JP2001013620A - Heat-developable photographic sensitive material, image recording method, and image forming method by using the same - Google Patents
Heat-developable photographic sensitive material, image recording method, and image forming method by using the sameInfo
- Publication number
- JP2001013620A JP2001013620A JP11183762A JP18376299A JP2001013620A JP 2001013620 A JP2001013620 A JP 2001013620A JP 11183762 A JP11183762 A JP 11183762A JP 18376299 A JP18376299 A JP 18376299A JP 2001013620 A JP2001013620 A JP 2001013620A
- Authority
- JP
- Japan
- Prior art keywords
- group
- layer
- photothermographic material
- photosensitive
- material according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- 230000002093 peripheral effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- NFBAXHOPROOJAW-UHFFFAOYSA-N phenindione Chemical compound O=C1C2=CC=CC=C2C(=O)C1C1=CC=CC=C1 NFBAXHOPROOJAW-UHFFFAOYSA-N 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 125000001476 phosphono group Chemical group [H]OP(*)(=O)O[H] 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000768 polyamine Chemical class 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005553 polystyrene-acrylate Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical class O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 150000003236 pyrrolines Chemical class 0.000 description 1
- 125000001422 pyrrolinyl group Chemical group 0.000 description 1
- QEIQICVPDMCDHG-UHFFFAOYSA-N pyrrolo[2,3-d]triazole Chemical class N1=NC2=CC=NC2=N1 QEIQICVPDMCDHG-UHFFFAOYSA-N 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 150000008515 quinazolinediones Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical class O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 102220047090 rs6152 Human genes 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- CRDYSYOERSZTHZ-UHFFFAOYSA-M selenocyanate Chemical compound [Se-]C#N CRDYSYOERSZTHZ-UHFFFAOYSA-M 0.000 description 1
- 125000001824 selenocyanato group Chemical group *[Se]C#N 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- AQRYNYUOKMNDDV-UHFFFAOYSA-M silver behenate Chemical compound [Ag+].CCCCCCCCCCCCCCCCCCCCCC([O-])=O AQRYNYUOKMNDDV-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- ORYURPRSXLUCSS-UHFFFAOYSA-M silver;octadecanoate Chemical compound [Ag+].CCCCCCCCCCCCCCCCCC([O-])=O ORYURPRSXLUCSS-UHFFFAOYSA-M 0.000 description 1
- 229910021647 smectite Inorganic materials 0.000 description 1
- CHLCPTJLUJHDBO-UHFFFAOYSA-M sodium;benzenesulfinate Chemical compound [Na+].[O-]S(=O)C1=CC=CC=C1 CHLCPTJLUJHDBO-UHFFFAOYSA-M 0.000 description 1
- CVYDEWKUJFCYJO-UHFFFAOYSA-M sodium;docosanoate Chemical compound [Na+].CCCCCCCCCCCCCCCCCCCCCC([O-])=O CVYDEWKUJFCYJO-UHFFFAOYSA-M 0.000 description 1
- MRQYKJNZWPCFNB-UHFFFAOYSA-M sodium;icosanoate Chemical compound [Na+].CCCCCCCCCCCCCCCCCCCC([O-])=O MRQYKJNZWPCFNB-UHFFFAOYSA-M 0.000 description 1
- 239000001119 stannous chloride Chemical class 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 229960004274 stearic acid Drugs 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 150000003452 sulfinic acid derivatives Chemical class 0.000 description 1
- 125000000213 sulfino group Chemical group [H]OS(*)=O 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 description 1
- 229910052815 sulfur oxide Inorganic materials 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- AUHHYELHRWCWEZ-UHFFFAOYSA-N tetrachlorophthalic anhydride Chemical compound ClC1=C(Cl)C(Cl)=C2C(=O)OC(=O)C2=C1Cl AUHHYELHRWCWEZ-UHFFFAOYSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 125000001984 thiazolidinyl group Chemical group 0.000 description 1
- 150000003549 thiazolines Chemical class 0.000 description 1
- 125000002769 thiazolinyl group Chemical group 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 125000001391 thioamide group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- ZEMGGZBWXRYJHK-UHFFFAOYSA-N thiouracil Chemical compound O=C1C=CNC(=S)N1 ZEMGGZBWXRYJHK-UHFFFAOYSA-N 0.000 description 1
- 229950000329 thiouracil Drugs 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- INDZTCRIYSRWOH-UHFFFAOYSA-N undec-10-enyl carbamimidothioate;hydroiodide Chemical compound I.NC(=N)SCCCCCCCCCC=C INDZTCRIYSRWOH-UHFFFAOYSA-N 0.000 description 1
- 125000005500 uronium group Chemical group 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は熱現像写真感光材
料、それを用いる画像記録方法及び画像形成方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photothermographic material, an image recording method and an image forming method using the same.
【0002】[0002]
【従来の技術】従来から印刷製版や医療の分野では画像
形成材料の湿式処理に伴う廃液が作業性の上で問題とな
っていたが、近年では環境保全、省スペースの観点から
も処理廃液の減量が強く望まれている。そこで、レーザ
・イメージセッタやレーザ・イメージャにより効率的な
露光が可能で、高解像度で鮮明な黒色画像を形成するこ
とができる写真技術用途の光熱写真材料に関する技術が
必要とされてきた。2. Description of the Related Art Conventionally, in the field of printing plate making and medical treatment, a waste liquid caused by wet processing of an image forming material has been a problem in terms of workability. Weight loss is strongly desired. Therefore, there has been a need for a technique relating to photothermographic materials for photographic technology, which enables efficient exposure with a laser imagesetter or laser imager and can form a high-resolution, clear black image.
【0003】このための技術として熱現像処理法を用い
て写真画像を形成する熱現像写真感光材料は、例えば米
国特許第3,152,904号、同第3,457,07
5号、及びD.モーガン(Morgan)とB.シェリ
ー(Shely)による「熱によって処理される銀シス
テム(Thermally Processed Si
lver Systems)」(イメージング・プロセ
ッシーズ・アンド・マテリアルズ(Imaging P
rocesses and Materials) N
eblette 第8版、スタージ(Sturge)、
V.ウォールワース(Walworth)、A.シェッ
プ(Shepp)編集、第2頁、1969年)に開示さ
れている。As a technique for this, a heat-developable photographic light-sensitive material for forming a photographic image using a heat-development processing method is disclosed in, for example, US Pat. Nos. 3,152,904 and 3,457,07.
No. 5, and D.E. Morgan and B.A. Shelly Processed Si System by Shelly
Lever Systems) "(Imaging Processes and Materials (Imaging P
processes and Materials) N
Eblette Eighth Edition, Sturge,
V. Walworth, A .; Shepp, page 2, 1969).
【0004】上記文献に記載されているように、熱現像
写真感光材料は従来の湿式処理の写真感光材料と異なり
感材中に現像剤、抑制剤、その他従来は写真処理剤中に
含有していた素材を含有することを特徴としている。現
像剤など感材中に含有された化合物は熱現像処理により
感材中で拡散しそれぞれの機能を発揮し写真画像を形成
する。[0004] As described in the above literature, heat-developable photographic materials differ from conventional wet-processed photographic materials in that a photographic material contains a developer, an inhibitor and other conventional photographic processing agents. It is characterized by containing a raw material. Compounds contained in the light-sensitive material such as a developer are diffused in the light-sensitive material by a heat development process and exhibit their respective functions to form a photographic image.
【0005】上記のような様々な方法で写真要素の各層
に添加される該写真有用化合物は通常、その感光材料内
に固定されて用いられる。ところが、熱現像処理中に僅
かではあるが層外拡散して様々な問題、例えば以下の様
な問題が生じている。The photographically useful compound added to each layer of the photographic element by various methods as described above is usually used by being fixed in the photographic material. However, various problems such as the following problems have occurred during the thermal development process, although they are slightly diffused out of the layer.
【0006】(1) 現像抑制剤、現像促進剤、還元剤
或いは染料など写真性に影響を与える添加剤が感光材料
外に拡散し熱現像写真感光材料を大量に処理しているう
ちに熱現像ローラーや搬送ローラーなどに付着蓄積し、
蓄積物がその後処理されるフィルムに転写し感材の品質
の劣化や不安定にする問題を起こしている。また感材中
の昇華性の化合物が自現機内で析出し搬送不良などの問
題を起こしている。これを防止するためには、該添加剤
の分子量を大きくする、保護層または中間層を厚くする
などの対策がとられる。しかしながら、これらの対策
は、該添加剤の効果を小さくしたり、膜厚が厚くなるこ
とによりカールが悪化したりする悪作用を伴う。(1) Additives that affect photographic properties, such as a development inhibitor, a development accelerator, a reducing agent, or a dye, diffuse out of the light-sensitive material and heat-process. Accumulates and accumulates on rollers and transport rollers,
The accumulated matter is transferred to a film to be processed later, causing a problem that the quality of the photosensitive material is deteriorated or unstable. Further, a sublimable compound in the photosensitive material precipitates in the automatic developing machine, causing a problem such as poor conveyance. To prevent this, measures such as increasing the molecular weight of the additive and increasing the thickness of the protective layer or the intermediate layer are taken. However, these countermeasures are accompanied by an adverse effect such that the effect of the additive is reduced or the curl is deteriorated by increasing the film thickness.
【0007】(2) 高湿度下での保存において、該添
加物が層中を拡散して表面で析出することによる粉吹き
故障が発生する。これを解決するために、通常バインダ
ーを選択したりその量を増加したりする。しかしながら
これらの対策では十分ではなく、膜厚が厚くなることに
よりカールが悪化したりする等の弊害が生ずる。(2) During storage under high humidity, powder blowing failure occurs due to the additive diffusing in the layer and depositing on the surface. In order to solve this, a binder is usually selected or its amount is increased. However, these countermeasures are not sufficient, and an increase in film thickness causes adverse effects such as deterioration of curl.
【0008】更に、空気中からの酸素、水蒸気、窒素酸
化物、硫黄酸化物などの層内への拡散により次のような
問題が発生する。Further, the following problems occur due to the diffusion of oxygen, water vapor, nitrogen oxides, sulfur oxides, and the like from the air into the layer.
【0009】(3) 含有した化合物が酸素により酸化
されて変質する、或いは酸素の存在下で光が照射される
ことにより光退色が促進される。これを防ぐために酸化
防止剤、紫外線吸収剤の添加、或いは、酸素透過率の低
いポリマーの保護層、中間層を設ける等が行われるがそ
の効果は必ずしも十分ではなく、又カーリングも悪化さ
せる。(3) The contained compound is oxidized by oxygen to change its quality, or is irradiated with light in the presence of oxygen to promote photobleaching. In order to prevent this, an antioxidant or an ultraviolet absorber is added, or a protective layer or an intermediate layer of a polymer having a low oxygen permeability is provided, but the effect is not always sufficient and curling is also deteriorated.
【0010】(4) 高湿度下で添加化合物が変質す
る。(4) The added compound is altered under high humidity.
【0011】(5) 空気中の微量の窒素酸化物或いは
硫黄酸化物が膜中に拡散して、該写真要素中の化合物と
反応して着色、変色、変質などの問題を引き起こす。(5) A trace amount of nitrogen oxide or sulfur oxide in the air diffuses into the film and reacts with the compound in the photographic element to cause problems such as coloring, discoloration, and alteration.
【0012】上記のような問題点の解決が要望されてい
た。There has been a demand for a solution to the above problems.
【0013】[0013]
【発明が解決しようとする課題】本発明の目的は、感材
中からの溶出物を低減させることにより画像形成装置内
での添加剤の析出を防止し、且つ、大気中の種々のガス
(酸素、水蒸気、二酸化炭素、窒素酸化物、硫黄酸化物
等)の写真層内への拡散を抑制することにより、現像む
らや感度変動の少ない、良好な画像を形成する熱現像写
真感光材料、それを用いる画像記録方法及び画像形成方
法を提供することである。SUMMARY OF THE INVENTION It is an object of the present invention to prevent the deposition of additives in an image forming apparatus by reducing the amount of leaching from a light-sensitive material, and to prevent various gases (atmospheres) in the atmosphere from being produced. A heat-developable photographic light-sensitive material capable of forming a good image with less uneven development and sensitivity fluctuation by suppressing diffusion of oxygen, water vapor, carbon dioxide, nitrogen oxide, sulfur oxide, etc. into the photographic layer; And an image recording method and an image forming method using the same.
【0014】[0014]
【課題を解決するための手段】本発明の目的は下記の項
目1〜11によって達成された。The object of the present invention has been attained by the following items 1 to 11.
【0015】1.支持体の少なくとも一方の面に感光性
ハロゲン化銀を含有する感光層を有し、非感光性銀塩お
よび該非感光性銀塩の還元剤を含有する熱現像写真感光
材料において、保護層、中間層またはバックコート層が
無機層状化合物を含有することを特徴とする熱現像写真
感光材料。1. A heat-developable photographic material having a photosensitive layer containing a photosensitive silver halide on at least one surface of a support and containing a non-photosensitive silver salt and a reducing agent for the non-photosensitive silver salt, wherein a protective layer, an intermediate A photothermographic material comprising a layer or a back coat layer containing an inorganic layered compound.
【0016】2.保護層またはバックコート層が無機層
状化合物を含有することを特徴とする前記1に記載の熱
現像写真感光材料。2. 2. The photothermographic material according to the above item 1, wherein the protective layer or the back coat layer contains an inorganic layered compound.
【0017】3.保護層表面のスムースター値が0〜2
5mmHg、バックコート層の表面のスムースター値が
50〜300mmHgであることを特徴とする前記1ま
たは2に記載の熱現像写真感光材料。3. The smoother value of the protective layer surface is 0 to 2
3. The photothermographic material according to the above item 1 or 2, wherein the back coat layer has a smoother value of 50 to 300 mmHg at 5 mmHg.
【0018】4.無機層状化合物を含む層の該無機層状
化合物とバインダーの重量比が1/10〜10/1であ
ることを特徴とする前記1〜3のいずれか1項に記載の
熱現像写真感光材料。4. 4. The photothermographic material according to any one of items 1 to 3, wherein the weight ratio of the inorganic layered compound to the binder in the layer containing the inorganic layered compound is 1/10 to 10/1.
【0019】5.無機層状化合物のアスペクト比が10
0以上であることを特徴とする前記1〜4のいずれか1
項に記載の熱現像写真感光材料。5. The aspect ratio of the inorganic layered compound is 10
Any one of the above 1 to 4, which is 0 or more
4. The photothermographic material according to item 1.
【0020】6.無機層状化合物が合成雲母であること
を特徴とする前記1〜5のいずれか1項に記載の熱現像
写真感光材料。6. 6. The photothermographic material according to any one of items 1 to 5, wherein the inorganic layered compound is synthetic mica.
【0021】7.無機層状化合物がベントナイトである
ことを特徴とする前記1〜6のいずれか1項に記載の熱
現像写真感光材料。7. 7. The photothermographic material according to any one of items 1 to 6, wherein the inorganic layered compound is bentonite.
【0022】8.レーザを用いて前記1〜7のいずれか
1項に記載の熱現像写真感光材料を露光することを特徴
とする画像記録方法。8. 8. An image recording method, comprising exposing the photothermographic material according to any one of the above items 1 to 7 using a laser.
【0023】9.露光面と走査レーザ光のなす角度が実
質的に垂直になることがない露光装置を用いて前記1〜
7のいずれか1項に記載の熱現像写真感光材料を露光す
ることを特徴とする画像記録方法。9. Using an exposure apparatus in which the angle between the exposure surface and the scanning laser light is not substantially perpendicular,
8. An image recording method, comprising exposing the photothermographic material according to any one of items 7 to 7.
【0024】10.縦マルチである走査レーザ光を発す
るレーザ走査露光機を用いて、前記1〜7に記載の熱現
像写真感光材料を露光することを特徴とする画像記録方
法。10. 8. An image recording method, comprising exposing the photothermographic material according to any one of 1 to 7 above using a laser scanning exposure machine that emits a scanning laser beam that is a vertical multi.
【0025】11.前記1〜7のいずれか1項に記載の
熱現像写真感光材料が溶剤を500mg/m2以下含有
している状態において、加熱現像することを特徴とする
画像形成方法。[11] 8. An image forming method, wherein the photothermographic material according to any one of the above items 1 to 7 is heat-developed in a state where the photothermographic material contains a solvent of 500 mg / m 2 or less.
【0026】以下に本発明の詳細について述べる。The details of the present invention will be described below.
【0027】本発明で用いられる無機層状化合物として
は、ベントナイト、ヘクトナイト、モンモリロナイト等
の粘土鉱物類、合成雲母、合成スメクタイト等が挙げら
れる。これらの無機層状化合物は10〜15オングスト
ロームの厚さの単位結晶格子層からなる積層構造を有
し、格子内金属原子置換が他の粘土鉱物より著しく大き
い。その結果、格子層は正電荷不足を生じ、それを補償
するために層間にNa+、Ca2+、Mg2+等の陽イオン
を吸着している。これらの層間に介在している陽イオン
は交換性陽イオン呼ばれ、いろいろな陽イオンと交換す
る。Examples of the inorganic layered compound used in the present invention include clay minerals such as bentonite, hectonite and montmorillonite, synthetic mica, and synthetic smectite. These inorganic layered compounds have a laminated structure composed of a unit crystal lattice layer having a thickness of 10 to 15 angstroms, and the substitution of metal atoms in the lattice is significantly larger than other clay minerals. As a result, the lattice layer has a shortage of positive charges, and cations such as Na + , Ca 2+ , and Mg 2+ are adsorbed between the layers to compensate for the shortage. The cations interposed between these layers are called exchangeable cations and exchange with various cations.
【0028】本発明に用いる合成雲母としては、Naテ
トラシックマイカNaMg2.5(Si4O10)F2、Na
またはLiテニオライト(NaLi)Mg2Li(Si4
O10)F2、NaまたはLiヘクトライ(NaLi)1/3
Mg2/3Li1/3(Si4O10)F2等が挙げられる。本発
明において好ましく用いられる合成雲母のサイズは厚さ
が1〜50nm、面サイズが1〜20μmである。拡散
制御のためには、厚さは薄ければ薄いほどよく、平面サ
イズは塗布面の平滑性及び透明性を悪化しない範囲で大
きい程よい。従って、アスペクト比は100以上、好ま
しくは200以上、特に好ましくは500以上である。As synthetic mica used in the present invention, Na tetrathick mica NaMg 2.5 (Si 4 O 10 ) F 2 , Na
Alternatively, Li teniolite (NaLi) Mg 2 Li (Si 4
O 10 ) F 2 , Na or Li hextry (NaLi) 1/3
Mg 2/3 Li 1/3 (Si 4 O 10 ) F 2 and the like. The synthetic mica preferably used in the present invention has a thickness of 1 to 50 nm and a surface size of 1 to 20 μm. For diffusion control, the thinner the better, the better the flatness is, and the better the planar size is, as long as the smoothness and transparency of the coated surface are not deteriorated. Therefore, the aspect ratio is 100 or more, preferably 200 or more, and particularly preferably 500 or more.
【0029】本発明に用いられる無機層状化合物の添加
量としては、中間層または保護層に用いて拡散制御を行
う観点から、50〜500mg/m2が好ましく、更に
好ましくは100〜300mg/m2である。また、膜
質改良の観点からは、5〜5000mg/m2の範囲で
その目的に応じて任意に選ぶことができる。[0029] The addition amount of the inorganic layered compound used in the present invention, from the viewpoint of performing diffusion control using the intermediate layer or the protective layer is preferably from 50 to 500 mg / m 2, more preferably 100 to 300 mg / m 2 It is. In addition, from the viewpoint of improving the film quality, it can be arbitrarily selected in the range of 5 to 5000 mg / m 2 according to the purpose.
