CN208352709U - A kind of microplate ridge waveguide laser and microplate ridge waveguide tunable laser - Google Patents
A kind of microplate ridge waveguide laser and microplate ridge waveguide tunable laser Download PDFInfo
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- 208000033748 Device issues Diseases 0.000 claims 1
- 239000000919 ceramic Substances 0.000 abstract description 9
- 238000000034 method Methods 0.000 description 20
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 238000009792 diffusion process Methods 0.000 description 9
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 9
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- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
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Abstract
The utility model discloses a kind of microplate ridge waveguide laser and microplate ridge waveguide tunable laser.The microplate ridge waveguide laser of the utility model can reduce the volume of laser resonator using ridge optical waveguide as the gain media of laser, increase the optical power density in resonant cavity, so as to realize stable waveguide laser output；By the way that microplate is made in waveguide, and in both ends plated film, the quantity for reducing component needed for laser using lens and reflecting mirror is avoided, greatly reduce the size and cost of laser, improves the integrated level and stability of laser system.Microplate ridge waveguide tunable laser provided by the utility model replaces traditional piezoelectric ceramics to control using temperature control, overcomes the shortcomings that pressure control easily causes microplate to damage, has the advantages that high reliablity, wavelength tuning range are big.
Description
Technical field
The utility model relates to field of laser device technology, more particularly to a kind of microplate ridge waveguide laser and microplate ridge ripple
Lead tunable laser.
Background technique
In recent years, the exploration Yu development of high quality light source laser have become the hot spot of researcher's concern.By continuous
Research and discovery, waveguide can be used for laser light source as a kind of new material, this waveguide laser transfer efficiency,
The aspect of performance such as laser generation and beam quality have, significant advantage, before the integrated aspect of light shows good application
Scape.
Waveguide laser is prepared at present and mainly uses ion implantation, titanium diffusion method and proton exchange, but these are prepared
There is also some problems for method, for example, ion implantation is since implantation dosage is larger, injection length is longer, waveguide fabrication cost
Higher, in ion implantation process, injection ion causes damage to a certain extent to lattice structure in end-of-range, and this
The presence damaged a bit will increase the absorption of waveguide and the loss of scattering, reduce wavelength conversion efficiency.University of Southampton
J.K.Jones et al. is prepared for waveguide laser using Ti method, although Ti diffusion can produce low-loss waveguide, due to
There are serious photorefractive damages for Ti diffusion, so that stable cw lasing can not be generated, which greatly limits them
Application.To seek better preparation method, Osaka, Japan university F.Masatoshi is prepared for niobium using annealed proton exchange process
Sour lithium waveguide laser, although reducing the photorefractive damage during preparing waveguide laser, proton exchange makes in crystal
Lattice destroyed, even if additional annealing process, repaired the lattice structure that part is destroyed, but shallower on surface
The nonlinear factor and electro-optic coefficient being destroyed in 1 μm of region still can not restore completely.Skill for the above preparation method
Art defect, J.Za yhowski of U.S.'s Lincoln laboratory et al. pump Nb:YAG micro-slice laser using LD, obtain Dan Zong
Mould output realizes the frequency tuning of micro-slice laser later again on this basis.Micro-slice laser is embedded in one piece by them
On the beryllium copper bracket of U shape, abut against on one block of piezoelectric ceramics.After being driven to piezoelectric ceramics application voltage, piezoelectric ceramics
Elongation, and then Nb:YAG crystal is squeezed, plane of crystal is protruded outward, so that it is long to change chamber, is successfully made micro-slice laser, is adjusted
Humorous frequency range reaches 300KHz；However, squeezing crystal, easy damaged microplate by piezoelectric ceramics, and it is prepared using the method
Micro-slice laser tuning range it is narrow.
Summary of the invention
The purpose of the utility model is to provide a kind of microplate ridge waveguide laser and microplate ridge waveguide tunable laser, with
Solve that existing micro-slice laser tuning range is narrow and in preparation process the technical issues of easy damaged microplate.
