to synchronously move through the first traversing part and the second traversing part.
In one embodiment of the present invention, the photodetection device further comprises:
the lifting mechanism is movably arranged on the transverse moving mechanism, and the detection assembly is arranged on the lifting mechanism, so that the detection assembly is arranged on the transverse moving mechanism through the lifting mechanism;
wherein, elevating system is located transmission assembly's top, and elevating system drive detection assembly's part is along being close to or keep away from the movable setting of direction of material loading portion.
In one embodiment of the present invention, the photodetection device further comprises:
The rotary driving mechanism is arranged on the lifting mechanism and comprises a first mounting end and a second mounting end, the first mounting end and the second mounting end face towards two directions respectively, and the light transmittance detection part and the surface resistance detection part are arranged on the first mounting end and the second mounting end respectively, so that the rotary driving mechanism drives the light transmittance detection part or the surface resistance detection part to face towards the film material to be detected.
In one embodiment of the invention, the part of the light transmittance detection part and the surface resistance detection part are directly arranged on the lifting mechanism and are both arranged towards the extending direction of the transmission assembly, so as to simultaneously obtain the optical light transmittance and the surface resistance of the film material to be detected.
According to a second aspect of the present invention, there is provided a photodetection method comprising:
Placing a feeding part carrying a film material to be detected on a transmission assembly;
The control transmission assembly drives the feeding part to move;
and acquiring at least one of optical light transmittance and surface resistance of the film material to be detected, and judging whether the film material to be detected is qualified or not according to the optical light transmittance and/or the surface resistance.
In one embodiment of the present invention, obtaining at least one of optical transmittance and surface resistance of a film material to be detected, and judging whether the film material to be detected is qualified according to the optical transmittance and/or the surface resistance, includes:
Acquiring optical transmittance values of a plurality of positions of the film material to be detected, calculating an average value to obtain an average optical transmittance value, judging whether the average optical transmittance value is within a preset light transmittance range value, and judging that the film material to be detected is unqualified when the average optical transmittance value is not within the preset light transmittance range value;
When the average optical transmittance value is within a preset light transmittance range value, carrying out surface scanning measurement on the film material to be detected to obtain an optical light transmittance data set, and carrying out uniformity judgment on the optical light transmittance data set to obtain a light transmittance uniformity value, and when the light transmittance uniformity value is smaller than a first preset value, judging that the film material to be detected is unqualified;
When the light transmittance uniformity value is not smaller than a first preset value, obtaining surface resistance values of a plurality of positions of the film material to be detected, calculating an average value to obtain an average surface resistance value, judging whether the average surface resistance value is within a preset surface resistance range value, and when the average surface resistance value is not within the preset surface resistance range value, judging that the film material to be detected is unqualified;
When the average surface resistance value is within the preset surface resistance range value, surface scanning measurement is carried out on the film material to be detected to obtain a surface resistance data set, and uniformity judgment is carried out on the surface resistance data set to obtain a surface resistance uniformity value, when the surface resistance uniformity value is smaller than a second preset value, the film material to be detected is judged to be unqualified, and when the surface resistance uniformity value is not smaller than the second preset value, the film material to be detected is judged to be qualified, or,
Acquiring surface resistance values of the film material to be detected at a plurality of positions, calculating an average value to obtain an average surface resistance value, judging whether the average surface resistance value is within a preset surface resistance range value, and judging that the film material to be detected is unqualified when the average surface resistance value is not within the preset surface resistance range value;
When the average surface resistance value is within a preset surface resistance range value, performing surface scanning measurement on the film material to be detected to obtain a surface resistance data set, and performing uniformity judgment on the surface resistance data set to obtain a surface resistance uniformity value, and when the surface resistance uniformity value is smaller than a second preset value, judging that the film material to be detected is unqualified;
When the surface resistance uniformity value is not smaller than a second preset value, optical transmittance values of a plurality of positions of the film material to be detected are obtained, an average value is calculated to obtain an average optical transmittance value, whether the average optical transmittance value is within a preset transmittance range value is judged, and when the average optical transmittance value is not within the preset transmittance range value, the film material to be detected is judged to be unqualified;
When the average optical transmittance value is within the preset light transmittance range value, carrying out surface scanning measurement on the film material to be detected to obtain an optical light transmittance data set, and carrying out uniformity judgment on the optical light transmittance data set to obtain a light transmittance uniformity value, when the light transmittance uniformity value is smaller than a first preset value, judging that the film material to be detected is unqualified, and when the light transmittance uniformity value is not smaller than the first preset value, judging that the film material to be detected is qualified, or,
Meanwhile, obtaining surface resistance values and optical transmittance values of the film material to be detected at a plurality of positions, calculating an average value to obtain an average surface resistance value and an average optical transmittance value, judging whether the average surface resistance value is within a preset surface resistance range value or not, judging whether the average optical transmittance value is within a preset transmittance range value or not, and judging that the film material to be detected is unqualified when the average surface resistance value is not within the preset surface resistance range value or the average optical transmittance value is not within the preset transmittance range value;
When the average surface resistance value is within a preset surface resistance range value and the average optical transmittance value is within a preset light transmittance range value, performing surface scanning measurement on the film material to be detected, obtaining a surface resistance data set and an optical transmittance data set, and performing uniformity judgment on the surface resistance data set and the optical transmittance data set to obtain a surface resistance uniformity value and a light transmittance uniformity value, judging that the film material to be detected is unqualified when the surface resistance uniformity value is smaller than a second preset value or the light transmittance uniformity value is smaller than a first preset value, and judging that the film material to be detected is qualified when the surface resistance uniformity value is not smaller than the second preset value and the light transmittance uniformity value is not smaller than the first preset value.
