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CN112542541A - Thermal power generation device and preparation method thereof - Google Patents

Thermal power generation device and preparation method thereof Download PDF

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Publication number
CN112542541A
CN112542541A CN202011358436.XA CN202011358436A CN112542541A CN 112542541 A CN112542541 A CN 112542541A CN 202011358436 A CN202011358436 A CN 202011358436A CN 112542541 A CN112542541 A CN 112542541A
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type semiconductor
flexible substrate
power generation
generation device
insulating film
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CN202011358436.XA
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李以贵
邱霁玄
王欢
张成功
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Shanghai Institute of Technology
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Shanghai Institute of Technology
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Publication of CN112542541A publication Critical patent/CN112542541A/en
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/10Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
    • H10N10/17Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects characterised by the structure or configuration of the cell or thermocouple forming the device
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/10Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photovoltaic Devices (AREA)

Abstract

The invention relates to a thermal power generation device and a preparation method thereof, wherein the device comprises a P-type semiconductor and an N-type semiconductor which are respectively doped on the two side surfaces of a flexible substrate, and a first flexible insulating film and a second flexible insulating film which encapsulate the flexible substrate, the P-type semiconductor and the N-type semiconductor form a P-N pair, lead-out wires are connected with the P-type semiconductor and the N-type semiconductor, the flexible substrate is wavy, and the P-type semiconductor and the N-type semiconductor are positioned on the peak ridge of the flexible substrate. Compared with the prior art, the method has the advantages of wider application range and strong flexibility.

