JP2001160207A - Thin-film magnetic head and method for manufacturing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To narrow a track width and to well execute the recording and/or reproducing operation of magnetic signals. SOLUTION: This thin-film magnetic head is constituted by laminating and forming at least a lower core layer and an upper core layer constituting a closed magnetic path on a substrate. The lower core layer and the upper core layer respectively have projecting parts formed to the width corresponding to the recording track on their medium-facing surface sides. These projecting parts are arranged to face each other via nonmagnetic layers, by which a magnetic gap is formed. The upper core layer has a first core layer which forms the projecting parts and a second core layer which is formed on this first core layer and is formed to the width greater than the width of the first core layer. The first core layer is molded to an approximately tapered shape in such a manner that its ends adjacent to the second core layer are larger than the width corresponding to the recording track.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin-film magnetic head in which components constituting a head element are formed by lamination in a thin-film forming step, and a method of manufacturing the same.

[0002]

2. Description of the Related Art A magnetic head is mounted on a magnetic recording / reproducing device such as a hard disk device, for example, and records and / or reproduces a recording signal on a magnetic recording medium (hereinafter, referred to as recording / reproducing). is there. As a magnetic head,
Conventionally, a so-called bulk type magnetic head in which a coil is wound around a magnetic core member constituting a closed magnetic circuit has been widely used. However, the bulk-type magnetic head has a limit in producing it by performing fine processing, and it has been difficult to reduce the size of the bulk-type magnetic head in response to an increase in recording density of a recording signal.

Therefore, as a magnetic head, a so-called thin-film magnetic head, which is manufactured by a thin-film forming process and is formed by laminating a lower core layer and an upper core layer constituting a closed magnetic circuit on a substrate, has been used. It has become to.

For example, as shown in FIG. 10, a thin-film magnetic head 100 has a substrate 101 on which a lower core layer 102, a nonmagnetic layer 103, and an upper core layer 104 are sequentially laminated.

In this thin-film magnetic head 100, the lower core layer 102 has a projection 102 formed on the medium facing surface side facing the magnetic recording medium so as to have a width corresponding to the recording track.
a. The non-magnetic layer 103 is formed of the lower core layer 1
02 is formed on the convex portion 102a. On the other hand, the upper core layer 104 has a first core layer 105 formed on the non-magnetic layer 103 to have a width corresponding to the recording track,
Of the first core layer 105 formed on the core layer 105 of FIG.
And a second core layer 106 formed to have a larger width.

That is, the lower core layer 102 and the upper core layer 104 are respectively formed on the medium facing surface side with a convex part 102a formed to have a width corresponding to a recording track and the first core layer 10a.
5, the projection 102a and the first core layer 105
Doo is by being opposed to each other via a nonmagnetic layer 103, and a magnetic gap is formed, these widths are the track width T _W.

In the thin-film magnetic head configured as described above, since each component is formed by the thin-film forming process, it is possible to reduce the size and cope with an increase in the recording density of a recording signal.

[0008]

By the way, in the thin-film magnetic head, in order to meet the demand for a higher recording density for a magnetic recording medium, it is increasingly important to reduce the track width and to improve the track width accuracy. ing.

For this reason, the above-described thin-film magnetic head 100
Then, the upper core layer 104 has a two-layer structure of a first core layer 105 and a second core layer 106.
Is divided into two stages, so that the track width T
It is possible to form a narrow track of _W , that is, to make the width of the first core layer 105 narrow.

Further, in the thin-film magnetic head 100, by forming the convex portion 102a disposed on the lower core layer 102 so as to face the first core layer 105, the leakage magnetic field to the surroundings can be reduced. In addition, it is possible to perform recording and reproduction with high accuracy even for minute magnetic signals.

As described above, in the thin-film magnetic head 100,
As the track width T _W becomes narrower, the convex portion 102 a for regulating the track width T _W and the first core layer 105 are formed.
And miniaturization. Also, in the upper core layer 104, the first core
The miniaturization of the second core layer 106 formed on the core layer 105 is also progressing.

In this thin-film magnetic head 100, a spiral-shaped conductor coil formed as a thin film is disposed between a lower core layer 102 and an upper core layer 104. Generally, when manufacturing the thin film magnetic head 100,
The second core layer constituting the upper core layer 104 is laminated on the surface on which the conductor coils are formed.