The photoelectric detection equipment can realize automatic measurement of optical transmittance and surface resistance of the film material to be detected through the feeding part, the transmission assembly, the transmittance detection part and the surface resistance detection part of the detection assembly, so as to judge whether the film material to be detected is qualified. Because the whole process belongs to automatic measurement, the detection efficiency is improved, and the method is suitable for batch rapid detection of a production line.
Drawings
Various objects, features and advantages of the present disclosure will become more apparent from the following detailed description of the preferred embodiments of the disclosure, when taken in conjunction with the accompanying drawings. The drawings are merely exemplary illustrations of the present disclosure and are not necessarily drawn to scale. In the drawings, like reference numerals refer to the same or similar parts throughout. Wherein:
FIG. 1 is a schematic diagram of a photodetection device according to an exemplary embodiment;
FIG. 2 is a schematic view of a portion of a photodetection device according to an exemplary embodiment;
Fig. 3 is a schematic structural view of a photodetection device according to another exemplary embodiment;
fig. 4 is a partial schematic structure diagram of a photodetection device according to another exemplary embodiment;
FIG. 5 is a flow chart of a method of photodetection according to an exemplary embodiment;
Fig. 6 is a flow chart illustrating a photodetection method according to another exemplary embodiment.
The reference numerals are explained as follows:
10. the device comprises a feeding part, 20, a transmission assembly, 21, a first transmission part, 22, a second transmission part, 23, a detection gap, 30, a detection assembly, 40, a light transmittance detection part, 41, a first probe, 42, a second probe, 50, a surface resistance detection part, 60, a traversing mechanism, 61, a first traversing part, 62, a second traversing part, 63, a driving part, 70, a lifting mechanism, 80, a rotary driving mechanism, 81, a first mounting end, 82 and a second mounting end.
Detailed Description
Exemplary embodiments that embody features and advantages of the present disclosure are described in detail in the following description. It will be understood that the present disclosure is capable of various modifications in the various embodiments, all without departing from the scope of the present disclosure, and that the description and drawings are intended to be illustrative in nature and not to be limiting of the present disclosure.
In the following description of various exemplary embodiments of the present disclosure, reference is made to the accompanying drawings, which form a part hereof, and in which are shown by way of illustration various exemplary structures, systems, and steps in which aspects of the disclosure may be practiced. It is to be understood that other specific arrangements of parts, structures, example devices, systems, and steps may be used, and structural and functional modifications may be made without departing from the scope of the present disclosure. Moreover, although the terms "over," "between," "within," and the like may be used in this description to describe various example features and elements of the disclosure, these terms are used herein for convenience only, e.g., in accordance with the directions of examples in the drawings. Nothing in this specification should be construed as requiring a particular three-dimensional orientation of structures to fall within the scope of this disclosure.
An embodiment of the present invention provides a photoelectric detection apparatus, please refer to fig. 1 to 4, wherein the photoelectric detection apparatus includes a feeding portion 10, a transmission assembly 20, a detection assembly 30, the detection assembly 30 is disposed on a moving path of the feeding portion 10, and the detection assembly 30 includes a light transmittance detection portion 40 and a surface resistance detection portion 50 for measuring optical light transmittance and surface resistance of a film material to be detected.
The photoelectric detection device of an embodiment of the invention can realize automatic measurement of optical transmittance and area resistance of the film material to be detected through the light transmittance detection part 40 and the area resistance detection part 50 of the feeding part 10, the transmission assembly 20 and the detection assembly 30, so as to judge whether the film material to be detected is qualified. Because the whole process belongs to automatic measurement, the detection efficiency is improved, and the method is suitable for batch rapid detection of a production line.
In one embodiment, the photoelectric detection device may be used to detect the graphene film material, i.e. the film material to be detected is a graphene film material. The two indexes of optical light transmittance and surface resistance are macroscopic manifestations of the performance of the graphene film material, the number of layers of the graphene film material can be calculated according to the light transmittance, and the surface resistance directly reflects the defect density, crystallization quality and other performances of the graphene film material. According to the embodiment, the measurement of the optical light transmittance and the surface resistance is obtained through one device, so that efficient online detection is realized, and the rapid evaluation of the overall performance of the graphene film material is realized. The photoelectric detection device is also suitable for batch rapid detection of other transparent conductive films.
