CN203083699U - Ultraviolet light source light equalizing device - Google Patents
Ultraviolet light source light equalizing device Download PDFInfo
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Abstract
Description
技术领域technical field
本实用新型涉及紫外-真空紫外辐射量计量测试领域,具体的讲是一种紫外光源均光装置。The utility model relates to the field of measurement and testing of ultraviolet-vacuum ultraviolet radiation, in particular to an ultraviolet light source uniform light device.
背景技术Background technique
随着我国探月计划及其它太空计划的开展,紫外载荷及设备的应用越来越广,作用也日益重要,同时,国内在导弹技术研究中正开展包括紫外制导的双模复合制导研究。在这些紫外领域开展的研究工作中,需要用到各类紫外设备及部件,包括光源、探测器、真空紫外光谱仪、臭氧垂直探测用真空紫外光谱辐射计、紫外成像器、紫外临边成像仪等,这些设备及其部件都需要进行计量测试及校准,以准确掌握这些设备及部件的特性,同时完成量值传递,为这些设备及组件的应用提供技术基础支撑。With the development of my country's lunar exploration program and other space programs, the application of ultraviolet loads and equipment is becoming more and more extensive, and its role is becoming more and more important. At the same time, domestic research on dual-mode composite guidance including ultraviolet guidance is being carried out in missile technology research. In the research work carried out in these ultraviolet fields, various ultraviolet equipment and components are needed, including light sources, detectors, vacuum ultraviolet spectrometers, vacuum ultraviolet spectroradiometers for vertical ozone detection, ultraviolet imagers, ultraviolet edge imagers, etc. , These devices and their components need to be measured and calibrated to accurately grasp the characteristics of these devices and components, and at the same time complete the value transfer to provide technical support for the application of these devices and components.
在紫外-真空紫外光谱辐照度计量、测试及校准过程中,为了保证计量、测试及校准的准确性,必须对光源发出的光辐射进行均匀化,均匀光辐射的水平在很大程度上决定了计量、测试及校准的精度。因此,光源匀光技术是紫外-真空紫外光谱辐照度计量系统中的一项关键技术。In the process of UV-VUV spectrum irradiance measurement, testing and calibration, in order to ensure the accuracy of measurement, testing and calibration, the light radiation emitted by the light source must be homogenized, and the level of uniform light radiation largely determines Accuracy of measurement, testing and calibration. Therefore, light source homogenization technology is a key technology in the UV-VUV spectral irradiance measurement system.
在紫外-真空紫外光谱辐照度计量测试系统中,光源匀光采用漫射器,其主要作用为校正光源空间辐射方向性差异,以便精确测量出光源在某一距离处的辐照度。在传统的光谱辐照度计量中,一般的漫射器主要有漫反射板、积分球、漫透射板等形式。对于紫外-真空紫外波段,对漫射器提出了更高的要求。一方面,即要保证余弦校正效果,另一方面又要保证光谱透射范围、透射率以及信噪比等因素。In the ultraviolet-vacuum ultraviolet spectral irradiance measurement and testing system, the diffuser is used for light source homogenization, and its main function is to correct the difference in the spatial radiation direction of the light source, so as to accurately measure the irradiance of the light source at a certain distance. In the traditional spectral irradiance measurement, the general diffuser mainly has the form of diffuse reflection plate, integrating sphere, diffuse transmission plate and so on. For the UV-VUV band, higher requirements are placed on the diffuser. On the one hand, it is necessary to ensure the effect of cosine correction, and on the other hand, it is necessary to ensure factors such as spectral transmission range, transmittance, and signal-to-noise ratio.
