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CN211320066U - Wafer transfer device - Google Patents

Wafer transfer device Download PDF

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Publication number
CN211320066U
CN211320066U CN201921621738.4U CN201921621738U CN211320066U CN 211320066 U CN211320066 U CN 211320066U CN 201921621738 U CN201921621738 U CN 201921621738U CN 211320066 U CN211320066 U CN 211320066U
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wafer
wafer transfer
rotating shaft
transfer device
wafers
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王二伟
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Yangtze Memory Technologies Co Ltd
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Yangtze Memory Technologies Co Ltd
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Abstract

The utility model provides a wafer transfer device, it includes pivot and a plurality of robotic arm, robotic arm follows the axial order of pivot sets up, at least part robotic arm can wind the pivot is rotatory. The utility model has the advantages of, wafer transfer device can shift a plurality of wafers simultaneously, has improved the efficiency that the wafer shifted, has saved production time.

Description

晶圆转移装置Wafer transfer device

技术领域technical field

本实用新型涉及半导体制造领域,尤其涉及一种将晶圆在晶圆盒之间转移的晶圆转移装置。The utility model relates to the field of semiconductor manufacturing, in particular to a wafer transfer device for transferring wafers between wafer cassettes.

背景技术Background technique

半导体制程中经常涉及到将晶圆自晶圆盒(FOUP)中取出的操作。其原因可能是旧的晶圆盒到了清洗日期,需要将晶圆移出,以清洗晶圆盒;也可能是因为晶圆在前序制程做过分离,分别位于几个不同的晶圆盒中,为了后续制程方便,需要将该些晶圆合并到一个晶圆盒里;还有可能是故障检修(trouble shooting),需要改变晶圆在晶圆盒中的位置等。The removal of wafers from a wafer cassette (FOUP) is often involved in semiconductor manufacturing. The reason may be that the old wafer cassette has reached the cleaning date, and the wafers need to be removed to clean the wafer cassette; it may also be that the wafers have been separated in the previous process and are located in several different wafer cassettes. For the convenience of subsequent processes, these wafers need to be merged into a wafer cassette; there may also be trouble shooting, which requires changing the position of the wafers in the wafer cassette, etc.

目前常见的用于转移晶圆的装置,转移晶圆的效率较低,无法满足需求。At present, the common devices for transferring wafers have low wafer transfer efficiency and cannot meet the demand.

实用新型内容Utility model content

本实用新型所要解决的技术问题是,提供一种晶圆转移装置,其能够提高晶圆转移效率,节省生产时间。The technical problem to be solved by the present invention is to provide a wafer transfer device, which can improve the wafer transfer efficiency and save production time.

为了解决上述问题,本实用新型提供了一种晶圆转移装置,其包括转轴及多个机械手臂,所述机械手臂沿所述转轴的轴向顺序设置,至少部分所述机械手臂能够绕所述转轴旋转。In order to solve the above problems, the present invention provides a wafer transfer device, which includes a rotating shaft and a plurality of robotic arms, the robotic arms are sequentially arranged along the axial direction of the rotating shaft, and at least part of the robotic arms can rotate around the rotating shaft. The shaft rotates.

进一步,所述机械手臂具有一旋转平面,所述机械手臂在所述旋转平面内旋转。Further, the robotic arm has a rotation plane, and the robotic arm rotates in the rotation plane.

进一步,所述机械手臂的旋转平面平行。Further, the rotation planes of the robotic arms are parallel.

进一步,所述旋转平面与所述转轴的轴向垂直。Further, the rotation plane is perpendicular to the axial direction of the rotation shaft.

进一步,所述机械手臂具有一承载面,所述机械手臂的承载面平行。Further, the robotic arm has a bearing surface, and the bearing surfaces of the robotic arm are parallel.

进一步,所述机械手臂的承载面与所述机械手臂的旋转平面平行。Further, the bearing surface of the robotic arm is parallel to the rotation plane of the robotic arm.

