[go: up one dir, main page]

CN112295840B - Slit nozzle and chemical liquid coating device comprising same - Google Patents

Slit nozzle and chemical liquid coating device comprising same Download PDF

Info

Publication number
CN112295840B
CN112295840B CN202010736335.5A CN202010736335A CN112295840B CN 112295840 B CN112295840 B CN 112295840B CN 202010736335 A CN202010736335 A CN 202010736335A CN 112295840 B CN112295840 B CN 112295840B
Authority
CN
China
Prior art keywords
thread groove
groove portion
gap
slit nozzle
thread
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202010736335.5A
Other languages
Chinese (zh)
Other versions
CN112295840A (en
Inventor
郑载勋
具世薰
金相薰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semes Co Ltd
Original Assignee
Semes Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semes Co Ltd filed Critical Semes Co Ltd
Publication of CN112295840A publication Critical patent/CN112295840A/en
Application granted granted Critical
Publication of CN112295840B publication Critical patent/CN112295840B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • B05C5/0262Coating heads with slot-shaped outlet adjustable in width, i.e. having lips movable relative to each other in order to modify the slot width, e.g. to close it
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)

Abstract

The invention discloses a slit nozzle and a liquid medicine coating device comprising the same. The medical fluid supply means may comprise a slit nozzle. The slit nozzle may include a body portion having a flow path for a liquid medicine to flow, a discharge portion for discharging the liquid medicine flowing through the flow path of the body portion onto the substrate, and a gap adjustment portion for adjusting a gap of the discharge portion. The gap adjusting portion may include a thread groove portion having a first thread groove portion extending from one side of the body portion toward the inside of the body portion and a second thread groove portion extending from the inside of the body portion toward the discharge portion, a slit portion between the first thread groove portion and the second thread groove portion, an adjusting nut having a first thread portion and a second thread portion coupled to the first thread groove portion, and a fixing bolt having a first coupling portion, a coupling portion, and a second coupling portion.

