CN112309822B - Ion probe mass spectrometer and imaging method thereof - Google Patents

Abstract

The embodiment of the specification provides an ion probe mass spectrometer and an imaging method thereof. Specifically, the ion probe mass spectrometer includes: a compression deflection plate configured to compress a secondary ion beam generated by scanning and bombarding a sample with a primary ion beam in time series by applying a first voltage; a mass spectrometer configured to analyze the compressed secondary ion beam; a decompression deflection plate configured to decompress secondary ion beams passing through the mass spectrometer in time series by applying a second voltage; wherein the first voltage and the second voltage have the same frequency; and an imaging component configured to acquire a secondary ion beam image decompressed by the decompression deflection plate. Through the technical scheme, on the basis of an ion microscope mode, the improvement of the mass resolution is realized through the compression and decompression of the secondary ion beam, meanwhile, the point-to-point microscopic function can be met, and the imaging efficiency is high.

Description

Ion probe mass spectrometer and imaging method thereof

technical field

One or more embodiments of this specification relate to the field of detection technology, and in particular, to an ion probe mass spectrometer and an imaging method thereof.

Background technique

Secondary ion mass spectrometry (Secondary Ion Mass Spectrometry, SIMS for short) or ion probe (Ion probe) is an advanced method for in situ micro-area analysis. After the accelerated primary ion beam is focused and bombarded on the surface of the sample to be tested, the components on the surface of the sample are sputtered, and some atoms, molecules and atomic groups are ionized, that is, secondary ions, which enter the mass spectrometer for analysis after the surface of the sample is accelerated by high pressure , to obtain the element and isotope information of the sample in the micro area.

Using a large (5-30μm) primary ion beam as the excitation source, a set of ion optical lenses can directly image the secondary ions generated on the surface of the sample through a point-to-point microscopy function. This imaging method is called ion microscopy. model. Using the ion microscope mode, the intensity of the primary ion beam can be guaranteed, and it has the advantages of strong signal and high imaging efficiency. However, the secondary ion beam generated based on the larger primary ion beam scanning still has a larger diameter at the ion convergence, resulting in reduced mass resolution and inability to effectively distinguish ions with different mass/charge ratios, especially for some special samples and Special elements are prone to signal mixing and cannot give an accurate sample distribution.

SUMMARY OF THE INVENTION

In view of this, the purpose of one or more embodiments of this specification is to propose an ion probe mass spectrometer and an imaging method thereof, so as to solve the problem that the mass resolution in the ion microscope mode in the prior art is low, and different masses/charges cannot be effectively distinguished. Ratio of ions to technical issues.

Based on the above purpose, the first aspect of this specification provides an ion probe mass spectrometer, which specifically includes:

a compression deflector, configured to compress the sample through the primary ion beam scanning and bombarding the secondary ion beam generated by applying the first voltage in time series;

a mass spectrometer configured to analyze the compressed secondary ion beam;

a decompression deflection plate configured to decompress the secondary ion beam passing through the mass spectrometer in time by applying a second voltage; wherein the frequency of the first voltage and the second voltage are the same; and

An imaging assembly configured to acquire an image of the secondary ion beam decompressed by the decompression deflector.

Further, the compression deflecting plate is arranged at the secondary ion convergence position in the secondary ion beam optical path.

Further, it also includes:

A converging lens, disposed between the mass spectrometer and the decompression deflector, is configured to converge the secondary ion beam passing through the mass spectrometer to the decompression deflector.

Further, it also includes:

A scanning deflection plate configured to apply a third voltage to the primary ion beam to cause the primary ion beam to scan the sample.

A second aspect of the present specification further provides an imaging method for an ion probe mass spectrometer, wherein the ion probe mass spectrometer includes a compression deflection plate, a mass spectrometer, a decompression deflection plate, and an imaging assembly;

The imaging method specifically includes:

Applying a first voltage in time sequence to the secondary ion beam generated by the primary ion beam scanning and bombarding the sample by compressing the deflection plate;

The secondary ion beam passing through the compressed deflection plate is analyzed by mass spectrometer;

A second voltage is sequentially applied to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate; wherein the frequencies of the first voltage and the second voltage are the same.