【0030】本発明に用いられる無機層状化合物を含む
層に用いるバインダーは透明または半透明で、一般に無
色であり、天然ポリマー合成樹脂やポリマー及びコポリ
マー、その他フィルムを形成する媒体が好ましく用いら
れる。例えば、ゼラチン、アラビアゴム、ポリ(ビニル
アルコール)、ヒドロキシエチルセルロース、セルロー
スアセテート、セルロースアセテートブチレート、ポリ
(ビニルピロリドン)、カゼイン、デンプン、ポリ(ア
クリル酸)、ポリ(メチルメタクリル酸)、ポリ(塩化
ビニル)、ポリ(メタクリル酸)、コポリ(スチレン−
無水マレイン酸)、コポリ(スチレン−アクリロニトリ
ル)、コポリ(スチレン−ブタジエン)、ポリ(ビニル
アセタール)類(例えば、ポリ(ビニルホルマール)及
びポリ(ビニルブチラール))、ポリ(エステル)類、
ポリ(ウレタン)類、フェノキシ樹脂、ポリ(塩化ビニ
リデン)、ポリ(エポキシド)類、ポリ(カーボネー
ト)類、ポリ(ビニルアセテート)、セルロースエステ
ル類、ポリ(アミド)類がある。本発明で用いられるバ
インダーは親水性でも非親水性でもよい。The binder used in the layer containing the inorganic layered compound used in the present invention is transparent or translucent and generally colorless, and natural polymer synthetic resins, polymers and copolymers, and other media for forming films are preferably used. For example, gelatin, gum arabic, poly (vinyl alcohol), hydroxyethyl cellulose, cellulose acetate, cellulose acetate butyrate, poly (vinyl pyrrolidone), casein, starch, poly (acrylic acid), poly (methyl methacrylic acid), poly (methyl methacrylic acid) Vinyl), poly (methacrylic acid), copoly (styrene-
Maleic anhydride), copoly (styrene-acrylonitrile), copoly (styrene-butadiene), poly (vinylacetal) s (eg, poly (vinylformal) and poly (vinylbutyral)), poly (esters),
There are poly (urethanes), phenoxy resins, poly (vinylidene chloride), poly (epoxides), poly (carbonates), poly (vinyl acetate), cellulose esters, and poly (amides). The binder used in the present invention may be hydrophilic or non-hydrophilic.
【0031】本発明においては、感光性層のバインダー
量が1.5〜6g/m2であることが好ましい。さらに
好ましくは1.7〜5g/m2である。In the present invention, the binder amount of the photosensitive layer is preferably from 1.5 to 6 g / m 2 . More preferably, it is 1.7 to 5 g / m 2 .
【0032】本発明に用いられる無機層状化合物添加層
のバインダー量は、無機層状化合物100重量部に対し
て、1〜2000重量部、好ましくは10〜1000重
量部、特に好ましくは20〜500重量部である。The amount of the binder in the inorganic layered compound-added layer used in the present invention is 1 to 2,000 parts by weight, preferably 10 to 1,000 parts by weight, particularly preferably 20 to 500 parts by weight, per 100 parts by weight of the inorganic layered compound. It is.
【0033】次に本発明で用いられる無機層状化合物の
分散方法について述べる。溶剤100重量部に無機層状
化合物5〜10重量添加し分散機にかけて分散する。本
発明を実施するために使用する分散機としては、機械的
に直接力を加えて分散する各種ミルによる方法、大きな
剪断力を有する高速撹拌型分散機、高強度の超音波エネ
ルギーを与える分散機などがある。具体的には、ボール
ミル、サンドグラインダーミル、ビスコミル、コロイド
ミル、ホモジナイザー、ディゾルバー、ポリトロン、ホ
モミキサー、ホモブレンダー、ケディミル、ジェットア
ジター、毛細管式乳化装置、液体サイレン、電磁歪式超
音波発生機、ポールマン笛を有する乳化装置などがあ
る。上記の方法で分散した5〜10重量%の分散物は高
粘度或いはゲル状であり、保存安定性は極めて良好であ
る。塗布液に添加する際は、溶剤で希釈し十分撹拌した
後添加する。Next, a method for dispersing the inorganic layered compound used in the present invention will be described. 5 to 10 parts by weight of the inorganic stratiform compound is added to 100 parts by weight of the solvent, and dispersed by a dispersing machine. Examples of the dispersing machine used to carry out the present invention include various milling methods in which a direct mechanical force is applied to disperse, a high-speed stirring type dispersing machine having a large shearing force, and a dispersing machine for applying high-intensity ultrasonic energy. and so on. Specifically, a ball mill, a sand grinder mill, a biscomil, a colloid mill, a homogenizer, a dissolver, a polytron, a homomixer, a homoblender, a kedi mill, a jet agitator, a capillary emulsifier, a liquid siren, an electromagnetic strain type ultrasonic generator, There is an emulsifying device having a Paulman whistle. The dispersion of 5 to 10% by weight dispersed by the above method has a high viscosity or a gel state, and has extremely good storage stability. When it is added to the coating liquid, it is added after diluting with a solvent and sufficiently stirring.
【0034】本発明で用いられる無機層状化合物は表面
がマイナスに荷電しているため、カチオン性界面活性剤
などを表面に吸着させると表面が疎水化される。このよ
うに表面が疎水化された無機層状化合物を用いる時は、
表面に吸着させた界面活性剤の疎水性部と十分親和性の
ある溶剤にて膨潤させた後、分散し、バインダー溶液を
加え、塗布液を調製できる。Since the surface of the inorganic layered compound used in the present invention is negatively charged, the surface becomes hydrophobic when a cationic surfactant or the like is adsorbed on the surface. When using an inorganic layered compound whose surface is hydrophobized in this way,
After swelling with a solvent having a sufficient affinity for the hydrophobic part of the surfactant adsorbed on the surface, the mixture is dispersed and a binder solution is added to prepare a coating solution.
【0035】前記1に記載の本発明の熱現像写真感光材
料においては、本発明で用いられる無機層状化合物が少
なくとも最外層に含有されるが、更に、無機層状化合物
が該最外層以外の層に含有されていても良い。In the photothermographic material of the present invention described in the above item 1, the inorganic layered compound used in the present invention is contained in at least the outermost layer, and the inorganic layered compound is further contained in layers other than the outermost layer. It may be contained.
【0036】また、前記2に記載の本発明の熱現像写真
感光材料においては、本発明で用いられる無機層状化合
物が保護層(最外層)、中間層またはバックコート層に
含有されるが、その他の層に、無機層状化合物が更に含
有されていても良い。In the photothermographic material of the present invention described in the above item 2, the inorganic layered compound used in the present invention is contained in the protective layer (outermost layer), the intermediate layer or the back coat layer. May further contain an inorganic layered compound.
【0037】本発明で用いられる無機層状化合物は、感
光性ハロゲン化銀を光センサーとして用いる本発明の熱
現像写真感光材料またはこれと組み合わせて用いられる
種々の写真要素等にも、適用することができる。The inorganic layered compound used in the present invention can be applied to the heat-developable photographic material of the present invention using a photosensitive silver halide as an optical sensor, or various photographic elements used in combination therewith. it can.
【0038】本発明においては、画像形成装置内での熱
現像写真感光材料の搬送性を向上させ、且つ、感度変動
や現像むらなどを低減させるという観点から、感光層側
の最外層(保護層)表面のスムースター値は、23℃、
55%RHで0〜25mmHgが好ましく、更に好まし
くは、0〜10mmHg、特に好ましくは、0〜5mm
Hgである。また、バックコート面のスムースター値は
23℃、55%RHで50〜500mmHg、好ましく
は50〜300mmHgのスムースター値である。In the present invention, from the viewpoint of improving the transportability of the photothermographic material in the image forming apparatus and reducing the sensitivity fluctuation and uneven development, the outermost layer (protective layer) on the photosensitive layer side is used. ) The surface smoother value is 23 ° C,
It is preferably 0 to 25 mmHg at 55% RH, more preferably 0 to 10 mmHg, and particularly preferably 0 to 5 mmHg.
Hg. The smoother value of the back coat surface is 50 to 500 mmHg at 23 ° C. and 55% RH, preferably 50 to 300 mmHg.
【0039】本発明において、スムースター値とは、面
の平滑度を表し、具体的には、JAPAN TAPPI
紙パルプ試験法No.5Aに記載されているスムースタ
ー平滑度の測定方法に準拠して測定される。In the present invention, the smoother value indicates the smoothness of a surface, and specifically, JAPAN TAPPI
Paper pulp test method No. It is measured according to the method for measuring smoother smoothness described in 5A.
【0040】上記記載のスムースター値によって感材の
粗面化の程度が決定される。スムースターの値が小さす
ぎると画像形成装置(自現機)内での搬送性が悪くな
る。また逆にスムースターの値が大きいと、露光の際に
光の拡散が起き、感度低下、画質低下などの問題が発生
しやすくなる。The degree of surface roughening of the light-sensitive material is determined by the smoother value described above. If the value of the smoother is too small, the transportability in the image forming apparatus (automatic processing machine) becomes poor. Conversely, if the value of the smoother is large, light diffusion occurs during exposure, and problems such as a decrease in sensitivity and a decrease in image quality tend to occur.
【0041】本発明の熱現像写真感光材料の最外層のス
ムースター値を上記記載の数値に調整するためには、例
えば、マット剤等を使用することが好ましく、更に好ま
しくは、平均粒径の異なる2種以上のマット剤を併用す
ることが好ましい。In order to adjust the smoother value of the outermost layer of the photothermographic material of the present invention to the above-mentioned value, it is preferable to use, for example, a matting agent, and more preferably to use an average particle size. It is preferable to use two or more different matting agents in combination.
【0042】また、感光性層側の最外層とバックコート
層表面で各々、異なるスムースター値を選択するように
調整することにより、自動現像機内での搬送性に優れ、
且つ、感度低下や画質劣化の少ない熱現像写真感光材料
を得ることが出来る。By adjusting the outermost layer on the photosensitive layer side and the surface of the back coat layer to select different smoother values, excellent transportability in an automatic developing machine is achieved.
Further, it is possible to obtain a heat-developable photographic light-sensitive material with less deterioration in sensitivity and image quality.
【0043】本発明においては、バッキング層と最外層
(保護層)の両方にマット剤を含有することが好まし
く、本発明の熱現像写真感光材料の寸法の繰り返し精度
を高めるには、ポリマーマット剤または無機マット剤を
乳剤層側の全バインダーに対し、重量比で0.5〜10
%含有することが好ましい。In the present invention, it is preferable that a matting agent is contained in both the backing layer and the outermost layer (protective layer). In order to improve the dimensional repetition accuracy of the photothermographic material of the present invention, a polymer matting agent is required. Alternatively, an inorganic matting agent may be used in a weight ratio of 0.5 to 10 with respect to all binders on the emulsion layer side.
%.
【0044】本発明に用いられるマット剤の材質は、有
機物及び無機物のいずれでもよい。The material of the matting agent used in the present invention may be either an organic substance or an inorganic substance.
【0045】例えば、無機物としては、スイス特許第3
30,158号等に記載のシリカ、仏国特許第1,29
6,995号等に記載のガラス粉、英国特許第1,17
3,181号等に記載のアルカリ土類金属またはカドミ
ウム、亜鉛等の炭酸塩等をマット剤として用いることが
できる。有機物としては、米国特許第2,322,03
7号等に記載の澱粉、ベルギー特許第625,451号
や英国特許第981,198号等に記載された澱粉誘導
体、特公昭44−3643号等に記載のポリビニルアル
コール、スイス特許第330,158号等に記載のポリ
スチレン或いはポリメタアクリレート、米国特許第3,
079,257号等に記載のポリアクリロニトリル、米
国特許第3,022,169号等に記載されたポリカー
ボネートの様な有機マット剤を用いることができる。For example, as inorganic substances, Swiss Patent No. 3
Silica described in No. 30,158, French Patent No. 1,29
No. 6,995, etc., British Patent No. 1,17
Alkaline earth metals or carbonates such as cadmium and zinc described in 3,181 and the like can be used as a matting agent. As organic substances, US Pat. No. 2,322,03
7, starch derivatives described in Belgian Patent No. 625,451 and British Patent No. 981,198, polyvinyl alcohol described in Japanese Patent Publication No. 44-3643, and Swiss Patent No. 330,158. Polystyrene or polymethacrylate described in U.S. Pat.
Organic matting agents such as polyacrylonitrile described in No. 079,257 and polycarbonate described in U.S. Pat. No. 3,022,169 can be used.
【0046】マット剤の形状は、定形、不定形どちらで
も良いが、好ましくは定形で、球形が好ましく用いられ
る。マット剤の大きさはマット剤の体積を球形に換算し
たときの直径で表される。本発明においては、マット剤
の粒径とはこの球形換算した直径のことを示す。The shape of the matting agent may be either regular or irregular, but is preferably regular and spherical. The size of the matting agent is represented by a diameter when the volume of the matting agent is converted into a sphere. In the present invention, the particle diameter of the matting agent refers to this spherical converted diameter.
【0047】マット剤の平均粒径としては、0.5μm
〜15μmが好ましく、更に好ましくは、1.0μm〜
10.0μmである。また、粒子サイズ分布の変動係数
としては、40%以下が好ましく、更に好ましくは30
%以下であり、特に好ましくは20%以下である。The average particle size of the matting agent is 0.5 μm
To 15 μm, more preferably 1.0 μm to
10.0 μm. The variation coefficient of the particle size distribution is preferably 40% or less, more preferably 30% or less.
%, Particularly preferably 20% or less.
【0048】ここで、粒子サイズ分布の変動係数は、下
記の式で表される値である。Here, the variation coefficient of the particle size distribution is a value represented by the following equation.
【0049】 (粒径の標準偏差)/(粒径の平均値)×100 更に、本発明においては、平均粒径の異なる2種のマッ
ト剤を混合して用いることが好ましい。2種のマット剤
料のそれぞれの添加量および割合はスムースター値、感
度、ヘイズなどのバランスに応じて任意に変えることが
できるが、平均粒径が1.0μm〜5.0μmと5.0
μm〜10.0μmのマット剤を併用して用いることに
より本発明の効果がもっともよく発揮される。(Standard deviation of particle size) / (average value of particle size) × 100 Further, in the present invention, it is preferable to use a mixture of two types of matting agents having different average particle sizes. The addition amount and ratio of each of the two matting agents can be arbitrarily changed according to the balance of the smoother value, sensitivity, haze, etc., but the average particle size is 1.0 μm to 5.0 μm and 5.0 μm.
The effect of the present invention is best exhibited by using a matting agent having a size of μm to 10.0 μm in combination.
【0050】本発明に用いられるマット剤は任意の構成
層中に含むことができるが、好ましくは感光性層以外の
構成層であり、更に好ましくは支持体から見て最も外側
の層(最外層)である。The matting agent used in the present invention can be contained in any constituent layer, but is preferably a constituent layer other than the photosensitive layer, and more preferably the outermost layer (outermost layer) as viewed from the support. ).
【0051】本発明に用いられるマット剤の添加方法
は、予め塗布液中に分散させて塗布する方法であっても
よいし、塗布液を塗布した後、乾燥が終了する以前にマ
ット剤を噴霧する方法を用いてもよい。また複数の種類
のマット剤を添加する場合は、両方の方法を併用しても
よい。The method for adding the matting agent used in the present invention may be a method in which the matting agent is dispersed in a coating solution in advance, or the matting agent may be sprayed after the coating solution is applied and before the drying is completed. May be used. When a plurality of types of matting agents are added, both methods may be used in combination.
【0052】有機銀塩化合物は、水溶性銀化合物と銀と
錯形成する化合物を混合することにより得られるが、正
混合法、逆混合法、同時混合法、特開平9−12764
3号に記載されている様なコントロールドダブルジェッ
ト法等が好ましく用いられる。例えば、有機酸にアルカ
リ金属塩(例えば、水酸化ナトリウム、水酸化カリウム
など)を加えて、有機酸アルカリ金属塩ソープ(例え
ば、ベヘン酸ナトリウム、アラキジン酸ナトリウムな
ど)を作製した後に、コントロールダブルジェットによ
り、前記ソープと硝酸銀などを添加して有機銀塩の結晶
を作製する。その際にハロゲン化銀粒子を混在させても
よい。The organic silver salt compound can be obtained by mixing a water-soluble silver compound and a compound which forms a complex with silver, and includes a normal mixing method, a reverse mixing method, a simultaneous mixing method, and a method described in JP-A-9-12764.
A controlled double jet method as described in No. 3 is preferably used. For example, after adding an alkali metal salt (eg, sodium hydroxide, potassium hydroxide, etc.) to an organic acid to produce an organic acid alkali metal salt soap (eg, sodium behenate, sodium arachidate, etc.), control double jet Thus, the soap and silver nitrate are added to produce organic silver salt crystals. At that time, silver halide grains may be mixed.
【0053】本発明に用いられる有機銀塩は、平均粒径
が1μm以下でありかつ単分散であることが好ましい。
有機銀塩の平均粒径とは、有機銀塩の粒子が例えば球
状、棒状、或いは平板状の粒子の場合には、有機銀塩粒
子の体積と同等な球を考えたときの直径をいう。平均粒
径は好ましくは0.01μm〜0.8μm、特に0.0
5μm〜0.5μmが好ましい。また単分散とは、ハロ
ゲン化銀の場合と同義であり、好ましくは変動係数が1
〜30%である。The organic silver salt used in the present invention preferably has an average particle size of 1 μm or less and is monodispersed.
The average particle size of the organic silver salt refers to the diameter of a sphere equivalent to the volume of the organic silver salt particles when the particles of the organic silver salt are, for example, spherical, rod-shaped, or tabular particles. The average particle size is preferably 0.01 μm to 0.8 μm, especially 0.0 μm.
5 μm to 0.5 μm is preferred. The term “monodisperse” is synonymous with silver halide, and preferably has a coefficient of variation of 1
3030%.
【0054】本発明に用いられる有機銀塩が平均粒径1
μm以下の単分散粒子であることがより好ましく、この
範囲にすることで濃度の高い画像が得られる。The organic silver salt used in the present invention has an average particle size of 1
It is more preferable that the particles are monodisperse particles having a particle size of not more than μm.
【0055】さらに有機銀塩は平板状粒子が全有機銀の
60%以上有することが好ましい。本発明において平板
状粒子とは平均粒径と厚さの比、いわゆる下記式で表さ
れるアスペクト比(ARと略す)が3以上のものをい
う。Further, the organic silver salt preferably has tabular grains having 60% or more of the total organic silver. In the present invention, the tabular grains mean those having an aspect ratio (abbreviated as AR) of 3 or more, which is a ratio between the average particle diameter and the thickness, that is, the following formula.
【0056】AR=平均粒径(μm)/厚さ(μm) 有機銀をこれらの形状にするためには、前記有機銀結晶
をバインダーや界面活性剤などと共にボールミルなどで
分散粉砕することで得られる。AR = average particle size (μm) / thickness (μm) In order to form organic silver into these shapes, the organic silver crystal is obtained by dispersing and pulverizing the organic silver crystal together with a binder, a surfactant and the like by a ball mill or the like. Can be
【0057】本発明において、感光材料の失透を防ぐた
めには、ハロゲン化銀及び有機銀塩の総量は、銀量に換
算して1m2当たり0.5g〜2.2gであることが好
ましい。この範囲にする時、より好ましい硬調な画像を
得ることが出来る。また銀総量に対するハロゲン化銀の
量は、重量比で50%以下、好ましくは25%以下、更
に好ましくは0.1%〜15%の範囲である。In the present invention, in order to prevent devitrification of the light-sensitive material, the total amount of silver halide and organic silver salt is preferably from 0.5 g to 2.2 g per m 2 in terms of silver amount. In this range, a more preferable high-contrast image can be obtained. The amount of silver halide relative to the total amount of silver is 50% or less by weight, preferably 25% or less, more preferably 0.1% to 15%.
