CN211785230U - Monochromatic X-ray single crystal/oriented crystal stress measuring system - Google Patents

Abstract

The utility model discloses a monochromatic X-ray single crystal/oriented crystal stress measurement system. In the measurement system, a multi-axis sample stage comprises an X degree of freedom translated along the X axis, a Y degree of freedom translated along the Y axis, and a Z degrees of freedom for axis translation, rotational degrees of freedom for rotation about the Z axis, and tilt degrees of freedom for tilting about the X and/or Y axes, the concentric height adjustment module makes the sample surface in a concentric height position based on the sample surface position, The concentric height position is the position where the height of the multi-axis sample stage does not change during the rotation and tilting process and is the position of the center of the circle where the X-ray generator and the detector rotate in the plane. The acquisition module collects diffraction peak signals, and the calculation module is based on Diffraction peak signals generate stress data.

Description

Monochromatic X-ray Single-Crystal/Oriented-Crystal Stress Measurement System

technical field

The utility model belongs to the technical field of single crystal measurement, in particular to a monochromatic X-ray single crystal/oriented crystal stress measurement system.

Background technique

As a key part in gas turbines and aircraft engines, single crystal blades have excellent mechanical properties, high temperature creep resistance and oxidation resistance. During the processing and production of single crystal blades, some residual stress will inevitably occur, and the existence of residual stress will affect the service life of the blade. In addition, during the service process, due to the long-term use under extreme working conditions, or the impact from foreign objects, such as dust particles, residual stress will also be generated on the blades, which will initiate cracks and cause failures and failures. At present, laser shock strengthening, as a processing technology of blades, introduces residual stress on the surface of the blade, which greatly improves the fatigue life and impact resistance of the blade. What range is favorable for blade life needs to be supported by residual stress measurements. Therefore, it is very important to measure the residual stress of a single crystal blade for the evaluation of the blade before and after service and the treatment process.

At present, the method of nondestructive residual stress testing in the laboratory is still based on powder samples or polycrystalline samples, which is not applicable to single crystal samples or oriented crystal samples. The residual stress measurement of single crystals and oriented crystals is currently carried out by large scientific devices, such as synchrotron X-ray and neutron diffraction. Relying on large scientific devices can achieve high-precision and even high spatial resolution measurements. However, the available machine time of large scientific devices is limited, and it cannot meet the purpose of producing and measuring at any time. The amount of data collected by large scientific devices is very large, and often has Multi-layer meaning, data analysis is difficult, and it is not practical in practical engineering.

Therefore, we hope that according to the above actual needs and the shortcomings of the existing technology, we will propose a single crystal/oriented crystal stress measurement system using monochromatic X-rays at the conventional laboratory energy level in a targeted manner to achieve high efficiency, fast and automatic. Precision measurement.

The above information disclosed in this Background section is only for enhancement of understanding of the background of the invention and therefore it may contain information that does not form the prior art that is already known in this country to a person of ordinary skill in the art.

Utility model content

Aiming at the problems existing in the prior art, the present utility model proposes a monochromatic X-ray single crystal/oriented crystal stress measurement system, which simplifies the detection requirements and can be easily automated only with low laboratory energy level monochromatic X-rays. Precise measurement to obtain single crystal residual stress and stress tensor.

The purpose of this utility model is to achieve through the following technical solutions, a monochromatic X-ray single crystal/oriented crystal stress measurement system includes:

A multi-axis stage, the upper surface of which supports a single crystal/oriented crystal sample, the multi-axis stage includes X degrees of freedom translated along the X axis, Y degrees of freedom translated along the Y axis, and Z degrees of freedom translated along the Z axis , rotational degrees of freedom for rotation around the Z axis, and tilt degrees of freedom for tilting around the X and/or Y axes,

A concentric height adjustment module configured to adjust the sample surface to a concentric height position, the concentric height adjustment module includes a position measurer that collects the position of the sample surface, and the concentric height adjustment module adjusts the sample surface to be concentric based on the sample surface position The high position, the concentric high position is the position where the height of the multi-axis sample stage does not change during the rotation and tilting process and is the center position of the X-ray generator and the detector rotating in the plane,

An X-ray generator that generates monochromatic X-rays to irradiate the sample, the X-ray generator performs a circular motion along a circle with the concentric high position as the center of rotation,

an acquisition module, which receives the diffraction signal from the sample, the acquisition module performs a circular motion along a circle with the concentric height position as the center of the circle to collect the diffraction peak signal,

a controller, which is electrically connected to the X-ray generator and the acquisition module,

A calculation module, configured to generate stress data based on the diffraction peak signal, is electrically connected to the acquisition module.

