JP2000044579A - Carbosiloxane dendrimer - Google Patents
Carbosiloxane dendrimerInfo
- Publication number
- JP2000044579A JP2000044579A JP10230154A JP23015498A JP2000044579A JP 2000044579 A JP2000044579 A JP 2000044579A JP 10230154 A JP10230154 A JP 10230154A JP 23015498 A JP23015498 A JP 23015498A JP 2000044579 A JP2000044579 A JP 2000044579A
- Authority
- JP
- Japan
- Prior art keywords
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- carbon atoms
- formula
- carbosiloxane dendrimer
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000412 dendrimer Substances 0.000 title claims abstract description 56
- 229920000736 dendritic polymer Polymers 0.000 title claims abstract description 56
- -1 polysiloxane structure Polymers 0.000 claims abstract description 40
- 125000005353 silylalkyl group Chemical group 0.000 claims abstract description 16
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 14
- 125000003118 aryl group Chemical group 0.000 claims abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- 239000004793 Polystyrene Substances 0.000 claims description 7
- 229920002223 polystyrene Polymers 0.000 claims description 7
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract description 13
- 125000003342 alkenyl group Chemical group 0.000 abstract description 8
- 150000001875 compounds Chemical class 0.000 abstract description 8
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 8
- 229910052697 platinum Inorganic materials 0.000 abstract description 7
- 239000003054 catalyst Substances 0.000 abstract description 5
- 230000009477 glass transition Effects 0.000 abstract description 5
- 229920000642 polymer Polymers 0.000 abstract description 5
- 229920001296 polysiloxane Polymers 0.000 abstract description 5
- 229910052723 transition metal Inorganic materials 0.000 abstract description 5
- 150000003624 transition metals Chemical class 0.000 abstract description 5
- 238000007259 addition reaction Methods 0.000 abstract description 3
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
- 239000004215 Carbon black (E152) Substances 0.000 abstract 1
- 229930195733 hydrocarbon Natural products 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 47
- 238000006243 chemical reaction Methods 0.000 description 37
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 28
- 239000007788 liquid Substances 0.000 description 16
- 238000010992 reflux Methods 0.000 description 15
- 239000002253 acid Substances 0.000 description 12
- 238000001816 cooling Methods 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical class [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- 238000005227 gel permeation chromatography Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 239000007795 chemical reaction product Substances 0.000 description 6
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 239000011162 core material Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- CHEFFAKKAFRMHG-UHFFFAOYSA-N ethenyl-tris(trimethylsilyloxy)silane Chemical compound C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)C=C CHEFFAKKAFRMHG-UHFFFAOYSA-N 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910004283 SiO 4 Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- UOUILILVWRHZSH-UHFFFAOYSA-N dimethyl-tris[(dimethyl-$l^{3}-silanyl)oxy]silyloxysilicon Chemical compound C[Si](C)O[Si](O[Si](C)C)(O[Si](C)C)O[Si](C)C UOUILILVWRHZSH-UHFFFAOYSA-N 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- 101100010166 Mus musculus Dok3 gene Proteins 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 101500019086 Ustilago maydis P6 virus KP6 killer toxin subunit alpha Proteins 0.000 description 1
- BGISVIDNIBCUTN-UHFFFAOYSA-N [bis[(dimethyl-$l^{3}-silanyl)oxy]-methylsilyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(O[Si](C)C)O[Si](C)C BGISVIDNIBCUTN-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 1
- CAPSVOLZKMIOEF-UHFFFAOYSA-N ethenyl-methoxy-bis(trimethylsilyloxy)silane Chemical compound C[Si](C)(C)O[Si](OC)(O[Si](C)(C)C)C=C CAPSVOLZKMIOEF-UHFFFAOYSA-N 0.000 description 1
- XWHJQTQOUDOZGR-UHFFFAOYSA-N hex-1-enyl(trimethoxy)silane Chemical compound CCCCC=C[Si](OC)(OC)OC XWHJQTQOUDOZGR-UHFFFAOYSA-N 0.000 description 1
- RYPKRALMXUUNKS-UHFFFAOYSA-N hex-2-ene Chemical compound CCCC=CC RYPKRALMXUUNKS-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- DVFZJTWMDGYBCD-UHFFFAOYSA-N triethoxy(hex-1-enyl)silane Chemical compound CCCCC=C[Si](OCC)(OCC)OCC DVFZJTWMDGYBCD-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Landscapes
- Silicon Polymers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は新規なカルボシロキ
サンデンドリマーに関し、詳しくは、ポリシロキサン構
造を核として、シロキサン結合とシルアルキレン結合が
交互に配列した高分岐構造を有する、分子量分布の狭い
新規なカルボシロキサンデンドリマーに関する。The present invention relates to a novel carbosiloxane dendrimer and, more particularly, to a novel carbosiloxane dendrimer having a highly branched structure in which a siloxane bond and a silalkylene bond are alternately arranged with a polysiloxane structure as a nucleus, and a narrow molecular weight distribution. It relates to a carbosiloxane dendrimer.
【0002】[0002]
【従来の技術】一つの核から放射状に高度な枝分かれ構
造を有し、分子量分布が狭い高分子はデンドリマーと呼
ばれ、低粘度性,高反応性,高溶解性,低ガラス転移温
度といった特徴的な性質を持っており、その応用が注目
されている。有機ケイ素デンドリマーとしては、例え
ば、シロキサンデンドリマー{レブロフら、Dokl. Aka
d.Nauk. SSSR 309, 367 (1989);正宗ら、J. Am. Chem.
Soc. 112, 7077 (1990)参照},カルボシロキサンデン
ドリマー{柿本ら、Macromolecules 24, 3469 (1991);
特開平7−17981号公報、シェイコら、Macromol.
Rapid Commun. 17,283 (1996)参照},カルボシランデ
ンドリマー{ルーバースら、Macromolecules26, 963 (1
993);特開平8−311205号公報参照}などが知ら
れている。これらの中には、シロキサン結合とシルアル
キレン結合が交互に配列したカルボシロキサンデンドリ
マーも開示されているが{特開平7−17981号公
報;シェイコら、Macromol. Rapid Commun. 17, 283 (1
996)参照}、これらは一個のケイ素原子に複数のビニル
基またはアリル基が結合したシラン化合物をデンドリマ
ーの核構成原料とするものに限定されており、しかも、
階層数が小さい低分子量のデンドリマーしか得られない
という欠点があった。また、一段階重合法によるシロキ
サン結合とシルアルキレン結合が交互に配列した高分岐
状ポリマーの合成も開示されているが{マシウスら、J.
Am. Chem. Soc. 113, 4043 (1991)参照}、この方法で
は、分子量分布の狭いデンドリマーは得られないという
欠点があった。すなわち、シロキサン結合とシルアルキ
レン結合が交互に配列した高分岐構造を有し、高分子量
化が可能であり、かつ分子量分布の狭いカルボシロキサ
ンデンドリマーはこれまで知られていなかった。2. Description of the Related Art A polymer having a highly branched structure radially from one core and having a narrow molecular weight distribution is called a dendrimer, and is characterized by low viscosity, high reactivity, high solubility, and low glass transition temperature. And its application has attracted attention. As the organosilicon dendrimer, for example, siloxane dendrimer Perevlov et al., Dokl. Aka
d.Nauk. SSSR 309, 367 (1989); Masamune et al., J. Am. Chem.
Soc. 112, 7077 (1990)}, carbosiloxane dendrimer {Kakimoto et al., Macromolecules 24, 3469 (1991);
JP-A-7-17981, Shaiko et al., Macromol.
Rapid Commun. 17,283 (1996)), carbosilane dendrimer {Luvers et al., Macromolecules 26, 963 (1
993); Japanese Patent Application Laid-Open No. 8-31205 is known. Among these, carbosiloxane dendrimers in which siloxane bonds and silalkylene bonds are alternately arranged are also disclosed {JP-A-7-17981; Shaiko et al., Macromol. Rapid Commun. 17, 283 (1)
996), these are limited to those using a silane compound in which a plurality of vinyl groups or allyl groups are bonded to one silicon atom as a core material of the dendrimer, and
There is a disadvantage that only a low molecular weight dendrimer having a small number of layers can be obtained. Further, the synthesis of a highly branched polymer in which siloxane bonds and silalkylene bonds are alternately arranged by a one-step polymerization method has also been disclosed.
