DE102017114472A1 - Polishing agent, flexible sheet with a polishing agent and process for its preparation - Google Patents

Abstract

The present invention relates to a polishing agent which is suitable for use in a dried state applied to a flexible sheet, a provided with the polishing agent sheet and a manufacturing method for such a sheet with the polishing agent. The corresponding product is suitable for the individual preparation of different materials by surface polishing. These include precious or non-precious metals, glasses, acrylics, plastics, decorative stones, etc. The polishing agent has a base substance with polychloroprene in an organic solvent or a solvent mixture, the u.a. Wax and abrasive, preferably based on nanoparticles, may be mixed. This polishing agent is applied to a sheet and dried.

Description

The present invention relates to a polishing agent which is suitable for use in a dried state applied to a flexible sheet, a provided with the polishing agent sheet and a method for producing such a sheet with the polishing agent.

The corresponding product is suitable for the individual preparation of different materials by surface polishing. These include precious or non-precious metals, glasses, acrylics, plastics, decorative stones, etc.

The process of polishing causes a surface smoothing with a certain degree of gloss due to various mechanisms: On the one hand roughness peaks of the surface structure are leveled. On the other hand - depending on the type of polish - a certain material removal and finally a filling of depressions.

In conventional polishing, the removal and smoothing of the surface is done with fine polishing agents such as polishing red cake, polishing slate, whiting, tin ash or cerium oxide, which are usually bound in a wet paste or liquid, usually in an acidic environment. The agents are applied in a sheet (polish backing), such as a cloth, felt, rubber, pitch or leather disk for rotating processes or a cloth for vibrating, bonded or superficial.

However, conventional polishing agents have the disadvantage that sensitive and thin surfaces (for example, plastic coatings) may possibly be easily inadvertently removed too much. Further, the wet polishing formulations used in the prior art, along with the polishing abrasion, cause significant staining of the polishing environment and the polishing apparatus.

Further, prior art polishing processes require the addition of additives such as waxes, the application of abrasive pastes, or the addition of solvents (such as water) to individually adjust the polishing properties and polish moisture content during the polishing process, which adds to the polishing effort. Moist polishing surfaces are only limitedly storable due to the evaporation or must be kept under exclusion of air.

The present invention has for its object to provide a polishing agent and a sheet with such a polishing agent, which allow a very good polishing result with little effort and with low material removal and low pollution.

The solution of the above object is achieved by means of a polishing agent with the features of claim 1, by means of a sheet with such a polishing agent having the features of claim 8, and by means of a manufacturing method for such a sheet with the method steps of claim. 9

Advantageous embodiments of the invention are described in the dependent claims.

1. a) 5% bis 40% Polychloropren, und
2. b) 5% bis 70% eines organischen Lösungsmittels oder eines Gemisches aus mehreren organischen Lösungsmitten.

According to the invention, a polishing agent suitable for application in a dried state to a flexible sheet comprises a mixture of at least one base substrate and a grinding additive, the base substrate having at least the following components:

1. a) 5% to 40% polychloroprene, and
2. b) 5% to 70% of an organic solvent or a mixture of several organic solvents.

In addition, the abrasive additive comprises at least one abrasive or more abrasives.

• c) 0% bis 30% eines Wachses oder eines Gemisches mehrerer Wachse,
• d) 0% bis 50% Raffinat (Rohölprodukt),
• e) 0% bis 50% Essigsäure,
• f) 0% bis 10% Zinkoxid,
• g) 0% bis 10% Magnesiumoxid, und/oder
• h) 0% bis 30% Phenolharz,

Optionally, the following ingredients can be added to the base substrate:

• c) 0% to 30% of a wax or a mixture of several waxes,
• d) 0% to 50% raffinate (crude oil product),
• e) 0% to 50% acetic acid,
• f) 0% to 10% zinc oxide,
• g) 0% to 10% magnesium oxide, and / or
• h) 0% to 30% phenolic resin,

Here, the percentages refer to the weight percent in the wet formulation of the base substrate, and the sum of all components of the base substrate is 100% or less. The missing 100 weight percent residue can be replenished with a solvent or optionally other components (e.g., fillers).

The specific recipe is adapted to the respective polishing task.