进一步,所述机械手臂能够绕所述转轴旋转至少180度。Further, the robotic arm can rotate at least 180 degrees around the rotation axis.

进一步,所述转轴能够自传,以带动所述机械手臂旋转。Further, the rotating shaft can be self-propagated to drive the mechanical arm to rotate.

进一步,所述晶圆转移装置还包括一固定件,所述转轴连接在所述固定件上。Further, the wafer transfer device further includes a fixing member, and the rotating shaft is connected to the fixing member.

进一步,相邻的所述机械手臂的间距与待转移的晶圆的间距相同。Further, the distance between the adjacent robotic arms is the same as the distance between the wafers to be transferred.

本实用新型晶圆转移装置,能够同时转移多个晶圆,提高了晶圆转移的效率,节省了生产时间。The wafer transfer device of the utility model can transfer a plurality of wafers at the same time, thereby improving the wafer transfer efficiency and saving production time.

附图说明Description of drawings

图1是本实用新型晶圆转移装置的一具体实施方式的结构示意图;1 is a schematic structural diagram of a specific embodiment of the wafer transfer device of the present invention;

图2是使用本实用新型晶圆转移装置进行晶圆转移的实施例一的示意图;2 is a schematic diagram of Embodiment 1 of wafer transfer using the wafer transfer device of the present invention;

图3是使用本实用新型晶圆转移装置进行晶圆转移的实施例二的示意图;3 is a schematic diagram of Embodiment 2 of wafer transfer using the wafer transfer device of the present invention;

图4是使用本实用新型晶圆转移装置进行晶圆转移的实施例三的示意图。FIG. 4 is a schematic diagram of Embodiment 3 of wafer transfer using the wafer transfer device of the present invention.

具体实施方式Detailed ways

下面结合附图对本实用新型提供的晶圆转移装置的具体实施方式做详细说明。The specific embodiments of the wafer transfer device provided by the present invention will be described in detail below with reference to the accompanying drawings.

图1是本实用新型晶圆转移装置的一具体实施方式的结构示意图。请参阅图1,所述晶圆转移装置包括转轴10及多个机械手臂11,所述机械手臂11沿所述转轴10的轴向A顺序设置。所述机械手臂11能够承载晶圆(附图中未绘示)。具体地说,所述机械手臂11具有一承载面B,所述承载面B用于承载晶圆。所述机械手臂11可为平板构型,或者为Y型构型,其能够自所述晶圆的底面托举所述晶圆。FIG. 1 is a schematic structural diagram of a specific embodiment of the wafer transfer apparatus of the present invention. Referring to FIG. 1 , the wafer transfer device includes a rotating shaft 10 and a plurality of robotic arms 11 , and the robotic arms 11 are arranged in sequence along the axis A of the rotating shaft 10 . The robotic arm 11 can carry wafers (not shown in the drawings). Specifically, the robot arm 11 has a bearing surface B, and the bearing surface B is used for bearing wafers. The robot arm 11 can be a flat plate configuration or a Y-shaped configuration, which can lift the wafer from the bottom surface of the wafer.

至少部分所述机械手臂11能够绕所述转轴10旋转。在本具体实施方式中,所述晶圆转移装置的所有的机械手臂11均能够绕所述转轴10旋转。在本实用新型其他具体实施方式中,也可部分所述机械手臂能够绕所述转轴旋转,其他机械手臂可相对于所述转轴固定。At least a part of the robotic arm 11 can rotate around the rotating shaft 10 . In this specific embodiment, all the robotic arms 11 of the wafer transfer apparatus can rotate around the rotating shaft 10 . In other specific embodiments of the present invention, some of the mechanical arms may be rotatable around the rotating shaft, and other mechanical arms may be fixed relative to the rotating shaft.

