JP2000078830A - Linear motor, stage device, and exposure device - Google Patents

Abstract

(57) [Problem] To provide a linear motor capable of driving a driving object in a two-dimensional direction without employing a two-stage structure. A linear motor (32) includes a magnetic pole unit (32A) that generates a magnetic flux in a series of gaps extending in a predetermined long stroke direction (Y-axis direction), and a magnetic pole unit formed by an electromagnetic interaction generated between the magnetic pole unit (32A) and the magnetic pole unit. And an armature unit 32B relatively driven in the Y-axis direction and a direction (X-axis direction) orthogonal to the Y-axis direction and the magnetic flux direction (Z-axis direction). When one of the magnetic pole unit 32A and the armature unit 32B is a stator and the other is a mover, the mover can be driven not only in the Y direction but also in the X direction. Therefore, by fixing the mover side to the object to be driven, the object to be driven can be driven in a two-dimensional direction without employing a two-stage structure.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a linear motor, a stage apparatus, and an exposure apparatus, and more particularly, to a guideless stage apparatus having no mechanical guide and suitable for driving a stage of the stage apparatus. A linear motor, and an exposure apparatus including the stage device as a mask or substrate driving device.

[0002]

2. Description of the Related Art Conventionally, in a lithography process for manufacturing a semiconductor device, a liquid crystal display device, or the like, a static exposure type projection exposure apparatus such as a so-called stepper or a scanning exposure type projection exposure apparatus such as a so-called scanning stepper. Is mainly used. In this type of projection exposure apparatus, a pattern of a mask or a reticle (hereinafter, collectively referred to as a “reticle”) on which a pattern is formed is formed on a substrate such as a wafer or a glass plate coated with a resist through a projection optical system. A substrate stage that holds the substrate and moves two-dimensionally is provided because it is necessary to transfer images sequentially to the shot areas. In the case of a scanning type exposure apparatus, a reticle stage for holding a reticle can be driven in the scanning direction.

In recent projection exposure apparatuses, a linear motor is used as a drive source for a reticle stage, a substrate stage, or the like due to a demand for improvement in throughput. However, in an exposure apparatus using such a linear motor as a driving source, there is a disadvantage that the main body column provided with the stage base vibrates due to the driving reaction force of the stage. Usually, since the projection optical system is held in the main body column, the vibration of the main body column deteriorates the superposition accuracy of the reticle and the substrate, increases the positioning settling time of the substrate stage, or deteriorates the positioning accuracy. There was an inconvenience. In addition, in the case of the scanning type exposure apparatus, there is an additional disadvantage that the synchronization settling time between the reticle stage and the substrate stage during the scanning exposure is increased or the synchronization accuracy is deteriorated.

In order to solve the above-described inconvenience, the applicant of the present application has separated a reaction force due to driving of the reticle stage from a frame and a substrate stage supporting a projection lens and the like of an exposure apparatus, and has a vibration caused by the movement of the reticle stage. Has previously proposed a stage mechanism that substantially eliminates the influence of the projection lens on the projection lens (see Japanese Patent Application Laid-Open No. 8-330224).

[0005]

However, the stage mechanism described in the above publication has the above-mentioned excellent effects, but on the other hand, the stage holding the reticle is movable mainly in the scanning direction by a predetermined stroke. Window frame), and this frame employs a so-called coarse / fine movement structure in which the frame is supported so as to be relatively movable in a small amount in the non-scanning direction with respect to the base support structure (stage base). There is also the disadvantage that there is.

When the substrate stage, which is an XY two-dimensional movement stage, is driven by a linear motor, the stage is driven along a movement guide having one of a scanning direction and a non-scanning direction as an axial direction. Need to be integrally driven along a guide having the other of the scanning direction and the non-scanning direction as the axial direction. For this reason, the reaction force at the time of driving the stage is transmitted through at least one of the guides to the base,
That is, it must be transmitted to a frame or the like that supports a projection lens or the like of the exposure apparatus.

Further, when a drive object is driven in a two-dimensional direction using a conventional linear motor, a two-stage structure in which the linear motors are arranged in two stages in two orthogonal axes is generally adopted. However, there is an inconvenience that such a two-stage structure cannot be adopted in a place where there is not enough space.

The present invention has been made under such circumstances, and a first object of the present invention is to adopt a two-stage structure,
An object of the present invention is to provide a linear motor that can drive a driving target in a two-dimensional direction.

A second object of the present invention is to provide a stage device which has a simple structure and drives the stage without a guide.

A third object of the present invention is to provide a main body column (exposure apparatus main body) caused by a reaction force generated by driving the stage.
It is an object of the present invention to provide an exposure apparatus capable of effectively suppressing vibration of light.

[0011]

As a method of two-dimensionally driving a stage by a guideless method, it is considered that a so-called planar motor is most commonly used as a stage driving source. However, when a planar motor is used as a stage drive source, the structure is complicated, and there are also many problems to be improved in terms of armature coil cooling, cost, etc. Is hard to say. Furthermore,
The planar motor also has a disadvantage that it is fundamentally difficult to apply thrust to the center of gravity of the stage to be driven.