【0058】本発明に用いられる有機銀塩は還元可能な
銀源であり、還元可能な銀イオン源を含有する有機酸及
びヘテロ有機酸の銀塩、特に長鎖(10〜30、好まし
くは15〜25の炭素原子数)の脂肪族カルボン酸及び
含窒素複素環が好ましい。配位子が、4.0〜10.0
の銀イオンに対する総安定定数を有する有機または無機
の銀塩錯体も有用である。好適な銀塩の例は、Rese
arch Disclosure第17029及び29
963に記載されており、次のものがある:有機酸の塩
(例えば、没食子酸、シュウ酸、ベヘン酸、ステアリン
酸、アラキジン酸、パルミチン酸、ラウリン酸等の
塩);銀のカルボキシアルキルチオ尿素塩(例えば、1
−(3−カルボキシプロピル)チオ尿素、1−(3−カ
ルボキシプロピル)−3,3−ジメチルチオ尿素等);
アルデヒドとヒドロキシ置換芳香族カルボン酸とのポリ
マー反応生成物の銀錯体(例えば、アルデヒド類(ホル
ムアルデヒド、アセトアルデヒド、ブチルアルデヒド
等)、ヒドロキシ置換酸類(例えば、サリチル酸、安息
香酸、3,5−ジヒドロキシ安息香酸、5,5−チオジ
サリチル酸)、チオン類の銀塩または錯体(例えば、3
−(2−カルボキシエチル)−4−ヒドロキシメチル−
4−(チアゾリン−2−チオン、及び3−カルボキシメ
チル−4−チアゾリン−2−チオン)、イミダゾール、
ピラゾール、ウラゾール、1,2,4−チアゾール及び
1H−テトラゾール、3−アミノ−5−ベンジルチオ−
1,2,4−トリアゾール及びベンゾトリアゾールから
選択される窒素酸と銀との錯体または塩;サッカリン、
5−クロロサリチルアルドキシム等の銀塩;及びメルカ
プチド類の銀塩。好ましい銀源はベヘン酸銀、アラキジ
ン酸銀、ステアリン酸銀である。有機銀塩は好ましくは
銀量として4g/m2以下で含有せしめる。更に好まし
くは3g/m2以下である。The organic silver salt used in the present invention is a reducible silver source, and silver salts of organic acids and heteroorganic acids containing a reducible silver ion source, especially long chains (10 to 30, preferably 15 to 15). Aliphatic carboxylic acids having up to 25 carbon atoms) and nitrogen-containing heterocycles are preferred. The ligand is 4.0 to 10.0
Also useful are organic or inorganic silver salt complexes having a total stability constant for silver ions of. An example of a suitable silver salt is Rese
arch Disclosure Nos. 17029 and 29
963, and include: salts of organic acids (eg, salts of gallic acid, oxalic acid, behenic acid, stearic acid, arachidic acid, palmitic acid, lauric acid, etc.); silver carboxyalkylthioureas Salt (for example, 1
-(3-carboxypropyl) thiourea, 1- (3-carboxypropyl) -3,3-dimethylthiourea, etc.);
Silver complexes of polymer reaction products of aldehydes and hydroxy-substituted aromatic carboxylic acids (eg, aldehydes (formaldehyde, acetaldehyde, butyraldehyde, etc.), hydroxy-substituted acids (eg, salicylic acid, benzoic acid, 3,5-dihydroxybenzoic acid) , 5,5-thiodisalicylic acid), silver salts or complexes of thiones (e.g., 3
-(2-carboxyethyl) -4-hydroxymethyl-
4- (thiazoline-2-thione and 3-carboxymethyl-4-thiazoline-2-thione), imidazole,
Pyrazole, urazole, 1,2,4-thiazole and 1H-tetrazole, 3-amino-5-benzylthio-
A complex or salt of silver and a nitrogen acid selected from 1,2,4-triazole and benzotriazole; saccharin,
Silver salts such as 5-chlorosalicylaldoxime; and silver salts of mercaptides. Preferred silver sources are silver behenate, silver arachidate and silver stearate. The organic silver salt is preferably contained at a silver amount of 4 g / m 2 or less. More preferably, it is 3 g / m 2 or less.
【0059】有機銀塩化合物は、水溶性銀化合物と銀と
錯形成する化合物を混合することにより得られるが、正
混合法、逆混合法、同時混合法、特開平9−12764
3号に記載されているコントロールドダブルジェット法
等が好ましく用いられる。The organic silver salt compound can be obtained by mixing a water-soluble silver compound and a compound which forms a complex with silver, and includes a forward mixing method, a reverse mixing method, a simultaneous mixing method, and a method described in JP-A-9-12764.
The controlled double jet method described in No. 3 is preferably used.
【0060】本発明に用いられる感光性ハロゲン化銀に
ついて説明する。The photosensitive silver halide used in the present invention will be described.
【0061】本発明に用いられるハロゲン化銀は、周期
表の6族から11族に属する金属イオンを含有すること
が好ましい。上記の金属としては、W、Fe、Co、N
i、Cu、Ru、Rh、Pd、Re、Os、Ir、P
t、Auが好ましい。The silver halide used in the present invention preferably contains metal ions belonging to groups 6 to 11 of the periodic table. The above metals include W, Fe, Co, N
i, Cu, Ru, Rh, Pd, Re, Os, Ir, P
t and Au are preferred.
【0062】これらの金属イオンは金属錯体または金属
錯体イオンの形でハロゲン化銀に導入できる。これらの
金属錯体または金属錯体イオンとしては、下記一般式で
表される6配位金属錯体が好ましい。These metal ions can be introduced into silver halide in the form of a metal complex or a metal complex ion. As these metal complexes or metal complex ions, hexacoordinate metal complexes represented by the following general formula are preferable.
【0063】一般式 〔ML6〕m 式中、Mは周期表の6〜11族の元素から選ばれる遷移
金属、Lは配位子、mは0、−、2−、3−または4−
を表す。Lで表される配位子の具体例としては、ハロゲ
ン化物(弗化物、塩化物、臭化物及び沃化物)、シアン
化物、シアナート、チオシアナート、セレノシアナー
ト、テルロシアナート、アジド及びアコの各配位子、ニ
トロシル、チオニトロシル等が挙げられ、好ましくはア
コ、ニトロシル及びチオニトロシル等である。アコ配位
子が存在する場合には、配位子の一つまたは二つを占め
ることが好ましい。Lは同一でもよく、また異なってい
てもよい。In the formula [ML 6 ] m , M is a transition metal selected from the elements of Groups 6 to 11 of the periodic table, L is a ligand, and m is 0,-, 2-, 3- or 4-
Represents Specific examples of the ligand represented by L include halides (fluoride, chloride, bromide and iodide), cyanide, cyanate, thiocyanate, selenocyanate, tellurocyanate, azide and aquo. Ligand, nitrosyl, thionitrosyl and the like, preferably aquo, nitrosyl and thionitrosyl. If an aquo ligand is present, it preferably occupies one or two of the ligands. L may be the same or different.
【0064】Mとして特に好ましい具体例は、ロジウム
(Rh)、ルテニウム(Ru)、レニウム(Re)、イ
リジウム(Ir)及びオスミウム(Os)である。Particularly preferred examples of M are rhodium (Rh), ruthenium (Ru), rhenium (Re), iridium (Ir) and osmium (Os).
【0065】以下に遷移金属錯体イオンの具体例を示す
が、本発明はこれらに限定されない。Specific examples of transition metal complex ions are shown below, but the present invention is not limited to these.
【0066】1:〔RhCl6〕3- 2:〔RuCl6〕3- 3:〔ReCl6〕3- 4:〔RuBr6〕3- 5:〔OsCl6〕3- 6:〔IrCl6〕4- 7:〔Ru(NO)Cl5〕2- 8:〔RuBr4(H2O)〕2- 9:〔Ru(NO)(H2O)Cl4〕- 10:〔RhCl5(H2O)〕2- 11:〔Re(NO)Cl5〕2- 12:〔Re(NO)(CN)5〕2- 13:〔Re(NO)Cl(CN)4〕2- 14:〔Rh(NO)2Cl4〕- 15:〔Rh(NO)(H2O)Cl4〕- 16:〔Ru(NO)(CN)5〕2- 17:〔Fe(CN)6〕3- 18:〔Rh(NS)Cl5〕2- 19:〔Os(NO)Cl5〕2- 20:〔Cr(NO)Cl5〕2- 21:〔Re(NO)Cl5〕- 22:〔Os(NS)Cl4(TeCN)〕2- 23:〔Ru(NS)Cl5〕2- 24:〔Re(NS)Cl4(SeCN)〕2- 25:〔Os(NS)Cl(SCN)4〕2- 26:〔Ir(NO)Cl5〕2- 27:〔Ir(NS)Cl5〕2− これらの金属イオン、金属錯体または金属錯体イオンは
一種類でもよいし、同種の金属及び異種の金属を二種以
上併用してもよい。これらの金属イオン、金属錯体また
は金属錯体イオンの含有量としては、一般的にはハロゲ
ン化銀1モル当たり1×10−9〜1×10-2モルが適
当であり、好ましくは1×10-8〜1×10-4モルであ
る。[0066] 1: [RhCl 6] 3- 2: [RuCl 6] 3- 3: [ReCl 6] 3- 4: [RuBr 6] 3- 5: [OsCl 6] 3- 6: [IrCl 6] 4 - 7: [Ru (NO) Cl 5] 2- 8: [RuBr 4 (H 2 O)] 2- 9: [Ru (NO) (H 2 O ) Cl 4 ] - 10: [RhCl 5 (H 2 O)] 2-11 : [Re (NO) Cl 5 ] 2-12 : [Re (NO) (CN) 5 ] 2-13 : [Re (NO) Cl (CN) 4 ] 2-14 : [Rh (NO) 2 Cl 4] - 15: [Rh (NO) (H 2 O ) Cl 4 ] - 16: [Ru (NO) (CN) 5] 2- 17: [Fe (CN) 6] 3- 18 : [Rh (NS) Cl 5] 2- 19: [Os (NO) Cl 5] 2- 20: [Cr (NO) Cl 5] 2- 21: [Re (NO) Cl 5] - 22: [Os (NS) Cl 4 (TeCN)] 2 - 23: [Ru (NS) Cl 5] 2- 24: [Re (NS) Cl 4 (SeCN ) ] 2- 25: [Os (NS) Cl (SCN) 4 ] 2- 26: [Ir (NO) Cl 5 ] 2-27 : [Ir (NS) Cl 5 ] 2- These metal ions, metal complexes or metal complex ions may be of one kind, or two or more of the same kind and different kinds of metals may be used in combination. Good. The content of these metal ions, metal complexes or metal complex ions, generally is suitably 1 × 10 -9 ~1 × 10 -2 mol per mol of silver halide, preferably 1 × 10 - It is 8 to 1 × 10 -4 mol.
【0067】これらの金属を提供する化合物は、ハロゲ
ン化銀粒子形成時に添加し、ハロゲン化銀粒子中に組み
込まれることが好ましく、ハロゲン化銀粒子の調製、つ
まり核形成、成長、物理熟成、化学増感の前後等の、い
ずれの段階で添加してもよいが、特に核形成、成長、物
理熟成の段階で添加するのが好ましく、更には核形成、
成長の段階で添加するのが好ましく、最も好ましいの
は、核形成の段階で添加することである。The compounds providing these metals are preferably added during silver halide grain formation and incorporated into silver halide grains. Preparation of silver halide grains, that is, nucleation, growth, physical ripening, and chemical ripening are carried out. Although it may be added at any stage, such as before and after sensitization, it is particularly preferable to add at the stage of nucleation, growth, and physical ripening.
It is preferably added at the stage of growth, most preferably at the stage of nucleation.
【0068】添加に際しては、数回に渡って分割して添
加してもよく、ハロゲン化銀粒子中に均一に含有させる
こともできるし、特開昭63−29603号、特開平2
−306236号、同3−167545号、同4−76
534号、同6−110146号、同5−273683
号等に記載されている様に粒子内に分布を持たせて含有
させることもできる。好ましくは粒子内部に分布をもた
せることができる。In the addition, the compound may be added in several divided portions, may be added uniformly in the silver halide grains, or may be added uniformly to the silver halide grains.
-306236, 3-167545, 4-76
No. 534, No. 6-110146, No. 5-273683
As described in Japanese Patent Application Laid-Open No. H10-284, etc., the particles can be contained in the particles with a distribution. Preferably, a distribution can be provided inside the particles.
【0069】これらの金属化合物は、水或いは適当な有
機溶媒(例えば、アルコール類、エーテル類、グリコー
ル類、ケトン類、エステル類、アミド類)に溶解して添
加することができるが、例えば金属化合物の粉末の水溶
液もしくは金属化合物とNaCl、KClとを一緒に溶
解した水溶液を、粒子形成中の水溶性銀塩溶液または水
溶性ハライド溶液中に添加しておく方法、或いは銀塩溶
液とハライド溶液が同時に混合されるとき第3の水溶液
として添加し、3液同時混合の方法でハロゲン化銀粒子
を調製する方法、粒子形成中に必要量の金属化合物の水
溶液を反応容器に投入する方法、或いはハロゲン化銀調
製時に予め金属のイオンまたは錯体イオンをドープして
ある別のハロゲン化銀粒子を添加して溶解させる方法等
がある。特に、金属化合物の粉末の水溶液もしくは金属
化合物とNaCl、KClとを一緒に溶解した水溶液を
水溶性ハライド溶液に添加する方法が好ましい。These metal compounds can be added by dissolving them in water or a suitable organic solvent (eg, alcohols, ethers, glycols, ketones, esters, amides). A method in which an aqueous solution of a powder or an aqueous solution in which a metal compound and NaCl and KCl are dissolved together is added to a water-soluble silver salt solution or a water-soluble halide solution during grain formation, or a silver salt solution and a halide solution are used. When they are mixed simultaneously, they are added as a third aqueous solution to prepare silver halide grains by a three-liquid simultaneous mixing method, a method in which a required amount of an aqueous solution of a metal compound is charged into a reaction vessel during grain formation, or a method in which halogen is added. There is a method in which another silver halide grain doped with metal ions or complex ions in advance during the preparation of silver halide is added and dissolved. In particular, a method of adding an aqueous solution of a powder of a metal compound or an aqueous solution in which a metal compound and NaCl and KCl are dissolved together is added to a water-soluble halide solution.
【0070】粒子表面に添加する時には、粒子形成直後
または物理熟成時途中もしくは終了時または化学熟成時
に必要量の金属化合物の水溶液を反応容器に投入するこ
ともできる。When adding to the surface of the particles, a required amount of an aqueous solution of a metal compound can be charged into the reaction vessel immediately after the formation of the particles, during or during physical ripening, or at the time of chemical ripening.
【0071】感光性ハロゲン化銀粒子はヌードル法、フ
ロキュレーション法、限外濾過法、電気透析法等の公知
の脱塩法により脱塩することができる。The photosensitive silver halide grains can be desalted by a known desalting method such as a noodle method, flocculation method, ultrafiltration method, and electrodialysis method.
【0072】本発明における感光性ハロゲン化銀粒子は
化学増感されていることが好ましく、増感方法としては
イオウ増感、セレン増感、テルル増感、貴金属増感、還
元増感等公知の増感法を用いることができる。また、こ
れら増感法は2種以上組み合わせて用いることもでき
る。イオウ増感にはチオ硫酸塩、チオ尿素化合物、無機
イオウ等を用いることができる。セレン増感、テルル増
感に好ましく用いられる化合物としては、特開平9−2
30527号記載の化合物を挙げることができる。貴金
属増感法に好ましく用いられる化合物としては、例えば
塩化金酸、カリウムクロロオーレート、カリウムオーリ
チオシアネート、硫化金、金セレナイド、あるいは米国
特許第2,448,060号、英国特許第618,06
1号等に記載されている化合物を挙げることができる。
還元増感法に用いられる具体的な化合物としてはアスコ
ルビン酸、二酸化チオ尿素、塩化第一スズ、ヒドラジン
誘導体、ボラン化合物、シラン化合物、ポリアミン化合
物等を用いることができる。また、乳剤のpHを7以上
またはpAgを8.3以下に保持して熟成することによ
り還元増感することができる。The photosensitive silver halide grains in the present invention are preferably chemically sensitized. Examples of the sensitization method include known methods such as sulfur sensitization, selenium sensitization, tellurium sensitization, noble metal sensitization and reduction sensitization. A sensitization method can be used. These sensitization methods can be used in combination of two or more. For sulfur sensitization, thiosulfates, thiourea compounds, inorganic sulfur and the like can be used. Compounds preferably used for selenium sensitization and tellurium sensitization are described in JP-A-9-2.
No. 30527 can be mentioned. Compounds preferably used in the noble metal sensitization method include, for example, chloroauric acid, potassium chloroaurate, potassium aurithiocyanate, gold sulfide, gold selenide, US Pat. No. 2,448,060, and British Patent 618,06.
Compounds described in No. 1 and the like can be mentioned.
Specific compounds used in the reduction sensitization method include ascorbic acid, thiourea dioxide, stannous chloride, hydrazine derivatives, borane compounds, silane compounds, polyamine compounds, and the like. Further, reduction sensitization can be achieved by ripening the emulsion while maintaining the pH of the emulsion at 7 or more or the pAg at 8.3 or less.
【0073】本発明の熱現像写真感光材料には、分光増
感色素としてシアニン色素、メロシアニン色素、コンプ
レックスシアニン色素、コンプレックスメロシアニン色
素、ホロポーラーシアニン色素、スチリル色素、ヘミシ
アニン色素、オキソノール色素、ヘミオキソノール色素
等を用いることができる。例えば特開昭63−1598
41号、同60−140335号、同63−23143
7号、同63−259651号、同63−304242
号、同63−15245号、米国特許第4,639,4
14号、同第4,740,455号、同第4,741,
966号、同第4,751,175号、同第4,83
5,096号に記載された増感色素が使用できる。The heat-developable photographic light-sensitive material of the present invention contains, as spectral sensitizing dyes, cyanine dyes, merocyanine dyes, complex cyanine dyes, complex merocyanine dyes, holopolar cyanine dyes, styryl dyes, hemicyanine dyes, oxonol dyes, and hemioxonol dyes. Dyes and the like can be used. For example, JP-A-63-1598
No. 41, No. 60-140335, No. 63-23143
No. 7, 63-259,651 and 63-304242
No. 63-15245, U.S. Pat. No. 4,639,4
No. 14, No. 4,740,455, No. 4,741,
No. 966, No. 4,751,175, No. 4,83
Sensitizing dyes described in U.S. Pat. No. 5,096 can be used.
【0074】本発明に使用される有用な増感色素は例え
ばResearch Disclosure Item
17643IV−A項(1978年12月p.23)、同
Item18431(1979年8月p.437)等に
記載もしくは引用された文献に記載されている。特に各
種レーザイメージャやスキャナの光源の分光特性に適し
た分光感度を有する増感色素を有利に選択することがで
きる。例えば特開平9−34078号、同9−5440
9号、同9−80679号記載の化合物が好ましく用い
られる。Useful sensitizing dyes for use in the present invention include, for example, Research Disclosure Item
17643 IV-A (p. 23, December 1978), and Item 18431 (p. 437, August 1979), etc. In particular, a sensitizing dye having a spectral sensitivity suitable for the spectral characteristics of the light source of various laser imagers and scanners can be advantageously selected. For example, JP-A-9-34078 and JP-A-9-5440
Compounds described in Nos. 9 and 9-80679 are preferably used.
【0075】本発明において有用なシアニン色素として
は、例えば、チアゾリン核、オキサゾリン核、ピロリン
核、ピリジン核、オキサゾール核、チアゾール核、セレ
ナゾール核およびイミダゾール核などの塩基性核を有す
るシアニン色素である。有用なメロシアニン染料で好ま
しいものは、上記の塩基性核に加えて、チオヒダントイ
ン核、ローダニン核、オキサゾリジンジオン核、チアゾ
リンジオン核、バルビツール酸核、チアゾリノン核、マ
ロノニトリル核およびピラゾロン核などの酸性核も含
む。The cyanine dye useful in the present invention is, for example, a cyanine dye having a basic nucleus such as a thiazoline nucleus, an oxazoline nucleus, a pyrroline nucleus, a pyridine nucleus, an oxazole nucleus, a thiazole nucleus, a selenazole nucleus and an imidazole nucleus. Preferred useful merocyanine dyes include, in addition to the above basic nuclei, acidic nuclei such as thiohydantoin nucleus, rhodanine nucleus, oxazolidinedione nucleus, thiazolinedione nucleus, barbituric acid nucleus, thiazolinone nucleus, malononitrile nucleus and pyrazolone nucleus. Including.