Description

Thermal power generation device and preparation method thereof
Technical Field
The invention relates to the field of thermal power generation, in particular to a thermal power generation device and a preparation method thereof.
Background
Thermal power generation devices play a special role in modern technology and play an important role in life. The mobile phone, the solar energy, the air conditioner, the refrigerator, the wearable device and various intelligent products basically have temperature gradients in the using process, so the thermal power generation device has a great application prospect. When the application of the thermal power generation device is put on human body wearable equipment, the flexibility, the portability and the conversion efficiency become important research points.
At present, silicon is mostly used as a substrate, and the problems of small application range and small flexibility exist.
Disclosure of Invention
The present invention is directed to a thermal power generating apparatus and a method for manufacturing the same, which overcome the above-mentioned drawbacks of the prior art.
The purpose of the invention can be realized by the following technical scheme:
a thermal power generation device comprises a P-type semiconductor and an N-type semiconductor which are doped on the two side surfaces of a flexible substrate respectively, and a first flexible insulating film and a second flexible insulating film which encapsulate the flexible substrate, wherein the P-type semiconductor and the N-type semiconductor form a P-N pair, lead-out wires are connected with the P-type semiconductor and the N-type semiconductor, the flexible substrate is wavy, and the P-type semiconductor and the N-type semiconductor are located on the peak ridge of the flexible substrate.
The number of the P-type semiconductors is plural, the number of the N-type semiconductors is plural, the P-type semiconductors and the N-type semiconductors form a plurality of P-N pairs, the P-N pairs are connected in series, and the P-type semiconductors and the N-type semiconductors form gaps at peaks and valleys.
The plurality of P-type semiconductors and the plurality of N-type semiconductors are arranged at equal intervals along the ridges.
The P-type semiconductor is bismuth telluride doped with antimony, and the N-type semiconductor is bismuth telluride doped with selenium.
The flexible substrate is a polyimide flexible substrate.
The first flexible insulating film is a PDMS film, and the second flexible insulating film is a PDMS film.
And the first flexible insulating film and the second flexible insulating film encapsulate the flexible substrate through a hot-pressing process.
A method for producing the thermal power generation device, comprising the steps of:
s1: spin-coating photoresist positive glue on the surface of one side of the flexible substrate;
s2: covering a mask plate, and irradiating the flexible substrate by using ultraviolet light;
s3: prebaking the flexible substrate irradiated by the ultraviolet light, changing the characteristics of the photoresist to change the positive photoresist into the negative photoresist, and carrying out development operation;
s4: doping a P-type semiconductor on the surface of the flexible substrate after development;
s5: stripping the residual photoresist and the P-type semiconductor by using a lift-off process to obtain a primary structure;
s6: on the basis of the primary structure, turning over the mask plate, repeating the steps S1-S5, and doping an N-type semiconductor on the surface to form a P-N pair;
s7: the flexible substrate is waved through vacuum heat treatment;
s8: leading out wires to connect the P-type semiconductor and the N-type semiconductor;
s9: and packaging the flexible substrate by adopting the first flexible insulating film and the second flexible insulating film to obtain the thermal power generation device.
In S7, the flexible substrate is adhered to a carrier having a wave shape, and the flexible substrate is formed into a wave shape by vacuum heat treatment.
Compared with the prior art, the invention has the following advantages:
(1) the flexible substrate, the first flexible insulating film and the second flexible insulating film which encapsulate the flexible substrate are used, so that the whole thermal power generation device has a bendable type, is wider in application range, has less harsh environmental requirements, and can be installed on a free-form surface.
(2) The flexible substrate is wavy, the P-type semiconductor and the N-type semiconductor are located on the ridge of the flexible substrate, and the thermal power generation device has good folding performance and is convenient to carry due to the structure.
(3) The P-type semiconductor is formed by doping antimony into bismuth telluride, and the N-type semiconductor is formed by doping selenium into bismuth telluride, so that heat energy can be converted into electric energy to the maximum extent, the requirement of a low-power supply can be met, the size of the thermal power generation device can be reduced, and the flexibility is improved.
(4) The whole thermal power generation device is used as clean energy and has the advantages of no noise, no abrasion, no medium leakage, light weight and the like.
