DE102024201528A1 - Method for operating an electromagnetic actuator, device for adjusting a spatial position and/or deformation of an element, computer program product, mechanical system and lithography system - Google Patents

Abstract

The invention relates to a method for operating an electromagnetic actuator (3), wherein the actuator (3) is supplied with both a control signal (5) for exerting a force and/or for achieving a deflection, and with a tempering signal (6) decoupled from the control signal (5) for targeted heat generation.

Description

The invention relates to a method for operating an electromagnetic actuator.

The invention further relates to a device for adjusting a spatial position and/or deformation of an element.

The invention also relates to a computer program product with program code means.

The invention further relates to a lithography system, in particular a projection exposure system for microlithography, comprising at least one optical element.

The use of Lorentz motors or Lorentz actuators in electromechanical components of EUV lithography systems is known from the state of the art.

According to the state of the art, Lorentz actuators are used to generate forces that are required for the positioning of optical elements.

Due to the physical principles underlying the generation of force in Lorentz actuators, an electric current is required.

The electric current flows through electrical conductors, which in turn have an electrical resistance.

This results in power dissipation at the Lorentz actuators in the electromechanical devices known from the state of the art in EUV lithography systems.

The heat dissipated by the power dissipation is a parasitic effect, which can lead to temperature-related, undesirable deformations of optical elements in spatial proximity to the Lorentz actuators.

The DE 10 2015 211 474 A1 discloses an actuator device for an optical element for a lithography system, which has a Lorentz actuator for providing a dynamic force and a reluctance actuator for providing a quasi-static force. The disclosed hybrid actuator has low power consumption and a fast response time.

From the DE 10 2015 217 119 A1 An electromagnetic drive with a stator, a stator holder and an actuating element that is movable by electromagnetic interaction with the stator is known.

From the DE 10 2020 212 742 A1 An adaptive optical element for microlithography with at least one manipulator for changing the shape of optical surfaces of the optical element is disclosed.

A disadvantage of the electromechanical devices known from the prior art in EUV lithography systems is that deformations of elements of lithography systems, in particular optical elements, can occur, which are caused by power from actuators dissipated as heat and which are difficult to correct.

The present invention is based on the object of creating a method for operating an electromagnetic actuator which avoids the disadvantages of the prior art, in particular enables a precise adjustment of a spatial position and/or a deformation of an element.

According to the invention, this object is achieved by a method having the features mentioned in claim 1.

The present invention is further based on the object of creating a device which avoids the disadvantages of the prior art, in particular enables a precise adjustment of a spatial position and/or a deformation of an element.

According to the invention, this object is achieved by a device having the features mentioned in claim 10.

The present invention is also based on the object of creating a computer program product which avoids the disadvantages of the prior art, in particular enables a precise adjustment of a spatial position and/or a deformation of an element.

According to the invention, this object is achieved by a computer program product having the features mentioned in claim 20.

The present invention is also based on the object of creating a mechanical system which avoids the disadvantages of the prior art, in particular enables a precise adjustment of a spatial position and/or a deformation of an element.

According to the invention, this object is achieved by a mechanical system having the features mentioned in claim 21.

The present invention is also based on the object of creating a lithography system which avoids the disadvantages of the prior art, in particular enables precise images.

According to the invention, this object is achieved by a lithography system having the features mentioned in claim 22.

In the method according to the invention for operating an electromagnetic actuator, the actuator is subjected to both a control signal for exerting a force and/or for achieving a deflection, and a tempering signal decoupled from the control signal for targeted heat generation.

It can be provided that the control signal and the temperature control signal are decoupled in such a way that the application of a force and/or the achievement of a deflection can take place independently of the targeted heat generation and/or vice versa.

It can also be provided that the control signal and the tempering signal are selected such that the application of a force and/or the achievement of a deflection takes place in a certain ratio to the targeted heat generation or vice versa.

Furthermore, in the method according to the invention, the ratio can be freely predetermined and/or varied, whereby the exertion of a force and/or the achievement of a deflection can be achieved independently of the targeted heat generation and/or vice versa. In this case, the total heat generation and the force effect are only connected to one another in that the total heat generation can only ever be set to be equal to or greater than the heat generation that is caused by the force effect.

It can be provided that a spatial position and/or a deformation of an element, in particular an optical element of a lithography system, is adjusted by means of the method according to the invention.

The method according to the invention can be designed in such a way that a deformation of the element is not avoided, but is made deterministic and/or constant. This makes it possible to make the deformation correctable and/or usable.

By means of the method according to the invention, deformations of optical elements which change over time and which can occur when using electromechanical devices known from the prior art can be avoided.

When operating an actuator, different levels of force generation are usually requested or called up over a period of time. A required temporal force profile is therefore not constant.

Because the power dissipated by the actuator as heat is directly proportional to the force generated by the actuator, the dissipated power is not constant during operation of the actuator. Rather, the heat dissipation varies over time with the force generation.

By means of the method according to the invention, different deformations which depend on a position of an element, in particular an optical element, which in particular has a rigid body, can be avoided and/or achieved in a targeted manner.

Due to mechanical stiffness, the position of the rigid body element, in particular an optical element, is proportional to the force generated or applied.

Preferably, the above-described variability of the deformation can be avoided by the method according to the invention. The above-described variability of the deformation can lead to optical effects which cannot be corrected in advance using the methods known from the prior art, e.g. by appropriate pre-forming of the surface or by independent component analysis.

In the method according to the invention, the power dissipation within the actuator is decoupled from the force generation.

In the context of the invention, an actuator can also be understood as an actuator unit which comprises several individual actuators which work together in a coordinated manner.

Furthermore, it can also be provided that the electromagnetic actuator has one, two or more conductor coils through which current flows.

In the context of the invention, the spatial position is to be understood as a center of gravity position and an orientation of the element in space.

A change in the position of the element, especially the optical element, can also influence its deformation and vice versa. This is especially true if the element is clamped on one side and is deflected by the actuator on a non-clamped side. In this case, the deformation is also accompanied by a change in the spatial position.

It can be provided that a low heat output of the actuator, which occurs, for example, when a low force is generated, is compensated by an increased heat output, which is achieved by means of the tempering signal.

In an advantageous development of the method according to the invention, it can be provided that a total heat output of the actuator is kept constant.

Because both the power dissipation and the power generation are decoupled in the method according to the invention and can be adjusted independently for each electromagnetic actuator, in particular each coil of an electromagnetic actuator, it is possible to keep a thermal output of the actuator constant.