【0076】特に各種スキャナ光源の分光特性に適した
分光感度を有する増感色素を有利に選択することができ
る。例えば、(A) アルゴンレーザ光源に対しては、
特開昭60−162247号、特開平2−48653
号、米国特許第2,161,331号、西独特許第93
6,071号、特願平3−189532号等に記載のシ
ンプルメロシアニン類等、(B) ヘリウム−ネオンレ
ーザ光源に対しては、特開昭50−62425号、同5
4−18726号、同59−102229号に示された
三核シアニン色素類、特願平6−103272号に示さ
れたメロシアニン類等、(C) LED光源及び赤色半
導体レーザに対しては特公昭48−42172号、同5
1−9609号、同55−39818号へ特開昭62−
284343号、特開平2−105135号に記載され
たチアカルボシアニン類等、(D) 赤外半導体レーザ
光源に対しては、特開昭59−191032号、同60
−80841号に記載されたトリカルボシアニン類、同
59−192242号、同3−67242号の一般式
(IIIa)、一般式(IIIb)に記載された4−キノリン
核を含有するジカルボシアニン類等、上記の(A)〜
(D)等に記載の増感色素が有利に選択される。さらに
赤外レーザ光源の波長が750nm以上、さらに好まし
くは、800nm以上である場合このような波長域のレ
ーザに対応するためには、特開平4−182639、同
5−341432、特公平6−52387、同3−10
931、米国特許第5,441,866号、特開平7−
13295等に記載されている増感色素が好ましく用い
られる。これらの増感色素は単独に用いてもよいが、そ
れらの組合せを用いてもよく、増感色素の組合せは特
に、強色増感の目的でしばしば用いられる。増感色素と
ともに、それ自身分光増感作用をもたない色素あるいは
可視光を実質的に吸収しない物質であって、強色増感を
示す物質を乳剤中に含んでもよい。In particular, a sensitizing dye having a spectral sensitivity suitable for the spectral characteristics of various scanner light sources can be advantageously selected. For example, (A) For an argon laser light source,
JP-A-60-162247, JP-A-2-48653
No. 2,161,331, West German Patent No. 93
(B) Helium-neon laser light sources such as simple merocyanines described in Japanese Patent Application No. 6,071 and Japanese Patent Application No. 3-189532 are disclosed in JP-A-50-62425 and JP-A-50-62425.
(C) LED light sources and red semiconductor lasers such as trinuclear cyanine dyes described in JP-A Nos. 4-18726 and 59-102229 and merocyanines described in Japanese Patent Application No. 6-103272. 48-42172, 5
Nos. 1-9609 and 55-39818.
(D) infrared semiconductor laser light sources such as thiacarbocyanines described in JP-A-284343 and JP-A-2-105135;
Tricarbocyanines described in JP-A-80841, and dicarbocyanines containing a 4-quinoline nucleus described in the general formulas (IIIa) and (IIIb) of JP-A-59-192242 and JP-A-3-67242. The above (A) ~
The sensitizing dyes described in (D) and the like are advantageously selected. Further, when the wavelength of the infrared laser light source is 750 nm or more, and more preferably 800 nm or more, in order to cope with a laser in such a wavelength range, Japanese Patent Application Laid-Open Nos. 4-18239, 5-341432, and 6-52387. 3-10
931; U.S. Pat. No. 5,441,866;
Sensitizing dyes described in 13295 and the like are preferably used. These sensitizing dyes may be used alone or in combination, and a combination of sensitizing dyes is often used particularly for supersensitization. Along with the sensitizing dye, the emulsion may contain a dye which does not itself have a spectral sensitizing effect or a substance which does not substantially absorb visible light and exhibits supersensitization.
【0077】本発明の熱現像写真感光材料の露光は、A
rレーザ(488nm)、He−Neレーザ(633n
m)、赤色半導体レーザ(670nm)、赤外半導体レ
ーザ(780nm、820nm)などが好ましく用いら
れるが、レーザパワーがハイパワーであることや、感光
材料を透明にできるなどの点から、赤外半導体レーザが
より好ましく用いられる。The exposure of the photothermographic material of the present invention is carried out by A
r laser (488 nm), He-Ne laser (633 n
m), a red semiconductor laser (670 nm), an infrared semiconductor laser (780 nm, 820 nm) and the like are preferably used. However, from the viewpoint of high laser power and transparency of the photosensitive material, infrared semiconductor lasers are used. Lasers are more preferably used.
【0078】本発明においては、特に赤外に分光感度を
有する増感色素を用いることが好ましいが、赤外に分光
感度を有する増感色素としては下式一般式(1−a)〜
(1−d)で示される化合物を少なくとも1種含有する
ことが好ましい。In the present invention, it is particularly preferred to use a sensitizing dye having a spectral sensitivity in the infrared, but the sensitizing dye having a spectral sensitivity in the infrared is preferably represented by the following general formula (1-a):
It is preferable to contain at least one compound represented by (1-d).
【0079】[0079]
【化1】 Embedded image
【0080】式中、Z11、Z12、Z21、Z22、Z31、Z
41及びZ42は、各々、単環あるいは縮合された5員また
は6員の含窒素複素環を完成するのに必要な非金属原子
群を表し、Q31、Q32及びQ41は、各々、酸素原子、硫
黄原子、セレン原子または−N(R)−を表し、ここ
で、Rはアルキル基、アリール基または複素環基を表
す。R11、R12、R21、R22、R31、R41及びR43は、
各々、脂肪族基を表し、R 32、R33及びR42は、各々、
アルキル基、アリール基または複素環基を表す。R13、
R14、R15、R16、R17、R23、R24、R25、R26、R
27、R28、R29、R34、R35、R36、R37、R38、
R39、R44、R45、R46、R47、R48及びR49は、各
々、水素原子、アルキル基、アルコキシル基、アリール
オキシ基、アリール基、−N(W1、W2)−、−SRま
たは複素環基を表す。ここでRはアルキル基、アリール
基または複素環基を表し、W1とW2は各々、アルキル基
またはアリール基を表し、W1とW2とは互いに連結して
5員または6員の含窒素複素環を形成することもでき
る。R11とR13、R14とR16、R17とR12、R21と
R23、R24とR26、R25とR27、R26とR28、R22とR
29、R31とR34、R35とR37、R41とR44、R45とR47
及びR49とR43は互いに連結して5員または6員環を形
成することができる。X11、X21及びX41は各々、分子
内の電荷を中和するに必要なイオンを表し、m11、m
21およびm41は各々、分子内の電荷を中和するに必
要なイオンの数を表す。n11、n12、n21、n2
2、n31、n41及びn42は各々、0または1を表
し、k31、k32、k33、k41、k42及びk4
3は各々、0または1を表す。Where Z11, Z12, Ztwenty one, Ztwenty two, Z31, Z
41And Z42Is a monocyclic or fused 5-membered or
Is the nonmetallic atom required to complete the 6-membered nitrogen-containing heterocycle
Represents a group, Q31, Q32And Q41Are oxygen atom, sulfur
Represents a yellow atom, a selenium atom or -N (R)-
And R represents an alkyl group, an aryl group or a heterocyclic group.
You. R11, R12, Rtwenty one, Rtwenty two, R31, R41And R43Is
Each represents an aliphatic group; 32, R33And R42Are
Represents an alkyl group, an aryl group or a heterocyclic group. R13,
R14, RFifteen, R16, R17, Rtwenty three, Rtwenty four, Rtwenty five, R26, R
27, R28, R29, R34, R35, R36, R37, R38,
R39, R44, R45, R46, R47, R48And R49Is each
Hydrogen, alkyl, alkoxyl, aryl
An oxy group, an aryl group, -N (W1, WTwo)-, -SR or
Or a heterocyclic group. Where R is an alkyl group, aryl
A group or a heterocyclic group;1And WTwoIs an alkyl group
Or an aryl group;1And WTwoIs connected to each other
It can also form a 5- or 6-membered nitrogen-containing heterocycle.
You. R11And R13, R14And R16, R17And R12, Rtwenty oneWhen
Rtwenty three, Rtwenty fourAnd R26, Rtwenty fiveAnd R27, R26And R28, Rtwenty twoAnd R
29, R31And R34, R35And R37, R41And R44, R45And R47
And R49And R43Are connected to each other to form a 5- or 6-membered ring
Can be achieved. X11, Xtwenty oneAnd X41Are the molecules
Represents the ions necessary to neutralize the charge in
21 and m41 are each required to neutralize intramolecular charge.
Indicates the number of important ions. n11, n12, n21, n2
2, n31, n41 and n42 each represent 0 or 1.
And k31, k32, k33, k41, k42 and k4
3 represents 0 or 1, respectively.
【0081】前記一般式(1−a)で表される化合物と
しては、下式一般式(1−e)または(1−f)で示さ
れる化合物が好ましい。The compound represented by the general formula (1-a) is preferably a compound represented by the following general formula (1-e) or (1-f).
【0082】[0082]
【化2】 Embedded image
【0083】式中、Y51、Y52、Y61及びY62は各々、
酸素原子、硫黄原子、セレン原子または−(NR0)−
を表し、ここでR0は脂肪族基を表す。R51及びR52は
各々、脂肪族基を表し、R61は脂肪族基またはR65と結
合して5員または6員の縮合環を形成するのに必要な非
金属原子群を表す。R53及びR54は各々、水素原子、ア
ルキル基、アリール基または複素環基を表し、R55及び
R62は各々、水素原子、アルキル基、アリール基、複素
環基、ハロゲン原子、アルコキシル基、アリールオキシ
基、アルキルチオ基、アリールチオ基またはアミノ基を
表し、R63及びR64は各々、水素原子、アルキル基また
はR63とR64の間で結合して5員または6員の環を形成
するのに必要な非金属原子群を表す。R65は水素原子ま
たはR61との結合手を表す。A51〜A58及びA61〜A68
は各々、水素原子または置換基(置換しうる基)を表
し、A51とA52、A52とA53、A53とA54、A55と
A56、A56とA57、A57とA58及びA61とA62、A
62とA63、A63とA64、A65とA66、A66とA67、A67
とA68の少なくとも一組は互いに連結して縮合ナフトー
ル環を形成することができる。M51及びM61は各々、分
子内の電荷を中和するに必要なイオンを表し、m51及び
m61は各々、分子内の電荷を中和するに必要なイオンの
数を表す。pは2または3を表す。Wherein Y 51 , Y 52 , Y 61 and Y 62 are each
Oxygen atom, sulfur atom, selenium atom or-(NR 0 )-
Wherein R 0 represents an aliphatic group. R 51 and R 52 each represent an aliphatic group, and R 61 represents a non-metal atom group necessary for forming a 5- or 6-membered condensed ring by bonding to the aliphatic group or R 65 . R 53 and R 54 each represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and R 55 and R 62 each represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, a halogen atom, an alkoxyl group, Represents an aryloxy group, an alkylthio group, an arylthio group or an amino group, and R 63 and R 64 are each bonded to a hydrogen atom, an alkyl group or R 63 and R 64 to form a 5- or 6-membered ring; Represents a group of nonmetallic atoms necessary for R 65 represents a hydrogen atom or a bond to R 61 . A 51 to A 58 and A 61 to A 68
Each represents a hydrogen atom or a substituent (substitutable group), and A 51 and A 52 , A 52 and A 53 , A 53 and A 54 , A 55 and A 56 , A 56 and A 57 , A 57 and A58 and A61 and A62 , A
62 and A 63 , A 63 and A 64 , A 65 and A 66 , A 66 and A 67 , A 67
And at least one pair of A 68 can be linked to each other to form a fused naphthol ring. M 51 and M 61 each represent an ion required to neutralize the intramolecular charge, and m 51 and m 61 each represent the number of ions required to neutralize the intramolecular charge. p represents 2 or 3.
【0084】前記一般式(1−b)で示される化合物と
しては、下式一般式(1−g)、(1−h)または(1
−i)で示される化合物であることが好ましい。As the compound represented by the above general formula (1-b), the following general formula (1-g), (1-h) or (1-h)
It is preferably a compound represented by -i).
【0085】[0085]
【化3】 Embedded image
【0086】式中、Y71、Y72、Y81、Y82、Y91及び
Y92は各々、酸素原子、硫黄原子、セレン原子または−
(NR0)−を表し、ここでR0は脂肪族基を表す。
R71、R72、R81、R82、R91及びR92は各々、脂肪族
基を表す。R73とR74及びR93とR94は各々、お互いに
結合して5員または6員の環を形成するのに必要な非金
属原子群を表し、R75及びR95は各々、水素原子、アル
キル基、アリール基、複素環基、ハロゲン原子、アルコ
キシル基、アリールオキシ基、アルキルチオ基、アリー
ルチオ基またはアミノ基を表す。A71〜A78、A81〜A
88及びA91〜A98は各々、水素原子または置換しうる基
を表し、A71とA72、A72とA73、A73とA74、A75と
A76、A76とA77、A77とA78及びA81とA82、A82と
A83、A83とA84、A85とA86、A86とA87、A87とA
88及びA91とA92、A92とA93、A93とA94、A95とA
96、A96とA97、A97とA98の少なくとも一組は互いに
連結して縮合ナフトール環を形成することができる。M
71、M81及びM91は各々、分子内の電荷を中和するに必
要なイオンを表し、m71、m81及びm91は各々、分子内
の電荷を中和するに必要なイオンの数を表す。In the formula, Y 71 , Y 72 , Y 81 , Y 82 , Y 91 and Y 92 each represent an oxygen atom, a sulfur atom, a selenium atom or
(NR 0 ) —, where R 0 represents an aliphatic group.
R 71 , R 72 , R 81 , R 82 , R 91 and R 92 each represent an aliphatic group. R 73 and R 74 and R 93 and R 94 each represent a nonmetallic atom group necessary to form a 5- or 6-membered ring, and R 75 and R 95 each represent a hydrogen atom , An alkyl group, an aryl group, a heterocyclic group, a halogen atom, an alkoxyl group, an aryloxy group, an alkylthio group, an arylthio group or an amino group. A 71 to A 78 , A 81 to A
88 and A 91 to A 98 each represent a hydrogen atom or a substitutable group, and A 71 and A 72 , A 72 and A 73 , A 73 and A 74 , A 75 and A 76 , A 75 and A 76 , A 76 and A 77 , A 77 and A 78 and A 81 and A 82, A 82 and A 83, A 83 and A 84, A 85 and A 86, A 86 and A 87, A 87 and A
88 and A 91 and A 92 , A 92 and A 93 , A 93 and A 94 , A 95 and A
96, A 96 and A 97, A 97 and at least one pair of A 98 may be linked to form a fused naphthol ring. M
71 , M 81 and M 91 each represent an ion required to neutralize an intramolecular charge, and m 71 , m 81 and m 91 each represent the number of ions required to neutralize an intramolecular charge. Represents
【0087】以下、一般式(1−a)〜(1−d)並び
に(1−e)または(1−i)で示される増感色素につ
いて詳説する。Hereinafter, the sensitizing dyes represented by formulas (1-a) to (1-d) and (1-e) or (1-i) will be described in detail.
【0088】前記一般式(1−a)〜(1−d)におい
て、Z11、Z12、Z21、Z22、Z31、Z41及びZ42で各
々、示される5員または6員の含窒素複素環としてはオ
キサゾール核(例えば、オキサゾリジン環、オキサゾリ
ン環、ベンゾオキサゾール環、テトラヒドロベンゾオキ
サゾール環、ナフトオキサゾール環、ベンゾナフトオキ
サゾール環等)、イミダゾール核(例えば、イミダゾリ
ジン環、イミダゾリン環、ベンゾイミダゾール環、テト
ラヒドロベンゾイミダゾール環、ナフトイミダゾール
環、ベンゾナフトイミダゾール環等)、チアゾール核
(例えば、チアゾリジン環、チアゾリン環、ベンゾチア
ゾール環、テトラヒドロベンゾチアゾール環、ナフトチ
アゾール環、ベンゾナフトチアゾール環等)、セレナゾ
ール核(例えば、セレナゾリジン環、セレナゾリン環、
ベンゾセレナゾール環、テトラヒドロベンゾセレナゾー
ル環、ナフトセレナゾール環、ベンゾナフトセレナゾー
ル環等)、テルラゾール核(例えば、テルラゾリジン
環、テルラゾリン環、ベンゾテルラゾール環等)、ピリ
ジン核(例えば、ピリジン、キノリン等)、ピロール核
(例えば、ピロリジン環、ピロリン環、ピロール環、
3,3−ジアルキルインドレニン環等)が挙げられ、こ
れらの環上には後述のA1〜A98で示される置換しうる
基として説明される任意の基が置換できる。In the above general formulas (1-a) to (1-d), a 5- or 6-membered group represented by Z 11 , Z 12 , Z 21 , Z 22 , Z 31 , Z 41 and Z 42 , respectively. Examples of the nitrogen-containing heterocyclic ring include an oxazole nucleus (for example, an oxazolidine ring, an oxazoline ring, a benzoxazole ring, a tetrahydrobenzoxazole ring, a naphthoxazole ring, a benzonaphthoxazole ring, and the like), and an imidazole nucleus (for example, an imidazolidine ring, an imidazoline ring, An imidazole ring, a tetrahydrobenzimidazole ring, a naphthoimidazole ring, a benzonaphthoimidazole ring, etc.), a thiazole nucleus (for example, a thiazolidine ring, a thiazoline ring, a benzothiazole ring, a tetrahydrobenzothiazole ring, a naphthothiazole ring, a benzonaphthothiazole ring, etc.), Selenazole nucleus (for example, Renazorijin ring, selenazoline ring,
Benzoselenazole ring, tetrahydrobenzoselenazole ring, naphthoselenazole ring, benzonaphthoselenazole ring, etc., tellurazole nucleus (for example, tellurazolidine ring, tellurazoline ring, benzotellurazole ring, etc.), pyridine nucleus (for example, pyridine, quinoline) Etc.), pyrrole nucleus (for example, pyrrolidine ring, pyrroline ring, pyrrole ring,
3,3-dialkylindolenin ring), and on these rings, any group described as a substitutable group represented by A 1 to A 98 described below can be substituted.
【0089】R0、R11、R12、R21、R22、R31、R
41、R43、R51、R52、R61、R71、R72、R81、
R82、R91及びR92で各々、示される脂肪族基として
は、例えば、炭素数1〜10の分岐或は直鎖のアルキル
基(例えば、メチル基、エチル基、プロピル基、ブチル
基、ペンチル基、iso−ペンチル基、2−エチルヘキ
シル基、オクチル基、デシル基等)、炭素数3〜10の
アルケニル基(例えば、2−プロペニル基、3−ブテニ
ル基、1−メチル−3−プロペニル基、3−ペンテニル
基、1−メチル−3−ブテニル基、4−ヘキセニル基
等)、炭素数7〜10のアラルキル基(例えば、ベンジ
ル基、フェネチル基等)が挙げられる。R 0 , R 11 , R 12 , R 21 , R 22 , R 31 , R
41 , R 43 , R 51 , R 52 , R 61 , R 71 , R 72 , R 81 ,
Examples of the aliphatic group represented by R 82 , R 91 and R 92 include, for example, a branched or straight-chain alkyl group having 1 to 10 carbon atoms (for example, methyl group, ethyl group, propyl group, butyl group, Pentyl group, iso-pentyl group, 2-ethylhexyl group, octyl group, decyl group, etc., alkenyl group having 3 to 10 carbon atoms (for example, 2-propenyl group, 3-butenyl group, 1-methyl-3-propenyl group) , A 3-pentenyl group, a 1-methyl-3-butenyl group, a 4-hexenyl group, etc.) and an aralkyl group having 7 to 10 carbon atoms (eg, a benzyl group, a phenethyl group, etc.).
