CN112117080A - Permanent magnet device and magnetron sputtering equipment - Google Patents
Permanent magnet device and magnetron sputtering equipment Download PDFInfo
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- CN112117080A CN112117080A CN202011289452.8A CN202011289452A CN112117080A CN 112117080 A CN112117080 A CN 112117080A CN 202011289452 A CN202011289452 A CN 202011289452A CN 112117080 A CN112117080 A CN 112117080A
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- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 28
- 230000007246 mechanism Effects 0.000 claims abstract description 103
- 230000005540 biological transmission Effects 0.000 claims abstract description 41
- 230000000712 assembly Effects 0.000 claims description 36
- 238000000429 assembly Methods 0.000 claims description 36
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 235000012431 wafers Nutrition 0.000 description 13
- 230000008859 change Effects 0.000 description 10
- 230000001105 regulatory effect Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000007888 film coating Substances 0.000 description 4
- 238000009501 film coating Methods 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 3
- 230000001360 synchronised effect Effects 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
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- 238000012986 modification Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
- H01F7/02—Permanent magnets [PM]
- H01F7/0273—Magnetic circuits with PM for magnetic field generation
- H01F7/0278—Magnetic circuits with PM for magnetic field generation for generating uniform fields, focusing, deflecting electrically charged particles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
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Abstract
The invention relates to the field of semiconductor manufacturing equipment, in particular to a permanent magnet device and magnetron sputtering equipment; the permanent magnet device comprises a permanent magnet assembly, a first driving mechanism and a second driving mechanism, wherein the first driving mechanism is in transmission connection with the permanent magnet assembly and is used for driving the permanent magnet assembly to rotate so as to form a rotating magnetic field; the second driving mechanism is in transmission connection with the first driving mechanism and used for driving the first driving mechanism to move so as to adjust the included angle of the permanent magnet assembly relative to the horizontal plane. The permanent magnet device is simple to operate when the angle of the permanent magnet assembly is adjusted, can ensure the accuracy, and can also drive the permanent magnet assembly to stably form a rotating magnetic field by using the first driving mechanism after the angle of the permanent magnet assembly is adjusted. The magnetron sputtering equipment provided with the permanent magnet device can uniformly coat the film on the wafer so as to ensure the quality of the film on the wafer.
Description
Technical Field
The invention relates to the field of semiconductor manufacturing equipment, in particular to a permanent magnet device and magnetron sputtering equipment.
Background
Magnetron sputtering is one type of Physical Vapor Deposition (PVD). The general sputtering method can be used for preparing various materials such as metal, semiconductor, insulator and the like, and has the advantages of simple equipment, easy control, high sputtering rate, large film coating area, strong adhesive force and the like. In the magnetron sputtering, a magnetic field is introduced on the surface of a target cathode, electrons form a spiral motion track around a magnetic line, the ionization rate of gas is increased by utilizing the constraint of the magnetic field on charged particles, and the plasma density is increased to increase the sputtering rate.
The magnetic field introduced by the magnetron sputtering device is realized by a permanent magnet assembly. Most of the permanent magnet assemblies are fixed, the requirements of the wafer coating on the thickness and the uniformity of the coated metal film are very high, and the magnetic field direction generated by the fixed permanent magnet assemblies cannot effectively meet the actual sputtering requirements, so that the thickness of the coated metal film on the surface of the wafer is not uniform, and the coating quality is influenced.
A few of magnetron sputtering devices can rotate in a horizontal plane, but the angle of the permanent magnet assembly is kept unchanged during rotation, and if the angle of the permanent magnet assembly is not changed, the permanent magnet assembly can only be manually adjusted.
Disclosure of Invention
The invention aims to provide a permanent magnet device and a magnetron sputtering device, wherein the permanent magnet device is simple to operate when the angle of a permanent magnet assembly is adjusted, can ensure the accuracy, and can drive the permanent magnet assembly to stably form a rotating magnetic field by using a first driving mechanism after the angle of the permanent magnet assembly is adjusted.
The embodiment of the invention is realized by the following steps:
in a first aspect, an embodiment of the present invention provides a permanent magnet device, which includes a permanent magnet assembly, an adjustment plate, a housing, a first driving mechanism, and a second driving mechanism,
the permanent magnet assembly is arranged in the shell, the first driving mechanism penetrates through the shell to be in transmission connection with the permanent magnet assembly and is used for driving the permanent magnet assembly to rotate so as to form a rotating magnetic field, and the first driving mechanism is arranged on the adjusting plate;
the second driving mechanism comprises at least two groups of second driving assemblies, the at least two groups of second driving assemblies are fixedly arranged outside the shell, and the at least two groups of second driving assemblies are in transmission connection with the first driving mechanism through an adjusting plate and are jointly used for driving the adjusting plate to move so as to adjust the included angle of the adjusting plate relative to the horizontal plane, and the adjusting plate is used for driving the first driving mechanism to move so as to adjust the included angle of the permanent magnet assembly relative to the horizontal plane;
the second driving assembly comprises a motor and a screw, the motor is fixedly arranged in the shell, an output shaft of the motor is in transmission connection with the screw, the adjusting plate is provided with a mounting hole, a bearing is arranged in the mounting hole, an outer ring of the bearing is fixedly connected with the adjusting plate, an inner ring of the bearing can rotate relative to the outer ring, the second driving assembly further comprises a connecting ring with internal threads, the connecting ring is embedded in the inner ring and is coaxially and fixedly connected with the inner ring, and the screw is in threaded connection with the connecting ring; when the output shaft of the motor drives the screw rod to rotate around the axis of the screw rod, the connecting ring and the inner ring can be driven to synchronously rotate around the screw rod and move along the axis direction of the screw rod, so that the adjusting plate is driven to move along the axis direction of the screw rod.
In an alternative embodiment, the second drive mechanism comprises three sets of second drive assemblies, the three sets of second drive assemblies being triangularly distributed.
