JP2001042118A - Color filter, continuous production method thereof, and liquid crystal element using the color filter - Google Patents

Abstract

(57) Abstract: In a manufacturing process of a color filter for a liquid crystal element, a pattern exposure of a photosensitive resin is continuously transported without stopping a substrate to efficiently manufacture the substrate. SOLUTION: A photosensitive resin layer is applied and formed by a coater 3 while a long strip-shaped film substrate 1 is being conveyed. Exposure is performed while transporting the exposure mask so that the relative position with respect to the material 1 is constant.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for continuously producing a color filter mainly used in a color liquid crystal display device, a color filter obtained by the continuous production method,
Further, the present invention relates to a liquid crystal element formed using the color filter.

[0002]

2. Description of the Related Art Generally, liquid crystal elements are mounted on personal computers, word processors, car navigation systems, small televisions, and the like. In particular, demand for color liquid crystal display devices has been increasing in recent years. In the market expansion of the liquid crystal display device, the color filters constituting the main part of the device are:
In addition to demands for performance such as high definition, large size, and high quality, demands for cost reduction are increasing, especially since the cost is high.

A color filter for a liquid crystal element is composed of a plurality of colored portions having different spectral characteristics, generally R, on a transparent substrate.
The pixel is composed of three colors of (red), G (green), and B (blue), and is formed by repeatedly arranging an extremely fine striped or mosaic pattern. In addition, a light-shielding layer called a black matrix or a black stripe is provided between each pixel in order to increase display contrast.

[0004] Conventional methods used as a coloring step for a color filter include a dyeing method, a pigment dispersion method, an electrodeposition method, and the like.
Printing method and the like can be mentioned, but all methods are R, G,
It is necessary to repeat the same process three times in order to color the three colors B, which increases the cost in terms of equipment and materials. There is also a problem that the yield decreases as the number of steps increases.

In order to make up for the above problem, Japanese Patent Application Laid-Open No.
JP-A-9-75205, JP-A-63-235901, JP-A-1-217302 and the like have been proposed. In these methods, three color inks of R, G, and B are discharged onto a transparent substrate by an ink jet method to form a colored portion. In such an ink jet system, R,
The formation of each pixel of G and B can be performed in a single process, so that a significant simplification of the manufacturing process and a significant cost reduction effect can be obtained. Further, in this method, the coloring step can be performed continuously.

There are roughly two methods for producing a color filter using an ink jet system. One is a method in which a resin ink receiving layer is formed on a transparent substrate, and the ink receiving layer is colored in a predetermined pattern by ejecting ink to the ink receiving layer by an inkjet method to form a colored portion. . The other is a method in which curable ink is directly discharged onto a transparent substrate and the ink itself is cured to form a colored portion. In the former method, an ink receiving layer is formed of a photosensitive resin, and a region (colored portion) having low or no ink absorptivity is formed between regions to be colored by pattern exposure (colored portion). It is common to prevent the color mixture of the ink by repelling the ink in the section. Also,
In the latter method, it is common to form a photosensitive resin layer in advance, perform pattern exposure, form a partition, and apply ink to an opening surrounded by the partition to prevent color mixing. By forming the partition wall with a black resin, the partition wall can also serve as the above-mentioned light shielding layer.

[0007]

In a method of manufacturing a color filter using an ink-jet method, a coloring step can be performed continuously, and a method of continuously performing all steps has been studied. In any of the above methods, the pattern exposure step of the photosensitive resin layer has become a problem. The reason is that the step of pattern exposure of a conventional general photosensitive resin layer has been performed intermittently. That is, when a photosensitive resin layer is formed on a long belt-shaped substrate while being transported while the substrate is being transported, patterning is performed, and once the substrate has been transported, the substrate on which the photosensitive resin layer has been formed is exposed to light. After aligning the mask, collective exposure is performed, and then the base material is conveyed to unload the exposed area, a new exposure area is loaded, and the mask alignment and batch exposure are repeated. In this method, each step of transporting the base material, aligning the mask, and performing the exposure operation requires time in an integrated manner. As a result, there is a problem that the processing capacity (throughput) per unit time is low. .