"Raffinate" should be a crude oil product known under CAS No. 8006-61-9. Synonyms for this are naphtha, light naphtha, solution degreaser, "Cut C6 C8", or "solvent no. 1".

By the base substrate, which contains as an essential ingredient polychloroprene, which is held in the wet formulation by organic solvents in a consistency that allows uniform application to a sheet, together with the provided (also in conventional polishing) abrasives, preferably a very have fine grain up to the nanoparticle area, after application of the polishing agent to a sheet and after drying excellent polishing effect can be achieved because the polychloroprene keeps the abrasive in a flexible matrix and allows optimal contact with the surfaces to be polished.

By incorporating the abrasives, the polishing process can be controlled very accurately and the risk of excessive surface erosion is reduced. Furthermore, much less dirt is formed in the dry formulation, so that expensive cleaning work can be omitted after the polishing process.

• b1) Cyclohexan,
• b2) Ethylacetat,
• b3) Aceton und/oder
• b4) Essigsäure-n-Butylester.

sein. Diese Lösungsmittel erlauben es, das Polychloropren in der feuchten Phase verarbeitungsfähig zu halten und sollten vorzugsweise so gewählt werden, dass die zu polierenden Oberflächen durch nach der Trocknung evtl. noch vorhandene Lösungsmittelreste nicht angegriffen werden.In a preferred embodiment, the organic solvent (b) may be an organic solvent or a mixture of a plurality of organic solvents from the following group

• b1) cyclohexane,
• b2) ethyl acetate,
• b3) acetone and / or
• b4) acetic acid n-butyl ester.

be. These solvents make it possible to keep the polychloroprene workable in the wet phase and should preferably be chosen so that the surfaces to be polished are not attacked by solvent residues that may still be present after drying.

Water is not a preferred solvent for the invention, but may also be present in certain amounts depending on the technical conditions (hygroscopic tendencies of certain solvents).

• e1) Carnaubawachs und/oder
• e2) Candelillawachs.

Particularly preferably, the base substrate contains a wax or a mixture of waxes from the following group:

• e1) carnauba wax and / or
• e2) candelilla wax.

By adding wax, fine depressions are closed during polishing and a desired degree of gloss of the surface to be polished is produced. In addition to the explicitly mentioned vegetable waxes, other waxes of animal or synthetic origin can be used.

As a definition for a wax which can be used in the context of the invention, the definition of the German Society for Fat Science should be used in this context: A substance is referred to as wax if it is kneadable at 20 ° C., solid to brittle-hard, a coarse bis has finely crystalline structure, color is translucent to opaque, but not glassy, melts over 40 ° C without decomposition, slightly above the melting point slightly liquid (less viscous), has a strong temperature-dependent consistency and solubility and is polishable under light pressure.

The wax should preferably be present at a weight fraction of at least 0.5%.

It is preferred that the wax is incorporated directly into the matrix. However, it can not initially be included and only be added during the polishing process, which of course increases the cost of the polishing process on the other hand.

• i1) Aluminiumoxid,
• i2) Siliciumcarbid,
• i3) Siliciumdioxid,
• i4) Zirkonoxid,
• i5) Ceriumoxid und/oder
• i6) Diamantpulver.

The abrasive additive preferably constitutes an abrasive or a mixture of abrasives of the following group:

• i1) alumina,
• i2) silicon carbide,
• i3) silica,
• i4) zirconium oxide,
• i5) cerium oxide and / or
• i6) diamond powder.

Preferably, each abrasive contained in the abrasive additive has a (mean) particle size between 30 nm and 400 μm, preferably between 30 nm and 900 nm. In the latter case, the particle size is in the nanoparticle range or slightly above. This particle size range is particularly preferred since, together with the polychloroprene, it enables a particularly good polishing result with low surface removal.

If cerium oxide is provided as a grinding additive, the polishing agent is particularly suitable for polishing glass or stones or for so-called lapidation. In this case, the polishing agent represents an alternative to the "jeweler's rouge", also known as "optical rouge" dar.

• j1) Now Woven,
• j2) Mikrofaser,
• j3) Viskose-Textilstoff,
• j4) Baumwollgewebe,
• j5) Synthetikstoff,
• j6) Polyurethanschaum,
• j7) Zellschaum,
• j8) Polyester-Schaumstoff,
• j9) Polyätherschaum,
• j10) Spunlace-Vlies,
• j11) Ethylen-Vinylacetat und/oder
• j12) Nylon-Scheuerpads.