In one embodiment, the photodetection device further includes a control section connected to both the light transmittance detection section 40 and the surface resistance detection section 50 to acquire data measured by the light transmittance detection section 40 and the surface resistance detection section 50. The control part can be used for processing and judging the measured data to determine whether the film material to be detected is qualified or not.
In one embodiment, the detection assembly 30 further includes a film thickness measurement probe.
In one embodiment, light transmittance detection section 40 is a four-probe and sheet resistance detection section 50 is a sheet resistance probe.
In one embodiment, the photoelectric detection apparatus further includes a cleaning portion disposed above the conveying assembly 20 for cleaning the film material to be detected on the feeding portion 10, where the cleaning portion may be a blowing mechanism or a suction mechanism, so as to reduce the influence of particle contamination on the detection result.
As shown in fig. 1 and 3, the transmission assembly 20 comprises a first transmission part 21 and a second transmission part 22, wherein the first transmission part 21 and the second transmission part 22 are arranged at intervals and are consistent in extending direction, a detection gap 23 is formed between the first transmission part 21 and the second transmission part 22, at least part of a light transmittance detection part 40 and at least part of a surface resistance detection part 50 are arranged opposite to the detection gap 23, and after the feeding part 10 drives the film material to be detected to move to a position opposite to the detection gap 23, the light transmittance detection part 40 and the surface resistance detection part 50 are used for measuring the optical light transmittance and the surface resistance of the film material to be detected.
In one embodiment, the first conveying portion 21 may be provided with a feeding port, that is, the feeding portion 10 carrying the film material to be detected is conveyed from the first conveying portion 21 to the second conveying portion 22, and when a portion of the feeding portion 10 reaches the detecting gap 23, that is, a portion of the film material to be detected is located in the detecting gap 23, the light transmittance detecting portion 40 and the surface resistance detecting portion 50 are used for measuring the optical light transmittance and the surface resistance of the film material to be detected. The detection gap 23 belongs to the measurement positions of the light transmittance detection section 40 and the surface resistance detection section 50. Of course, the second conveying portion 22 may also be provided with a feeding port, that is, the feeding portion 10 is first placed on the second conveying portion 22, and the arrangement manner is not limited as long as the normal conveying function is ensured.
In one embodiment, the width of the detecting gap 23 is smaller than half the width of the feeding portion 10, wherein the width of the detecting gap 23 is the distance between the first conveying portion 21 and the second conveying portion 22, and the width of the feeding portion 10 is the dimension in the moving direction thereof, that is, the feeding portion 10 is ensured not to fall from the detecting gap 23.
In one embodiment, considering that the measurement process of the film material to be detected may be a multi-point measurement, the first conveying portion 21 and the second conveying portion 22 are required to cooperate with each other during the measurement process, so as to ensure the moving direction of the feeding portion 10. The first transmission portion 21 and the second transmission portion 22 can realize transmission in two directions when specifically used.
In one embodiment, the first and second transfer portions 21 and 22 may be belt-driven, chain-driven, roller-driven, floating, or the like, as long as the transfer to the feeding portion 10 can be ensured.
As shown in fig. 2 and 4, the light transmittance detecting section 40 includes a first probe 41 and a second probe 42, each of the first probe 41 and the sheet resistance detecting section 50 being located above the detection gap 23, and at least part of the second probe 42 being located within the detection gap 23 or below the detection gap 23, wherein the first probe 41 and the second probe 42 are disposed opposite to each other. The first probe 41 and the second probe 42 are used for obtaining the optical transmittance of the film material to be detected, namely, the optical transmittance of the film material to be detected is obtained by emitting and receiving the film material one by one.
In one embodiment, the feeding portion 10 is in a hollow structure, so as to avoid shielding the first probe 41 and the second probe 42 from measuring the optical transmittance of the film material to be detected. In a specific measurement process, the feeding portion 10 cannot affect measurement of optical transmittance, so that it is required to ensure that the feeding portion 10 is in a hollow structure, but effective fixation of the film material to be detected is required to be ensured.
In one embodiment, the light transmittance detecting portion 40 and the surface resistance detecting portion 50 are both movably provided to adjust the relative positions between the light transmittance detecting portion 40 and the surface resistance detecting portion 50 and the film material to be detected on the feeding portion 10. Considering that in the specific measurement process, measured values at different positions of the film material to be detected need to be obtained, the movement of the light transmittance detection part 40 and the surface resistance detection part 50 is combined on the basis that the first transmission part 21 and the second transmission part 22 drive the feeding part 10 to move, so that the measurement efficiency can be effectively improved, and the reliable acquisition of measurement electricity can be ensured.
As shown in fig. 1 and 3, the photoelectric detection apparatus further includes a traversing mechanism 60, the traversing mechanism 60 being disposed on a moving path of the feeding portion 10, the detection assembly 30 being disposed on the traversing mechanism 60, the traversing mechanism 60 driving the detection assembly 30 to move in a direction perpendicular to the moving direction of the feeding portion 10. The transverse moving mechanism 60 is mainly configured to ensure that the detecting assembly 30 can move in a direction parallel to the feeding portion 10, that is, the detecting assembly 30 can move relatively to the feeding portion 10 in the whole horizontal plane in combination with the conveying direction of the first conveying portion 21 and the second conveying portion 22 relative to the feeding portion 10, so that the detecting assembly 30 can measure the whole surface of the film material to be detected.