See Am. Chem. Soc. 113, 4043 (1991). This method has a disadvantage that a dendrimer having a narrow molecular weight distribution cannot be obtained. That is, a carbosiloxane dendrimer having a highly branched structure in which siloxane bonds and silalkylene bonds are alternately arranged, capable of increasing the molecular weight, and having a narrow molecular weight distribution has not been known.
【0003】[0003]
【発明が解決しようとする課題】本発明者らは上記問題
点を解決すべく鋭意検討した結果、本発明に到達した。
即ち、本発明の目的は、ポリシロキサン構造を核とし
て、シロキサン結合とシルアルキレン結合が交互に配列
した高分岐構造を有し、高分子量化が可能であり、かつ
分子量分布の狭い新規なカルボシロキサンデンドリマー
を提供することにある。The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, have reached the present invention.
That is, an object of the present invention is to provide a novel carbosiloxane having a highly branched structure in which siloxane bonds and silalkylene bonds are alternately arranged with a polysiloxane structure as a nucleus, capable of increasing the molecular weight, and having a narrow molecular weight distribution. It is to provide a dendrimer.
【0004】[0004]
【問題を解決するための手段】本発明は、一般式:X1R1
aSiO(3-a)/2 {式中、R1は炭素原子数1〜10のアルキル基もしくは
アリール基であり、aは0〜2の整数であり、X1はi=1と
した場合の次式で示されるシリルアルキル基である。The present invention, in order to solve the problem] has the general formula: X 1 R 1
a SiO (3-a) / 2 where R 1 is an alkyl group or an aryl group having 1 to 10 carbon atoms, a is an integer of 0 to 2, and X 1 is i = 1 Is a silylalkyl group represented by the following formula:
【化3】 (式中、R1は炭素原子数1〜10のアルキル基もしくは
アリール基であり、R2は炭素原子数2〜10のアルキレ
ン基であり、R3は炭素原子数1〜10のアルキル基であ
り、Xi+1は上記シリルアルキル基または炭素原子数1〜
30の炭化水素基である。iは該シリルアルキル基の階
層を示している1〜10の整数であり、biは0〜3の整
数である。)}で示されるシロキサン単位を含有するケ
イ素原子数2以上のポリシロキサン構造を核に有し、
式:Embedded image (Wherein, R 1 is an alkyl group having 1 to 10 carbon atoms or an aryl group, R 2 is an alkylene group having 2 to 10 carbon atoms, and R 3 is an alkyl group having 1 to 10 carbon atoms. X i + 1 is the above silylalkyl group or 1 to 1 carbon atoms
30 hydrocarbon groups. i is an integer from 1 to 10, which shows the hierarchy of the silylalkyl group, b i is an integer of 0 to 3. ) Having a polysiloxane structure having two or more silicon atoms containing a siloxane unit represented by に as a nucleus;
formula:
【化4】 (式中、R1は炭素原子数1〜10のアルキル基もしくは
アリール基であり、R4は炭素原子数1〜30の炭化水素
基である。)で示されるシロキシ基を1個以上有するカ
ルボシロキサンデンドリマーに関する。Embedded image Wherein R 1 is an alkyl group or an aryl group having 1 to 10 carbon atoms, and R 4 is a hydrocarbon group having 1 to 30 carbon atoms. It relates to a siloxane dendrimer.
【0005】[0005]
【発明の実施の形態】本発明のカルボシロキサンデンド
リマーは、一般式:X1R1 aSiO(3-a)/2 で示される同種も
しくは異種のシロキサン単位を含有するケイ素原子数2
以上のポリシロキサン構造を核に有する化合物である。
上式中、R1は炭素原子数1〜10のアルキル基もしくは
アリール基であり、アルキル基としては、メチル基,エ
チル基,プロピル基,ブチル基,ペンチル基,イソプロ
ピル基,イソブチル基,シクロペンチル基,シクロヘキ
シル基が例示され、アリール基としては、フェニル基,
ナフチル基が例示される。これらの中でもメチル基が好
ましい。aは0〜2の整数である。X1はi=1とした場合の
次式で示されるシリルアルキル基である。Carbosiloxane dendrimer of the embodiment of the present invention have the general formula: X 1 R 1 a SiO ( 3-a) / 2 silicon atoms containing siloxane units of the same type or different represented by 2
It is a compound having the above-mentioned polysiloxane structure at its core.
In the above formula, R 1 is an alkyl group or an aryl group having 1 to 10 carbon atoms, and examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, an isopropyl group, an isobutyl group and a cyclopentyl group. , A cyclohexyl group, and an aryl group includes a phenyl group,
An example is a naphthyl group. Among these, a methyl group is preferred. a is an integer of 0 to 2. X 1 is a silylalkyl group represented by the following formula when i = 1.
【化5】 上式中、R2は炭素原子数2〜10のアルキレン基であ
り、エチレン基,プロピレン基,ブチレン基,ヘキシレ
ン基などの直鎖状アルキレン基;メチルメチレン基,メ
チルエチレン基,1−メチルペンチレン基,1,4−ジ
メチルブチレン基などの分岐状アルキレン基が例示され
る。これらの中でも、エチレン基,メチルメチレン基,
ヘキシレン基,1−メチルペンチレン基,1,4−ジメ
チルブチレン基が好ましい。R3は炭素原子数1〜10の
アルキル基であり、メチル基,エチル基,プロピル基,
ブチル基,ペンチル基,イソプロピル基が例示される。
これらの中でもメチル基またはエチル基が好ましい。R1
は前記と同じである。Xi+1は上記シリルアルキル基また
は炭素原子数1〜30の非置換の炭化水素基であり、該
炭化水素基として具体的には、メチル基,エチル基,プ
ロピル基,ブチル基,ペンチル基,イソプロピル基,イ
ソブチル基,シクロペンチル基,シクロヘキシル基など
のアルキル基;フェニル基,ナフチル基,トリル基,キ
シリル基などのアリール基;ビニル基,アリル基、ブテ
ニル基、ペンテニル基,へキセニル基などのアルケニル
基;ベンジル基,フェネチル基などのアラルキル基が例
示される。iは1〜10の整数であり、biは0〜3の整
数である。ここで、iは該シリルアルキル基の階層数、
即ち、該シリルアルキル基の繰り返し数を示している。
従って、階層数が1である場合に、該シリルアルキル基
は一般式:Embedded image In the above formula, R 2 is an alkylene group having 2 to 10 carbon atoms, and a linear alkylene group such as ethylene group, propylene group, butylene group, hexylene group; methylmethylene group, methylethylene group, 1-methylpentene Examples thereof include a branched alkylene group such as a ren group and a 1,4-dimethylbutylene group. Among them, ethylene group, methylmethylene group,
Hexylene, 1-methylpentylene and 1,4-dimethylbutylene are preferred. R 3 is an alkyl group having 1 to 10 carbon atoms, such as a methyl group, an ethyl group, a propyl group,
A butyl group, a pentyl group and an isopropyl group are exemplified.
Among these, a methyl group or an ethyl group is preferable. R 1
Is the same as above. X i + 1 is the silylalkyl group or an unsubstituted hydrocarbon group having 1 to 30 carbon atoms, and specific examples of the hydrocarbon group include a methyl group, an ethyl group, a propyl group, a butyl group and a pentyl group. Alkyl groups such as phenyl, isopropyl, isobutyl, cyclopentyl and cyclohexyl groups; aryl groups such as phenyl, naphthyl, tolyl and xylyl groups; vinyl groups, allyl groups, butenyl groups, pentenyl groups and hexenyl groups An alkenyl group; an aralkyl group such as a benzyl group and a phenethyl group; i represents an integer of 1 to 10, b i is an integer of 0 to 3. Here, i is the number of levels of the silylalkyl group,
That is, it indicates the number of repetitions of the silylalkyl group.