The polishing agent described above is preferably applied to a flexible sheet and is then ready for use after drying for the polishing task, at the same time very good shelf life even without air. In which It can be a sheet of the following group, of course - as far as technically possible - mixed fabric or mixed nonwovens are possible:

• j1) Now Woven,
• j2) microfiber,
• j3) viscose fabric,
• j4) cotton fabric,
• j5) synthetic material,
• j6) polyurethane foam,
• j7) cell foam,
• j8) polyester foam,
• j9) polyether foam,
• j10) spunlace fleece,
• j11) ethylene-vinyl acetate and / or
• j12) Nylon scouring pads.

1. i) Mischen der Komponenten des Grundsubstrats,
2. ii) Hinzufügen des Schleifzusatzes und Mischen,
3. iii) Auftragen der gemischten Substanz via Injektionsverfahren oder Walze auf dem flexiblen Flächengebilde, und
4. iv) Trocknen.

In a method for producing a flexible sheet with a polishing agent as described above, the method has at least the following steps:

1. i) mixing the components of the base substrate,
2. ii) adding the abrasive additive and mixing,
3. iii) applying the mixed substance via injection process or roll on the flexible sheet, and
4. iv) drying.

The application is carried out, of course, on the side of the fabric, with which the polishing process is to take place later. If a two-sided usability should be desired, so the order may also be done (then preferably in two steps) on both sides.

The layer thickness to be applied is preferably 0.1 to 5 mm.

The drying is preferably carried out under moderate hot air and under suction and treatment of the resulting solvent vapors until the final product has reached a steady state degree of drying, i. is almost 100% dry. I

The sheet thus obtained is very storable in this state and can then be used in a variety of ways by known tools (e.g., rotary polishing pad polishing machines) or by hand.

In this case, no additives such as waxes, abrasive pastes, solvents od. Like. Needed and the polishing process is accelerated.

Thus, the invention comprises a formulation of a base substrate (phase A), introduction of a product-dependent abrasive additive (phase B) (depending on the polishing piece metal, plastic, glass, etc.), preferably down to the nanoscale, and application on a flexible base material.

The invention is explained in more detail below with reference to an example, which is not to be construed restrictively.

Construction of basic substrate / grinding additive / flexible base material:

Base substrate (phase A) consisting of:

• Polychloroprene 5-40% (CAS 9010-98-4)
• Cyclohexane 30.5% (CAS 110-82-7)
• Ethyl acetate 10% to 30% (CAS 141-78-6)
• Acetone 10% to 30% (CAS 67-64-1)
• Raffinate (crude oil product) 30.5% (CAS 8006-61-9)
• Acetic acid n-butyl ester 30.5% (CAS 105-46-4)
• Carnauba wax 1.5% to 15% (CAS 801-586-9)
• Candelilla Wax 1.5% to 15% (CAS 8006-44-8)
• Zinc oxide from 0.1 to 3.0% (CAS 1314-13-2)
• Magnesium Oxide 0.1 to 3.0% (CAS 1309-48-4)
• Phenolic resin 3 to 15% (CAS 9003-35-4)

Grinding additive (phase B) consisting of:

• Aluminum oxide 5% -50% (CAS 1344-28-1) Grain size (30 nm - 400 μm)
• Silicon carbide 5% -50% (CAS 409-21-2) Grain size (30 nm - 400 μm)
• Silica 5% -50% (CAS 14808-60-7) Grain size (30 nm - 400 μm)
• Zirconia 5% -50% (CAS 1314-23-4) Grain size (30 nm - 400 μm)
• Cerium oxide 5% -50% (CAS 1306-38-3) Grain size (30 nm - 400 μm)
• Diamond powder 5% -50% (CAS 7782-40-3) Grain size (30 nm - 400 μm)

Flexible base material consisting of:

Now Woven, Microfiber, Viscose Fabric, Cotton Fabric, Synthetic, PU Foam, Cell Foam, Polyester Foam, Polyether Foam, Spunlace Nonwoven, Ethyl Vinyl Acetate, Nylon Scouring Pads (Mantas Acrylics) and / or other materials or synthetic fabrics.