现有技术的方法是采用积分球或漫反射板,材料选用聚四氟乙烯。但是聚四氟乙烯的反射波段范围在250nm处已经产生强烈的衰减,无法对整个紫外-真空紫外波段形成全面覆盖;如果选用铝作为反射材料,氧化后的铝只能反射到160nm波段,且反射率低。The method in the prior art is to use an integrating sphere or a diffuse reflection plate, and the material is polytetrafluoroethylene. However, the reflection band range of PTFE has been strongly attenuated at 250nm, and it cannot form a comprehensive coverage of the entire UV-VUV band; if aluminum is used as the reflective material, the oxidized aluminum can only reflect to the 160nm band, and the reflection low rate.
实用新型内容Utility model content
为了解决现有技术中对紫外-真空紫外波段范围的紫外光的辐射度计量中衰减和处理波段缺陷等问题,提供了一种紫外光源均光装置,可以覆盖整个紫外-真空紫外波段(110nm~400nm)对光源发出的光辐射进行均匀化,以满足该波段内光谱辐照的计量测试需求。In order to solve the problems of attenuation and processing band defects in the radiometric measurement of ultraviolet light in the ultraviolet-vacuum ultraviolet range in the prior art, a uniform light device for ultraviolet light sources is provided, which can cover the entire ultraviolet-vacuum ultraviolet band (110nm~ 400nm) to homogenize the light radiation emitted by the light source to meet the measurement and test requirements of spectral radiation in this band.
本实用新型实施例提供了一种紫外光源均光装置,包括:The embodiment of the utility model provides an ultraviolet light source uniform light device, including:
复数个漫射器,驱动单元;A plurality of diffusers, drive units;
每个所述的漫射器用于对特定波段的入射紫外光进行均光和聚焦;Each of the diffusers is used to homogenize and focus the incident ultraviolet light of a specific wavelength band;
所述驱动单元用于根据测试的需要调节相应的漫射器位于光路中。The drive unit is used to adjust the corresponding diffuser to be located in the light path according to the test requirements.
根据本实用新型实施例所述的一种紫外光源均光装置的一个进一步的方面,所述复数个漫射器连续覆盖在110nm-400nm的紫外-真空紫外波段。According to a further aspect of the ultraviolet light source homogenizing device described in the embodiment of the present invention, the plurality of diffusers continuously cover the ultraviolet-vacuum ultraviolet band of 110nm-400nm.
根据本实用新型实施例所述的一种紫外光源均光装置的再一个进一步的方面,所述复数个漫射器包括3个漫射器,所述3个漫射器覆盖的波段分别为110nm~130nm、130nm~200nm和200nm~400nm。According to a further aspect of the ultraviolet light source homogenizing device described in the embodiment of the present invention, the plurality of diffusers include 3 diffusers, and the wavelength bands covered by the 3 diffusers are respectively 110nm ~130nm, 130nm~200nm, and 200nm~400nm.
根据本实用新型实施例所述的一种紫外光源均光装置的另一个进一步的方面,所述漫射器一面为平面的漫射面,另一面为抛光的凸面;或者所述平面为抛光面,所述凸面为漫射面;或者平面和凸面均为漫射面。According to another further aspect of the ultraviolet light source homogenizing device described in the embodiment of the present invention, one side of the diffuser is a plane diffusing surface, and the other side is a polished convex surface; or the plane is a polished surface , the convex surface is a diffuse surface; or both the plane and the convex surface are diffuse surfaces.
根据本实用新型实施例所述的一种紫外光源均光装置的另一个进一步的方面,所述3个漫射器中的第一漫射器工作波段为110nm~130nm,材料为氟化锂单晶,其凸面的曲率半径为81.56mm,整体厚度为4±0.1mm,通光口径为26mm,焦距数为9;According to another further aspect of the ultraviolet light source homogenizing device described in the embodiment of the present invention, the first diffuser among the three diffusers has a working wavelength range of 110nm to 130nm, and the material is lithium fluoride crystal, the curvature radius of its convex surface is 81.56mm, the overall thickness is 4±0.1mm, the aperture is 26mm, and the focal length is 9;
第二漫射器工作波段为130nm~200nm,材料为氟化钙单晶,其凸面的曲率半径为77.35mm,整体厚度为4±0.1mm,通光口径为26mm,F数为9;The working band of the second diffuser is 130nm-200nm, the material is calcium fluoride single crystal, the curvature radius of its convex surface is 77.35mm, the overall thickness is 4±0.1mm, the aperture is 26mm, and the F number is 9;
第三漫射器工作波段为200nm~400nm,材料为氟化钙单晶,其凸面的曲率半径为168.31mm,整体厚度为6±0.1mm,通光口径为64mm,F数为9。The working band of the third diffuser is 200nm-400nm, the material is calcium fluoride single crystal, the curvature radius of its convex surface is 168.31mm, the overall thickness is 6±0.1mm, the aperture is 64mm, and the F-number is 9.