As shown in fig. 2 and 4, the light transmittance detecting section 40 includes a first probe 41 and a second probe 42 which are disposed opposite to each other, the traversing mechanism 60 includes a first traversing section 61, the first traversing section 61 being located above the transmission unit 20, the first probe 41 and the surface resistance detecting section 50 being disposed on the first traversing section 61, a second traversing section 62, the first traversing section 61 being disposed opposite to the second traversing section 62, and the second traversing section 62 being located below the transmission unit 20, the second probe 42 being disposed on the second traversing section 62, a driving section 63, the driving section 63 being in driving connection with each of the first traversing section 61 and the second traversing section 62 so as to drive the first probe 41, the surface resistance detecting section 50, and the second probe 42 to move synchronously by the first traversing section 61 and the second traversing section 62.
In one embodiment, the first probe 41 and the second probe 42 are used to obtain the optical transmittance of the film material to be detected, i.e. to transmit and receive one another, so as to obtain the optical transmittance of the film material to be detected. Therefore, it is necessary to ensure synchronous movement of both probes during use, and the first probe 41 and the second probe 42 are driven to move simultaneously by one driving section 63.
In one embodiment, the traversing mechanism 60 may be a linear module (may be a synchronous belt type or a ball screw type), or may be a motor driving two pulley assemblies simultaneously, which is mainly aimed at achieving synchronous movement of the first probe 41, the surface resistance detecting portion 50, and the second probe 42, and the specific arrangement herein is not limited.
As shown in fig. 2 and 4, the photoelectric detection apparatus further includes a lifting mechanism 70, the lifting mechanism 70 being movably disposed on the traversing mechanism 60, the detection assembly 30 being disposed on the lifting mechanism 70 such that the detection assembly 30 is disposed on the traversing mechanism 60 by the lifting mechanism 70, wherein the lifting mechanism 70 is located above the transmission assembly 20, and the lifting mechanism 70 drives a portion of the detection assembly 30 to be movably disposed in a direction approaching or separating from the feeding portion 10. The lifting mechanism 70 is provided to adjust the distance between the detecting component 30 and the film material to be detected, for example, when the surface resistance detecting portion 50 is a contact probe, the surface resistance detecting portion needs to contact with the film material to be detected during measurement, and at this time, the lifting mechanism 70 can complete adjustment. The lifting mechanism 70 may be a linear module, a cylinder, an oil cylinder, etc., so long as the up-and-down movement of the detecting assembly 30 can be ensured.
As shown in fig. 1 and2, the photo-detection apparatus further includes a rotation driving mechanism 80, the rotation driving mechanism 80 being disposed on the lifting mechanism 70, the rotation driving mechanism 80 including a first mounting end 81 and a second mounting end 82, the first mounting end 81 and the second mounting end 82 being oriented in two directions, respectively, and a portion of the light transmittance detecting section 40 and the surface resistance detecting section 50 being disposed on the first mounting end 81 and the second mounting end 82, respectively, such that the rotation driving mechanism 80 drives the light transmittance detecting section 40 or the surface resistance detecting section 50 toward the film material to be detected. The rotation driving mechanism 80 may be provided to switch the light transmittance detecting section 40 and the surface resistance detecting section 50 at the time of specific measurement, that is, to complete sequential measurement of the optical light transmittance and the surface resistance. The light transmittance detecting portion 40 and the surface resistance detecting portion 50 may detect the film material to be detected at the same position, and the accuracy of the evaluation is high.
In one embodiment, the first probe 41 and the surface resistance detecting portion 50 are respectively disposed on the first mounting end 81 and the second mounting end 82, and when the measurement is performed, the first probe 41 or the surface resistance detecting portion 50 faces the film material to be detected, and after the measurement of the optical transmittance or the surface resistance is first completed, the rotation driving mechanism 80 drives the first probe 41 and the surface resistance detecting portion 50 to rotate, at this time, the positions of the first probe 41 and the surface resistance detecting portion 50 are changed, and then the measurement of the surface resistance or the optical transmittance is completed.
In one embodiment, the rotary driving mechanism 80 may be a rotary cylinder, or a motor, which drives the first probe 41 and the surface resistance detecting portion 50 to rotate by rotating some mechanisms.
As shown in fig. 3 and 4, the portion of the light transmittance detecting section 40 and the surface resistance detecting section 50 are directly provided on the elevating mechanism 70, and are both provided toward the extending direction of the transport assembly 20 for simultaneously acquiring the optical light transmittance and the surface resistance of the film material to be detected. The light transmittance detecting portion 40 and the surface resistance detecting portion 50 do not undergo position conversion, that is, the optical light transmittance and the surface resistance of the film material to be detected are measured at the same time, and the detection points obtained by the light transmittance detecting portion 40 and the surface resistance detecting portion are not identical, but have relatively high efficiency.
