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CN204188180U - Motor, the servo-drive system of scrambler, band scrambler - Google Patents

Motor, the servo-drive system of scrambler, band scrambler Download PDF

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Publication number
CN204188180U
CN204188180U CN201420652640.6U CN201420652640U CN204188180U CN 204188180 U CN204188180 U CN 204188180U CN 201420652640 U CN201420652640 U CN 201420652640U CN 204188180 U CN204188180 U CN 204188180U
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light
receiving array
light receiving
encoder
array
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吉田康
松谷泰裕
吉冨史朗
高田裕司
有永雄司
室北几磨
原田正信
近藤宏树
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Yaskawa Electric Corp
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Yaskawa Electric Corp
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Abstract

本实用新型提供编码器、带编码器的马达、伺服系统,能够实现编码器的高分辨率化。编码器(100)具有:多个槽隙轨道(SI1、SI2),它们分别具有沿测定方向排列的多个槽隙;光源(121),其构成为向多个槽隙轨道(SI1、SI2)射出光;受光阵列(PI2),其构成为接受被具有增量图案的槽隙轨道(SI2)反射的光;以及受光阵列(PI1),其构成为接受被具有间距比槽隙轨道(SI2)的增量图案长的增量图案的槽隙轨道(SI1)反射的光,并且所述受光阵列(PI1)在宽度方向(R)上的长度(WPI1)比受光阵列(PI2)的长度(WPI2)短。

The utility model provides an encoder, a motor with an encoder, and a servo system, which can realize high resolution of the encoder. The encoder (100) has: a plurality of slot tracks (SI1, SI2) each having a plurality of slots arranged in a measuring direction; a light source (121) configured to provide Emitting light; a light-receiving array (PI2) configured to receive light reflected by a slot track (SI2) having an incremental pattern; and a light-receiving array (PI1) configured to receive light reflected by a slot track (SI2) having a pitch ratio The light reflected by the slot track (SI1) of the incremental pattern is long, and the length (WPI1) of the light receiving array (PI1) in the width direction (R) is longer than the length (WPI2) of the light receiving array (PI2) )short.

Description

编码器、带编码器的马达、伺服系统Encoders, motors with encoders, servo systems

技术领域technical field

公开的实施方式涉及编码器、带编码器的马达、伺服系统。The disclosed embodiments relate to encoders, motors with encoders, servo systems.

背景技术Background technique

专利文献1中记载了一种绝对型编码器,其具有:旋转板,在该旋转板设置有多个光学图案,所述多个光学图案能够在旋转了1周时输出2个周期以上的不同周期的信号;以及光学式检测部,其具备多个光传感器,所述多个光传感器接受透过各光学图案的光线。Patent Document 1 describes an absolute encoder including: a rotating plate on which a plurality of optical patterns capable of outputting a difference of two or more cycles when one rotation is made a periodic signal; and an optical detection unit including a plurality of photosensors that receive light transmitted through each optical pattern.

现有技术文献prior art literature

专利文献1:日本特开2009-294073号公报Patent Document 1: Japanese Patent Laid-Open No. 2009-294073

在上述现有技术中,为了实现编码器的高分辨率化,虽然期望使光学式检测部的各光传感器的配置形式最优化,但没有被特别考虑过。In the prior art described above, in order to achieve higher resolution of the encoder, it is desired to optimize the arrangement of the optical sensors in the optical detection unit, but this has not been particularly considered.

实用新型内容Utility model content

本实用新型正是鉴于这样的问题点而完成的,其目的在于提供能够实现高分辨率化的编码器、带编码器的马达、伺服系统。The present invention has been made in view of such a problem, and an object thereof is to provide an encoder, a motor with an encoder, and a servo system capable of achieving high resolution.

为了解决上述课题,根据本实用新型的一个观点,应用一种编码器,其具有:多个槽隙轨道,它们分别具有沿测定方向排列的多个槽隙;光源,其构成为向所述多个槽隙轨道射出光;第1受光阵列,其构成为接受被具有增量图案的所述槽隙轨道反射或者透过的光;以及第2受光阵列,其构成为接受被具有间距比其他增量图案长的增量图案的所述槽隙轨道反射的光,并且所述第2受光阵列在与所述测定方向垂直的宽度方向上的尺寸比所述第1受光阵列小。In order to solve the above-mentioned problems, according to a viewpoint of the utility model, an encoder is applied, which has: a plurality of slot tracks, which respectively have a plurality of slots arranged along the measurement direction; The first light-receiving array is configured to receive the light reflected or transmitted by the slot track having an incremental pattern; The light reflected by the slot track of the incremental pattern with long measurement pattern, and the size of the second light-receiving array in the width direction perpendicular to the measurement direction is smaller than that of the first light-receiving array.

此外,为了解决上述课题,根据本实用新型的另一观点,提供一种带编码器的马达,其具备:可动体相对于固定体移动的直线马达、或者、转子相对于定子旋转的旋转式马达;以及上述的编码器,其构成为检测所述可动体或所述转子的位置和速度中的至少一方。In addition, in order to solve the above-mentioned problems, according to another aspect of the present invention, there is provided a motor with an encoder, which includes: a linear motor in which the movable body moves relative to the fixed body; or a rotary motor in which the rotor rotates relative to the stator. a motor; and the aforementioned encoder configured to detect at least one of a position and a speed of the movable body or the rotor.

此外,为了解决上述课题,根据本实用新型的另一观点,提供一种伺服系统,其具备:可动体相对于固定体移动的直线马达、或者、转子相对于定子旋转的旋转式马达;上述的编码器,其构成为检测所述可动体或所述转子的位置和速度中的至少一方;以及控制装置,其构成为根据所述编码器的检测结果控制所述直线马达或者所述旋转式马达。In addition, in order to solve the above-mentioned problems, according to another viewpoint of the present invention, a servo system is provided, which includes: a linear motor in which the movable body moves relative to the fixed body, or a rotary motor in which the rotor rotates relative to the stator; an encoder configured to detect at least one of the position and speed of the movable body or the rotor; and a control device configured to control the linear motor or the rotary motor based on a detection result of the encoder. type motor.

实用新型效果Utility Model Effect

根据本实用新型的编码器等,能够实现高分辨率化。According to the encoder and the like of the present invention, high resolution can be achieved.

附图说明Description of drawings

图1是用于对一个实施方式的伺服系统进行说明的说明图。FIG. 1 is an explanatory diagram for explaining a servo system according to one embodiment.

图2是用于对该实施方式的编码器进行说明的说明图。FIG. 2 is an explanatory diagram for explaining the encoder of this embodiment.

图3是用于对该实施方式的盘进行说明的说明图。FIG. 3 is an explanatory diagram for explaining the disk of this embodiment.

图4是用于对该实施方式的槽隙轨道进行说明的说明图。FIG. 4 is an explanatory diagram for explaining the slot track of the embodiment.

图5是用于对该实施方式的光学模块和受光阵列进行说明的说明图。FIG. 5 is an explanatory diagram for explaining the optical module and the light receiving array of the embodiment.

图6是用于对该实施方式的位置数据生成部进行说明的说明图。FIG. 6 is an explanatory diagram for explaining a position data generation unit according to the embodiment.

图7是用于对由该实施方式的盘表面的凹凸引起的漫反射进行说明的说明图。FIG. 7 is an explanatory diagram for explaining diffuse reflection due to irregularities on the surface of the disc according to this embodiment.

图8是用于对由凸部引起的漫反射成分的方向性进行说明的说明图。FIG. 8 is an explanatory diagram for explaining the directionality of diffuse reflection components caused by convex portions.

图9是用于对从X轴正方向观察到的漫反射成分的强度分布进行说明的说明图。FIG. 9 is an explanatory diagram for explaining the intensity distribution of the diffuse reflection component viewed from the positive direction of the X-axis.

图10是用于对从Z轴正方向观察到的漫反射成分的强度分布进行说明的说明图。FIG. 10 is an explanatory diagram for explaining the intensity distribution of the diffuse reflection component viewed from the positive Z-axis direction.

图11是用于对第1变形例的光学模块和受光阵列进行说明的说明图。FIG. 11 is an explanatory diagram for explaining an optical module and a light-receiving array of a first modified example.

图12是用于对第2变形例的光学模块和受光阵列进行说明的说明图。FIG. 12 is an explanatory diagram for explaining an optical module and a light-receiving array of a second modified example.

图13是用于对第3变形例的光学模块和受光阵列进行说明的说明图。FIG. 13 is an explanatory diagram for explaining an optical module and a light-receiving array of a third modified example.

标号说明Label description

100:编码器;100: encoder;

120:光学模块;120: optical module;

121:光源;121: light source;

C:测定方向;C: measuring direction;

CT:控制装置;CT: control device;

ci1:中心位置;ci1: center position;

ci2:中心位置;ci2: center position;

gPA1:最短距离;gPA1: shortest distance;

gPA2:最短距离;gPA2: shortest distance;

gPI:最短距离;gPI: shortest distance;

gPI1:最短距离;gPI1: shortest distance;

gPI2:最短距离;gPI2: shortest distance;

LPI2:长度;lpi2: length;

M:马达;M: motor;

PA:受光阵列;PA: light receiving array;

PA1、PA2:受光阵列;PA1, PA2: light receiving array;

PI1:受光阵列;PI1: light receiving array;

PI2:受光阵列;PI2: light receiving array;

S:伺服系统;S: servo system;

SA1:槽隙轨道;SA1: slot track;

SA2:槽隙轨道;SA2: slot track;

SI1:槽隙轨道;SI1: slot track;

SI2:槽隙轨道;SI2: slot track;

SM:伺服马达。SM: Servo motor.

具体实施方式Detailed ways

以下,参照附图对一个实施方式进行说明。Hereinafter, one embodiment will be described with reference to the drawings.

另外,以下说明的实施方式的编码器能够应用于旋转式(旋转类型)和直线式(直线类型)等各种各样的类型的编码器。在下文中,为了容易理解编码器,以旋转式的编码器为例进行说明。在应用于其他类型的编码器的情况下,能够通过将被测定对象从旋转式的盘(disk)变更成直线式的直线标尺等适当的变更来实现,因此省略详细说明。In addition, the encoders of the embodiments described below can be applied to various types of encoders such as rotary (rotary type) and linear (linear type). In the following, for easy understanding of the encoder, a rotary encoder is taken as an example for description. When applied to other types of encoders, it can be realized by changing the object to be measured from a rotary disk to a linear linear scale, etc., and thus detailed description is omitted.

<1.伺服系统><1.Servo system>

首先,参照图1对本实施方式的伺服系统的结构进行说明。如图1所示,伺服系统S具有伺服马达SM和控制装置CT。伺服马达SM具有编码器100和马达M。First, the configuration of the servo system according to the present embodiment will be described with reference to FIG. 1 . As shown in FIG. 1 , the servo system S has a servo motor SM and a control device CT. The servo motor SM has an encoder 100 and a motor M.

马达M是不包括编码器100的动力发生源的一例。马达M是转子(省略图示)相对于定子(省略图示)旋转的旋转式马达,通过使固定于转子的轴SH绕轴心AX旋转来输出旋转力。The motor M is an example of a power generation source that does not include the encoder 100 . The motor M is a rotary motor in which a rotor (not shown) rotates with respect to a stator (not shown), and outputs a rotational force by rotating a shaft SH fixed to the rotor around an axis AX.

另外,虽然有时也将马达M单体称作伺服马达,但在本实施方式中,将包括编码器100的结构称作伺服马达SM。也就是说,伺服马达SM相当于带编码器的马达的一例。在下文中,为了便于说明,对带编码器的马达是以追随位置、速度等目标值的方式进行控制的伺服马达的情况进行说明,但未必限定于伺服马达。关于带编码器的马达,例如在仅用于显示编码器的输出的情况下等,只要附加设置了编码器,就还包括伺服系统以外使用的马达。In addition, although the motor M alone may be referred to as a servo motor, in this embodiment, the structure including the encoder 100 is referred to as a servo motor SM. That is, the servo motor SM corresponds to an example of a motor with an encoder. Hereinafter, for convenience of explanation, a case will be described where the motor with an encoder is a servomotor controlled so as to follow target values such as position and speed, but it is not necessarily limited to a servomotor. Motors with encoders include motors used in other than servo systems as long as an encoder is additionally provided, for example, when they are used only for displaying the output of the encoder.

并且,马达M只要是编码器100能够检测例如位置数据等的马达,就不特别限定。并且,马达M不限定于使用电力作为动力源的电动式马达的情况,例如也可以是液压式马达、空气式马达、蒸气式马达等使用其他动力源的马达。但是,为了便于说明,在下文中对马达M为电动式马达的情况进行说明。In addition, the motor M is not particularly limited as long as the encoder 100 can detect, for example, position data. In addition, the motor M is not limited to an electric motor using electric power as a power source, and may be a motor using another power source such as a hydraulic motor, an air motor, or a steam motor, for example. However, for convenience of description, the case where the motor M is an electric motor will be described below.

编码器100连结在马达M的与轴SH的旋转力输出侧相反的一侧。但是,未必限定于相反侧,编码器100也可以连结在轴SH的旋转力输出侧。并且,编码器100例如也可以经由减速器、旋转方向变换器等其他机构而连结。编码器100通过检测轴SH(转子)的位置来检测马达M的位置(也称作旋转角度。),并输出表示该位置的位置数据。The encoder 100 is connected to the side of the motor M opposite to the rotational force output side of the shaft SH. However, it is not necessarily limited to the opposite side, and the encoder 100 may be connected to the rotational force output side of the shaft SH. In addition, the encoder 100 may be connected via other mechanisms such as a speed reducer and a rotation direction converter, for example. The encoder 100 detects the position (also referred to as rotation angle) of the motor M by detecting the position of the shaft SH (rotor), and outputs position data indicating the position.