Description

Slit nozzle and chemical liquid coating device comprising same
The present application enjoys priority of korean patent application No. 10-2019-0092889, which was filed in the korean franchise on the 7 th month 30 th year of 2019.
Technical Field
Exemplary embodiments of the present invention relate to a slit nozzle and a chemical liquid coating apparatus including the slit nozzle. More particularly, exemplary embodiments of the present invention relate to a slit nozzle capable of uniformly discharging a chemical solution onto a substrate and a chemical solution coating apparatus including the same.
Background
In manufacturing a display device such as an organic light emitting display device, a process of forming a desired pattern on a substrate may be performed. Such a desired pattern may be formed on the substrate generally by a photo etching process. In the photo etching process, a chemical solution such as a photoresist or a developer is discharged onto the substrate.
The chemical solution can be discharged onto the substrate by a slit nozzle. In the case where a chemical solution such as the photoresist or the developing solution is not uniformly supplied to the entire substrate, a desired pattern cannot be formed on the substrate, and thus, a defect of the display device may be caused. Therefore, a constant gap is required between the discharge portions of the slit nozzle during discharge of the chemical solution onto the substrate. For this reason, a technique for adjusting the gap of the slit nozzle is disclosed in korean laid-open patent No. 2006-0133783.
Disclosure of Invention
Technical problem
An object of the present invention is to provide a slit nozzle capable of uniformly discharging a chemical solution over an entire substrate by maintaining a certain gap of a discharge portion.
Another object of the present invention is to provide a medical fluid application device comprising such a slit nozzle.
Technical proposal
According to one aspect of the present invention, a slit nozzle is provided. The slit nozzle may include a body portion having a flow path for flowing a chemical liquid, a discharge portion for discharging the chemical liquid flowing through the flow path of the body portion onto the substrate, and a gap adjustment portion for adjusting a gap of the discharge portion. The gap adjusting portion may include a thread groove portion having a first thread groove portion extending from a side of the body portion toward an inside of the body portion and a second thread groove portion extending from the inside of the body portion toward the discharge portion, a slit portion between the first thread groove portion and the second thread groove portion, an adjusting nut having a first thread portion and a second thread portion coupled to the first thread groove portion, and a fixing bolt having a first coupling portion coupled to the second thread groove portion, a coupling portion, and a second coupling portion coupled to the second thread portion.
In an exemplary embodiment, the body portion may substantially correspond to a length of the substrate in a width direction.
In an exemplary embodiment, the first thread groove portion and the second thread groove portion of the thread groove portion may communicate with each other. In this case, the diameter of the second thread groove portion of the thread groove portion may be substantially smaller than the diameter of the first thread groove portion of the thread groove portion.
In an exemplary embodiment, the slit portion may be extended to be substantially perpendicular to the first thread groove portion of the thread groove portion and the second thread groove portion of the thread groove portion.
In an exemplary embodiment, the second threaded portion of the adjustment nut may have a substantially smaller pitch than a pitch of the first threaded portion.
In an exemplary embodiment, the connection portion of the fixing bolt may be in contact with an inlet of the second thread groove portion of the thread groove portion.
In some exemplary embodiments, the gap adjusting portion may be disposed in a length direction of the body portion.
In an exemplary embodiment, the connection portion of the fixing bolt is capable of adjusting a gap of the discharge portion. In this case, the connecting portion of the fixing bolt may have a length substantially shorter than a length of the slit portion in a width direction.
In an exemplary embodiment, the gap adjusting portion may adjust the gap of the discharging portion using a pitch difference between a pitch of the first threaded portion of the adjusting nut and a pitch of the second threaded portion of the adjusting nut.
In an exemplary embodiment, the gap of the discharge portion can be controlled as the fixing bolt moves forward and backward.
According to another aspect of the present invention, a slit nozzle is provided. The slit nozzle may have a length substantially corresponding to a width direction of the substrate, and include a body portion having a flow path for flowing the chemical liquid, a discharge portion for discharging the chemical liquid flowing through the flow path of the body portion onto the substrate, and a plurality of gap adjustment portions for adjusting a gap of the discharge portion. Each of the gap adjustment portions may include: the device includes a first screw groove portion extending from one side of the body portion toward the inside of the body portion, a second screw groove portion extending from the inside of the body portion toward the discharge portion and communicating with the first screw groove portion, a slit portion located between the first screw groove portion and the second screw groove portion and extending perpendicularly to the first screw groove portion and the second screw groove portion, an adjusting nut having a first screw portion joined to the first screw groove portion and having a first screw pitch and a second screw portion having a second screw pitch smaller than the first screw pitch, and a fixing bolt having a first connecting portion joined to the second screw groove portion, a connecting portion contacting an inlet of the second screw groove portion, and a second connecting portion joined to the second screw groove portion.