Therefore, when the number of levels is 1, the silylalkyl group has the general formula:
【化6】 で示され、階層数が2である場合に、該シリルアルキル
基は一般式:Embedded image In the case where the number of levels is 2, the silylalkyl group is represented by the general formula:
【化7】 で示され、階層数が3である場合に、該シリルアルキル
基は一般式:Embedded image In the case where the number of classes is 3, the silylalkyl group is represented by the general formula:
【化8】 で示される。上式中、R1, R2, R3, b1, b2, b3は前記と
同じであり、R4は炭素原子数1〜30の炭化水素基であ
り、前記Xi+1で例示したのと同様の基が挙げられる。
尚、本発明のカルボシロキサンデンドリマーは、1分子
中に、式:Embedded image Indicated by In the above formulas, R 1, R 2, R 3, b 1, b 2, b 3 are as defined above, R 4 is a hydrocarbon group having 1 to 30 carbon atoms, in the X i + 1 The same groups as exemplified above can be mentioned.
The carbosiloxane dendrimer of the present invention has the formula:
【化9】 (式中、R1およびR4は前記と同じである。)で示される
シロキシ基を1個以上有する。Embedded image (In the formula, R 1 and R 4 are the same as described above.)
【0006】本発明のカルボシロキサンデンドリマーの
核であるポリシロキサン構造は、上記一般式:X1R1 aSiO
(3-a)/2(式中、X1,R1およびaは前記と同じであ
る。)で示されるシロキサン単位を含有するケイ素原子
数2以上のシロキサン構造であればよく、一般式:X1R1
aSiO(3-a)/2(式中、X1,R1およびaは前記と同じであ
る。)で示されるシロキサン単位からなるポリシロキサ
ン構造の他、該一般式で示されるシロキサン単位と一般
式:R1 cSiO(4-c)/2(式中、R1は前記と同じであり、c
は0〜3の整数である。)で示されるシロキサン単位か
らなるポリシロキサン構造が挙げられる。このような本
発明のカルボシロキサンデンドリマーの核を構成するシ
ロキサン単位としては、一般式: X1R1 2SiO1/2またはR1
3SiO1/2で示される1官能シロキサン単位(M単位),
一般式:X1R1SiO2/2またはR1 2SiO2/2で示される2官能
シロキサン単位(D単位),一般式:X1SiO3/2またはR1
SiO3/2で示される3官能シロキサン単位(T単位),Si
O4/2で示される4官能シロキサン単位(Q単位)があ
る。このようなシロキサン単位が結合したポリシロキサ
ン構造を核とし、この核から放射状に高度な枝分かれ構
造を有する本発明のカルボシロキサンデンドリマーとし
ては、次の一般式で示される化合物が挙げられる。式
中、X1およびR1は前記と同じであり、m, n, x, y, z,
p, q, r, s, tは一分子中に存在するシロキサン単位数
を示す1以上の数であるが、(p+q)は5以上、(s+t)
は6以上である。The polysiloxane structure which is the core of the carbosiloxane dendrimer of the present invention has the above general formula: X 1 R 1 a SiO
(3-a) / 2 (wherein X 1 , R 1 and a are the same as described above) as long as it is a siloxane structure having two or more silicon atoms containing a siloxane unit, and represented by the general formula: X 1 R 1
a SiO (3-a) / 2 (wherein X 1 , R 1 and a are the same as those described above), and a siloxane unit represented by the general formula. General formula: R 1 c SiO (4-c) / 2 (wherein, R 1 is the same as described above, and c
Is an integer of 0 to 3. )), A polysiloxane structure comprising a siloxane unit represented by the following formula: The siloxane units that constitute the nucleus of the carbosiloxane dendrimer of the present invention, the general formula: X 1 R 1 2 SiO 1/2 or R 1
Monofunctional siloxane unit (M unit) represented by 3 SiO 1/2 ,
General formula: X 1 R 1 SiO 2/2 or R 1 2 2 functional siloxane unit represented by SiO 2/2 (D unit), the general formula: X 1 SiO 3/2 or R 1
Trifunctional siloxane unit (T unit) represented by SiO 3/2 , Si
There is a tetrafunctional siloxane unit (Q unit) represented by O 4/2 . The carbosiloxane dendrimer of the present invention having a polysiloxane structure having such a siloxane unit bonded as a nucleus and having a highly branched structure radially from the nucleus includes a compound represented by the following general formula. In the formula, X 1 and R 1 are the same as described above, and m, n, x, y, z,
p, q, r, s, and t are 1 or more indicating the number of siloxane units present in one molecule, (p + q) is 5 or more, and (s + t)
Is 6 or more.
【化10】 Embedded image
【化11】 Embedded image
【化12】 Embedded image
【化13】 Embedded image
【化14】 Embedded image
【化15】 Embedded image
【化16】 Embedded image
【化17】 (X1R1 2SiO1/2)p(R1SiO3/2)q (X1SiO3/2)r (X1R1 2SiO1/2)s(SiO4/2)t 本発明のカルボシロキサンデンドリマーは単一化合物も
しくはそれらの混合物であるが、ポリスチレン換算の分
子量における分散度指数、即ち重量平均分子量と数平均
分子量の商(Mw/Mn)が2以下であることが好まし
い。Embedded image (X 1 R 1 2 SiO 1/2 ) p (R 1 SiO 3/2 ) q (X 1 SiO 3/2 ) r (X 1 R 1 2 SiO 1/2 ) s (SiO 4/2 ) t The carbosiloxane dendrimer of the present invention is a single compound or a mixture thereof, and preferably has a polydispersity-based molecular weight dispersion index, that is, the quotient (Mw / Mn) of the weight average molecular weight and the number average molecular weight of 2 or less.
【0007】このような本発明のカルボシロキサンデン
ドリマーとして具体的には、下記平均分子式で示される
重合体が挙げられる。Specific examples of the carbosiloxane dendrimer of the present invention include polymers represented by the following average molecular formula.
【化18】 Embedded image
【化19】 Embedded image
【化20】 Embedded image
【化21】 Embedded image
【化22】 Embedded image
【化23】 Embedded image
【化24】 Embedded image
【化25】 Embedded image
【化26】 Embedded image
【化27】 Embedded image
【0008】本発明のカルボシロキサンデンドリマー
は、例えば、一般式:HR1 aSiO(3-a)/2(式中、R1および
aは前記と同じである。)で示されるケイ素原子数2以
上のケイ素原子結合水素原子含有ポリシロキサンを出発
物質として、下記の(x)〜(w)工程のいずれかを少
なくとも1回以上行い、最後に(z)工程もしくは
(w)工程を行うことにより製造することができる。具
体的には、(z)工程のみを行う方法や、(x)工程と
(y)工程を1回以上交互に行い、次いで(y)工程の
後に(z)工程を行うか、もしくは(x)工程の後に
(w)工程を行う方法が挙げられる。 (x)工程:上記出発物質または下記(y)工程で生成
するケイ素原子結合水素原子含有カルボシロキサンデン
ドリマーと、一般式:R5Si(OR3)3(式中、R3は前記と同
じであり、R5は炭素原子数2〜10のアルケニル基であ
る。)で示されるアルケニル基含有アルコキシシランと
を、白金系遷移金属触媒の存在下に付加反応させる工
程。 (y)工程:上記(x)工程で得られたアルコキシ基含
有カルボシロキサンデンドリマーと、一般式:The carbosiloxane dendrimer of the present invention has, for example, the general formula: HR 1 a SiO (3-a) / 2 (wherein R 1 and
a is the same as above. ), The starting material is a silicon-bonded hydrogen atom-containing polysiloxane having 2 or more silicon atoms, and any one of the following steps (x) to (w) is performed at least once, and finally the step (z) or It can be manufactured by performing the step (w). Specifically, a method in which only the step (z) is performed, a step (x) and a step (y) are alternately performed at least once, and then the step (z) is performed after the step (y), or (x )) Followed by the step (w). Step (x): the starting material or a silicon-bonded hydrogen atom-containing carbosiloxane dendrimer produced in the following step (y) and a general formula: R 5 Si (OR 3 ) 3 (wherein R 3 is the same as described above) R 5 is an alkenyl group having 2 to 10 carbon atoms.) In the presence of a platinum-based transition metal catalyst. Step (y): the alkoxy group-containing carbosiloxane dendrimer obtained in the above step (x) and a general formula:
【化28】 (式中、R1は前記と同じである。)で示されるジシロキ
サンを酸性条件下に反応させる工程。 (z)工程:上記出発物質または上記(y)工程で得ら
れたカルボシロキサンデンドリマーと、一分子中に1個
の非共役アルケニル基を有する化合物とを、白金系遷移
金属触媒の存在下に付加反応させる工程。 (w)工程:上記(x)工程で得られたアルコキシ基含
有カルボシロキサンデンドリマーと、一般式:Embedded image (Wherein R 1 is the same as defined above) under the acidic condition. Step (z): adding the starting material or the carbosiloxane dendrimer obtained in step (y) and a compound having one non-conjugated alkenyl group in one molecule in the presence of a platinum-based transition metal catalyst The step of reacting. Step (w): the alkoxy group-containing carbosiloxane dendrimer obtained in the above step (x) and a general formula:
【化29】 (式中、R1およびR4は前記と同じである。)で示される
ジシロキサンを酸性条件下に反応させる工程。Embedded image Wherein R 1 and R 4 are as defined above, under acidic conditions.
