[go: up one dir, main page]

DE10293414D2 - Lithograph mit bewegtem Zylinderlinsensystem - Google Patents

Lithograph mit bewegtem Zylinderlinsensystem

Info

Publication number
DE10293414D2
DE10293414D2 DE10293414T DE10293414T DE10293414D2 DE 10293414 D2 DE10293414 D2 DE 10293414D2 DE 10293414 T DE10293414 T DE 10293414T DE 10293414 T DE10293414 T DE 10293414T DE 10293414 D2 DE10293414 D2 DE 10293414D2
Authority
DE
Germany
Prior art keywords
lithograph
lens system
cylindrical lens
moving cylindrical
moving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE10293414T
Other languages
English (en)
Other versions
DE10293414B4 (de
Inventor
Steffen Noehte
Christoph Dietrich
Robert Thomann
Stefan Stadler
Joern Leiber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Scribos GmbH
Original Assignee
Tesa Scribos GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tesa Scribos GmbH filed Critical Tesa Scribos GmbH
Priority to DE10293414T priority Critical patent/DE10293414B4/de
Application granted granted Critical
Publication of DE10293414D2 publication Critical patent/DE10293414D2/de
Publication of DE10293414B4 publication Critical patent/DE10293414B4/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0891—Processes or apparatus adapted to convert digital holographic data into a hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0478—Serial printer, i.e. point oriented processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)
DE10293414T 2001-07-27 2002-07-26 Lithograph mit bewegtem Zylinderlinsensystem Expired - Fee Related DE10293414B4 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE10293414T DE10293414B4 (de) 2001-07-27 2002-07-26 Lithograph mit bewegtem Zylinderlinsensystem

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10136569.1 2001-07-27
DE10136569 2001-07-27
DE10293414T DE10293414B4 (de) 2001-07-27 2002-07-26 Lithograph mit bewegtem Zylinderlinsensystem
PCT/EP2002/008372 WO2003012549A2 (de) 2001-07-27 2002-07-26 Lithograph mit bewegtem zylinderlinsensystem

Publications (2)

Publication Number Publication Date
DE10293414D2 true DE10293414D2 (de) 2004-08-19
DE10293414B4 DE10293414B4 (de) 2007-03-01

Family

ID=7693264

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10293414T Expired - Fee Related DE10293414B4 (de) 2001-07-27 2002-07-26 Lithograph mit bewegtem Zylinderlinsensystem

Country Status (4)