For this reason, when manufacturing the thin-film magnetic head 100, the second core layer is inevitably formed with a pattern on an extremely uneven surface, so that the second core layer 106 is miniaturized. Then, there arises a problem that the pattern of the second core layer 106 cannot be accurately formed.

In the thin-film magnetic head 100, as the size of the second core layer 106 is reduced, magnetic saturation of the second core layer 106 is likely to occur on the medium facing surface side. This magnetic saturation is caused by the second on the medium facing surface side.
Of the core layer 106 of FIG.

For this reason, in the thin-film magnetic head 100, the width of the first core layer 105 is reduced to accompany the narrow track, whereas the width of the second core layer 106 is designed to be as large as possible. In this case, in the thin-film magnetic head 100,
A large difference occurs between the width of the first core layer 105 and the width of the second core layer 106.

However, in the thin-film magnetic head 100, if there is a large difference between the width of the first core layer 105 and the width of the second core layer 106, the first core layer 105 and the second core layer 106 There is a case where a large step is generated at a joint portion between the recording medium and the pseudo recording operation at the step.

In view of the foregoing, the present invention has been proposed in view of the above circumstances, and has a thin film capable of narrowing a track width and performing a recording and / or reproducing operation of a magnetic signal satisfactorily. An object of the present invention is to provide a magnetic head and a method for manufacturing the same.

[0018]

According to the present invention, there is provided a thin-film magnetic head comprising at least a lower core layer and an upper core layer constituting a closed magnetic circuit, which are laminated on a substrate. The upper core layer and the upper core layer each have a protrusion formed on the medium facing surface side to have a width corresponding to the recording track, and these protrusions are arranged to face each other via the nonmagnetic layer to form a magnetic gap. At the same time, the upper core layer has a first core layer forming the protrusion and a first core layer formed on the first core layer and having a width larger than the width of the first core layer. And the first core layer is formed in a substantially tapered shape such that an end portion adjacent to the second core layer is larger than a width corresponding to the recording track. It is characterized by.

As described above, in the thin-film magnetic head according to the present invention, the first core layer is substantially shaped so that the end adjacent to the second core layer is larger than the width corresponding to the recording track. Since the first core layer and the second core layer are formed in a tapered shape, it is possible to prevent a step from being generated at a joint portion between the first core layer and the second core layer, and a pseudo recording operation occurs at the joint portion. Can be prevented.

The second core layer is formed to have a width larger than the width of the first core layer.
Can be designed to have a large width, and magnetic saturation can be prevented from occurring in the second core layer.

Further, a method of manufacturing a thin-film magnetic head according to the present invention for achieving the above object, comprises the steps of: providing a lower core layer on a substrate;
A method for manufacturing a thin-film magnetic head in which a non-magnetic layer and an upper core layer are sequentially laminated, and in forming the upper core layer, a resist material is applied on the non-magnetic layer to form a resist layer. A step of forming a resist pattern having a predetermined shape by performing exposure setting on the resist layer using a photolithography technique, and using a resist pattern, an upper end portion is formed from a width corresponding to the recording track. Forming a substantially tapered first core layer that is also large, and etching the first core layer as a mask to an intermediate portion in the thickness direction of the lower core layer,
Forming a protrusion having a width corresponding to the first core layer on the lower core layer; and forming a second core having a width larger than the width of the first core layer on the first core layer. Forming a layer.

As described above, in the method of manufacturing a thin-film magnetic head according to the present invention, the first core layer having a substantially tapered shape whose upper end portion is larger than the width corresponding to the recording track is formed. Since the second core layer having a width larger than the width of the first core layer is formed on the first core layer,
The width of the core layer can be designed to be large, and the second core layer can be accurately formed on the first core layer.

[0023]

Embodiments of the present invention will be described below in detail with reference to the drawings.

First, the structure of a thin-film magnetic head to which the present invention is applied is shown in FIGS. FIG. 1 is an end view of the thin-film magnetic head viewed from the medium sliding surface side.
FIG. 2 is a sectional view of the thin-film magnetic head taken along a plane perpendicular to the medium facing surface.

The thin-film magnetic head 1 is formed by a thin-film forming process, and has a magneto-resistance effect on a substrate 2 formed of a hard non-magnetic material such as AlTiC (alumina-titanium carbide) in a substantially flat shape. A reproducing head for reproducing a signal recorded on a magnetic recording medium by utilizing the reproducing head, and an inductance type recording head for recording a signal on the magnetic recording medium are provided on the reproducing head.