通过本实用新型实施例,由于采用了工作于110nm-400nm紫外光波段范围的复数个漫射镜均光和聚焦,保证了以点光源或面光源作为紫外光源时的光谱辐照度校准既可以产生很好的余弦校正效应,又能保证系统的信噪比。Through the embodiment of the utility model, due to the use of a plurality of diffuse mirrors working in the range of 110nm-400nm ultraviolet light for uniform light and focusing, it is ensured that the spectral irradiance calibration can be done when the point light source or surface light source is used as the ultraviolet light source. It produces a good cosine correction effect and can ensure the signal-to-noise ratio of the system.
附图说明Description of drawings
结合以下附图阅读对实施例的详细描述,本实用新型的上述特征和优点,以及额外的特征和优点,将会更加清楚。The above-mentioned features and advantages of the present invention, as well as additional features and advantages, will become clearer when reading the detailed description of the embodiments in conjunction with the following drawings.
图1给出了根据本实用新型的一个实施例一种紫外光源均光装置的结构示意图;Fig. 1 has provided the structural representation of a kind of ultraviolet light source homogenizing device according to an embodiment of the present utility model;
图2所示为本实用新型实施例第一漫射器的结构示意图;Fig. 2 shows the structural representation of the first diffuser of the utility model embodiment;
图3所示为本实用新型实施例第二漫射器的结构示意图;Fig. 3 is a schematic structural diagram of a second diffuser according to an embodiment of the present invention;
图4所示为本实用新型实施例第三漫射器的结构示意图;Fig. 4 is a schematic structural view of a third diffuser according to an embodiment of the present invention;
图5所示为本实用新型实施例对点光源进行光谱辐照度校准时的系统结构图;Fig. 5 shows the system structure diagram when the spectral irradiance calibration of the point light source is carried out in the embodiment of the utility model;
图6所示为本实用新型实施例对面光源进行光谱辐照度校准时的系统结构图。Fig. 6 is a system structure diagram for calibrating the spectral irradiance of a surface light source according to an embodiment of the present invention.
具体实施方式Detailed ways
下面的描述可以使任何本领域技术人员利用本实用新型。具体实施例和应用中所提供的描述信息仅为示例。这里所描述的实施例的各种延伸和组合对于本领域的技术人员是显而易见的,在不脱离本实用新型的实质和范围的情况下,本实用新型定义的一般原则可以应用到其他实施例和应用中。因此,本实用新型不只限于所示的实施例,本实用新型涵盖与本文所示原理和特征相一致的最大范围。The following description can make any person skilled in the art utilize the utility model. The descriptions provided in the specific embodiments and applications are examples only. Various extensions and combinations of the embodiments described herein will be apparent to those skilled in the art. Without departing from the spirit and scope of the present invention, the general principles defined in the present invention can be applied to other embodiments and in application. Thus, the invention is not limited to the embodiments shown, but the invention covers the widest scope consistent with the principles and features shown herein.
图1给出了根据本实用新型的一个实施例一种紫外光源均光装置的结构示意图。Fig. 1 shows a schematic structural view of an ultraviolet light source homogenizing device according to an embodiment of the present invention.
包括复数个漫射器101,驱动单元102。It includes a plurality of diffusers 101 and a driving unit 102 .