By keeping the total thermal output of the actuator constant for all possible positions or forces, in particular of elements and mirrors, as well as for all types of use, the effect on optical properties of optical elements can also be kept constant.

This makes it possible to correct the influence or impairment of the optical properties known from the process by predicting them.

This in turn can be used to minimize optical errors, especially in an optical element, preferably a mirror.

Alternatively or additionally, a larger total thermal output of the actuator can be achieved.

In an advantageous development of the method according to the invention, it can be provided that an optical surface of an element, preferably mechanically coupled to the actuator, is specifically heated by means of the tempering signal.

If the total heat output of the actuator is varied within the process, i.e. not kept constant but specifically adjusted, the optical surface of an optical element can be heated in a targeted manner.

Targeted heating can cause a targeted deformation of the optical surface.

The targeted deformation caused in this way can correct errors in the optical surface.

In an advantageous development of the method according to the invention, it can be provided that a Lorentz force and/or a reluctance force is used by the actuator to exert the force and/or to achieve the deflection.

In the state of the art, electromagnetic actuators in the broader sense are referred to as electro-magneto-mechanical energy converters that use electromagnetic field effects to generate force.

• Zum Ersten werden elektrodynamische Kräfte in elektromagnetischen Aktuatoren verwendet. Hierbei werden Kräfte auf bewegte Ladungen bzw. stromführende Leiter in einem Magnetfeld genutzt. Lorentz-Aktuatoren verwenden im Wesentlichen die vorbeschriebenen elektrodynamischen Kräfte.

Two types of electromagnetic forces are particularly important here:

• Firstly, electrodynamic forces are used in electromagnetic actuators. Here, forces are used on moving charges or current-carrying conductors in a magnetic field. Lorentz actuators essentially use the electrodynamic forces described above.

Secondly, magnetic reluctance forces can be used. These forces occur at interfaces of different magnetic permeabilities in a magnetic field, for example at an iron-air boundary. Reluctance actuators essentially use the magnetic reluctance forces described above.

In an advantageous development of the method according to the invention, it can be provided that the tempering signal is formed as a modulation of the control signal.

It is advantageous if currents, preferably sinusoidal, are modulated onto the control signal used for positioning. If the modulations, preferably sinusoidal, flow through the coil, the desired total heat output can be achieved.

It can be provided that the desired total heat output is adjusted by changing the amplitude of the temperature control signal.

In an advantageous development of the method according to the invention, it can be provided that the tempering signal is generated with such a frequency that an element mechanically coupled to the actuator cannot follow the tempering signal.

It is advantageous if a heat output is generated by means of the tempering signal, whereby the coil currents in the actuator based on the tempering signal lie in a dynamically insensitive frequency range.

For this purpose, it is advantageous if a frequency range is defined in which the forces of the actuator or actuator unit do not influence the positioning of an element coupled to the actuator.

In an advantageous development of the method according to the invention, it can be provided that an eddy current is generated in an at least partially electrically conductive housing of the actuator by means of the tempering signal.

It is advantageous if the housing of the actuator, in particular a housing of a coil of the actuator, has electrical conductivity.

It is also advantageous if currents are conducted in the actuator, in particular in a coil or conductor coil of the actuator, such that eddy currents are formed in the housing. As a result, heat is formed in the housing and the housing serves as an inductive heating element.

It can be provided that the tempering signal used for the induction of the eddy currents has a frequency which an element mechanically coupled to the actuator or a body mechanically coupled to the actuator cannot follow.

It is advantageous if the thermal output of the housing is controlled in such a way that a constant total power dissipation or a total heat transfer results as the sum of the thermal outputs of the housing and the coil.

In an advantageous development of the method according to the invention, it can be provided that the tempering signal is formed with a frequency of 1 kHz to 100 kHz, preferably 5 kHz to 20 kHz and/or from 10 kHz to 300 kHz, preferably 25 kHz to 100 kHz.

The above-described embodiments of the method according to the invention can be carried out particularly advantageously if the frequency of the tempering signal is selected such that an element mechanically coupled to the actuator cannot follow the tempering signal.

For this purpose, it is advantageous if a transfer function between force and position for the element or body mechanically coupled to the actuator, in particular an element of an EUV lithography system, has a high suppression for high frequencies.

For the embodiment of the method described above, in which the tempering signal is designed as a modulation of the control signal, a frequency range from 5 kHz up to 20 kHz is advantageous.

However, the upper limit may depend on the availability of power electronics.

For the embodiment of the method described above, which is based on the induction of eddy currents, it is advantageous if the currents used have frequencies of 25 kHz to 100 kHz.

Such frequencies enable typical elements of EUV lithography systems, in conjunction with a filter behavior of an optical system of the EUV lithography system, to generate heat without impairing the working quality of the EUV lithography system, since high-frequency forces do not lead to relevant mirror movements.

In an advantageous development of the method according to the invention, it can be provided that at least two interacting coils of the actuator are each supplied with such a current intensity by the tempering signal and the control signal that a predeterminable total force of the actuator results.

For this purpose, a main coil of the actuator can have two coils which are arranged one behind the other, next to each other and/or interwoven with each other.

It is advantageous if both coils are individually supplied with current so that when both coils are used they are controlled separately, whereby the force effects overlap.

It can be provided that the individual currents have a different direction on and/or lead to oppositely directed forces.

In particular, it can be provided that by applying the respective individual currents to the coils, a vanishing net force or resulting force of the actuator results.

In the above-described embodiment of the method according to the invention, one can also speak of a double coil design of the actuator.

In order to change the magnitude of the force, it can be provided that the currents supplied to the respective coils lead to a constant heat output, but with the respective desired and required net forces.

In the previously described embodiment of the method according to the invention, the control signal is given by the respective current strengths in the coils leading to the desired net force or resulting force. The tempering signal, on the other hand, is given by the currents in the two coils leading to the desired total heat output. Thus, both the control signal and the tempering signal are reflected in part in the respective currents flowing in the coils. However, before conversion into the currents flowing in the coils, the control signal and the tempering signal can be selected independently of one another. The respective desired strength of the currents flowing in the coils is then obtained, for example, by a mathematical calculation based on the control signal and the tempering signal, which are or were preselected independently of one another.

The invention further relates to a device for adjusting a spatial position and/or deformation of an element with the features mentioned in claim 10.