In an optional embodiment, the second driving assembly further includes a first fixing frame and a second fixing frame, the first fixing frame is fixedly connected to the housing, one side of the first fixing frame facing the housing has an accommodating cavity, the second fixing frame is connected to the first fixing frame and located in the accommodating cavity, and the motor is disposed on the second fixing frame.
In optional embodiment, first mount includes fixed plate and a plurality of support piece, a plurality of support piece's first end all with casing fixed connection, a plurality of support piece's second end all with fixed plate fixed connection, enclose jointly between a plurality of support piece and the fixed plate and hold the chamber, first through-hole has been seted up to the fixed plate, second mount and one side fixed connection of fixed plate towards the casing, first through-hole is worn to locate by the screw rod.
In an optional embodiment, the first driving mechanism comprises a first driving assembly, a driving shaft and a protection tube, the adjusting plate is provided with a second through hole, the permanent magnet device further comprises a shell, the permanent magnet assembly is arranged inside the shell, the shell is provided with a third through hole, the driving shaft penetrates through the second through hole and the third through hole, the first driving assembly is arranged on the adjusting plate and is in transmission connection with the permanent magnet assembly through the driving shaft, and the first driving assembly is used for driving the driving shaft to drive the permanent magnet assembly to rotate so as to form a rotating magnetic field; the both ends of protection tube respectively with regulating plate and casing fixed connection, and the outside of drive shaft is located to the cover, and the protection tube is flexible hose.
In a second aspect, an embodiment of the present invention provides a magnetron sputtering apparatus including the permanent magnet device of any one of the preceding embodiments.
The permanent magnet device of the embodiment of the invention has the beneficial effects that: the permanent magnet device provided by the embodiment of the invention comprises a permanent magnet assembly, a first driving mechanism and a second driving mechanism, wherein the first driving mechanism is in transmission connection with the permanent magnet assembly and is used for driving the permanent magnet assembly to rotate so as to form a rotating magnetic field; the second driving mechanism comprises at least two groups of second driving assemblies, the at least two groups of second driving assemblies are in transmission connection with the first driving mechanism through adjusting plates and are jointly used for driving the adjusting plates to move so as to adjust the included angle of the adjusting plates relative to the horizontal plane, and the adjusting plates are utilized to drive the first driving mechanism to move so as to adjust the included angle of the permanent magnet assemblies relative to the horizontal plane. Therefore, when the included angle of the permanent magnet assembly relative to the horizontal plane needs to be adjusted, the second driving assembly of the second driving mechanism only needs to be utilized to drive the adjusting plate to move, the first driving mechanism and the permanent magnet assembly which are connected in a transmission mode are driven by the adjusting plate to move synchronously, the included angle of the permanent magnet assembly relative to the horizontal plane can be adjusted, the angle of the permanent magnet assembly does not need to be adjusted manually, the angle adjusting operation of the permanent magnet assembly is simple, errors caused by manual adjustment are reduced, and the accuracy is easy to guarantee.
Moreover, the angle of the permanent magnet assembly is adjusted through the first driving mechanism in transmission connection with the permanent magnet assembly by the second driving assembly of the second driving mechanism, so that the stability of transmission connection between the first driving mechanism and the permanent magnet assembly can be ensured when the angle of the permanent magnet assembly is adjusted, and further, the first driving mechanism can stably drive the permanent magnet assembly to rotate no matter how the angle of the permanent magnet assembly is adjusted, and the permanent magnet assembly can be ensured to stably form a rotating magnetic field under the driving of the first driving mechanism.
The magnetron sputtering equipment of the embodiment of the invention has the beneficial effects that: the magnetron sputtering equipment provided by the embodiment of the invention comprises the permanent magnet device, and the included angle of the permanent magnet component relative to the horizontal plane can be adjusted by utilizing the second driving component of the second driving mechanism, so that the magnetron sputtering equipment can ensure the uniform thickness of a film when the film is coated on the surface of a wafer, and the film coating quality is improved; and the angle of the permanent magnet component is adjusted by the permanent magnet device of the magnetron sputtering equipment through the second driving mechanism, the angle of the permanent magnet component does not need to be adjusted manually, the operation is simple, errors caused by manual adjustment can be avoided, and the accuracy is further ensured.
And the second driving component of the second driving mechanism adjusts the angle of the permanent magnet component through the first driving mechanism in transmission connection with the permanent magnet component, so that the stability of transmission connection between the first driving mechanism and the permanent magnet component can be ensured when the angle of the permanent magnet component is adjusted, and further the first driving mechanism can stably drive the permanent magnet component to rotate no matter how the angle of the permanent magnet component is adjusted, so that the permanent magnet component can be ensured to stably form a rotating magnetic field under the driving of the first driving mechanism, and the quality of wafer coating can be further ensured.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a schematic structural diagram of a permanent magnet device in an embodiment of the present invention at a first viewing angle;
FIG. 2 is a schematic structural diagram of a first driving mechanism according to an embodiment of the present invention;
FIG. 3 is an exploded view of a permanent magnet apparatus in an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of a permanent magnet assembly according to an embodiment of the present invention at a first viewing angle;
FIG. 5 is a schematic structural diagram of a permanent magnet assembly according to an embodiment of the present invention at a second viewing angle;
FIG. 6 is a schematic structural diagram of a permanent magnet device according to an embodiment of the present invention at a second viewing angle;
FIG. 7 is a schematic structural diagram of a second driving assembly according to an embodiment of the present invention;
fig. 8 is a schematic view of the structure of the second bearing and the connection ring in the embodiment of the present invention.