每个所述的漫射器101用于对特定波段的入射紫外光进行均光和聚焦。Each of the diffusers 101 is used to homogenize and focus the incident ultraviolet light of a specific wavelength band.
所述驱动单元102用于根据测试的需要调节相应的漫射器102位于光路中。The driving unit 102 is used to adjust the corresponding diffuser 102 to be located in the light path according to the test requirements.
作为本实用新型的一个实施例,所述复数个漫射器101连续覆盖在110nm-400nm的紫外-真空紫外波段,用以满足光谱辐射度计量的需求。As an embodiment of the present invention, the plurality of diffusers 101 continuously cover the ultraviolet-vacuum ultraviolet band of 110nm-400nm, so as to meet the requirement of spectral radiometric measurement.
作为本实用新型的一个实施例,所述复数个漫射器101包括3个漫射器,所述3个漫射器覆盖的波段分别为110nm~130nm、130nm~200nm和200nm~400nm。As an embodiment of the present invention, the plurality of diffusers 101 includes three diffusers, and the wavelength bands covered by the three diffusers are 110nm-130nm, 130nm-200nm and 200nm-400nm respectively.
作为本实用新型的一个实施例,所述漫射器一面为平面的漫射面,另一面为抛光的凸面;或者所述平面为抛光面,所述凸面为漫射面;或者平面和凸面均为漫射面。As an embodiment of the present invention, one side of the diffuser is a plane diffusing surface, and the other side is a polished convex surface; or the plane is a polished surface, and the convex surface is a diffusing surface; or both the plane and the convex surface are for the diffuse surface.
作为本实用新型的一个实施例,所述3个漫射器中的第一漫射器工作波段为110nm~130nm,材料为氟化锂单晶,其凸面的曲率半径为81.56mm,整体厚度为4±0.1mm,通光口径为26mm,焦距(F)数为9。As an embodiment of the present invention, the working band of the first diffuser among the three diffusers is 110nm-130nm, and the material is lithium fluoride single crystal, the radius of curvature of its convex surface is 81.56mm, and the overall thickness is 4±0.1mm, the clear aperture is 26mm, and the focal length (F) number is 9.
第二漫射器工作波段为130nm~200nm,材料为氟化钙单晶,其凸面的曲率半径为77.35mm,整体厚度为4±0.1mm,通光口径为26mm,F数为9。The working band of the second diffuser is 130nm-200nm, the material is calcium fluoride single crystal, the curvature radius of its convex surface is 77.35mm, the overall thickness is 4±0.1mm, the aperture is 26mm, and the F-number is 9.
第三漫射器工作波段为200nm~400nm,材料为氟化钙单晶,其凸面的曲率半径为168.31mm,整体厚度为6±0.1mm,通光口径为64mm,F数为9。The working band of the third diffuser is 200nm-400nm, the material is calcium fluoride single crystal, the curvature radius of its convex surface is 168.31mm, the overall thickness is 6±0.1mm, the aperture is 64mm, and the F-number is 9.
在本实用新型中也应当包括可以覆盖紫外-真空紫外波段范围不同数量的漫射器,例如两个漫射器、四个漫射器等,对于不同数量的漫射器涉及略有不同,而且漫射器的排列方式也可以具有不同形式,例如还可以将复数个漫射器并列排布,并垂直于光路,针对不同波段紫外光源时,可以垂直于光路的移动从而改变漫射器,但是都应当理解为本实用新型的保护范围。The utility model should also include different numbers of diffusers that can cover the range of ultraviolet-vacuum ultraviolet bands, such as two diffusers, four diffusers, etc., which are slightly different for different numbers of diffusers, and The arrangement of the diffusers can also have different forms. For example, a plurality of diffusers can be arranged side by side and perpendicular to the light path. For different wavelengths of ultraviolet light sources, the diffuser can be changed by moving perpendicular to the light path, but All should be understood as the protection scope of the present utility model.