The image of the secondary ion beam decompressed by the decompression deflector is acquired by an imaging assembly.

Further, the ion probe mass spectrometer further includes a converging lens;

The imaging method further includes:

The secondary ion beam passing through the mass spectrometer is focused to the decompression deflector by the focusing lens.

Further, the ion probe mass spectrometer further includes a scanning deflection plate;

Before the step of applying the first voltage to the secondary ion beam generated by the primary ion beam scanning and bombardment of the sample by compressing the deflection plate in time series, the imaging method further includes:

A third voltage is applied to the primary ion beam through the scanning deflection plate so that the primary ion beam scans the sample.

Further, the frequencies of the first voltage, the second voltage and the third voltage are the same.

Further, the step of applying the second voltage in time sequence to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate includes:

The delayed phase of the second voltage relative to the first voltage is determined according to the time-of-flight of the secondary ion beam passing through the compressed deflection plate in the mass spectrometer.

Further, the step of applying the second voltage in time sequence to the secondary ion beam passing through the mass spectrometer by decompressing the deflection plate includes:

The magnitude of the second voltage is determined according to a preset magnification of the secondary ion beam image.

It can be seen from the above that one or more embodiments of the present specification provide an ion probe mass spectrometer and an imaging method thereof, wherein the ion probe mass spectrometer includes a compression deflection plate and a decompression deflection plate. A first voltage is applied to the sample to compress the secondary ion beam generated by the primary ion beam scanning and bombardment in time sequence, so that the mass spectrometer can analyze the compressed secondary ion beam with a smaller diameter, thereby improving the mass resolution, Effectively distinguish ions of different mass/charge ratios; decompress the secondary ion beam passing through the mass spectrometer by applying a second voltage to the decompression deflector in time series, and the frequencies of the first voltage and the second voltage are the same, by This decompresses the compressed secondary ion beam with smaller diameter to restore its position property, and finally the imaging component can obtain the secondary ion beam image decompressed by the decompression deflection plate. Such a technical solution, on the basis of the ion microscope mode, realizes the improvement of mass resolution by compressing and decompressing the secondary ion beam, and at the same time, it can satisfy the point-to-point microscopy function, and has the advantage of high imaging efficiency.

Description of drawings

In order to more clearly illustrate one or more embodiments of the present specification or the technical solutions in the prior art, the following briefly introduces the accompanying drawings used in the description of the embodiments or the prior art. Obviously, in the following description The accompanying drawings are only one or more embodiments of the present specification, and for those of ordinary skill in the art, other drawings can also be obtained from these drawings without any creative effort.

FIG. 1 is a schematic diagram of the principle of reducing the resolution of a mass spectrometer according to one or more embodiments of the present specification;

FIG. 2 is a schematic partial structure diagram of an ion probe mass spectrometer provided by one or more embodiments of the present specification;

3 is a schematic diagram of the sequence of scanning a primary ion beam on a sample according to one or more embodiments of the present specification;

FIG. 4 is a schematic waveform diagram of a scan voltage provided by one or more embodiments of the present specification.

FIG. 5 is a schematic flowchart of an imaging method provided by one or more embodiments of the present specification.

Detailed ways

In order to make the objectives, technical solutions and advantages of the present disclosure clearer, the present disclosure will be further described in detail below with reference to the specific embodiments and the accompanying drawings.

It should be noted that, unless otherwise defined, the technical or scientific terms used in one or more embodiments of the present specification shall have the usual meanings understood by those with ordinary skill in the art to which this disclosure belongs. The terms "first," "second," and similar terms used in one or more embodiments of this specification do not denote any order, quantity, or importance, but are merely used to distinguish the various components. "Comprises" or "comprising" and similar words mean that the elements or things appearing before the word encompass the elements or things recited after the word and their equivalents, but do not exclude other elements or things. Words like "connected" or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "Down", "Left", "Right", etc. are only used to represent the relative positional relationship, and when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