To achieve the above object, the utility model provides following scheme:
A kind of microplate ridge waveguide laser, the microplate ridge waveguide laser include: lithium niobate substrate layer and ridge waveguide portion
Point；The material of the ridge waveguide part and the lithium niobate substrate layer is the lithium columbate crystal for adulterating ytterbium ion；The niobic acid
Lithium substrate layer and the ridge waveguide part are rectangular parallelepiped structure；The ridge waveguide part is located at table on the lithium niobate substrate layer
The middle position in face；The length of the ridge waveguide part is parallel with the width of the lithium niobate substrate layer；The ridge waveguide part
Length is of same size with the lithium niobate substrate layer；The both ends of the surface of the microplate ridge waveguide laser are coated with laser resonator
Film.
Optionally, the input end face of the microplate ridge waveguide laser is coated with the anti-reflection film and 1050-1070nm of 918nm
The first high-reflecting film；The transmissivity of the anti-reflection film is greater than 95%；The reflectivity of first high-reflecting film is greater than 95%；It is described micro-
The output end face of piece ridge waveguide laser is coated with the second high-reflecting film of 918nm and the high transmittance film of 1050-1070nm；Described second is high
The reflectivity of anti-film is greater than 90%；The transmissivity of the high transmittance film is greater than 10%.
Optionally, the thickness of the microplate ridge waveguide laser meetsWherein L is the microplate ridge waveguide
The thickness of laser；N is group index, Δ λ0For gain spectrum width, λ is center wavelength.
Optionally, the size of the ridge waveguide part is that long wide 10 μ m of 300 μ ms is 25 μm high.
Optionally, the size of the microplate ridge waveguide laser is long 0.5mm × wide 0.3mm × high 0.4mm.
The utility model also provides a kind of microplate ridge waveguide tunable laser, the microplate ridge waveguide tunable laser
It include: microplate ridge waveguide laser, semiconductor laser, optical fiber, optical coupler and temperature controller；
The microplate ridge waveguide laser includes: lithium niobate substrate layer and ridge waveguide part；The ridge waveguide part and institute
The material for stating lithium niobate substrate layer is the lithium columbate crystal for adulterating ytterbium ion；The lithium niobate substrate layer and the ridge waveguide portion
Dividing is rectangular parallelepiped structure；The ridge waveguide part is located at the middle position of lithium niobate substrate layer upper surface；The ridge
The length of waveguide portion is parallel with the width of the lithium niobate substrate layer；The length of the ridge waveguide part and the lithium niobate substrate layer
It is of same size；The both ends of the surface of the microplate ridge waveguide laser are coated with laser resonator film；
The pump light that the semiconductor laser issues is after the optical fiber transmits and the optical coupler couples, coupling
It closes and enters the ridge waveguide part；The microplate ridge waveguide laser is placed in the temperature controller；The temperature controller is for adjusting
The temperature of the microplate ridge waveguide laser makes the microplate ridge waveguide laser issue the laser of different wave length.
Optionally, the pump wavelength that the semiconductor laser issues is 918nm.
Optionally, it is 1050-1070nm that the microplate ridge waveguide laser, which issues the wave-length coverage of laser,.
According to specific embodiment provided by the utility model, the utility model discloses following technical effects:
The utility model provides a kind of microplate ridge waveguide laser and microplate ridge waveguide tunable laser.The utility model
Microplate ridge waveguide laser using ridge optical waveguide as the gain media of laser, the body of laser resonator can be reduced
Product, increases the optical power density in resonant cavity, so as to realize stable waveguide laser output；It is provided by the utility model
Microplate ridge waveguide tunable laser is controlled using temperature and is controlled instead of traditional piezoelectric ceramics, is overcome pressure control and is easily made
The shortcomings that damaging at microplate has the advantages that high reliablity, wavelength tuning range are big.Meanwhile by the way that microplate is made in waveguide, and
In both ends plated film, the quantity for reducing component needed for laser using lens and reflecting mirror is avoided, laser is greatly reduced
The size and cost of device improve the integrated level and stability of laser system.