An embodiment of the photoelectric detection device according to the present invention is an automatic detection device for photoelectric characteristics of a graphene film material, which includes a feeding unit (a feeding portion 10), a detection unit (a detection assembly 30), a substrate transmission unit (a transmission assembly 20), a data processing unit, and the like. The detection unit has two measurement functions of optical transmittance and surface resistance. The substrate transmission unit can ensure accurate transmission through a special transmission mode and combination, and the transmission and detection speed is improved. The detection unit comprises a light transmittance detection part 40 and a surface resistance detection part 50, the substrate transmission unit realizes the back-and-forth movement of the substrate through a conveyor belt or an air bearing table, and cooperates with the left-and-right movement of a measurement probe (the light transmittance detection part 40 or the surface resistance detection part 50) to realize the surface scanning function of measurement, and the upper probe and the lower probe (the first probe 41 and the second probe 42) move in a mode of adopting a two-axis synchronous linear module (a transverse moving mechanism 60) because the light transmittance measurement needs to be directly opposite to the transmitting and receiving probes. The integration of the measuring probe is not limited to two probes of optical transmittance and area resistance, and can be expanded according to the needs, such as adding a film thickness measuring probe. The movement of the measuring probe drives the two probes to move up and down simultaneously by combining a motor and a synchronous belt. The detected graphene film material comprises graphene glass directly grown by a chemical vapor deposition method, a graphene wafer or a graphene film material transferred to a substrate.
The substrate transfer unit is divided into two parts (a first transfer part 21 and a second transfer part 22), and the transfer of the substrate in the horizontal direction is mainly completed, and the two parts of the transfer unit are designed with a horizontal distance in advance, and the distance mainly reserves a space (a detection gap 23) for the vertical movement of the detection unit. The whole surface measurement function of the substrate is completed through the cooperation of the transmission unit and the detection unit. Wherein, the detecting unit and the transmission unit are added with an upper cover to form a closed space, and a side air extraction functional component is added in the vertical direction of substrate transmission, so as to reduce the influence of particles on the surface of the substrate on the detection result. The data processing unit can sort the data collected by the probe, output and display the data, and judge whether the detection object (film material to be detected) is qualified or unqualified according to the set detection result judging condition.
The photoelectric detection equipment can realize the rapid and automatic acquisition of two indexes, namely optical transmittance and surface resistance. And based on the corresponding relation between the two indexes of optical transmittance and surface resistance and the performance of the graphene film material, the performance and quality of the graphene film material can be rapidly judged. The photoelectric detection equipment is a large-scale preparation production line for the graphene film material, can macroscopically and rapidly evaluate the graphene film material through the surface resistance and the optical light transmittance, can improve the detection efficiency on the production line, laterally improves the quality of the graphene film material, and ensures the large-scale application of the high-quality graphene film material.
An embodiment of the present invention further provides a photoelectric detection method, please refer to fig. 5, which includes placing a feeding portion 10 carrying a film material to be detected on a transmission assembly 20, controlling the transmission assembly 20 to drive the feeding portion 10 to move, obtaining at least one of optical transmittance and surface resistance of the film material to be detected, and judging whether the film material to be detected is qualified according to the optical transmittance and/or the surface resistance.
In one embodiment, the photodetection method is applied to a photodetection device.
In one embodiment, obtaining at least one of optical transmittance and surface resistance of the film material to be detected, and judging whether the film material to be detected is qualified according to the optical transmittance and/or the surface resistance, including:
Acquiring optical transmittance values of a plurality of positions of the film material to be detected, calculating an average value to obtain an average optical transmittance value, judging whether the average optical transmittance value is within a preset light transmittance range value, and judging that the film material to be detected is unqualified when the average optical transmittance value is not within the preset light transmittance range value;
When the average optical transmittance value is within a preset light transmittance range value, carrying out surface scanning measurement on the film material to be detected to obtain an optical light transmittance data set, and carrying out uniformity judgment on the optical light transmittance data set to obtain a light transmittance uniformity value, and when the light transmittance uniformity value is smaller than a first preset value, judging that the film material to be detected is unqualified;
When the light transmittance uniformity value is not smaller than a first preset value, obtaining surface resistance values of a plurality of positions of the film material to be detected, calculating an average value to obtain an average surface resistance value, judging whether the average surface resistance value is within a preset surface resistance range value, and when the average surface resistance value is not within the preset surface resistance range value, judging that the film material to be detected is unqualified;
When the average surface resistance value is within the preset surface resistance range value, surface scanning measurement is carried out on the film material to be detected to obtain a surface resistance data set, and uniformity judgment is carried out on the surface resistance data set to obtain a surface resistance uniformity value, when the surface resistance uniformity value is smaller than a second preset value, the film material to be detected is judged to be unqualified, and when the surface resistance uniformity value is not smaller than the second preset value, the film material to be detected is judged to be qualified, or,
Acquiring surface resistance values of the film material to be detected at a plurality of positions, calculating an average value to obtain an average surface resistance value, judging whether the average surface resistance value is within a preset surface resistance range value, and judging that the film material to be detected is unqualified when the average surface resistance value is not within the preset surface resistance range value;