【0009】上記(x)工程および(z)工程で使用さ
れる白金系遷移金属触媒としては、塩化白金酸,アルコ
ール変性塩化白金酸,白金のオレフィン錯体,白金のジ
ケトナート錯体が例示される。この白金系遷移金属触媒
を用いて付加反応を行う際には、原料中のケイ素原子結
合水素原子を完全に反応させるために、やや過剰のアル
ケニル基含有化合物を反応させるのが好ましい。過剰量
のアルケニル基含有化合物は反応後、減圧蒸留等によっ
て分別回収することができる。またこの付加反応は常温
もしくは加熱条件下に行うことができ、反応を妨害しな
い溶媒を用いて行うこともできる。尚、(x)工程で使
用されるアルケニル基含有アルコキシシランとしては、
ビニルトリメトキシシラン,ビニルトリエトキシシラ
ン,ヘキセニルトリメトキシシラン,ヘキセニルトリエ
トキシシランが例示され、(z)工程で使用される一分
子中に1個の非共役アルケニル基を有する化合物として
は、ブテン,イソブテン,ヘキセン,オクテン,スチレ
ン,α−メチルスチレン,ビニルトリス(トリメチルシ
ロキシ)シラン,ビニルビス(トリメチルシロキシ)メ
トキシシランが例示される。Examples of the platinum-based transition metal catalyst used in the steps (x) and (z) include chloroplatinic acid, alcohol-modified chloroplatinic acid, an olefin complex of platinum, and a diketonate complex of platinum. When performing an addition reaction using this platinum-based transition metal catalyst, it is preferable to react a slightly excessive alkenyl group-containing compound in order to completely react the silicon-bonded hydrogen atoms in the raw material. After the reaction, an excess amount of the alkenyl group-containing compound can be separated and recovered by distillation under reduced pressure or the like. This addition reaction can be performed at room temperature or under heating conditions, and can also be performed using a solvent that does not interfere with the reaction. The alkenyl group-containing alkoxysilane used in the step (x) includes
Examples of vinyltrimethoxysilane, vinyltriethoxysilane, hexenyltrimethoxysilane, and hexenyltriethoxysilane include compounds having one non-conjugated alkenyl group in one molecule used in the step (z), such as butene; Isobutene, hexene, octene, styrene, α-methylstyrene, vinyltris (trimethylsiloxy) silane, and vinylbis (trimethylsiloxy) methoxysilane are exemplified.
【0010】上記(y)工程および(w)工程において
酸性条件を作るのに使われる酸性物質としては、塩酸,
硫酸,カルボン酸類,スルホン酸類またはその混合物が
好ましい。尚、(y)工程では、ケイ素原子結合水素原
子がアルコール分解することにより、本発明のカルボシ
ロキサンデンドリマーに下記式で示されるモノアルコキ
シシロキシ基が少量含まれることがある。The acidic substance used to create the acidic conditions in the above steps (y) and (w) includes hydrochloric acid,
Sulfuric acid, carboxylic acids, sulfonic acids or mixtures thereof are preferred. In the step (y), the carbosiloxane dendrimer of the present invention may contain a small amount of a monoalkoxysiloxy group represented by the following formula due to alcohol decomposition of the silicon-bonded hydrogen atom.
【化30】 (式中、R1およびR3は前記と同じである。)Embedded image (In the formula, R 1 and R 3 are the same as described above.)
【0011】以上のような本発明のカルボシロキサンデ
ンドリマーは、ポリシロキサン構造を核として、シロキ
サン結合とシルアルキレン結合が交互に配列した高分岐
構造を有し、高分子量化が可能であり、かつ分子量分布
が狭いという特徴を有する。さらに本発明のカルボシロ
キサンデンドリマーは、分岐構造のすべての末端が非置
換の炭化水素基であるため、高分岐構造を有するにもか
かわらず粘度が低く、線状ポリシロキサンと同程度の低
いガラス転移温度を有し、しかも結晶化を起こしにくい
という特徴を有する。このため、本発明のカルボシロキ
サンデンドリマーは、離型剤,潤滑剤,樹脂添加剤とし
て有用である。The carbosiloxane dendrimer of the present invention as described above has a highly branched structure in which a siloxane bond and a silalkylene bond are alternately arranged with a polysiloxane structure as a nucleus. It has the characteristic that the distribution is narrow. Further, since the carbosiloxane dendrimer of the present invention has an unsubstituted hydrocarbon group at all terminals of the branched structure, it has a low viscosity despite having a highly branched structure, and has a glass transition as low as linear polysiloxane. It has a characteristic that it has a temperature and hardly causes crystallization. Therefore, the carbosiloxane dendrimer of the present invention is useful as a release agent, a lubricant, and a resin additive.
【0012】[0012]
【実施例】以下、本発明を実施例により説明する。実施
例中、本発明のカルボシロキサンデンドリマーの同定
は、29Si−核磁気共鳴分析およびゲル透過クロマトグ
ラフィー分析(溶媒:トルエン)により行った。The present invention will be described below with reference to examples. In the examples, the carbosiloxane dendrimer of the present invention was identified by 29 Si-nuclear magnetic resonance analysis and gel permeation chromatography analysis (solvent: toluene).
【0013】[0013]
【実施例1】撹拌装置,温度計,還流冷却管,滴下ロー
トを取り付けた100ml4つ口フラスコに、ビニルト
リス(トリメチルシロキシ)シラン35.5gと塩化白
金酸3%イソプロパノール溶液0.04gを投入し、こ
れらを撹拌しながら100℃に加熱した。これに、テト
ラキス(ジメチルシロキシ)シラン8.2gを、滴下ロ
ートを用いて反応温度が100℃を保つようにゆっくり
滴下した。滴下終了後、反応溶液を120℃で1時間加
熱した。冷却後、減圧濃縮したところ、40.5gの微
褐色液体が得られた。得られた液体の25℃での粘度は9
8センチストークスであり、示差走査熱量計により求め
たガラス転移温度は−85.1℃であり、また直鎖状の
ポリジメチルシロキサンに通常見られるような結晶化が
起きないことが確認された。この反応生成物を29Si−
核磁気共鳴分析により分析したところ、下記の平均分子
式で示されるカルボシロキサンデンドリマーであること
が判明した。またこのカルボシロキサンデンドリマー
は、ゲル透過クロマトグラフィーによるポリスチレン換
算数平均分子量が2180であり、分散度指数が1.0
6であることが確認された。Example 1 Into a 100 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel were charged 35.5 g of vinyltris (trimethylsiloxy) silane and 0.04 g of a 3% solution of chloroplatinic acid in isopropanol. These were heated to 100 ° C. with stirring. To this, 8.2 g of tetrakis (dimethylsiloxy) silane was slowly added dropwise using a dropping funnel so that the reaction temperature was kept at 100 ° C. After the addition was completed, the reaction solution was heated at 120 ° C. for 1 hour. After cooling, the mixture was concentrated under reduced pressure to obtain 40.5 g of a slightly brown liquid. The viscosity of the obtained liquid at 25 ° C. is 9
It was 8 centistokes, the glass transition temperature determined by a differential scanning calorimeter was -85.1 ° C, and it was confirmed that crystallization, which is usually found in linear polydimethylsiloxane, did not occur. This reaction product was converted to 29 Si-
Analysis by nuclear magnetic resonance analysis revealed that it was a carbosiloxane dendrimer represented by the following average molecular formula. The carbosiloxane dendrimer had a polystyrene reduced number average molecular weight of 2180 as determined by gel permeation chromatography and a dispersity index of 1.0.