编码器100也可以在马达M的位置的基础上或代替马达M的位置,检测马达M的速度(也称作旋转速度、角速度等。)和马达M的加速度(也称作旋转加速度、角加速度等。)中的至少一方。在该情况下,马达M的速度和加速度例如能够通过以时间的方式对位置进行1阶或2阶微分、或者在规定的时间对检测信号(例如后述的增量信号)进行计数等处理来检测。为了便于说明,在下文中以编码器100检测的物理量为位置的情况进行说明。The encoder 100 can also detect the speed of the motor M (also referred to as rotational speed, angular velocity, etc.) and the acceleration of the motor M (also referred to as rotational acceleration, angular acceleration) on the basis of or instead of the position of the motor M. etc.) at least one of. In this case, the speed and acceleration of the motor M can be determined by, for example, performing first-order or second-order differentiation of the position with time, or counting detection signals (for example, incremental signals described later) at a predetermined time. detection. For the convenience of description, the following description will be made by taking the physical quantity detected by the encoder 100 as the position.

控制装置CT取得从编码器100输出的位置数据,根据该位置数据对马达M的旋转进行控制。因此,在使用电动式马达作为马达M的本实施方式中,控制装置CT根据位置数据对施加于马达M的电流或电压等进行控制,由此控制马达M的旋转。此外,控制装置CT也可以从上位控制装置(未图示)取得上位控制信号,并以从马达M的轴SH输出能够实现该上位控制信号所表示的位置等的旋转力的方式来控制马达M。另外,在马达M使用液压式、空气式、蒸气式等其他动力源的情况下,控制装置CT能够通过对所述动力源的供给进行控制来控制马达M的旋转。The control device CT acquires the position data output from the encoder 100, and controls the rotation of the motor M based on the position data. Therefore, in the present embodiment using an electric motor as the motor M, the control device CT controls the rotation of the motor M by controlling the current or voltage applied to the motor M based on the position data. In addition, the control device CT may obtain a high-level control signal from a high-level control device (not shown), and may control the motor M so that the shaft SH of the motor M outputs a rotational force capable of realizing a position indicated by the high-level control signal. . In addition, when another power source such as a hydraulic type, an air type, or a steam type is used for the motor M, the control device CT can control the rotation of the motor M by controlling the supply of the power source.

<2.编码器><2. Encoder>

接下来,对本实施方式的编码器100进行说明。如图2所示,编码器100具有盘110、光学模块120和位置数据生成部130。Next, the encoder 100 of this embodiment will be described. As shown in FIG. 2 , the encoder 100 has a disk 110 , an optical module 120 , and a position data generation unit 130 .

这里,为了便于说明编码器100的构造,如下那样定义上下等方向并适当使用。在图2中,将盘110面向光学模块120的方向、即Z轴正方向作为“上”,将Z轴负方向作为“下”。但是,该方向根据编码器100的设置方式而变动,并不限定编码器100的各结构的位置关系。Here, for the convenience of describing the structure of the encoder 100, directions such as up and down are defined as follows and used as appropriate. In FIG. 2 , the direction in which the disk 110 faces the optical module 120 , that is, the positive direction of the Z-axis is defined as "up", and the negative direction of the Z-axis is defined as "down". However, this direction changes according to the installation form of the encoder 100 , and does not limit the positional relationship of the respective components of the encoder 100 .

(2-1.盘)(2-1. plate)

盘110如图3所示地形成为圆板状,盘中心O被配置成与轴心AX大致一致。盘110与马达M的轴SH连结,借助轴SH的旋转而旋转。另外,在本实施方式中,作为对马达M的旋转进行测定的被测定对象的例子,列举圆板状的盘110为例进行说明,但例如也可以使用轴SH的端面等其他部件作为被测定对象。并且,在图2所示的例子中,盘110与轴SH直接连结,但也可以经由枢毂等连结部件连结。The disc 110 is formed in a disc shape as shown in FIG. 3 , and the disc center O is arranged so as to substantially coincide with the axis AX. The disk 110 is connected to the shaft SH of the motor M, and is rotated by the rotation of the shaft SH. In addition, in the present embodiment, as an example of the object to be measured for measuring the rotation of the motor M, the disc-shaped disk 110 is described as an example, but other members such as the end surface of the shaft SH may also be used as the object to be measured. object. Furthermore, in the example shown in FIG. 2 , the disk 110 is directly connected to the shaft SH, but it may be connected via a connecting member such as a hub.

如图3所示,盘110具有多个槽隙轨道(slit track)SA1、SA2、SI1、SI2。盘110与马达M的驱动一起旋转,但光学模块120与盘110的一部分对置并固定地配置。因此,槽隙轨道SA1、SA2、SI1、SI2和光学模块120随着马达M的驱动而相互在测定方向(图3所示的箭头C的方向。以下适当记载为“测定方向C”。)上相对移动。As shown in FIG. 3, the disc 110 has a plurality of slit tracks SA1, SA2, SI1, SI2. The disk 110 rotates together with the drive of the motor M, but the optical module 120 is fixedly arranged to face a part of the disk 110 . Therefore, the slot tracks SA1 , SA2 , SI1 , SI2 and the optical module 120 are aligned with each other in the measurement direction (the direction of the arrow C shown in FIG. 3 . Hereinafter, it is appropriately described as "measurement direction C") as the motor M is driven. relatively mobile.

这里,“测定方向”是指利用光学模块120对形成于盘110的各槽隙轨道进行光学测定时的测定方向。如本实施方式那样,在被测定对象为盘110的旋转式的编码器中,测定方向与以盘110的中心轴为中心的圆周方向一致,但例如在被测定对象为直线标尺、可动体相对于固定体移动的直线式的编码器中,测定方向为沿着直线标尺的方向。另外,“中心轴”是指盘110的旋转轴心,在盘110和轴SH同轴地连结的情况下,与轴SH的轴心AX一致。Here, the “measurement direction” refers to the measurement direction when the optical module 120 performs optical measurement of each groove track formed on the disc 110 . As in this embodiment, in a rotary encoder in which the object to be measured is the disk 110, the measurement direction coincides with the circumferential direction centered on the central axis of the disk 110. In a linear encoder that moves relative to a fixed body, the measurement direction is the direction along the linear scale. In addition, the "central axis" refers to the rotational axis of the disk 110, and coincides with the axis AX of the shaft SH when the disk 110 is coaxially connected to the shaft SH.

(2-2.光学检测机构)(2-2. Optical detection mechanism)

光学检测机构具有槽隙轨道SA1、SA2、SI1、SI2和光学模块120。各槽隙轨道形成为在盘110的上表面呈以盘中心O为中心的环状配置的轨道。各槽隙轨道遍布轨道整周地具有沿测定方向C排列的多个反射槽隙(图4的斜线阴影部分)。一个个反射槽隙反射从光源121照射来的光。The optical detection mechanism has slot tracks SA1 , SA2 , SI1 , SI2 and an optical module 120 . Each slot track is formed as a track arranged in an annular shape around the disk center O on the upper surface of the disk 110 . Each slot track has a plurality of reflective slots arranged along the measurement direction C over the entire circumference of the track (hatched portion in FIG. 4 ). Each reflective slot reflects the light irradiated from the light source 121 .

(2-2-1.盘)(2-2-1. plate)

盘110例如由金属等反射光的材质形成。并且,在盘110的表面的不反射光的部分通过涂布等配置反射率低的材质(例如氧化铬等),由此在未配置的部分形成反射槽隙。另外,也可以利用溅射等使不反射光的部分为粗糙面来降低反射率,由此形成反射槽隙。The disc 110 is formed of, for example, a light-reflecting material such as metal. In addition, a material with low reflectance (for example, chromium oxide, etc.) is placed on the portion of the surface of the disk 110 that does not reflect light by coating or the like, thereby forming reflective grooves on the portion that is not placed. In addition, reflective grooves may be formed by roughening portions that do not reflect light by sputtering or the like to reduce reflectivity.

另外,对于盘110的材质、制造方法等,不特别限定。例如,也可以利用玻璃、透明树脂等透光的材质形成盘110。在该情况下,能够通过蒸镀等在盘110的表面配置反射光的材质(例如铝等),从而形成反射槽隙。In addition, the material, manufacturing method, etc. of the disc 110 are not particularly limited. For example, the disc 110 may be formed of a light-transmitting material such as glass or transparent resin. In this case, reflective grooves can be formed by disposing a light-reflecting material (for example, aluminum, etc.) on the surface of the disc 110 by vapor deposition or the like.

槽隙轨道在盘110的上表面在宽度方向(图3所示的箭头R的方向。以下适当记载为“宽度方向R”。)上并排设置有4条。另外,“宽度方向”是指盘110的半径方向、即与测定方向C大致垂直的方向,沿着该宽度方向R的各槽隙轨道的长度相当于各槽隙轨道的宽度。4条槽隙轨道从宽度方向R的内侧朝向外侧按照SA1、SI1、SI2、SA2的顺序呈同心圆状配置。为了对各槽隙轨道进行更详细的说明,在图4中示出盘110的与光学模块120对置的区域附近的局部放大图。Four slot tracks are arranged side by side in the width direction (the direction of the arrow R shown in FIG. 3 . Hereinafter, it will be referred to as “the width direction R” as appropriate) on the upper surface of the disk 110 . The "width direction" refers to the radial direction of the disk 110, that is, the direction substantially perpendicular to the measurement direction C, and the length of each slot track along the width direction R corresponds to the width of each slot track. The four slot tracks are concentrically arranged in the order of SA1 , SI1 , SI2 , and SA2 from the inner side toward the outer side in the width direction R. In order to describe each slot track in more detail, FIG. 4 shows a partially enlarged view of the vicinity of the region of the disc 110 facing the optical module 120 .

如图4所示,槽隙轨道SA1、SA2所具有的多个反射槽隙以在测定方向C上具有绝对图案的方式配置在盘110的整周。As shown in FIG. 4 , the plurality of reflection grooves included in the groove tracks SA1 and SA2 are arranged on the entire circumference of the disk 110 so as to have an absolute pattern in the measurement direction C. As shown in FIG.

另外,“绝对图案”是指与后述的光学模块120所具有的受光阵列对置的角度内的反射槽隙的位置、比例等在盘110旋转1周内唯一确定那样的图案。也就是说,例如,在图4所示的绝对图案的例子的情况下,当马达M在某个角度位置时,基于对置的受光阵列的多个受光元件各自的检测或未检测的位元图案的组合能够唯一表示该角度位置的绝对位置。另外,“绝对位置”是指在盘110旋转1周内的相对于原点的角度位置。原点设定在盘110旋转1周内的适当的角度位置,以该原点为基准来形成绝对图案。The term "absolute pattern" refers to a pattern in which the positions, ratios, etc. of the reflective slots within the angle facing the light receiving array of the optical module 120 described later are uniquely determined within one rotation of the disk 110 . That is to say, for example, in the case of the example of the absolute pattern shown in FIG. The combination of patterns can uniquely represent the absolute position of the angular position. In addition, "absolute position" refers to an angular position with respect to the origin within one rotation of the disk 110 . The origin is set at an appropriate angular position within one rotation of the disk 110, and an absolute pattern is formed with this origin as a reference.

另外,根据该图案的一例,能够生成利用受光阵列的受光元件数的位元一维地表示马达M的绝对位置那样的图案。但是,绝对图案不限定于该例。例如,也可以是利用受光元件数的位元多维地表示的图案。并且,除了规定的位元图案以外,也可以是由受光元件接受的光量、相位等物理量以唯一表示绝对位置的方式变化的图案,或者是对绝对图案的符号系列实施调制后的图案等,此外也可以是各种各样的图案。In addition, according to an example of the pattern, it is possible to generate a pattern in which the absolute position of the motor M is expressed one-dimensionally by bits of the number of light-receiving elements of the light-receiving array. However, the absolute pattern is not limited to this example. For example, it may be a pattern multi-dimensionally expressed by bits of the number of light-receiving elements. In addition, other than a predetermined bit pattern, a pattern in which an absolute position is uniquely changed by a physical quantity such as a light quantity received by a light receiving element or a phase, or a pattern obtained by modulating a symbol series of an absolute pattern may be used. Various patterns are also possible.

另外,在本实施方式中,同样的绝对图案在测定方向C上被偏置例如1位元的1/2的长度,形成为2条槽隙轨道SA1、SA2。该偏置量例如相当于槽隙轨道SI1的反射槽隙的间距P1的一半。假设在不这样地构成为使槽隙轨道SA1、SA2偏置的情况下,存在如下可能性。也就是说,在利用本实施方式这样的一维的绝对图案表示绝对位置的情况下,在受光阵列PA1、PA2的各受光元件位于与反射槽隙的端部附近对置的位置而实现的位元图案的转变点(変わり目)的区域,绝对位置的检测精度有可能降低。在本实施方式中,由于使槽隙轨道SA1、SA2偏置,因此,例如,在基于槽隙轨道SA1的绝对位置相当于位元图案的转变点的情况下,使用来自槽隙轨道SA2的检测信号计算绝对位置,或者相反地进行,由此能够提高绝对位置的检测精度。另外,在为这样的结构的情况下,需要使2个受光阵列PA1、PA2的受光量均一,但在本实施方式中由于将2个受光阵列PA1、PA2配置在相对于光源121大致相等距离的位置,所以能够实现上述结构。In addition, in the present embodiment, the same absolute pattern is offset in the measurement direction C by, for example, 1/2 the length of 1 bit to form two slot tracks SA1 and SA2. This offset amount corresponds to, for example, half the pitch P1 of the reflection slots of the slot track SI1 . Assuming that the slot tracks SA1 and SA2 are not configured to be offset in this way, the following possibility exists. That is, when the absolute position is represented by a one-dimensional absolute pattern as in the present embodiment, the position realized when the light receiving elements of the light receiving arrays PA1 and PA2 are positioned opposite to the vicinity of the ends of the reflective slots In the region of the transition point (変わり目) of the original pattern, the detection accuracy of the absolute position may decrease. In this embodiment, since the slot tracks SA1 and SA2 are offset, for example, when the absolute position based on the slot track SA1 corresponds to a transition point of the bit pattern, the detection from the slot track SA2 is used. The signal calculates the absolute position, or vice versa, whereby the detection accuracy of the absolute position can be improved. In addition, in the case of such a structure, it is necessary to make the light receiving amounts of the two light receiving arrays PA1 and PA2 uniform, but in this embodiment, since the two light receiving arrays PA1 and PA2 are arranged at approximately equal distances from the light source 121 position, so the above structure can be realized.