Therefore, the inventor of the present application has searched for an alternative drive source, and as a result of earnest research, has come up with the idea that a linear motor can generate a force not only in a long stroke direction but also in a direction perpendicular thereto. I got it.

The present invention has been made based on the idea (new knowledge) obtained by the inventor, and employs the following configuration. That is,

A linear motor (32) according to the present invention includes a magnetic pole unit (32A) that generates a magnetic flux in a series of gaps extending in a predetermined long stroke direction; and an electromagnetic interaction generated between the magnetic pole unit (32A) and the magnetic pole unit. An armature unit (32B) driven relative to the magnetic pole unit in the long stroke direction, and in a direction different from the long stroke direction and the magnetic flux direction.

According to this, a magnetic pole unit that generates a magnetic flux in a series of gaps extending in a predetermined long stroke direction,
An armature unit provided corresponding to the magnetic pole unit can be relatively driven in a long stroke direction and in a direction different from the long stroke direction and the magnetic flux direction by an electromagnetic interaction generated between the two units.

For this reason, for example, when the driving direction different from the long stroke direction is a direction perpendicular to the long stroke direction and the magnetic flux direction (hereinafter, referred to as “short stroke direction” for convenience), the short direction is used. By generating the driving force in the stroke direction as the holding force, both units can be linearly driven in the long stroke direction while maintaining the positional relationship in the short stroke direction. Therefore, when one of the magnetic pole unit and the armature unit is the stator and the other is the mover, the mover does not run out. When the driving direction different from the long stroke direction is other than the short stroke direction, the driving force is used as a holding force, so that the driving force is applied as a holding force to the short stroke direction. While maintaining the positional relationship, both units can be linearly driven relative to each other in the long stroke direction.

Of course, by generating a driving force in a direction different from the above long stroke direction as a driving force, one of the magnetic pole unit and the armature unit can be a stator, and the other can be a long mover. It can be driven not only in the stroke direction but also in a different direction. In this case, the driving force in the direction different from the long stroke direction includes the long stroke direction and the component force in the direction orthogonal to the long stroke direction as the component force. Therefore, by fixing the mover side to the object to be driven, the object to be driven can be driven in a two-dimensional direction without employing a two-stage structure. Even in such a case, it is possible to set up.

As described above, when one of the magnetic pole unit and the armature unit is a stator and the other is a mover, the mover can be driven relative to the stator also in a direction perpendicular to the long stroke direction. The linear motor according to the present invention is hereinafter appropriately referred to as a “new linear motor”.

A first stage apparatus according to the present invention comprises a stage (RST) and a stage (RST).
a) a driving device that drives at least a first axis direction (Y-axis direction) along a), wherein the driving device is a new linear motor in which the first axis direction is set to the long stroke direction. (32) One or more linear motors including at least (32) are provided.

[0020] According to this, the driving device is provided with a new linear motor (3) in which the first axial direction is set to the long stroke direction.
Since one or two or more linear motors including at least 2) are provided, the stage can be driven by the driving device at a predetermined stroke in the first axial direction along the moving surface, and the stage is orthogonal to the first axis by the new linear motor. It becomes possible to finely drive in the second axis direction. When the driving device includes two linear motors including a new linear motor in which the first axis direction is set to the long stroke direction, the stage is moved in the rotational direction by making the thrust generated by both linear motors different. Can be driven minutely. Therefore, it is possible to realize a guideless stage device having a simple structure that is not a coarse / fine movement structure and can drive the stage in the first axis direction while finely adjusting the position of the stage in the second axis direction and the rotation direction. .

Here, "including at least a new linear motor" means that the driving device only needs to include at least one new linear motor whose long stroke direction is set to the first axial direction. That is, using only one new linear motor, the stage may be driven along the moving surface at a predetermined stroke in the first axis direction and may be minutely driven in the second axis direction. Alternatively, a driving device is constituted by a combination of a known linear motor and a new linear motor, and the stage is driven along the moving surface by a predetermined stroke in the first axial direction and finely driven in the second axial direction and the rotating direction. Alternatively, the stage may be similarly driven using a pair of new linear motors.

A second stage apparatus according to the present invention comprises a stage (PST) and a stage (24
a) a driving device for driving in a first axis direction (Y-axis direction) and a second axis direction (X-axis direction) perpendicular to the first axis direction along a). The first axis linear motor (6
0, 62), and a new linear motor (66) in which the long stroke direction for driving the first axis linear motor and the stage in a second axis direction orthogonal to the first axis is set in the second axis direction. ), And a second-axis linear motor (64, 66) including at least

Here, the "second-axis linear motor including at least a new linear motor" means that the second-axis linear motor should include at least one new linear motor, as described above. .