In order to solve the above problem, Japanese Patent Application Laid-Open No. 9-274
No. 323, Japanese Patent Application Laid-Open No. 10-10745, etc.
A method of performing pattern exposure in a continuous transport state without stopping the base material using a pattern exposure method in a continuous irradiation state is disclosed. This method, while exposing while continuously transporting the substrate through an exposure mask having a linear light-shielding pattern, from above the substrate on which the photosensitive resin layer is formed,
This is a method characterized by forming a stripe pattern by satisfying a desired exposure irradiation amount. In such a pattern exposure method, patterning can be performed continuously without stopping the transport of the base material, and the throughput can be greatly improved.

However, in the above continuous exposure method, since the exposure is performed through a linear exposure mask, the pattern shape is limited to a stripe. Therefore, the method cannot be directly applied to the method for manufacturing a color filter using the inkjet method.

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems, and to provide a color filter manufacturing method using an ink-jet system in which each step is continuously performed without stopping the transfer of a base material, thereby achieving a high throughput and a good color. An object of the present invention is to manufacture a filter and provide a liquid crystal element having excellent color display characteristics at a lower cost.

[0011]

The method of manufacturing a color filter according to the present invention is a method of manufacturing a plurality of color filters having a colored portion on a transparent substrate in a continuous manner. Forming a photosensitive resin layer in a predetermined area while continuously transporting the substrate; and (2) transporting the exposure mask so that the relative position with respect to the film substrate is constant. Pattern exposure by continuous irradiation through the above exposure mask, (3)
Forming a colored portion by applying ink on the film substrate by an inkjet method.

Further, the color filter of the present invention has a colored portion on a transparent substrate, and is manufactured by the above-described method for continuously manufacturing a color filter of the present invention.

Further, the liquid crystal element of the present invention is characterized in that liquid crystal is sandwiched between a pair of substrates, and one of the substrates is formed using the color filter of the present invention.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, basic steps of a method for manufacturing a color filter according to the present invention will be described. As described above, a method of manufacturing a color filter using an inkjet method includes a method of coloring the ink receiving layer with ink and a method of curing the ink itself to form a colored portion.

FIG. 4 schematically shows a process chart of an example of a method for coloring the ink receiving layer with ink. In the figure, 41
Is a transparent substrate, 42 is a black matrix, 43 is an ink receiving layer, 44 is an exposure mask, 45 is a non-colored portion, 46 is a portion to be colored, 47 is a colored ink, 48 is a colored portion, and 49 is a protective layer. 4A to 4F are cross-sectional views respectively corresponding to the following steps (a) to (f).

Step (a) A black matrix 42 is provided on a transparent substrate 41 if necessary.
To form As the transparent substrate 41 used in the present invention, glass is generally used, but any substrate such as plastic having the required strength transparency can be used. In the continuous production method of the present invention, each step is carried out while continuously transporting a long strip-shaped film substrate, but the film substrate itself may be used as the transparent substrate 41 of the color filter. As the film substrate, it is preferable to use a synthetic resin film having both rigidity and heat resistance, such as a heat-resistant polyester film, a polyimide film, a polycarbonate film, and a polyethylene terephthalate film. Synthesis is a property derived from the fact that expansion and contraction when transporting a film substrate is not preferred in the present invention.

In the present invention, it is also preferable that a long strip-shaped film substrate is used as a support for the transparent substrate 41 of the color filter, and the transparent substrate 41 is placed and fixed on the film substrate and transported. Used. In this case,
As the film substrate, in addition to the above-mentioned synthetic resin film, 42 alloy (nickel 42% by weight, iron 58% by weight),
Metals that are difficult to rust in air, such as amber (36% by weight of nickel, 0.36% by weight of manganese, balance iron) and 18-8 stainless steel are preferably used.

The black matrix 42 is a light-shielding layer usually formed of a metal such as chromium. In addition to the black matrix, a black stripe is also preferably used.