Detailed description of the invention
In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment
Needed in attached drawing be briefly described, it should be apparent that, the accompanying drawings in the following description is only the utility model
Some embodiments for those of ordinary skill in the art without any creative labor, can also basis
These attached drawings obtain other attached drawings.
Fig. 1 is the structural schematic diagram of microplate ridge waveguide laser provided by the utility model；
Fig. 2 is the scale diagrams of microplate ridge waveguide laser provided by the utility model；
Fig. 3 is the structural schematic diagram of microplate ridge waveguide tunable laser provided by the utility model；
Fig. 4 is the method flow diagram of microplate ridge waveguide laser preparation method provided by the utility model；
Fig. 5 is that the light emission of 918nm provided by the utility model enters the mode distributions figure after microplate ridge waveguide laser；
Fig. 6 is that the light emission of 1060nm provided by the utility model enters the mode distributions figure after microplate ridge waveguide laser.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
The purpose of the utility model is to provide a kind of microplate ridge waveguide laser and microplate ridge waveguide tunable laser, with
Solve that existing micro-slice laser tuning range is narrow and in preparation process the technical issues of easy damaged microplate.
To keep the above objects, features, and advantages of the utility model more obvious and easy to understand, with reference to the accompanying drawing and have
Body embodiment is described in further detail the utility model.
Fig. 1 is the structural schematic diagram of microplate ridge waveguide laser provided by the utility model.Referring to Fig. 1, the utility model
A kind of microplate ridge waveguide laser provided includes: lithium niobate substrate layer 101 and ridge waveguide part 102.The ridge waveguide part
102 with the material of the lithium niobate substrate layer 101 be the lithium columbate crystal for adulterating ytterbium ion.The lithium niobate substrate layer 101
It is rectangular parallelepiped structure with the ridge waveguide part 102, is cut by the lithium columbate crystal of monolith doping ytterbium ion.It is described
Ridge waveguide part 102 is located at the middle position of 101 upper surface of lithium niobate substrate layer.The length of the ridge waveguide part 102
It is parallel with the width of the lithium niobate substrate layer 101.The length of the ridge waveguide part 102 and the lithium niobate substrate layer 101
It is of same size, it is 300 μm.The both ends of the surface of the microplate ridge waveguide laser are coated with laser resonator film.
The both ends of the surface of the microplate ridge waveguide laser plate different laser resonator films, specifically: the microplate ridge ripple
The input end face 103 for leading laser is coated with the anti-reflection film of 918nm and the first high-reflecting film of 1050-1070nm；The anti-reflection film
Transmissivity is greater than 95%；The reflectivity of first high-reflecting film is greater than 95%.The output end face of the microplate ridge waveguide laser
104 are coated with the second high-reflecting film of 918nm and the high transmittance film of 1050-1070nm；The reflectivity of second high-reflecting film is greater than
90%；The transmissivity of the high transmittance film is greater than 10%.
The thickness of the microplate ridge waveguide laser meetsWherein L is the microplate ridge waveguide laser
Thickness；N is group index, Δ λ0For gain spectrum width, λ is center wavelength.
Microplate ridge waveguide laser provided by the utility model uses microplate ridge waveguide as laser gain medium, to subtract
Small spot size, and then the optical power density in resonant cavity is increased, to realize efficient waveguide laser light source output.
Fig. 2 is the scale diagrams of microplate ridge waveguide laser provided by the utility model.Referring to fig. 2, the utility model
The size of the ridge waveguide part 102 of the microplate ridge waveguide laser is that long wide 10 μ m of 300 μ ms is 25 μm high.It is entire described
The size of microplate ridge waveguide laser is long 0.5mm × wide 0.3mm × high 0.4mm.