For mass spectrometers, when other parameters are the same, the sharper and narrower the secondary ions are imaged at the convergence point, the higher the mass resolution. In the ion microscope mode, although a large (5-30μm) primary ion beam is used as the excitation source, the surface of the sample is usually more than 30μm; at this time, the sample is scanned at high speed by the primary ion beam. The speed is fast enough to achieve the purpose of covering a larger area at the same time with one ion beam. For example, taking a time point in the high-speed scanning, for example, the primary ion beam is located at the upper left corner of the sample at a time point, then the secondary ion beam is also emitted from this position at the same time. After the entire high-speed scanning period, the primary ion beam can Covers the entire sample surface and generates a secondary ion beam accordingly. Thus, the secondary ion beam generated by the sample is scanned and bombarded with position information, and after mass screening by the mass spectrometer, it can be directly used for imaging, so as to quickly complete the mass spectrometry analysis and secondary ion imaging of the sample.

Those skilled in the art can understand that in this way, the surface area of the sample determines that the secondary ion beam must have a larger diameter, so that the diameter of the secondary ion beam is still larger at the ion convergence point, and the larger the surface area of the sample, the larger the convergence point larger diameter. As shown in Figure 1, due to the increase in the diameter of the secondary ion beam, the spherical aberration of the ion optical system increases, resulting in blurring of the interface at the ion beam convergence. Due to the larger diameter, the boundary of the convergence point is blurred, which leads to a decrease in the mass resolution of the mass spectrometer, resulting in a decrease in the mass resolution, and it is impossible to effectively distinguish ions with different mass/charge ratios.

Thus, in a first aspect of the present specification, an ion probe mass spectrometer is provided. Specifically, as shown in Figure 2, the ion probe mass spectrometer includes:

The compression deflection plate 6 is configured to compress the secondary ion beam 4 generated by scanning the sample 5 through the primary ion beam and bombarding the sample 5 in time sequence by applying a first voltage;

a mass spectrometer configured to analyze the compressed secondary ion beam;

a decompression deflector 13 configured to decompress the secondary ion beam passing through the mass spectrometer in time sequence by applying a second voltage; wherein the frequency of the first voltage and the second voltage are the same; and

An imaging assembly configured to acquire an image of the secondary ion beam decompressed by the decompression deflector.

Here, it should be understood that since the primary ion beam scans different positions on the sample surface based on time sequence; correspondingly, the secondary ion beam emitted from different positions includes time sequence information. Thus, the first voltage changes according to the time sequence, so that the secondary ion beams emitted from different positions all return to the center of the optical axis. Thus, the secondary ion beam in the mass spectrometer is compressed, which maintains a high mass resolution, independent of the area to be imaged. At the same time, the second voltage changes according to the time sequence, and restores the secondary ion beam passing through the mass spectrometer to the position where it should be, so as to obtain the distribution image of elements and isotopes on the sample.

Here, the spatial resolution of the secondary ion beam image is not related to the diameter of the primary ion beam, but only to the optical path setting of the ion probe mass spectrometer. Exemplarily, the image of the secondary ion beam can achieve a spatial resolution of 1 micron. In addition, the mass resolution of the secondary ion beam is not affected by the image size, which means that the mass spectrometer can ensure accurate mass analysis of the secondary ion beam even if the sample surface is large.

It should be noted that, when the second voltage is not applied, the back-end equipment of the ion probe mass spectrometer is used to observe (such as an imaging component), and the image of the secondary ion beam at this time is similar to that of the primary ion beam without scanning. An image matching the size of the primary ion beam is obtained, and the timing information and position information included in the secondary ion beam cannot be reflected in the image.

It can be seen from the above that the ion probe mass spectrometer provided in this specification includes a compression deflection plate and a decompression deflection plate. The ion beam is compressed according to the time series, which enables the mass spectrometer to analyze the compressed secondary ion beam with smaller diameter, thereby improving the mass resolution and effectively distinguishing ions of different mass/charge ratios; The second voltage decompresses the secondary ion beam passing through the mass spectrometer and the frequencies of the first voltage and the second voltage are the same, thereby decompressing the compressed secondary ion beam with a smaller diameter in time to have The position property of , is restored, and finally the imaging assembly can obtain the secondary ion beam image decompressed by the decompression deflector. Such a technical solution, on the basis of the ion microscope mode, realizes the improvement of mass resolution by compressing and decompressing the secondary ion beam, and at the same time, it can satisfy the point-to-point microscopy function, and has the advantage of high imaging efficiency.