When the average surface resistance value is within a preset surface resistance range value, performing surface scanning measurement on the film material to be detected to obtain a surface resistance data set, and performing uniformity judgment on the surface resistance data set to obtain a surface resistance uniformity value, and when the surface resistance uniformity value is smaller than a second preset value, judging that the film material to be detected is unqualified;
When the surface resistance uniformity value is not smaller than a second preset value, optical transmittance values of a plurality of positions of the film material to be detected are obtained, an average value is calculated to obtain an average optical transmittance value, whether the average optical transmittance value is within a preset transmittance range value is judged, and when the average optical transmittance value is not within the preset transmittance range value, the film material to be detected is judged to be unqualified;
When the average optical transmittance value is within the preset light transmittance range value, carrying out surface scanning measurement on the film material to be detected to obtain an optical light transmittance data set, and carrying out uniformity judgment on the optical light transmittance data set to obtain a light transmittance uniformity value, when the light transmittance uniformity value is smaller than a first preset value, judging that the film material to be detected is unqualified, and when the light transmittance uniformity value is not smaller than the first preset value, judging that the film material to be detected is qualified, or,
Meanwhile, obtaining surface resistance values and optical transmittance values of the film material to be detected at a plurality of positions, calculating an average value to obtain an average surface resistance value and an average optical transmittance value, judging whether the average surface resistance value is within a preset surface resistance range value or not, judging whether the average optical transmittance value is within a preset transmittance range value or not, and judging that the film material to be detected is unqualified when the average surface resistance value is not within the preset surface resistance range value or the average optical transmittance value is not within the preset transmittance range value;
When the average surface resistance value is within a preset surface resistance range value and the average optical transmittance value is within a preset light transmittance range value, performing surface scanning measurement on the film material to be detected, obtaining a surface resistance data set and an optical transmittance data set, and performing uniformity judgment on the surface resistance data set and the optical transmittance data set to obtain a surface resistance uniformity value and a light transmittance uniformity value, judging that the film material to be detected is unqualified when the surface resistance uniformity value is smaller than a second preset value or the light transmittance uniformity value is smaller than a first preset value, and judging that the film material to be detected is qualified when the surface resistance uniformity value is not smaller than the second preset value and the light transmittance uniformity value is not smaller than the first preset value.
In one embodiment, the process of judging whether the film material to be detected is qualified is to first select multi-point measurement (multiple points in a straight line are not excluded, of course, multiple points are not excluded), compare the obtained structure with a preset qualified range, directly judge whether the film material is qualified if the film material is not in the qualified range, and then perform surface scanning measurement if the film material is qualified, namely obtain multiple measurement points in the whole surface, and then perform judgment on whether the film material is qualified according to uniformity. For the process of sequentially measuring the optical transmittance or the surface resistance, the two can be exchanged, and finally, two indexes are required to be simultaneously satisfied for adjustment, so that the optical transmittance or the surface resistance is qualified. And for simultaneously measuring the optical transmittance and the surface resistance, two indexes finally meet the regulation simultaneously, namely the qualification is achieved.
In one embodiment, for the obtaining of the sheet resistance uniformity value and the light transmittance uniformity value, the uniformity value= (maximum-minimum)/(maximum+minimum), the uniformity value= (maximum-minimum)/average, or the uniformity value= (maximum-minimum)/2 average may be based on the sheet resistance data set and the optical light transmittance data set. The above are all determination formulas of the uniformity values in uniformity judgment, and the values of the first preset value and the second preset value can be determined according to the evaluation index of the film material to be detected.
For a specific process of the photodetection method, the photodetection device starts to operate, i.e. the detection starts. Firstly, the film material to be detected is placed on the feeding part 10, and the process can be mechanical arm automation operation. The feeding part 10 is conveyed in parallel by the first conveying part 21, when the film material to be detected enters the detection area, the rotary driving mechanism 80 switches the detection probe to the surface resistance probe (the surface resistance detection part 50), the traversing mechanism 60 drives the probe to move at set intervals in the vertical substrate conveying direction, and the lifting mechanism 70 drives the probe to press down to obtain required data when reaching a specified point. Judging whether the surface resistance data is in a set value range or not, and if so, finishing surface scanning of the surface resistance value of the film material to be detected by combining the horizontal transmission and the vertical movement. At this time, the data processing unit determines the uniformity of the area resistance value, and determines that the uniformity is acceptable within a set range. When the result of the above detection step is qualified, the film material to be detected is driven by the second transmission portion 22 to be transmitted along the opposite direction of the horizontal direction, and meanwhile, the rotation driving mechanism 80 is switched to the light transmittance test probe (light transmittance detection portion 40), whether the light transmittance data is within the set value range is judged, if yes, the surface scanning measurement of the light transmittance is completed, the data processing unit judges the uniformity of the light transmittance, and if the uniformity is within the set range, the sample is judged to be qualified, so that all detection of the film material to be detected is completed. If it is determined that a certain data does not meet the set value range in the whole process, the sample failure detection is finished, and the specific flow is shown in fig. 6.