The utility model also provides a kind of microplate ridge waveguide tunable laser.Fig. 3 is microplate provided by the utility model
The structural schematic diagram of ridge waveguide tunable laser.Referring to Fig. 3, the microplate ridge waveguide tunable laser includes: microplate ridge
Waveguide laser 301, semiconductor laser 302, optical fiber 303, optical coupler 304 and temperature controller 305.Wherein, the microplate
Ridge waveguide laser 301 includes lithium niobate substrate layer 101 and ridge waveguide part 102.The microplate ridge waveguide laser 301 is set
In the temperature controller 305, the ridge waveguide part 102 of the microplate ridge waveguide laser 301 is higher by the temperature controller 305, with
Just pump light enters.The input end face 103 of the microplate ridge waveguide laser 301 is positioned close to the semiconductor laser
302 side, output end face 104 are arranged far from the side of the semiconductor laser 302.
The semiconductor laser 302 exports the pump light of 918nm, and pump light is transmitted to described by the optical fiber 303
Optical coupler 304 is coupled into the ridge waveguide part 102 after the optical coupler 304.The ridge waveguide part
102 input terminal plates 918nm AR, T > 95% and adjustable harmonic wave section 1050-1070nm HR, the laser resonator film of R > 95%；
Output end is adjustable harmonic wave section 1050-1070nm HT, T > 10% and 918nm HR, the laser resonator film of R > 90%.
The temperature controller 305 adjusts refractive index by adjusting the temperature of the microplate ridge waveguide laser 301, changes
Change chamber is long, controls the laser 306 that the microplate ridge waveguide laser 301 issues different wave length, realizes tunable laser output.
The temperature regulating range of the microplate ridge waveguide laser 301 is usually room temperature to 200 degrees Celsius.Due to lithium niobate
Crystal has refractive index with the dispersion relation of temperature inversion, i.e. temperature changes, and the refractive index of crystal will change, resonant cavity
Effective cavity length nL will change, and then the output wavelength of laser can be changed.
As it can be seen that microplate ridge waveguide tunable laser provided by the utility model changes microplate Yb by control temperature:
LiNbNO3The refractive index of crystal (lithium columbate crystal of doping ytterbium ion), and then change chamber is long, realizes the wavelength tune of laser
It is humorous.The microplate ridge waveguide tunable laser overcomes existing laser tuning mode and squeezes microplate by piezoelectric ceramics, from
And easily cause the deficiency that microplate damages and tuning range is narrow.Microplate ridge waveguide tunable laser provided by the utility model does not have to
Microplate is squeezed, but realizes the wavelength tuning of laser by control temperature, microplate damage is not will cause and tuning range is larger.
Fig. 4 is the method flow diagram of microplate ridge waveguide laser preparation method provided by the utility model.Referring to fig. 4, institute
The preparation method for stating microplate ridge waveguide laser includes:
Step 401: preparing lithium columbate crystal.
Step 402: the lithium columbate crystal is polished and cleared up, the lithium columbate crystal after being cleared up.
Optionally, described that the lithium columbate crystal is polished and cleared up, the lithium columbate crystal after being cleared up, specifically
Include:
The end face of the lithium columbate crystal is processed by shot blasting using the method for chemical-mechanical grinding, after being polished
Lithium columbate crystal；
Successively the crystal after the polishing is started the cleaning processing using acetone soln, dehydrated alcohol, distilled water；It is respectively clear
It washes 20 minutes, the lithium columbate crystal after obtaining the cleaning.
Step 403: one layer of ytterbium film of lithium columbate crystal surface evaporation after the cleaning, and expanded under high temperature environment
Processing is dissipated, the lithium columbate crystal of doping ytterbium ion is generated.