Drawings
FIG. 1 is a schematic structural view of the present invention;
reference numerals:
1 is a first flexible insulating film; 2 is a P-type semiconductor; 3 is an N-type semiconductor; 4 is a second flexible insulating film; 5 is a flexible substrate; and 6 is a lead-out wire.
Detailed Description
The invention is described in detail below with reference to the figures and specific embodiments. The present embodiment is implemented on the premise of the technical solution of the present invention, and a detailed implementation manner and a specific operation process are given, but the scope of the present invention is not limited to the following embodiments.
Examples
A thermal power generation device comprises a P-type semiconductor 2 and an N-type semiconductor 3 doped on one side surface of a flexible substrate 5, a first flexible insulating film 1 and a second flexible insulating film 4 for packaging the flexible substrate 5, wherein the P-type semiconductor 2 and the N-type semiconductor 3 are communicated to form a P-N pair, a lead wire 6 is connected with the P-type semiconductor 2 and the N-type semiconductor 3, the flexible substrate 5 is wavy, and the P-type semiconductor 2 and the N-type semiconductor 3 are positioned on the peak ridge of the flexible substrate 5, as shown in figure 1.
Specifically, the method comprises the following steps:
the number of the P-type semiconductors 2 is multiple, the number of the N-type semiconductors 3 is multiple, the P-type semiconductors 2 and the N-type semiconductors 3 form a plurality of P-N pairs, the P-N pairs are connected in series, the P-type semiconductors 2 and the N-type semiconductors 3 form gaps at peaks and valleys, and the P-type semiconductors 2 and the N-type semiconductors 3 are arranged at equal intervals along the peaks and the ridges.
The first flexible insulating film 1 is a PDMS film, the second flexible insulating film 4 is a PDMS film, and the first flexible insulating film 1 and the second flexible insulating film 4 encapsulate the flexible substrate 5 by a hot pressing process.
The flexible substrate 5 is a polyimide flexible substrate.
The P-type semiconductor 2 is bismuth telluride doped with antimony, and the N-type semiconductor 3 is bismuth telluride doped with selenium.
Structural size of the whole thermal power generation device: the length x width x height is 70x70x5 (mm), the Seebeck coefficient is 160mV/K, the resistivity of the bismuth telluride P-N pair is 3.12x10-5 omega m, and the adopted PDMS film is packaged to ensure that the thermal power generation device is even if the thermal power generation device is packaged by the PDMS filmThe material can not be broken under the curvature radius of 9 mm, the maximum output is about 1mW when the temperature difference is 10K, and the exchange power can reach 4.09x10-4η。
The embodiment also provides a preparation method of the thermal power generation device, which comprises the following steps:
s1: spin-coating photoresist positive photoresist AZ5214E on the flexible substrate 5;
s2: covering a mask plate, and irradiating the flexible substrate 5 by using ultraviolet light;
s3: prebaking the flexible substrate 5 irradiated by the ultraviolet light, changing the characteristics of the photoresist to change the positive photoresist into the negative photoresist, and carrying out development operation;
s4: after development, doping the P-type semiconductor 2 on the surface of the flexible substrate 5;
s5: stripping the residual photoresist and the P-type semiconductor 2 by using a lift-off process to obtain a primary structure;
s6: on the basis of the primary structure, rotating the mask plate by 180 degrees, repeating the steps S1-S5, and doping the N-type semiconductor 3 on the surface to form a P-N pair;
s7: array preparation is adopted, 1991 pairs of P-N pairs are formed, and 1991 pairs of P-N pairs are connected in series;
s8: adhering a flexible substrate 5 on a carrier plate in a waveform shape, and forming the flexible substrate 5 into a waveform shape through vacuum heat treatment;
s9: the lead-out wire 6 is connected with the P-type semiconductor 2 and the N-type semiconductor 3;
s9: the flexible substrate 5 is encapsulated with the first flexible insulating film 1 and the second flexible insulating film 4, and the thermal power generation device is obtained.
The working principle is as follows:
based on the Seebeck theory, because two homogeneous conductors with different components form a closed loop, a heat transfer component can be formed, when temperature gradients are formed on two surfaces of the PDMS packaging film, electromotive force can be generated between the PDMS packaging film and the PDMS packaging film, a lead is led out to generate current, the magnitude of the current is related to the homogeneous conductor material, is related to temperature difference and is unrelated to the length and the diameter of the flexible substrate, and the P-N pairs form thermocouples which can be used for measuring temperature and generating electricity. Therefore, the thermal power generation device can be used as a low-power supply and an energy supply device of small wearable equipment.