【0090】上述した基は、更に、低級アルキル基(例
えば、メチル基、エチル基、プロピル基等)、ハロゲン
原子(例えば、フッ素原子、塩素原子、臭素原子等)、
ビニル基、アリール基(例えば、フェニル基、p−トリ
ル基、p−ブロモフェニル基等)、トリフルオロメチル
基、アルコキシル基(例えば、メトキシ基、エトキシ
基、メトキシエトキシ基等)、アリールオキシ基(例え
ば、フェノキシ基、p−トリルオキシ基等)、シアノ
基、スルホニル基(例えば、メタンスルホニル基、トリ
フルオロメタンスルホニル基、p−トルエンスルホニル
基等)、アルコキシカルボニル基(例えば、エトキシカ
ルボニル基、ブトキシカルボニル基等)、アミノ基(例
えば、アミノ基、ビスカルボキシメチルアミノ基等)、
アリール基(例えば、フェニル基、カルボキシフェニル
基等)、複素環基(例えば、テトラヒドロフルフリル、
2−ピロリジノン−1−イル基等)、アシル基(例え
ば、アセチル基、ベンゾイル基等)、ウレイド基(例え
ば、ウレイド基、3−メチルウレイド基、3−フェニル
ウレイド基等)、チオウレイド基(例えば、チオウレイ
ド基、3−メチルチオウレイド基等)、アルキルチオ基
(例えば、メチルチオ、エチルチオ基等)、アリールチ
オ基(例えば、フェニルチオ基等)、複素環チオ基(例
えば、2−チエニルチオ基、3−チエニルチオ基等)、
カルボニルオキシ基(例えば、アセチルオキシ基、プロ
パノイルオキシ基、ベンゾイルオキシ基等)、アシルア
ミノ基(例えば、アセチルアミノ、ベンゾイルアミノ基
等)、チオアミド基(例えば、チオアセトアミド基、チ
オベンゾイルアミノ基等)等の基、あるいは、例えば、
スルホ基、カルボキシ基、ホスフォノ基、スルファート
基、ヒドロキシ基、メルカプト基、スルフィノ基、カル
バモイル基(例えば、カルバモイル基、N−メチルカル
バモイル基、N,N−テトラメチレンカルバモイル基
等)、スルファモイル基(例えば、スルファモイル基、
N,N−3−オキペンタメチレンアミノスルホニル基
等)、スルホンアミド基(例えば、メタンスルホンアミ
ド、ブタンスルホンアミド基等)、スルホニルアミノカ
ルボニル基(例えば、メタンスルホニルアミノカルボニ
ル、エタンスルホニルアミノカルボニル基等)、アシル
アミノスルホニル基(例えば、アセトアミドスルホニ
ル、メトキシアセトアミドスルホニル基等)、アシルア
ミカルボニル基(例えば、アセトアミドカルボニル、メ
トキシアセトアミドカルボニル基等)、スルフィニルア
ミノカルボニル基(例えば、メタンスルフィニルアミノ
カルボニル、エタンスルフィニルアミノカルボニル基
等)、等の親水性の基で置換されていても良い。これら
親水性の基を置換した脂肪族基の具体的例としては、カ
ルボキシメチル、カルボキシエチル、カルボキシブチ
ル、カルボキシペンチル、3−スルファ−トブチル、3
−スルホプロピル、2−ヒドロキシ−3−スルホプロピ
ル、4−スルホブチル、5−スルホペンチル、3−スル
ホペンチル、3−スルフィノブチル、3−ホスフォノプ
ロピル、ヒドロキシエチル、N−メタンスルホニルカル
バモイルメチル、2−カルボキシ−2−プロペニル、o
−スルホベンジル、p−スルホフェネチル、p−カルボ
キシベンジル等の各基が挙げられる。The above-mentioned groups further include a lower alkyl group (eg, a methyl group, an ethyl group, a propyl group, etc.), a halogen atom (eg, a fluorine atom, a chlorine atom, a bromine atom, etc.),
Vinyl group, aryl group (eg, phenyl group, p-tolyl group, p-bromophenyl group, etc.), trifluoromethyl group, alkoxyl group (eg, methoxy group, ethoxy group, methoxyethoxy group, etc.), aryloxy group ( For example, phenoxy group, p-tolyloxy group, etc.), cyano group, sulfonyl group (eg, methanesulfonyl group, trifluoromethanesulfonyl group, p-toluenesulfonyl group, etc.), alkoxycarbonyl group (eg, ethoxycarbonyl group, butoxycarbonyl group) Etc.), an amino group (for example, an amino group, a biscarboxymethylamino group, etc.),
Aryl group (for example, phenyl group, carboxyphenyl group, etc.), heterocyclic group (for example, tetrahydrofurfuryl,
2-pyrrolidinone-1-yl group, etc.), acyl group (eg, acetyl group, benzoyl group, etc.), ureido group (eg, ureido group, 3-methylureido group, 3-phenylureido group, etc.), thioureido group (eg, Thioureido group, 3-methylthioureido group, etc., alkylthio group (eg, methylthio, ethylthio group, etc.), arylthio group (eg, phenylthio group, etc.), heterocyclic thio group (eg, 2-thienylthio group, 3-thienylthio group) etc),
Carbonyloxy group (eg, acetyloxy group, propanoyloxy group, benzoyloxy group, etc.), acylamino group (eg, acetylamino, benzoylamino group, etc.), thioamide group (eg, thioacetamido group, thiobenzoylamino group, etc.) Groups, or, for example,
Sulfo group, carboxy group, phosphono group, sulfate group, hydroxy group, mercapto group, sulfino group, carbamoyl group (for example, carbamoyl group, N-methylcarbamoyl group, N, N-tetramethylenecarbamoyl group, etc.), sulfamoyl group (for example, , A sulfamoyl group,
N, N-3-oxpentamethyleneaminosulfonyl group, etc.), sulfonamide group (eg, methanesulfonamide, butanesulfonamide group, etc.), sulfonylaminocarbonyl group (eg, methanesulfonylaminocarbonyl, ethanesulfonylaminocarbonyl group, etc.) ), An acylaminosulfonyl group (eg, acetamidosulfonyl, methoxyacetamidosulfonyl group, etc.), an acylamicarbonyl group (eg, acetamidocarbonyl, methoxyacetamidocarbonyl group, etc.), a sulfinylaminocarbonyl group (eg, methanesulfinylaminocarbonyl, ethanesulfinyl) And a hydrophilic group such as aminocarbonyl group). Specific examples of the aliphatic group substituted with these hydrophilic groups include carboxymethyl, carboxyethyl, carboxybutyl, carboxypentyl, 3-sulfatobutyl,
-Sulfopropyl, 2-hydroxy-3-sulfopropyl, 4-sulfobutyl, 5-sulfopentyl, 3-sulfopentyl, 3-sulfinobutyl, 3-phosphonopropyl, hydroxyethyl, N-methanesulfonylcarbamoylmethyl, 2 -Carboxy-2-propenyl, o
-Sulfobenzyl, p-sulfophenethyl, p-carboxybenzyl and the like.
【0091】R、R13、R14、R15、R16、R17、
R23、R24、R25、R26、R27、R28、R29、R32、R
33、R34、R35、R36、R37、R38、R39、R42、
R44、R45、R46、R47、R48、R49、R53、R54、R
55、R62、R63、R64、R75及びR95で各々、示される
アルキル基としては例えば、メチル基、エチル基、ブチ
ル基、iso−ブチル基等が挙げられ、アリール基とし
ては、単環並びに多環のものを含み、例えば、フェニル
基、ナフチル基等の基が挙げられ、複素環基としては例
えば、チエニル、フリル、ピリジル、カルバゾリル、ピ
ロリル、インドリル等の各基が挙げられる。R, R 13 , R 14 , R 15 , R 16 , R 17 ,
R 23, R 24, R 25 , R 26, R 27, R 28, R 29, R 32, R
33 , R34 , R35 , R36 , R37 , R38 , R39 , R42 ,
R44 , R45 , R46 , R47 , R48 , R49 , R53 , R54 , R
Examples of the alkyl group represented by 55 , R 62 , R 63 , R 64 , R 75 and R 95 include, for example, a methyl group, an ethyl group, a butyl group, an iso-butyl group, and the like. Including monocyclic and polycyclic groups, examples include groups such as phenyl group and naphthyl group, and examples of the heterocyclic group include groups such as thienyl, furyl, pyridyl, carbazolyl, pyrrolyl, and indolyl.
【0092】これらの基にはR0、R11並びにR92等で
示される脂肪族基の説明で挙げた基が置換でき、置換さ
れたアルキル基の具体例としては、例えば、2−メトキ
シエチル、2−ヒドロキシエチル、3−エトキシカルボ
ニルプロピル、2−カルバモイルエチル、2−メタンス
ルホニルエチル、3−メタンスルホニルアミノプロピ
ル、ベンジル、フェネチル、カルボキメチル、カルボキ
シエチル、アリル、2−フリルエチル等の各基が挙げら
れ、置換されたアリール基の具体例としては、例えば、
p−カルボキシフェニル、p−N,N−ジメチルアミノ
フェニル、p−モルフォリノフェニル、p−メトキシフ
ェニル、3,4−ジメトキシフェニル、3,4−メチレ
ンジオキシフェニル、3−クロロフェニル、p−ニトロ
フェニル等の各基が挙げられ、置換された複素環基の具
体例としては、例えば、5−クロロ−2−ピリジル、5
−エトキシカルボニル−2−ピリジル、5−カルバモイ
ル−2−ピリジル等の各基が挙げられる。These groups can be substituted by the groups described in the description of the aliphatic groups represented by R 0 , R 11 and R 92. Specific examples of the substituted alkyl group include 2-methoxyethyl , 2-hydroxyethyl, 3-ethoxycarbonylpropyl, 2-carbamoylethyl, 2-methanesulfonylethyl, 3-methanesulfonylaminopropyl, benzyl, phenethyl, carboxymethyl, carboxyethyl, allyl, 2-furylethyl, etc. And specific examples of the substituted aryl group include, for example,
p-carboxyphenyl, pN, N-dimethylaminophenyl, p-morpholinophenyl, p-methoxyphenyl, 3,4-dimethoxyphenyl, 3,4-methylenedioxyphenyl, 3-chlorophenyl, p-nitrophenyl And specific examples of the substituted heterocyclic group include, for example, 5-chloro-2-pyridyl, 5
-Ethoxycarbonyl-2-pyridyl, 5-carbamoyl-2-pyridyl and the like.
【0093】W1及びW2で示されるアルキル基並びにア
リール基としては前述のRその他で説明された基が挙げ
られる。As the alkyl group and the aryl group represented by W 1 and W 2 , the groups described above for R and the like can be mentioned.
【0094】R13、R14、R15、R16、R17、R23、R
24、R25、R26、R27、R28、R29、R34、R35、
R36、R37、R38、R39、R44、R45、R46、R47、R
48、R49、R55、R62、R75及びR95で各々、示される
アルコキシル基としては、例えば、メトキシ基、エトキ
シ基、2−メトキシエトキシ基、2−ヒドロキシエトキ
シ基等が挙げられ、アリールオキシ基としては、例え
ば、フェノキシ基、2−ナフトキシ基、1−ナフトキシ
基、p−トリルオキシ基、p−メトキフェニル基等が挙
げられる。R 13 , R 14 , R 15 , R 16 , R 17 , R 23 , R
24, R 25, R 26, R 27, R 28, R 29, R 34, R 35,
R36 , R37 , R38 , R39 , R44 , R45 , R46 , R47 , R
Examples of the alkoxyl group represented by each of 48 , R 49 , R 55 , R 62 , R 75 and R 95 include, for example, a methoxy group, an ethoxy group, a 2-methoxyethoxy group, a 2-hydroxyethoxy group and the like, Examples of the aryloxy group include a phenoxy group, a 2-naphthoxy group, a 1-naphthoxy group, a p-tolyloxy group, a p-methoxyphenyl group and the like.
【0095】R55、R62、R75及びR95で各々、示され
るハロゲン原子としては例えば、フッ素原子、塩素原
子、臭素原子、沃素原子があり、アルキルチオ基として
は例えば、メチルチオ基、エチルチオ基等が挙げられ、
アリールチオ基としては、例えばフェニルチオ基、m−
クロロフェニルチオ基等が挙げられ、アミノ基としては
置換、非置換の基を含み、例えば、アミノ基、メチルア
ミノ基、ジメチルアミノ基、ジエチルアミノ基、ジフェ
ニルアミノ基、N,N−テトラメチレンアミノ基、N,
N−ペンタメチレンアミノ基等が挙げられる。Examples of the halogen atom represented by R 55 , R 62 , R 75 and R 95 include, for example, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and examples of the alkylthio group include a methylthio group and an ethylthio group. And the like,
Examples of the arylthio group include a phenylthio group and m-
Examples of the amino group include substituted and unsubstituted groups, such as an amino group, a methylamino group, a dimethylamino group, a diethylamino group, a diphenylamino group, an N, N-tetramethyleneamino group, N,
And an N-pentamethyleneamino group.
【0096】R14とR16、R24とR26、R25とR27、R
26とR28、R35とR37、R45とR47、R49とR43、R63
とR64、R73とR74及びR93とR94が各々、互いに連結
して形成することができる縮合環としては、例えば、5
員、6員の飽和または不飽和の縮合炭素環が挙げられ
る。これらの縮合環上には任意の位置に置換することが
でき、これら置換される基としては前述の脂肪族基に置
換できる基で説明した基が挙げられる。R 14 and R 16 , R 24 and R 26 , R 25 and R 27 , R
26 and R 28 , R 35 and R 37 , R 45 and R 47 , R 49 and R 43 , R 63
And R 64 , R 73 and R 74, and R 93 and R 94 may be each connected to each other to form a condensed ring, for example, 5
And 6-membered saturated or unsaturated fused carbocycles. Any of these condensed rings can be substituted at any position, and examples of these substituted groups include the groups described above as the groups that can be substituted with the aliphatic group.
【0097】R11とR13、R17とR12、R21とR23、R
22とR29、R31とR34、R41とR44が各々、互いに連結
して形成することができる縮合環としては、例えば、5
員、6員の飽和または不飽和の含窒素縮合環が挙げられ
る。W1とW2とが互いに連結して窒素原子とともに形成
される5員または6員の含窒素複素環としては、例え
ば、ピロリジン環、モルフォリン環、ピペリジン環等が
挙げられる。R 11 and R 13 , R 17 and R 12 , R 21 and R 23 , R
Examples of the condensed ring which can be formed by connecting 22 and R 29 , R 31 and R 34 , and R 41 and R 44 to each other include, for example, 5
And 6-membered saturated or unsaturated nitrogen-containing condensed rings. Examples of the 5- or 6-membered nitrogen-containing heterocyclic ring formed by connecting W 1 and W 2 together with a nitrogen atom include a pyrrolidine ring, a morpholine ring, and a piperidine ring.
【0098】A51〜A58、A61〜A68、A71〜A78、A
81〜A88及びA91〜A98で示される置換しうる基として
は各々、低級アルキル基(例えば、メチル基、エチル
基、プロピル基等)、ハロゲン原子(例えば、フッ素原
子、塩素原子、臭素原子等)、ビニル基、スチリル基、
アリール基(例えば、フェニル基、p−トリル基、p−
ブロモフェニル基等)、トリフルオロメチル基、アルコ
キシル基(例えば、メトキシ基、エトキシ基等)、アリ
ールオキシ基(例えば、フェノキシ基、p−トリルオキ
シ基等)、カルボニルオキシ基(例えば、アセチルオキ
シ基、プロパノイルオキシ基、ベンゾイルオキシ基
等)、アミノ基(例えば、アミノ、ジメチルアミノ、ア
ニリノ等の各基)、複素環基(例えば、ピリジル基、ピ
ロリル基、フリル基、チエニル基、イミダゾリル基、チ
アゾリル基、ピリミジニル基等)、アシル基(例えば、
アセチル基、ベンゾイル基等)、シアノ基、スルホニル
基(例えば、メタンスルホニル基、ベンゼンスルホニル
基等)、カルバモイル基(例えば、カルバモイル基、
N,N−ジメチルカルバモイル基、モルフォリノカルボ
ニル基等)、スルファモイル基(例えば、スルファモイ
ル基、N−フェニルスルファモイル基、モルフォリノス
ルホニル基等)、アシルアミノ基(例えば、アセチルア
ミノ基、ベンゾイルアミノ、orth−ヒドロキシベン
ゾイルアミノ基等)、スルホニルアミノ基(例えば、メ
タンスルホニルアミノ基、ベンゼンスルホニルアミノ基
等)、アルコキシカルボニル基、(例えば、メトキシカ
ルボニル基、エトキシカルボニル基、トリフルオロエト
キシカルボニル基等)、ヒドロキシル基、カルボキシル
基等の中から任意に選択される。A 51 to A 58 , A 61 to A 68 , A 71 to A 78 , A
Each Examples of the group can be substituted represented by 81 to A 88 and A 91 to A 98, a lower alkyl group (e.g., methyl group, ethyl group, propyl group, etc.), a halogen atom (e.g., fluorine atom, chlorine atom, bromine Atom), vinyl group, styryl group,
Aryl group (for example, phenyl group, p-tolyl group, p-
Bromophenyl group, etc.), trifluoromethyl group, alkoxyl group (eg, methoxy group, ethoxy group, etc.), aryloxy group (eg, phenoxy group, p-tolyloxy group, etc.), carbonyloxy group (eg, acetyloxy group, A propanoyloxy group, a benzoyloxy group, etc.), an amino group (eg, amino, dimethylamino, anilino, etc.), a heterocyclic group (eg, pyridyl group, pyrrolyl group, furyl group, thienyl group, imidazolyl group, thiazolyl) Group, pyrimidinyl group, etc.), acyl group (for example,
Acetyl group, benzoyl group, etc.), cyano group, sulfonyl group (eg, methanesulfonyl group, benzenesulfonyl group, etc.), carbamoyl group (eg, carbamoyl group,
N, N-dimethylcarbamoyl group, morpholinocarbonyl group, etc.), sulfamoyl group (eg, sulfamoyl group, N-phenylsulfamoyl group, morpholinosulfonyl group, etc.), acylamino group (eg, acetylamino group, benzoylamino, an ortho-hydroxybenzoylamino group, a sulfonylamino group (e.g., a methanesulfonylamino group, a benzenesulfonylamino group, etc.), an alkoxycarbonyl group (e.g., a methoxycarbonyl group, an ethoxycarbonyl group, a trifluoroethoxycarbonyl group, etc.), It is arbitrarily selected from a hydroxyl group, a carboxyl group and the like.
【0099】前記一般式(1−a)〜(1−i)で示さ
れる化合物において、カチオン或いはアニオンの電荷を
有する基が置換されている場合には各々、分子内の電荷
が中和するように当量のアニオン或いはカチオンで対イ
オンが形成される。例えば、X11、X21、X41、M51、
M61、M71、M81及びM91で各々、示される分子内の電
荷を中和するに必要なイオンに於いてカチオンの具体例
としては、プロトン、有機アンモニウムイオン(例え
ば、トリエチルアンモニウム、トリエタノールアンモニ
ウム等の各イオン)、無機カチオン(例えば、リチウ
ム、ナトリウム、カリウム等の各カチオン)が挙げら
れ、酸アニオンの具体例としては例えば、ハロゲンイオ
ン(例えば塩素イオン、臭素イオン、沃素イオン等)、
p−トルエンスルホン酸イオン、過塩素酸イオン、四フ
ッ化ホウ素イオン、硫酸イオン、メチル硫酸イオン、エ
チル硫酸イオン、メタンスルホン酸イオン、トリフルオ
ロメタンスルホン酸イオン等が挙げられる。In the compounds represented by the above general formulas (1-a) to (1-i), when a group having a cationic or anionic charge is substituted, each of the compounds is designed to neutralize the intramolecular charge. A counter ion is formed with an equivalent amount of an anion or cation. For example, X 11 , X 21 , X 41 , M 51 ,
Specific examples of the cation required for neutralizing the intramolecular charge represented by M 61 , M 71 , M 81 and M 91 include a proton and an organic ammonium ion (for example, triethylammonium, triethylammonium). Specific examples of the acid anion include halogen ions (eg, chloride ion, bromide ion, iodine ion, etc.), and inorganic cations (eg, cations such as lithium, sodium, and potassium). ,
Examples include p-toluenesulfonic acid ion, perchlorate ion, boron tetrafluoride ion, sulfate ion, methyl sulfate ion, ethyl sulfate ion, methanesulfonic acid ion, trifluoromethanesulfonic acid ion and the like.
【0100】一般式(1−a)〜(1−d)で示される
増感色素において、前記一般式(1−e)及び(1−
f)で示される増感色素が好ましく用いられ、前記一般
式(1−g)〜(1−i)で示される増感色素がより好
ましく用いられる。In the sensitizing dyes represented by formulas (1-a) to (1-d), the sensitizing dyes represented by formulas (1-e) and (1-d)
The sensitizing dye represented by f) is preferably used, and the sensitizing dyes represented by the general formulas (1-g) to (1-i) are more preferably used.