It is that one kind by people is looked steadily target material that ytterbium ion is adulterated in crystal, has very strong polarization absorption, high-selenium corn system
Number, smaller to the dependence of pumping wavelength, laser threshold is lower, while can generate the laser of 1061nm, in integrated optics and
Optical communication field has important application.Therefore the utility model one layer of ytterbium of the lithium columbate crystal surface evaporation after the cleaning
Film, and it is diffused processing under high temperature environment, the lithium columbate crystal of doping ytterbium ion is generated, is specifically included:
Depositing a layer thickness using lithium columbate crystal surface of the precision machinery electron beam evaporation technique after the cleaning is
The ytterbium film of 40nm；
Lithium columbate crystal after deposition ytterbium film is placed in high-temperature atmosphere furnace, in order to prevent waveguide surface oxide point
Solution, carries out High temperature diffusion processing to the lithium columbate crystal with ytterbium film under aerobic environment, and diffusion temperature setting is Celsius 1150
Degree, diffusion time are set as 25 hours, generate the lithium columbate crystal of the doping ytterbium ion.
Ytterbium is diffused into lithium columbate crystal at high temperature using ytterbium as gain media, by depositing ytterbium film by the utility model
In, soft proton exchange is then carried out, forms the waveguide of burial type, ytterbium is distributed in inside waveguide, as gain media.
Step 404: soft proton exchange processing being carried out to the lithium columbate crystal of the doping ytterbium ion, forms plane light wave
It leads.It specifically includes:
The lithium columbate crystal of the doping ytterbium ion is placed in Muffle furnace after constant temperature preheating preset time, is filled by rotation
Setting rotation glass tube makes displacement liquid submerge the lithium columbate crystal of the doping ytterbium ion, starts soft proton exchange.The displacement liquid
For the mixed solution of lithium benzoate and benzoic acid, lithium benzoate is mixed in certain proportion with benzoic acid, is increased in displacement liquid
In lithium concentration, the ratio that lithium benzoate is occupied is a key factor, and the lithium benzoate concentration value isWherein ρ is soft proton exchange threshold value, wLiBAFor the weight of lithium benzoate powder, wBAFor benzoic acid powder
The weight at end.Lithium benzoate is added in displacement liquid benzoic acid, under 305 degrees Celsius, 100 hours of soft proton exchange.
By diffusion theory it is found that ion-exchange speed is by factors such as concentration gradients on diffusion coefficient, temperature, diffusing surface
It determines, and the target of soft sub- exchange temperature is to complete two processes of proton exchange and annealing in a step, so fixation is soft
Proton exchange temperature is 305 DEG C, controls in-furnace temperature by adjusting the temp controlled meter of Muffle furnace, is 305 DEG C by temperature setting, warp
It crosses after certain constant temperature time is fully warmed-up by chip, rotating glass tube by certain rotating device makes benzoic acid and benzoic acid
Lithium solution submerges chip, starts to exchange.
After the soft proton exchange for continuing 100 hours, being rotated further by glass tube makes the lithium columbate crystal of the doping ytterbium ion
It is detached from the displacement liquid, the lithium columbate crystal after taking out soft proton exchange.
After Muffle furnace is cooling and is close to room temperature, be successively cleaned by ultrasonic using acetone, dehydrated alcohol, deionized water described in
The surface of lithium columbate crystal after soft proton exchange each ten minutes, lithium columbate crystal surface after removing the soft proton exchange
Impression of the hand, grease and dust form the planar optical waveguide.
Wherein acetone can remove plane of crystal impurity, and then dehydrated alcohol is dissolved in acetone again, and last deionized water is rinsed
Ethyl alcohol remained on surface has been finally completed entire cleaning process.
As it can be seen that microplate ridge waveguide laser preparation method provided by the utility model on mixing ytterbium lithium columbate crystal, utilizes
The soft proton exchange of high refractive index prepares ridge waveguide laser, obtains microplate ridge waveguide laser.By increasing lithium in displacement liquid
Ion concentration slows down the outside diffusion velocity of lithium ion in lithium niobate lattice, so that hydrogen ion concentration reduces in displacement liquid to reach
At the purpose for slowing down proton exchange speed, reduce the change in exchange process to internal crystal structure, and then keeps crystal former
Some crystal phases reduce the damage in replacement process to lattice in crystal, overcome the deficiency of traditional proton exchange, improve sharp
Light conversion efficiency.