另外,代替使槽隙轨道SA1、SA2的各绝对图案彼此偏置,例如也可以不使绝对图案彼此偏置,而是使分别与槽隙轨道SA1、SA2对应的受光阵列PA1、PA2彼此在测定方向C上偏置。In addition, instead of offsetting the absolute patterns of the slot tracks SA1 and SA2, for example, instead of offsetting the absolute patterns, the light-receiving arrays PA1 and PA2 respectively corresponding to the slot tracks SA1 and SA2 may be measured. Bias in direction C.

另一方面,槽隙轨道SI1、SI2所具有的多个反射槽隙以在测定方向C上具有增量图案的方式配置在盘110整周。On the other hand, the plurality of reflection slots included in the slot tracks SI1 and SI2 are arranged in an incremental pattern in the measurement direction C over the entire circumference of the disk 110 .

如图4所示,“增量图案”是指以规定的间距规则地重复的图案。这里,“间距”是指具有增量图案的槽隙轨道SI1、SI2的各反射槽隙的配置间隔。如图4所示,槽隙轨道SI1的间距为P1,槽隙轨道SI2的间距为P2。增量图案与将多个受光元件的检测的有无分别作为位元来表示绝对位置的绝对图案不同,利用至少1个以上的受光元件的检测信号的和来表示每1个间距或者1个间距内的马达M的位置。因此,增量图案不是表示马达M的绝对位置,但与绝对图案相比,能够非常高精度地表示位置。As shown in FIG. 4 , the "incremental pattern" refers to a pattern that is regularly repeated at a predetermined pitch. Here, the "pitch" refers to the arrangement interval of the reflective slots of the slot tracks SI1 and SI2 having an incremental pattern. As shown in FIG. 4, the pitch of the slot track SI1 is P1, and the pitch of the slot track SI2 is P2. The incremental pattern is different from the absolute pattern that expresses the absolute position by using the presence or absence of detection of multiple light-receiving elements as bits. Each pitch or pitch is represented by the sum of the detection signals of at least one or more light-receiving elements. The position of the motor M within. Therefore, the incremental pattern does not represent the absolute position of the motor M, but it can represent the position with very high precision compared with the absolute pattern.

在本实施方式中,槽隙轨道SI1的间距P1设定得比槽隙轨道SI2的间距P2长。在本实施方式中,以P1=2×P2的方式设定各间距。即,槽隙轨道SI2的反射槽隙的数量是槽隙轨道SI1的反射槽隙的数量的2倍。然而,该槽隙间距的关系不限定于该例,例如可以取3倍、4倍、5倍等各种各样的值。In this embodiment, the pitch P1 of the slot track SI1 is set to be longer than the pitch P2 of the slot track SI2. In this embodiment, each pitch is set so that P1=2×P2. That is, the number of reflection slots of the slot track SI2 is twice the number of reflection slots of the slot track SI1. However, the relationship of the slot pitch is not limited to this example, and various values such as 3 times, 4 times, and 5 times can be taken, for example.

另外,在本实施方式中,槽隙轨道SA1、SA2的反射槽隙在测定方向C上的最小长度与槽隙轨道SI1的反射槽隙的间距P1一致。其结果是,基于槽隙轨道SA1、SA2的绝对信号的分辨率与槽隙轨道SI1的反射槽隙的数量一致。然而,最小长度不限定于该例,槽隙轨道SI1的反射槽隙的数量优选设定为与绝对信号的分辨率相同或者比其多。In addition, in the present embodiment, the minimum length of the reflection slots of the slot tracks SA1 and SA2 in the measurement direction C matches the pitch P1 of the reflection slots of the slot track SI1 . As a result, the resolution of the absolute signal based on the slot tracks SA1 , SA2 corresponds to the number of reflection slots of the slot track SI1 . However, the minimum length is not limited to this example, and the number of reflection slots of the slot track SI1 is preferably set to be equal to or greater than the resolution of the absolute signal.

(2-2-2.光学模块)(2-2-2. Optical module)

如图2和图5所示,光学模块120形成为与盘110平行的一张基板BA。由此,能够使编码器100薄型化,并容易制造光学模块120。因此,随着盘110的旋转,光学模块120相对于槽隙轨道SA1、SA2、SI1、SI2在测定方向C上相对移动。另外,光学模块120未必一定构成为一张基板BA,各结构也可以构成为多张基板。在该情况下,这些基板集中地配置即可。并且,光学模块120也可以不是基板状。As shown in FIGS. 2 and 5 , the optical module 120 is formed as a single substrate BA parallel to the disk 110 . Accordingly, the thickness of the encoder 100 can be reduced, and the optical module 120 can be easily manufactured. Therefore, as the disk 110 rotates, the optical module 120 relatively moves in the measurement direction C with respect to the slot tracks SA1 , SA2 , SI1 , and SI2 . In addition, the optical module 120 is not necessarily configured as a single substrate BA, and each structure may be configured as a plurality of substrates. In this case, these substrates may be collectively arranged. In addition, the optical module 120 does not need to be in the form of a substrate.

如图2和图5所示,光学模块120在基板BA的与盘110对置的面上具有光源121和多个受光阵列PA1、PA2、PI1、PI2。As shown in FIGS. 2 and 5 , the optical module 120 has a light source 121 and a plurality of light-receiving arrays PA1 , PA2 , PI1 , and PI2 on the surface of the substrate BA facing the disc 110 .

如图3所示,光源121配置在与槽隙轨道SI1和槽隙轨道SI2之间对置的位置。而且,光源121向通过光学模块120所对置的位置的4个槽隙轨道SA1、SA2、SI1、SI2的对置的部分射出光。As shown in FIG. 3 , the light source 121 is disposed at a position facing between the slot track SI1 and the slot track SI2 . Furthermore, the light source 121 emits light to the opposing portions of the four slot tracks SA1 , SA2 , SI1 , and SI2 passing through the opposing positions of the optical module 120 .

作为光源121,只要是能够向照射区域照射光的光源就不特别限定,例如可以使用LED(Light Emitting Diode,发光二极管)。光源121特别构成为未配置光学透镜等的点光源,从发光部射出扩散光。另外,在“点光源”的情况下,不必是严格的点,只要是视为在设计上或工作原理上从大致点状的位置发出扩散光的光源,也可以从有限的射出面发出光。并且,“扩散光”不限定于从点光源向全部方位放出的光,包括向有限的一定的方位扩散并射出的光。即,这里所说的扩散光,只要是比平行光具有扩散性的光就包括在内。通过这样地使用点光源,光源121能够使光大致均等地照射到通过对置的位置的4个槽隙轨道SA1、SA2、SI1、SI2。并且,由于不进行基于光学元件的聚光和扩散,因此不易产生光学元件引起的误差等,能够提高光向槽隙轨道的直线行进性。The light source 121 is not particularly limited as long as it is capable of irradiating light to the irradiation area, for example, an LED (Light Emitting Diode, light emitting diode) can be used. The light source 121 is particularly configured as a point light source without an optical lens or the like, and emits diffused light from a light emitting unit. In addition, in the case of a "point light source", it does not have to be strictly a point, and light may be emitted from a limited emission surface as long as it is considered to emit diffused light from a substantially point-like position in terms of design or operating principle. In addition, "diffused light" is not limited to light emitted from a point light source in all directions, but includes light diffused and emitted in a limited fixed direction. That is, the diffused light referred to here includes light as long as it is more diffuse than parallel light. By using the point light sources in this way, the light source 121 can irradiate the four slot tracks SA1 , SA2 , SI1 , and SI2 passing through the opposing positions with substantially equal light. In addition, since light collection and diffusion by optical elements are not performed, errors due to optical elements are less likely to occur, and linearity of light traveling to the slot track can be improved.

多个受光阵列PA1、PA2、PI1、PI2配置在光源121的周围,并具有分别接受被对应的槽隙轨道的反射槽隙反射的光的多个受光元件(图5的点阴影部分)。多个受光元件如图5所示地沿测定方向C排列。A plurality of light receiving arrays PA1, PA2, PI1, and PI2 are arranged around the light source 121, and have a plurality of light receiving elements (dotted shaded parts in FIG. 5) that respectively receive light reflected by the reflection slots of the corresponding slot tracks. The plurality of light receiving elements are arranged along the measurement direction C as shown in FIG. 5 .

另外,从光源121射出的光为扩散光。因此,被投影到光学模块120上的槽隙轨道的像以与光路长度对应的规定的放大率ε被放大。也就是说,如图4和图5所示,若设槽隙轨道SA1、SA2、SI1、SI2各自在宽度方向R上的长度为WSA1、WSA2、WSI1、WSI2,设它们的反射光投影到光学模块120的形状在宽度方向R上的长度为WPA1、WPA2、WPI1、WPI2,则WPA1、WPA2、WPI1、WPI2为WSA1、WSA2、WSI1、WSI2的ε倍的长度。另外,在本实施方式中,如图5所示,示出各受光阵列的受光元件在宽度方向R上的长度被设定为与各槽隙投影到光学模块120的形状大致相等的例子。但是,受光元件在宽度方向R上的长度未必限定于该例子。例如,对于受光阵列PA1、PA2,也可以使各受光元件在宽度方向R上的长度不同。In addition, the light emitted from the light source 121 is diffused light. Therefore, the image of the slot track projected onto the optical module 120 is enlarged at a predetermined magnification factor ε corresponding to the optical path length. That is to say, as shown in FIG. 4 and FIG. 5, if the respective lengths of the slot tracks SA1, SA2, SI1, and SI2 in the width direction R are WSA1, WSA2, WSI1, and WSI2, and their reflected light is projected onto the optical The length of the shape of the module 120 in the width direction R is WPA1, WPA2, WPI1, WPI2, and WPA1, WPA2, WPI1, WPI2 are ε times the length of WSA1, WSA2, WSI1, WSI2. In addition, in this embodiment, as shown in FIG. 5 , an example is shown in which the length of the light receiving elements of each light receiving array in the width direction R is set to be approximately equal to the shape of each slot projected on the optical module 120 . However, the length of the light receiving element in the width direction R is not necessarily limited to this example. For example, in the light receiving arrays PA1 and PA2, the lengths of the respective light receiving elements in the width direction R may be different.

同样地,光学模块120上的测定方向C也成为盘110上的测定方向C投影到光学模块120的形状、即受到放大率ε的影响的形状。为了容易理解,如图2所示地列举光源121的位置处的测定方向C为例进行具体说明。盘110的测定方向C为以轴心AX为中心的圆状。与此相对,投影到光学模块120上的测定方向C的中心位于从盘110的配置有光源121的面内位置即光学中心Op离开距离εL的位置。距离εL为轴心AX和光学中心Op之间的距离L被以放大率ε放大后的距离。在图2中,概念地将该位置作为测定中心Os而示出。因此,光学模块120的测定方向C位于以测定中心Os为中心、以距离εL为半径的线上,该测定中心Os从光学中心Op在该光学中心Op和轴心AX所通过的线上向轴心AX方向离开距离εL。Similarly, the measurement direction C on the optical block 120 is also a shape in which the measurement direction C on the disk 110 is projected onto the optical block 120 , that is, a shape affected by the magnification ε. For easy understanding, the measurement direction C at the position of the light source 121 as shown in FIG. 2 will be taken as an example for specific description. The measurement direction C of the disc 110 is circular with the axis AX as the center. In contrast, the center of the measurement direction C projected onto the optical module 120 is located at a distance εL away from the optical center Op, which is the in-plane position of the disk 110 where the light source 121 is arranged. The distance εL is a distance obtained by enlarging the distance L between the axis AX and the optical center Op by the magnification factor ε. In FIG. 2 , this position is conceptually shown as the measurement center Os. Therefore, the measurement direction C of the optical module 120 is located on a line centered on the measurement center Os and having the distance εL as a radius. The center AX direction is away from the distance εL.

在图4和图5中,用圆弧状的线Lcd、Lcp表示盘110和光学模块120各自的测定方向C的对应关系。图4所示的线Lcd表示沿着盘110上的测定方向C的线,另一方面,图5所示的线Lcp表示沿着基板BA上的测定方向C的线(线Lcd被投影到光学模块120上的线)。In FIGS. 4 and 5 , the corresponding relationship between the measurement directions C of the disk 110 and the optical module 120 is shown by arc-shaped lines Lcd and Lcp. The line Lcd shown in FIG. 4 represents the line along the measurement direction C on the disk 110, on the other hand, the line Lcp shown in FIG. 5 represents the line along the measurement direction C on the substrate BA (the line Lcd is projected onto the optical line on module 120).

如图2所示,在设光学模块120和盘110之间的间隔长为G,设光源121从基板BA突出的突出量为Δd的情况下,放大率ε用下述(式1)表示。As shown in FIG. 2 , when G is the distance between optical module 120 and disk 110 and Δd is the protrusion amount of light source 121 from substrate BA, magnification ε is expressed by the following (Equation 1).

ε=(2G-Δd)/(G-Δd)…(式1)ε=(2G-Δd)/(G-Δd)...(Formula 1)

作为一个个受光元件,例如可以使用光电二极管。但是,不限定于光电二极管,只要能够接受从光源121射出的光并转换为电信号,就不特别限定。As each light receiving element, for example, a photodiode can be used. However, it is not limited to a photodiode, and is not particularly limited as long as it can receive light emitted from the light source 121 and convert it into an electrical signal.