It was confirmed to be 6.
【化31】 Embedded image
【0014】[0014]
【実施例2】撹拌装置、温度計、還流冷却管、滴下ロー
トを取り付けた200ml4つ口フラスコに、ビニルト
リメトキシシラン107gと塩化白金酸3%イソプロパ
ノール溶液0.04gを投入し、これらを撹拌しながら
100℃に加熱した。これに、テトラキス(ジメチルシ
ロキシ)シラン49.4gを、滴下ロートを用いて反応
温度が100℃を保つようにゆっくり滴下した。滴下終
了後、反応溶液を120℃で1時間加熱した。冷却後、
減圧濃縮したところ、138gの微褐色液体が得られ
た。これを中間体Aとした。次に、撹拌装置、温度計、
還流冷却管、滴下ロートを取り付けた2リットル4つ口
フラスコに、1,1,3,3−テトラメチル−1,3−ジビ
ニルジシロキサン210g、酢酸67.6gおよびトリ
フルオロメタンスルホン酸0.20gを投入してこれら
を撹拌しながら、50℃に昇温した。これに、上記で得
た中間体A120gを滴下ロートを用いて1時間かけて
ゆっくり滴下した。滴下終了後、反応溶液を60℃で5
時間撹拌した。冷却後、反応溶液を分液ロートに移し、
水200mlで2回、飽和炭酸水素ナトリウム水溶液1
00mlで1回洗浄して、無水硫酸マグネシウムで乾燥
した。生成した固形分を濾別し、得られた溶液を減圧濃
縮したところ、212gの無色透明液体が得られた。こ
の反応生成物を29Si−核磁気共鳴分析により分析した
ところ、下記の平均分子式で示される、一分子中に約1
2個のビニル基を有するカルボシロキサンデンドリマー
であることが判明した。またこのカルボシロキサンデン
ドリマーは、ゲル透過クロマトグラフィーによるポリス
チレン換算数平均分子量が1211であり、分散度指数
が1.28であることが確認された。Example 2 107 g of vinyltrimethoxysilane and 0.04 g of a 3% solution of chloroplatinic acid in isopropanol were charged into a 200 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel. While heating to 100 ° C. To this, 49.4 g of tetrakis (dimethylsiloxy) silane was slowly added dropwise using a dropping funnel so that the reaction temperature was kept at 100 ° C. After the addition was completed, the reaction solution was heated at 120 ° C. for 1 hour. After cooling,
Upon concentration under reduced pressure, 138 g of a light brown liquid was obtained. This was designated as Intermediate A. Next, a stirrer, thermometer,
In a 2-liter four-necked flask equipped with a reflux condenser and a dropping funnel, 210 g of 1,1,3,3-tetramethyl-1,3-divinyldisiloxane, 67.6 g of acetic acid and 0.20 g of trifluoromethanesulfonic acid were placed. The temperature was raised to 50 ° C. while stirring and stirring. To this, 120 g of the intermediate A obtained above was slowly dropped over 1 hour using a dropping funnel. After completion of the dropwise addition, the reaction solution was heated at
Stirred for hours. After cooling, transfer the reaction solution to a separatory funnel,
2 times with 200 ml of water, 1 aqueous saturated sodium hydrogen carbonate solution
Washed once with 00 ml and dried over anhydrous magnesium sulfate. The generated solids were separated by filtration, and the obtained solution was concentrated under reduced pressure to obtain 212 g of a colorless transparent liquid. When this reaction product was analyzed by 29 Si-nuclear magnetic resonance analysis, it was found that one molecule per molecule represented by the following average molecular formula was obtained.
It was found to be a carbosiloxane dendrimer having two vinyl groups. The carbosiloxane dendrimer was found to have a polystyrene reduced number average molecular weight of 1211 by gel permeation chromatography and a dispersity index of 1.28.
【化32】 Embedded image
【0015】[0015]
【実施例3】撹拌装置,温度計,還流冷却管,滴下ロー
トを取り付けた300ml4つ口フラスコに、ビニルト
リメトキシシラン182gと塩化白金酸3%イソプロパ
ノール溶液0.28gを投入し、これらを撹拌しながら
100℃に加熱した。これに、メチルトリス(ジメチル
シロキシ)シラン100gを、滴下ロートを用いて反応
温度が100℃を保つようにゆっくり滴下した。滴下終
了後、反応溶液を120℃で1時間加熱した。冷却後、
反応溶液を減圧濃縮したところ、266gの微褐色液体
が得られた。これを中間体Eとした。次に、撹拌装置、
温度計、還流冷却管、滴下ロートを取り付けた500m
l4つ口フラスコに、1,1,3,3−テトラメチルジシ
ロキサン127g、濃塩酸33ml、水66 ml
およびイソプロパノール66mlを投入してこれらを撹
拌した。次いでこれに、上記で得た中間体E100gを
滴下ロートを用いて1時間かけてゆっくり滴下した。滴
下終了後、反応溶液を室温で1時間撹拌した。反応溶液
を分液ロートに移して下層を分取した後、残った上層液
を水30mlで2回、飽和炭酸水素ナトリウム水溶液3
0mlで1回洗浄して、無水硫酸ナトリウムで乾燥し
た。固形分を濾別し、得られた溶液を減圧濃縮したとこ
ろ、156gの無色透明液体が得られた。これを中間体
Fとした。最後に、撹拌装置、温度計、還流冷却管、滴
下ロートを取り付けた100ml4つ口フラスコに、上
記で得た中間体F30.0gと塩化白金酸3%イソプロ
パノール溶液0.03gを投入し、これらを撹拌しなが
ら100℃に加熱した。これに、ヘキセン24.6g
を、滴下ロートを用いて反応温度が100℃を保つよう
にゆっくり滴下した。滴下終了後、反応溶液を100℃
で1時間加熱した。冷却後、反応溶液を減圧濃縮したと
ころ、44.4gの微褐色液体が得られた。この反応生
成物を29Si−核磁気共鳴分析により分析したところ、
下記の平均分子式で示されるカルボシロキサンデンドリ
マーであることが判明した。またこのカルボシロキサン
デンドリマーは、ゲル透過クロマトグラフィーによるポ
リスチレン換算数平均分子量が2476であり、分散度
指数が1.08であることが確認された。EXAMPLE 3 182 g of vinyltrimethoxysilane and 0.28 g of a 3% solution of chloroplatinic acid in isopropanol were charged into a 300 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel. While heating to 100 ° C. To this, 100 g of methyltris (dimethylsiloxy) silane was slowly added dropwise using a dropping funnel so that the reaction temperature was kept at 100 ° C. After the addition was completed, the reaction solution was heated at 120 ° C. for 1 hour. After cooling,
When the reaction solution was concentrated under reduced pressure, 266 g of a slightly brown liquid was obtained. This was designated as Intermediate E. Next, a stirring device,
500m equipped with thermometer, reflux condenser and dropping funnel
In a four-necked flask, 127 g of 1,1,3,3-tetramethyldisiloxane, 33 ml of concentrated hydrochloric acid, 66 ml of water
And 66 ml of isopropanol were charged and stirred. Next, 100 g of the intermediate E obtained above was slowly added dropwise over 1 hour using a dropping funnel. After the addition was completed, the reaction solution was stirred at room temperature for 1 hour. After the reaction solution was transferred to a separating funnel and the lower layer was separated, the remaining upper layer solution was washed twice with 30 ml of water and saturated aqueous sodium hydrogen carbonate solution 3 times.
It was washed once with 0 ml and dried over anhydrous sodium sulfate. The solid was filtered off, and the obtained solution was concentrated under reduced pressure to obtain 156 g of a colorless transparent liquid. This was designated as Intermediate F. Finally, 30.0 g of the intermediate F obtained above and 0.03 g of a 3% chloroplatinic acid isopropanol solution were charged into a 100 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel. Heat to 100 ° C. with stirring. Add 24.6 g of hexene
Was slowly added dropwise using a dropping funnel so that the reaction temperature was maintained at 100 ° C. After completion of the dropwise addition, the reaction solution is heated to 100 ° C.