Step 405: the planar optical waveguide is cut by ridge optical waveguide using diamond scribing cutting technique.
Waveguide can be divided mainly into slab guide, ridge waveguide.Slab guide is only in one direction to the limited production of light
With, and there are diffraction and scattering phenomenon in waveguide transverse direction, integrated optical wave guide device is made of it, and there are certain offices
It is sex-limited.If ridge structure is made in slab guide, stronger to the restriction ability of light beam, output spot size is smaller, thus
The conversion efficiency and output power of laser can be effectively improved.Therefore the utility model uses precision diamond scribing cutting technique
The planar optical waveguide is cut into ridge optical waveguide, is specifically included:
The planar optical waveguide is cut by ridge structure using diamond scribing cutting technique, cutting width is 10 μm,
Depth of cut is 25 μm, and the ridge optical waveguide having a size of long high 25 μm of wide 10 μ m of 300 μ ms is made.Make in cutting process
Blade particle mesh size is #4800, and particle diameter is 2 μm.LiNbO is considered simultaneously3Crystal is kind of a fragile crystal material
Material, hardness is moderate, therefore the blade that the blade selects resin to paste.
Step 406: the ridge optical waveguide being processed by microplate using mechanochemical reaction, forms microplate ridge waveguide.Specifically
Are as follows:
By mechanochemical reaction or more accurate machining process, first by the ridge optical waveguide in length direction
Upper carry out mechanical grinding, is polishing to required length, then carries out chemical polishing, and last plated film keeps microplate surface strictly parallel,
Form the microplate ridge waveguide.
The thickness of the microplate determines that is, longitudinal mode spacing is greater than gain spectrum width according to single longitudinal mode modeling principle:
In formula, C is the light velocity in vacuum, and n is group index, Δ λ0For gain spectrum width, λ is center wavelength.It is then humorous
The width (i.e. microplate thickness) of vibration chamber meets:
In the utility model, the thickness of microplate is set as 200 μm.
The utility model utilizes precision processing technology, and microplate is processed into waveguide, microplate ridge waveguide laser is made, and reduces
The volume of laser resonator, realizes Highgrade integration and the micromation of laser.The microplate ridge waveguide laser has body
The advantages that product is small, compact-sized, output is stablized, tunable range is big.
Step 407: plating laser resonator film in the both ends of the surface of the microplate ridge waveguide, the microplate ridge waveguide is made and swashs
Light device.
By carrying out resonant cavity plated film to Waveguide end face, and waveguide type gain media is pumped with suitable pump light
Pu can make corresponding waveguide type laser.The utility model plates laser resonator in the both ends of the surface of the microplate ridge waveguide
Film is made the microplate ridge waveguide laser, specifically includes:
In the anti-reflection film of the first end face plating 918nm of the microplate ridge waveguide and the first high-reflecting film of 1050-1070nm；Institute
The transmissivity for stating anti-reflection film is greater than 95%；The reflectivity of first high-reflecting film is greater than 95%；
In the second high-reflecting film of the second end face plating 918nm of the microplate ridge waveguide and the high transmittance film of 1050-1070nm, system
At the microplate ridge waveguide laser；The reflectivity of second high-reflecting film is greater than 90%；The transmissivity of the high transmittance film is greater than
10%.
The utility model is by avoiding using lens and reflecting mirror, reducing laser system in microplate waveguide both ends plated film
The quantity of discrete component needed for uniting, greatly reduces the production cost of laser, and then greatly improve the collection of laser system
Cheng Du and stability.
Compared with general laser, the utility model utilizes light using the microplate ridge waveguide laser of above method preparation
Energy can be limited in the waveguide of section very little by waveguiding structure, can effectively improve the energy density of light, reduce pumping
Threshold value, to effectively improve the efficiency of laser.