According to this, the stage is driven in the second axis direction integrally with the first axis linear motor by the second axis linear motor constituting the driving device. For this reason, the stage is integrated with the linear motor for the first axis by the linear motor for the second axis,
It is possible to drive in the second axial direction while finely adjusting the positions in the axial direction and the rotational direction. In addition, a new linear motor included in the second-axis linear motor is used to offset the first-axis linear motor so as to cancel the reaction force when the stage is driven by the first-axis linear motor. A compensating force in the one axis direction can be provided, and the linear motor for the first axis can be held at a fixed position in the first axis direction.

A first exposure apparatus according to the present invention comprises a mask
(R) and an exposure apparatus for synchronously moving the substrate (P) in a one-dimensional direction to transfer the pattern of the mask onto the substrate, wherein the first stage device according to the present invention includes the mask and It is characterized in that it is provided as a driving device for at least one of the substrates.

According to this, since the first stage device according to the present invention is provided as a driving device for at least one of the mask and the substrate, the first axis direction is made coincident with the scanning direction (one-dimensional direction). At least one of the mask stage on which the mask is mounted and the substrate stage on which the substrate is mounted is not subjected to a coarse / fine movement structure, and has a simple structure and guideless, and finely adjusts the positions in the non-scanning direction and the rotation direction. However, it can be driven in the first axial direction. Therefore, reduction in size and weight of the stage and improvement in controllability can be expected.

In this case, the stator of each of the linear motors constituting the stage device is connected to the moving surface (28).
It is desirable that the holding member (13A, 13B) is held independently of the main body column (18) on which the a) is formed. In such a case, the reaction force at the time of driving the stage (at least one of the mask stage on which the mask is mounted and the substrate stage on which the substrate is mounted) constituting the first stage device is transmitted via the stator of each linear motor. Since the moving surface of the stage is not transmitted to the formed main body column,
Vibration of the main body column (exposure apparatus main body) due to stage driving can be effectively suppressed. In particular, when the first stage device is provided as a driving device for the mask and the substrate, the vibration of the main body column due to the driving of the stage can be suppressed more reliably.

A second exposure apparatus according to the present invention is an exposure apparatus for transferring a predetermined pattern onto a substrate (P) via an optical system. Characterized in that it is provided as a drive device.

According to this, since the second stage device according to the present invention is provided as a substrate driving device, the substrate stage on which the substrate is mounted can be a simple structure as a guideless and controllable two-dimensional stage. Can be realized. In addition, the reaction force generated when the substrate stage is driven in the first axis direction can be offset by the compensation force generated by the new linear motor included in the second axis linear motor.

Also in this case, the holding member (72A, 72B) independent of the main body column (18) on which the moving surface (24a) is formed is used as the stator of the second axis linear motor constituting the substrate stage device. It is desirable to hold in.
With this configuration, the substrate stage can be moved in the first axial direction and in the second axial direction.
Regardless of the driving direction in the axial direction, the driving reaction force is not transmitted to the main body column, and vibration of the main body column caused by driving of the substrate stage can be almost completely prevented.

[0031]

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIG.
This will be described with reference to FIG.

FIG. 1 shows an exposure apparatus 10 according to one embodiment.
Is schematically shown. The exposure apparatus 10 uses a step-and-scan method to transfer a reticle pattern as a mask onto a liquid crystal glass plate as a substrate (hereinafter, referred to as “plate P” (see FIG. 5)). Device.

The exposure apparatus 10 includes an illumination system 12, a reticle stage device 14, a plate stage device 16, a projection optical system (not shown), a main body column 18 provided with the projection optical system, and the like.

The main body column 18 is provided on a base plate (frame caster) 20 mounted on the upper surface of the installation floor, and a surface plate 24 held horizontally via a plurality of (here, four) vibration isolating pads 22. And a first column 26 fixed on the platen 24, a second column (not shown) provided on the first column 26, and the like.

The platen 24 constitutes a base of a plate stage to be described later, and a moving surface 24a of the plate stage is formed on the upper surface of the platen 24.

The first column 26 holds a projection optical system (not shown) whose optical axis direction is the Z-axis direction. As the projection optical system, a double-sided telecentric refraction optical system is used here, and the projection magnification is, for example, equal to one.

The second column is fixed to the upper surface of the first column 26 so as to surround the projection optical system. A reticle stage base 28 shown in FIG. 1 is horizontally fixed on the second column. ing. A moving surface 28 of reticle stage RST is provided on the upper surface of reticle stage base 28.
a is formed.

The main body column 18 thus constructed
Is insulated at the micro G level by the vibration isolating pad 22.

The illumination system 12 is, for example, disclosed in
As disclosed in Japanese Unexamined Patent Publication No. 0956, the reticle stage includes a light source unit, a shutter, a secondary light source forming optical system, a beam splitter, a condenser lens system, a reticle blind, an imaging lens system, and the like (all not shown). RST
Illuminates a rectangular (or circular) illumination area on the reticle R (see FIG. 2) held at a uniform illumination. As shown in FIG. 1, the illumination system 12 includes a pair of support members 1.
It is supported on reaction frames 40A and 40B as a pair of holding members provided separately from main body column 18 via 3A and 13B, respectively. The lower ends of these reaction frames 40A and 40B are connected to the installation floor on the sides of the base frame 20.