The reproducing head section includes a first non-magnetic layer 3 formed on the substrate 2, a lower shield layer 4 formed on the first non-magnetic layer 3 with substantially the same height, and a first non-magnetic layer 3. 2 non-magnetic layer 5, a third non-magnetic layer 6 formed on the lower shield layer 4 and the second non-magnetic layer 5, and a magnetoresistive layer formed on the third non-magnetic layer 6. An effect element (hereinafter, referred to as an MR element) 7 and a pair of electrode films 8, a fourth nonmagnetic layer 9 formed on the third nonmagnetic layer 6,
Intermediate shield layer 1 formed on fourth nonmagnetic layer 9
0 and a fifth nonmagnetic layer 11.

On the other hand, the recording head section has a fourth nonmagnetic layer 9.
A lower core layer 10 formed on the lower core layer 10;
A sixth nonmagnetic layer 12 formed thereon, a depth regulating film 13 and a seventh nonmagnetic layer 14 formed on the sixth nonmagnetic layer 12, and a sixth nonmagnetic layer 14 on the seventh nonmagnetic layer 14. And an upper core layer 17 formed substantially at the center of the thin film coil 15 and substantially in contact with the lower core layer 10.

In the thin-film magnetic head 1, the intermediate shield layer 10 and the lower core layer 10 are made of the same material. In the reproducing head section, a pair of magnetic shields is formed together with the lower shield layer 4, and in the recording head section. Constitutes a pair of magnetic cores together with the upper core layer 17.

In the thin-film magnetic head 1, the constituent elements of the reproducing head section and the recording head section face outward to form substantially the same end face, and this end face is the medium facing surface facing the magnetic recording medium. It has been.

The reproducing head has a structure in which a sense current is supplied to the MR element 7 in parallel with the medium facing surface, and is configured as a so-called horizontal MR head. Further, the reproducing head section includes a third nonmagnetic layer 6 and a fourth nonmagnetic layer 9 in which the MR element 7 forms a shield gap by a pair of the lower shield layer 4 and the intermediate shield layer 10.
This is a so-called shield type MR head that is sandwiched between the two.

On the other hand, in the recording head section, the lower core layer 10 and the upper core layer 17 constitute a magnetic core that forms a closed magnetic circuit, and a sixth non-magnetic layer is provided between the lower core layer 10 and the upper core layer 17. The arrangement of the magnetic layer 12 forms a magnetic gap on the medium facing surface.

More specifically, in the recording head portion, the lower core layer 10 has a convex portion 10a formed on the medium facing surface side so as to have a width corresponding to the recording track. And the sixth
The non-magnetic layer 12 is formed on the projection 10a of the lower core layer 10.

On the other hand, the upper core layer 17 is formed on the sixth nonmagnetic layer 12 by a first core layer 18 and the first core layer 18.
And a second core layer 19 formed to have a width larger than the width of the first core layer 18 formed thereon. The first core layer 18 is formed to have a width corresponding to the recording track from the side adjacent to the sixth non-magnetic layer 12 to the middle of the thickness method, and from the middle to the second core layer 19. Is formed in a substantially tapered shape so as to be larger than the width corresponding to the recording track up to the side adjacent to the recording track. Then, the second core layer 19 is formed on the first core layer 18. Here, the width of the second core layer 19 is substantially equal to or slightly larger than the width of the end of the first core layer 18 adjacent to the second core layer 19. Molding.

As described above, the lower core layer 10 and the upper core layer 17 are respectively formed on the medium facing surface side with the convex portion 10 a formed to have a width corresponding to the recording track and the first core layer 18.
And the projection 10a and the first core layer 18
Doo is by being opposed to each other via a nonmagnetic layer 12 of the sixth, and the magnetic gap is formed, these widths are the track width T _W.

In the recording head section, the depth regulating film 1 is provided.
3 regulates the depth (depth) of the magnetic gap from the medium facing surface side of the first core layer 18 to the other end side.

The thin-film magnetic head 1 configured as described above
Then, when reproducing the signal recorded on the magnetic recording medium,
A sense current is supplied to the MR element 7 from a power source (not shown) via the pair of electrode films 8. The voltage value of the MR element 7 is detected by a detection mechanism (not shown). Since the MR element 7 has a film structure having a magnetoresistive effect, its resistance value changes according to the signal magnetic field from the magnetic recording medium. Therefore, in the thin-film magnetic head 1, when a sense current is supplied to the MR element 7, the voltage value changes based on the change in the resistance value of the MR element 7. Therefore, in the thin-film magnetic head 1, a signal magnetic field from the magnetic recording medium can be detected by detecting a change in the voltage value of the MR element 7.