Step (b) An ink receiving layer 43 made of a photosensitive resin is formed on the transparent substrate 41 on which the black matrix 42 is formed. The photosensitive resin used here is one that expresses (or increases) ink absorbency by light irradiation or light irradiation and heat treatment.
Alternatively, it has a property of eliminating (or reducing) the ink absorbency. As such a photosensitive resin, an acrylic resin, an epoxy resin, an amide resin, a phenol resin, a polystyrene resin, or the like is used, if necessary, in combination with a photoinitiator (crosslinking agent).

The photosensitive resin is applied onto the transparent substrate 41 by a known method such as dipping, roll coating, bar coating, slit coating, or the like, and prebaked as necessary to form the ink receiving layer 43. The application area does not need to be the entire surface, and in particular, when the transparent substrate 41 is a long strip-shaped film base material, it is intermittently corresponding to the required area of the desired pattern, and is applied to a certain area. good.

Step (c) The ink receiving layer 43 is subjected to pattern exposure through an exposure mask 44, and a portion 46 to be colored having high ink absorbency and an ink existing between the portions to be colored, and having a higher ink content than the portion 46 to be colored. The non-colored portion 45 having low absorptivity is formed.

The exposure step is performed using a contact or non-contact type. As a lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, a xenon lamp, or the like that effectively radiates energy rays such as ultraviolet rays can be used.

During the exposure, the exposure mask 44 must be transported in synchronization with the transport of the transparent substrate 41, and maintain a relative positional relationship with the transparent substrate 41.

Step (d) Each of the R, G, and B colored inks 47 is applied to the colored portion 46 along a predetermined colored pattern by an ink jet method. At this time, since the non-colored portion 45 has low or no ink absorbency, even if the colored ink 47 protrudes from the colored portion 46, it is repelled and color mixing between adjacent colored portions 47 is prevented. In order to further enhance the effect of preventing color mixing, a component that causes the non-colored portion 45 to exhibit ink repellency may be added to the ink receiving layer 43 in advance.

Colored ink 47 used in the present invention
Any of dyes and pigments can be used as long as it can be ejected by an inkjet method.

As an ink jet system used in the present invention, a bubble jet type using an electrothermal converter or a piezo jet type using a piezoelectric element can be used as an energy generating element. The pattern can be set arbitrarily.

Step (e) After the colored ink 47 is absorbed and sufficiently diffused in the colored portion 46, a drying process is performed as necessary, and a necessary process such as light irradiation and heat treatment is performed to form the entire ink receiving layer. After curing, a colored portion 48 is formed.

Step (f) If necessary, a protective layer 49 is formed. As the protective layer 49, a resin composition layer of a photo-curing type, a thermo-setting type, or a combination of heat and light, or an inorganic film formed by vapor deposition, sputtering, or the like can be used. In any case, any material can be used as long as it has transparency as a color filter and can withstand the subsequent steps of manufacturing a liquid crystal element such as an ITO film forming step and an alignment film forming step.

Next, FIG. 5 schematically shows a process chart of an example of a method of forming a colored portion by curing the ink itself.
In the figure, 51 is a black photosensitive resin layer, 52 is a black matrix, 57 is a curable ink, and 58 is a colored portion. Further, the same members as those in FIG. 4 are denoted by the same reference numerals, and description thereof will be omitted. In addition, (a)-(f) of FIG.
It is sectional drawing respectively corresponding to (f).

Step (a) A photosensitive resin layer is formed on the transparent substrate 41 to form a partition for preventing color mixing of the curable ink. In the step of FIG. 5, a case is shown in which a black photosensitive resin layer 51 is formed in order to give the partition a function as a light-shielding layer.

As the photosensitive resin, an acrylic resin, an epoxy resin, an amide resin, a phenol resin, a polystyrene resin, etc., if necessary, a photoinitiator (crosslinking agent)
When a black matrix is used, a black dye or pigment is mixed and used. FIG. 5 shows a case where a negative photosensitive resin is used.