本实施方式的受光阵列与4条槽隙轨道SA1、SA2、SI1、SI2对应地配置。受光阵列PA1构成为接受被槽隙轨道SA1反射的光,受光阵列PA2构成为接受被槽隙轨道SA2反射的光。并且,受光阵列PI1构成为接受被槽隙轨道SI1反射的光,受光阵列PI2构成为接受被槽隙轨道SI2反射的光。The light receiving array of this embodiment is arranged corresponding to four slot tracks SA1, SA2, SI1, and SI2. The light receiving array PA1 is configured to receive light reflected by the slot track SA1 , and the light receiving array PA2 is configured to receive light reflected by the slot track SA2 . Furthermore, the light receiving array PI1 is configured to receive the light reflected by the slot track SI1, and the light receiving array PI2 is configured to receive the light reflected by the slot track SI2.

光源121、受光阵列PA1、PA2和受光阵列PI1、PI2配置成图5所示的位置关系。与绝对图案对应的受光阵列PA1、PA2被配置成在宽度方向R上将光源121夹在它们之间。在该例子中,受光阵列PA1配置在内周侧,受光阵列PA2配置在外周侧。在本实施方式中,各个受光阵列PA1、PA2与光源121的距离大致相等。也就是说,受光阵列PA1、PA2被配置成在宽度方向R将光源121夹在它们之间并实质上对称。另外,这里所说的“实质上对称”是指,受光阵列PA1、PA2形成为:除了以测定中心Os为中心的弯曲的形状以外,基本上以通过光源121的测定方向C上的线为对称轴的线对称形状。并且,受光阵列PA1、PA2所具有的多个受光元件分别沿测定方向C(线Lcp)以恒定的间距排列。在受光阵列PA1、PA2中,分别来自槽隙轨道SA1、SA2的反射光被接受,生成具有受光元件数的位元图案的绝对信号。另外,受光阵列PA1、PA2相当于第3受光阵列的一例。The light source 121, the light receiving arrays PA1, PA2, and the light receiving arrays PI1, PI2 are arranged in the positional relationship shown in FIG. 5 . The light receiving arrays PA1 and PA2 corresponding to the absolute pattern are disposed so as to sandwich the light source 121 in the width direction R therebetween. In this example, the light receiving array PA1 is arranged on the inner peripheral side, and the light receiving array PA2 is arranged on the outer peripheral side. In this embodiment, the distances between the light receiving arrays PA1 and PA2 and the light source 121 are substantially equal. That is, light receiving array PA1, PA2 is arrange|positioned so that the light source 121 may be sandwiched between these in the width direction R, and it is substantially symmetrical. In addition, the term "substantially symmetrical" here means that the light-receiving arrays PA1 and PA2 are formed substantially symmetrically with respect to a line passing through the light source 121 in the measurement direction C, except for a curved shape centered on the measurement center Os. The line-symmetric shape of the axis. And the some light receiving element which light receiving array PA1, PA2 has is arrange|positioned at constant pitch along measurement direction C (line Lcp), respectively. In the light-receiving arrays PA1 and PA2, the reflected light from the slot tracks SA1 and SA2 is respectively received, and an absolute signal having a bit pattern of the number of light-receiving elements is generated. In addition, light receiving arrays PA1 and PA2 correspond to an example of the 3rd light receiving array.

与增量图案对应的受光阵列PI1和受光阵列PI2在宽度方向R上配置在2个受光阵列PA1、PA2之间。在该例子中,受光阵列PI1配置在受光阵列PA1和光源121之间,受光阵列PI2配置在受光阵列PA2和光源121之间。受光阵列PI1配置在比受光阵列PI2靠中心轴侧的位置。另外,受光阵列PI2相当于第1受光阵列的一例,受光阵列PI1相当于第2受光阵列的一例。Light receiving array PI1 and light receiving array PI2 corresponding to the incremental pattern are arranged between two light receiving arrays PA1 and PA2 in the width direction R. In this example, the light receiving array PI1 is arranged between the light receiving array PA1 and the light source 121 , and the light receiving array PI2 is arranged between the light receiving array PA2 and the light source 121 . Light receiving array PI1 is arrange|positioned at the center axis side rather than light receiving array PI2. In addition, light receiving array PI2 corresponds to an example of a 1st light receiving array, and light receiving array PI1 corresponds to an example of a 2nd light receiving array.

受光阵列PI1与受光阵列PI2的尺寸关系如下。即,受光阵列PI1在宽度方向R上的尺寸即长度WPI1比受光阵列PI2在宽度方向R上的尺寸即长度WPI2小。而且,受光阵列PI2在测定方向C上的尺寸即长度LPI2比受光阵列PI1在测定方向C上的尺寸即长度LPI1大。也就是说,在本实施方式中,受光阵列PI2在宽度方向R上的尺寸和测定方向C上的尺寸这两方形成得比受光阵列PI1大。The size relationship between the light receiving array PI1 and the light receiving array PI2 is as follows. That is, length WPI1 which is the size of light receiving array PI1 in the width direction R is smaller than length WPI2 which is the size of light receiving array PI2 in the width direction R. Furthermore, the length LPI2 which is the size of the light receiving array PI2 in the measurement direction C is larger than the length LPI1 which is the size of the light receiving array PI1 in the measurement direction C. That is, in the present embodiment, both the dimension in the width direction R and the dimension in the measurement direction C of the light receiving array PI2 are formed larger than the light receiving array PI1.

另外,受光阵列PI1和受光阵列PI2的尺寸关系不限定于上述情况。例如,也可以使长度LPI1和长度LPI2大致相等,也可以与上述相反地使长度LPI1比长度LPI2大。但是,在图5中,为了便于说明,图示了长度LPI2比长度LPI1大的情况。In addition, the dimensional relationship between light receiving array PI1 and light receiving array PI2 is not limited to the above. For example, the length LPI1 and the length LPI2 may be made approximately equal, or the length LPI1 may be made larger than the length LPI2 contrary to the above. However, in FIG. 5 , the case where the length LPI2 is larger than the length LPI1 is shown for convenience of description.

另一方面,受光阵列PI1和受光阵列PI2在基板BA上的配置形式如下。即,受光阵列PI2被配置成:从光源121(详细地说是光源121的光轴。以下同样。)到该受光阵列PI2的最短距离gPI2比从光源121到受光阵列PI1的最短距离gPI1小。并且,受光阵列PI2被配置成:从光源121到该受光阵列PI2的中心位置ci2的距离dPI2比从光源121到受光阵列PI1的中心位置ci1的距离dPI1小。On the other hand, the arrangements of light receiving array PI1 and light receiving array PI2 on substrate BA are as follows. That is, the light receiving array PI2 is arranged such that the shortest distance gPI2 from the light source 121 (specifically, the optical axis of the light source 121 ; the same applies hereinafter) to the light receiving array PI2 is smaller than the shortest distance gPI1 from the light source 121 to the light receiving array PI1 . In addition, the light receiving array PI2 is arranged such that the distance dPI2 from the light source 121 to the center position ci2 of the light receiving array PI2 is smaller than the distance dPI1 from the light source 121 to the center position ci1 of the light receiving array PI1 .

另外,中心位置ci1、ci2是受光阵列PI1、PI2的实质的中心位置即可。这里所说的“实质的中心位置”例如包括:虽然受光阵列PI1、PI2分别具有多个受光元件,但将它们作为一体来观察的情况下的平面图形(换句话说,具有将位于多个受光元件的最外侧的周缘连起来的轮廓的平面图形)的重心位置、该平面图形在测定方向C上的中心线与在宽度方向R上的中心线的交点位置、或者该平面图形的对角线的交点位置等。In addition, the central positions ci1 and ci2 may be substantially central positions of the light receiving arrays PI1 and PI2. The "substantial central position" mentioned here includes, for example: Although the light receiving arrays PI1 and PI2 have a plurality of light receiving elements, they are viewed as a whole when viewed as a plane figure (in other words, there are positions that will be located at a plurality of light receiving elements). The position of the center of gravity of the plane figure of the outline of the outermost periphery of the component), the position of the intersection of the center line of the plane figure in the measurement direction C and the center line in the width direction R, or the diagonal of the plane figure position of intersection, etc.

另外,受光阵列PI1和受光阵列PI2的配置形式不限定于上述情况。例如,可以使最短距离gPI2和最短距离gPI1大致相等,也可以与上述相反地使最短距离gPI2比最短距离gPI1大。并且,可以使距离dPI2和距离dPI1大致相等,也可以与上述相反地使距离dPI2比距离dPI1大。但是,在图5中,为了便于说明,图示了最短距离gPI2比最短距离gPI1小、且距离dPI2比距离dPI1小的情况。In addition, the arrangement|positioning form of light receiving array PI1 and light receiving array PI2 is not limited to the said case. For example, the shortest distance gPI2 and the shortest distance gPI1 may be made approximately equal, or contrary to the above, the shortest distance gPI2 may be made larger than the shortest distance gPI1. In addition, the distance dPI2 and the distance dPI1 may be made substantially equal, or the distance dPI2 may be made larger than the distance dPI1 contrary to the above. However, in FIG. 5 , for convenience of description, a case where the shortest distance gPI2 is smaller than the shortest distance gPI1 and the distance dPI2 is smaller than the distance dPI1 is shown.

并且,受光阵列PI1、PI2和受光阵列PA1、PA2在基板BA上的配置形式如下。即,受光阵列PI1、PI2和受光阵列PA1、PA2被配置成:受光阵列PI1与受光阵列PI2的最短距离gPI比受光阵列PI1与受光阵列PA1的最短距离gPA1以及受光阵列PI2与受光阵列PA2的最短距离gPA2小。In addition, the arrangements of light receiving arrays PI1 and PI2 and light receiving arrays PA1 and PA2 on the substrate BA are as follows. That is, the light-receiving arrays PI1, PI2 and the light-receiving arrays PA1, PA2 are configured such that the shortest distance gPI between the light-receiving array PI1 and the light-receiving array PI2 is shorter than the shortest distance gPA1 between the light-receiving array PI1 and the light-receiving array PA1 and the shortest distance between the light-receiving array PI2 and the light-receiving array PA2 The distance to gPA2 is small.

另外,受光阵列PI1、PI2和受光阵列PA1、PA2的配置形式不限定于上述情况。例如,可以使最短距离gPI和最短距离gPA1、gPA2大致相等,也可以与上述相反地使最短距离gPI比最短距离gPA1、gPA2大。但是,在图5中,为了便于说明,图示了最短距离gPI比最短距离gPA1、gPA2小的情况。In addition, the arrangement|positioning form of light receiving array PI1, PI2 and light receiving array PA1, PA2 is not limited to the said case. For example, the shortest distance gPI and the shortest distances gPA1 and gPA2 may be substantially equal, or contrary to the above, the shortest distance gPI may be made larger than the shortest distances gPA1 and gPA2. However, in FIG. 5 , for convenience of description, the case where the shortest distance gPI is smaller than the shortest distances gPA1 and gPA2 is shown.

在本实施方式中,例示了一维的图案作为绝对图案,与其对应的受光阵列PA1、PA2具有多个(本实施方式中例如为9个)受光元件(相当于第1受光元件的一例),所述多个受光元件以分别接受被对应的槽隙轨道SA1、SA2的反射槽隙反射的光的方式沿测定方向C(线Lcp)排列。在该多个受光元件中,如上述那样,一个个的受光或者非受光被处理为位元,表示9个位元的绝对位置。因此,多个受光元件分别接受的受光信号在位置数据生成部130被相互独立地处理,被加密化成(代码化成)串行的位元图案的绝对位置根据这些受光信号的组合进行解码。将该受光阵列PA1、PA2的受光信号称作“绝对信号”。另外,在使用了与本实施方式不同的绝对图案的情况下,受光阵列PA1、PA2成为与该图案对应的结构。In this embodiment, a one-dimensional pattern is exemplified as an absolute pattern, and the light receiving arrays PA1 and PA2 corresponding thereto have a plurality of (for example, nine in this embodiment) light receiving elements (corresponding to an example of a first light receiving element), The plurality of light receiving elements are arranged along the measurement direction C (line Lcp) so as to receive light reflected by the reflection slots of the corresponding slot tracks SA1 and SA2 . In the plurality of light-receiving elements, as described above, each light-receiving or non-light-receiving element is processed as a bit, and an absolute position of 9 bits is represented. Therefore, the light-receiving signals received by the plurality of light-receiving elements are independently processed in the position data generation unit 130, and the absolute positions encrypted (encoded) into serial bit patterns are decoded based on the combination of these light-receiving signals. The light-receiving signals of the light-receiving arrays PA1 and PA2 are referred to as "absolute signals". Moreover, when using the absolute pattern different from this embodiment, light receiving array PA1, PA2 becomes a structure corresponding to this pattern.

受光阵列PI1、PI2具有多个受光元件,所述多个受光元件以分别接受被对应的槽隙轨道SI1、SI2的反射槽隙反射的光的方式沿测定方向C(线Lcp)排列。首先,列举受光阵列PI1为例进行说明。The light receiving arrays PI1 and PI2 have a plurality of light receiving elements arranged along the measurement direction C (line Lcp) so as to receive light reflected by the reflection slots of the corresponding slot tracks SI1 and SI2, respectively. First, the light receiving array PI1 will be described as an example.

在本实施方式中,在槽隙轨道SI1的增量图案的1个间距(投影出的像的1个间距。即ε×P1。)中,排列有共计4个受光元件的组(图5中用“SET1”表示),而且,沿测定方向C进一步排列多个4个受光元件的组。并且,反射槽隙按照1个间距反复地形成增量图案,因此,各受光元件在盘110旋转的情况下按照1个间距生成1周期(以电气角表示为360°。)的周期信号。并且,在相当于1个间距的1个组中配置有4个受光元件,因此1个组内的相邻的受光元件之间检测彼此具有90°的相位差的周期信号。将该各受光信号称作A相信号、B相信号(相对于A相信号的相位差为90°)、/A相信号(相对于A相信号的相位差为180°)、/B相信号(相对于B相信号的相位差为180°)。In this embodiment, a total of four groups of light receiving elements are arranged in one pitch of the incremental pattern of the slot track SI1 (one pitch of the projected image. That is, ε×P1.) (in FIG. 5 Indicated by "SET1"), further, along the measurement direction C, a plurality of sets of four light-receiving elements are further arranged. Since the reflective slots repeatedly form an incremental pattern at one pitch, each light receiving element generates a periodic signal with one cycle (360° in electrical angle) at one pitch when the disk 110 rotates. In addition, since four light receiving elements are arranged in one group corresponding to one pitch, adjacent light receiving elements in one group detect periodic signals having a mutual phase difference of 90°. These received light signals are called A-phase signal, B-phase signal (90° phase difference from A-phase signal), /A-phase signal (180° phase difference from A-phase signal), /B-phase signal (The phase difference with respect to the B-phase signal is 180°).