The device according to the invention serves to adjust a spatial position and/or deformation of an element, in particular an optical element of a lithography system. The device according to the invention comprises at least one electromagnetic actuator and a control device for controlling the actuator. According to the invention, the control device is designed to apply an electrical control signal and an electrical tempering signal decoupled from the control signal to the actuator.

The device according to the invention makes it possible to avoid the problem of uneven heat input into an element, in particular into an EUV mirror, by an actuator used to position the mirror.

By means of the device according to the invention, the total heat input by the actuator can be made predictable and constant by means of a variable additional heat input.

The element can be - apart from an optical element - any element of the lithography system whose deformation is to be avoided, for example a measurement reference.

In an advantageous development of the device according to the invention, it can be provided that the actuator can be controlled by the control device in such a way that the actuator has a constant total heat output.

Constant heat output causes constant deformations, which can be corrected in advance.

In an advantageous development of the device according to the invention, it can be provided that the actuator can be controlled by the control device in such a way that an optical surface of the element, which is preferably mechanically coupled to the actuator, can be specifically heated by means of the temperature control signal.

A variation of the power dissipation or the total heat output is advantageous in order to induce targeted deformations of an optical surface of the element. These deformations can be used to correct certain errors of the optical surface.

It can be provided that the device has two, three or more actuators.

In the case of three actuators present, the device according to the invention results in a heating element with three degrees of freedom.

This three-degree-of-freedom heater can be used to correct errors or alignment in certain mirrors of the EUV lithography system.

This allows a thermal actuator to be implemented in a simple manner, advantageously without requiring additional volume or additional installation space.

It can be provided that the device is set up for operation in an open control chain or for open-loop operation.

The total physical power of the actuator during operation is made up of mechanical power and thermal power. If a force is generated and maintained without a path being covered, for example by a plunger of the actuator, the power used to generate the force is also dissipated as thermal power.

In a static situation, the total power of the actuator is therefore dissipated as heat output. The total power of the electromagnetic actuator is the product of the voltage applied to the actuator and the current supplied to the actuator. The device can therefore be operated in an advantageously simple open control chain, since the total power can be measured and/or controlled at any time via the applied voltage or the current supplied.

The total power of the electromechanical actuator is typically proportional to the square of the coil current, while the force is only proportional to the coil current.

It can be provided that the device is designed to operate in a closed control chain.

Especially in the case of varying target temperatures in the element, a closed-loop control is advantageous.

At least one temperature sensor may be provided as part of the device.

In particular, the at least one temperature sensor can be configured to transmit information to the control device about a temperature prevailing at the element and/or certain regions of the element.

This allows the overall heat output to be influenced in such a way that the desired temperature can be set or maintained in relevant areas of the element.

In an advantageous development of the device according to the invention, it can be provided that the actuator is a Lorentz actuator and/or a reluctance actuator.

It can be provided that the actuator is designed to exert a maximum force of at least 1 N to 100 N, preferably at least 10 N to 15 N.

It can be provided that the desired total heat output is greater than a maximum heat dissipation which occurs when the actuator generates force.

For a given actuator design or a given actuator type, power dissipation caused by the desired force generation cannot be further minimized. It is therefore advantageous if the total heat output, which should be independent of the force generation, has values that are greater than those that are inevitably to be expected for the desired force generation.

In case of a desired constant total heat output, it is advantageous if the total heat output is set to the expected maximum of the unavoidable or parasitic heat output of the actuator.

In this case, instead of the maximum parasitic heat output expected for the actuator, the additional heat output can be reduced to zero by the tempering signal.

In the event that the device is used as a thermal actuator, preferably to adjust deformation profiles on the element, it is advantageous if the total heat output is set higher than the expected maximum parasitic heat output of the at least one actuator or the plurality of actuators.

In an advantageous development of the device according to the invention, it can be provided that an at least partially electrically conductive housing is provided for the actuator and/or an eddy current can be formed in the housing by the control device.

By providing an at least partially electrically conductive housing, thermal effects can also be achieved on a housing of the actuator, in particular through the temperature control signal.

If eddy currents are additionally generated in the housing, the housing serves as an inductive heating element.

It can be provided that the device is designed for inductive heating using eddy currents and/or remagnetization losses.

In particular, it can be provided that the device, preferably the housing, comprises ferromagnetic materials. By means of a housing made of ferromagnetic materials, the remagnetization losses can be used particularly advantageously as a share of the heat development for inductive heating.

In particular, it can be provided that the housing is designed to generate suitable eddy currents and a suitable heating output. It can be provided that the housing is made entirely or partially from iron and/or nickel and/or copper and/or brass and/or stainless steel.

It can be provided that the housing has a shape which is particularly advantageous for the formation of eddy currents.

It can be provided that the housing is electrically conductive only in partial areas.

In particular, it can be provided that the housing is cylindrical, while only a region of the cylinder surface is electrically conductive, in particular completely or partially made of the aforementioned materials.

Alternatively, the entire housing may be electrically conductive.

In an advantageous development of the device according to the invention, it can be provided that the tempering signal is a modulation of the control signal.

By designing the tempering signal as a modulation of the control signal, the actuator can be supplied with the tempering signal in a simple manner and without the need for further changes to the respective actuator, in particular without the attachment of further electrical conductors.

It can be provided that the tempering signal is a harmonic of the control signal.

In an advantageous development of the device according to the invention, it can be provided that the tempering signal has a frequency by which the element cannot be mechanically excited.

It is advantageous if, for both of the above-described embodiments of the device, namely the case of a conductive housing and the case of a modulated temperature control signal, the frequency is designed or selected as a function of a real dynamic behavior of the element consisting of the actuator and the element mechanically coupled to the actuator, in particular an optical element.

The above-described embodiments of the device therefore depend on a transfer function between force and position of the element coupled to the actuator, in particular the optical element.

In an advantageous development of the device according to the invention, it can be provided that the actuator has at least two interacting coils.

It is advantageous if two, three or more interacting coils are provided for the actuator.

This increases the flexibility of the actuator’s usability.

It can be provided that one, several or all conductor tracks of at least one coil are arranged such that the coil does not generate any force in a magnetic field of the coil.

In particular, it can be provided that a current direction is aligned parallel to a field direction of the magnetic field. Alternatively or additionally, it can be provided that the force of the coil in question is aligned in a direction that is irrelevant for the force effect to be achieved.

This allows the coil to be used as a simple “heating spindle” without effective force development. This means that there is no need to adjust the control signal.