Next the microplate ridge waveguide laser is installed in temperature control device, and by coupling pump light into microplate ridge ripple
It leads in laser, by adjusting temperature, realizes the laser output of different wave length.The utility model is controlled using temperature instead of biography
The shortcomings that piezoelectric ceramics of system controls, and overcomes pressure control has reliability, highly-safe, and it is excellent that wavelength tuning range is big etc.
Point.
Fig. 5 is that the light emission of 918nm provided by the utility model enters the mode distributions figure after microplate ridge waveguide laser.Fig. 5
Middle horizontal, ordinate is the physical size of model, and unit is all μm.6.96 × 10 in Fig. 5-1、 1.82×103×103Indicate light
Field energy magnitude, respectively the minimum and maximum coordinate value in energy legend, unit are V/m.Fig. 6 is provided by the utility model
The light emission of 1060nm enters the mode distributions figure after microplate ridge waveguide laser.Horizontal, ordinate is the physical size of model in Fig. 6,
Unit is all μm.893 × 10 in Fig. 6-18、1.45×103×103Indicate Light Energy value, the respectively minimum in energy legend
And maximum coordinate value among, unit are V/m.By the simulation result of Fig. 5 and Fig. 6 it is found that the microplate ridge waveguide of the utility model preparation
Laser has good light beam coupling effect, and hot spot is concentrated, and beam quality is fine.
To sum up, a kind of microplate ridge waveguide laser provided by the utility model and microplate ridge waveguide tunable laser
Compared with prior art, it has at least the following advantages:
1, the utility model laser uses gain media of the microplate ridge waveguide as laser, reduces laser resonator
Volume reduces spot size, and then increases the optical power density in resonant cavity, so that the waveguide for realizing stability and high efficiency swashs
Radiant output.
2, the utility model reduces the volume of laser resonator, realizes the height of laser by the way that microplate is made in waveguide
Integrated and micromation.By avoiding using lens and reflecting mirror in microplate waveguide both ends plated film, reduce laser system institute
The quantity for needing discrete component, greatly reduces the production cost of laser, and then greatly improves the integrated level of laser system
And stability.
3, the utility model is controlled using temperature and is controlled instead of traditional piezoelectric ceramics, overcomes lacking for pressure control
Point has reliability, highly-safe, the big advantage of wavelength tuning range.
Each embodiment in this specification is described in a progressive manner, the highlights of each of the examples are with other
The difference of embodiment, the same or similar parts in each embodiment may refer to each other.
Specific case used herein is expounded the principles of the present invention and embodiment, above embodiments
Explanation be merely used to help understand the method and its core concept of the utility model；Meanwhile for the general technology of this field
Personnel, based on the idea of the present invention, there will be changes in the specific implementation manner and application range.In conclusion
The content of the present specification should not be construed as a limitation of the present invention.
Claims (8)
1. a kind of microplate ridge waveguide laser, which is characterized in that the microplate ridge waveguide laser include: lithium niobate substrate layer and
Ridge waveguide part；The material of the ridge waveguide part and the lithium niobate substrate layer is the lithium columbate crystal for adulterating ytterbium ion；
The lithium niobate substrate layer and the ridge waveguide part are rectangular parallelepiped structure；The ridge waveguide part is located at lithium niobate lining
The middle position of bottom upper surface；The length of the ridge waveguide part is parallel with the width of the lithium niobate substrate layer；The ridge ripple
Lead the of same size of the length of part and the lithium niobate substrate layer；The both ends of the surface of the microplate ridge waveguide laser are coated with laser
Resonant cavity film.
2. microplate ridge waveguide laser according to claim 1, which is characterized in that the microplate ridge waveguide laser it is defeated
Enter end face and is coated with the anti-reflection film of 918nm and the first high-reflecting film of 1050-1070nm；The transmissivity of the anti-reflection film is greater than 95%；
The reflectivity of first high-reflecting film is greater than 95%；The output end face of the microplate ridge waveguide laser is coated with the second of 918nm
The high transmittance film of high-reflecting film and 1050-1070nm；The reflectivity of second high-reflecting film is greater than 90%；The transmissivity of the high transmittance film
Greater than 10%.