如图1所示紫外光源均光装置的漫射器101与驱动单元102的排布形式为一个实施例,还可以为其他形式,只要是使得复数个覆盖110nm-400nm紫外光波段范围的漫射器可以逐个位于光路中即可,其它的排布形式也在本实用新型的保护范围之内。The arrangement form of the diffuser 101 and the driving unit 102 of the ultraviolet light source homogenizing device as shown in Figure 1 is an embodiment, and can also be other forms, as long as it makes a plurality of diffusers covering the 110nm-400nm ultraviolet band range The devices can be located in the optical path one by one, and other arrangements are also within the protection scope of the present utility model.
通过上述实施例,由于采用了工作于110nm-400nm紫外光波段范围的复数个漫射镜均光和聚焦,保证了以点光源或面光源作为紫外光源时的光谱辐照度校准既可以产生很好的余弦校正效应,又能保证系统的信噪比。Through the above-mentioned embodiment, due to the use of a plurality of diffuse mirrors working in the 110nm-400nm ultraviolet wavelength range for uniform light and focusing, it is ensured that the spectral irradiance calibration when using a point light source or a surface light source as an ultraviolet light source can produce a lot of light. Good cosine correction effect can ensure the signal-to-noise ratio of the system.
如图2所示为本实用新型实施例第一漫射器的结构示意图。FIG. 2 is a schematic structural diagram of the first diffuser according to the embodiment of the present invention.
该第一漫射器工作波段为110nm~130nm,材料为氟化锂单晶,共有两个工作面,一个工作面为平面,加工成漫透射面,所述平面侧的玻璃表面具有细微的划痕,构成漫射投射面;另一个工作面为球面,其曲率半径为81.56mm,加工成抛光面,整体厚度为4±0.1mm,通光口径为26mm,F数为9。其中,表示倒角的角度是45度,单边长为0.3,公差是+0.2,R∞表示曲率半径为无穷大,表示为粗糙度是0.05。The working band of the first diffuser is 110nm-130nm, and the material is lithium fluoride single crystal. There are two working surfaces, one working surface is a plane, which is processed into a diffuse transmission surface, and the glass surface on the side of the plane has fine scratches. The other working surface is a spherical surface with a radius of curvature of 81.56mm, processed into a polished surface, with an overall thickness of 4±0.1mm, a clear aperture of 26mm, and an F number of 9. in, It means that the angle of the chamfer is 45 degrees, the length of one side is 0.3, the tolerance is +0.2, R∞ means that the radius of curvature is infinite, Expressed as roughness is 0.05.
如图3所示为本实用新型实施例第二漫射器的结构示意图。FIG. 3 is a schematic structural diagram of the second diffuser according to the embodiment of the present invention.
该第二漫射器工作波段为130nm~200nm,材料为氟化钙单晶,共有两个工作面,一个工作面为平面,加工成漫透射面,所述平面侧的玻璃表面具有细微的划痕,构成漫射投射面;另一个工作面为球面,其曲率半径为77.35mm,加工成抛光面,整体厚度为4±0.1mm,通光口径为26mm,F数为9。The working waveband of the second diffuser is 130nm-200nm, and the material is calcium fluoride single crystal. The other working surface is a spherical surface with a radius of curvature of 77.35mm, processed into a polished surface, with an overall thickness of 4±0.1mm, a clear aperture of 26mm, and an F number of 9.
如图4所示为本实用新型实施例第三漫射器的结构示意图。FIG. 4 is a schematic structural diagram of a third diffuser according to an embodiment of the present invention.
该第三漫射器工作波段为200nm~400nm,材料为氟化钙单晶,共有两个工作面,一个工作面为平面,加工成漫透射面,所述平面侧的玻璃表面具有细微的划痕,构成漫射投射面;另一个工作面为球面,其曲率半径为168.31mm,加工成抛光面,整体厚度为6±0.1mm,通光口径为64mm,F数为9。The working band of the third diffuser is from 200nm to 400nm, and the material is calcium fluoride single crystal. The other working surface is a spherical surface with a radius of curvature of 168.31mm, processed into a polished surface, with an overall thickness of 6±0.1mm, a clear aperture of 64mm, and an F number of 9.