As a method for applying the black photosensitive resin layer 51, similar to the ink receiving layer 43 shown in FIG. 4, known methods such as dipping, roll coating, bar coating, and slit coating are used. Prebake according to. Further, similarly to the ink receiving layer 43, the application area does not need to be the entire surface. In particular, when the transparent substrate 41 is a long strip-shaped film base material, the application area is intermittent in accordance with the required area of the desired pattern. It may be partially applied to a certain area.

Step (b) Using the exposure mask 44, the black photosensitive resin layer 51 is subjected to pattern exposure while transporting the exposure mask 44 in the same manner as in step (c) of FIG.

Step (c) A development process is performed. As a developing method, a dip method, a spray method, or the like is used, and a high-pressure spray method is most suitable for high resolution. The developer greatly differs between the solvent development type and the alkali development type. In the solvent development type, 1,1,1-trichloroethane is generally used, and in the alkali development type, 1% by weight of sodium carbonate is generally used. When the photosensitive resin used is a negative type, a portion that has not been irradiated with light is dissolved and removed by a developer, and the irradiated region remains to form a black matrix 52 having a desired pattern. The pattern of the partition walls is not limited to the matrix, but may be stripes.

Step (d) The curable ink 57 is applied to the openings of the black matrix 52 by an ink jet method. Curable ink 57
As the resin composition, a resin composition containing a resin which is cured by energy application such as light irradiation or heat treatment and R, G, B dyes or pigments is used. Examples of the resin include melamine resin, hydroxyl or carboxyl group-containing polymer and melamine, hydroxyl or carboxyl group-containing polymer and polyfunctional epoxy compound, hydroxyl or carboxyl group-containing polymer and cellulose reaction type compound, epoxy resin and resol type resin, epoxy Resins and amines, epoxy resins and carboxylic acids or acid anhydrides, epoxy compounds, negative resists and the like are used.

Step (e) If necessary, the curable ink 57 is cured by subjecting it to a drying treatment and a necessary treatment such as light irradiation and heat treatment.

Step (f) If necessary, a protective layer 49 is formed.

Next, FIG. 1 is a schematic view of a main part of an embodiment of the continuous production method of the present invention. This embodiment is an example of a method in which the film base also serves as the transparent substrate of the color filter, and the ink receiving layer shown in FIG. 4 is colored to form a colored portion. In FIG. 1, reference numeral 1 denotes a long strip-shaped film substrate also serving as a transparent substrate of a color filter, 2 denotes a reel for feeding the film substrate, 3 denotes a coater for applying a photosensitive resin, and 4a.
4d is an oven, 5 is an exposure device, 6 is an ink jet recording device, 7 is a film substrate take-up reel, 8a,
8b is a gear, and 9a to 9d are rollers.

A film substrate 1 on which a black matrix is formed in advance is sent out from a coiled sending reel 2 at a maximum constant speed which can be processed in an exposure step and a coloring step. The resin is applied to the entire surface of the film substrate 1 with a uniform thickness. Subsequently, the photosensitive resin layer is dried by the oven 4a to form an ink receiving layer.

Next, the above-mentioned ink receiving layer is subjected to pattern exposure by the exposure device 5. FIG. 2 is an enlarged schematic diagram of the exposure apparatus 5. In the figure, 11 is an exposure mask, 12 is a reflecting mirror,
13 is an exposure lamp. As shown in FIG. 2, the exposure mask 11 is made of a thin metal plate having a circumference equal to or a multiple of the repetition pitch of the openings, and the pattern portion is formed as an opening except for the outer shape of the pattern to be formed. Use an endless belt. The exposure mask 11
Is installed so as to be wound around the outer circumference of a plurality of rotating shafts, and is moved in strict synchronization with the transport speed, direction and parallelism of the film substrate 1. Thus, pattern exposure can be performed with high fidelity, high accuracy, and faithful to the pattern of the exposure mask 11 used. For precise synchronization between the exposure mask 11 and the film substrate 1, perforations having precise and fixed sizes, positions, and parallelisms at both ends in the width direction of the exposure mask 11 and the film substrate 1. Is formed,
In order to connect or compare the perforations of the exposure mask 11 and the perforations of the film substrate 1 to tune the outer shape of the pattern portion,
For example, it is preferable to take measures such as meshing using the gears 8a and 8b.