In an advantageous development of the device according to the invention, it can be provided that the coils can each be supplied with a current intensity such that a predeterminable total force of the actuator results by means of the control device through the tempering signal and the control signal.

It can be provided that at least one calibration curve and/or at least one characteristic curve for the heat output and/or the force generation of the actuator formed from the at least two interacting coils is recorded.

Based on the calibration curves, the current to be applied to the respective coils can be determined.

It can be provided that the actuator has three or more coils. This enables a Number of possible variations to achieve a certain force at a certain heat output increased.

In an advantageous development of the device according to the invention, it can be provided that the coils are arranged one behind the other, and/or parallel to each other, and/or interwoven with each other.

The configurations described above enable a particularly simple and space-saving design of at least one actuator.

It can be provided that the coils have a shorter length when arranged one behind the other and/or have a smaller diameter when arranged next to one another.

This allows the required installation space in the actuator to be kept constant even for a larger number of coils.

In particular, it can be provided that a total heat output results from the sum of the currents through the coils, while a force generation results from the difference between the currents or the current applied to the respective coils.

In this way, the two unknowns of the respective current control can be determined for each combination of required force and required heat output and the previously described determination equations.

At this point, a device is disclosed in a more general form in which two counter-rotating actuators are provided or used. In this case, it can be provided that the difference in the power of the two actuators determines or controls a resulting force or net force and thus a position. A sum of the powers of the actuators then determines or controls a heat input. The disclosed device is not limited to the use of electromagnetic actuators. Rather, many different types of actuators, such as piezo actuators, can be provided. The features and advantages described in connection with the device according to the invention are to be applied accordingly.

It can be provided that there are two groups of actuators for changing the position of the element, with each of the groups comprising three individual actuators. This allows six degrees of freedom for a position and an orientation of the element to be changed or controlled.

The invention further relates to a computer program product having the features mentioned in claim 20.

The computer program product according to the invention with program code means is designed to carry out the above-described method according to the invention, in particular when the program is executed on a control device of the above-described device according to the invention.

The invention further relates to a mechanical system having the features mentioned in claim 21.

The mechanical system according to the invention comprises at least one actuator and at least one element, wherein a spatial position and/or deformation of the element can be adjusted by means of the method according to the invention and/or the device according to the invention and/or by using the computer program product according to the invention.

It can be provided that the element is an optical element of a lithography system, in particular an EUV projection exposure system.

It can be provided that the at least one element is mechanically coupled to the at least one actuator.

The mechanical system according to the invention can advantageously be designed to be usable in all operating states of an EUV lithography system and in all operating states of EUV optics. In particular, the mechanical system according to the invention can be designed to be usable during exposure phases in an EUV lithography system.

It can advantageously be provided that the actuator can be controlled by the control device in such a way that an optical surface of the element can be specifically heated by means of the temperature control signal.

The invention further relates to a lithography system having the features mentioned in claims 22.

The lithography system according to the invention, in particular a projection exposure system for microlithography, comprises at least one element, in particular an optical element. It is provided that a spatial position and/or deformation of the at least one element, in particular of the at least one optical element, is determined by means of the method according to the invention and/or can be set by means of the device according to the invention and/or using the computer program product according to the invention.

The optical element can in particular be a mirror and/or a lens.

In an advantageous development of the lithography system according to the invention, it can be provided that the lithography system is an EUV projection exposure system.

The lithography system according to the invention has the advantage that drift behavior and/or deformation behavior of the elements installed in the lithography system, in particular the optical elements, caused by temperature fluctuations is reduced. This enables more precise images and thus improved production of semiconductor elements.

Advantageously, it can be provided that for use in an EUV projection exposure system, adjustments are made to the coils and the power electronics used to control the coils, since EUV radiation and also the vacuum prevailing in an EUV projection exposure system impose special requirements.

Features that have been described in connection with one of the objects of the invention, namely given by the method according to the invention, the device according to the invention, the computer program product according to the invention, the mechanical system according to the invention or the lithography system according to the invention, can also be advantageously implemented for the other objects of the invention. Likewise, advantages that have been mentioned in connection with one of the objects of the invention can also be understood to relate to the other objects of the invention.

It should also be noted that terms such as "comprising", "having" or "with" do not exclude other features or steps. Furthermore, terms such as "a" or "the", which refer to a singular number of steps or features, do not exclude a plurality of features or steps - and vice versa.

In a purist embodiment of the invention, however, it can also be provided that the features introduced in the invention with the terms "comprising", "having" or "with" are listed exhaustively. Accordingly, one or more lists of features can be considered complete within the scope of the invention, for example considered for each claim. The invention can, for example, consist exclusively of the features mentioned in claim 1.

It should be noted that terms such as “first” or “second” etc. are used primarily for reasons of distinguishing between respective device or process features and are not necessarily intended to indicate that features are mutually dependent or related to one another.

In the following, embodiments of the invention are described in more detail with reference to the drawing.

The figures each show preferred embodiments in which individual features of the present invention are shown in combination with one another. Features of one embodiment can also be implemented separately from the other features of the same embodiment and can therefore be easily combined by a person skilled in the art to form further useful combinations and sub-combinations with features of other embodiments.

In the figures, functionally identical elements are provided with the same reference symbols.

• 1 eine EUV-Projektionsbelichtungsanlage im Meridionalschnitt;
• 2 eine DUV-Projektionsbelichtungsanlage;
• 3 eine schematische Darstellung einer möglichen Ausführungsform einer erfindungsgemäßen Vorrichtung;
• 4 eine schematische Darstellung einer weiteren möglichen Ausführungsform der erfindungsgemäßen Vorrichtung;
• 5 eine schematische Darstellung eines möglichen Verlaufes einer Transferfunktion zwischen einem Aktuator und einem Element;
• 6 eine schematische Darstellung einer weiteren möglichen Ausführungsform der erfindungsgemäßen Vorrichtung;
• 7 eine schematische Darstellung einer weiteren möglichen Ausführungsform der erfindungsgemäßen Vorrichtung;
• 8 eine schematische Darstellung einer weiteren möglichen Ausführungsform der erfindungsgemäßen Vorrichtung; und
• 9 eine blockdiagrammartige Darstellung einer weiteren möglichen Ausführungsform eines erfindungsgemäßen Verfahrens.

