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FR2857154B1 - PROCESS FOR TREATING SEMICONDUCTOR SURFACES - Google Patents

PROCESS FOR TREATING SEMICONDUCTOR SURFACES

Info

Publication number
FR2857154B1
FR2857154B1 FR0308055A FR0308055A FR2857154B1 FR 2857154 B1 FR2857154 B1 FR 2857154B1 FR 0308055 A FR0308055 A FR 0308055A FR 0308055 A FR0308055 A FR 0308055A FR 2857154 B1 FR2857154 B1 FR 2857154B1
Authority
FR
France
Prior art keywords
semiconductor surfaces
treating semiconductor
treating
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0308055A
Other languages
French (fr)
Other versions
FR2857154A1 (en
Inventor
Marius Chemla
Sebastien Petitdidier
Didier Levy
Francois Rouelle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SA
Original Assignee
STMicroelectronics SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SA filed Critical STMicroelectronics SA
Priority to FR0308055A priority Critical patent/FR2857154B1/en
Publication of FR2857154A1 publication Critical patent/FR2857154A1/en
Application granted granted Critical
Publication of FR2857154B1 publication Critical patent/FR2857154B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
FR0308055A 2003-07-02 2003-07-02 PROCESS FOR TREATING SEMICONDUCTOR SURFACES Expired - Fee Related FR2857154B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR0308055A FR2857154B1 (en) 2003-07-02 2003-07-02 PROCESS FOR TREATING SEMICONDUCTOR SURFACES

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0308055A FR2857154B1 (en) 2003-07-02 2003-07-02 PROCESS FOR TREATING SEMICONDUCTOR SURFACES

Publications (2)

Publication Number Publication Date
FR2857154A1 FR2857154A1 (en) 2005-01-07
FR2857154B1 true FR2857154B1 (en) 2005-12-16

Family

ID=33522693

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0308055A Expired - Fee Related FR2857154B1 (en) 2003-07-02 2003-07-02 PROCESS FOR TREATING SEMICONDUCTOR SURFACES

Country Status (1)

Country Link
FR (1) FR2857154B1 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6030491A (en) * 1997-08-19 2000-02-29 Micron Technology, Inc. Processing compositions and methods of using same
EP1024524A2 (en) * 1999-01-27 2000-08-02 Matsushita Electric Industrial Co., Ltd. Deposition of dielectric layers using supercritical CO2

Also Published As

Publication number Publication date
FR2857154A1 (en) 2005-01-07

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20090331