当需要将若干个晶圆从一个晶圆承载装置(例如,晶圆盒)转移至另一晶圆承载装置或者其他位置时,与所述晶圆对应位置的机械手臂绕所述转轴10旋转至需要转移的晶圆下方并承载晶圆;承载所述晶圆后,所述机械手臂绕所述转轴10旋转至预设位置,将所述晶圆传送至另一晶圆承载装置内或者目标位置。When several wafers need to be transferred from one wafer carrier (for example, a wafer cassette) to another wafer carrier or other positions, the robotic arm corresponding to the wafers rotates around the rotating shaft 10 to Below the wafer to be transferred and carrying the wafer; after carrying the wafer, the robotic arm rotates around the rotating shaft 10 to a preset position, and transfers the wafer to another wafer carrying device or a target position .

在图1中示意性地绘示四个所述机械手臂11,其中一个机械手臂11为旋转一角度的状态。在本实用新型的其他具体实施方式中,可根据需求设置所述机械手臂11的数量。例如,若晶圆承载装置内能够装载的晶圆的数量为25个,则所述晶圆转移装置可设置25个机械手臂,以能够对所述晶圆承载装置内的所述晶圆进行一次性转移,提高晶圆转移效率。In FIG. 1 , four of the robotic arms 11 are schematically shown, and one of the robotic arms 11 is rotated by an angle. In other specific embodiments of the present invention, the number of the robotic arms 11 can be set according to requirements. For example, if the number of wafers that can be loaded in the wafer carrier is 25, the wafer transfer device can be provided with 25 robotic arms, so that the wafers in the wafer carrier can be loaded once Sex transfer, improve wafer transfer efficiency.

本实用新型晶圆转移装置设置有多个机械手臂,其能够一次性转移多个晶圆,大大提高了晶圆转移的效率;同时,所述晶圆转移装置的至少一部分机械手臂还可绕所述转轴10旋转,则可针对特定位置的晶圆进行转移,提高晶圆转移的准确度及效率。The wafer transfer device of the utility model is provided with a plurality of mechanical arms, which can transfer a plurality of wafers at one time, thereby greatly improving the efficiency of wafer transfer; at the same time, at least a part of the mechanical arms of the wafer transfer device can also go around the When the rotating shaft 10 rotates, the wafer at a specific position can be transferred, and the accuracy and efficiency of the wafer transfer can be improved.

优选地,所述机械手臂11能够绕所述转轴10旋转至少180度,提高机械手臂11的活动范围,从而使所述机械手臂11能够覆盖的范围更大,降低了对晶圆承载装置的摆放位置的要求,提高使用者操作便利性。Preferably, the robotic arm 11 can rotate at least 180 degrees around the rotating shaft 10 to increase the range of motion of the robotic arm 11, so that the robotic arm 11 can cover a larger range and reduce the swing of the wafer carrier device. Place the requirements of the location, improve the user's convenience of operation.

在本具体实施方式中,在垂直所述转轴10的轴向的方向仅设置一个所述机械手臂11,以避免所述机械手臂11之间互相干扰,影响晶圆的转移。进一步,相邻的所述机械手臂11的间距与待转移的晶圆的间距相同,则在同时使用多个机械手臂11转移晶圆时,所述机械手臂11可直接对应至晶圆,不需要再更改机械手臂11之间的间距,以便于提高使用者的操作便利性。In this specific embodiment, only one of the robotic arms 11 is arranged in a direction perpendicular to the axial direction of the rotating shaft 10 to avoid mutual interference between the robotic arms 11 and affect the transfer of the wafer. Further, the distance between the adjacent robotic arms 11 is the same as the distance between the wafers to be transferred, then when multiple robotic arms 11 are used to transfer wafers at the same time, the robotic arms 11 can directly correspond to the wafers, and do not need to be Then, the distance between the robotic arms 11 is changed, so as to improve the convenience of the user's operation.