For 1 hour. After cooling, the reaction solution was concentrated under reduced pressure to obtain 44.4 g of a slightly brown liquid. When the reaction product was analyzed by 29 Si-nuclear magnetic resonance analysis,
It was found to be a carbosiloxane dendrimer represented by the following average molecular formula. The carbosiloxane dendrimer was confirmed to have a number average molecular weight in terms of polystyrene of 2476 by gel permeation chromatography and a dispersity index of 1.08.
【化33】 Embedded image
【0016】[0016]
【実施例4】撹拌装置,温度計,還流冷却管,滴下ロー
トを取り付けた200ml4つ口フラスコに、ビニルト
リメトキシシラン121gと塩化白金酸3%イソプロパ
ノール溶液0.2gを投入し、これらを撹拌しながら1
00℃に加熱した。これに、1,1,3,3−テトラメチ
ルジシロキサン50gを、滴下ロートを用いて反応温度
が100℃を保つようにゆっくり滴下した。滴下終了
後、反応溶液を120℃で1時間加熱した。冷却後、反
応溶液を減圧濃縮したところ、158gの微褐色液体が
得られた。これを中間体Gとした。次に、撹拌装置、温
度計、還流冷却管、滴下ロートを取り付けた1リットル
4つ口フラスコに、1,1,3,3−テトラメチルジシロ
キサン180g、濃塩酸50ml、水100mlおよび
イソプロパノール100mlを投入してこれらを撹拌し
た。これに、上記で得た中間体G158gを滴下ロート
を用いて1時間かけてゆっくり滴下した。滴下終了後、
反応溶液を室温で1時間撹拌した。反応溶液を分液ロー
トに移して下層を分取した後、残った上層液を水100
mlで2回、飽和炭酸水素ナトリウム水溶液100ml
で1回洗浄して、無水硫酸ナトリウムで乾燥した。固形
分を濾別し、得られた溶液を減圧濃縮したところ、23
3gの無色透明液体が得られた。これを中間体Hとし
た。最後に、撹拌装置,温度計,還流冷却管,滴下ロー
トを取り付けた200ml4つ口フラスコに、ビニルト
リス(トリメチルシロキシ)シラン133gと塩化白金
酸3%イソプロパノール溶液0.09gを投入し、これ
らを撹拌しながら100℃に加熱した。これに、上記で
得た中間体H40.0gを、滴下ロートを用いて反応温
度が100℃を保つようにゆっくり滴下した。滴下終了
後、反応溶液を120℃で1時間加熱した。冷却後、減
圧濃縮したところ、127gの微褐色液体が得られた。
この反応生成物を29Si−核磁気共鳴分析により分析し
たところ、下記の平均分子式で示されるカルボシロキサ
ンデンドリマーであることが判明した。またこのカルボ
シロキサンデンドリマーは、ゲル透過クロマトグラフィ
ーによるポリスチレン換算数平均分子量が2911であ
り、分散度指数が1.08であることが確認された。EXAMPLE 4 121 g of vinyltrimethoxysilane and 0.2 g of a 3% solution of chloroplatinic acid in isopropanol were charged into a 200 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel. While 1
Heated to 00 ° C. To this, 50 g of 1,1,3,3-tetramethyldisiloxane was slowly added dropwise using a dropping funnel so that the reaction temperature was maintained at 100 ° C. After the addition was completed, the reaction solution was heated at 120 ° C. for 1 hour. After cooling, the reaction solution was concentrated under reduced pressure to obtain 158 g of a slightly brown liquid. This was used as Intermediate G. Next, 180 g of 1,1,3,3-tetramethyldisiloxane, 50 ml of concentrated hydrochloric acid, 100 ml of water, and 100 ml of isopropanol were placed in a 1-liter four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel. These were charged and stirred. To this, 158 g of the intermediate G obtained above was slowly dropped over 1 hour using a dropping funnel. After dropping,
The reaction solution was stirred at room temperature for 1 hour. After the reaction solution was transferred to a separating funnel and the lower layer was separated, the remaining upper layer solution was washed with 100 ml of water.
twice with saturated sodium bicarbonate solution 100ml
And dried over anhydrous sodium sulfate. The solid was separated by filtration, and the obtained solution was concentrated under reduced pressure.
3 g of a clear, colorless liquid were obtained. This was designated as Intermediate H. Finally, 133 g of vinyltris (trimethylsiloxy) silane and 0.09 g of a 3% solution of chloroplatinic acid in isopropanol were charged into a 200 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel. While heating to 100 ° C. To this, 40.0 g of the intermediate H obtained above was slowly added dropwise using a dropping funnel so that the reaction temperature was maintained at 100 ° C. After the addition was completed, the reaction solution was heated at 120 ° C. for 1 hour. After cooling, the mixture was concentrated under reduced pressure to obtain 127 g of a slightly brown liquid.
The reaction product was analyzed by 29 Si-nuclear magnetic resonance analysis and found to be a carbosiloxane dendrimer represented by the following average molecular formula. The carbosiloxane dendrimer was confirmed to have a polystyrene reduced number average molecular weight of 2911 by gel permeation chromatography and a dispersity index of 1.08.
【化34】 Embedded image
【0017】[0017]
【実施例5】撹拌装置,温度計,還流冷却管,滴下ロー
トを取り付けた100ml4つ口フラスコに、ビニルト
リメトキシシラン49.4gと塩化白金酸3%イソプロ
パノール溶液0.04gを投入し、これらを撹拌しなが
ら100℃に加熱した。これに、平均分子式:EXAMPLE 5 49.4 g of vinyltrimethoxysilane and 0.04 g of a 3% chloroplatinic acid isopropanol solution were charged into a 100 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel. Heat to 100 ° C. with stirring. In addition, the average molecular formula:
【化35】 で示されるポリシロキサン30.0gを、滴下ロートを
用いて反応温度が100℃を保つようにゆっくり滴下し
た。滴下終了後、反応溶液を120℃で1時間加熱し
た。冷却後、反応溶液を減圧濃縮したところ、63.1
gの微褐色液体が得られた。これを中間体Kとした。次
に、撹拌装置、温度計、還流冷却管、滴下ロートを取り
付けた200ml4つ口フラスコに、1,1,3,3−テ
トラメチルジシロキサン33.9g、濃塩酸13ml、
水27mlおよびイソプロパノール27mlを投入して
これらを撹拌した。次いでこれに、上記で得た中間体K
40.0gを滴下ロートを用いて1時間かけてゆっくり
滴下した。滴下終了後、反応溶液を室温で1時間撹拌し
た。反応溶液を分液ロートに移して下層を分取した後、
残った上層液を水20mlで2回、飽和炭酸水素ナトリ
ウム水溶液20mlで1回洗浄して、無水硫酸ナトリウ
ムで乾燥した。固形分を濾別し、得られた溶液を減圧濃
縮したところ、45.4gの無色透明液体が得られた。
これを中間体Lとした。最後に、撹拌装置,温度計,還
流冷却管,滴下ロートを取り付けた100ml4つ口フ
ラスコに、α−メチルスチレン65.5gと塩化白金酸
3%イソプロパノール溶液0.04gを投入し、これら
を撹拌しながら100℃に加熱した。これに、上記で得
た中間体L24.0gを、滴下ロートを用いて反応温度
が100℃を保つようにゆっくり滴下した。滴下終了
後、反応溶液を120℃で1時間加熱した。冷却後、減
圧濃縮したところ、35.1gの微褐色液体が得られ
た。この反応生成物を29Si−核磁気共鳴分析により分
析したところ、下記の平均分子式で示されるカルボシロ
キサンデンドリマーであることが判明した。またこのカ
ルボシロキサンデンドリマーは、ゲル透過クロマトグラ
フィーによるポリスチレン換算数平均分子量が3830
であり、分散度指数が1.75であることが確認され
た。Embedded image Was slowly added dropwise using a dropping funnel so that the reaction temperature was maintained at 100 ° C. After the addition was completed, the reaction solution was heated at 120 ° C. for 1 hour. After cooling, the reaction solution was concentrated under reduced pressure to give 63.1.
g of a light brown liquid was obtained. This was designated as Intermediate K. Next, 33.9 g of 1,1,3,3-tetramethyldisiloxane, 13 ml of concentrated hydrochloric acid were placed in a 200 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel.