It should be understood that the primary ion beam (as indicated by reference numeral 1 in FIG. 2 ) in one or more embodiments of the present specification is formed by a primary ion emission system. The primary ion emission system belongs to the prior art and will not be described in detail here.

It should be noted that those skilled in the art can reasonably set the specific structures of the compression deflection plate 6 and the decompression deflection plate 13 according to the range and direction of the secondary ion beam 4 , which are not specifically limited here.

Exemplarily, the compression deflection plate 6 and the decompression deflection plate 13 respectively include two pairs of voltage plates, and the two pairs of voltage plates are perpendicular to each other. By arranging two pairs of voltage plates perpendicular to each other, the secondary ion beam can be effectively compressed in two directions perpendicular to each other, thereby reducing the diameter of the secondary ion beam. Such an arrangement has the advantages of simple structure and easy implementation.

Optionally, the amplitude of the first voltage can be determined by the following method: on the premise that the decompression voltage is not activated (that is, the decompression deflection plate 13 does not apply the second voltage), by observing the imaging For the image acquired by the component, the amplitude of the first voltage is adjusted until the size of the acquired image is the smallest.

In one or more embodiments of the present specification, the compression deflecting plate 6 is disposed at the secondary ion convergence point in the secondary ion beam optical path.

It should be noted that, in the optical path of the secondary ion beam 4 , the secondary ions converge multiple times. By arranging the compression deflecting plate 6 at the convergence, a better deflection effect can be obtained with a smaller voltage. For multiple convergence points, those skilled in the art can reasonably select one of them as the installation position of the compression deflection plate 6, which is not specifically limited here.

In one or more embodiments of the present specification, the mass spectrometer is selected from a dual focusing magnetic mass spectrometer.

Further, as shown in FIG. 2 , the mass spectrometer includes an electrostatic analyzer 9 and a sector magnetic field 10 . Wherein, the main optical axis 7 of the optical path of the secondary ion beam 4 passes through the entrance slit 8 and then enters the electrostatic analyzer 9 for energy focusing, and the ion beam converges at different positions according to the difference in the carried energy. The secondary ion beam, which is mass-screened by the ion beam through the fan-shaped magnetic field 10 , is emitted through the exit slit 11 .

It should be noted that the secondary ion beam passing through the compression deflector plate 6 is compressed to a smaller range and converged on the main optical axis 7, so as to better enter the mass spectrometer for analysis, and ensure that the mass spectrometer can The secondary ion beam was used for high-mass resolution analysis.

It should be noted that although the secondary ion beam passed through the mass spectrometer has undergone mass screening, the secondary ion beam is still a mixed ion beam.

Further, by applying a second voltage having an opposite direction to the first voltage to the decompression deflection plate 13, the position information carried by the mixed ion beam can be restored, effectively ensuring that the imaging component obtains an image of the secondary ion beam.

In one or more embodiments of this specification, referring to FIG. 2 , the imaging assembly includes an imaging lens 14 and an image receiver 15 . Through the cooperation of the imaging lens 14 and the image receiver 15, an image of the secondary ion beam passing through the decompression deflector 13 can be obtained, thereby realizing high-efficiency image analysis.

It can be seen from the above examples that the technical solution of this specification first uses a compression deflector to compress the secondary ion beam in a smaller range, thereby effectively improving the mass resolution in the ion microscope mode; The position information of the secondary ions is restored by decompressing the deflection plate to achieve high-efficiency image analysis. The technical solution of the present specification retains the advantages of ion microscope mode imaging while overcoming its disadvantage of losing mass resolution because the primary ion beam size is too large.

Further, the exit slit 11 corresponding to the mass spectrometer itself is the ion beam convergence point, and the subsequent ion beams will diverge.

Therefore, referring to FIG. 2, in one or more embodiments of the present specification, the ion probe mass spectrometer further includes: a converging lens 12 disposed between the mass spectrometer and the decompression deflection plate 13, which is It is configured to focus the secondary ion beam passing through the mass spectrometer to the decompression deflection plate 13 .