Country Link
US (1) US20040257629A1 (de)
DE (1) DE10293414B4 (de)
GB (1) GB2395799B (de)
WO (1) WO2003012549A2 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1377880B1 (de) * 2001-04-12 2005-06-01 tesa scribos GmbH Lithograph und mikroskop mit eindimensionaler triggermaske und verfahren zum herstellen digitaler hologramme in einem speichermedium
EP1826632B1 (de) 2006-02-22 2015-12-30 tesa scribos GmbH Verfahren zum Berechnen von computergenerierten Hologrammen auf einer unebenen Fläche
JP5166397B2 (ja) 2006-04-04 2013-03-21 テーザ スクリボス ゲゼルシャフト ミット ベシュレンクテル ハフツング ストレージ媒体を微細構造化するためのデバイスおよび方法ならびに微細構造領域を含むストレージ媒体
DE102006037216B4 (de) * 2006-04-04 2017-07-13 Tesa Scribos Gmbh Verfahren zur Herstellung einer Punkteverteilung in einem Speichermedium sowie ein Speichermedium
DE102006032538A1 (de) 2006-04-04 2007-10-11 Tesa Scribos Gmbh Speichermedium mit einem Sicherheitsmerkmal sowie Verfahren zur Herstellung eines Speichermediums mit einem Sicherheitsmerkmal
DE102006025335A1 (de) * 2006-05-31 2007-12-06 Tesa Scribos Gmbh Etikett mit einem Sicherheitsmerkmal und Behälter mit einem Etikett
DE102006032234A1 (de) 2006-07-12 2008-01-17 Tesa Scribos Gmbh Verfahren zum Aufbringen eines Sicherheitsmerkmals auf ein Sicherheitsdokument sowie Sicherheitsdokument mit einem Sicherheitsmerkmal
DE102007004857A1 (de) 2007-01-31 2008-08-07 Tesa Scribos Gmbh Datenträger und Etikett sowie deren Herstellung
DE102007006119A1 (de) 2007-02-02 2008-08-14 Tesa Scribos Gmbh Datenspeicher
DE102007006120A1 (de) 2007-02-02 2008-08-07 Tesa Scribos Gmbh Speichermedium mit einer optisch veränderbaren Speicherschicht
WO2008153674A1 (en) 2007-06-09 2008-12-18 Boris Kobrin Method and apparatus for anisotropic etching
US8518633B2 (en) 2008-01-22 2013-08-27 Rolith Inc. Large area nanopatterning method and apparatus
US8192920B2 (en) 2008-04-26 2012-06-05 Rolith Inc. Lithography method
CN102203674B (zh) * 2008-09-22 2015-08-12 Asml荷兰有限公司 光刻设备、可编程图案形成装置和光刻方法
US20110210480A1 (en) * 2008-11-18 2011-09-01 Rolith, Inc Nanostructures with anti-counterefeiting features and methods of fabricating the same
DE102009040112B4 (de) 2009-09-04 2021-03-04 Tesa Scribos Gmbh Etikettenbahn mit einer Mehrzahl von Etiketten
TWI448830B (zh) 2010-02-09 2014-08-11 Asml Netherlands Bv 微影裝置及元件製造方法
US9235140B2 (en) 2010-02-23 2016-01-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2006261A (en) 2010-02-25 2011-08-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
KR101537289B1 (ko) 2010-04-12 2015-07-16 에이에스엠엘 네델란즈 비.브이. 기판 핸들링 장치 및 리소그래피 장치
JP2014501934A (ja) 2010-08-23 2014-01-23 ローイス インコーポレイテッド 近接場リソグラフィのためのマスク及びその製造方法
US9316926B2 (en) 2010-12-08 2016-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101517457B1 (ko) 2011-03-29 2015-05-04 에이에스엠엘 네델란즈 비.브이. 리소그래피에서 방사선 빔 스팟 위치의 측정
KR101538414B1 (ko) 2011-04-08 2015-07-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 프로그래밍 가능한 패터닝 디바이스 및 리소그래피 방법
JP2014514764A (ja) 2011-04-21 2014-06-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィ装置をメンテナンスするための方法、及びデバイス製造方法
CN103765316B (zh) 2011-08-18 2016-06-29 Asml荷兰有限公司 光刻设备和器件制造方法
NL2009342A (en) 2011-10-31 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
WO2013079316A2 (en) 2011-11-29 2013-06-06 Asml Netherlands B.V. Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method
US9696636B2 (en) 2011-11-29 2017-07-04 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program
NL2009806A (en) 2011-12-05 2013-06-10 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5881851B2 (ja) 2011-12-06 2016-03-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、セットポイントデータを提供する装置、デバイス製造方法、セットポイントデータの計算方法、およびコンピュータプログラム
NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
WO2013104482A1 (en) 2012-01-12 2013-07-18 Asml Netherlands B.V. A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
KR101633761B1 (ko) 2012-01-17 2016-06-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
KR101650830B1 (ko) 2012-02-23 2016-08-24 에이에스엠엘 네델란즈 비.브이. 디바이스, 리소그래피 장치, 방사선을 안내하는 방법, 및 디바이스 제조 방법
NL2012052A (en) 2013-01-29 2014-08-04 Asml Netherlands Bv A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.
KR102517037B1 (ko) * 2020-11-03 2023-04-04 경북대학교 산학협력단 실린드리컬 렌즈를 이동하여 호겔 위치를 조정하는 홀로그램 프린터