Icon: 010-permanent magnet devices; 100-a permanent magnet assembly; 110-horseshoe magnet; 120-an outer positioning ring; 130-an inner positioning ring; 140-a connecting plate; 150-a counterweight block; 200-a first drive mechanism; 210-a first drive assembly; 211-a drive shaft; 212-a protective tube; 213-rotating wheel; 214-a mounting plate; 215-a cavity; 216 — a first bearing; 217-convex teeth; 300-a second drive mechanism; 310-a second drive assembly; 311, a motor; 312-screw rod; 313-attachment ring; 320-a first mount; 321-a containing cavity; 322-a fixed plate; 323-a support member; 324-a first via; 330-a second fixing frame; 331-an accommodating cavity; 332-a third bearing; 400-adjusting plate; 401 — a second via; 410-a housing; 411-side plate; 412-a top plate; 413-a third via; 414-a receiving space; 420-mounting holes; 421-a second bearing; 422-outer ring; 423-inner ring.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention. It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present invention, it should be noted that the terms "upper", "lower", "horizontal", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or orientations or positional relationships that the products of the present invention conventionally place when used, and are only used for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the devices or elements referred to must have specific orientations, be constructed in specific orientations, and be operated, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed" and "connected" are to be interpreted broadly, e.g., as being either fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The present embodiment provides a magnetron sputtering apparatus that can be used for coating materials such as metals, semiconductors, and insulators. Further, the magnetron sputtering device of the embodiment can be used for coating the wafer.
The magnetron sputtering device of the embodiment comprises a permanent magnet device, a magnetic field generator and a control device, wherein the permanent magnet device can provide a rotating magnetic field with a variable angle; in magnetron sputtering, a magnetic field is introduced on the surface of a target cathode, electrons form a spiral track around magnetic lines provided by a permanent magnet device, and the plasma density is improved by utilizing the restraint of the electromagnetic field on charged particles to increase the sputtering rate.
It should be noted that, the above-mentioned permanent magnet device can change the direction of the magnetic field generated by the permanent magnet assembly by changing the angle of the permanent magnet assembly, so as to meet the requirement of coating and improve the uniformity of coating; particularly, the angle of the permanent magnet assembly is changed, so that the direction of a magnetic field generated by the permanent magnet assembly meets the requirement of wafer coating, the uniformity of the wafer coating is improved, and the quality of the wafer coating is further improved.
It should be noted that the structure and the working principle of the magnetron sputtering device are similar to those of the related art, and are not described herein again; only the permanent magnet arrangement will be described in detail below.
Referring to fig. 1 and 2, the permanent magnet device 010 includes a permanent magnet assembly 100, a first driving assembly 210 and a second driving assembly 310, wherein the first driving assembly 210 is in transmission connection with the permanent magnet assembly 100 and is used for driving the permanent magnet assembly 100 to rotate so as to form a stable rotating magnetic field; the second driving mechanism 300 is in transmission connection with the first driving mechanism 200, and is used for driving the first driving mechanism 200 to move so as to adjust the included angle of the permanent magnet assembly 100 relative to the horizontal plane.
The included angle of permanent magnet assembly 100 for the horizontal plane needs to be adjusted to when adjusting the magnetic field direction that permanent magnet assembly 100 formed, only need utilize first actuating mechanism 200 and the permanent magnet assembly 100 synchronous motion that second actuating mechanism 300 drive transmission is connected, can adjust the included angle of permanent magnet assembly 100 for the horizontal plane, and then do not need the angle of manual regulation permanent magnet assembly 100, make the angle modulation easy operation of permanent magnet assembly 100, and reduced the error that manual regulation leads to, guarantee the degree of accuracy promptly easily.
Moreover, since the second driving mechanism 300 adjusts the angle of the permanent magnet assembly 100 through the first driving mechanism 200 in transmission connection with the permanent magnet assembly 100, when adjusting the angle of the permanent magnet assembly 100, it can ensure the stability of transmission connection between the first driving mechanism 200 and the permanent magnet assembly 100, and further ensure that the first driving mechanism 200 can be stably in transmission connection with the permanent magnet assembly 100 no matter how the angle of the permanent magnet assembly 100 is adjusted, i.e. the transmission connection between the first driving mechanism 200 and the permanent magnet assembly 100 is not disconnected due to the angle change of the permanent magnet assembly 100, so as to ensure that the first driving mechanism 200 can stably drive the permanent magnet assembly 100 to rotate, i.e. ensure that the permanent magnet assembly 100 can stably form a stable rotating magnetic field under the driving of the first driving mechanism 200, i.e. ensure that when the first driving mechanism 200 drives the permanent magnet assembly 100 to rotate, a magnetic field is generated in the circumferential annular region of the permanent magnet assembly, so as to further ensure the quality of the film coating for the wafer by using the magnetron sputtering equipment with the permanent magnetic device 010.
It should be noted that the horizontal plane mentioned in the angle of the permanent magnet assembly 100 with respect to the horizontal plane may refer to an absolute position of the magnetron sputtering apparatus provided with the permanent magnet device 010 in normal operation, that is, an absolute position of the permanent magnet assembly 100 in use; rather than the relative position of the permanent magnet device 010 during handling and transportation.
Referring to fig. 1, in a preferred embodiment, the permanent magnetic device 010 further includes an adjusting plate 400, and the first driving mechanism 200 is disposed on the adjusting plate 400, for example: the first driving mechanism 200 is disposed on the upper surface of the adjustment plate 400, or in other embodiments, the first driving mechanism 200 may also be disposed on the lower surface of the adjustment plate 400, which is not particularly limited herein; the second driving mechanism 300 is in transmission connection with the first driving mechanism 200 through the adjustment plate 400, and is used for driving the adjustment plate 400 to move so as to adjust the included angle of the adjustment plate 400 relative to the horizontal plane, and the adjustment plate 400 is used for driving the first driving mechanism 200 to move so as to adjust the included angle of the permanent magnet assembly 100 relative to the horizontal plane. According to the arrangement, the second driving mechanism 300 can be used for driving the adjusting plate 400 to change the angle of the adjusting plate relative to the horizontal plane, so that the first driving mechanism 200 and the permanent magnet assembly 100 are stably and synchronously driven to move, the angle of the permanent magnet assembly 100 relative to the horizontal plane is adjusted, the stability of synchronous movement of the permanent magnet assembly 100 and the first driving mechanism 200 is ensured by effectively utilizing the adjusting plate 400, the angle of a magnetic field generated by the permanent magnet assembly 100 is stably adjusted, the stability of transmission connection between the first driving mechanism 200 and the permanent magnet assembly 100 is also ensured, no matter how the angle of the permanent magnet assembly 100 relative to the horizontal plane is changed, the first driving mechanism 200 can stably drive the permanent magnet assembly 100 to rotate, a rotating magnetic field is formed, the uniformity of the film coating of a wafer by a magnetron sputtering.