In the thin-film magnetic head 1, when a magnetic signal is recorded on a magnetic recording medium, a current corresponding to the signal to be recorded is supplied to the thin-film coil 15 of the recording head. In the thin-film magnetic head 1, the thin-film coil 1
The magnetic field generated by 5 causes a magnetic flux to flow through the magnetic core constituted by the lower core layer 10 and the upper core layer 17. Thereby, in the thin-film magnetic head 1, a leakage magnetic field is generated in the magnetic gap, and a magnetic signal can be recorded by applying the leakage magnetic field to the magnetic recording medium.

Further, in the thin-film magnetic head 1, by forming the protrusion 10a on the lower core layer 10 so as to face the first core layer 18, the leakage magnetic field to the surroundings can be reduced. Thus, a magnetic signal can be recorded with high accuracy.

[0039] Incidentally, in the thin-film magnetic head 1, by the upper core layer 17 and the first core layer 18 and the two-layer structure of the second core layer 19, tried to narrow the track of the track width T _W ing. The first core layer 18 is formed to have a width corresponding to the recording track from the side adjacent to the sixth non-magnetic layer 12 to the middle of the thickness method, and from the middle to the second core. It is formed in a substantially tapered shape so that the width adjacent to the layer 19 is larger than the width corresponding to the recording track.

The first core layer 18 does not necessarily need to be formed to have a width corresponding to the recording track from the side adjacent to the sixth nonmagnetic layer 12 to the middle of the thickness method. The shape is not necessarily limited as long as the end adjacent to the second core layer 19 is formed in a substantially tapered shape so as to be larger than the width corresponding to the recording track.

As shown in FIG. 3, the upper core layer 17 has a width W1 at an end portion of the first core layer 18 adjacent to the sixth nonmagnetic layer 12, and a width W1 of the first core layer 18. Assuming that the width of the end adjacent to the second core layer 19 is W2, W2−W1
It is formed so as to satisfy ≧ 0.4 μm. FIG. 3 is a schematic end view schematically showing a recording head portion of the thin-film magnetic head 1.

Thus, in the thin-film magnetic head 1,
First core layer 18 and second core layer 19 of upper core layer 17
Steps can be prevented from occurring at the joint portion between the two, and a pseudo recording operation can be prevented from occurring at this joint portion.

In the upper core layer 17, the second core layer 19 is formed to have a width larger than the width of the first core layer 18. Can be designed to be large, and the occurrence of magnetic saturation in the second core layer 19 can be prevented.

Therefore, according to the thin-film magnetic head 1, a magnetic signal can be recorded on a magnetic recording medium with high accuracy.

Next, a method of manufacturing the above-described thin-film magnetic head 1 will be described.

In the following description, the thin-film magnetic head 1
Although specific examples are given for each constituent element and its material, size, film thickness, film forming method and the like, the present invention is not necessarily limited to the following examples.

First, when the thin-film magnetic head 1 is manufactured, a substrate made of a hard non-magnetic material such as AlTiC (alumina-titanium carbide) is prepared in a substantially flat plate shape. Is subjected to mirror polishing. The substrate material finally becomes the substrate 2 of the thin-film magnetic head 1, and the components of the thin-film magnetic head 1 are sequentially formed on this main surface by a thin-film forming process.

Next, a non-magnetic insulating film to be the first non-magnetic layer 3 is formed on the entire main surface of the substrate material. This nonmagnetic insulating film is formed by a method such as sputtering using a nonmagnetic insulating material such as Al ₂ O ₃ or SiO ₂ . In the present embodiment, polishing is performed after the film formation so that the surface of the first nonmagnetic layer 3 is smooth.

Next, a soft magnetic film to be the lower shield layer 4 is formed on the first nonmagnetic layer 3. Specifically, this soft magnetic film is made of sendust (Fe-Al-Si alloy), Fe
-A film is formed by a method such as sputtering using a metal material such as an Si-Ru-Ga alloy or an Fe-Ta-N alloy.
The lower shield layer 4 is formed with a predetermined width in a direction perpendicular to the medium facing surface. Specifically, for example, the lower shield layer 4 is formed by forming a sendust film with a thickness of about 3 to 5 μm, forming a resist pattern, and removing unnecessary sendust by a dry etching method.