• Polychloropren 7,5% (CAS 9010-98-4)
• Cyclohexane 23% (CAS 110-82-7)
• Ethylacetat 5,6% (CAS 141-78-6)
• Aceton 5,6% (CAS 67-64-1)
• Raffinat (Rohölprodukt) 2,8% (CAS 8006-61-9)
• Essigsäure-n-Butylester 2,8% (CAS 105-46-4)
• Carnaubawachs 1,25% (CAS 801-586-9)
• Candelillawachs 1,25% (CAS 8006-44-8)
• Zinkoxid 0,1% (CAS 1314-13-2)
• Magnesiumoxid 0,1% (CAS 1309-48-4)
• Phenolharz 5% (CAS 9003-35-4)

A refined composition of Phase A could be:

• Polychloroprene 7.5% (CAS 9010-98-4)
• Cyclohexane 23% (CAS 110-82-7)
• Ethyl acetate 5.6% (CAS 141-78-6)
• Acetone 5.6% (CAS 67-64-1)
• Raffinate (crude oil product) 2.8% (CAS 8006-61-9)
• Acetic acid n-butyl ester 2.8% (CAS 105-46-4)
• Carnauba wax 1.25% (CAS 801-586-9)
• Candelilla wax 1.25% (CAS 8006-44-8)
• Zinc oxide 0.1% (CAS 1314-13-2)
• Magnesium oxide 0.1% (CAS 1309-48-4)
• Phenolic resin 5% (CAS 9003-35-4)

Claims (9)

Polishing agent suitable for use in a dried state applied to a flexible sheet material, characterized in that the polishing agent comprises a mixture of at least one base substrate and a grinding additive, wherein the base substrate has at least the ingredients listed below, wherein the percentages are by weight in the wet formulation of the base substrate, and the sum of all components of the base substrate is 100% or less, the remainder being filled with a solvent: a) 5% to 40% polychloroprene, b) 5% to 70% of an organic solvent or a mixture of several organic solvents, and optionally c) 0 to 30% of a wax or a mixture of several waxes, d) 0% to 50% raffinate (crude oil product), e) 0% to 50% acetic acid, f) 0% to 10 % Zinc oxide, g) 0% to 10% magnesium oxide, h) 0% to 30% phenolic resin, and wherein (i) the abrasive additive has at least one abrasive mixture or more abrasives. Polish after Claim 1 , characterized in that the organic solvent (b) is an organic solvent or a mixture of several organic solvents from the following group: b1) cyclohexane, b2) ethyl acetate, b3) acetone and / or b4) n-butyl acetate. Polish after Claim 1 or 2 , characterized in that the wax (e) is a wax or a mixture of waxes from the following group: e1) carnauba wax and / or e2) candelilla wax. Polish after one of Claims 1 to 3 , characterized in that the wax is present in the base substrate with a weight fraction of at least 0.5%. Polish after one of Claims 1 to 4 , characterized in that the abrasive additive (i) is an abrasive or a mixture of abrasives of the following group: i1) alumina, i2) silicon carbide, i3) silica, i4) zirconia, i5) cerium oxide and / or i6) diamond powder. Polish after one of Claims 1 to 5 characterized in that each abrasive contained in the abrasive additive has a mean grain size between 30 nm and 400 μm, preferably between 30 nm and 900 nm, Polish after one of Claims 1 to 6 , characterized in that the abrasive additive contains cerium oxide, if the polishing agent is to be particularly suitable for polishing glass or stones or for lapidation. Flexible sheet with a polishing agent according to one of Claims 1 to 7 characterized in that the polishing agent is applied to a sheet of the following group: j1) Now Woven, j2) Microfiber, j3) Viscose fabric, j4) Cotton fabric, j5) Synthetic fabric, j6) Polyurethane foam, j7) Cell foam, j8) Polyester foam, j9) polyether foam, j10) spunlace nonwoven, j11) ethylene vinyl acetate and / or j12) nylon scrub pads. A method for producing a flexible sheet with a polishing agent according to one of Claims 1 to 7 , in particular for the production of a fabric according to Claim 8 characterized in that the method comprises at least the following steps: i) mixing the components of the base substrate, ii) adding the abrasive additive and mixing, iii) applying the mixed substance via injection process or roll on the flexible sheet, and iv) drying.