Of course, in other embodiments, the second driving mechanism 300 may be directly connected to the first driving mechanism 200, rather than being connected to the first driving mechanism 200 through the adjusting plate 400, so that the second driving mechanism 300 directly drives the first driving mechanism 200 to drive the permanent magnet assembly 100 to move, thereby adjusting the angle of the permanent magnet assembly 100 relative to the horizontal plane.
Referring to fig. 1, the permanent magnetic device 010 of the embodiment further includes a housing 410, the housing 410 has an accommodating space 414, and the permanent magnetic assembly 100 is disposed in the accommodating space 414; the first driving mechanism 200 is in transmission connection with the permanent magnet assembly 100 through the housing 410, that is, the first driving mechanism 200 can drive the permanent magnet assembly 100 to rotate in the accommodating space 414 of the housing 410.
The specific structure of the housing 410 can be set as desired; in this embodiment, the housing 410 includes four side plates 411 connected end to end in sequence and a top plate 412 connected to the four side plates 411 at the same time, and the four side plates 411 and the top plate 412 together enclose an accommodating space 414 for accommodating the permanent magnet assembly 100. It should be understood that in other embodiments, the housing 410 may further include three side plates 411 connected end to end in sequence and a top plate 412 connected to the three side plates 411 at the same time, or the housing 410 may further include an annular side plate 411 and a top plate 412 connected to the side plate 411, which is not illustrated and described herein.
The connection method between the two side plates 411 and the connection method between the side plates 411 and the top plate 412 may be selected as needed, and may be, for example, welding, integral molding, and the like, and is not particularly limited herein.
Optionally, a top plate 412 of the housing 410 is disposed opposite to the adjusting plate 400, the top plate 412 extends in a horizontal direction, and the second driving mechanism 300 is disposed on the housing 410 for driving the adjusting plate 400 to move relative to the top plate 412 to adjust an included angle of the adjusting plate 400 relative to a horizontal plane; it should be noted that the second driving mechanism 300 may be disposed on the upper surface of the housing 410, and in other embodiments, the second driving mechanism 300 may also be disposed inside the housing 410 as long as it can be in transmission connection with the adjustment plate 400 to drive the angle of the adjustment plate 400, which is not specifically limited herein.
Referring to fig. 1 to 3, the first driving mechanism 200 of the present embodiment includes a first driving assembly 210, a driving shaft 211, and a protection tube 212, wherein the adjustment plate 400 has a second through hole 401, the housing 410 has a third through hole 413, and specifically, the top plate 412 has a third through hole 413; the driving shaft 211 is inserted into the second through hole 401 and the third through hole 413, that is, the driving shaft 211 can sequentially penetrate through the second through hole 401 of the adjusting plate 400 and the third through hole 413 of the top plate 412 of the housing 410 and extend into the accommodating space 414 of the housing 410; the first driving assembly 210 is disposed on the adjusting plate 400, specifically, the first driving assembly 210 is located on a side of the adjusting plate 400 away from the housing 410, and the first driving assembly 210 is in transmission connection with the permanent magnet assembly 100 through a driving shaft 211 and is used for driving the driving shaft 211 to drive the permanent magnet assembly 100 to rotate so as to form a rotating magnetic field; the two ends of the protection tube 212 are respectively fixedly connected with the adjusting plate 400 and the housing 410, and are sleeved outside the driving shaft 211, the protection tube 212 is a flexible tube, and specifically, one end of the protection sleeve away from the adjusting plate 400 is fixedly connected with the top plate 412 of the housing 410. So set up, not only can utilize first drive assembly 210 to drive shaft 211 drive permanent magnetic component 100 and rotate, and when the contained angle change of regulating plate 400 for the horizontal plane, the protection tube 212 of connecting between regulating plate 400 and roof 412 can be along with the change of regulating plate 400 for the contained angle of roof 412 and take place deformation, and then can not produce harmful effects to permanent magnetic component 100's work, can not influence the magnetic field that permanent magnetic component 100 produced promptly.
Optionally, the protection tube 212 is a corrugated tube, which can be flexibly changed with the angle of the adjusting plate 400 relative to the horizontal plane, for example: when the angle between the adjusting plate 400 and the horizontal plane is changed from 0 ° to 10 °, the corrugated tube bends with the change of the angle of the adjusting plate 400. Moreover, the corrugated pipe is made of metal, can have the characteristics of high temperature resistance, wear resistance and long service life, and has a sealing effect.
It should be noted that the connection manner of the two ends of the protection tube 212 with the adjustment plate 400 and the top plate 412 can be selected according to the requirement, and for example, the connection manner can be bonding, clamping, screwing, or fastening, and is not limited in detail here.
