GB1125444A - Method and apparatus for the preparation of thin layers - Google Patents
Method and apparatus for the preparation of thin layersInfo
- Publication number
- GB1125444A GB1125444A GB36586/65A GB3658665A GB1125444A GB 1125444 A GB1125444 A GB 1125444A GB 36586/65 A GB36586/65 A GB 36586/65A GB 3658665 A GB3658665 A GB 3658665A GB 1125444 A GB1125444 A GB 1125444A
- Authority
- GB
- United Kingdom
- Prior art keywords
- coating
- substrate
- aug
- cooled
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000011248 coating agent Substances 0.000 abstract 4
- 238000000576 coating method Methods 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000007789 gas Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000007664 blowing Methods 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 238000002144 chemical decomposition reaction Methods 0.000 abstract 1
- 230000005684 electric field Effects 0.000 abstract 1
- 230000005672 electromagnetic field Effects 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 229930195733 hydrocarbon Natural products 0.000 abstract 1
- 150000002430 hydrocarbons Chemical class 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Photoreceptors In Electrophotography (AREA)
- Silicon Compounds (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
1,125,444. Coating in the presence of a glow discharge. F. GRASENICK. Aug. 25, 1965 [Aug. 25, 1964], No.36586/65. Heading C7F. In a process for forming a coating in the presence of a (gas) discharge by vacuum deposition, sputtering or by chemical decomposition of a gas, the walls surrounding the substrate are cooled to a temperature in the region of or below that of liquid nitrogen. The temperature of the walls may also be controlled by blowing hot air into the chamber or by heating coils and the support for the substrate may be heated or cooled. The glow discharge may also be used to clean the substrate before coating. Electric or electromagnetic fields may be used to control the formation of the coating. The central part of the chamber may be enclosed by negatively charged grid electrodes. Carbon is deposited from hydrocarbons and silicon or silica from silicon - hydrogen compounds. The support for the substrates may be two semi-cylindrical shells pressed together by springs Fig. 3 (not shown).
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT736264A AT258664B (en) | 1964-08-25 | 1964-08-25 | Device for producing and / or breaking down layers by means of electrical gas discharges |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1125444A true GB1125444A (en) | 1968-08-28 |
Family
ID=3595287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB36586/65A Expired GB1125444A (en) | 1964-08-25 | 1965-08-25 | Method and apparatus for the preparation of thin layers |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3736246A (en) |
| AT (1) | AT258664B (en) |
| DE (1) | DE1515297C3 (en) |
| GB (1) | GB1125444A (en) |
| NL (1) | NL6511079A (en) |
| SE (1) | SE317235B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4265991A (en) | 1977-12-22 | 1981-05-05 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member and process for production thereof |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3894926A (en) * | 1973-02-09 | 1975-07-15 | Lee Jau Yien | In-out transporter for an enclosed chamber |
| US3956093A (en) * | 1974-12-16 | 1976-05-11 | Airco, Inc. | Planar magnetron sputtering method and apparatus |
| FR2371524A1 (en) * | 1976-11-18 | 1978-06-16 | Alsthom Atlantique | PROCESS FOR DEPOSITING A THIN LAYER BY DECOMPOSITION OF A GAS IN A PLASMA |
| US4151064A (en) * | 1977-12-27 | 1979-04-24 | Coulter Stork U.S.A., Inc. | Apparatus for sputtering cylinders |
| DE3331707A1 (en) * | 1983-09-02 | 1985-03-21 | Leybold-Heraeus GmbH, 5000 Köln | METHOD AND DEVICE FOR REACTIVELY SPRAYING CONNECTIONS FROM METALS AND SEMICONDUCTORS |
| DE3347036C2 (en) * | 1983-12-24 | 1986-04-24 | Fr. Kammerer GmbH, 7530 Pforzheim | Process for coating substrates with metals |
-
1964
- 1964-08-25 AT AT736264A patent/AT258664B/en active
-
1965
- 1965-01-09 DE DE1515297A patent/DE1515297C3/en not_active Expired
- 1965-08-24 SE SE11018/65A patent/SE317235B/xx unknown
- 1965-08-25 GB GB36586/65A patent/GB1125444A/en not_active Expired
- 1965-08-25 NL NL6511079A patent/NL6511079A/xx unknown
-
1971
- 1971-11-04 US US00195792A patent/US3736246A/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4265991A (en) | 1977-12-22 | 1981-05-05 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member and process for production thereof |
| US4507375A (en) * | 1977-12-22 | 1985-03-26 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member and process for production thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| AT258664B (en) | 1967-12-11 |
| DE1515297B2 (en) | 1978-12-07 |
| US3736246A (en) | 1973-05-29 |
| NL6511079A (en) | 1966-02-28 |
| SE317235B (en) | 1969-11-10 |
| DE1515297A1 (en) | 1969-06-12 |
| DE1515297C3 (en) | 1979-08-02 |
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