In the stress measurement system, the stress measurement system further includes a sample stage control module electrically connected to the multi-axis sample stage, the concentric height adjustment module and the controller, and the concentric height adjustment module sends an instruction to the sample surface position based on the sample surface position. Stage control module, stage control module, controller and/or computing module including memory for storing data and digital signal processor, application specific integrated circuit ASIC or field programmable gate array FPGA for processing data and plotting.

In the stress measurement system, the calculation module includes a fitter for fitting based on the diffraction peak signal to obtain diffraction angle data, a stress calculator for calculating the residual stress of the sample based on the diffraction angle, and a plurality of diffraction peak signals based on a stress calculator. Stress tensor calculator for calculating sample stress tensors.

In the stress measurement system, the multi-axis sample stage includes a clamp for fixing the sample, and the position of the sample can be adjusted finely.

In the stress measurement system, the position measurement device includes an optical measurement device, a laser rangefinder and/or a laser profile collector.

In the stress measurement system, the acquisition module includes a line detector or an area detector.

In the stress measurement system, the Z degree of freedom of the multi-axis sample stage translated along the Z axis includes a coarse adjuster with a first adjustment accuracy and a fine adjuster with a second adjustment accuracy.

In the stress measurement system, the stress measurement system further includes an electron backscatter diffractometer for measuring the crystal orientation of the sample and a standard sample for calibrating the peak position of the diffraction peak, and the standard sample includes alumina powder, calcium carbonate Powder and/or Lithium Lanthanum Zirconium Oxygen powder.

In the stress measurement system, the multi-axis sample stage includes a stacking structure of multiple motion stages or an integrated six-degree-of-freedom displacement stage.

In the stress measurement system, the controller and/or the computing module are wired/wireless connected to a mobile terminal, and the mobile terminal includes a computer, a mobile phone, a wristband, and a cloud server.

Compared with the prior art, the utility model has the following advantages:

The utility model adjusts the height of the single crystal sample based on the determined crystal orientation of the single crystal sample so that the surface of the single crystal sample is located at a concentric high position, wherein the concentric high position means that the height of the observation point does not change during the tilting process of the single crystal sample to ensure the detection accuracy; adjust the incident direction of the monochromatic X-ray and the relative position of the detector used to obtain the diffraction signal and the single crystal sample to obtain the diffraction signal; obtain the position with the strongest diffraction peak based on the diffraction signal, based on the The diffraction peak at the above position calculates the residual stress and stress tensor of the single crystal sample, which simplifies the detection requirements, and can easily detect the residual stress of the single crystal in large quantities without the need for high-energy X-rays, synchrotron radiation and neutron diffraction.

Description of drawings

Various other advantages and benefits of the present invention will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The accompanying drawings are only for the purpose of illustrating the preferred embodiments, and are not considered to be limitations of the present invention. Obviously, the drawings described below are only some embodiments of the present invention, and for those of ordinary skill in the art, other drawings can also be obtained from these drawings without creative effort. Also, the same components are denoted by the same reference numerals throughout the drawings.

In the attached image:

FIG. 1 is a schematic structural diagram of a monochromatic X-ray single crystal/oriented crystal stress measurement system according to an embodiment of the present invention.

The utility model will be further explained below in conjunction with the accompanying drawings and embodiments.

Detailed ways

Specific embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. Although specific embodiments of the present invention are shown in the accompanying drawings, it should be understood that the present invention may be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided so that the present invention will be more thoroughly understood, and will fully convey the scope of the present invention to those skilled in the art.

It should be noted that certain terms are used in the description and claims to refer to specific components. It should be understood by those skilled in the art that the same component may be referred to by different nouns. The description and the claims do not use the difference in terms as a way to distinguish components, but use the difference in function of the components as a criterion for distinguishing. As referred to throughout the specification and claims, "comprising" or "including" is an open-ended term and should be interpreted as "including but not limited to". Subsequent descriptions in the specification are preferred embodiments for implementing the present invention. However, the descriptions are for the purpose of general principles of the specification and are not intended to limit the scope of the present invention. The protection scope of the present invention shall be determined by the appended claims.