As shown in FIG. 2, the reticle stage device 14 includes a reticle stage RST and a set of linear motors 30 and 32 constituting a driving device for driving the reticle stage RST along a moving surface 28a. It has.

More specifically, a plurality of air pads (not shown) are arranged on the lower surface of the reticle stage RST, and are floatingly supported by the air pads on the moving surface 28a via a predetermined clearance. I have. At the center of the reticle stage RST, a recess 15 having a rectangular cross section is formed, and the reticle R is fixed to the inner bottom of the recess 15 by vacuum suction or the like. A rectangular opening (not shown) that forms a passage for the illumination light is formed at the inner bottom of the concave portion 15 (on the back side of the reticle R).

The one linear motor 30 is disposed above the reticle stage base 28 (see FIG. 1) and extends from a magnetic pole unit having a U-shaped cross section extending in the scanning direction (here, the Y-axis direction). Composed stator (stator) 3
0A and one side of the reticle stage RST in the X direction (−X
And a mover (rotor) 30B composed of an armature unit integrally fixed to the side surface (side). The stator 30A is actually a reaction frame 40A.
Is fixed to the tip of the upper protrusion.

As the linear motor 30, a known moving magnet type Lorentz electromagnetic force driven linear motor is used.

As the other linear motor 32, a new linear motor according to the present invention is used. As shown in FIG. 2, the linear motor 32 is disposed above the reticle stage base 28 (see FIG. 1), and is a stator (stator) including a U-shaped magnetic pole unit extending along the Y-axis direction. 32A and a mover (rotor) 32B composed of an armature unit integrally fixed to a side surface on the other side (+ X side) in the X direction of the reticle stage RST. The stator 32A is actually fixed to the tip of the upper protrusion of the reaction frame 40B.

FIG. 3 shows a specific configuration of the linear motor 32. Here, the magnetic pole unit 32A constitutes a stator of the linear motor 32, and includes a stator yoke 34 as a magnetic pole base having a U-shaped cross section extending in the Y-axis direction, and a pair of opposing surfaces 34a of the stator yoke 34. 34b, a first field magnet (field magnet) 36 composed of a plurality of sets of permanent magnets arranged at predetermined intervals so that the polarity alternates along the Y-axis direction, and the pair of opposed surfaces 34a, 3
4b, each set of elongated S-pole magnets 38S extending in the Y-axis direction at predetermined intervals in the X-axis direction orthogonal to the Y-axis.
And a second field magnet (field magnet) including the N-pole magnet 38N. In the following, for each second field magnet,
The description will be given with the appropriate identification symbols. In this case, the magnets on the surface 34a and the magnets on the surface 34b facing each other have opposite polarities (see FIG. 4B).

The armature unit 32B constitutes a mover of the linear motor 32 here, has an armature base made of a non-magnetic material, and the inside thereof is schematically shown in FIG. as such, the first plurality comprising two square coil provided in a ratio of one of the permanent magnets 36 adjacent in the Y direction on the stator yoke 34 (36 ₁ to 36 ₈₎ (four in this case) Armature coils 42 ₁ , 42 ₂ , 42 ₃ , 4
2 ₄ are disposed at predetermined intervals along the Y-axis direction. Further, inside the armature base of the armature unit 32B,
The FIG. 4 (A), the 4 as shown in (B), S-pole magnet 38S ₂ and the N-pole magnet 38N ₁ facing each other, and the N-pole magnet 38N ₂ and S-pole magnet 38S ₁ facing each other A second armature coil 44 composed of a rectangular coil elongated in the Y-axis direction is provided corresponding to the above.

Here, the driving principle of the linear motor (new linear motor) 32 will be briefly described with reference to FIGS. 4 (A) and 4 (B). FIG. 4A shows the armature unit 32B when the armature unit 32B is at a certain position.
FIG. 4B schematically shows the internal configuration of FIG.
(A) is a schematic cross-sectional view taken along the line BB. In the following, for convenience, the permanent magnets 36 will be described by appropriately assigning identification codes.

First, the principle of driving in the Y-axis direction (long stroke direction), which is the scanning direction, will be described.