They show:

• 1 an EUV projection exposure system in meridional section;
• 2 a DUV projection exposure system;
• 3 a schematic representation of a possible embodiment of a device according to the invention;
• 4 a schematic representation of another possible embodiment of the device according to the invention;
• 5 a schematic representation of a possible course of a transfer function between an actuator and an element;
• 6 a schematic representation of another possible embodiment of the device according to the invention;
• 7 a schematic representation of another possible embodiment of the device according to the invention;
• 8 a schematic representation of another possible embodiment of the device according to the invention; and
• 9 a block diagram representation of another possible embodiment of a method according to the invention.

In the following, with reference to 1 The essential components of an EUV projection exposure system 100 for microlithography are described as an example of a lithography system. The description of the basic structure of the EUV projection exposure system 100 and its components should not be understood as limiting.

An illumination system 101 of the EUV projection exposure system 100 has, in addition to a radiation source 102, an illumination optics 103 for illuminating an object field 104 in an object plane 105. A reticle 106 arranged in the object field 104 is exposed. The reticle 106 is held by a reticle holder 107. The reticle holder 107 can be displaced via a reticle displacement drive 108, in particular in a scanning direction.

In 1 For explanation purposes, a Cartesian xyz coordinate system is shown. The x-direction runs perpendicular to the drawing plane. The y-direction runs horizontally and the z-direction runs vertically. The scanning direction runs in 1 along the y-direction. The z-direction is perpendicular to the object plane 105.

The EUV projection exposure system 100 comprises a projection optics 109. The projection optics 109 are used to image the object field 104 into an image field 110 in an image plane 111. The image plane 111 runs parallel to the object plane 105. Alternatively, an angle other than 0° between the object plane 105 and the image plane 111 is also possible.

A structure on the reticle 106 is imaged onto a light-sensitive layer of a wafer 112 arranged in the area of the image field 110 in the image plane 111. The wafer 112 is held by a wafer holder 113. The wafer holder 113 can be displaced via a wafer displacement drive 114, in particular along the y-direction. The displacement of the reticle 106 on the one hand via the reticle displacement drive 108 and the wafer 112 on the other hand via the wafer displacement drive 114 can be synchronized with one another.

The radiation source 102 is an EUV radiation source. The radiation source 102 emits in particular EUV radiation 115, which is also referred to below as useful radiation or illumination radiation. The useful radiation 115 has in particular a wavelength in the range between 5 nm and 30 nm. The radiation source 102 can be a plasma source, for example an LPP source (“laser produced plasma”, plasma generated using a laser) or a DPP source (“gas discharged produced plasma”, plasma generated by means of gas discharge). It can also be a synchrotron-based radiation source. The radiation source 102 can be a free-electron laser (FEL).

The illumination radiation 115 that emanates from the radiation source 102 is bundled by a collector 116. The collector 116 can be a collector with one or more ellipsoidal and/or hyperboloidal reflection surfaces. The at least one reflection surface of the collector 116 can be exposed to the illumination radiation 115 in grazing incidence (GI), i.e. with angles of incidence greater than 45°, or in normal incidence (NI), i.e. with angles of incidence less than 45°. The collector 116 can be structured and/or coated on the one hand to optimize its reflectivity for the useful radiation 115 and on the other hand to suppress stray light.

After the collector 116, the illumination radiation 115 propagates through an intermediate focus in an intermediate focal plane 117. The intermediate focal plane 117 can represent a separation between a radiation source module, comprising the radiation source 102 and the collector 116, and the illumination optics 103.

The illumination optics 103 comprises a deflection mirror 118 and a first facet mirror 119 arranged downstream of this in the beam path. The deflection mirror 118 can be a flat deflection mirror or alternatively a mirror with a beam-influencing effect beyond the pure deflection effect. Alternatively or additionally, the deflection mirror 118 can be designed as a spectral filter that separates a useful light wavelength of the illumination radiation 115 from false light of a different wavelength. If the first facet mirror 119 is arranged in a plane of the illumination optics 103 that is optically conjugated to the object plane 105 as a field plane, it is also referred to as a field facet mirror. The first facet mirror 119 comprises a plurality of individual first facets 120, which are also referred to below as field facets. Of these facets 120, only one is shown in the 1 only a few examples are shown.

The first facets 120 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or partially circular edge contour. The first facets 120 can be designed as flat facets or alternatively be designed as convex or concave curved facets.

As for example from the DE 10 2008 009 600 A1 As is known, the first facets 120 themselves can also be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 119 can in particular be designed as a microelectromechanical system (MEMS system). For details, see the DE 10 2008 009 600 A1 referred to.

Between the collector 116 and the deflection mirror 118, the illumination radiation 115 runs horizontally, i.e. along the y-direction.

In the beam path of the illumination optics 103, a second facet mirror 121 is arranged downstream of the first facet mirror 119. If the second facet mirror 121 is arranged in a pupil plane of the illumination optics 103, it is also referred to as a pupil facet mirror. The second facet mirror 121 can also be arranged at a distance from a pupil plane of the illumination optics 103. In this case, the combination of the first facet mirror 119 and the second facet mirror 121 is also referred to as a specular reflector. Specular reflectors are known from the US 2006/0132747 A1 , the EP 1 614 008 B1 and the US 6,573,978 .

The second facet mirror 121 comprises a plurality of second facets 122. In the case of a pupil facet mirror, the second facets 122 are also referred to as pupil facets.

The second facets 122 can also be macroscopic facets, which can be round, rectangular or hexagonal, for example, or alternatively facets composed of micromirrors. In this regard, reference is also made to the DE 10 2008 009 600 A1 referred to.

The second facets 122 may have planar or alternatively convex or concave curved reflection surfaces.

The illumination optics 103 thus forms a double-faceted system. This basic principle is also called the fly's eye integrator.

It may be advantageous not to arrange the second facet mirror 121 exactly in a plane which is optically conjugated to a pupil plane of the projection optics 109.

With the help of the second facet mirror 121, the individual first facets 120 are imaged into the object field 104. The second facet mirror 121 is the last bundle-forming or actually the last mirror for the illumination radiation 115 in the beam path in front of the object field 104.

In a further embodiment of the illumination optics 103 (not shown), a transmission optics can be arranged in the beam path between the second facet mirror 121 and the object field 104, which in particular contributes to the imaging of the first facets 120 in the object field 104. The transmission optics can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 103. The transmission optics can in particular comprise one or two mirrors for normal incidence (NI mirrors, “normal incidence” mirrors) and/or one or two mirrors for grazing incidence (GL mirrors, “grazing incidence” mirrors).