【0101】以下に、上記一般式(1−a)〜(1−
i)で示される増感色素(化合物)の代表的なものを示
すが、本発明はこれらの化合物に限定されない。The following formulas (1-a) to (1-a)
Representative sensitizing dyes (compounds) shown in i) are shown below, but the present invention is not limited to these compounds.
【0102】[0102]
【化4】 Embedded image
【0103】[0103]
【化5】 Embedded image
【0104】[0104]
【化6】 Embedded image
【0105】[0105]
【化7】 Embedded image
【0106】[0106]
【化8】 Embedded image
【0107】[0107]
【化9】 Embedded image
【0108】[0108]
【化10】 Embedded image
【0109】[0109]
【化11】 Embedded image
【0110】[0110]
【化12】 Embedded image
【0111】[0111]
【化13】 Embedded image
【0112】上記の赤外感光性の増感色素は、例えばエ
フ・エム・ハーマー著、The Chemistry
of Heterocylic Compounds第
18巻、The Cyanine Dyes and
Related Compounds(A.Weiss
herger ed.Interscience社刊、
New York 1964年)に記載の方法によって
容易に合成することができる。The above-mentioned infrared-sensitive sensitizing dye is described, for example, in FM Chemer's The Chemistry.
of Heterocyclic Compounds, Vol. 18, The Cyanine Dyes and
Related Compounds (A. Weiss
Herger ed. Published by Interscience,
New York 1964).
【0113】本発明に用いられる増感色素は単独で用い
てもよいが、2種以上を組み合わせて用いることもでき
る。本発明の増感色素(感光色素)を2種以上組み合わ
せる場合、感光色素はそれぞれ独立して、または予め混
合して上記のごとき方法によりハロゲン化銀乳剤中に分
散できる。本発明の感光色素とともに、強色増感を目的
として可視域に吸収を持つ色素や、それ自身分光増感作
用を持たない色素或いは可視光を実質的に吸収しない物
質であって、強色増感を示す物質を乳剤中に含んでもよ
い。The sensitizing dyes used in the present invention may be used alone or in combination of two or more. When two or more sensitizing dyes (photosensitive dyes) of the present invention are used in combination, the photosensitive dyes can be dispersed in a silver halide emulsion independently or in a premixed manner by the method described above. A dye having absorption in the visible region for the purpose of supersensitization, a dye having no spectral sensitization itself, or a substance which does not substantially absorb visible light together with the photosensitive dye of the present invention, A substance exhibiting a feeling may be contained in the emulsion.
【0114】有用な感光色素、強色増感を示す色素の組
み合わせ及び強色増感を示す物質はリサーチ・ディスク
ロージャ(Research Disclosure)
176巻17643(1978年12月発行)第23頁
IVのJ項、或いは特公昭49−25500号、同43−
4933号、特開昭59−19032号、同59−19
2242号、同62−123454号、特開平3−15
049号、同7−146527号等に記載されている。Useful photosensitive dyes, combinations of dyes exhibiting supersensitization, and substances exhibiting supersensitization are described in Research Disclosure.
176, 17643 (published December 1978), page 23
Section J of IV or JP-B-49-25500, 43-
No. 4933, JP-A-59-19032 and JP-A-59-19.
Nos. 2242 and 62-123454, JP-A-3-15
Nos. 049 and 7-146527.
【0115】本発明には現像を抑制あるいは促進させ現
像を制御するため、分光増感効率を向上させるため、現
像前後の保存性を向上させるためなどにメルカプト化合
物、ジスルフィド化合物、チオン化合物を含有させるこ
とができる。本発明にメルカプト化合物を使用する場
合、いかなる構造のものでもよいが、ArSM、Ar−
S−S−Arで表されるものが好ましい。式中、Mは水
素原子またはアルカリ金属原子であり、Arは1個以上
の窒素、イオウ、酸素、セレニウムまたはテルリウム原
子を有する芳香環または縮合芳香環である。好ましく
は、複素芳香環はベンゾイミダゾール、ナフトイミダゾ
ール、ベンゾチアゾール、ナフトチアゾール、ベンゾオ
キサゾール、ナフトオキサゾール、ベンゾセレナゾー
ル、ベンゾテルゾール、イミダゾール、オキサゾール、
ピラゾール、トリアゾール、チアジアゾール、テトラゾ
ール、トリアジン、ピリミジン、ピリダジン、ピラジ
ン、ピリジン、プリン、キノリンまたはキナゾリノンで
ある。この複素芳香環は、例えば、ハロゲン(例えば、
BrおよびCl)、ヒドロキシ、アミノ、カルボキシ、
アルキル(例えば、1個以上の炭素原子、好ましくは1
〜4個の炭素原子を有するもの)およびアルコキシル
(例えば、1個以上の炭素原子、好ましくは1〜4個の
炭素原子を有するもの)からなる置換基群から選択され
るものを有してもよい、メルカプト置換複素芳香族化合
物としては、2−メルカプトベンゾイミダゾール、2−
メルカプトベンゾオキサゾール、2−メルカプトベンゾ
チァゾール、2−メルカプト−5−メチルベンゾイミダ
ゾール、6−エトキシ−2−メルカプトベンゾチアゾー
ル、2,2′−ジチオビスベンゾチアゾール、3−メル
カプト−1,2,4−トリアゾール、4,5−ジフェニ
ル−2−イミダゾールチオール、2−メルカプトイミダ
ゾール、1−エチル−2−メルカプトベンゾイミダゾー
ル、2−メルカプトキノリン、8−メルカプトプリン、
2−メルカプト−4−(3H)キナゾリノン、7−トリ
フルオロメチル−4−キノリンチオール、2,3,5,
6−テトラクロロ−4−ピリジンチオール、4−アミノ
−6−ヒドロキシ−2−メルカプトピリミジンモノヒド
レート、2−アミノ−5−メルカプト−1,3,4−チ
アジアゾール、3−アミノ−5−メルカプト−1,2,
4−トリアゾール、4−ヒドロキシ−2−メルカプトピ
リミジン、2一メルカプトピリミジン、4,6−ジアミ
ノ−2メルカプトピリミジン、2−メルカプト−4−メ
チルピリミジンヒドロクロリド、3−メルカプト−5−
フェニル−1,2,4−トリアゾール、2−メルカプト
−4−フェニルオキサゾールなどが挙げられるが、本発
明はこれらに限定されない。これらのメルカプト化合物
の添加量としては乳剤層中に銀1モル当たり0.001
〜1.0モルの範囲が好ましく、さらに好ましくは、銀
1モル当たり0.01〜0.3モルの量である。In the present invention, a mercapto compound, a disulfide compound, and a thione compound are contained to control development by suppressing or accelerating development, to improve spectral sensitization efficiency, and to improve storage stability before and after development. be able to. When a mercapto compound is used in the present invention, it may be of any structure, but may be ArSM, Ar-
Those represented by SS-Ar are preferred. In the formula, M is a hydrogen atom or an alkali metal atom, and Ar is an aromatic ring or a condensed aromatic ring having one or more nitrogen, sulfur, oxygen, selenium or tellurium atoms. Preferably, the heteroaromatic ring is benzimidazole, naphthimidazole, benzothiazole, naphthothiazole, benzoxazole, naphthoxazole, benzoselenazole, benzoterzole, imidazole, oxazole,
Pyrazole, triazole, thiadiazole, tetrazole, triazine, pyrimidine, pyridazine, pyrazine, pyridine, purine, quinoline or quinazolinone. This heteroaromatic ring is, for example, a halogen (for example,
Br and Cl), hydroxy, amino, carboxy,
Alkyl (eg one or more carbon atoms, preferably 1
May have a substituent selected from the group consisting of those having from 1 to 4 carbon atoms) and alkoxyl (for example, having 1 or more carbon atoms, preferably having from 1 to 4 carbon atoms). Good mercapto-substituted heteroaromatic compounds include 2-mercaptobenzimidazole and 2-mercaptobenzimidazole.
Mercaptobenzoxazole, 2-mercaptobenzothiazole, 2-mercapto-5-methylbenzimidazole, 6-ethoxy-2-mercaptobenzothiazole, 2,2'-dithiobisbenzothiazole, 3-mercapto-1,2,4 -Triazole, 4,5-diphenyl-2-imidazolethiol, 2-mercaptoimidazole, 1-ethyl-2-mercaptobenzimidazole, 2-mercaptoquinoline, 8-mercaptopurine,
2-mercapto-4- (3H) quinazolinone, 7-trifluoromethyl-4-quinolinethiol, 2,3,5
6-tetrachloro-4-pyridinethiol, 4-amino-6-hydroxy-2-mercaptopyrimidine monohydrate, 2-amino-5-mercapto-1,3,4-thiadiazole, 3-amino-5-mercapto- 1,2,
4-triazole, 4-hydroxy-2-mercaptopyrimidine, 21-mercaptopyrimidine, 4,6-diamino-2mercaptopyrimidine, 2-mercapto-4-methylpyrimidine hydrochloride, 3-mercapto-5
Examples thereof include phenyl-1,2,4-triazole and 2-mercapto-4-phenyloxazole, but the present invention is not limited thereto. The addition amount of these mercapto compounds is 0.001 per mole of silver in the emulsion layer.
The range is preferably from 1.0 to 1.0 mol, more preferably from 0.01 to 0.3 mol per mol of silver.
【0116】本発明の熱現像写真感光材料には還元剤を
内蔵させることが好ましい。本発明の熱現像写真感光材
料に好適な還元剤の例は、米国特許第3,770,44
8号、同第3,773,512号、同第3,593,8
63号、及びResearch Disclosure
第17029及び29963に記載されており、次のも
のがある。The photothermographic material of the present invention preferably contains a reducing agent. Examples of the reducing agent suitable for the photothermographic material of the present invention are described in US Pat. No. 3,770,44.
No. 8, 3,773, 512, 3,593, 8
No. 63 and Research Disclosure
Nos. 17029 and 29996, and include the following.
【0117】アミノヒドロキシシクロアルケノン化合物
(例えば、2−ヒドロキシピペリジノ−2−シクロヘキ
セノン);還元剤の前駆体としてアミノリダクトン類
(reductones)エステル(例えば、ピペリジ
ノヘキソースリダクトンモノアセテート);N−ヒドロ
キシ尿素誘導体(例えば、N−p−メチルフェニル−N
−ヒドロキシ尿素);アルデヒドまたはケトンのヒドラ
ゾン類(例えば、アントラセンアルデヒドフェニルヒド
ラゾン);ホスファーアミドフェノール類;ホスファー
アミドアニリン類;ポリヒドロキシベンゼン類(例え
ば、ヒドロキノン、t−ブチル−ヒドロキノン、イソプ
ロピルヒドロキノン及び(2,5−ジヒドロキシ−フェ
ニル)メチルスルホン);スルフヒドロキサム酸類(例
えば、ベンゼンスルフヒドロキサム酸);スルホンアミ
ドアニリン類(例えば、4−(N−メタンスルホンアミ
ド)アニリン);2−テトラゾリルチオヒドロキノン類
(例えば、2−メチル−5−(1−フェニル−5−テト
ラゾリルチオ)ヒドロキノン);テトラヒドロキノキサ
リン類(例えば、1,2,3,4−テトラヒドロキノキ
サリン);アミドオキシン類;アジン類(例えば、脂肪
族カルボン酸アリールヒドラザイド類とアスコルビン酸
の組み合わせ);ポリヒドロキシベンゼンとヒドロキシ
ルアミンの組み合わせ、リダクトン及び/またはヒドラ
ジン;ヒドロキサン酸類;アジン類とスルホンアミドフ
ェノール類の組み合わせ;α−シアノフェニル酢酸誘導
体;ビス−β−ナフトールと1,3−ジヒドロキシベン
ゼン誘導体の組み合わせ;5−ピラゾロン類;スルホン
アミドフェノール還元剤;2−フェニルインダン−1,
3−ジオン等;クロマン;1,4−ジヒドロピリジン類
(例えば、2,6−ジメトキシ−3,5−ジカルボエト
キシ−1,4−ジヒドロピリジン);ビスフェノール類
(例えば、ビス(2−ヒドロキシ−3−t−ブチル−5
−メチルフェニル)メタン、ビス(6−ヒドロキシ−m
−トリ)メシトール(mesitol)、2,2−ビス
(4−ヒドロキシ−3−メチルフェニル)プロパン、
4,5−エチリデン−ビス(2−t−ブチル−6−メチ
ル)フェノール)、紫外線感応性アスコルビン酸誘導体
及び3−ピラゾリドン類。中でも特に好ましい還元剤は
ヒンダードフェノール類である。ヒンダードフェノール
類としては下記一般式(A)で示される化合物が挙げら
れる。Aminohydroxycycloalkenonone compounds (eg, 2-hydroxypiperidino-2-cyclohexenone); aminoreductones esters (eg, piperidinohexose reductone monoacetate) as precursors of reducing agents An N-hydroxyurea derivative (for example, Np-methylphenyl-N
Hydrazones of aldehydes or ketones (eg, anthracenaldehyde phenylhydrazone); phosphoramidophenols; phosphoramidoanilines; polyhydroxybenzenes (eg, hydroquinone, t-butyl-hydroquinone, isopropylhydroquinone and (2,5-dihydroxy-phenyl) methylsulfone); sulfhydroxamic acids (for example, benzenesulfhydroxamic acid); sulfonamidoanilines (for example, 4- (N-methanesulfonamido) aniline); 2-tetrazoli Ruthiohydroquinones (eg, 2-methyl-5- (1-phenyl-5-tetrazolylthio) hydroquinone); tetrahydroquinoxalines (eg, 1,2,3,4-tetrahydroquinoxaline); Synths; Azines (for example, a combination of aliphatic carboxylic acid arylhydrazides and ascorbic acid); Polyhydroxybenzene and hydroxylamine; reductone and / or hydrazine; Hydroxanoic acids; Azines and sulfonamidophenols Α-cyanophenylacetic acid derivatives; combinations of bis-β-naphthol and 1,3-dihydroxybenzene derivatives; 5-pyrazolones; sulfonamide phenol reducing agents; 2-phenylindane-1,
3-dione and the like; chroman; 1,4-dihydropyridines (eg, 2,6-dimethoxy-3,5-dicarbethoxy-1,4-dihydropyridine); bisphenols (eg, bis (2-hydroxy-3- t-butyl-5
-Methylphenyl) methane, bis (6-hydroxy-m
-Tri) mesitol, 2,2-bis (4-hydroxy-3-methylphenyl) propane,
4,5-ethylidene-bis (2-t-butyl-6-methyl) phenol), ultraviolet-sensitive ascorbic acid derivatives and 3-pyrazolidones. Among them, particularly preferred reducing agents are hindered phenols. Examples of the hindered phenols include compounds represented by the following general formula (A).
【0118】[0118]
【化14】 Embedded image
【0119】式中、Rは水素原子、または炭素原子数1
〜10のアルキル基(例えば、−C4H9、2,4,4−
トリメチルペンチル)を表し、R′及びR″は炭素原子
数1〜5のアルキル基(例えば、メチル、エチル、t−
ブチル)を表す。In the formula, R is a hydrogen atom or a group having 1 carbon atom.
10 alkyl group (e.g., -C 4 H 9, 2,4,4-
R ′ and R ″ represent an alkyl group having 1 to 5 carbon atoms (eg, methyl, ethyl, t-
Butyl).
【0120】一般式(A)で示される化合物の具体例を
以下に示す。ただし、本発明は、以下の化合物に限定さ
れるものではない。Specific examples of the compound represented by formula (A) are shown below. However, the present invention is not limited to the following compounds.
【0121】[0121]
【化15】 Embedded image
【0122】[0122]
【化16】 Embedded image
【0123】前記一般式(A)で示される化合物を始め
とする還元剤の使用量は、好ましくは銀1モル当り1×
10-2〜10モル、特に好ましくは1×10-2〜1.5
モルである。The amount of the reducing agent including the compound represented by the formula (A) is preferably 1 × per mole of silver.
10 -2 to 10 mol, particularly preferably 1 × 10 -2 to 1.5
Is a mole.
【0124】本発明の熱現像写真感光材料には、色調剤
を添加することが好ましい。好適な色調剤の例はRes
earch Disclosure第17029号に開
示されており、次のものがある。It is preferable to add a color tone agent to the photothermographic material of the present invention. Examples of suitable toning agents are Res
No. 17029, and includes the following:
【0125】イミド類(例えば、フタルイミド);環状
イミド類、ピラゾリン−5−オン類、及びキナゾリノン
(例えば、スクシンイミド、3−フェニル−2−ピラゾ
リン−5−オン、1−フェニルウラゾール、キナゾリン
及び2,4−チアゾリジンジオン);ナフタールイミド
類(例えば、N−ヒドロキシ−1,8−ナフタールイミ
ド);コバルト錯体(例えば、コバルトのヘキサミント
リフルオロアセテート)、メルカプタン類(例えば、3
−メルカプト−1,2,4−トリアゾール);N−(ア
ミノメチル)アリールジカルボキシイミド類(例えば、
N−(ジメチルアミノメチル)フタルイミド);ブロッ
クされたピラゾール類、イソチウロニウム(isoth
iuronium)誘導体及びある種の光漂白剤の組み
合わせ(例えば、N,N′−ヘキサメチレン(1−カル
バモイル−3,5−ジメチルピラゾール)、1,8−
(3,6−ジオキサオクタン)ビス(イソチウロニウム
トリフルオロアセテート)、及び2−(トリブロモメチ
ルスルホニル)ベンゾチアゾールの組み合わせ);メロ
シアニン染料(例えば、3−エチル−5−((3−エチ
ル−2−ベンゾチアゾリニリデン(ベンゾチアゾリニリ
デン))−1−メチルエチリデン)−2−チオ−2,4
−オキサゾリジンジオン);フタラジノン、フタラジノ
ン誘導体またはこれらの誘導体の金属塩(例えば、4−
(1−ナフチル)フタラジノン、6−クロロフタラジノ
ン、5,7−ジメチルオキシフタラジノン、及び2,3
−ジヒドロ−1,4−フタラジンジオン);フタラジノ
ンとスルフィン酸誘導体の組み合わせ(例えば、6−ク
ロロフタラジノン+ベンゼンスルフィン酸ナトリウムま
たは8−メチルフタラジノン+p−トリスルホン酸ナト
リウム);フタラジン+フタル酸の組み合わせ;フタラ
ジン(フタラジンの付加物を含む)とマレイン酸無水
物、及びフタル酸、2,3−ナフタレンジカルボン酸ま
たはo−フェニレン酸誘導体及びその無水物(例えば、
フタル酸、4−メチルフタル酸、4−ニトロフタル酸及
びテトラクロロフタル酸無水物)から選択される少なく
とも1つの化合物との組み合わせ;キナゾリンジオン
類、ベンゾオキサジン、ナフトキサジン誘導体;ベンゾ
オキサジン−2,4−ジオン類(例えば、1,3−ベン
ゾオキサジン−2,4−ジオン);ピリミジン類及び不
斉−トリアジン類(例えば、2,4−ジヒドロキシピリ
ミジン)、及びテトラアザペンタレン誘導体(例えば、
3,6−ジメルカプト−1,4−ジフェニル−1H,4
H−2,3a,5,6a−テトラアザペンタレン)。好
ましい色調剤としてはフタラゾンまたはフタラジンであ
る。Imides (eg, phthalimide); cyclic imides, pyrazolin-5-ones, and quinazolinones (eg, succinimide, 3-phenyl-2-pyrazolin-5-one, 1-phenylurazole, quinazoline and 2 , 4-thiazolidinedione); naphthalimides (eg, N-hydroxy-1,8-naphthalimide); cobalt complexes (eg, hexamine trifluoroacetate of cobalt), mercaptans (eg, 3
-Mercapto-1,2,4-triazole); N- (aminomethyl) aryldicarboximides (for example,
N- (dimethylaminomethyl) phthalimide); blocked pyrazoles, isothiuronium (isoth
uronium) derivatives and certain photobleaches (eg, N, N'-hexamethylene (1-carbamoyl-3,5-dimethylpyrazole), 1,8-
A combination of (3,6-dioxaoctane) bis (isothiuronium trifluoroacetate) and 2- (tribromomethylsulfonyl) benzothiazole; a merocyanine dye (e.g., 3-ethyl-5-((3-ethyl -2-benzothiazolinylidene (benzothiazolinylidene))-1-methylethylidene) -2-thio-2,4
Oxazolidinedione); phthalazinone, a phthalazinone derivative or a metal salt of these derivatives (for example, 4-
(1-naphthyl) phthalazinone, 6-chlorophthalazinone, 5,7-dimethyloxyphthalazinone, and 2,3
-Dihydro-1,4-phthalazinedione); a combination of phthalazinone and a sulfinic acid derivative (for example, 6-chlorophthalazinone + sodium benzenesulfinate or 8-methylphthalazinone + sodium p-trisulfonate); phthalazine + phthalate Combinations of acids; phthalazine (including adducts of phthalazine) and maleic anhydride, and phthalic acid, 2,3-naphthalenedicarboxylic acid or o-phenylene acid derivatives and anhydrides thereof (for example,
A combination with at least one compound selected from phthalic acid, 4-methylphthalic acid, 4-nitrophthalic acid and tetrachlorophthalic anhydride); quinazolinediones, benzoxazine, naphthoxazine derivatives; benzoxazine-2,4-dione (Eg, 1,3-benzoxazine-2,4-dione); pyrimidines and asymmetric-triazines (eg, 2,4-dihydroxypyrimidine), and tetraazapentalene derivatives (eg,
3,6-dimercapto-1,4-diphenyl-1H, 4
H-2,3a, 5,6a-tetraazapentalene). Preferred toning agents are phthalazone or phthalazine.