In some exemplary embodiments, the plurality of gap adjustment portions may be disposed at substantially regular intervals along a length direction of the slit nozzle.
In some exemplary embodiments, each of the gap adjustment portions is capable of adjusting the gap of the discharge portion using a pitch difference between a first pitch of a first threaded portion of the adjustment nut and a second pitch of a second threaded portion of the adjustment nut.
In an exemplary embodiment, the gap of the discharge portion may be adjusted as the fixing bolt moves forward and backward.
In an exemplary embodiment, the first coupling portion of the fixing bolt may have a length substantially shorter than a depth of the second thread groove portion of the thread groove portion.
According to another aspect of the present invention, there is provided a medical fluid coating apparatus. The chemical liquid coating apparatus may include a floating table for floating a substrate, a transfer member for transferring the substrate above the floating table, and a slit nozzle for discharging the chemical liquid onto the substrate. The slit nozzle may include: a body portion having a flow path for the chemical liquid to flow, a discharge portion for discharging the chemical liquid flowing through the flow path of the body portion onto the substrate, and a plurality of gap adjustment portions for adjusting gaps of the discharge portion. Each of the gap adjustment portions may include a first thread groove portion extending from one side of the body portion toward an inner side of the body portion, a thread groove portion extending from an inner side of the body portion toward the discharge portion, and communicating with the first thread groove portion, a second thread groove portion extending between the first thread groove portion and the second thread groove portion, a slit portion extending perpendicularly to the first thread groove portion and the second thread groove portion, an adjustment nut having a first thread portion coupled to the first thread groove portion and having a first thread portion and having a second thread portion smaller than the first thread portion, and a fixing bolt having a first connection portion coupled to the second thread groove portion, a connection portion contacting an inlet of the second thread groove portion, and a second connection portion coupled to the second thread portion.
In some exemplary embodiments, the plurality of gap adjustment portions may be disposed at substantially regular intervals along a length direction of the slit nozzle.
In some exemplary embodiments, each of the gap adjustment portions is capable of adjusting the gap of the discharge portion using a pitch difference between a first pitch of a first threaded portion of the adjustment nut and a second pitch of a second threaded portion of the adjustment nut.
Technical effects
According to an exemplary embodiment of the present invention, the gap of the discharge portion can be adjusted by the gap adjusting portion of the slit nozzle, and deformation of the gap of the discharge portion can be prevented or minimized, so that the chemical solution can be uniformly discharged from the slit nozzle onto the entire substrate. Therefore, a desired fine pattern can be accurately formed on the entire substrate by the chemical liquid coating apparatus, and reliability of a recent display apparatus having such a fine pattern can be improved.
However, the effects of the present invention are not limited to the above effects, and various expansions can be made without departing from the spirit and scope of the present invention.
Drawings
Fig. 1 is a schematic perspective view of a slit nozzle for explaining an exemplary embodiment of the present invention;
fig. 2 is a sectional view of a portion a of fig. 1 enlarged to illustrate a gap adjusting portion included in the slit nozzle of fig. 1;
fig. 3 is an enlarged sectional view for explaining a fixing bolt included in the gap adjusting portion of fig. 2;
fig. 4 is an enlarged cross-sectional view for explaining a load applied when the gap of the discharge portion is adjusted by the gap adjustment portion of fig. 2;
fig. 5 is an enlarged cross-sectional view for explaining a load applied when the gap of the discharge portion is adjusted by the conventional gap adjustment portion;
fig. 6 is a graph showing the amount of displacement of the gap of the discharge portion by the gap adjustment portion of fig. 4 and the gap adjustment portion of fig. 5;
fig. 7 is a schematic cross-sectional view for explaining a chemical liquid coating apparatus according to an exemplary embodiment of the present invention.
Detailed Description
The following describes exemplary embodiments of the present invention, but the present invention is capable of various modifications and various forms, and the embodiments are described in detail in this specification. It is not intended to limit the invention to the particular form disclosed, but it is to be understood that the invention is to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. Like reference numerals are used to denote like elements throughout the various figures. The terms first, second, etc. may be used to describe various elements, but the elements should not be limited by the terms. The terms are used merely to distinguish one component from other components. The terminology used in the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. Singular forms "a", "an" and "the" include plural referents unless the context clearly dictates otherwise. The terms "comprises," "comprising," "including," "includes," "including," "having," "forming," and the like, are to be construed as excluding the existence of features, numbers, steps, actions, components, elements, or combinations thereof recited in the specification, but are not to be construed as excluding the existence or additional possibilities of one or more other features, numbers, steps, actions, components, elements, or combinations thereof.
Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms defined in a dictionary generally used should be interpreted as meaning consistent with the context of the related art, and should not be interpreted in an ideal or excessively formal sense unless explicitly defined herein.
Exemplary embodiments of the present invention are described below with reference to the accompanying drawings.
Fig. 1 is a schematic perspective view of a slit nozzle for explaining an exemplary embodiment of the present invention.
Referring to fig. 1, a slit nozzle 100 according to an exemplary embodiment may be suitable for providing a liquid medicine or fluid onto a substrate when manufacturing a display device such as an organic light emitting display device. For example, the slit nozzle 100 may be used for a process of supplying a liquid such as a photoresist or a chemical such as a developing solution onto a substrate when performing a photo etching process to form a desired pattern on the substrate.
In an exemplary embodiment, the slit nozzle 100 may include a body portion 11, a discharge portion 15, and a gap adjustment portion 17.
The fluid or the chemical solution may be supplied from the slit nozzle 100 onto the substrate in a scanning manner along a width direction of the substrate, which is a direction substantially perpendicular to a transfer direction in which the substrate is transferred. Accordingly, the body portion 11 of the slit nozzle 100 may substantially correspond to the length of the substrate in the width direction of the substrate.
The interior of the body portion 11 may include a flow path 13 through which the fluid or the chemical solution supplied onto the substrate can flow. In this case, the flow path 13 of the body portion 11 may be connected to a chemical liquid supply member (not shown) capable of supplying the fluid or the chemical liquid to the inside of the body portion 11.
In an exemplary embodiment, the body portion 11 may have two parts, for example, a first body portion and a second body portion combined with each other. Here, the body portion 11 may be formed by joining the first body portion and the second body portion with a joining member 19. For example, the coupling member 19 may include a screw, a rivet, or the like.
The discharge portion 15 can supply the chemical liquid flowing through the flow path 13 of the body portion 11 onto the substrate. The discharge portion 15 may be located at an end of the body portion 11 to substantially face the substrate. The spouting portion 15 can be spouted from the end portion of the body portion 11. For example, the spouting portion 15 may have a substantially sharp structure spouted from the end of the body portion 11 so as to substantially face the substrate.
In the process of supplying the chemical solution onto the substrate using the slit nozzle 100, if the chemical solution is not uniformly discharged onto the entire substrate, a desired pattern may not be precisely formed on the substrate. Therefore, the chemical solution needs to be uniformly discharged from the slit nozzle 100 over the entire substrate along the longitudinal direction of the slit nozzle 100. For this reason, the gap adjusting portion 17 of the slit nozzle 100 can adjust the gap of the discharge portion 15. In some exemplary embodiments, the slit nozzle 100 may include a plurality of gap adjustment portions 17 that may be disposed at substantially intervals along a length direction of the slit nozzle 100. In this case, the gap adjusting portion 17 can uniformly adjust the gap of the discharge portion 15 at a constant interval.
Hereinafter, the gap adjusting portion 17 included in the slit nozzle 100 according to the exemplary embodiment is described with reference to the accompanying drawings.
Fig. 2 is a sectional view of the portion 'a' of fig. 1 enlarged to illustrate the gap adjusting portion 17 included in the slit nozzle 100. Fig. 3 is an enlarged sectional view for explaining the fixing bolt 35 included in the gap adjusting portion 17 of fig. 2.
Referring to fig. 2 and 3, each of the gap adjusting parts 17 may include a screw groove part 21, a slit part (slit part) 27, an adjusting nut 29, and the fixing bolt 35.
The thread groove portion 21 may have a groove structure toward the discharge portion 15. Here, the side of the thread groove part 21 may be formed with a thread groove. For example, the thread groove portion 21 may not substantially contact the discharge portion 15.
The thread groove portion 21 may be extended from one side of the body portion 11 toward the inside of the body portion 11. In this case, the thread groove portion 21 may be inclined from one side of the body portion 11 toward the inside of the body portion 11. For example, the thread groove portion 21 may be elongated at a predetermined inclination angle from the right side of the body portion 11 toward the inside of the body portion 11. Alternatively, the thread groove portion 21 may be elongated at the predetermined inclination angle from the left side of the body portion 11 toward the inside of the body portion 11.
In an exemplary embodiment, the thread groove portion 21 may include a first thread groove portion 23 and a second thread groove portion 25. The first thread groove portion 23 and the second thread groove portion 25 may communicate with each other.
As illustrated in fig. 2, the first thread groove portion 23 may be extended from one side of the body portion 11 toward the inside of the body portion 11, and the second thread groove portion 25 may be extended from the inside of the body portion 11 toward the discharge portion 15. That is, the first thread groove portion 23 may be inclined from one side of the body portion 11 to the inside of the body portion 11 at the predetermined inclination angle, and the second thread groove portion 25 may be inclined from the inside of the body portion 11 to the discharge portion 15 at the predetermined inclination angle.