Through such a technical solution, a better decompression effect can be obtained by using a smaller voltage, which is beneficial to ensure that the imaging component obtains high-quality secondary ion imaging.

Optionally, the ion probe mass spectrometer further includes components such as a Faraday cup, a secondary electron multiplier tube, and the like. It should be understood that the arrangement of the components such as the Faraday cup, the secondary electron multiplier tube and the like belong to the prior art, and will not be described in detail here.

To facilitate a comprehensive analysis of the sample surface at one time, the ion probe mass spectrometer further includes: a scanning deflection plate 2 (see FIG. 2 ).

Further, the scanning deflection plate is configured to apply a third voltage to the primary ion beam to scan the sample with the primary ion beam.

Through such a technical solution, the primary ion beam can scan the surface of the sample 5 , thereby realizing a comprehensive analysis of the surface of the sample 5 .

Please refer to FIG. 2 , the primary ion beam is marked as 1 before entering the scanning deflection plate 2 , and marked as 3 after passing through the scanning deflection plate 2 . Those skilled in the art can understand that by applying different voltages to the scanning deflection plate 2, the position of the primary ion beam marked 3 on the surface of the sample 5 can be adjusted, thereby realizing the scanning.

Exemplarily, please refer to FIG. 3 , the primary ion beam is marked with 1, and the scanning paths of the primary ion beam in the XY directions on the sample 5 are shown as lines in FIG. 3 , and the arrows in the lines represent the primary ions direction of movement of the beam.

Optionally, as shown in FIG. 4 , the third voltage applied to the scanning deflection plate 2 is a sawtooth waveform. The line marked O is the reference voltage, so the third voltage is scanned from the negative electrode to the positive electrode.

3 and 4, it can be seen that the horizontal (X) scanning frequency is high, the vertical (Y) scanning frequency is low, and the horizontal scanning frequency should be an integer multiple of the vertical scanning frequency.

Optionally, in order to obtain a more uniform scanning effect, the horizontal scanning frequency should be more than 100 times the vertical frequency. Moreover, the vertical scanning frequency determines the refresh rate of the frame, so the vertical scanning frequency is greater than 10 Hz to obtain a more continuous scanning frequency. screen.

Optionally, the voltage amplitudes scanned in the XY directions are the same.

It should be noted that the first voltage can correspond to the scanning range of the primary ion beam, so as to ensure that all the secondary ion beams can be effectively compressed. It should be noted that the direction of the third voltage is opposite to that of the first voltage, and the frequency is the same. In this way, the secondary ions excited by the primary ion beam at a position far from the optical axis on the sample surface can pass through the first voltage. The deflection of the voltage back to the position of the optical axis, thereby achieving "compression".

Exemplarily, the diameter of the compressed secondary ion beam is the same as that of the primary ion beam, usually in the range of 20-30 μm. On these 20-30 μm scales, the ion beam still retains its positional information.

In a second aspect of the present specification, there is also provided an imaging method of an ion probe mass spectrometer. Specifically, the imaging method is applicable to an ion probe mass spectrometer including a compression deflector, a mass spectrometer, a decompression deflector, and an imaging assembly.

As shown in Figure 5, the imaging method specifically includes:

Step S501 : applying a first voltage in time sequence to the secondary ion beam generated by the primary ion beam scanning and bombardment of the sample by compressing the deflection plate. Here, the first voltage can compress the secondary ion beam, reduce the diameter of the secondary ion beam, avoid blurred boundaries of the secondary ion beam imaging, and improve the mass resolution of the mass spectrometer.

Step S502: Analyze the secondary ion beam passing through the compressed deflection plate by a mass spectrometer.

Step S503 : applying a second voltage to the secondary ion beam passing through the mass spectrometer in time sequence by decompressing the deflection plate; wherein, the frequencies of the first voltage and the second voltage are the same.

Through such a step, a second reverse voltage is applied to the secondary ion beam that has been screened by the mass spectrometer, so that the position information carried by the compressed secondary ion beam can be restored, and it is convenient for subsequent imaging components to directly obtain the secondary ion beam. 's image.

Step S504: Acquire an image of the secondary ion beam decompressed by the decompression deflector through an imaging component.