进一步,所述转轴10可与一固定件12连接。所述固定件12固定在外部构件上,例如,所述固定件12固定在传送机台的侧壁上或者底座上。优选地,在本具体实施方式中,所述转轴10可转动地与所述固定件12连接,即所述转轴能够自传。所述转轴10自传进而能够带动位于所述转轴10上的机械手臂跟随所述转轴10转动,从而整体上改变所述机械手臂11的方向,以使所述机械手臂11能够与晶圆对应,进而转移晶圆。Further, the rotating shaft 10 can be connected with a fixing member 12 . The fixing member 12 is fixed on the external member, for example, the fixing member 12 is fixed on the side wall or the base of the conveyor table. Preferably, in this specific embodiment, the rotating shaft 10 is rotatably connected to the fixing member 12 , that is, the rotating shaft can self-transmit. The rotating shaft 10 transmits itself and can drive the robotic arm located on the rotating shaft 10 to follow the rotating shaft 10 to rotate, thereby changing the direction of the robotic arm 11 as a whole, so that the robotic arm 11 can correspond to the wafer, and then Transfer wafers.

进一步,所述晶圆转移装置也可根据晶圆承载装置的位置而整体移动,以便于使用者操作。Further, the wafer transfer device can also move as a whole according to the position of the wafer carrier device, so as to facilitate the operation of the user.

所述机械手臂11具有一旋转平面C,所述机械手臂11在所述旋转平面C内旋转。优选地,所有所述机械手臂11的旋转平面A平行设置,则可便于多个机械手臂11同时转移晶圆,且能够避免在转移晶圆时所述机械手臂11之间相互干扰。其中,所述旋转平面C与所述转轴10的轴向A垂直,即所述机械手臂11在垂直所述转轴10的轴向A的平面内转动。The robot arm 11 has a rotation plane C, and the robot arm 11 rotates in the rotation plane C. As shown in FIG. Preferably, the rotation planes A of all the robotic arms 11 are arranged in parallel, so that multiple robotic arms 11 can transfer wafers at the same time, and can avoid mutual interference between the robotic arms 11 when transferring wafers. The rotation plane C is perpendicular to the axial direction A of the rotating shaft 10 , that is, the robotic arm 11 rotates in a plane perpendicular to the axial direction A of the rotating shaft 10 .

在本具体实施方式中,所有所述机械手臂11的承载面B平行,且所述机械手臂11的承载面B与所述机械手臂11的旋转平面C平行,则所有所述机械手臂11的运动路径相同。在采用所述机械手臂11转移晶圆时,可使用任意一机械手臂11,不需再进行匹配选择,提高了使用者操作便利性。In this specific embodiment, the bearing surfaces B of all the robotic arms 11 are parallel, and the bearing surfaces B of the robotic arms 11 are parallel to the rotation plane C of the robotic arm 11, then all the motions of the robotic arms 11 are The path is the same. When using the robotic arm 11 to transfer the wafer, any one of the robotic arms 11 can be used, and no matching selection is required, which improves the user's operational convenience.

下面列举使用本实用新型晶圆转移装置进行晶圆转移的实施例Examples of wafer transfer using the wafer transfer device of the present invention are listed below.

实施例一Example 1

图2是使用本实用新型晶圆转移装置进行晶圆转移的实施例一的示意图。请参阅图2,在本实施例中,机械手臂11的数量与晶圆盒20A中的晶圆数量相同,晶圆盒20A中的所有晶圆21均需转移至晶圆盒20B,则所有的机械手臂11转动至晶圆盒20A对应位置,所述机械手臂11承载晶圆后再绕转轴旋转若干角度至晶圆盒20B的位置,将晶圆放置在晶圆盒20B内,实现晶圆自晶圆盒20A转移至晶圆盒20B内的目的。在图2中转移前及转移后的晶圆采用不同的阴影绘示。FIG. 2 is a schematic diagram of Embodiment 1 of wafer transfer using the wafer transfer apparatus of the present invention. Referring to FIG. 2 , in this embodiment, the number of the robotic arms 11 is the same as the number of wafers in the wafer cassette 20A, and all the wafers 21 in the wafer cassette 20A need to be transferred to the wafer cassette 20B. The robotic arm 11 rotates to the position corresponding to the wafer cassette 20A, the robotic arm 11 carries the wafer and then rotates around the axis of rotation by a number of angles to the position of the wafer cassette 20B, and places the wafer in the wafer cassette 20B to realize the wafer self-removal. The purpose of transferring the pod 20A to the pod 20B. The wafers before and after transfer are shown with different shading in FIG. 2 .