The first thread groove portion 23 may have a first diameter and the second thread groove portion 25 may have a second diameter substantially different from the first diameter. For example, the first diameter of the first thread groove section 23 may be substantially larger than the second diameter of the second thread groove section 25. That is, the thread groove portion 21 may be constituted by the first thread groove portion 23 having a relatively large first diameter extending from one side of the body portion 11 toward the inside of the body portion 11 and the second thread groove portion 25 having a relatively small second diameter extending from the inside of the body portion 11 toward the spouting portion 15.
The slit portion 27 may be located between the first thread groove portion 23 and the second thread groove portion 25. The slit portion 27 may extend from one side of the body portion 11 toward the inside of the body portion 11. For example, the slit portion 27 may have a groove structure from one side of the body portion 11 toward the inside of the body portion 11.
In an exemplary embodiment, the slit portion 27 may be elongated in a direction substantially perpendicular to the thread groove portion 21. For example, the thread groove portion 21 may extend from the left side or the right side of the body portion 11 toward the inside of the body portion 11, and thus the slit portion 27 may extend from the upper side or the lower side of the body portion 11 toward the inside of the body portion 11 in a direction substantially perpendicular to the thread groove portion 21. Accordingly, the slit portion 27 can be elongated between the first thread groove portion 23 and the second thread groove portion 25 in a direction substantially perpendicular to the first thread groove portion 23 and the second thread groove portion 25.
The adjustment nut 29 may be coupled to the first thread groove part 23. In an exemplary embodiment, the adjustment nut 29 may include a first threaded portion 31 capable of being coupled to the first threaded groove portion 23. The adjustment nut 29 may have a structure into which the fixing bolt 35 can be inserted. For this, the adjustment nut 29 may include a second threaded portion 33 capable of being coupled to the fixing bolt 35. Here, the second screw part 33 may have a diameter substantially smaller than that of the first screw part 31.
In an exemplary embodiment, the first threaded portion 31 of the adjustment nut 29 may have a first thread pitch and the second threaded portion 33 of the adjustment nut 29 may have a second thread pitch. Here, the first pitch of the first thread portion 31 may be substantially greater than the second pitch of the second thread portion 33.
As illustrated in fig. 3, the fixing bolt 35 may include a first coupling portion 37, a coupling portion 41, and a second coupling portion 39. In an exemplary embodiment, the first and second coupling parts 37 and 39 of the fixing bolt 35 may have a thread shape, respectively, and the coupling part 41 of the fixing bolt 35 may have a substantially flat surface instead of the thread shape. That is, the fixing bolt 35 is not an integral screw structure, but may have a structure including an upper screw structure portion (the second coupling portion 39), a substantially flat central portion (the connecting portion 41), and a lower screw portion (the first coupling portion 37).
The first coupling portion 37 of the fixing bolt 35 can be coupled to the second screw groove portion 25, and the second coupling portion 39 of the fixing bolt 35 can be coupled to the second screw portion 33 of the adjusting nut 29. Here, the first coupling portion 37 may have substantially the same diameter as the second coupling portion 39, and the second thread groove portion 25 of the thread groove portion 21 may have substantially the same diameter as the second thread portion 33 of the adjustment nut 29.
The connecting portion 41 of the fixing bolt 35 can be adjacent to the slit portion 27 in the case where the first connecting portion 37 of the fixing bolt 35 is coupled to the second screw groove portion 25 and the second connecting portion 39 of the fixing bolt 35 is coupled to the second screw portion 33 of the adjusting nut 29. For example, the connection portion 41 can contact the inlet of the second thread groove portion 25.
In an exemplary embodiment, in a case where the first coupling portion 37 is coupled to the second thread groove portion 25, the first coupling portion 37 can be spaced apart from an end of the second thread groove portion 25 by a predetermined interval. For this, the first coupling portion 37 may have a length relatively shorter than the depth of the second thread groove portion 25.
The connection portion 41 of the fixing bolt 35 can contact the inlet of the second screw groove portion 25 so that the connection portion 41 of the fixing bolt 35 can pressurize the inlet of the second screw groove portion 25. In some exemplary embodiments, the connection portion 41 of the fixing bolt 35 can adjust the gap of the discharge portion 15. Also, the connection portion 41 of the fixing bolt 35 can be located at the slit portion 27 and can contact the entrance of the second thread groove portion 25, and thus the connection portion 41 of the fixing bolt 35 can have a length substantially shorter than the length of the slit portion 27 in the width direction.
In an exemplary embodiment, the gap adjusting portion 17 is capable of adjusting the gap of the discharge portion 15 using a differential bolt principle. For example, the gap adjusting portion 17 can adjust the gap of the discharge portion 15 by using a pitch difference between the first pitch of the first screw portion 31 of the adjustment nut 29 and the second pitch of the second screw portion 33 of the adjustment nut 29. In this case, the clearance of the discharge portion 15 can be accurately controlled in response to the minute forward movement and minute backward movement of the fixing bolt 35 during the rotation of the adjustment nut 29. Also, the first coupling portion 37 of the fixing bolt 35 may have a length substantially shorter than the depth of the second thread groove portion 25, and thus in the case of coupling the first coupling portion 37 to the second thread groove portion 25, the first coupling portion 37 can be spaced apart from the end of the second thread groove portion 25 by a predetermined interval.