In order to facilitate the understanding of the embodiments of the present invention, the following will take specific embodiments as examples for further explanation and description in conjunction with the accompanying drawings, and each accompanying drawing does not constitute a limitation to the embodiments of the present invention.

For better understanding, as shown in Figure 1, the monochromatic X-ray single crystal/oriented crystal stress measurement system includes,

A multi-axis sample stage 1, the upper surface of which supports a single crystal/oriented crystal sample, the multi-axis sample stage 1 includes an X degree of freedom translated along the X axis, a Y degree of freedom translated along the Y axis, and a Z translation along the Z axis. degrees of freedom, rotational degrees of freedom for rotation about the Z axis, and tilt degrees of freedom for tilting about the X and/or Y axes,

A concentric height adjustment module 3, which is configured to adjust the sample surface to a concentric height, the concentric height adjustment module 3 connected to the sample stage control module 2 includes a position measurer for collecting the position of the sample surface, and the concentric height adjustment module 3 Send an instruction to the sample stage control module 2 based on the sample surface position to make the sample surface at a concentric high position, which is a position where the multi-axis sample stage 1 does not change its height during rotation and tilting and is The position of the center of the rotation of the X-ray generator 4 and the detector in the plane,

The X-ray generator 4, which generates monochromatic X-rays to irradiate the sample, performs a circular motion along a circle with the concentric high position as the center of rotation, when the X-ray generator 4 rotates , the irradiation point is always located at the concentric high position,

The acquisition module 5, which receives the diffraction signal from the sample, the acquisition module 5 performs a circular motion along the circle with the concentric height position as the center of the circle, when the acquisition module 5 rotates, the rotation center is always located at the concentric center high position,

A controller 6, which is electrically connected to the sample stage control module 2, the X-ray generator 4 and the acquisition module 5, based on the crystal orientation of the sample, the controller 6 sends an instruction to the sample stage control module 2 to make the sample in a concentric high position Surface rotation and tilt, and adjustment of the X-ray incident direction of the X-ray generator 4 and the collection position of the collection module 5 to collect diffraction peak signals,

A calculation module 7 is connected to the acquisition module 5, and the calculation module 7 generates stress data based on the diffraction peak signal.

The monochromatic X-ray single crystal/oriented crystal measurement system of the utility model realizes efficient, fast, automatic and precise measurement of residual stress in the single crystal/oriented crystal sample.

In one embodiment, a sample stage control module 2, which is electrically connected to the multi-axis sample stage 1, controls the movement of the sample stage in its degrees of freedom based on instructions.

In one embodiment, the measurement system includes a calculation module 7 , a concentric height adjustment module 3 , a sample stage control module 2 , an X-ray generation and acquisition module 5 , a multi-axis sample stage 1 and a controller 6 . The diffraction peaks of possible crystal planes are obtained by the controller 6 according to the approximate crystal orientation and Bragg equation, so as to adjust the X-ray generation and the X-ray incident direction of the acquisition module 5 and the approximate acquisition position of the detector. The height direction of the multi-axis sample stage 1 is controlled by the sample stage control module 2, combined with the concentric height adjustment module 3, so that the sample surface fixed by the sample holder is adjusted to the concentric height. During the signal acquisition process, the rotation and tilt functions of the multi-axis sample stage 1 are controlled by the sample stage control module 2 to realize the peak searching process. Finally, for the collected diffraction peak signals, in the calculation module 7, peak shape fitting is performed to obtain an accurate diffraction angle, so as to calculate the stress.

In a preferred embodiment, the approximate orientation of the crystal only needs to be known, and the determination method can be determined by the production, processing method or manufacturing process of the sample, or by electron backscatter diffraction (EBSD).

In a preferred embodiment, the concentric height is the position where the height of the sample observation point does not change during the rotation and tilting process, and is also the position of the center of the rotation of the X-ray generator 4 and the detector in the plane. Changes in the position of the observation point are moved in-plane by the X and Y stages.

In a preferred embodiment, the concentric height adjustment module 3 includes a height detector, and the height measurement method may be an optical low-depth-of-field lens, laser ranging, or laser profile acquisition. The sample stage control module 2 can adjust the height of the sample surface according to the height information collected by the concentric height adjustment module 3, or adjust the height and tilt of a specific point according to the collected contour information.