如图5所示为本实用新型实施例对点光源进行光谱辐照度校准时的系统结构图。As shown in FIG. 5 , it is a system structure diagram when the spectral irradiance calibration of the point light source is carried out in the embodiment of the utility model.
包括点光源501,紫外光源均光装置502,探测器503。It includes a point light source 501, an ultraviolet light source homogenizing device 502, and a detector 503.
所述点光源501用于提供紫外光源,放置于紫外光源均光装置502漫射器的焦点上。The point light source 501 is used to provide an ultraviolet light source, and is placed on the focal point of the diffuser of the ultraviolet light source homogenizing device 502 .
所述紫外光源均光装置502,利用上述实施例的紫外光源均光装置中的3个漫射器对点光源501发出的紫外光进行均光和聚焦,所述3个漫射器分别负责应对不同波段紫外光。The ultraviolet light source homogenizing device 502 uses the three diffusers in the ultraviolet light source homogenizing device of the above embodiment to homogenize and focus the ultraviolet light emitted by the point light source 501, and the three diffusers are respectively responsible for Different wavelengths of ultraviolet light.
所述探测器503获取透过所述紫外光源均光装置502的紫外光辐射,探测到110nm-400nm波段范围的全部紫外光辐射。The detector 503 acquires the ultraviolet light radiation transmitted through the ultraviolet light source homogenizing device 502, and detects all the ultraviolet light radiation in the 110nm-400nm band range.
在本实施例中的点光源也可以为近似的点光源。The point light source in this embodiment may also be an approximate point light source.
通过本实用新型中的设计保证了光谱辐照度校准时,既可以产生很好的余弦校正效应,又能保证系统的信噪比,利用探测器件可以探测到均匀的光辐射,可以对紫外光源或者探测器件进行计量、测试及校准。The design in the utility model ensures that when the spectral irradiance is calibrated, it can not only produce a good cosine correction effect, but also ensure the signal-to-noise ratio of the system. The detection device can detect uniform light radiation, and can detect the ultraviolet light source. Or detect devices for measurement, testing and calibration.
如图6所示为本实用新型实施例对面光源进行光谱辐照度校准时的系统结构图。As shown in FIG. 6 , it is a system structure diagram when performing spectral irradiance calibration on a surface light source according to an embodiment of the present invention.
包括面光源601,紫外光源均光装置602,靶标及平行光管603,探测器604。It includes a surface light source 601 , an ultraviolet light source uniform light device 602 , a target and collimator 603 , and a detector 604 .
所述面光源601,用于提供紫外光源,放置于距离所述紫外光源均光装置602较远距离处,以保证余弦校正效果。The surface light source 601 is used to provide an ultraviolet light source, and is placed at a relatively long distance from the ultraviolet light source homogenizing device 602 to ensure the cosine correction effect.
所述紫外光源均光装置602,利用上述实施例的紫外光源均光装置中的3个漫射器对面光源601发出的紫外光进行均光和聚焦,所述3个漫射器分别负责应对不同波段紫外光。The ultraviolet light source homogenizing device 602 uses the three diffusers in the ultraviolet light source homogenizing device of the above embodiment to homogenize and focus the ultraviolet light emitted by the surface light source 601, and the three diffusers are respectively responsible for responding to different band ultraviolet light.
所述靶标及平行光管603,用于将不平行光变为平行光,可与面光源及漫射器配合,提供均匀的紫外光辐射,可以用于对探测器件或者光源进行计量测试及校准。The target and collimator 603 are used to change non-parallel light into parallel light, and can cooperate with surface light source and diffuser to provide uniform ultraviolet radiation, which can be used for measurement testing and calibration of detection devices or light sources .