It can be seen that, through the imaging method of this embodiment, the first voltage is used to compress the secondary ion beam within a small range, thereby effectively improving the mass resolution in the ion microscope mode; after the secondary ion beam passes through mass screening Then, the position information of the secondary ions is restored by the second voltage in the opposite direction of the same frequency, so as to realize high-efficiency image analysis. The technical solution of the present specification retains the advantages of ion microscope mode imaging while overcoming its disadvantage of losing mass resolution because the primary ion beam size is too large.

In one or more embodiments of this specification, the ion probe mass spectrometer further includes a converging lens; the imaging method further includes:

The secondary ion beam passing through the mass spectrometer is focused to the decompression deflector by the focusing lens.

With such a technical solution, a better decompression effect can be obtained by using a smaller voltage, which is beneficial to ensure that the imaging component obtains high-quality secondary ion imaging.

In one or more embodiments of the present specification, the ion probe mass spectrometer further comprises a scanning deflection plate; the compressing the deflection plate applies a first ion beam to the sample by scanning the primary ion beam and bombarding the secondary ion beam in time series. Before the step of voltage, the imaging method further comprises:

A third voltage is applied to the primary ion beam through the scanning deflection plate so that the primary ion beam scans the sample.

With such a technical solution, the primary ion beam can scan the surface of the sample 5 , thereby realizing a comprehensive analysis of the surface of the sample 5 .

In one or more embodiments of the present specification, the frequencies of the first voltage, the second voltage and the third voltage are the same.

It should be noted that setting the frequencies of the first voltage, the second voltage and the third voltage to be the same is beneficial to ensure targeted compression and decompression of the secondary ion beam.

Exemplarily, the frequencies of the X and Y directions of the sawtooth wave of the first voltage applied to the compression deflection plate 6 and the second voltage applied to the decompression deflection plate 13 are respectively the same as the frequency of the first ion beam applied to the scanning deflection plate 2 of the primary ion beam. The frequencies in the X and Y directions are consistent, so as to achieve accurate compression and decompression time sequence.

At a high secondary ion beam speed, the time required for ions to fly from the compression deflector 6 to the decompression deflector 13 is very short, usually in nanoseconds, which can be ignored. At this time, the first voltage, the The second voltage and the third voltage may be scanned synchronously.

Time-of-flight compensation is required if the ion beam energy is low, or if the mass spectrometer is large in size and the ion time-of-flight is long. Therefore, in one or more embodiments of the present specification, the step of applying the second voltage to the secondary ion beam passing through the mass spectrometer in time series by decompressing the deflection plate includes:

The delayed phase of the second voltage relative to the first voltage is determined according to the time-of-flight of the secondary ion beam passing through the compressed deflection plate in the mass spectrometer.

In this way, targeted decompression of the compressed secondary ion beam can be achieved, so as to ensure that the position information possessed by the secondary ion beam can be effectively restored.

It should be noted that the flight time of the secondary ion beam in the mass spectrometer can be determined by those skilled in the art as required, including but not limited to the energy of the primary ion beam, the size of the mass spectrometer, and the like. This embodiment does not specifically limit this.

Exemplarily, if the flight time is t, the scanning frequency in the X direction is F _x , and the scanning frequency in the Y direction is F _y , the phases that need to be delayed in the XY directions are 2πtF _x and 2πtF _y , respectively.

In ion microscope mode, the magnification of secondary ion beam imaging is usually determined by the settings of the ion probe mass spectrometer. In one or more embodiments of the present specification, the step of applying the second voltage to the secondary ion beam passing through the mass spectrometer in time sequence by decompressing the deflection plate includes:

The magnitude of the second voltage is determined according to a preset magnification of the secondary ion beam image.

With such a technical solution, by controlling the magnitude of the second voltage, it is possible to adjust the offset size of the secondary ion beam, so as to meet the requirement of magnification and generate a clear ion image at the same time.