In a preferred embodiment, the multi-axis sample stage 1 has five or six dimensions, including in-plane movement (X-axis, Y-axis), translation in the height direction (Z-axis), and in-plane rotation (around Z-axis) ) and tilt around the axis (can include around the X-axis and around the Y-axis). The adjustment of the height direction of the sample stage can be divided into Z-axis coarse adjustment and Z-axis fine adjustment. The construction of the multi-dimensional sample stage can be in the form of stacking multiple motion stages, or it can be a combination of an integrated hexapod and necessary expansion stages.

In a preferred embodiment, the computing module 7 communicates with the X-ray generation and acquisition module 5 and the sample stage control module 2 . The calculation module 7 provides the crystal planes that may generate diffraction peaks, the corresponding diffraction angles and the spatial positions of the diffraction peaks. The X-ray generating and collecting module 5 rotates the X-ray generator 4 and the detector around the concentric point to corresponding positions according to the results provided by the calculation module 7 . The sample stage control module 2 rotates and tilts the sample within a set angle range according to the results provided by the calculation module 7 . While rotating and tilting, X-ray diffraction signal acquisition can be performed.

In a preferred embodiment, the detector can be a line detector or an area detector.

In a preferred embodiment, the stress calculation module 7 includes peak shape fitting and peak position calibration, and the calibration method includes using alumina powder, calcium carbonate powder and lithium lanthanum zirconium oxygen powder.

In order to further understand the utility model, in the examples, we fix the single crystal nickel-based alloy sample with <001> orientation on the sample stage with a clamp, and the <001> direction is roughly along the Z direction as shown in the figure, concentric The height adjustment module 3 adjusts the position to be measured to a concentric height position. The crystal plane and the corresponding diffraction angle that can generate diffraction signals in the high-angle range such as (130°-165°) are calculated by the calculation module 7, and the X-ray generation and collection module 5 records the corresponding diffraction angle. During the collection of diffraction peaks, the sample stage control module 2 starts to control the sample stage to rotate around the Z axis, and the detector performs signal collection at the same time. Start swinging (including rotation and tilting directions) within the range of ±10o from this position, and tilt every 0.1 degree. At the same time, data collection is performed. At this time, the tilting is also carried out according to a certain step size (0.1 degree), and each movement is recorded. diffraction signal. According to the recorded data, a two-dimensional diffraction peak distribution cloud map is made, and the residual stress is calculated in the stress calculation module 7 according to the calibration results. After completing the peak finding of the diffraction peak and the calculation of residual stress, the process of peak finding, calibration and calculation of the next diffraction peak is automatically performed. After collecting and calculating no less than 4 diffraction peaks, the stress tensor can also be obtained.

In the preferred embodiment of the stress measurement system, the calculation module 7 includes:

a fitter 8, which fits based on the diffraction peak signal to obtain diffraction angle data,

The stress calculator 9, based on the diffraction angle, calculates the residual strain/force of a certain crystal orientation of the sample,

A stress tensor calculator that calculates the strain/force tensor of a sample based on multiple diffraction peak signals.

In the preferred embodiment of the stress measurement system, the multi-axis sample stage 1 includes a stacking structure of multiple motion stages or an integrated six-degree-of-freedom displacement stage.

In the preferred embodiment of the described stress measurement system, the multi-axis sample stage 1 includes a rotatable clamp for fixing the sample.

In a preferred embodiment of the stress measurement system, the position measurement device includes an optical measurement device, a laser rangefinder and/or a laser profile collector.

In the preferred embodiment of the stress measurement system, the acquisition module 5 includes a line detector or an area detector.

In the preferred embodiment of the stress measurement system, the Z degree of freedom of the multi-axis sample stage 1 translated along the Z axis includes a coarse adjuster with a first adjustment accuracy and a fine adjuster with a second adjustment accuracy.

In a preferred embodiment of the stress measurement system, the stress measurement system further comprises an electron backscatter diffractometer for measuring the crystal orientation of the sample and a standard sample for calibrating the peak positions of the diffraction peaks, the standard sample comprising alumina Powder, calcium carbonate powder and/or lithium lanthanum zirconium oxygen powder.

In the preferred embodiment of the stress measurement system, the sample stage control module 2, the controller 6 and/or the calculation module 7 include a memory for storing data, a digital signal processor, an application-specific integrated circuit for processing the data and drawing. ASIC or Field Programmable Gate Array FPGA, the memory includes one or more of read only memory ROM, random access memory RAM, flash memory or electronically erasable programmable read only memory EEPROM.