A cross section of the linear motor 32 (FIG. 4A)
S pole in the vicinity of the line B-B cross section), which is fixed to 4 (as shown in B), the surface 34b from the permanent magnet 36 _2N N pole which is fixed to the surface 34a of the stator yoke 34 after reaching the permanent magnet 36 _2S, magnetic circuit 50 to return to the permanent magnet 36 _2N through the interior of the stator yoke 34 is formed. Thus, in this cross section, the direction of magnetic flux crossing the first armature coil 42 ₁ is in a + Z direction as indicated by the solid line arrow in FIG. 4 (B). Therefore, at the location of the permanent magnet 36 ₂ (36 _2S , 36 _2N ) in FIG. 4A, the magnetic flux passes from the back side to the front side of the drawing. For the same reason, the permanent magnets 36 _4, 36 _6, 36 ₈ locations shown in FIG. 4 (A) and through which the magnetic flux toward the front side from the depth of the page surface. In addition, the permanent magnet 3
In 6 _1, 36 _3, 36 _5, 36 ₇ place, the magnetic flux toward the back side from the front side passes through. That is, an alternating magnetic field is generated along the Y-axis direction in the internal space of the magnetic pole unit 32A, that is, in a series of gaps extending in the Y-axis direction.

FIG. 4 shows the first armature coils 42 _{1 to} 42 ₄ .
Assuming that flow counter-clockwise current I as shown (A), the left side of the first armature coil 42 _{1-42 4,} Lorentz electromagnetic force F ₁ of both the + Y direction on the right side, F ₂ is In operation, the armature unit 32B is driven in the + Y direction. The Lorentz electromagnetic forces F ₁ and F ₂ are determined by the relative positional relationship between the magnetic pole unit 32A and the armature unit 32B in the Y-axis direction and the magnitude and direction of the current I. Also, the first
From the periodicity of the arrangement of the armature coil 42 and the permanent magnet 36,
The same Lorentz electromagnetic force to all of the first armature coil 42 ₁ through 42 ₄ F _1, so that the F ₂ acts.

[0051] Thus, in the state of FIG. 4 (A), when the direction of the current flowing through the respective first armature coil 42 _{1-42 4} in the opposite direction, is naturally armature unit 32B is driven in the -Y direction . The armature unit 32B is moved in the + Y direction and the −Y direction.
If it is necessary to continuously drive the first armature coil, it is necessary to change the direction and magnitude of the current flowing through each first armature coil with time, but such a current control method is a conventional Lorentz electromagnetic force type linear motor. Since it has been adopted and is publicly known, detailed description is omitted.

Next, the driving principle in the X-axis direction (short stroke direction) which is the non-scanning direction will be described.

[0053] In the linear motor 32, another magnetic circuit 50 described above, as shown in FIG. 4 (B), is fixed from the N pole magnet 38N ₁ which is fixed to the surface 34a of the stator yoke 34 on the surface 34b and after reaching the S-pole magnet 38S _2, reaches the N-pole magnet 38N ₂ through the interior of the stator yoke 34, from the N-pole magnet 38N ₂ after reaching the S-pole magnet 38S _1, the stator yoke 34 N pole magnet 38N ₁ through the inside
Is formed. Therefore, FIG.
In the cross-sectional portion of (B), the direction of the magnetic flux traversing the second armature coil 44 is the + Z direction on the upper side portion of the armature coil 44 and the lower side portion as indicated by solid arrows in FIG. In the -Z direction.

Now, when a current i in a counterclockwise direction as shown in FIG. 4A is applied to the second armature coil 44, both the upper side and the lower side of the second armature coil 44 have a negative value. The Lorentz electromagnetic forces f ₁ and f _{2 in the} X direction work, and the armature unit 32
B is driven in the -X direction. The Lorentz electromagnetic forces f ₁ and f ₂ are determined by the magnetic pole unit 32A and the armature unit 32.
It is determined by the relative positional relationship in the X-axis direction with B, and the magnitude and direction of the current i. Also in this case, the second armature coil 4
When the direction of the current i flowing through 4 is reversed, the armature unit 32B is driven in the + X direction. It is clear that the armature unit 32B can be driven in the X-axis direction by a desired amount by changing the magnitude and direction of the current i flowing through the second armature coil 44.

As described above, the linear motor 32 not only has a thrust in the Y-axis direction, which is a long stroke direction, but also has a magnetic flux direction (Z-axis direction) in the Y-axis direction and in the gap of the stator yoke 34.
A thrust in the X-axis direction perpendicular to the direction can also be generated. For this reason, the reticle stage RST shown in FIGS. 1 and 2 can be driven by the linear motors 30 and 32 at a predetermined stroke in the scanning direction and can be minutely driven in the non-scanning direction. In addition, the linear motor 3
By giving a difference to the value of the thrust in the Y-axis direction generated at 0 and 32 (including the case of applying a thrust in the opposite direction), reticle stage RST can be slightly rotated around the Z-axis passing through its center of gravity.

Returning to FIG. 2, a pair of corner cubes is provided at an end on the + Y side of the upper surface of reticle stage RST.
A and 46B are fixed, and the reticle stage base 2 faces the corner cubes 46A and 46B.
A reticle Y interferometer 48Y is fixed to the + Y direction end of the upper surface of 8. The reticle Y interferometer 48Y actually projects an interferometer beam onto the corner cubes 46A and 46B, receives respective reflected lights, and detects a position of the corner cubes 46A and 46B in the Y-axis direction. It is configured to include a double-pass interferometer.