Optionally, with continued reference to fig. 2 and fig. 3, the first driving assembly 210 includes a rotating wheel 213 and a mounting plate 214, the mounting plate 214 is fixedly connected to a side of the adjusting plate 400 away from the housing 410, the mounting plate 214 is provided with a fourth through hole (not shown), and the fourth through hole is communicated with the second through hole 401; the rotating wheel 213 is rotatably connected with the mounting plate 214, a cavity 215 is formed inside the rotating wheel 213, one end of the driving shaft 211, which is far away from the permanent magnet assembly 100, is fixedly connected with the rotating wheel 213, and the driving shaft 211 penetrates through the cavity 215 and penetrates through the fourth through hole and the second through hole 401; when the rotating wheel 213 rotates, the driving shaft 211 is driven to rotate synchronously, so that the driving shaft 211 is used to drive the permanent magnet assembly 100 to rotate, thereby forming a rotating magnetic field; when the angle of the adjusting plate 400 relative to the horizontal plane is changed, the mounting plate 214, the rotating wheel 213 and the driving shaft 211 are driven to move synchronously to drive the permanent magnet assembly 100 to move and change the angle of the permanent magnet assembly 100 relative to the horizontal plane. Alternatively, the fixing connection manner of the mounting plate 214 and the adjusting plate 400 may be welding, connection by a fastener such as a bolt, etc., and is not particularly limited herein.
Further, referring to fig. 2, the first driving assembly 210 includes a first bearing 216, the first bearing 216 is disposed in the cavity 215, and the first bearing 216 is connected between the mounting plate 214 and the driving shaft 211. With such an arrangement, the rotation wheel 213 can rotate relative to the mounting plate 214 and the adjusting plate 400 more smoothly, so as to ensure that the rotation wheel 213 can stably drive the driving shaft 211 to rotate the permanent magnet assembly 100. Still further, an outer ring (not shown) of the first bearing 216 is fixedly connected to the mounting plate 214, an inner ring (not shown) of the first bearing 216 is fixedly connected to the driving shaft 211, and the inner ring is rotatable with respect to the outer ring so that the driving shaft 211 can smoothly rotate with respect to the mounting plate 214.
Referring to fig. 2, a plurality of teeth 217 are disposed on a peripheral sidewall of the rotating wheel 213, and the plurality of teeth 217 are sequentially and uniformly distributed along a circumferential direction of the rotating wheel 213; the first driving assembly 210 further includes a toothed belt (not shown) and a driving motor (not shown), the toothed belt can be meshed with the plurality of convex teeth 217 arranged on the peripheral side wall of the rotating wheel 213, and the toothed belt is in transmission connection with the driving motor, that is, the toothed belt is in transmission connection between the rotating wheel 213 and the driving motor, and when an output shaft of the driving motor rotates, the rotating wheel 213 can be driven to rotate through the toothed belt, so as to drive the driving shaft 211 to drive the permanent magnet assembly 100 to rotate. It should be noted that the toothed belt may be in transmission connection with the output shaft of the driving motor through a gear assembly, a worm gear assembly or directly, and is not limited herein.
It should be noted that in other embodiments, the output shaft of the driving motor may also be in transmission connection with the rotating wheel 213 through a gear assembly, that is, a gear in transmission connection with the output shaft of the driving motor may be directly engaged with the convex teeth 217 on the periphery of the rotating wheel 213; when the output shaft of the driving motor rotates, the gear assembly can be driven to directly drive the rotating wheel 213 to rotate.
It should be appreciated that in other embodiments, the permanent magnet assembly 100 may be directly geared via the output shaft of the drive motor without the need for a rotating wheel 213 and drive shaft 211.
The specific structure of the permanent magnet assembly 100 is similar to the related art, for example: referring to fig. 4 and 5, the permanent magnet assembly 100 includes a plurality of horseshoe magnets 110, an outer positioning ring 120, an inner positioning ring 130, a connecting plate 140 and a weight 150, the horseshoe magnets 110 are magnets with a horseshoe shape, the outer sides of the horseshoe magnets 110 are semi-circular arcs, the inner sides of the horseshoe magnets 110 are provided with straight grooves, the upper parts of the horseshoe magnets 110 are machined and flattened, the two ends of the horseshoe magnets 110 are south poles and north poles respectively, a magnetic induction line starts from the north pole and reaches the south pole, and the magnetism between the two poles is strongest; the inner positioning ring 130 is distributed inside the outer positioning ring 120, two ends of the lower part of the horseshoe-shaped magnet 110 are respectively connected with the outer positioning ring 120 and the inner positioning ring 130, and the horseshoe-shaped magnets 110 are sequentially arranged at intervals along the circumference of the outer positioning ring 120, and the balancing weight 150 can be fixedly connected with the outer positioning ring 120 for maintaining the weight dynamic balance of the permanent magnet assembly 100; connecting plate 140 is connected with the upper portion of a plurality of horseshoe magnets 110 simultaneously, and connecting plate 140 can with drive shaft 211 fixed connection to utilize drive shaft 211 to drive connecting plate 140, horseshoe magnets 110, outer holding ring 120 and interior positioning ring 130 synchronous revolution, can realize utilizing drive shaft 211 to drive permanent magnet assembly 100 and rotate. It should be noted that, the connection mode between the horseshoe magnet 110 and the outer positioning ring 120 and the inner positioning ring 130, and the connection mode between the connection plate 140 and the horseshoe magnet 110 may be selected according to the needs, for example, the connection mode may be selected by a fastener such as a bolt, and the connection mode between the driving shaft 211 and the connection plate 140 may also be selected according to the needs, for example, an interference fit, a threaded connection, a connection with a fastener, and the like, and are not limited specifically herein; the shapes of the outer positioning ring 120 and the inner positioning ring 130 may be selected according to the needs, and may be, for example, substantially heart-shaped or ellipse-like, and the like, and are not particularly limited herein.
Of course, in other embodiments, the structure of the permanent magnet assembly 100 may also be adjusted according to the magnetic field direction required by the magnetron sputtering apparatus, and the like, and is not limited herein.