In the preferred embodiment of the stress measurement system, the sample stage control module 2, the controller 6 and/or the computing module 7 are wired or wirelessly connected to a mobile terminal, and the mobile terminal includes a computer, a mobile phone, a wristband, a large screen and a cloud. server.

The utility model can realize high-efficiency, rapid, automatic and precise measurement of the residual stress of single crystal and directional crystal by using monochromatic X-rays in a conventional laboratory.

Although the embodiments of the present utility model have been described above in conjunction with the accompanying drawings, the present utility model is not limited to the above-mentioned specific embodiments and application fields, and the above-mentioned specific embodiments are only illustrative and instructive, rather than limiting. sexual. Under the inspiration of this specification and without departing from the scope of protection of the claims of the present invention, those skilled in the art can also make many forms, which all belong to the protection of the present invention.

Claims (10)

1. a single crystal/oriented crystal stress measurement system of monochromatic X-ray, is characterized in that, it comprises, A multi-axis stage, the upper surface of which supports a single crystal/oriented crystal sample, the multi-axis stage includes X degrees of freedom translated along the X axis, Y degrees of freedom translated along the Y axis, and Z degrees of freedom translated along the Z axis , rotational degrees of freedom for rotation around the Z axis, and tilt degrees of freedom for tilting around the X and/or Y axes, A concentric height adjustment module configured to adjust the sample surface to a concentric height position, the concentric height adjustment module includes a position measurer that collects the position of the sample surface, and the concentric height adjustment module adjusts the sample surface to be concentric based on the sample surface position The high position, the concentric high position is the position where the height of the multi-axis sample stage does not change during the rotation and tilting process and is the center position of the X-ray generator and the detector rotating in the plane, An X-ray generator that generates monochromatic X-rays to irradiate the sample, the X-ray generator performs a circular motion along a circle with the concentric high position as the center of rotation, an acquisition module, which receives the diffraction signal from the sample, the acquisition module performs a circular motion along a circle with the concentric height position as the center of the circle to collect the diffraction peak signal, a controller, which is electrically connected to the X-ray generator and the acquisition module, A calculation module, configured to generate stress data based on the diffraction peak signal, is electrically connected to the acquisition module. 2. The stress measurement system of claim 1, wherein the stress measurement system further comprises a sample stage control module electrically connecting the multi-axis sample stage, a concentric height adjustment module and a controller, the concentric height adjustment module based on the sample The surface position sends instructions to the stage control module, the stage control module, controller and/or computing module including memory for storing data and digital signal processor, application specific integrated circuit ASIC or field for processing data and mapping Programmable gate array FPGA. 3. The stress measurement system according to claim 1, wherein the calculation module comprises a fitter based on the diffraction peak signal fitting to obtain diffraction angle data, a strain/force for calculating residual strain/force of the sample based on the diffraction angle Calculator, a strain/force tensor calculator that calculates the sample stress tensor based on multiple diffraction peak signals. 4. The stress measurement system of claim 1 , wherein the multi-axis sample stage includes a micro-adjustable sample position clamp for holding the sample. 5. The stress measurement system of claim 1, wherein the position measurer comprises an optical measurer, a laser rangefinder, and/or a laser profiler. 6. The stress measurement system of claim 1, wherein the acquisition module comprises a line detector or an area detector. 7 . The stress measurement system according to claim 1 , wherein the Z degree of freedom of the translation of the multi-axis sample stage along the Z axis includes a coarse adjuster of the first adjustment accuracy and a fine adjuster of the second adjustment accuracy. 8 . 8. The stress measurement system according to claim 1, wherein the stress measurement system further comprises an electron backscatter diffractometer for measuring the crystal orientation of the sample and a standard sample for calibrating the peak positions of the diffraction peaks, the standard sample Including alumina powder, calcium carbonate powder and/or lithium lanthanum zirconium oxygen powder. 9 . The stress measurement system of claim 1 , wherein the multi-axis sample stage comprises a stacking structure of a plurality of motion stages or an integrated six-degree-of-freedom stage. 10 . 10. The stress measurement system according to claim 1, wherein the controller and/or the computing module are wired or wirelessly connected to a mobile terminal, and the mobile terminal includes a computer, a mobile phone, a wristband, and a cloud server.

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