Further, + X on the upper surface of reticle stage RST
A flat mirror 50 extending in the Y-axis direction is fixed to the end on the side of the reticle X.
An interferometer 48X is provided. The reticle X interferometer 48X is fixed to the reticle stage base 28 via an interferometer mounting member 52 having an L-shaped cross section.

The reticle Y interferometer 48Y and the reticle X
The measurement value of the interferometer 48X is supplied to a stage controller (not shown) and a main controller via the stage controller, and the reticle Y interferometer 48Y is controlled by the stage controller according to an instruction from the main controller. The position of the reticle stage RST is controlled by controlling the linear motors 30 and 32 based on the measurement values of the reticle X interferometer 48X.

FIG. 5 is a perspective view showing a state where components above the first column of the exposure apparatus 10 have been removed. As shown in FIG. 5, the plate stage device 16 includes a plate stage PST and a driving device that freely drives the plate stage PST along the moving surface 24a.

A plurality of air pads (not shown) are arranged on the lower surface of the plate stage PST, and the plate stage PST moves the moving surface 24a by these air pads.
Are supported by floating through a predetermined clearance. Above the plate stage PST, the plate P is held by suction.

The driving device comprises a plate stage PST
Is driven along the moving surface 24a in the Y-axis direction, which is the scanning direction, with a predetermined stroke, and X is moved in the non-scanning direction.
Linear motors 60 and 62 as first-axis linear motors driven in minute amounts in the axial and rotational directions, and connecting members 68 and 70 for connecting between both ends of the stators of these linear motors 60 and 62; There are provided second-axis linear motors 64 and 66 for driving the plate stage PST in the X-axis direction integrally with the linear motors 60 and 62 via the connecting members 68 and 70, respectively.

Here, one of the Y-axis linear motors 60 is the linear motor 30 described above.
A known linear motor similar to the above is used, and the mover of this linear motor 60 is integrally fixed to the side surface of the plate stage PST on one side in the X direction (−X side). Also,
The other linear motor 62 of the Y-axis linear motor is
A new linear motor similar to the above-described linear motor 32 is used, and the mover of this linear motor 62 is integrally fixed to the side surface on the other side (+ X side) in the X direction of the plate stage PST.

A known linear motor similar to the linear motors 30 and 60 is used as one of the linear motors 64 of the X-axis linear motor. It is integrally fixed to the side surface. The stator of the linear motor 64 includes a reaction frame 7 as a holding member shown in FIG.
It is fixed to the tip of the upper protrusion of 2A. The lower end of the reaction frame 72A is connected to the installation floor at the side of the base frame 20.

As the other linear motor 66 of the X-axis linear motor, a new linear motor similar to the above-described linear motors 32 and 62 is used.
The mover 6 is integrally fixed to the −Y side surface of the connecting member 70. The stator of this linear motor 66 is shown in FIG.
Reaction frame 72 as a holding member shown in FIG.
B is fixed to the tip of the upper protrusion. The lower end of the reaction frame 72B is connected to the installation floor at the side of the base frame 20.

The position of the plate stage PST in the XY plane is constantly measured at a predetermined resolution by a laser interferometer system (not shown). The measured values of the laser interferometer system are supplied to a stage controller (not shown) and a main controller via the stage controller. The stage controller controls the laser interferometer in accordance with an instruction from the main controller. The position of the plate stage PST is controlled by controlling the linear motors 60, 62, 64, 66 based on the measured values of the system.

In the exposure apparatus 10 of the present embodiment configured as described above, at the time of exposure, the stage controller controls the reticle stage RST and the plate stage PS.
A scanning exposure operation for sequentially transferring a reticle pattern onto a plate by synchronously moving the reticle pattern onto a plate in a direction opposite to each other along the Y-axis direction at a speed ratio corresponding to a projection magnification of a projection optical system (not shown); The stepping operation of moving the plate stage to the scanning start position for exposing the adjacent partitioned area is repeatedly performed.

At the time of the above scanning exposure, since the driving device for driving the reticle stage RST includes the new linear motor 32, the position of the reticle stage RST in the non-scanning direction (X-axis direction) and the rotation direction is determined. It can be driven in the Y-axis direction without guide while making fine adjustments. Therefore, the reticle stage RST can be reduced in size and weight and controllability can be improved without employing a complicated structure as in the conventional reticle stage having a coarse / fine movement structure.

Since the stators of the linear motors 30 and 32 constituting the reticle stage device 14 are held by the reaction frames 40A and 40B independent of the main body column 18 on which the moving surface 28a is formed, the reticle stage Is not transmitted to the main body column 18 on which the moving surface 28a of the reticle stage RST is formed via the stator of each linear motor, so that the main body column 18 (exposure device) The vibration of the main body can be effectively suppressed.