In the case where a predetermined torque is applied by the movement of the fixing bolt 35 in order to adjust the clearance of the discharge portion 15, a load point (load point) caused by the torque can act in the vicinity of the inlet of the second thread groove portion 25 instead of in the vicinity of the discharge portion 15 adjacent to the end of the second thread groove portion 25. At this time, a compressive force rather than a tensile force can be applied near the entrance of the second thread groove part 25, and thus gap deformation of the discharge part 15 can be prevented or minimized.
As described above, when the gap of the discharge portion 15 is adjusted by the gap adjusting portions 17 arranged substantially at regular intervals along the longitudinal direction of the slit nozzle 100, the deformation of the gap of the discharge portion 15 can be prevented or minimized, and therefore the chemical solution can be uniformly discharged from the discharge portion 15 of the slit nozzle 100 onto the entire substrate.
Fig. 4 is an enlarged cross-sectional view for explaining the load applied when the gap of the discharge portion 15 is adjusted by the gap adjusting portion 17 of fig. 2. Fig. 5 is an enlarged cross-sectional view for explaining a load applied when the gap of the discharge portion is adjusted by the conventional gap adjusting portion 51. Fig. 6 is a graph showing the amount of displacement of the gap of the discharge portion 15 by the gap adjusting portion 17 of fig. 4 and the amount of displacement of the gap of the discharge portion by the gap adjusting portion 51 of fig. 5. In fig. 4 to 6, it was confirmed that the load applied when the gap of the discharge portion 15 was adjusted by the gap adjusting portion 17 according to the exemplary embodiment and the load applied when the gap of the discharge portion was adjusted by the existing gap adjusting portion 51.
Referring to fig. 4, it is confirmed that a load applied when the gap of the discharge portion 15 is adjusted by the gap adjustment portion 17 according to the exemplary embodiment is generated near the inlet of the second thread groove portion 25.
Referring to fig. 5, it was confirmed that the load applied when the gap of the discharge portion was adjusted by the conventional gap adjustment portion 51 was generated near the end of the second thread groove portion adjacent to the discharge portion.
Referring to fig. 6, a curve B represents the amount of displacement of the gap of the discharge portion 15 when the gap of the discharge portion 15 is adjusted by the gap adjusting portion 17 according to the exemplary embodiment, and a curve C represents the amount of displacement of the gap of the existing discharge portion when the gap of the existing discharge portion is adjusted by the existing gap adjusting portion 51. As shown in the curve B and the curve C, it can be seen that the amount of displacement of the gap of the discharge portion 15 according to the exemplary embodiment is considerably smaller than that of the conventional discharge portion. That is, in the case of adjusting the gap of the discharge portion 15 with the gap adjusting portion 17 according to the exemplary embodiment, as shown by the curve B, deformation of the gap of the discharge portion 15 can be prevented or minimized. As a result, the chemical solution can be uniformly supplied from the discharge portion 15 of the slit nozzle 100 to the entire substrate.
Hereinafter, a chemical liquid application device provided with a slit nozzle according to an exemplary embodiment will be described with reference to the accompanying drawings.
Fig. 7 is a schematic cross-sectional view for explaining a chemical liquid coating apparatus according to an exemplary embodiment of the present invention.
Referring to fig. 7, the chemical liquid coating apparatus 700 according to the exemplary embodiment may include a floating table 300, a transfer member 400, and a slit nozzle 100. In fig. 7, the slit nozzle 100 may be substantially the same as the slit nozzle 100 described with reference to fig. 1 to 3.
The substrate 200 can be lifted up from the upper portion of the lifting table 300. For example, the floating stage 300 may supply air to the bottom surface of the substrate 200, or may supply air and vacuum. Accordingly, the substrate 200 can float on the upper portion of the floating table 300. In some exemplary embodiments, the floating table 300 may supply only the air to the bottom surface of the substrate 200 in a region where the substrate 200 is transferred, and the floating table 300 may supply the air and the vacuum to the bottom surface of the substrate 200 at the same time in a region where the chemical solution is supplied to the substrate 200, so that the distance from the floating table 300 to the substrate 200 may be precisely adjusted.
The transfer member 400 may transfer the substrate 200 floating on the upper portion of the floating table 300 along the floating table 300. Although not shown, the transfer member 400 may be provided with a grip member for gripping one side or both sides of the substrate 200, a guide member for guiding movement of the grip member along the floating table 300, and a driving member for driving the grip member and the guide member. For example, the holding member can hold the substrate 200 and simultaneously transfer the substrate 200 along the guide member.
As described above, the gap of the discharge portion 15 can be adjusted by the gap adjusting portion 17 of the slit nozzle 100, and the deformation of the gap of the discharge portion 15 can be prevented or minimized, so that the chemical solution can be uniformly discharged from the slit nozzle 100 onto the entire substrate 200. Therefore, the desired fine pattern can be formed on the entire substrate 200 accurately by the chemical liquid coating apparatus 700, and reliability of the recent display devices such as OLED and QLED having such fine pattern can be improved.
While the illustrative embodiments of the invention have been described, it will be understood by those skilled in the art that various changes and modifications may be made therein without departing from the spirit and scope of the invention as set forth in the following claims.