增量图案表示1个间距中的位置,因此,1个组中的各相位的信号和与其对应的其他组中的各相位的信号成为同样地变化的值。因此,同一相位的信号遍布多个组地被累加。因此,从图5所示的受光阵列PI1的大量受光元件检测相位各相差90°的4个信号。Since the incremental pattern indicates the position in one pitch, the signal of each phase in one group and the signal of each phase in the other corresponding group have values that change similarly. Therefore, signals of the same phase are accumulated over a plurality of groups. Therefore, four signals whose phases are different from each other by 90° are detected from a large number of light receiving elements of the light receiving array PI1 shown in FIG. 5 .

另一方面,受光阵列PI2也与受光阵列PI1同样地构成。即,在槽隙轨道SI2的增量图案的1个间距(投影出的像的1个间距。即ε×P2。)中,排列有共计4个受光元件的组(图5中用“SET2”表示),而且,沿测定方向C排列多个4个受光元件的组。因此,从受光阵列PI1、PI2分别生成相位各相差90°的4个信号。将这4个信号称作“增量信号”。并且,由与间距短的槽隙轨道SI2对应的受光阵列PI2生成的增量信号与其他增量信号相比为高分辨率,所以称作“高增量信号”,由与间距长的槽隙轨道SI1对应的受光阵列PI1生成的增量信号与其他增量信号相比为低分辨率,所以称作“低增量信号”。On the other hand, light receiving array PI2 is also comprised similarly to light receiving array PI1. That is, in one pitch of the incremental pattern of the slot track SI2 (one pitch of the projected image. That is, ε×P2.), a total of four sets of light receiving elements (in FIG. 5 "SET2" ), and a plurality of groups of four light-receiving elements are arranged along the measurement direction C. Therefore, four signals whose phases are different from each other by 90° are generated from the light receiving arrays PI1 and PI2 . These four signals are called "incremental signals". In addition, the incremental signal generated by the light-receiving array PI2 corresponding to the short-pitch slot track SI2 has a high resolution compared with other incremental signals, so it is called "high incremental signal". Compared with other incremental signals, the incremental signal generated by the corresponding light receiving array PI1 has a lower resolution, so it is called "low incremental signal".

另外,在本实施方式中,将在相对于增量图案的1个间距的1个组包括4个受光元件的情况作为一例进行说明,但例如可以是在1个组包括2个受光元件等,1个组中的受光元件数不特别限定。In addition, in this embodiment, a case where four light receiving elements are included in one group with respect to one pitch of the incremental pattern is described as an example, but for example, two light receiving elements may be included in one group, The number of light receiving elements in one group is not particularly limited.

(2-3.位置数据生成部)(2-3. Position data generation unit)

位置数据生成部130在测定马达M的绝对位置的时刻,从光学模块120取得分别具备表示绝对位置的位元图案的2个绝对信号、以及包括相位各相差90°的4个信号的高增量信号和低增量信号。然后,位置数据生成部130根据取得的信号,计算这些信号表示的马达M的绝对位置,并将计算出的表示绝对位置的位置数据输出到控制装置CT。When measuring the absolute position of the motor M, the position data generator 130 acquires from the optical module 120 two absolute signals each having a bit pattern indicating the absolute position, and a high incremental signal and a high-increment signal including four signals whose phases are different by 90°. low delta signal. Then, the position data generator 130 calculates the absolute position of the motor M indicated by these signals based on the acquired signals, and outputs the calculated position data indicating the absolute position to the control device CT.

另外,位置数据生成部130的位置数据的生成方法能够使用各种各样的方法,不特别限定。这里,以根据高增量信号及低增量信号、绝对信号计算绝对位置并生成位置数据的情况为例进行说明。In addition, various methods can be used for generating the position data by the position data generating unit 130 and are not particularly limited. Here, the case where the absolute position is calculated based on the high incremental signal, low incremental signal, and absolute signal to generate position data will be described as an example.

如图6所示,位置数据生成部130具有:绝对位置确定部131、第1位置确定部132、第2位置确定部133和位置数据计算部134。绝对位置确定部131将来自受光阵列PA1、PA2的绝对信号分别二值化,并转换成表示绝对位置的位元数据。然后,根据预先确定的位元数据与绝对位置的对应关系确定绝对位置。As shown in FIG. 6 , the position data generating unit 130 includes an absolute position specifying unit 131 , a first position specifying unit 132 , a second position specifying unit 133 , and a position data calculating unit 134 . The absolute position specifying unit 131 binarizes the absolute signals from the light receiving arrays PA1 and PA2 respectively, and converts them into bit data representing an absolute position. Then, the absolute position is determined according to the predetermined correspondence between the bit data and the absolute position.

另一方面,第1位置确定部132将来自受光阵列PI1的4个相位各自的低增量信号中、180°相位差的低增量信号彼此相减。这样,通过使具有180°相位差的信号相减,能够抵消1个间距内的反射槽隙的制造误差和测定误差等。这里,将如上述那样相减得到结果的信号称作“第1增量信号”和“第2增量信号”。关于该第1增量信号和第2增量信号,彼此电气角具有90°的相位差(简称作“A相信号”、“B相信号”等。)。因此,第1位置确定部132根据这2个信号确定1个间距内的位置。该1个间距内的位置的确定方法不特别限定。例如,在作为周期信号的低增量信号为正弦波信号的情况下,作为上述确定方法的例子,存在通过对A相和B相这2个正弦波信号的相除结果进行arctan运算来计算电气角的方法。或者,还存在使用跟踪电路将2个正弦波信号转换成电气角的方法。或者,还存在确定预先制作的表中与A相和B相的信号的值对应的电气角的方法。另外,这时,第1位置确定部132优选将A相和B相这2个正弦波信号按照各检测信号进行模拟-数字转换。On the other hand, the first position specifying unit 132 subtracts the low delta signals with a phase difference of 180° among the low delta signals of the four phases from the light receiving array PI1 . In this way, by subtracting the signals having a phase difference of 180°, it is possible to cancel out manufacturing errors, measurement errors, and the like of reflection slots within one pitch. Here, the signals obtained by subtraction as described above are referred to as "first incremental signal" and "second incremental signal". The first incremental signal and the second incremental signal have a phase difference of 90° in electrical angle (abbreviated as "A-phase signal", "B-phase signal", etc.). Therefore, the first position specifying unit 132 specifies a position within one pitch based on these two signals. The method of specifying the position within one pitch is not particularly limited. For example, in the case where the low-incremental signal that is a periodic signal is a sine wave signal, as an example of the above-mentioned determination method, there is an arctan calculation for the division result of two sine wave signals, A phase and B phase, to calculate the electrical horn Methods. Alternatively, there is also the use of a tracking circuit to convert 2 sine wave signals into electrical degrees Methods. Alternatively, there is also a determination of the electrical angle corresponding to the values of the A-phase and B-phase signals in a pre-made table Methods. In addition, at this time, it is preferable that the first position specifying unit 132 performs analog-to-digital conversion of the two sine wave signals of the A phase and the B phase according to each detection signal.

位置数据计算部134使利用第1位置确定部132确定的1个间距内的位置与利用绝对位置确定部131确定的绝对位置重叠。由此,能够计算比基于绝对信号的绝对位置高分辨率的绝对位置。在本实施方式中,该计算出的绝对位置的分辨率与间距短的槽隙轨道SI2的槽隙数一致。即,在该例子中,计算出的绝对位置的分辨率是基于绝对信号的绝对位置的分辨率的2倍。The position data calculating unit 134 superimposes the position within one pitch specified by the first position specifying unit 132 and the absolute position specified by the absolute position specifying unit 131 . Accordingly, it is possible to calculate an absolute position with a higher resolution than an absolute position based on an absolute signal. In this embodiment, the resolution of the calculated absolute position corresponds to the number of slots of the short-pitch slot track SI2. That is, in this example, the resolution of the calculated absolute position is twice the resolution of the absolute position based on the absolute signal.

另一方面,第2位置确定部133对来自受光阵列PI2的高增量信号进行与上述的第1位置确定部132同样的处理,根据2个信号确定1个间距内的高精度的位置。然后,位置数据计算部134使利用第2位置确定部133确定出的1个间距内的位置与根据上述的低增量信号计算出的绝对位置重叠。由此,能够计算出比根据低增量信号计算出的绝对位置更高分辨率的绝对位置。On the other hand, the second position specifying unit 133 performs the same processing as the above-mentioned first position specifying unit 132 on the high-increment signal from the light receiving array PI2, and specifies a high-precision position within one pitch from the two signals. Then, the position data calculation unit 134 superimposes the position within one pitch specified by the second position specifying unit 133 on the absolute position calculated from the aforementioned low incremental signal. As a result, it is possible to calculate an absolute position with higher resolution than the absolute position calculated from the low incremental signal.

位置数据计算部134对这样地计算出的绝对位置进行倍增处理而进一步提高分辨率之后,作为表示高精度的绝对位置的位置数据输出到控制装置CT。这里,将像这样根据分辨率不同的多个位置数据确定高分辨率的绝对位置的方法称作“累积方式”。The position data calculation unit 134 multiplies the absolute position calculated in this way to further increase the resolution, and then outputs it to the control device CT as position data representing a highly accurate absolute position. Here, the method of specifying a high-resolution absolute position from a plurality of pieces of position data having different resolutions is called an "accumulation method".

<3.本实施方式的效果的例子><3. Examples of effects of this embodiment>

在以上说明的实施方式中,编码器100具有多个种类的槽隙轨道SI1、SI2和受光阵列PI1、PI2,所述多个种类的槽隙轨道SI1、SI2分别具有间距不同的增量图案,所述受光阵列PI1、PI2构成为分别接受被多个种类的槽隙轨道SI1、SI2反射的光。由此,利用将受光阵列PI1的低增量信号的倍增处理和受光阵列PI2的高增量信号的倍增处理累积起来的倍增累积方式,能够生成表示高分辨率的绝对位置的位置数据,因此,能够实现高的分辨率。In the embodiment described above, the encoder 100 has a plurality of types of slot tracks SI1, SI2 and light receiving arrays PI1, PI2, and the plurality of types of slot tracks SI1, SI2 respectively have incremental patterns with different pitches, The light receiving arrays PI1 and PI2 are configured to receive light reflected by a plurality of types of slot tracks SI1 and SI2, respectively. Thus, by using the multiplication and accumulation method of accumulating the multiplication processing of the low-increment signal of the light-receiving array PI1 and the multiplication processing of the high-increment signal of the light-receiving array PI2, the position data representing the absolute position of high resolution can be generated, and therefore, the realization of high resolution.

并且,在这样地将受光阵列PI1的信号的倍增处理和受光阵列PI2的信号的倍增处理累积的情况下,编码器100的最终的绝对位置的精度受到从受光阵列PI2输出的高增量信号的精度的影响相对大。如前述那样,在本实施方式中,受光阵列PI1在宽度方向R上的长度WPI1比受光阵列PI2在宽度方向R上的长度WPI2小。换句话说,受光阵列PI2在宽度方向R上的长度WPI2比受光阵列PI1在宽度方向R上的长度WPI1大。由此,能够使要求精度的受光阵列PI2的受光面积相比受光阵列PI1扩大,从而增大受光阵列PI2的受光量。其结果是,受光阵列PI2的模拟信号即受光信号的SN比增高,因此能够提高之后的倍增处理的精度。因此,能够实现编码器100的高分辨率化。In addition, when the multiplication processing of the signal of the light receiving array PI1 and the multiplication processing of the signal of the light receiving array PI2 are integrated in this way, the accuracy of the final absolute position of the encoder 100 is affected by the accuracy of the high incremental signal output from the light receiving array PI2. The impact is relatively large. As mentioned above, in this embodiment, the length WPI1 of the light receiving array PI1 in the width direction R is smaller than the length WPI2 of the light receiving array PI2 in the width direction R. In other words, the length WPI2 of the light receiving array PI2 in the width direction R is larger than the length WPI1 of the light receiving array PI1 in the width direction R. Thereby, the light receiving area of the light receiving array PI2 which requires precision can be enlarged compared with the light receiving array PI1, and the light receiving quantity of the light receiving array PI2 can be increased. As a result, since the SN ratio of the light-receiving signal which is an analog signal of the light-receiving array PI2 increases, the precision of the subsequent multiplication process can be improved. Therefore, high resolution of the encoder 100 can be realized.

并且,在本实施方式中,在以从光源121到受光阵列PI2的最短距离gPI2比从光源121到受光阵列PI1的最短距离gPI1小的方式配置受光阵列PI1、PI2的情况下,得到如下效果。也就是说,利用上述结构,能够使对绝对位置的精度引起相对大的影响的受光阵列PI2比受光阵列PI1靠近光源121,因此,能够增大受光阵列PI2的受光量。并且,还能够提高受光阵列PI2的高增量信号的响应性。Furthermore, in the present embodiment, when the light receiving arrays PI1 and PI2 are arranged such that the shortest distance gPI2 from the light source 121 to the light receiving array PI2 is smaller than the shortest distance gPI1 from the light source 121 to the light receiving array PI1, the following effects are obtained. That is, with the above configuration, the light receiving array PI2 which has a relatively large influence on the accuracy of the absolute position can be brought closer to the light source 121 than the light receiving array PI1 , and thus the amount of light received by the light receiving array PI2 can be increased. Furthermore, the responsiveness of the light receiving array PI2 to a high incremental signal can also be improved.