For another specific process of the photodetection method, the photodetection device starts to operate, i.e. the detection starts. Firstly, the film material to be detected is placed on the feeding part 10, and the process can be mechanical arm automation operation. The feeding part 10 is conveyed in parallel by the first conveying part 21, and when the film material to be detected enters the detection area, the surface resistance probe and the light transmittance probe are simultaneously driven to be pressed down by the lifting mechanism 70, and optical light transmittance and surface resistance data are simultaneously acquired. The light transmittance probe and the surface resistance probe are not switched, so that the detection efficiency is further improved.
Other embodiments of the invention will be apparent to those skilled in the art from consideration of the specification and practice of the invention disclosed herein. This invention is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the invention and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains. It is intended that the specification and example embodiments be considered as exemplary only, with a true scope and spirit of the invention being indicated by the following claims.
It is to be understood that the invention is not limited to the precise arrangements and instrumentalities shown in the drawings, which have been described above, and that various modifications and changes may be effected without departing from the scope thereof. The scope of the invention is limited only by the appended claims.
Claims (9)
1. A photodetection device characterized by comprising:
The device comprises a feeding part (10), wherein the feeding part (10) is used for bearing a film material to be detected, and the film material to be detected is a graphene film material;
The conveying assembly (20) is used for driving the feeding part (10) to move;
The detection assembly (30) is arranged on the moving path of the feeding part (10), and the detection assembly (30) comprises a light transmittance detection part (40) and a surface resistance detection part (50) for measuring the optical light transmittance and the surface resistance of the film material to be detected;
The transmission assembly (20) comprises:
A first transmission unit (21);
a second transmission part (22), wherein the first transmission part (21) and the second transmission part (22) are arranged at intervals and the extending directions are consistent, and a detection gap (23) is formed between the first transmission part (21) and the second transmission part (22);
At least part of the light transmittance detection part (40) and at least part of the surface resistance detection part (50) are arranged opposite to the detection gap (23) so that after the feeding part (10) drives the film material to be detected to move to a position opposite to the detection gap (23), the light transmittance detection part (40) and the surface resistance detection part (50) are used for simultaneously measuring the optical light transmittance and the surface resistance of the film material to be detected;
The light transmittance detection part (40) and the surface resistance detection part (50) are movably arranged to adjust the relative positions between the light transmittance detection part (40) and the surface resistance detection part (50) and the film material to be detected on the feeding part (10);
The transverse moving mechanism (60), the transverse moving mechanism (60) is arranged on the moving path of the feeding part (10), the detection assembly (30) is arranged on the transverse moving mechanism (60), and the transverse moving mechanism (60) drives the detection assembly (30) to move along the direction perpendicular to the moving direction of the feeding part (10).
2. The photodetection device according to claim 1, characterized in that the light transmittance detection section (40) includes a first probe (41) and a second probe (42), the first probe (41) and the sheet resistance detection section (50) are both located above the detection gap (23), and at least part of the second probe (42) is located within the detection gap (23) or below the detection gap (23);
Wherein the first probe (41) and the second probe (42) are disposed opposite to each other.
3. The photoelectric detection apparatus according to claim 2, wherein the feeding portion (10) is of a hollowed-out structure so as to avoid shielding the first probe (41) and the second probe (42) from measuring optical light transmittance of the film material to be detected.
4. The photodetection device according to claim 1, wherein the light transmittance detecting section (40) includes a first probe (41) and a second probe (42) that are disposed opposite to each other, and the traversing mechanism (60) includes:
A first traverse section (61), the first traverse section (61) being located above the transport assembly (20), the first probe (41) and the sheet resistance detection section (50) being provided on the first traverse section (61);
A second traverse section (62), wherein the first traverse section (61) is disposed opposite to the second traverse section (62), the second traverse section (62) is located below the transmission assembly (20), and the second probe (42) is disposed on the second traverse section (62);
And a driving unit (63), wherein the driving unit (63) is in driving connection with the first traversing unit (61) and the second traversing unit (62), so as to drive the first probe (41), the surface resistance detecting unit (50) and the second probe (42) to move synchronously through the first traversing unit (61) and the second traversing unit (62).
5. The photodetection device according to claim 1, wherein the photodetection device further comprises:
a lifting mechanism (70), wherein the lifting mechanism (70) is movably arranged on the traversing mechanism (60), and the detection assembly (30) is arranged on the lifting mechanism (70) so that the detection assembly (30) is arranged on the traversing mechanism (60) through the lifting mechanism (70);
The lifting mechanism (70) is located above the transmission assembly (20), and the lifting mechanism (70) drives the detection assembly (30) to be movably arranged along the direction approaching to or separating from the feeding portion (10).
6. The photodetection device according to claim 5, characterized in that the photodetection device further comprises:
The rotary driving mechanism (80), the rotary driving mechanism (80) is arranged on the lifting mechanism (70), the rotary driving mechanism (80) comprises a first mounting end (81) and a second mounting end (82), the first mounting end (81) and the second mounting end (82) are respectively oriented in two directions, and the light transmittance detection part (40) and the surface resistance detection part (50) are respectively arranged on the first mounting end (81) and the second mounting end (82), so that the rotary driving mechanism (80) drives the light transmittance detection part (40) or the surface resistance detection part (50) to be oriented to the film material to be detected.