The illumination optics 103 has in the design shown in the 1 As shown, after the collector 116 there are exactly three mirrors, namely the deflection mirror 118, the field facet mirror 119 and the pupil facet mirror 121.

In a further embodiment of the illumination optics 103, the deflection mirror 118 can also be omitted, so that the illumination optics 103 can then have exactly two mirrors after the collector 116, namely the first facet mirror 119 and the second facet mirror 121.

The imaging of the first facets 120 by means of the second facets 122 or with the second facets 122 and a transmission optics into the object plane 105 is usually only an approximate imaging.

The projection optics 109 comprises a plurality of mirrors Mi, which are numbered according to their arrangement in the beam path of the EUV projection exposure system 100.

In the 1 In the example shown, the projection optics 109 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve or another number of mirrors Mi are also possible. The penultimate mirror M5 and the last mirror M6 each have a passage opening for the illumination radiation 115. The projection optics 109 are doubly obscured optics. The projection optics 109 have a numerical aperture on the image side that is greater than 0.5 and can also be greater than 0.6 and can be, for example, 0.7 or 0.75.

Reflection surfaces of the mirrors Mi can be designed as free-form surfaces without a rotational symmetry axis. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one rotational symmetry axis of the reflection surface shape. The mirrors Mi, just like the mirrors of the illumination optics 103, can have highly reflective coatings for the illumination radiation 115. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.

The projection optics 109 have a large object-image offset in the y-direction between a y-coordinate of a center of the object field 104 and a y-coordinate of the center of the image field 110. This object-image offset in the y-direction can be approximately as large as a z-distance between the object plane 105 and the image plane 111.

The number of intermediate image planes in the x- and y-direction in the beam path between the object field 104 and the image field 110 can be the same or can be different depending on the design of the projection optics 109. Examples of projection optics with different numbers of such intermediate images in the x- and y-direction are known from US 2018/0074303 A1 .

Each of the pupil facets 122 is assigned to exactly one of the field facets 120 to form an illumination channel for illuminating the object field 104. This can result in particular in illumination according to the Köhler principle. The far field is broken down into a plurality of object fields 104 using the field facets 120. The field facets 120 generate a plurality of images of the intermediate focus on the pupil facets 122 assigned to them.

The field facets 120 are each imaged onto the reticle 106 by an associated pupil facet 122, superimposing one another, to illuminate the object field 104. The illumination of the object field 104 is in particular as homogeneous as possible. It preferably has a uniformity error of less than 2%. The field uniformity can be achieved by superimposing different illumination channels.

By arranging the pupil facets, the illumination of the entrance pupil of the projection optics 109 can be defined geometrically. By selecting the illumination channels, in particular the subset of the pupil facets that guide light, the intensity distribution in the entrance pupil of the projection optics 109 can be set. This intensity distribution is also referred to as the illumination setting.

A likewise preferred pupil uniformity in the region of defined illuminated sections of an illumination pupil of the illumination optics 103 can be achieved by a redistribution of the illumination channels.

In the following, further aspects and details of the illumination of the object field 104 and in particular the entrance pupil of the projection optics 109 are described.

The projection optics 109 can in particular have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.

The entrance pupil of the projection optics 109 cannot usually be illuminated precisely with the pupil facet mirror 121. When the projection optics 109 images the center of the pupil facet mirror 121 telecentrically onto the wafer 112, the aperture rays often do not intersect at a single point. However, a surface can be found in which the pairwise determined distance of the aperture rays is minimal. This surface represents the entrance pupil or a surface conjugated to it in spatial space. In particular, this surface shows a finite curvature.

It may be that the projection optics 109 have different positions of the entrance pupil for the tangential and the sagittal beam path. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second facet mirror 121 and the reticle 106. With the help of this optical component, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account.

In the 1 In the arrangement of the components of the illumination optics 103 shown, the pupil facet mirror 121 is arranged in a surface conjugated to the entrance pupil of the projection optics 109. The first field facet mirror 119 is arranged tilted to the object plane 105. The first facet mirror 119 is arranged tilted to an arrangement plane that is defined by the deflection mirror 118.

The first facet mirror 119 is arranged tilted to an arrangement plane which is defined by the second facet mirror 121.

In 2 an exemplary DUV projection exposure system 200 is shown. The DUV projection exposure system 200 has an illumination system 201, a device called a reticle stage 202 for receiving and precisely positioning a reticle 203, by means of which the later structures on a wafer 204 are determined, a wafer holder 205 for holding, moving and precisely positioning the wafer 204 and an imaging device, namely a projection optics 206, with several optical elements, in particular lenses 207, which are held via mounts 208 in an objective housing 209 of the projection optics 206.

Alternatively or in addition to the lenses 207 shown, various refractive, diffractive and/or reflective optical elements, including mirrors, prisms, end plates and the like, can be provided.

The basic functional principle of the DUV projection exposure system 200 provides that the structures introduced into the reticle 203 are imaged onto the wafer 204.

The illumination system 201 provides a projection beam 210 in the form of electromagnetic radiation required for imaging the reticle 203 onto the wafer 204. A laser, a plasma source or the like can be used as a source for this radiation. The radiation is shaped in the illumination system 201 via optical elements such that the projection beam 210 has the desired properties with regard to diameter, polarization, shape of the wave front and the like when it strikes the reticle 203.

An image of the reticle 203 is generated by means of the projection beam 210 and is transferred to the wafer 204 in a correspondingly reduced size by the projection optics 206. The reticle 203 and the wafer 204 can be moved synchronously so that areas of the reticle 203 are imaged onto corresponding areas of the wafer 204 practically continuously during a so-called scanning process.

Optionally, an air gap between the last lens 207 and the wafer 204 can be replaced by a liquid medium having a refractive index greater than 1.0. The liquid medium can be, for example, highly pure water. Such a structure is also referred to as immersion lithography and has an increased photolithographic resolution.

The use of the invention is not limited to use in projection exposure systems 100, 200, in particular not with the described structure. The invention is suitable for any lithography systems or microlithography systems, but in particular for projection exposure systems with the described structure. The invention is also suitable for EUV projection exposure systems which have a smaller image-side numerical aperture than that which is used in connection with 1 described, and do not have an obscured mirror M5 and/or M6. In particular, the invention is also suitable for EUV projection exposure systems which have an image-side numerical aperture of 0.25 to 0.5, preferably 0.3 to 0.4, particularly preferably 0.33. The invention and the following embodiments are also not to be understood as being limited to a specific design.