实施例二Embodiment 2

图3是使用本实用新型晶圆转移装置进行晶圆转移的实施例三的示意图。请参阅图3,在本实施例中,机械手臂11的数量与晶圆盒20A中的晶圆数量相同,晶圆盒20A中的部分晶圆21(如图3中阴影绘示的晶圆)需转移至晶圆盒20B,则与该些需要转移的晶圆21对应的机械手臂11转动至晶圆盒20A对应位置,所述机械手臂11承载晶圆后再绕转轴旋转若干角度至晶圆盒20B的位置,将晶圆放置在晶圆盒20B内,实现晶圆自晶圆盒20A转移至晶圆盒20B内的目的。在图3中转移前及转移后的晶圆采用不同的阴影绘示。FIG. 3 is a schematic diagram of the third embodiment of wafer transfer using the wafer transfer device of the present invention. Referring to FIG. 3 , in this embodiment, the number of the robotic arms 11 is the same as the number of wafers in the wafer cassette 20A, and some of the wafers 21 in the wafer cassette 20A (the shaded wafers in FIG. 3 ) To be transferred to the wafer box 20B, the robot arm 11 corresponding to the wafers 21 to be transferred is rotated to the corresponding position of the wafer box 20A, and the robot arm 11 carries the wafer and then rotates around the rotation axis by a certain angle to the wafer. The position of the cassette 20B, the wafers are placed in the wafer cassette 20B, and the purpose of transferring the wafers from the wafer cassette 20A to the wafer cassette 20B is realized. The wafers before and after transfer are shown with different shading in FIG. 3 .

实施例三Embodiment 3

图4是使用本实用新型晶圆转移装置进行晶圆转移的实施例三的示意图。请参阅图4,在本实施例中,机械手臂11的数量与晶圆盒20A中的晶圆数量相同,晶圆盒20A中的单片晶圆21(如图3中阴影绘示的晶圆)需转移至晶圆盒20B,则与该晶圆21对应的机械手臂11转动至晶圆盒20A对应位置,所述机械手臂11承载晶圆后在绕转轴旋转若干角度至晶圆盒20B的位置,将晶圆21放置在晶圆盒20B内,实现晶圆21自晶圆盒20A转移至晶圆盒20B内的目的。在图4中转移前及转移后的晶圆采用不同的阴影绘示。FIG. 4 is a schematic diagram of Embodiment 3 of wafer transfer using the wafer transfer device of the present invention. Referring to FIG. 4 , in this embodiment, the number of the robotic arms 11 is the same as the number of wafers in the wafer cassette 20A, and the single wafer 21 in the wafer cassette 20A (the shaded wafer in FIG. 3 ) ) needs to be transferred to the wafer box 20B, then the robot arm 11 corresponding to the wafer 21 is rotated to the corresponding position of the wafer box 20A, and after the robot arm 11 carries the wafer, it rotates around the rotation axis by several angles to the position of the wafer box 20B. position, the wafer 21 is placed in the wafer cassette 20B, and the purpose of transferring the wafer 21 from the wafer cassette 20A to the wafer cassette 20B is realized. The wafers before and after transfer are shown with different shading in FIG. 4 .

以上所述仅是本实用新型的优选实施方式,应当指出,对于本技术领域的普通技术人员,在不脱离本实用新型原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本实用新型的保护范围。The above are only the preferred embodiments of the present invention. It should be pointed out that for those skilled in the art, without departing from the principles of the present invention, several improvements and modifications can also be made. It should be regarded as the protection scope of the present invention.