【0126】本発明の熱現像写真感光材料が特に600
〜800nmに発振波長を有する印刷用イメージセッタ
の出力用の熱現像写真感光材料に応用される場合、ヒド
ラジン化合物が感材中に含有されることが好ましい。本
発明に用いられる好ましいヒドラジン化合物としてはR
esearch Disclosure Item23
516(1983年11月号、P.346)およびそこ
に引用された文献の他、米国特許第4,080,207
号、同第4,269,929号、同第4,276,36
4号、同第4,278,748号、同第4,385,1
08号、同第4,459,347号、同第4,478,
928号、同第4,560,638号、同第4,68
6,167号、同第4,912,016号、同第4,9
88,604号、同第4,994,365号、同第5,
041,355号、同第5,104,769号、英国特
許第2,011,391B号、欧州特許第217,31
0号、同第301,799号、同第356,898号、
特開昭60−179734号、同61−170733
号、同61−270744号、同62−178246
号、同62−270948号、同63−29751号、
同63−32538号、同63−104047号、同6
3−121838号、同63−129337号、同63
−223744号、同63−234244号、同63−
234245号、同63−234246号、同63−2
94552号、同63−306438号、同64−10
233号、特開平1−90439号、同1−10053
0号、同1−105941号、同1−105943号、
同1−276128号、同1−280747号、同1−
283548号、同1−283549号、同1−285
940号、同2−2541号、同2−77057号、同
2−139538号、同2−196234号、同2−1
96235号、同2−198440号、同2−1984
41号、同2−198442号、同2−220042
号、同2−221953号、同2−221954号、同
2−285342号、同2−285343号、同2−2
89843号、同2−302750号、同2−3045
50号、同3−37642号、同3−54549号、同
3−125134号、同3−184039号、同3−2
40036号、同3−240037号、同3−2592
40号、同3−280038号、同3−282536
号、同4−51143号、同4−56842号、同4−
84134号、同2−230233号、同4−9605
3号、同4−216544号、同5−45761号、同
5−45762号、同5−45763号、同5−457
64号、同5−45765号、同6−289524号、
同9−160164号等に記載されたものを挙げること
ができる。The photothermographic material of the present invention is particularly preferably 600
When applied to a photothermographic material for output of a printing image setter having an oscillation wavelength of up to 800 nm, a hydrazine compound is preferably contained in the photosensitive material. Preferred hydrazine compounds used in the present invention include R
search Disclosure Item23
516 (November 1983, P. 346) and references cited therein, as well as U.S. Pat. No. 4,080,207.
No. 4,269,929 and 4,276,36
No. 4, No. 4,278,748, No. 4,385,1
No. 08, No. 4,459, 347, No. 4,478,
No. 928, No. 4,560,638, No. 4,68
Nos. 6,167, 4,912,016 and 4,9
Nos. 88,604, 4,994,365 and 5,
041,355, 5,104,769, British Patent 2,011,391B, European Patent 217,31
No. 0, No. 301,799, No. 356,898,
JP-A-60-179733 and JP-A-61-170733.
Nos. 61-270744 and 62-178246
No. 62-270948, No. 63-29751,
No. 63-32538, No. 63-104047, No. 6
Nos. 3-121838, 63-129337, 63
-223744, 63-234244, 63-
No. 234245, No. 63-234246, No. 63-2
No. 94552, No. 63-306438, No. 64-10
No. 233, JP-A-1-90439 and 1-10053
No. 0, No. 1-1055941, No. 1-105943,
No. 1-276128, No. 1-280747, No. 1-
Nos. 283548, 1-283549, 1-285
No. 940, No. 2-2541, No. 2-77057, No. 2-139538, No. 2-196234, and No. 2-1
No. 96235, No. 2-198440, No. 2-1984
No. 41, 2-198442, 2-2-20042
Nos. 2-221953, 2-221954, 2-285342, 2-285343, and 2-2
No. 89843, No. 2-302750, No. 2-30445
Nos. 50, 3-37642, 3-54549, 3-125134, 3-184039, 3-2
No. 40036, No. 3-240037, No. 3-2592
No. 40, No. 3-2820038, No. 3-282536
Nos. 4-51143, 4-56842, 4-
Nos. 84134, 2-230233, 4-9605
No. 3, 4-216544, 5-45761, 5-45762, 5-45763, 5-457
No. 64, No. 5-45765, No. 6-289524,
No. 9-160164 and the like.
【0127】またこの他にも特公平6−77138号に
記載の(化1)て表される化合物で、具体的には同公報
3頁、4頁に記載の化合物。特公平6−93082号に
記載の一般式(I)で表される化合物で、具体的には同
公報8頁〜18頁に記載の1〜38の化合物。特開平6
−230497号に記載の一般式(4)、一般式(5)
および一般式(6)で表される化合物で、具体的には同
公報25頁、26頁に記載の化合物4−1〜化合物4−
10、28頁〜36頁に記載の化合物5−1〜5−4
2、および39頁、40頁に記載の化合物6−1〜化合
物6−7。特開平6−289520号に記載の一般式
(I)および一般式(2)で表される化合物で、具体的
には同公報5頁〜7頁に記載の化合物1−1)〜1−1
7)および2−1)、特開平6−313936号に記載
の(化2)および(化3)で表される化合物で、具体的
には同公報6頁〜19頁に記載の化合物。特開平6−3
13951号に記載の(化1)で表される化合物で、具
体的には同公報3頁〜5頁に記載の化合物。特開平7−
5610号に記載の一般式(I)で表される化合物で、
具体的には同公報5頁〜10頁に記載の化合物I−1〜
I−38。特開平7−77783号に記載の一般式(I
I)で表される化合物で、具体的には同公報10頁〜2
7頁に記載の化合物II−1〜II−102。特開平7−1
04426号に記載の一般式(H)および一般式(H
a)で表される化合物で、具体的には同公報8頁〜15
頁に記載の化合物H−1〜H−44に記載されたものを
用いることができる。In addition, the compounds represented by (Chemical Formula 1) described in JP-B-6-77138, specifically, the compounds described on pages 3 and 4 of the same publication. Compounds represented by the general formula (I) described in JP-B-6-93082, specifically, compounds 1 to 38 described on pages 8 to 18 of the publication. JP 6
General formulas (4) and (5) described in JP-A-230497
And compounds represented by formula (6), specifically, compounds 4-1 to 4-
Compounds 5-1 to 5-4 described on page 10, pages 28 to 36
2, and compounds 6-1 to 6-7 described on pages 39 and 40. Compounds represented by formulas (I) and (2) described in JP-A-6-289520, specifically, compounds 1-1) to 1-1 described on pages 5 to 7 of the same publication
7) and 2-1), compounds represented by (Chemical Formula 2) and (Chemical Formula 3) described in JP-A-6-313936, specifically, compounds described on pages 6 to 19 of the same publication. JP-A-6-3
A compound represented by (Chemical Formula 1) described in No. 13951, specifically, a compound described on pages 3 to 5 of the same publication. JP-A-7-
A compound represented by the general formula (I) described in No. 5610,
Specifically, Compounds I-1 to I-5 described on pages 5 to 10 of the publication are described.
I-38. The general formula (I) described in JP-A-7-77783.
Compounds represented by I), specifically, pages 10 to 2 of the publication
Compounds II-1 to II-102 described on page 7. JP-A-7-1
General formula (H) and general formula (H
Compounds represented by a), specifically, pages 8 to 15 of the same publication.
The compounds described in Compounds H-1 to H-44 on the page can be used.
【0128】本発明の熱現像写真感光材料は常温で安定
であるが、露光後高温に加熱することで現像される。加
熱温度としては80℃以上200℃以下が好ましく、更
に好ましくは100℃以上150℃以下である。The photothermographic material of the present invention is stable at room temperature, but is developed by heating to a high temperature after exposure. The heating temperature is preferably from 80 ° C to 200 ° C, more preferably from 100 ° C to 150 ° C.
【0129】加熱することで有機銀塩(酸化剤として機
能する)と還元剤との間の酸化還元反応を通じて銀を生
成する。この酸化還元反応は露光でハロゲン化銀に発生
した潜像の触媒作用によって促進される。露光領域中の
有機銀塩の反応によって生成した銀は黒色画像を提供
し、これは非露光領域と対照をなし、画像の形成がなさ
れる。この反応過程は、外部から水等の処理液を供給す
ることなしで進行する。By heating, silver is produced through an oxidation-reduction reaction between an organic silver salt (functioning as an oxidizing agent) and a reducing agent. This oxidation-reduction reaction is accelerated by the catalytic action of the latent image generated on the silver halide upon exposure. The silver formed by the reaction of the organic silver salt in the exposed areas provides a black image, which contrasts with the unexposed areas, resulting in the formation of an image. This reaction process proceeds without supplying a processing liquid such as water from the outside.
【0130】本発明の熱現像写真感光材料は支持体上に
少なくとも一層の感光性層を有している。また感光性層
の上には少なくとも1層の非感光性層を形成されてい
る。感光性層に通過する光の量または波長分布を制御す
るために感光性層と同じ側または反対側にフィルター層
を形成しても良いし、感光性層に染料または顔料を含ま
せても良い。染料としては特開平8−201959号の
化合物が好ましい。感光性層は複数層にしても良く、ま
た階調の調節のため感度を高感層/低感層または低感層
/高感層にしても良い。各種の添加剤は感光性層、非感
光性層、またはその他の形成層のいずれに添加しても良
い。本発明の熱現像写真感光材料には例えば、界面活性
剤、酸化防止剤、安定化剤、可塑剤、紫外線吸収剤、被
覆助剤等を用いても良い。The photothermographic material of the present invention has at least one photosensitive layer on a support. At least one non-photosensitive layer is formed on the photosensitive layer. A filter layer may be formed on the same side as the photosensitive layer or on the opposite side to control the amount or wavelength distribution of light passing through the photosensitive layer, or the photosensitive layer may contain a dye or pigment. . As the dye, compounds described in JP-A-8-201959 are preferred. The photosensitive layer may be composed of a plurality of layers, and the sensitivity may be changed to a high-sensitivity layer / low-sensitivity layer or a low-sensitivity layer / high-sensitivity layer for adjusting the gradation. Various additives may be added to any of the photosensitive layer, the non-photosensitive layer, and other forming layers. The photothermographic material of the present invention may contain, for example, a surfactant, an antioxidant, a stabilizer, a plasticizer, an ultraviolet absorber, and a coating aid.
【0131】[0131]
【実施例】以下、実施例を挙げて本発明を詳細に説明す
るが、本発明はこれらに限定されない。EXAMPLES The present invention will be described in detail below with reference to examples, but the present invention is not limited thereto.
【0132】実施例1 (支持体の作製)濃度0.170(コニカ(株)製デン
シトメータPDA−65)に青色着色した、厚み175
μmのPETフィルムの両面に8W/m2・分のコロナ
放電処理を施した。Example 1 (Preparation of support) 0.175 (densitometer PDA-65 manufactured by Konica Corp.) was colored blue and had a thickness of 175.
A corona discharge treatment of 8 W / m 2 · min was applied to both sides of a μm PET film.
【0133】(感光性ハロゲン化銀乳剤Aの調製)水9
00ml中に平均分子量10万のオセインゼラチン7.
5g及び臭化カリウム10mgを溶解して温度35℃、
pHを3.0に合わせた後、硝酸銀74gを含む水溶液
370mlと(98/2)のモル比の臭化カリウムと沃
化カリウム(上記硝酸銀と当モル量)を含む水溶液37
0ml及び塩化イリジウムを銀1モル当たり1×10-4
モルを、pAg7.7に保ちながらコントロールドダブ
ルジェット法で10分間かけて添加した。その後4−ヒ
ドロキシ−6−メチル−1,3,3a,7−テトラザイ
ンデン0.3gを添加しNaOHでpHを5に調整して
平均粒子サイズ0.06μm、粒子サイズの変動係数1
2%、〔100〕面比率87%の立方体沃臭化銀粒子を
得た。この乳剤にゼラチン凝集剤を用いて凝集沈降させ
脱塩処理後フェノキシエタノール0.1gを加え、pH
5.9、pAg7.5に調整して、感光性ハロゲン化銀
乳剤Aを得た。(Preparation of Photosensitive Silver Halide Emulsion A) Water 9
6. Ossein gelatin having an average molecular weight of 100,000 in 00 ml
5 g and 10 mg of potassium bromide were dissolved at a temperature of 35 ° C.
After adjusting the pH to 3.0, an aqueous solution containing 370 ml of an aqueous solution containing 74 g of silver nitrate and an aqueous solution containing potassium bromide and potassium iodide (equimolar to the above-mentioned silver nitrate) in a molar ratio of (98/2) was used.
0 ml and iridium chloride at 1 × 10 -4 per mole of silver.
Mole was added over 10 minutes by a controlled double jet method, keeping the pAg at 7.7. Thereafter, 0.3 g of 4-hydroxy-6-methyl-1,3,3a, 7-tetrazaindene was added, the pH was adjusted to 5 with NaOH, the average particle size was 0.06 μm, and the variation coefficient of the particle size was 1
Cubic silver iodobromide grains of 2% and [100] face ratio of 87% were obtained. This emulsion was subjected to coagulation sedimentation using a gelatin coagulant, desalting treatment, and then 0.1 g of phenoxyethanol was added.
5.9 and a pAg of 7.5 to obtain a photosensitive silver halide emulsion A.
【0134】(粉末有機銀塩の調製)9450mlの純
水にベヘン酸324g、アラキジン酸99g、ステアリ
ン酸56gを80℃で溶解した。次に高速で撹拌しなが
ら1.5Mの水酸化ナトリウム水溶液980mlを添加
した。次に濃硝酸9.3mlを加えた後、55℃に冷却
して30分撹拌させて前記感光性ハロゲン化銀乳剤A
(銀量として0.9モルおよび水1400gを含有)を
5秒間で添加し5分間撹拌した後に1Mの硝酸銀溶液1
470mlを2分間かけて加え、さらに20分撹拌し、
濾過により水溶性塩類を除去した。その後、濾液の電導
度が2μS/cmになるまで脱イオン水による水洗、濾
過を繰り返し、遠心脱水を実施した後、37℃にて重量
減がなくなるまで温風乾燥を行い、粉末有機銀塩を得
た。(Preparation of Powdered Organic Silver Salt) In 9450 ml of pure water, 324 g of behenic acid, 99 g of arachidic acid and 56 g of stearic acid were dissolved at 80 ° C. Next, 980 ml of a 1.5 M aqueous sodium hydroxide solution was added while stirring at a high speed. Next, 9.3 ml of concentrated nitric acid was added, and the mixture was cooled to 55 ° C. and stirred for 30 minutes.
(Containing 0.9 mole of silver and 1400 g of water) for 5 seconds and stirred for 5 minutes, and then 1M silver nitrate solution 1
Add 470 ml over 2 minutes and stir for another 20 minutes
Water-soluble salts were removed by filtration. After that, washing with deionized water and filtration are repeated until the conductivity of the filtrate becomes 2 μS / cm, centrifugal dehydration is performed, and then hot air drying is performed at 37 ° C. until the weight is reduced, and the powdered organic silver salt is removed. Obtained.
【0135】(感光性乳剤分散液の調製)ポリビニルブ
チラール粉末(Monsanto社 Butvar B
−79)14.57gをメチルエチルケトン1457g
に溶解し、ディゾルバー型ホモジナイザにて撹拌しなが
ら、500gの粉末有機銀塩を徐々に添加して十分に混
合した。その後1mm径のZrビーズ(東レ製)を80
%充填したメディア型分散機(gettzmann社
製)にて周速13m、ミル内滞留時間0.5分間にて分
散を行ない感光性乳剤分散液を調製した。(Preparation of Photosensitive Emulsion Dispersion) Polyvinyl butyral powder (Butvar B manufactured by Monsanto)
-79) 14.57 g of methyl ethyl ketone 1457 g
And, while stirring with a dissolver-type homogenizer, 500 g of powdered organic silver salt was gradually added and mixed well. After that, 1mm diameter Zr beads (manufactured by Toray) are
The dispersion was carried out at a peripheral speed of 13 m and a residence time in the mill of 0.5 minute with a media-type disperser (manufactured by gettzmann) filled with% to prepare a photosensitive emulsion dispersion.
【0136】《赤外増感色素液の調製》350mgの赤
外増感色素1、13.96gの2−クロロ−安息香酸、
および2.14gの5−メチル−2−メルカプトベンゾ
イミダゾールをメタノール73.4mlを用い、暗所に
て溶解し赤外増感色素液を調製した。<< Preparation of Infrared Sensitizing Dye Liquid >> 350 mg of infrared sensitizing dye 1, 13.96 g of 2-chloro-benzoic acid,
And 2.14 g of 5-methyl-2-mercaptobenzimidazole were dissolved in 73.4 ml of methanol in a dark place to prepare an infrared sensitizing dye solution.
【0137】《安定剤液の調製》1.0gの安定剤1、
0.5gの酢酸カリウムをメタノール8.5gに溶解し
安定剤液を調製した。<< Preparation of Stabilizer Liquid >> 1.0 g of stabilizer 1,
0.5 g of potassium acetate was dissolved in 8.5 g of methanol to prepare a stabilizer solution.
【0138】《現像剤液の調製》17.74gの還元剤
A−3をメチルエチルケトン(MEK)に溶解し、10
0mlに仕上げ、現像剤液とした。<< Preparation of Developer Solution >> 17.74 g of reducing agent A-3 was dissolved in methyl ethyl ketone (MEK),
Finished to 0 ml and used as developer solution.
【0139】《かぶり防止剤液の調製》5.81gのか
ぶり防止剤2をMEKに溶解し、100mlに仕上げ、
かぶり防止剤液とした。<< Preparation of Antifoggant Solution >> 5.81 g of the antifoggant 2 was dissolved in MEK and finished to 100 ml.
An antifoggant solution was used.