7. The photodetection device according to claim 5, wherein a portion of the light transmittance detecting section (40) and the sheet resistance detecting section (50) are directly provided on the elevating mechanism (70), and are both provided toward an extending direction of the transmission assembly (20).
8. A photodetection method using the photodetection device according to any one of claims 1 to 7, comprising:
Placing a feeding part (10) carrying a film material to be detected on a transmission assembly (20);
controlling the transmission assembly (20) to drive the feeding part (10) to move;
And acquiring at least one of optical light transmittance and surface resistance of the film material to be detected, and judging whether the film material to be detected is qualified or not according to the optical light transmittance and/or the surface resistance.
9. The photodetection method according to claim 8, wherein obtaining at least one of optical transmittance and surface resistance of the film material to be detected, and judging whether the film material to be detected is qualified according to the optical transmittance and/or the surface resistance, comprises:
Acquiring optical transmittance values of the film material to be detected at a plurality of positions, calculating an average value to obtain an average optical transmittance value, judging whether the average optical transmittance value is within a preset light transmittance range value, and judging that the film material to be detected is unqualified when the average optical transmittance value is not within the preset light transmittance range value;
when the average optical transmittance value is within the preset light transmittance range value, carrying out surface scanning measurement on the film material to be detected to obtain an optical light transmittance data set, and carrying out uniformity judgment on the optical light transmittance data set to obtain a light transmittance uniformity value, and when the light transmittance uniformity value is smaller than a first preset value, judging that the film material to be detected is unqualified;
When the light transmittance uniformity value is not smaller than the first preset value, obtaining surface resistance values of the to-be-detected film material at a plurality of positions, calculating an average value to obtain an average surface resistance value, judging whether the average surface resistance value is within a preset surface resistance range value, and when the average surface resistance value is not within the preset surface resistance range value, judging that the to-be-detected film material is unqualified;
When the average surface resistance value is within the preset surface resistance range value, performing surface scanning measurement on the film material to be detected to obtain a surface resistance data set, and performing uniformity judgment on the surface resistance data set to obtain a surface resistance uniformity value, when the surface resistance uniformity value is smaller than a second preset value, judging that the film material to be detected is unqualified, and when the surface resistance uniformity value is not smaller than the second preset value, judging that the film material to be detected is qualified, or,
Acquiring surface resistance values of the film material to be detected at a plurality of positions, calculating an average value to obtain an average surface resistance value, judging whether the average surface resistance value is within a preset surface resistance range value, and judging that the film material to be detected is unqualified when the average surface resistance value is not within the preset surface resistance range value;
When the average surface resistance value is within the preset surface resistance range value, performing surface scanning measurement on the film material to be detected to obtain a surface resistance data set, and performing uniformity judgment on the surface resistance data set to obtain a surface resistance uniformity value, and when the surface resistance uniformity value is smaller than a second preset value, judging that the film material to be detected is unqualified;
When the surface resistance uniformity value is not smaller than the second preset value, optical transmittance values of a plurality of positions of the film material to be detected are obtained, an average value is calculated to obtain an average optical transmittance value, whether the average optical transmittance value is within a preset light transmittance range value is judged, and when the average optical transmittance value is not within the preset light transmittance range value, the film material to be detected is judged to be unqualified;
when the average optical transmittance value is within the preset light transmittance range value, carrying out surface scanning measurement on the film material to be detected to obtain an optical light transmittance data set, and carrying out uniformity judgment on the optical light transmittance data set to obtain a light transmittance uniformity value, when the light transmittance uniformity value is smaller than a first preset value, judging that the film material to be detected is unqualified, and when the light transmittance uniformity value is not smaller than the first preset value, judging that the film material to be detected is qualified, or,
Acquiring surface resistance values and optical transmittance values of the film material to be detected at a plurality of positions, calculating an average value to obtain an average surface resistance value and an average optical transmittance value, judging whether the average surface resistance value is within a preset surface resistance range value or not and judging whether the average optical transmittance value is within a preset transmittance range value or not, and judging that the film material to be detected is unqualified when the average surface resistance value is not within the preset surface resistance range value or the average optical transmittance value is not within the preset transmittance range value;
when the average surface resistance value is within the preset surface resistance range value and the average optical transmittance value is within the preset light transmittance range value, performing surface scanning measurement on the film material to be detected to obtain a surface resistance data set and an optical light transmittance data set, and performing uniformity judgment on the surface resistance data set and the optical light transmittance data set to obtain a surface resistance uniformity value and a light transmittance uniformity value, when the surface resistance uniformity value is smaller than a second preset value or the light transmittance uniformity value is smaller than a first preset value, judging that the film material to be detected is unqualified, and when the surface resistance uniformity value is not smaller than the second preset value and the light transmittance uniformity value is not smaller than the first preset value, judging that the film material to be detected is qualified.
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