27 ml of water and 27 ml of isopropanol were charged and stirred. This is then added to the intermediate K obtained above
40.0 g was slowly added dropwise over 1 hour using a dropping funnel. After the addition was completed, the reaction solution was stirred at room temperature for 1 hour. After transferring the reaction solution to a separating funnel to separate the lower layer,
The remaining upper layer solution was washed twice with 20 ml of water and once with 20 ml of a saturated aqueous solution of sodium hydrogen carbonate, and dried over anhydrous sodium sulfate. The solid was filtered off, and the obtained solution was concentrated under reduced pressure to obtain 45.4 g of a colorless transparent liquid.
This was designated as Intermediate L. Finally, 65.5 g of α-methylstyrene and 0.04 g of a 3% solution of chloroplatinic acid in isopropanol were charged into a 100 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel. While heating to 100 ° C. To this, 24.0 g of the intermediate L obtained above was slowly added dropwise using a dropping funnel so that the reaction temperature was maintained at 100 ° C. After the addition was completed, the reaction solution was heated at 120 ° C. for 1 hour. After cooling, the mixture was concentrated under reduced pressure to obtain 35.1 g of a slightly brown liquid. The reaction product was analyzed by 29 Si-nuclear magnetic resonance analysis and found to be a carbosiloxane dendrimer represented by the following average molecular formula. The carbosiloxane dendrimer had a polystyrene reduced number average molecular weight of 3830 as determined by gel permeation chromatography.
And the dispersity index was confirmed to be 1.75.
【化36】 Embedded image
【0018】[0018]
【実施例6】撹拌装置、温度計、還流冷却管、滴下ロー
トを取り付けた500ml4つ口フラスコに、ビニルト
リメトキシシラン214gと塩化白金酸3%イソプロパ
ノール溶液0.16gを投入し、これらを撹拌しながら
100℃に加熱した。これに、平均組成式:{H(CH3)2Si
O1/2}10(SiO4/2)5 で示されるポリシロキサン100g
を、滴下ロートを用いて反応温度が100℃を保つよう
にゆっくり滴下した。滴下終了後、反応溶液を120℃
で1時間加熱した。冷却後、減圧濃縮したところ、23
4gの微褐色液体が得られた。これを中間体Mとした。
次に、撹拌装置、温度計、還流冷却管、滴下ロートを取
り付けた1000ml4つ口フラスコに、1,1,3,3
−テトラメチルジシロキサン468g、濃塩酸75m
l、水150mlおよびイソプロパノール150mlを
投入してこれらを撹拌した。これに、上記で得た中間体
M220gを滴下ロートを用いて1時間かけてゆっくり
滴下した。滴下終了後、反応溶液を室温で1時間撹拌し
た。反応溶液を分液ロートに移して下層を分取した後、
残った上層液を水100mlで2回、飽和炭酸水素ナト
リウム水溶液100mlで1回洗浄して、無水硫酸ナト
リウムで乾燥した。固形分を濾別し、得られた溶液を減
圧濃縮したところ、273gの無色透明液体が得られ
た。これを中間体Nとした。最後に、撹拌装置、温度
計、還流冷却管、滴下ロートを取り付けた200ml4
つ口フラスコに、ビニルトリス(トリメチルシロキシ)
シラン105gと塩化白金酸3%イソプロパノール溶液
0.07gを投入し、これらを撹拌しながら100℃に
加熱した。次いでこれに、上記で得た中間体N35.0
gを、滴下ロートを用いて反応温度が100℃を保つよ
うにゆっくり滴下した。滴下終了後、反応溶液を120
℃で1時間加熱した。冷却後、反応溶液を減圧濃縮した
ところ、80.3gの微褐色液体が得られた。この反応
生成物を29Si−核磁気共鳴分析により分析したとこ
ろ、下記の平均分子式で示されるカルボシロキサンデン
ドリマーであることが判明した。またこのカルボシロキ
サンデンドリマーは、ゲル透過クロマトグラフィーによ
るポリスチレン換算数平均分子量が6586であり、分
散度指数が1.14であることが確認された。Example 6 In a 500 ml four-necked flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, 214 g of vinyltrimethoxysilane and 0.16 g of a 3% solution of chloroplatinic acid in isopropanol were charged and stirred. While heating to 100 ° C. In addition, the average composition formula: {H (CH 3 ) 2 Si
100 g of a polysiloxane represented by O 1/2 } 10 (SiO 4/2 ) 5
Was slowly added dropwise using a dropping funnel so that the reaction temperature was maintained at 100 ° C. After completion of the dropwise addition, the reaction solution was heated to 120 ° C.
For 1 hour. After cooling, the mixture was concentrated under reduced pressure.
4 g of a light brown liquid were obtained. This was designated as Intermediate M.
Then, 1,1,3,3 was placed in a 1000 ml four-necked flask equipped with a stirrer, thermometer, reflux condenser, and dropping funnel.
468 g of tetramethyldisiloxane, 75 m of concentrated hydrochloric acid
l, 150 ml of water and 150 ml of isopropanol were charged and stirred. To this, the intermediate obtained above
M220g was slowly dripped over 1 hour using the dropping funnel. After the addition was completed, the reaction solution was stirred at room temperature for 1 hour. After transferring the reaction solution to a separating funnel to separate the lower layer,
The remaining upper layer solution was washed twice with 100 ml of water and once with 100 ml of a saturated aqueous solution of sodium hydrogen carbonate, and dried over anhydrous sodium sulfate. The solid content was separated by filtration, and the obtained solution was concentrated under reduced pressure to obtain 273 g of a colorless transparent liquid. This was designated as Intermediate N. Finally, 200 ml 4 equipped with a stirrer, thermometer, reflux condenser, and dropping funnel was added.
In a one-necked flask, vinyl tris (trimethylsiloxy)
105 g of silane and 0.07 g of a 3% solution of chloroplatinic acid in isopropanol were added, and these were heated to 100 ° C. with stirring. This was then added to the intermediate N35.0 obtained above.
g was slowly added dropwise using a dropping funnel so that the reaction temperature was maintained at 100 ° C. After completion of the dropwise addition, the reaction solution is
Heated at 0 ° C. for 1 hour. After cooling, the reaction solution was concentrated under reduced pressure to obtain 80.3 g of a slightly brown liquid. The reaction product was analyzed by 29 Si-nuclear magnetic resonance analysis and found to be a carbosiloxane dendrimer represented by the following average molecular formula. The carbosiloxane dendrimer was found to have a polystyrene reduced number average molecular weight of 6,586 as determined by gel permeation chromatography and a dispersity index of 1.14.
【化37】 Embedded image
【0019】[0019]
【発明の効果】本発明のカルボシロキサンデンドリマー
は、ポリシロキサン構造を核として、シロキサン結合と
シルアルキレン結合が交互に配列した高分岐構造を有
し、高分子量化が可能であり、かつ分子量分布が狭いと
いう特徴を有する。さらに本発明のカルボシロキサンデ
ンドリマーは、そのような高分岐構造を有するにもかか
わらず粘度が低く、線状ポリシロキサンと同程度の低い
ガラス転移温度を有し、しかも結晶化を起こしにくいと
いう特徴を有する。The carbosiloxane dendrimer of the present invention has a highly branched structure in which a siloxane bond and a silalkylene bond are alternately arranged with a polysiloxane structure as a nucleus, is capable of increasing the molecular weight, and has a molecular weight distribution. It has the characteristic of being narrow. Further, the carbosiloxane dendrimer of the present invention has such a characteristic that despite having such a highly branched structure, the viscosity is low, the glass transition temperature is as low as that of the linear polysiloxane, and crystallization hardly occurs. Have.
【図1】 図1は、実施例1で得られたカルボシロキサ
ンデンドリマーの29Si−核磁気共鳴スペクトルであ
る。FIG. 1 is a 29 Si-nuclear magnetic resonance spectrum of the carbosiloxane dendrimer obtained in Example 1.
【図2】 図2は、実施例2で得られたカルボシロキサ
ンデンドリマーの29Si−核磁気共鳴スペクトルであ
る。FIG. 2 is a 29 Si-nuclear magnetic resonance spectrum of the carbosiloxane dendrimer obtained in Example 2.