并且,在本实施方式中,在以从光源121到受光阵列PI2的中心位置ci2的距离dPI2比从光源121到受光阵列PI1的中心位置ci1的距离dPI1小的方式配置受光阵列PI1、PI2的情况下,得到如下效果。也就是说,利用上述结构,能够使对绝对位置的精度引起相对大的影响的受光阵列PI2比受光阵列PI1更进一步靠近光源121,因此,能够进一步增大受光阵列PI2的受光量。并且,还能够进一步提高受光阵列PI2的高增量信号的响应性。Furthermore, in the present embodiment, when the light receiving arrays PI1 and PI2 are arranged such that the distance dPI2 from the light source 121 to the center position ci2 of the light receiving array PI2 is smaller than the distance dPI1 from the light source 121 to the center position ci1 of the light receiving array PI1 Next, the following effect is obtained. That is to say, with the above structure, the light receiving array PI2 which has a relatively large influence on the accuracy of the absolute position can be brought closer to the light source 121 than the light receiving array PI1, and thus the light receiving amount of the light receiving array PI2 can be further increased. Furthermore, the responsiveness of the high incremental signal of the light receiving array PI2 can be further improved.

并且,在本实施方式中,在使受光阵列PI2在测定方向C上的长度LPI2比受光阵列PI1在测定方向C上的长度LPI1大的情况下,能够使受光阵列PI2的受光面积相比受光阵列PI1进一步扩大,从而进一步增大受光阵列PI2的受光量。Furthermore, in this embodiment, when the length LPI2 of the light receiving array PI2 in the measurement direction C is made larger than the length LPI1 of the light receiving array PI1 in the measurement direction C, the light receiving area of the light receiving array PI2 can be made larger than the length LPI1 of the light receiving array PI2. PI1 further expands, thereby further increasing the amount of light received by the light receiving array PI2.

并且,在本实施方式中,特别地,受光阵列PI1和受光阵列PI2被配置在2个受光阵列PA1、PA2之间,所述2个受光阵列PA1、PA2被配置成在宽度方向R以将光源121夹在它们之间的方式实质上对称。在这样的结构中,受光阵列PI1和受光阵列PI2配置在受光阵列PA1、PA2之间的受限的区域内。通过在该有限的区域内,如上述那样地构成下述配置形式中的至少任意一种,能够使受光阵列PI1、PI2的配置形式最优化,以实现编码器100的高分辨率化,所述配置形式包括:使受光阵列PI2在宽度方向R上的长度WPI2比受光阵列PI1在宽度方向R上的长度WPI1大;使从光源121到受光阵列PI2的最短距离gPI2比从光源121到受光阵列PI1的最短距离gPI1小;使从光源121到受光阵列PI2的中心位置ci2的距离dPI2比从光源121到受光阵列PI1的中心位置ci1的距离dPI1小;以及使受光阵列PI2在测定方向C上的长度LPI2比受光阵列PI1在测定方向C上的长度LPI1大等。Moreover, in this embodiment, in particular, the light-receiving array PI1 and the light-receiving array PI2 are arranged between two light-receiving arrays PA1 and PA2, and the two light-receiving arrays PA1 and PA2 are arranged in the width direction R so that the light source The manner in which 121 is sandwiched between them is substantially symmetrical. In such a structure, light receiving array PI1 and light receiving array PI2 are arrange|positioned in the limited area between light receiving array PA1, PA2. By constituting at least one of the following arrangements in this limited area as described above, the arrangement of the light receiving arrays PI1, PI2 can be optimized to achieve high resolution of the encoder 100. The configuration includes: making the length WPI2 of the light-receiving array PI2 in the width direction R larger than the length WPI1 of the light-receiving array PI1 in the width direction R; The shortest distance gPI1 is small; the distance dPI2 from the light source 121 to the center position ci2 of the light-receiving array PI2 is smaller than the distance dPI1 from the light source 121 to the center position ci1 of the light-receiving array PI1; and the length of the light-receiving array PI2 in the measuring direction C LPI2 is larger than length LPI1 of light receiving array PI1 in measurement direction C, etc.

并且,在本实施方式中,在以受光阵列PI1与受光阵列PI2的最短距离gPI比受光阵列PI1与受光阵列PA1的最短距离gPA1以及受光阵列PI2与受光阵列PA2的最短距离gPA2小的方式配置各受光阵列的情况下,得到如下效果。即,在编码器100中,由于因盘110的偏心引起的槽隙的反射像的偏移、光源121的射出面具有有限的面积而使得各受光阵列的宽度方向R上的光量分布成为梯形形状等的影响,若各受光阵列之间的间隔小,则容易在宽度方向R上相邻的受光阵列之间产生串扰。In addition, in this embodiment, the shortest distance gPI between the light-receiving array PI1 and the light-receiving array PI2 is smaller than the shortest distance gPA1 between the light-receiving array PI1 and the light-receiving array PA1 and the shortest distance gPA2 between the light-receiving array PI2 and the light-receiving array PA2. In the case of a light-receiving array, the following effects are obtained. That is, in the encoder 100, due to the offset of the reflected image of the slot due to the eccentricity of the disk 110, and the limited area of the emitting surface of the light source 121, the light quantity distribution in the width direction R of each light receiving array becomes a trapezoidal shape. etc., if the interval between the light receiving arrays is small, crosstalk is likely to occur between adjacent light receiving arrays in the width direction R.

此外,对由于反射光的漫反射成分引起的串扰进行说明。如图7所示,在盘110的材质111的表面存在大量细微的凹凸,因此,从光源121射出的光在盘110发生反射时产生漫反射(散射)。In addition, crosstalk due to diffuse reflection components of reflected light will be described. As shown in FIG. 7 , since there are many fine irregularities on the surface of the material 111 of the disc 110 , light emitted from the light source 121 is diffusely reflected (scattered) when reflected by the disc 110 .

图8中概念性地示出材质111的细微的凹凸中的凸部112的形状的一例。另外,图8中漫反射成分的各箭头的长度表示强度的大小。图8所示的例子中,凸部112具有上表面112a和包围上表面112a的周围的倾斜的侧面112b。上表面112a具有较平坦的形状,因此,来自斜上方(在该例中为Y轴向正侧且Z轴向正侧)的入射光所照射的面积大,但侧面112b由于倾斜而入射光所照射的面积小。因此,关于由入射光产生的漫反射成分的强度,如图8所示,被上表面112a散射的前方散射成分Lf、上方散射成分Lu、和后方散射成分Lb相对大,被侧面112b向周围方向散射的侧方散射成分Ls相对小。并且,前方散射成分Lf、上方散射成分Lu、后方散射成分Lb中,向正反射方向散射的前方散射成分Lf的强度最大,向上方散射的上方散射成分Lu和与入射光的行进方向相反地散射的后方散射成分Lb的强度为中间程度(比侧方散射成分Ls大)。因此,整体上漫反射成分的分布中,沿Y-Z平面的方向是主导地位的。FIG. 8 conceptually shows an example of the shape of the convex portion 112 among the fine unevenness of the material 111 . In addition, the length of each arrow of the diffuse reflection component in FIG. 8 indicates the magnitude of the intensity. In the example shown in FIG. 8, the convex part 112 has the upper surface 112a and the inclined side surface 112b which surrounds the periphery of the upper surface 112a. The upper surface 112a has a relatively flat shape, so the area irradiated by the incident light from obliquely above (in this example, the positive side of the Y-axis and the positive side of the Z-axis) is large, but the side surface 112b is obliquely illuminated by the incident light. The irradiated area is small. Therefore, with regard to the intensity of the diffuse reflection component generated by the incident light, as shown in FIG. The side scattering component Ls of the scattering is relatively small. Furthermore, among the forward scattering component Lf, the upward scattering component Lu, and the back scattering component Lb, the intensity of the forward scattering component Lf scattered in the regular reflection direction is the largest, and the upward scattering component Lu scattered upward is scattered in the direction opposite to the direction of incident light. The intensity of the backscattering component Lb is intermediate (larger than the side scattering component Ls). Therefore, in the distribution of diffuse reflection components as a whole, the direction along the Y-Z plane is dominant.

图9中示出从X轴正方向观察的漫反射成分的强度分布,图10中示出从Z轴正方向观察的漫反射成分的强度分布。另外,图9中各箭头的长度表示强度的大小,图10中距点E的距离表示强度的大小。利用上述的凸部112的漫反射,大量细微的凸部112所存在的盘110的表面的漫反射成分的强度分布如图9和图10所示那样,在沿包括光的行进方向的面(在该例中为Y-Z平面)的方向上成为较长的形状,整体在Y轴方向上具有方向性。更详细地说,如图10所示,该漫反射成分的强度分布以反射位置E为中心,成为将沿光的行进方向排列的2个圆连接而成的大致8字状的分布,特别地,成为光的行进方向里侧的圆比行进方向近前侧的圆大的分布形状。即,在光学模块120中相对于光源121在相同方向上配置有2个受光阵列的情况下,在两受光阵列之间,发生应到达一个受光阵列的反射光的散射光到达另一受光阵列等串扰,成为噪声的原因。并且,远离光源121的受光阵列比靠近光源121的受光阵列更多地接受彼此的光的漫反射成分,因此,存在产生更大的噪声的情况。FIG. 9 shows the intensity distribution of the diffuse reflection component viewed from the positive X-axis direction, and FIG. 10 shows the intensity distribution of the diffuse reflection component viewed from the positive Z-axis direction. In addition, the length of each arrow in FIG. 9 indicates the intensity, and the distance from point E in FIG. 10 indicates the intensity. Utilizing the above-mentioned diffuse reflection of the convex portion 112, the intensity distribution of the diffuse reflection component on the surface of the disk 110 where a large number of fine convex portions 112 exist, as shown in FIGS. In this example, it has a long shape in the direction of the Y-Z plane), and has directionality in the Y-axis direction as a whole. More specifically, as shown in FIG. 10 , the intensity distribution of the diffuse reflection component has a roughly figure-of-eight distribution formed by connecting two circles arranged along the light traveling direction with the reflection position E as the center. , a distribution shape in which the circle on the far side in the traveling direction of light is larger than the circle on the near side in the traveling direction. That is, when two light-receiving arrays are arranged in the same direction with respect to the light source 121 in the optical module 120, between the two light-receiving arrays, scattered light of reflected light that should reach one light-receiving array reaches the other light-receiving array, etc. Crosstalk becomes a cause of noise. In addition, since the light receiving arrays farther from the light source 121 receive more diffuse reflection components of each other's light than the light receiving arrays close to the light source 121 , larger noise may be generated.

并且,关于受光阵列PA1、PA2分别输出的绝对信号,基于多个受光元件各自的检测或未检测的位元图案唯一地表示绝对位置。在这样的信号的性质方面,受光阵列PA1、PA2抗噪声能力相对低。并且,受光阵列PA1、PA2所输出的绝对信号与增量信号不同,不会成为反复信号(正弦波等),因此,应被受光阵列PA1、PA2接受的光的反射成分被受光阵列PI1或者受光阵列PI2接受而引起的噪声难以通过过滤器来降低。因此,优选尽量避免在受光阵列PI1和受光阵列PA1之间、以及受光阵列PI2和受光阵列PA2之间噪声相互叠加的情况。Furthermore, absolute positions are uniquely indicated based on the detected or undetected bit patterns of the respective light receiving arrays PA1 and PA2 for the absolute signals output by the light receiving arrays PA1 and PA2 . In terms of the nature of such signals, the light-receiving arrays PA1 and PA2 have relatively low noise immunity. In addition, the absolute signal output by the light receiving arrays PA1 and PA2 is different from the incremental signal, and will not become a repetitive signal (sine wave, etc.). The noise induced by array PI2 acceptance is difficult to reduce by filters. Therefore, it is preferable to avoid superposition of noise between light receiving array PI1 and light receiving array PA1 and between light receiving array PI2 and light receiving array PA2 as much as possible.

另一方面,关于受光阵列PI1所输出的低增量信号和受光阵列PI2所输出的高增量信号,后者的周期为前者的1/2,并且是彼此相位相等的关系。因此,通过进行A相信号和B相信号的差分、多个受光元件之间的同相信号的相加,抵消了彼此相互叠加的噪声。因此,即使噪声在受光阵列PI1和受光阵列PI2之间相互叠加,影响也会比较小。On the other hand, regarding the low incremental signal output by the light receiving array PI1 and the high incremental signal output by the light receiving array PI2 , the period of the latter is 1/2 of the former, and they are in a phase-equal relationship with each other. Therefore, by performing the difference between the A-phase signal and the B-phase signal and adding the in-phase signals between the plurality of light receiving elements, noises superimposed on each other are cancelled. Therefore, even if noise is superimposed on each other between the light receiving array PI1 and the light receiving array PI2, the influence will be relatively small.

鉴于以上那样的情况,在本实施方式中,如上述那样以噪声的相互叠加的影响相对小的受光阵列PI1与受光阵列PI2的最短距离gPI比噪声的相互叠加的影响相对大的受光阵列PI1与受光阵列PA1的最短距离gPA1以及受光阵列PI2与受光阵列PA2的最短距离gPA2小的方式配置各受光阵列。由此,能够降低上述的槽隙的反射像的偏移、光量分布的形状等影响引起的各受光阵列之间的串扰的影响,并且能够降低基于上述的光的漫反射成分的强度分布的、从受光阵列PI1向受光阵列PA1的漫反射成分以及从受光阵列PI2向受光阵列PA2的漫反射成分。因此,能够提高位置数据的可靠性。In view of the above circumstances, in this embodiment, the shortest distance gPI between the light-receiving array PI1 and the light-receiving array PI2 whose mutual influence of noise is relatively small as described above is greater than the shortest distance gPI between the light-receiving arrays PI1 and PI2 whose mutual influence of noise is relatively large. Each light receiving array is arrange|positioned so that the shortest distance gPA1 of light receiving array PA1 and the shortest distance gPA2 of light receiving array PI2 and light receiving array PA2 are small. Thereby, it is possible to reduce the influence of the crosstalk between the light-receiving arrays caused by the shift of the reflected image of the slit and the shape of the light intensity distribution, and to reduce the influence of the intensity distribution based on the diffuse reflection component of the above-mentioned light. The diffuse reflection component from the light receiving array PI1 to the light receiving array PA1 and the diffuse reflection component from the light receiving array PI2 to the light receiving array PA2. Therefore, the reliability of position data can be improved.