Claims (10)

1.一种晶圆转移装置,其特征在于,包括转轴及多个机械手臂,所述机械手臂沿所述转轴的轴向顺序设置,至少部分所述机械手臂能够绕所述转轴旋转。1. A wafer transfer device, characterized in that it comprises a rotating shaft and a plurality of robotic arms, the robotic arms are sequentially arranged along the axial direction of the rotating shaft, and at least part of the robotic arms can rotate around the rotating shaft. 2.根据权利要求1所述的晶圆转移装置,其特征在于,所述机械手臂具有一旋转平面,所述机械手臂在所述旋转平面内旋转。2 . The wafer transfer apparatus according to claim 1 , wherein the robot arm has a rotation plane, and the robot arm rotates in the rotation plane. 3 . 3.根据权利要求2所述的晶圆转移装置,其特征在于,所述机械手臂的旋转平面平行。3 . The wafer transfer apparatus according to claim 2 , wherein the rotation planes of the robotic arms are parallel. 4 . 4.根据权利要求2所述的晶圆转移装置,其特征在于,所述旋转平面与所述转轴的轴向垂直。4 . The wafer transfer apparatus according to claim 2 , wherein the rotation plane is perpendicular to the axial direction of the rotation shaft. 5 . 5.根据权利要求2所述的晶圆转移装置,其特征在于,所述机械手臂具有一承载面,所述机械手臂的承载面平行。5 . The wafer transfer apparatus according to claim 2 , wherein the robot arm has a bearing surface, and the bearing surfaces of the robot arm are parallel. 6 . 6.根据权利要求5所述的晶圆转移装置,其特征在于,所述机械手臂的承载面与所述机械手臂的旋转平面平行。6 . The wafer transfer apparatus according to claim 5 , wherein the bearing surface of the robotic arm is parallel to the rotation plane of the robotic arm. 7 . 7.根据权利要求1所述的晶圆转移装置,其特征在于,所述机械手臂能够绕所述转轴旋转至少180度。7 . The wafer transfer apparatus of claim 1 , wherein the robotic arm can rotate at least 180 degrees around the rotation axis. 8 . 8.根据权利要求1所述的晶圆转移装置,其特征在于,所述转轴能够自传,以带动所述机械手臂旋转。8 . The wafer transfer device of claim 1 , wherein the rotating shaft is capable of self-transmission to drive the robotic arm to rotate. 9 . 9.根据权利要求1所述的晶圆转移装置,其特征在于,所述晶圆转移装置还包括一固定件,所述转轴连接在所述固定件上。9 . The wafer transfer device according to claim 1 , wherein the wafer transfer device further comprises a fixing member, and the rotating shaft is connected to the fixing member. 10 . 10.根据权利要求1所述的晶圆转移装置,其特征在于,相邻的所述机械手臂的间距与待转移的晶圆的间距相同。10 . The wafer transfer apparatus according to claim 1 , wherein the distance between the adjacent robotic arms is the same as the distance between the wafers to be transferred. 11 .
CN201921621738.4U 2019-09-26 2019-09-26 Wafer transfer device Active CN211320066U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112151432A (en) * 2020-11-26 2020-12-29 西安奕斯伟硅片技术有限公司 Apparatus, method and wafer transfer device for gripping wafers stored in wafer cassettes
CN116020692A (en) * 2022-12-26 2023-04-28 西安奕斯伟材料科技有限公司 Silicon wafer passivation system and working method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112151432A (en) * 2020-11-26 2020-12-29 西安奕斯伟硅片技术有限公司 Apparatus, method and wafer transfer device for gripping wafers stored in wafer cassettes
CN116020692A (en) * 2022-12-26 2023-04-28 西安奕斯伟材料科技有限公司 Silicon wafer passivation system and working method thereof

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