【図3】 図3は、実施例3で得られたカルボシロキサ
ンデンドリマーの29Si−核磁気共鳴スペクトルであ
る。FIG. 3 is a 29 Si-nuclear magnetic resonance spectrum of the carbosiloxane dendrimer obtained in Example 3.
【図4】 図4は、実施例4で得られたカルボシロキサ
ンデンドリマーの29Si−核磁気共鳴スペクトルであ
る。FIG. 4 is a 29 Si-nuclear magnetic resonance spectrum of the carbosiloxane dendrimer obtained in Example 4.
【図5】 図5は、実施例5で得られたカルボシロキサ
ンデンドリマーの29Si−核磁気共鳴スペクトルであ
る。FIG. 5 is a 29 Si-nuclear magnetic resonance spectrum of the carbosiloxane dendrimer obtained in Example 5.
【図6】 図6は、実施例6で得られたカルボシロキサ
ンデンドリマーの29Si−核磁気共鳴スペクトルであ
る。FIG. 6 is a 29 Si-nuclear magnetic resonance spectrum of the carbosiloxane dendrimer obtained in Example 6.
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4H049 VN01 VP10 VQ02 VQ79 VR21 VR23 VR41 VR43 VR44 VW02 4J035 CA01N HA01 HB10 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4H049 VN01 VP10 VQ02 VQ79 VR21 VR23 VR41 VR43 VR44 VW02 4J035 CA01N HA01 HB10
Claims (2)
アリール基であり、aは0〜2の整数であり、X1はi=1と
した場合の次式で示されるシリルアルキル基である。 【化1】 (式中、R1は炭素原子数1〜10のアルキル基もしくは
アリール基であり、R2は炭素原子数2〜10のアルキレ
ン基であり、R3は炭素原子数1〜10のアルキル基であ
り、Xi+1は上記シリルアルキル基または炭素原子数1〜
30の炭化水素基である。iは該シリルアルキル基の階
層を示している1〜10の整数であり、biは0〜3の整
数である。)}で示されるシロキサン単位を含有するケ
イ素原子数2以上のポリシロキサン構造を核に有し、
式: 【化2】 (式中、R1は炭素原子数1〜10のアルキル基もしくは
アリール基であり、R4は炭素原子数1〜30の炭化水素
基である。)で示されるシロキシ基を1個以上有するカ
ルボシロキサンデンドリマー。1. A general formula: X 1 R 1 a SiO (3-a) / 2 wherein R 1 is an alkyl group or an aryl group having 1 to 10 carbon atoms, and a is an integer of 0 to 2. And X 1 is a silylalkyl group represented by the following formula when i = 1. Embedded image (Wherein, R 1 is an alkyl group having 1 to 10 carbon atoms or an aryl group, R 2 is an alkylene group having 2 to 10 carbon atoms, and R 3 is an alkyl group having 1 to 10 carbon atoms. X i + 1 is the above silylalkyl group or 1 to 1 carbon atoms
30 hydrocarbon groups. i is an integer from 1 to 10, which shows the hierarchy of the silylalkyl group, b i is an integer of 0 to 3. ) Having a polysiloxane structure having two or more silicon atoms containing a siloxane unit represented by に as a nucleus;
Formula: Wherein R 1 is an alkyl group or an aryl group having 1 to 10 carbon atoms, and R 4 is a hydrocarbon group having 1 to 30 carbon atoms. Siloxane dendrimer.
2以下である請求項1記載のカルボシロキサンデンドリ
マー。2. The carbosiloxane dendrimer according to claim 1, which has a polystyrene equivalent molecular weight polydispersity index of 2 or less.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10230154A JP2000044579A (en) | 1998-07-31 | 1998-07-31 | Carbosiloxane dendrimer |
| US09/317,529 US6184407B1 (en) | 1998-05-29 | 1999-05-24 | Carbosiloxane dendrimers |
| CA002273131A CA2273131A1 (en) | 1998-05-29 | 1999-05-27 | Carbosiloxane dendrimers |
| KR1019990019587A KR100574573B1 (en) | 1998-05-29 | 1999-05-29 | Cabosiloxane Dendrimer |
| EP19990114567 EP0976775B1 (en) | 1998-07-31 | 1999-07-24 | Carbosiloxane dendrimers |
| DE69927644T DE69927644T2 (en) | 1998-07-31 | 1999-07-24 | Carbosiloxane dendrimer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10230154A JP2000044579A (en) | 1998-07-31 | 1998-07-31 | Carbosiloxane dendrimer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000044579A true JP2000044579A (en) | 2000-02-15 |
Family
ID=16903449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10230154A Pending JP2000044579A (en) | 1998-05-29 | 1998-07-31 | Carbosiloxane dendrimer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000044579A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040014018A (en) * | 2002-08-09 | 2004-02-14 | 김정균 | Synthetic method of Terpyridine-metal complex |
| JP2004532921A (en) * | 2001-06-11 | 2004-10-28 | ゼネラル・エレクトリック・カンパニイ | Branched organosilicone compounds |
| JP2007302721A (en) * | 2006-05-09 | 2007-11-22 | Tokyo Institute Of Technology | Siloxane derivatives and siloxane derivative-coated inorganic oxides |
| JP2011246706A (en) * | 2010-04-30 | 2011-12-08 | Dow Corning Toray Co Ltd | Novel organopolysiloxane, surfactant, emulsion composition, powder treatment agent, thickening agent of oil-based raw material, gelling agent, gel composition and cosmetic raw material comprising the organopolysiloxane, as well as, preparations for external use and cosmetics comprising the same |
| WO2014141578A1 (en) * | 2013-03-15 | 2014-09-18 | 信越化学工業株式会社 | Symmetrical hyperbranched silicone-modified polymerizable compound and preparation method modularizing same |
| US9980897B2 (en) | 2010-04-30 | 2018-05-29 | Dow Corning Toray Co., Ltd. | Organopolysiloxane and powder treatment agent, preparation for external use and cosmetic comprising the same |
-
1998
- 1998-07-31 JP JP10230154A patent/JP2000044579A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004532921A (en) * | 2001-06-11 | 2004-10-28 | ゼネラル・エレクトリック・カンパニイ | Branched organosilicone compounds |
| KR20040014018A (en) * | 2002-08-09 | 2004-02-14 | 김정균 | Synthetic method of Terpyridine-metal complex |
| JP2007302721A (en) * | 2006-05-09 | 2007-11-22 | Tokyo Institute Of Technology | Siloxane derivatives and siloxane derivative-coated inorganic oxides |
| JP2011246706A (en) * | 2010-04-30 | 2011-12-08 | Dow Corning Toray Co Ltd | Novel organopolysiloxane, surfactant, emulsion composition, powder treatment agent, thickening agent of oil-based raw material, gelling agent, gel composition and cosmetic raw material comprising the organopolysiloxane, as well as, preparations for external use and cosmetics comprising the same |
| US9475828B2 (en) | 2010-04-30 | 2016-10-25 | Dow Corning Toray Co., Ltd. | Organopolysiloxane and use thereof as surfactant, powder treatment agent, thickening agent of oil-based raw material or gelling agent. gel and emulsion compositions, as well as, preparations for external use and cosmetics comprising the same |
| US9980897B2 (en) | 2010-04-30 | 2018-05-29 | Dow Corning Toray Co., Ltd. | Organopolysiloxane and powder treatment agent, preparation for external use and cosmetic comprising the same |
| WO2014141578A1 (en) * | 2013-03-15 | 2014-09-18 | 信越化学工業株式会社 | Symmetrical hyperbranched silicone-modified polymerizable compound and preparation method modularizing same |
| JP2014198703A (en) * | 2013-03-15 | 2014-10-23 | 信越化学工業株式会社 | Symmetric hyperbranched silicone-modified polymerizable compound and modularized production method thereof |
| US9428527B2 (en) | 2013-03-15 | 2016-08-30 | Shin-Etsu Chemical Co., Ltd. | Symmetric hyperbranched type silicone-modified polymerizable compound, and its modularized preparation method |
| KR101752650B1 (en) | 2013-03-15 | 2017-06-30 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Symmetrical hyperbranched silicone-modified polymerizable compound and preparation method modularizing same |
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