The exposure mask 11 can be formed with an arbitrary pattern such as a product name as an opening in addition to the pixel pattern portion. Further, the exposure lamp 13 and the reflecting mirror 12 for efficiently using the light are located in the space inside the exposure apparatus, and continuously generate energy rays such as ultraviolet light.

The film substrate 1 having the pattern-exposed ink receiving layer is subsequently heat-treated in an oven 4b to form a non-colored portion.

Next, the R, G, and B colors are supplied to the ink jet recording apparatus 6 provided with dedicated ejection nozzles for each of the colors R, G, and B.
Each of the colored inks G and B is discharged to a portion to be colored of the ink receiving layer to perform a coloring step. In the coloring step, the mechanical position accuracy of the film base material 1 to be conveyed is made high precision,
Coloring can be performed at an arbitrary position, and color mixing due to positional deviation can be prevented. Furthermore, oven 4c,
At 4d, a heat treatment is performed to cure the entire ink receiving layer to obtain a colored portion.

Finally, the film substrate 1 is wound around the take-up reel 7 with tension or cut out one by one to perform necessary steps thereafter, for example, formation of a protective layer, to obtain a color filter. The color filter may be provided by forming a transparent electrode layer such as ITO by vapor deposition or the like.

In the above embodiment, the film substrate 1
Is illustrated as the transparent substrate 1 of the color filter. However, as shown in FIG. 3, if the transparent substrate 41 is sequentially placed and fixed at a predetermined position on the film substrate 1 and transported, Similarly, color filters can be manufactured continuously.

Next, an example of the liquid crystal element of the present invention is shown in FIG. FIG. 6 is a schematic cross-sectional view of an example of a liquid crystal element formed using the color filter of the present invention obtained in the step shown in FIG. In the figure, 61 is a counter substrate, 62 is a common electrode, 6
3 is a pixel electrode, 64 and 65 are alignment films, and 66 is a liquid crystal. The present liquid crystal element is an example of an active matrix type (so-called TFT type) liquid crystal element in which a TFT (thin film transistor) is arranged for each pixel.

A liquid crystal element for color display is generally formed by fitting a color filter side substrate 41 and a counter substrate 61 and sealing a liquid crystal 66. Inside the opposing substrate 61, a TFT (not shown) and a transparent pixel electrode 63 are formed in a matrix. Further, inside the transparent substrate 41, a colored portion 48 of a color filter is provided at a position facing the pixel electrode 63 so that R, G, and B are arranged.
A transparent common electrode 62 is formed on the entire surface. The black matrix 2 is usually formed on the color filter side, but is formed on the counter substrate 61 side in a BM-on-array type liquid crystal element. Further, alignment films 64 and 65 are formed in the planes of both substrates, and by subjecting them to rubbing treatment, liquid crystal molecules can be aligned in a certain direction. These substrates are arranged to face each other via a spacer (not shown) or the like, are bonded by a sealing material (not shown), and a gap is filled with a liquid crystal 66.

In the case of the above-mentioned liquid crystal element, a polarizing plate is provided outside of both substrates in the case of a transmission type, and a backlight in which a fluorescent lamp and a scattering plate are combined is generally used. A polarizing plate is installed outside the
Is displayed by functioning as a light shutter that changes light transmittance.

In the above embodiment, a TFT type liquid crystal element has been described. However, the present invention is preferably applied to other driving type liquid crystal elements such as a simple matrix type.

Further, in the liquid crystal device of the present invention, as long as it is constituted by using the color filter of the present invention, the other members can use the conventional liquid crystal device technology, and the liquid crystal is generally used as a liquid crystal. Any of the used TN type liquid crystal and ferroelectric liquid crystal can be used.