The foregoing describes specific embodiments of the present specification. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recited in the claims can be performed in an order different from that in the embodiments and still achieve desirable results. Additionally, the processes depicted in the figures do not necessarily require the particular order shown, or sequential order, to achieve desirable results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

It should be understood by those of ordinary skill in the art that the discussion of any of the above embodiments is only exemplary, and is not intended to imply that the scope of the present disclosure (including the claims) is limited to these examples; under the spirit of the present disclosure, the above embodiments or Technical features in different embodiments may also be combined, steps may be carried out in any order, and there are many other variations of the different aspects of one or more embodiments of this specification as described above, which are not in detail for the sake of brevity supply.

Although the present disclosure has been described in conjunction with specific embodiments thereof, many alternatives, modifications, and variations to these embodiments will be apparent to those of ordinary skill in the art from the foregoing description. For example, other memory architectures (eg, dynamic RAM (DRAM)) may use the discussed embodiments.

The embodiment or embodiments of this specification are intended to cover all such alternatives, modifications and variations that fall within the broad scope of the appended claims. Therefore, any omission, modification, equivalent replacement, improvement, etc. made within the spirit and principle of one or more embodiments of the present specification should be included within the protection scope of the present disclosure.

Claims (10)

1. An ion probe mass spectrometer, characterized in that, comprising: a compression deflector, configured to compress the sample through the primary ion beam scanning and bombarding the secondary ion beam generated by applying the first voltage in time series; a mass spectrometer configured to analyze the compressed secondary ion beam; a decompression deflection plate configured to decompress the secondary ion beam passing through the mass spectrometer in time by applying a second voltage; wherein the frequency of the first voltage and the second voltage are the same; and An imaging assembly configured to acquire an image of the secondary ion beam decompressed by the decompression deflector. 2 . The ion probe mass spectrometer according to claim 1 , wherein the compression deflecting plate is disposed at the secondary ion convergence point in the secondary ion beam optical path. 3 . 3. The ion probe mass spectrometer of claim 1, further comprising: A converging lens, disposed between the mass spectrometer and the decompression deflector, is configured to converge the secondary ion beam passing through the mass spectrometer to the decompression deflector. 4. The ion probe mass spectrometer of claim 1, further comprising: A scanning deflection plate configured to apply a third voltage to the primary ion beam to cause the primary ion beam to scan the sample. 5. An imaging method for an ion probe mass spectrometer, wherein the ion probe mass spectrometer comprises a compression deflection plate, a mass spectrometer, a decompression deflection plate and an imaging assembly; The imaging method specifically includes: Applying a first voltage in time sequence to the secondary ion beam generated by the primary ion beam scanning and bombarding the sample by compressing the deflection plate; The secondary ion beam passing through the compressed deflection plate is analyzed by mass spectrometer; A second voltage is applied to the secondary ion beam passing through the mass spectrometer in time sequence by decompressing the deflection plate; wherein, the frequencies of the first voltage and the second voltage are the same; The image of the secondary ion beam decompressed by the decompression deflector is acquired by an imaging component. 6. The imaging method according to claim 5, wherein the ion probe mass spectrometer further comprises a converging lens; The imaging method further includes: The secondary ion beam passing through the mass spectrometer is focused to the decompression deflector by the focusing lens. 7. The imaging method of claim 5, wherein the ion probe mass spectrometer further comprises a scanning deflection plate; Before the step of applying the first voltage to the secondary ion beam generated by the primary ion beam scanning and bombardment of the sample by compressing the deflection plate in a time sequence, the imaging method further includes: A third voltage is applied to the primary ion beam through the scanning deflection plate to cause the primary ion beam to scan the sample. 8. The imaging method according to claim 7, wherein the frequencies of the first voltage, the second voltage and the third voltage are the same. 9 . The imaging method according to claim 5 , wherein the step of applying the second voltage to the secondary ion beam passing through the mass spectrometer in time sequence by decompressing the deflection plate comprises: 10 . The delayed phase of the second voltage relative to the first voltage is determined according to the time-of-flight of the secondary ion beam passing through the compressed deflection plate in the mass spectrometer. 10 . The imaging method according to claim 5 , wherein the step of applying the second voltage to the secondary ion beam passing through the mass spectrometer in time sequence by decompressing the deflection plate comprises: 10 . The magnitude of the second voltage is determined according to a preset magnification of the secondary ion beam image.

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