Claims (9)

1.一种热发电装置,其特征在于,包括分别掺杂于柔性基板(5)两侧表面的P型半导体(2)和N型半导体(3),以及封装柔性基板(5)的第一柔性绝缘膜(1)和第二柔性绝缘膜(4),P型半导体(2)和N型半导体(3)形成P-N对,引出导线(6)连接P型半导体(2)和N型半导体(3),所述柔性基板(5)呈波浪形,所述P型半导体(2)和N型半导体(3)位于柔性基板(5)的峰脊。1. A thermal power generation device, characterized in that it comprises a P-type semiconductor (2) and an N-type semiconductor (3) doped on both sides of a flexible substrate (5), respectively, and a first encapsulating flexible substrate (5) The flexible insulating film (1) and the second flexible insulating film (4), the P-type semiconductor (2) and the N-type semiconductor (3) form a P-N pair, and the lead wire (6) connects the P-type semiconductor (2) and the N-type semiconductor ( 3), the flexible substrate (5) is wavy, and the P-type semiconductor (2) and the N-type semiconductor (3) are located on the peak ridge of the flexible substrate (5). 2.根据权利要求1所述的一种热发电装置,其特征在于,所述P型半导体(2)有多个,所述N型半导体(3)有多个,多个所述P型半导体(2)与多个所述N型半导体(3)形成多个P-N对,多个所述P-N对串联,多个所述P型半导体(2)与多个所述N型半导体(3)在峰谷形成缝隙。2. A thermal power generation device according to claim 1, characterized in that there are a plurality of the P-type semiconductors (2), a plurality of the N-type semiconductors (3), and a plurality of the P-type semiconductors (2) forming a plurality of P-N pairs with a plurality of the N-type semiconductors (3), a plurality of the P-N pairs are connected in series, and a plurality of the P-type semiconductors (2) and the plurality of the N-type semiconductors (3) are connected The peaks and valleys form gaps. 3.根据权利要求2所述的一种热发电装置,其特征在于,多个所述P型半导体(2)与多个所述N型半导体(3)沿峰脊等间距间隔排列。3 . The thermal power generation device according to claim 2 , wherein a plurality of the P-type semiconductors ( 2 ) and a plurality of the N-type semiconductors ( 3 ) are arranged at equal intervals along the peak and ridge. 4 . 4.根据权利要求1所述的一种热发电装置,其特征在于,所述的P型半导体(2)为碲化铋掺杂锑,所述N型半导体(3)为碲化铋掺杂硒。4 . The thermal power generation device according to claim 1 , wherein the P-type semiconductor (2) is bismuth telluride doped with antimony, and the N-type semiconductor (3) is bismuth telluride doped. 5 . selenium. 5.根据权利要求1所述的一种热发电装置,其特征在于,所述的柔性基板(5)为聚酰亚胺柔性基板。5 . The thermal power generation device according to claim 1 , wherein the flexible substrate ( 5 ) is a polyimide flexible substrate. 6 . 6.根据权利要求1所述的一种热发电装置,其特征在于,所述的第一柔性绝缘膜(1)为PDMS膜,所述第二柔性绝缘膜(4)为PDMS膜。6 . The thermoelectric power generation device according to claim 1 , wherein the first flexible insulating film ( 1 ) is a PDMS film, and the second flexible insulating film ( 4 ) is a PDMS film. 7 . 7.根据权利要求7所述的一种热发电装置,其特征在于,所述的第一柔性绝缘膜(1)和第二柔性绝缘膜(4)通过热压工艺对柔性基板(5)进行封装。7 . The thermal power generation device according to claim 7 , wherein the first flexible insulating film ( 1 ) and the second flexible insulating film ( 4 ) are subjected to a hot pressing process on the flexible substrate ( 5 ). 8 . package. 8.一种权利要求1-7任一所述热发电装置的制备方法,其特征在于,该方法包括以下步骤:8. A method for preparing a thermal power generation device according to any one of claims 1-7, wherein the method comprises the following steps: S1:在柔性基板(5)一侧表面旋涂光刻胶正胶;S1: spin-coating positive photoresist on the surface of one side of the flexible substrate (5); S2:盖上掩膜板用紫外光照射柔性基板(5);S2: cover the mask plate and irradiate the flexible substrate (5) with ultraviolet light; S3:对紫外光照射后的柔性基板(5)进行前烘,改变光刻胶的特性使正胶变负胶,进行显影操作;S3: pre-baking the flexible substrate (5) irradiated with the ultraviolet light, changing the characteristics of the photoresist to make the positive photoresist become negative photoresist, and performing the developing operation; S4:显影后,在柔性基板(5)的表面掺杂P型半导体(2);S4: after developing, doping a P-type semiconductor (2) on the surface of the flexible substrate (5); S5:利用lift-off工艺对剩余的光刻胶和P型半导体(2)进行剥离,得到一次结构;S5: using the lift-off process to lift off the remaining photoresist and the P-type semiconductor (2) to obtain a primary structure; S6:在一次结构基础上,将掩膜板翻转,重复步骤S1-S5,表面掺杂N型半导体(3),形成P-N对;S6: On the basis of the primary structure, the mask plate is turned over, and steps S1-S5 are repeated, and the surface is doped with N-type semiconductor (3) to form a P-N pair; S7:通过真空热处理使柔性基板(5)成为波浪形;S7: the flexible substrate (5) is made into a wavy shape by vacuum heat treatment; S8:引出导线(6)连接P型半导体(2)和N型半导体(3);S8: the lead wire (6) is connected to the P-type semiconductor (2) and the N-type semiconductor (3); S9:采用第一柔性绝缘膜(1)和第二柔性绝缘膜(4)对柔性基板(5)进行封装,得到热发电装置。S9: encapsulating the flexible substrate (5) with the first flexible insulating film (1) and the second flexible insulating film (4) to obtain a thermoelectric power generation device. 9.根据权利要求8所述的一种制备方法,其特征在于,S7中将柔性基板(5)粘附在波形形状的载板上,通过真空热处理,使柔性基板(5)形成波浪形。9. A preparation method according to claim 8, characterized in that, in S7, the flexible substrate (5) is adhered to the carrier plate with a wave shape, and the flexible substrate (5) is formed into a wave shape by vacuum heat treatment.
CN202011358436.XA 2020-11-27 2020-11-27 Thermal power generation device and preparation method thereof Pending CN112542541A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114335314A (en) * 2021-12-30 2022-04-12 中国科学技术大学 P/n type thermoelectric film, preparation method thereof, wearable thermoelectric generator and application

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US20140318591A1 (en) * 2013-04-26 2014-10-30 Eastman Chemical Company Self-corrugating laminates useful in the manufacture of thermoelectric devices and corrugated structures therefrom
CN104538541A (en) * 2014-11-26 2015-04-22 辽宁师范大学 Novel carbon nanotube based organic composite thermoelectric material
CN107846157A (en) * 2017-10-11 2018-03-27 中国科学院上海硅酸盐研究所 Temperature difference electricity generation device

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WO1996015412A2 (en) * 1994-11-08 1996-05-23 Kavon V.O.S Cascade of thermoelectric couples
US6314741B1 (en) * 1997-08-25 2001-11-13 Citizen Watch Co., Ltd. Thermoelectric device
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CN114335314A (en) * 2021-12-30 2022-04-12 中国科学技术大学 P/n type thermoelectric film, preparation method thereof, wearable thermoelectric generator and application

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Application publication date: 20210323