Next, the first shield layer 4 having the lower shield layer 4 formed thereon is formed.
A non-magnetic insulating film to be the second non-magnetic layer 5 is formed on the entire surface of the non-magnetic layer 3. This nonmagnetic insulating film is formed by a method such as sputtering using a nonmagnetic insulating material such as Al ₂ O ₃ or SiO ₂ , similarly to the first nonmagnetic layer 3. Then, the second non-magnetic layer 5 is polished to expose the lower shield layer 4 embedded in the second non-magnetic layer 5, and these lower shield layer 4 and the second non-magnetic layer 5 are polished. 5 is flattened so as to form the same plane.

Next, a third non-magnetic layer 6 is formed on the entire surface of the lower shield layer 4 and the second non-magnetic layer 5 forming the same plane.
A non-magnetic insulating film is formed. This nonmagnetic insulating film
Like the first non-magnetic layer 3, for example, Al ₂ O ₃ or SiO ₂
Is formed by a method such as sputtering using a non-magnetic insulating material such as

Next, on the third nonmagnetic layer 6, the MR element 7
Is formed by a thin film forming process using sputtering or the like. Specifically, the MR element 7 includes, for example, a Ta layer, Ni
It is manufactured by sequentially laminating an Fe—Nb layer, a Ta layer, a Ni—Fe layer, and a Ta layer by sputtering. The material of each layer constituting the MR element 7 and the film thickness thereof are not limited to the above examples. An appropriate material is selected according to the purpose of use of the thin-film magnetic head 1 and the like. Should be set to. Further, the MR element 7 using a spin valve film may be used.

The MR element 7 is formed in a substantially rectangular shape.
The thin-film magnetic head 1 is formed so that its longitudinal direction is along one side which is the medium facing surface in the thin-film magnetic head 1. Further, the MR element 7
Is formed such that its length in the longitudinal direction is shorter than the width of the lower shield layer 4.

Next, a pair of electrode films 8 are formed on both ends of the MR element 7 in a thin film shape. The electrode film 8 is formed using a conductive material by, for example, an evaporation method, a sputtering method, or the like. The electrode film 8 is formed in a substantially rectangular shape.
Films are formed on both ends of the MR element 7 in a direction perpendicular to the longitudinal direction of the R element 7. In the MR element 7, hard magnetic films for applying a bias magnetic field to the MR element 7 are provided at both ends of the MR element 7 in order to stabilize the operation of the MR element 7. It may be.

Next, a non-magnetic insulating film to be the fourth non-magnetic layer 9 is formed on the entire surface of the third non-magnetic layer 6 on which the MR element 7 and the pair of electrode films 8 are formed. This nonmagnetic insulating film is made of, for example, Al ₂ O ₃ or Si, like the first nonmagnetic layer 3.
A film is formed using a nonmagnetic insulating material such as O ₂ by a technique such as sputtering.

Next, a soft magnetic film to be the intermediate shield layer 10 is formed on the fourth nonmagnetic layer 9. This soft magnetic film
For example, a film having good soft magnetic properties such as a Ni-Fe alloy is formed by a plating method, a sputtering method, or the like. Further, the intermediate shield layer 10 is formed with a width that is larger than the length of the MR element 7 in the longitudinal direction with respect to the medium facing surface.

Next, a non-magnetic insulating film to be the fifth non-magnetic layer 11 is formed on the entire surface of the fourth non-magnetic layer 9 on which the intermediate shield layer 10 is formed. This nonmagnetic insulating film is formed by a method such as sputtering using a nonmagnetic insulating material such as Al ₂ O ₃ or SiO ₂ , similarly to the first nonmagnetic layer 3. Then, the fifth non-magnetic layer 11 is polished to expose the intermediate shield layer 10 embedded in the fifth non-magnetic layer 11.
And the intermediate shield layer 10 is flattened so as to form the same plane.

Next, a non-magnetic insulating film to be the sixth non-magnetic layer 12 is formed on the entire surface of the intermediate shield layer 10 and the fifth non-magnetic layer 11 constituting the same plane. This nonmagnetic insulating film is made of, for example, Al ₂ O ₃ or S
A film is formed by a technique such as sputtering using a non-magnetic insulating material such as iO ₂ .