Further, since the driving device of the plate stage PST includes a Y-axis linear motor including the new linear motor 62, similar to the reticle stage RST,
Move the plate stage PST in its non-scanning direction (X-axis direction)
And guide-less Y while finely adjusting the position in the rotation direction.
It can be driven in the axial direction. In addition, since the driving device of the plate stage PST includes the X-axis linear motor including the new linear motor 66 that drives the plate stage PST integrally with the Y-axis linear motor, Plate stage PST integrated with Y-axis linear motors 60 and 62 by motors 64 and 66
Can be driven in the X-axis direction while finely adjusting the positions in the Y-axis direction and the rotation direction without a guide.

Further, a new linear motor 66 included in the X-axis linear motor is used to cancel the reaction force generated when the plate stage PST is driven by the Y-axis linear motors 60 and 62. Y for 60, 62
An axial compensating force can be applied, and the (linear stator) for the Y-axis can be held at a fixed position in the Y-axis direction.

The stators of the X-axis linear motors 64 and 66 constituting the plate stage device 16
a is held by the reaction frames 72A and 72B independent of the main body column 18 in which the a is formed, so that the driving reaction force is transmitted to the main body column 18 even if the plate stage PST is driven in any of the XY two-dimensional directions. Therefore, the vibration of the main body column 18 due to the driving of the plate stage PST can be effectively suppressed.

As described above, in the exposure apparatus 10, since the driving reaction force of the stage is not transmitted to the main body column 18 as a factor of vibration during the stepping as well as during the scanning exposure, the synchronous setting of the reticle stage RST and the plate stage is performed. It is possible to realize both an improvement in throughput by shortening the time and a shortening of the positioning and setting time of the plate stage, and an improvement in overlay accuracy by improving the stage controllability.

Further, in this embodiment, since both the reticle stage device 14 and the plate stage device 16 are basically of a guideless configuration, no guide is required. Therefore, the number of parts can be reduced, so that the cost can be significantly reduced, the rigidity of the constituent members can be increased, and the control performance of each stage can be improved. Further, since both the reticle stage device 14 and the plate stage device 16 can be designed to be compact, the size of the device can be reduced and the weight can be reduced.

Further, since the yaw guide is eliminated and the guide and actuator of the fine movement system are not required, the driving weight is greatly reduced, the thrust specification of the linear motor can be reduced, and the heat generation during driving is very advantageous. It is. Further, the linear motors 32 and 62 of the present embodiment can apply thrust to the center of gravity of the reticle stage RST and the plate stage PST, and the reticle stage RST and the plate stage PST do not vibrate in the pitching direction. And a stage device with good controllability can be realized.

In the above embodiment, the case where the reticle stage device 14 includes the known linear motor 30 and the new linear motor 32 has been described, but the present invention is not limited to this. That is, the reticle stage RST is moved to the moving surface 28 using only one new linear motor.
It is also possible to drive along the line a in the Y-axis direction at a predetermined stroke and to finely drive in the X-axis direction. Alternatively, the reticle stage RST may be driven by a predetermined stroke in the Y-axis direction along the moving surface 28a using the pair of new linear motors in the same manner as in the above embodiment, and may be minutely driven in the X-axis direction and the rotation direction. .

Further, a pair of new linear motors may be used as the Y-axis linear motors constituting the plate stage device 16. However, the X-axis linear motor as the second-axis linear motor constituting the plate stage device 16 includes at least one new linear motor, which cancels out the effect of the reaction force due to the driving of the plate stage PST. Important in that respect.

The two new linear motors according to the present invention in which the Y-axis and the X-axis are the long-stroke directions and the Z-axis direction is the short-stroke direction (small-stroke direction) are suitable for a plate stage device, for example. By incorporating it, it is also possible to realize a plate stage device having the function of a Z-leveling stage.

In the above embodiment, the case where the first and second stage devices according to the present invention are applied to a step-and-scan type scanning exposure apparatus for liquid crystal has been described. It goes without saying that the present invention can be similarly applied to a scanning stepper for manufacturing. Also,
The projection optical system (not shown) may be a reduction system or an enlargement system. Further, the linear motors 32 and 62 can be applied to a vertical exposure apparatus that supports the reticle R and the plate P along the vertical direction and performs scanning exposure.

Further, for example, in the case of a batch scanning type exposure apparatus for liquid crystal for transferring an equal-size erect image of a mask pattern onto a plate at a time, the present invention is used as a driving device for both or one of the mask and the plate. Such a first stage device can be suitably applied.

The second stage apparatus according to the present invention is not limited to a scanning type exposure apparatus, but also includes a static exposure type exposure apparatus such as a step-and-repeat type projection exposure apparatus (so-called stepper), and an electron beam. Exposure equipment (EB exposure equipment)
In addition to the exposure apparatus, a laser repair apparatus or any other apparatus having an XY stage can be suitably applied.