Referring to fig. 1 and fig. 3, the second driving mechanism 300 of the present embodiment includes at least two sets of second driving assemblies 310, wherein the at least two sets of second driving assemblies 310 are both fixedly disposed outside the housing 410, and specifically, the at least two sets of second driving assemblies 310 are both fixedly disposed on a side of the top plate 412 facing the adjustment plate 400, and the at least two sets of second driving assemblies 310 are both in transmission connection with the first driving mechanism 200 through the adjustment plate 400 and are commonly used for driving the adjustment plate 400 to move so as to adjust an included angle of the adjustment plate 400 relative to a horizontal plane, and drive the first driving mechanism 200 to move through the adjustment plate 400 so as to adjust an included angle of the permanent magnet assembly 100 relative to the horizontal plane. With this arrangement, the adjusting plate 400 can be driven by the at least two second driving assemblies 310 to move relative to the horizontal plane at the same time, so as to ensure that the adjusting plate 400 can stably move relative to the horizontal plane, thereby stably changing the included angle of the adjusting plate 400 relative to the horizontal plane, and stably changing the included angle of the permanent magnet assembly 100 relative to the horizontal plane.
Optionally, referring to fig. 6, the second driving mechanism 300 includes three sets of second driving assemblies 310, and the three sets of second driving assemblies 310 are distributed in a triangular shape; therefore, the three sets of second driving assemblies 310 can be used to stably adjust the vertical positions of the three corresponding points on the adjusting plate 400 relative to the horizontal plane by the principle that three points determine a plane, so as to adjust the included angle of the adjusting plate 400 relative to the horizontal plane, thereby stably changing the included angle of the permanent magnet assembly 100 relative to the horizontal plane. It should be noted that, when the three sets of second driving assemblies 310 respectively adjust the upper and lower positions of the corresponding three points on the adjusting plate 400 relative to the horizontal plane, the three are mutually constrained, so that the adjustment of the included angle of the adjusting plate 400 relative to the horizontal plane is more controllable.
It should be noted that the distribution of the three sets of second driving assemblies 310 relative to the adjusting plate 400 can be selected as required, for example, the adjusting plate 400 is a square plate, and the adjusting plate 400 includes a first side and a second side that are distributed oppositely, wherein two second driving assemblies 310 are distributed at two ends of the first side, i.e., two adjacent vertex angles of the square plate, and another second driving assembly 310 is distributed in the middle of the second side, so that the three second driving assemblies 310 are distributed in an isosceles triangle. Of course, the three sets of second driving assemblies 310 may also be distributed in an equilateral triangle, a right-angled triangle, etc., and are not limited herein.
It should be understood that in other embodiments, the number of the second driving assemblies 310 included in the second driving mechanism 300 may also be two, four, five, etc., and is not limited herein; of course, when the number of the second driving assemblies 310 is greater than three, all the second driving assemblies 310 are preferably distributed in a triangular shape, that is, the connecting lines of all the second driving assemblies 310 are distributed in a triangular shape, so as to stably change the included angle of the adjusting plate 400 relative to the horizontal plane, and further change the included angle of the permanent magnet assembly 100 relative to the horizontal plane.
Of course, in embodiments where the adjustment plate 400 is not provided, the second drive assembly 310 and the first drive mechanism 200 may be connected by a plurality of first connecting rods and a plurality of second connecting rods, for example: the second driving mechanism 300 includes three groups of second driving assemblies 310, the three groups of second driving assemblies 310 are distributed in a triangular manner, two groups of second driving assemblies 310 located on the same triangular side are connected by a first connecting rod, each second driving assembly 310 is connected with the first driving mechanism 200 by a second connecting rod, and other embodiments are not described herein.
Optionally, referring to fig. 3 and fig. 7, the second driving assembly 310 includes a motor 311 and a screw 312, the motor 311 is fixedly disposed in the housing 410, specifically, the motor 311 is fixedly disposed in the top plate 412, an output shaft of the motor 311 is in transmission connection with the screw 312, and the screw 312 is in threaded fit with the adjusting plate 400; when the output shaft of the motor 311 drives the screw 312 to rotate around its own axis, the adjusting plate 400 is driven to move along the axis direction of the screw 312, that is, when the output shaft of the motor 311 drives the screw 312 to rotate around its own axis, the adjusting plate 400 is driven to move up and down along the axis of the screw 312 relative to the horizontal plane. So set up, can drive the position that the regulating plate 400 corresponds respectively through at least two second drive assembly 310 and reciprocate different distances for the horizontal plane, and then change the contained angle of regulating plate 400 for the horizontal plane.
Further, referring to fig. 3 and 8, the adjusting plate 400 is provided with a mounting hole 420, a bearing (hereinafter referred to as a second bearing 421) is disposed in the mounting hole 420, an outer ring 422 of the second bearing 421 is fixedly connected to the adjusting plate 400, an inner ring 423 of the second bearing 421 can rotate relative to the outer ring 422, the second driving assembly 310 further includes a connecting ring 313 with internal threads, the connecting ring 313 is embedded in the inner ring 423 and coaxially and fixedly connected to the inner ring 423, and the screw 312 is in threaded connection with the connecting ring 313; when the output shaft of the motor 311 drives the screw 312 to rotate around its axis, the connecting ring 313 and the inner ring 423 can be driven to synchronously rotate around the screw 312 and move along the axial direction of the screw 312, so as to drive the adjusting plate 400 to move along the axial direction of the screw 312. With this arrangement, friction can be reduced by the second bearing 421, so that the screw rod 312 can rotate relative to the adjusting plate 400 more smoothly, and the adjusting plate 400 is driven to move along the axial direction of the screw rod 312.
Of course, in other embodiments, the mounting hole 420 may be a threaded hole and the threaded rod 312 may be directly threadedly engaged with the threaded hole.
It should be noted that the outer ring 422 of the second bearing 421 may be disposed in the mounting hole 420 by bonding, interference, or the like; similarly, the connection ring 313 may be disposed in the inner ring 423 of the second bearing 421 by bonding or interference; and is not particularly limited herein.
It should be understood that in other embodiments, the second driving assembly 310 may also be a rack and pinion driving assembly, a belt driving assembly, etc., and is not limited herein.