[0051]

EXAMPLES Example 1 A heat-resistant polyester film substrate (300 mm in width and 0.5 mm in thickness) was used as a film substrate 1.
And a color filter was manufactured in the process shown in FIG.

The film substrate 1 is fed from the feed reel 2 and guided by rollers 9a to 9d to suppress the lateral swing with respect to the traveling direction with a mechanical accuracy of ± 1 μm per 300 mm width of the film substrate 1. The sheet was conveyed at a speed of about 3 m / min while ensuring linearity.

The following photosensitive resin composition is applied onto the film substrate 1 by the coater 3 and the coating is performed in an oven 4a.
Drying was carried out in an environment at a temperature of ° C. to form an ink receiving layer having a thickness of 1.0 μm.

[Photosensitive resin composition] Ternary copolymer composed of the following monomer components 10 parts by weight Methyl methacrylate 5.0 parts by weight Hydroxymethyl methacrylate 3.0 parts by weight N-methylolacrylamide 2.0 parts by weight Triphenylsulfonium Trifluflate 0.3 parts by weight ("TPS-105" manufactured by Midori Kagaku) 89.7 parts by weight of ethyl cellosolve

The exposure dose of 60 mJ / cm ^{2 was} applied to the obtained ink receiving layer by using the exposure apparatus shown in FIG. 2 while synchronizing the film substrate and the exposure mask with the gears 8 a and 8 b.
Exposed a stripe pattern of a non-colored portion having a line width of 10 μm and a pitch of 100 μm. Subsequently, heat treatment was performed in the oven 4b.

Using a bubble jet type head as the ink jet recording apparatus 6, each of R, G and B colored inks was discharged to the colored portion of the ink receiving layer along a predetermined colored pattern. Then, at 90 ° C, 5 in oven 4c.
Heat treatment was performed at 230 ° C. for 5 minutes in an oven 4 d for 5 minutes, and the film was taken up on a take-up reel 7.

After that, the TFT type liquid crystal element shown in FIG. 6 was manufactured by using the obtained color filters by cutting each sheet, and driven, and a high-definition color display was possible.

Example 2 A color filter was formed by applying the process of FIG. 5 to FIG. Specifically, the same heat-resistant polyester film substrate 1 as in Example 1 was used, and a negative black resist (“V-259BK” manufactured by Nippon Steel Chemical Co., Ltd.) was formed on the film substrate 1 using a coater 3. Coating was performed to a thickness of 1 μm, and prebaking was performed at 90 ° C. for 20 minutes in an oven 4 a to form a black photosensitive resin layer.
Next, pattern exposure was performed using the exposure device 5 in the same manner as in Example 1, and development was performed to form a resin black matrix.

R, G, B containing a dye of any of R, G, and B and a water-soluble acrylic resin are formed in the openings of the black matrix along a predetermined coloring pattern using a bubble jet type head. The curable ink of each color was ejected. Then, at 100 ° C, 10 ° C in oven 4c.
The ink was cured at 230 ° C. for 60 minutes in an oven 4d for 60 minutes to cure the ink to form a colored portion, and was taken up on a take-up reel 7.

After that, the TFT type liquid crystal device shown in FIG. 6 was manufactured by using the obtained color filters by cutting each one and driven, and a high-definition color display was obtained in the same manner as in Example 1. It was possible.

Example 3 As shown in FIG. 3, a glass substrate (41) on which a black matrix (not shown) was previously formed was placed and fixed on a heat-resistant polyester film substrate, and was conveyed. A color filter was formed in the same manner as in Example 1 except that the film filter was removed from the film substrate after completion, and only the film substrate was wound on a take-up reel.

Using the obtained color filter, the TFT type liquid crystal element shown in FIG. 6 was manufactured and driven. As a result, high-definition color display was possible as in Example 1.

[0063]

As described above, according to the present invention,
In the process of manufacturing a color filter using a long strip-shaped film substrate, pattern exposure can be performed continuously without stopping the film substrate, so that the working time can be greatly reduced and the manufacturing equipment is simplified. Accordingly, a color filter can be provided with high productivity, and a liquid crystal element can be provided at lower cost using the color filter.