Next, a depth regulating film 13 is formed of a non-magnetic material at a position slightly retreated from the medium facing surface.
The depth regulating film 13 has a function of regulating the depth of the magnetic gap from the medium facing surface, thereby improving the generation efficiency of the leakage magnetic field from the magnetic gap.

Next, an upper core layer 17 is formed on the sixth nonmagnetic layer 12.

Specifically, when the upper core layer 17 is formed, first, as shown in FIG. 4, over the entire surface of the sixth nonmagnetic layer 12 on which the read head is formed on the substrate 2, On the other hand, a base film for magnetic plating is formed by sputtering or the like.

Next, as shown in FIG. 5, a frame resist 20 for frame plating the first core layer 18 is formed on the surface on which the base film has been formed.

When the frame resist 20 is formed, a resist material is applied on a base film to form a resist layer, and the resist layer is set to be exposed by using a photolithography technique. The first core layer 18 is formed so as to have substantially the same shape as that of the first core layer 18 described above. The frame resist 20 is formed at a position where one end of the frame resist 20 rides on the depth regulating film 13.

More specifically, the setting of the exposure of the resist layer is performed by changing the focal position of light applied to the resist layer through a lens. At that time, the focus setting during exposure that usually emphasizes linearity is performed,
In the present invention, focus setting is performed so that the inner shape of the frame resist 20 is enlarged in the thickness direction of the resist layer, that is, defocus setting is performed to shift the focus of light irradiated through the lens to the resist layer in the thickness direction.

As a result, the inner shape of the frame resist 20 is formed to have a width corresponding to the recording track from the sixth nonmagnetic layer 12 to an intermediate portion in the thickness direction thereof, and the inner shape of the frame resist 20 corresponds to the recording track. It can be formed into a substantially tapered shape larger than the width.

For example, when the thickness of the first core layer 18 to be manufactured is set to about 1.75 μm, the first core layer 18 rises substantially perpendicularly to a position away from the resist layer by about 1 μm in the thickness direction. A focus setting is made from the middle part so that the shape is enlarged at an angle of about 15 °.

As a result, the width W1 of the end of the first core layer 18 adjacent to the sixth nonmagnetic layer 12 and the width W1 of the first core layer 1
Assuming that the width of the end portion adjacent to the second core layer 19 is W2, the substantially tapered first core layer 18 that satisfies W2−W1 ≧ 0.4 μm can be formed.

In this method, the frame resist 20
Need not necessarily be formed to have a width corresponding to the recording track from the sixth nonmagnetic layer 12 to an intermediate part of the thickness method, and the upper end of the inner shape is larger than the width corresponding to the recording track. It is not necessarily limited to such a shape as long as it is formed in a substantially tapered shape so that the diameter becomes large.

Here, for example, when the thickness of the first core layer 18 to be formed is about 2.0 μm, the focus setting for the resist layer and the frame resist 2 to be formed
The relationship between the taper angle of 0 and W2-W1 of the first core layer 18 manufactured using this frame resist was measured.

Here, the focus setting is a focus position of light irradiated on the resist layer through the lens, and the focus position is higher than the resist layer surface with respect to a case where the focus position is on the resist layer surface. A certain case was defined as a plus (+) direction, and a lower case was defined as a minus (-) direction. Also, the taper angle is defined as the frame resist 20
W2−W1 is the width of the end portion of the first core layer 18 adjacent to the sixth nonmagnetic layer 12 as W1, and the width of the first core layer 18 Second
Is the difference when the width of the end adjacent to the core layer 19 is W2. Table 1 shows the measurement results.

[0071]

[Table 1]

As can be seen from Table 1, in this case, the above-mentioned focus setting is set to +0.6 μm or more, the frame resist 20 is formed, and the upper core layer 18 is formed by using the frame resist 20, thereby obtaining W2-W1.
The first core layer 18 having a substantially tapered shape that satisfies ≧ 0.4 μm can be formed.

Next, as shown in FIG. 6, a soft magnetic film 21 serving as the first core layer 18 is formed using a frame resist 20.
Is formed by frame plating. The soft magnetic film 21 is formed of a material exhibiting good soft magnetic characteristics such as a Ni-Fe alloy.

Next, as shown in FIG. 7, the frame resist 20 is removed using an organic solvent or the like, and the underlying film is removed by etching or the like. Then, the first core layer 18
Of the soft magnetic film 21 formed as the first core layer 1
The soft magnetic film 21 to be 8 is protected by a cover resist, and unnecessary soft magnetic film 21 is removed by chemical etching. Then, the cover resist is removed using an organic solvent or the like.