The following figures represent the invention merely by way of example and in a highly schematic manner.

3 shows a schematic representation of a possible embodiment of a device 1 for adjusting a spatial position and/or deformation of an element 2. The element 2 can in particular be one of the optical elements 116, 118, 119, 120, 121, 122, Mi, 207.

The device 1 comprises at least one electromagnetic actuator 3 and a control device 4 for controlling the at least one actuator 3. The control device 4 is designed to apply a control signal 5 (see 4 ) and an electrical tempering signal 6 decoupled from the control signal 5 (see 4 ) furnished.

In the 3 In the illustrated embodiment of the device 1, the actuator 3 is preferably controllable by the control device 4 such that the actuator 3 has a constant total heat output.

Furthermore, in the 3 In the embodiment of the device 1 shown, the actuator 3 can be controlled by the control device 4 such that an optical surface 7 of the element 2, which is preferably mechanically coupled to the actuator 3, can be specifically heated by means of the tempering signal 6.

In addition, the 3 In the illustrated embodiment of the device 1, the actuator 3 is preferably a Lorentz actuator.

In an alternative or combined embodiment, at least one of the actuators 3 can also be designed as a reluctance actuator.

In the 3 In the embodiment shown, two actuators 3 are provided. The actuators 3 each have a housing 8, a coil 9 and a plunger 10 and are mechanically coupled to the element 2.

In the 3 In the embodiment shown, a dissipative heat input, which emanates from the actuators 3 and heats the element 2, is symbolized by paths or arrows 11.

3 further serves to disclose a mechanical system 15 which comprises the at least one actuator 3 and the at least one element 2. The spatial position and/or deformation of the element 2 can be adjusted in the mechanical system 15 by means of a method described later or the device 1 described above or by using a computer program product described later.

4 shows a schematic representation of a possible further embodiment of the device 1.

In the 4 In the embodiment shown, an at least partially electrically conductive housing 8 is provided for the actuator 3.

Preferably, the control device 4 (see 3 ) an eddy current can be formed in the housing 8.

Furthermore, in 4 a situation is shown in which the tempering signal 6 is a, preferably sinusoidal, modulation of the control signal 5. In 4 the control signal 5 is shown as a carrier signal in a dashed line. A total input signal 56 fed to the actuator 3 results from the addition of the tempering signal 6 with the control signal 5.

The high frequency superposition of the input signal 56 generates in the 4 illustrated embodiment, but has no effect on a position of the element 2, in particular on a mirror position and/or a lens position.

5 shows a schematic representation of a possible course of a transfer function between a force generated at the actuator 3 and a position of the element 2.

A relationship between position and force is plotted on a vertical y-axis 12.

A frequency of an excitation caused by the actuator 3 is plotted on a horizontal x-axis 13.

The transfer function is described by a curve 14.

It can be seen that the transfer function shows a strong suppression of high frequencies.

From the 5 From the transfer function shown, it is clear that it is advantageous if the tempering signal 5 preferably has a frequency by which the element 2 cannot be mechanically excited, for example to oscillate.

6 shows a schematic representation of another possible embodiment of the device 1.

In the 6 as well as in connection with the 7 and 8 In the embodiment explained later, the actuator 3 has at least two cooperating coils 9.

Furthermore, in the 6 , 7 and 8 In the embodiments shown, the coils 9 can be supplied with a current intensity such that a predeterminable total force of the actuator 3 is obtained by means of the control device 4 (not shown) through the tempering signal 6 and the control signal 5.

In the 6 In the embodiment shown, the coils 9 are arranged one behind the other.

7 shows a schematic representation of another possible embodiment of the device 1.

In the 7 In the embodiment shown, the coils 9 are arranged parallel to each other.

8 shows a schematic representation of another possible embodiment of the device 1.

In the 8 In the embodiment shown, the coils 9 are interwoven around a common core.

9 shows a block diagram of a possible embodiment of a method for operating the electromagnetic actuator 3.

In a control block 20, the actuator 3 is supplied with the control signal 5 to exert a force or to achieve a deflection.

In a tempering block 21, the actuator 3 is subjected to the tempering signal 6, which is decoupled from the control signal 5, for targeted heat generation.

The control block 20 and the tempering block 21 are preferably executed at the same time.

In a constant block 22, the total heat output of the actuator 3 is preferably kept constant. In a heating block 23, the optical surface 7 of the element 2, which is preferably mechanically coupled to the actuator 3, is preferably heated in a targeted manner by means of the temperature control signal 6.

The constant block 22 and the heating block 23 are preferably carried out at different times.

Within the control block 20, the actuator 3 preferably uses a Lorentz force and/or a reluctance force to exert the force and/or to achieve the deflection.

Within the scope of the control block 20 and/or the tempering block 21, the tempering signal 6 is preferably formed as a modulation of the control signal 5.

Furthermore, within the framework of the tempering block 21, the tempering signal 6 is preferably generated at such a frequency that the element 2 mechanically coupled to the actuator 3 cannot follow the force of the actuator 3 caused by the tempering signal 6.

Alternatively or additionally, it can be provided within the framework of the tempering block 21 that an eddy current is generated in the at least partially electrically conductive housing 8 of the actuator 3 by means of the tempering signal 6.

Within the framework of the tempering block 21, the tempering signal 6 is further preferably formed with a frequency of 1 kHz to 100 kHz, preferably 5 kHz to 20 kHz and/or from 10 kHz to 300 kHz, preferably 25 kHz to 100 kHz.

Furthermore, within the scope of the control block 20 and/or the tempering block 21, it can be provided that the tempering signal 6 and the control signal 5 each apply a current intensity to at least two interacting coils 9 of the actuator 3 such that a predeterminable total force of the actuator 3 results.

Preferably, the method is carried out in the 9 implemented in the chronological sequence shown.

A computer program product with program code means is preferably intended to implement the 9 described method when the program is on the control device 4 of the device 1, preferably in one of the embodiments described in connection with the 3 to 8 described above.