【0140】《感光層塗布液の調製》前記感光性乳剤分
散液(50g)およびMEK15.11gを撹拌しなが
ら21℃に保温し、かぶり防止剤1(10%メタノール
溶液)390μlを加え、1時間撹拌した。さらに臭化
カルシウム(10%メタノール溶液)889μlを添加
して30分撹拌した。次に、赤外増感色素液1.416
mlおよび安定剤液667μlを添加して1時間撹拌し
た後に温度を13℃まで降温してさらに30分撹拌し
た。13℃に保温したまま、ポリビニルブチラール(M
onsanto社Butvar B−79)13.31
gを添加して30分撹拌してから、さらに撹拌を続けな
がら以下の添加物を15分間隔で添加した。<< Preparation of Coating Solution for Photosensitive Layer >> The above-mentioned photosensitive emulsion dispersion (50 g) and 15.11 g of MEK were kept at 21 ° C. while stirring, and 390 μl of antifoggant 1 (10% methanol solution) was added thereto for 1 hour. Stirred. Further, 889 μl of calcium bromide (10% methanol solution) was added, and the mixture was stirred for 30 minutes. Next, infrared sensitizing dye solution 1.416
After stirring for 1 hour, the temperature was lowered to 13 ° C., and the mixture was further stirred for 30 minutes. While keeping the temperature at 13 ° C, polyvinyl butyral (M
onsanto Butvar B-79) 13.31
g was added and stirred for 30 minutes, and then the following additives were added at 15-minute intervals while stirring was continued.
【0141】 フタラジン 305mg テトラクロロフタル酸 102mg 4−メチルフタル酸 137mg 赤外染料1 37mg 上記を添加し15分撹拌した後、 かぶり防止剤液 5.47ml 現像剤液 14.06ml DesmodurN3300(モーベイ社、脂肪族イソシアネート) 10%MEK溶液 1.60ml 上記記載の添加物を順次添加し撹拌することにより感光
層塗布液を得た。Phthalazine 305 mg Tetrachlorophthalic acid 102 mg 4-Methylphthalic acid 137 mg Infrared dye 1 37 mg After adding the above and stirring for 15 minutes, antifoggant solution 5.47 ml Developer solution 14.06 ml Desmodur N3300 (Mobay, Inc. Isocyanate) 10% MEK solution 1.60 ml The above-mentioned additives were sequentially added and stirred to obtain a photosensitive layer coating solution.
【0142】[0142]
【化17】 Embedded image
【0143】[0143]
【化18】 Embedded image
【0144】[0144]
【化19】 Embedded image
【0145】《保護層塗布液の調製》下記に示すよう
に、セルロースアセテートブチレートプリミックス溶
液、炭酸カルシウムプリミックス溶液を調製した。<< Preparation of Protective Layer Coating Solution >> As shown below, a cellulose acetate butyrate premix solution and a calcium carbonate premix solution were prepared.
【0146】(1)セルロースアセテートブチレートプ
リミックス溶液の調製 セルロースアセテートブチレートプリミックス溶液10
00gバッチを以下の如く調製した。2−ブタノン86
7.2gにセルロースアセテートブチレート(CAB
171−15S イーストマン・コダック(株)製)9
5.67gを加え2時間攪拌し完全に溶解させた。(1) Preparation of Cellulose Acetate Butyrate Premix Solution Cellulose Acetate Butyrate Premix Solution 10
A 00g batch was prepared as follows. 2-butanone 86
7.2 g of cellulose acetate butyrate (CAB)
171-15S Eastman Kodak Co., Ltd.) 9
5.67 g was added and stirred for 2 hours to completely dissolve.
【0147】(2)炭酸カルシウムプリミックス溶液の
調製 炭酸カルシウムプリミックス溶液100gバッチを以下
の如く調製した。2−ブタノン85.0gにセルロース
アセテートブチレート(CAB 171−15S イー
ストマン・コダック(株)製)15.0gを加え攪拌し
た。更に溶液を2時間攪拌し完全に溶解させた。この溶
液にピッツァー・スーパーフレックスSF200CaC
O10.0gを加えてディゾルバー型ホモジナイザにて
8000rpmで撹拌しながら45分間分散させた。(2) Preparation of Calcium Carbonate Premix Solution A 100 g batch of calcium carbonate premix solution was prepared as follows. 15.0 g of cellulose acetate butyrate (CAB 171-15S manufactured by Eastman Kodak Co., Ltd.) was added to 85.0 g of 2-butanone, and the mixture was stirred. The solution was further stirred for 2 hours to completely dissolve. This solution is added to Pitzer Superflex SF200CaC
O.Og was added, and the mixture was dispersed for 45 minutes while stirring at 8000 rpm using a dissolver-type homogenizer.
【0148】上記で得られたセルロースアセテートブチ
レートプリミックス溶液970.5g、炭酸カルシウム
プリミックス溶液29.5gを600rpmで攪拌し
た。更にアクリロイドA−21(ローム・アンド・ハー
ス製)4.29g、ムラ防止剤(KH40:非イオン性
タイプ 旭ガラス(株)製 パーフルオロアルキルエチ
レンオキシド付加物)1.43g、化合物(A)0.8
94g、化合物(B)1.43gの順に加えて混合物を
2時間攪拌し、保護層塗布液の1000gバッチを作製
した。970.5 g of the cellulose acetate butyrate premix solution obtained above and 29.5 g of the calcium carbonate premix solution were stirred at 600 rpm. Further, 4.29 g of acryloid A-21 (manufactured by Rohm and Haas), 1.43 g of a non-uniformity inhibitor (KH40: nonionic type, a perfluoroalkylethylene oxide adduct manufactured by Asahi Glass Co., Ltd.), and 0.4% of compound (A). 8
94 g and 1.43 g of the compound (B) were added in this order, and the mixture was stirred for 2 hours to prepare a 1,000 g batch of the coating solution for the protective layer.
【0149】(注:化合物(A)はベンゾトリアゾー
ル、化合物(B)はビニルスルホン化合物(HD−
1)) 《バックコート層塗布液調製》以下の組成のプリミック
ス溶液を調製した。(Note: Compound (A) is a benzotriazole, compound (B) is a vinyl sulfone compound (HD-
1)) << Preparation of Coating Solution for Backcoat Layer >> A premix solution having the following composition was prepared.
【0150】(1)セルロースアセテートブチレートプ
リミックス溶液の調製 塗布液材料の1000gバッチを以下の如く調製した。
2−ブタノン704.8gにセルロースアセテートブチ
レート(CAB 381−20 イーストマン・コダッ
ク(株)製)84.18g、グッドイヤー製ヴィッテル
2200B4.29gを加えて2時間攪拌し完全に溶解
させた。(1) Preparation of Cellulose Acetate Butyrate Premix Solution A 1,000 g batch of the coating solution material was prepared as follows.
To 704.8 g of 2-butanone, 84.18 g of cellulose acetate butyrate (CAB 381-20 manufactured by Eastman Kodak Co., Ltd.) and 4.29 g of Vittel 2200B manufactured by Goodyear were added and stirred for 2 hours to completely dissolve.
【0151】(2)シロイドX6000プリミックス溶
液の調製 シロイドX6000プリミックス溶液の200gバッチ
を以下の如く調製した。2−ブタノン199.2gにシ
リカ(シロイド74−X6000 W.R.グレース
製)0.76gを添加しスラリーとした。スラリーをホ
モジナイザー内に於いて、280kgf/cm2(40
00psi)で1回パスして均質化した。(2) Preparation of Syloid X6000 Premix Solution A 200 g batch of the Syloid X6000 premix solution was prepared as follows. To 199.2 g of 2-butanone, 0.76 g of silica (Syloid 74-X6000 WR Grace) was added to form a slurry. The slurry was placed in a homogenizer at 280 kgf / cm 2 (40
(00 psi) for one pass to homogenize.
【0152】上記記載のセルロースアセテートブチレー
トプリミックス溶液789.0gに0.314gの赤外
染料1、シロイドX6000/ブタノンプリミックス溶
液197.0gを添加しよく攪拌した。最後にムラ防止
剤(KH40:非イオン性タイプ パーフルオロアルキ
ルエチレンオキシド付加物 旭ガラス(株)製)9.3
7gを加え攪拌し溶液を完全に溶解し、バックコート層
塗布液の1000gバッチを作製した。To 789.0 g of the cellulose acetate butyrate premix solution described above, 0.314 g of infrared dye 1 and 197.0 g of a syloid X6000 / butanone premix solution were added and stirred well. Finally, an unevenness inhibitor (KH40: nonionic type perfluoroalkyl ethylene oxide adduct, manufactured by Asahi Glass Co., Ltd.) 9.3
7 g was added and stirred to completely dissolve the solution, thereby preparing a 1000 g batch of the back coat layer coating solution.
【0153】《塗布工程及び熱現像写真感光材料の作
製》上記記載のバックコート層塗布液をエクストリュー
ジョンコーターに設置し、感光層を有する側とは反対側
の支持体面に塗布した。塗布はバインダーとしてのセル
ロースアセテートブチレートが3.71g/m2となる
ように均一塗布した。塗布はエクストリュージョンコー
ターを用いて行った。その後、100℃、1分間加熱乾
燥を行った。<< Coating Step and Preparation of Photothermographic Photosensitive Material >> The coating solution for the back coat layer described above was placed on an extrusion coater, and applied to the side of the support opposite to the side having the photosensitive layer. Coating was performed uniformly so that cellulose acetate butyrate as a binder was 3.71 g / m 2 . The coating was performed using an extrusion coater. Thereafter, heating and drying were performed at 100 ° C. for 1 minute.
【0154】続いて、エクストリュージョンコーターを
用い、上記のバックコート層塗布済みの支持体上に赤外
線安全光条件下で保護層塗布液と感光層塗布液の同時重
層塗布を行った。感光層は前記の組成の液を塗布銀量
2.0g/m2、バインダーとしてのポリビニルブチラ
ールを8.5g/m2になる様に塗布した。また保護層
はバインダーとしてのセルロースアセテートブチレート
が2.34g/m2となるように均一塗布した。塗布
後、75℃、4分間加熱乾燥を行った。このようにして
熱現像写真感光材料を作製した。Subsequently, using an extrusion coater, a protective layer coating solution and a photosensitive layer coating solution were simultaneously coated on the support coated with the back coat layer under infrared safe light conditions. The photosensitive layer was coated with the liquid having the above composition so that the coating silver amount was 2.0 g / m 2 and polyvinyl butyral as a binder was 8.5 g / m 2 . Further, the protective layer was uniformly applied so that the cellulose acetate butyrate as a binder was 2.34 g / m 2 . After the application, heating and drying were performed at 75 ° C. for 4 minutes. Thus, a photothermographic material was prepared.
【0155】無機層状化合物としては、合成雲母とし
て、Naテトラシックマイカ(NaMg2.5(Si
4O10)F2)を表1に示したように、保護層、バックコ
ート層に加えた。また、無機層状化合物の添加は保護層
に関しては「炭酸カルシウムプリミックス溶液の調製」
の際に、バックコート層に関しては「シロイドX600
0プリミックス溶液」の際に行った。こうして本発明の
試料1を得た。As an inorganic layered compound, as synthetic mica, Na tetrathick mica (NaMg 2.5 (Si
4 O 10 ) F 2 ) was added to the protective layer and the back coat layer as shown in Table 1. In addition, the addition of the inorganic layered compound is described in “Preparation of calcium carbonate premix solution” for the protective layer.
At this time, regarding the back coat layer, "Syloid X600
0 premix solution ". Thus, Sample 1 of the present invention was obtained.
【0156】次いで、保護層またはバックコート層の無
機層状化合物の種類を表1に示すようにした以外は、試
料1と同様にして試料2〜9を作製した。Next, Samples 2 to 9 were prepared in the same manner as in Sample 1, except that the kind of the inorganic layered compound of the protective layer or the back coat layer was as shown in Table 1.
【0157】保護層のスムースター値は炭酸カルシウム
プリミックス溶液調製時における炭酸カルシウム量を増
減、またバックコート表面のスムースター値はシロイド
X6000プリミックス溶液調製時におけるシリカ量を
増減して調製した。The smoother value of the protective layer was adjusted by increasing or decreasing the amount of calcium carbonate during the preparation of the calcium carbonate premix solution, and the smoother value of the back coat surface was adjusted by increasing or decreasing the amount of silica during the preparation of the Syloid X6000 premix solution.
【0158】《評価》 《スムースター平滑度》JAPAN TAPPI N
o.5Aに準拠し測定を行った。この値が小さいほど平
滑度が高いことを表す。<< Evaluation >><< Smoother smoothness >> JAPAN TAPPI N
o. The measurement was performed according to 5A. The smaller this value is, the higher the smoothness is.
【0159】《露光及び現像処理》上記のように作製し
た感光材料の乳剤面側から、高周波重畳にて波長800
nm〜820nmの縦マルチモード化された半導体レー
ザを露光源とした露光機によりレーザ走査による露光を
与えた。この際に、感光材料の露光面と露光レーザ光の
角度を75度として画像を形成した。(なお、当該角度
を90度とした場合に比べムラが少なく、かつ予想外に
鮮鋭性等が良好な画像が得られた。)その後、ヒートド
ラムを有する自動現像機を用いて感光材料の保護層とド
ラム表面が接触するようにして、110℃で15秒熱現
像処理した。その際、露光及び現像は23℃、50%R
Hに調湿した部屋で行った。得られた画像の評価をデジ
タル濃度計PDA−65(コニカ(株)製)により行っ
た。上記の露光および現像を連続的に2500枚処理し
0枚目、2500枚目の感度(未露光部分よりも1.0
高い濃度を与える露光量の比の逆数)変動およびカブリ
変動と現像ムラを評価した。なお感度は感光材料1の0
枚目処理時の感度を100とする相対値で示した。現像
ムラの実技上許容されるレベルはA、Bである。<< Exposure and development treatment >> From the emulsion side of the photosensitive material prepared as described above, a wavelength of 800
Exposure was performed by laser scanning using an exposing machine using a semiconductor laser having a vertical multi-mode of nm to 820 nm as an exposure source. At this time, an image was formed at an angle of 75 degrees between the exposure surface of the photosensitive material and the exposure laser beam. (Note that an image with less unevenness and unexpectedly good sharpness and the like was obtained compared to the case where the angle was set to 90 degrees.) Thereafter, protection of the photosensitive material was performed using an automatic developing machine having a heat drum. The film was thermally developed at 110 ° C. for 15 seconds so that the layer and the drum surface were in contact with each other. At that time, exposure and development were performed at 23 ° C and 50% R.
We went in a room conditioned to H. The obtained image was evaluated by a digital densitometer PDA-65 (manufactured by Konica Corporation). The above exposure and development are continuously performed on 2500 sheets, and the sensitivity of the 0th sheet and the 2500th sheet (1.0 times higher than the unexposed part)
The fluctuation (reciprocal of the ratio of the exposure amount giving a high density), the fog fluctuation and the development unevenness were evaluated. The sensitivity is 0 for photosensitive material 1.
The relative values are shown with the sensitivity at the time of processing the first sheet as 100. The practically acceptable levels of development unevenness are A and B.
【0160】《現像ムラ評価》 A:現像ムラが全く見られない B:拡大鏡で現像ムラが確認できる C:目視で現像ムラが確認できる D:明確に現像ムラが確認できる。<< Evaluation of Development Unevenness >> A: No development unevenness is observed. B: Development unevenness can be confirmed with a magnifying glass. C: Development unevenness can be visually confirmed. D: Development unevenness can be clearly confirmed.
【0161】《画像形成装置内での析出》画像形成装置
内での析出物の発生状態を目視で評価した。許容される
レベルはA、Bである。<< Precipitation in Image Forming Apparatus >> The state of generation of precipitates in the image forming apparatus was visually evaluated. Acceptable levels are A and B.
【0162】 A:ほとんど発生していない B:壁などに僅かに発生しているが問題はない C:画像形成装置内のローラ部、壁に析出が見られ問題 D:画像形成装置内の駆動部に析出し問題。A: Almost no occurrence B: Slight occurrence on a wall or the like but no problem C: Precipitation on roller portion and wall in image forming apparatus D: Driving in image forming apparatus Deposits on the part and causes problems.
【0163】[0163]
【表1】 [Table 1]
【0164】[0164]
【表2】 [Table 2]
【0165】表2から、本発明の試料は感度、カブリな
どの写真性能の変動が少なく、現像ムラの発生も少ない
ことが明らかである。From Table 2, it is clear that the sample of the present invention has little variation in photographic performance such as sensitivity and fog, and has little development unevenness.
【0166】[0166]
【発明の効果】本発明により、感度やカブリなどの写真
性能の変動が少なく、感材を大量に処理した後でも現像
ムラの発生もほとんど見られない高品質な熱現像写真感
光材料、それを用いる画像記録方法及び画像形成方法を
提供することが出来た。According to the present invention, a high-quality heat-developable photographic light-sensitive material which has little fluctuation in photographic performance such as sensitivity and fog and hardly shows development unevenness even after processing a large amount of photographic material. An image recording method and an image forming method to be used can be provided.
Claims (11)
ロゲン化銀を含有する感光層を有し、非感光性銀塩およ
び該非感光性銀塩の還元剤を含有する熱現像写真感光材
料において、保護層、中間層またはバックコート層が無
機層状化合物を含有することを特徴とする熱現像写真感
光材料。1. A heat-developable photographic material having a photosensitive layer containing a photosensitive silver halide on at least one surface of a support, and containing a non-photosensitive silver salt and a reducing agent for the non-photosensitive silver salt. A heat-developable photographic material, wherein the protective layer, the intermediate layer or the back coat layer contains an inorganic layer compound.
化合物を含有することを特徴とする請求項1に記載の熱
現像写真感光材料。2. The photothermographic material according to claim 1, wherein the protective layer or the backcoat layer contains an inorganic layered compound.
mmHg、バックコート層の表面のスムースター値が5
0〜300mmHgであることを特徴とする請求項1ま
たは2に記載の熱現像写真感光材料。3. The protective layer surface has a smoother value of 0 to 25.
mmHg, smoother value of the surface of the back coat layer is 5
3. The photothermographic material according to claim 1, wherein the pressure is from 0 to 300 mmHg.
合物とバインダーの重量比が1/10〜10/1である
ことを特徴とする請求項1〜3のいずれか1項に記載の
熱現像写真感光材料。4. The heat according to claim 1, wherein the weight ratio of the inorganic layered compound to the binder in the layer containing the inorganic layered compound is 1/10 to 10/1. Developed photographic photosensitive material.
以上であることを特徴とする請求項1〜4のいずれか1
項に記載の熱現像写真感光材料。5. An inorganic layered compound having an aspect ratio of 100.
The method according to any one of claims 1 to 4, wherein
4. The photothermographic material according to item 1.
特徴とする請求項1〜5のいずれか1項に記載の熱現像
写真感光材料。6. The photothermographic material according to claim 1, wherein the inorganic layered compound is synthetic mica.
とを特徴とする請求項1〜6のいずれか1項に記載の熱
現像写真感光材料。7. The photothermographic material according to claim 1, wherein the inorganic layered compound is bentonite.
1項に記載の熱現像写真感光材料を露光することを特徴
とする画像記録方法。8. An image recording method comprising exposing the photothermographic material according to claim 1 using a laser.
的に垂直になることがない露光装置を用いて請求項1〜
7のいずれか1項に記載の熱現像写真感光材料を露光す
ることを特徴とする画像記録方法。9. An exposure apparatus using an exposure apparatus in which an angle between an exposure surface and a scanning laser beam does not become substantially vertical.
8. An image recording method, comprising exposing the photothermographic material according to any one of items 7 to 7.
レーザ走査露光機を用いて、請求項1〜7に記載の熱現
像写真感光材料を露光することを特徴とする画像記録方
法。10. An image recording method comprising exposing the photothermographic material according to claim 1 using a laser scanning exposure device that emits a scanning laser beam that is a vertical multi.
熱現像写真感光材料が溶剤を500mg/m2以下含有
している状態において、加熱現像することを特徴とする
画像形成方法。11. An image forming method, wherein the photothermographic material according to claim 1 is heat-developed in a state where the photothermographic material contains a solvent of 500 mg / m 2 or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11183762A JP2001013620A (en) | 1999-06-29 | 1999-06-29 | Heat-developable photographic sensitive material, image recording method, and image forming method by using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11183762A JP2001013620A (en) | 1999-06-29 | 1999-06-29 | Heat-developable photographic sensitive material, image recording method, and image forming method by using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001013620A true JP2001013620A (en) | 2001-01-19 |
Family
ID=16141538
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11183762A Pending JP2001013620A (en) | 1999-06-29 | 1999-06-29 | Heat-developable photographic sensitive material, image recording method, and image forming method by using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001013620A (en) |
-
1999
- 1999-06-29 JP JP11183762A patent/JP2001013620A/en active Pending
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