所述探测器604获取透过所述紫外光源均光装置602的紫外光辐射,探测到110nm-400nm波段范围的全部紫外光辐射。The detector 604 acquires the ultraviolet light radiation transmitted through the ultraviolet light source homogenizing device 602, and detects all the ultraviolet light radiation in the 110nm-400nm band range.
由于面光源的辐射照度较强,可以能保证系统的信噪比,与后续的光机组件(在本例中为靶标及平行光管)配合,可以为探测器件提供均匀光辐射,可以对探测器件或者光源进行计量、测试及校准。Due to the strong irradiance of the surface light source, the signal-to-noise ratio of the system can be guaranteed. Cooperating with the subsequent optical-mechanical components (in this case, the target and collimator), it can provide uniform light radiation for the detection device, which can be used for detection. Devices or light sources are measured, tested and calibrated.
通过本实用新型实施例,在具备以上紫外-真空紫外漫射器的基础上,形成了采用漫射方式的紫外光源均光装置,根据被校光源的形式,灵活选用漫射器形式。既可以对于点光源或近似点光源,采用新型紫外-真空紫外平凸漫射透镜作为漫射器,将点光源中心放置在漫射器的焦点上,平凸漫射器一面为漫射面形式的平面,另一面为抛光的凸面,通过此项设计保证了光谱辐照度校准时,可以产生很好的余弦校正效应,又能保证系统的信噪比;又能对于面光源的光谱辐照度校准,可以采用毛玻璃作为漫射器的一侧平面,将被校光源放置在较远距离处,保证余弦校正效果,同时由于面光源的辐射照度较强,也能保证系统的信噪比。Through the embodiment of the utility model, on the basis of the above ultraviolet-vacuum ultraviolet diffuser, a diffused ultraviolet light source uniform light device is formed, and the form of the diffuser is flexibly selected according to the form of the light source to be calibrated. For point light sources or approximate point light sources, a new type of ultraviolet-vacuum ultraviolet plano-convex diffuser lens is used as a diffuser, and the center of the point light source is placed on the focal point of the diffuser. One side of the plano-convex diffuser is in the form of a diffuser surface The other side is a polished convex surface. This design ensures that when the spectral irradiance is calibrated, a good cosine correction effect can be produced, and the signal-to-noise ratio of the system can be guaranteed; For high-degree calibration, frosted glass can be used as one side plane of the diffuser, and the light source to be calibrated is placed at a relatively long distance to ensure the cosine correction effect. At the same time, due to the strong irradiance of the surface light source, the signal-to-noise ratio of the system can also be guaranteed.
在相关领域中的技术人员将会认识到,本实用新型的实施例有许多可能的修改和组合,虽然形式略有不同,仍采用相同的基本机制和方法。为了解释的目的,前述描述参考了几个特定的实施例。然而,上述的说明性讨论不旨在穷举或限制本文所实用新型的精确形式。前文所示,许多修改和变化是可能的。所选和所描述的实施例,用以解释本实用新型的原理及其实际应用,用以使本领域技术人员能够最好地利用本实用新型和各个实施例的针对特定应用的修改、变形。Those skilled in the relevant art will recognize that there are many possible modifications and combinations of the embodiments of the present invention, albeit in slightly different forms, still employing the same basic mechanisms and methods. The foregoing description, for purposes of explanation, has referred to a few specific embodiments. However, the illustrative discussions above are not intended to be exhaustive or to limit the precise forms of the inventions disclosed herein. As indicated above, many modifications and variations are possible. The selected and described embodiments are used to explain the principle of the utility model and its practical application, so as to enable those skilled in the art to make the best use of the utility model and the modifications and variations for specific applications of each embodiment.
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| CN103175608B (en) * | 2013-03-04 | 2016-06-08 | 北京振兴计量测试研究所 | A kind of equal electro-optical device of ultraviolet source |
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