并且,在本实施方式中,特别地,编码器100构成为反射型的编码器。在反射型的编码器中,由于因前述的盘110的偏心引起的槽隙的偏移在反射像上倍增,以及因使用射出扩散光的光源121而光量分布容易成为梯形形状,因此,若受光阵列之间的间隔小的话,在宽度方向R相邻的受光阵列之间更容易产生串扰。因此,可以说本实施方式的各受光阵列的配置形式对反射型的编码器的应用是更有效的。并且,通过使编码器100构成为反射型的编码器,能够靠近光源121地配置受光阵列PI1、PI2和受光阵列PA1、PA2,因此,能够使编码器100小型化。Furthermore, in the present embodiment, the encoder 100 is particularly configured as a reflective encoder. In a reflective encoder, since the offset of the slot due to the eccentricity of the disc 110 described above is multiplied on the reflected image, and the light distribution is likely to become a trapezoidal shape due to the use of the light source 121 that emits diffused light, if the received light When the interval between arrays is small, crosstalk is more likely to occur between adjacent light-receiving arrays in the width direction R. Therefore, it can be said that the arrangement form of each light-receiving array in this embodiment is more effective for application to a reflective encoder. In addition, by configuring the encoder 100 as a reflective encoder, the light receiving arrays PI1 , PI2 and the light receiving arrays PA1 , PA2 can be arranged close to the light source 121 , so the encoder 100 can be downsized.

<4.变形例><4. Modifications>

以上,一边参照附图一边对一个实施方式进行了详细说明。然而,权利要求书中记载的技术思想的范围不限定于这里所说明的实施方式。显然,只要是具有本实施方式所属的技术领域的通常知识的人,就能够想到在技术思想的范围内进行各种各样的变更、修正、组合等。因此,进行了这些变更、修正、组合等之后的技术当然也属于技术思想的范围。As above, one embodiment has been described in detail with reference to the drawings. However, the range of technical ideas described in the claims is not limited to the embodiments described here. It is obvious that various changes, corrections, combinations, and the like can be conceived within the scope of the technical idea as long as a person having ordinary knowledge in the technical field to which the present embodiment belongs. Therefore, it is a matter of course that technologies after such changes, corrections, combinations, etc. are made also belong to the scope of technical ideas.

(4-1.将受光阵列PI1配置在比受光阵列PI2靠外周侧的位置)(4-1. Arranging the light receiving array PI1 on the outer peripheral side than the light receiving array PI2)

在上述实施方式中,将受光阵列PI1配置在比受光阵列PI2靠内周侧的位置的情况作为一例进行了说明,但例如也可以如图11所示地将受光阵列PI1配置在比受光阵列PI2靠外周侧的位置。本变形例的各受光阵列的尺寸关系和配置形式也与上述实施方式相同。也就是说,受光阵列PI2在宽度方向R上的长度WPI2比受光阵列PI1在宽度方向R上的长度WPI1大,从光源121到受光阵列PI2的最短距离gPI2比从光源121到受光阵列PI1的最短距离gPI1小。并且,从光源121到受光阵列PI2的中心位置ci2的距离dPI2比从光源121到受光阵列PI1的中心位置ci1的距离dPI1小,并且受光阵列PI2在测定方向C上的长度LPI2比受光阵列PI1在测定方向C上的长度LPI1大。并且,受光阵列PI1与受光阵列PI2的最短距离gPI比受光阵列PI1与受光阵列PA2的最短距离gPA2以及受光阵列PI2与受光阵列PA1的最短距离gPA1小。虽省略图示,但在本变形例的情况下,在盘110中,4条槽隙轨道从宽度方向R的内侧朝向外侧按照SA1、SI2、SI1、SA2的顺序配置。In the above-mentioned embodiment, the case where the light-receiving array PI1 is disposed on the inner peripheral side of the light-receiving array PI2 has been described as an example. However, for example, as shown in FIG. on the outer peripheral side. The dimensional relationship and arrangement form of each light-receiving array in this modified example are also the same as those in the above-mentioned embodiment. That is to say, the length WPI2 of the light-receiving array PI2 in the width direction R is larger than the length WPI1 of the light-receiving array PI1 in the width direction R, and the shortest distance gPI2 from the light source 121 to the light-receiving array PI2 is shorter than the shortest distance gPI2 from the light source 121 to the light-receiving array PI1. The distance from gPI1 is small. In addition, the distance dPI2 from the light source 121 to the center position ci2 of the light receiving array PI2 is smaller than the distance dPI1 from the light source 121 to the center position ci1 of the light receiving array PI1, and the length LPI2 of the light receiving array PI2 in the measuring direction C is shorter than that of the light receiving array PI1 in The length LPI1 in the measurement direction C is large. In addition, the shortest distance gPI between the light receiving array PI1 and the light receiving array PI2 is smaller than the shortest distance gPA2 between the light receiving array PI1 and the light receiving array PA2 and the shortest distance gPA1 between the light receiving array PI2 and the light receiving array PA1. Although not shown, in the case of this modified example, four slot tracks are arranged in the order of SA1, SI2, SI1, and SA2 from the inner side toward the outer side in the width direction R on the disc 110 .

在本变形例中,也得到与上述实施方式同样的效果。并且,在采用上述结构的情况下,能够提高低增量信号针对偏心的稳定性。也就是说,一般由盘110的偏心引起的检测误差具有依赖于槽隙轨道的半径的性质,半径小的话误差就大,半径大的话误差就小。在本变形例中,受光阵列PI1配置在比受光阵列PI2靠外周侧的位置,在盘110中槽隙轨道SI1配置在外周侧,从而能够增大该槽隙轨道SI1的半径。其结果是,能够减小由受光阵列PI1的偏心引起的检测误差,能够提高针对偏心的稳定性。因此,优选在提高高增量信号针对偏心的稳定性的情况下,采用上述实施方式的结构,在提高低增量信号针对偏心的稳定性的情况下,采用该结构。Also in this modified example, the same effect as that of the above-mentioned embodiment is obtained. Furthermore, in the case of adopting the above structure, the stability of the low incremental signal against eccentricity can be improved. In other words, generally, the detection error caused by the eccentricity of the disk 110 has a property of depending on the radius of the slot track, and the error is large if the radius is small, and the error is small if the radius is large. In this modified example, the light receiving array PI1 is arranged on the outer peripheral side than the light receiving array PI2, and the slot track SI1 is arranged on the outer peripheral side in the disk 110, so that the radius of the slot track SI1 can be increased. As a result, the detection error due to the eccentricity of the light receiving array PI1 can be reduced, and the stability against eccentricity can be improved. Therefore, it is preferable to adopt the structure of the above-described embodiment when improving the stability of the high-increment signal against eccentricity, and to adopt the structure when improving the stability of the low-increment signal against eccentricity.

(4-2.将一条结构的绝对用受光阵列配置在内周侧)(4-2. Arranging the absolute light-receiving array of one structure on the inner peripheral side)

在上述实施方式中,将受光阵列PA1、PA2在宽度方向R上偏置地配置而构成为2个轨道的情况作为一例进行了说明,但受光阵列PA1、PA2的配置结构不限定于此,也可以构成为一条。In the above-mentioned embodiment, the case where the light-receiving arrays PA1 and PA2 are arranged offset in the width direction R to form two tracks has been described as an example, but the arrangement structure of the light-receiving arrays PA1 and PA2 is not limited to this, and can be constituted as one.

如图12所示,在本变形例中,在受光阵列PI1的内周侧配置有与绝对图案对应的受光阵列PA。虽省略图示,但在本变形例的情况下,在盘110中,3条槽隙轨道从宽度方向R的内侧朝向外侧按照SA、SI1、SI2的顺序呈同心圆状配置。受光阵列PA具有2种类型的受光阵列PA1、PA2。分别构成所述受光阵列PA1、PA2的受光元件p1、p2沿测定方向C(线Lcp)交替配置,由此2个受光阵列PA1、PA2构成为单一轨道(1条)的受光阵列PA。在受光阵列PA1、PA2中,分别来自槽隙轨道SA的反射光被接受,生成具有受光元件数的位元图案的绝对信号。另外,受光阵列PA相当于第3受光阵列的一例。As shown in FIG. 12, in this modification, the light receiving array PA corresponding to the absolute pattern is arrange|positioned on the inner peripheral side of the light receiving array PI1. Although not shown, in the case of this modified example, three slot tracks are concentrically arranged in the order of SA, SI1, and SI2 from the inner side toward the outer side in the width direction R on the disk 110 . The light receiving array PA has two types of light receiving arrays PA1 and PA2. The light receiving elements p1 and p2 respectively constituting the light receiving arrays PA1 and PA2 are alternately arranged along the measurement direction C (line Lcp), whereby the two light receiving arrays PA1 and PA2 constitute a single track (one) light receiving array PA. In the light-receiving arrays PA1 and PA2, the reflected light from the slot track SA is received, and an absolute signal having a bit pattern of the number of light-receiving elements is generated. In addition, the light receiving array PA corresponds to an example of the 3rd light receiving array.

在该例子中,受光元件p1的配置间距和受光元件p2的配置间距都与槽隙轨道SA的反射槽隙在测定方向C上的最小长度(间距P1)对应(投影出的像的最小长度。即ε×P1。),各受光元件p1、p2在测定方向C上的长度与ε×P1的一半一致。由此,受光阵列PA1、PA2彼此在测定方向C上偏置1位元的1/2的长度(相当于间距P1的一半),与上述的实施方式同样地,在基于受光阵列PA1的绝对位置相当于位元图案的转变点的情况下,使用来自受光阵列PA2的检测信号计算绝对位置,或者相反地进行,由此能够提高绝对位置的检测精度。另外,各受光元件p1、p2在测定方向C上的长度不限定于上述情况,也可以为ε×P1的一半以外的长度。In this example, both the arrangement pitch of the light receiving elements p1 and the arrangement pitch of the light receiving elements p2 correspond to the minimum length (pitch P1) of the reflection slot of the slot track SA in the measurement direction C (the minimum length of the projected image. That is, ε×P1.), the length of each light receiving element p1, p2 in the measurement direction C is equal to half of ε×P1. As a result, the light-receiving arrays PA1 and PA2 are offset from each other in the measurement direction C by 1/2 the length of 1 bit (corresponding to half the pitch P1). When corresponding to the transition point of the bit pattern, the absolute position can be calculated using the detection signal from the light-receiving array PA2 or vice versa, thereby improving the detection accuracy of the absolute position. In addition, the length of each light receiving element p1, p2 in the measurement direction C is not limited to the above, and may be a length other than half of ε×P1.

本变形例的各受光阵列的尺寸关系和配置形式与上述实施方式相同。也就是说,受光阵列PI2在宽度方向R上的长度WPI2比受光阵列PI1在宽度方向R上的长度WPI1大,从光源121到受光阵列PI2的最短距离gPI2比从光源121到受光阵列PI1的最短距离gPI1小。并且,从光源121到受光阵列PI2的中心位置ci2的距离dPI2比从光源121到受光阵列PI1的中心位置ci1的距离dPI1小,并且受光阵列PI2在测定方向C上的长度LPI2比受光阵列PI1在测定方向C上的长度LPI1大。并且,受光阵列PI1与受光阵列PI2的最短距离gPI比受光阵列PI1与受光阵列PA的最短距离gPA小。The dimensional relationship and arrangement form of each light-receiving array in this modified example are the same as those in the above-mentioned embodiment. That is to say, the length WPI2 of the light-receiving array PI2 in the width direction R is larger than the length WPI1 of the light-receiving array PI1 in the width direction R, and the shortest distance gPI2 from the light source 121 to the light-receiving array PI2 is shorter than the shortest distance gPI2 from the light source 121 to the light-receiving array PI1. The distance from gPI1 is small. In addition, the distance dPI2 from the light source 121 to the center position ci2 of the light receiving array PI2 is smaller than the distance dPI1 from the light source 121 to the center position ci1 of the light receiving array PI1, and the length LPI2 of the light receiving array PI2 in the measuring direction C is shorter than that of the light receiving array PI1 in The length LPI1 in the measurement direction C is large. Furthermore, the shortest distance gPI between the light receiving array PI1 and the light receiving array PI2 is smaller than the shortest distance gPA between the light receiving array PI1 and the light receiving array PA.

在本变形例中,也得到与上述实施方式同样的效果。并且,在采用上述结构的情况下,能够实现编码器100的小型化。也就是说,根据本变形例,2个受光阵列PA1、PA2构成为1条受光阵列PA,因此,能够使槽隙轨道SA和受光阵列PA都构成为1条轨道。因此,能够使盘110和光学模块120小型化,进而能够使编码器100小型化。Also in this modified example, the same effect as that of the above-mentioned embodiment is obtained. Furthermore, in the case of employing the above configuration, it is possible to reduce the size of the encoder 100 . That is, according to this modified example, two light-receiving arrays PA1 and PA2 constitute one light-receiving array PA, so both the slot track SA and the light-receiving array PA can be constituted as one track. Therefore, the disc 110 and the optical module 120 can be downsized, and the encoder 100 can also be downsized.