Thus, the recording track is formed to have a width corresponding to the recording track from the side adjacent to the sixth non-magnetic layer 12 to the middle of the thickness method, and from the middle to the recording track in the thickness direction. A first core layer 18 formed into a substantially tapered shape so as to have a width larger than the corresponding width is formed. That is, the substantially tapered first core layer 18 whose upper end is larger than the width corresponding to the recording track.
Is formed.

Next, as shown in FIG. 8, using the first core layer 18 as a mask, etching is continuously performed up to the middle of the intermediate magnetic shield layer 10. As a result, the lower core layer 10 having the protrusions 10a opposed to each other with the first core layer 18 and the sixth nonmagnetic layer 12 therebetween is formed.

Then, a non-magnetic insulating film to be the seventh non-magnetic layer 14 is formed on the entire surface of the sixth non-magnetic layer 12 on which the first core layer 18 is formed. This nonmagnetic insulating film is formed by the first
Like the non-magnetic layer 3, a film is formed by a method such as sputtering using a non-magnetic insulating material such as Al ₂ O ₃ or SiO ₂ . Then, the seventh non-magnetic layer 14 is polished to expose the first core layer 18 embedded in the seventh non-magnetic layer 14, and the first core layer 18 and the seventh Is flattened so as to form the same plane with the nonmagnetic layer 14.

Then, a thin-film coil 15 is formed on the seventh nonmagnetic layer 14 using a conductive material. Thin film coil 1
5 is formed by a technique such as sputtering from a conductive material such as Cu. In addition, the thin film coil 15
It is formed in a spiral shape with an abutting portion between a second core layer 19 and a lower core layer 10 described later substantially at the center.

Then, a non-magnetic insulating film to be the eighth non-magnetic layer 16 is formed so as to cover the thin-film coil 15. This non-magnetic insulating film is made of, for example, A, like the first non-magnetic layer 3.
A film is formed using a non-magnetic insulating material such as l ₂ O ₃ or SiO ₂ by a technique such as sputtering.

Next, as shown in FIG. 9, the first core layer 1
A soft magnetic film to be the second core layer 19 is formed on 8.
This soft magnetic film is formed from a material exhibiting good soft magnetic properties such as a Ni-Fe alloy by a plating method, a sputtering method, or the like. In addition, the second core layer 19
It is formed in contact with the first core layer 18 and abuts the lower core layer 10 at a substantially central portion of the spirally formed thin-film coil 15. Thereby, the lower core layer 1
0 and the upper core layer 17 constitute the magnetic core of the thin-film magnetic head 1.

As described above, the above-described thin-film magnetic head 1 is manufactured. The thin-film magnetic head 1 to be manufactured
Is polished in a later step,
The end face that is polished and exposed becomes the medium facing surface, and finally has a structure as shown in FIGS.

In the above description, the first core layer 18
Is formed by plating, but the present invention is not limited to the method of forming the first core layer 18. For example, the first core layer 18 is formed by various PVD methods such as a vapor deposition method and a sputtering method. May be.

As described above, in this method, the upper core layer 1
7 is formed, a substantially tapered first core layer 18 whose upper end is larger than the width corresponding to the recording track is formed, and the first core layer 18 is formed on the first core layer 18. Layer 18
Since the second core layer 19 having a width larger than the width of the second core layer 19 is formed, the width of the second core layer 19 can be designed to be large, and the second core layer 19 is formed on the first core layer 18. It can be formed with high precision. Therefore, according to this method, the thin-film magnetic head 1 with improved reliability can be manufactured, and the productivity can be greatly improved.

[0084]

As described in detail above, in the thin-film magnetic head according to the present invention, the first core layer has an end adjacent to the second core layer larger than the width corresponding to the recording track. Is formed in a substantially tapered shape so that a step can be prevented from being formed at a joint portion between the first core layer and the second core layer, and a pseudo recording operation is performed at this joint portion. Can be prevented from occurring.

The second core layer is formed to have a width larger than the width of the first core layer.
Can be designed to have a large width, and magnetic saturation can be prevented from occurring in the second core layer.

Therefore, according to this thin-film magnetic head, a magnetic signal can be recorded and / or reproduced with high accuracy on a magnetic recording medium.