In addition, an illumination optical system and a projection optical system composed of a plurality of lenses are incorporated in the exposure apparatus main body to perform optical adjustment, and a reticle stage or a wafer stage composed of a large number of mechanical parts is mounted on the exposure apparatus main body and wired. And pipe connection, and further comprehensive adjustment (electrical adjustment, operation check, etc.)
By performing the above, the exposure apparatus of the above embodiment can be manufactured. It is desirable that the manufacture of the exposure apparatus be performed in a clean room in which the temperature, cleanliness, and the like are controlled.

[0082]

As described above, according to the first and second aspects of the present invention, a two-stage structure can be adopted without using a two-stage structure.
The object to be driven can be driven in a two-dimensional direction, thereby providing an excellent linear motor which can be applied to a place where installation was difficult because there was no conventional space.

According to each of the third and fourth aspects of the present invention, it is possible to provide a stage device that drives the stage with a simple structure and without a guide.

According to each of the fifth to eighth aspects of the present invention, vibration of a main body column (exposure apparatus main body) due to a reaction force due to driving of a stage is not conventionally available. An excellent exposure apparatus can be provided.

[Brief description of the drawings]

FIG. 1 is a schematic perspective view illustrating a configuration of an exposure apparatus according to an embodiment.

FIG. 2 is a schematic perspective view showing the reticle stage device of FIG.

FIG. 3 is a schematic perspective view showing a new linear motor (a linear motor according to the present invention) constituting the reticle stage device of FIG. 2;

4A and 4B are diagrams for explaining the driving principle of the linear motor in FIG. 3 ((A), (B)).

FIG. 5 is a perspective view of a state in which components above a first column constituting the exposure apparatus of FIG. 1 have been removed;

[Explanation of symbols]

10 exposure apparatus, 14 reticle stage device (first stage device), 16 plate stage device (second stage device), 18 body column, 24a moving surface,
28a: moving surface, 30: linear motor (part of drive unit), 32: linear motor (part of drive unit), 32A
... magnetic pole unit, 32B ... armature unit, 34 ... stator yoke (magnetic pole base), 36 ... first field magnet, 38
N ... N pole magnet (second field magnet), 38S ... S pole magnet (second field magnet), 40A, 40B ... reaction frame (holding member), 42 ... first armature coil, 44 ...
2nd armature coil, 60 ... 1st axis linear motor (part of drive unit), 62 ... 1st axis linear motor (part of drive unit), 64 ... 2nd axis linear motor (of drive unit) Part: 66, Linear motor for the second axis (part of the driving device), 72A, 72B: Reaction frame (holding member), RST: Reticle stage (stage), PST
... Plate stage (stage), R: reticle (mask), P: plate (substrate).

Claims (8)

[Claims] A magnetic pole unit for generating a magnetic flux in a series of air gaps extending in a predetermined long stroke direction; and a long stroke direction with respect to the magnetic pole unit by an electromagnetic interaction generated between the magnetic pole unit and the magnetic pole unit. An armature unit relatively driven in a direction different from the long stroke direction and the magnetic flux direction. 2. The magnetic pole unit according to claim 1, wherein the magnetic pole base extends at a predetermined length in the long stroke direction in which the gap is formed, and the polarity of the magnetic pole base is alternately changed along the long stroke direction. And a plurality of sets of first field magnets arranged at predetermined intervals, and an S-pole magnet and an N-pole magnet extending in the long stroke direction in parallel with each other at a predetermined interval on the magnetic pole base. And at least one pair of second field magnets, wherein the armature unit comprises: a first armature coil disposed corresponding to the first field magnet; and the second field magnet. 2. The linear motor according to claim 1, further comprising a second armature coil disposed corresponding to the first armature coil. 3. A stage device comprising: a stage; and a driving device that drives the stage in at least a first axial direction along a predetermined moving surface, wherein the driving device is configured such that the long stroke direction is the first axis. A stage device comprising one or more linear motors including at least the linear motor according to claim 1 set in a direction. 4. A stage device comprising: a stage; and a driving device for driving the stage in a first axis direction and a second axis direction orthogonal to the stage along a predetermined moving surface, wherein the driving device comprises: A first axis linear motor that drives a stage in the first axis direction; and a long stroke direction that drives the first axis linear motor and the stage in a second axis direction orthogonal to the first axis. A stage apparatus comprising: a second-axis linear motor including at least the linear motor according to claim 1 set in two-axis directions. 5. An exposure apparatus for transferring a mask pattern onto the substrate by synchronously moving a mask and a substrate in a one-dimensional direction, wherein the stage device according to claim 3 An exposure apparatus provided as at least one drive device. 6. The exposure apparatus according to claim 5, wherein a stator of each of the linear motors constituting the stage device is held by a holding member independent of a main body column on which the moving surface is formed. . 7. An exposure apparatus for transferring a predetermined pattern onto a substrate via an optical system, wherein the stage apparatus according to claim 4 is provided as a driving apparatus for the substrate. 8. The apparatus according to claim 7, wherein a stator of the linear motor for the second shaft constituting the stage device is held by a holding member independent of a main body column on which the moving surface is formed. Exposure equipment.