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2222937A (en) * 1937-09-21 1940-11-26 Rca Corp Scanning device
US3976354A (en) * 1973-12-14 1976-08-24 Honeywell Inc. Holographic memory with moving memory medium
JPS544856B2 (de) * 1974-01-17 1979-03-10
GB1545234A (en) * 1975-10-31 1979-05-02 Hitachi Ltd Information play-back apparatus
CA2064230A1 (en) * 1989-07-18 1991-01-19 Erik H. Anderson Holographic lithography
US5142385A (en) * 1989-07-18 1992-08-25 Massachusetts Institute Of Technology Holographic lithography
US5109149A (en) * 1990-03-15 1992-04-28 Albert Leung Laser, direct-write integrated circuit production system
US5095386A (en) * 1990-05-01 1992-03-10 Charles Lescrenier Optical system for generating lines of light using crossed cylindrical lenses
JP2991097B2 (ja) * 1995-12-20 1999-12-20 富士ゼロックス株式会社 画像形成装置
JPH1078554A (ja) * 1996-09-05 1998-03-24 Asahi Optical Co Ltd カスケード走査光学系の調整機構
US6014270A (en) * 1998-11-23 2000-01-11 Lucent Technologies Inc Cylindrical lenses for alignment of optical sources and destinations
US6692030B1 (en) * 2000-07-21 2004-02-17 Verify First Technologies, Inc. Security document with nano-pattern
CA2416159A1 (en) * 2000-07-25 2002-01-31 Kosan Biosciences, Inc. Fermentation process for epothilones
DE10116059B4 (de) * 2001-03-30 2007-03-01 Tesa Scribos Gmbh Lithograph mit bewegter Linse und Verfahren zum Herstellen digitaler Hologramme in einem Speichermedium
EP1377880B1 (de) * 2001-04-12 2005-06-01 tesa scribos GmbH Lithograph und mikroskop mit eindimensionaler triggermaske und verfahren zum herstellen digitaler hologramme in einem speichermedium

Also Published As

Publication number Publication date
US20040257629A1 (en) 2004-12-23
GB2395799A (en) 2004-06-02
DE10293414B4 (de) 2007-03-01
WO2003012549A3 (de) 2003-10-09
WO2003012549A2 (de) 2003-02-13
GB0403047D0 (en) 2004-03-17
GB2395799B (en) 2005-06-15

Similar Documents

Publication Publication Date Title
DE10293414D2 (de) Lithograph mit bewegtem Zylinderlinsensystem
DE60123204D1 (de) Zoom-Objektiv
DE60104146D1 (de) Flachkamera
DE50205989D1 (de) Belichtungsobjektiv mit mehreren optischen Elementen
DE60200226D1 (de) Zoom-Projektionsobjektiv mit vier Linsengruppen
DE60132648D1 (de) Projektionssystem mit mehreren Projektoren
DE50012452D1 (de) Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
DE60008214D1 (de) Optischer Schalter mit zweiachsigen Mikrospiegeln
DE69942493D1 (de) Mehrschichtige optische Körper
DE60134397D1 (de) Lichtinterferenz-tomographiebildbeobachtungsvor-richtung
DE60238911D1 (de) Omnidirektionaler optischer codeleser mit scheimpflug-optik
DE60135554D1 (de) Plastiklinse
DE50112921D1 (de) Projektionsbelichtungsanlage mit reflektivem Retikel
DE60201630D1 (de) Optischer MEMS Schalter mit Abbildungssystem
DE60224608D1 (de) Drucksystem
DE60033989D1 (de) Zoomobjektiv
DE50104196D1 (de) Fokussierbarer Scheinwerfer mit Negativlinse
DE60136785D1 (de) Autofokus-Linsenvorrichtung
DE50211190D1 (de) Projektionsbelichtungsanlage
DE10083056T1 (de) Anamorphotische Linse mit variablem Verhältnis
DE50103723D1 (de) 6-Spiegel-Mikrolithographie-Projektionsobjektiv
DE60131603D1 (de) Katadioptrisches Objektiv mit hoher numerischer Apertur
DE60220014D1 (de) Fokalebenen-array-kalibrationssystem
DE60110517D1 (de) Lichtgesteuerter Lichtmodulator
DE10137803B8 (de) Zylindrischer Laserschutzbalg

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law

Ref document number: 10293414

Country of ref document: DE

Date of ref document: 20040819

Kind code of ref document: P

8364 No opposition during term of opposition
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20150203