With reference to fig. 3 and fig. 7, a manner of fixing the motor 311 in the housing 410 may be selected according to needs, and optionally, the second driving assembly 310 further includes a first fixing frame 320 and a second fixing frame 330, the first fixing frame 320 is fixedly connected to the housing 410, specifically, the first fixing frame 320 is fixedly connected to the top plate 412, one side of the first fixing frame 320 facing the housing 410 has an accommodating cavity 321, the second fixing frame 330 is fixedly connected to the first fixing frame 320 and located in the accommodating cavity 321, and the motor 311 is disposed in the second fixing frame 330. In this way, when assembling the motor 311, the motor 311 may be disposed on the second fixing frame 330, and after the second fixing frame 330 is connected to the first fixing frame 320, the motor 311, the second fixing frame 330 and the first fixing frame 320 may be assembled as an integral module on the housing 410, so that the assembly of the motor 311 may be performed more easily.
Further, the first fixing frame 320 includes a fixing plate 322 and a plurality of supporting members 323, first ends of the plurality of supporting members 323 are all fixedly connected to the housing 410, second ends of the plurality of supporting members 323 are all fixedly connected to the fixing plate 322, the accommodating cavity 321 is enclosed between the plurality of supporting members 323 and the fixing plate 322, the fixing plate 322 is provided with a first through hole 324, the second fixing frame 330 is fixedly connected to one side of the fixing plate 322 facing the housing 410, and the screw 312 penetrates through the first through hole 324. Furthermore, the second fixing frame 330 has an accommodating cavity 331 with an opening facing the fixing plate 322, the motor 311 is embedded in the accommodating cavity 331, and the screw 312 in transmission connection with the output shaft of the motor 311 sequentially extends out of the opening of the accommodating cavity 331 and the first through hole 324 to be in threaded connection with the adjusting plate 400. With the arrangement, the stability of the motor 311 arranged on the housing 410 can be ensured by the first fixing frame 320 and the second fixing frame 330, and then the motor 311 drives the screw 312 to rotate, so as to stably adjust the included angle of the adjusting plate 400 relative to the horizontal plane.
It should be noted that the number of the supporting members 323 of the first fixing frame 320 can be selected according to the requirement, for example: two, three, four, etc., and are not specifically limited herein. The connection manner of the supporting frame and the fixing plate 322 can be selected according to the requirement, such as integral molding, welding, etc., and is not limited in detail here. The connection manner of the supporting element 323 of the first fixing frame 320 and the top plate 412 and the connection manner of the second fixing frame 330 and the fixing plate 322 can be selected according to the requirement, for example, they can be welded, clamped, etc.
It should be further noted that the supporting member 323 of the present embodiment is a supporting rod; in other embodiments, the supporting member 323 may also be a supporting plate, etc., and is not particularly limited herein.
Optionally, the second driving mechanism 300 further includes a third bearing 332, the third bearing 332 is fixedly disposed in the first through hole 324, specifically, an outer ring of the third bearing 332 is fixedly connected to the fixing plate 322, and an inner ring of the third bearing 332 is fixedly connected to the screw 312; so set up, can avoid screw rod 312 and fixed plate 322 looks mutual friction, ensure the smooth and easy rotation of motor 311's output shaft drive screw rod 312, set up in first through-hole 324 moreover with screw rod 312 complex third bearing 332, can also avoid the unexpected external force of screw rod 312 to rock under effect, and then improve the stability that second actuating mechanism 300 and regulating plate 400 transmission are connected.
Of course, in some embodiments, the third bearing 332 is not disposed in the first through hole 324, and the screw 312 directly passes through the first through hole 324.
It should be understood that in other embodiments, the motor 311 does not need to be disposed on the housing 410 through the first fixing frame 320 and the second fixing frame 330, but the housing of the motor 311 is directly fixedly connected to the housing 410.
The magnetron sputtering device provided by the embodiment can be used for coating films on elements such as wafers, when the magnetron sputtering device coats films on elements such as wafers, the parts corresponding to the adjusting plates 400 can be synchronously driven to move up and down relative to the horizontal plane by the aid of the second driving assemblies 310 of the second driving mechanisms 300, included angles of the adjusting plates 400 relative to the horizontal plane are further adjusted, the adjusting plates 400 drive the first driving mechanisms 200 and the permanent magnet assemblies 100 to synchronously move, included angles of the permanent magnet assemblies 100 relative to the horizontal plane can be synchronously adjusted, and different coating requirements can be met by magnetic field directions formed by the permanent magnet assemblies 100.
In summary, when the included angle of the permanent magnet assembly 100 relative to the horizontal plane needs to be adjusted, the permanent magnet device 010 of the magnetron sputtering apparatus provided by the present invention can adjust the included angle of the permanent magnet assembly 100 relative to the horizontal plane only by using the second driving mechanism 300 to drive the first driving mechanism 200 and the permanent magnet assembly 100 in transmission connection to move synchronously, and further does not need to manually adjust the angle of the permanent magnet assembly 100, so that the angle adjustment operation of the permanent magnet assembly 100 is simple, and the error caused by manual adjustment is reduced, i.e. the accuracy is easily ensured; moreover, since the second driving mechanism 300 specifically adjusts the angle of the permanent magnet assembly 100 through the first driving mechanism 200 in transmission connection with the permanent magnet assembly 100, when adjusting the angle of the permanent magnet assembly 100, the stability of transmission connection between the first driving mechanism 200 and the permanent magnet assembly 100 can be ensured, and further, the first driving mechanism 200 can stably drive the permanent magnet assembly 100 to rotate regardless of the angle adjustment of the permanent magnet assembly 100, that is, the permanent magnet assembly 100 can stably form a rotating magnetic field under the driving of the first driving mechanism 200, so as to further ensure the quality of wafer coating.