Claims (19)

1. A slit nozzle, comprising:
a body portion having a flow path for a flow of a medical fluid;
a discharge portion for discharging the chemical liquid flowing through the flow path of the main body portion onto the substrate; and
a gap adjusting portion for adjusting a gap of the discharge portion,
wherein the gap adjusting portion includes:
a thread groove portion having a first thread groove portion extending from one side of the body portion toward the inside of the body portion and a second thread groove portion extending from the inside of the body portion toward the discharge portion;
a slit portion located between the first thread groove portion and the second thread groove portion;
an adjustment nut having a first threaded portion and a second threaded portion coupled to the first threaded portion; and
a fixing bolt having a first coupling portion coupled to the second thread groove portion, a connecting portion, and a second coupling portion coupled to the second thread portion,
the second threaded portion of the adjustment nut has a smaller pitch than the first threaded portion.
2. The slit nozzle of claim 1, wherein:
the body portion corresponds to a length of the substrate in a width direction.
3. The slit nozzle of claim 1, wherein:
the first thread groove portion and the second thread groove portion of the thread groove portion communicate with each other.
4. A slit nozzle as claimed in claim 3, wherein:
the second thread groove portion of the thread groove portion has a diameter smaller than a diameter of the first thread groove portion of the thread groove portion.
5. A slit nozzle as claimed in claim 3, wherein:
the slit portion is extended to be perpendicular to the first thread groove portion of the thread groove portion and the second thread groove portion of the thread groove portion.
6. The slit nozzle of claim 1, wherein:
the connecting portion of the fixing bolt contacts an inlet of the second thread groove portion of the thread groove portion.
7. The slit nozzle of claim 1, wherein:
the gap adjusting portion is disposed in a longitudinal direction of the body portion.
8. The slit nozzle of claim 1, wherein:
the connection portion of the fixing bolt adjusts a gap of the discharge portion.
9. The slit nozzle of claim 8, wherein:
the connecting portion of the fixing bolt has a length shorter than a length of the slit portion in a width direction.
10. The slit nozzle of claim 1, wherein:
the gap adjusting portion adjusts the gap of the discharge portion using a pitch difference between a pitch of the first threaded portion of the adjustment nut and a pitch of the second threaded portion of the adjustment nut.
11. The slit nozzle of claim 10, wherein:
the clearance of the discharge portion is controlled by the forward movement and the backward movement of the fixing bolt.
12. A slit nozzle, comprising:
a body portion having a flow path for flowing a chemical solution, corresponding to a length of the substrate in a width direction;
a discharge portion for discharging the chemical liquid flowing through the flow path of the main body portion onto the substrate; and
a plurality of gap adjusting portions for adjusting the gap of the discharge portion,
wherein each of the gap adjustment sections includes:
a screw groove portion having a first screw groove portion extending from one side of the body portion toward an inner side of the body portion and a second screw groove portion extending from an inner side of the body portion toward the discharge portion and communicating with the first screw groove portion;
a slit portion located between the first thread groove portion and the second thread groove portion, and extending perpendicularly to the first thread groove portion and the second thread groove portion;
an adjustment nut having a first threaded portion coupled to the first threaded groove portion and having a first thread pitch and a second threaded portion having a second thread pitch less than the first thread pitch; and
and a fixing bolt having a first coupling portion coupled to the second thread groove portion, a coupling portion contacting an inlet of the second thread groove portion, and a second coupling portion coupled to the second thread portion.
13. The slit nozzle of claim 12, wherein:
the plurality of gap adjustment portions are arranged at regular intervals along a longitudinal direction of the slit nozzle.
14. The slit nozzle of claim 12, wherein:
each of the gap adjustment portions adjusts the gap of the discharge portion using a pitch difference between a first pitch of the first threaded portion of the adjustment nut and a second pitch of the second threaded portion of the adjustment nut.
15. The slit nozzle of claim 14, wherein:
the clearance of the discharge portion is adjusted as the fixing bolt moves forward and backward.
16. The slit nozzle of claim 14, wherein:
the first coupling portion of the fixing bolt has a length shorter than a depth of the second thread groove portion of the thread groove portion.
17. A medical fluid coating apparatus, characterized by comprising:
a floating table for floating the substrate;
a transfer member for transferring the substrate on the floating table;
a slit nozzle for discharging a chemical solution onto the substrate,
wherein the slit nozzle comprises:
a main body portion having a flow path for the chemical solution to flow, the main body portion having a length in a width direction of the substrate;
a discharge portion for discharging the chemical liquid flowing through the flow path of the main body portion onto the substrate; and
a plurality of gap adjusting portions for adjusting the gap of the discharge portion,
each of the gap adjustment portions includes:
a screw groove portion having a first screw groove portion extending from one side of the body portion toward an inner side of the body portion and a second screw groove portion extending from an inner side of the body portion toward the discharge portion and communicating with the first screw groove portion;
a slit portion located between the first thread groove portion and the second thread groove portion, and extending perpendicularly to the first thread groove portion and the second thread groove portion;
an adjustment nut having a first threaded portion coupled to the first threaded groove portion and having a first thread pitch and a second threaded portion having a second thread pitch less than the first thread pitch; and
and a fixing bolt having a first coupling portion coupled to the second thread groove portion, a coupling portion contacting an inlet of the second thread groove portion, and a second coupling portion coupled to the second thread portion.
18. The medical fluid application device of claim 17, wherein:
the plurality of gap adjustment portions are arranged at regular intervals along a longitudinal direction of the slit nozzle.
19. The medical fluid application device of claim 17, wherein:
each of the gap adjustment portions adjusts the gap of the discharge portion using a pitch difference between a first pitch of the first threaded portion of the adjustment nut and a second pitch of the second threaded portion of the adjustment nut.
CN202010736335.5A 2019-07-30 2020-07-28 Slit nozzle and chemical liquid coating device comprising same Active CN112295840B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020190092389A KR102317671B1 (en) 2019-07-30 2019-07-30 Slit nozzle and apparatus for dispensing droplet
KR10-2019-0092389 2019-07-30