[Brief description of the drawings]

FIG. 1 is a schematic view of the steps of one embodiment of a method for continuously producing a color filter of the present invention.

FIG. 2 is an enlarged view of the exposure apparatus of FIG.

FIG. 3 is a schematic view showing a state in which a transparent substrate is placed and fixed on a film substrate and transported in the continuous production method of the present invention.

FIG. 4 is a schematic view illustrating an example of a basic process of a method for manufacturing a color filter according to the present invention.

FIG. 5 is a schematic view showing another example of the basic steps of the method for manufacturing a color filter according to the present invention.

FIG. 6 is a schematic sectional view of an example of the liquid crystal element of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Film base material 2 Sending reel 3 Coater 4a-4d Oven 5 Exposure device 6 Ink jet recording device 7 Take-up reel 8a, 8b Gear 9a-9d Roller 11 Exposure mask 12 Reflector 13 Exposure lamp 41 Transparent substrate 42 Black matrix 43 Ink Reception layer 44 Exposure mask 45 Non-colored portion 46 Colored portion 48 Colored portion 49 Protective layer 51 Black photosensitive resin layer 52 Black matrix 57 Curable ink 58 Colored portion 61 Counter substrate 62 Common electrode 63 Pixel electrode 64, 65 Alignment film 66 LCD

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Yoshihisa Yamashita, Inventor 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc. (72) Inventor Akio Kashiwazaki 3- 30-2, Shimomaruko, Ota-ku, Tokyo Canon Inside (72) Inventor Koichiro Nakazawa 3-30-2 Shimomaruko, Ota-ku, Tokyo Within Canon Inc. (72) Inventor Masafumi Hirose 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. ( 72) Inventor Ken Miyazaki 3-30-2 Shimomaruko, Ota-ku, Tokyo F-term in Canon Inc. (reference) 2H048 BA02 BA56 BA57 BA58 BA60 BB02 BB14 BB15 BB24 BB44 2H091 FA02Y FA35Y FB02 FB03 FB04 FC01 FC10 FC22 FD04 FD05 GA01 GA13 LA12

Claims (8)

[Claims] 1. A method for continuously manufacturing a plurality of color filters having a colored portion on a transparent substrate, comprising: (1) a photosensitive resin in a predetermined area while continuously transporting a long strip-shaped film base material; Forming a layer and (2) pattern-exposing the photosensitive resin layer by continuous irradiation through the exposure mask while transporting the exposure mask so that the relative position with respect to the film substrate is constant. And (3)
A step of forming a colored portion by applying ink on the film substrate by an ink-jet method to form a colored portion. 2. The method for continuously producing a color filter according to claim 1, wherein the film substrate is a transparent substrate of a color filter, and is cut and separated one by one after a colored portion forming step. 3. The continuous method for producing a color filter according to claim 1, wherein a transparent substrate of the color filter is mounted and fixed on the film substrate and conveyed. 4. The ink-receiving layer according to claim 1, wherein the photosensitive resin layer is an ink-receiving layer, and a portion to be colored having ink absorbability by pattern exposure is located between the portions to be colored and has at least an ink absorbing property than the portion to be colored. 2. A colored portion is formed by forming a low non-colored portion and applying ink to the colored portion by an ink jet method to color the colored portion.
4. The method for continuously producing a color filter according to any one of claims 3 to 3. 5. A partition having an opening is formed by pattern exposure of the photosensitive resin layer, and a curable ink is applied to the opening surrounded by the partition by an inkjet method and cured to form a colored portion. The method for continuously producing a color filter according to claim 1. 6. The photosensitive resin layer is black, and a light-shielding layer serving also as a partition is formed by pattern exposure.
A continuous production method of the color filter described in the above. 7. A colored substrate having a colored portion on a transparent substrate,
6. A color filter manufactured by the continuous method for manufacturing a color filter according to any one of 6. 8. A liquid crystal element comprising liquid crystal sandwiched between a pair of substrates, wherein one of the substrates is formed using the color filter according to claim 7.