The 1 and 2 The lithography system explained, in particular the projection exposure system for microlithography, generally has at least one element 2, in particular an optical element 116, 118, 119, 120, 121, 122, Mi, 207. In the 1 and 2 The lithography system shown is a spatial position and/or deformation of the at least one element 2, in particular of the at least one optical element 116, 118, 119, 120, 121, 122, Mi, 207, by means of the in connection with the 9 explained procedure and/or by means of the information provided in connection with the 3 to 8 explained device 1 and/or using the computer program product described above. Alternatively or additionally, the device described in connection with 3 explained mechanical system 15 is intended as part of the lithography system.

list of reference symbols

1

device

2

element

3

electromagnetic actuator

4

control device

5

control signal

6

tempering signal

56

input signal

7

optical surface

8

Housing

9

Sink

10

pestle

11

Arrow

12

y-axis

13

x-axis

14

curve

15

mechanical system

20

control block

21

tempering block

22

constant block

23

warming block

100

EUV projection exposure system

101

lighting system

102

radiation source

103

lighting optics

104

object field

105

object level

106

reticle

107

reticle holder

108

reticle displacement drive

109

projection optics

110

image field

111

image plane

112

wafer

113

wafer holder

114

wafer relocation drive

115

EUV / useful / illumination radiation

116

collector

117

intermediate focal plane

118

deflecting mirror

119

first facet mirror / field facet mirror

120

first facets / field facets

121

second facet mirror / pupil facet mirror

122

second facets / pupillary facets

200

DUV projection exposure system

201

lighting system

202

reticle stage

203

reticle

204

wafer

205

wafer holder

206

projection optics

207

lens

208

version

209

lens housing

210

projection beam

Wed

Mirror

QUOTES INCLUDED IN THE DESCRIPTION

This list of documents listed by the applicant was generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA accepts no liability for any errors or omissions.

Cited patent literature

• DE 10 2015 211 474 A1 [0011]
• DE 10 2015 217 119 A1 [0012]
• DE 10 2020 212 742 A1 [0013]
• DE 10 2008 009 600 A1 [0178, 0182]
• US 2006/0132747 A1 [0180]
• EP 1 614 008 B1 [0180]
• US 6,573,978 [0180]
• US 2018/0074303 A1 [0195]

Claims (22)

Method for operating an electromagnetic actuator (3), wherein the actuator (3) is subjected to both a control signal (5) for exerting a force and/or for achieving a deflection, and a tempering signal (6) decoupled from the control signal (5) for targeted heat generation. procedure according to claim 1 , characterized in that a total heat output of the actuator (3) is kept constant. procedure according to claim 1 or 2 , characterized in that an optical surface (7) of an element (2), preferably mechanically coupled to the actuator (3), is specifically heated by means of the tempering signal (6). Method according to one of the Claims 1 until 3 , characterized in that the actuator (3) uses a Lorentz force and/or a reluctance force to exert the force and/or to achieve the deflection. Method according to one of the Claims 1 until 4 , characterized in that the tempering signal (6) is designed as a modulation of the control signal (5). Method according to one of the Claims 1 until 5 , characterized in that the tempering signal (6) is generated with such a frequency that an element (2) mechanically coupled to the actuator (3) cannot follow the tempering signal (6). Method according to one of the Claims 1 until 6 , characterized in that by means of the tempering signal (6) an eddy current is generated in an at least partially electrically conductive housing (8) of the actuator (3). Method according to one of the Claims 1 until 7 , characterized in that the tempering signal (6) is formed with a frequency of 1 kHz to 100 kHz, preferably 5 kHz to 20 kHz and/or from 10 kHz to 300 kHz, preferably 25 kHz to 100 kHz. Method according to one of the Claims 1 until 8 , characterized in that by the tempering signal (6) and the control signal (5) at least two interacting coils (9) of the actuator (3) are each supplied with such a current intensity that a predeterminable total force of the actuator (3) results. Device (1) for adjusting a spatial position and/or deformation of an element (2), in particular an optical element (116, 118, 119, 120, 121, 122, Mi, 207) of a lithography system, comprising - at least one electromagnetic actuator (3), and - a control device (4) for controlling the at least one actuator (3); characterized in that the control device (4) is set up to apply an electrical control signal (5) and an electrical tempering signal (6) decoupled from the control signal (5) to the actuator (3). Device (1) according to claim 10 , characterized in that the actuator (3) can be controlled by the control device (4) such that the actuator (3) has a constant total heat output. Device (1) according to claim 10 or 11 , characterized in that the actuator (3) can be controlled by the control device (4) such that an optical surface (7) of the element (2), which is preferably mechanically coupled to the actuator (3), can be heated in a targeted manner by means of the tempering signal (6). Device (1) according to one of the Claims 10 until 12 , characterized in that the actuator (3) is a Lorentz actuator and/or a reluctance actuator. Device (1) according to one of the Claims 10 until 13 , characterized in that an at least partially electrically conductive housing (8) is provided for the actuator (3) and/or an eddy current can be formed in the housing (8) by the control device (4). Device (1) according to one of the Claims 10 until 14 , characterized in that the tempering signal (5) is a modulation of the control signal (5). Device (1) according to one of the Claims 10 until 15 , characterized in that the tempering signal (5) has a frequency by which the element (2) cannot be mechanically excited. Device (1) according to one of the Claims 10 until 16 , characterized in that the actuator (3) has at least two cooperating coils (9). Device (1) according to claim 17 , characterized in that the coils (9) are controlled by the control device (4) by the tempering signal (6) and the control signal (5) can each be supplied with a current strength such that a predeterminable total force of the actuator (3) results. device according to claim 17 or 18 , characterized in that the coils (9) - are arranged one behind the other, and/or - are arranged parallel to one another, and/or - are interwoven with one another. Computer program product with program code means for implementing a method according to one of the Claims 1 until 9 to be carried out when the program is executed on a control device (4) of a device (1) according to one of the Claims 10 until 19 is executed. Mechanical system (15) with at least one actuator (3) and at least one element (2), wherein a spatial position and/or deformation of the element (2) is determined by means of a method according to one of the Claims 1 until 9 and/or a device (1) according to one of the Claims 10 until 19 and/or using a computer program product according to claim 20 is adjustable. Lithography system, in particular projection exposure system (100,200) for microlithography, comprising at least one element (2), in particular an optical element (116, 118, 119, 120, 121, 122, Mi, 207), characterized in that a spatial position and/or deformation of the at least one element (2), in particular of the at least one optical element (116, 118, 119, 120, 121, 122, Mi, 207), by means of a method according to one of the Claims 1 until 9 and/or by means of a device (1) according to one of the Claims 10 until 19 and/or using a computer program product according to claim 20 adjustable and/or a mechanical system (15) according to claim 21 is intended.

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