3. microplate ridge waveguide laser according to claim 1, which is characterized in that the thickness of the microplate ridge waveguide laser
Degree meetsWherein L is the thickness of the microplate ridge waveguide laser；N is group index, Δ λ0For gain spectrum
Width, λ are center wavelength.
4. microplate ridge waveguide laser according to claim 1, which is characterized in that the size of the ridge waveguide part is length
Wide 10 μ m of 300 μ ms is 25 μm high.
5. microplate ridge waveguide laser according to claim 1, which is characterized in that the ruler of the microplate ridge waveguide laser
Very little is long 0.5mm × wide 0.3mm × high 0.4mm.
6. a kind of microplate ridge waveguide tunable laser, which is characterized in that the microplate ridge waveguide tunable laser includes: micro-
Piece ridge waveguide laser, semiconductor laser, optical fiber, optical coupler and temperature controller；
The microplate ridge waveguide laser includes: lithium niobate substrate layer and ridge waveguide part；The ridge waveguide part and the niobium
The material of sour lithium substrate layer is the lithium columbate crystal for adulterating ytterbium ion；The lithium niobate substrate layer and the ridge waveguide part are equal
For rectangular parallelepiped structure；The ridge waveguide part is located at the middle position of lithium niobate substrate layer upper surface；The ridge waveguide
Partial length is parallel with the width of the lithium niobate substrate layer；The width of the length of the ridge waveguide part and the lithium niobate substrate layer
It spends identical；The both ends of the surface of the microplate ridge waveguide laser are coated with laser resonator film；
The pump light that the semiconductor laser issues is coupled into after the optical fiber transmits and the optical coupler couples
Enter the ridge waveguide part；The microplate ridge waveguide laser is placed in the temperature controller；The temperature controller is described for adjusting
The temperature of microplate ridge waveguide laser makes the microplate ridge waveguide laser issue the laser of different wave length.
7. microplate ridge waveguide tunable laser according to claim 6, which is characterized in that the semiconductor laser hair
Pump wavelength out is 918nm.
8. microplate ridge waveguide tunable laser according to claim 6, which is characterized in that the microplate ridge waveguide laser
The wave-length coverage that device issues laser is 1050-1070nm.
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| CN201821032947.0U CN208352709U (en) | 2018-07-02 | 2018-07-02 | A kind of microplate ridge waveguide laser and microplate ridge waveguide tunable laser |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108493769A (en) * | 2018-07-02 | 2018-09-04 | 南京天正明日自动化有限公司 | A kind of microplate ridge waveguide laser, tunable laser and preparation method thereof |
| CN112130253A (en) * | 2020-09-08 | 2020-12-25 | 派尼尔科技（天津）有限公司 | Method for manufacturing Y-transmission ridge type optical waveguide on Z-cut lithium niobate thin film |
| CN113067251A (en) * | 2021-04-16 | 2021-07-02 | 福建中科晶创光电科技有限公司 | Array waveguide all-solid-state laser |
-
2018
- 2018-07-02 CN CN201821032947.0U patent/CN208352709U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108493769A (en) * | 2018-07-02 | 2018-09-04 | 南京天正明日自动化有限公司 | A kind of microplate ridge waveguide laser, tunable laser and preparation method thereof |
| CN112130253A (en) * | 2020-09-08 | 2020-12-25 | 派尼尔科技（天津）有限公司 | Method for manufacturing Y-transmission ridge type optical waveguide on Z-cut lithium niobate thin film |
| CN112130253B (en) * | 2020-09-08 | 2021-07-23 | 派尼尔科技（天津）有限公司 | Method for manufacturing Y-transmission ridge type optical waveguide on Z-cut lithium niobate thin film |
| CN113067251A (en) * | 2021-04-16 | 2021-07-02 | 福建中科晶创光电科技有限公司 | Array waveguide all-solid-state laser |
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