In the method for manufacturing a thin-film magnetic head according to the present invention, a substantially tapered first core layer whose upper end portion is larger than the width corresponding to the recording track is formed. Since the second core layer having a width larger than the width of the first core layer is formed on the layer, the width of the second core layer can be designed to be large. First
Can be accurately formed on the core layer.

Therefore, according to this method, a thin-film magnetic head with improved reliability can be manufactured, and the productivity can be greatly improved.

[Brief description of the drawings]

FIG. 1 is an end view showing a configuration of a thin film magnetic head to which the present invention is applied.

FIG. 2 is a sectional view showing a configuration of the thin-film magnetic head.

FIG. 3 is a schematic end view schematically showing a recording head portion of the thin-film magnetic head.

FIG. 4 is a view showing a manufacturing process of the thin-film magnetic head;
FIG. 4 is a cross-sectional view showing a state where a reproducing head is formed on a substrate.

FIG. 5 is a view showing a manufacturing process of the thin-film magnetic head;
FIG. 5 is a cross-sectional view showing a state where a frame resist is formed on a surface on which a base film is formed.

FIG. 6 is a diagram showing a manufacturing process of the thin-film magnetic head.
FIG. 4 is a cross-sectional view showing a state in which a soft magnetic film serving as a first core layer is frame-plated using a frame resist.

FIG. 7 is a view showing a manufacturing process of the thin-film magnetic head.
FIG. 14 is a cross-sectional view showing a state where a first core layer is formed on a sixth soft magnetic film.

FIG. 8 is a view showing a manufacturing process of the thin-film magnetic head.
FIG. 4 is a cross-sectional view showing a state in which a lower core layer is formed by performing an etching process to a middle part of an intermediate shield layer using a first core layer as a mask.

FIG. 9 is a diagram showing a manufacturing process of the thin-film magnetic head.
FIG. 4 is a cross-sectional view illustrating a state where a second core layer is formed on the first core layer.

FIG. 10 is an end view showing a configuration of a conventional thin film magnetic head.

[Explanation of symbols]

1 thin film magnetic head, 2 substrates, 4 lower shield layers,
6 lower gap layer, 7 magnetoresistive element, 9 upper gap layer, 10 intermediate shield layer (lower core layer), 1
0a convex portion, 12 sixth nonmagnetic layer, 17 upper core layer, 18 first core layer, 19 second core layer, 20
Frame resist

Claims (4)

[Claims] At least a lower core layer and an upper core layer constituting a closed magnetic path are laminated on a substrate, and the lower core layer and the upper core layer are respectively formed on a recording track on a medium facing surface side. The upper core layer has projections formed to have corresponding widths, and the projections are arranged to face each other via the nonmagnetic layer to form a magnetic gap. And a second core layer formed on the first core layer and having a width larger than the width of the first core layer. The first core layer Wherein the end portion adjacent to the second core layer is formed in a substantially tapered shape such that the end portion is larger than the width corresponding to the recording track. 2. The method according to claim 1, wherein the upper core layer has a width W1 at an end of the first core layer adjacent to the nonmagnetic layer, and the first core layer has a width W1.
The width of the end of the core layer adjacent to the second core layer is W2
2. The thin-film magnetic head according to claim 1, wherein said thin-film magnetic head is formed so as to satisfy W2-W1≥0.4 [mu] m. 3. A method according to claim 1, wherein a lower core layer, a non-magnetic layer,
A method of manufacturing a thin-film magnetic head in which an upper core layer is sequentially laminated, wherein a resist material is applied on the non-magnetic layer to form a resist layer on the non-magnetic layer, and photolithography is performed. Forming a resist pattern having a predetermined shape by performing exposure setting on the resist layer using a technique; and using the resist pattern, an upper end portion having a width larger than a width corresponding to the recording track. Forming a substantially tapered first core layer, and using the first core layer as a mask, etching to a middle part in the thickness direction of the lower core layer, thereby forming the first core layer on the lower core layer. Forming a protrusion having a width corresponding to the first core layer; and forming a second core layer having a width larger than the width of the first core layer on the first core layer. Method of manufacturing a thin film magnetic head is characterized in that it has and. 4. The exposure setting for the resist layer is performed as follows:
4. The method according to claim 3, wherein the focusing is performed by changing a focal position of light applied to the resist layer through a lens.
The manufacturing method of the thin film magnetic head according to the above.