The above is only a preferred embodiment of the present invention, and is not intended to limit the present invention, and various modifications and changes will occur to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. A permanent magnet device is characterized by comprising a permanent magnet component, an adjusting plate, a shell, a first driving mechanism and a second driving mechanism,
the permanent magnet assembly is arranged in the shell, the first driving mechanism penetrates through the shell to be in transmission connection with the permanent magnet assembly and is used for driving the permanent magnet assembly to rotate so as to form a rotating magnetic field, and the first driving mechanism is arranged on the adjusting plate;
the second driving mechanism comprises at least two groups of second driving components, the at least two groups of second driving components are fixedly arranged outside the shell, are in transmission connection with the first driving mechanism through the adjusting plate and are jointly used for driving the adjusting plate to move so as to adjust the included angle of the adjusting plate relative to the horizontal plane, and drive the first driving mechanism to move by utilizing the adjusting plate so as to adjust the included angle of the permanent magnet component relative to the horizontal plane;
the second driving assembly comprises a motor and a screw, the motor is fixedly arranged in the shell, an output shaft of the motor is in transmission connection with the screw, the adjusting plate is provided with a mounting hole, a bearing is arranged in the mounting hole, an outer ring of the bearing is fixedly connected with the adjusting plate, an inner ring of the bearing can rotate relative to the outer ring, the second driving assembly further comprises a connecting ring with internal threads, the connecting ring is embedded in the inner ring and is coaxially and fixedly connected with the inner ring, and the screw is in threaded connection with the connecting ring; when the output shaft of the motor drives the screw to rotate around the axis of the screw, the connecting ring and the inner ring can be driven to synchronously rotate around the screw and move along the axis direction of the screw, so that the adjusting plate is driven to move along the axis direction of the screw.
2. The permanent magnet apparatus of claim 1 wherein the second drive mechanism comprises three sets of the second drive assemblies, the three sets of the second drive assemblies being triangularly distributed.
3. The permanent magnet device according to claim 1, wherein the second driving assembly further comprises a first fixing frame and a second fixing frame, the first fixing frame is fixedly connected with the housing, a receiving cavity is formed in a side of the first fixing frame facing the housing, the second fixing frame is connected with the first fixing frame and located in the receiving cavity, and the motor is disposed in the second fixing frame.
4. The permanent magnet device according to claim 3, wherein the first fixing frame includes a fixing plate and a plurality of supporting members, first ends of the supporting members are all fixedly connected to the housing, second ends of the supporting members are all fixedly connected to the fixing plate, the supporting members and the fixing plate together define the accommodating cavity, the fixing plate is provided with a first through hole, the second fixing frame is fixedly connected to one side of the fixing plate facing the housing, and the screw rod is inserted into the first through hole.
5. The permanent magnet device according to claim 1, wherein the first driving mechanism comprises a first driving assembly, a driving shaft and a protection tube, the adjusting plate is provided with a second through hole, the permanent magnet device further comprises a housing, the permanent magnet assembly is disposed inside the housing, the housing is provided with a third through hole, the driving shaft is disposed through the second through hole and the third through hole, the first driving assembly is disposed on the adjusting plate and is in transmission connection with the permanent magnet assembly through the driving shaft, and is used for driving the driving shaft to drive the permanent magnet assembly to rotate so as to form a rotating magnetic field; the two ends of the protection pipe are respectively fixedly connected with the adjusting plate and the shell, the protection pipe is sleeved outside the driving shaft, and the protection pipe is a flexible hose.
6. Magnetron sputtering apparatus comprising a permanent magnet device according to any of claims 1 to 5.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011289452.8A CN112117080A (en) | 2020-11-18 | 2020-11-18 | Permanent magnet device and magnetron sputtering equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011289452.8A CN112117080A (en) | 2020-11-18 | 2020-11-18 | Permanent magnet device and magnetron sputtering equipment |
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| CN112117080A true CN112117080A (en) | 2020-12-22 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202011289452.8A Pending CN112117080A (en) | 2020-11-18 | 2020-11-18 | Permanent magnet device and magnetron sputtering equipment |
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| JP2001152333A (en) * | 1999-11-29 | 2001-06-05 | Shibaura Mechatronics Corp | Sputtering equipment |
| CN202181345U (en) * | 2011-06-20 | 2012-04-04 | 肇庆市前沿真空设备有限公司 | Rotary target device for vacuum magnetron sputtering |
| CN207321034U (en) * | 2017-06-10 | 2018-05-04 | 上海陛通半导体能源科技股份有限公司 | A kind of vacuum rotating device |
| CN207489655U (en) * | 2017-11-13 | 2018-06-12 | 西安锐驰电器有限公司 | A kind of power transformer with operating status alarm |
| CN110177898A (en) * | 2017-11-01 | 2019-08-27 | 株式会社爱发科 | Sputtering device and film forming method |
| CN209836294U (en) * | 2018-12-20 | 2019-12-24 | 上海陛通半导体能源科技股份有限公司 | Permanent magnet device for physical vapor deposition plasma distribution regulation |
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2020
- 2020-11-18 CN CN202011289452.8A patent/CN112117080A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001152333A (en) * | 1999-11-29 | 2001-06-05 | Shibaura Mechatronics Corp | Sputtering equipment |
| CN202181345U (en) * | 2011-06-20 | 2012-04-04 | 肇庆市前沿真空设备有限公司 | Rotary target device for vacuum magnetron sputtering |
| CN207321034U (en) * | 2017-06-10 | 2018-05-04 | 上海陛通半导体能源科技股份有限公司 | A kind of vacuum rotating device |
| CN110177898A (en) * | 2017-11-01 | 2019-08-27 | 株式会社爱发科 | Sputtering device and film forming method |
| CN207489655U (en) * | 2017-11-13 | 2018-06-12 | 西安锐驰电器有限公司 | A kind of power transformer with operating status alarm |
| CN209836294U (en) * | 2018-12-20 | 2019-12-24 | 上海陛通半导体能源科技股份有限公司 | Permanent magnet device for physical vapor deposition plasma distribution regulation |
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Application publication date: 20201222 |