(4-3.将一条结构的绝对用受光阵列配置在外周侧)(4-3. Arranging the absolute light-receiving array of one structure on the outer peripheral side)

在上述变形例(4-2)中,将受光阵列PA配置在比受光阵列PI1、PI2靠内周侧的位置的情况作为一例进行了说明,但例如也可以如图13所示地将受光阵列PA配置在比受光阵列PI1、PI2靠外周侧的位置。In the above modification (4-2), the case where the photoreceiving array PA is arranged on the inner peripheral side than the photoreceiving arrays PI1 and PI2 has been described as an example, but for example, the photoreceiving array PA may be arranged as shown in FIG. PA is arrange|positioned at the outer peripheral side rather than light receiving array PI1, PI2.

在本变形例中,在受光阵列PI2的内周侧配置有与绝对图案对应的受光阵列PA。虽省略图示,但在本变形例的情况下,在盘110中,3条槽隙轨道从宽度方向R的内侧朝向外侧按照SI1、SI2、SA的顺序呈同心圆状配置。本变形例的各受光阵列的尺寸关系和配置形式也与上述变形例(4-2)相同。优选在提高绝对信号针对偏心的稳定性的情况下,采用本变形例的结构,在提高增量信号针对偏心的稳定性的情况下,采用上述变形例(4-2)。In this modified example, the light receiving array PA corresponding to the absolute pattern is arranged on the inner peripheral side of the light receiving array PI2. Although not shown, in the case of this modified example, three slot tracks are concentrically arranged in the order of SI1, SI2, and SA on the disk 110 from the inner side toward the outer side in the width direction R. The dimensional relationship and arrangement form of each light-receiving array in this modification are also the same as those in the modification (4-2). It is preferable to adopt the structure of this modification when improving the stability of the absolute signal against eccentricity, and to adopt the above-mentioned modification (4-2) when improving the stability of the incremental signal against eccentricity.

(4-4.透过型编码器)(4-4.Through-through encoder)

在上文中,以光源和受光阵列相对于盘110的槽隙轨道配置在相同侧的、所谓反射型编码器的情况为例进行了说明,但不限定于此。即,也可以是光源和受光阵列隔着盘110地配置在相反侧的、所谓透过型编码器。在该情况下,在盘110中,可以将槽隙轨道SA1、SA2、SI1、SI2的各缝形成为透过缝,或者,利用溅射等使槽隙以外的部分为粗糙面,涂布透过率低的材质来形成。另外,在本变形例中,光源121和受光阵列PA1、PA2、PI1、PI2隔着盘110对置配置,但本变形例的光学模块120包括这样地形成为分体的光源和受光阵列。In the above, the case of a so-called reflective encoder in which the light source and the light receiving array are arranged on the same side with respect to the slot track of the disk 110 has been described as an example, but the present invention is not limited thereto. That is, a so-called transmissive encoder may be used in which the light source and the light receiving array are arranged on opposite sides of the disc 110 . In this case, in the disk 110, each slit of the slot tracks SA1, SA2, SI1, and SI2 may be formed as a transparent slit, or the portion other than the groove may be roughened by sputtering or the like, and the transparent slit may be coated. It is formed by materials with low pass rate. In addition, in this modified example, the light source 121 and the light receiving arrays PA1, PA2, PI1, PI2 are arranged to face each other across the disk 110, but the optical module 120 of this modified example includes the light source and the light receiving array formed as separate bodies in this way.

在本变形例中,上述实施方式中的最短距离gPI1、gPI2、距离dPI1、dPI2等的以光源121为基准的距离位于以光源121的光轴为基准的位置。在使用这样的透过型编码器的情况下,也得到与上述实施方式相同的效果。In this modified example, the shortest distances gPI1 , gPI2 , distances dPI1 , dPI2 , and other distances based on the light source 121 in the above-described embodiment are located at positions based on the optical axis of the light source 121 . Even when such a transmissive encoder is used, the same effects as those of the above-described embodiment can be obtained.

(4-5.其他)(4-5. Others)

在上文中,对在盘110设置具有间距不同的增量图案的2个槽隙轨道SI1、SI2的情况进行了说明,但也可以设置具有间距不同的增量图案的3个以上的槽隙轨道。在该情况下,也能够通过累积方式实现高的分辨率。这时,例如也可以将受光阵列PA1、PA2中的至少一方用于增量信号。In the above, the case where two slot tracks SI1 and SI2 having incremental patterns with different pitches are provided on the disk 110 has been described, but three or more slot tracks having incremental patterns with different pitches may also be provided. . In this case, too, a high resolution can be achieved cumulatively. At this time, for example, at least one of the light receiving arrays PA1 and PA2 may be used for the incremental signal.

并且,在上文中,对受光阵列PA1、PA2分别具有9个受光元件、绝对信号表示9个位元的绝对位置的情况进行了说明,但受光元件的数量也可以是9以外,绝对信号的位元数也不限定于9。并且,受光阵列PI1、PI2的受光元件的数量也不特别限定于上述实施方式的数量。In addition, above, the light receiving arrays PA1 and PA2 respectively have 9 light receiving elements and the absolute signal represents the absolute position of 9 bits. However, the number of light receiving elements may be other than 9, and the absolute signal bit The number of arity is also not limited to 9. In addition, the number of light receiving elements of light receiving arrays PI1 and PI2 is not particularly limited to the number of the above-mentioned embodiment, either.

并且,在上文中,对光学模块120具备绝对信号用的受光阵列PA1、PA2的情况进行了说明,但未必需要具备受光阵列PA1、PA2。例如,取代受光阵列PA1、PA2,也可以具备利用来自各受光元件的检测信号表示原点位置的原点用的受光元件阵列。在该情况下,盘110的槽隙轨道SA1、SA2形成为原点用的图案。In addition, although the optical module 120 has demonstrated the case where the light receiving array PA1 and PA2 for absolute signals are provided above, it does not necessarily need to provide the light receiving array PA1 and PA2. For example, instead of the light-receiving arrays PA1 and PA2 , a light-receiving element array for the origin indicating the position of the origin using detection signals from the respective light-receiving elements may be provided. In this case, the slot tracks SA1 and SA2 of the disk 110 are formed as a pattern for the origin.

另外,以上的说明中的“垂直”、“平行”、“相等”并不是严格的含义。即,“垂直”、“平行”、“相等”意味着容许设计上、制造上的公差、误差,是“实质上垂直”、“实质上平行”、“实质上相等”。In addition, "perpendicular", "parallel", and "equal" in the above description are not strict meanings. That is, "perpendicular", "parallel", and "equal" mean that design and manufacturing tolerances and errors are allowed, and they are "substantially perpendicular", "substantially parallel", and "substantially equal".

Claims (10)

1.一种编码器,其特征在于,该编码器具有:1. An encoder, characterized in that the encoder has: 多个槽隙轨道,它们分别具有沿测定方向排列的多个槽隙;a plurality of slot tracks each having a plurality of slots arranged along the measuring direction; 光源,其构成为向所述多个槽隙轨道射出光;a light source configured to emit light toward the plurality of slot tracks; 第1受光阵列,其构成为接受被具有增量图案的所述槽隙轨道反射或者透过的光;以及a first light-receiving array configured to receive light reflected or transmitted by the slot track having an incremental pattern; and 第2受光阵列,其构成为接受被具有间距比其他增量图案长的增量图案的所述槽隙轨道反射的光,并且所述第2受光阵列在与所述测定方向垂直的宽度方向上的尺寸比所述第1受光阵列小。a second light-receiving array configured to receive light reflected by the slot track having an incremental pattern whose pitch is longer than other incremental patterns, and the second light-receiving array is arranged in a width direction perpendicular to the measurement direction The size is smaller than the first light-receiving array. 2.根据权利要求1所述的编码器,其特征在于,2. The encoder of claim 1, wherein 所述第1受光阵列被配置成相对于所述光源的光轴的最短距离比从该光轴到所述第2受光阵列的最短距离小。The first light receiving array is arranged such that the shortest distance from the optical axis of the light source is shorter than the shortest distance from the optical axis to the second light receiving array. 3.根据权利要求1所述的编码器,其特征在于,3. The encoder of claim 1, wherein 所述第1受光阵列被配置成,从所述光源的光轴到所述第1受光阵列的中心位置的距离比从所述光轴到所述第2受光阵列的中心位置的距离小。The first light receiving array is arranged such that the distance from the optical axis of the light source to the center of the first light receiving array is smaller than the distance from the optical axis to the center of the second light receiving array. 4.根据权利要求2所述的编码器,其特征在于,4. The encoder of claim 2, wherein 所述第1受光阵列被配置成,从所述光源的光轴到所述第1受光阵列的中心位置的距离比从所述光轴到所述第2受光阵列的中心位置的距离小。The first light receiving array is arranged such that the distance from the optical axis of the light source to the center of the first light receiving array is smaller than the distance from the optical axis to the center of the second light receiving array. 5.根据权利要求1~4中任一项所述的编码器,其特征在于,5. The encoder according to any one of claims 1 to 4, characterized in that, 所述第1受光阵列在所述测定方向上的尺寸比所述第2受光阵列大。The size of the first light receiving array in the measurement direction is larger than that of the second light receiving array. 6.根据权利要求1~4中任一项所述的编码器,其特征在于,6. The encoder according to any one of claims 1 to 4, characterized in that, 所述编码器还具有2个第3受光阵列,所述2个第3受光阵列被配置成:以在所述宽度方向上将所述光轴夹在它们之间的方式对称,并分别接受被具有绝对图案的所述槽隙轨道反射或者透过的光,The encoder further has two third light-receiving arrays, and the two third light-receiving arrays are arranged symmetrically with the optical axis sandwiched between them in the width direction, and receive the received light respectively. light reflected or transmitted by said slot track having an absolute pattern, 所述第1受光阵列和所述第2受光阵列在所述宽度方向上配置在所述2个第3受光阵列之间。The first light receiving array and the second light receiving array are arranged between the two third light receiving arrays in the width direction. 7.根据权利要求6所述的编码器,其特征在于,7. The encoder of claim 6, wherein 所述第1受光阵列和所述第2受光阵列在所述宽度方向上以将所述光轴夹在它们之间的方式配置,The first light-receiving array and the second light-receiving array are arranged in the width direction so as to sandwich the optical axis therebetween, 所述第1受光阵列、所述第2受光阵列、所述第3受光阵列被配置成:所述第1受光阵列与所述第2受光阵列的最短距离比所述第1受光阵列与第3受光阵列的最短距离以及所述第2受光阵列与第3受光阵列的最短距离小。The first light-receiving array, the second light-receiving array, and the third light-receiving array are configured such that the shortest distance between the first light-receiving array and the second light-receiving array is shorter than the first light-receiving array and the third light-receiving array. The shortest distance between the light receiving array and the shortest distance between the second light receiving array and the third light receiving array is small. 8.根据权利要求1~4中任一项所述的编码器,其特征在于,8. The encoder according to any one of claims 1 to 4, characterized in that, 所述光源是构成为向所述多个槽隙轨道射出扩散光的点光源,The light source is a point light source configured to emit diffused light to the plurality of slot tracks, 所述槽隙轨道所具有的各所述槽隙构成为反射从所述点光源射出的光,Each of the slots included in the slot track is configured to reflect light emitted from the point light source, 所述第1受光阵列、所述第2受光阵列、第3受光阵列构成为分别接受被所述槽隙轨道反射的光。The first light-receiving array, the second light-receiving array, and the third light-receiving array are each configured to receive light reflected by the groove track. 9.一种带编码器的马达,其特征在于,该带编码器的马达具备:9. A motor with an encoder, characterized in that the motor with an encoder has: 可动体相对于固定体移动的直线马达、或者、转子相对于定子旋转的旋转式马达;以及a linear motor in which a movable body moves relative to a fixed body, or a rotary motor in which a rotor rotates relative to a stator; and 权利要求1~8中任一项所述的编码器,其构成为检测所述可动体或所述转子的位置和速度中的至少一方。The encoder according to any one of claims 1 to 8, which is configured to detect at least one of the position and speed of the movable body or the rotor. 10.一种伺服系统,其特征在于,该伺服系统具备:10. A servo system, characterized in that the servo system has: 可动体相对于固定体移动的直线马达、或者、转子相对于定子旋转的旋转式马达;A linear motor in which the movable body moves relative to a fixed body, or a rotary motor in which the rotor rotates relative to the stator; 权利要求1~8中任一项所述的编码器,其构成为检测所述可动体或所述转子的位置和速度中的至少一方;以及The encoder according to any one of claims 1 to 8, which is configured to detect at least one of the position and speed of the movable body or the rotor; and 控制装置,其构成为根据所述编码器的检测结果控制所述直线马达或者所述旋转式马达。A control device configured to control the linear motor or the rotary motor based on a detection result of the encoder.
CN201420652640.6U 2013-11-05 2014-11-04 Motor, the servo-drive system of scrambler, band scrambler Expired - Lifetime CN204188180U (en)

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Cited By (2)

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CN112240781A (en) * 2019-07-19 2021-01-19 株式会社安川电机 Encoder, servo motor and servo system
CN118583202A (en) * 2024-08-05 2024-09-03 宁波升谱光电股份有限公司 An encoder and a detection system

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JP4476682B2 (en) * 2003-05-16 2010-06-09 株式会社ミツトヨ Photoelectric encoder
JP5962884B2 (en) * 2011-12-20 2016-08-03 株式会社安川電機 Encoder and servo motor

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Publication number Priority date Publication date Assignee Title
CN112240781A (en) * 2019-07-19 2021-01-19 株式会社安川电机 Encoder, servo motor and servo system
EP3767243A1 (en) * 2019-07-19 2021-01-20 Kabushiki Kaisha Yaskawa Denki Encoder, servo motor, and servo system
CN112240781B (en) * 2019-07-19 2022-10-18 株式会社安川电机 Encoder, servo motor and servo system
US11566920B2 (en) 2019-07-19 2023-01-31 Kabushiki Kaisha Yaskawa Denki Encoder, servo motor, and servo system
US11860007B2 (en) 2019-07-19 2024-01-02 Kabushiki Kaisha Yaskawa Denki Encoder, servo motor, and servo system
CN118583202A (en) * 2024-08-05 2024-09-03 宁波升谱光电股份有限公司 An encoder and a detection system

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