Publications (2)

Publication Number Publication Date
CN112295840A CN112295840A (en) 2021-02-02
CN112295840B true CN112295840B (en) 2023-08-01

Family

ID=74484036

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010736335.5A Active CN112295840B (en) 2019-07-30 2020-07-28 Slit nozzle and chemical liquid coating device comprising same

Country Status (2)

Country Link
KR (1) KR102317671B1 (en)
CN (1) CN112295840B (en)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100858889B1 (en) * 2003-03-03 2008-09-17 도레이 가부시끼가이샤 Slit die, and method and device for producing base material with coating film
JP3977308B2 (en) * 2003-09-26 2007-09-19 シャープ株式会社 Slit nozzle
JP4752275B2 (en) * 2005-01-27 2011-08-17 凸版印刷株式会社 Coating device
KR100739477B1 (en) * 2005-06-21 2007-07-13 세메스 주식회사 Slit nozzles used to manufacture flat panel displays
JP2008296078A (en) * 2007-05-29 2008-12-11 Dainippon Screen Mfg Co Ltd Slit nozzle and substrate treatment apparatus
KR101064169B1 (en) * 2009-05-19 2011-09-15 주식회사 나래나노텍 Improved gap adjusting device for slit die and slit die and coating device with the same
KR101071583B1 (en) * 2009-08-21 2011-10-10 주식회사 케이씨텍 Inline type substrate coater apparatus
KR101506697B1 (en) 2013-08-30 2015-03-27 추승준 A glasses frame possible to adjust of the nose pad
JP6338140B2 (en) 2014-02-26 2018-06-06 オイレス工業株式会社 Separation distance adjustment mechanism and conveyance device
KR101652481B1 (en) * 2015-05-08 2016-08-30 남지영 chemical coating apparatus using double slit nozzle
KR20180027066A (en) * 2016-09-06 2018-03-14 주식회사 케이씨텍 Apparatus for measuring the nozzle gap of slit nozzle
KR20180039819A (en) * 2016-10-11 2018-04-19 주식회사 케이씨텍 Slit Nozzle

Also Published As

Publication number Publication date
KR102317671B1 (en) 2021-10-26
CN112295840A (en) 2021-02-02
KR20210014387A (en) 2021-02-09

Similar Documents

Publication Publication Date Title
EP1770771A2 (en) Substrate transfer apparatus
CN110349904B (en) Work table for floating substrate, substrate processing apparatus and substrate processing method
US7326300B2 (en) Coating apparatus and method using the same
CN111545381B (en) Coating device and coating method
CN108325788B (en) Coating device and coating method
CN112295840B (en) Slit nozzle and chemical liquid coating device comprising same
US20240059064A1 (en) Electrohydrodynamic print head with ink pinning
JP4960191B2 (en) Electronic component mounting method and apparatus
US8770719B2 (en) Liquid discharge head
US20180376600A1 (en) Fluid discharge device and method for discharging fluid
JP6860357B2 (en) Coating device and coating method
JP2020044522A (en) Slit nozzle and substrate processing equipment
JP7330233B2 (en) SLIT NOZZLE, SLIT NOZZLE ADJUSTMENT METHOD, AND SUBSTRATE PROCESSING APPARATUS
KR20160038245A (en) Floating coater apparatus with high accuracy of substrate alignment
KR102335726B1 (en) Mixed fluid dispensing apparatus equipped with temperature reduction preventing function
US8979248B2 (en) Ink-jet apparatus
US11766765B2 (en) Substrate treatment apparatus
KR20140071039A (en) Substrate treating apparatus
KR20210114350A (en) Slit nozzle and substrate processing apparatus
KR101856197B1 (en) Apparatus for providing chemical liquid
US7586118B2 (en) Micro device and manufacturing method thereof
KR102326115B1 (en) Coating apparatus and coating method
TWI494978B (en) Processing module for single-row processing substrate
KR102297312B1 (en) Apparatus for floating substrate and apparatus for processing substrate having the same
CN109148344B (en) Transfer guide assembly and substrate transfer device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant